TWI581006B - Gantry equipment and control methods - Google Patents

Description

Gantry equipment and control method

The invention relates to an optical device and a control method, in particular to a gantry device and a control method capable of moving in a vertical direction.

With the development of flat panel display technology, in flat panel display photoetching equipment and measuring equipment, the size of the substrate placed on the workpiece table is getting larger and larger, and the difficulty of moving the workpiece table in the vertical direction or the horizontal direction is increased, and the moving distance is increased. It is also limited by the size of the substrate. Compared with the workpiece table, the gantry has the advantages of simple structure and long working distance. Therefore, the advantage of using the gantry to replace the workpiece table is more and more prominent.

At present, the gantry has only horizontal control, and there is no precedent for vertical control. In the prior art, the vertical direction control method of the photoetching machine adopts a focus leveling sensor for closed loop control to adjust the measurement area to the best focus. The control method is: given the set value of the focus leveling sensor height and the tilt, the servo is performed according to the set value and the height and the tilt value measured by the sensor, and finally the measurement area is adjusted to the best focus. 1 is a schematic diagram of a vertical direction control in the prior art, in which a substrate is placed on a workpiece stage, a controller first issues a control command, and a workpiece stage actuator (motor) shifts the workpiece stage according to a control command; thereafter, focus adjustment is performed. The sensor measures the current position of the upper surface of the substrate and negatively feeds the current position to the controller to form a control loop; the controller then issues a control command to the motor based on the feedback. After repeating the above steps, the substrate on the workpiece table can be adjusted to the best focus, that is, the target point.

However, the vertical direction control is performed by the closed loop method of the focus leveling sensor, and the focus leveling sensor needs to participate in the closed loop control, and the vertical direction control is implemented according to the feedback mechanism, so that it takes time and focus adjustment The closed loop mechanism of the leveling sensor is more complicated.

The object of the present invention is to provide a gantry type device, which comprises a gantry frame and a gantry guide rail, which can realize horizontal movement and vertical movement, and does not require a focus adjustment sensor to participate in closing. Loop control to adjust the substrate to the best focus, reducing control difficulty and saving production costs.

In order to achieve the above object, the present invention provides a gantry-type device, comprising: a supporting device for carrying a substrate; a gantry body and a gantry connecting device, wherein the gantry body is disposed on the supporting device by a gantry connecting device; a directional actuator disposed on the gantry body and movable in a vertical direction relative to the gantry body; a scanning galvanometer located on the vertical actuator; a first sensing unit disposed on the supporting device, the first A reference surface of the sensing unit detects an optimal focus of the scanning galvanometer; a second sensing unit is disposed on the gantry body for acquiring a first surface between the substrate surface and the reference surface of the first sensing unit a third sensing unit is disposed on the vertical direction actuator, and when the reference surface of the first sensing unit detects the optimal focus of the scanning galvanometer, the third sensing unit acquires the scanning galvanometer and the first The second distance between the reference planes of the sensing unit, The vertical direction actuator is configured to adjust a vertical direction position of the scanning galvanometer according to the first distance and the second distance, such that a vertical distance of the scanning galvanometer relative to a surface of the substrate is equal to the first distance and the second distance. And.

Further, the gantry attachment device includes a gantry rail.

Further, the gantry body comprises a first beam and a second beam, the first beam and the second beam are perpendicular to each other, and both are located in a horizontal direction and carry the scanning galvanometer to move horizontally along the gantry rail.

Further, the first sensing unit is a profiler.

Further, the second sensing unit is a color difference sensor, a displacement sensor or a focus leveling sensor.

Further, the third sensing unit is a grating scale, a linear variable differential transformer or an interferometer.

Further, the supporting device comprises a workpiece table, marble, a shock absorber and a foundation placed on the workpiece table, the workpiece table being placed on the marble, the marble being connected to the foundation by a shock absorber.

Further, the gantry apparatus is used for a laser package of a glass substrate, the substrate comprising an upper glass substrate and a lower glass substrate, the substrate surface being a lower surface of the upper glass substrate.

Further, the gantry apparatus is used for an exposure apparatus, and the surface of the substrate is an upper surface of the substrate.

The present invention also provides a control method applied to the above-described gantry type device. The control method of the gantry type device includes the following steps: 1) moving the second sensing unit directly above the first sensing unit, the second sensing The unit acquires a fifth distance Z_BF between the reference planes of the first sensing unit; 2) moving the scanning galvanometer directly above the first sensing unit, the vertical direction actuator adjusting the vertical direction of the scanning galvanometer Directional position until the reference surface of the first sensing unit detects the best focus of the scanning galvanometer, and the third sensing unit detects the zero plane of the third sensing unit to the reference surface of the first sensing unit Six distance Z_galBFref ; 3) moving the second sensing unit directly above the substrate, detecting the third distance Z_mes to the surface of the substrate by the second sensing unit; 4) adjusting the optimal focus of the scanning galvanometer to the substrate The surface distance, the fourth distance Z_s of the zero plane of the third sensing unit to the surface of the substrate, and the relationship between the fourth distance and the fifth, sixth, and third distances is calculated as: Z_s = Z_galBFref + ( Z_mes - Z_BF ); According to the fourth distance Description of best focus moves to the galvanometer substrate surface.

Further, step 5) includes the third sensing unit servo closed loop controlling the vertical direction actuator to drive the third sensing unit and the scanning galvanometer to perform vertical direction synchronization until the zero plane of the third sensing unit is opposite to The vertical direction distance of the substrate surface is equal to the fourth distance Z_s .

The present invention also provides another control method applied to the above gantry type device. The control method of the gantry type device includes the following steps: 1) moving the second sensing unit directly above the first sensing unit, the second sense The measuring unit obtains a fifth distance Z_BF between the reference faces of the first sensing unit; 2) moving the scanning galvanometer directly above the first sensing unit, the vertical direction actuator adjusting the scanning galvanometer a position in the vertical direction until the reference surface of the first sensing unit detects the best focus of the scanning galvanometer, and the third sensing unit detects the zero plane of the third sensing unit to the reference surface of the first sensing unit The sixth distance Z_galBFref ; 3) the second sensing unit is moved directly above the substrate, and the second sensing unit respectively detects the distance z ₁ , z ₂ ... z _n ; 4) according to the distance z ₁ , z ₂ ... z _n , and the horizontal positions ( x ₁ , y ₁ ) of the plurality of leveling points, ( x ₂ , y ₂ )...( x _n , y _n ), calculating the average distance pz of the second sensing unit to the substrate surface and the tilt coefficients pwx , pwy :

Where n is a positive integer; pwx and pwy are the slope coefficients

5) pz, and the average distance to the substrate surface inclination factor pwx according to the second sensing unit, pwy, and a horizontal position of the target set in advance (x_aim, y_aim), calculating the target point height value z_aim: pz-pwy. X_aim + pwx . Y_aim = z_aim

6) When the optimal focus of the scanning galvanometer is adjusted to the plane of the target point, the fourth distance Z_s of the plane from the zero plane of the third sensing unit to the target point is calculated , and the fourth distance is the fifth distance and the sixth distance. The relationship between the distance and the height value of the target point is: Z_s = Z_galBFref + ( Z_aim - Z_BF ); 7) moving the scanning galvanometer directly above the target point, according to which the best focus of the scanning galvanometer is to be scanned Move to the plane of the target point.

Further, step 7) includes the third sensing unit servo closed loop controlling the vertical direction actuator to drive the third sensing unit and the scanning galvanometer to perform vertical direction synchronization until the zero plane of the third sensing unit is opposite. The distance in the vertical direction of the plane of the target point is equal to the fourth distance Z_s .

Further, the number of the leveling points is three.

Compared with the prior art, the invention has the beneficial effects that not only the workpiece table but also the gantry body and the gantry connecting device are used, and the gantry body and the gantry connecting device are combined to realize the horizontal movement of the gantry body and Moving in the vertical direction, providing a plurality of choices; obtaining the vertical direction setting value of the scanning galvanometer height measuring sensor according to the measured values of the first sensing unit, the second sensing unit, and the third sensing unit, and then moving the scanning vibration The mirror adjusts the optimal focus of the scanning galvanometer to the target point, reducing the control difficulty and saving production costs.

1‧‧‧Light source

2‧‧‧Second sensing unit

3‧‧‧First sensing unit

4‧‧‧ scanning galvanometer

5‧‧‧ third sensing unit

6‧‧‧Vertical actuator

7‧‧‧ glass substrate

7a‧‧‧Upper glass substrate

7b‧‧‧Lower glass substrate

8‧‧‧ gantry body

9‧‧‧ gantry rail

10‧‧‧Workpiece table

11‧‧‧ marble

12‧‧‧ Shock absorbers

13‧‧‧ Foundation

14‧‧‧ Zero plane of the second sensing unit

15‧‧‧ Zero plane of the first sensing unit

16‧‧‧The upper surface of the third sensing unit

17‧‧‧ Upper surface of the upper glass substrate

18‧‧‧Lower surface of the upper glass substrate

19‧‧‧ Upper surface of the lower glass substrate

20‧‧‧ horizontal zero position

21‧‧‧First leveling point

22‧‧‧ Target point

23‧‧‧Second leveling point

24‧‧‧ Third leveling point

A‧‧‧ solder

B‧‧‧OLED chip

1 is a schematic diagram of a vertical direction control in the prior art; FIG. 2 is a schematic structural view of a vertical direction control device of a gantry type device according to Embodiment 1 of the present invention; and FIG. 3 is a package of a laser sealing glass package according to Embodiment 1 of the present invention; FIG. 4 is a schematic diagram of the vertical direction control in the first embodiment of the present invention; FIG. 5 is a schematic diagram showing the height adjustment of the scanning galvanometer according to the first embodiment of the present invention; FIGS. 6a to 6c are vertical diagrams of the gantry apparatus of the present invention; Schematic diagram of the direction control process; FIG. 7 is a schematic diagram of the height adjustment of the scanning galvanometer in the second embodiment of the present invention.

Specific embodiments of the present invention will be described in more detail below with reference to the drawings. Advantages and features of the present invention will be apparent from the description and appended claims. It should be noted that the drawings are in a very simplified form and both use non-precise proportions, and are only for convenience and clarity to assist the purpose of the embodiments of the present invention.

[Example 1]

As shown in FIG. 2, FIG. 2 is a schematic structural diagram of a vertical direction control device of a gantry type device according to Embodiment 1 of the present invention. The gantry type device includes: a support device for carrying a substrate, and the substrate is a glass substrate or a sapphire substrate. In this embodiment, the glass substrate 7 is preferably a gantry body 8 and a gantry connecting device. The gantry body 8 is disposed on the supporting device by a gantry connecting device; the scanning galvanometer 4 is placed on the gantry On the body 8, the scanning galvanometer 4 can drive the light beam to scan according to a predetermined trajectory and has a motion of 3 degrees of freedom (x, y, z) including 1 degree of freedom motion and horizontal direction in the vertical direction (z direction). 2 degrees of freedom motion (x direction and y direction); a light source 1 for emitting a light beam to the scanning galvanometer 4, the scanning galvanometer 4 driving the light beam to scan according to a predetermined trajectory, in the embodiment, the light source 1 is a laser The first sensing unit 3 is disposed on the supporting device, and the light beam is irradiated onto the first sensing unit 3 through the scanning galvanometer 4 to form a light spot, and the first sensing unit 3 can measure the spot size and the light intensity; Second sensing unit 2 The gantry body 8 is configured to measure the surface height of the substrate 7 and the first sensing unit 3, and determine the best focus of the scanning galvanometer 4 according to the spot size and the light intensity and the surface height of the first sensing unit 3. a third sensing unit 5 is disposed on the gantry body 8 for measuring the height of the scanning galvanometer 4; a vertical direction actuator 6 is located between the scanning galvanometer 4 and the gantry body 8 for The scanning galvanometer 4 is supported to move in the vertical direction to adjust the optimal focus of the scanning galvanometer 4 to the target point.

The gantry connecting device comprises a gantry rail 9 comprising a first beam in the x direction and a second beam in the y direction, the first beam and the second beam being perpendicular to each other and both in a horizontal direction and carrying the scanning The galvanometer 4 moves horizontally along the gantry rail 9. The second sensing unit 2 may also be referred to as a non-contact height measuring sensor, the third sensing unit 5 may also be referred to as a scanning galvanometer height measuring sensor, and the first sensing unit 3 is a profilometer. The second sensing unit 2 and the third sensing unit 5 are vertical direction measuring sensors, and the second sensing unit 2 is a color difference sensor, a displacement sensor or a focus leveling sensor. Returning to the measured object at least in the z direction without touching the object to be measured; the third sensing unit 5 is a grating scale, LVDT (Linear Variable Differential Transformer) or An interferometer for measuring the height of the scanning galvanometer 4 and implementing closed loop control with the vertical direction actuator 6 to move the scanning galvanometer 4 to move the optimal focus of the scanning galvanometer 4 to the target point; the first sensing The unit 3 measures the spot size and light intensity of the laser emitted from the scanning galvanometer 4. The supporting device comprises a workpiece table 10, a marble 11, a damper 12 and a foundation 13, which is placed on the workpiece table 10, and the workpiece table 10 can be used only for supporting the glass substrate 7, without vertical movement and horizontal movement The profiler 3, the workpiece stage 10 and the gantry guide 9 are both placed on a marble 11 which is connected to the foundation 13 by a damper 12. The laser is placed on a foundation 13, which emits a laser and is irradiated onto the upper surface of the glass substrate 7 or the profiler 3 via the scanning galvanometer 4.

The gantry apparatus can be used for a laser package of a glass substrate 7, as shown in FIG. 3, the substrate 7 includes an upper glass substrate 7a and a lower glass substrate 7b, and the spot is covered by alignment during the laser package process of the substrate 7. On the solder A to be packaged, that is, aligned on the lower surface 18 of the upper glass substrate 7a, under the control of the direction of the laser beam by the scanning galvanometer 4, the spot will be quickly and periodically scanned on the package line, and the solder A will be Temperature The heating is continued to above the softening point, and the heating is stopped, so that the upper and lower glass substrates are firmly bonded together by the intermediate solder A when cooled, thereby forming a hermetic package, and the OLED wafer B to be packaged is packaged in The hermetic package is shown in Figure 3. In this case, the height of the substrate surface measured by the second sensing unit 2 is the height of the lower surface 18 of the upper glass substrate.

In addition, the gantry apparatus can also be used for an exposure apparatus, that is, a usual single substrate is used, in which case the height of the substrate surface measured by the second sensing unit 2 is the height of the upper surface of the substrate.

As shown in FIG. 4, FIG. 4 is a schematic diagram of vertical direction control according to Embodiment 1 of the present invention. The controller first issues a control command, and the vertical direction actuator 6 (motor) shifts the scanning galvanometer 4 according to the control command, and the current position is Negative feedback to the controller to form a control loop. The vertical direction setting value is calculated according to the measurement data obtained by the second sensing unit 2, the third sensing unit 5, and the first sensing unit 3, and the mathematical model includes a first mathematical model and a second mathematical The model, the difference between the vertical direction setting value and the current position is input to the controller, and finally realizes the current position tracking vertical direction setting value, that is, the difference is zero.

As shown in FIG. 5, FIG. 5 is a schematic diagram of the height adjustment of the scanning galvanometer according to the first embodiment of the present invention. The best focus of the scanning galvanometer 4 is adjusted to the target point by the field-by-field measurement method of field-by-field focusing. The vertical direction control method is as follows: 1. As shown in FIG. 6a, the second sensing unit 2 is moved directly above the first sensing unit 3, and the second sensing unit 2 measures the same to the first sensing unit 3. The height Z_BF of the upper surface 16; 2. As shown in FIG. 6b, the scanning galvanometer 4 is moved directly above the first sensing unit 3, and the light beam emitted by the light source 1 is irradiated to the first sense through the scanning galvanometer 4. On the measuring unit 3, the vertical direction actuator 6 adjusts the vertical direction position of the scanning galvanometer 4 until the spot light detected by the first sensing unit 3 has the strongest maximum light intensity (when the detected spot size is the largest and the light intensity is the strongest) That is, the upper surface 16 of the first sensing unit 3 is located at the optimal focus position of the scanning galvanometer 4, and at this time, the scanning galvanometer 4 moved in the vertical direction to the upper surface 16 of the first sensing unit 3 The distance is the best focal length of the scanning galvanometer 4, in other words, at the time of the first sensing unit 3 Point 16 is located on the surface of the scanning mirror 4 of the best focus position. Since the position of the scanning galvanometer 4 and the third sensing unit 5 in the vertical direction is relatively fixed, the vertical distance Z_galBFref of the zero plane 14 of the third sensing unit 5 to the upper surface 16 of the first sensing unit 3 may be adopted . Indirectly indicating the vertical direction distance of the scanning galvanometer 4 to the upper surface 16 of the first sensing unit 3; it should be noted that in the process of adjusting the vertical direction position of the scanning galvanometer 4 by the vertical direction actuator 6, the third sensing The unit 5 moves synchronously with the scanning galvanometer 4, and the vertical sensing position of the second sensing unit 2 and the first sensing unit 3 does not change; 3. as shown in FIG. 6c, the second sensing unit 2 is moved. Directly above the substrate 7, the height Z_mes of the target point on the surface of the substrate is measured by the second sensing unit 2, that is, the height of the measurement point on the lower surface 18 of the upper glass substrate of the substrate 7 supported on the workpiece stage 10 is measured. That is, the height of the target point 22, which is not marked in FIG. 4; 4. When the optimal focus of the scanning galvanometer 4 is adjusted to the target point 22, the zero plane 14 of the third sensing unit 5 is calculated. Set to the vertical height of the plane 18 where the target point 22 is located Value Z_s, is calculated as follows: Z_s = Z_galBFref + (Z_mes - Z_BF) (1)

The above formula (1) is the first mathematical model; 5. As shown in FIG. 6c, the scanning galvanometer 4 is moved directly above the target point 22, and the optimal focus of the scanning galvanometer 4 is moved according to the height setting value. The target point 22, that is, the third sensing unit 5, the servo closed loop controls the vertical direction actuator 6 to drive the third sensing unit 5 and the scanning galvanometer 4 to move in the vertical direction until the third sensing unit 5 The distance between the zero plane 14 and the target point 22 in the vertical direction is equal to the height set value Z_s . At this time, the target point 22 is located at the optimum focus of the scanning galvanometer 4.

[Embodiment 2]

In the second embodiment, the schematic diagram of the vertical direction control device of the gantry type device and the schematic diagram of the vertical direction control are also shown in FIG. 2 and FIG. 4 respectively. In the first embodiment, the gantry type shown in FIG. 2 has been described in detail. The device and the schematic diagram of the vertical direction control shown in FIG. 4 are not described here.

FIG. 7 is a schematic diagram showing the height adjustment of the scanning galvanometer according to the second embodiment of the present invention. When the glass substrate is used, the lower surface of the upper glass substrate often has a certain inclination, which is different from the inclination in the first embodiment. In the second embodiment, the influence of the inclination of the lower surface of the upper glass substrate on the set value of the height is examined, and the best focus of the scanning galvanometer 4 is adjusted to the target point by the field-by-field measurement method of field-by-field focusing, which is vertical. The direction control method is: 1. As shown in FIG. 6a, the second sensing unit 2 is moved directly above the first sensing unit 3, and the second sensing unit 2 measures it onto the first sensing unit 3. The height Z_BF of the surface 16; 2. As shown in FIG. 6b, the scanning galvanometer 4 is moved directly above the first sensing unit 3, and the light beam emitted by the light source 1 is irradiated to the first sensing unit through the scanning galvanometer 4. 3, the vertical direction actuator 6 adjusts the vertical direction position of the scanning galvanometer 4 until the maximum light intensity of the spot detected by the first sensing unit 3 is the strongest (when the detected spot size is the largest and the light intensity is the strongest) Indicates that the upper surface 16 of the first sensing unit 3 is located in the sweep The optimal focus position of the galvanometer 4), at this time, the distance from the scanning galvanometer 4 in the vertical direction to the upper surface 16 of the first sensing unit 3 is the optimal focal length of the scanning galvanometer 4, in other words, The point at the upper surface 16 of the first sensing unit 3 at this time is at the optimum focus position of the scanning galvanometer 4. Since the position of the scanning galvanometer 4 and the third sensing unit 5 in the vertical direction is relatively fixed, the vertical distance Z_galBFref of the zero plane 14 of the third sensing unit 5 to the upper surface 16 of the first sensing unit 3 may be adopted . Indirectly indicating the vertical direction distance of the scanning galvanometer 4 to the upper surface 16 of the first sensing unit 3; it should be noted that in the process of adjusting the vertical direction position of the scanning galvanometer 4 by the vertical direction actuator 6, the third sensing The unit 5 moves synchronously with the scanning galvanometer 4, and the vertical sensing position of the second sensing unit 2 and the first sensing unit 3 does not change; 3. as shown in FIG. 6c, the second sensing unit 2 is moved. Directly above the substrate 7, the heights z ₁ , z ₂ ... z _n of the plurality of leveling points on the surface of the substrate are respectively measured by the second sensing unit 2, wherein n is a positive integer, in this embodiment The second sensing unit 2 measures the height of the first leveling point 21 on the lower surface 18 of the upper glass substrate of the substrate 7 supported on the workpiece table 10, denoted as z ₁ , and measures the second leveling point 23 and leveling height of the third point 24, referred to as z ₂ and z _3;. 4 to recorded three leveling points Height calculation value on the glass substrate overall height and tilt, the height and tilt three unknowns need to be set, it may set pz, pwx PWY and, provided on the lower surface of the glass plate Equation 18 is: z = pz-pwy. x + pwx.y (2)

The horizontal positions of the first leveling point 21, the second leveling point 23, and the third leveling point 24 with respect to the horizontal direction zero position 20 are respectively ( x ₁ , y ₁ ), ( x ₂ , y ₂ ), ( x ₃ , y ₃ ), the relative height values of the second sensing units 2 of the three leveling points are z ₁ , z ₂ and z ₃ , and substituting into the formula (2) can obtain:

The values of pz , pwx and pwy can be obtained from equation (3); 5. The height value of the target point 22 is calculated, and the horizontal position of the target point 22 is ( x_aim , y_aim ), and the relative height value of the target point 22 is z_aim . Then substituting into formula (2) can be obtained: pz-pwy . X_aim + pwx. Y_aim = z_aim (4)

The value of z_aim can be found by the formula (4); 6. When the optimal focus of the scanning galvanometer 4 is adjusted to the target point 22, the vertical plane 14 of the third sensing unit 5 to the plane 18 of the target point 22 is calculated. The direction height setting value Z_s is calculated as follows: Z_s = Z_galBFref +( Z_aim-Z_BF ) (5)

The above formulas (2), (3), (4), and (5) are second mathematical models; 7. As shown in FIG. 6c, the scanning galvanometer 4 is moved directly above the target point 22, and is set according to the height. The value moves the optimal focus of the scanning galvanometer 4 to the target point 22, that is, the third sensing unit 5 servos the closed loop to control the vertical direction actuator 6 to drive the third sensing unit 5 and the scanning galvanometer 4 to be synchronized vertically. The direction moves until the vertical direction distance of the zero plane 14 of the third sensing unit 5 with respect to the target point 22 is equal to the height set value Z_s , at which time the target point 22 is located at the best focus of the scanning galvanometer 4.

In summary, in the gantry type control device and method provided by the embodiments of the present invention, not only the workpiece table but also the gantry body 8 and the gantry frame connecting device are used. The combination of the gantry body 8 and the gantry connecting device realizes the horizontal movement and the vertical movement of the gantry body 8, providing a plurality of choices; only measuring the measured value and scanning vibration of the sensor 2 according to the non-contact height The mirror height measures the measured value of the sensor 5, and the vertical direction setting value of the scanning galvanometer height measuring sensor 5 is calculated, and then the scanning galvanometer height measuring sensor 5 controls the moving scanning galvanometer 4 according to the set value closed loop. Thereby, the optimal focus of the scanning galvanometer 2 is adjusted to the target point 22, which reduces the control difficulty and saves production costs.

The above are only the preferred embodiments of the present invention and are not intended to limit the invention. Any changes in the technical solutions and technical contents disclosed in the present invention may be made by those skilled in the art without departing from the technical scope of the present invention. The content is still within the scope of protection of the present invention.

1‧‧‧Light source

2‧‧‧Second sensing unit

3‧‧‧First sensing unit

4‧‧‧ scanning galvanometer

5‧‧‧ third sensing unit

6‧‧‧Vertical actuator

7‧‧‧ glass substrate

8‧‧‧ gantry body

9‧‧‧ gantry rail

10‧‧‧Workpiece table

11‧‧‧ marble

12‧‧‧ Shock absorbers

13‧‧‧ Foundation

Claims (14)

A gantry type device, comprising: a supporting device for carrying a substrate; a gantry body and a gantry connecting device, wherein the gantry body is disposed on the supporting device by the gantry connecting device; a vertical actuator disposed on the gantry body and movable in a vertical direction relative to the gantry body; a scanning galvanometer on the vertical actuator; a first sensing unit disposed on the support device Detecting, by the reference surface of the first sensing unit, the best focus of the scanning galvanometer; a second sensing unit is disposed on the gantry body for acquiring the surface of the substrate and the first sensing unit a first distance between the reference planes; and a third sensing unit disposed on the vertical actuator, when the reference surface of the first sensing unit detects the best focus of the scanning galvanometer, The third sensing unit acquires a second distance between the scanning galvanometer and the reference surface of the first sensing unit, wherein the vertical direction actuator is configured to adjust the scanning vibration according to the first distance and the second distance Mirrored Straight-direction position, so that the scanning mirror with respect to a direction perpendicular to the surface of the substrate by a distance equal to the first distance and the second distance. The gantry type device of claim 1, wherein the gantry connecting device comprises a gantry rail. The gantry apparatus of claim 2, wherein the gantry body comprises a first beam and a second beam, the first beam and the second beam being perpendicular to each other, both in a horizontal direction and carrying the scanning galvanometer Move along the gantry rail for horizontal movement. The gantry device of claim 1, wherein the first sensing unit is a profiler. The gantry device of claim 1, wherein the second sensing unit is a color difference sensor, a displacement sensor or a focus leveling sensor. The gantry device of claim 1, wherein the third sensing unit is a grating scale, a linear variable differential transformer or an interferometer. The gantry apparatus of claim 1, wherein the supporting device comprises a workpiece table, a marble, a shock absorber and a foundation, the substrate is placed on the workpiece table, the workpiece table is placed on the marble, the marble The shock absorber is connected to the foundation. The gantry device of claim 1, wherein the gantry device is used for a laser package of a glass substrate, the substrate comprising an upper glass substrate and a lower glass substrate, the surface of the substrate being a lower surface of the upper glass substrate. The gantry device of claim 1, wherein the gantry device is used for an exposure device, and a surface of the substrate is an upper surface of the substrate. A gantry-type device control method is applied to the gantry device of claim 1, wherein the method includes the following steps: 1) moving the second sensing unit directly above the first sensing unit, the second sensing unit Obtaining a fifth distance Z_BF between the reference planes of the first sensing unit; 2) moving the scanning galvanometer directly above the first sensing unit, the vertical direction actuator adjusting the scanning galvanometer a position in the vertical direction until the reference surface of the first sensing unit detects the best focus of the scanning galvanometer, and the third sensing unit detects the zero plane of the third sensing unit to the reference of the first sensing unit a sixth distance Z_galBFref of the surface ; 3) moving the second sensing unit directly above the substrate, and detecting, by the second sensing unit, a third distance Z_mes to the surface of the substrate; 4) scanning the surface When the optimal focus of the galvanometer is adjusted to the surface of the substrate, calculating a fourth distance Z_s of the zero plane of the third sensing unit to the surface of the substrate, the fourth distance and the fifth, sixth, and third distances relationship: Z_s = Z_galBFref + (Z_mes- Z_BF) And 5) to move to the surface of the substrate of the scanning mirror in the best focus based on the fourth distance. The control method of the gantry device of claim 10, wherein the step 5) comprises: the third sensing unit servo closed loop controls the vertical direction actuator to drive the third sensing unit and the scanning galvanometer to perform vertical direction Moving until the vertical direction distance of the zero plane of the third sensing unit with respect to the surface of the substrate is equal to the fourth distance Z_s . A gantry-type device control method is applied to the gantry device of claim 1, wherein the method includes the following steps: 1) moving the second sensing unit directly above the first sensing unit, the second sensing unit Obtaining a fifth distance Z_BF between the reference planes of the first sensing unit; 2) moving the scanning galvanometer directly above the first sensing unit, the vertical direction actuator adjusting the scanning galvanometer Positioning in the vertical direction until the reference surface of the first sensing unit detects the best focus of the scanning galvanometer, the third sensing unit detecting the zero plane of the third sensing unit to the reference surface of the first sensing unit a sixth distance Z_galBFref ; 3) moving the second sensing unit directly above the substrate, and the second sensing unit respectively detects the distance z ₁ , z from the plurality of leveling points on the surface of the substrate ₂ ... z _n ; 4) according to the equidistances z ₁ , z ₂ ... z _n , and the horizontal positions ( x ₁ , y ₁ ), ( x ₂ , y ₂ ) of the plurality of leveling points... ( x _n , y _n ), calculating an average distance pz of the second sensing unit to the surface of the substrate and a tilt coefficient pwx , pwy : Wherein n is a positive integer; pwx and pwy are inclination coefficients 5) an average distance pz from the second sensing unit to the surface of the substrate, a tilt coefficient pwx , pwy , and a preset horizontal position of a target point ( x_aim) , y_aim ), calculate a height value of the target point z_aim : pz-pwy . X_aim + pwx . Y_aim = z_aim 6) when the optimal focus of the scanning galvanometer is adjusted to the plane of the target point, a fourth distance Z_s of the plane of the third sensing unit to the plane of the target point is calculated , the fourth distance The relationship with the fifth distance, the sixth distance, and the height value of the target point is: Z_s = Z_galBFref + ( Z_aim-Z_BF ); and 7) moving the scanning galvanometer directly above the target point, according to the The fourth distance moves the best focus of the scanning galvanometer to the plane of the target point. The control method of the gantry device of claim 12, wherein the step 7) includes the third sensing unit servo closed loop controlling the vertical direction actuator to drive the third sensing unit and the scanning galvanometer to perform vertical direction Moving until the vertical distance of the zero plane of the third sensing unit with respect to the plane of the target point is equal to the fourth distance Z_s . The control method of the gantry device of claim 12, wherein the number of the leveling points is three.