CN107111324B - 低压力波动流动控制装置及方法 - Google Patents
低压力波动流动控制装置及方法 Download PDFInfo
- Publication number
- CN107111324B CN107111324B CN201580064737.2A CN201580064737A CN107111324B CN 107111324 B CN107111324 B CN 107111324B CN 201580064737 A CN201580064737 A CN 201580064737A CN 107111324 B CN107111324 B CN 107111324B
- Authority
- CN
- China
- Prior art keywords
- flow
- liquid
- pump
- pressure
- controller
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/29—Mixing systems, i.e. flow charts or diagrams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/40—Mixing liquids with liquids; Emulsifying
- B01F23/45—Mixing liquids with liquids; Emulsifying using flow mixing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/40—Mixing liquids with liquids; Emulsifying
- B01F23/49—Mixing systems, i.e. flow charts or diagrams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/50—Circulation mixers, e.g. wherein at least part of the mixture is discharged from and reintroduced into a receptacle
- B01F25/53—Circulation mixers, e.g. wherein at least part of the mixture is discharged from and reintroduced into a receptacle in which the mixture is discharged from and reintroduced into a receptacle through a recirculation tube, into which an additional component is introduced
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/181—Preventing generation of dust or dirt; Sieves; Filters
- B01F35/187—Preventing generation of dust or dirt; Sieves; Filters using filters in mixers, e.g. during venting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/20—Measuring; Control or regulation
- B01F35/21—Measuring
- B01F35/211—Measuring of the operational parameters
- B01F35/2111—Flow rate
- B01F35/21112—Volumetric flow rate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/20—Measuring; Control or regulation
- B01F35/22—Control or regulation
- B01F35/221—Control or regulation of operational parameters, e.g. level of material in the mixer, temperature or pressure
- B01F35/2213—Pressure
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/05—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects
- G01F1/34—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by measuring pressure or differential pressure
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D11/00—Control of flow ratio
- G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
- G05D11/13—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means
- G05D11/131—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components
- G05D11/132—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components by controlling the flow of the individual components
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
- G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
- G05D7/0647—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means the plurality of throttling means being arranged in series
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0688—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by combined action on throttling means and flow sources
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F2101/00—Mixing characterised by the nature of the mixed materials or by the application field
- B01F2101/58—Mixing semiconducting materials, e.g. during semiconductor or wafer manufacturing processes
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Fluid Mechanics (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Flow Control (AREA)
- Accessories For Mixers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201462061538P | 2014-10-08 | 2014-10-08 | |
| US62/061,538 | 2014-10-08 | ||
| PCT/US2015/054698 WO2016057797A1 (en) | 2014-10-08 | 2015-10-08 | Low pressure fluctuation flow control apparatus and method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107111324A CN107111324A (zh) | 2017-08-29 |
| CN107111324B true CN107111324B (zh) | 2021-09-24 |
Family
ID=55653776
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201580064737.2A Active CN107111324B (zh) | 2014-10-08 | 2015-10-08 | 低压力波动流动控制装置及方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US11266959B2 (enExample) |
| EP (1) | EP3204733B1 (enExample) |
| JP (1) | JP6669737B2 (enExample) |
| KR (1) | KR102013906B1 (enExample) |
| CN (1) | CN107111324B (enExample) |
| SG (1) | SG11201702586XA (enExample) |
| TW (1) | TWI595339B (enExample) |
| WO (1) | WO2016057797A1 (enExample) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6669737B2 (ja) * | 2014-10-08 | 2020-03-18 | バーサム マテリアルズ ユーエス,リミティド ライアビリティ カンパニー | 低い圧力変動のフロー制御装置及び方法 |
| US10634538B2 (en) | 2016-07-13 | 2020-04-28 | Rain Bird Corporation | Flow sensor |
| CN107170501B (zh) * | 2017-05-26 | 2018-02-23 | 中国核动力研究设计院 | 一种抑制汽液两相自然循环系统流动不稳定的方法 |
| US10473494B2 (en) | 2017-10-24 | 2019-11-12 | Rain Bird Corporation | Flow sensor |
| JP6849574B2 (ja) * | 2017-11-07 | 2021-03-24 | 株式会社神戸製鋼所 | 混合装置 |
| US10451461B2 (en) * | 2018-01-12 | 2019-10-22 | Price Industries Limited | Venturi air flow sensor and control system |
| JP7139467B2 (ja) | 2018-06-29 | 2022-09-20 | アプライド マテリアルズ インコーポレイテッド | 液体リチウムの供給及び制御 |
| US11662242B2 (en) | 2018-12-31 | 2023-05-30 | Rain Bird Corporation | Flow sensor gauge |
| JP7544737B2 (ja) | 2019-03-26 | 2024-09-03 | バーサム マテリアルズ ユーエス,リミティド ライアビリティ カンパニー | 脱気装置、脱気システム及びそれらを使用する方法 |
| CN110238708B (zh) * | 2019-06-20 | 2024-01-23 | 中国工程物理研究院激光聚变研究中心 | 一种磁流变抛光机床磁流变液循环系统 |
| TWI774041B (zh) * | 2019-10-15 | 2022-08-11 | 信紘科技股份有限公司 | 氣液混合調控系統及調控方法 |
| US11465110B2 (en) * | 2019-12-26 | 2022-10-11 | Asahi Kasei Bioprocess America, Inc. | Scaleable inline buffer dilution scheme |
| US11874149B2 (en) | 2020-04-27 | 2024-01-16 | Rain Bird Corporation | Irrigation flow sensor systems and methods of detecting irrigation flow |
| JP7432923B2 (ja) | 2020-08-21 | 2024-02-19 | 伸和コントロールズ株式会社 | 流量制御装置及び方法、並びに、流体供給システム |
| TWI809498B (zh) * | 2020-09-18 | 2023-07-21 | 美商慧盛材料美國責任有限公司 | 材料供應系統及使從氣體供應和分配系統分配的氣體的壓力變化實質上降低之方法 |
| CN112808054A (zh) * | 2020-12-30 | 2021-05-18 | 常州市深水城北污水处理有限公司 | 一种水流式搅拌器 |
| KR102869665B1 (ko) * | 2021-07-08 | 2025-10-16 | 주식회사 제우스 | 식각 장치 및 그 제어 방법 |
| US20230381725A1 (en) * | 2022-05-31 | 2023-11-30 | Exel Industries | Mixing plant with intermediate purge and associated control method |
| FR3138326A1 (fr) * | 2022-08-01 | 2024-02-02 | Exel Industries | Installation de mélange à purge intermédiaire et procédé de commande associé |
| WO2024158784A1 (en) * | 2023-01-23 | 2024-08-02 | Equilibar, Llc | Pumpless fluid delivery method and apparatus |
| US12443208B2 (en) | 2023-02-08 | 2025-10-14 | Rain Bird Corporation | Control zone devices, systems and methods |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000202774A (ja) * | 1999-01-18 | 2000-07-25 | Tokyo Seimitsu Co Ltd | スラリ―の供給装置 |
| CN101632974A (zh) * | 2009-08-17 | 2010-01-27 | 清华大学 | 无稳压器长尺寸喷涂管道压力稳定装置 |
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| US5480292A (en) | 1993-05-19 | 1996-01-02 | Asti Sae | Dual chamber pump |
| US5924794A (en) | 1995-02-21 | 1999-07-20 | Fsi International, Inc. | Chemical blending system with titrator control |
| JP3373144B2 (ja) | 1997-09-10 | 2003-02-04 | アドバンス電気工業株式会社 | 流量コントロールバルブ |
| US6352592B1 (en) * | 1998-01-16 | 2002-03-05 | Silicon Valley Group, Thermal Systems Llc | Free floating shield and semiconductor processing system |
| US6095194A (en) | 1998-03-20 | 2000-08-01 | Nippon Pillar Packaging Co., Ltd. | Pulsation suppression device for a pump |
| WO1999056189A1 (en) | 1998-04-30 | 1999-11-04 | The Boc Group, Inc. | Conductivity feedback control system for slurry blending |
| US6168048B1 (en) | 1998-09-22 | 2001-01-02 | American Air Liquide, Inc. | Methods and systems for distributing liquid chemicals |
| US20030010792A1 (en) * | 1998-12-30 | 2003-01-16 | Randy Forshey | Chemical mix and delivery systems and methods thereof |
| JP3205909B2 (ja) | 1999-10-25 | 2001-09-04 | 日本ピラー工業株式会社 | 脈動低減装置付きポンプ |
| US7905653B2 (en) * | 2001-07-31 | 2011-03-15 | Mega Fluid Systems, Inc. | Method and apparatus for blending process materials |
| CN101274230A (zh) * | 2000-07-31 | 2008-10-01 | 迅捷公司 | 用来混合加工材料的方法和装置 |
| US6561381B1 (en) * | 2000-11-20 | 2003-05-13 | Applied Materials, Inc. | Closed loop control over delivery of liquid material to semiconductor processing tool |
| US6554467B2 (en) * | 2000-12-28 | 2003-04-29 | L'air Liquide - Societe' Anonyme A'directoire Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude | Process and apparatus for blending and distributing a slurry solution |
| US6572255B2 (en) * | 2001-04-24 | 2003-06-03 | Coulter International Corp. | Apparatus for controllably mixing and delivering diluted solution |
| TW583355B (en) | 2001-06-21 | 2004-04-11 | M Fsi Ltd | Slurry mixing feeder and slurry mixing and feeding method |
| TW571182B (en) | 2001-12-04 | 2004-01-11 | Smc Kk | Flow rate control apparatus |
| US6732017B2 (en) | 2002-02-15 | 2004-05-04 | Lam Research Corp. | System and method for point of use delivery, control and mixing chemical and slurry for CMP/cleaning system |
| US6994464B2 (en) * | 2002-04-11 | 2006-02-07 | Mobius Technologies, Inc | Control system and method for continuous mixing of slurry with removal of entrained bubbles |
| JP3621690B2 (ja) * | 2002-04-16 | 2005-02-16 | 株式会社イワキ | コントロールシステム |
| JP3995543B2 (ja) | 2002-07-03 | 2007-10-24 | 旭有機材工業株式会社 | 流体制御弁 |
| JP2005537464A (ja) | 2002-07-19 | 2005-12-08 | マイクロリス コーポレイション | 流体フロー測定および比例流体フロー制御デバイス |
| US6860723B2 (en) * | 2002-10-05 | 2005-03-01 | Taiwan Semiconductor Manufacturing Co., Ltd | Slurry flow control and monitor system for chemical mechanical polisher |
| TWI265216B (en) * | 2003-04-18 | 2006-11-01 | Applied Materials Inc | Multi-chemistry plating system |
| JP4362473B2 (ja) * | 2003-06-20 | 2009-11-11 | 富士通マイクロエレクトロニクス株式会社 | 薬液供給装置及び供給装置 |
| JP4461329B2 (ja) | 2004-08-31 | 2010-05-12 | 旭有機材工業株式会社 | 流体制御装置 |
| US8485792B2 (en) * | 2009-01-23 | 2013-07-16 | Warren Rupp, Inc. | Method for increasing compressed air efficiency in a pump |
| US8297830B2 (en) * | 2009-03-04 | 2012-10-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Slurry system for semiconductor fabrication |
| JP2011115754A (ja) * | 2009-12-07 | 2011-06-16 | Hitachi Plant Technologies Ltd | 化学装置 |
| US20120122373A1 (en) * | 2010-11-15 | 2012-05-17 | Stmicroelectronics, Inc. | Precise real time and position low pressure control of chemical mechanical polish (cmp) head |
| CN102133731B (zh) * | 2011-01-06 | 2012-10-10 | 清华大学 | 一种用于cmp抛光头多腔室的压力控制系统 |
| US9770804B2 (en) * | 2013-03-18 | 2017-09-26 | Versum Materials Us, Llc | Slurry supply and/or chemical blend supply apparatuses, processes, methods of use and methods of manufacture |
| US10210957B2 (en) * | 2013-11-26 | 2019-02-19 | Ingenieria Y Marketing, S.A. | Portable apparatus for the boration of continuously flowing water |
| CN203856697U (zh) * | 2014-06-11 | 2014-10-01 | 北方工具设备(宁波)有限公司 | 一种稳定输出的双隔膜泵 |
| JP6669737B2 (ja) * | 2014-10-08 | 2020-03-18 | バーサム マテリアルズ ユーエス,リミティド ライアビリティ カンパニー | 低い圧力変動のフロー制御装置及び方法 |
-
2015
- 2015-10-08 JP JP2017518893A patent/JP6669737B2/ja active Active
- 2015-10-08 KR KR1020177012503A patent/KR102013906B1/ko active Active
- 2015-10-08 US US15/518,177 patent/US11266959B2/en active Active
- 2015-10-08 TW TW104133313A patent/TWI595339B/zh active
- 2015-10-08 WO PCT/US2015/054698 patent/WO2016057797A1/en not_active Ceased
- 2015-10-08 CN CN201580064737.2A patent/CN107111324B/zh active Active
- 2015-10-08 SG SG11201702586XA patent/SG11201702586XA/en unknown
- 2015-10-08 EP EP15848899.9A patent/EP3204733B1/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000202774A (ja) * | 1999-01-18 | 2000-07-25 | Tokyo Seimitsu Co Ltd | スラリ―の供給装置 |
| CN101632974A (zh) * | 2009-08-17 | 2010-01-27 | 清华大学 | 无稳压器长尺寸喷涂管道压力稳定装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2017531265A (ja) | 2017-10-19 |
| KR102013906B1 (ko) | 2019-08-23 |
| US20170259226A1 (en) | 2017-09-14 |
| WO2016057797A1 (en) | 2016-04-14 |
| US11266959B2 (en) | 2022-03-08 |
| SG11201702586XA (en) | 2017-04-27 |
| KR20170069254A (ko) | 2017-06-20 |
| EP3204733A4 (en) | 2018-07-25 |
| CN107111324A (zh) | 2017-08-29 |
| EP3204733A1 (en) | 2017-08-16 |
| EP3204733B1 (en) | 2022-05-11 |
| TWI595339B (zh) | 2017-08-11 |
| TW201626126A (zh) | 2016-07-16 |
| JP6669737B2 (ja) | 2020-03-18 |
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| GR01 | Patent grant |