TWI595339B - 低的壓力波動的流控制設備和方法 - Google Patents

低的壓力波動的流控制設備和方法 Download PDF

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Publication number
TWI595339B
TWI595339B TW104133313A TW104133313A TWI595339B TW I595339 B TWI595339 B TW I595339B TW 104133313 A TW104133313 A TW 104133313A TW 104133313 A TW104133313 A TW 104133313A TW I595339 B TWI595339 B TW I595339B
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TW
Taiwan
Prior art keywords
liquid
flow
pump
pressure
controller
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Application number
TW104133313A
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English (en)
Chinese (zh)
Other versions
TW201626126A (zh
Inventor
班傑明 派屈克 貝爾
羅拉 蘇克 鍾 陳
菲迪 哈立勒 艾瑞費
丹尼爾 瓦倫汀 洛伊鮑爾
Original Assignee
慧盛材料美國責任有限公司
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Publication of TW201626126A publication Critical patent/TW201626126A/zh
Application granted granted Critical
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/29—Mixing systems, i.e. flow charts or diagrams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/40—Mixing liquids with liquids; Emulsifying
    • B01F23/45—Mixing liquids with liquids; Emulsifying using flow mixing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/40—Mixing liquids with liquids; Emulsifying
    • B01F23/49—Mixing systems, i.e. flow charts or diagrams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/50—Circulation mixers, e.g. wherein at least part of the mixture is discharged from and reintroduced into a receptacle
    • B01F25/53—Circulation mixers, e.g. wherein at least part of the mixture is discharged from and reintroduced into a receptacle in which the mixture is discharged from and reintroduced into a receptacle through a recirculation tube, into which an additional component is introduced
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/181—Preventing generation of dust or dirt; Sieves; Filters
    • B01F35/187—Preventing generation of dust or dirt; Sieves; Filters using filters in mixers, e.g. during venting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20—Measuring; Control or regulation
    • B01F35/21—Measuring
    • B01F35/211—Measuring of the operational parameters
    • B01F35/2111—Flow rate
    • B01F35/21112—Volumetric flow rate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20—Measuring; Control or regulation
    • B01F35/22—Control or regulation
    • B01F35/221—Control or regulation of operational parameters, e.g. level of material in the mixer, temperature or pressure
    • B01F35/2213—Pressure
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/05—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects
    • G01F1/34—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by measuring pressure or differential pressure
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D11/00—Control of flow ratio
    • G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
    • G05D11/13—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means
    • G05D11/131—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components
    • G05D11/132—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components by controlling the flow of the individual components
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
    • G05D7/0647—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means the plurality of throttling means being arranged in series
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0688—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by combined action on throttling means and flow sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F2101/00—Mixing characterised by the nature of the mixed materials or by the application field
    • B01F2101/58—Mixing semiconducting materials, e.g. during semiconductor or wafer manufacturing processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Fluid Mechanics (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Flow Control (AREA)
  • Accessories For Mixers (AREA)
TW104133313A 2014-10-08 2015-10-08 低的壓力波動的流控制設備和方法 TWI595339B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201462061538P 2014-10-08 2014-10-08

Publications (2)

Publication Number Publication Date
TW201626126A TW201626126A (zh) 2016-07-16
TWI595339B true TWI595339B (zh) 2017-08-11

Family

ID=55653776

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104133313A TWI595339B (zh) 2014-10-08 2015-10-08 低的壓力波動的流控制設備和方法

Country Status (8)

Country Link
US (1) US11266959B2 (enExample)
EP (1) EP3204733B1 (enExample)
JP (1) JP6669737B2 (enExample)
KR (1) KR102013906B1 (enExample)
CN (1) CN107111324B (enExample)
SG (1) SG11201702586XA (enExample)
TW (1) TWI595339B (enExample)
WO (1) WO2016057797A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI875869B (zh) * 2019-12-26 2025-03-11 美商旭化成生物工藝美國股份有限公司 內聯緩衝液稀釋系統及在一定流體流量範圍內產生經稀釋之緩衝溶液之方法

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6669737B2 (ja) * 2014-10-08 2020-03-18 バーサム マテリアルズ ユーエス，リミティド ライアビリティ カンパニー 低い圧力変動のフロー制御装置及び方法
US10634538B2 (en) 2016-07-13 2020-04-28 Rain Bird Corporation Flow sensor
CN107170501B (zh) * 2017-05-26 2018-02-23 中国核动力研究设计院 一种抑制汽液两相自然循环系统流动不稳定的方法
US10473494B2 (en) 2017-10-24 2019-11-12 Rain Bird Corporation Flow sensor
JP6849574B2 (ja) * 2017-11-07 2021-03-24 株式会社神戸製鋼所 混合装置
US10451461B2 (en) * 2018-01-12 2019-10-22 Price Industries Limited Venturi air flow sensor and control system
JP7139467B2 (ja) 2018-06-29 2022-09-20 アプライド マテリアルズ インコーポレイテッド 液体リチウムの供給及び制御
US11662242B2 (en) 2018-12-31 2023-05-30 Rain Bird Corporation Flow sensor gauge
JP7544737B2 (ja) 2019-03-26 2024-09-03 バーサム マテリアルズ ユーエス，リミティド ライアビリティ カンパニー 脱気装置、脱気システム及びそれらを使用する方法
CN110238708B (zh) * 2019-06-20 2024-01-23 中国工程物理研究院激光聚变研究中心 一种磁流变抛光机床磁流变液循环系统
TWI774041B (zh) * 2019-10-15 2022-08-11 信紘科技股份有限公司 氣液混合調控系統及調控方法
US11874149B2 (en) 2020-04-27 2024-01-16 Rain Bird Corporation Irrigation flow sensor systems and methods of detecting irrigation flow
JP7432923B2 (ja) 2020-08-21 2024-02-19 伸和コントロールズ株式会社 流量制御装置及び方法、並びに、流体供給システム
TWI809498B (zh) * 2020-09-18 2023-07-21 美商慧盛材料美國責任有限公司 材料供應系統及使從氣體供應和分配系統分配的氣體的壓力變化實質上降低之方法
CN112808054A (zh) * 2020-12-30 2021-05-18 常州市深水城北污水处理有限公司 一种水流式搅拌器
KR102869665B1 (ko) * 2021-07-08 2025-10-16 주식회사 제우스 식각 장치 및 그 제어 방법
US20230381725A1 (en) * 2022-05-31 2023-11-30 Exel Industries Mixing plant with intermediate purge and associated control method
FR3138326A1 (fr) * 2022-08-01 2024-02-02 Exel Industries Installation de mélange à purge intermédiaire et procédé de commande associé
WO2024158784A1 (en) * 2023-01-23 2024-08-02 Equilibar, Llc Pumpless fluid delivery method and apparatus
US12443208B2 (en) 2023-02-08 2025-10-14 Rain Bird Corporation Control zone devices, systems and methods

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6561381B1 (en) * 2000-11-20 2003-05-13 Applied Materials, Inc. Closed loop control over delivery of liquid material to semiconductor processing tool
US20030192920A1 (en) * 1998-12-30 2003-10-16 Randy Forshey Chemical mix and delivery systems and methods thereof
TWI223675B (en) * 2000-01-27 2004-11-11 Silicon Valley Group Thermal Free floating shield and semiconductor processing system
TW200502439A (en) * 2003-04-18 2005-01-16 Applied Materials Inc Multi-chemistry plating system
US20120122373A1 (en) * 2010-11-15 2012-05-17 Stmicroelectronics, Inc. Precise real time and position low pressure control of chemical mechanical polish (cmp) head
CN102133731B (zh) * 2011-01-06 2012-10-10 清华大学 一种用于cmp抛光头多腔室的压力控制系统

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5480292A (en) 1993-05-19 1996-01-02 Asti Sae Dual chamber pump
US5924794A (en) 1995-02-21 1999-07-20 Fsi International, Inc. Chemical blending system with titrator control
JP3373144B2 (ja) 1997-09-10 2003-02-04 アドバンス電気工業株式会社 流量コントロールバルブ
US6095194A (en) 1998-03-20 2000-08-01 Nippon Pillar Packaging Co., Ltd. Pulsation suppression device for a pump
WO1999056189A1 (en) 1998-04-30 1999-11-04 The Boc Group, Inc. Conductivity feedback control system for slurry blending
US6168048B1 (en) 1998-09-22 2001-01-02 American Air Liquide, Inc. Methods and systems for distributing liquid chemicals
JP3179064B2 (ja) * 1999-01-18 2001-06-25 株式会社東京精密 スラリーの供給装置
JP3205909B2 (ja) 1999-10-25 2001-09-04 日本ピラー工業株式会社 脈動低減装置付きポンプ
US7905653B2 (en) * 2001-07-31 2011-03-15 Mega Fluid Systems, Inc. Method and apparatus for blending process materials
CN101274230A (zh) * 2000-07-31 2008-10-01 迅捷公司 用来混合加工材料的方法和装置
US6554467B2 (en) * 2000-12-28 2003-04-29 L'air Liquide - Societe' Anonyme A'directoire Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude Process and apparatus for blending and distributing a slurry solution
US6572255B2 (en) * 2001-04-24 2003-06-03 Coulter International Corp. Apparatus for controllably mixing and delivering diluted solution
TW583355B (en) 2001-06-21 2004-04-11 M Fsi Ltd Slurry mixing feeder and slurry mixing and feeding method
TW571182B (en) 2001-12-04 2004-01-11 Smc Kk Flow rate control apparatus
US6732017B2 (en) 2002-02-15 2004-05-04 Lam Research Corp. System and method for point of use delivery, control and mixing chemical and slurry for CMP/cleaning system
US6994464B2 (en) * 2002-04-11 2006-02-07 Mobius Technologies, Inc Control system and method for continuous mixing of slurry with removal of entrained bubbles
JP3621690B2 (ja) * 2002-04-16 2005-02-16 株式会社イワキ コントロールシステム
JP3995543B2 (ja) 2002-07-03 2007-10-24 旭有機材工業株式会社 流体制御弁
JP2005537464A (ja) 2002-07-19 2005-12-08 マイクロリス コーポレイション 流体フロー測定および比例流体フロー制御デバイス
US6860723B2 (en) * 2002-10-05 2005-03-01 Taiwan Semiconductor Manufacturing Co., Ltd Slurry flow control and monitor system for chemical mechanical polisher
JP4362473B2 (ja) * 2003-06-20 2009-11-11 富士通マイクロエレクトロニクス株式会社 薬液供給装置及び供給装置
JP4461329B2 (ja) 2004-08-31 2010-05-12 旭有機材工業株式会社 流体制御装置
US8485792B2 (en) * 2009-01-23 2013-07-16 Warren Rupp, Inc. Method for increasing compressed air efficiency in a pump
US8297830B2 (en) * 2009-03-04 2012-10-30 Taiwan Semiconductor Manufacturing Co., Ltd. Slurry system for semiconductor fabrication
CN101632974B (zh) * 2009-08-17 2011-05-11 清华大学 无稳压器长尺寸喷涂管道压力稳定装置
JP2011115754A (ja) * 2009-12-07 2011-06-16 Hitachi Plant Technologies Ltd 化学装置
US9770804B2 (en) * 2013-03-18 2017-09-26 Versum Materials Us, Llc Slurry supply and/or chemical blend supply apparatuses, processes, methods of use and methods of manufacture
US10210957B2 (en) * 2013-11-26 2019-02-19 Ingenieria Y Marketing, S.A. Portable apparatus for the boration of continuously flowing water
CN203856697U (zh) * 2014-06-11 2014-10-01 北方工具设备（宁波）有限公司 一种稳定输出的双隔膜泵
JP6669737B2 (ja) * 2014-10-08 2020-03-18 バーサム マテリアルズ ユーエス，リミティド ライアビリティ カンパニー 低い圧力変動のフロー制御装置及び方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030192920A1 (en) * 1998-12-30 2003-10-16 Randy Forshey Chemical mix and delivery systems and methods thereof
TWI223675B (en) * 2000-01-27 2004-11-11 Silicon Valley Group Thermal Free floating shield and semiconductor processing system
US6561381B1 (en) * 2000-11-20 2003-05-13 Applied Materials, Inc. Closed loop control over delivery of liquid material to semiconductor processing tool
TW200502439A (en) * 2003-04-18 2005-01-16 Applied Materials Inc Multi-chemistry plating system
US20120122373A1 (en) * 2010-11-15 2012-05-17 Stmicroelectronics, Inc. Precise real time and position low pressure control of chemical mechanical polish (cmp) head
CN102133731B (zh) * 2011-01-06 2012-10-10 清华大学 一种用于cmp抛光头多腔室的压力控制系统

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI875869B (zh) * 2019-12-26 2025-03-11 美商旭化成生物工藝美國股份有限公司 內聯緩衝液稀釋系統及在一定流體流量範圍內產生經稀釋之緩衝溶液之方法

Also Published As

Publication number Publication date
JP2017531265A (ja) 2017-10-19
KR102013906B1 (ko) 2019-08-23
US20170259226A1 (en) 2017-09-14
WO2016057797A1 (en) 2016-04-14
US11266959B2 (en) 2022-03-08
SG11201702586XA (en) 2017-04-27
KR20170069254A (ko) 2017-06-20
EP3204733A4 (en) 2018-07-25
CN107111324A (zh) 2017-08-29
EP3204733A1 (en) 2017-08-16
EP3204733B1 (en) 2022-05-11
CN107111324B (zh) 2021-09-24
TW201626126A (zh) 2016-07-16
JP6669737B2 (ja) 2020-03-18

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