TWI588274B - A copper alloy sheet for a heat radiating component and a heat radiating component - Google Patents
A copper alloy sheet for a heat radiating component and a heat radiating component Download PDFInfo
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- TWI588274B TWI588274B TW105109030A TW105109030A TWI588274B TW I588274 B TWI588274 B TW I588274B TW 105109030 A TW105109030 A TW 105109030A TW 105109030 A TW105109030 A TW 105109030A TW I588274 B TWI588274 B TW I588274B
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- 229910000881 Cu alloy Inorganic materials 0.000 title claims description 73
- 230000032683 aging Effects 0.000 claims description 53
- 238000010438 heat treatment Methods 0.000 claims description 44
- 239000010949 copper Substances 0.000 claims description 30
- 238000000034 method Methods 0.000 claims description 18
- 230000008569 process Effects 0.000 claims description 12
- 239000011247 coating layer Substances 0.000 claims description 11
- 229910052759 nickel Inorganic materials 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 229910052804 chromium Inorganic materials 0.000 claims description 8
- 229910052749 magnesium Inorganic materials 0.000 claims description 8
- 229910052748 manganese Inorganic materials 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 230000035882 stress Effects 0.000 claims description 8
- 229910052719 titanium Inorganic materials 0.000 claims description 8
- 229910052726 zirconium Inorganic materials 0.000 claims description 8
- 239000012535 impurity Substances 0.000 claims description 5
- 239000000463 material Substances 0.000 description 25
- 229910052802 copper Inorganic materials 0.000 description 23
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 22
- 230000000052 comparative effect Effects 0.000 description 14
- 229910000679 solder Inorganic materials 0.000 description 13
- 238000012360 testing method Methods 0.000 description 11
- 230000001965 increasing effect Effects 0.000 description 10
- 239000013078 crystal Substances 0.000 description 9
- 238000007747 plating Methods 0.000 description 9
- 238000001556 precipitation Methods 0.000 description 9
- 238000009792 diffusion process Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- 238000005452 bending Methods 0.000 description 7
- 229910052742 iron Inorganic materials 0.000 description 7
- 230000008018 melting Effects 0.000 description 7
- 238000002844 melting Methods 0.000 description 7
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- 239000003507 refrigerant Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 238000004018 waxing Methods 0.000 description 6
- 238000005275 alloying Methods 0.000 description 5
- 229910052785 arsenic Inorganic materials 0.000 description 5
- 229910052797 bismuth Inorganic materials 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- 230000007797 corrosion Effects 0.000 description 5
- 238000005260 corrosion Methods 0.000 description 5
- 238000007872 degassing Methods 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 239000002244 precipitate Substances 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 238000005096 rolling process Methods 0.000 description 5
- 239000006104 solid solution Substances 0.000 description 5
- 229910052725 zinc Inorganic materials 0.000 description 5
- 229910017755 Cu-Sn Inorganic materials 0.000 description 4
- 229910017927 Cu—Sn Inorganic materials 0.000 description 4
- 229910052787 antimony Inorganic materials 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000009833 condensation Methods 0.000 description 4
- 230000005494 condensation Effects 0.000 description 4
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 229910052745 lead Inorganic materials 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000004080 punching Methods 0.000 description 4
- 229910052711 selenium Inorganic materials 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
- 229910052718 tin Inorganic materials 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000005097 cold rolling Methods 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000000265 homogenisation Methods 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 229910001128 Sn alloy Inorganic materials 0.000 description 2
- 238000003490 calendering Methods 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 238000009749 continuous casting Methods 0.000 description 2
- 238000001887 electron backscatter diffraction Methods 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 238000005098 hot rolling Methods 0.000 description 2
- 238000005470 impregnation Methods 0.000 description 2
- 238000009740 moulding (composite fabrication) Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 238000009864 tensile test Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- FZQBLSFKFKIKJI-UHFFFAOYSA-N boron copper Chemical compound [B].[Cu] FZQBLSFKFKIKJI-UHFFFAOYSA-N 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000002003 electron diffraction Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000009830 intercalation Methods 0.000 description 1
- 230000002687 intercalation Effects 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
- C22C9/04—Alloys based on copper with zinc as the next major constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C13/00—Alloys based on tin
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C13/00—Alloys based on tin
- C22C13/02—Alloys based on tin with antimony or bismuth as the next major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/08—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Conductive Materials (AREA)
- Thermal Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Description
本發明為關於一種放熱零件用銅合金板以及放熱零件。 The present invention relates to a copper alloy sheet for an exothermic part and a heat releasing member.
搭載於桌上型PC或筆記型PC等之CPU的動作速度之高速化以及高密度化急速地進展,自此等CPU的發熱量大幅地增大。CPU之溫度若上升至一定以上的溫度,則會成為錯誤動作或熱當機等之原因,故來自CPU等半導體裝置之效果性的放熱成為切實之問題。 The CPU of the desktop PC or the notebook PC has rapidly increased the speed of operation and high density, and the amount of heat generated by the CPU has increased significantly. When the temperature of the CPU rises to a certain temperature or higher, the operation is caused by an erroneous operation or a thermal shutdown. Therefore, the effect of heat release from a semiconductor device such as a CPU becomes a practical problem.
作為吸收半導體裝置的熱,並發散至大氣中之放熱零件有使用散熱片。由於對散熱片要求高熱傳導性,故,作為素材有使用熱傳導率較大的銅或鋁等。然而,對流抗熱性會限制散熱片的性能,變得較難滿足發熱量增大之高機能電子零件的放熱要求。 A heat sink is used as a heat releasing member that absorbs heat of the semiconductor device and is radiated to the atmosphere. Since heat sink is required to have high thermal conductivity, copper or aluminum having a large thermal conductivity is used as a material. However, convection heat resistance limits the performance of the heat sink, making it more difficult to meet the heat release requirements of high-performance electronic components with increased heat generation.
因此,作為具有較高放熱性之放熱零件,有提案一種具備高熱傳導性以及熱輸送能力之管狀熱導管以 及平面狀熱導管(蒸氣腔)。熱導管藉由循環性地進行密封於內部之冷媒的蒸發(自CPU之吸熱)與凝縮(吸收的熱之放出),相較於散熱片,會發揮較高的放熱特性。且,有提案藉由將熱導管與散熱片或風扇這種放熱零件進行組合,來解決半導體裝置之發熱問題。 Therefore, as a heat release part with high heat release, there is proposed a tubular heat pipe having high heat conductivity and heat transfer capability. And a planar heat pipe (vapor chamber). The heat pipe exhibits high heat release characteristics by evaporation (condensation from the CPU) and condensation (absorption of absorbed heat) of the refrigerant sealed in the interior by cyclically. Moreover, it has been proposed to solve the problem of heat generation in a semiconductor device by combining a heat pipe with a heat radiating member such as a heat sink or a fan.
作為使用於放熱板、散熱片或熱導管等之放熱零件的素材,較多使用導電率以及耐蝕性較優異之純銅製(無氧銅:C1020)之板或管。為了確保成形加工性,作為素材,有使用軟質的燒鈍材(O材)或1/4H調質材,但在後述放熱零件之製造步驟中,會有容易發生變形或瑕疵,打洞加工時容易出現毛邊或容易磨耗打孔模具等問題。另一方面,引證1以2中有記載將Fe-P系之銅合金板作為放熱零件之素材。 As a material for a heat releasing member such as a heat radiating plate, a heat sink, or a heat pipe, a plate or tube made of pure copper (oxygen-free copper: C1020) having excellent electrical conductivity and corrosion resistance is often used. In order to ensure the formability, a soft blunt material (O material) or a 1/4H tempering material is used as a material. However, in the manufacturing process of a heat releasing component to be described later, deformation or flaws are likely to occur, and when the hole is processed, It is prone to problems such as burrs or easy to wear punching dies. On the other hand, in the reference 1 to 2, the Fe-P-based copper alloy sheet is described as a material for the heat releasing member.
放熱板以及散熱片係將純銅板以壓製成形、穿孔加工、切削、鑽孔加工以及蝕刻等加工成特定形狀後,因應必要,進行Ni電鍍或Sn電鍍後以焊料、蠟或接著劑等與CPU等之半導體裝置接合。 The heat release plate and the heat sink are processed into a specific shape by press forming, punching, cutting, drilling, etching, etc., and if necessary, Ni plating or Sn plating is performed with solder, wax or an adhesive, etc. with the CPU. The semiconductor devices are joined.
管狀熱導管(參照專利文獻3)係於管內將銅粉末燒結,形成燈芯,加熱脫氣處理後,將一端以塗蠟密封,在真空或減壓下將冷媒注入管內後,將另一端的端部以塗蠟密封來製造。 The tubular heat pipe (refer to Patent Document 3) is obtained by sintering copper powder in a tube to form a wick, and after heating and degassing, one end is sealed with a wax, and after the refrigerant is injected into the tube under vacuum or reduced pressure, the other end is used. The ends are made of a wax seal.
平面狀熱導管(參照專利文獻4以及5)能夠進一步提升管狀熱導管之放熱性能。作為平面狀熱導管,為了有效率地進行冷媒之凝縮與蒸發,有提案與管狀熱導管 同樣地於內面進行粗面化加工或溝加工等。將進行壓製成形、穿孔加工、切削或蝕刻等加工後的上下2片純銅板,以塗蠟、擴散接合或溶接等方法接合,將冷媒注入內部後,以塗蠟等方法來密封。在接合步驟中有時會進行脫氣處理。 The planar heat pipe (refer to Patent Documents 4 and 5) can further improve the heat release performance of the tubular heat pipe. As a planar heat pipe, in order to efficiently carry out condensation and evaporation of the refrigerant, there is a proposal and a tubular heat pipe Similarly, roughening processing, groove processing, and the like are performed on the inner surface. Two pieces of the upper and lower pure copper sheets processed by press molding, punching, cutting, or etching are joined by waxing, diffusion bonding, or welding, and the refrigerant is injected into the inside, and then sealed by waxing or the like. Degassing is sometimes performed during the joining step.
且,作為平面狀熱導管,有提案一種由外面構件、與收容在外面構件之內部的內部構件所構成者。內部構件係為了要促進冷媒之凝縮、蒸發以及輸送,而配置一個或複數個於外面構件之內部,且各種形狀之散熱片、突起、孔洞或狹縫等有經過加工。此形式之平面狀熱導管中,也能將內部構件配置於外面構件之內部後,以塗蠟或擴散接合等方法將外面構件與內部構件接合並一體化,注入冷媒後,以塗蠟等方法來密封。 Further, as the planar heat pipe, there is proposed a member including an outer member and an inner member housed inside the outer member. The internal members are arranged to facilitate condensation, evaporation, and transportation of the refrigerant, and one or more of the outer members are disposed inside, and fins, protrusions, holes, or slits of various shapes are processed. In the planar heat pipe of this type, after the internal member is disposed inside the outer member, the outer member and the inner member are joined and integrated by waxing or diffusion bonding, and after the refrigerant is injected, waxing or the like is applied. To seal.
[專利文獻1]日本特開2003-277853號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2003-277853
[專利文獻2]日本特開2014-189816號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2014-189816
[專利文獻3]日本特開2008-232563號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2008-232563
[專利文獻4]日本特開2007-315754號公報 [Patent Document 4] Japanese Patent Laid-Open Publication No. 2007-315754
[專利文獻5]日本特開2014-134347號公報 [Patent Document 5] Japanese Patent Laid-Open Publication No. 2014-134347
此等之放熱零件的製造步驟中,放熱板以及散熱片係於塗焊料或塗蠟之步驟而加熱至200~700℃左右。管狀熱導管、平面狀熱導管係於使用燒結、脫氣或磷銅硼(BCuP-2等)之塗蠟、擴散接合或溶接等之步驟加熱至800~1000℃左右。 In the manufacturing steps of the exothermic parts, the heat release plate and the heat sink are heated to about 200 to 700 ° C in the step of applying solder or wax. The tubular heat pipe and the planar heat pipe are heated to about 800 to 1000 ° C by a step of waxing, diffusion bonding or melting using sintering, degassing or phosphorous copper boron (BCuP-2 or the like).
例如使用純銅板作為熱導管之素材時,以650℃以上之溫度進行加熱時的軟化會較激烈。因此,在對散熱片或半導體裝置之安裝、或對PC基座之組合等時,製造之熱導管較容易變形,熱導管內部之構造會有變化,會有無法發揮所期望之放熱性能的問題。且,為了要防止如此變形,雖然將純銅板之厚度變厚即可,但若這樣做的話,熱導管之質量以及厚度會增大。厚度增大時,PC基座內部之隙間會變小,會有對流傳熱性能降低之問題。 For example, when a pure copper plate is used as the material of the heat pipe, the softening at the time of heating at a temperature of 650 ° C or higher is intense. Therefore, when mounting on a heat sink or a semiconductor device, or a combination with a PC base, etc., the heat pipe to be manufactured is easily deformed, the structure inside the heat pipe is changed, and the desired heat release performance cannot be exerted. . Further, in order to prevent such deformation, the thickness of the pure copper plate may be increased, but if this is done, the quality and thickness of the heat pipe will increase. When the thickness is increased, the gap between the insides of the PC base becomes small, and there is a problem that the convective heat transfer performance is lowered.
且,專利文獻1以及2所記載之銅合金板(Fe-P系)也是以650℃以上溫度加熱後,會軟化,且相較於純銅,導電率會大幅降低。因此,經過燒結、脫氣、塗蠟、擴散接合或溶接等步驟,來製造例如平面狀熱導管時,在同熱導管之搬送以及操作或對基盤之組合步驟等時,較容易變形。且,由於導電率降低,作為熱導管之所期的性能較難發揮。 Further, the copper alloy sheets (Fe-P type) described in Patent Documents 1 and 2 are also softened after being heated at a temperature of 650 ° C or higher, and the electrical conductivity is greatly lowered as compared with pure copper. Therefore, when a planar heat pipe is manufactured by a process such as sintering, degassing, waxing, diffusion bonding or melting, it is easier to deform when transporting and operating the same heat pipe or the step of combining the substrates. Moreover, since the electrical conductivity is lowered, the performance as a heat pipe is difficult to exert.
本發明有鑑於自純銅或銅合金板製造放熱零件之過程的一部分包含加熱至650℃以上之溫度的過程時,所產生的上述問題點、目的為提供一種銅合金板,其係使經過加熱至650℃以上之溫度的過程所製造之放熱零 件,具有充分強度與放熱性能。 The present invention has been made in view of the fact that a part of the process for producing an exothermic part from a pure copper or copper alloy sheet includes a process of heating to a temperature of 650 ° C or higher, and the object of the present invention is to provide a copper alloy sheet which is heated to Exothermic zero produced by a process at temperatures above 650 ° C Pieces with sufficient strength and heat release properties.
本發明相關之放熱零件用銅合金板係使用在包含加熱至650℃以上之過程作為製造放熱零件之過程的一部分與時效處理時,且含有Fe:1.0~2.4質量%、P:0.005~0.1質量%,殘餘部分由Cu以及不可避免之雜質而成,於850℃下加熱30分鐘後水冷,接著時效處理後之0.2%耐力為110MPa以上,導電率為50%IACS以上。 The copper alloy plate for the exothermic part according to the present invention is used in a process including heating to 650 ° C or more as part of the process of manufacturing the exothermic part and the aging treatment, and contains Fe: 1.0 to 2.4% by mass, P: 0.005 to 0.1 mass. %, the residual part is made of Cu and unavoidable impurities. After heating at 850 ° C for 30 minutes, it is water-cooled, and then 0.2% of the endurance after aging treatment is 110 MPa or more, and the electrical conductivity is 50% IACS or more.
本發明相關之放熱零件用銅合金板,能夠因應必要,進一步含有2.0質量%以下(不包含0質量%)之Zn、或/及0.005~0.5質量%之Sn作為合金元素。且,本發明相關之放熱零件用銅合金板能夠進一步以合計為0.5質量%以下(不包含0質量%)含有Mn、Mg、Si、Al、Cr、Ti、Zr、Ni以及Co中的1種或2種以上。 The copper alloy sheet for a heat-releasing component according to the present invention may further contain 2.0% by mass or less (excluding 0% by mass) of Zn, or/and 0.005 to 0.5% by mass of Sn as an alloying element, if necessary. Further, the copper alloy sheet for a heat-releasing component according to the present invention may further contain one of Mn, Mg, Si, Al, Cr, Ti, Zr, Ni, and Co in a total amount of 0.5% by mass or less (excluding 0% by mass). Or two or more.
本發明相關之銅合金板係使用於包含加熱至650℃以上之過程作為製造放熱零件之過程的一部分、與時效處理時。也就是說,本發明相關之使用銅合金板所製造之放熱零件在高溫加熱至650℃以上後會經時效處理,故強度會提升。 The copper alloy sheet according to the present invention is used in a process including heating to 650 ° C or higher as part of a process for manufacturing a heat releasing member, and an aging treatment. That is to say, the heat-releasing component manufactured by using the copper alloy sheet according to the present invention is subjected to aging treatment after being heated to a temperature of 650 ° C or higher at a high temperature, so that the strength is increased.
本發明相關之銅合金板於850℃下加熱30分鐘,接著進行時效處理時,0.2%耐力為110MPa以上,導電率為 50%IACS以上。本發明相關之銅合金板由於時效處理後之強度較高,故將使用此銅合金板所製造之熱導管等放熱零件安裝至散熱片或半導體裝置、或者組合至PC基座等時,該放熱零件較難變形。且,本發明相關之銅合金板雖然導電率比純銅板低,但由於時效處理後的強度較高,故能夠薄片化,在放熱性能這一點能夠補足導電率的降低部分。 The copper alloy sheet according to the present invention is heated at 850 ° C for 30 minutes, and then subjected to aging treatment, 0.2% of the endurance is 110 MPa or more, and the electrical conductivity is 50% IACS or more. The copper alloy sheet according to the present invention has a high strength after aging treatment, and therefore, when the heat releasing member such as a heat pipe manufactured by using the copper alloy sheet is attached to a heat sink or a semiconductor device, or is combined to a PC base or the like, the heat release is performed. Parts are more difficult to deform. Further, although the copper alloy sheet according to the present invention has a lower electrical conductivity than a pure copper plate, the strength after aging treatment is high, so that it can be flaky, and the portion where the electrical conductivity is lowered can be complemented by the heat release performance.
以下針對本發明相關之放熱零件用銅合金板進行更詳細地說明。 Hereinafter, the copper alloy sheet for a heat releasing component according to the present invention will be described in more detail.
本發明相關之銅合金板藉由、壓製成形、穿孔加工、切削或蝕刻等加工至特定形狀,經過高溫加熱(用於脫氣、接合(塗蠟、擴散接合或溶接)或燒結等之加熱),完成放熱零件。依照放熱零件之種類或製造方法,前述高溫加熱之加熱條件會有差異,但本發明中是想定於650℃~1050℃左右下來進行前述高溫加熱之狀況(被加熱材之實體溫度為650~1000℃)。本發明相關之銅合金板係由後述之組成的Fe-P系銅合金而成,加熱至前述溫度範圍內後,Fe以及P等元素之至少一部分會固溶,結晶粒成長,且發生軟化以及導電率之降低。 The copper alloy sheet according to the present invention is processed to a specific shape by, press forming, punching, cutting or etching, and is heated at a high temperature (for degassing, bonding (wax coating, diffusion bonding or melting) or sintering, etc.) , complete the exothermic parts. The heating conditions of the high-temperature heating may differ depending on the type of the heat-releasing component or the manufacturing method. However, in the present invention, the high-temperature heating is performed at about 650 ° C to 1050 ° C (the solid temperature of the heated material is 650 to 1000). °C). The copper alloy sheet according to the present invention is formed of an Fe-P-based copper alloy having a composition described later, and after heating to the above temperature range, at least a part of elements such as Fe and P are solid-solved, crystal grains are grown, and softening occurs. The decrease in electrical conductivity.
本發明相關之銅合金板,於850℃下加熱30分鐘後水冷,接著時效處理後之強度(0.2%耐力)為110MPa以上,導電率為50%IACS以上。850℃下30分鐘 之加熱是想定放熱零件之製造中前述高溫加熱的過程之加熱條件。將本發明相關之銅合金板以此條件高溫加熱後,加熱前所析出的Fe或P等元素會固溶,結晶粒會成長,會發生軟化以及導電率之降低。接著將前述銅合金板進行時效處理後,微細的Fe-P化合物或Fe等會析出。藉此,因前述高溫加熱而降低的強度以及導電率會有顯著得改善。 The copper alloy sheet according to the present invention is water-cooled after heating at 850 ° C for 30 minutes, and then the strength (0.2% proof) after the aging treatment is 110 MPa or more, and the electric conductivity is 50% IACS or more. 30 minutes at 850 ° C The heating is a heating condition for the above-described high-temperature heating process in the manufacture of the heat-releasing component. When the copper alloy sheet according to the present invention is heated at a high temperature under such conditions, elements such as Fe or P precipitated before heating are solid-solved, crystal grains are grown, softening occurs, and electrical conductivity is lowered. Next, after the copper alloy sheet is subjected to aging treatment, fine Fe-P compound or Fe or the like is precipitated. Thereby, the strength and electrical conductivity which are lowered by the aforementioned high-temperature heating are remarkably improved.
前述時效處理能夠以(a)高溫加熱後之冷卻步驟中保持於析出溫度範圍一定時間、(b)高溫加熱後冷卻至室溫,之後再加熱至析出溫度範圍保持一定時間、(c)前述(a)之步驟後,再加熱至析出溫度範圍保持一定時間、等之方法來實施。 The aging treatment can be maintained in the precipitation temperature range for a certain period of time in (a) the high-temperature heating step, (b) high-temperature heating, and then cooled to room temperature, and then heated to the precipitation temperature range for a certain period of time, (c) the foregoing ( After the step a), the method is further heated until the precipitation temperature range is maintained for a certain period of time.
作為具體的時效處理條件,有舉出在300~620℃之溫度範圍保持5分鐘~10小時之條件。以強度之提升為優先時,適當地選擇微細的Fe或Fe-P析出物所生成之溫度-時間條件即可,以導電率之提升為優先時,適當地選擇固溶之Fe以及P所減少之快過時效的溫度-時間條件即可。 As specific aging treatment conditions, the conditions are maintained in the temperature range of 300 to 620 ° C for 5 minutes to 10 hours. When priority is given to the improvement of the strength, the temperature-time conditions generated by the fine Fe or Fe-P precipitates may be appropriately selected, and when the conductivity is increased as a priority, the solid solution of Fe and P is appropriately selected to be reduced. It is faster than the aging temperature-time condition.
時效處理後之銅合金板,相較於高溫加熱後之純銅板,導電率較低,但強度相較於純銅板,有顯著地變高。為了得到此效果,本發明相關之使用銅合金板所製造之熱導管等的放熱零件在高溫加熱後有經時效處理。時效處理條件如前述。時效處理後之放熱零件(銅合金板)其強度較高,安裝至散熱片或半導體裝置、或組合至PC基座等時,能夠防止該放熱零件的變形。且,本發明相關之 銅合金板(時效處理後)相較於純銅板,強度較高,故能夠薄片化(0.1~1.0mm厚),藉此能夠提高放熱零件之放熱性能,且能夠補足與純銅板相較時的導電率之降低部分。 The copper alloy plate after the aging treatment has a lower electrical conductivity than the pure copper plate after the high temperature heating, but the strength is significantly higher than that of the pure copper plate. In order to obtain this effect, the heat releasing member of the heat pipe or the like manufactured using the copper alloy sheet according to the present invention is subjected to aging treatment after high temperature heating. The aging treatment conditions are as described above. The heat-dissipating component (copper alloy plate) after the aging treatment has high strength, and can be prevented from being deformed when mounted to a heat sink or a semiconductor device or combined to a PC base or the like. And related to the present invention Compared with the pure copper plate, the copper alloy plate (after aging treatment) has higher strength, so it can be thinned (0.1 to 1.0 mm thick), thereby improving the heat release performance of the exothermic part and complementing the time of the pure copper plate. The reduced portion of conductivity.
且,本發明相關之銅合金板即使高溫加熱之溫度未滿850℃(650℃以上)或超過850℃(1050℃以下),時效處理後,也能夠達成110MPa附近或其以上之0.2%耐力、以及50%IACS附近或其以上之導電率。 Moreover, even if the temperature of the high temperature heating of the copper alloy sheet according to the present invention is less than 850 ° C (650 ° C or more) or more than 850 ° C (1050 ° C or less), after the aging treatment, 0.2% of the endurance of 110 MPa or more can be achieved. And the conductivity near or above 50% IACS.
本發明相關之銅合金板在高溫加熱至650℃以上之溫度之前,能夠藉由壓製成形、穿孔加工、切削或蝕刻等,加工成構成放熱零件之構件。銅合金板具有在前述加工時的搬送以及操作中不容易變形之強度,且具有能夠無障礙地實施前述加工之機械特性較佳。更具體來說,本發明相關之銅合金板,其0.2%耐力為150MPa以上,張力為5%以上,板表面之平均結晶粒徑為20μm以下,以及具有優異之彎曲加工性(參照後述之實施例)較佳。只要滿足以上特性,在銅合金板之調質上就沒有問題。能夠使用於例如將溶體化處理材料、時效處理完成材料或時效處理完成材料進行冷間壓延而成之任一者。 The copper alloy sheet according to the present invention can be processed into a member constituting a heat releasing member by press forming, piercing, cutting, etching, or the like before being heated at a high temperature to a temperature of 650 ° C or higher. The copper alloy sheet has strength that is not easily deformed during transportation and handling during the above-described processing, and has mechanical properties that can perform the above-described processing without any trouble. More specifically, the copper alloy sheet according to the present invention has a 0.2% proof stress of 150 MPa or more, a tension of 5% or more, an average crystal grain size of the surface of the sheet of 20 μm or less, and excellent bending workability (refer to the following description for implementation). Example) is preferred. As long as the above characteristics are satisfied, there is no problem in the conditioning of the copper alloy sheet. For example, any of the solution treatment material, the aging treatment material, or the aging treatment material can be used for cold rolling.
如前面所述,將本發明相關之加工銅合金板所製造之放熱零件高溫加熱至650℃以上之溫度後,會軟化。高溫加熱後之放熱零件進一步具有在實施時效處理時的搬送以及操作中不容易變形之強度較佳。因此,於850℃下加熱30分鐘後水冷之段階,具有60MPa以上之0.2%耐力較佳。 As described above, the exothermic part manufactured by the processed copper alloy sheet according to the present invention is softened after being heated at a high temperature to a temperature of 650 ° C or higher. The heat-dissipating member after the high-temperature heating further has a strength which is not easily deformed during the conveyance and the operation at the time of performing the aging treatment. Therefore, the step of water cooling after heating at 850 ° C for 30 minutes has a resistance of 0.2% or more of 0.2 MPa or more.
本發明相關之使用銅合金板所製造之放熱零件在受到時效處理後,因應必要,將耐蝕性以及焊料塗布性之提升作為主要目的,在至少外表面的一部分有形成Sn被覆層。Sn被覆層中包含電鍍或無電解電鍍、或者此等之電鍍後,加熱至Sn之融點以下或融點以上所形成者。Sn被覆層中包含Sn金屬與Sn合金,作為Sn合金,有舉出包含合計為5質量%以下之Bi、Ag、Cu、Ni、In以及Zn中的1種以上作為Sn以外之合金元素者。 The heat-releasing member manufactured using the copper alloy sheet according to the present invention is subjected to aging treatment, and the corrosion resistance and the solder coating property are preferably increased as necessary, and an Sn coating layer is formed on at least a part of the outer surface. The Sn coating layer includes electroplating or electroless plating, or the like, and is heated to a point below the melting point of Sn or above the melting point. In the Sn coating layer, a Sn metal and a Sn alloy are contained, and as the Sn alloy, one or more of Bi, Ag, Cu, Ni, In, and Zn, which are 5% by mass or less in total, are used as alloying elements other than Sn.
Sn被覆層之下能夠形成Ni、Co或Fe等基底電鍍。此等之基底電鍍具有作為防止Cu或合金元素自基材擴散的障壁機能、以及防止放熱零件之表面硬度增加所造成的傷痕之機能。於前述基底電鍍上電鍍Cu,進而在電鍍Sn之後,進行加熱至Sn之融點以下或融點以上之熱處理,來形成Cu-Sn合金層,並且能夠設為基底電鍍、Cu-Sn合金層以及Sn被覆層之3層構成。Cu-Sn合金層具有作為防止Cu或合金元素自基材擴散的障壁機能、以及防止放熱零件之表面硬度增加所造成的傷痕之機能。 Substrate plating such as Ni, Co or Fe can be formed under the Sn coating layer. These base plating functions have a function as a barrier function for preventing diffusion of Cu or an alloying element from the substrate, and a flaw caused by an increase in surface hardness of the heat releasing member. Cu is electroplated on the base plating, and after the Sn is electroplated, heat treatment is performed below the melting point of Sn or above the melting point to form a Cu-Sn alloy layer, and the base plating, the Cu-Sn alloy layer, and the Cu-Sn alloy layer can be used. The Sn coating layer is composed of three layers. The Cu-Sn alloy layer has a function as a barrier function for preventing diffusion of Cu or an alloying element from the substrate, and a flaw caused by an increase in surface hardness of the heat releasing member.
且,本發明相關之使用銅合金板所製造之放熱零件在受到時效處理後,因應必要,在至少外表面的一部分有形成Ni被覆層。Ni被覆層具有防止Cu或合金元素自基材擴散之障壁機能、防止放熱零件之表面硬度增大所造成的傷痕之機能、以及提升耐蝕性之機能。 Further, after the aging treatment using the heat-dissipating member manufactured using the copper alloy sheet according to the present invention, a Ni coating layer is formed on at least a part of the outer surface as necessary. The Ni coating layer has a barrier function for preventing diffusion of Cu or an alloying element from the substrate, a function of preventing scratches caused by an increase in surface hardness of the heat releasing member, and a function of improving corrosion resistance.
接著針對本發明相關之銅合金板的組成進行說明。 Next, the composition of the copper alloy sheet according to the present invention will be described.
Fe會形成Fe單體或與P形成化合物並析出,具有提升時效處理後之銅合金板的強度以及導電率之作用。然而,Fe含量未滿1.0質量%時,時效處理後之0.2%耐力會未滿110MPa。另一方面,Fe含量若超過2.4質量%,則強度之提升比例會飽和,且,在溶解鑄造步驟中會形成粗大的Fe晶出物,在之後的加工步驟中較難使其消失。粗大的Fe晶出物會使耐蝕性、彎曲加工性、電鍍性等降低。因此,Fe含量設為1.0~2.4質量%。Fe含量之下限較佳為1.2質量%,上限較佳為2.2質量%。 Fe forms a Fe monomer or forms a compound with P and precipitates, and has the effect of enhancing the strength and conductivity of the copper alloy sheet after the aging treatment. However, when the Fe content is less than 1.0% by mass, the 0.2% endurance after the aging treatment may be less than 110 MPa. On the other hand, when the Fe content exceeds 2.4% by mass, the strength increase ratio is saturated, and coarse Fe crystals are formed in the dissolution casting step, which is difficult to be eliminated in the subsequent processing steps. The coarse Fe crystal grains can lower the corrosion resistance, the bending workability, the plating property, and the like. Therefore, the Fe content is set to 1.0 to 2.4% by mass. The lower limit of the Fe content is preferably 1.2% by mass, and the upper limit is preferably 2.2% by mass.
P會以脫氧作用將銅合金中包含的氧量降低,並具有防止以包含氫之還原環境加熱放熱零件時的氫脆性之作用。為了氫脆化防止,必須之P含量為0.005質量%以上。且,固溶後之P會使銅合金之導電率降低,但藉由加熱至析出溫度,會形成Fe-P化合物,藉此,可提升銅合金之強度、耐熱性、以及導電率。然而,P之含量若超過0.1質量%,則固溶之P的量會增加,導電率會未滿50%IACS。因此,P的含量設為0.005~0.1質量%。 P reduces the amount of oxygen contained in the copper alloy by deoxidation and has the effect of preventing hydrogen embrittlement when the exothermic part is heated in a reducing environment containing hydrogen. For the prevention of hydrogen embrittlement, the P content is required to be 0.005% by mass or more. Further, P after solid solution lowers the electrical conductivity of the copper alloy, but by heating to the precipitation temperature, an Fe-P compound is formed, whereby the strength, heat resistance, and electrical conductivity of the copper alloy can be improved. However, if the content of P exceeds 0.1% by mass, the amount of solid solution P increases, and the electrical conductivity may be less than 50% IACS. Therefore, the content of P is set to be 0.005 to 0.1% by mass.
Zn具有改善銅合金板的焊料之耐熱剝離性以及Sn電鍍之耐熱剝離性之作用,故能夠因應必要來添加。將放熱零件組合至半導體裝置時,有時會需要焊料塗布,且製造放熱零件後,為了耐蝕性之改善,有時會進行Sn電鍍。在如此之放熱零件之製造中,適合使用含有Zn之銅合金板。然而,Zn之含量若超過2.0質量%,則焊料可濕性會降低,故Zn之含量設為2.0質量%以下。Zn之 含量的上限值為0.7質量%以下較佳,為0.5質量%以下更較佳。另一方面,Zn含量未滿0.01質量%時,耐熱剝離性之改善較不充分,Zn之含量為0.01質量%以上較佳。Zn含量的下限值為0.05質量%更較佳,為0.1質量%再較佳。 Zn has an effect of improving the heat-resistant peeling property of the solder of the copper alloy sheet and the heat-resistant peeling property of the Sn plating, and therefore can be added as necessary. When a heat-dissipating component is combined in a semiconductor device, solder coating may be required, and after the heat-releasing component is manufactured, Sn plating may be performed for improvement of corrosion resistance. In the manufacture of such a heat releasing member, a copper alloy plate containing Zn is suitably used. However, when the content of Zn exceeds 2.0% by mass, the solder wettability is lowered, so the content of Zn is 2.0% by mass or less. Zn The upper limit of the content is preferably 0.7% by mass or less, more preferably 0.5% by mass or less. On the other hand, when the Zn content is less than 0.01% by mass, the improvement of the heat-resistant peeling property is insufficient, and the content of Zn is preferably 0.01% by mass or more. The lower limit of the Zn content is more preferably 0.05% by mass, and more preferably 0.1% by mass.
且,本發明之銅合金板包含Zn時,若以500℃以上之溫度加熱,則Zn會因為加熱環境而氣化,有時會汙染加熱爐。以防止Zn之氣化的觀點來看,Zn之含量較佳為設為0.5質量%以下,更較佳為0.3質量%以下,再較佳為設為0.2質量%以下。 Further, when the copper alloy sheet of the present invention contains Zn, if it is heated at a temperature of 500 ° C or higher, Zn is vaporized by the heating environment, which may contaminate the heating furnace. The content of Zn is preferably 0.5% by mass or less, more preferably 0.3% by mass or less, and still more preferably 0.2% by mass or less from the viewpoint of preventing vaporization of Zn.
Sn會固溶於銅合金母相,具有使銅合金的強度提升之作用,故能夠因應必要來添加。且,Sn之添加對耐應力緩和特性之提升也有效。放熱零件之使用環境若在80℃或其以上,則會發生潛變變形,與CPU等之熱源的接觸面變小,放熱性會降低,但藉由提升耐應力緩和特性,能夠抑制此現象。為了得到強度以及耐應力緩和特性之提升效果,Sn含量設為0.005質量%以上,較佳為0.01質量%以上,更佳為設為0.02質量%以上,再較佳為設為0.05質量%以上。另一方面,Sn的含量若超過0.5質量%,則時效處理後之銅合金板的導電率會未滿50%IACS。因此,Sn的含量設為0.5質量%以下。 Sn is solid-solubilized in the copper alloy mother phase and has the effect of increasing the strength of the copper alloy, so it can be added as necessary. Moreover, the addition of Sn is also effective for improving the stress relaxation resistance. When the environment in which the heat-dissipating component is used is 80 ° C or higher, the creeping deformation occurs, and the contact surface with the heat source such as the CPU becomes small, and the heat radiation property is lowered. However, the stress relaxation property can be improved to suppress the phenomenon. In order to obtain the effect of improving the strength and the stress relaxation resistance, the Sn content is 0.005% by mass or more, preferably 0.01% by mass or more, more preferably 0.02% by mass or more, and still more preferably 0.05% by mass or more. On the other hand, if the content of Sn exceeds 0.5% by mass, the electrical conductivity of the copper alloy sheet after the aging treatment may be less than 50% IACS. Therefore, the content of Sn is set to 0.5% by mass or less.
Mn、Mg、Si、Al、Cr、Ti、Zr、Ni以及Co具有提升銅合金之強度以及耐熱性之作用,能夠因應必要添加此等中的1種或2種以上。然而,若此等之元素中的 1種或2種以上之合計含量超過0.5質量%,則導電率會降低,故該含量設為0.5質量%以下(不包含0質量%)。此等之元素中的1種或2種以上之合計含量的下限值較佳為0.01質量%,更較佳為0.02%,再較佳為0.03%。 Mn, Mg, Si, Al, Cr, Ti, Zr, Ni, and Co have an effect of improving the strength and heat resistance of the copper alloy, and one or more of these may be added as necessary. However, if these elements are When the total content of one kind or two or more is more than 0.5% by mass, the electrical conductivity is lowered. Therefore, the content is 0.5% by mass or less (excluding 0% by mass). The lower limit of the total content of one or two or more of these elements is preferably 0.01% by mass, more preferably 0.02%, still more preferably 0.03%.
且,複合式地添加任意元素之Zn、Sn、以及其他強化元素(Mn、Mg、Si、Al、Cr、Ti、Zr、Ni以及Co)時,以於850℃下加熱30分鐘後水冷,接著時效處理後之導電率未滿50%IACS之範圍來添加。 Further, when Zn, Sn, and other strengthening elements (Mn, Mg, Si, Al, Cr, Ti, Zr, Ni, and Co) of any element are added in combination, they are heated at 850 ° C for 30 minutes, and then water-cooled, followed by water cooling. The conductivity after the aging treatment is added in the range of less than 50% IACS.
不可避免之雜質的H、O、S、Pb、Bi、Sb、Se以及As,若銅合金板長時間加熱至650℃以上之溫度,會聚集在粒界,可能會引起加熱中以及加熱後之粒界破裂以及粒界脆化等,故降低此等之元素的含量較佳。H在加熱中會聚集在粒界、介在物與基材之界面,會使膨脹產生,故較佳為設為未滿1.5ppm(質量ppm,以下相同),更較佳為設為未滿1ppm。O較佳為未滿20ppm,更較佳為設為未滿15ppm。S、Pb、Bi、Sb、Se以及As較佳為合計未滿30ppm,更較佳為設為未滿20ppm。尤其是關於Bi、Sb、Se以及As,較佳為將此等之元素的合計含量設為未滿10ppm,更較佳為設為未滿5ppm。 H, O, S, Pb, Bi, Sb, Se, and As, which are unavoidable impurities, if the copper alloy plate is heated to a temperature of 650 ° C or more for a long time, it will accumulate at the grain boundary, which may cause heating and heating. It is preferable to reduce the content of such elements by rupture of grain boundaries and embrittlement of grain boundaries. H aggregates at the grain boundary and the interface between the material and the substrate during heating, which causes expansion. Therefore, it is preferably set to less than 1.5 ppm (ppm by mass, the same below), and more preferably set to less than 1 ppm. . O is preferably less than 20 ppm, more preferably less than 15 ppm. S, Pb, Bi, Sb, Se and As are preferably less than 30 ppm in total, and more preferably less than 20 ppm. In particular, in the case of Bi, Sb, Se, and As, it is preferable that the total content of the elements is less than 10 ppm, and more preferably less than 5 ppm.
本發明相關之銅合金板可藉由例如將鑄塊熱間壓延後,重複1次或2次以上的冷間壓延與熱處理(時效處理)來製造。使用前述組成之銅合金,由以下之條件所製造之銅合金板,其0.2%耐力為150MPa以上,張力為5%以上,板表面之平均結晶粒徑為20μm以下,且具有優 異之彎曲加工性。且,於850℃下加熱30分鐘,接著時效處理後,具有110MPa以上之0.2%耐力以及50%IACS以上之導電率。 The copper alloy sheet according to the present invention can be produced, for example, by calendering the ingot, and repeating the cold rolling and the heat treatment (aging treatment) one or two times or more. A copper alloy sheet produced by the following conditions has a 0.2% proof stress of 150 MPa or more, a tension of 5% or more, and an average crystal grain size of 20 μm or less on the surface of the sheet, and is excellent. Different bending workability. Further, it was heated at 850 ° C for 30 minutes, and then subjected to aging treatment to have a 0.2% proof stress of 110 MPa or more and a conductivity of 50% IACS or more.
溶解以及鑄造能夠藉由連續鑄造或半連續鑄造等通常之方法來進行。且,作為銅溶解原料,使用S、Pb、Bi、Se以及As含量較少者較佳。且,注意被覆於銅合金熔融之木碳的赤熱化(水分去除)、裸金屬、殘渣原料、槽溝、鑄型之乾燥、以及熔融之脫氧等,降低O以及H較佳。 Dissolution and casting can be carried out by a usual method such as continuous casting or semi-continuous casting. Further, as the copper dissolution raw material, it is preferred to use a small content of S, Pb, Bi, Se, and As. In addition, it is preferable to reduce O and H by red heat (moisture removal), bare metal, residue raw material, groove, drying of the mold, and deoxidation of molten metal coated with the molten copper of the copper alloy.
對鑄塊進行均質化處理較佳,均質化處理在鑄塊內部到達溫度800℃後,保持30分鐘以上較佳。均質化處理之保持時間更較佳為1小時以上,再較佳為2小時以上。 It is preferred to homogenize the ingot, and the homogenization treatment is preferably carried out for 30 minutes or more after reaching the temperature of 800 ° C inside the ingot. The holding time of the homogenization treatment is more preferably 1 hour or more, still more preferably 2 hours or more.
均質化處理後,熱間壓延以800℃以上之溫度開始,使粗大的Fe、或Fe-P析出物不會形成在熱間壓延材上,熱間壓延以600℃以上之溫度結束,藉由此溫度自水冷等之方法急冷卻較佳。熱間壓延後之急冷卻開始溫度若比600℃低,則粗大的Fe、以及Fe-P析出物會形成,組織較容易不均勻,銅合金板(製品板)之強度會降低。 After the homogenization treatment, the inter-heat rolling starts at a temperature of 800 ° C or higher, so that coarse Fe or Fe-P precipitates are not formed on the inter-heated rolled material, and the inter-heat rolling is terminated at a temperature of 600 ° C or higher. This temperature is preferably cooled by a method such as water cooling. When the rapid cooling start temperature after the hot rolling is lower than 600 ° C, coarse Fe and Fe-P precipitates are formed, the structure is more likely to be uneven, and the strength of the copper alloy plate (product plate) is lowered.
熱間壓延後係(a)將熱間壓延材冷間壓延至製品厚度,進行時效處理、(b)將熱間壓延材進行冷間壓延以及時效處理,進一步冷間壓延至製品厚度、或(c)在前述(b)之後,進行低溫燒鈍(延性之回復)。 After the inter-heat rolling, (a) the inter-heating rolled material is cold-rolled to the thickness of the product, subjected to aging treatment, (b) the inter-heating rolled material is subjected to cold rolling and aging treatment, and further cold-rolled to the thickness of the product, or c) After the aforementioned (b), low temperature burning (return of ductility) is carried out.
時效處理(析出處理)係以在加熱溫度300~620℃左右 下保持0.5~10小時之條件來進行。此加熱溫度未滿300℃時,析出量較少,若超過620℃,則析出物容易粗大化。加熱溫度之下限較佳為設為350℃、更較佳為設為400℃,上限較佳為600℃,更較佳為設為580℃。時效處理之保持時間能因加熱溫度而適當地選擇,在0.5~10小時之範圍內進行。此保持時間在0.5小時以下時,析出較不充分,即使超過10小時,析出量也會飽和,生產性會降低。保持時間之下限較佳為1小時,更較佳為設為2小時。可以在上述加熱溫度以及保持時間之範圍內重複時效處理2次以上。 The aging treatment (precipitation treatment) is performed at a heating temperature of about 300 to 620 ° C. It is carried out under conditions of 0.5 to 10 hours. When the heating temperature is less than 300 ° C, the amount of precipitation is small, and when it exceeds 620 ° C, the precipitate is likely to be coarsened. The lower limit of the heating temperature is preferably 350 ° C, more preferably 400 ° C, the upper limit is preferably 600 ° C, and more preferably 580 ° C. The holding time of the aging treatment can be appropriately selected depending on the heating temperature, and is carried out in the range of 0.5 to 10 hours. When the holding time is 0.5 hours or less, precipitation is insufficient, and even if it exceeds 10 hours, the amount of precipitation is saturated, and productivity is lowered. The lower limit of the holding time is preferably 1 hour, more preferably 2 hours. The aging treatment may be repeated twice or more within the above heating temperature and holding time.
鑄造表1所示之組成的銅合金(僅比較例9,純銅),分別製作厚度45mm之鑄塊。此銅以及銅合金中,不可避免之雜質的H未滿1ppm,O未滿20ppm,S、Pb、Bi、Sb、Se以及As以合計來說未滿20ppm。 A copper alloy having a composition shown in Table 1 (Comparative Example 9, pure copper only) was cast, and ingots each having a thickness of 45 mm were produced. In the copper and copper alloy, H of the unavoidable impurity is less than 1 ppm, O is less than 20 ppm, and S, Pb, Bi, Sb, Se, and As are less than 20 ppm in total.
對各鑄塊進行950℃下2小時的均熱處理,接著進行熱間壓延,製成板厚15mm的熱間壓延材,自700℃以上之溫度進行淬火(水冷)。分別研磨淬火後之熱間壓延材的兩面1mm後,冷間粗壓延至目標板厚0.6mm,進行於500℃下保持2小時之時效處理(伴有再結晶),接著施予完成50%的冷間壓延,製造板厚0.3mm之銅合金板。 Each of the ingots was subjected to a soaking treatment at 950 ° C for 2 hours, followed by hot rolling, to obtain a hot intercalation material having a thickness of 15 mm, and quenching (water cooling) from a temperature of 700 ° C or higher. After grinding the two sides of the quenched hot-rolled material by 1 mm, the cold-thickness was roughly rolled to a target thickness of 0.6 mm, and the aging treatment was carried out at 500 ° C for 2 hours (with recrystallization), and then 50% of the application was completed. Calendered between cold, and a copper alloy plate having a thickness of 0.3 mm was produced.
且,將所得之銅合金板於室溫下抽真空後,取代Ar氣體並加熱,板材溫度到達850℃進行30分鐘加熱後水冷者,將前述水冷材進一步以500℃加熱2小時(時效處理)者分別作為供試材料,進行導電率以及機械特性的各種測定。 Then, after the obtained copper alloy sheet was evacuated at room temperature, it was replaced with Ar gas and heated, and the sheet temperature reached 850 ° C for 30 minutes, and then water-cooled, and the water-cooled material was further heated at 500 ° C for 2 hours (aging treatment). Each of them was used as a test material to perform various measurements of electrical conductivity and mechanical properties.
將各試驗結果表示於表1。 The results of each test are shown in Table 1.
(導電率之測定) (Measurement of conductivity)
導電率之測定是根據JIS-H0505所規定之非鐵金屬材料導電率測定法,並以使用雙電橋之四終端方法來進行。試驗片之尺寸為寬度15mm以及長度300mm。 The conductivity was measured in accordance with the conductivity measurement method of the non-ferrous metal material specified in JIS-H0505, and was carried out by a four-terminal method using a double bridge. The size of the test piece was 15 mm in width and 300 mm in length.
(機械的特性) (mechanical characteristics)
自供試材料以縱向方向成為壓延平行方向之方式切出JIS5號拉伸試驗片,根據JIS-Z2241實施拉伸試驗,測定耐力與延展力。耐力係相當於永久張力0.2%之伸拉強度。 The JIS No. 5 tensile test piece was cut out from the test material in such a manner that the longitudinal direction was a rolling parallel direction, and a tensile test was carried out in accordance with JIS-Z2241 to measure endurance and elongation. Endurance is equivalent to a tensile strength of 0.2% of permanent tension.
(平均結晶粒徑) (average crystal grain size)
平均結晶粒徑(圓相當直徑)為使用SEM(Scanning Electron Microscope)並以背向散射電子繞射分析(EBSD:Electron Back-Scatter Diffraction)來測定。 The average crystal grain size (circle equivalent diameter) was measured using SEM (Scanning Electron Microscope) and backscattered electron diffraction analysis (EBSD: Electron Back-Scatter Diffraction).
(彎曲加工性) (bending workability)
彎曲加工性之測定是根據伸銅協會標準JBMA-T307所規定的W彎曲試驗方法來實施。自各供試材料切出寬度10mm、長度30mm之試驗片,使用R/t=0.5之工模,進行G.W.(Good Way(彎曲軸與壓延方向垂直))以及B.W.(Bad Way(彎曲軸與壓延方向平行))之彎曲。接著,以100倍的光學顯微鏡目測觀察彎曲部中有無破裂,將G.W.或B.W.兩者都沒有產生破裂者評價為○(合格),將G.W.或B.W.的任一者或兩者產生破裂者評價為×(不合格)。 The measurement of the bending workability was carried out in accordance with the W bending test method prescribed by the Copper Extension Society Standard JBMA-T307. A test piece having a width of 10 mm and a length of 30 mm was cut out from each test material, and GW (Good Way (vertical axis and rolling direction)) and BW (Bad Way) were used using a mold of R/t = 0.5 (Bad Way) Parallel))). Next, the presence or absence of cracking in the bent portion was visually observed by a 100-fold optical microscope, and it was evaluated as ○ (qualified) in the case where neither GW nor BW was broken, and the crack or the GW or BW was evaluated as × (failed).
(焊料可濕性) (solder wettability)
自各供試材料採取布帶狀試驗片,將非活性助焊劑浸漬1秒鐘並塗布後,由新月型法測定焊料可濕時間。焊料為使用保持在260±5℃之Sn-3質量%Ag-0.5質量%Cu,以浸漬速度為25mm/sec、浸漬深度為5mm以及浸漬時間為5sec之試驗條件來實施。將焊料可濕時間為2秒以下者評價為焊料可濕性優異。且,比較例7以外,焊料可濕時間為2秒以下。 A tape test piece was taken from each test material, and the inactive flux was immersed for 1 second and coated, and the solder wet time was measured by a crescent type method. The solder was applied under the test conditions of Sn-3 mass% Ag-0.5 mass% Cu maintained at 260 ± 5 ° C, impregnation speed of 25 mm/sec, impregnation depth of 5 mm, and immersion time of 5 sec. When the solder wettable time was 2 seconds or less, it was evaluated that the solder wettability was excellent. Further, in addition to Comparative Example 7, the solder wettable time was 2 seconds or shorter.
如表1所示之實施例1~12的銅合金板,其合金組成滿足本發明之規定,於850℃下加熱30分鐘,接著時效處理後之強度(0.2%耐力)為110MPa以上,且導電率為50%IACS以上。且,以850℃加熱之前的銅合金板之特性為強度(0.2%耐力)為150MPa以上,張力為5%以上,平均結晶粒徑為20μm以下,彎曲加工性以及焊料可 濕性也較優異。以850℃加熱之後,相較於以往材料之比較例9,也具有較高70MPa以上之強度(0.2%耐力)。 The copper alloy sheets of Examples 1 to 12 shown in Table 1 have an alloy composition satisfying the requirements of the present invention, and are heated at 850 ° C for 30 minutes, and then the strength (0.2% proof) after the aging treatment is 110 MPa or more, and is electrically conductive. The rate is 50% IACS or more. Further, the characteristics of the copper alloy sheet before heating at 850 ° C are strength (0.2% proof) of 150 MPa or more, tension of 5% or more, average crystal grain size of 20 μm or less, bending workability and soldering. The wetness is also excellent. After heating at 850 ° C, it also had a strength of higher than 70 MPa (0.2% proof) compared to Comparative Example 9 of the conventional material.
相對於此,比較例1~8之銅合金板以及比較例9之純銅板如以下所示,有些特性較差。 On the other hand, the copper alloy sheets of Comparative Examples 1 to 8 and the pure copper sheets of Comparative Example 9 were inferior in some characteristics as described below.
比較例1以及2由於Fe含量較少,故時效處理後之強度較低。 In Comparative Examples 1 and 2, since the Fe content was small, the strength after the aging treatment was low.
比較例3中,P含量過多,且對Fe-P化合物之析出無貢獻之P會固溶,時效處理後之導電率較低。 In Comparative Example 3, the P content was too large, and P which did not contribute to the precipitation of the Fe-P compound was solid-solved, and the electrical conductivity after the aging treatment was low.
比較例4中,Zn與Sn之合計含量比較多,且固溶後之Zn與Sn之合計量也變得較多,故時效處理後之導電率會未滿50%IACS。 In Comparative Example 4, the total content of Zn and Sn was relatively large, and the total amount of Zn and Sn after solid solution was also increased. Therefore, the electrical conductivity after the aging treatment was less than 50% IACS.
比較例5以及6中,Sn含量過多,且因固溶之Sn,時效處理後之導電率會降低。 In Comparative Examples 5 and 6, the Sn content was excessive, and the conductivity after the aging treatment was lowered due to the solid solution of Sn.
比較例7中,Zn含量過多,如先前所述焊料可濕性較差。 In Comparative Example 7, the Zn content was excessive, and the solder wettability was poor as described earlier.
比較例8中,Zn、Sn及以其他元素之合計含量比較多,時效處理後之導電率會低於50%IACS。 In Comparative Example 8, the total content of Zn, Sn, and other elements was relatively large, and the electrical conductivity after the aging treatment was lower than 50% IACS.
比較例9為以往之純銅板,雖導電率較高,但強度在時效處理後也很低。 Comparative Example 9 is a conventional pure copper plate, and although the electrical conductivity is high, the strength is also low after the aging treatment.
關於表1所示之銅合金板中的代表者(實施例3以及7與比較例1以及4),於1000℃下加熱30分鐘後水冷,進一步於500℃下加熱2小時(時效處理),將該銅 合金板作為供試材料,並以實施例1記載之方法來進行導電率以及機械特性的各種測定試驗。將其結果表示於表2。 Representatives of the copper alloy sheets shown in Table 1 (Examples 3 and 7 and Comparative Examples 1 and 4) were heated at 1000 ° C for 30 minutes, then water-cooled, and further heated at 500 ° C for 2 hours (aging treatment). The copper The alloy plate was used as a test material, and various measurement tests of electrical conductivity and mechanical properties were carried out by the method described in Example 1. The results are shown in Table 2.
如表2所示,實施例3及7以及比較例1及4,於1000℃下加熱30分鐘,接著時效處理後之強度(0.2%耐力)以及導電率會比於850℃下加熱30分鐘,接著時效處理後之強度以及導電率(參照表1)更低。然而,實施例3以及7中,強度(0.2%耐力)以及導電率之降低較小,作為於1000℃下加熱30分鐘,接著時效處理後之強度以及導電率,會得到110MPa以及50%IACS附近或其以上之值。 As shown in Table 2, Examples 3 and 7 and Comparative Examples 1 and 4 were heated at 1000 ° C for 30 minutes, and then the strength (0.2% proof) and conductivity after aging treatment were heated for 30 minutes at 850 ° C. The strength and conductivity (see Table 1) after the aging treatment are then lower. However, in Examples 3 and 7, the strength (0.2% proof) and the decrease in electrical conductivity were small, and the heat and temperature at 1000 ° C for 30 minutes, followed by the strength and conductivity after the aging treatment, were obtained in the vicinity of 110 MPa and 50% IACS. Or a value above it.
本說明書之揭示內容包含以下型態。 The disclosure of this specification contains the following types.
型態1: Type 1:
一種放熱零件用銅合金板,其特徵為含有Fe:1.0~2.4質量%、P:0.005~0.1質量%,殘餘部分由Cu以及不可避免之雜質而成,於850℃下加熱30分鐘後水冷,接著時效處理後之0.2%耐力為110MPa以上,導電率為50%IACS以上,製造放熱零件之過程的一部分包含加熱至650℃以上之過程與時效處理。 A copper alloy plate for exothermic parts, characterized in that it contains Fe: 1.0 to 2.4% by mass, P: 0.005 to 0.1% by mass, and the residual portion is formed of Cu and unavoidable impurities, and is heated at 850 ° C for 30 minutes and then water-cooled. Then, the 0.2% proof stress after the aging treatment is 110 MPa or more, and the electric conductivity is 50% IACS or more. A part of the process of manufacturing the exothermic part includes a process of heating to 650 ° C or more and an aging treatment.
型態2: Type 2:
如型態1之放熱零件用銅合金板,其中,進一步含有2.0質量%以下之Zn(不包含0質量%)。 A copper alloy plate for a heat releasing component of the first aspect, which further contains 2.0% by mass or less of Zn (excluding 0% by mass).
型態3: Type 3:
如型態1或2之放熱零件用銅合金板,其中,進一步含有0.005~0.5質量%之Sn。 A copper alloy plate for a heat releasing component of the type 1 or 2, which further contains 0.005 to 0.5% by mass of Sn.
型態4: Type 4:
如型態1~3中任一項之放熱零件用銅合金板,其中, 進一步以合計為0.5質量%以下(不包含0質量%)含有Mn、Mg、Si、Al、Cr、Ti、Zr、Ni以及Co中的1種或2種以上。 A copper alloy plate for a heat releasing component according to any one of the types 1 to 3, wherein In addition, one or two or more of Mn, Mg, Si, Al, Cr, Ti, Zr, Ni, and Co are contained in a total amount of 0.5% by mass or less (excluding 0% by mass).
型態5: Type 5:
一種放熱零件,其特徵為由如型態1~4中任一項之放熱零件用銅合金板所製造,且在加熱至650℃以上之過程後,接受時效處理。 An exothermic part characterized by being produced from a copper alloy sheet for a heat releasing part according to any one of the types 1 to 4, and subjected to an aging treatment after heating to a temperature of 650 ° C or higher.
型態6: Type 6:
如型態5之放熱零件,其係在外表面的至少一部分有形成Sn被覆層。 A heat releasing component of the type 5 is formed by forming a Sn coating layer on at least a portion of the outer surface.
型態7: Type 7:
如型態5之放熱零件,其係在外表面的至少一部分有形成Ni被覆層。 The exothermic part of the form 5 has a Ni coating layer formed on at least a portion of the outer surface.
本案以申請日為2015年3月27日之日本特許出願之日本特願第2015-066518號的基礎申請案來主張優先權。參照日本特願第2015-066518號而導入本說明書中。 In this case, the priority is claimed based on the basic application of Japan Patent Application No. 2015-066518, which is filed on March 27, 2015. This specification is incorporated by reference to Japanese Patent Application No. 2015-066518.
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JP6446010B2 (en) * | 2016-09-29 | 2018-12-26 | 株式会社神戸製鋼所 | Copper alloy plate for heat dissipation parts |
KR102226988B1 (en) * | 2016-10-05 | 2021-03-11 | 가부시키가이샤 고베 세이코쇼 | Copper alloy plate for heat dissipation parts, heat dissipation parts, and manufacturing method of heat dissipation parts |
CN109402446A (en) * | 2018-12-24 | 2019-03-01 | 中铝洛阳铜加工有限公司 | A kind of high-end frame material copper strips preparation process |
CN109930099B (en) * | 2019-01-31 | 2020-06-02 | 河南师范大学 | Preparation method of high-strength strong-cube-texture Cu-Fe-Zr-P alloy baseband |
CN115091153A (en) * | 2022-07-05 | 2022-09-23 | 珠海市斗门区宇博电子科技有限公司 | Manufacturing process of radiator |
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JP2015048517A (en) * | 2013-09-03 | 2015-03-16 | Jx日鉱日石金属株式会社 | Copper alloy sheet excellent in conductivity and bending deflection coefficient |
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JP5467163B1 (en) | 2013-03-26 | 2014-04-09 | Jx日鉱日石金属株式会社 | Copper alloy plate, heat dissipating electronic component comprising the same, and method for producing copper alloy plate |
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JP2011252215A (en) * | 2010-06-03 | 2011-12-15 | Mitsubishi Shindoh Co Ltd | Copper alloy strip material excellent in heat dissipation and adhesion and prepared for electronic apparatus |
JP2015048517A (en) * | 2013-09-03 | 2015-03-16 | Jx日鉱日石金属株式会社 | Copper alloy sheet excellent in conductivity and bending deflection coefficient |
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