CN106772736A - The manufacture device and manufacture method of big grating - Google Patents
The manufacture device and manufacture method of big grating Download PDFInfo
- Publication number
- CN106772736A CN106772736A CN201710019314.XA CN201710019314A CN106772736A CN 106772736 A CN106772736 A CN 106772736A CN 201710019314 A CN201710019314 A CN 201710019314A CN 106772736 A CN106772736 A CN 106772736A
- Authority
- CN
- China
- Prior art keywords
- substrate
- grating
- light source
- exposed
- translation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
A kind of manufacture device and manufacture method of big grating, the device include light source mobile module, substrate mobile module and the part of Monitoring and Controlling module three.Compared to the device that conventional scanning light beam legal system makes grating, the device splits the two-dimensional scan campaign of grating substrate, light source and grating substrate are driven respectively using one-dimensional precise translation stage, the demand for being equipped with two dimension precision translation stage is eliminated, and greatly save system cost.The device simple structure, it is easy to the area of the made big grating of expansion.With reference to 3 axle laser interferometer positioning and closed loop adjustment control method, the device can effectively produce the big grating with striped precision high and the depth of parallelism.
Description
Technical field
The present invention relates to grid photo-etching, the particularly a kind of manufacture device and manufacture method of big grating.
Background technology
Grating is widely used in many of national defence, scientific research and national economy as a kind of important basic optical element
Field.Especially in astronomical observation instrument, high power laser pulse compression and long range accurate measurement, large scale grating is can not
Or lack.
2003, Carl Gang Chen described one kind in its thesis for the doctorate and inscribe big grating using scanning light beam method
Method (Carl Gang Chen.Beam Alignment and Image Metrology for Scanning Beam
Interference Lithography—Fabricating Gratings with Nanometer Phase
Accuracy.PhD Thesis,Massachusetts Institute of Technology,2003.).The technology uses phase
Dry light beam creates exposure stripe, and carry grating substrate using big stroke two dimension precision translation stage support scans under exposing light beam
Motion, makes striped substrate each several part all be exposed by stripe, forms complete large-area grating, can inscribe out grades up to a hundred
Grating.
One key link of the technology is the use of big stroke two dimension precision displacement table, and it is whole grating fabrication process
Motion parts, its stroke and positioning precision determine the size and quality of final lenticular product.And such two-dimension translational platform
System complex, it is expensive, and double with dimension enlargement.To be difficult to make long stroke but also with nanometer in domestic prior art
The two-dimension translational platform of level setting accuracy.
The content of the invention
In order to overcome the long stroke precise 2-D translation stage described in background technology to be difficult to manufacture and difficulty with high costs,
The present invention provides a kind of manufacture device and manufacture method of big grating, and the device eliminates structure complicated two-dimensional sports platform system
The need for, greatly reduce system cost.
Technical solution of the invention
A kind of manufacture device that big grating is manufactured based on one-dimensional precise translation stage, including the movement of light source mobile module, substrate
Module and the part of Monitoring and Controlling module three, its feature is：
Described light source mobile module, including light source, Light Source Translation platform and portal frame, described Light Source Translation platform are one-dimensional
Long stroke translation stage, its base is fixed on described portal frame, and described light source is arranged on described light source by contiguous block
On the mobile table top of translation stage, described light source projects downwards exposing light beam, when the mobile table top of described Light Source Translation platform is straight
When line is moved, described light source is driven and moves along a straight line, while exposing light beam streaks straight line；
Described substrate mobile module, including two substrate translation stages being placed in parallel, the Optical grating bases of a block length bar shaped
With grating substrate to be exposed, two described substrate translation stages are all one-dimensional long stroke precision translation stage, are installed in parallel in described
Portal frame under, the mobile table top of two described substrate translation stages supports the two ends of described Optical grating base respectively, described
Two directions of motion of the mobile table top of substrate translation stage are vertical with the direction of motion of the mobile table top of described Light Source Translation platform,
The Optical grating base described in drive is moved in the movement of the mobile table top of two described substrate translation stages, described light to be exposed
Grid base piece is placed on described Optical grating base, is fixed with compressing tablet；
Described Monitoring and Controlling module, including a set of 3 axle laser interferometer and an industrial computer, 3 described axle laser are done
Interferometer has 3 measurement mirrors, and installed in described Optical grating base side, axis measurement mirror is arranged in described Optical grating base side
At point, paraxonic measurement mirror mount point is respectively aligned to two described axis of movements of substrate translation stage, 3 described axle laser interferences
Three measurement laser beams of instrument are respectively aligned to 3 measurement mirrors, are in coplanar with described grating substrate to be exposed, described
3 axle laser interferometer can accurately measure 3 displacements of measurement mirror relative initial position, described industrial computer with it is described
3 axle laser interferometer, described Light Source Translation platform, two described substrate translation stages, described light source be connected, by program
Read and control their state.
The exposing light beam that described light source sends, has various beam types to use, and one kind is laser direct-writing device hair
The point light beam for going out, a kind of is the light and shade striped produced in grating substrate plane using two-beam interference, and one kind is using Dammam light
The light dot matrix that grid diffraction is produced.
The method that the manufacture device of described big grating manufactures big grating, comprises the steps of：
1) grating substrate to be exposed is placed on described Optical grating base, is fixed with compressing tablet, start described industrial computer (7)
Program carry out following operation, two described substrate translation stages drive described grating substrate to be exposed to reach its movement table top
Motion starting point, described Light Source Translation platform drives described light source to reach its movement table top motion starting point, 3 described axles of initialization
3 axle readings of laser interferometer are zero, that is, set this position as measurement origin；
2) open described light source, described Light Source Translation platform drive described light source from go to move table top move starting point to
Terminal makees linear uniform motion, makes the exposing light beam that described light source sends inswept one on described grating substrate to be exposed
Straightway, i.e., exposed to current location；
3) described light source is closed, described Light Source Translation platform drives described light source to return to its movement table top and moves
Point；
4) screen periods for setting needs are t, if now exposed n times, next exposure position coordinate is T=(n
+ 1) t, two described substrate translation stages drive described grating substrate to be exposed to move forward simultaneously, and amount of movement is t；
5) after two substrate translation stages described in come to a complete stop, it is left and right that described industrial computer reads 3 described axle laser interferometer
Two paraxonic survey measurements are respectively P1, P2, and axis reading is P0, calculates the tune that two described substrate translation stages should be made respectively
Whole distance is：X1=T-P0+ (P2-P1)/2 and X2=T-P0+ (P1-P2)/2, the described two substrate translation stages difference phase of order
X1, X2 are moved to current location, is advanced on the occasion of representing, negative value represents retrogressing；
6) the 5th step is repeated, until the X1 for calculating, minimum moving step pitchs or default maximum of the X2 less than substrate translation stage
Tolerance, it is believed that now described grating substrate to be exposed has arrived at target light exposure position T, and adjustment terminates；
7) when the exposure of described grating substrate to be exposed is not completed, return to step 2), when described grating to be exposed
When substrate has completed all exposures, into next step；
8) described grating substrate to be exposed is taken out, grating is obtained after developing, dechromising, dry.
Technique effect of the invention
The present invention builds scanning light beam and inscribes optical-mechanical system using one-dimensional precise translation stage.Driven using a rectilinear translation platform
Dynamic exposing light beam, drives grating substrate, with reference to 3 coplanar axle laser interferometer, in the Abbe that disappears using two accurate translation stages
To grating substrate position and attitude accurate detection in the case of error, then controlled by industrial computer feedback adjustment, it is ensured that grating
The depth of parallelism and positional precision of striped, minimum step of its precision up to precision translation stage.For nanoscale translation stage, can inscribe
Go out the grating of nano-precision, grating length and width are up to translation stage stroke.
Invention avoids the demand during scanning light beam inscription grating using two dimension precision translation stage, only need to be using one
Dimension translation stage builds system, and greatly reduces holistic cost；Simple structure, it is easy to build and safeguard；Registration, manufactures light
Grid high precision；Expansion is strong, can as needed increase translation stage size and be upgraded.
Brief description of the drawings
Fig. 1 is the schematic perspective view of apparatus of the present invention.
Fig. 2 is the substrate mobile module top view of apparatus of the present invention.
Specific embodiment
With reference to embodiment and accompanying drawing, the invention will be further described, but should not limit protection model of the invention with this
Enclose.
Refering to Fig. 1, Fig. 1 is the schematic perspective view of apparatus of the present invention.Exposing light beam is produced by light supply apparatus 1, it can be
The speckle pattern interferometry that dual-beam is formed, it would however also be possible to employ laser direct-writing light beam, or the dot matrix that Darman raster is produced.Light supply apparatus 1
It is installed on one-dimensional rectilinear translation platform 2, linear uniform motion can be done under the drive of translation stage 2, direction is as shown by arrows in FIG..
Translation stage 2 is fixed on portal frame 3.The light source mobile module of above section constitution equipment.
Portal frame 3 is parallel below to be provided with two one-dimensional precise translation stages 601,602 as substrate translation stage, two translation stages
601st, 602 directions of motion are perpendicular to Light Source Translation platform 2, in Fig. 1 perpendicular to paper.Two translation stages 6 prop Optical grating base 5 respectively
Two ends, inscribe grating time grid base piece and 4 be fixed on Optical grating base 5, the height of substrate 4 should be located at the focus of exposing light beam
On.When two substrate translation stages 601,602 are moved, Optical grating base plate 5 can be driven and then drive grating substrate 4 to move.More than
The substrate mobile module of part constitution equipment.
Referring again to Fig. 2, two one-dimensional precise translation stages 601,602 parallel arrangements, support are carried in the side of Optical grating base plate 5
Portion and both sides are provided with 3 face speculums 801,802,800.3 axle laser interferometer 7 send moves with substrate translation stage 601,602
The parallel measurement laser beam 901,902,900 in direction, can accurately measure out the relative initial bit of 3 face speculum 801,802,800
The displacement put.Jackshaft reading P0 as grating substrate 4 position readings, two paraxonic reading P1, P2 are used as grating substrate 4
Attitude reference.To eliminate the Abbe error of measurement, the measurement laser beam 901,902,900 and speculum of 3 axle laser interferometer 7
801st, 802,800 should be with grating substrate 4 in the plane of sustained height.
Because there is a difference in height in the positioned internal plane of grating substrate 4 and translation stage 6, the positional readings of translation stage 6 with
The actual position of grating substrate 4 is present, it is therefore desirable to the accurate measurement of grating substrate 4 is positioned with 3 axle laser interferometer 6., to accord with
Close Abbe's principle.
3 axle laser interferometer 7, measure laser beam 901,902,900, speculum 801,802,800 and monitor each instrument
Industrial computer (being not drawn into figure) the composition Monitoring and Controlling module of device equipment.Whole device should be fixed on the shock insulation platform of stabilization,
To cut down the influence that ambient vibration brings.
The method that big grating is manufactured using the device, is comprised the steps of：
1) grating substrate 4 to be exposed is placed on described Optical grating base 5, is fixed with compressing tablet, start described industrial computer 7
Program carry out following operation, described two substrate translation stages 601,602 drive described grating substrate 4 to be exposed to reach it
Mobile table top motion starting point, described Light Source Translation platform 2 drives described light source 1 to reach its movement table top motion starting point, initially
The 3 axle readings for changing 3 described axle laser interferometer 7 are zero, that is, set this position as measurement origin；
2) described light source 1 is opened, described Light Source Translation platform 5 drives described light source 1 from going to move table top motion
Point makees linear uniform motion to terminal, and the exposing light beam for sending described light source 1 is swept on described grating substrate 4 to be exposed
Straight line section is crossed, i.e., current location is exposed；
3) described light source 1 is closed, described Light Source Translation platform 2 drives described light source 1 to return to its movement table top and transports
Dynamic starting point；
4) screen periods for setting needs are t, if now exposed n times, next exposure position coordinate is T=(n
+ 1) * t, described two substrate translation stages 601,602 drive described grating substrate 4 to be exposed to move forward simultaneously, amount of movement
It is t；
5) after two substrate translation stages 601,602 described in come to a complete stop, described industrial computer 7 reads 3 described axle laser and does
The left and right two paraxonics survey measurements of interferometer 7 is respectively P1, P2, and axis reading is P0, calculate two described substrate translation stages 601,
The 602 adjustment distances that should be made respectively are：X1=T-P0+ (P2-P1)/2 and X2=T-P0+ (P1-P2)/2, two described in order
Substrate translation stage 601,602 difference relative current position movement X1, X2, advance on the occasion of representing, negative value represents retrogressing；
6) the 5th step is repeated, until the X1 for calculating, minimum moving step pitchs or pre- of the X2 less than substrate translation stage 601,602
If maximum tolerance, it is believed that now described grating substrate 4 to be exposed has arrived at target light exposure position T, and adjustment terminates；
7) when the exposure of described grating substrate 4 to be exposed is not completed, return to step 2), when described grating to be exposed
When substrate 4 has completed all exposures, into next step；
8) described grating substrate 4 to be exposed is taken out, grating is obtained after developing, dechromising, dry.
Using the stroke 100mm of PI Corp., the precision displacement table of minimum step 4nm as translation stage 6, Agilent company
The interferometer of resolution ratio 0.32nm establishes apparatus of the present invention as 3 axle laser interferometer 7, and experiment shows, has produced 50mm
Width, 100mm is long, cycle 562nm, the grating sample of fringe position precision ± 5nm.
Claims (3)
1. a kind of manufacture device of big grating, including light source mobile module, substrate mobile module and the part of Monitoring and Controlling module three,
It is characterized in that：
Described light source mobile module, including light source (1), Light Source Translation platform (2) and portal frame (3), described Light Source Translation platform
(2) it is one-dimensional long stroke translation stage, its base is fixed on described portal frame (3), described light source (1) is pacified by contiguous block
On the mobile table top of described Light Source Translation platform (2), described light source (1) projects downwards exposing light beam, when described light
When the mobile table top of source translation stage (2) moves along a straight line, described light source (1) is driven and moves along a straight line, while exposing light beam is drawn
Cross straight line；
Described substrate mobile module, including two substrate translation stages being placed in parallel (601,602), the gratings of a block length bar shaped
Pedestal (5) and grating substrate to be exposed (4), two described substrate translation stages (601,602) are all for one-dimensional long stroke is accurate flat
Moving stage, is installed in parallel under described portal frame (3), and the mobile table top of two described substrate translation stages (601,602) is distinguished
The two ends of the described Optical grating base (5) of support, two described directions of motion of the mobile table top of substrate translation stage (601,602)
The direction of motion with the mobile table top of described Light Source Translation platform (2) is vertical, described two substrate translation stages (601,602)
The movement of mobile table top is mobile by the Optical grating base (5) described in drive, and described grating substrate (4) to be exposed is placed on described
Optical grating base (5) on, fixed with compressing tablet；
Described Monitoring and Controlling module, including a set of 3 axle laser interferometer (7) and an industrial computer, 3 described axle laser interferences
Instrument (7) has 3 measurements mirror (801,802,800), and installed in the side of described Optical grating base (5), axis measures mirror (800) peace
At described Optical grating base (5) side edge mid-points, paraxonic measurement mirror (801,802) mount point is respectively aligned to two described bases
The axis of movement of piece translation stage (601,602), described 3 axle laser interferometer (7) three measurement laser beams (901,902,
900) 3 measurements mirror (801,802,800) are respectively aligned to, with described grating substrate (4) to be exposed in coplanar interior, institute
The 3 axle laser interferometer (7) stated accurately measure 3 displacements of measurement mirror (801,802,800) relative initial position, described
Industrial computer and 3 described axle laser interferometer (7), described Light Source Translation platform (2), two described substrate translation stages
(601,602), described light source (1) are connected, and their state is read and controlled by program.
2. the manufacture device of big grating according to claim 1, it is characterised in that：The exposure that described light source (1) sends
Light beam, including the point light beam that laser direct-writing device sends, or the light and shade bar produced in grating substrate plane using two-beam interference
Line, or the light dot matrix produced using Darman raster diffraction.
3. the method for manufacturing big grating using the manufacture device of the big grating described in claim 1, it is characterised in that comprising following
Step：
1) grating substrate (4) to be exposed is placed on described Optical grating base (5), is fixed with compressing tablet, start described industrial computer
(7) program carries out following operation：Two described substrate translation stages (601,602) drive described grating substrate to be exposed
(4) its movement table top motion starting point is reached, described Light Source Translation platform (2) drives described light source (1) to reach its movement table top
Motion starting point, 3 axle readings of 3 described axle laser interferometer (7) of initialization are zero, that is, set this position as measurement origin；
2) described light source (1) is opened, described Light Source Translation platform (2) drives described light source (1) from mobile table top motion
Point makees linear uniform motion to terminal, makes the exposing light beam that described light source (1) sends in described grating substrate (4) to be exposed
Upper inswept straight line section, i.e., exposed to current location；
3) described light source (1) is closed, described Light Source Translation platform (2) drives described light source (1) to return to its movement table top
Motion starting point；
4) screen periods for setting needs are t, if now exposed n times, next exposure position coordinate is T=(n+1)
T, two described substrate translation stages (601,602) are while drive described grating substrate (4) to be exposed forward movement, amount of movement
It is t；
5) after two substrate translation stages (601,602) described in are come to a complete stop, described industrial computer (7) reads 3 described axle laser and does
The left and right two paraxonics survey measurements of interferometer (7) is respectively P1, P2, and axis reading is P0, calculates two described substrate translation stages
The adjustment distance that (601,602) should be made respectively is：X1=T-P0+ (P2-P1)/2 and X2=T-P0+ (P1-P2)/2, order is described
Two substrate translation stages (601,602) relative current position movement X1, X2 respectively, advance on the occasion of representing, negative value represents retrogressing；
6) the 5th step is repeated, until the X1 for calculating, minimum moving step pitchs or default of the X2 less than substrate translation stage (601,602)
Maximum tolerance, it is believed that now described grating substrate (4) to be exposed has arrived at target light exposure position T, and adjustment terminates；
7) when the exposure of described grating substrate (4) to be exposed is not completed, return to step 2), when described to be exposed smooth grid base
When piece (4) has completed all exposures, into next step；
8) described grating substrate (4) to be exposed is taken out, grating is obtained after developing, dechromising, dry.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710019314.XA CN106772736B (en) | 2017-01-11 | 2017-01-11 | The manufacturing device and manufacturing method of large scale grating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710019314.XA CN106772736B (en) | 2017-01-11 | 2017-01-11 | The manufacturing device and manufacturing method of large scale grating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106772736A true CN106772736A (en) | 2017-05-31 |
| CN106772736B CN106772736B (en) | 2019-02-01 |
Family
ID=58947612
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710019314.XA Active CN106772736B (en) | 2017-01-11 | 2017-01-11 | The manufacturing device and manufacturing method of large scale grating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106772736B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111185678A (en) * | 2020-02-07 | 2020-05-22 | 吉林大学 | Method for preparing hollow structure on surface and inside of transparent material |
| CN112764145A (en) * | 2021-02-01 | 2021-05-07 | 西安交通大学 | Two-dimensional grating efficient manufacturing method based on time sequence control |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000147228A (en) * | 1998-11-05 | 2000-05-26 | Ricoh Co Ltd | Production of optical diffraction element |
| US20120038899A1 (en) * | 2010-08-13 | 2012-02-16 | Samsung Electronics Co., Ltd. | Exposure apparatus and alignment error compensation method using the same |
| CN102809892A (en) * | 2012-07-20 | 2012-12-05 | 顾金昌 | Moving, compressing and shading mechanism for digital stereo image processing and method thereof |
| CN105527796A (en) * | 2014-09-28 | 2016-04-27 | 上海微电子装备有限公司 | Gantry type device and control method |
| CN106226854A (en) * | 2016-09-21 | 2016-12-14 | 清华大学深圳研究生院 | A kind of producing device of holographic grating array |
-
2017
- 2017-01-11 CN CN201710019314.XA patent/CN106772736B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000147228A (en) * | 1998-11-05 | 2000-05-26 | Ricoh Co Ltd | Production of optical diffraction element |
| US20120038899A1 (en) * | 2010-08-13 | 2012-02-16 | Samsung Electronics Co., Ltd. | Exposure apparatus and alignment error compensation method using the same |
| CN102809892A (en) * | 2012-07-20 | 2012-12-05 | 顾金昌 | Moving, compressing and shading mechanism for digital stereo image processing and method thereof |
| CN105527796A (en) * | 2014-09-28 | 2016-04-27 | 上海微电子装备有限公司 | Gantry type device and control method |
| CN106226854A (en) * | 2016-09-21 | 2016-12-14 | 清华大学深圳研究生院 | A kind of producing device of holographic grating array |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111185678A (en) * | 2020-02-07 | 2020-05-22 | 吉林大学 | Method for preparing hollow structure on surface and inside of transparent material |
| CN111185678B (en) * | 2020-02-07 | 2021-07-27 | 吉林大学 | Method for preparing hollow structure on surface and inside of transparent material |
| CN112764145A (en) * | 2021-02-01 | 2021-05-07 | 西安交通大学 | Two-dimensional grating efficient manufacturing method based on time sequence control |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106772736B (en) | 2019-02-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Isheil et al. | Systematic error correction of a 3D laser scanning measurement device | |
| Alcock et al. | The Diamond-NOM: A non-contact profiler capable of characterizing optical figure error with sub-nanometre repeatability | |
| TW528881B (en) | Position measuring apparatus | |
| KR100898848B1 (en) | Method for a multiple exposure beams lithopraphy tool | |
| CN104614558B (en) | A kind of, line CCD combine atomic force probe scanning measurement system and measuring method | |
| CN106643550B (en) | Three-dimensional shape measuring device and method based on digital holographic scanning | |
| TW201303260A (en) | Method and device for non-contact measuring surfaces | |
| CN105157606A (en) | Non-contact type high-precision three-dimensional measurement method and measurement device for complex optical surface shapes | |
| CN109374259A (en) | Holographic grating period high precision online measuring and regulating device | |
| CN104515470B (en) | Holoscan exposes two-dimentional work bench displacement and deflection angle measurement light channel structure | |
| TW201423033A (en) | Shape measuring apparatus, structure manufacturing system, stage apparatus, shape measuring method, structure manufacturing method, program, and recording medium | |
| CN106772736B (en) | The manufacturing device and manufacturing method of large scale grating | |
| CN105547184B (en) | A kind of flatness error measuring device and its two-dimensional scanning workbench | |
| CN103884270B (en) | Measurement apparatus and the method for two dimension minute angle is produced when Circular gratings is installed | |
| JP4427632B2 (en) | High-precision 3D shape measuring device | |
| Fluegge et al. | Status of the nanometer comparator at PTB | |
| US20230278282A1 (en) | Compensating laser alignment for irregularities in an additive manufacturing machine powderbed | |
| CN108413872B (en) | Three-dimensional size precision measurement method based on Fabry-Perot multi-beam interference | |
| CN108413875A (en) | A kind of adjustable non-contact type high-precision length measuring system of scale | |
| CN107990839A (en) | The quick splicing detection device and measuring method of strip optical component surface shape | |
| Levin et al. | Metrological Support of Video Measuring Systems | |
| CN112857253A (en) | Surface three-dimensional shape measuring device for large-size wafer | |
| TWI448855B (en) | Actuating apparatus, actuating system and method for actuating a working stage to move relative to a platform with high-precision positioning capability | |
| Meli et al. | Calibration of a 2D reference mirror system of a photomask measuring instrument | |
| CN107588728A (en) | Precise grating displacement measurement system and method for scanning interferometer field exposure system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |