TWI603949B - 新穎肟酯聯苯基化合物、及含彼之光起始劑與光敏樹脂組合物 - Google Patents

新穎肟酯聯苯基化合物、及含彼之光起始劑與光敏樹脂組合物 Download PDF

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Publication number
TWI603949B
TWI603949B TW103138030A TW103138030A TWI603949B TW I603949 B TWI603949 B TW I603949B TW 103138030 A TW103138030 A TW 103138030A TW 103138030 A TW103138030 A TW 103138030A TW I603949 B TWI603949 B TW I603949B
Authority
TW
Taiwan
Prior art keywords
group
biphenyl
resin composition
photosensitive resin
oxime
Prior art date
Application number
TW103138030A
Other languages
English (en)
Chinese (zh)
Other versions
TW201518265A (zh
Inventor
辛承林
全根
申鍾一
李相悟
文奉錫
吳泉林
李元重
蘇仁永
Original Assignee
韓國化學研究院
三養社股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020130132783A external-priority patent/KR101574535B1/ko
Priority claimed from KR1020130133311A external-priority patent/KR101478292B1/ko
Application filed by 韓國化學研究院, 三養社股份有限公司 filed Critical 韓國化學研究院
Publication of TW201518265A publication Critical patent/TW201518265A/zh
Application granted granted Critical
Publication of TWI603949B publication Critical patent/TWI603949B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
    • C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
    • C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
    • C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
    • C07C251/68—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with at least one of the esterifying carboxyl groups bound to a carbon atom of a six-membered aromatic ring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/06—Systems containing only non-condensed rings with a five-membered ring
    • C07C2601/08—Systems containing only non-condensed rings with a five-membered ring the ring being saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/14—The ring being saturated
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
TW103138030A 2013-11-04 2014-11-03 新穎肟酯聯苯基化合物、及含彼之光起始劑與光敏樹脂組合物 TWI603949B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020130132783A KR101574535B1 (ko) 2013-11-04 2013-11-04 신규한 옥심에스테르 비페닐 화합물, 이를 포함하는 광개시제 및 감광성 수지 조성물
KR1020130133311A KR101478292B1 (ko) 2013-11-05 2013-11-05 신규한 β-옥심에스테르 비페닐 화합물, 이를 포함하는 광개시제 및 감광성 수지 조성물

Publications (2)

Publication Number Publication Date
TW201518265A TW201518265A (zh) 2015-05-16
TWI603949B true TWI603949B (zh) 2017-11-01

Family

ID=53004498

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103138030A TWI603949B (zh) 2013-11-04 2014-11-03 新穎肟酯聯苯基化合物、及含彼之光起始劑與光敏樹脂組合物

Country Status (2)

Country Link
TW (1) TWI603949B (ko)
WO (1) WO2015064958A1 (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6088105B1 (ja) * 2015-08-27 2017-03-01 東京応化工業株式会社 感光性組成物、パターン形成方法、硬化物、及び表示装置
JP6713112B2 (ja) * 2016-04-27 2020-06-24 東京応化工業株式会社 化合物及びその製造方法
KR102005346B1 (ko) * 2016-05-24 2019-07-30 동우 화인켐 주식회사 감광성 수지 조성물 및 이로부터 제조되는 광경화 패턴
KR20210148071A (ko) * 2019-04-08 2021-12-07 가부시키가이샤 아데카 카르바모일옥심 화합물 그리고 상기 화합물을 함유하는 중합 개시제 및 중합성 조성물

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60108837A (ja) * 1983-11-17 1985-06-14 Fuji Photo Film Co Ltd 酸プレカ−サ−
NL1016815C2 (nl) * 1999-12-15 2002-05-14 Ciba Sc Holding Ag Oximester-fotoinitiatoren.
CN100528838C (zh) * 2001-06-11 2009-08-19 西巴特殊化学品控股有限公司 具有复合结构的肟酯光引发剂
JP2004240241A (ja) * 2003-02-07 2004-08-26 Jsr Corp 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル
CN101370772B (zh) * 2006-01-13 2012-10-17 东洋油墨制造株式会社 二酮肟酯化合物及其用途
JP2010015025A (ja) * 2008-07-04 2010-01-21 Adeka Corp 特定の光重合開始剤を含有する感光性組成物

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Publication number Publication date
TW201518265A (zh) 2015-05-16
WO2015064958A1 (ko) 2015-05-07

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