TWI643740B - Optical laminate and manufacturing method of optical laminate - Google Patents

Optical laminate and manufacturing method of optical laminate Download PDF

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TWI643740B
TWI643740B TW104104480A TW104104480A TWI643740B TW I643740 B TWI643740 B TW I643740B TW 104104480 A TW104104480 A TW 104104480A TW 104104480 A TW104104480 A TW 104104480A TW I643740 B TWI643740 B TW I643740B
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resin layer
acrylic
acrylic substrate
meth
resin
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TW201536545A (en
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堀尾智之
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日商大日本印刷股份有限公司
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics

Abstract

本發明提供一種製造步驟少,且不論樹脂層所含之功能性成分之種類均更強地表現功能之光學積層體及其製造方法。 The present invention provides an optical multilayer body having fewer manufacturing steps and exhibiting a stronger function regardless of the type of functional components contained in the resin layer, and a method for manufacturing the same.

本發明之光學積層體之製造方法之特徵在於依序進行如下步驟:塗佈步驟(A),其係於丙烯酸基材(acrylic based material)上塗佈至少含有功能性成分之游離輻射硬化性樹脂組成物A而形成未硬化樹脂層;減厚步驟(B),其係藉由該未硬化樹脂層而使丙烯酸基材溶解,使丙烯酸基材之厚度減少1.0~15.0%;及硬化步驟(C),其係照射游離輻射使該未硬化樹脂層硬化而形成樹脂層;藉此,使功能性成分向該樹脂層表面側偏靠;且本發明之光學積層體係於丙烯酸基材上具有樹脂層,並使功能性成分向該樹脂層表面側偏靠而成。 The manufacturing method of the optical multilayer body of the present invention is characterized by sequentially performing the following steps: a coating step (A), which coats an acrylic based material with a free radiation-curable resin containing at least a functional component The composition A forms an unhardened resin layer; the step of reducing the thickness (B) is to dissolve the acrylic substrate by the unhardened resin layer and reduce the thickness of the acrylic substrate by 1.0 to 15.0%; and the hardening step (C ), Which is irradiated with free radiation to harden the unhardened resin layer to form a resin layer; thereby, the functional component is biased toward the resin layer surface side; and the optical laminated system of the present invention has a resin layer on an acrylic substrate , And the functional component is biased toward the surface side of the resin layer.

Description

光學積層體及其製造方法 Optical laminated body and manufacturing method thereof

本發明係關於一種光學積層體及其製造方法。 The invention relates to an optical multilayer body and a method for manufacturing the same.

於影像顯示裝置中,液晶顯示器(LCD)、搭載有觸控面板之LCD、電致發光(EL)、電子紙等具有省電、輕量、薄型等特徵,因此近年來代替先前之布朗管(CRT)顯示器而正迅速地普及。 In image display devices, liquid crystal displays (LCDs), LCDs equipped with touch panels, electroluminescence (EL), electronic paper, etc. have features such as power saving, light weight, and thinness. CRT) displays are rapidly spreading.

對用於此種影像顯示裝置之表面或內部之光學積層體要求用以於處理時不會劃傷之硬塗性、用以消除靜電之影響之抗靜電性、用以消除因指紋之附著引起之外觀不良之防污性、用以防止映入之防眩性、用以防止外光之反射之抗反射性等功能,因此通常係藉由在光穿透性基材上單獨或者組合設置硬塗層、抗靜電層、防污層、防眩層、抗反射層等而賦予功能。 Optical laminates used on the surface or inside of such image display devices require hard-coating properties that do not scratch during handling, anti-static properties to eliminate the effects of static electricity, and to eliminate the effects of fingerprint adhesion Poor appearance, anti-fouling properties, anti-glare properties to prevent reflection, anti-reflection properties to prevent reflection of external light, etc., so it is usually done by setting the hard Coatings, antistatic layers, antifouling layers, antiglare layers, antireflection layers, etc. provide functions.

例如,於LCD中,於液晶單元之影像顯示面側配置有偏光元件,通常藉由利用於光穿透性基材上設置有上述功能層之硬塗膜作為偏光板保護膜,而對影像顯示面賦予各種功能。 For example, in an LCD, a polarizing element is arranged on the image display surface side of a liquid crystal cell. Usually, a hard coating film provided with the above-mentioned functional layer on a light-transmitting substrate is used as a polarizing plate protective film to display an image. Faces give various functions.

先前,作為此種硬塗膜之光穿透性基材,使用由以三乙醯纖 維素(TAC)為代表之纖維素酯所構成之膜。其原因在於,纖維素酯具有如下優點:透明性、光學各向同性優異,於面內幾乎不具有相位差(延遲值較低),故極少改變入射直線偏光之振動方向,對液晶顯示裝置之顯示品質之影響較少。又,纖維素酯亦具有如下等優點:具有適度之透水性,因此於製造使用光學積層體而成之偏光板時,可通過光學積層體使殘留於偏光元件之水分、殘留於光學積層體與偏光板之接著層之水分乾燥。 Previously, as the light-transmitting substrate of such a hard coating film, Vitamin (TAC) is a typical film made of cellulose ester. The reason is that cellulose ester has the following advantages: excellent transparency and optical isotropy, almost no phase difference in the plane (lower retardation value), so it rarely changes the vibration direction of incident linearly polarized light. The effect of display quality is less. In addition, cellulose ester also has the following advantages: it has moderate water permeability. Therefore, when manufacturing a polarizing plate made using an optical laminate, the optical laminate can be used to keep the moisture remaining in the polarizing element and the optical laminate. The moisture of the adhesive layer of the polarizing plate is dried.

另一方面,於將纖維素酯膜用作透明基材之情形時,為了賦予硬塗性及抗靜電性,已知有藉由將於紫外線硬化型樹脂中調配有抗靜電劑之組成物塗佈至該透明基材並硬化而賦予功能的方法。又,已知有藉由將於黏合劑中調配有硬度較高之無機微粒子、及抗靜電劑之組成物塗佈至透明基材並硬化而賦予功能的方法。 On the other hand, in the case where a cellulose ester film is used as a transparent substrate, in order to impart hard coat properties and antistatic properties, it is known to apply a composition containing an antistatic agent to an ultraviolet curable resin. A method of applying a function to the transparent substrate and curing it. In addition, a method is known in which a composition comprising an inorganic fine particle having a relatively high hardness and an antistatic agent prepared by blending in an adhesive is applied to a transparent substrate and hardened to impart a function.

另一方面,例如於專利文獻1中,揭示有將功能性成分於硬塗層中偏靠化之方法。該方法係藉由使功能性成分向表面偏靠化,而更有效地表現該功能性成分之功能之方法,具體而言係對功能性粒子實施表面處理,控制其親水性或疏水性之程度、表面能量等。然而,該方法存在如下等問題:因需要特別之處理而較為繁雜,且成本方面亦不利,並且材料選擇之範圍較窄,又,製造條件受制約。 On the other hand, for example, Patent Document 1 discloses a method of biasing a functional component into a hard coat layer. This method is a method of more effectively expressing the function of the functional component by biasing the functional component toward the surface, and specifically, surface-treating the functional particles to control the degree of hydrophilicity or hydrophobicity. , Surface energy, etc. However, this method has the following problems: it is complicated due to the need for special treatment, and it is also disadvantageous in terms of cost, and the range of material selection is narrow, and the manufacturing conditions are restricted.

[專利文獻1]日本特開2007-133236號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2007-133236

本發明之目的在於提供一種製造步驟少,且不論樹脂層所含之功能性成分之種類均更強地表現功能之光學積層體及其製造方法。 An object of the present invention is to provide an optical multilayer body having fewer manufacturing steps and exhibiting a stronger function regardless of the type of functional components contained in the resin layer, and a method for manufacturing the same.

本發明者為了解決上述課題而反覆進行潛心研究,結果獲得如下見解:為了達成上述目的,使用丙烯酸膜來代替纖維素酯膜作為透明基材,於該丙烯酸膜上設置含有功能性成分之樹脂層,且使用使上述丙烯酸膜溶解之塗液作為構成該樹脂層之塗液,基於該溶解之程度,上述功能性成分容易地偏靠化。其結果,發現可提供製造步驟少,且不論樹脂層所含之功能性成分之種類均更強地表現功能之光學積層體。 The present inventors conducted diligent research in order to solve the above-mentioned problems. As a result, they obtained the following insight: In order to achieve the above-mentioned object, an acrylic film was used as a transparent substrate instead of a cellulose ester film, and a resin layer containing a functional component was provided on the acrylic film. Furthermore, the coating liquid in which the acrylic film is dissolved is used as the coating liquid constituting the resin layer, and based on the degree of the dissolution, the functional components are easily biased. As a result, it was found that it is possible to provide an optical multilayer body that has fewer manufacturing steps and that exhibits functions more strongly regardless of the type of functional component contained in the resin layer.

本發明係提供以下[1]~[3]之發明者。 The present invention provides the inventors of the following [1] to [3].

[1]一種光學積層體之製造方法,其依序進行如下步驟:塗佈步驟(A),其係於丙烯酸基材(acrylic based material)上塗佈至少含有功能性成分之游離輻射硬化性樹脂組成物A而形成未硬化樹脂層;減厚步驟(B),其係藉由該未硬化樹脂層而使丙烯酸基材溶解,使丙烯酸基材之厚度減少1.0~15.0%;及硬化步驟(C),其係照射游離輻射使該未硬化樹脂層硬化而形成樹脂層;藉此,使功能性成分向該樹脂層表面側偏靠。 [1] A method for manufacturing an optical laminated body, which sequentially performs the following steps: a coating step (A), which coats an acrylic base material (acrylic based material) with a radiation-hardening resin containing at least a functional component The composition A forms an unhardened resin layer; the step of reducing the thickness (B) is to dissolve the acrylic substrate by the unhardened resin layer and reduce the thickness of the acrylic substrate by 1.0 to 15.0%; and the hardening step (C ), Which irradiates free radiation to harden the uncured resin layer to form a resin layer; thereby, the functional component is biased toward the surface side of the resin layer.

[2]如上述[1]記載之光學積層體之製造方法,其中,上述游離輻射硬化性樹脂組成物A含有聚伸烷基二醇二(甲基)丙烯酸酯(polyalkylene glycol di(meth)acrylate)。 [2] The method for producing an optical laminated body according to the above [1], wherein the free radiation-curable resin composition A contains polyalkylene glycol di (meth) acrylate ).

[3]一種光學積層體,其係藉由依序進行如下步驟,使功能性成分向該樹脂層表面側偏靠而成,上述步驟係:塗佈步驟(A),其係於丙烯酸基材上塗佈含有功能性成分之游離輻射硬化性樹脂組成物A而形成未硬化樹脂層;減厚步驟(B),其係藉由該未硬化樹脂層而使丙烯酸基材溶解,使丙烯酸基材之厚度減少1.0~15.0%;及硬化步驟(C),其係使該未硬化樹脂層硬化而形成樹脂層。 [3] An optical laminate, which is obtained by sequentially performing the following steps to bias a functional component toward the surface side of the resin layer, the above step is: a coating step (A), which is on an acrylic substrate The free radiation-curable resin composition A containing a functional component is applied to form an uncured resin layer; the step of reducing the thickness (B) is to dissolve the acrylic substrate with the uncured resin layer and to dissolve the acrylic substrate. The thickness is reduced by 1.0 to 15.0%; and in the curing step (C), the uncured resin layer is cured to form a resin layer.

根據本發明,可提供一種製造步驟少,且不論樹脂層所含之功能性成分之種類均更強地表現功能之光學積層體及其製造方法。 According to the present invention, it is possible to provide an optical multilayer body having fewer manufacturing steps and exhibiting a stronger function regardless of the type of functional component contained in the resin layer, and a method for manufacturing the same.

具體而言,藉由採用本發明之製造方法,無需對功能性粒子實施特別之處理,因此材料選擇之範圍較廣,且製造條件之限制得到緩和,亦無需特別之處理步驟。又,製造步驟少,且不論樹脂層所含之功能性成分之種類均更強地表現功能,可廉價地賦予廣泛之功能。 Specifically, by adopting the manufacturing method of the present invention, there is no need to perform special treatment on the functional particles, so the range of material selection is wide, the limitation of manufacturing conditions is eased, and no special processing steps are required. In addition, the number of manufacturing steps is small, and the function is more strongly expressed regardless of the type of the functional component contained in the resin layer, and a wide range of functions can be provided at low cost.

進而,藉由使用本案之方法,除上述本案之目的外,亦帶來下述效果。 Furthermore, by using the method of the present case, in addition to the purpose of the present case, the following effects are brought.

(1)藉由使用耐濕熱性良好之丙烯酸基材來代替纖維素酯膜,而可改善在使用纖維素酯膜之偏光板中表現之高溫多濕之環境下之偏光功能或色相等偏光板功能之下降的因吸濕或吸水引起之翹曲等缺點。又,丙烯酸基材較纖維素酯膜廉價,易於在市場取得,故具有可進一步抑制製造成本的優勢。 (1) By using an acrylic substrate with good moisture and heat resistance instead of cellulose ester film, it can improve the polarizing function or color-equivalent polarizing plate in a high-temperature and high-humidity environment exhibited in a polarizing plate using a cellulose ester film. The decline in function is due to the disadvantages of warping caused by moisture absorption or water absorption. In addition, an acrylic substrate is cheaper than a cellulose ester film and is easily available in the market, so it has the advantage of further suppressing manufacturing costs.

(2)於丙烯酸基材之單面或者兩面形成有硬塗層等樹脂層之光學積層體具有與使用纖維素膜基材之情形相比,基材與樹脂層之密接性較差之缺點。然而,本發明之光學積層體藉由使用含有使丙烯酸基材溶解之黏合劑之塗液作為構成樹脂層之塗液,丙烯酸基材之成分溶出至樹脂層,兩者於兩者之界面附近牢固地連結,可提高丙烯酸基材與樹脂層之密接性。又,於丙烯酸基材之成分溶出至樹脂層時,樹脂層之功能性成分向樹脂層之表面偏靠,可賦予基於該功能性成分之表面物性。 (2) The optical laminated body in which a resin layer such as a hard coat layer is formed on one or both sides of the acrylic substrate has a disadvantage that the adhesion between the substrate and the resin layer is poorer than when a cellulose film substrate is used. However, in the optical multilayer body of the present invention, by using a coating liquid containing a binder for dissolving an acrylic substrate as the coating liquid constituting the resin layer, the components of the acrylic substrate are eluted to the resin layer, and the two are firmly near the interface between the two. Ground bonding can improve the adhesion between the acrylic substrate and the resin layer. In addition, when the components of the acrylic base material are eluted to the resin layer, the functional components of the resin layer are biased toward the surface of the resin layer, and surface properties based on the functional components can be imparted.

(3)通常,於丙烯酸基材之單面或者兩面形成有硬塗層等樹脂層之光學積層體具有如下等缺點:於丙烯酸基材與樹脂層之間產生折射率差,於使用該光學積層體形成偏光板等之情形時,產生干涉條紋而成為外觀不 良。然而,如上所述,本發明之光學積層體中,丙烯酸基材之成分溶出於樹脂層,故丙烯酸基材與樹脂層之界面上之折射率之變化得到緩和,不產生干涉條紋,可改善外觀不良。 (3) Generally, an optical laminated body in which a resin layer such as a hard coat layer is formed on one or both sides of an acrylic substrate has disadvantages such as a refractive index difference between the acrylic substrate and the resin layer, and the optical laminate is used. When the body is formed with a polarizing plate, etc., interference fringes occur and the appearance is not changed. good. However, as described above, in the optical laminate of the present invention, the components of the acrylic substrate are dissolved in the resin layer, so the change in the refractive index at the interface between the acrylic substrate and the resin layer is reduced, no interference fringes are generated, and the appearance can be improved. bad.

圖1係表示藉由實施例1之光學積層體之製造方法而獲得之光學積層體之剖面的掃描型穿透式電子顯微鏡(STEM)之照片。 FIG. 1 is a photograph of a scanning transmission electron microscope (STEM) showing a cross section of an optical multilayer body obtained by the method for manufacturing an optical multilayer body of Example 1. FIG.

圖2係表示藉由比較例2之光學積層體之製造方法而獲得之光學積層體之剖面的掃描型穿透式電子顯微鏡(STEM)之照片。 FIG. 2 is a photograph of a scanning transmission electron microscope (STEM) showing a cross section of an optical multilayer body obtained by the method for manufacturing an optical multilayer body of Comparative Example 2. FIG.

圖3係表示藉由實施例18之光學積層體之製造方法而獲得之光學積層體之剖面的掃描型穿透式電子顯微鏡(STEM)之局部放大照片。 FIG. 3 is a partially enlarged photograph of a scanning transmission electron microscope (STEM) showing a cross section of an optical multilayer body obtained by the method for manufacturing an optical multilayer body of Example 18. FIG.

圖4係將表示藉由實施例18之光學積層體之製造方法而獲得之光學積層體之樹脂層之剖面的掃描型穿透式電子顯微鏡(STEM)之局部放大照片自樹脂層之表面側向丙烯酸基材側排列者。 FIG. 4 is a partially enlarged photograph of a scanning transmission electron microscope (STEM) showing a cross section of a resin layer of an optical laminate obtained by the method for manufacturing an optical laminate in Example 18 from the surface of the resin layer to the side Acrylic substrate side alignment.

圖5係將表示藉由比較例9之光學積層體之製造方法而獲得之光學積層體之樹脂層之剖面的掃描型穿透式電子顯微鏡(STEM)之局部放大照片自樹脂層之表面側向丙烯酸基材側排列者。 FIG. 5 is a partially enlarged photograph of a scanning transmission electron microscope (STEM) showing a cross-section of a resin layer of an optical laminate obtained by the method of manufacturing an optical laminate of Comparative Example 9 from the surface side of the resin layer Acrylic substrate side alignment.

本發明之製造方法之特徵在於依序進行如下步驟:塗佈步驟(A),其係於丙烯酸基材上塗佈至少含有功能性成分之游離輻射硬化性樹脂組成物A而形成未硬化樹脂層;減厚步驟(B),其係藉由該未硬化樹脂 層而使丙烯酸基材溶解,使丙烯酸基材之厚度減少1.0~15.0%;及硬化步驟(C),其係照射游離輻射使該未硬化樹脂層硬化而形成樹脂層;藉此使功能性成分向該樹脂層表面側偏靠。 The manufacturing method of the present invention is characterized by sequentially carrying out the following steps: a coating step (A), which coats an acrylic substrate with a free radiation-curable resin composition A containing at least a functional component to form an unhardened resin layer ; Thickening step (B), which is performed by the uncured resin Layer to dissolve the acrylic substrate and reduce the thickness of the acrylic substrate by 1.0 to 15.0%; and a curing step (C), which irradiates free radiation to harden the unhardened resin layer to form a resin layer; thereby making the functional component It leans toward this resin layer surface side.

本發明係至少依序進行上述(A)~(C)步驟,但亦可於發揮本發明之效果之範圍內,於各個步驟間含有其他步驟。 In the present invention, at least the above steps (A) to (C) are performed in order. However, other steps may be included between the steps within the scope of exerting the effects of the present invention.

以下,詳細地對各步驟進行說明。 Hereinafter, each step will be described in detail.

(A)步驟及(B)步驟 Steps (A) and (B)

本發明之製造方法中之(A)步驟係於丙烯酸基材上塗佈含有功能性成分之游離輻射硬化性樹脂組成物A而形成未硬化樹脂層之塗佈步驟,(B)步驟係藉由該未硬化樹脂層而使丙烯酸基材溶解,使丙烯酸基材之厚度減少1.0~15.0%之減厚步驟。 The step (A) in the manufacturing method of the present invention is a coating step in which an uncured resin layer is formed by coating a free radiation-curable resin composition A containing a functional component on an acrylic substrate, and the step (B) is performed by This unhardened resin layer dissolves the acrylic substrate and reduces the thickness of the acrylic substrate by a thickness reduction step of 1.0 to 15.0%.

圖1係表示藉由實施例1之光學積層體之製造方法而獲得之光學積層體之剖面的掃描型穿透式電子顯微鏡(STEM)之照片。又,圖2係表示藉由比較例2之光學積層體之製造方法而獲得之光學積層體之剖面的掃描型穿透式電子顯微鏡(STEM)之照片。可知雖然實施例1及比較例2均使用厚度為40μm之丙烯酸基材,但圖1(實施例1)之丙烯酸基材之厚度減少3μm(7.5%),與此相對,圖2(比較例2)之丙烯酸基材之厚度幾乎未減少。 FIG. 1 is a photograph of a scanning transmission electron microscope (STEM) showing a cross section of an optical multilayer body obtained by the method for manufacturing an optical multilayer body of Example 1. FIG. In addition, FIG. 2 is a photograph of a scanning transmission electron microscope (STEM) showing a cross section of an optical multilayer body obtained by the method for manufacturing an optical multilayer body of Comparative Example 2. It can be seen that although the acrylic substrate having a thickness of 40 μm was used in both Example 1 and Comparative Example 2, the thickness of the acrylic substrate in FIG. 1 (Example 1) was reduced by 3 μm (7.5%). In contrast, FIG. 2 (Comparative Example 2) ) The thickness of the acrylic substrate is hardly reduced.

<丙烯酸基材> <Acrylic substrate>

作為丙烯酸基材所含有之丙烯酸樹脂並無特別限定,例如較佳為將1種(甲基)丙烯酸烷基酯或組合2種以上聚合而成者,更具體而言,較佳為使用(甲基)丙烯酸甲酯獲得者。 The acrylic resin contained in the acrylic substrate is not particularly limited. For example, it is preferably one obtained by polymerizing one (meth) acrylic acid alkyl ester or a combination of two or more. More specifically, it is preferable to use (a Base) methyl acrylate recipient.

又,亦可使用具有內酯環結構之丙烯酸樹脂、具有醯亞胺環結構之丙烯酸樹脂等具有環結構者。下文對該等樹脂進行詳述。 In addition, those having a ring structure such as an acrylic resin having a lactone ring structure and an acrylic resin having a fluorene imine ring structure can also be used. These resins are described in detail below.

本發明之光學積層體藉由使基材含有丙烯酸樹脂,而與具備由TAC所構成之基材者相比,耐濕熱性優異,並且可較佳地防止褶皺之產生。再者,於本說明書中,所謂「丙烯酸樹脂」係指丙烯酸系樹脂及/或甲基丙烯酸系樹脂。 The optical laminated body of the present invention has an acrylic resin in the base material, which is superior to those having a base material made of TAC in that it has excellent heat and humidity resistance and can prevent the occurrence of wrinkles. In addition, in this specification, "acrylic resin" means an acrylic resin and / or a methacrylic resin.

於本發明中重要的是於下文詳述之減厚步驟(B)中,藉由未硬化樹脂層而使丙烯酸基材溶解,使丙烯酸基材之厚度減少1.0~15.0%。即,本發明中之丙烯酸基材藉由利用含有功能性成分之游離輻射硬化性樹脂組成物A、特別是利用該樹脂組成物A所含之溶劑而侵蝕構成該丙烯酸基材,並且使該丙烯酸樹脂溶出至未硬化樹脂層,而減少丙烯酸基材之厚度。 What is important in the present invention is that in the thickness reduction step (B) detailed below, the acrylic substrate is dissolved by the uncured resin layer to reduce the thickness of the acrylic substrate by 1.0 to 15.0%. That is, the acrylic base material in the present invention is eroded to form the acrylic base material by using a free radiation-curable resin composition A containing a functional component, in particular, a solvent contained in the resin composition A, and the acrylic The resin is eluted to the unhardened resin layer, thereby reducing the thickness of the acrylic substrate.

於減厚步驟(B)中,若丙烯酸基材之厚度之減少率未達1.0%,則丙烯酸基材中之成分不會充分地轉移至樹脂層,而無法使樹脂層中之功能性成分向表面偏靠,並且無法使丙烯酸基材與樹脂層之密接性變良好,進而無法防止干涉條紋。又,於減厚步驟(B)中,若丙烯酸基材之厚度之減少率超過15.0%,則丙烯酸基材之強度不足,於減厚步驟(B)或此後之使用過程等中會於基材產生破裂。 In the thickness reduction step (B), if the reduction rate of the thickness of the acrylic substrate is less than 1.0%, the components in the acrylic substrate will not be sufficiently transferred to the resin layer, and the functional components in the resin layer cannot be oriented. The surface is biased, and the adhesion between the acrylic substrate and the resin layer cannot be improved, and further, interference fringes cannot be prevented. In addition, in the thickness reduction step (B), if the reduction rate of the thickness of the acrylic substrate exceeds 15.0%, the strength of the acrylic substrate is insufficient, and it may be applied to the substrate during the thickness reduction step (B) or subsequent use processes. Rupture.

減厚步驟(B)中之丙烯酸基材之厚度之減少率較佳為3.0~13.0%。 The reduction rate of the thickness of the acrylic substrate in the thickness reduction step (B) is preferably 3.0 to 13.0%.

於減厚步驟(B)中,丙烯酸基材之厚度是否減少可如字面所述測定減厚步驟(B)之前後之厚度之變化,但例如即便於減厚步驟(B)後,亦可藉由對未塗佈游離輻射硬化性樹脂組成物A之部位之丙烯酸基材之厚度與 塗佈有游離輻射硬化性樹脂組成物A之部位之丙烯酸基材之厚度進行比較而進行確認。再者,於減厚步驟(B)前之丙烯酸基材之厚度不均為明顯之情形時,較佳為在相對較接近之部位進行塗佈部位與未塗佈部位之丙烯酸基材之厚度的比較。 In the thickness reduction step (B), whether the thickness of the acrylic substrate is reduced can be measured literally as described before and after the thickness reduction step (B), but for example, even after the thickness reduction step (B), The thickness and thickness of the acrylic substrate on the portion where the free radiation-curable resin composition A is not applied are The thicknesses of the acrylic substrates at the locations where the free radiation-curable resin composition A was applied were compared and confirmed. In addition, when the thickness of the acrylic substrate before the thickness reduction step (B) is not obvious, it is preferable that the thickness of the acrylic substrate of the coated portion and the uncoated portion be relatively close. Compare.

再者,於本發明中,減厚步驟(B)後之丙烯酸基材之厚度係設為表示光學積層體之剖面的掃描型穿透式電子顯微鏡(STEM)之照片之寬度30μm之平均值。例如,於圖3般丙烯酸基材之表面粗糙之情形時,算出在STEM之照片之寬度30μm之區域內,自丙烯酸基材之與樹脂層為相反側之面至樹脂層之平均距離,將該平均距離設為減厚步驟(B)後之丙烯酸基材之厚度。又,硬化步驟(C)後之樹脂層之厚度(樹脂層之成分與丙烯酸基材之成分渾然一體化並完成硬化之層之厚度)係算出於STEM之照片之寬度30μm之區域內,自樹脂層之表面至丙烯酸基材之平均距離,將該平均距離設為樹脂層之厚度。 In addition, in the present invention, the thickness of the acrylic substrate after the thickness reduction step (B) is an average value of a width of 30 μm of a scanning transmission electron microscope (STEM) photograph showing a cross section of the optical laminate. For example, when the surface of the acrylic substrate is rough as shown in FIG. 3, the average distance from the surface of the acrylic substrate opposite to the resin layer to the resin layer is calculated in a 30 μm width area of the STEM photograph. The average distance is set as the thickness of the acrylic substrate after the thickness reduction step (B). In addition, the thickness of the resin layer after the curing step (C) (the thickness of the layer of the resin layer and the composition of the acrylic substrate are completely integrated to complete the curing) is calculated in a 30 μm width area of the STEM photograph from the resin The average distance from the surface of the layer to the acrylic substrate was set as the thickness of the resin layer.

作為上述丙烯酸基材之厚度,較佳為20~300μm,更佳為30~200μm,進而較佳為30~100μm。若丙烯酸基材為20μm以上,則即便經過減厚步驟(B),基材亦不易破裂,並且不易於硬化步驟(C)之後捲曲。又,若丙烯酸基材為300μm以下,則本發明之光學積層體變薄,光穿透性等光學特性優異。 The thickness of the acrylic substrate is preferably 20 to 300 μm, more preferably 30 to 200 μm, and even more preferably 30 to 100 μm. When the acrylic base material is 20 μm or more, the base material is not easily cracked even after the thickness reduction step (B), and it is not easy to curl after the hardening step (C). In addition, when the acrylic substrate is 300 μm or less, the optical laminate of the present invention becomes thin, and optical properties such as light permeability are excellent.

又,於減厚步驟(B)中,較佳為樹脂層形成後之丙烯酸基材之厚度相對於樹脂層形成前之丙烯酸基材之厚度減少0.5~5.0μm,更佳為減少1.5~5.0μm。若為該範圍之減少,則可更充分地發揮上述本發明之效果。 In the thickness reduction step (B), it is preferred that the thickness of the acrylic substrate after the resin layer is formed be reduced by 0.5 to 5.0 μm, and more preferably reduced by 1.5 to 5.0 μm compared to the thickness of the acrylic substrate before the resin layer is formed. . If it falls within this range, the effects of the present invention described above can be more fully exhibited.

再者,本發明中之丙烯酸基材較佳為延伸丙烯酸基材。藉由設為延伸丙烯酸基材,可使基材之強度或尺寸穩定性變良好。 Furthermore, the acrylic substrate in the present invention is preferably an extended acrylic substrate. By using an extended acrylic substrate, the strength or dimensional stability of the substrate can be improved.

作為上述具有內酯環結構之丙烯酸樹脂之具體例,例如可列舉日本特開2000-230016號公報、日本特開2001-151814號公報、日本特開2002-120326號公報、日本特開2002-254544號公報、日本特開2005-146084號公報等中所記載者。 Specific examples of the acrylic resin having a lactone ring structure include, for example, Japanese Patent Laid-Open No. 2000-230016, Japanese Patent Laid-Open No. 2001-151814, Japanese Patent Laid-Open No. 2002-120326, and Japanese Patent Laid-Open No. 2002-254544. It is described in Japanese Patent Publication No. 2005-146084 and the like.

作為上述具有內酯環結構之丙烯酸樹脂,較佳為具有以下述通式(1)表示之內酯環結構者。 The acrylic resin having a lactone ring structure is preferably one having a lactone ring structure represented by the following general formula (1).

通式(1)中,R1、R2及R3分別獨立地表示氫原子或碳數為1~20之有機基。再者,上述有機基亦可含有氧原子。 In the general formula (1), R 1 , R 2 and R 3 each independently represent a hydrogen atom or an organic group having 1 to 20 carbon atoms. The organic group may contain an oxygen atom.

作為上述具有內酯環結構之丙烯酸樹脂之結構中之以通式(1)表示之內酯環結構之含有率,較佳為5~90質量%,更佳為10~70質量%,進而較佳為10~60質量%,最佳為10~50質量%。若以上述通式(1)表示之內酯環結構之含有率為5質量%以上,則耐熱性、耐溶劑性、表面硬度改善,若為90質量%以下,則成形加工性改善。 The content of the lactone ring structure represented by the general formula (1) in the structure of the acrylic resin having the lactone ring structure described above is preferably 5 to 90% by mass, more preferably 10 to 70% by mass, and more It is preferably 10 to 60% by mass, and most preferably 10 to 50% by mass. When the content rate of the lactone ring structure represented by the said General formula (1) is 5 mass% or more, heat resistance, solvent resistance, and surface hardness will improve, and 90 mass% or less will improve moldability.

上述具有內酯環結構之丙烯酸樹脂之重量平均分子量較佳為1000~200萬,更佳為5000~100萬,進而較佳為1萬~50萬,最佳為5萬~50萬。若上述具有內酯環結構之丙烯酸樹脂之重量平均分子量處於上 述範圍內,則就上述本發明之效果之觀點而言較佳。 The weight average molecular weight of the above acrylic resin having a lactone ring structure is preferably 10 to 2 million, more preferably 50 to 1 million, still more preferably 10,000 to 500,000, and most preferably 50,000 to 500,000. If the weight average molecular weight of the above acrylic resin having a lactone ring structure is above Within the above range, it is preferable from the viewpoint of the effect of the present invention described above.

又,作為上述具有醯亞胺環結構之丙烯酸樹脂,例如可列舉具有戊二醯亞胺結構或N-取代順丁烯二醯亞胺結構之丙烯酸樹脂等。作為具有戊二醯亞胺結構之丙烯酸樹脂,較佳為具有以下述通式(2)表示之戊二醯亞胺結構。 Examples of the acrylic resin having a fluoreneimine ring structure include an acrylic resin having a glutariminium structure or an N-substituted maleimide structure. As the acrylic resin having a glutaridine imine structure, it is preferable to have a glutaridine imine structure represented by the following general formula (2).

上述通式(2)中,R4及R5相互獨立地表示氫原子或甲基,R6表示氫原子、碳數為1~6之直鏈烷基、環戊基、環己基、或苯基。 In the general formula (2), R 4 and R 5 each independently represent a hydrogen atom or a methyl group, and R 6 represents a hydrogen atom, a linear alkyl group having 1 to 6 carbon atoms, cyclopentyl group, cyclohexyl group, or benzene. base.

再者,此種戊二醯亞胺結構例如可藉由甲胺等醯亞胺化劑將(甲基)丙烯酸酯聚合物進行醯亞胺化而形成。此處,所謂「(甲基)丙烯酸」係指「丙烯酸」及「甲基丙烯酸」。 In addition, such a glutarimidine imine structure can be formed, for example, by amidine imidation of a (meth) acrylic acid ester polymer with a fluorinated imidating agent such as methylamine. Here, the "(meth) acrylic acid" means "acrylic acid" and "methacrylic acid".

作為上述具有N-取代順丁烯二醯亞胺結構之丙烯酸樹脂,較佳為具有以下述通式(3)表示之N-取代順丁烯二醯亞胺結構。 The acrylic resin having an N-substituted maleimide diimide structure is preferably an N-substituted maleimide diimide structure represented by the following general formula (3).

上述通式(3)中,R7及R8相互獨立地表示氫原子或甲基,R9表示氫原子、碳數為1~6之直鏈烷基、環戊基、環己基、或苯基。 In the general formula (3), R 7 and R 8 independently represent a hydrogen atom or a methyl group, and R 9 represents a hydrogen atom, a linear alkyl group having 1 to 6 carbon atoms, cyclopentyl group, cyclohexyl group, or benzene. base.

再者,於主鏈具有此種N-取代順丁烯二醯亞胺結構之丙烯酸樹脂例如可將N-取代順丁烯二醯亞胺與(甲基)丙烯酸酯共聚而形成。 Furthermore, an acrylic resin having such an N-substituted maleimide diimide structure in the main chain can be formed by copolymerizing an N-substituted maleimide diimide and a (meth) acrylate, for example.

又,上述丙烯酸樹脂之玻璃轉移點(Tg)較佳為100~150℃,更佳為105~135℃,進而較佳為110~130℃。若丙烯酸樹脂之玻璃轉移點(Tg)為100℃以上,則於形成樹脂層時,不易因樹脂層形成用組成物所含之溶劑而受到損傷,另一方面,若為150℃以下,則容易在與下文將述之樹脂層之界面形成凹凸。 The glass transition point (Tg) of the acrylic resin is preferably 100 to 150 ° C, more preferably 105 to 135 ° C, and even more preferably 110 to 130 ° C. When the glass transition point (Tg) of the acrylic resin is 100 ° C or higher, the resin layer is less likely to be damaged by the solvent contained in the composition for forming the resin layer. On the other hand, when the temperature is 150 ° C or lower, it is easy to be damaged. Unevenness is formed at the interface with the resin layer to be described later.

丙烯酸基材亦可含有除丙烯酸樹脂以外之樹脂,丙烯酸基材中之丙烯酸樹脂之比率較佳為80質量%以上,進而較佳為90質量%以上。 The acrylic substrate may contain a resin other than the acrylic resin, and the ratio of the acrylic resin in the acrylic substrate is preferably 80% by mass or more, and more preferably 90% by mass or more.

上述丙烯酸基材例如可藉由如下方式製造:於對濕度經控制之由丙烯酸樹脂所構成之顆粒(chip)進行通常之熔融擠出後,一面進行冷卻,一面向縱向(製膜方向)延伸,此後向橫向延伸。 The above-mentioned acrylic base material can be produced, for example, by performing normal melt extrusion on a chip made of acrylic resin whose humidity is controlled, then cooling it while extending it in the longitudinal direction (film-forming direction), Thereafter it extends laterally.

於上述熔融擠出步驟中,可使用單軸、雙軸、或雙軸以上之螺桿,可任意設定螺桿之旋轉方向、轉數、熔融溫度。 In the above-mentioned melt extrusion step, a uniaxial, biaxial, or more than two-screw screw can be used, and the rotation direction, number of revolutions, and melting temperature of the screw can be arbitrarily set.

上述延伸較佳為以於延伸後成為所期望之厚度之方式進行。又,延伸倍率並無限定,較佳為1.2倍以上且4.5倍以下。可任意地決定延伸時之溫度、濕度。延伸方法為普通之方法即可。 It is preferable to perform the said extending | stretching so that it may become a desired thickness after extending | stretching. The stretching magnification is not limited, but is preferably 1.2 times or more and 4.5 times or less. The temperature and humidity at the time of extension can be arbitrarily determined. The extension method may be a common method.

又,為了防止捲取丙烯酸基材時之貼附,亦可於丙烯酸基材之延伸前或後,在丙烯酸基材之至少單面形成底塗層,或對丙烯酸基材之兩側賦予輥紋。 In addition, in order to prevent the adhesion when winding the acrylic substrate, an undercoat layer may be formed on at least one side of the acrylic substrate before or after the acrylic substrate is extended, or a roller pattern may be provided on both sides of the acrylic substrate. .

上述丙烯酸基材亦可含有丙烯酸橡膠粒子、抗氧化劑、紫外線吸收劑、塑化劑等。丙烯酸橡膠粒子可容易防止丙烯酸樹脂基材之龜裂。 The acrylic substrate may contain acrylic rubber particles, an antioxidant, an ultraviolet absorber, a plasticizer, and the like. The acrylic rubber particles can easily prevent cracking of the acrylic resin substrate.

又,於本發明中,上述丙烯酸基材亦可於不脫離本發明之主旨之範圍內,進行皂化處理、輝光放電處理、電暈放電處理、電漿處理、紫外線(UV)處理、及火焰處理等表面處理。 In the present invention, the acrylic substrate may be subjected to saponification treatment, glow discharge treatment, corona discharge treatment, plasma treatment, ultraviolet (UV) treatment, and flame treatment within a range not departing from the gist of the present invention. And other surface treatment.

<含有功能性成分之游離輻射硬化性樹脂組成物A> <Free Radiation Curing Resin Composition A Containing Functional Components>

(功能性成分) (Functional ingredients)

作為功能性成分,可列舉抗靜電劑、折射率調整劑、防污劑、滑劑(slip agent)、抗反射劑、防眩劑、硬塗性賦予劑、抗黏連劑等通常用於光學片材者。 Examples of the functional component include an antistatic agent, a refractive index adjuster, an antifouling agent, a slip agent, an antireflection agent, an antiglare agent, a hard-coating imparting agent, and an anti-blocking agent. Sheeter.

作為抗靜電劑,可為有機系者,亦可為無機系者,作為有機系者,具體而言可列舉鋰離子鹽、四級銨鹽、離子性液體等離子性者,或聚噻吩、聚苯胺、聚吡咯、聚乙炔等電子傳導性者。作為無機系者,可列舉ATO、ITO、PTO、GZO、五氧化二銻、氧化鋅等金屬氧化物、銀奈米線、奈米碳管、富勒烯等。 The antistatic agent may be an organic one or an inorganic one. As the organic one, specific examples include ionic ones such as lithium ion salts, quaternary ammonium salts, and ionic liquids, or polythiophenes and polyanilines. , Polypyrrole, polyacetylene and other electronic conductivity. Examples of the inorganic system include metal oxides such as ATO, ITO, PTO, GZO, antimony pentoxide, and zinc oxide, silver nanowires, carbon nanotubes, and fullerenes.

關於折射率調整劑,作為低折射率材料,可列舉中空二氧化矽、實心二氧化矽、氟化鎂、氟化鈉等無機系材料,以及含氟單體、低聚物、聚合物等氟系材料等。另一方面,作為高折射率材料,可列舉氧化鋯、氧化鈦、ATO、ITO、PTO、GZO、五氧化二銻等無機系材料,以及含有除氯、氟以外之鹵素(溴、碘原子)之有機系材料、含有硫原子之有機系材料、於分子內具有至少1個以上之苯環骨架或萘骨架、蒽骨架之有機系材料、咔唑材料等。 Regarding the refractive index modifier, examples of the low refractive index material include inorganic materials such as hollow silica, solid silica, magnesium fluoride, and sodium fluoride; and fluorine such as fluorine-containing monomers, oligomers, and polymers. Department of materials and so on. On the other hand, examples of the high refractive index materials include inorganic materials such as zirconia, titanium oxide, ATO, ITO, PTO, GZO, and antimony pentoxide, and halogens (bromine and iodine atoms) other than chlorine and fluorine. Organic materials, organic materials containing sulfur atoms, organic materials having at least one benzene ring skeleton or naphthalene skeleton, anthracene skeleton in the molecule, carbazole materials, and the like.

又,作為防污劑,可列舉氟系樹脂、聚矽氧系樹脂、氟-聚矽氧共聚樹脂、不含氟及聚矽氧之界面活性劑等。作為滑劑,可列舉氟系樹脂、聚矽氧系樹脂、氟-聚矽氧共聚樹脂。 Examples of the antifouling agent include fluorine-based resins, polysiloxane-based resins, fluorine-polysiloxane copolymer resins, and surfactants not containing fluorine and polysiloxane. Examples of the lubricant include a fluorine-based resin, a silicone resin, and a fluorine-polysiloxane copolymer resin.

作為抗反射劑,可列舉上述低折射率材料。 Examples of the antireflection agent include the aforementioned low refractive index materials.

作為防眩劑,可列舉二氧化矽(silica)粒子、丙烯酸樹脂粒子、三聚氰胺粒子、苯并胍胺粒子、聚矽氧粒子等。作為硬塗性賦予劑,可列舉二氧化矽、氧化鋁等之實心超微粒子、異型微粒子、鏈狀微粒子、附有突起之微粒子(金平糖型微粒子)等。 Examples of the anti-glare agent include silica particles, acrylic resin particles, melamine particles, benzoguanamine particles, and polysiloxane particles. Examples of the hard-coating property imparting agent include solid ultrafine particles such as silica, alumina, and the like, shaped particles, chain-shaped particles, and fine particles with fine protrusions (gold sugar-type particles).

作為抗黏連劑,可列舉二氧化矽、丙烯酸、苯乙烯、氧化鋁等之微粒子等。 Examples of the anti-blocking agent include fine particles of silicon dioxide, acrylic acid, styrene, and alumina.

關於上述功能性成分之含量,抗靜電劑較佳為相對於游離輻射硬化性樹脂組成物A中之總固形物成分之合計質量為0.1~30質量%之範圍。折射率調整劑之含量較佳為相對於游離輻射硬化性樹脂組成物A中之總固形物成分之合計質量為5~30質量%之範圍。防污劑之含量較佳為相對於游離輻射硬化性樹脂組成物A中之總固形物成分之合計質量為0.01~5質量%之範圍。滑劑之含量較佳為相對於游離輻射硬化性樹脂組成物A中之總固形物成分之合計質量為0.01~5質量%之範圍。防眩劑較佳為相對於游離輻射硬化性樹脂組成物A中之總固形物成分之合計質量為1~20質量%之範圍。硬塗性賦予劑較佳為相對於游離輻射硬化性樹脂組成物A中之總固形物成分之合計質量為5~40質量%之範圍。抗黏連劑較佳為相對於游離輻射硬化性樹脂組成物A中之總固形物成分之合計質量為0.1~5質量%之範圍。 Regarding the content of the functional component, the antistatic agent is preferably in a range of 0.1 to 30% by mass based on the total mass of the total solid component in the free radiation-curable resin composition A. The content of the refractive index adjuster is preferably in a range of 5 to 30% by mass based on the total mass of the total solid components in the free radiation-curable resin composition A. The content of the antifouling agent is preferably in a range of 0.01 to 5% by mass with respect to the total mass of the total solid components in the free radiation-curable resin composition A. The content of the lubricant is preferably in a range of 0.01 to 5% by mass based on the total mass of the total solid components in the free radiation-curable resin composition A. The anti-glare agent is preferably in a range of 1 to 20% by mass based on the total mass of the total solid components in the free radiation-curable resin composition A. The hard-coating property imparting agent is preferably in a range of 5 to 40% by mass based on the total mass of the total solid components in the free radiation-curable resin composition A. The anti-blocking agent is preferably in a range of 0.1 to 5% by mass based on the total mass of the total solid components in the free radiation-curable resin composition A.

再者,如下所述,於本發明中,功能性成分向樹脂層之上表面偏靠化,因此能夠以更少之含量表現上述功能性成分之效果。 Furthermore, as described below, in the present invention, since the functional component is biased toward the upper surface of the resin layer, the effect of the above-mentioned functional component can be expressed in a smaller content.

如圖3及圖4所示,本發明之光學積層體之功能性成分向樹脂層之上表面偏靠化,因此可更強地表現功能性成分之功能。例如,於本發明之光學積層體之樹脂層含有抗靜電劑作為功能性成分之情形時,抗靜電劑向樹脂層之表面側偏靠,故與使相同量之抗靜電劑均勻分散之情形相比,更強地表現抗靜電性能。 As shown in FIG. 3 and FIG. 4, since the functional components of the optical laminate of the present invention are biased toward the upper surface of the resin layer, the functions of the functional components can be more strongly expressed. For example, in the case where the resin layer of the optical laminate of the present invention contains an antistatic agent as a functional component, the antistatic agent is biased toward the surface side of the resin layer, which is in contrast to the case where the same amount of the antistatic agent is uniformly dispersed. Than, stronger antistatic performance.

同樣地,於樹脂層含有防眩劑之情形時,進一步防止映入,於含有低折射率劑之情形時,反射率進一步下降,於含有硬塗性賦予劑之情形時,硬塗性能進一步提高。 Similarly, when the resin layer contains an anti-glare agent, reflection is further prevented. When a low refractive index agent is included, the reflectance is further reduced. When a hard coating property imparting agent is included, the hard coating performance is further improved. .

再者,如圖5所示,於不溶解丙烯酸基材而形成樹脂層之情形時,無法使功能性成分向樹脂層之上表面偏靠。 Further, as shown in FIG. 5, when the resin layer is formed without dissolving the acrylic substrate, the functional component cannot be biased toward the upper surface of the resin layer.

於本發明中,對於功能性成分向樹脂層之上表面偏靠化之機制係如下般推測。即,推測伴隨下述之溶劑揮發之動作,溶解之丙烯酸基材之材料成分流出至樹脂層中,賦予朝上層推頂功能性成分之力。 In the present invention, the mechanism by which the functional component is biased toward the upper surface of the resin layer is estimated as follows. That is, it is presumed that the material component of the dissolved acrylic substrate flows out into the resin layer with the action of the solvent volatilization described below, and gives a force to push the functional component toward the upper layer.

因此,先前於功能性成分相對於作為基質之樹脂成分之比重較輕之情形時,因該比重差而使功能性成分向上層方向移動,但於本發明之情形時,認為即便為比重較樹脂成分重者,亦可使功能性成分向樹脂層表面偏靠。 Therefore, in the case where the specific gravity of the functional component relative to the resin component of the matrix is relatively light, the functional component is moved to the upper direction due to the difference in specific gravity. However, in the case of the present invention, it is considered that If the component is heavy, the functional component may be biased toward the surface of the resin layer.

特別是於功能性成分為四級銨鹽等親水性之成分、或防污劑、滑劑等表面張力較低之成分之情形時,功能性成分變得容易向樹脂層之上方偏靠化。又,於功能性成分與樹脂層之樹脂之相溶性較丙烯酸基材中之丙烯酸樹脂良好之情形時,功能性成分變得容易向樹脂層之上方偏靠化。 In particular, when the functional component is a hydrophilic component such as a quaternary ammonium salt, or a component having a low surface tension such as an antifouling agent or a slip agent, the functional component tends to be biased toward the upper side of the resin layer. In addition, when the compatibility between the functional component and the resin of the resin layer is better than that of the acrylic resin in the acrylic substrate, the functional component tends to be biased toward the upper side of the resin layer.

再者,如上所述,丙烯酸基材之材料成分流出至樹脂層中,因此於丙烯酸基材-樹脂層界面產生適度之凹凸,丙烯酸基材與樹脂層間之密接性變良好,並且根據地點不同,光學距離不同,因此干涉條紋變得不鮮明,抗干涉條紋性亦變良好。 In addition, as described above, the material components of the acrylic substrate flow out into the resin layer, so that there are moderate irregularities at the interface between the acrylic substrate and the resin layer, and the adhesion between the acrylic substrate and the resin layer becomes better. Optical distances are different, so interference fringes are not clear, and anti-interference fringes are also good.

又,功能性成分多數情況下其折射率與作為基材之丙烯酸不同,故若功能性成分均勻分散於樹脂層中,則於丙烯酸基材與樹脂層中產生折射率差,容易產生干涉條紋。與此相對,本發明之光學積層體由於功能性成分幾乎不存在於丙烯酸基材-樹脂層界面,故可不易產生起因於折射率差之干涉條紋。 In addition, the functional component often has a refractive index different from that of acrylic as the base material. Therefore, if the functional component is uniformly dispersed in the resin layer, a refractive index difference occurs between the acrylic base material and the resin layer, and interference fringes tend to occur. On the other hand, since the optical laminated body of the present invention hardly exists at the acrylic substrate-resin layer interface, it is difficult to generate interference fringes due to the difference in refractive index.

(游離輻射硬化性樹脂) (Free radiation curable resin)

於本說明書中,所謂游離輻射硬化性樹脂組成物係表示電子束硬化性樹脂組成物或紫外線硬化性樹脂組成物。作為游離輻射硬化性樹脂,較佳為以聚伸烷基二醇二(甲基)丙烯酸酯為主成分。具體而言,游離輻射硬化性樹脂中之聚伸烷基二醇二(甲基)丙烯酸酯之含量以固形物成分換算計較佳為25~100質量%,更佳為50~100質量%。 As used herein, the term "radiation-curable resin composition" means an electron beam-curable resin composition or an ultraviolet-curable resin composition. The free radiation curable resin is preferably a polyalkylene glycol di (meth) acrylate as a main component. Specifically, the content of the polyalkylene glycol di (meth) acrylate in the free radiation curable resin is preferably 25 to 100% by mass, and more preferably 50 to 100% by mass in terms of solid content.

丙烯酸基材亦藉由溶劑而溶解,但可藉由溶劑與聚伸烷基二醇二(甲基)丙烯酸酯之相乘作用,而使丙烯酸基材更易於溶解。又,聚伸烷基二醇二(甲基)丙烯酸酯容易與丙烯酸基材之樹脂成分混合。因此,藉由使用聚伸烷基二醇二(甲基)丙烯酸酯作為游離輻射硬化性樹脂,可容易使功能性成分向樹脂層之上方偏靠化。 The acrylic substrate is also dissolved by the solvent, but the acrylic substrate can be more easily dissolved by the multiplication of the solvent and the polyalkylene glycol di (meth) acrylate. In addition, polyalkylene glycol di (meth) acrylate is easily mixed with the resin component of the acrylic substrate. Therefore, by using a polyalkylene glycol di (meth) acrylate as the radiation-hardenable resin, it is possible to easily bias the functional component above the resin layer.

作為聚伸烷基二醇二(甲基)丙烯酸酯,可列舉二乙二醇二(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、四乙二醇二(甲基)丙烯酸酯等聚 乙二醇二(甲基)丙烯酸酯,二丙二醇二(甲基)丙烯酸酯等聚丙二醇二(甲基)丙烯酸酯,及二丁二醇二(甲基)丙烯酸酯、三丁二醇二(甲基)丙烯酸酯、四丁二醇二(甲基)丙烯酸酯等聚丁二醇二(甲基)丙烯酸酯。 Examples of the polyalkylene glycol di (meth) acrylate include diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, and tetraethylene glycol di (meth) Polyacrylate Polypropylene glycol di (meth) acrylates such as ethylene glycol di (meth) acrylate, dipropylene glycol di (meth) acrylate, and dibutyl glycol di (meth) acrylate, tributyl glycol di (meth) acrylate Polybutylene glycol di (meth) acrylates such as meth) acrylates and tetrabutanediol di (meth) acrylates.

上述聚伸烷基二醇二(甲基)丙烯酸酯較佳為分子量為180~1000者,更佳為分子量為200~750者,特佳為分子量為220~450者。若該分子量處於該範圍內,則丙烯酸基材與樹脂層之密接性或抗干涉條紋性優異,並且可容易使功能性成分向樹脂層之上方偏靠。 The polyalkylene glycol di (meth) acrylate is preferably one having a molecular weight of 180 to 1,000, more preferably one having a molecular weight of 200 to 750, and particularly preferably one having a molecular weight of 220 to 450. When the molecular weight is within this range, the acrylic substrate and the resin layer are excellent in adhesion or interference fringing resistance, and the functional component can be easily biased above the resin layer.

游離輻射硬化性樹脂組成物A較佳為以聚伸烷基二醇二(甲基)丙烯酸酯為主成分,但亦可含有下述之其他成分。再者,於在游離輻射硬化性樹脂組成物A中混合有性質極端不同之材料之情形時,存在於在減厚步驟(B)中丙烯酸基材之成分流入於樹脂層側時,形成海島結構而使外觀受損之情況。因此,於將游離輻射硬化性樹脂組成物A之材料設為兩種成分以上之情形時,較佳為使用性質接近之材料。 The free radiation-curable resin composition A preferably contains polyalkylene glycol di (meth) acrylate as a main component, but may also contain other components described below. Furthermore, when materials with extremely different properties are mixed in the free radiation-curable resin composition A, an island structure is formed when components of the acrylic base material flow into the resin layer side in the thickness reduction step (B). And the appearance is damaged. Therefore, in a case where the material of the free radiation-curable resin composition A is two or more components, it is preferable to use a material having similar properties.

上述游離輻射硬化性樹脂組成物A亦可進而含有單官能(甲基)丙烯酸酯或三官能(甲基)丙烯酸酯。 The free radiation-curable resin composition A may further contain a monofunctional (meth) acrylate or a trifunctional (meth) acrylate.

作為單官能(甲基)丙烯酸酯之具體例,可列舉(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸己酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸苯酯、丙烯醯嗎福啉、N-丙烯醯氧基乙基六氫鄰苯二甲醯亞胺、丙烯酸四氫糠酯、丙烯酸異莰酯、丙烯酸苯氧基乙酯、丙烯酸金剛烷酯、伸烷基二醇單(甲基)丙烯酸酯(乙二醇單(甲基)丙烯酸酯、丙二醇單(甲基)丙烯酸酯、丁二醇單(甲基)丙烯酸酯等)或聚伸烷基二醇單(甲基)丙烯酸酯(聚乙二醇單(甲基)丙烯酸酯、聚丙二醇單(甲 基)丙烯酸酯、聚丁二醇單(甲基)丙烯酸酯等),特佳為伸烷基二醇單(甲基)丙烯酸酯。 Specific examples of the monofunctional (meth) acrylate include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, hexyl (meth) acrylate, and (meth) ) Cyclohexyl acrylate, 2-ethylhexyl (meth) acrylate, phenyl (meth) acrylate, propylene morpholine, N-acryloxyethyl hexahydrophthalimide, Tetrahydrofurfuryl acrylate, isoamyl acrylate, phenoxyethyl acrylate, adamantyl acrylate, alkylene glycol mono (meth) acrylate (ethylene glycol mono (meth) acrylate, propylene glycol mono ( (Meth) acrylate, butanediol mono (meth) acrylate, etc.) or polyalkylene glycol mono (meth) acrylate (polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) Acrylate), polybutylene glycol mono (meth) acrylate, etc.), particularly preferred is alkylene glycol mono (meth) acrylate.

又,作為三官能(甲基)丙烯酸酯之具體例,可列舉異氰尿酸三丙烯酸酯、聚伸烷基二醇三(甲基)丙烯酸酯(三羥甲基丙烷三(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯等)。 Specific examples of the trifunctional (meth) acrylate include isocyanurate triacrylate, polyalkylene glycol tri (meth) acrylate (trimethylolpropane tri (meth) acrylate). , Neopentaerythritol tri (meth) acrylate, etc.).

再者,作為單官能(甲基)丙烯酸酯、三官能(甲基)丙烯酸酯,亦可使用各化合物之環氧丙烷(PO)、環氧乙烷(EO)之改質品。 Further, as the monofunctional (meth) acrylate and trifunctional (meth) acrylate, modified products of propylene oxide (PO) and ethylene oxide (EO) of each compound may be used.

藉由使用單官能(甲基)丙烯酸酯,變得容易調整黏度,並且與基材之密接性亦變良好。又,單官能(甲基)丙烯酸酯可容易與丙烯酸基材中之樹脂成分混合,使功能性成分容易向樹脂層之上方偏靠化。 By using a monofunctional (meth) acrylate, it becomes easy to adjust viscosity, and adhesiveness with a base material becomes favorable. In addition, the monofunctional (meth) acrylate can be easily mixed with the resin component in the acrylic substrate, so that the functional component can be easily biased above the resin layer.

若使用三官能(甲基)丙烯酸酯,則可提高硬度。另一方面,三官能(甲基)丙烯酸酯具有不易與丙烯酸基材中之樹脂成分混合之傾向,存在變得不易使功能性成分向樹脂層之上方偏靠化之情形。 When a trifunctional (meth) acrylate is used, hardness can be improved. On the other hand, a trifunctional (meth) acrylate tends to be difficult to mix with a resin component in an acrylic substrate, and there is a case where it becomes difficult to bias a functional component upward from the resin layer.

再者,於本說明書中,所謂「(甲基)丙烯酸酯」係指甲基丙烯酸酯及丙烯酸酯。 In addition, in this specification, "(meth) acrylate" means a methacrylate and an acrylate.

上述游離輻射硬化性樹脂組成物A亦可進而含有光聚合性聚合物、光聚合性低聚物、其他光聚合性單體等,於紫外線硬化性樹脂組成物之情形時,含有起始劑。 The above-mentioned free radiation-curable resin composition A may further contain a photopolymerizable polymer, a photopolymerizable oligomer, other photopolymerizable monomers, and the like, and in the case of the ultraviolet curable resin composition, an initiator.

(光聚合性聚合物) (Photopolymerizable polymer)

作為光聚合性聚合物,較佳為具有(甲基)丙烯醯基作為官能基者,較佳為官能基數為10~250個者,更佳為10~100個者,進而較佳為10~50個者。 As the photopolymerizable polymer, those having a (meth) acrylfluorenyl group as a functional group are preferred, and the number of functional groups is preferably 10 to 250, more preferably 10 to 100, and even more preferably 10 to 50 people.

光聚合性聚合物之重量平均分子量較佳為10,000~100,000,更佳為12,000~40,000。 The weight-average molecular weight of the photopolymerizable polymer is preferably 10,000 to 100,000, and more preferably 12,000 to 40,000.

游離輻射硬化性樹脂組成物A中之光聚合性聚合物之調配量以固形物成分換算計較佳為0~40質量%,更佳為0~30質量%。 The blending amount of the photopolymerizable polymer in the free radiation-curable resin composition A is preferably 0 to 40% by mass, more preferably 0 to 30% by mass in terms of solid content.

(光聚合性低聚物) (Photopolymerizable oligomer)

作為光聚合性低聚物,可使用二官能以上者,較佳為具有(甲基)丙烯醯基作為官能基者,較佳為官能基數為2~30個者,更佳為2~20個者,進而較佳為3~15個者。 As the photopolymerizable oligomer, one having more than two functions can be used, preferably one having a (meth) acrylfluorenyl group as a functional group, preferably one having 2 to 30 functional groups, and more preferably 2 to 20 It is further preferably 3 to 15.

光聚合性低聚物之重量平均分子量較佳為1,000~10,000,更佳為1,500~10,000。 The weight average molecular weight of the photopolymerizable oligomer is preferably 1,000 to 10,000, and more preferably 1,500 to 10,000.

游離輻射硬化性樹脂組成物A中之光聚合性低聚物之調配量以固形物成分換算計較佳為0~40質量%,更佳為0~30質量%。 The blending amount of the photopolymerizable oligomer in the free radiation-curable resin composition A is preferably 0 to 40% by mass, and more preferably 0 to 30% by mass in terms of solid content.

(其他光聚合性單體) (Other photopolymerizable monomers)

作為其他光聚合性單體,可列舉具有1個或2個以上之不飽和鍵之除上述(甲基)丙烯酸酯以外之化合物或四官能以上之(甲基)丙烯酸酯。作為除(甲基)丙烯酸酯以外之化合物,例如可列舉苯乙烯、甲基苯乙烯、N-乙烯基吡咯啶酮等單官能單體,多元醇之聚(甲基)丙烯酸酯等多官能單體等。作為四官能以上之(甲基)丙烯酸酯,可列舉新戊四醇四(甲基)丙烯酸酯、二新戊四醇六(甲基)丙烯酸酯、二新戊四醇五(甲基)丙烯酸酯等、及將該等利用環氧乙烷(EO)等改質而成之多官能化合物等。 Examples of other photopolymerizable monomers include compounds other than the above-mentioned (meth) acrylates and tetrafunctional or more (meth) acrylates having one or two or more unsaturated bonds. Examples of compounds other than (meth) acrylates include monofunctional monomers such as styrene, methylstyrene, and N-vinylpyrrolidone, and polyfunctional monomers such as poly (meth) acrylates of polyhydric alcohols.体 等。 Body and so on. Examples of the tetrafunctional or higher (meth) acrylates include neopentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, and dipentaerythritol penta (meth) acrylic acid. Esters, etc., and polyfunctional compounds modified by using ethylene oxide (EO) or the like.

可藉由該等其他光聚合性單體而調整折射率或硬度。 The refractive index or hardness can be adjusted by these other photopolymerizable monomers.

光聚合性單體之分子量較佳為200~1,000,更佳為250~750。 The molecular weight of the photopolymerizable monomer is preferably 200 to 1,000, and more preferably 250 to 750.

游離輻射硬化性樹脂組成物A中之其他光聚合性單體之調配量於發揮本發明之效果之範圍內並無特別限制,以固形物成分換算計較佳為0~40質量%,更佳為0~30質量%。 The blending amount of other photopolymerizable monomers in the free radiation-curable resin composition A is not particularly limited as long as it exhibits the effects of the present invention, and it is preferably 0 to 40% by mass in terms of solid content conversion, and more preferably 0 to 30% by mass.

(起始劑) (Starter)

作為起始劑,並無特別限定,可使用公知者,例如作為光聚合起始劑,在具體例中可列舉苯乙酮類、二苯甲酮類、米其勒苯甲醯基苯甲酸酯、α-戊基肟酯、9-氧硫類、苯丙酮類、苯偶醯類、安息香類、醯基氧化膦類。又,較佳為混合光敏劑而使用,作為其具體例,例如可列舉正丁胺、三乙胺、聚正丁基膦等。 The initiator is not particularly limited, and a known one may be used. For example, as a photopolymerization initiator, specific examples include acetophenones, benzophenones, and Michele benzamidine benzoic acid. Ester, α-pentyloxime ester, 9-oxosulfur Type, phenylacetone type, benzophenone type, benzoin type, fluorenyl phosphine oxide type. In addition, it is preferable to use a mixed photosensitizer, and specific examples thereof include n-butylamine, triethylamine, poly-n-butylphosphine, and the like.

作為上述光聚合起始劑,於上述光聚合性單體/低聚物/聚合物為具有自由基聚合性不飽和基之樹脂系之情形時,較佳為單獨或混合使用苯乙酮類、二苯甲酮類、9-氧硫類、安息香、安息香甲醚等,1-羥基-環己基-苯基-酮因與游離輻射硬化型樹脂之相溶性、及黃變亦較少之原因而特佳。又,於上述光聚合性單體/低聚物/聚合物具有陽離子聚合性官能基之情形時,作為上述光聚合起始劑,較佳為將芳香族重氮鎓鹽、芳香族鋶鹽、芳香族錪鹽、二茂金屬化合物、安息香磺酸酯等單獨或作為混合物使用。 As the photopolymerization initiator, when the photopolymerizable monomer / oligomer / polymer is a resin system having a radical polymerizable unsaturated group, it is preferable to use acetophenones alone or in combination. Benzophenones, 9-oxysulfur Type, benzoin, benzoin methyl ether, etc., 1-hydroxy-cyclohexyl-phenyl-ketone is particularly preferred due to its compatibility with free radiation-curable resins and less yellowing. When the photopolymerizable monomer / oligomer / polymer has a cationically polymerizable functional group, the photopolymerization initiator is preferably an aromatic diazonium salt, an aromatic sulfonium salt, Aromatic sulfonium salts, metallocene compounds, benzoin sulfonate and the like are used alone or as a mixture.

上述游離輻射硬化性樹脂組成物A中之起始劑之含量相對於總固形物成分之合計質量為1~10質量%。若起始劑之含量為1質量%以上,則就光學積層體中之樹脂層之硬度之觀點而言較佳,若為10質量%以下,則可抑制因起始劑過度地殘留引起之樹脂劣化,並且防止成本提昇,可獲得作為目標之樹脂層或下述之硬塗層表面之鉛筆硬度。 The content of the initiator in the above-mentioned free radiation-curable resin composition A is 1 to 10% by mass based on the total mass of the total solid component. If the content of the initiator is 1% by mass or more, it is preferable from the viewpoint of the hardness of the resin layer in the optical laminate, and if it is 10% by mass or less, the resin caused by excessive residue of the initiator can be suppressed Deterioration and prevention of cost increase, pencil hardness of the target resin layer or the hard coat surface described below can be obtained.

上述起始劑之含量之更佳之下限相對於總固形物成分之合計質量為2 質量%,更佳之上限為8質量%。藉由使上述起始劑之含量處於該範圍內,而使上述硬化變得更確實。 The lower limit of the content of the above-mentioned starter relative to the total mass of the total solids component is 2 Mass%, and a more preferable upper limit is 8 mass%. When the content of the initiator is within this range, the hardening can be made more certain.

(溶劑乾燥型樹脂) (Solvent-drying resin)

上述游離輻射硬化性樹脂組成物A亦可進而含有溶劑乾燥型樹脂。藉由併用溶劑乾燥型樹脂,可有效地防止塗佈面之被膜缺陷。再者,所謂上述溶劑乾燥型樹脂係指熱塑性樹脂等為了於塗敷時調整固形物成分而添加之僅藉由使溶劑乾燥即成為被膜之樹脂。 The above-mentioned free radiation-curable resin composition A may further contain a solvent-drying resin. By using a solvent-drying resin in combination, it is possible to effectively prevent coating defects on the coating surface. The above-mentioned solvent-drying resin refers to a resin such as a thermoplastic resin that is added to adjust a solid component during coating, and is a film that is formed by merely drying the solvent.

作為上述溶劑乾燥型樹脂,並無特別限定,通常可使用熱塑性樹脂。 The solvent-drying resin is not particularly limited, and a thermoplastic resin can be generally used.

作為上述熱塑性樹脂,並無特別限定,例如可列舉苯乙烯系樹脂、(甲基)丙烯酸系樹脂、乙酸乙烯酯系樹脂、乙烯醚系樹脂、含鹵素之樹脂、脂環式烯烴系樹脂、聚碳酸酯系樹脂、聚酯系樹脂、聚醯胺系樹脂、纖維素衍生物、聚矽氧系樹脂及橡膠或彈性體等。上述熱塑性樹脂較佳為非晶質,且可溶於有機溶劑(特別是可溶解多種聚合物或硬化性化合物之共用溶劑)。特別是就製膜性、透明性、或耐候性之觀點而言,較佳為苯乙烯系樹脂、(甲基)丙烯酸系樹脂、脂環式烯烴系樹脂、聚酯系樹脂、纖維素衍生物(纖維素酯類等)等。 The thermoplastic resin is not particularly limited, and examples thereof include a styrene resin, a (meth) acrylic resin, a vinyl acetate resin, a vinyl ether resin, a halogen-containing resin, an alicyclic olefin resin, and a polymer. Carbonate resin, polyester resin, polyamide resin, cellulose derivative, silicone resin, rubber or elastomer, etc. The thermoplastic resin is preferably amorphous and soluble in an organic solvent (especially a common solvent capable of dissolving a plurality of polymers or hardening compounds). Especially from a viewpoint of film forming property, transparency, or weather resistance, a styrene resin, a (meth) acrylic resin, an alicyclic olefin resin, a polyester resin, and a cellulose derivative are preferable. (Cellulose esters, etc.) and the like.

(溶劑) (Solvent)

上述游離輻射硬化性樹脂組成物A較佳為進而含有溶劑。 The free radiation-curable resin composition A preferably further contains a solvent.

該溶劑較佳為選擇會適度地使丙烯酸基材溶解者。更詳細而言,較佳為選擇如上所述,於減厚步驟(B)中,使樹脂層形成後之丙烯酸基材之厚度相對於樹脂層形成前之丙烯酸基材之厚度減少1.0~15.0%的溶劑。 The solvent is preferably selected from those which will moderately dissolve the acrylic substrate. In more detail, it is preferable to select the above-mentioned method. In the thickness reduction step (B), the thickness of the acrylic substrate after the resin layer is formed is reduced by 1.0 to 15.0% relative to the thickness of the acrylic substrate before the resin layer is formed. Solvent.

然而,丙烯酸基材與先前經常使用之TAC基材不同,幾乎可由所有種 類之溶劑溶解。因此,由溶劑產生之影響較強,若溶解度過強,則亦存在破裂而無法生產光學積層體之情形。因此,於溶劑中較佳為選擇以下之溶劑。又,丙烯酸基材之溶解性亦受塗佈液中之溶劑之質量比率或溶劑之乾燥溫度之影響。因此,較佳為考慮溶劑之使用量及乾燥溫度並自以下之溶劑選擇適當者。 However, acrylic substrates are different from previously used TAC substrates and can be used by almost all species. Similar solvents dissolve. Therefore, the influence caused by the solvent is strong, and if the solubility is too strong, there may be cases where it is broken and the optical laminate cannot be produced. Therefore, among the solvents, the following solvents are preferably selected. The solubility of the acrylic substrate is also affected by the mass ratio of the solvent in the coating liquid or the drying temperature of the solvent. Therefore, it is preferable to select an appropriate one from the following solvents in consideration of the amount of the solvent used and the drying temperature.

作為此種溶劑,可較佳地列舉醇類、酮類、芳香族烴類、二醇類等,若為醇則較佳為甲醇、乙醇、異丙醇、1-丁醇等低級醇類。又,除醇類以外之各溶劑存在碳數更多者良好之傾向,且存在其中蒸發速度較快者良好之傾向。具體而言,若為酮類則可例示甲基異丁基酮,若為芳香族烴類則可例示甲苯,若為二醇類則可例示丙二醇單甲醚等,亦可為該等之混合溶劑。 Examples of such a solvent include alcohols, ketones, aromatic hydrocarbons, glycols, and the like, and in the case of alcohols, lower alcohols such as methanol, ethanol, isopropanol, and 1-butanol are preferred. In addition, each solvent other than alcohols tends to be more favorable if the number of carbons is higher, and the solvent having a higher evaporation rate tends to be better. Specifically, methyl isobutyl ketone may be exemplified if it is a ketone, toluene may be exemplified if it is an aromatic hydrocarbon, propylene glycol monomethyl ether, etc. may be exemplified if it is a diol, and a mixture of these may also be exemplified. Solvent.

特別是於本發明中,就與樹脂之相溶性、塗敷性優異,又,於丙烯酸基材-樹脂層界面形成本案之特殊之凹凸形狀,進而於加工時不會發生基材斷裂之不良情況之原因而言,尤佳為含有選自甲基異丁基酮、異丙醇及1-丁醇、丙二醇單甲醚中之一種以上者。若為該等溶劑,則可不使丙烯酸基材破裂而適度地使其溶解。 Especially in the present invention, the resin has excellent compatibility and coating properties, and also forms a special uneven shape in the present case at the interface between the acrylic substrate and the resin layer, so that the failure of the substrate does not occur during processing. For reasons, it is particularly preferable to contain one or more selected from the group consisting of methyl isobutyl ketone, isopropyl alcohol, 1-butanol, and propylene glycol monomethyl ether. If it is these solvents, it can melt | dissolve moderately without breaking an acrylic base material.

另一方面,乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸丁酯等酯類;丙酮、甲基乙基酮、環己酮、二丙酮醇等酮類;溶纖素類;二烷、四氫呋喃、丙二醇單甲醚乙酸酯等醚類;己烷等脂肪族烴類;二甲苯等除甲苯以外之芳香族烴類;二氯甲烷、二氯乙烷等鹵化碳類;甲基溶纖素、乙基溶纖素等溶纖素類;乙酸溶纖素類;二甲基亞碸等亞碸類;二甲基甲醯胺、二甲基乙醯胺等醯胺類由於存在過度地溶解丙烯酸基材之情形,故 較佳為於對基材施加張力之情形時不使用。 On the other hand, esters such as methyl acetate, ethyl acetate, propyl acetate, and butyl acetate; ketones such as acetone, methyl ethyl ketone, cyclohexanone, and diacetone alcohol; Ethers such as alkane, tetrahydrofuran, propylene glycol monomethyl ether acetate; aliphatic hydrocarbons such as hexane; aromatic hydrocarbons other than toluene such as xylene; halogenated carbons such as dichloromethane, dichloroethane; methyl Fibrinolysins such as lysinolysin, ethyl lysinolysin; fibrinolysins such as acetic acid; hydrazones such as dimethylarsine; amides such as dimethylformamide and dimethylacetamide Since the acrylic substrate is excessively dissolved, it is preferably not used when tension is applied to the substrate.

上述游離輻射硬化性樹脂組成物A中之溶劑之含有比率係根據使用之溶劑之種類及溶劑之乾燥溫度,於適度地溶解丙烯酸基材之範圍內決定。上述較佳之溶劑之含量相對於游離輻射硬化性樹脂組成物A之固形物成分100質量份較佳為30~300質量份,更佳為100~220質量份。 The content ratio of the solvent in the above-mentioned free radiation-curable resin composition A is determined within a range in which the acrylic substrate is moderately dissolved according to the type of the solvent used and the drying temperature of the solvent. The content of the above-mentioned preferable solvent is preferably 30 to 300 parts by mass, and more preferably 100 to 220 parts by mass with respect to 100 parts by mass of the solid content of the free radiation-curable resin composition A.

本發明之光學積層體中之丙烯酸基材-樹脂層界面例如係藉由溶劑而適當地溶解丙烯酸基材,伴隨於此,具有適度之分子量之聚伸烷基二醇二(甲基)丙烯酸酯等滲透至丙烯酸基材。又,於樹脂層之成分滲透至丙烯酸基材時,相反地丙烯酸基材之材料成分向樹脂層方向擠出、或溶劑自丙烯酸基材向樹脂層之空氣面方向揮發等,藉此所溶解之丙烯酸基材之材料成分亦滲透至樹脂層中。認為如上所述,各成分自上部向下部、自下部向上部移動,藉此於界面產生適當之凹凸,密接性變良好,並且抗干涉條紋性亦變良好。 The acrylic substrate-resin layer interface in the optical laminate of the present invention is, for example, an acrylic substrate that is appropriately dissolved by a solvent, and a polyalkylene glycol di (meth) acrylate having a moderate molecular weight is accompanied by this. Isotonic penetration into acrylic substrate. In addition, when the components of the resin layer penetrate into the acrylic substrate, the material components of the acrylic substrate are conversely extruded in the direction of the resin layer, or the solvent is volatilized from the acrylic substrate to the air surface of the resin layer. The material component of the acrylic substrate also penetrates into the resin layer. As described above, it is considered that each component moves from the upper part to the lower part and from the lower part to the upper part, thereby generating appropriate unevenness at the interface, and the adhesiveness is improved, and the anti-interference fringing property is also improved.

(游離輻射硬化性樹脂組成物A之製備) (Preparation of Free Radiation Curable Resin Composition A)

作為游離輻射硬化性樹脂組成物A之製備方法,只要可均勻地混合各成分,則並無特別限定,例如可使用塗料振盪機、珠磨機、捏合機、攪拌機等公知之裝置而進行。 The method for producing the free radiation-curable resin composition A is not particularly limited as long as the components can be uniformly mixed, and for example, a known device such as a paint shaker, a bead mill, a kneader, and a stirrer can be used.

(塗佈方法) (Coating method)

作為將塗佈步驟(A)中之上述游離輻射硬化性樹脂組成物A塗佈至上述丙烯酸基材上之方法,並無特別限定,例如可列舉旋轉塗佈法、浸漬法、噴霧法、模嘴塗佈法、棒式塗佈法、凹版塗佈法、輥式塗佈機法、液面彎曲式塗佈法、軟版印刷法、網版印刷法、液滴塗佈機法等公知之方法。 The method for applying the free radiation-curable resin composition A in the coating step (A) to the acrylic substrate is not particularly limited, and examples thereof include a spin coating method, a dipping method, a spray method, and a mold. The nozzle coating method, the bar coating method, the gravure coating method, the roll coater method, the liquid surface bending coating method, the flexographic printing method, the screen printing method, and the droplet coater method are known. method.

(乾燥步驟) (Drying step)

其次,視需要實施乾燥步驟。存在亦藉由乾燥步驟而減少丙烯酸基材之厚度之情形,於該情形時,乾燥步驟成為(B)減厚步驟之一部分。 Second, if necessary, a drying step is performed. There are cases where the thickness of the acrylic substrate is also reduced by the drying step, and in this case, the drying step becomes part of the (B) thickness reduction step.

乾燥步驟中之乾燥時間較佳為20秒~120秒,更佳為40秒~80秒。又,乾燥步驟中之乾燥溫度較佳為40~90℃,更佳為50~80℃。若乾燥溫度超過100℃,則存在即便選擇對丙烯酸之溶解性較佳之溶劑,溶劑之滲透力等亦提昇,從而使基材破裂之情形,故乾燥溫度較佳為於無論使用哪種溶劑之情形時基本上均為90℃以下。例如,如上所述,作為較佳之溶劑,有甲基異丁基酮,但即便為該溶劑,若乾燥溫度為100℃,則亦存在藉由施加張力,丙烯酸基材斷裂之情形。 The drying time in the drying step is preferably 20 seconds to 120 seconds, and more preferably 40 seconds to 80 seconds. The drying temperature in the drying step is preferably 40 to 90 ° C, and more preferably 50 to 80 ° C. If the drying temperature exceeds 100 ° C, even if a solvent with better solubility in acrylic acid is selected, the solvent's penetrability and the like will increase, which will cause the substrate to break. Therefore, the drying temperature is preferably in the case of whichever solvent is used The temperature is basically below 90 ° C. For example, as described above, methyl isobutyl ketone is a preferred solvent. However, even if the solvent is a drying temperature of 100 ° C, the acrylic substrate may be broken by applying tension.

最低溫度只要為可使溶劑乾燥之程度即可,較佳為40℃以上。例如,於為甲基異丁基酮且乾燥溫度為30℃之情形時,會在乾燥不充分之狀態下直接藉由紫外線等進行硬化,該情形時會未順利地進行硬化,亦會產生未硬化部分。此時,存在密接性下降之情形。 The minimum temperature may be such that the solvent can be dried, and is preferably 40 ° C or higher. For example, in the case of methyl isobutyl ketone and a drying temperature of 30 ° C, curing may be performed directly by ultraviolet rays or the like in a state of insufficient drying. In this case, curing may not be performed smoothly, and unsettling may occur. Hardened part. At this time, the adhesion may be reduced.

(C)步驟 (C) Step

本發明之製造方法中之(C)步驟係照射游離輻射使未硬化樹脂層硬化而形成樹脂層之硬化步驟。 Step (C) in the manufacturing method of the present invention is a hardening step of irradiating free radiation to harden an unhardened resin layer to form a resin layer.

作為游離輻射,可列舉利用紫外線或電子束進行之照射。 Examples of the free radiation include irradiation with ultraviolet rays or electron beams.

作為紫外線源之具體例,例如可列舉超高壓水銀燈、高壓水銀燈、低壓水銀燈、碳弧燈、黑光燈螢光燈、金屬鹵化物燈等光源。又,作為紫外線之波長,可使用190~380nm之波長區域。 Specific examples of the ultraviolet light source include light sources such as an ultrahigh-pressure mercury lamp, a high-pressure mercury lamp, a low-pressure mercury lamp, a carbon arc lamp, a black light fluorescent lamp, and a metal halide lamp. As the wavelength of ultraviolet rays, a wavelength range of 190 to 380 nm can be used.

作為上述電子束照射之電子束源之具體例,可列舉柯克勞夫-華爾吞 型、凡德格拉夫型、共振變壓器型、絕緣芯變壓器型、或直線型、高頻高壓加速器型、高頻型等之各種電子束加速器。 As a specific example of the electron beam source irradiated by the above electron beam, Kirklauf-Walten Electron beam accelerators of various types, such as Vandergraff type, resonant transformer type, insulated core transformer type, or linear type, high frequency and high voltage accelerator type, and high frequency type.

再者,上述樹脂層之較佳之膜厚(樹脂層之成分與丙烯酸基材之成分渾然一體化並完成硬化之層的厚度)為0.5~100μm,更佳為0.8~20μm,就抗捲曲性或抗龜裂性特別優異而言,最佳為2~10μm之範圍。 In addition, the preferred film thickness of the above resin layer (thickness of the layer in which the components of the resin layer and the component of the acrylic substrate are completely integrated and hardened) is 0.5 to 100 μm, and more preferably 0.8 to 20 μm. Particularly, the crack resistance is particularly preferably in a range of 2 to 10 μm.

<光學積層體> <Optical laminate>

本發明之光學積層體之特徵在於依序進行如下步驟:塗佈步驟(A),其係於丙烯酸基材上塗佈含有功能性成分之游離輻射硬化性樹脂組成物A而形成未硬化樹脂層;減厚步驟(B),其係藉由該未硬化樹脂層而使丙烯酸基材溶解,使丙烯酸基材之厚度減少1.0~15.0%;及硬化步驟(C),其係將該未硬化樹脂層硬化而形成樹脂層;藉此,使功能性成分向該樹脂層表面側偏靠而成。 The optical laminated body of the present invention is characterized in that the following steps are sequentially performed: a coating step (A), which forms an uncured resin layer by coating a free radiation-curable resin composition A containing a functional component on an acrylic substrate. ; A thickness reduction step (B), which is to dissolve the acrylic substrate by the uncured resin layer, and reduce the thickness of the acrylic substrate by 1.0 to 15.0%; and a curing step (C), which is the uncured resin The layer is hardened to form a resin layer; thereby, the functional component is biased toward the surface side of the resin layer.

作為功能性成分,可使用上述各種成分,故可僅由丙烯酸基材及樹脂層構成本發明之光學積層體。 Since the various components mentioned above can be used as a functional component, the optical laminated body of this invention can be comprised only with an acrylic base material and a resin layer.

另一方面,本發明之光學積層體亦可於樹脂層上具有選自低折射率層、硬塗層、防污層、防眩層、抗靜電層、及高折射率層中之1種以上。 On the other hand, the optical laminated body of the present invention may have at least one selected from a low refractive index layer, a hard coat layer, an antifouling layer, an antiglare layer, an antistatic layer, and a high refractive index layer on the resin layer. .

<硬塗層> <Hard coating>

硬塗層較佳為由游離輻射硬化性樹脂組成物B之硬化物構成。 The hard coat layer is preferably composed of a cured product of the free radiation-curable resin composition B.

硬塗層之硬度於依據JIS K5600-5-4(1999)之鉛筆硬度試驗(負載為4.9N)中,較佳為H以上,更佳為2H以上。又,上述硬塗層亦可為含有除硬塗性賦予劑以外之上述功能性成分者。 In the pencil hardness test (load: 4.9N) according to JIS K5600-5-4 (1999), the hardness of the hard coating layer is preferably H or more, and more preferably 2H or more. Moreover, the said hard-coat layer may be a thing containing the said functional component other than a hard-coating property imparting agent.

形成硬塗層之游離輻射硬化性樹脂組成物B之詳細內容係 與上述游離輻射硬化性樹脂組成物A相同。 Details of the free radiation-curable resin composition B forming the hard coat layer are It is the same as the above-mentioned free radiation-curable resin composition A.

又,游離輻射硬化性樹脂組成物B之光聚合性單體(特別是多官能單體)之調配量相對於總固形物成分之合計質量較佳為30~100質量%,更佳為40~90質量%,進而較佳為50~80質量%。 In addition, the blending amount of the photopolymerizable monomer (especially a polyfunctional monomer) of the free radiation-curable resin composition B is preferably 30 to 100% by mass and more preferably 40 to 100% of the total mass of the total solid component. 90% by mass, more preferably 50 to 80% by mass.

進而,游離輻射硬化性樹脂組成物B之光聚合性低聚物及光聚合性聚合物之調配量之合計相對於總固形物成分之合計質量較佳為30~100質量%,更佳為40~90質量%,進而較佳為50~80質量%。 Furthermore, the total amount of the photopolymerizable oligomer and photopolymerizable polymer in the free radiation-curable resin composition B is preferably 30 to 100% by mass, and more preferably 40 to the total mass of the total solid content. ~ 90 mass%, more preferably 50 to 80 mass%.

又,硬塗層之形成方法係與上述樹脂層相同。關於其他硬塗層之詳細內容,亦與上述樹脂層相同。 The method for forming the hard coat layer is the same as that of the resin layer. The details of the other hard coat layers are also the same as those of the resin layer described above.

於本發明中,較佳為於樹脂層上積層硬塗層。為了獲得作為光學積層體之硬度,考慮使樹脂層本身變為高硬度。然而,於在丙烯酸基材上直接、即於樹脂層使用具有多官能之反應性官能基之材料而設為2H以上之高硬度之情形時,具有對硬塗層局部性地施加某種壓力之情形等時丙烯酸基材容易破裂之缺點。因此,於本發明之光學積層體中,藉由使樹脂層在與硬塗層之間,可使硬塗層之衝擊不會直接傳遞至丙烯酸基材而具有緩衝作用,故較佳。又,藉由成為樹脂層/硬塗層,而亦可較僅積層有硬塗層之情形提高硬度。 In the present invention, a hard coat layer is preferably laminated on the resin layer. In order to obtain the hardness as an optical laminate, it is considered to make the resin layer itself high in hardness. However, when a material having a polyfunctional reactive functional group and a high hardness of 2H or more is used directly on the acrylic substrate, that is, when the resin layer is made to have a high hardness of 2H or more, there is a possibility of locally applying a certain pressure to the hard coating layer. In some cases, the acrylic substrate is liable to crack. Therefore, in the optical multilayer body of the present invention, it is preferable that the impact of the hard coating layer is not directly transmitted to the acrylic substrate and has a buffering effect by having the resin layer between the hard coating layer and the hard coating layer. In addition, by forming a resin layer / hard coat layer, the hardness can be increased as compared with a case where only a hard coat layer is laminated.

然而,於積層硬塗層等之情形時,與樹脂層之間形成新界面,即成為產生干涉條紋之誘因之部分增加。於該情形時,重要的是積層之層之折射率儘可能地與其下之層接近。因此,為了良好地維持抗干涉條紋性,硬塗層之折射率較佳為與樹脂層之折射率大致相同,較佳之折射率差為0.03以下。 However, when a hard coat layer is laminated, etc., a new interface with the resin layer is formed, and the portion that causes an interference fringe is increased. In this case, it is important that the refractive index of the laminated layer be as close as possible to the underlying layer. Therefore, in order to maintain the anti-interference fringe property well, the refractive index of the hard coat layer is preferably substantially the same as the refractive index of the resin layer, and the preferable refractive index difference is 0.03 or less.

<低折射率層> <Low refractive index layer>

本發明之光學積層體較佳為於上述硬塗層上進而具有低折射率層。 The optical laminated body of the present invention preferably has a low refractive index layer on the hard coat layer.

作為上述低折射率層,較佳為使用1)含有二氧化矽或氟化鎂等之低折射率無機微粒子之樹脂、2)為低折射率樹脂之氟系樹脂、3)含有二氧化矽或氟化鎂等之低折射率無機微粒子之氟系樹脂、4)包含二氧化矽或氟化鎂等之低折射率無機薄膜等中之任一種之低折射率層形成用組成物而形成。關於除氟系樹脂以外之樹脂,可使用與上述丙烯酸樹脂相同之樹脂。 As the low-refractive index layer, it is preferable to use 1) a resin containing low-refractive index inorganic particles such as silicon dioxide or magnesium fluoride, 2) a fluorine-based resin containing a low-refractive index resin, and 3) containing silicon dioxide or A fluorine-based resin of low-refractive index inorganic fine particles such as magnesium fluoride, and 4) a composition for forming a low-refractive index layer containing any of low-refractive index inorganic films such as silicon dioxide and magnesium fluoride. Regarding the resin other than the fluorine-based resin, the same resin as the above-mentioned acrylic resin can be used.

又,上述二氧化矽較佳為中空二氧化矽微粒子,此種中空二氧化矽微粒子例如可藉由日本特開2005-099778號公報之實施例中記載之製造方法而製作。 The above-mentioned silicon dioxide is preferably hollow silicon dioxide fine particles, and such hollow silicon dioxide fine particles can be produced, for example, by the production method described in the example of Japanese Patent Application Laid-Open No. 2005-099778.

該等低折射率層之折射率為1.47以下,特佳為1.42以下。又,低折射率層之厚度並無限定,通常只要在10nm~1μm左右之範圍內適當設定即可。 The refractive index of these low refractive index layers is 1.47 or less, and particularly preferably 1.42 or less. The thickness of the low-refractive index layer is not limited, and generally it may be appropriately set within a range of about 10 nm to 1 μm.

作為上述氟系樹脂,可使用至少於分子中含有氟原子之聚合性化合物或其聚合物。作為聚合性化合物,並無特別限定,例如較佳為具有藉由游離輻射而硬化之官能基、熱硬化之極性基等硬化反應性基者。又,亦可為同時兼具該等反應性基之化合物。相對於該聚合性化合物,所謂聚合物係一概不具有如上所述之反應性基等者。 As the fluorine-based resin, a polymerizable compound containing a fluorine atom in a molecule or a polymer thereof can be used. Although it does not specifically limit as a polymerizable compound, For example, it is preferable to have a hardening reactive group, such as a functional group hardened by a free radiation, and a thermally hardening polar group. It may also be a compound having both of these reactive groups. With respect to this polymerizable compound, the so-called polymer system does not have any of the reactive groups and the like described above.

作為上述具有藉由游離輻射而硬化之官能基之聚合性化合物,可廣泛地使用具有乙烯性不飽和鍵之含氟單體。更具體而言,可例示氟烯烴類(例如,氟乙烯、偏二氟乙烯、四氟乙烯、六氟丙烯、全氟丁二烯、全氟-2,2-二甲基-1,3-二氧雜環戊烯等)。 As the polymerizable compound having a functional group hardened by free radiation, a fluorine-containing monomer having an ethylenically unsaturated bond can be widely used. More specifically, fluoroolefins (e.g., fluoroethylene, vinylidene fluoride, tetrafluoroethylene, hexafluoropropylene, perfluorobutadiene, perfluoro-2,2-dimethyl-1,3- Dioxolene, etc.).

又,亦可使用具有(甲基)丙烯醯氧基之含氟單體。具體而言,可列舉(甲基)丙烯酸2,2,2-三氟乙酯、(甲基)丙烯酸2,2,3,3,3-五氟丙酯、(甲基)丙烯酸2-(全氟丁基)乙酯、(甲基)丙烯酸2-(全氟己基)乙酯、(甲基)丙烯酸2-(全氟辛基)乙酯、(甲基)丙烯酸2-(全氟癸基)乙酯、α-三氟甲基丙烯酸甲酯、α-三氟甲基丙烯酸乙酯之類之於分子中具有氟原子之(甲基)丙烯酸酯化合物。 Further, a fluorine-containing monomer having a (meth) acrylic fluorenyloxy group may be used. Specific examples include 2,2,2-trifluoroethyl (meth) acrylate, 2,2,3,3,3-pentafluoropropyl (meth) acrylate, and 2- (meth) acrylic acid. Perfluorobutyl) ethyl ester, 2- (perfluorohexyl) ethyl (meth) acrylate, 2- (perfluorooctyl) ethyl (meth) acrylate, 2- (perfluorodecyl) (meth) acrylate (Meth) acrylate, (alpha) -trifluoromethyl methacrylate, (alpha) -trifluoromethacrylate and the like (meth) acrylate compounds having a fluorine atom in the molecule.

進而,亦有於分子中具備具有至少3個氟原子之碳數為1~14之氟烷基、氟環烷基或氟伸烷基、及至少2個(甲基)丙烯醯氧基的含氟多官能(甲基)丙烯酸酯化合物等。 Furthermore, there are compounds containing a fluoroalkyl group, a fluorocycloalkyl group or a fluoroalkylene group having 1 to 14 carbon atoms having at least 3 fluorine atoms in the molecule, and at least 2 (meth) acryloxy groups. Fluorine polyfunctional (meth) acrylate compounds and the like.

其次,作為上述熱硬化之極性基,較佳為例如羥基、羧基、胺基、環氧基等氫鍵形成基。該等不僅與塗膜之密接性優異,而且與二氧化矽等之無機超微粒子之親和性亦優異。作為具有熱硬化性極性基之聚合性化合物,例如可列舉4-氟乙烯-全氟烷基乙烯醚共聚物;氟乙烯-烴系乙烯醚共聚物;環氧樹脂、聚胺酯(Polyurethane)、纖維素、苯酚、聚醯亞胺等各樹脂之氟改質品等。 Next, as the above-mentioned thermally-curable polar group, a hydrogen bond-forming group such as a hydroxyl group, a carboxyl group, an amine group, or an epoxy group is preferred. These are not only excellent in adhesion to the coating film, but also excellent in affinity with inorganic ultrafine particles such as silicon dioxide. Examples of the polymerizable compound having a thermosetting polar group include a 4-fluoroethylene-perfluoroalkyl vinyl ether copolymer; a fluoroethylene-hydrocarbon-based vinyl ether copolymer; an epoxy resin, a polyurethane, and cellulose , Phenol, polyimide and other resins such as fluorine modified products.

作為兼具藉由上述游離輻射而硬化之官能基及熱硬化之極性基之聚合性化合物,可例示丙烯酸或甲基丙烯酸之部分及完全氟化烷基、烯基、芳基酯類、完全或部分氟化乙烯醚類、完全或部分氟乙烯酯類、完全或部分氟乙烯酮類等。 Examples of the polymerizable compound having both a functional group hardened by the above-mentioned free radiation and a polar group thermally hardened include partially or fully fluorinated alkyl, alkenyl, and aryl esters of acrylic or methacrylic acid, and Partially fluorinated vinyl ethers, completely or partially fluorinated vinyl esters, completely or partially fluorinated ketenes, etc.

又,作為氟系樹脂,例如可列舉如下者。 Examples of the fluorine-based resin include the following.

含有至少1種作為上述具有游離輻射硬化性基之聚合性化合物的含氟(甲基)丙烯酸酯化合物之單體或單體混合物之聚合物;上述含氟(甲基)丙烯酸酯化合物中之至少1種與(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基) 丙烯酸丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-乙基己酯之類之於分子中不含氟原子之(甲基)丙烯酸酯化合物之共聚物;氟乙烯、偏二氟乙烯、三氟乙烯、三氟氯乙烯、3,3,3-三氟丙烯、1,1,2-三氯-3,3,3-三氟丙烯、六氟丙烯之類之含氟單體之均聚物或共聚物等。亦可使用於該等共聚物中含有聚矽氧成分之含聚矽氧之偏二氟乙烯共聚物。作為該情形時之聚矽氧成分,可例示(聚)二甲基矽氧烷、(聚)二乙基矽氧烷、(聚)二苯基矽氧烷、(聚)甲基苯基矽氧烷、烷基改質(聚)二甲基矽氧烷、含偶氮基之(聚)二甲基矽氧烷、二甲基聚矽氧、苯基甲基聚矽氧、烷基-芳烷基改質聚矽氧、氟聚矽氧、聚醚改質聚矽氧、脂肪酸酯改質聚矽氧、甲基氫聚矽氧、含矽烷醇基之聚矽氧、含烷氧基之聚矽氧、含苯酚基之聚矽氧、甲基丙烯醯基改質聚矽氧、丙烯醯基改質聚矽氧、胺基改質聚矽氧、羧酸改質聚矽氧、甲醇改質聚矽氧、環氧改質聚矽氧、巰基改質聚矽氧、氟改質聚矽氧、聚醚改質聚矽氧等。其中,較佳為具有二甲基矽氧烷結構者。 A polymer containing at least one monomer or monomer mixture of a fluorine-containing (meth) acrylate compound as the polymerizable compound having a free radiation-curable group; at least one of the fluorine-containing (meth) acrylate compounds 1 type with methyl (meth) acrylate, ethyl (meth) acrylate, (meth) Copolymers of (meth) acrylate compounds containing no fluorine atom in the molecule, such as propyl acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate; vinyl fluoride, vinylidene Fluorine-containing monomers such as fluoroethylene, trifluoroethylene, trifluorochloroethylene, 3,3,3-trifluoropropylene, 1,1,2-trichloro-3,3,3-trifluoropropylene, and hexafluoropropylene Homopolymer or copolymer. Polysiloxane-containing vinylidene fluoride copolymers containing a polysiloxane component in these copolymers can also be used. Examples of the polysiloxane component in this case include (poly) dimethylsiloxane, (poly) diethylsiloxane, (poly) diphenylsiloxane, and (poly) methylphenylsiloxane). Oxane, alkyl modified (poly) dimethylsiloxane, (poly) dimethylsiloxane containing azo group, dimethylpolysiloxane, phenylmethylpolysiloxane, alkyl- Aralkyl modified polysiloxane, fluoropolysiloxane, polyether modified polysiloxane, fatty acid ester modified polysiloxane, methylhydrogen polysiloxane, silanol containing silanol, alkoxy Polysiloxane based on phenol, polysiloxane based on phenol group, modified polysiloxane based on methacryl group, modified polysiloxane based on propylene group, polysiloxane based on amino group, polysiloxane based on carboxylic acid, Methanol modified polysiloxane, epoxy modified polysiloxane, mercapto modified polysiloxane, fluorine modified polysiloxane, polyether modified polysiloxane, etc. Among them, those having a dimethylsiloxane structure are preferred.

進而,由如下之化合物所構成之非聚合物或聚合物亦可用作氟系樹脂。即,可使用使分子中具有至少1個異氰酸酯基之含氟化合物與分子中具有至少1個胺基、羥基、羧基之類之與異氰酸酯基反應之官能基之化合物反應而獲得的化合物;使含氟聚醚多元醇、含氟烷基多元醇、含氟聚酯多元醇、含氟ε-己內酯改質多元醇之類之含氟多元醇與具有異氰酸酯基之化合物反應而獲得之化合物等。 Furthermore, non-polymers or polymers composed of the following compounds can also be used as the fluorine-based resin. That is, a compound obtained by reacting a fluorine-containing compound having at least one isocyanate group in the molecule with a compound having at least one amine group, a hydroxyl group, and a carboxyl group and a functional group that reacts with an isocyanate group in the molecule; Fluorinated polyether polyols, fluorinated alkyl polyols, fluorinated polyester polyols, fluorinated polyols such as fluorinated ε-caprolactone modified polyols, and compounds obtained by reacting compounds having isocyanate groups, etc. .

又,低折射率層形成用組成物可連同上述具有氟原子之聚合性化合物或聚合物一併含有如上所記載之各熱塑性樹脂。進而,可適當地使用用以使反應性基等硬化之硬化劑,且為了提高塗敷性、或賦予防污性, 可適當地使用各種添加劑、溶劑。 The composition for forming a low-refractive-index layer may contain each of the thermoplastic resins described above together with the polymerizable compound or polymer having a fluorine atom. Further, a hardening agent for hardening a reactive group or the like can be appropriately used, and in order to improve coating properties or impart antifouling properties, Various additives and solvents can be used suitably.

於上述低折射率層之形成中,較佳為將上述低折射率層形成用組成物之黏度設為可獲得較佳之塗佈性之0.5~5mPa.s(25℃)之範圍,較佳為0.7~3mPa.S(25℃)之範圍。可實現可見光線之優異抗反射層,且可形成均勻且無塗佈不均之薄膜,且可形成密接性特別優異之低折射率層。 In the formation of the above-mentioned low-refractive index layer, it is preferable that the viscosity of the composition for forming the above-mentioned low-refractive index layer is set to 0.5 to 5 mPa to obtain better coatability. The range of s (25 ℃) is preferably 0.7 ~ 3mPa. S (25 ° C). It can realize an excellent anti-reflection layer for visible light, and it can form a uniform and non-uniform thin film, and it can form a low refractive index layer with excellent adhesion.

樹脂之硬化手段可與上述硬塗層之硬化手段相同。於為了硬化處理而利用加熱手段之情形時,較佳為將藉由加熱例如產生自由基而開始聚合性化合物之聚合的熱聚合起始劑添加至低折射率層形成用組成物。 The hardening means of the resin may be the same as the hardening means of the above-mentioned hard coat layer. When a heating means is used for the hardening treatment, it is preferable to add a thermal polymerization initiator that starts the polymerization of the polymerizable compound by heating, for example, to generate a radical, to the composition for forming a low refractive index layer.

本發明之光學積層體較佳為全光線穿透率為80%以上。若未達80%,則於裝設於影像顯示裝置之情形時,存在破壞顏色再現性或視認性之虞,除此之外,存在無法獲得所期望之對比度之虞。上述全光線穿透率更佳為90%以上。 The optical laminated body of the present invention preferably has a total light transmittance of 80% or more. If it is less than 80%, when it is installed in an image display device, there is a possibility that the color reproducibility or visibility may be impaired. In addition, there is a possibility that a desired contrast cannot be obtained. The above-mentioned total light transmittance is more preferably 90% or more.

上述全光線穿透率可使用霧度計(村上色彩技術研究所製造,製品編號:HM-150),藉由依據JIS K-7361之方法而測定。 The above-mentioned total light transmittance can be measured by a method according to JIS K-7361 using a haze meter (manufactured by Murakami Color Technology Research Institute, product number: HM-150).

又,本發明之光學積層體較佳為霧度為1%以下。若為1%以下,則可獲得所期望之光學特性,不存在於影像顯示表面設置本發明之光學積層體時之視認性之劣化。 Moreover, it is preferable that the haze of the optical laminated body of this invention is 1% or less. If it is 1% or less, desired optical characteristics can be obtained, and there is no deterioration in visibility when the optical laminated body of the present invention is provided on the image display surface.

上述霧度可使用霧度計(村上色彩技術研究所製造,製品編號:HM-150),藉由依據JIS K-7136之方法而測定。 The haze can be measured by a method according to JIS K-7136 using a haze meter (manufactured by Murakami Color Technology Research Institute, product number: HM-150).

本發明之光學積層體可用作偏光板,係於偏光膜之至少一面積層本發明之光學積層體而成。 The optical laminated body of the present invention can be used as a polarizing plate, and is formed by layering the optical laminated body of the present invention on at least one area of a polarizing film.

作為上述偏光膜,並無特別限定,例如可使用藉由碘等而染色且經延伸之聚乙烯醇膜、聚乙烯醇縮甲醛膜、聚乙烯醇縮乙醛膜、乙烯-乙酸乙烯酯共聚物系皂化膜等。於上述偏光膜與上述光學積層體之層疊處理中,較佳為對丙烯酸基材進行皂化處理。藉由皂化處理,接著性變良好且亦可獲得抗靜電效果。 The polarizing film is not particularly limited, and for example, a polyvinyl alcohol film, a polyvinyl formal film, a polyvinyl formal film, an ethylene-vinyl acetate copolymer that is dyed and stretched with iodine, or the like can be used. Department of saponification film. In the lamination process of the polarizing film and the optical laminate, it is preferable to perform a saponification treatment on an acrylic substrate. By the saponification treatment, the adhesiveness becomes good and an antistatic effect can also be obtained.

本發明之光學積層體可應用於具備上述光學積層體及/或上述偏光板而成之影像顯示裝置。 The optical multilayer body of the present invention can be applied to an image display device including the optical multilayer body and / or the polarizing plate.

作為上述影像顯示裝置,可列舉電視、電腦、LCD、PDP、FED、ELD(有機EL、無機EL)、CRT、平板PC、電子紙、行動電話等,進而亦可較佳地使用於影像顯示裝置等中所使用之觸控面板。 Examples of the image display device include a television, a computer, an LCD, a PDP, a FED, an ELD (organic EL, an inorganic EL), a CRT, a tablet PC, an electronic paper, a mobile phone, and the like, and can also be preferably used in an image display Touch panel used in the etc.

作為上述代表例之LCD係具備穿透性顯示體、及自背面對上述穿透性顯示體進行照射之光源裝置而成者。於使用有本發明之光學積層體之影像顯示裝置為LCD之情形時,係於該穿透性顯示體之表面形成本發明之光學積層體及/或使用有本發明之光學積層體之偏光板而成者。然而,於搭載有觸控面板之影像顯示裝置之情形時,除構成表面以外,亦可用作構成裝置內部之透明基板等。 The LCD as a representative example includes a transmissive display and a light source device for irradiating the transmissive display from the back. When the image display device using the optical laminated body of the present invention is an LCD, the optical laminated body of the present invention is formed on the surface of the transparent display body and / or the polarizing plate using the optical laminated body of the present invention is used. Become. However, in the case of an image display device equipped with a touch panel, in addition to the configuration surface, it can also be used as a transparent substrate or the like inside the device.

於使用有本發明之光學積層體之影像顯示裝置中,光源裝置之光源係自光學積層體或偏光板之下側照射。再者,亦可於影像顯示元件與偏光板之間插入相位差板。於該影像顯示裝置之各層間,可視需要而設置接著劑層。 In the image display device using the optical laminated body of the present invention, the light source of the light source device is irradiated from the lower side of the optical laminated body or the polarizing plate. Furthermore, a retardation plate may be inserted between the image display element and the polarizing plate. An adhesive layer may be provided between the layers of the image display device as required.

此處,於使用有本發明之光學積層體之影像顯示裝置為液晶顯示裝置之情形時,對於其背光光源並無特別限定,較佳為白色發光二極 體(白色LED),該影像顯示裝置較佳為具備白色發光二極體作為背光光源之VA模式或IPS模式之液晶顯示裝置。 Here, when the image display device using the optical laminate of the present invention is a liquid crystal display device, the backlight light source is not particularly limited, and a white light emitting diode is preferred. (White LED), the image display device is preferably a VA mode or IPS mode liquid crystal display device having a white light emitting diode as a backlight light source.

所謂上述白色LED係螢光體方式、即藉由組合使用有化合物半導體之發出藍色光或紫外光之發光二極體與螢光體而發出白色之元件。其中,由組合使用有化合物半導體之藍色發光二極體及釔-鋁-石榴石系黃色螢光體之發光元件所構成之白色發光二極體具有連續且寬廣之發光光譜,因此對抗反射性能及亮處對比度之改善有效,並且發光效率亦優異,故較佳用作本發明中之上述背光光源。又,可廣泛地利用耗電較少之白色LED,因此亦可發揮節能化之效果。 The above-mentioned white LED is a phosphor method, that is, a device that emits white by using a combination of a compound semiconductor-emitting light emitting diode and a phosphor emitting blue light or ultraviolet light. Among them, a white light-emitting diode composed of a light-emitting element using a compound semiconductor blue light-emitting diode and a yttrium-aluminum-garnet yellow phosphor has a continuous and wide light-emitting spectrum, and therefore has anti-reflection performance. It is effective to improve the contrast in bright places, and also has excellent luminous efficiency, so it is preferably used as the backlight light source in the present invention. In addition, since white LEDs that consume less power can be widely used, energy saving effects can also be exerted.

又,所謂上述VA(Vertical Alignment,垂直配向)模式係如下之動作模式:於未施加電壓時,以液晶分子垂直於液晶單元之基板之方式配向而顯示暗顯示,藉由液晶分子因電壓之施加倒下而顯示明顯示。 In addition, the above-mentioned VA (Vertical Alignment) mode is an operation mode in which, when no voltage is applied, the liquid crystal molecules are aligned perpendicular to the substrate of the liquid crystal cell to display a dark display. Fall down and display clearly.

又,所謂上述IPS(In-Plane Switching,共平面切換)模式係藉由施加於設置於液晶單元之一基板之梳形電極對之橫向電場,使液晶於基板面內旋轉而進行顯示的方式。 In addition, the above-mentioned IPS (In-Plane Switching, coplanar switching) mode is a method of displaying liquid crystal by rotating a liquid crystal within a substrate surface by applying a lateral electric field to a comb-shaped electrode pair provided on a substrate of a liquid crystal cell.

為上述影像顯示裝置之PDP係具備正面玻璃基板及背面玻璃基板而成者,該正面玻璃基板係於表面形成有電極,該背面玻璃基板係於與該正面玻璃基板對向而於之間封入配置放電氣體,於表面形成電極及微小之溝槽,於溝槽內形成有紅、綠、藍之螢光體層。於本發明之影像顯示裝置為PDP之情形時,亦係於上述正面玻璃基板之表面、或其前面板(玻璃基板或膜基板)具備上述光學積層體者。 The PDP of the image display device described above is provided with a front glass substrate and a back glass substrate. The front glass substrate is formed with electrodes on the surface, and the back glass substrate is arranged opposite to the front glass substrate and sealed in between. The discharge gas forms electrodes and minute grooves on the surface, and red, green, and blue phosphor layers are formed in the grooves. In the case where the image display device of the present invention is a PDP, it is also the one on the surface of the front glass substrate or the front panel (glass substrate or film substrate) provided with the optical laminate.

上述影像顯示裝置亦可為將若施加電壓則發光之硫化鋅、二 胺類物質即發光體蒸鍍至玻璃基板,控制施加至基板之電壓而進行顯示之ELD裝置;或將電訊號轉換成光,產生可由人眼觀察到之影像之CRT等影像顯示裝置。於該情形時係於如上所述之各顯示裝置之最表面或其前面板之表面具備上述光學積層體者。 The image display device described above may also be zinc sulfide, An amine is an ELD device in which a light-emitting body is vapor-deposited on a glass substrate and controls the voltage applied to the substrate to perform display; or an image display device such as a CRT that converts electrical signals into light to produce an image that can be viewed by the human eye. In this case, the above-mentioned optical laminate is provided on the outermost surface of each display device or the surface of its front panel as described above.

[實施例] [Example]

其次,藉由實施例,進一步詳細地對本發明進行說明,但本發明不受該例之任何限定。 Next, the present invention will be described in more detail by way of examples, but the present invention is not limited in any way by the examples.

(評價方法) (Evaluation method)

對藉由各實施例及比較例而製造之光學積層體進行以下之評價。 The following evaluations were performed on the optical laminates produced by the respective examples and comparative examples.

(1)丙烯酸基材之厚度測定 (1) Thickness measurement of acrylic substrate

藉由說明書正文中記載之方法,算出減厚步驟(B)後之丙烯酸基材之厚度、及硬化步驟(C)後之樹脂層之厚度。 The thickness of the acrylic substrate after the thickness reduction step (B) and the thickness of the resin layer after the hardening step (C) were calculated by the method described in the text of the description.

(2)密接性 (2) Adhesiveness

基於JIS K 5600,於光學積層體之硬塗層刻入1mm見方且合計100格之棋盤格,使用NICHIBAN(股)製造之工業用24mm之Cellotape(註冊商標)進行5次連續剝離試驗,測量剩餘之方格之數量。 Based on JIS K 5600, the hard coating of the optical laminate is engraved with a checkerboard of 1mm square and a total of 100 grids. Industrial continuous 24mm Cellotape (registered trademark) manufactured by NICHIBAN is used for 5 consecutive peel tests, and the remaining is measured. The number of squares.

根據未被剝離之方格之數量,如下般進行評價。B等級以上為作為製品良好者。 The evaluation was performed as follows based on the number of cells that were not peeled. B grade or higher is a good product.

A:90-100 A: 90-100

B:80-89 B: 80-89

C:50-79 C: 50-79

D:未達50 D: less than 50

(3)干涉條紋 (3) interference fringes

於在光學積層體之與硬塗層相反側之面貼合黑色之膠帶後,於三波長管螢光燈下藉由目視進行有無干涉條紋之評價。將無法視認干涉條紋之合格品設為A,將可輕微地視認之情形設為C,將可視認之情形設為D。 After the black tape was attached to the surface of the optical multilayer body opposite to the hard coat layer, the presence or absence of interference fringes was evaluated visually under a three-wavelength fluorescent lamp. A good product that cannot recognize the interference fringe is set to A, a case where it is slightly visible is set to C, and a case where it is visible is set to D.

(4)製造加工性 (4) Manufacturing processability

於在丙烯酸基材上塗佈游離輻射硬化性樹脂組成物A並進行乾燥之階段,進行拉伸試驗。拉伸程度設為2.2N/cm。將其結果,於拉伸時未斷裂之情形評價為「A」,將略微發生斷裂,且於製造加工上產生問題者評價為「C」。再者,製造加工性成為「不良」之光學積層體由於基材本身之物性弱化,因此即便使樹脂層、硬塗層等硬化,鉛筆硬度(JIS K5600-5-4)亦不會成為2H以上。 A tensile test was performed at the stage where the free radiation-curable resin composition A was applied to an acrylic substrate and dried. The degree of stretching was set to 2.2 N / cm. The result was evaluated as "A" when it was not broken during stretching, and it was evaluated as "C" if it was slightly broken and a problem occurred in the manufacturing process. Furthermore, since the optical laminated body whose manufacturing processability is "poor" is weakened in the physical properties of the base material, the pencil hardness (JIS K5600-5-4) does not become 2H or more even if the resin layer or hard coating layer is hardened. .

(5)霧度 (5) Haze

使用霧度計(村上色彩技術研究所製造,製品編號:HM-150),根據JIS K-7136測定光學積層體之霧度值(%),藉由以下之評價基準進行評價。 The haze value (%) of the optical laminate was measured using a haze meter (manufactured by Murakami Color Technology Research Institute, product number: HM-150) in accordance with JIS K-7136, and evaluated by the following evaluation criteria.

A:霧度值為0.8以下 A: Haze value is 0.8 or less

C:霧度值超過0.8 C: Haze value exceeds 0.8

(6)破裂耐性 (6) Bursting resistance

使用Tensilon萬能材料試驗機(RTG-1310,A&D股份有限公司製造),進行拉伸試驗,評價破裂耐性。將光學積層體設為寬度10mm、長度100mm之樣品,利用Tensilon以100mm/分鐘進行拉伸,藉由以下之基準進行評價。 A Tensilon universal material testing machine (RTG-1310, manufactured by A & D Co., Ltd.) was used to perform a tensile test to evaluate the fracture resistance. The optical laminate was a sample having a width of 10 mm and a length of 100 mm. Tensilon was used to stretch the sample at 100 mm / min. The evaluation was performed based on the following criteria.

A:於較15N強地進行拉伸之情形時亦不會斷裂之情形 A: The case where it will not break even when it is stretched stronger than 15N.

C:於15N以下而斷裂之情形 C: Fracture below 15N

(7)表面電阻率 (7) Surface resistivity

使用表面電阻率測定器(Hiresta HT-210,三菱化學ANALYTECH公司製造),對在樹脂層含有抗靜電材之光學積層體測定表面電阻率(Ω/□)。 Using a surface resistivity measuring device (Hiresta HT-210, manufactured by ANALYTECH, Mitsubishi Chemical Corporation), the surface resistivity (Ω / □) was measured on an optical laminate including an antistatic material in a resin layer.

(8)抗黏連性(抗貼附性能) (8) Anti-blocking property (anti-adhesion performance)

製作2個於樹脂層含有抗黏連劑之光學積層體(實施例21之光學積層體),分別切割成5cm×5cm之大小。使一光學積層體之丙烯酸基材側與另一光學積層體之樹脂層側對向重疊,以壓力為3.0kgf/cm2、50℃之條件密接30小時後,藉由以下之基準進行評價。 Two optical laminated bodies (the optical laminated body of Example 21) containing an anti-blocking agent in the resin layer were prepared and cut into a size of 5 cm × 5 cm, respectively. The acrylic substrate side of one optical laminated body and the resin layer side of the other optical laminated body were opposed to each other, and they were closely adhered under a condition of a pressure of 3.0 kgf / cm 2 at 50 ° C. for 30 hours, and then evaluated based on the following criteria.

A:無貼附 A: No attachment

C:有貼附 C: with stickers

(9)鉛筆硬度 (9) Pencil hardness

使用JIS-S-6006規定之試驗用鉛筆,根據JIS K5600-5-4(1999)規定之鉛筆硬度評價方法,藉由4.9N之負載而測定形成有硬塗層之表面之鉛筆硬度。 Using a pencil for testing specified in JIS-S-6006 and a pencil hardness evaluation method specified in JIS K5600-5-4 (1999), the pencil hardness of the surface on which the hard coat layer was formed was measured under a load of 4.9N.

實施例1 Example 1

(丙烯酸基材之製造) (Manufacture of acrylic substrate)

熔融混練由甲基丙烯酸甲酯及丙烯酸甲酯之共聚物(玻璃轉移點:130℃)所構成之顆粒,利用過濾器去除異物,並且藉由熔融擠出方法,自模嘴之間隙擠出聚合物。其次,一面冷卻聚合物,一面向縱向延伸1.2倍,此後向橫向延伸1.5倍,獲得厚度為40μm之丙烯酸基材。 Melt-knead the granules composed of a copolymer of methyl methacrylate and methyl acrylate (glass transition point: 130 ° C), remove foreign matter with a filter, and extrude and polymerize through the gap of the die by the melt extrusion method Thing. Secondly, while cooling the polymer, one side extended 1.2 times in the longitudinal direction, and 1.5 times in the lateral direction thereafter to obtain an acrylic substrate having a thickness of 40 μm.

(游離輻射硬化性樹脂組成物A之製備) (Preparation of Free Radiation Curable Resin Composition A)

相對於四乙二醇二丙烯酸酯(東亞合成股份有限公司製造,「M240」, 分子量:286)80質量份,使作為功能性成分之摻銻氧化錫粒子(ATO粒子之甲基異丁基酮分散液,三菱綜合材料電子化成股份有限公司製造,「EPT5DL2MIBK」)20質量份(固形物成分換算)、起始劑(BASF公司製造,「Irg184」)4質量份溶解於甲基異丁基酮(MIBK)150質量份,製備游離輻射硬化性樹脂組成物A。於第1表中表示游離輻射硬化性樹脂組成物A之組成。 Relative to tetraethylene glycol diacrylate (manufactured by Toa Synthesis Co., Ltd., "M240", Molecular weight: 286) 80 parts by mass, 20 parts by mass ("EPT5DL2MIBK") of antimony-doped tin oxide particles (methyl isobutyl ketone dispersion of ATO particles, manufactured by Mitsubishi Materials Electronic Chemicals Co., Ltd.) as functional components ( 4 parts by mass of the initiator ("Irg184" manufactured by BASF) was dissolved in 150 parts by mass of methyl isobutyl ketone (MIBK) to prepare a free radiation-curable resin composition A. Table 1 shows the composition of the free radiation-curable resin composition A.

(光學積層體之製造) (Manufacture of optical laminated body)

藉由模嘴塗佈法,於丙烯酸基材上塗敷游離輻射硬化性樹脂組成物A,形成未硬化樹脂層。以70℃乾燥1分鐘而使溶劑蒸發,以乾燥後之附著量成為5g/m2之方式形成樹脂層。於氮氣環境下(氧氣濃度500ppm以下),以紫外線照射量200mJ/cm2對所獲得之塗膜照射紫外線而使塗膜完全硬化(全固(full cure)狀態),從而獲得光學積層體。將藉由上述評價方法評價所得之結果示於表1。 An uncured resin layer was formed by applying a free radiation-curable resin composition A to an acrylic substrate by a die coating method. It dried at 70 degreeC for 1 minute, the solvent was evaporated, and the resin layer was formed so that the adhesion amount after drying might be 5 g / m <2> . In a nitrogen environment (oxygen concentration of 500 ppm or less), the obtained coating film was irradiated with ultraviolet rays at an ultraviolet irradiation amount of 200 mJ / cm 2 to completely harden the coating film (full cure state), thereby obtaining an optical laminate. Table 1 shows the results obtained by the above evaluation method.

實施例2~28、比較例1~13 Examples 2 to 28, Comparative Examples 1 to 13

除將游離輻射硬化性樹脂組成物A、乾燥溫度、及乾燥後之附著量變更為表1~5之條件以外,與實施例1同樣地獲得光學積層體。將與實施例1同樣地進行評價所得之結果示於表1~5。 An optical laminated body was obtained in the same manner as in Example 1 except that the free radiation-curable resin composition A, the drying temperature, and the adhesion amount after drying were changed to the conditions of Tables 1 to 5. The evaluation results obtained in the same manner as in Example 1 are shown in Tables 1 to 5.

(表1~5使用之材料) (Materials used in Tables 1 to 5)

[游離輻射硬化性樹脂] [Free Radiation Hardening Resin]

TEGDA:四乙二醇二丙烯酸酯(東亞合成股份有限公司製造,「M240」,分子量:286) TEGDA: Tetraethylene glycol diacrylate (manufactured by Toa Synthesis Co., Ltd., "M240", molecular weight: 286)

PETA:新戊四醇三丙烯酸酯 PETA: neopentaerythritol triacrylate

[其他游離輻射硬化性樹脂] [Other free radiation curable resins]

A:二新戊四醇六丙烯酸酯 A: Dinepentaerythritol hexaacrylate

B:丙烯酸胺酯,日本合成化學工業公司製造,「紫光UV1700B」 B: amine acrylate, manufactured by Japan Synthetic Chemical Industry Co., Ltd., "violet UV1700B"

[功能性材料] [Functional materials]

抗靜電劑a:ATO分散液,三菱綜合材料電子化成公司製造,「EPT5DL2MIBK」 Antistatic agent a: ATO dispersion, manufactured by Mitsubishi Materials Electronic Chemicals, "EPT5DL2MIBK"

抗靜電劑b:鏈狀ATO分散液,日揮觸媒化成公司製造,「ELCOM V3560」 Antistatic agent b: Chain-shaped ATO dispersion, manufactured by Nihon Catalyst Chemical Co., Ltd., "ELCOM V3560"

抗靜電劑c:五氧化二銻分散液,日揮觸媒化成公司製造,「ELCOM V4504」 Antistatic agent c: Antimony pentoxide dispersion, manufactured by Niwa Catalyst Co., Ltd., "ELCOM V4504"

抗靜電劑d:四級銨鹽,COLCOAT公司製造,「COLCOAT NR121X」 Antistatic agent d: quaternary ammonium salt, manufactured by COLCOAT, "COLCOAT NR121X"

抗靜電劑e:四級銨鹽,TAISEI FINE CHEMICAL公司製造,「1SX3004」 Antistatic agent e: quaternary ammonium salt, manufactured by TAISEI FINE CHEMICAL, "1SX3004"

抗靜電劑f:Li離子系抗靜電劑,雙(三氟甲磺醯)亞胺鋰,住友3M公司製造,「LJ-603010」 Antistatic agent f: Li ion-based antistatic agent, lithium bis (trifluoromethanesulfonyl) imide, manufactured by Sumitomo 3M, "LJ-603010"

反應性二氧化矽a:日產化學工業公司製造,實心二氧化矽,「MIBK-SDL」,平均粒徑為44nm Reactive silicon dioxide a: Solid silicon dioxide, "MIBK-SDL" manufactured by Nissan Chemical Industries, Inc., with an average particle size of 44 nm

反應性二氧化矽b:日揮觸媒化成公司製造,異型二氧化矽,「ELCOM V8803」,平均粒徑為25nm Reactive silicon dioxide b: manufactured by Niwa Catalyst Co., Ltd., shaped silicon dioxide, "ELCOM V8803", average particle size is 25nm

抗黏連劑:CIK NanoTek公司製造,實心二氧化矽,「E65」,平均一次粒徑為150~300nm Anti-blocking agent: made by CIK NanoTek, solid silicon dioxide, "E65", average primary particle size is 150 ~ 300nm

高折射率材料a:高折射率丙烯酸胺酯,第一工業製藥公司製造,「R1403MB」 High refractive index material a: High refractive index amine acrylate, manufactured by Daiichi Kogyo Pharmaceutical Co., Ltd., "R1403MB"

高折射率材料b:高折射率單官能單體,第一工業製藥公司製造,「OPPE」 High refractive index material b: high refractive index monofunctional monomer, manufactured by Daiichi Kogyo Co., Ltd., "OPPE"

[溶劑] [Solvent]

MIBK:甲基異丁基酮 MIBK: methyl isobutyl ketone

IPA:異丙醇 IPA: isopropanol

MEK:甲基乙基酮 MEK: methyl ethyl ketone

PGME:丙二醇單甲醚 PGME: propylene glycol monomethyl ether

本發明之光學積層體可較佳地使用於陰極射線管顯示裝置(CRT)、液晶顯示器(LCD)、電漿顯示器(PDP)、電致發光顯示器(ELD)、觸控面板、電子紙、行動電話等之顯示器、特別是高精細化顯示器。 The optical laminate of the present invention can be preferably used in cathode ray tube display devices (CRT), liquid crystal displays (LCD), plasma displays (PDP), electroluminescence displays (ELD), touch panels, electronic paper, mobile Displays for telephones, especially high-definition displays.

Claims (3)

一種光學積層體之製造方法,其依序進行如下步驟:塗佈步驟(A),其係於丙烯酸基材上塗佈至少含有功能性成分之游離輻射硬化性樹脂組成物A而形成未硬化樹脂層;減厚步驟(B),其係藉由該未硬化樹脂層而使丙烯酸基材溶解,使丙烯酸基材之厚度減少1.0~15.0%;及硬化步驟(C),其係照射游離輻射使該未硬化樹脂層硬化而形成樹脂層;藉此,使功能性成分向該樹脂層表面側偏靠。A method for manufacturing an optical laminate, which sequentially performs the following steps: a coating step (A), which coats an acrylic substrate with a free radiation-curable resin composition A containing at least a functional component to form an uncured resin Layer; step (B) of reducing the thickness of the acrylic substrate by dissolving the acrylic substrate by the unhardened resin layer, and reducing the thickness of the acrylic substrate by 1.0 to 15.0%; The uncured resin layer is cured to form a resin layer; thereby, the functional component is biased toward the surface side of the resin layer. 如申請專利範圍第1項之光學積層體之製造方法,其中,該游離輻射硬化性樹脂組成物A含有聚伸烷基二醇二(甲基)丙烯酸酯(polyalkylene glycol di(meth)acrylate)。For example, the method for manufacturing an optical laminated body according to item 1 of the patent application scope, wherein the free radiation-curable resin composition A contains polyalkylene glycol di (meth) acrylate. 一種光學積層體,其係藉由依序進行如下步驟,使功能性成分向該樹脂層表面側偏靠而成,上述步驟係:塗佈步驟(A),其係於丙烯酸基材上塗佈含有功能性成分之游離輻射硬化性樹脂組成物A而形成未硬化樹脂層;減厚步驟(B),其係藉由該未硬化樹脂層而使丙烯酸基材溶解,使丙烯酸基材之厚度減少1.0~15.0%;及硬化步驟(C),其係使該未硬化樹脂層硬化而形成樹脂層。An optical laminated body is formed by sequentially performing the following steps to bias a functional component toward the surface side of the resin layer. The above step is: a coating step (A), which is coated on an acrylic substrate and contains The non-hardened resin layer is formed by the radiation-hardenable resin composition A of the functional component, and the thickness reduction step (B) is to dissolve the acrylic base material by the unhardened resin layer and reduce the thickness of the acrylic base material by 1.0. ~ 15.0%; and a curing step (C), which hardens the uncured resin layer to form a resin layer.
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