TWI607289B - 適應性預補償靶材推出現象以使極紫外光生成作用最佳化之系統及方法 - Google Patents

適應性預補償靶材推出現象以使極紫外光生成作用最佳化之系統及方法 Download PDF

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Publication number
TWI607289B
TWI607289B TW102133353A TW102133353A TWI607289B TW I607289 B TWI607289 B TW I607289B TW 102133353 A TW102133353 A TW 102133353A TW 102133353 A TW102133353 A TW 102133353A TW I607289 B TWI607289 B TW I607289B
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Taiwan
Prior art keywords
burst
target
droplet
drops
drop
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TW102133353A
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English (en)
Chinese (zh)
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TW201421168A (zh
Inventor
傑若恩 凡德布吉特
馬修Ｒ 葛拉漢
查理斯 肯尼
威尼Ｊ 杜恩斯坦
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Ａｓｍｌ荷蘭公司
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B17/00—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0027—Arrangements for controlling the supply; Arrangements for measurements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW102133353A 2012-09-28 2013-09-14 適應性預補償靶材推出現象以使極紫外光生成作用最佳化之系統及方法 TWI607289B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13/631,645 US9238243B2 (en) 2012-09-28 2012-09-28 System and method to adaptively pre-compensate for target material push-out to optimize extreme ultraviolet light production

Publications (2)

Publication Number Publication Date
TW201421168A TW201421168A (zh) 2014-06-01
TWI607289B true TWI607289B (zh) 2017-12-01

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW102133353A TWI607289B (zh) 2012-09-28 2013-09-14 適應性預補償靶材推出現象以使極紫外光生成作用最佳化之系統及方法

Country Status (5)

Country Link
US (2) US9238243B2 (https=)
JP (1) JP6184500B2 (https=)
KR (1) KR102079053B1 (https=)
TW (1) TWI607289B (https=)
WO (1) WO2014051891A1 (https=)

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JP6087105B2 (ja) * 2012-10-23 2017-03-01 ギガフォトン株式会社 極端紫外光生成装置
US8872123B2 (en) * 2013-01-10 2014-10-28 Asml Netherlands B.V. Method of timing laser beam pulses to regulate extreme ultraviolet light dosing
US9678431B2 (en) * 2015-03-16 2017-06-13 Taiwan Semiconductor Manufacturing Company, Ltd. EUV lithography system and method with optimized throughput and stability
US9591734B1 (en) * 2015-09-29 2017-03-07 Asml Netherlands B.V. Reduction of periodic oscillations in a source plasma chamber
WO2017154111A1 (ja) * 2016-03-08 2017-09-14 ギガフォトン株式会社 極端紫外光生成装置
WO2018029759A1 (ja) * 2016-08-08 2018-02-15 ギガフォトン株式会社 極端紫外光生成方法
US9778022B1 (en) * 2016-09-14 2017-10-03 Asml Netherlands B.V. Determining moving properties of a target in an extreme ultraviolet light source
US10149375B2 (en) * 2016-09-14 2018-12-04 Asml Netherlands B.V. Target trajectory metrology in an extreme ultraviolet light source
WO2018211551A1 (ja) * 2017-05-15 2018-11-22 ギガフォトン株式会社 ターゲット計測装置及び極端紫外光生成装置
US10314154B1 (en) * 2017-11-29 2019-06-04 Taiwan Semiconductor Manufacturing Co., Ltd. System and method for extreme ultraviolet source control
WO2019186754A1 (ja) 2018-03-28 2019-10-03 ギガフォトン株式会社 極端紫外光生成システム及び電子デバイスの製造方法
US10925142B2 (en) * 2018-07-31 2021-02-16 Taiwan Semiconductor Manufacturing Co., Ltd. EUV radiation source for lithography exposure process
US20200057376A1 (en) * 2018-08-14 2020-02-20 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography system and lithography method
WO2020165942A1 (ja) * 2019-02-12 2020-08-20 ギガフォトン株式会社 極端紫外光生成装置、ターゲット制御方法、及び電子デバイスの製造方法
WO2020200610A1 (en) 2019-04-04 2020-10-08 Asml Netherlands B.V. Radiation system
KR102375567B1 (ko) * 2019-11-01 2022-03-16 주식회사 포스코 고정장치 및 이를 이용한 밸런스 레버
JP2024011005A (ja) 2022-07-13 2024-01-25 ギガフォトン株式会社 Ｅｕｖ光生成システム及び電子デバイスの製造方法
KR20240117731A (ko) 2023-01-26 2024-08-02 주식회사 베이직컴퍼니 슬라이드식 간이 테이블을 구비한 침대

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US20100258750A1 (en) * 2009-04-09 2010-10-14 Partlo William N System, method and apparatus for aligning and synchronizing target material for optimum extreme ultraviolet light output

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US7372056B2 (en) 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
US6930851B2 (en) * 2003-06-26 2005-08-16 Seagate Technology Llc Guiding a sensor using a broadly-curved lateral profile
US7718985B1 (en) * 2005-11-01 2010-05-18 University Of Central Florida Research Foundation, Inc. Advanced droplet and plasma targeting system
US7501642B2 (en) * 2005-12-29 2009-03-10 Asml Netherlands B.V. Radiation source
NL2003772A (en) * 2008-12-11 2010-06-14 Asml Netherlands Bv Lithographic apparatus and a method to compensate for the effect of disturbances on the projection system of a lithographic apparatus.
JP5603135B2 (ja) * 2009-05-21 2014-10-08 ギガフォトン株式会社 チャンバ装置におけるターゲット軌道を計測及び制御する装置及び方法
US9072153B2 (en) * 2010-03-29 2015-06-30 Gigaphoton Inc. Extreme ultraviolet light generation system utilizing a pre-pulse to create a diffused dome shaped target
JP5864949B2 (ja) * 2010-11-29 2016-02-17 ギガフォトン株式会社 極端紫外光生成システム
JP6434404B2 (ja) * 2013-06-20 2018-12-05 ギガフォトン株式会社 極端紫外光生成システム
JP6513025B2 (ja) * 2013-09-17 2019-05-15 ギガフォトン株式会社 極端紫外光生成装置

Patent Citations (1)

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Publication number Priority date Publication date Assignee Title
US20100258750A1 (en) * 2009-04-09 2010-10-14 Partlo William N System, method and apparatus for aligning and synchronizing target material for optimum extreme ultraviolet light output

Also Published As

Publication number Publication date
US20160202614A1 (en) 2016-07-14
US9588430B2 (en) 2017-03-07
TW201421168A (zh) 2014-06-01
KR20150060755A (ko) 2015-06-03
WO2014051891A1 (en) 2014-04-03
KR102079053B1 (ko) 2020-02-19
US20140091239A1 (en) 2014-04-03
JP2015532505A (ja) 2015-11-09
JP6184500B2 (ja) 2017-08-23
US9238243B2 (en) 2016-01-19

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