TWI521730B - Substrate processing equipment - Google Patents
Substrate processing equipment Download PDFInfo
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- TWI521730B TWI521730B TW102119859A TW102119859A TWI521730B TW I521730 B TWI521730 B TW I521730B TW 102119859 A TW102119859 A TW 102119859A TW 102119859 A TW102119859 A TW 102119859A TW I521730 B TWI521730 B TW I521730B
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- Prior art keywords
- substrate
- sensor
- holder
- solar cell
- tool
- Prior art date
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- 239000000758 substrate Substances 0.000 title claims description 82
- 238000001514 detection method Methods 0.000 claims description 13
- 238000003825 pressing Methods 0.000 claims description 13
- 238000000034 method Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- -1 chalcopyrite structure compound Chemical class 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
- H01L22/32—Additional lead-in metallisation on a device or substrate, e.g. additional pads or pad portions, lines in the scribe line, sacrificed conductors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Description
本發明係關於一種基板之加工裝置，尤其關於一種用以於太陽電池基板之薄膜形成槽之加工裝置。 The present invention relates to a processing apparatus for a substrate, and more particularly to a processing apparatus for forming a film for a film of a solar cell substrate.
太陽電池基板係例如藉由如專利文獻1所示之方法而製造。於該專利文獻1所記載之製造方法中，於玻璃等基板上形成由Mo膜組成之下部電極膜，其後，藉由於下部電極膜形成槽而將其分割為短條狀。其次，於下部電極膜上形成CIGS膜等包含黃銅礦構造化合物半導體膜之化合物半導體膜。然後，該等半導體膜之一部分係藉由槽加工而呈條紋狀地除去且分割為短條狀，並以覆蓋該等之方式形成上部電極膜。最後，上部電極膜之一部分係藉由槽加工而呈條紋狀地剝離且分割為短條狀。 The solar cell substrate is manufactured, for example, by a method as disclosed in Patent Document 1. In the manufacturing method described in Patent Document 1, a lower electrode film composed of a Mo film is formed on a substrate such as glass, and thereafter, the lower electrode film is formed into a short strip shape by forming a groove. Next, a compound semiconductor film containing a chalcopyrite structure compound semiconductor film such as a CIGS film is formed on the lower electrode film. Then, one of the semiconductor films is removed in a stripe shape by groove processing and divided into short strips, and the upper electrode film is formed to cover the film. Finally, one of the upper electrode films is peeled off in a stripe shape by groove processing and is divided into short strips.
作為如上之步驟中之槽加工技術之一，使用有藉由金剛石等機械工具而除去薄膜之一部分之機械劃線法。於該機械劃線法中，為了可進行穩定之寬度之槽加工，而提出有如專利文獻2所示之方法。於該專利文獻2所示之方法中，使用有具備調整加工負荷之加工負荷調整機構之槽加工工具及剝離工具。 As one of the groove processing techniques in the above steps, a mechanical scribing method in which a part of the film is removed by a mechanical tool such as diamond is used. In the mechanical scribing method, a method as shown in Patent Document 2 has been proposed in order to perform groove processing of a stable width. In the method disclosed in Patent Document 2, a groove processing tool and a peeling tool having a processing load adjusting mechanism for adjusting a processing load are used.
又，於專利文獻3中，亦提供一種設置有沿槽形成方向搖動自如之鐘擺搖動體，而可於往返移動時形成槽之裝置。 Further, Patent Document 3 also provides a device in which a pendulum swinging body that is rockable in the groove forming direction is provided, and a groove can be formed when reciprocating.
[專利文獻1]日本實開昭63-16439號公報 [Patent Document 1] Japanese Unexamined Gazette No. 63-16439
[專利文獻2]日本特開2002-033498號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2002-033498
[專利文獻3]日本特開2010-245255號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2010-245255
於先前之槽加工裝置中，工具係藉由氣缸而按壓於太陽電池基板。而且，於太陽電池基板之表面撓曲之情形時，藉由使氣缸之活塞桿上下移動而使工具追隨基板表面。 In previous slot processing devices, the tool was pressed against the solar cell substrate by a cylinder. Further, when the surface of the solar cell substrate is deflected, the tool follows the surface of the substrate by moving the piston rod of the cylinder up and down.
此處，於在太陽電池基板上進行槽加工之情形時，將按壓荷重設定得較小之情形較多。而且，由於在太陽電池基板之製造中，當於玻璃基板上形成金屬膜(Mo膜)時會進行熱處理，因此玻璃表面之撓曲變大之情形較多。 Here, in the case where the groove processing is performed on the solar cell substrate, the pressing load is often set to be small. Further, in the production of a solar cell substrate, when a metal film (Mo film) is formed on a glass substrate, heat treatment is performed, and thus the deflection of the glass surface is often increased.
於此種狀況下，若如先前裝置般僅使氣缸之活塞桿上下移動，則工具會無法充分地追隨太陽電池基板之撓曲，且工具之按壓力之變動會變大。如此一來，存在成為加工殘留或對基板造成損傷之原因而產生加工不良之情形。 Under such circumstances, if only the piston rod of the cylinder is moved up and down as in the prior art, the tool will not sufficiently follow the deflection of the solar cell substrate, and the variation of the pressing force of the tool will become large. As a result, there is a case where processing defects occur due to processing residues or damage to the substrate.
本發明之課題在於獲得一種可準確地追隨基板之表面之撓曲，且可抑制加工不良的加工裝置。 An object of the present invention is to provide a processing apparatus which can accurately follow the deflection of the surface of a substrate and can suppress processing defects.
本發明之第1方面之基板之加工裝置係用以加工基板之表面之裝置，且具備載置基板之載台、頭部、驅動機構、感測器、及控制部。頭部具有可相對於載台沿水平方向相對移動之基座、及於前端安裝有加工用工具且被基座升降自如地支承之保持具。驅動機構使保持具相對於基座升降。感測器檢測基板表面之高度位置。控制部根據感測器之檢測結果控制驅動機構，從而控制保持具之高度位置。 A substrate processing apparatus according to a first aspect of the present invention is an apparatus for processing a surface of a substrate, and includes a stage on which the substrate is placed, a head, a driving mechanism, a sensor, and a control unit. The head has a susceptor that is relatively movable in the horizontal direction with respect to the stage, and a holder that is attached to the tip end with a processing tool and that is detachably supported by the susceptor. The drive mechanism raises and lowers the holder relative to the base. The sensor detects the height position of the substrate surface. The control unit controls the driving mechanism according to the detection result of the sensor, thereby controlling the height position of the holder.
此處，基板之表面之高度係藉由感測器而檢測，且與該檢測結果相應地相對於基座沿上下方向移動控制安裝工具之保持具。 Here, the height of the surface of the substrate is detected by the sensor, and the holder for controlling the mounting tool is moved in the up and down direction with respect to the base in accordance with the detection result.
因此，工具可沿上下方向移動之範圍與先前裝置相比變大，從而使工具之相對於基板之表面之追隨性提高。藉此，使工具之按壓力之變動變小，從而可抑制加工殘留或對基板之損傷等加工不良。 Therefore, the range in which the tool can be moved in the up and down direction becomes larger than that of the prior device, thereby improving the followability of the tool with respect to the surface of the substrate. Thereby, the fluctuation of the pressing force of the tool is made small, and processing defects such as machining residue or damage to the substrate can be suppressed.
本發明之第2方面之基板之加工裝置係如第1方面之裝置，其中保持具包含保持具本體、工具安裝部、及按壓手段。工具安裝部係相對於保持具本體升降自如地支承，且於下端部安裝工具。按壓手段係用以將工具安裝部對載台上之基板按壓。 A substrate processing apparatus according to a second aspect of the invention, wherein the holder comprises a holder body, a tool mounting portion, and a pressing means. The tool mounting portion is detachably supported with respect to the holder body, and a tool is attached to the lower end portion. The pressing means is for pressing the tool mounting portion against the substrate on the stage.
本發明之第3方面之基板之加工裝置係如第2方面之裝置，其中按壓手段係活塞桿之前端連結於工具安裝部之氣缸。 A substrate processing apparatus according to a third aspect of the invention is the apparatus of the second aspect, wherein the pressing means is a cylinder in which a front end of the piston rod is coupled to the tool mounting portion.
本發明之第4方面之基板之加工裝置係如第1方面至第3方面中任一項之裝置，其中感測器對基板之表面照射雷射光而檢測基板之表面之高度位置。 A substrate processing apparatus according to any one of the first aspect to the third aspect, wherein the sensor irradiates the surface of the substrate with laser light to detect a height position of the surface of the substrate.
本發明之第5方面之基板之加工裝置係如自第1方面至第4方面中任一項之裝置，其中感測器係安裝於基座。而且，控制部接收來自感測器之檢測結果，並根據感測器與基板表面之間之距離之變化量而控制驅動機構。 A device for processing a substrate according to any one of the first aspect to the fourth aspect, wherein the sensor is attached to the susceptor. Moreover, the control unit receives the detection result from the sensor and controls the drive mechanism according to the amount of change in the distance between the sensor and the substrate surface.
本發明之第6方面之基板之加工裝置係如第2方面至第4方面中任一項之裝置，其中感測器係安裝於保持具本體。而且，控制部接收來自感測器之檢測結果，並以使感測器與基板表面之間之距離始終固定之方式控制驅動機構。 The apparatus for processing a substrate according to the sixth aspect of the invention, wherein the sensor is attached to the holder body. Moreover, the control unit receives the detection result from the sensor and controls the drive mechanism in such a manner that the distance between the sensor and the substrate surface is always fixed.
於如上之本發明中，即便於基板之表面之撓曲較大之情形時，亦可使工具精度良好地追隨該撓曲，從而可抑制加工不良。 In the above aspect of the invention, even when the deflection of the surface of the substrate is large, the tool can accurately follow the deflection, and the processing failure can be suppressed.
1‧‧‧載台 1‧‧‧ stage
2‧‧‧工具 2‧‧‧ Tools
3、30‧‧‧頭部 3, 30‧‧‧ head
16、32‧‧‧基座 16, 32‧‧‧ Pedestal
17、33‧‧‧保持具 17, 33‧‧‧ Keeping
18、34‧‧‧馬達 18, 34‧‧‧ motor
19、38‧‧‧感測器 19, 38‧‧‧ Sensors
21、35‧‧‧保持具本體 21, 35‧‧‧ keep the body
22、36‧‧‧工具安裝部 22, 36‧‧‧Tools Installation Department
23、37‧‧‧氣缸 23, 37‧‧ ‧ cylinder
24、40‧‧‧控制部 24, 40‧‧‧Control Department
圖1係採用本發明之一實施形態之加工裝置之外觀立體圖。 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing the appearance of a processing apparatus according to an embodiment of the present invention.
圖2係本發明之第1實施形態之頭部之示意圖。 Fig. 2 is a schematic view showing the head portion of the first embodiment of the present invention.
圖3係本發明之第2實施形態之頭部之示意圖。 Fig. 3 is a schematic view showing a head portion of a second embodiment of the present invention.
將採用本發明之第1實施形態之基板加工裝置之外觀立體圖示於圖1。 The external appearance of the substrate processing apparatus according to the first embodiment of the present invention is shown in Fig. 1.
該裝置包含載置太陽電池基板(以下僅記為「基板」)W之載台1、安裝槽形成用工具2之頭部3、2個相機4及2個監視器5。 This apparatus includes a stage 1 on which a solar cell substrate (hereinafter simply referred to as "substrate") W, a head 3 of the groove forming tool 2, two cameras 4, and two monitors 5 are mounted.
載台1於水平面內可沿圖1之Y方向移動。又，載台1於水平面內能夠以任意之角度旋轉。再者，於圖1中，表示頭部3之概略之外觀，關於頭部3將於下文敍述。 The stage 1 is movable in the horizontal direction of FIG. 1 in the horizontal plane. Further, the stage 1 can be rotated at an arbitrary angle in the horizontal plane. Further, in Fig. 1, the outline appearance of the head portion 3 is shown, and the head portion 3 will be described later.
頭部3係藉由移動支承機構6而可於載台1之上方沿X、Y方向移動。再者，如圖1所示，X方向係於水平面內與Y方向正交之方向。移動支承機構6具有1對支承柱7a、7b、跨及1對支承柱7a、7b間而設置之導桿8、及驅動形成於導桿8之導軌9之馬達10。各頭部3可沿導軌9如上述般在X方向上移動。 The head portion 3 is movable in the X and Y directions above the stage 1 by moving the support mechanism 6. Furthermore, as shown in FIG. 1, the X direction is a direction orthogonal to the Y direction in the horizontal plane. The moving support mechanism 6 has a pair of support columns 7a and 7b, a guide bar 8 disposed between the pair of support columns 7a and 7b, and a motor 10 for driving the guide rail 9 formed on the guide bar 8. Each of the heads 3 is movable along the guide rail 9 in the X direction as described above.
2個相機4係分別固定於台座12。各台座12可沿設置於支承台13之沿X方向延伸之導軌14移動。2個相機4可進行上下移動，藉由各相機4拍攝之圖像係顯示於對應之監視器5中。 Two cameras 4 are fixed to the pedestal 12, respectively. Each of the pedestals 12 is movable along a guide rail 14 that is disposed in the X direction of the support table 13. The two cameras 4 are movable up and down, and images captured by the respective cameras 4 are displayed on the corresponding monitor 5.
於圖2中示意性地表示頭部3及其控制塊。圖2(a)係前視圖，圖2(b)係側視圖。 The head 3 and its control block are schematically represented in FIG. Fig. 2(a) is a front view, and Fig. 2(b) is a side view.
頭部3具有基座16及保持具17。又，於頭部3中設置有用以驅動保持具17之馬達18及感測器19。 The head 3 has a base 16 and a holder 17. Further, a motor 18 and a sensor 19 for driving the holder 17 are provided in the head 3.
基座16可沿圖1所示之導桿8之導軌9在X方向上移動。 The base 16 is movable in the X direction along the guide rail 9 of the guide bar 8 shown in FIG.
保持具17係藉由馬達18而沿上下方向地驅動，並經由未圖示之軌道而相對於基座16沿上下方向滑動自如地支承。該保持具17具有保持具本體21、工具安裝部22、及氣缸23。 The holder 17 is driven in the vertical direction by the motor 18, and is slidably supported in the vertical direction with respect to the susceptor 16 via a rail (not shown). The holder 17 has a holder body 21, a tool mounting portion 22, and a cylinder 23.
工具安裝部22係相對於保持具本體21而升降自如地支承。氣缸23係固定於保持具本體21，且活塞桿之下端係連結於工具安裝部22。藉由該氣缸23而將安裝於工具安裝部22之工具2向下方(基板)按壓。於工具安裝部22之下部拆卸自如地安裝有工具2。 The tool attachment portion 22 is supported to be lifted and lowered with respect to the holder body 21. The cylinder 23 is fixed to the holder body 21, and the lower end of the piston rod is coupled to the tool mounting portion 22. The tool 2 attached to the tool mounting portion 22 is pressed downward (substrate) by the air cylinder 23. The tool 2 is detachably attached to the lower portion of the tool mounting portion 22.
感測器19檢測載置於載台1上之基板之表面之高度，且固定於基座16。該感測器19對基板之表面照射雷射光，從而測定感測器19與基板之間之距離。 The sensor 19 detects the height of the surface of the substrate placed on the stage 1 and is fixed to the susceptor 16. The sensor 19 irradiates the surface of the substrate with laser light to determine the distance between the sensor 19 and the substrate.
於該裝置中設置有控制部24。控制部24接收來自感測器19之檢測信號，從而控制馬達18。具體而言，控制部24使保持具17與感測器19和基板之間之距離之變化量相應地上下移動。即，於基板之表面較正規之位置向上方撓曲之情形時，上述距離與撓曲量相應地變短。因此，控制部24以變短之距離之量驅動馬達18而使保持具17向上方移動。 A control unit 24 is provided in the apparatus. The control unit 24 receives the detection signal from the sensor 19 to control the motor 18. Specifically, the control unit 24 moves the amount of change in the distance between the holder 17 and the sensor 19 and the substrate up and down accordingly. That is, when the surface of the substrate is bent upward at a position where the surface is more regular, the distance is shortened in accordance with the amount of deflection. Therefore, the control unit 24 drives the motor 18 by the amount of the shortened distance to move the holder 17 upward.
於使用如上之裝置對太陽電池基板進行槽加工之情形時，藉由移動機構6而使頭部3移動並且使載台1移動，使用相機4及監視器5而使工具2 位於劃線預定線上。 When the solar cell substrate is grooved using the above apparatus, the head 3 is moved by the moving mechanism 6 and the stage 1 is moved, and the tool 2 is used to make the tool 2 Located on the line of the line.
於進行如上之位置對準後，驅動氣缸23而使保持具17下降，使工具2之前端接觸薄膜。此時之工具2之相對於薄膜之加壓力係藉由供給至氣缸23之氣壓而調整。 After the above alignment is performed, the cylinder 23 is driven to lower the holder 17 so that the front end of the tool 2 contacts the film. The pressing force of the tool 2 with respect to the film at this time is adjusted by the air pressure supplied to the cylinder 23.
其次，驅動馬達10使頭部3沿劃線預定線掃描。此時，檢測基板之表面之高度(與感測器19之間之距離)，該檢測結果係輸入至控制部24。如上所述，控制部24根據基板表面之高度而驅動控制馬達18，使保持具17即工具2沿上下方向移動。因此，可使工具2之相對於薄膜之加壓力始終維持於適當之壓力。 Next, the drive motor 10 causes the head 3 to scan along a predetermined line of scribe lines. At this time, the height of the surface of the substrate (the distance from the sensor 19) is detected, and the detection result is input to the control portion 24. As described above, the control unit 24 drives and controls the motor 18 in accordance with the height of the surface of the substrate, and moves the holder 17, that is, the tool 2, in the vertical direction. Therefore, the pressing force of the tool 2 relative to the film can be maintained at an appropriate pressure.
由於根據基板表面之高度位置而沿上下方向移動控制具有工具安裝部22及氣缸23之保持具17，因此與如先前裝置般在氣缸23之動作範圍內使工具2沿上下方向移動之情形相比，工具2之相對於基板表面之追隨性提高。即，即便於基板之撓曲較大之情形時，亦可使工具2精度良好地追隨基板表面。因此，可使加工殘留較少，又，可抑制對構成太陽電池基板之玻璃基板之損傷。 Since the holder 17 having the tool mounting portion 22 and the cylinder 23 is moved in the vertical direction in accordance with the height position of the surface of the substrate, the tool 2 is moved in the vertical direction within the range of the operation of the cylinder 23 as in the prior art. The followability of the tool 2 relative to the surface of the substrate is improved. That is, even when the deflection of the substrate is large, the tool 2 can be accurately followed the surface of the substrate. Therefore, the processing residue can be made small, and damage to the glass substrate constituting the solar cell substrate can be suppressed.
於圖3中示意性地表示本發明之第2實施形態。圖3(a)係槽加工裝置之頭部及其控制塊之前視圖，圖3(b)係側視圖。再者，頭部以外之部分與第1實施形態所示之構成相同。 A second embodiment of the present invention is schematically shown in Fig. 3 . Figure 3 (a) is a front view of the head of the groove processing device and its control block, and Figure 3 (b) is a side view. Further, the portions other than the head are the same as those shown in the first embodiment.
與第1實施形態同樣地，頭部30具有可沿X方向移動之基座32與保持具33。又，於頭部30中設置有用以沿上下方向驅動保持具33之馬達34。 Similarly to the first embodiment, the head portion 30 has a base 32 and a holder 33 that are movable in the X direction. Further, a motor 34 for driving the holder 33 in the vertical direction is provided in the head portion 30.
保持具33具有保持具本體35、相對於保持具本體35升降自如地支承之工具安裝部36、固定於保持具本體35之氣缸37、及感測器38。氣缸37之活塞桿之下端係連結於工具安裝部36。又，於工具安裝部36之下部拆卸自如地安裝有工具2。 The holder 33 has a holder body 35, a tool attachment portion 36 that is slidably supported by the holder body 35, a cylinder 37 that is fixed to the holder body 35, and a sensor 38. The lower end of the piston rod of the cylinder 37 is coupled to the tool mounting portion 36. Further, the tool 2 is detachably attached to the lower portion of the tool mounting portion 36.
感測器38檢測載置於載台1上之基板之表面之高度，且固定於保持具本體35。該感測器38與第1實施形態同樣地對基板之表面照射雷射光，從而測定感測器38與基板之間之距離。 The sensor 38 detects the height of the surface of the substrate placed on the stage 1 and is fixed to the holder body 35. In the same manner as in the first embodiment, the sensor 38 irradiates the surface of the substrate with laser light to measure the distance between the sensor 38 and the substrate.
於該第2實施形態中，設置有控制部40。控制部40接收來自感測器38之檢測信號，而控制馬達34。具體而言，控制部40以使感測器38與基板之間之距離始終固定之方式控制馬達34而使保持具33上下移動。 In the second embodiment, the control unit 40 is provided. The control unit 40 receives the detection signal from the sensor 38 and controls the motor 34. Specifically, the control unit 40 controls the motor 34 so that the distance between the sensor 38 and the substrate is always fixed, and the holder 33 is moved up and down.
關於槽加工動作與第1實施形態相同。此處，保持具33之驅動控制與第1實施形態不同。即，於驅動馬達10而使頭部3沿劃線預定線掃描時，檢測基板之表面之高度(與感測器38之間之距離)，並將該檢測結果輸入至控制部40。如上所述，控制部40根據基板表面之高度，以使感測器38與基板表面之間之距離始終固定之方式驅動控制馬達34，從而使保持具33即工具2沿上下方向移動。因此，可將工具2之相對於薄膜之加壓力維持於適當之壓力。 The groove processing operation is the same as that of the first embodiment. Here, the drive control of the holder 33 is different from that of the first embodiment. That is, when the motor 10 is driven to scan the head 3 along a predetermined line of the scribe line, the height of the surface of the substrate (the distance from the sensor 38) is detected, and the detection result is input to the control unit 40. As described above, the control unit 40 drives the control motor 34 such that the distance between the sensor 38 and the surface of the substrate is always fixed in accordance with the height of the surface of the substrate, thereby moving the holder 33, that is, the tool 2, in the vertical direction. Therefore, the pressing force of the tool 2 with respect to the film can be maintained at an appropriate pressure.
除第1實施形態之特徵以外，由於感測器38與保持具33共同追隨基板表面而沿上下方向移動，因此可藉由感測器38測定之基板表面之高度範圍擴大。因此，與感測器之可測定範圍無關地使對基板表面之可追隨範圍擴 大。即，於第1實施形態中，需要以使基板表面之高度不會自感測器之測定範圍偏離之方式，根據基板之厚度或厚度方向之變形而交換可測定範圍不同之感測器，或調整感測器之安裝位置(高度)，但於第2實施形態中，由於感測器之高度追隨基板之表面而變化，因此無需進行此種感測器之安裝位置之調整。 In addition to the features of the first embodiment, since the sensor 38 and the holder 33 move in the vertical direction following the surface of the substrate, the height range of the substrate surface measured by the sensor 38 can be expanded. Therefore, the followable range of the surface of the substrate is expanded irrespective of the measurable range of the sensor Big. In other words, in the first embodiment, it is necessary to exchange sensors having different measurable ranges depending on the thickness of the substrate or the thickness direction so that the height of the surface of the substrate does not deviate from the measurement range of the sensor, or Although the mounting position (height) of the sensor is adjusted, in the second embodiment, since the height of the sensor changes depending on the surface of the substrate, it is not necessary to adjust the mounting position of the sensor.
又，可無需進行伴隨感測器之交換或安裝位置之調整的零點調整作業。 Moreover, it is not necessary to perform a zero point adjustment operation accompanying the exchange of the sensor or the adjustment of the mounting position.
本發明並不限定於如上之實施形態，可不脫離本發明之範圍地進行各種變形或修正。 The present invention is not limited to the above embodiments, and various modifications and changes can be made without departing from the scope of the invention.
1‧‧‧載台 1‧‧‧ stage
2‧‧‧工具 2‧‧‧ Tools
3‧‧‧頭部 3‧‧‧ head
4‧‧‧相機 4‧‧‧ camera
5‧‧‧監視器 5‧‧‧Monitor
6‧‧‧移動支承機構 6‧‧‧Mobile support mechanism
7a、7b‧‧‧支承柱 7a, 7b‧‧‧ support column
8‧‧‧導桿 8‧‧‧guides
9、14‧‧‧導軌 9, 14 ‧ ‧ rail
10‧‧‧驅動馬達 10‧‧‧Drive motor
12‧‧‧台座 12‧‧‧ pedestal
13‧‧‧支承台 13‧‧‧Support table
W‧‧‧基板 W‧‧‧Substrate
Claims (8)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012142674A JP2014004776A (en) | 2012-06-26 | 2012-06-26 | Processing device of substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201401546A TW201401546A (en) | 2014-01-01 |
| TWI521730B true TWI521730B (en) | 2016-02-11 |
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| Application Number | Title | Priority Date | Filing Date |
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| TW102119859A TWI521730B (en) | 2012-06-26 | 2013-06-05 | Substrate processing equipment |
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| Country | Link |
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| JP (1) | JP2014004776A (en) |
| KR (1) | KR101547823B1 (en) |
| CN (1) | CN103515219B (en) |
| TW (1) | TWI521730B (en) |
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| KR102355043B1 (en) * | 2014-03-28 | 2022-01-25 | 엘지디스플레이 주식회사 | Display device and bending apparatus for display device |
| CN104716070B (en) | 2015-04-03 | 2017-12-26 | 合肥京东方光电科技有限公司 | Size detecting device and substrate loading device |
| CN105171089A (en) * | 2015-07-24 | 2015-12-23 | 南通福通机床有限公司 | Gantry machine tool |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2003267742A (en) * | 2002-03-13 | 2003-09-25 | Nakamura Tome Precision Ind Co Ltd | Method for scribing hard fragile plate |
| JP3867230B2 (en) * | 2002-09-26 | 2007-01-10 | 本田技研工業株式会社 | Mechanical scribing device |
| CN100528507C (en) * | 2002-11-06 | 2009-08-19 | 三星钻石工业股份有限公司 | Scribe line forming device and scribe line forming method |
| JP2006119024A (en) * | 2004-10-22 | 2006-05-11 | Tokyo Electron Ltd | Probe and its manufacturing method |
| JP5395592B2 (en) * | 2009-09-24 | 2014-01-22 | 大日本スクリーン製造株式会社 | Electrode forming apparatus and electrode forming method |
| JP2011155151A (en) * | 2010-01-27 | 2011-08-11 | Mitsuboshi Diamond Industrial Co Ltd | Scribing apparatus for thin-film solar cell |
| JP5145368B2 (en) * | 2010-03-29 | 2013-02-13 | 三星ダイヤモンド工業株式会社 | Multilayer substrate patterning device |
| JP5912395B2 (en) * | 2011-10-14 | 2016-04-27 | 三星ダイヤモンド工業株式会社 | Substrate upper surface detection method and scribing apparatus |
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| CN103515219A (en) | 2014-01-15 |
| TW201401546A (en) | 2014-01-01 |
| KR20140004000A (en) | 2014-01-10 |
| JP2014004776A (en) | 2014-01-16 |
| KR101547823B1 (en) | 2015-08-27 |
| CN103515219B (en) | 2016-08-10 |
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