TWI582412B - Chip on glass bonding inspection apparatus - Google Patents

Chip on glass bonding inspection apparatus Download PDF

Info

Publication number
TWI582412B
TWI582412B TW104132659A TW104132659A TWI582412B TW I582412 B TWI582412 B TW I582412B TW 104132659 A TW104132659 A TW 104132659A TW 104132659 A TW104132659 A TW 104132659A TW I582412 B TWI582412 B TW I582412B
Authority
TW
Taiwan
Prior art keywords
imaging device
inspection object
image
scanning direction
trigger signal
Prior art date
Application number
TW104132659A
Other languages
Chinese (zh)
Other versions
TW201602561A (en
Inventor
金鮮中
李倫基
李誠錄
Original Assignee
V One技術股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by V One技術股份有限公司 filed Critical V One技術股份有限公司
Publication of TW201602561A publication Critical patent/TW201602561A/en
Application granted granted Critical
Publication of TWI582412B publication Critical patent/TWI582412B/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67288Monitoring of warpage, curvature, damage, defects or the like
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K13/00Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
    • H05K13/08Monitoring manufacture of assemblages
    • H05K13/081Integration of optical monitoring devices in assembly lines; Processes using optical monitoring devices specially adapted for controlling devices or machines in assembly lines

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Operations Research (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Description

玻璃上晶片之接合檢驗設備 Bond inspection equipment for wafers on glass 【相關申請的交叉引用】[Cross-reference to related applications]

本申請案主張2014年1月22日所提出的韓國智慧財產權局的韓國專利申請No.10-2014-0007705的優先權,在此通過引用方式將該申請的公開內容併入本文。 The present application claims the priority of the Korean Patent Application No. 10-2014-0007705, filed on Jan. 22, 2014, the disclosure of which is hereby incorporated by reference.

本發明涉及玻璃上晶片(chip on glass,COG)接合檢驗設備。更具體地說,本發明涉及能夠同時進行壓痕核對總和對準檢驗來檢驗玻璃上晶片接合狀態的玻璃上晶片接合檢驗設備。 The present invention relates to a chip on glass (COG) joint inspection apparatus. More specifically, the present invention relates to an on-glass wafer bonding inspection apparatus capable of simultaneously performing an indentation check sum alignment check to inspect a wafer bonding state on a glass.

一般來說,玻璃上晶片接合是指在使用面板製造顯示裝置時晶片與面板的接合。晶片向面板提供用於顯現圖像的外部控制信號。 In general, wafer bonding on a glass refers to bonding of a wafer to a panel when a display device is manufactured using a panel. The wafer provides an external control signal to the panel for visualizing the image.

具體地說,玻璃上晶片接合的過程如下:將含有導電顆粒的各向異性導電膜貼附在面板的引線上,然後將晶片安裝在各向異性導電膜上並向各向異性導電膜施加適當的熱和壓力,從而利用各向異性導電膜將面板的引線與晶片接合。這裡,各向異性導電膜所含有的導電顆粒會破裂,因此,面板的引線通過破裂的導電顆粒與晶片電連接。 Specifically, the process of wafer bonding on a glass is as follows: an anisotropic conductive film containing conductive particles is attached to a lead of a panel, and then the wafer is mounted on an anisotropic conductive film and applied to the anisotropic conductive film appropriately. The heat and pressure thereby bonding the leads of the panel to the wafer using an anisotropic conductive film. Here, the conductive particles contained in the anisotropic conductive film may be broken, and therefore, the leads of the panel are electrically connected to the wafer through the broken conductive particles.

然而,如果在進行玻璃上晶片接合時晶片不能與引線精確對準,那麼可能會出現接觸故障。因此,在進行玻璃上晶片接合之後,需要 精確地檢驗晶片與面板之間的接合狀態。 However, if the wafer cannot be precisely aligned with the leads during wafer bonding on the glass, contact failure may occur. Therefore, after performing wafer bonding on the glass, it is required The joint state between the wafer and the panel is accurately inspected.

晶片與面板之間的接合狀態的檢驗可以包括:用於檢驗晶片 與面板之間的各向異性導電膜內的導電球是否被正常壓縮的壓痕檢驗,以及用於檢驗晶片和面板是否均安裝(接合)在其精確位置的對準檢驗。 The inspection of the bonding state between the wafer and the panel may include: for inspecting the wafer Whether the conductive ball in the anisotropic conductive film between the panels is inspected by normal compression indentation, and an alignment test for verifying whether the wafer and the panel are both mounted (joined) at their precise positions.

根據在韓國專利登記No.10-0549470(專利檔1)中公開的 壓痕檢驗,將作為破裂導電顆粒標記的凹入壓痕(indentation impression)的分佈狀態捕捉成三維圖像並對捕捉的圖像進行分析,從而檢驗接合狀態。 此外,根據在韓國專利公開No.10-2010-0070814(專利檔2)中公開的對準檢驗,將形成在晶片上的對準標記和形成在面板上的對準標記均捕捉成圖像,從而根據捕捉圖像內的相應對準標記的位置來檢驗晶片與面板之間的失準程度。 According to the disclosure in Korean Patent Registration No. 10-0549470 (Patent Document 1) The indentation test captures the distribution state of the indentation impression as a mark of the fractured conductive particle into a three-dimensional image and analyzes the captured image to examine the state of engagement. Further, according to the alignment inspection disclosed in Korean Patent Publication No. 10-2010-0070814 (Patent Document 2), the alignment marks formed on the wafer and the alignment marks formed on the panel are each captured as an image, The degree of misalignment between the wafer and the panel is thereby verified based on the position of the corresponding alignment mark within the captured image.

然而,根據現有技術的用於壓痕檢驗的壓痕檢驗設備使用的是在沿著掃描方向移動的同時由線性單元拍攝線性圖像的線掃描相機,而用於對準檢驗的對準檢驗設備使用的是對一定區域進行拍攝的區域相機。因此,壓痕檢驗設備和對準檢驗設備需要個別安裝。所以,因為個別進行壓痕核對總和對準檢驗,所以會佔用較長的時間來進行檢驗。另外,因為個別安裝壓痕檢驗設備和對準檢驗設,所以增加了安裝空間和成本。 However, the indentation inspection apparatus for indentation inspection according to the related art uses a line scan camera that takes a linear image by a linear unit while moving in the scanning direction, and an alignment inspection apparatus for alignment inspection. An area camera that shoots a certain area is used. Therefore, the indentation inspection device and the alignment inspection device need to be individually installed. Therefore, because the indentation check is performed separately for the sum check, it takes a long time to perform the test. In addition, since the indentation inspection apparatus and the alignment inspection apparatus are separately installed, the installation space and cost are increased.

[現有技術檔] [Prior art file] [專利檔] [patent file]

(專利檔1) 專利檔1:韓國專利登記No. 10-0549470 (Patent file 1) Patent file 1: Korean Patent Registration No. 10-0549470

(專利檔2) 專利檔2:韓國專利公開No. 10-2010-0070814 (Patent file 2) Patent file 2: Korean Patent Publication No. 10-2010-0070814

本發明的一個方面提供了一種能夠在一個檢驗裝置中同時進行壓痕檢驗和對準檢驗的玻璃上晶片接合檢驗設備。 One aspect of the present invention provides an on-glass wafer bonding inspection apparatus capable of simultaneously performing indentation inspection and alignment inspection in an inspection apparatus.

根據本發明的一個方面,提供了一種玻璃上晶片接合檢驗設備,包括:底座;檢驗物體,所述檢驗物體相對於所述底座水平設置;第一成像裝置,所述第一成像裝置安裝在所述底座上並且設置在所述檢驗物體的下方,並且所述第一成像裝置在相對於所述檢驗物體沿著一個方向(掃描方向)移動的同時將可見光照射在所述檢驗物體上,以按照線掃描方法並利用反射光捕捉所述檢驗物體的下部圖像;第二成像裝置,所述第二成像裝置安裝在所述底座上並且設置在所述檢驗物體的上方,並且所述第二成像裝置在相對於所述檢驗物體沿著一個方向(掃描方向)移動的同時將紅外光照射在所述檢驗物體上,以按照線掃描方法並利用反射光捕捉所述檢驗物體的上部圖像;驅動單元,所述驅動單元使所述第一成像裝置和所述第二成像裝置沿著掃描方向移動;以及控制裝置,所述控制裝置控制所述驅動單元,並且所述控制裝置將第一線性觸發信號和第二線性觸發信號分別發送給所述第一成像裝置和所述第二成像裝置,所述第一線性觸發信號和所述第二線性觸發信號與所述第一成像裝置和所述第二成像裝置沿著掃描方向的移動速度同步。 According to an aspect of the invention, there is provided an on-glass wafer bonding inspection apparatus comprising: a base; an inspection object, the inspection object being horizontally disposed with respect to the base; and a first imaging device, the first imaging device being mounted at the On the base and disposed under the inspection object, and the first imaging device irradiates visible light on the inspection object while moving relative to the inspection object in one direction (scanning direction) to follow a line scanning method and capturing a lower image of the inspection object using reflected light; a second imaging device mounted on the base and disposed above the inspection object, and the second imaging The device irradiates infrared light on the inspection object while moving in one direction (scanning direction) with respect to the inspection object to capture an upper image of the inspection object according to a line scanning method and using reflected light; driving a unit that moves the first imaging device and the second imaging device in a scanning direction; and controls loading The control device controls the driving unit, and the control device transmits a first linear trigger signal and a second linear trigger signal to the first imaging device and the second imaging device, respectively A linear trigger signal and the second linear trigger signal are synchronized with a moving speed of the first imaging device and the second imaging device along a scanning direction.

100‧‧‧底座 100‧‧‧Base

120‧‧‧導軌 120‧‧‧rails

200‧‧‧第一成像裝置 200‧‧‧First imaging device

210‧‧‧第一光學系統 210‧‧‧First optical system

220‧‧‧第一光源 220‧‧‧First light source

230‧‧‧第一相機 230‧‧‧ first camera

240‧‧‧雷射位移感應器 240‧‧‧Laser Displacement Sensor

300‧‧‧第二成像裝置 300‧‧‧Second imaging device

310‧‧‧第二光學系統 310‧‧‧Second optical system

320‧‧‧紅外光控制器 320‧‧‧Infrared light controller

330‧‧‧第二相機 330‧‧‧Second camera

340‧‧‧光纖 340‧‧‧ fiber optic

400‧‧‧檢驗物體 400‧‧‧Inspection of objects

410‧‧‧各向異性導電膜 410‧‧‧ Anisotropic conductive film

411‧‧‧導電顆粒 411‧‧‧Electrical particles

420‧‧‧晶片 420‧‧‧ wafer

421‧‧‧晶片對準標記 421‧‧‧ wafer alignment mark

430‧‧‧透明面板 430‧‧‧Transparent panel

431‧‧‧面板對準標記 431‧‧‧ Panel alignment mark

432‧‧‧引線 432‧‧‧ lead

500‧‧‧傳送裝置 500‧‧‧Transfer

510‧‧‧載台 510‧‧‧ stage

520‧‧‧導軌 520‧‧‧rail

530‧‧‧驅動電動機 530‧‧‧Drive motor

540‧‧‧參照位置定位支架 540‧‧‧Reference position positioning bracket

541‧‧‧通孔 541‧‧‧through hole

610‧‧‧載台 610‧‧‧ stage

620‧‧‧載台 620‧‧‧ stage

630‧‧‧載台 630‧‧‧ stage

700‧‧‧驅動單元 700‧‧‧ drive unit

710‧‧‧掃描方向線性電動機 710‧‧‧Scanning direction linear motor

720‧‧‧垂直方向移動電動機 720‧‧‧Moving motor in the vertical direction

810‧‧‧連接部件 810‧‧‧Connecting parts

900‧‧‧控制裝置 900‧‧‧Control device

910‧‧‧第一圖像輸入單元 910‧‧‧First image input unit

920‧‧‧第二圖像輸入單元 920‧‧‧Second image input unit

930‧‧‧影像處理單元 930‧‧‧Image Processing Unit

940‧‧‧觸發信號控制單元 940‧‧‧Trigger signal control unit

950‧‧‧驅動控制單元 950‧‧‧Drive Control Unit

從下面結合附圖的詳細描述中,將會更清楚地理解本發明的上述和其他觀點、特徵和其他優點,附圖中:圖1是根據本發明的玻璃上晶片接合檢驗設備的立體圖;圖2是根據本發明的玻璃上晶片接合檢驗設備的側面圖; 圖3是示出圖1的A部分的放大圖;圖4是根據本發明的玻璃上晶片接合檢驗設備的控制裝置的示意圖;圖5是用於說明對根據本發明的玻璃上晶片接合檢驗設備進行控制的視圖;圖6是示出了通過根據本發明的玻璃上晶片接合檢驗設備進行檢驗的物體的視圖;以及圖7是通過根據本發明的玻璃上晶片接合檢驗設備捕捉的圖像的視圖。 The above and other aspects, features, and other advantages of the present invention will be more clearly understood from the following description of the accompanying drawings. FIG. 1 is a perspective view of a wafer-on-chip wafer bonding inspection apparatus according to the present invention; 2 is a side view of a wafer-on-wafer bonding inspection apparatus according to the present invention; Figure 3 is an enlarged view showing a portion A of Figure 1; Figure 4 is a schematic view of a control device for a wafer-on-chip bonding inspection apparatus according to the present invention; and Figure 5 is a view for explaining a wafer-on-chip bonding inspection apparatus according to the present invention. View of the control; FIG. 6 is a view showing an object inspected by the on-glass wafer bonding inspection apparatus according to the present invention; and FIG. 7 is a view of an image captured by the on-glass bonding inspection apparatus according to the present invention. .

下面,將參考附圖詳細描述根據本發明的玻璃上晶片接合檢驗設備。為了便於描述,相同的元件符號表示相同的元件,並且將省略重複的描述。此外,在下面的描述中,「線掃描方法(line-scan method)」是指第一成像裝置200和第二成像裝置300在沿著圖1的X方向移動的同時通過線性單元捕捉線性圖像的方法。此外,圖1的X方向是指第一成像裝置200和第二成像裝置300在移動的同時通過線性單元捕捉線性圖像的「掃描方向」。這裡,Z方向是指「垂直方向」。 Hereinafter, the on-glass wafer bonding inspection apparatus according to the present invention will be described in detail with reference to the accompanying drawings. For the convenience of description, the same component symbols denote the same elements, and the repeated description will be omitted. Further, in the following description, the "line-scan method" means that the first imaging device 200 and the second imaging device 300 capture a linear image by a linear unit while moving in the X direction of FIG. Methods. Further, the X direction of FIG. 1 means that the first imaging device 200 and the second imaging device 300 capture the "scanning direction" of the linear image by the linear unit while moving. Here, the Z direction means "vertical direction".

參考圖1和圖2,根據本發明實施例的玻璃上晶片接合檢驗設備10包括:底座100、安裝在底座100的側表面的第一成像裝置200和安裝在底座100的上部的第二成像裝置300。 1 and 2, a wafer-on-glass wafer bonding inspection apparatus 10 according to an embodiment of the present invention includes a base 100, a first image forming apparatus 200 mounted on a side surface of the base 100, and a second image forming apparatus mounted on an upper portion of the base 100. 300.

底座100具有沿著X方向(掃描方向)持續延伸的長條形狀。第一成像裝置200設置在底座100的一個側表面的下部,第二成像裝置 300設置在第一成像裝置200上方並間隔預定距離的位置。 The base 100 has an elongated shape that continuously extends in the X direction (scanning direction). The first image forming apparatus 200 is disposed at a lower portion of one side surface of the base 100, and the second image forming apparatus 300 is disposed above the first imaging device 200 and spaced apart by a predetermined distance.

待檢驗物體400(以下稱為「檢驗物體」)設置在第一成像 裝置200與第二成像裝置300之間。因此,第一成像裝置200捕捉檢驗物體400下部圖像,第二成像裝置300捕捉檢驗物體400上部圖像。 The object to be inspected 400 (hereinafter referred to as "inspection object") is set in the first imaging Between the device 200 and the second imaging device 300. Therefore, the first imaging device 200 captures the lower image of the inspection object 400, and the second imaging device 300 captures the upper image of the inspection object 400.

如圖6所示,檢驗物體400可以是類似於上部晶片420與下 部透明面板430通過各向異性導電膜410相互接合的液晶面板的物體。各向異性導電膜410含有導電顆粒411,並且在接合時,各向異性導電膜410可以在高溫高壓下被壓縮。 As shown in FIG. 6, the inspection object 400 can be similar to the upper wafer 420 and the lower The transparent panel 430 is an object of a liquid crystal panel that is bonded to each other by the anisotropic conductive film 410. The anisotropic conductive film 410 contains conductive particles 411, and upon bonding, the anisotropic conductive film 410 can be compressed under high temperature and high pressure.

參考圖6,在檢驗物體400中,在晶片420兩端的下表面上 均形成晶片對準標記421,在透明面板430兩端的上表面上均形成面板對準標記431。此外,晶片420和透明面板430的引線432設置在檢驗物體400的中心部分並且通過各向異性導電膜410的導電顆粒411相互電連接。 Referring to FIG. 6, in the inspection object 400, on the lower surface of both ends of the wafer 420 Wafer alignment marks 421 are formed, and panel alignment marks 431 are formed on the upper surfaces of both ends of the transparent panel 430. Further, the wafer 420 and the leads 432 of the transparent panel 430 are disposed at the central portion of the inspection object 400 and electrically connected to each other through the conductive particles 411 of the anisotropic conductive film 410.

如圖1和圖2所示,第一成像裝置200將可見光照射到檢驗 物體400上以利用反射光捕捉檢驗物體400下部圖像。為此,第一成像裝置200包括:第一光源220,用於產生可見光;第一光學系統210,用於將第一光源220產生的可見光照射到檢驗物體400的下表面上以接收反射光;以及第一相機230,用於將接收到第一光學系統210中的光轉換成圖像並捕捉圖像。如圖6所示,因為透明面板430設置在檢驗物體400的下部,所以從第一成像裝置200照射的可見光穿過透明面板430然後被面板對準標記431和引線432反射。因為第一相機230接收反射光以捕捉圖像,所以第一相機230可以獲取與包括檢驗物體400中的面板對準標記431和引線432的檢驗區有關的圖像。 As shown in FIGS. 1 and 2, the first imaging device 200 irradiates visible light to the inspection. The image of the lower portion of the inspection object 400 is captured on the object 400 by the reflected light. To this end, the first imaging device 200 includes: a first light source 220 for generating visible light; and a first optical system 210 for illuminating the visible light generated by the first light source 220 onto the lower surface of the inspection object 400 to receive the reflected light; And a first camera 230 for converting light received in the first optical system 210 into an image and capturing an image. As shown in FIG. 6, since the transparent panel 430 is disposed at the lower portion of the inspection object 400, visible light irradiated from the first imaging device 200 passes through the transparent panel 430 and is then reflected by the panel alignment mark 431 and the lead 432. Since the first camera 230 receives the reflected light to capture an image, the first camera 230 can acquire an image related to the inspection area including the panel alignment mark 431 and the lead 432 in the inspection object 400.

第一成像裝置200可以將壓縮導電顆粒411的凹入壓痕圖像 捕捉成三維圖像以檢驗壓痕狀態。這裡,為了獲取三維圖像,第一光學系統210包括微分干涉顯微鏡。由於微分干涉顯微鏡通常是已知的,因此省略其詳細描述。 The first imaging device 200 may have a concave indentation image of the compressed conductive particles 411 Capture into a three-dimensional image to verify the indentation state. Here, in order to acquire a three-dimensional image, the first optical system 210 includes a differential interference microscope. Since a differential interference microscope is generally known, a detailed description thereof will be omitted.

此外,如圖1和圖2所示,第一成像裝置200包括雷射位移 感應器240,該雷射位移感應器240用於測量與檢驗物體400之間的距離以進行對焦。 In addition, as shown in FIGS. 1 and 2, the first imaging device 200 includes a laser displacement The sensor 240 is used to measure the distance between the object 400 and the inspection object 400 for focusing.

第二成像裝置300將紅外光照射到檢驗物體400上以利用反 射光捕捉檢驗物體400上部圖像。為此,第二成像裝置300包括:紅外光控制器320,用於控制紅外燈(未示出)以產生紅外光;第二光學系統310,用於將紅外光控制器320產生的紅外光照射到檢驗物體400的上表面上以接收反射光;以及第二相機330,用於將接收到第二光學系統310中的光轉換成圖像並捕捉圖像。紅外光控制器320所產生的紅外光通過光纖340引入第二光學系統310。紅外光控制器320由下面將要描述的控制裝置900控制。 The second imaging device 300 irradiates infrared light onto the inspection object 400 to utilize the inverse The light capture captures the upper image of the object 400. To this end, the second imaging device 300 includes an infrared light controller 320 for controlling an infrared lamp (not shown) to generate infrared light, and a second optical system 310 for illuminating the infrared light generated by the infrared light controller 320. To the upper surface of the inspection object 400 to receive the reflected light; and a second camera 330 for converting the light received in the second optical system 310 into an image and capturing an image. The infrared light generated by the infrared light controller 320 is introduced into the second optical system 310 through the optical fiber 340. The infrared light controller 320 is controlled by a control device 900 to be described below.

如圖6所示,因為不透明晶片420設置在檢驗物體400的上 部,所以從第二成像裝置300照射的紅外光穿過晶片420然後被晶片對準標記421反射。因為第二相機330接收反射光以捕捉圖像,所以第二相機330可以獲取與包括檢驗物體400中的晶片對準標記421的檢驗區有關的圖像。 As shown in FIG. 6, because the opaque wafer 420 is disposed on the inspection object 400 Therefore, the infrared light irradiated from the second imaging device 300 passes through the wafer 420 and is then reflected by the wafer alignment mark 421. Because the second camera 330 receives the reflected light to capture an image, the second camera 330 can acquire an image related to the inspection zone that includes the wafer alignment mark 421 in the inspection object 400.

此外,第一成像裝置200和第二成像裝置300按照線掃描方 法捕捉檢驗物體400的圖像。如上文所述,根據線掃描方法,將具有長線性形狀的線性光照射到檢驗物體400上,然後接收反射的線性光以通過線性單元將接收的線性光轉換成線性圖像並捕捉線性圖像。因此,在沿著掃 描方向移動的同時持續進行通過線性光的圖像捕捉,然後將通過線性單元捕捉的線性圖像組合以獲取與檢驗物體400的整個檢驗區(包括形成在檢驗物體400上的晶片對準標記421、導電顆粒411的凹入壓痕和面板對準標記431的區域)有關的圖像。為此,第一相機和第二相機均使用線掃描相機。 In addition, the first imaging device 200 and the second imaging device 300 follow the line scan side The method captures an image of the inspection object 400. As described above, according to the line scanning method, linear light having a long linear shape is irradiated onto the inspection object 400, and then the reflected linear light is received to convert the received linear light into a linear image and capture a linear image through a linear unit. . Therefore, along the sweep The image capture by linear light is continued while the direction is moving, and then the linear images captured by the linear unit are combined to acquire and examine the entire inspection area of the object 400 (including the wafer alignment mark 421 formed on the inspection object 400). An image related to the concave indentation of the conductive particles 411 and the area of the panel alignment mark 431. To this end, both the first camera and the second camera use a line scan camera.

在根據本發明實施例的玻璃上晶片接合設備10中,因為第 一成像裝置200和第二成像裝置300均獲取與線掃描方法中的檢驗區有關的圖像,所以可以通過使用一個裝置將形成在檢驗物體400上的晶片對準標記421、導電顆粒411的所有凹入壓痕以及面板對準標記431捕捉成圖像。 因此,可以同時進行使用與晶片對準標記421和面板對準標記431有關的圖像的對準檢驗以及使用導電顆粒411的壓痕圖像的壓痕檢驗。結果,根據玻璃上晶片檢驗裝置,與對準檢驗裝置和壓痕檢驗裝置單獨設置的常規玻璃上晶片接合設備相比,可以減少檢驗時間和裝置數量。 In the on-glass wafer bonding apparatus 10 according to an embodiment of the present invention, An image forming apparatus 200 and a second image forming apparatus 300 each acquire an image relating to the inspection area in the line scanning method, so that all of the wafer alignment marks 421 and conductive particles 411 formed on the inspection object 400 can be formed by using one apparatus. The recessed indentation and the panel alignment mark 431 are captured as an image. Therefore, the alignment inspection using the images related to the wafer alignment marks 421 and the panel alignment marks 431 and the indentation inspection using the indentation images of the conductive particles 411 can be simultaneously performed. As a result, according to the on-glass wafer inspection apparatus, the inspection time and the number of apparatuses can be reduced as compared with the conventional on-wafer wafer bonding apparatus in which the alignment inspection apparatus and the indentation inspection apparatus are separately provided.

因為第一成像裝置200和第二成像裝置300都使用線掃描方 法,所以第一成像裝置200和第二成像裝置300在沿著掃描方向移動的同時可以連續捕捉檢驗物體400的圖像,從而獲取與檢驗物體400的整個檢驗區有關的圖像。下面,將描述根據本發明的玻璃上晶片接合設備的組成。 Because the first imaging device 200 and the second imaging device 300 both use a line scan side The first imaging device 200 and the second imaging device 300 can continuously capture an image of the inspection object 400 while moving along the scanning direction, thereby acquiring an image related to the entire inspection area of the inspection object 400. Next, the composition of the on-glass bonding apparatus according to the present invention will be described.

參考圖1和圖2,在底座100的一個表面上設置有沿著掃描 方向延伸的導軌110a和110b。此外,在導軌110a和110b上設置有能夠沿著掃描方向相對於導軌110a和110b移動的第一掃描方向移動載台610。第一掃描方向移動載台610通過掃描方向線性電動機710(即,由電信號驅動的驅動單元700)而沿著導軌110a和110b在掃描方向上移動。 Referring to FIGS. 1 and 2, a scan along the surface of the base 100 is provided. Guide rails 110a and 110b extending in the direction. Further, the guide rails 110a and 110b are provided with a movement stage 610 which is movable in the scanning direction with respect to the guide rails 110a and 110b. The first scanning direction moving stage 610 is moved in the scanning direction along the guide rails 110a and 110b by the scanning direction linear motor 710 (i.e., the driving unit 700 driven by the electric signal).

此外,第一掃描方向移動載台610與第二掃描方向移動載台 620連接,該第二掃描方向移動載台620設置成能夠沿著掃描方向相對於底座100的上表面移動。因此,當第一掃描方向移動載台610沿著掃描方向移動時,第二掃描方向移動載台620也可以與第一掃描方向移動載台610一起沿著掃描方向移動,並且因為第二掃描方向移動載台620在水準方向上支撐與底座100的側表面連接的第一掃描方向移動載台610,所以第一掃描方向移動載台610可以保持穩定。 Further, the first scanning direction moves the stage 610 and moves the stage in the second scanning direction The second scanning direction moving stage 620 is disposed to be movable relative to the upper surface of the base 100 along the scanning direction. Therefore, when the first scanning direction moving stage 610 moves along the scanning direction, the second scanning direction moving stage 620 can also move along the scanning direction together with the first scanning direction moving stage 610, and because of the second scanning direction The moving stage 620 supports the first scanning direction moving stage 610 connected to the side surface of the base 100 in the horizontal direction, so that the first scanning direction moving stage 610 can be kept stable.

此外,上述紅外光控制器320固定在第二掃描方向移動載台 620的上部。因此,紅外光控制器320可以借助第二掃描方向移動載台620的移動而與第二掃描方向移動載台620一起沿著掃描方向移動。 In addition, the infrared light controller 320 is fixed in the second scanning direction to move the stage. The upper part of the 620. Therefore, the infrared light controller 320 can move along the scanning direction together with the second scanning direction moving stage 620 by moving the movement of the stage 620 by the second scanning direction.

雖然在本實施例中第二掃描方向移動載台620在與第一掃 描方向移動載台610連接的同時支撐紅外光控制器320,但是本發明不限於此。例如,如果根據一種設計紅外光控制器320不必沿著掃描方向移動,那麼可以省略第二掃描方向移動載台620。 Although in the embodiment the second scanning direction moves the stage 620 with the first scan The infrared light controller 320 is supported while the moving direction of the moving stage 610 is connected, but the present invention is not limited thereto. For example, if the infrared light controller 320 does not have to move in the scanning direction according to one design, the second scanning direction moving stage 620 can be omitted.

在第一掃描方向移動載台610的側表面上設置有沿著Z方向 (垂直方向)延伸的導軌120。此外,在導軌120上安裝有能夠相對於導軌120豎向移動的垂直方向移動載台630。垂直方向移動載台630通過垂直方向移動電動機720(即,由電信號驅動的驅動單元700)的控制而沿著導軌120豎向移動。 a side surface of the moving stage 610 in the first scanning direction is disposed along the Z direction A guide rail 120 that extends (vertical direction). Further, a vertical movement stage 630 capable of moving vertically with respect to the guide rail 120 is attached to the guide rail 120. The vertical direction moving stage 630 is vertically moved along the guide rail 120 by the control of the vertical direction moving motor 720 (i.e., the driving unit 700 driven by the electric signal).

作為參考,在本實施例中,移動載台600包括第一掃描方向 移動載台610和第二掃描方向移動載台620(在一些情況下僅包括第一掃描方向移動載台610)以及垂直方向移動載台630。此外,用於使移動載台600 沿著掃描方向和垂直方向移動的驅動單元700包括掃描方向線性電動機710和垂直方向驅動電動機720。 For reference, in the present embodiment, the mobile stage 600 includes a first scanning direction. The moving stage 610 and the second scanning direction moving stage 620 (in some cases, only the first scanning direction moving stage 610) and the vertical direction moving stage 630. In addition, for moving the stage 600 The driving unit 700 that moves in the scanning direction and the vertical direction includes a scanning direction linear motor 710 and a vertical direction driving motor 720.

第一成像裝置200固定在垂直方向移動載台630上。此外, 第二成像裝置300通過使用連接部件810作為中間物而與垂直方向移動載台630連接。因為垂直方向移動載台630通過垂直方向驅動電動機720的操作而豎向移動並與通過掃描方向線性電動機710沿著掃描方向移動的第一掃描方向移動載台610連接,所以垂直方向移動載台630也可以沿著掃描方向移動。因此,與垂直方向移動載台630連接的第一成像裝置200和第二成像裝置300能夠沿著掃描方向和垂直方向相對於底座100移動。此外,第一成像裝置200和第二成像裝置300可以彼此一起移動。這樣,因為第一成像裝置200和第二成像裝置300沿著相同區域在掃描方向上彼此一起移動,所以第一成像裝置200和第二成像裝置300可以按照線掃描方法分別在檢驗物體400的上部和下部獲取與相同檢驗區有關的圖像。 The first image forming apparatus 200 is fixed to the vertical movement stage 630. In addition, The second image forming apparatus 300 is connected to the vertical direction moving stage 630 by using the connecting member 810 as an intermediate. Since the vertical direction moving stage 630 is vertically moved by the operation of the vertical direction driving motor 720 and is connected to the first scanning direction moving stage 610 that is moved in the scanning direction by the scanning direction linear motor 710, the stage 630 is moved in the vertical direction. It can also be moved in the scanning direction. Therefore, the first imaging device 200 and the second imaging device 300 connected to the vertical direction moving stage 630 can move relative to the base 100 in the scanning direction and the vertical direction. Further, the first imaging device 200 and the second imaging device 300 may move together with each other. Thus, since the first imaging device 200 and the second imaging device 300 move together with each other in the scanning direction along the same region, the first imaging device 200 and the second imaging device 300 can respectively be in the upper portion of the inspection object 400 in accordance with the line scanning method. And the lower part acquires an image related to the same inspection area.

如圖1和圖2所示,根據本實施例的玻璃上晶片接合檢驗設 備10包括傳送裝置500,該傳送裝置500用於傳送檢驗物體400,使得檢驗物體400設置在第一成像裝置200與第二成像裝置300之間。傳送裝置500設置成能夠相對於沿著Y方向延伸的導軌520移動並且被驅動電動機530驅動。傳送裝置500的上部設置有檢驗載台510,檢驗物體400放置在檢驗載台510上。只要在檢驗物體400放置於傳送裝置500上的狀態下,傳送裝置500沿著與Y方向相反的方向相對於底座100移動以將檢驗物體400定位在第一成像裝置200與第二成像裝置300之間的位置,則不限定傳送裝置500的結構。因此,將省略與傳送裝置500的構造有關的描述。 As shown in FIG. 1 and FIG. 2, the wafer bonding inspection device on the glass according to the embodiment The device 10 includes a transfer device 500 for transporting the test object 400 such that the test object 400 is disposed between the first image forming device 200 and the second image forming device 300. The conveying device 500 is provided to be movable relative to the guide rail 520 extending in the Y direction and driven by the drive motor 530. An inspection stage 510 is disposed on an upper portion of the conveying device 500, and the inspection object 400 is placed on the inspection stage 510. As long as the inspection object 400 is placed on the conveying device 500, the conveying device 500 moves relative to the base 100 in a direction opposite to the Y direction to position the inspection object 400 between the first imaging device 200 and the second imaging device 300. The position of the transfer device 500 is not limited. Therefore, the description related to the configuration of the conveying device 500 will be omitted.

在根據本實施例的包括上述構造的玻璃上晶片接合檢驗設 備10中,第一成像裝置200和第二成像裝置300在掃描方向上的捕捉位置可以是相同的,以便在檢驗物體400的上部和下部的相同檢驗區中獲取檢驗物體400的精確上部圖像和下部圖像。為此,第一成像裝置200和第二成像裝置300可以設置成:在第一成像裝置200和第二成像裝置300沿著掃描方向移動之前,第一成像裝置200的可見光發射位置與第二成像裝置300的紅外光發射位置彼此對準。也就是說,如上文所述,因為第一成像裝置200和第二成像裝置300通過相同的驅動單元700(即,掃描方向線性電動機710)沿著掃描方向彼此一起移動,所以如果在第一成像裝置200和第二成像裝置300沿著掃描方向移動之前第一成像裝置200和第二成像裝置300的捕捉位置是相同的,那麼可以通過第一成像裝置200和第二成像裝置300獲取在檢驗物體400的上部和下部的相同檢驗區中捕捉的圖像。 On-glass wafer bonding inspection apparatus including the above configuration according to the present embodiment In the preparation 10, the capturing positions of the first imaging device 200 and the second imaging device 300 in the scanning direction may be the same to acquire an accurate upper image of the inspection object 400 in the same inspection region of the upper and lower portions of the inspection object 400. And the lower image. To this end, the first imaging device 200 and the second imaging device 300 may be configured to: before the first imaging device 200 and the second imaging device 300 move in the scanning direction, the visible light emission position and the second imaging of the first imaging device 200 The infrared light emission positions of the device 300 are aligned with each other. That is, as described above, since the first imaging device 200 and the second imaging device 300 are moved together with each other in the scanning direction by the same driving unit 700 (ie, the scanning direction linear motor 710), if the first imaging is performed Before the device 200 and the second imaging device 300 move along the scanning direction, the capturing positions of the first imaging device 200 and the second imaging device 300 are the same, then the inspection object can be acquired by the first imaging device 200 and the second imaging device 300. Images captured in the same inspection area above and below the 400.

如圖3所示,在本實施例中提供從傳送裝置500的檢驗載台 510的一側伸出的參照位置定位支架540,使得第一成像裝置200的捕捉位置與第二成像裝置300的捕捉位置彼此對準。此外,在參照位置定位支架540中限定有豎向穿過參照位置定位支架540的通孔541。 As shown in FIG. 3, an inspection stage from the conveyor 500 is provided in the present embodiment. The reference position positioning bracket 540 that protrudes from one side of the 510 causes the capturing position of the first imaging device 200 and the capturing position of the second imaging device 300 to be aligned with each other. Further, a through hole 541 that vertically passes through the reference position positioning bracket 540 is defined in the reference position positioning bracket 540.

具體地說,為了在第一成像裝置200和第二成像裝置300沿 著掃描方向移動之前利用參照位置定位支架540使第一成像裝置200的捕捉位置與第二成像裝置300的捕捉位置彼此對準,可以首先移動傳送裝置500,使得參照位置定位支架540設置在第一成像裝置200與第二成像裝置300之間,然後可以通過第一成像裝置200和第二成像裝置300捕捉參照位置定位支架540的上部和下部圖像。然後,可以對捕捉的圖像進行分析來 測量參照位置定位支架540的通孔541的中心位置。此後,可以調節第一成像裝置200和第二成像裝置300的位置以使中心位置彼此對準。 Specifically, in order to be along the first imaging device 200 and the second imaging device 300 Before the scanning direction is moved, the reference position positioning bracket 540 is used to align the capturing position of the first imaging device 200 with the capturing position of the second imaging device 300, and the conveying device 500 may be moved first, so that the reference position positioning bracket 540 is disposed at the first position. Between the imaging device 200 and the second imaging device 300, upper and lower images of the reference position locating bracket 540 can then be captured by the first imaging device 200 and the second imaging device 300. Then, you can analyze the captured image to The center position of the through hole 541 of the reference position positioning bracket 540 is measured. Thereafter, the positions of the first imaging device 200 and the second imaging device 300 can be adjusted to align the center positions with each other.

即使第一成像裝置200的捕捉位置與第二成像裝置300的捕 捉位置最初是相同的,在使用過程中第一成像裝置200的捕捉位置與第二成像裝置300的捕捉位置也可能會失準。在這種情況下,在使用過程中可以週期性地捕捉參照位置定位支架540的圖像來測量第一成像裝置200的捕捉位置與第二成像裝置300的捕捉位置之間的失準程度。然後,測量值可以返回給對有關檢驗區圖像的分析。結果,玻璃上晶片接合檢驗設備10可以在檢驗物體400的檢驗區的相同位置獲取檢驗物體400的上部圖像和下部圖像(通過第一成像裝置200和第二成像裝置300捕捉)。因此,可以基於獲取的圖像進行精確的壓痕核對總和對準檢驗。 Even if the capture position of the first imaging device 200 and the capture of the second imaging device 300 The capture position is initially the same, and the capture position of the first imaging device 200 and the capture position of the second imaging device 300 may also be misaligned during use. In this case, the image of the reference position positioning bracket 540 may be periodically captured during use to measure the degree of misalignment between the capturing position of the first imaging device 200 and the capturing position of the second imaging device 300. The measured value can then be returned to the analysis of the image of the relevant inspection area. As a result, the on-glass wafer bonding inspection apparatus 10 can acquire the upper image and the lower image (captured by the first imaging device 200 and the second imaging device 300) of the inspection object 400 at the same position of the inspection region of the inspection object 400. Therefore, an accurate indentation check summation alignment test can be performed based on the acquired image.

雖然本實施例在參照位置定位支架540中限定有通孔541, 但是可以形成其圖像能夠被第一成像裝置200和第二成像裝置300捕捉的標記來代替通孔541。 Although the present embodiment defines a through hole 541 in the reference position positioning bracket 540, However, instead of the through hole 541, a mark whose image can be captured by the first imaging device 200 and the second imaging device 300 can be formed.

此外,第一成像裝置200和第二成像裝置300借助驅動單元 700(即,垂直方向驅動電動機720)的豎向移動主要用於使第一成像裝置200沿著Z方向(垂直方向)移動,從而利用雷射位移感應器240測量相對於檢驗物體400的焦點方向,然後在通過第一成像裝置200和第二成像裝置300捕捉檢驗物體400的上部線性圖像和下部線性圖像時,使第一成像裝置200的焦點與第二成像裝置300的焦點相互對焦。 Furthermore, the first imaging device 200 and the second imaging device 300 are driven by means of a drive unit The vertical movement of 700 (i.e., the vertical direction driving motor 720) is mainly used to move the first imaging device 200 in the Z direction (vertical direction), thereby measuring the focus direction with respect to the inspection object 400 using the laser displacement sensor 240. Then, when the upper linear image and the lower linear image of the inspection object 400 are captured by the first imaging device 200 and the second imaging device 300, the focus of the first imaging device 200 and the focus of the second imaging device 300 are made to be in focus with each other.

具體地說,當設置第一成像裝置200和第二成像裝置300 時,將第一成像裝置200設置在沿著Z方向(垂直方向)對檢驗物體400 進行對焦的位置,然後將第二成像裝置300設置在沿著垂直方向對檢驗物體400進行對焦的位置。在第一成像裝置200和第二成像裝置300沿著掃描方向移動以捕捉檢驗物體400的上部線性圖像和下部線性圖像時,利用雷射位移感應器240來測量檢驗物體400與第一成像裝置200之間的焦距,然後第一成像裝置200基於焦距沿著垂直方向移動以對第一成像裝置200的焦點進行對焦。這裡,如上文所述,因為第二成像裝置300與第一成像裝置200的豎向移動一起沿著垂直方向移動,所以如果第一成像裝置200的焦點對焦,則第二成像裝置300的焦點也可以對焦。 Specifically, when the first imaging device 200 and the second imaging device 300 are provided At the time, the first imaging device 200 is disposed to inspect the object 400 along the Z direction (vertical direction) At the position where the focusing is performed, the second imaging device 300 is then placed at a position where the inspection object 400 is focused in the vertical direction. When the first imaging device 200 and the second imaging device 300 are moved along the scanning direction to capture the upper linear image and the lower linear image of the inspection object 400, the inspection object 400 and the first imaging are measured using the laser displacement sensor 240. The focal length between the devices 200 is then moved by the first imaging device 200 in the vertical direction based on the focal length to focus the focus of the first imaging device 200. Here, as described above, since the second imaging device 300 moves in the vertical direction together with the vertical movement of the first imaging device 200, if the focus of the first imaging device 200 is in focus, the focus of the second imaging device 300 is also Can focus.

連接部件810設置在第一成像裝置200與第二成像裝置300之間。此外,連接部件810可以具有朝向傳送裝置500敞開的一側和呈「」形狀的另一側。通過傳送裝置500沿著與Y方向相反的方向(與掃描方向垂直的方向)移動的檢驗物體400可以容納在由「」形狀限定的空間中。因此,檢驗物體400的移動不會干擾連接部件810。 The connecting member 810 is disposed between the first imaging device 200 and the second imaging device 300. Further, the connecting member 810 may have a side that is open toward the conveying device 500 and is " The other side of the shape. The inspection object 400 moved by the conveying device 500 in a direction opposite to the Y direction (a direction perpendicular to the scanning direction) can be accommodated by " "The shape is limited to the space. Therefore, the movement of the inspection object 400 does not interfere with the connection member 810.

此外,因為傳送裝置500沿著Y方向傳送檢驗物體400和參照位置定位支架540,所以第一成像裝置200和第二成像裝置300的掃描方向不會相互干擾。 Further, since the conveying device 500 conveys the inspection object 400 and the reference position positioning bracket 540 in the Y direction, the scanning directions of the first imaging device 200 and the second imaging device 300 do not interfere with each other.

根據本實施例的玻璃上晶片接合檢驗設備10包括控制裝置900,該控制裝置900用於對驅動單元700進行驅動,控制第一成像裝置200和第二成像裝置300的圖像捕捉,並且分析捕捉的圖像以確定接合狀態是否有錯誤。控制裝置900可以內置在電腦中,該電腦向/從驅動單元700、第一成像裝置200和第二成像裝置300發送和接收電信號並且存儲用於對捕捉的圖像進行分析的程式。 The on-glass wafer bonding inspection apparatus 10 according to the present embodiment includes a control device 900 for driving the driving unit 700, controlling image capturing of the first imaging device 200 and the second imaging device 300, and analyzing and capturing Image to determine if there is an error in the engagement status. The control device 900 may be built in a computer that transmits and receives electrical signals to/from the drive unit 700, the first imaging device 200, and the second imaging device 300 and stores a program for analyzing the captured images.

圖4是示出控制裝置900控制驅動單元700以及第一成像裝 置200和第二成像裝置300的圖像捕捉以對捕捉的圖像進行處理的過程的結構圖。參考圖4,控制裝置900包括:第一圖像輸入單元910和第二圖像輸入單元920,第一圖像輸入單元910和第二圖像輸入單元920用於通過線性單元從第一成像裝置200和第二成像裝置300接收線性圖像;以及影像處理單元930,影像處理單元930用於組合並分析接收到的線性圖像。此外,控制裝置900包括:驅動控制單元950,該驅動控制單元950用於控制驅動單元700的移動;以及觸發信號控制單元940,該觸發信號控制單元940用於發送第一線性觸發信號和第二線性觸發信號,第一成像裝置200和第二成像裝置300通過第一線性觸發信號和第二線性觸發信號進行圖像捕捉。 4 is a diagram showing the control device 900 controlling the drive unit 700 and the first imaging device A block diagram of the process of image capture of the second imaging device 300 to process the captured image. Referring to FIG. 4, the control device 900 includes a first image input unit 910 and a second image input unit 920 for using a linear unit from the first imaging device. 200 and the second imaging device 300 receive a linear image; and an image processing unit 930 for combining and analyzing the received linear image. Further, the control device 900 includes a drive control unit 950 for controlling the movement of the drive unit 700, and a trigger signal control unit 940 for transmitting the first linear trigger signal and the The two linear trigger signals, the first imaging device 200 and the second imaging device 300 perform image capturing by the first linear trigger signal and the second linear trigger signal.

具體地說,驅動控制單元950驅動掃描方向線性電動機710以使第一成像裝置200和第二成像裝置300沿著掃描方向以恒定速度移動。此外,驅動控制單元950控制垂直方向電動機720,使得在第一成像裝置200和第二成像裝置300沿著掃描方向移動並連續捕捉線性圖像時,第一成像裝置200和第二成像裝置300的焦距對焦。 Specifically, the drive control unit 950 drives the scan direction linear motor 710 to move the first imaging device 200 and the second imaging device 300 at a constant speed in the scanning direction. Further, the drive control unit 950 controls the vertical direction motor 720 such that when the first imaging device 200 and the second imaging device 300 move along the scanning direction and continuously capture a linear image, the first imaging device 200 and the second imaging device 300 Focus focus.

此外,觸發信號控制單元940接收由用於控制掃描方向移動的驅動單元700(即,掃描方向線性電動機710)產生的編碼信號,以便將第一線性觸發信號和第二線性觸發信號分別發送給第一成像裝置200和第二成像裝置300。根據從觸發信號控制單元940發送的第一線性觸發信號和第二線性觸發信號中每一者的脈衝週期,第一成像裝置200和第二成像裝置300均可以每個脈衝捕捉一張線性圖像。 Further, the trigger signal control unit 940 receives the encoded signal generated by the driving unit 700 for controlling the scanning direction movement (ie, the scanning direction linear motor 710) to respectively transmit the first linear trigger signal and the second linear trigger signal to The first imaging device 200 and the second imaging device 300. According to the pulse period of each of the first linear trigger signal and the second linear trigger signal transmitted from the trigger signal control unit 940, both the first imaging device 200 and the second imaging device 300 can capture one linear pattern per pulse. image.

這裡,分別根據第一成像裝置200和第二成像裝置300的解 析度確定第一線性觸發信號的脈衝週期和第二線性觸發信號的脈衝週期。例如,如圖5所示,當第一成像裝置200的解析度為大約0.72μm/圖元時,第一線性觸發信號的脈衝週期可以為大約0.72μm/脈衝。此外,當第二成像裝置300的解析度為大約1.44μm/圖元時,第二線性觸發信號的脈衝週期可以為大約1.44μm/脈衝。 Here, according to the solutions of the first imaging device 200 and the second imaging device 300, respectively The resolution determines a pulse period of the first linear trigger signal and a pulse period of the second linear trigger signal. For example, as shown in FIG. 5, when the resolution of the first imaging device 200 is about 0.72 μm/pixel, the pulse period of the first linear trigger signal may be about 0.72 μm/pulse. Further, when the resolution of the second imaging device 300 is about 1.44 μm/pixel, the pulse period of the second linear trigger signal may be about 1.44 μm/pulse.

在這種情況下,第一成像裝置200可以以大約0.72μm的距離捕捉線性圖像,第二成像裝置300可以以大約1.44μm的距離捕捉線性圖像。因此,在第一成像裝置200捕捉兩張線性圖像時,第二成像裝置300可以捕捉一張線性圖像。因此,第一成像裝置200和第二成像裝置300可以獲取與檢驗物體400的檢驗區中的沿著掃描方向的相同位置有關的圖像。 In this case, the first imaging device 200 can capture a linear image at a distance of about 0.72 μm, and the second imaging device 300 can capture a linear image at a distance of about 1.44 μm. Therefore, when the first imaging device 200 captures two linear images, the second imaging device 300 can capture a linear image. Therefore, the first imaging device 200 and the second imaging device 300 can acquire an image related to the same position in the inspection area of the inspection object 400 along the scanning direction.

因為使用線掃描方法的第一成像裝置200和第二成像裝置300在沿著掃描方向移動的同時分別捕捉線性圖像,所以發送至第一成像裝置200的第一線性觸發信號的脈衝週期和發送至第二成像裝置300的第二線性觸發信號的脈衝週期可以與第一成像裝置200和第二成像裝置300沿著掃描方向的移動速度匹配(同步)。例如,如圖5所示,當掃描方向線性電動機710的編碼信號的脈衝週期為大約0.18μm/脈衝,第一線性觸發信號的脈衝週期為0.72μm/脈衝,並且第二線性觸發信號的脈衝週期為大約1.44μm/脈衝時,觸發信號控制單元940基於接收到的掃描方向線性電動機710的編碼信號將第一線性觸發信號發送給第一成像裝置200以與每個週期為大約0.18μm/脈衝的四個脈衝匹配,並且將第二線性觸發信號發送給第二成像裝置300以與每個週期為大約0.18μm/脈衝的八個脈衝匹配。 Since the first imaging device 200 and the second imaging device 300 using the line scanning method respectively capture linear images while moving in the scanning direction, the pulse period of the first linear trigger signal transmitted to the first imaging device 200 and The pulse period of the second linear trigger signal transmitted to the second imaging device 300 may be matched (synchronized) with the moving speed of the first imaging device 200 and the second imaging device 300 in the scanning direction. For example, as shown in FIG. 5, when the pulse period of the encoded signal of the scanning direction linear motor 710 is about 0.18 μm/pulse, the pulse period of the first linear trigger signal is 0.72 μm/pulse, and the pulse of the second linear trigger signal When the period is about 1.44 μm/pulse, the trigger signal control unit 940 transmits the first linear trigger signal to the first imaging device 200 based on the received encoded signal of the linear motor 710 in the scanning direction to be about 0.18 μm/per cycle. The four pulses of the pulse match and the second linear trigger signal is sent to the second imaging device 300 to match eight pulses of approximately 0.18 [mu]m per pulse per cycle.

結果,在與第一成像裝置200和第二成像裝置300沿著掃描 方向的移動速度匹配(即,同步)的情況下,第一成像裝置200和第二成像裝置300可以捕捉線性圖像。如果第一線性觸發信號和第二線性觸發信號中每一者的脈衝週期快於或者慢於第一成像裝置200和第二成像裝置300中每一者的沿著掃描方向的移動速度,則第一成像裝置和第二成像裝置均可能會捕捉到窄於或者寬於其移動距離的線性圖像,從而獲取到不精確的圖像。 As a result, scanning along with the first imaging device 200 and the second imaging device 300 In the case where the moving speed of the direction is matched (ie, synchronized), the first imaging device 200 and the second imaging device 300 can capture a linear image. If the pulse period of each of the first linear trigger signal and the second linear trigger signal is faster or slower than the moving speed of each of the first imaging device 200 and the second imaging device 300 along the scanning direction, then Both the first imaging device and the second imaging device may capture a linear image that is narrower or wider than its moving distance, thereby obtaining an inaccurate image.

如上文所述,在根據本發明的玻璃上晶片接合檢驗設備10 中,因為第一成像裝置200和第二成像裝置300的第一線性觸發信號和第二線性觸發信號的脈衝週期與從一台掃描方向線性電動機710發送的編碼信號同步並相互匹配,所以玻璃上晶片接合檢驗設備10可以獲取檢驗物體400的檢驗區中的精確的上部圖像和下部圖像。 As described above, the wafer bonding inspection apparatus 10 on glass according to the present invention Because the pulse periods of the first linear trigger signal and the second linear trigger signal of the first imaging device 200 and the second imaging device 300 are synchronized with and matched with the encoded signals transmitted from one scanning direction linear motor 710, the glass The upper wafer bonding inspection apparatus 10 can acquire an accurate upper image and a lower image in the inspection area of the inspection object 400.

下面,將描述包括上述構造的玻璃上晶片接合檢驗設備10的操作。 Next, the operation of the on-glass wafer bonding inspection apparatus 10 including the above configuration will be described.

首先,第一成像裝置200和第二成像裝置300設置成:在將檢驗物體400傳送到第一成像裝置200與第二成像裝置300之間之前,利用參照位置定位支架540使第一成像裝置200和第二成像裝置300的捕捉位置彼此對準。此後,將檢驗物體400放置在傳送裝置500上,然後傳送裝置500沿著與Y方向相反的方向移動以將檢驗物體400定位在第一成像裝置200與第二成像裝置300之間。 First, the first imaging device 200 and the second imaging device 300 are arranged to cause the first imaging device 200 with the reference position positioning bracket 540 before transferring the inspection object 400 between the first imaging device 200 and the second imaging device 300. The capturing positions of the second imaging device 300 are aligned with each other. Thereafter, the inspection object 400 is placed on the conveyor 500, and then the conveyor 500 is moved in a direction opposite to the Y direction to position the inspection object 400 between the first imaging device 200 and the second imaging device 300.

然後,對驅動單元700的掃描方向線性電動機710進行驅動以使第一成像裝置200和第二成像裝置300沿著掃描方向移動。這裡,控制裝置900的觸發信號控制單元940接收掃描方向線性電動機710的編碼信 號,以基於接收到的編碼信號產生與第一成像裝置200和第二成像裝置300的移動速度同步的第一線性觸發信號和第二線性觸發信號。在通過第一線性觸發信號和第二線性觸發信號與沿著掃描方向的移動速度匹配的情況下,第一成像裝置200和第二成像裝置300沿著掃描方向分別捕捉與檢驗物體400的檢驗區有關的上部線性圖像和下部線性圖像。 Then, the scanning direction linear motor 710 of the driving unit 700 is driven to move the first imaging device 200 and the second imaging device 300 in the scanning direction. Here, the trigger signal control unit 940 of the control device 900 receives the encoded signal of the scanning direction linear motor 710. No. to generate a first linear trigger signal and a second linear trigger signal synchronized with the moving speeds of the first imaging device 200 and the second imaging device 300 based on the received encoded signal. In the case where the first linear trigger signal and the second linear trigger signal are matched with the moving speed along the scanning direction, the first imaging device 200 and the second imaging device 300 respectively capture the inspection of the inspection object 400 along the scanning direction. The area is related to the upper linear image and the lower linear image.

捕捉的上部線性圖像和下部線性圖像被分別輸入到第一圖 像輸入單元910和第二圖像輸入單元920。影像處理單元930可以分別組合上部線性圖像和下部線性圖像以獲取與檢驗物體400的檢驗區有關的上部圖像和下部圖像,如圖7所示。 The captured upper linear image and lower linear image are respectively input to the first image The input unit 910 and the second image input unit 920. The image processing unit 930 may combine the upper linear image and the lower linear image, respectively, to acquire an upper image and a lower image related to the inspection area of the inspection object 400, as shown in FIG.

參考圖7,可以從第一成像裝置200捕捉的下部圖像確認導 電顆粒411的凹入壓痕(存在於透明面板430的引線432中)和佈置在透明面板430兩端的面板對準標記431,並且可以從第二成像裝置300捕捉的上部圖像確認晶片對準標記421。 Referring to FIG. 7, a lower image confirmation guide that can be captured from the first imaging device 200 A recessed indentation of the electric particles 411 (present in the lead 432 of the transparent panel 430) and a panel alignment mark 431 disposed at both ends of the transparent panel 430, and the wafer alignment can be confirmed from the upper image captured by the second imaging device 300 Mark 421.

控制裝置900可以進行對準檢驗,以便通過晶片對準標記 421在上部圖像上的位置和面板對準標記431在下部圖像上的位置的比較來檢驗晶片420與透明面板430之間的失準程度。此外,控制裝置900還可以進行壓痕檢驗,以便檢驗導電顆粒411在下部圖像上的凹入壓痕。 Control device 900 can perform an alignment check to pass the wafer alignment mark The degree of misalignment between the wafer 420 and the transparent panel 430 is checked by comparing the position of the 421 on the upper image with the position of the panel alignment mark 431 on the lower image. In addition, the control device 900 can also perform an indentation test to inspect the concave indentations of the conductive particles 411 on the lower image.

在第一成像裝置200和第二成像裝置300沿著掃描方向移動 的同時,第一成像裝置200和第二成像裝置300可以通過利用雷射位移感應器240對第一成像裝置200和第二成像裝置300的焦點進行對焦並基於與檢驗物體400之間的距離而沿著Z方向(垂直方向)移動。 Moving in the scanning direction between the first imaging device 200 and the second imaging device 300 Meanwhile, the first imaging device 200 and the second imaging device 300 may focus on the focal points of the first imaging device 200 and the second imaging device 300 by using the laser displacement sensor 240 and based on the distance from the inspection object 400. Move in the Z direction (vertical direction).

如上文所述,根據本發明,因為第一成像裝置200和第二成 像裝置300按照線掃描方法通過線性單元獲取線性圖像,所以可以利用一台檢驗設備同時進行對準核對總和壓痕檢驗,然而在現有技術中通過不同的設備分別進行對準核對總和壓痕檢驗。因此,可以縮短檢驗時間並且減少裝置的安裝空間和成本。 As described above, according to the present invention, because the first imaging device 200 and the second imaging device The image device 300 acquires a linear image by a linear unit according to the line scanning method, so that the alignment check can be performed simultaneously by using one inspection device. However, in the prior art, the alignment check is performed by different devices. . Therefore, the inspection time can be shortened and the installation space and cost of the device can be reduced.

此外,根據本發明,第一成像裝置200和第二成像裝置300 的第一線性觸發信號和第二線性觸發信號可以與第一成像裝置和第二成像裝置的移動速度同步,以更精確地捕捉與檢驗物體400的檢驗區有關上部圖像和下部圖像。因此,可以進行更精確的對準核對總和壓痕檢驗。 Further, according to the present invention, the first imaging device 200 and the second imaging device 300 The first linear trigger signal and the second linear trigger signal may be synchronized with the moving speeds of the first imaging device and the second imaging device to more accurately capture the upper image and the lower image related to the inspection region of the inspection object 400. Therefore, a more accurate alignment checksum total indentation test can be performed.

雖然公開了本發明的優選實施例,但是在不脫離所附權利要 求所闡述的本發明的範圍和精神的情況下,本領域技術人員可以對本發明進行各種改變和修改。還應當理解,本文所使用的術語進是描述性的而不是限制性的,並且在不脫離本發明的範圍和精神的情況下可以進行各種改變。 Although the preferred embodiment of the invention has been disclosed, it does not depart from the appended claims Various changes and modifications of the invention may be made by those skilled in the art without departing from the scope of the invention. It is also to be understood that the terms of the invention are intended to be illustrative and not restrictive, and various modifications may be made without departing from the scope and spirit of the invention.

例如,雖然在前述實施例中提供了一台用於使第一成像裝置 200和第二成像裝置300沿著掃描方向移動的掃描方向線性電動機710,但是本發明不限於此。也就是說,可以分別提供用於使第一成像裝置200沿著掃描方向移動的線性電動機和用於使第二成像裝置300沿著掃描方向移動的線性電動機。在這種情況下,控制裝置900的觸發信號控制單元940可以從每一台線性電動機接收編碼信號並基於接收到的編碼信號將第一線性觸發信號和第二線性觸發信號發送給第一成像裝置200和第二成像裝置300。 For example, although a first imaging device is provided in the foregoing embodiment The scanning direction linear motor 710 is moved 200 and the second imaging device 300 in the scanning direction, but the present invention is not limited thereto. That is, a linear motor for moving the first imaging device 200 in the scanning direction and a linear motor for moving the second imaging device 300 in the scanning direction may be separately provided. In this case, the trigger signal control unit 940 of the control device 900 may receive the encoded signal from each linear motor and transmit the first linear trigger signal and the second linear trigger signal to the first imaging based on the received encoded signal. The device 200 and the second imaging device 300.

此外,雖然在前述實施例中與用於控制驅動單元700的控制 裝置900一起提供觸發信號控制單元940,但是本發明不限於此。例如,可以相對於用於控制驅動單元700的控制裝置單獨地提供觸發信號控制單元940。 Further, although in the foregoing embodiment, the control for controlling the driving unit 700 The device 900 together provides the trigger signal control unit 940, but the invention is not limited thereto. For example, the trigger signal control unit 940 can be separately provided with respect to the control device for controlling the drive unit 700.

此外,雖然在前述實施例中第一成像裝置200和第二成像裝 置300相對於檢驗物體400沿著掃描方向移動,但是本發明不限於此。例如,第一成像裝置200和第二成像裝置300可以是固定的,並且可以提供用於使上面放置有檢驗物體400的傳送裝置500沿著X方向(掃描方向)移動的驅動單元(線性電動機),以允許檢驗物體400相對於第一成像裝置200和第二成像裝置300沿著掃描方向移動。這裡,觸發信號控制單元940可以接收用於使傳送裝置500沿著掃描方向移動的驅動單元(線性電動機)編碼信號,並且將與檢驗物體400沿著掃描方向的移動速度同步的第一線性觸發信號和第二線性觸發信號發送給第一成像裝置200和第二成像裝置300。 Further, although in the foregoing embodiment, the first imaging device 200 and the second imaging device The setting 300 moves in the scanning direction with respect to the inspection object 400, but the present invention is not limited thereto. For example, the first imaging device 200 and the second imaging device 300 may be fixed, and may provide a driving unit (linear motor) for moving the conveying device 500 on which the inspection object 400 is placed in the X direction (scanning direction). To allow the inspection object 400 to move in the scanning direction with respect to the first imaging device 200 and the second imaging device 300. Here, the trigger signal control unit 940 may receive a drive unit (linear motor) coded signal for moving the transfer device 500 in the scan direction, and a first linear trigger that synchronizes the moving speed of the inspection object 400 along the scan direction. The signal and the second linear trigger signal are transmitted to the first imaging device 200 and the second imaging device 300.

根據如上文所述的本發明,因為照射可見光以捕捉檢驗物體 下部圖像的第一成像裝置和照射紅外光以捕捉檢驗物體上部圖像的第二成像裝置均按照線掃描方法通過線性單元獲取線性圖像,所以可以利用一台檢驗設備同時進行對準核對總和壓痕檢驗,然而在現有技術中通過不同的設備分別進行對準核對總和壓痕檢驗。因此,可以縮短檢驗接合狀態的檢驗時間並且減少裝置的安裝空間和成本。 According to the invention as described above, since the visible light is irradiated to capture the inspection object The first imaging device of the lower image and the second imaging device that illuminates the infrared light to capture the upper image of the inspection object all acquire the linear image through the linear unit according to the line scanning method, so that the alignment check sum can be simultaneously performed by one inspection device Indentation inspection, however, alignment correction verification of the total indentation is performed by different equipment in the prior art. Therefore, the inspection time for checking the joint state can be shortened and the installation space and cost of the apparatus can be reduced.

100‧‧‧底座 100‧‧‧Base

120‧‧‧導軌 120‧‧‧rails

200‧‧‧第一成像裝置 200‧‧‧First imaging device

210‧‧‧第一光學系統 210‧‧‧First optical system

220‧‧‧第一光源 220‧‧‧First light source

230‧‧‧第一相機 230‧‧‧ first camera

240‧‧‧雷射位移感應器 240‧‧‧Laser Displacement Sensor

300‧‧‧第二成像裝置 300‧‧‧Second imaging device

310‧‧‧第二光學系統 310‧‧‧Second optical system

320‧‧‧紅外光控制器 320‧‧‧Infrared light controller

330‧‧‧第二相機 330‧‧‧Second camera

340‧‧‧光纖 340‧‧‧ fiber optic

400‧‧‧檢驗物體 400‧‧‧Inspection of objects

500‧‧‧傳送裝置 500‧‧‧Transfer

510‧‧‧載台 510‧‧‧ stage

520‧‧‧導軌 520‧‧‧rail

530‧‧‧驅動電動機 530‧‧‧Drive motor

540‧‧‧參照位置定位支架 540‧‧‧Reference position positioning bracket

610‧‧‧載台 610‧‧‧ stage

620‧‧‧載台 620‧‧‧ stage

630‧‧‧載台 630‧‧‧ stage

710‧‧‧掃描方向線性電動機 710‧‧‧Scanning direction linear motor

720‧‧‧垂直方向移動電動機 720‧‧‧Moving motor in the vertical direction

810‧‧‧連接部件 810‧‧‧Connecting parts

Claims (7)

一種玻璃上晶片接合檢驗設備,其檢驗一檢驗物體,該設備包括:底座;第一成像裝置,所述第一成像裝置安裝在所述底座上並且設置在所述檢驗物體的下方,並且所述第一成像裝置在相對於所述檢驗物體沿著一個方向(掃描方向)移動的同時將可見光照射在所述檢驗物體上,以按照線掃描方法並利用反射光捕捉所述檢驗物體的下部圖像;第二成像裝置,所述第二成像裝置安裝在所述底座上並且設置在所述檢驗物體的上方,並且所述第二成像裝置在相對於所述檢驗物體沿著一個方向(所述掃描方向)移動的同時將紅外光照射在所述檢驗物體上,以按照線掃描方法並利用反射光捕捉所述檢驗物體的上部圖像;驅動單元,所述驅動單元使所述第一成像裝置和所述第二成像裝置沿著掃描方向移動;以及控制裝置,所述控制裝置控制所述驅動單元,並且所述控制裝置將第一線性觸發信號和第二線性觸發信號分別發送給所述第一成像裝置和所述第二成像裝置,所述第一線性觸發信號和所述第二線性觸發信號與所述第一成像裝置和所述第二成像裝置沿著所述掃描方向的移動速度同步,其中,所述控制裝置基於從所述驅動單元發送的編碼信號來同步所述第一線性觸發信號和所述第二線性觸發信號。 An on-glass wafer bonding inspection apparatus for inspecting an inspection object, the apparatus comprising: a base; a first imaging device mounted on the base and disposed under the inspection object, and The first imaging device irradiates visible light on the inspection object while moving in one direction (scanning direction) with respect to the inspection object to capture a lower image of the inspection object according to a line scanning method and using reflected light a second imaging device mounted on the base and disposed above the inspection object, and the second imaging device is in one direction relative to the inspection object (the scanning Irradiating the infrared light on the inspection object while moving, to capture an upper image of the inspection object according to a line scanning method and using reflected light; a driving unit that causes the first imaging device and The second imaging device moves along a scanning direction; and a control device that controls the driving unit, and the control The device transmits a first linear trigger signal and a second linear trigger signal to the first imaging device and the second imaging device, respectively, the first linear trigger signal and the second linear trigger signal Synchronizing the moving speed of the first imaging device and the second imaging device along the scanning direction, wherein the control device synchronizes the first linear trigger signal and the sound based on the encoded signal transmitted from the driving unit The second linear trigger signal is described. 如申請專利範圍第1項所述的玻璃上晶片接合檢驗設備,進一步包括移動載台,所述移動載台通過所述驅動單元相對於所述底座沿著所述掃描方向移動, 其中,所述第一成像裝置和所述第二成像裝置連接至所述移動載台,以隨著所述移動載台的移動一起沿著所述掃描方向移動。 The on-glass wafer bonding inspection apparatus of claim 1, further comprising a moving stage, wherein the moving stage moves along the scanning direction relative to the base by the driving unit, Wherein the first imaging device and the second imaging device are coupled to the moving stage to move along the scanning direction along with movement of the moving stage. 如申請專利範圍第1項所述的玻璃上晶片接合檢驗設備,其中,所述第一成像裝置和所述第二成像裝置設置成:所述第一成像裝置的可見光發射位置與所述第二成像裝置的紅外光發射位置相互對準。 The on-glass wafer bonding inspection apparatus of claim 1, wherein the first imaging device and the second imaging device are disposed to: a visible light emission position of the first imaging device and the second The infrared light emission positions of the imaging device are aligned with each other. 如申請專利範圍第1項所述的玻璃上晶片接合檢驗設備,進一步包括傳送裝置,所述傳送裝置用於傳送所述檢驗物體,以使所述檢驗物體設置在所述第一成像裝置與所述第二成像裝置之間,其中,在所述傳送裝置上設置有參照位置定位支架,所述參照位置定位支架用於確認所述第一成像裝置的捕捉位置和所述第二成像裝置的捕捉位置。 The on-glass wafer bonding inspection apparatus of claim 1, further comprising a conveying device for conveying the inspection object such that the inspection object is disposed at the first imaging device and Between the second imaging devices, wherein the transfer device is provided with a reference position positioning bracket for confirming the capturing position of the first imaging device and the capturing of the second imaging device position. 如申請專利範圍第1項所述的玻璃上晶片接合檢驗設備,其中,分別基於所述第一成像裝置和所述第二成像裝置的解析度來確定所述第一線性觸發信號的脈衝週期和所述第二線性觸發信號的脈衝週期。 The on-glass wafer bonding inspection apparatus of claim 1, wherein the pulse period of the first linear trigger signal is determined based on resolutions of the first imaging device and the second imaging device, respectively And a pulse period of the second linear trigger signal. 如申請專利範圍第1到5項中任一項所述的玻璃上晶片接合檢驗設備,其中,通過利用各向異性導電膜使上部晶片與下部透明面板接合來製造所述檢驗物體,並且所述檢驗物體的下部圖像包括形成在所述透明面板上的面板對準標記和包含在所述各向異性導電膜中的導電顆粒的凹入壓痕,並且所述檢驗物體的上部圖像包括形成在晶片上的晶片對準標記。 The on-glass wafer bonding inspection apparatus according to any one of claims 1 to 5, wherein the inspection object is manufactured by joining an upper wafer to a lower transparent panel by using an anisotropic conductive film, and The lower image of the inspection object includes a panel alignment mark formed on the transparent panel and a concave indentation of conductive particles contained in the anisotropic conductive film, and an upper image of the inspection object includes formation The wafer alignment marks on the wafer. 如申請專利範圍第1到5項中任一項所述的玻璃上晶片接合檢驗設備,其中,所述第一成像裝置和所述第二成像裝置能夠垂直移動,以使所 述第一成像裝置和所述第二成像裝置的焦點的每一個均對焦。 The on-glass wafer bonding inspection apparatus according to any one of claims 1 to 5, wherein the first imaging device and the second imaging device are vertically movable to make Each of the focal points of the first imaging device and the second imaging device is in focus.
TW104132659A 2014-01-22 2014-05-29 Chip on glass bonding inspection apparatus TWI582412B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020140007705A KR101619149B1 (en) 2014-01-22 2014-01-22 Chip on glass bonding inspection apparatus

Publications (2)

Publication Number Publication Date
TW201602561A TW201602561A (en) 2016-01-16
TWI582412B true TWI582412B (en) 2017-05-11

Family

ID=53557783

Family Applications (2)

Application Number Title Priority Date Filing Date
TW103118721A TWI509237B (en) 2014-01-22 2014-05-29 Chip on glass bonding inspection apparatus
TW104132659A TWI582412B (en) 2014-01-22 2014-05-29 Chip on glass bonding inspection apparatus

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW103118721A TWI509237B (en) 2014-01-22 2014-05-29 Chip on glass bonding inspection apparatus

Country Status (3)

Country Link
KR (1) KR101619149B1 (en)
CN (1) CN104792800B (en)
TW (2) TWI509237B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105259178B (en) * 2015-11-20 2019-03-15 云南卡索实业有限公司 A kind of shearing class linear trace laser detection system
KR102008224B1 (en) * 2018-05-29 2019-08-07 에스엔유 프리시젼 주식회사 Inspecting system being capable of inspecting curved surface
KR102326328B1 (en) * 2020-03-05 2021-11-15 주식회사 앱소 Apparatus and Method for Vision Inspection
CN116013803B (en) * 2023-03-30 2023-06-20 深圳新控半导体技术有限公司 Temperature sensing type detection device for chip adhesion and detection method thereof

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012233880A (en) * 2011-04-19 2012-11-29 Shibaura Mechatronics Corp Substrate inspection device, substrate inspection method, and adjusting method of substrate inspection device
US20130157391A1 (en) * 2010-08-24 2013-06-20 Nanda Technologies Gmbh Methods and systems for inspecting bonded wafers
TW201339572A (en) * 2012-03-21 2013-10-01 Optivu Vision System Corp Apparatus and method for detecting defects in device
TWM469621U (en) * 2013-06-21 2014-01-01 昇佳電子股份有限公司 Optical sensor
TW201403056A (en) * 2012-06-04 2014-01-16 Panasonic Corp Method for manufacturing display panel and inspection device and inspection method thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006184021A (en) * 2004-12-24 2006-07-13 Saki Corp:Kk Visual inspection system
KR101002441B1 (en) * 2008-12-18 2010-12-17 세광테크 주식회사 Apparatus for inspecting conjugation portion of c.o.g
KR101019831B1 (en) 2010-09-02 2011-03-04 주식회사 투아이스펙트라 System for inspecting edge of glass substrate
CN103376259A (en) * 2012-04-11 2013-10-30 百励科技股份有限公司 Device and method for detecting internal defects of element

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130157391A1 (en) * 2010-08-24 2013-06-20 Nanda Technologies Gmbh Methods and systems for inspecting bonded wafers
JP2012233880A (en) * 2011-04-19 2012-11-29 Shibaura Mechatronics Corp Substrate inspection device, substrate inspection method, and adjusting method of substrate inspection device
TW201339572A (en) * 2012-03-21 2013-10-01 Optivu Vision System Corp Apparatus and method for detecting defects in device
TW201403056A (en) * 2012-06-04 2014-01-16 Panasonic Corp Method for manufacturing display panel and inspection device and inspection method thereof
TWM469621U (en) * 2013-06-21 2014-01-01 昇佳電子股份有限公司 Optical sensor

Also Published As

Publication number Publication date
CN104792800B (en) 2018-04-17
CN104792800A (en) 2015-07-22
KR101619149B1 (en) 2016-05-10
KR20150087575A (en) 2015-07-30
TW201530123A (en) 2015-08-01
TWI509237B (en) 2015-11-21
TW201602561A (en) 2016-01-16

Similar Documents

Publication Publication Date Title
KR100958204B1 (en) Method and apparatus for inspecting of flat display panel
US11038314B2 (en) Electronic device assembling apparatus
TWI582412B (en) Chip on glass bonding inspection apparatus
WO2009090871A1 (en) Apparatus for inspecting subject to be inspected
US10310010B2 (en) Probe apparatus and probe method
JP2006234553A (en) Visual inspection device and visual inspection method
KR101747852B1 (en) Printed circuit board coating inspection apparatus and inspection methods thereof
JP4877100B2 (en) Mounting board inspection apparatus and inspection method
KR101470424B1 (en) Testing apparatus for lens
JP5288411B2 (en) Alignment device
JP6998503B2 (en) Electronic device assembly equipment and electronic device assembly method
KR20160003608A (en) Chip on glass bonding inspection apparatus
KR101719470B1 (en) The electronic component testing apparatus and testing method
JP2013015328A (en) Display panel inspection device and display panel inspection method
JP2010204122A (en) Method of processing information about probe card, and method of testing energization inspecting object using processed information
JP2008091843A (en) Crimped-state inspection apparatus of substrate
JP2010267756A (en) Bonding apparatus and bonding method
JP2007225317A (en) Apparatus for three-dimensionally measuring component
CN114695229A (en) Bonding alignment device, flip chip bonding machine and bonding method
JP2014001939A (en) Component checkup apparatus
KR102227473B1 (en) Thin film deposition apparatus and method for forming thin film using the same
KR20150087829A (en) Chip on glass bonding inspection apparatus
KR20160002151A (en) Denting Inspecting Apparatus and Method thereof
KR20170065848A (en) Apparatus for Inspecting IC Conjugation Portion of Pannel
JP4895356B2 (en) Line width measuring device