TWI607879B - Optical laminate, polarizing plate and image display device using same - Google Patents
Optical laminate, polarizing plate and image display device using same Download PDFInfo
- Publication number
- TWI607879B TWI607879B TW102146871A TW102146871A TWI607879B TW I607879 B TWI607879 B TW I607879B TW 102146871 A TW102146871 A TW 102146871A TW 102146871 A TW102146871 A TW 102146871A TW I607879 B TWI607879 B TW I607879B
- Authority
- TW
- Taiwan
- Prior art keywords
- resin layer
- meth
- acrylate
- resin
- acrylic
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims description 105
- 229920005989 resin Polymers 0.000 claims description 141
- 239000011347 resin Substances 0.000 claims description 141
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 94
- 239000000758 substrate Substances 0.000 claims description 81
- -1 acryl Chemical group 0.000 claims description 35
- 239000010410 layer Substances 0.000 description 152
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 87
- 239000010408 film Substances 0.000 description 48
- 239000011342 resin composition Substances 0.000 description 38
- 239000002904 solvent Substances 0.000 description 36
- 230000005855 radiation Effects 0.000 description 35
- 239000004925 Acrylic resin Substances 0.000 description 27
- 229920000178 Acrylic resin Polymers 0.000 description 27
- 239000000463 material Substances 0.000 description 26
- 238000000576 coating method Methods 0.000 description 23
- 150000001875 compounds Chemical class 0.000 description 23
- 239000000203 mixture Substances 0.000 description 23
- 239000000178 monomer Substances 0.000 description 23
- 239000011248 coating agent Substances 0.000 description 22
- 229910052731 fluorine Inorganic materials 0.000 description 22
- 238000000034 method Methods 0.000 description 21
- 229920000642 polymer Polymers 0.000 description 21
- 238000001035 drying Methods 0.000 description 19
- 239000011737 fluorine Substances 0.000 description 18
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 17
- 239000004973 liquid crystal related substance Substances 0.000 description 16
- 125000000524 functional group Chemical group 0.000 description 15
- 229920002098 polyfluorene Polymers 0.000 description 13
- 239000003999 initiator Substances 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 12
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 11
- 229920002678 cellulose Polymers 0.000 description 11
- 238000011282 treatment Methods 0.000 description 11
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 10
- 239000007787 solid Substances 0.000 description 10
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 9
- 239000002216 antistatic agent Substances 0.000 description 9
- 239000003795 chemical substances by application Substances 0.000 description 9
- 150000002596 lactones Chemical group 0.000 description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 9
- 238000000851 scanning transmission electron micrograph Methods 0.000 description 9
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 8
- 229910000420 cerium oxide Inorganic materials 0.000 description 8
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 8
- 229920001515 polyalkylene glycol Polymers 0.000 description 8
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 7
- 229920001577 copolymer Polymers 0.000 description 7
- 239000011254 layer-forming composition Substances 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 125000001153 fluoro group Chemical group F* 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 229920001223 polyethylene glycol Polymers 0.000 description 6
- 230000002265 prevention Effects 0.000 description 6
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
- 238000003917 TEM image Methods 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 5
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 229920005992 thermoplastic resin Polymers 0.000 description 5
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 4
- 229920002284 Cellulose triacetate Polymers 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 4
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 229920002675 Polyoxyl Polymers 0.000 description 3
- 239000004721 Polyphenylene oxide Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical class [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000001913 cellulose Substances 0.000 description 3
- 210000002858 crystal cell Anatomy 0.000 description 3
- 238000007607 die coating method Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 150000002009 diols Chemical class 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000001125 extrusion Methods 0.000 description 3
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 3
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 3
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 229920000570 polyether Polymers 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 238000007127 saponification reaction Methods 0.000 description 3
- 230000008961 swelling Effects 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 2
- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical group CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- 229930040373 Paraformaldehyde Natural products 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 230000003373 anti-fouling effect Effects 0.000 description 2
- 239000002519 antifouling agent Substances 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 238000003851 corona treatment Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 208000028659 discharge Diseases 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 2
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 229920001748 polybutylene Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 229920005672 polyolefin resin Polymers 0.000 description 2
- 150000003077 polyols Chemical class 0.000 description 2
- 229920006324 polyoxymethylene Polymers 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 125000004151 quinonyl group Chemical group 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 2
- 239000011882 ultra-fine particle Substances 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 230000037303 wrinkles Effects 0.000 description 2
- LGPPATCNSOSOQH-UHFFFAOYSA-N 1,1,2,3,4,4-hexafluorobuta-1,3-diene Chemical compound FC(F)=C(F)C(F)=C(F)F LGPPATCNSOSOQH-UHFFFAOYSA-N 0.000 description 1
- QSSVZVNYQIGOJR-UHFFFAOYSA-N 1,1,2-trichloro-3,3,3-trifluoroprop-1-ene Chemical compound FC(F)(F)C(Cl)=C(Cl)Cl QSSVZVNYQIGOJR-UHFFFAOYSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- CRXBTDWNHVBEIC-UHFFFAOYSA-N 1,2-dimethyl-9h-fluorene Chemical group C1=CC=C2CC3=C(C)C(C)=CC=C3C2=C1 CRXBTDWNHVBEIC-UHFFFAOYSA-N 0.000 description 1
- ALVZNPYWJMLXKV-UHFFFAOYSA-N 1,9-Nonanediol Chemical compound OCCCCCCCCCO ALVZNPYWJMLXKV-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- MWOODERJGVWYJE-UHFFFAOYSA-N 1-methyl-1-phenylhydrazine Chemical compound CN(N)C1=CC=CC=C1 MWOODERJGVWYJE-UHFFFAOYSA-N 0.000 description 1
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- FEWSKCAVEJNPBX-UHFFFAOYSA-N 2-(2-hydroxy-2-phenylacetyl)benzenesulfonic acid Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1S(O)(=O)=O FEWSKCAVEJNPBX-UHFFFAOYSA-N 0.000 description 1
- LTHJXDSHSVNJKG-UHFFFAOYSA-N 2-[2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOCCOC(=O)C(C)=C LTHJXDSHSVNJKG-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- FIAHOPQKBBASOY-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-henicosafluorododecyl prop-2-enoate Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCOC(=O)C=C FIAHOPQKBBASOY-UHFFFAOYSA-N 0.000 description 1
- YSYRISKCBOPJRG-UHFFFAOYSA-N 4,5-difluoro-2,2-bis(trifluoromethyl)-1,3-dioxole Chemical compound FC1=C(F)OC(C(F)(F)F)(C(F)(F)F)O1 YSYRISKCBOPJRG-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical group C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 150000000703 Cerium Chemical class 0.000 description 1
- 244000301850 Cupressus sempervirens Species 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical class [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 229930182558 Sterol Natural products 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- XVEUJTIZHZIHJM-UHFFFAOYSA-N a828782 Chemical compound CCOC(N)=O.CCOC(N)=O XVEUJTIZHZIHJM-UHFFFAOYSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 229920000800 acrylic rubber Polymers 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- JNDMLEXHDPKVFC-UHFFFAOYSA-N aluminum;oxygen(2-);yttrium(3+) Chemical compound [O-2].[O-2].[O-2].[Al+3].[Y+3] JNDMLEXHDPKVFC-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 150000007860 aryl ester derivatives Chemical group 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 description 1
- CLHAOIOLCMPIRX-UHFFFAOYSA-N benzoic acid diphenylmethanone Chemical compound OC(=O)C1=CC=CC=C1.C=1C=CC=CC=1C(=O)C1=CC=CC=C1 CLHAOIOLCMPIRX-UHFFFAOYSA-N 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- DLIJPAHLBJIQHE-UHFFFAOYSA-N butylphosphane Chemical compound CCCCP DLIJPAHLBJIQHE-UHFFFAOYSA-N 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- SFZULDYEOVSIKM-UHFFFAOYSA-N chembl321317 Chemical compound C1=CC(C(=N)NO)=CC=C1C1=CC=C(C=2C=CC(=CC=2)C(=N)NO)O1 SFZULDYEOVSIKM-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 125000003709 fluoroalkyl group Chemical group 0.000 description 1
- 125000005348 fluorocycloalkyl group Chemical group 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 239000003205 fragrance Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 150000002466 imines Chemical group 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 239000002608 ionic liquid Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 150000002561 ketenes Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000005499 meniscus Effects 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 239000000113 methacrylic resin Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000003544 oxime group Chemical group 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- KNCYXPMJDCCGSJ-UHFFFAOYSA-N piperidine-2,6-dione Chemical group O=C1CCCC(=O)N1 KNCYXPMJDCCGSJ-UHFFFAOYSA-N 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920001197 polyacetylene Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920005906 polyester polyol Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- KRIOVPPHQSLHCZ-UHFFFAOYSA-N propiophenone Chemical compound CCC(=O)C1=CC=CC=C1 KRIOVPPHQSLHCZ-UHFFFAOYSA-N 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 150000003432 sterols Chemical class 0.000 description 1
- 235000003702 sterols Nutrition 0.000 description 1
- SKRWFPLZQAAQSU-UHFFFAOYSA-N stibanylidynetin;hydrate Chemical compound O.[Sn].[Sb] SKRWFPLZQAAQSU-UHFFFAOYSA-N 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000002522 swelling effect Effects 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
- 229910019901 yttrium aluminum garnet Inorganic materials 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
- G02B5/3041—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
- G02B5/305—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks including organic materials, e.g. polymeric layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
- B32B27/308—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising acrylic (co)polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
- B32B3/26—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
- B32B3/30—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by a layer formed with recesses or projections, e.g. hollows, grooves, protuberances, ribs
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/16—Optical coatings produced by application to, or surface treatment of, optical elements having an anti-static effect, e.g. electrically conducting coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/13338—Input devices, e.g. touch panels
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/10—Coating on the layer surface on synthetic resin layer or on natural or synthetic rubber layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/30—Properties of the layers or laminate having particular thermal properties
- B32B2307/306—Resistant to heat
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/42—Polarizing, birefringent, filtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Laminated Bodies (AREA)
- Polarising Elements (AREA)
- Liquid Crystal (AREA)
- Surface Treatment Of Optical Elements (AREA)
Description
本發明係關於一種光學積層體、使用其之偏光板及影像顯示裝置。 The present invention relates to an optical laminate, a polarizing plate using the same, and an image display device.
於影像顯示裝置中,LCD(Liquid Crystal Display,液晶顯示裝置)、搭載有觸控面板之LCD或ELD(Electroluminescence Display,電致發光)、電子紙等具有省電、輕量、薄型等特徵,因此取代先前之CRT(Cathode-Ray Tube,陰極射線管)顯示器而於近年迅速普及。 In an image display device, an LCD (Liquid Crystal Display), an LCD equipped with a touch panel, an ELD (Electroluminescence Display), and an electronic paper have characteristics such as power saving, light weight, and thinness. It has been rapidly popularized in recent years in place of the previous CRT (Cathode-Ray Tube) display.
用於此種影像顯示裝置之表面或內部之光學積層體係通常要求賦予硬度以於使用時不受傷,因此,通常藉由在透光性基材上設置硬塗層等而賦予硬度。例如,於LCD,通常於液晶單元之影像顯示面側配置偏光元件,並利用在透光性基材上設置有硬塗層之硬塗膜作為偏光板保護膜,藉此對影像顯示面賦予硬度。 An optical layering system used for the surface or the inside of such an image display device is generally required to impart hardness so as not to be injured during use. Therefore, hardness is usually imparted by providing a hard coat layer or the like on a light-transmitting substrate. For example, in the LCD, a polarizing element is usually disposed on the image display surface side of the liquid crystal cell, and a hard coat film provided with a hard coat layer on the light-transmitting substrate is used as a polarizing plate protective film, thereby imparting hardness to the image display surface. .
先前,作為上述硬塗膜之透光性基材,使用由三乙醯纖維素所代表之纖維素酯構成的膜。此係基於如下優點:纖維素酯之透明性、光學均向性優異,且面內幾乎並無相位差(延遲值較低),因此極少使入射直線偏光之振動方向發生變化,而對液晶顯示裝置之顯示品質之影響較少,且具有適度之透水性,因此可使製造使用光學積層體而成之偏光板時殘留於偏光片之水分透過光學積層體而乾燥等優點。 Conventionally, as the light-transmitting substrate of the hard coat film, a film composed of a cellulose ester represented by triacetyl cellulose has been used. This is based on the advantages that the cellulose ester is excellent in transparency and optical uniformity, and there is almost no phase difference in the surface (the retardation value is low), so that the vibration direction of the incident linear polarization is rarely changed, and the liquid crystal display is displayed. Since the influence of the display quality of the device is small and the water permeability is moderate, it is advantageous in that the moisture remaining in the polarizing plate is transmitted through the optical laminate and dried when the polarizing plate made of the optical laminate is used.
然而,纖維素酯膜為成本考量下不利之原材料,又,耐濕、耐熱性並不足,若將以纖維素酯膜為基材之硬塗膜作為偏光板保護膜而於高溫多濕之環境下使用,則存在會使偏光功能或色相等偏光板功能降低之缺點。 However, the cellulose ester film is an unfavorable raw material in consideration of cost, and is resistant to moisture and heat. If a hard coating film made of a cellulose ester film is used as a polarizing plate protective film, it is in a high-temperature and humid environment. When used below, there is a disadvantage that the polarizing function or the color equal polarizing plate function is lowered.
由於上述纖維素酯膜之問題,故而提出使用以丙烯酸系樹脂為主成分的透明塑膠基材,該丙烯酸系樹脂係透明性、耐熱性、機械強度優異且與纖維素酯膜相比廉價且於市場上容易獲得。 Due to the problem of the above cellulose ester film, it has been proposed to use a transparent plastic substrate containing an acrylic resin as a main component, which is excellent in transparency, heat resistance, and mechanical strength, and is inexpensive compared with a cellulose ester film. Easy to get on the market.
然而,於以丙烯酸系樹脂為主成分之基材之單面或雙面形成有硬塗層的光學積層體存在丙烯酸系基材與硬塗層之密接性較差的問題。又,丙烯酸系基材與硬塗層之間會產生折射率差,於使用該光學積層體形成偏光板等之情形,亦存在產生干涉條紋而外觀不良之問題。 However, in the optical layered body in which the hard coat layer is formed on one surface or both surfaces of the substrate containing the acrylic resin as a main component, there is a problem that the adhesion between the acrylic base material and the hard coat layer is inferior. Further, a refractive index difference occurs between the acrylic base material and the hard coat layer, and when a polarizing plate or the like is formed using the optical laminate, there is a problem that interference fringes are generated and the appearance is poor.
針對上述問題,例如,專利文獻1中揭示:除了對基材膜進行電暈放電處理、氧化處理等物理性處理外,亦進行稱為錨固劑(anchor agent)或底塗劑之塗料的塗佈,此後形成硬塗層,藉此謀求基材膜與硬塗層之密接性提高。又,例如,專利文獻2中揭示於基材膜與硬塗層之界面形成凹凸之方法。 In view of the above problems, for example, Patent Document 1 discloses that, in addition to physical treatment such as corona discharge treatment or oxidation treatment on a substrate film, coating of a coating called an anchor agent or a primer is also performed. Thereafter, a hard coat layer is formed, whereby the adhesion between the base film and the hard coat layer is improved. Further, for example, Patent Document 2 discloses a method of forming irregularities at the interface between the base film and the hard coat layer.
然而,該等方法中,需要增加硬塗膜之製造時所必需之步驟,會有進行特殊處理之必要,因此生產性較差。 However, in such methods, it is necessary to increase the steps necessary for the production of the hard coat film, and it is necessary to carry out special treatment, so that productivity is poor.
[專利文獻1]日本特開2011-81359號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2011-81359
[專利文獻2]日本特開平8-197670號公報 [Patent Document 2] Japanese Patent Laid-Open No. Hei 8-197670
又,丙烯酸系基材與先前常用之纖維素酯膜或聚酯系膜相比,通常可使用之溶劑全都具有使基材膨潤之力,反倒因溶劑而導致基材易強烈地受到膨潤之影響,存在加工時基材本身斷開等問題,並且亦存在先前透明塑膠基材方面已知之技術無法直接用於丙烯酸系基材之問題。 Further, the acrylic substrate generally has a force for swelling the substrate as compared with the conventionally used cellulose ester film or polyester film, and the substrate is easily subjected to swelling due to the solvent. There is a problem that the substrate itself is broken during processing, and there is also a problem that the technique known from the prior transparent plastic substrate cannot be directly used for the acrylic substrate.
本發明之目的在於在上述狀況下提供一種光學積層體,係於丙烯酸系基材上具有樹脂層,能以相對較少之製造步驟獲得,可丙烯酸系基材本身不斷開而製造加工,且抑制干涉條紋之產生,且丙烯酸系基材與樹脂層之密接性優異。 An object of the present invention is to provide an optical layered body having a resin layer on an acrylic substrate under the above-described conditions, which can be obtained in a relatively small number of manufacturing steps, and can be manufactured without being broken, and can be suppressed. The interference fringes are generated, and the adhesion between the acrylic base material and the resin layer is excellent.
本發明人為了解決上述課題而反覆進行努力研究,結果發現,於丙烯酸系基材之一個面上具有樹脂層之光學積層體中,於丙烯酸系基材-樹脂層界面設有特定形狀之凹凸,藉此可解決上述課題。本發明係基於該見解而完成者。 In order to solve the above problems, the present inventors have conducted intensive studies on the above-mentioned problems, and found that in the optical layered body having a resin layer on one surface of the acrylic substrate, irregularities of a specific shape are provided at the interface between the acrylic substrate and the resin layer. This can solve the above problems. The present invention has been completed based on this finding.
即,本發明提供以下發明。 That is, the present invention provides the following invention.
[1]一種光學積層體,係於丙烯酸系基材之一個面上具有樹脂層者,且於該光學積層體厚度方向之剖面,丙烯酸系基材-樹脂層界面顯示具有山部及谷部之稜線,且與上述光學積層體厚度方向垂直之方向的基準長度30μm中上述稜線之長度為31~45μm。 [1] An optical layered product having a resin layer on one surface of an acrylic substrate, and having a cross section in the thickness direction of the optical layered body, the acrylic substrate-resin layer interface has a mountain portion and a valley portion. The ridge line has a length of 31 to 45 μm in the reference length of 30 μm in the direction perpendicular to the thickness direction of the optical layered body.
[2]如[1]之光學積層體,其中於上述光學積層體厚度方向之剖面,與光學積層體厚度方向垂直之方向的基準長度30μm中,將丙烯酸系基材-樹脂層界面之谷部中自最深之谷底起按深淺順序排前3名之平均深度作為基準深度,繼而將丙烯酸系基材-樹脂層界面之山部中自最高之峰頂起按高低順 序排前3名之平均高度作為基準高度,該基準高度與基準深度之高低差為0.3~3.5μm。 [2] The optical layered product according to [1], wherein the cross section in the thickness direction of the optical layered body and the reference length of 30 μm in the direction perpendicular to the thickness direction of the optical layered body, the valley portion of the acrylic substrate-resin layer interface From the bottom of the deepest valley, the average depth of the top three in the order of depth is used as the reference depth, and then the top of the acrylic substrate-resin layer is topped from the highest peak. The average height of the top three in the sequence is used as the reference height, and the difference between the reference height and the reference depth is 0.3 to 3.5 μm.
[3]如[1]或[2]之光學積層體,其中上述稜線之平均傾斜角θa為15~48°。 [3] The optical layered body according to [1] or [2], wherein the ridge line has an average inclination angle θa of 15 to 48°.
[4]如[1]至[3]中任一項之光學積層體,其中上述稜線顯示之凹凸之平均間隔Sm為0.5~7μm。 [4] The optical layered body according to any one of [1] to [3] wherein the ridge line exhibits an average interval Sm of the unevenness of 0.5 to 7 μm.
[5]一種偏光板,係於偏光膜之至少一個面積層[1]至[4]中任一項之光學積層體而成。 [5] A polarizing plate comprising an optical layered body of any one of the at least one area layers [1] to [4] of the polarizing film.
[6]一種影像顯示裝置,其具備[1]至[4]中任一項之光學積層體及/或[5]之偏光板。 [6] An image display device comprising the optical layered body of any one of [1] to [4] and/or the polarizing plate of [5].
本發明之光學積層體係於丙烯酸系基材上具有樹脂層,能以相對較少之製造步驟獲得,干涉條紋之產生受到抑制,且丙烯酸系基材與樹脂層之密接性優異。 The optical layering system of the present invention has a resin layer on an acrylic substrate, and can be obtained in a relatively small number of production steps, and the occurrence of interference fringes is suppressed, and the adhesion between the acrylic substrate and the resin layer is excellent.
1‧‧‧丙烯酸系基材 1‧‧‧Acrylic substrate
2‧‧‧樹脂層 2‧‧‧ resin layer
3‧‧‧硬塗層 3‧‧‧hard coating
4‧‧‧丙烯酸系基材-樹脂層界面 4‧‧‧Acrylic substrate-resin layer interface
4a‧‧‧最大值點 4a‧‧‧Maximum point
4a-1‧‧‧y座標最大之最大值點(3點) 4a-1‧‧‧y maximum maximum point (3 points)
4b‧‧‧最小值點 4b‧‧‧minimum point
4b-1‧‧‧y座標最小值最小值(3點) 4b-1‧‧‧y coordinate minimum value (3 points)
5a‧‧‧基準深度 5a‧‧‧Datum depth
5b‧‧‧基準高度 5b‧‧‧Base height
h‧‧‧基準高度與基準深度之高低差 h‧‧‧The difference between the reference height and the reference depth
h1~h12‧‧‧鄰接之極值點間之高低差 h 1 ~h 12 ‧‧‧The difference between the extreme points of the adjacent
圖1係顯示本發明之光學積層體之一態樣之剖面的掃描型穿透式電子顯微鏡照片(STEM)。 Fig. 1 is a scanning type transmission electron micrograph (STEM) showing a cross section of one aspect of the optical layered body of the present invention.
圖2係將本發明之光學積層體之一態樣之剖面中的丙烯酸系基材-樹脂層界面放大而顯示之掃描型穿透式電子顯微鏡照片(STEM)。 Fig. 2 is a scanning transmission electron micrograph (STEM) showing an acrylic substrate-resin layer interface in a cross section of one aspect of the optical layered body of the present invention.
圖3係表示本發明之光學積層體之一態樣之剖面的示意圖。 Fig. 3 is a schematic view showing a cross section of one aspect of the optical layered body of the present invention.
圖4係表示本發明之光學積層體之丙烯酸系基材-樹脂層界面之稜線、及基準高度與基準深度之高低差的示意圖。 Fig. 4 is a schematic view showing the ridgeline of the acrylic substrate-resin layer interface of the optical layered body of the present invention and the difference in height between the reference height and the reference depth.
圖5係表示本發明之光學積層體之丙烯酸系基材-樹脂層界面之稜線、 及鄰接之極值點間之高低差的示意圖。 Figure 5 is a view showing the ridge line of the acrylic substrate-resin layer interface of the optical layered body of the present invention, And a schematic diagram of the difference between the extreme points of the adjacent ones.
圖6係顯示實施例10中獲得之本發明之光學積層體之剖面的掃描型穿透式電子顯微鏡照片(STEM)。 Fig. 6 is a scanning type transmission electron micrograph (STEM) showing a cross section of the optical layered body of the present invention obtained in Example 10.
圖7係將實施例10中所獲得之本發明之光學積層體之剖面中自硬塗層-樹脂層界面至丙烯酸系基材-樹脂層界面放大而顯示的掃描型穿透式電子顯微鏡照片(STEM)。 Fig. 7 is a scanning type transmission electron micrograph showing the cross section of the optical layer-resin layer interface to the acrylic substrate-resin layer in the cross section of the optical layered body of the present invention obtained in Example 10 ( STEM).
圖8係顯示比較例8中所獲得之光學積層體之剖面的掃描型穿透式電子顯微鏡照片(STEM)。 Fig. 8 is a scanning type transmission electron micrograph (STEM) showing a cross section of the optical layered body obtained in Comparative Example 8.
圖9係將比較例8中所獲得之本發明之光學積層體之剖面中自硬塗層-樹脂層界面至丙烯酸系基材-樹脂層界面放大而顯示的掃描型穿透式電子顯微鏡照片(STEM)。 Fig. 9 is a scanning type transmission electron micrograph showing an enlarged view of the interface from the hard coat layer-resin layer interface to the acrylic substrate-resin layer in the cross section of the optical layered body of the present invention obtained in Comparative Example 8. STEM).
本發明之光學積層體係於丙烯酸系基材之一個面上具有樹脂層者,且其特徵在於:其於該光學積層體厚度方向之剖面,丙烯酸系基材-樹脂層界面顯示具有山部及谷部之稜線,上述光學積層體與厚度方向垂直之方向的基準長度30μm中上述稜線之長度為31~45μm。 The optical layering system of the present invention has a resin layer on one surface of the acrylic substrate, and is characterized in that it has a cross section in the thickness direction of the optical laminate, and the acrylic substrate-resin layer interface has a mountain portion and a valley. In the ridge line of the portion, the length of the ridge line in the reference length 30 μm in the direction perpendicular to the thickness direction of the optical layered body is 31 to 45 μm.
本發明之光學積層體係於丙烯酸系基材上具有樹脂層,如圖1及圖2所示般,丙烯酸系基材與樹脂層之界面(以下,有時簡稱為丙烯酸系基材-樹脂層界面)具有凹凸。 The optical layering system of the present invention has a resin layer on the acrylic substrate, and the interface between the acrylic substrate and the resin layer as shown in FIGS. 1 and 2 (hereinafter, simply referred to as an acrylic substrate-resin layer interface) ) has bumps.
又,上述稜線之長度較佳為31~45μm,更佳為32~42μm。若該稜線之長度未達31μm,則丙烯酸系基材-樹脂層界面之凹凸形狀不足或平坦之部分變多,因此丙烯酸系基材-樹脂層界面之密接性惡化, 或者容易產生干涉條紋。另一方面,若該稜線之長度超過45μm,則光學積層體之霧度上升。 Further, the length of the ridge line is preferably 31 to 45 μm, more preferably 32 to 42 μm. When the length of the ridge line is less than 31 μm, the unevenness of the interface between the acrylic base material and the resin layer is insufficient or the flat portion is increased, so that the adhesion between the acrylic base material and the resin layer interface is deteriorated. Or it is easy to produce interference fringes. On the other hand, if the length of the ridge line exceeds 45 μm, the haze of the optical layered body rises.
上述稜線之長度具體係按以下所示之方式進行測定。 The length of the above ridge line is specifically measured in the manner shown below.
(基準長度30μm中稜線之長度之測定方法) (Method for measuring the length of the ridgeline in the reference length of 30 μm)
此處,上述基準長度30μm中之稜線之長度例如可藉由使用影像解析軟體(Image-Pro、Media Cybernetic公司製造)之上述剖面之影像解析進行測定。具體而言,使用利用電子顯微鏡等進行剖面觀察之影像,使用上述影像解析軟體,於上述影像內之樹脂層與基材膜端部間之直線上取上述基準長度,並使用上述影像解析軟體測定該基準長度中上述界面長度。更具體而言,使用影像解析軟體Image-Pro Plus、Sharp Stack 6.2版,構成測定、校準、空間之校準精靈(wizard)、主動影像、並以單位(微米)進行操作,結合影像之比例尺劃定義線,進行校準。校準後,利用距離測定於界面兩末端之2點間取基準長度。繼而,利用手動測定製作痕跡線(trace line)(閾值=3、平滑化=0、速度=3、雜訊=5、自動),最終比照標準,藉此自動地測定曲線,並讀取實測值作為界面之長度。 Here, the length of the ridge line in the reference length of 30 μm can be measured, for example, by image analysis using the above-described cross section of the image analysis software (Image-Pro, manufactured by Media Cybernetic Co., Ltd.). Specifically, using the image analysis software by an electron microscope or the like, the image analysis software is used, and the reference length is taken on a straight line between the resin layer and the end portion of the base film in the image, and the image analysis software is used. The length of the above interface in the reference length. More specifically, using image analysis software Image-Pro Plus, Sharp Stack version 6.2, to form the measurement, calibration, space calibration wizard, active image, and operate in units (micron), combined with the scale of the image definition Line, for calibration. After calibration, the reference length is taken between two points at both ends of the interface by distance measurement. Then, using a manual measurement to create a trace line (threshold = 3, smoothing = 0, speed = 3, noise = 5, automatic), and finally compare the standard, thereby automatically measuring the curve, and reading the measured value As the length of the interface.
又,本發明之光學積層體係於上述光學積層體厚度方向之剖面,與光學積層體厚度方向垂直之方向的基準長度30μm中,將丙烯酸系基材-樹脂層界面之谷部中自最深之谷底起按深淺順序排前3名之平均深度作為基準深度,繼而將丙烯酸系基材-樹脂層界面之山部中自最高之峰頂起按高低順序排前3名之平均高度作為基準高度,該基準高度與基準深度之高低差較佳為0.3~3.5μm,該高低差更佳為0.7~3.0μm,進而較佳為1.0~2.5μm。若該高低差為3.5μm以下,則難以產生霧度,若為0.3μm以 上,則難以產生干涉條紋,丙烯酸系基材-樹脂層界面間之密接性改善。 Further, in the optical layering system of the present invention, the cross section in the thickness direction of the optical layered body has a reference length of 30 μm in the direction perpendicular to the thickness direction of the optical layered body, and the valley portion of the acrylic substrate-resin layer interface is the deepest valley bottom. The average depth of the top three in the order of depth is used as the reference depth, and then the average height of the top three in the order of the highest peak from the top of the acrylic substrate-resin layer interface is used as the reference height. The difference between the reference height and the reference depth is preferably 0.3 to 3.5 μm, and the height difference is preferably 0.7 to 3.0 μm, and more preferably 1.0 to 2.5 μm. If the height difference is 3.5 μm or less, it is difficult to produce haze, and if it is 0.3 μm On the other hand, it is difficult to generate interference fringes, and the adhesion between the acrylic substrate-resin layer interface is improved.
上述基準深度與平均高度之高低差具體而言係按以下所述之方式進行測定。 The difference between the above reference depth and the average height is specifically measured as described below.
(基準高度與基準深度之高低差之測定方法) (Method for measuring the difference between the reference height and the reference depth)
如圖4所示般,於上述光學積層體之厚度方向之剖面,丙烯酸系基材-樹脂層界面顯示具有山部及谷部之稜線,於以光學積層體之厚度方向為y軸(其中,樹脂層側為正方向)、以垂直於該y軸之方向為x軸的xy平面中,於該x軸方向取30μm之基準長度L,於該基準長度L,稜線所具有之最小值點4b中,自y座標最小者中選擇3點(4b-1)並以其平均y座標作為基準深度5b,另一方面,於該基準長度L,稜線所具有之最大值點4a中,自y座標最大者中選擇3點(4a-1)並以其平均y座標作為基準高度5a,該基準深度5b與基準高度5a之差(絕對值)為基準深度5b與基準高度5a之高低差。 As shown in Fig. 4, in the cross section in the thickness direction of the optical layered body, the acrylic substrate-resin layer interface has ridge lines having a mountain portion and a valley portion, and the y-axis is in the thickness direction of the optical layered body (where The resin layer side is a positive direction), and a reference length L of 30 μm is taken in the x-axis direction in the xy plane perpendicular to the y-axis direction, and the minimum length point 4b of the ridge line is obtained at the reference length L. Among them, 3 points (4b-1) are selected from the smallest of the y coordinates and the average y coordinate is used as the reference depth 5b. On the other hand, in the reference length L, the maximum point 4a of the ridge line is from the y coordinate Among the largest ones, 3 points (4a-1) are selected and the average y coordinate is used as the reference height 5a, and the difference (absolute value) between the reference depth 5b and the reference height 5a is the difference between the reference depth 5b and the reference height 5a.
本發明之光學積層體係上述稜線之平均傾斜角θa較佳為15~48°,更佳為20~48°,進而較佳為25~45°。若平均傾斜角θa為48°以下,則難以產生霧度,若為15°以上,則難以產生干涉條紋,丙烯酸系基材-樹脂層界面間之密接性改善。 The average inclination angle θa of the ridgeline of the optical layering system of the present invention is preferably from 15 to 48, more preferably from 20 to 48, still more preferably from 25 to 45. When the average inclination angle θa is 48° or less, the haze is less likely to occur, and when it is 15° or more, interference fringes are less likely to occur, and the adhesion between the acrylic base material and the resin layer interface is improved.
上述平均傾斜角θa具體而言係按以下所述之方式進行測定。 The above average tilt angle θa is specifically measured as described below.
(平均傾斜角θa之測定方法) (Method for measuring the average tilt angle θa)
如圖5所示般,於上述光學積層體之厚度方向之剖面,丙烯酸系基材-樹脂層界面顯示具有山部及谷部之稜線,於以光學積層體之厚度方向為y 軸(其中,樹脂層側為正方向)、以垂直於該y軸之方向為x軸的xy平面中,於該x軸方向取30μm之基準長度L,並於該基準長度L確定稜線所具有之極值點(最大值點4a及最小值點4b),將全部之鄰接之極值點間之高低差(h1~h12、絕對值)之和記作總高低差ΣH,此時tan-1(總高低差ΣH/基準長度L)所表示之值為平均傾斜角θa。 As shown in Fig. 5, in the cross section in the thickness direction of the optical layered body, the acrylic substrate-resin layer interface has ridge lines having a mountain portion and a valley portion, and the thickness direction of the optical layered body is the y-axis (where The resin layer side is a positive direction), an xy plane which is an x-axis in a direction perpendicular to the y-axis, a reference length L of 30 μm is taken in the x-axis direction, and an extreme point of the ridge line is determined at the reference length L (maximum point 4a and minimum point 4b), the sum of the height difference (h 1 ~ h 12 , absolute value) of all the adjacent extreme points is recorded as the total height difference ΣH, at this time tan -1 (total The height difference ΣH/reference length L) is expressed as an average inclination angle θa.
進而,本發明之光學積層體係上述稜線所示之凹凸之平均間隔Sm較佳為0.5~7μm,更佳為1~6μm,進而較佳為2~5μm。若平均間隔Sm為0.5μm以上則難以產生霧度,若為7μm以下則難以產生干涉條紋,丙烯酸系基材-樹脂層界面間之密接性改善。 Further, the average interval Sm of the concavities and convexities indicated by the ridge lines of the optical layering system of the present invention is preferably from 0.5 to 7 μm, more preferably from 1 to 6 μm, still more preferably from 2 to 5 μm. When the average interval Sm is 0.5 μm or more, haze is less likely to occur, and when it is 7 μm or less, interference fringes are less likely to occur, and the adhesion between the acrylic substrate-resin layer interface is improved.
再者,上述平均間隔Sm可依據JIS B0601(1994)進行測定。 Further, the above average interval Sm can be measured in accordance with JIS B0601 (1994).
本發明之光學積層體係基材含有丙烯酸系樹脂,因此,與具備由三乙醯纖維素(TAC)構成之基材者相比,耐濕熱性及平滑性優異,並且可較佳地防止皺褶之產生。再者,於本說明書中,所謂「丙烯酸系樹脂」,係指丙烯酸系樹脂及/或甲基丙烯酸系樹脂。 Since the base material of the optical layering system of the present invention contains an acrylic resin, it is excellent in moisture heat resistance and smoothness, and wrinkles can be preferably prevented, compared with a substrate made of triacetyl cellulose (TAC). Produced. In the present specification, the term "acrylic resin" means an acrylic resin and/or a methacrylic resin.
<丙烯酸系基材> <Acrylic substrate>
作為丙烯酸系基材所含有之丙烯酸系樹脂,並無特別限定,例如,較佳為將1種或2種以上(甲基)丙烯酸烷基酯組合並使之聚合而成者,更具體而言,較佳為使用(甲基)丙烯酸甲酯而獲得者。 The acrylic resin to be contained in the acrylic base material is not particularly limited, and for example, one or two or more kinds of alkyl (meth)acrylates are preferably combined and polymerized. More specifically, It is preferably obtained by using methyl (meth) acrylate.
作為丙烯酸系基材所含有之丙烯酸系樹脂,可使用具有內酯環結構之丙烯酸系樹脂、具有醯亞胺環結構之丙烯酸系樹脂等具有環結構者。 As the acrylic resin contained in the acrylic base material, a ring structure having an internal structure such as an acrylic resin having a lactone ring structure or an acrylic resin having a quinone ring structure can be used.
作為上述具有內酯環結構之丙烯酸系樹脂之具體例,例如可 列舉日本特開2000-230016號公報、日本特開2001-151814號公報、日本特開2002-120326號公報、日本特開2002-254544號公報、日本特開2005-146084號公報等中記載者。 As a specific example of the above acrylic resin having a lactone ring structure, for example, It is described in Japanese Laid-Open Patent Publication No. 2000-230016, JP-A-2001-151814, JP-A-2002-120326, JP-A-2002-254544, JP-A-2005-146084, and the like.
作為上述具有內酯環結構之丙烯酸系樹脂,較佳為具有下述通式(1)所表示之內酯環結構。 The acrylic resin having a lactone ring structure preferably has a lactone ring structure represented by the following formula (1).
通式(1)中,R1、R2及R3分別獨立地表示氫原子或碳數1~20之有機基。再者,上述有機基可含有氧原子。 In the formula (1), R 1 , R 2 and R 3 each independently represent a hydrogen atom or an organic group having 1 to 20 carbon atoms. Further, the above organic group may contain an oxygen atom.
上述具有內酯環結構之丙烯酸系樹脂之結構中,通式(1)所表示之內酯環結構之含有率較佳為5~90質量%,更佳為10~70質量%,進而較佳為10~60質量%,最佳為10~50質量%。若上述通式(1)所表示之內酯環結構之含有率為5質量%以上,則耐熱性、耐溶劑性、表面硬度改善,若為90質量%以下,則成形加工性改善。 In the structure of the acrylic resin having a lactone ring structure, the content of the lactone ring structure represented by the formula (1) is preferably from 5 to 90% by mass, more preferably from 10 to 70% by mass, further preferably. It is 10 to 60% by mass, preferably 10 to 50% by mass. When the content of the lactone ring structure represented by the above formula (1) is 5% by mass or more, the heat resistance, the solvent resistance, and the surface hardness are improved, and when the content is 90% by mass or less, the moldability is improved.
上述具有內酯環結構之丙烯酸系樹脂係重量平均分子量較佳為1000~200萬,更佳為5000~100萬,進而較佳為1萬~50萬,最佳為5萬~50萬。若上述具有內酯環結構之丙烯酸系樹脂之重量平均分子量為上述範圍內,則就上述本發明之效果之觀點而言,較佳。 The weight average molecular weight of the acrylic resin having a lactone ring structure is preferably from 1,000 to 2,000,000, more preferably from 5,000 to 1,000,000, still more preferably from 10,000 to 500,000, most preferably from 50,000 to 500,000. When the weight average molecular weight of the acrylic resin having a lactone ring structure is within the above range, it is preferred from the viewpoint of the effects of the present invention described above.
又,作為上述具有醯亞胺環結構之丙烯酸系樹脂,例如可列 舉具有戊二醯亞胺結構或N-取代順丁烯二醯亞胺結構之丙烯酸系樹脂等。 Further, as the acrylic resin having the above quinone ring structure, for example, it can be listed An acrylic resin having a glutarylene imine structure or an N-substituted maleimide structure can be used.
作為上述具有戊二醯亞胺結構之丙烯酸系樹脂,較佳為具有下述通式(2)所表示之戊二醯亞胺(glutarimide)結構。 The acrylic resin having a pentacomilin structure preferably has a glutarimide structure represented by the following formula (2).
上述通式(2)中,R4及R5相互獨立地表示氫原子或甲基,R6表示氫原子、碳數1~6之直鏈烷基、環戊基、環己基或苯基。 In the above formula (2), R 4 and R 5 each independently represent a hydrogen atom or a methyl group, and R 6 represents a hydrogen atom, a linear alkyl group having 1 to 6 carbon atoms, a cyclopentyl group, a cyclohexyl group or a phenyl group.
再者,上述戊二醯亞胺結構例如可利用甲基胺等醯亞胺化劑使(甲基)丙烯酸酯聚合物醯亞胺化而形成。此處,所謂「(甲基)丙烯酸」係指「丙烯酸」及「甲基丙烯酸」。 Further, the glutarylenediamine structure can be formed, for example, by imidization of a (meth) acrylate polymer oxime by a sulfhydrylating agent such as methylamine. Here, "(meth)acrylic" means "acrylic acid" and "methacrylic acid".
作為上述具有N-取代順丁烯二醯亞胺結構之丙烯酸系樹脂,較佳為具有下述通式(3)所表示之N-取代順丁烯二醯亞胺結構。 The acrylic resin having the N-substituted maleimide structure has an N-substituted maleimide structure represented by the following formula (3).
上述通式(3)中,R7及R8相互獨立地表示氫原子或甲基, R9表示氫原子、碳數1~6之直鏈烷基、環戊基、環己基或苯基。 In the above formula (3), R 7 and R 8 each independently represent a hydrogen atom or a methyl group, and R 9 represents a hydrogen atom, a linear alkyl group having 1 to 6 carbon atoms, a cyclopentyl group, a cyclohexyl group or a phenyl group.
再者,於主鏈具有上述N-取代順丁烯二醯亞胺結構之丙烯酸系樹脂例如可使N-取代順丁烯二醯亞胺與(甲基)丙烯酸酯共聚合而形成。 Further, an acrylic resin having the above-described N-substituted maleimide structure in the main chain can be formed, for example, by copolymerizing N-substituted maleimide and (meth) acrylate.
又,上述丙烯酸系樹脂係玻璃轉移點(Tg)較佳為100~140℃,更佳為105~135℃,進而較佳為110~130℃。若丙烯酸系樹脂之玻璃轉移點(Tg)為110℃以上,則形成樹脂層時難以受樹脂層形成用組成物中所含之溶劑的損害,另一方面,若為150℃以下,則於與樹脂層之界面容易形成凹凸。 Further, the acrylic resin-based glass transition point (Tg) is preferably from 100 to 140 ° C, more preferably from 105 to 135 ° C, still more preferably from 110 to 130 ° C. When the glass transition point (Tg) of the acrylic resin is 110° C. or more, the resin layer is less likely to be damaged by the solvent contained in the resin layer-forming composition, and when it is 150° C. or less, The interface of the resin layer is likely to form irregularities.
丙烯酸系基材亦可含有丙烯酸系樹脂以外之樹脂,但丙烯酸系基材中丙烯酸系樹脂之比率較佳為80質量%以上,更佳為90質量%以上。 The acrylic base material may contain a resin other than the acrylic resin, but the ratio of the acrylic resin in the acrylic base material is preferably 80% by mass or more, and more preferably 90% by mass or more.
作為上述丙烯酸系基材之厚度,較佳為20~300μm,更佳為上限為200μm且下限為30μm。若上述丙烯酸系基材之厚度為20μm以上,則本發明之光學積層體難以產生皺褶,另一方面,若為300μm以下,則本發明之光學積層體變薄,而透光性等光學特性優異。 The thickness of the acrylic substrate is preferably 20 to 300 μm, more preferably 200 μm, and the lower limit is 30 μm. When the thickness of the acrylic substrate is 20 μm or more, the optical layered product of the present invention is less likely to wrinkle. On the other hand, when the thickness is 300 μm or less, the optical layered body of the present invention is thinned, and optical properties such as light transmittance are obtained. Excellent.
上述丙烯酸系基材較佳為經延伸之丙烯酸系基材。藉由製成延伸丙烯酸系基材,可使基材之強度或尺寸穩定性良好。 The acrylic substrate is preferably an extended acrylic substrate. By forming the stretched acrylic substrate, the strength or dimensional stability of the substrate can be improved.
上述丙烯酸系基材例如可藉由如下方式進行製造:將經濕度控制之丙烯酸系樹脂構成的顆粒(碎片)進行通常之熔融擠出後,一面進行冷卻一面向縱方向延伸,此後向橫方向延伸。 The acrylic base material can be produced, for example, by subjecting particles (fragments) composed of a humidity-controlled acrylic resin to a usual melt extrusion, and then cooling the first surface to extend in the longitudinal direction, and then extending in the lateral direction. .
上述熔融擠出步驟中,可使用1軸、2軸、或2軸以上之螺桿(screw),螺桿之旋轉方向、轉數、熔融溫度可任意地設定。 In the melt extrusion step, a screw having one axis, two axes, or two axes or more can be used, and the rotation direction, the number of revolutions, and the melting temperature of the screw can be arbitrarily set.
上述延伸較佳為以於延伸後成為所需厚度之方式進行。又,延伸倍率 並無限定,較佳為1.2倍以上且4.5倍以下。延伸時之溫度、濕度可任意地決定。延伸方法為通常之方法即可。 The above extension is preferably carried out in such a manner as to extend to a desired thickness. Extension ratio It is not limited, and is preferably 1.2 times or more and 4.5 times or less. The temperature and humidity at the time of extension can be arbitrarily determined. The extension method is a usual method.
上述丙烯酸系基材亦可含有丙烯酸系橡膠粒子、抗氧化劑、紫外線吸收劑、塑化劑等。 The acrylic base material may contain acrylic rubber particles, an antioxidant, an ultraviolet absorber, a plasticizer, or the like.
又,於本發明中,上述丙烯酸系基材於不偏離本發明之主旨之範圍內亦可進行皂化處理、輝光放電處理、電暈放電處理、電漿處理、紫外線(UV)處理、及火焰處理等表面處理。 Further, in the present invention, the acrylic substrate may be subjected to saponification treatment, glow discharge treatment, corona discharge treatment, plasma treatment, ultraviolet (UV) treatment, and flame treatment without departing from the gist of the present invention. Wait for surface treatment.
<樹脂層> <Resin layer>
作為上述樹脂層,並無特別限定,例如較佳為含有一官能~三官能(甲基)丙烯酸酯、尤佳為含有二官能(甲基)丙烯酸酯之游離輻射硬化性樹脂組成物A之硬化物。於使用一官能或三官能(甲基)丙烯酸酯之情形,較佳為與二官能(甲基)丙烯酸酯混合使用。 The resin layer is not particularly limited, and for example, it is preferably a hardening of a free-radiation curable resin composition A containing a monofunctional to trifunctional (meth) acrylate, particularly preferably a difunctional (meth) acrylate. Things. In the case of using a monofunctional or trifunctional (meth) acrylate, it is preferably used in combination with a difunctional (meth) acrylate.
作為二官能(甲基)丙烯酸酯之具體例,可列舉:異三聚氰酸二(甲基)丙烯酸酯、聚伸烷二醇二(甲基)丙烯酸酯(polyalkylene glycol di(meth)acrylate)、或1,6-己二醇二(甲基)丙烯酸酯、1,9-壬二醇二(甲基)丙烯酸酯等。尤其是,二官能(甲基)丙烯酸酯中,就抑制由游離輻射硬化性樹脂組成物A引起之基材破斷、上述表面凹凸之控制較為容易之觀點而言,尤其是聚伸烷二醇二(甲基)丙烯酸酯最佳。 Specific examples of the difunctional (meth) acrylate include dialkyl (meth) acrylate and polyalkylene glycol di (meth) acrylate. Or 1,6-hexanediol di(meth)acrylate, 1,9-nonanediol di(meth)acrylate, or the like. In particular, in the difunctional (meth) acrylate, from the viewpoint of suppressing breakage of the substrate caused by the free radiation curable resin composition A and control of the surface unevenness, the polyalkylene glycol is particularly preferable. Di(meth)acrylate is the best.
又,作為聚伸烷二醇二(甲基)丙烯酸酯,可列舉:二乙二醇二(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、四乙二醇二(甲基)丙烯酸酯等聚乙二醇二(甲基)丙烯酸酯,二丙二醇二(甲基)丙烯酸酯等聚丙二醇二(甲基)丙烯酸酯,及二丁二醇二(甲基)丙烯酸酯、三丁二醇二(甲基)丙烯酸酯、四丁二醇 二(甲基)丙烯酸酯等聚丁二醇二(甲基)丙烯酸酯。 Further, examples of the polyalkylene glycol di(meth)acrylate include diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, and tetraethylene glycol di(meth)acrylate. Polyethylene glycol di(meth)acrylate such as acrylate, polypropylene glycol di(meth)acrylate such as dipropylene glycol di(meth)acrylate, and dibutylene glycol di(meth)acrylate, Tributyl diol di(meth) acrylate, tetrabutyl diol Polybutylene glycol di(meth)acrylate such as di(meth)acrylate.
此處,於本說明書中,所謂游離輻射硬化性樹脂組成物,表示電子束硬化性樹脂組成物及/或紫外線硬化性樹脂組成物。 In the present specification, the composition of the radiation curable resin is an electron beam curable resin composition and/or an ultraviolet curable resin composition.
再者,於本說明書中,所謂「(甲基)丙烯酸酯」係指甲基丙烯酸酯及丙烯酸酯。 In the present specification, the term "(meth)acrylate" means methacrylate and acrylate.
作為上述一官能(甲基)丙烯酸酯之具體例,可列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸己酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸苯酯、伸烷二醇單(甲基)丙烯酸酯(乙二醇單(甲基)丙烯酸酯、丙二醇單(甲基)丙烯酸酯、丁二醇單(甲基)丙烯酸酯等)或聚伸烷二醇單(甲基)丙烯酸酯(聚乙二醇單(甲基)丙烯酸酯、聚丙二醇單(甲基)丙烯酸酯、聚丁二醇單(甲基)丙烯酸酯等),較佳為伸烷二醇單(甲基)丙烯酸酯。 Specific examples of the monofunctional (meth) acrylate include methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, and hexyl (meth)acrylate. Cyclohexyl methacrylate, 2-ethylhexyl (meth) acrylate, phenyl (meth) acrylate, alkylene glycol mono (meth) acrylate (ethylene glycol mono (meth) acrylate , propylene glycol mono (meth) acrylate, butane diol mono (meth) acrylate, etc.) or polyalkylene glycol mono (meth) acrylate (polyethylene glycol mono (meth) acrylate, polypropylene glycol Mono (meth) acrylate, polybutylene glycol mono (meth) acrylate, etc.), preferably alkylene glycol mono (meth) acrylate.
作為上述三官能(甲基)丙烯酸酯之具體例,可列舉:異三聚氰酸三丙烯酸酯、聚伸烷二醇三(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯等。 Specific examples of the trifunctional (meth) acrylate include isomeric cyanuric acid triacrylate, polyalkylene glycol tri(meth) acrylate, and trimethylolpropane tri(meth)acrylic acid. Ester, pentaerythritol tri(meth)acrylate, and the like.
再者,上述一官能、二官能、三官能之各化合物之PEO(聚環氧乙烷)改質品、EO(環氧乙烷)改質品亦較佳。 Further, PEO (polyethylene oxide) modified products and EO (ethylene oxide) modified products of the above-mentioned monofunctional, difunctional and trifunctional compounds are also preferred.
於上述游離輻射硬化性樹脂組成物A含有二官能(甲基)丙烯酸酯與一官能(甲基)丙烯酸酯或三官能(甲基)丙烯酸酯之情形,較佳為二官能(甲基)丙烯酸酯之質量比大於一官能(甲基)丙烯酸酯及三官能(甲基)丙烯酸酯之合計質量比。 In the case where the above-mentioned free radiation curable resin composition A contains a difunctional (meth) acrylate and a monofunctional (meth) acrylate or a trifunctional (meth) acrylate, preferably a difunctional (meth) acrylate The mass ratio of the ester is greater than the total mass ratio of the monofunctional (meth) acrylate and the trifunctional (meth) acrylate.
上述游離輻射硬化性樹脂組成物A亦可進而含有一官能~三官能(甲基) 丙烯酸酯以外之光聚合性單體、光聚合性寡聚物、光聚合性聚合物等,於為紫外線硬化性樹脂組成物之情形含有起始劑。 The above-mentioned free-radiation curable resin composition A may further contain a monofunctional to trifunctional (methyl) group. The photopolymerizable monomer, the photopolymerizable oligomer, and the photopolymerizable polymer other than the acrylate include an initiator in the case of an ultraviolet curable resin composition.
(二官能(甲基)丙烯酸酯) (difunctional (meth) acrylate)
上述二官能(甲基)丙烯酸酯較佳為分子量為180~1000者,更佳為分子量為200~750者,尤佳為分子量為220~450者。若二官能(甲基)丙烯酸酯之分子量為上述範圍內,則可容易地獲得滿足上述基準長度30μm中稜線之長度、基準高度與基準深度之高低差、平均傾斜角θa者,且密接性或干涉條紋防止性優異。 The difunctional (meth) acrylate is preferably one having a molecular weight of from 180 to 1,000, more preferably from 200 to 750, and particularly preferably having a molecular weight of from 220 to 450. When the molecular weight of the difunctional (meth) acrylate is within the above range, the length of the ridge line in the reference length of 30 μm, the difference in height between the reference height and the reference depth, and the average inclination angle θa can be easily obtained, and the adhesion or Excellent interference fringe prevention.
游離輻射硬化性樹脂組成物A中之二官能(甲基)丙烯酸酯之調配量以固形物成分量計更佳為50~100質量%,尤佳為70~100質量%。於對二官能(甲基)丙烯酸酯併用一官能(甲基)丙烯酸酯及/或三官能(甲基)丙烯酸酯之情形,游離輻射硬化性樹脂組成物A中一官能(甲基)丙烯酸酯及/或三官能(甲基)丙烯酸酯之調配量較佳設為上述二官能(甲基)丙烯酸酯調配量之剩餘部分。 The amount of the difunctional (meth) acrylate in the composition of the free radiation curable resin composition A is more preferably from 50 to 100% by mass, particularly preferably from 70 to 100% by mass, based on the mass of the solid content. In the case of using a difunctional (meth) acrylate in combination with a monofunctional (meth) acrylate and/or a trifunctional (meth) acrylate, a monofunctional (meth) acrylate in the free radiation curable resin composition A The blending amount of the trifunctional (meth) acrylate is preferably set to the remainder of the above-mentioned difunctional (meth) acrylate blending amount.
再者,於樹脂層中添加有折射率調整材料或抗靜電材料等其他功能性成分之情形,推測如圖7所示般,功能性成分並非存在於樹脂層之下部而是偏靠密集於上部,因此後述之溶劑進行揮發動作之同時,溶解之丙烯酸系基材之材料成分會流出至樹脂層中而形成丙烯酸系基材-樹脂層界面之凹凸。再者,藉此於界面產生適度之凹凸,使密接性良好並且干涉條紋防止性亦良好,不僅如此,亦可良好地產生目標之功能(抗靜電性或高折射率性、低折射率性等),因此亦較佳。 Further, when a functional component such as a refractive index adjusting material or an antistatic material is added to the resin layer, it is presumed that as shown in FIG. 7, the functional component is not present in the lower portion of the resin layer but is densely concentrated on the upper portion. Therefore, the solvent to be described later is volatilized, and the material component of the dissolved acrylic substrate flows out into the resin layer to form irregularities at the interface of the acrylic substrate-resin layer. Further, by forming an appropriate unevenness at the interface, the adhesion is good and the interference fringe prevention property is also good, and the target function (antistatic property, high refractive index, low refractive index, etc.) can be favorably produced. ), so it is also better.
(光聚合性聚合物) (photopolymerizable polymer)
作為上述光聚合性聚合物,較佳為具有(甲基)丙烯醯基作為官能基者,較佳為官能基數為10~250個者,更佳為官能基數為10~100個者,進而較佳為官能基數為10~50個者。 The photopolymerizable polymer preferably has a (meth)acryl fluorenyl group as a functional group, and preferably has a functional group number of 10 to 250, more preferably 10 to 100 functional groups, and further Jia is a functional group of 10 to 50.
光聚合性聚合物之重量平均分子量較佳為10,000~100,000,更佳為12,000~40,000。 The weight average molecular weight of the photopolymerizable polymer is preferably from 10,000 to 100,000, more preferably from 12,000 to 40,000.
游離輻射硬化性樹脂組成物A中光聚合性聚合物之調配量以固形物成分量計較佳為0~40質量%,更佳為0~30質量%。 The amount of the photopolymerizable polymer in the composition of the radiation curable resin composition A is preferably from 0 to 40% by mass, more preferably from 0 to 30% by mass, based on the mass of the solid content.
(光聚合性寡聚物) (photopolymerizable oligomer)
作為上述光聚合性寡聚物,可使用2官能以上者,較佳為具有(甲基)丙烯醯基作為官能基者,較佳為官能基數為2~30個者,更佳為官能基數為2~20個者,進而較佳為官能基數為3~15個者。 As the photopolymerizable oligomer, a bifunctional or higher functional group may be used, and a (meth)acryl fluorenyl group is preferably used as the functional group, and the number of functional groups is preferably 2 to 30, and more preferably the number of functional groups is 2 to 20, and more preferably 3 to 15 functional groups.
光聚合性寡聚物之重量平均分子量較佳為1,000~10,000,更佳為1,500~10,000。 The weight average molecular weight of the photopolymerizable oligomer is preferably from 1,000 to 10,000, more preferably from 1,500 to 10,000.
游離輻射硬化性樹脂組成物A中光聚合性寡聚物之調配量以固形物成分量計較佳為0~40質量%,更佳為0~30質量%。 The amount of the photopolymerizable oligomer in the composition of the radiation curable resin composition A is preferably from 0 to 40% by mass, more preferably from 0 to 30% by mass, based on the mass of the solid content.
(一官能~三官能(甲基)丙烯酸酯以外之光聚合性單體) (Photopolymerizable monomer other than monofunctional to trifunctional (meth) acrylate)
作為上述光聚合性單體,可列舉具有(甲基)丙烯醯基之化合物等具有1個或2個以上不飽和鍵者。作為具有1個不飽和鍵之單官能單體,例如可列舉:苯乙烯、甲基苯乙烯、N-乙烯吡咯啶酮等。作為具有2個以上不飽和鍵之多官能單體,例如可列舉:新戊四醇四(甲基)丙烯酸酯、二新戊四醇六(甲基)丙烯酸酯、二新戊四醇五(甲基)丙烯酸酯等及經環氧乙烷(EO)等使該等改質之多官能化合物等。 Examples of the photopolymerizable monomer include one or two or more unsaturated bonds such as a compound having a (meth) acrylonitrile group. Examples of the monofunctional monomer having one unsaturated bond include styrene, methylstyrene, and N-vinylpyrrolidone. Examples of the polyfunctional monomer having two or more unsaturated bonds include pentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate, and dipentaerythritol five ( A methyl group acrylate or the like, and a polyfunctional compound modified by ethylene oxide (EO) or the like.
藉由使用單官能單體,而折射率調整變容易,且可形成折射率更高之樹脂層,另一方面,若使用多官能單體,則硬度良好。 By using a monofunctional monomer, the refractive index adjustment becomes easy, and a resin layer having a higher refractive index can be formed. On the other hand, when a polyfunctional monomer is used, the hardness is good.
上述光聚合性單體之分子量較佳為200~1,000,更佳為250~750。 The molecular weight of the photopolymerizable monomer is preferably from 200 to 1,000, more preferably from 250 to 750.
游離輻射硬化性樹脂組成物A中一官能~三官能(甲基)丙烯酸酯以外之光聚合性單體之調配量以固形物成分量計較佳為0~40質量%,更佳為0~30質量%。 The amount of the photopolymerizable monomer other than the monofunctional to trifunctional (meth) acrylate in the composition of the free radiation curable resin composition A is preferably from 0 to 40% by mass, more preferably from 0 to 30, based on the amount of the solid content component. quality%.
上述游離輻射硬化性樹脂組成物A較佳為進而含有溶劑。 The free radiation curable resin composition A preferably further contains a solvent.
該溶劑較佳為選擇使丙烯酸系基材適度膨潤者。其中,丙烯酸系基材與先前常用之TAC基材不同,能利用幾乎所有種類之溶劑進行膨潤。由此,受溶劑之影響較強,亦存在膨潤度過強而破裂之情形,因此選擇以下之溶劑,藉此,可使基材適度地膨潤,構成基材之樹脂成分與構成樹脂層之樹脂成分移動之平衡變適度,而可於界面獲得較佳之稜線。 Preferably, the solvent is selected such that the acrylic substrate is moderately swollen. Among them, the acrylic substrate is different from the conventional TAC substrate, and can be swollen with almost all kinds of solvents. Therefore, the influence of the solvent is strong, and the swelling degree is too strong and the film is broken. Therefore, the following solvent is selected, whereby the substrate can be appropriately swollen, and the resin component of the substrate and the resin constituting the resin layer can be formed. The balance of component movement becomes moderate, and a better ridgeline can be obtained at the interface.
進而,上述溶劑可根據使用之樹脂成分之種類及溶解性而選擇使用。作為上述溶劑,較佳為醇類(甲醇、乙醇、異丙醇、1-丁醇),其他各溶劑種類方面存在碳數更多者較為良好之傾向,其中存在蒸發速度較快者較為良好之傾向。例如,酮類可例示甲基異丁基酮,芳香族烴類可例示甲苯,二醇類可例示丙二醇單甲醚等,亦可為該等之混合溶劑。 Further, the solvent can be selected and used depending on the type and solubility of the resin component to be used. The solvent is preferably an alcohol (methanol, ethanol, isopropanol or 1-butanol), and the other solvent types tend to have a higher carbon number, and those having a faster evaporation rate are preferred. tendency. For example, the ketones are exemplified by methyl isobutyl ketone, the aromatic hydrocarbons are exemplified by toluene, the diols are propylene glycol monomethyl ether, and the like, and these may be mixed solvents.
於本發明中,尤其是出於與樹脂之相溶性、塗敷性優異,又於丙烯酸系基材-樹脂層界面形成本案之特殊凹凸形狀,進而加工時不出現基材斷開之不良情況等理由,尤佳為含有選自甲基異丁基酮、異丙醇及1-丁醇、丙二醇單甲醚中之一種以上者。若為該等溶劑,則丙烯酸系基材可無破裂而適度地膨潤。 In the present invention, in particular, the compatibility with the resin and the coating property are excellent, and the special uneven shape of the present invention is formed at the interface between the acrylic substrate and the resin layer, and the substrate is not broken during processing. For the reason, it is particularly preferable to contain one or more selected from the group consisting of methyl isobutyl ketone, isopropyl alcohol, 1-butanol, and propylene glycol monomethyl ether. When it is such a solvent, an acrylic base material can swell moderately without breaking.
相反地,酯類(乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸丁酯等)或酮類(丙酮、甲基乙基酮、環己酮、二丙酮醇)、賽路蘇類、醚類(二烷、四氫呋喃、丙二醇單甲醚乙酸酯等)、脂肪族烴類(己烷等)、芳香族烴類(二甲苯)、鹵代烴類(二氯甲烷、二氯乙烷等)、賽路蘇類(甲基賽路蘇、乙基賽路蘇等)、賽路蘇乙酸酯類、亞碸類(二甲基亞碸等)、醯胺類(二甲基甲醯胺、二甲基乙醯胺等)存在使丙烯酸系基材過度膨潤之情形,因此於對基材施加張力時,較佳為不使用。 Conversely, esters (methyl acetate, ethyl acetate, propyl acetate, butyl acetate, etc.) or ketones (acetone, methyl ethyl ketone, cyclohexanone, diacetone alcohol), 赛路苏, ether Class (two Alkane, tetrahydrofuran, propylene glycol monomethyl ether acetate, etc.), aliphatic hydrocarbons (hexane, etc.), aromatic hydrocarbons (xylene), halogenated hydrocarbons (dichloromethane, dichloroethane, etc.), race Lu Su (Methyl Cyrus, Ethyl Lucas, etc.), Cypress Acetate, Azadiracht (Dimethyl Azine, etc.), Amidoxime (Dimethylformamide, Dimethyl) Since the acrylamide base material is excessively swelled by the acetonitrile, it is preferable not to use when tension is applied to the base material.
上述游離輻射硬化性樹脂組成物A中,溶劑之含有比率並無特別限定,例如,關於上述較佳之溶劑,相對於游離輻射硬化性樹脂組成物A之固形物成分100質量份,較佳為30~300質量份,更佳為100~220質量份。若溶劑之含有比率為上述範圍以內,則可容易地獲得滿足上述基準長度30μm中之稜線之長度、基準高度與基準深度之高低差、平均傾斜角θa者。若相對於游離輻射硬化性樹脂組成物A之固形物成分100質量份而溶劑之含有比率為30質量份以上,則上述基準長度30μm中之稜線之長度、基準高度與基準深度之高低差、平均傾斜角θa增大,若相對於游離輻射硬化性樹脂組成物A之固形物成分100質量份而溶劑之含有比率為300質量份以下,則上述基準長度30μm中之稜線之長度、基準高度與基準深度之高低差、平均傾斜角θa減小。 In the above-mentioned free radiation curable resin composition A, the content ratio of the solvent is not particularly limited. For example, the preferred solvent is preferably 30 parts by mass based on 100 parts by mass of the solid content of the free radiation curable resin composition A. ~300 parts by mass, more preferably 100 to 220 parts by mass. When the content ratio of the solvent is within the above range, the length of the ridge line in the reference length of 30 μm, the height difference between the reference height and the reference depth, and the average inclination angle θa can be easily obtained. When the content ratio of the solvent is 100 parts by mass or more based on 100 parts by mass of the solid content component of the free radiation curable resin composition A, the length of the ridge line in the reference length of 30 μm, the height difference between the reference height and the reference depth, and the average value When the inclination ratio θa is increased, and the solvent content ratio is 300 parts by mass or less based on 100 parts by mass of the solid content component of the free radiation curable resin composition A, the length, the reference height, and the reference of the ridge line in the reference length of 30 μm. The depth difference and the average tilt angle θa are reduced.
本發明之光學積層體中之丙烯酸系基材-樹脂層界面具有山部及谷部之稜線,其係藉由將含有聚伸烷二醇二(甲基)丙烯酸酯等二官能(甲基)丙烯酸酯之游離輻射硬化性樹脂組成物A與上述較佳之溶劑組合而有效地獲得。例如,利用溶劑使丙烯酸系基材適度膨潤,伴隨於此,具有適當分子量之 二官能(甲基)丙烯酸酯等滲透至丙烯酸系基材。又,樹脂層之成分滲透至丙烯酸系基材時,相反地丙烯酸系基材之材料成分會被擠出至樹脂層方向,溶劑自丙烯酸系基材向樹脂層之空氣面方向揮發等,因此經膨潤之丙烯酸系基材之材料成分亦滲透至樹脂層中。可認為,各成分如上述般自上部向下部、自下部向上部動作,藉此於界面產生具有適度山部及谷部之稜線,使密接性良好並且干涉條紋防止性亦良好。該等稜線之構造或平均傾斜角可藉由較佳之樹脂層之成分或溶劑之種類、以及乾燥溫度之控制進行調整。 The acrylic substrate-resin layer interface in the optical layered body of the present invention has a ridge line of a mountain portion and a valley portion, which is obtained by containing a difunctional (meth) group such as a polyalkylene glycol di(meth)acrylate. The acrylate free radiation curable resin composition A is effectively obtained in combination with the above preferred solvent. For example, the acrylic substrate is moderately swollen by a solvent, and accordingly, it has an appropriate molecular weight. A difunctional (meth) acrylate or the like penetrates into the acrylic substrate. Further, when the component of the resin layer penetrates into the acrylic substrate, the material component of the acrylic substrate is extruded in the direction of the resin layer, and the solvent is volatilized from the acrylic substrate toward the air surface of the resin layer. The material component of the swollen acrylic substrate also penetrates into the resin layer. It is considered that each component moves from the upper portion to the lower portion and from the lower portion to the upper portion as described above, whereby ridge lines having appropriate mountain portions and valley portions are formed at the interface, and the adhesion is good and the interference fringe prevention property is also good. The configuration or average tilt angle of the ridge lines can be adjusted by controlling the composition of the resin layer or the kind of the solvent and the drying temperature.
為了本發明之光學積層體之丙烯酸系基材-樹脂層界面形成上述特定之稜線結構,作為較佳之製造方法之1例而存在如下方法:(第一步驟)將以聚伸烷二醇二(甲基)丙烯酸酯等二官能二(甲基)丙烯酸酯為主成分、及含有溶劑之游離輻射硬化性樹脂組成物A塗佈於丙烯酸系基材,(第二步驟)藉由游離輻射硬化性樹脂組成物A中之溶劑、單體等使丙烯酸系基材膨潤,(第三步驟)一面以適當之乾燥溫度使溶劑乾燥一面使丙烯酸系基材膨潤,同時藉由丙烯酸系基材之材料成分與游離輻射硬化性樹脂組成物A之成分相互移動而於丙烯酸系基材/樹脂層界面形成凹凸狀之最佳稜線,(第四步驟)有照射游離輻射使游離輻射硬化性樹脂組成物A硬化而形成樹脂層的方法,但只要為製造上述特定稜線之條件,則光學積層體之製造方法並不 限定於此。 In order to form the above-described specific ridgeline structure at the interface of the acrylic substrate-resin layer of the optical layered body of the present invention, as one example of a preferable production method, there is the following method: (first step) will be a polyalkylene glycol di A difunctional di(meth)acrylate such as methyl acrylate is used as a main component, and a free radiation curable resin composition A containing a solvent is applied to an acrylic substrate, and (second step) is cured by free radiation. The solvent, the monomer, and the like in the resin composition A swell the acrylic substrate, and (in the third step), while drying the solvent at an appropriate drying temperature, the acrylic substrate is swollen while the material component of the acrylic substrate is used. It is preferable to move the component of the radical radiation curable resin composition A to form an uneven ridge line at the interface of the acrylic base material/resin layer, and (the fourth step) irradiate the free radiation to harden the free radiation curable resin composition A. However, the method of forming the resin layer is not a method for producing the above specific ridge line, and the method of manufacturing the optical layered body is not Limited to this.
於樹脂層中添加有折射率調整材料或抗靜電材料等其他功能性成分之情形,可藉由該丙烯酸系基材之材料成分之逆流而使功能性成分偏靠分佈於樹脂層之上部,各功能成分密集於光學積層體之表面側,因此可良好地產生目標之功能(抗靜電性或高折射率性、低折射率性等),因此較佳。 When a functional component such as a refractive index adjusting material or an antistatic material is added to the resin layer, the functional component may be distributed over the upper portion of the resin layer by the reverse flow of the material component of the acrylic substrate. Since the functional component is densely concentrated on the surface side of the optical layered body, the function of the target (antistatic property, high refractive index, low refractive index, etc.) can be favorably produced, which is preferable.
上述游離輻射硬化性樹脂組成物A亦可進而含有溶劑乾燥型樹脂。藉由併用溶劑乾燥型樹脂,可有效地防止塗佈面之被膜缺陷。再者,上述所謂溶劑乾燥型樹脂,係指熱塑性樹脂等塗敷時僅為了調整固形物成分所添加之溶劑乾燥而形成被膜之樹脂。 The free-radiation curable resin composition A may further contain a solvent-drying resin. By using a solvent-drying type resin in combination, it is possible to effectively prevent film defects on the coated surface. In addition, the above-mentioned solvent-drying type resin refers to a resin which forms a film only by drying a solvent added by adjusting a solid content component when a thermoplastic resin or the like is applied.
作為上述溶劑乾燥型樹脂,並無特別限定,通常可使用熱塑性樹脂。 The solvent-drying type resin is not particularly limited, and a thermoplastic resin can be usually used.
作為上述熱塑性樹脂,並無特別限定,例如可列舉:苯乙烯系樹脂、(甲基)丙烯酸系樹脂、乙酸乙烯酯系樹脂、乙烯醚系樹脂、含鹵素之樹脂、脂環式烯烴系樹脂、聚碳酸酯系樹脂、聚酯系樹脂、聚醯胺系樹脂、纖維素衍生物、聚矽氧系樹脂及橡膠或彈性體等。上述熱塑性樹脂較佳為非結晶性、且可溶於有機溶劑(尤其是可溶解複數種聚合物或硬化性化合物之共用溶劑)。尤其是,就製膜性、透明性或耐候性之觀點而言,較佳為苯乙烯系樹脂、(甲基)丙烯酸系樹脂、脂環式烯烴系樹脂、聚酯系樹脂、纖維素衍生物(纖維素酯類等)等。 The thermoplastic resin is not particularly limited, and examples thereof include a styrene resin, a (meth)acrylic resin, a vinyl acetate resin, a vinyl ether resin, a halogen-containing resin, and an alicyclic olefin resin. A polycarbonate resin, a polyester resin, a polyamide resin, a cellulose derivative, a polyoxyn resin, a rubber or an elastomer. The above thermoplastic resin is preferably amorphous and soluble in an organic solvent (particularly a common solvent which can dissolve a plurality of polymers or curable compounds). In particular, a styrene resin, a (meth)acrylic resin, an alicyclic olefin resin, a polyester resin, or a cellulose derivative is preferred from the viewpoint of film formability, transparency, and weather resistance. (cellulose esters, etc.) and the like.
作為上述起始劑,並無特別限定,可使用公知者,例如,作為光聚合起始劑,具體例可列舉:苯乙酮類、二苯基酮類、米希勒苯醯苯甲酸酯(Michler-benzoyl benzoate)、α-澱粉肟酯(α-amyloxim ester)、噻噸酮類、苯丙酮類、苯偶醯(benzil)類、安息香(benzoyl)類、醯基氧化 膦(acylphosphine oxide)類。又,較佳為混合光敏劑而使用,作為其具體例,例如可列舉:正丁基胺、三乙基胺、聚正丁基膦等。 The above-mentioned initiator is not particularly limited, and a known one can be used, for example, as a photopolymerization initiator. Specific examples thereof include acetophenones, diphenylketones, and Michler benzophenone benzoate. (Michler-benzoyl benzoate), α-amyloxim ester, thioxanthone, propiophenone, benzil, benzoyl, sulfhydryl oxidation Acylphosphine oxides. Further, it is preferably used by mixing a photosensitizer, and specific examples thereof include n-butylamine, triethylamine, and poly-n-butylphosphine.
作為上述光聚合起始劑,於上述光聚合性單體/寡聚物/聚合物為具有自由基聚合性不飽和基之樹脂系之情形,較佳為將苯乙酮類、二苯基酮類、噻噸酮類、安息香、安息香甲基醚等單獨或混合使用,1-羥基環己基苯基酮由於與游離輻射硬化型樹脂之相溶性、及黃變亦較少之理由,故而尤佳。又,於上述光聚合性單體/寡聚物/聚合物具有陽離子聚合性官能基之情形,作為上述光聚合起始劑,較佳為將芳香族重氮鎓鹽、芳香族鋶鹽、芳香族錪鹽、茂金屬化合物、安息香磺酸酯等單獨或製成混合物而使用。 In the case where the photopolymerizable monomer/oligomer/polymer is a resin having a radical polymerizable unsaturated group, the photopolymerization initiator is preferably a acetophenone or a diphenyl ketone. Separately or in combination, such as thioxanthone, benzoin, and benzoin methyl ether, 1-hydroxycyclohexyl phenyl ketone is preferred because it is compatible with free radiation-curable resin and has less yellowing. . Further, in the case where the photopolymerizable monomer/oligomer/polymer has a cationically polymerizable functional group, the photo-polymerization initiator is preferably an aromatic diazonium salt, an aromatic sulfonium salt or a fragrance. The cerium salt, the metallocene compound, the benzoin sulfonate or the like is used singly or as a mixture.
上述紫外線硬化性樹脂組成物中,上述起始劑之含量較佳為相對於上述光聚合性單體、光聚合性寡聚物及光聚合性聚合物之合計量100質量份為1~10質量份。若起始劑之含量為1質量份以上,則就光學積層體之樹脂層之硬度之觀點而言較佳,若為10質量份以下,則可抑制由起始劑過度殘留而導致之樹脂劣化並且可防止成本提高,獲得目標之樹脂層或後述硬塗層之表面的鉛筆硬度。 In the ultraviolet curable resin composition, the content of the above-mentioned initiator is preferably 1 to 10 by mass based on 100 parts by mass of the total of the photopolymerizable monomer, the photopolymerizable oligomer, and the photopolymerizable polymer. Share. When the content of the initiator is 1 part by mass or more, it is preferably from the viewpoint of the hardness of the resin layer of the optical layered product, and when it is 10 parts by mass or less, deterioration of the resin due to excessive residue of the initiator can be suppressed. Further, it is possible to prevent an increase in cost and obtain a pencil hardness of the target resin layer or the surface of the hard coat layer described later.
上述起始劑之含量之更佳下限係相對於上述光聚合性單體、光聚合性寡聚物及光聚合性聚合物之合計量100質量份為2質量份,更佳之上限為8質量份。藉由上述起始劑之含量為該範圍,而使上述硬化更確實。 The lower limit of the content of the above-mentioned initiator is 2 parts by mass, and more preferably 8 parts by mass, based on 100 parts by mass of the total of the photopolymerizable monomer, the photopolymerizable oligomer, and the photopolymerizable polymer. . The above hardening is more sure by the content of the above-mentioned initiator.
藉由使上述游離輻射硬化性樹脂組成物A中含有功能性成分,而可進而對樹脂層賦予功能。 By including the functional component in the above-mentioned free radiation curable resin composition A, the resin layer can be further functionalized.
作為功能性成分,可列舉:抗靜電劑、折射率調整劑、防污劑、滑澤 劑、防眩劑、硬塗性賦予劑等通常之光學片材所使用者。 Examples of the functional component include an antistatic agent, a refractive index adjuster, an antifouling agent, and a slippery A user of a usual optical sheet such as a agent, an anti-glare agent, or a hard coat imparting agent.
上述游離輻射硬化性樹脂組成物A亦可含有抗靜電劑。 The above-mentioned free radiation curable resin composition A may also contain an antistatic agent.
作為抗靜電劑,較佳為有機系者,更具體而言,可列舉:鋰離子鹽、四級銨鹽、離子性液體等離子性者,或聚噻吩、聚苯胺、聚吡咯、聚乙炔等電子導電性者。 The antistatic agent is preferably an organic one, and more specifically, an ion such as a lithium ion salt, a quaternary ammonium salt or an ionic liquid, or an electron such as polythiophene, polyaniline, polypyrrole or polyacetylene. Conductive.
進而,上述游離輻射硬化性樹脂組成物A亦可含有氟、聚矽氧等防污劑。 Further, the free radiation curable resin composition A may contain an antifouling agent such as fluorine or polyfluorene.
於使用上述功能性成分之情形,其含量較佳為相對於游離輻射硬化性樹脂組成物A中之總固形物成分之合計質量為1~30質量%。 In the case of using the above functional component, the content thereof is preferably from 1 to 30% by mass based on the total mass of the total solid content in the free radiation curable resin composition A.
再者,本發明之光學積層體於使用含有抗靜電劑之游離輻射硬化性樹脂組成物A形成樹脂層之情形(即,樹脂層含有抗靜電劑之情形),藉由與上述二官能(甲基)丙烯酸酯之組合,且由於上述理由,而抗靜電劑偏在於樹脂層之上表面,因此進而提高抗靜電性能。又,於使用含有二氧化矽、氧化鋁等超微粒子作為硬塗性賦予劑之游離輻射硬化性樹脂組成物A而形成樹脂層之情形(即,樹脂層含有硬塗性賦予劑之情形),藉由與上述聚伸烷二醇二(甲基)丙烯酸酯之組合,且由於上述理由,而硬塗性賦予劑偏在於樹脂層之上表面,因此進而提高硬塗性能。 Furthermore, the optical laminate of the present invention is formed by using a free radiation curable resin composition A containing an antistatic agent to form a resin layer (that is, a case where the resin layer contains an antistatic agent), by the above-mentioned difunctional (A) The combination of acrylates, and for the above reasons, the antistatic agent is biased on the upper surface of the resin layer, thereby further improving the antistatic property. In addition, when a resin layer is formed by using the free radiation curable resin composition A containing ultrafine particles such as ceria or alumina as a hard coatability imparting agent (that is, when the resin layer contains a hard coat imparting agent), By the combination with the above-mentioned polyalkylene glycol di(meth)acrylate, and for the above reasons, the hard coat property imparting agent is biased on the upper surface of the resin layer, thereby further improving the hard coat performance.
作為上述游離輻射硬化性樹脂組成物A之製備方法,只要可使各成分均勻地混合則並無特別限定,例如可使用塗料振盪機、珠磨機、捏合機、攪拌機等公知之裝置進行。 The method for producing the above-mentioned free radiation curable resin composition A is not particularly limited as long as the components can be uniformly mixed, and can be, for example, a known apparatus such as a paint shaker, a bead mill, a kneader or a stirrer.
又,作為將上述游離輻射硬化性樹脂組成物A塗佈於上述丙烯酸系基材上之方法,並無特別限定,例如可列舉旋轉塗佈法、浸漬法、 噴霧法、模具塗佈法、棒式塗佈法、凹版塗佈法、輥式塗佈法、液面彎曲式塗佈法(meniscus coater method)、軟版印刷法、網版印刷法、液滴塗佈(bead coater)等公知之方法。 In addition, the method of applying the above-mentioned free radiation curable resin composition A to the above acrylic substrate is not particularly limited, and examples thereof include a spin coating method and a dipping method. Spray method, die coating method, bar coating method, gravure coating method, roll coating method, meniscus coater method, soft printing method, screen printing method, droplet A known method such as a bead coater.
於上述丙烯酸系基材上塗佈上述游離輻射硬化性樹脂組成物A而形成之塗膜係較佳為根據需要進行加熱及/或乾燥,並藉由活性能量射線照射等使之硬化。 The coating film formed by applying the above-mentioned free radiation curable resin composition A to the acrylic substrate is preferably heated and/or dried as necessary, and is cured by irradiation with an active energy ray or the like.
乾燥步驟中,乾燥時間較佳為20秒~2分鐘,更佳為30秒~1分鐘。又,乾燥步驟中,乾燥溫度較佳為40~90℃,更佳為50~80℃。若乾燥溫度超過100℃,則即便選擇對丙烯酸之膨潤性較佳之溶劑,亦存在溶劑之滲透力等提昇而基材破裂之情形,因此,乾燥溫度較佳為於使用任何溶劑之情況下基本皆為90℃以下。例如,作為較佳之溶劑有甲基異丁基酮,即便為該溶劑,若乾燥溫度為100℃而於施加張力之情形,有丙烯酸系基材斷開之情況。 In the drying step, the drying time is preferably from 20 seconds to 2 minutes, more preferably from 30 seconds to 1 minute. Further, in the drying step, the drying temperature is preferably from 40 to 90 ° C, more preferably from 50 to 80 ° C. When the drying temperature exceeds 100 ° C, even if a solvent having a preferred swelling property against acrylic acid is selected, there is a case where the penetration of the solvent is increased and the substrate is broken. Therefore, the drying temperature is preferably such that any solvent is used. It is below 90 °C. For example, a preferred solvent is methyl isobutyl ketone. Even in the case of this solvent, when the drying temperature is 100 ° C and the tension is applied, the acrylic substrate may be broken.
最低溫度係只要溶劑可乾燥之程度即可,較佳為50℃以上。例如,為甲基異丁基酮且乾燥溫度為30℃之情形,乾燥不充分而直接以紫外線等進行硬化,則該情形硬化進行會不順利,亦產生未硬化部分。此時,存在密接性降低之情況。 The minimum temperature is preferably as long as the solvent can be dried, and is preferably 50 ° C or higher. For example, in the case of methyl isobutyl ketone and the drying temperature is 30 ° C, if the drying is insufficient and the curing is performed directly by ultraviolet rays or the like, the hardening proceeds in this case, and an unhardened portion is also produced. At this time, there is a case where the adhesion is lowered.
作為上述活性能量射線照射,可列舉紫外線或電子束之照射。 Examples of the active energy ray irradiation include irradiation with ultraviolet rays or electron beams.
作為上述紫外線照射之紫外線源之具體例,例如可列舉:超高壓水銀燈、高壓水銀燈、低壓水銀燈、碳弧燈、黑光螢光燈、金屬鹵化物燈等光源。又,作為紫外線之波長,可使用190~380nm之波長區域。 Specific examples of the ultraviolet light source to be irradiated with ultraviolet rays include light sources such as an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a low pressure mercury lamp, a carbon arc lamp, a black fluorescent lamp, and a metal halide lamp. Further, as the wavelength of the ultraviolet light, a wavelength region of 190 to 380 nm can be used.
作為上述電子束照射之電子束源之具體例,可列舉:柯克勞夫-沃耳吞(Cockcroft Walton)型、範德格拉夫(Van de Graaff)型、共振變壓器型、絕緣心變壓器型、或直線型、地那米(dynamitron)型、高頻型等各種電子束加速器。 Specific examples of the electron beam source to be irradiated by the electron beam include a Cockcroft Walton type, a Van de Graaff type, a resonant transformer type, and an insulated core transformer type. Or various electron beam accelerators such as linear type, dynamitron type, and high frequency type.
再者,上述樹脂層之較佳膜厚(硬化時)為0.5~100μm,更佳為0.8~20μm;更為容易於丙烯酸系基材/樹脂層界面形成凹凸狀之最佳稜線,又,捲曲防止性或裂痕防止性尤其優異,故最佳為3.5~13μm之範圍。 Further, the film thickness of the resin layer (at the time of curing) is preferably 0.5 to 100 μm, more preferably 0.8 to 20 μm; it is easier to form an uneven ridge line at the interface of the acrylic substrate/resin layer, and curling The prevention property or the crack prevention property is particularly excellent, so it is preferably in the range of 3.5 to 13 μm.
又,為了提高密接性,樹脂層之膜厚較佳為0.8μm以上且未達3μm。樹脂層之膜厚為0.8μm亦是為了形成凹凸狀之最佳稜線所需要之最低限膜厚。樹脂層之膜厚為0.8μm以上且未達3μm之情形,上述基準高度與基準深度之高低差較佳為0.3~1.5μm。 Further, in order to improve the adhesion, the film thickness of the resin layer is preferably 0.8 μm or more and less than 3 μm. The film thickness of the resin layer is 0.8 μm, which is also the minimum film thickness required for forming the optimum ridge line of the uneven shape. When the film thickness of the resin layer is 0.8 μm or more and less than 3 μm, the difference between the reference height and the reference depth is preferably 0.3 to 1.5 μm.
再者,上述高低差無論於樹脂層之膜厚取任何值之情形,均設為滿足樹脂層膜厚>高低差之關係。 In addition, the height difference is set to satisfy the relationship between the film thickness of the resin layer and the height difference regardless of the film thickness of the resin layer.
上述樹脂層之膜厚係利用電子顯微鏡(SEM、TEM、STEM)觀察剖面並測定任意10處而得之平均值(μm)。 The film thickness of the resin layer was observed by an electron microscope (SEM, TEM, STEM), and the average value (μm) obtained by measuring any 10 points was measured.
又,本發明之光學積層體亦可於上述樹脂層上直接具有選自低折射率層、硬塗層、防污層、防眩層、抗靜電層、及高折射率層中之1者以上。 Further, the optical layered body of the present invention may directly have one or more selected from the group consisting of a low refractive index layer, a hard coat layer, an antifouling layer, an antiglare layer, an antistatic layer, and a high refractive index layer on the resin layer. .
<硬塗層> <hard coating>
硬塗層較佳為由游離輻射硬化性樹脂組成物B之硬化物構成。 The hard coat layer is preferably composed of a cured product of the free radiation curable resin composition B.
硬塗層係其硬度於JIS K5600-5-4(1999)之鉛筆硬度試驗(荷重4.9N) 中較佳為H以上,更佳為2H以上。又,上述硬塗層亦可為含有功能性成分者。 Hard coating is a pencil hardness test (load 4.9N) with hardness of JIS K5600-5-4 (1999) It is preferably H or more, more preferably 2H or more. Further, the hard coat layer may be a functional component.
形成硬塗層之游離輻射硬化性樹脂組成物B之詳細情況係除了以二官能(甲基)丙烯酸酯為必需成分以外,與上述游離輻射硬化性樹脂組成物A相同。 The details of the free-radiation-curable resin composition B forming the hard coat layer are the same as those of the above-mentioned free-radiation curable resin composition A except that a difunctional (meth) acrylate is an essential component.
又,游離輻射硬化性樹脂組成物B中,光聚合性單體(尤其是多官能單體)之調配量較佳為30~100質量%,更佳為40~90質量%,進而較佳為50~80質量%。此時,游離輻射硬化性樹脂組成物B之剩餘部分較佳設為光聚合性寡聚物及光聚合性聚合物之至少一者。 Further, in the composition of the radiation curable resin composition B, the amount of the photopolymerizable monomer (especially a polyfunctional monomer) is preferably from 30 to 100% by mass, more preferably from 40 to 90% by mass, still more preferably 50~80% by mass. In this case, the remaining portion of the free radiation curable resin composition B is preferably at least one of a photopolymerizable oligomer and a photopolymerizable polymer.
又,硬塗層之形成方法與上述樹脂層相同。其他硬塗層之詳細情況亦與上述樹脂層相同。 Further, the method of forming the hard coat layer is the same as that of the above resin layer. The details of the other hard coat layers are also the same as those of the above resin layer.
於本發明中,較佳為於樹脂層之上積層硬塗層。為了獲得作為光學積層體之硬度,可考慮使樹脂層本身成為高硬度。然而,於在丙烯酸系基材之上直接、即於樹脂層使用具有多官能之反應性官能基之材料形成2H以上之高硬度的情形,具有於對硬塗層進行部分施壓之情形等而丙烯酸系基材容易破裂之缺點。因此,於本發明之光學積層體中,樹脂層處於丙烯酸系基材與硬塗層之間,因此,硬塗層之衝擊並不直接傳遞至丙烯酸系基材,具有緩衝作用,較佳。又,藉由形成樹脂層/硬塗層之結構,與僅僅積層硬塗層之情形相比,亦可提高硬度。 In the present invention, it is preferred to laminate a hard coat layer over the resin layer. In order to obtain the hardness as an optical laminate, it is conceivable to make the resin layer itself high in hardness. However, when a high hardness of 2H or more is formed directly on the acrylic substrate, that is, a material having a polyfunctional reactive functional group in the resin layer, a partial pressure is applied to the hard coat layer, and the like. The acrylic substrate is susceptible to cracking. Therefore, in the optical laminate of the present invention, since the resin layer is between the acrylic substrate and the hard coat layer, the impact of the hard coat layer is not directly transmitted to the acrylic substrate, and it has a buffering effect. Further, by forming the structure of the resin layer/hard coat layer, the hardness can be improved as compared with the case of merely laminating the hard coat layer.
但,於積層硬塗層等之情形,其與樹脂層之間形成新界面,即增加了會產生干涉條紋之部分。該情形時,較重要為積層之層之折射率儘可能接近其下方之層。因此,為了良好地維持干涉條紋防止性,硬塗層之折射率 較佳為與樹脂層之折射率大致相同,較佳之折射率差為0.03以下。 However, in the case of a laminated hard coat layer or the like, a new interface is formed with the resin layer, that is, a portion where interference fringes are generated is increased. In this case, it is more important that the refractive index of the layer of the laminate is as close as possible to the layer below it. Therefore, in order to maintain the interference fringe prevention property well, the refractive index of the hard coat layer It is preferably substantially the same as the refractive index of the resin layer, and preferably has a refractive index difference of 0.03 or less.
硬塗層之膜厚較佳為1~20μm,更佳為3.5~13μm。 The film thickness of the hard coat layer is preferably from 1 to 20 μm, more preferably from 3.5 to 13 μm.
<低折射率層> <low refractive index layer>
本發明之光學積層體較佳為於上述硬塗層上進而具有低折射率層。 The optical layered body of the present invention preferably has a low refractive index layer on the above hard coat layer.
作為上述低折射率層,較佳為使用含有如下材料之低折射率層形成用組成物而形成:1)含有二氧化矽或氟化鎂等低折射率無機微粒子之樹脂、2)為低折射率樹脂之氟系樹脂、3)含有二氧化矽或氟化鎂等低折射率無機微粒子之氟系樹脂、4)二氧化矽或氟化鎂等低折射率無機薄膜等中之任一者。關於氟系樹脂以外之樹脂,可使用與上述丙烯酸系樹脂同樣之樹脂。 The low refractive index layer is preferably formed by using a composition for forming a low refractive index layer containing 1) a resin containing low refractive index inorganic fine particles such as cerium oxide or magnesium fluoride, and 2) low refractive index. The resin is a fluorine-based resin of a resin, 3) a fluorine-based resin containing low-refractive-index inorganic fine particles such as cerium oxide or magnesium fluoride, and 4) a low refractive index inorganic thin film such as cerium oxide or magnesium fluoride. As the resin other than the fluorine-based resin, the same resin as the above-mentioned acrylic resin can be used.
又,上述二氧化矽較佳為中空二氧化矽微粒子,上述中空二氧化矽微粒子例如可利用日本特開2005-099778號公報之實施例中記載之製造方法進行製作。 Further, the above-mentioned cerium oxide is preferably hollow cerium oxide fine particles, and the hollow cerium oxide fine particles can be produced, for example, by the production method described in the examples of JP-A-2005-099778.
該等低折射率層係其折射率較佳為1.47以下,尤佳為1.42以下。又,低折射率層之厚度並無限定,通常自10nm~1μm左右之範圍內設當設定即可。 The refractive index of the low refractive index layer is preferably 1.47 or less, and particularly preferably 1.42 or less. Further, the thickness of the low refractive index layer is not limited, and it is usually set in the range of about 10 nm to 1 μm.
作為上述氟系樹脂,可使用至少分子中含有氟原子之聚合性化合物或其聚合物。作為聚合性化合物,並無特別限定,例如較佳為具有經游離輻射進行硬化之官能基、進行熱硬化之極性基等硬化反應性基者。又,亦可為同時一併具有該等反應性基之化合物。相對於該聚合性化合物,所謂聚合物,為一概不具有如上所述之反應性基等者。 As the fluorine-based resin, a polymerizable compound containing at least a fluorine atom in a molecule or a polymer thereof can be used. The polymerizable compound is not particularly limited, and for example, a hardening reactive group such as a functional group which is cured by free radiation and a polar group which is thermally cured is preferably used. Further, it may be a compound having such reactive groups at the same time. The polymer is not a reactive group as described above with respect to the polymerizable compound.
作為具有上述利用游離輻射進行硬化之官能基的聚合性化合物,可廣泛使用具有乙烯性不飽和鍵之含氟單體。更具體而言,可例示: 氟烯烴(fluoroolefin)類(例如,氟乙烯、偏二氟乙烯、四氟乙烯、六氟丙烯、全氟丁二烯、全氟-2,2-二甲基-1,3-二唑(perfluoro-2,2-dimethyl-1,3-dioxol)等)。作為具有(甲基)丙烯醯氧基者,存在:(甲基)丙烯酸2,2,2-三氟乙酯、(甲基)丙烯酸2,2,3,3,3-五氟丙酯、(甲基)丙烯酸2-(全氟丁基)乙酯、(甲基)丙烯酸2-(全氟己基)乙酯、(甲基)丙烯酸2-(全氟辛基)乙酯、(甲基)丙烯酸2-(全氟癸基)乙酯、α-三氟甲基丙烯酸甲酯、α-三氟甲基丙烯酸乙酯等分子中具有氟原子之(甲基)丙烯酸酯化合物;分子中包含具有至少3個氟原子之碳數1~14之氟烷基、氟環烷基或氟伸烷基及至少2個(甲基)丙烯醯氧基的含氟多官能(甲基)丙烯酸酯化合物等。 As the polymerizable compound having the functional group which is hardened by the above-mentioned free radiation, a fluorine-containing monomer having an ethylenically unsaturated bond can be widely used. More specifically, fluoroolefins (for example, vinyl fluoride, vinylidene fluoride, tetrafluoroethylene, hexafluoropropylene, perfluorobutadiene, perfluoro-2,2-dimethyl-) can be exemplified. 1,3-two Oral (perfluoro-2,2-dimethyl-1,3-dioxol), etc.). As the (meth) propylene oxime group, there are: 2,2,2-trifluoroethyl (meth)acrylate, 2,2,3,3,3-pentafluoropropyl (meth)acrylate, 2-(perfluorobutyl)ethyl (meth)acrylate, 2-(perfluorohexyl)ethyl (meth)acrylate, 2-(perfluorooctyl)ethyl (meth)acrylate, (methyl) a (meth) acrylate compound having a fluorine atom in a molecule such as 2-(perfluorodecyl)ethyl acrylate, α-trifluoromethyl methacrylate or α-trifluoromethyl acrylate; Fluorinated polyfunctional (meth) acrylate compound having at least 3 fluorine atoms and having a fluoroalkyl group having 1 to 14 carbon atoms, a fluorocycloalkyl group or a fluoroalkylene group, and at least 2 (meth) propylene fluorenyloxy groups Wait.
作為上述進行熱硬化之極性基之較佳者,例如為羥基、羧基、胺基、環氧基等氫鍵形成基。該等不僅與塗膜之密接性優異,與二氧化矽等無機超微粒子之親和性亦優異。作為具有熱硬化性極性基之聚合性化合物,例如可列舉:4-氟乙烯-全氟烷基乙烯醚共聚物;氟乙烯-烴系乙烯醚共聚物;環氧樹脂、聚胺基甲酸酯、纖維素、酚類、聚醯亞胺等各樹脂之氟改質品等。 The preferred one of the polar groups to be thermally cured is, for example, a hydrogen bond forming group such as a hydroxyl group, a carboxyl group, an amine group or an epoxy group. These are excellent not only in adhesion to a coating film, but also in affinity with inorganic ultrafine particles such as cerium oxide. Examples of the polymerizable compound having a thermosetting polar group include a 4-fluoroethylene-perfluoroalkyl vinyl ether copolymer; a vinyl fluoride-hydrocarbon vinyl ether copolymer; an epoxy resin and a polyurethane. Fluorine-modified products of various resins such as cellulose, phenols, and polyimine.
作為一併具有上述經游離輻射進行硬化之官能基與進行熱硬化之極性基的聚合性化合物,可例示:丙烯酸或甲基丙烯酸之部分及完全氟化烷基、烯基、芳基酯類、完全或部分氟化乙烯醚類、完全或部分氟化乙烯酯類、完全或部分氟化乙烯酮類等。 The polymerizable compound having the above-mentioned functional group which is hardened by free radiation and the polar group which is thermally hardened may, for example, be a part of acrylic acid or methacrylic acid and a completely fluorinated alkyl group, an alkenyl group, an aryl ester group, Full or partial fluorinated vinyl ethers, fully or partially fluorinated vinyl esters, fully or partially fluorinated ketenes, and the like.
又,作為氟系樹脂,例如可列舉如下者。 Further, examples of the fluorine-based resin include the following.
含有至少1種具有上述游離輻射硬化性基之聚合性化合物之含氟(甲基)丙烯酸酯化合物的單體或單體混合物之聚合物;上述含氟(甲基)丙烯酸酯化 合物之至少1種、與如(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-乙基己酯之分子中不含氟原子之(甲基)丙烯酸酯化合物的共聚物;氟乙烯、偏二氟乙烯、三氟乙烯、氯三氟乙烯、3,3,3-三氟丙烯、1,1,2-三氯-3,3,3-三氟丙烯、六氟丙烯等含氟單體之均聚物或共聚物等。亦可使用使該等共聚物含有聚矽氧成分而成之含聚矽氧之偏二氟乙烯共聚物。作為該情形之聚矽氧成分,可例示:(聚)二甲基矽氧烷、(聚)二乙基矽氧烷、(聚)二苯基矽氧烷、(聚)甲基苯基矽氧烷、烷基改質(聚)二甲基矽氧烷、含偶氮基之(聚)二甲基矽氧烷、二甲基聚矽氧、苯基甲基聚矽氧、烷基改質聚矽氧、芳烷基改質聚矽氧、氟聚矽氧、聚醚改質聚矽氧、脂肪酸酯改質聚矽氧、甲基氫聚矽氧、含矽醇基之聚矽氧、含烷氧基之聚矽氧、含酚基之聚矽氧、甲基丙烯酸改質聚矽氧、丙烯酸改質聚矽氧、胺基改質聚矽氧、羧酸改質聚矽氧、甲醇改質聚矽氧、環氧改質聚矽氧、巰基改質聚矽氧、氟改質聚矽氧、聚醚改質聚矽氧等。其中,較佳為具有二甲基矽氧烷結構者。 a polymer of a monomer or a monomer mixture containing at least one fluorine-containing (meth) acrylate compound having a polymerizable compound of the above-mentioned free radiation curable group; the above fluorine-containing (meth) acrylate At least one of the complexes, such as methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, butyl (meth)acrylate, 2-ethyl (meth)acrylate a copolymer of a (meth) acrylate compound having no fluorine atom in the molecule of hexyl ester; vinyl fluoride, vinylidene fluoride, trifluoroethylene, chlorotrifluoroethylene, 3,3,3-trifluoropropene, 1, A homopolymer or copolymer of a fluorine-containing monomer such as 1,2-trichloro-3,3,3-trifluoropropene or hexafluoropropylene. A polyfluorene-containing vinylidene fluoride copolymer obtained by including a polyfluorene oxide component in the copolymer may also be used. As the polyoxymethylene component in this case, (poly)dimethyloxane, (poly)dimethoxydecane, (poly)diphenyloxirane, (poly)methylphenylhydrazine can be exemplified. Oxyalkane, alkyl modified (poly)dimethyloxane, azo-containing (poly)dimethyloxane, dimethylpolyfluorene, phenylmethylpolyoxyl, alkyl Poly-oxygen, aralkyl modified poly-oxygen, fluoropolyoxygen, polyether modified poly-oxygen, fatty acid ester modified polyoxyl, methyl hydrogen polyoxyl, sterol-containing polyfluorene Oxygen, alkoxy-containing polyfluorene oxide, phenol group-containing polyfluorene oxide, methacrylic acid modified polyfluorene oxide, acrylic acid modified polyfluorene oxide, amine modified polyoxymethylene, carboxylic acid modified polyoxyl Methanol modified polyfluorene oxide, epoxy modified polyfluorene oxide, sulfhydryl modified polyfluorene oxide, fluorine modified polyfluorene oxide, polyether modified polyfluorene and so on. Among them, those having a dimethyl fluorene structure are preferred.
進而,由如下之化合物構成之非聚合物或聚合物亦可用作氟系樹脂。即,可使用:使分子中具有至少1個異氰酸酯基之含氟化合物、與分子中具有至少1個如胺基、羥基、羧基之與異氰酸酯基反應之官能基的化合物發生反應而獲得的化合物;使如含氟聚醚多元醇、含氟烷基多元醇、含氟聚酯多元醇、含氟ε-己內酯改質多元醇之含氟多元醇、與具有異氰酸酯基之化合物反應而獲得的化合物等。 Further, a non-polymer or a polymer composed of the following compounds can also be used as the fluorine-based resin. That is, a compound obtained by reacting a fluorine-containing compound having at least one isocyanate group in the molecule with a compound having at least one functional group reactive with an isocyanate group such as an amine group, a hydroxyl group or a carboxyl group in the molecule; A fluorine-containing polyhydric alcohol such as a fluorine-containing polyether polyol, a fluorine-containing polyhydric alcohol, a fluorine-containing polyester polyol, or a fluorine-containing ε-caprolactone-modified polyol, and a compound obtained by reacting a compound having an isocyanate group Compounds, etc.
又,低折射率層形成用組成物中除了上述具有氟原子之聚合性化合物或聚合物,亦可含有如上述所記載之各熱塑性樹脂。進而,可適 當使用用以使反應性基等硬化之硬化劑、用以提高塗敷性或賦予防污性之各種添加劑、溶劑。 Further, the low refractive index layer-forming composition may contain each of the thermoplastic resins described above in addition to the above-mentioned polymerizable compound or polymer having a fluorine atom. Further, When a curing agent for curing a reactive group or the like is used, various additives and solvents for improving coating properties or imparting antifouling properties are used.
於上述低折射率層之形成中較佳為將上述低折射率層形成用組成物之黏度設為可獲得較佳塗佈性之0.5~5mPa‧s(25℃)、較佳為0.7~3mPa‧s(25℃)之範圍。可實現可見光之優異之抗反射層,且可形成均勻且無塗佈不均之薄膜,且可形成密接性尤其優異之低折射率層。 In the formation of the low refractive index layer, it is preferable that the viscosity of the composition for forming the low refractive index layer is 0.5 to 5 mPa ‧ (25 ° C), preferably 0.7 to 3 mPa, for obtaining a preferable coating property. ‧ s (25 ° C) range. The antireflection layer excellent in visible light can be realized, and a film which is uniform and has no uneven coating can be formed, and a low refractive index layer which is particularly excellent in adhesion can be formed.
樹脂之硬化手段可與前述之硬塗層之硬化手段相同。於為了硬化處理而使用加熱手段之情形,較佳為於低折射率層形成用組成物中添加藉由加熱而例如產生自由基使聚合性化合物開始聚合之熱聚合起始劑。 The hardening means of the resin may be the same as the hardening means of the aforementioned hard coat layer. In the case where a heating means is used for the hardening treatment, it is preferred to add a thermal polymerization initiator which starts polymerization of a polymerizable compound by heating, for example, by generating a radical in the composition for forming a low refractive index layer.
本發明之光學積層體較佳為總透光率為80%以上。若未達80%,則於安裝於影像顯示裝置之情形,存在損及色再現性或視認性之虞,並且有無法獲得所需對比度之虞。上述總透光率更佳為90%以上。 The optical layered body of the present invention preferably has a total light transmittance of 80% or more. If it is less than 80%, in the case of being mounted on an image display device, there is a possibility that the color reproducibility or visibility is impaired, and the desired contrast cannot be obtained. The above total light transmittance is more preferably 90% or more.
上述總透光率可使用測霧計(村上色彩技術研究所製造、產品編號:HM-150)利用依據JIS K-7361之方法進行測定。 The total light transmittance can be measured by a method according to JIS K-7361 using a fog meter (manufactured by Murakami Color Research Laboratory, product number: HM-150).
又,本發明之光學積層體係霧度較佳為1%以下。若為1%以下,則可獲得所需之光學特性,於將本發明之光學積層體設置於影像顯示表面時視認性不會劣化。霧度更佳為0.8%以下,進而較佳為0.5%以下。 Further, the optical layering system of the present invention preferably has a haze of 1% or less. When it is 1% or less, the desired optical characteristics can be obtained, and the visibility of the optical layered body of the present invention on the image display surface is not deteriorated. The haze is more preferably 0.8% or less, further preferably 0.5% or less.
上述霧度可使用測霧計(村上色彩技術研究所製造、產品編號:HM-150)利用依據JIS K-7136之方法進行測定。 The haze can be measured by a method according to JIS K-7136 using a fog meter (manufactured by Murakami Color Research Laboratory, product number: HM-150).
本發明之偏光板係於偏光膜之至少一個面積層本發明之光學積層體而成。 The polarizing plate of the present invention is formed by the optical layered body of the present invention in at least one area layer of the polarizing film.
作為上述偏光膜,並無特別限定,例如可使用經碘等染色、且經延伸 之聚乙烯醇膜、聚乙烯醇縮甲醛膜、聚乙烯醇縮乙醛膜、乙烯-乙酸乙烯酯共聚物系皂化膜等。於上述偏光膜與上述光學積層體之層壓處理中,較佳為對丙烯酸系基材進行皂化處理。藉由皂化處理,可使接著性良好且亦獲得抗靜電效果。 The polarizing film is not particularly limited, and for example, it can be dyed with iodine or the like and stretched. A polyvinyl alcohol film, a polyvinyl formal film, a polyvinyl acetal film, an ethylene-vinyl acetate copolymer saponified film, or the like. In the lamination treatment of the polarizing film and the optical layered body, it is preferred to subject the acrylic substrate to a saponification treatment. By the saponification treatment, the adhesion is good and an antistatic effect is also obtained.
本發明亦提供具備上述光學積層體及/或上述偏光板而成之影像顯示裝置。 The present invention also provides an image display device including the optical layered body and/or the polarizing plate.
作為上述影像顯示裝置,可列舉:電視、電腦、LCD、PDP(Plasma Display Panel,電漿顯示器)、FED(field emission display,場發射顯示裝置)、ELD(有機EL、無機EL)、CRT、平板PC(tablet PC)、電子紙、行動電話等,進而亦可較佳地用於影像顯示裝置等所使用之觸控面板。 Examples of the image display device include a television, a computer, an LCD, a PDP (Plasma Display Panel), an FED (field emission display), an ELD (organic EL, inorganic EL), a CRT, and a flat panel. A PC (tablet PC), an electronic paper, a mobile phone, etc., can be preferably used for a touch panel used in an image display device or the like.
上述之代表例即LCD係具備透過性顯示體、及自背面照射上述透過性顯示體之光源裝置而成者。於本發明之影像顯示裝置為LCD之情形,其為於該透過性顯示體之表面形成有本發明之光學積層體及/或本發明之偏光板而成者。其中,於搭載有觸控面板之影像顯示裝置之情形,不限用於表面,亦可用作構成觸控面板之透明基板。 The above-mentioned representative example of the LCD includes a transmissive display body and a light source device that illuminates the transmissive display body from the back surface. In the case where the image display device of the present invention is an LCD, the optical layered body of the present invention and/or the polarizing plate of the present invention are formed on the surface of the transparent display body. In the case where the image display device with the touch panel is mounted, it is not limited to the surface, and can also be used as a transparent substrate constituting the touch panel.
上述之代表例即LCD係具有透過性顯示體、及自背面照射上述透過性顯示體之光源裝置而成者。於本發明之影像顯示裝置為LCD之情形,其為於該透過性顯示體之表面形成有本發明之光學積層體及/或本發明之偏光板而成者。又,根據搭載有觸控面板之影像顯示裝置之情形或LCD等之情形,不限用於表面,亦可用作構成裝置內部之透明基板等。 The above-mentioned representative example is an LCD having a transmissive display and a light source device that illuminates the transmissive display from the back. In the case where the image display device of the present invention is an LCD, the optical layered body of the present invention and/or the polarizing plate of the present invention are formed on the surface of the transparent display body. Further, depending on the case of the image display device on which the touch panel is mounted or the case of the LCD or the like, it is not limited to the surface, and may be used as a transparent substrate or the like constituting the inside of the device.
於本發明之液晶顯示裝置中,光源裝置之光源係自光學積層體或偏光板之下側進行照射。再者,亦可於液晶顯示元件與偏光板之間插 入相位差板。該液晶顯示裝置之各層間亦可根據需要而設置接著劑層。 In the liquid crystal display device of the present invention, the light source of the light source device is irradiated from the lower side of the optical laminate or the polarizing plate. Furthermore, it is also possible to insert between the liquid crystal display element and the polarizing plate. Into the phase difference plate. An adhesive layer may be provided between the respective layers of the liquid crystal display device as needed.
此處,當本發明具有上述光學積層體之液晶顯示裝置之情形,於該液晶顯示裝置中,作為背光光源並無特別限定,較佳為白色發光二極體(白色LED),本發明之影像顯示裝置較佳為具備白色發光二極體作為背光光源之VA模式或IPS模式之液晶顯示裝置。 Here, in the case where the liquid crystal display device of the optical layered body of the present invention is provided, the liquid crystal display device is not particularly limited as a backlight source, and is preferably a white light emitting diode (white LED), and the image of the present invention. The display device is preferably a VA mode or IPS mode liquid crystal display device having a white light-emitting diode as a backlight source.
上述所謂白色LED,係指螢光體方式、即藉由將使用化合物半導體之發藍色光或紫外光之發光二極體與螢光體組合而發白色的元件。其中,由將使用化合物半導體之藍色發光二極體與釔鋁石榴石系黃色螢光體組合而成之發光元件所構成的白色發光二極體,其具有連續且範圍較廣之發光光譜,故而對抗反射性能及明處對比度之改善較為有效,並且其發光效率亦優異,因此作為本發明之上述背光光源較佳。又,可廣泛地利用耗電較小之白色LED,因此亦可實現節能化之效果。 The above-mentioned white LED refers to a phosphor type, that is, an element which emits white by combining a light-emitting diode using a blue light or ultraviolet light of a compound semiconductor and a phosphor. Among them, a white light-emitting diode composed of a light-emitting element in which a blue light-emitting diode of a compound semiconductor and a yttrium aluminum garnet-based yellow phosphor are combined has a continuous and wide range of light-emitting spectra. Therefore, the improvement of the antireflection performance and the contrast of the bright portion is effective, and the luminous efficiency is also excellent. Therefore, it is preferable as the backlight source of the present invention. Moreover, since the white LED with low power consumption can be widely used, the effect of energy saving can also be achieved.
又,上述所謂VA(Vertical Alignment,垂直配向)模式,係未施加電壓時液晶分子以垂直於液晶單元之基板之方式配向而顯示為暗顯示,並藉由利用電壓之施加使液晶分子倒伏而顯示為亮顯示的動作模式。 Further, in the above-mentioned VA (Vertical Alignment) mode, when liquid crystal molecules are aligned perpendicular to the substrate of the liquid crystal cell when no voltage is applied, the liquid crystal molecules are displayed in a dark display, and the liquid crystal molecules are displayed by the application of a voltage. The action mode for the light display.
又,上述所謂IPS(In-Plane Switching,面內切換)模式,係利用對設置於液晶單元之一基板之梳形電極(interdigitated array electrode)對施加的橫向電場使液晶於基板面內旋轉而進行顯示的方式。 Further, in the above-described IPS (In-Plane Switching) mode, the liquid crystal is rotated in the surface of the substrate by applying a transverse electric field to an interdigitated array electrode provided on one of the liquid crystal cells. The way it is displayed.
上述影像顯示裝置即PDP具備:於表面形成有電極之表面玻璃基板,及與該表面玻璃基板對向且於之間封入放電氣體而配置、於表面形成有電極及微小之槽、槽內形成有紅、綠、藍之螢光體層的背面玻璃基板。於本發明之影像顯示裝置為PDP之情形,其為於上述表面玻璃基板 之表面或其前面板(玻璃基板或膜基板)具備上述光學積層體者。 The PDP of the image display device includes a surface glass substrate on which an electrode is formed on the surface, and a discharge gas is disposed to face the surface glass substrate, and an electrode and a minute groove are formed on the surface, and a groove is formed in the groove. The back glass substrate of the red, green, and blue phosphor layers. In the case where the image display device of the present invention is a PDP, the surface glass substrate is The surface or the front panel (glass substrate or film substrate) thereof is provided with the above optical laminate.
上述影像顯示裝置亦可為將一旦施加電壓即發光之硫化鋅、二胺類物質:發光體蒸鍍於玻璃基板並對施加於基板之電壓進行控制而進行顯示的ELD裝置、或將電訊號轉換為光而產生人眼可見之像之CRT等影像顯示裝置。於該情形,其為於如上所述之各顯示裝置之最表面或其前面板之表面具備上述光學積層體者。 The image display device may be an ELD device that displays a zinc sulfide, a diamine substance, a light-emitting body that emits light when a voltage is applied, and a light-emitting body, and controls the voltage applied to the substrate, or converts the electric signal. An image display device such as a CRT that produces an image visible to the human eye for light. In this case, the optical layered body is provided on the outermost surface of each display device or the surface of the front panel thereof as described above.
[實施例] [Examples]
繼而,利用實施例進而對本發明進行詳細情況之說明,但本發明不受該等例任何限定。 Further, the present invention will be described in detail by way of examples, but the invention is not limited by the examples.
實施例1 Example 1
(丙烯酸系基材之製造) (Manufacture of acrylic substrate)
將由甲基丙烯酸甲酯及丙烯酸甲酯之共聚物(玻璃轉移點:130℃)構成之顆粒加以熔融混練,並一面使之通過過濾器而去除雜質,一面利用熔融擠出之方法將聚合物自模具之間隙擠出。繼而,一面冷卻聚合物,一面於縱方向延伸至1.2倍,此後,於橫方向延伸至1.5倍,而獲得厚度40μm之丙烯酸系基材。 The particles composed of a copolymer of methyl methacrylate and methyl acrylate (glass transfer point: 130 ° C) are melt-kneaded and passed through a filter to remove impurities while the polymer is self-expanded by melt extrusion. The gap between the molds is extruded. Then, the polymer was cooled to 1.2 times in the longitudinal direction, and then extended to 1.5 times in the lateral direction to obtain an acrylic substrate having a thickness of 40 μm.
(樹脂層形成用組成物之製備) (Preparation of a composition for forming a resin layer)
使四乙二醇二丙烯酸酯(東亞合成股份有限公司製造、「M240」)100質量份、及起始劑(BASF公司製造、「Irg184」)4質量份溶解於甲基異丁基酮150質量份,而製備樹脂層形成用組成物。 100 parts by mass of tetraethylene glycol diacrylate (manufactured by Toagosei Co., Ltd., "M240"), and 4 parts by mass of an initiator (manufactured by BASF Corporation, "Irg184") were dissolved in methyl isobutyl ketone 150 mass. A composition for forming a resin layer was prepared.
再者,於表1中顯示樹脂層形成用組成物之組成。 In addition, the composition of the composition for resin layer formation is shown in Table 1.
(硬塗層形成用組成物1之製備) (Preparation of Composition 1 for Hard Coating Formation)
使二新戊四醇六丙烯酸酯(日本化藥股份有限公司製造)50質量份、丙烯酸胺基甲酸酯(日本合成化學工業股份有限公司製造、「UV1700B」、10官能、重量平均分子量:2,000)50質量份、及起始劑(BASF公司製造、「Irg184」)4質量份溶解於甲基異丁基酮150質量份,而製備硬塗層形成用組成物1。 50 parts by mass of dipentaerythritol hexaacrylate (manufactured by Nippon Kayaku Co., Ltd.), urethane urethane (manufactured by Nippon Synthetic Chemical Co., Ltd., "UV1700B", 10-functional, weight average molecular weight: 2,000 50 parts by mass and 4 parts by mass of an initiator (manufactured by BASF Corporation, "Irg 184") were dissolved in 150 parts by mass of methyl isobutyl ketone to prepare a composition 1 for forming a hard coat layer.
(光學積層體之製造) (Manufacture of optical laminate)
利用模具塗佈法於丙烯酸系基材上塗敷樹脂層形成用組成物,於70℃下乾燥1分鐘使溶劑蒸發,以乾燥後之塗佈量成為4g/m2(乾燥膜厚3.5μm)之方式形成樹脂層。對所獲得之塗膜以照射量70mJ/cm2照射紫外線而使塗膜半硬化(半固化狀態)。 The resin layer-forming composition was applied onto the acrylic substrate by a die coating method, and dried at 70 ° C for 1 minute to evaporate the solvent, and the coating amount after drying was 4 g/m 2 (dry film thickness: 3.5 μm). The method forms a resin layer. The coating film obtained was irradiated with ultraviolet rays at an irradiation amount of 70 mJ/cm 2 to semi-harden the coating film (semi-cured state).
繼而,利用模具塗佈方法將硬塗層形成用組成物1塗敷於以上述方式形成之樹脂層上,於70℃下乾燥1分鐘使溶劑蒸發,以乾燥後之塗佈量成為8g/m2(乾燥膜厚7μm)之方式形成硬塗層1。對所獲得之塗膜以紫外線照射量200mJ/cm2照射紫外線而使塗膜完全硬化(完全固化狀態),獲得光學積層體。 Then, the composition for forming a hard coat layer 1 was applied onto the resin layer formed in the above manner by a die coating method, and dried at 70 ° C for 1 minute to evaporate the solvent, and the coating amount after drying became 8 g/m. The hard coat layer 1 was formed in the form of 2 (dry film thickness: 7 μm). The coating film obtained was irradiated with ultraviolet rays at an ultraviolet irradiation amount of 200 mJ/cm 2 to completely cure the coating film (completely cured state), thereby obtaining an optical layered body.
實施例2~16及比較例1~10 Examples 2 to 16 and Comparative Examples 1 to 10
將樹脂層形成用組成物之組成變更為表1~3中所示者,除此以外,以與實施例1同樣之方式獲得光學積層體。 An optical layered body was obtained in the same manner as in Example 1 except that the composition of the resin layer-forming composition was changed to those shown in Tables 1 to 3.
實施例17 Example 17
作為硬塗層形成用組成物,使用按以下方式製備之硬塗層形成用組成物2代替上述硬塗層形成用組成物1,除此以外,以與實施例1同樣之方式獲得光學積層體。 An optical layered body was obtained in the same manner as in Example 1 except that the hard-coat layer-forming composition 2 prepared in the following manner was used as the composition for forming a hard-coat layer instead of the hard-coat layer-forming composition 1 described above. .
(硬塗層形成用組成物2之製備) (Preparation of Composition 2 for Hard Coating Formation)
使二新戊四醇六丙烯酸酯(日本化藥股份有限公司製造)30質量份、丙烯酸胺基甲酸酯(荒川化學工業股份有限公司製造、「BS577」、6官能、重量平均分子量:1,000)46質量份、單體(東亞合成股份有限公司製造、「M315」、3官能)20質量份、含四級銨鹽之寡聚物(TAISEI FINE CHEMICAL股份有限公司製造、「1SX3000」)4質量份、及起始劑(BASF公司製造、「Irg184」)4質量份溶解於甲基異丁基酮130質量份及N-丁醇20質量份,而製備硬塗層形成用組成物2。 30 parts by mass of dipentaerythritol hexaacrylate (manufactured by Nippon Kayaku Co., Ltd.), urethane acrylate (manufactured by Arakawa Chemical Industries Co., Ltd., "BS577", 6-functional, weight average molecular weight: 1,000) 20 parts by mass, 20 parts by mass of a monomer (manufactured by Toagosei Co., Ltd., "M315", trifunctional), and 4 parts by mass of an oligomer containing a quaternary ammonium salt (manufactured by TAISEI FINE CHEMICAL Co., Ltd., "1SX3000") 4 parts by mass of the initiator (manufactured by BASF Corporation, "Irg 184") was dissolved in 130 parts by mass of methyl isobutyl ketone and 20 parts by mass of N-butanol to prepare a composition 2 for forming a hard coat layer.
實施例17中所獲得之光學積層體係於硬塗層中含有抗靜電劑,因此具有抗靜電性。 The optical layering system obtained in Example 17 contained an antistatic agent in the hard coat layer and thus had antistatic properties.
針對實施例1~17及比較例1~10中所獲得之光學積層體,進行下述評價。將結果示於表1~3。 The optical laminates obtained in Examples 1 to 17 and Comparative Examples 1 to 10 were subjected to the following evaluations. The results are shown in Tables 1 to 3.
(基準長度30μm中稜線之長度) (The length of the ridge line in the reference length of 30 μm)
使用掃描型穿透式電子顯微鏡(STEM)對所獲得之光學積層體之厚度方向之剖面進行拍攝,基於該畫面,並基於上述「基準長度30μm中稜線之長度之測定方法」進行測定。 The cross section in the thickness direction of the obtained optical layered body was imaged by a scanning transmission electron microscope (STEM), and the measurement was performed based on the above-described "measurement method of the length of the ridge line in the reference length of 30 μm".
(基準高度與基準深度之高低差) (the difference between the reference height and the reference depth)
如圖4所示般,於上述光學積層體之厚度方向之剖面,丙烯酸系基材-樹脂層界面顯示具有山部及谷部之稜線,於以光學積層體之厚度方向為y軸(其中,樹脂層側為正方向)、以垂直於該y軸之方向為x軸的xy平面,於該x軸方向取30μm之基準長度L,於該基準長度L中稜線所具有之最小值點4b中,自y座標最小者中選擇3點(4b-1),並以其等之平均y座標 作為基準深度5b,另一方面,於該基準長度L中稜線所具有之最大值點4a中,自y座標最大者中選擇3點(4a-1),並以其等之平均y座標作為基準高度5a,將該基準深度5b與基準高度5a之差(絕對值)作為基準深度5b與基準高度5a之高低差。 As shown in Fig. 4, in the cross section in the thickness direction of the optical layered body, the acrylic substrate-resin layer interface has ridge lines having a mountain portion and a valley portion, and the y-axis is in the thickness direction of the optical layered body (where The resin layer side is a positive direction), an xy plane which is an x-axis in a direction perpendicular to the y-axis, and a reference length L of 30 μm in the x-axis direction, in the minimum point 4b of the ridge line in the reference length L Select 3 points (4b-1) from the smallest of the y coordinates, and use the average y coordinate As the reference depth 5b, on the other hand, among the maximum point 4a of the ridge line in the reference length L, three points (4a-1) are selected from the largest y coordinate, and the average y coordinate thereof is used as a reference. The height 5a is the difference (absolute value) between the reference depth 5b and the reference height 5a as the difference between the reference depth 5b and the reference height 5a.
(平均傾斜角θa) (average tilt angle θa)
如圖5所示,於上述光學積層體之厚度方向之剖面,丙烯酸系基材-樹脂層界面顯示具有山部及谷部之稜線,於以光學積層體之厚度方向為y軸(其中,樹脂層側為正方向)、以垂直於該y軸之方向為x軸的xy平面,於該x軸方向取30μm之基準長度L,於該基準長度L確定稜線所具有之極值點(最大值點4a及最小值點4b),將全部之鄰接之極值點間之高低差(h1~h12、絕對值)之和記作總高低差ΣH,此時,將tan-1(總高低差ΣH/基準長度L)所表示之值作為平均傾斜角θa。 As shown in Fig. 5, in the cross section in the thickness direction of the optical layered body, the acrylic substrate-resin layer interface has a ridgeline having a mountain portion and a valley portion, and the y-axis is in the thickness direction of the optical layered body (wherein the resin The layer side is a positive direction), the xy plane is an x-axis in a direction perpendicular to the y-axis, and a reference length L of 30 μm is taken in the x-axis direction, and the extreme value point of the ridge line is determined at the reference length L (maximum value) Point 4a and minimum point 4b), the sum of the height difference (h 1 ~ h 12 , absolute value) of all the adjacent extreme points is recorded as the total height difference ΣH, at this time, tan -1 (total height) The value indicated by the difference H/reference length L) is taken as the average inclination angle θa.
(凹凸之平均間隔Sm) (average interval Sm of the bumps)
依據JIS B0601(1994)進行測定。 The measurement was carried out in accordance with JIS B0601 (1994).
(密接性) (adhesiveness)
基於JIS K 5600,對光學積層體之硬塗層劃1mm見方且合計100格之棋盤格,使用Nichiban(股)製造之工業用24mm之Cellotape(註冊商標)連續5次進行剝離試驗,計算殘留之方格之數量。 Based on JIS K 5600, a hard coating of an optical laminate was drawn in a square of 1 mm square and a total of 100 squares, and a 24 mm Cellotape (registered trademark) manufactured by Nichiban Co., Ltd. was used for peeling test five times in a row to calculate the residue. The number of squares.
根據未剝離之方格之數,按以下方式進行評價。○等級以上作為製品較佳。 According to the number of squares that were not peeled off, the evaluation was performed as follows. ○ Above grade is preferred as a product.
A:90-100 A: 90-100
B:80-89 B: 80-89
C:50-79 C: 50-79
D:未達50 D: not up to 50
(干涉條紋) (interference fringes)
於與光學積層體之硬塗層相反側之面貼合黑色膠帶後,於三波長管螢光燈下以目視評價有無干涉條紋。將不可見干涉條紋之情形記為A,將稍稍可見之情形記為B,將可見之情形記為C。 After attaching a black tape to the surface opposite to the hard coat layer of the optical layered body, the presence or absence of interference fringes was visually evaluated under a three-wavelength tube fluorescent lamp. The case where the invisible interference fringes are inscribed is denoted by A, the case where it is slightly visible is denoted by B, and the case where it is visible is denoted by C.
(製造加工性) (manufacturing processability)
於將樹脂層形成用組成物塗佈於丙烯酸系基材上並進行乾燥的階段,進行拉伸試驗。拉伸程度設為2.2N/cm。 A tensile test was carried out at the stage where the resin layer-forming composition was applied onto an acrylic substrate and dried. The degree of stretching was set to 2.2 N/cm.
其結果為,將拉伸時未斷開之情形評價為「良好」,將即便產生少許斷裂而於製造加工上產生問題者評價為「不良」。 As a result, the case where the film was not broken at the time of stretching was evaluated as "good", and those who had problems in the manufacturing process even if a slight break occurred were evaluated as "poor".
製造加工性為「不良」之光學積層體係基材本身之物性弱化,因此即便使樹脂層、硬塗層等硬化,鉛筆硬度(JIS K5600-5-4)亦非2H以上。 Since the physical properties of the substrate of the optical layering system in which the workability is "defective" are weakened, even if the resin layer or the hard coat layer is cured, the pencil hardness (JIS K5600-5-4) is not 2H or more.
(霧度) (haze)
使用測霧計(村上色彩技術研究所製造、產品編號:HM-150)依據JIS K-7136測定光學積層體之霧度值(%),並按以下評價基準進行評價。 The haze value (%) of the optical laminate was measured in accordance with JIS K-7136 using a fog meter (manufactured by Murakami Color Research Laboratory, product number: HM-150), and evaluated according to the following evaluation criteria.
A:霧度值為0.8以下 A: Haze value is below 0.8
C:霧度值超過0.8 C: haze value exceeds 0.8
(表面電阻) (surface resistance)
對上述實施例及比較例中製作之各光學積層體,使用表面電阻值測定器(Hiresta HT-210、三菱油化股份有限公司製造)測定表面電阻值。 The surface resistivity of each of the optical laminates produced in the above Examples and Comparative Examples was measured using a surface resistance value measuring device (Hiresta HT-210, manufactured by Mitsubishi Petrochemical Co., Ltd.).
PEG二(甲基)丙烯酸酯1:四乙二醇二丙烯酸酯(東亞合成股份有限公司製造、「M240」、分子量:286) PEG di(meth)acrylate 1: tetraethylene glycol diacrylate (manufactured by Toagosei Co., Ltd., "M240", molecular weight: 286)
PEG二(甲基)丙烯酸酯2:三乙二醇二甲基丙烯酸酯(共榮社化學股份有限公司製造、「Light ester 3EG」、分子量:270) PEG di(meth)acrylate 2: triethylene glycol dimethacrylate (manufactured by Kyoeisha Chemical Co., Ltd., "Light ester 3EG", molecular weight: 270)
PEG二(甲基)丙烯酸酯3:四乙二醇二甲基丙烯酸酯(共榮社化學股份有限公司製造、「Light ester 4EG」、分子量:314) PEG di(meth)acrylate 3: tetraethylene glycol dimethacrylate (manufactured by Kyoeisha Chemical Co., Ltd., "Light ester 4EG", molecular weight: 314)
順丁烯二醯亞胺聚合物:(東亞合成股份有限公司製造、「UVT302」) Maleic acid imide polymer: (manufactured by Toagosei Co., Ltd., "UVT302")
PETA:新戊四醇三丙烯酸酯 PETA: Pentaerythritol triacrylate
多官能聚合物:荒川化學工業製造、「BS371」 Polyfunctional polymer: manufactured by Arakawa Chemical Industry, "BS371"
多官能寡聚物:第一工業製藥股份有限公司製造、「R1403」 Polyfunctional oligomer: manufactured by First Industrial Pharmaceutical Co., Ltd., "R1403"
單體1:二新戊四醇六丙烯酸酯、日本化藥股份有限公司製造 Monomer 1: dipentaerythritol hexaacrylate, manufactured by Nippon Kayaku Co., Ltd.
單體2:鄰苯酚EO改質丙烯酸酯、東亞合成股份有限公司製造之M106 Monomer 2: o-phenol EO modified acrylate, M106 manufactured by East Asia Synthetic Co., Ltd.
四級銨鹽:Colcoat公司製造、「Colcoat NR121X」 Quaternary ammonium salt: manufactured by Colcoat, "Colcoat NR121X"
ATO粒子:摻銻氧化錫之甲基異丁基酮分散液、Mitsubishi Materials Electronic Chemicals股份有限公司製造、「EPT5DL2MIBK」 ATO particles: methyl isobutyl ketone dispersion doped with antimony tin oxide, manufactured by Mitsubishi Materials Electronic Chemicals Co., Ltd., "EPT5DL2MIBK"
反應性二氧化矽:日產化學工業股份有限公司製造、「MIBKSD」、平均粒徑:12nm Reactive cerium oxide: manufactured by Nissan Chemical Industry Co., Ltd., "MIBKSD", average particle size: 12 nm
氧化鋯:氧化鋯之MEK分散液(固形物成分30%分散液、堺化學工業製造、「SZR-K 4nm」) Zirconium oxide: MEK dispersion of zirconia (solid content component 30% dispersion, manufactured by 堺Chemical Industries, "SZR-K 4nm")
MIBK:甲基異丁基酮 MIBK: methyl isobutyl ketone
PGME:丙二醇單甲醚 PGME: propylene glycol monomethyl ether
MEK:甲基乙基酮 MEK: methyl ethyl ketone
[產業上之可利用性] [Industrial availability]
本發明之光學積層體可較佳地用於陰極射線管顯示裝置(CRT)、液晶顯示器(LCD)、電漿顯示器(PDP)、電致發光顯示器(ELD)、觸控面板、電子紙、行動電話等顯示器,尤其是高精細化顯示器。 The optical laminate of the present invention can be preferably used for a cathode ray tube display device (CRT), a liquid crystal display (LCD), a plasma display (PDP), an electroluminescence display (ELD), a touch panel, an electronic paper, and an action. A display such as a telephone, especially a high-definition display.
1‧‧‧丙烯酸系基材 1‧‧‧Acrylic substrate
2‧‧‧樹脂層 2‧‧‧ resin layer
3‧‧‧硬塗層 3‧‧‧hard coating
Claims (6)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012281656 | 2012-12-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201425045A TW201425045A (en) | 2014-07-01 |
TWI607879B true TWI607879B (en) | 2017-12-11 |
Family
ID=51020777
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW102146871A TWI607879B (en) | 2012-12-25 | 2013-12-18 | Optical laminate, polarizing plate and image display device using same |
Country Status (6)
Country | Link |
---|---|
US (1) | US10241235B2 (en) |
JP (1) | JP6565186B2 (en) |
KR (1) | KR102062156B1 (en) |
CN (1) | CN104854491B (en) |
TW (1) | TWI607879B (en) |
WO (1) | WO2014103686A1 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6413289B2 (en) * | 2014-03-27 | 2018-10-31 | 大日本印刷株式会社 | Optical laminate and method for producing the same |
JP6684046B2 (en) * | 2014-07-30 | 2020-04-22 | デクセリアルズ株式会社 | Transparent laminate |
JP6819156B2 (en) * | 2015-11-11 | 2021-01-27 | 住友化学株式会社 | Liquid crystal display device |
JP6690385B2 (en) * | 2016-04-27 | 2020-04-28 | 凸版印刷株式会社 | Hard coat film, polarizing plate, and transmissive liquid crystal display |
JP2018080251A (en) * | 2016-11-16 | 2018-05-24 | 株式会社Dnpファインケミカル | Composition, laminated member, touch panel, and display device |
CN110494282B (en) * | 2017-04-11 | 2022-02-22 | 富士胶片株式会社 | Optical laminate, front panel of image display device having optical laminate, image display device, resistive film type touch panel, and capacitive touch panel |
US20230341590A1 (en) * | 2020-07-20 | 2023-10-26 | Lg Chem, Ltd. | Anti-glare film, polarizing plate and display apparatus |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08197670A (en) * | 1995-01-27 | 1996-08-06 | Dainippon Printing Co Ltd | Surface protection sheet and manufacture thereof |
TW201037367A (en) * | 2009-01-09 | 2010-10-16 | Sony Corp | Optical element and method for making the same, master and method for making the same, and display apparatus |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3680206B2 (en) | 2000-10-17 | 2005-08-10 | 古河スカイ株式会社 | Aluminum alloy plate for coating with excellent adhesion of coating layer |
JP3989176B2 (en) | 2001-01-17 | 2007-10-10 | 古河スカイ株式会社 | Method for producing thermoplastic resin-coated aluminum alloy sheet for molding process with excellent adhesion and workability of coating layer |
JP4135364B2 (en) * | 2002-01-16 | 2008-08-20 | 凸版印刷株式会社 | Manufacturing method of optical film |
JP2005352238A (en) * | 2004-06-11 | 2005-12-22 | Dainippon Printing Co Ltd | Light diffusing member |
JP5082097B2 (en) * | 2006-02-28 | 2012-11-28 | 国立大学法人 筑波大学 | Antireflection structure and light emitting element having the antireflection structure |
CN101568420B (en) * | 2006-12-28 | 2014-06-25 | 大成普拉斯株式会社 | Metal/resin composite and process for producing the same |
JP4935627B2 (en) * | 2007-10-30 | 2012-05-23 | ソニー株式会社 | OPTICAL ELEMENT AND METHOD FOR PRODUCING OPTICAL ELEMENT MANUFACTURING MASTER |
JP2009150998A (en) * | 2007-12-19 | 2009-07-09 | Sumitomo Chemical Co Ltd | Antiglare film, antiglare polarizing plate and image display device |
JP5266827B2 (en) * | 2008-03-25 | 2013-08-21 | 東レ株式会社 | Hard coat film and antireflection film |
JP2010015109A (en) * | 2008-07-07 | 2010-01-21 | Sony Corp | Optical film and manufacturing method therefor, glare-proof polarizer, and display |
JP5521354B2 (en) * | 2009-02-27 | 2014-06-11 | 三菱レイヨン株式会社 | Transparent film having fine concavo-convex structure on surface and method for producing the same |
JP2012208526A (en) * | 2009-09-02 | 2012-10-25 | Sony Corp | Optical element, and display unit |
JP2011081359A (en) | 2009-09-09 | 2011-04-21 | Nitto Denko Corp | Method for manufacturing polarizing plate |
WO2011055624A1 (en) * | 2009-11-06 | 2011-05-12 | コニカミノルタオプト株式会社 | Polarizing plate and liquid crystal display device |
JP2011164433A (en) * | 2010-02-10 | 2011-08-25 | Sony Corp | Optical body, window member, fixture and sunlight blocking member |
JP5773576B2 (en) * | 2010-04-01 | 2015-09-02 | キヤノン株式会社 | Anti-reflection structure and optical equipment |
JP5842320B2 (en) * | 2010-09-16 | 2016-01-13 | 大日本印刷株式会社 | Manufacturing method of optical film, optical film, polarizing plate, and image display device |
JP6128629B2 (en) * | 2011-04-22 | 2017-05-17 | 日東電工株式会社 | Optical laminate |
US9447492B2 (en) * | 2011-06-03 | 2016-09-20 | Graham J. Hubbard | Conductive anti-reflective films |
JP6048145B2 (en) * | 2011-09-08 | 2016-12-21 | 三菱レイヨン株式会社 | Transparent film having fine concavo-convex structure on surface, and production method thereof |
-
2013
- 2013-12-09 US US14/654,751 patent/US10241235B2/en active Active
- 2013-12-09 KR KR1020157015961A patent/KR102062156B1/en active IP Right Grant
- 2013-12-09 JP JP2014554288A patent/JP6565186B2/en active Active
- 2013-12-09 WO PCT/JP2013/082991 patent/WO2014103686A1/en active Application Filing
- 2013-12-09 CN CN201380065330.2A patent/CN104854491B/en active Active
- 2013-12-18 TW TW102146871A patent/TWI607879B/en active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08197670A (en) * | 1995-01-27 | 1996-08-06 | Dainippon Printing Co Ltd | Surface protection sheet and manufacture thereof |
TW201037367A (en) * | 2009-01-09 | 2010-10-16 | Sony Corp | Optical element and method for making the same, master and method for making the same, and display apparatus |
Also Published As
Publication number | Publication date |
---|---|
CN104854491A (en) | 2015-08-19 |
JP6565186B2 (en) | 2019-08-28 |
KR102062156B1 (en) | 2020-01-03 |
CN104854491B (en) | 2018-10-16 |
US20150355385A1 (en) | 2015-12-10 |
KR20150100663A (en) | 2015-09-02 |
US10241235B2 (en) | 2019-03-26 |
WO2014103686A1 (en) | 2014-07-03 |
TW201425045A (en) | 2014-07-01 |
JPWO2014103686A1 (en) | 2017-01-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI607879B (en) | Optical laminate, polarizing plate and image display device using same | |
TWI602699B (en) | Optical laminate, a method of manufacturing the same, a polarizing plate using the same, and a liquid crystal display device | |
KR101796808B1 (en) | Optical laminate, method for manufacturing an optical laminate, polarizing plate, and image display device | |
KR101273748B1 (en) | Optical layered body, polarizer and image display device | |
KR101870473B1 (en) | Anti-reflective film, anti-reflective film production method, polarization plate and image display device | |
TWI448718B (en) | An optical laminate, a polarizing plate, and an image display device | |
JP2020060760A (en) | Protective film for polarizing plate and polarizing plate using the same | |
TWI474052B (en) | Anti-glare film, anti-glare film manufacturing method, polarizing film and image display device | |
TWI551881B (en) | Optical continuum | |
US8715784B2 (en) | Method of producing optical layered body, optical layered body, polarizer and image display device | |
TWI542466B (en) | An optical laminate, a polarizing plate, and an image display device | |
TWI643740B (en) | Optical laminate and manufacturing method of optical laminate | |
KR101910206B1 (en) | Optical laminate, method for manufacturing thereof, and polarizing plate and image display device using the same | |
JP5359652B2 (en) | Optical laminate, polarizing plate, and image display device | |
JP2013147535A (en) | Resin composition, optical laminate, polarizing plate and image display device | |
TW201615773A (en) | Polarizing plate protective film, polarizing plate, liquid crystal display device, and manufacturing method of polarizing plate protective film | |
JPWO2019035398A1 (en) | Optical film, polarizing plate, and image display device | |
TWI542472B (en) | Optical laminate, polarizing plate and image display device |