TWI597182B - 液體排出裝置、奈米壓印設備、奈米壓印液體儲存桶、製造硬化產品圖案的方法、製造光學組件的方法、製造電路板的方法、和製造壓印模具的方法 - Google Patents

液體排出裝置、奈米壓印設備、奈米壓印液體儲存桶、製造硬化產品圖案的方法、製造光學組件的方法、製造電路板的方法、和製造壓印模具的方法 Download PDF

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Publication number
TWI597182B
TWI597182B TW104134899A TW104134899A TWI597182B TW I597182 B TWI597182 B TW I597182B TW 104134899 A TW104134899 A TW 104134899A TW 104134899 A TW104134899 A TW 104134899A TW I597182 B TWI597182 B TW I597182B
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TW
Taiwan
Prior art keywords
liquid
nanoimprinting
component
sorption medium
substrate
Prior art date
Application number
TW104134899A
Other languages
English (en)
Chinese (zh)
Other versions
TW201615434A (zh
Inventor
伊藤俊樹
荒木義雅
坂本和美
Original Assignee
佳能股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2015128160A external-priority patent/JP2016164961A/ja
Application filed by 佳能股份有限公司 filed Critical 佳能股份有限公司
Publication of TW201615434A publication Critical patent/TW201615434A/zh
Application granted granted Critical
Publication of TWI597182B publication Critical patent/TWI597182B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW104134899A 2014-10-30 2015-10-23 液體排出裝置、奈米壓印設備、奈米壓印液體儲存桶、製造硬化產品圖案的方法、製造光學組件的方法、製造電路板的方法、和製造壓印模具的方法 TWI597182B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014222047 2014-10-30
JP2015039400 2015-02-27
JP2015128160A JP2016164961A (ja) 2014-10-30 2015-06-25 液体吐出装置、ナノインプリント装置、ナノインプリント用液体収容タンク、硬化物パターンの製造方法、光学部品の製造方法、回路基板の製造方法、インプリント用モールドの製造方法

Publications (2)

Publication Number Publication Date
TW201615434A TW201615434A (zh) 2016-05-01
TWI597182B true TWI597182B (zh) 2017-09-01

Family

ID=55856894

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104134899A TWI597182B (zh) 2014-10-30 2015-10-23 液體排出裝置、奈米壓印設備、奈米壓印液體儲存桶、製造硬化產品圖案的方法、製造光學組件的方法、製造電路板的方法、和製造壓印模具的方法

Country Status (2)

Country Link
TW (1) TWI597182B (fr)
WO (1) WO2016067525A1 (fr)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5300628A (en) * 1992-06-29 1994-04-05 Ocg Microelectronic Materials, Inc. Selected chelate resins and their use to remove multivalent metal impurities from resist components
KR100853054B1 (ko) * 2003-10-07 2008-08-19 히다치 가세고교 가부시끼가이샤 방사선 경화성 조성물, 그 보존방법, 경화막 형성방법,패턴 형성방법, 패턴 사용방법, 전자부품 및 광도파로
JP4983137B2 (ja) * 2006-08-03 2012-07-25 凸版印刷株式会社 濾過装置及びそれを用いた塗布装置
JP5890323B2 (ja) * 2011-01-13 2016-03-22 丸善石油化学株式会社 光インプリント用樹脂組成物、パターン形成方法及びエッチングマスク
JP2012195370A (ja) * 2011-03-15 2012-10-11 Canon Inc インプリント装置及びデバイス製造方法
JP2013022807A (ja) * 2011-07-20 2013-02-04 Hitachi High-Technologies Corp 微細構造転写装置及びスタンパ移送方法
JP5741549B2 (ja) * 2012-10-09 2015-07-01 東京エレクトロン株式会社 処理液供給方法、処理液供給装置及び記憶媒体

Also Published As

Publication number Publication date
TW201615434A (zh) 2016-05-01
WO2016067525A1 (fr) 2016-05-06

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