CN106772736B - The manufacturing device and manufacturing method of large scale grating - Google Patents
The manufacturing device and manufacturing method of large scale grating Download PDFInfo
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- CN106772736B CN106772736B CN201710019314.XA CN201710019314A CN106772736B CN 106772736 B CN106772736 B CN 106772736B CN 201710019314 A CN201710019314 A CN 201710019314A CN 106772736 B CN106772736 B CN 106772736B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
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Abstract
A kind of manufacturing device and manufacturing method of big grating, the device include light source mobile module, substrate mobile module and monitoring control module three parts.Compared to the device that previous scanning light beam legal system makes grating, the device splits the two-dimensional scanning campaign of grating substrate, light source and grating substrate are respectively driven using one-dimensional precise translation stage, the demand for being equipped with two-dimensional precision translation stage is eliminated, system cost is greatly saved.The device simple structure, the area for the made big grating for being easy to expand.The big grating with high striped precision and the depth of parallelism can be effectively produced in conjunction with the positioning of 3 axis laser interferometer and closed loop adjustment control method, the device.
Description
Technical field
The present invention relates to grid photo-etching, the manufacturing device and manufacturing method of especially a kind of big grating of size.
Background technique
Grating is widely used in many of national defence, scientific research and national economy as a kind of important basic optical element
Field.Especially in astronomical observation instrument, high power laser pulse compression and long range accurate measurement, large scale grating is can not
Or lack.
2003, Carl Gang Chen described a kind of using the big grating of scanning light beam method inscription in its doctoral thesis
Method (Carl Gang Chen.Beam Alignment and Image Metrology for Scanning Beam
Interference Lithography—Fabricating Gratings with Nanometer Phase
Accuracy.PhD Thesis,Massachusetts Institute of Technology,2003.).The technology uses phase
Dry light beam creates exposure stripe, carries grating substrate using big stroke two-dimensional precision translation stage support and scans under exposing light beam
Movement, exposes striped substrate each section all by stripe, forms complete large-area grating, can inscribe out grades up to a hundred
Grating.
One key link of the technology is to have used big stroke two dimension precision displacement table, it is entire grating fabrication process
Motion parts, stroke and positioning accuracy determine the size and quality of final lenticular product.And such two-dimension translational platform
System complex, it is expensive, and double with dimension enlargement.It is difficult to make long stroke but also with nanometer with the domestic prior art
The two-dimension translational platform of grade setting accuracy.
Summary of the invention
In order to overcome long stroke precise 2-D translation stage described in background technology to be difficult to manufacture and difficulty with high costs,
The present invention provides the manufacturing device and manufacturing method of a kind of big grating, which eliminates building complicated two-dimensional sports platform system
Needs, greatly reduce system cost.
Technical solution of the invention
A kind of manufacturing device manufacturing big grating based on one-dimensional precise translation stage, including light source mobile module, substrate are mobile
Module and monitoring control module three parts, it is characterized in that:
The light source mobile module, including light source, Light Source Translation platform and portal frame, the Light Source Translation platform are one-dimensional
Long stroke translation stage, pedestal are fixed on the portal frame, and the light source is mounted on the light source by link block
On the mobile table top of translation stage, the light source projects downwards exposing light beam, when the mobile table top of the Light Source Translation platform is straight
When line moves, the light source, which is driven, to move along a straight line, while exposing light beam streaks straight line；
The substrate mobile module, the Optical grating base including two substrate translation stages being placed in parallel, one piece of strip
With grating substrate to be exposed, two substrate translation stages are all one-dimensional long stroke precision translation stage, are installed in parallel in described
Portal frame under, the mobile table top of two substrate translation stages supports the both ends of the Optical grating base respectively, described
The direction of motion of the mobile table top of two substrate translation stages is vertical with the direction of motion of mobile table top of Light Source Translation platform,
The light to be exposed that the movement of the mobile table top of two substrate translation stages will drive the Optical grating base mobile, described
Grid base piece is placed on the Optical grating base, is fixed with tabletting；
The monitoring control module, including a set of 3 axis laser interferometer and an industrial personal computer, the 3 axis laser are dry
Interferometer has 3 measurement mirrors, is mounted on the Optical grating base side, and axis measurement mirror is mounted in the Optical grating base side
At point, paraxonic measurement mirror installation point is respectively aligned to the axis of movement of two substrate translation stages, the 3 axis laser interferences
Three measurement laser beams of instrument are respectively aligned to 3 measurement mirrors, are in coplanar interior with the grating substrate to be exposed, described
3 axis laser interferometer can accurately measure 3 measurement mirror relative initial position displacements, the industrial personal computer with it is described
3 axis laser interferometer, the Light Source Translation platform, two substrate translation stages, the light source be connected, pass through program
Read and control their state.
The exposing light beam that the light source issues can be used there are many beam type, and one is laser direct-writing device hairs
Point light beam out, one is the light and shade stripeds generated using two-beam interference in grating substrate plane, and one is utilize Dammam light
The luminous point battle array that grid diffraction generates.
The method that the manufacturing device of the big grating manufactures big grating comprising the steps of:
1) grating substrate to be exposed is placed on the Optical grating base, is fixed with tabletting, start the industrial personal computer
Program performs the following operation, and two substrate translation stages drive the grating substrate to be exposed to reach it and move table top fortune
Dynamic starting point, the Light Source Translation platform drive the light source to reach it and move table top movement starting point, initialize 3 axis and swash
The 3 axis reading of optical interferometer is zero, that is, sets this position to measure origin；
2) open the light source, the Light Source Translation platform drive the light source from go mobile table top move starting point to
Terminal makees linear uniform motion, and the exposing light beam for issuing the light source is inswept one on the grating substrate to be exposed
Straightway exposes current location；
3) light source is closed, the Light Source Translation platform drives the light source to return to its movement table top and moves
Point；
4) screen periods of needs are set as t, if exposed at this time n times, next exposure position coordinate is T=(n
+ 1) t, two substrate translation stages drive the grating substrate to be exposed to move forward simultaneously, amount of movement t；
5) after two substrate translation stages described in come to a complete stop, it is left and right that the industrial personal computer reads the 3 axis laser interferometer
Two paraxonic survey measurements are respectively P1, and P2, axis reading is P0, calculate the tune that two substrate translation stages should be made respectively
Whole distance are as follows: X1=T-P0+ (P2-P1)/2 and X2=T-P0+ (P1-P2)/2 enables two substrate translation stages distinguish phase
X1, X2 mobile to current location, positive value indicate to advance, and negative value indicates to retreat；
6) step 5 is repeated, until calculated X1, X2 are less than the minimum movement step pitch or preset maximum of substrate translation stage
Tolerance, it is believed that the grating substrate to be exposed has arrived at target light exposure position T at this time, and adjustment terminates；
7) when the exposure of the grating substrate to be exposed does not complete, return step 2), when the grating to be exposed
When all exposures are completed in substrate, into next step；
8) the grating substrate to be exposed is taken out, by obtaining grating after developing, dechromise, drying.
Technical effect of the invention
The present invention builds scanning light beam using one-dimensional precise translation stage and inscribes optical-mechanical system.It is driven using a rectilinear translation platform
Dynamic exposing light beam drives grating substrate using two accurate translation stages, in conjunction with 3 coplanar axis laser interferometer, in the Abbe that disappears
Grating substrate position and posture are accurately detected in the case where error, is controlled using industrial personal computer feedback adjustment, ensure that grating
The depth of parallelism and position precision of striped, minimum step of the precision up to accurate translation stage.For nanoscale translation stage, can inscribe
The grating of nano-precision out, grating length and width are up to translation stage stroke.
Invention avoids scanning light beams to inscribe the demand that grating uses two-dimensional precision translation stage in the process, need to only utilize one
Dimension translation stage builds system, and greatly reduces overall cost；Structure is simple, is easy to build and safeguard；Registration manufactures light
Grid precision is high；Expansion is strong, can increase translation stage size as needed and be upgraded.
Detailed description of the invention
Fig. 1 is the stereoscopic schematic diagram of apparatus of the present invention.
Fig. 2 is the substrate mobile module top view of apparatus of the present invention.
Specific embodiment
Below with reference to embodiment and attached drawing, the invention will be further described, but protection model of the invention should not be limited with this
It encloses.
Refering to fig. 1, Fig. 1 is the stereoscopic schematic diagram of apparatus of the present invention.Exposing light beam is generated by light supply apparatus 1, can be
The speckle pattern interferometry field that dual-beam is formed, the dot matrix that can also be generated using laser direct-writing light beam or Darman raster.Light supply apparatus 1
It is installed on one-dimensional rectilinear translation platform 2, linear uniform motion can be done under the drive of translation stage 2.Translation stage 2 is fixed on portal frame
On 3.The light source mobile module of above section constitution equipment.
Portal frame 3 is equipped with two one-dimensional precise translation stages 601,602 as substrate translation stage, two translation stages in parallel below
601,602 directions of motion are perpendicular to Light Source Translation platform 2, perpendicular to paper in Fig. 1.Two translation stages 6 prop Optical grating base 5 respectively
Both ends, inscribe grating time grid base piece 4 be fixed on Optical grating base 5,4 height of substrate should be located at exposing light beam focus
On.When two substrate translation stages 601,602 move, Optical grating base plate 5 can be driven and then grating substrate 4 is driven to move.More than
The substrate mobile module of part constitution equipment.
Referring again to Fig. 2, two one-dimensional precise translation stages 601,602 parallel arrangements, support is carried in the side of Optical grating base plate 5
Portion and both sides are equipped with 3 face reflecting mirrors 801,802,800.3 axis laser interferometer 7 are issued to be moved with substrate translation stage 601,602
The parallel measurement laser beam 901,902,900 in direction can accurately measure out the opposite initial bit of 3 face reflecting mirror 801,802,800
The displacement set.Jackshaft reads position readings of the P0 as grating substrate 4, and two paraxonics read P1, and P2 is as grating substrate 4
Attitude reference.For the Abbe error for eliminating measurement, the measurement laser beam 901,902,900 and reflecting mirror of 3 axis laser interferometer 7
It 801,802,800 should be with grating substrate 4 in the plane of sustained height.
Because there is a difference in height in the positioned internal plane of grating substrate 4 and translation stage 6, the positional readings of translation stage 6 and
The actual position of grating substrate 4 exists, it is therefore desirable to be positioned with 3 axis laser interferometer 7 to 4 precise measurement of grating substrate., with symbol
Close Abbe's principle.
3 axis laser interferometer 7 measure laser beam 901,902,900, reflecting mirror 801,802,800 and each instrument of monitoring
Industrial personal computer (being not drawn into figure) the composition monitoring control module of device equipment.Whole device should be fixed on stable shock insulation platform,
To cut down the influence of ambient vibration bring.
Utilize the method for the big grating of the device manufacturing comprising the steps of:
1) grating substrate 4 to be exposed is placed on the Optical grating base 5, is fixed with tabletting, start the industrial personal computer
Program perform the following operation, two substrate translation stages 601,602 drive the grating substrate 4 to be exposed to reach it
Mobile table top moves starting point, and the Light Source Translation platform 2 drives the light source 1 to reach it and moves table top movement starting point, initially
The 3 axis reading for changing the 3 axis laser interferometer 7 is zero, that is, sets this position to measure origin；
2) light source 1 is opened, the Light Source Translation platform 2 drives the light source 1 from going mobile table top movement
Point makees linear uniform motion to terminal, and the exposing light beam for issuing the light source 1 is swept on the grating substrate 4 to be exposed
Straight line section is crossed, i.e., current location is exposed；
3) light source 1 is closed, the Light Source Translation platform 2 drives the light source 1 to return to it and moves table top fortune
Dynamic starting point；
4) screen periods of needs are set as t, if exposed at this time n times, next exposure position coordinate is T=(n
+ 1) * t, two substrate translation stages 601,602 drive the grating substrate 4 to be exposed to move forward simultaneously, amount of movement
For t；
5) after two substrate translation stages 601,602 described in come to a complete stop, the industrial personal computer reads the 3 axis laser interferences
The left and right two paraxonics survey measurements of instrument 7 is respectively P1, P2, and axis reading is P0, calculate two substrate translation stages 601,
The 602 adjustment distances that should be made respectively are as follows: X1=T-P0+ (P2-P1)/2 and X2=T-P0+ (P1-P2)/2 enables described two
Substrate translation stage 601,602 distinguishes relative current position mobile X1, X2, and positive value indicates to advance, and negative value indicates to retreat；
6) step 5 is repeated, until calculated X1, X2 is less than the minimum movement step pitch or pre- of substrate translation stage 601,602
If maximum tolerance, it is believed that the grating substrate 4 to be exposed described at this time has arrived at target light exposure position T, and adjustment terminates；
7) when the exposure of the grating substrate 4 to be exposed does not complete, return step 2), when the grating to be exposed
When all exposures are completed in substrate 4, into next step；
8) the grating substrate 4 to be exposed is taken out, by obtaining grating after developing, dechromise, drying.
Using the stroke 100mm of PI Corp., the precision displacement table of minimum step 4nm as translation stage 6, agilent company
The interferometer of resolution ratio 0.32nm establishes apparatus of the present invention as 3 axis laser interferometer 7, and experiment shows to have produced 50mm
Width, 100mm long, period 562nm, the grating sample of fringe position precision ± 5nm.
Claims (3)
1. a kind of manufacturing device of large scale grating, including light source mobile module, substrate mobile module and monitoring control module three
Part, it is characterised in that:
The light source mobile module, including light source (1), Light Source Translation platform (2) and portal frame (3), the Light Source Translation platform
It (2) is one-dimensional long stroke translation stage, pedestal is fixed on the portal frame (3), and the light source (1) is pacified by link block
On the mobile table top of the Light Source Translation platform (2), the light source (1) projects downwards exposing light beam, when the light
When the mobile table top linear motion of source translation stage (2), the light source (1), which is driven, to move along a straight line, while exposing light beam is drawn
Cross straight line；
The substrate mobile module, the grating including two substrate translation stages being placed in parallel (601,602), one piece of strip
Pedestal (5) and grating substrate to be exposed (4), two substrate translation stages (601,602) are all flat for one-dimensional long stroke precision
Moving stage is installed in parallel under the portal frame (3), and the mobile table top of two substrate translation stages (601,602) is distinguished
The both ends of the support Optical grating base (5), the direction of motion of the mobile table top of two substrate translation stages (601,602)
It is vertical with the direction of motion of mobile table top of Light Source Translation platform (2), two substrate translation stages (601,602)
The movement of mobile table top will drive the Optical grating base (5) mobile, and the grating substrate (4) to be exposed is placed on described
Optical grating base (5) on, fixed with tabletting；
The monitoring control module, including a set of 3 axis laser interferometer (7) and an industrial personal computer, the 3 axis laser interferences
Instrument (7) has 3 measurement mirrors (801,802,800), is mounted on the side of the Optical grating base (5), and axis measures mirror (800) peace
At described Optical grating base (5) side edge mid-points, paraxonic measurement mirror (801,802) installation point is respectively aligned to two bases
The axis of movement of piece translation stage (601,602), the 3 axis laser interferometer (7) three measurement laser beams (901,902,
900) 3 measurement mirrors (801,802,800) are respectively aligned to, are in coplanar interior with the grating substrate (4) to be exposed, institute
The 3 axis laser interferometer (7) stated accurately measure the displacement of 3 measurement mirror (801,802,800) relative initial positions, described
Industrial personal computer and the 3 axis laser interferometer (7), the Light Source Translation platform (2), two substrate translation stages
(601,602), the light source (1) are connected, and read and control their state by program.
2. the manufacturing device of large scale grating according to claim 1, it is characterised in that: what the light source (1) issued
Exposing light beam, the point light beam including laser direct-writing device sending, or utilization two-beam interference generate bright in grating substrate plane
Dark fringe, or the luminous point battle array generated using Darman raster diffraction.
3. the method for manufacturing big grating using the manufacturing device of large scale grating described in claim 1, it is characterised in that include
Following steps:
1) grating substrate (4) to be exposed is placed on the Optical grating base (5), is fixed with tabletting, start the industrial personal computer
Program perform the following operation: two substrate translation stages (601,602) drive the grating substrate (4) to be exposed to arrive
Table top is moved up to it and moves starting point, and the Light Source Translation platform (2) drives the light source (1) to reach its movement table top and moves
Point, the 3 axis reading for initializing the 3 axis laser interferometer (7) is zero, that is, sets this position to measure origin；
2) light source (1) is opened, the Light Source Translation platform (2) drives the light source (1) from mobile table top movement
Point makees linear uniform motion to terminal, and the exposing light beam for issuing the light source (1) is in the grating substrate (4) to be exposed
Upper inswept straight line section, i.e., expose current location；
3) light source (1) is closed, the Light Source Translation platform (2) drives the light source (1) to return to it and moves table top
Move starting point；
4) screen periods of needs are set as t, if exposed at this time n times, next exposure position coordinate is T=(n+1)
T, two substrate translation stages (601,602) drive the grating substrate (4) to be exposed to move forward simultaneously, amount of movement
For t；
5) after two substrate translation stages (601,602) described in are come to a complete stop, the industrial personal computer reads the 3 axis laser interferometer
(7) left and right two paraxonics survey measurements is respectively P1, P2, and axis reading is P0, calculate two substrate translation stages (601,
602) the adjustment distance that should be made respectively are as follows: X1=T-P0+ (P2-P1)/2 and X2=T-P0+ (P1-P2)/2 enables described two
Relative current position mobile X1, X2, positive value indicate to advance a substrate translation stage (601,602) respectively, and negative value indicates to retreat；
6) step 5 is repeated, until calculated X1, X2 are less than the minimum movement step pitch of substrate translation stage (601,602) or preset
Maximum tolerance, it is believed that the grating substrate (4) to be exposed described at this time has arrived at target light exposure position T, and adjustment terminates；
7) when the exposure of the grating substrate (4) to be exposed does not complete, return step 2), when the grating base to be exposed
When all exposures are completed in piece (4), into next step；
8) exposed grating substrate (4) is taken out, by obtaining grating after developing, dechromise, drying.
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| CN111185678B (en) * | 2020-02-07 | 2021-07-27 | 吉林大学 | Method for preparing hollow structure on surface and inside of transparent material |
| CN112764145A (en) * | 2021-02-01 | 2021-05-07 | 西安交通大学 | Two-dimensional grating efficient manufacturing method based on time sequence control |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000147228A (en) * | 1998-11-05 | 2000-05-26 | Ricoh Co Ltd | Production of optical diffraction element |
| CN102809892A (en) * | 2012-07-20 | 2012-12-05 | 顾金昌 | Moving, compressing and shading mechanism for digital stereo image processing and method thereof |
| CN105527796A (en) * | 2014-09-28 | 2016-04-27 | 上海微电子装备有限公司 | Gantry type device and control method |
| CN106226854A (en) * | 2016-09-21 | 2016-12-14 | 清华大学深圳研究生院 | A kind of producing device of holographic grating array |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20120015936A (en) * | 2010-08-13 | 2012-02-22 | 삼성전자주식회사 | Exposure apparatus and method for compensation alignment error using the same |
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- 2017-01-11 CN CN201710019314.XA patent/CN106772736B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000147228A (en) * | 1998-11-05 | 2000-05-26 | Ricoh Co Ltd | Production of optical diffraction element |
| CN102809892A (en) * | 2012-07-20 | 2012-12-05 | 顾金昌 | Moving, compressing and shading mechanism for digital stereo image processing and method thereof |
| CN105527796A (en) * | 2014-09-28 | 2016-04-27 | 上海微电子装备有限公司 | Gantry type device and control method |
| CN106226854A (en) * | 2016-09-21 | 2016-12-14 | 清华大学深圳研究生院 | A kind of producing device of holographic grating array |
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