CN107588728A - Precise grating displacement measurement system and method for scanning interferometer field exposure system - Google Patents
Precise grating displacement measurement system and method for scanning interferometer field exposure system Download PDFInfo
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- CN107588728A CN107588728A CN201710734787.8A CN201710734787A CN107588728A CN 107588728 A CN107588728 A CN 107588728A CN 201710734787 A CN201710734787 A CN 201710734787A CN 107588728 A CN107588728 A CN 107588728A
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Abstract
The invention discloses a kind of precise grating displacement measurement system for scanning interferometer field exposure system, in scanning interferometer field, the front of exposure system and the back side introduce long stroke, high precision diffraction gratings displacement measurement system respectively, and the grating displacement measuring system includes：Two-frequency laser, diaphragm, reading head, the two-frequency laser, diaphragm, reading head are separately fixed at the positive and negative same position of laser fixed plate, the laser fixed plate is fixed on the bottom of marble platform, whether the emergent light that the diaphragm automatically controls two-frequency laser by control system enters reading head, and the reading head is integrated with optical element and receiver.The present invention is a kind of measuring system and method for solving measurement stroke increase and causing laser interferometer affected by environment more sensitive and causing measurement accuracy to decline, and reduces environmental Kuznets Curves cost, improves optical grating diffraction beam quality.
Description
Technical field
The present invention relates to large scale grating manufacturing field, the more particularly, to precise grating of scanning interferometer field exposure system
Displacement measurement system and method.
Background technology
Scanning interferometer field exposure technique is to make one of large scale, main path of high diffraction beam quality grating.It was both
The advantages of control of optical grating diffraction wavefront is easily realized with mechanical scribing techniques, but also with the low veiling glare of holographic exposure techniques, without ghost
The advantages of line and high producing efficiency, using interference fringe as " cutter ", use the scanning-stepping consistent with mechanical scribing techniques
Exposure mode, carry out large-area grating making.Because the interference field size for participating in exposure is small, it is easier to control optical grating diffraction ripple
Before, in combination with holographic exposure techniques, each scan exposure has thousands of interference fringes, compared with mechanical scribing techniques, light
The efficiency that grid make is significantly improved.Because scanning interferometer field exposure technique is static with exposure spot, workbench carries
Grating substrate realizes grating mask fabrication by the Exposure mode of scanning-stepping, and the interference fringe between the adjacent scan period exists
Realized in phase accurately splice it is most important, this just need precision workbench position measuring system.Operating position measurement system
Unite for the operating position for positioning carrying grating substrate, actually in order to obtain the phase of exposure area, workbench position
Put the making precision that measurement accuracy directly determines optical grating diffraction wavefront, be determine preparing grating success or failure the most key factor it
One, it is necessary to realize in nano level repeatability.
In the prior art, when making large scale grating, early stage is double because workbench is smaller along the displacement of step direction
Distance is shorter between frequency laser interferometer and measurement mirror, and influence of the external environment to optical maser wavelength is smaller, two-frequency laser interferometer
Measurement accuracy and repeatability be all easier to ensure.But as sports platform is done in the increase of step direction displacement, double-frequency laser
Interferometer will increase with measuring the distance between mirror, and disturbance of the external environment to two-frequency laser interferometer will increase, and cause double
Frequency laser interferometer measurement precision and measurement reproducibility decline, and cumulative errors will increase, if now environmental Kuznets Curves are not up to
To requiring, manufactured optical grating diffraction beam quality is deteriorated with the increase of step distance, causes environmental Kuznets Curves cost and skill
Art, optical grating diffraction beam quality etc. face problem.
Diffraction grating displacement measurement system uses high incisure density diffraction grating, coordinates high magnification numbe electronic fine-grained, is differentiating
Also scanning interferometer field exposure system sports platform step direction displacement measurement the required accuracy can be reached in rate and precision.Surveyed in displacement
During amount, the distance between reading head and measurement grating remain constant, and light path is symmetrical and light path is short, so extraneous ring
Influence of the border to wavelength will very little, and diffraction grating displacement measurement system is using grating pitch as measuring basis, and this is just more
Add the requirement relaxed to environment.But diffraction grating displacement measurement system range is restricted by measurement grating length, for
The scanning interferometer field exposure system of meter-sized grating is made, existing diffraction grating displacement measurement system can not be applied directly
Into scanning interferometer field exposure system step direction displacement measurement.
Therefore, how to provide a kind of solution measurement stroke increase causes laser interferometer affected by environment more sensitive and makes
The measuring method declined into measurement accuracy, reduces environmental Kuznets Curves cost, and it is people in the art to improve optical grating diffraction beam quality
Member's technical problem urgently to be resolved hurrily.
The content of the invention
An object of the present invention is to provide a kind of precise grating displacement measurement system for scanning interferometer field exposure system
System.
The second object of the present invention is to provide a kind of precise grating displacement measurement side for scanning interferometer field exposure system
Method.
One of to achieve these goals, technical scheme provided by the invention exposes to provide a kind of scanning interferometer field that is used for
The precise grating displacement measurement system of system, including：, in scanning interferometer field, the front of exposure system and the back side introduce long row respectively
Journey, high precision diffraction gratings displacement measurement system, the grating displacement measuring system include：Two-frequency laser, diaphragm, reading
Head, the two-frequency laser, diaphragm, reading head are separately fixed at the positive and negative same position of laser fixed plate, the laser
Device fixed plate is fixed on the bottom of fixed platform, and the emergent light that the diaphragm automatically controls two-frequency laser by control system is
No to enter reading head, the reading head is integrated with optical element and receiver.
Also include workbench, the workbench is fixed on the workbench below the grating displacement measuring system
Two measurement gratings, the measurement grating are that high-precision grating fixation is arranged by polylith grid and be fixed on along grating vector direction to lead
On rail.
In the scanning interferometer field exposure system front introduce grating displacement measuring system outgoing measuring beam than
It is more forward in the exposing light beam position of the scanning interferometer exposure system, so that the measuring beam of reading head outgoing can be with
Incide on the measurement grating；Equally, the grating displacement measuring system introduced at the scanning interferometer field exposure system back side
Outgoing measuring beam compared to the scanning interferometer exposure system exposing light beam position more rearward so that the reading head
The measuring beam of outgoing can be incided on the measurement grating.
To achieve these goals two, the technical scheme is that：Put forward one kind and be used for scanning interferometer field exposure system
Precise grating displacement measurement method, comprise the following steps：
Step 1：Exposure the incipient stage, workbench close to the front end optical system come out exposing light beam it is most left
End, now due to not measuring grating below the reading head of the laser fixed plate front and back, so system
The measurement mirror is coordinated to walk the workbench by the positive two-frequency laser interferometer of the laser fixed plate
Enter the displacement measurement in direction and scanning direction beat is measured；
Step 2：The workbench continues to do scanning motion and does step motion, and the workbench is transported along scanning is completed
When moving and starting to do step motion, just against the survey below the reading head of the laser fixed plate front and back
Measure grating, at this moment control system can open the diaphragm of the corresponding measurement grating reading head, the laser fixed plate front or
The emergent light of the two-frequency laser at the back side can enter the corresponding reading head, by the optics member inside the reading head
Part, forms two groups of measuring beams, and each group of measuring beam can be measured accurately to the step-wise displacement of the workbench；
Step 3：When the workbench, which completes step motion, starts to do scanning motion, front opening that control system is just closed
The diaphragm, the reading head at laser fixed plate front or the back side is stopped, at the end of motion to be scanned
One of them described diaphragm is then turned on, is so moved in circles, surveys the two-frequency laser interferometer and the precise grating displacement
Amount system, which cooperates, completes measurement.
Because the measurement grating is formed by polylith grating alignment, so the seam crossing of wherein two blocks gratings cannot get position
Shifting signal, alternately measured by two groups of measuring beams so that at least one group of measuring beam is work in whole range, real
The displacement measurement of long stroke is showed.
Compared with prior art, due in precise grating displacement measurement system of the present invention for scanning interferometer field exposure system
In system and method, diffraction grating displacement measurement system uses high incisure density diffraction grating, coordinates high magnification numbe electronic fine-grained, is dividing
Also scanning interferometer field exposure system sports platform step direction displacement measurement the required accuracy can be reached in resolution and precision.In displacement
In measurement process, the distance between reading head and measurement grating remain constant, and light path is symmetrical and light path is short, so extraneous
Influence of the environment to wavelength will very little, and diffraction grating displacement measurement system is using grating pitch as measuring basis, and this is just
More relax the requirement to environment.It is right but diffraction grating displacement measurement system range is restricted by measurement grating length
In the scanning interferometer field exposure system for making meter-sized grating, existing diffraction grating displacement measurement system can not be answered directly
Use in the exposure system step direction displacement measurement of scanning interferometer field, and the present invention can provide a kind of measurement stroke that solves and increase
The measuring system and method for causing laser interferometer affected by environment more sensitive and causing measurement accuracy to decline, reduce environment control
This is made, improves optical grating diffraction beam quality.
It will be become more fully apparent by following description and with reference to accompanying drawing, the present invention, these accompanying drawings are used to explain the present invention
Embodiment.
Brief description of the drawings
Fig. 1 is the schematic diagram of scanning interferometer field one angle of exposure system structure.
Fig. 2 is the schematic diagram of another angle of scanning interferometer field exposure system structure.
Fig. 3 is scanning interferometer field exposure system Working table structure schematic diagram.
Fig. 4 is regarding for an angle of the precise grating displacement measurement system that the present invention is used for scanning interferometer field exposure system
Figure.
Fig. 5 is second of the precise grating displacement measurement system for scanning interferometer field exposure system as shown in Figure 4
The view of angle.
Fig. 6 is the 3rd of the precise grating displacement measurement system for scanning interferometer field exposure system as shown in Figure 4
The view of angle.
Fig. 7 is the workbench of the precise grating displacement measurement system for scanning interferometer field exposure system as shown in Figure 4
Schematic diagram.
Fig. 8 is the signal of the step 1 for the precise grating displacement measurement method that the present invention is used for scanning interferometer field exposure system
Figure.
Fig. 9 is the signal of the step 2 for the precise grating displacement measurement method that the present invention is used for scanning interferometer field exposure system
Figure.
Embodiment
Embodiments of the invention are described with reference now to accompanying drawing, similar element numbers represent similar element in accompanying drawing.
In description of the invention accompanying drawing, direction is distinguished for convenience, and Figure of description 1~9 has marked three-dimensional coordinate.As described above,
As shown in Figure 1, Figure 2 and Figure 3, scanning interferometer field exposure system mainly includes：Fixed platform 1, optical system 2, front-end optical system
System 3, front end optical system fixed plate 4, grating substrate to be exposed 5, workbench 6, two-frequency laser interferometer 7, measurement mirror 8.Double frequency
The one side of 7 conjunction measuring mirror of laser interferometer 8 is measured and positioned along step direction (X-direction) to workbench 6, on the other hand
Also to measure workbench 6 along scanning direction (Y-direction) move when deflection angle.When making large scale grating, early stage is due to work
It is smaller to make displacement of the platform 6 along step direction (X-direction), distance is shorter between two-frequency laser interferometer 7 and measurement mirror 8, extraneous ring
Influence of the border to optical maser wavelength is smaller, and the measurement accuracy and repeatability of two-frequency laser interferometer 7 are all easier to ensure.
In one embodiment of the invention, fixed platform 1 is marble platform.
As shown in figure 4, introduce long stroke, high precision diffraction gratings displacement measurement in the front of scanning interferometer field exposure system
System, including：Two-frequency laser 10, diaphragm 11, reading head 12；It is as shown in figure 5, same at the back side of scanning interferometer field exposure system
Sample introduces long stroke, high precision diffraction gratings displacement measurement system, including：Two-frequency laser 13, diaphragm 14, reading head 15.Institute
State two-frequency laser 10 and two-frequency laser 13 is fixed on the positive and negative same position of laser fixed plate 9, the laser is consolidated
Fixed board 9 is fixed on the bottom of marble platform 1.The diaphragm 11, reading head 12, diaphragm 14, reading head 15 are fixed on front end light
On the tow sides of system fixed plate 4.The diaphragm 11 and diaphragm 14 can be automatically controlled by control system (not shown)
Whether the emergent light of two-frequency laser 10 and two-frequency laser 13 enters reading head 12 and reading head 15.The reading head 12 and reading
Optical element (not shown) and receiver (not shown) are integrated with several first 15.
Two measurement gratings 16 are fixed on workbench 6 as shown in Figure 7.The measurement grating 16 is along grating by polylith grid
Direction vector arranges and is fixed on high-precision grating and fixes in guide rail (not shown).As shown in fig. 6, expose system in scanning interferometer field
Exposing light beam position of the outgoing measuring beam for the grating displacement measuring system that system front introduces compared to scanning interferometer exposure system
Put it is more forward, ensure reading head 12 be emitted measuring beam can incide measurement grating 16 on.Equally, in scanning interferometer field
Exposure of the outgoing measuring beam for the grating displacement measuring system that the exposure system back side introduces compared to scanning interferometer exposure system
Light-beam position more rearward, ensures that the measuring beam that reading head 15 is emitted can be incided on measurement grating 16.
The present invention also puies forward a kind of precise grating displacement measurement method for scanning interferometer field exposure system, including following step
Suddenly：
Step 1：In the exposure incipient stage, relative position between workbench 6 and exposing light beam as shown in figure 8, now by
Grating is not measured in reading head 12 and the lower section of reading head 15, so system relies on the conjunction measuring mirror 8 of two-frequency laser interferometer 7
The displacement measurement of step direction (X-direction) is carried out to workbench 6 and scanning direction (Y-direction) beat is measured.
Step 2：Workbench 6 continues doing scanning motion along Y-axis, and step motion is done along X-axis.It is as shown in Figure 9 when stepping to
Position, and workbench 6 completes scanning motion and when starting to do step motion along Y-axis, under reading head 12 or reading head 15
Founder is good against grating 16 is measured, and at this moment control system (not shown) can open the diaphragm of corresponding measurement grating reading head, double frequency
The emergent light of the either two-frequency laser 13 of laser 10 can enter reading head 12 or reading head 15, by the light inside reading head
Element is learned, forms two groups of measuring beams, each group of measuring beam can be surveyed accurately to the step-wise displacement of workbench 6
Amount.Because measurement grating is formed by polylith grating alignment, so the seam crossing of wherein two blocks gratings cannot get displacement signal, lead to
Cross two groups of measuring beams alternately to measure, ensure that at least one group of measuring beam is work in whole range, this is just realized
The displacement measurement of long stroke.The displacement that the step-wise displacement and two-frequency laser interferometer 7 that grating displacement measuring system measures measure
Handled, coordinate other systems to complete closed-loop control.
Step 3：When workbench 6 completes step motion along X-direction to be started to do scanning motion along Y direction, control system
The diaphragm for the front opening that system (not shown) is just closed, makes reading head 12 or reading head 15 be stopped.At the end of motion to be scanned
It is then turned on one of diaphragm.
So move in circles, make two-frequency laser interferometer 7 and long stroke, high precision diffraction gratings displacement measurement system mutual
Coordinate, with reference to the advantages of two systems, mutually compensate for measurement data, ensure that the stepping when workbench step distance is long
Precision, improve systematic function.
The above disclosed right for being only the preferred embodiments of the present invention, the present invention can not being limited with this certainly
Scope, therefore the equivalent variations made according to scope of the present invention patent, still belong to the scope that the present invention is covered.
Claims (5)
1. a kind of precise grating displacement measurement system for scanning interferometer field exposure system, it is characterised in that in scanning interferometer
The front and the back side of field exposure system introduce long stroke, high precision diffraction gratings displacement measurement system, the pattern displacement respectively
Measuring system includes：Two-frequency laser, diaphragm, reading head, the two-frequency laser, diaphragm, reading head are separately fixed at sharp
The positive and negative same position of light device fixed plate, the laser fixed plate are fixed on the bottom of fixed platform, and the diaphragm passes through
Whether the emergent light that control system automatically controls two-frequency laser enters reading head, and the reading head is integrated with optical element and connect
Receive device.
2. precise grating displacement measurement system as claimed in claim 1, it is characterised in that also including workbench, the work
Platform fixes two measurement gratings below the grating displacement measuring system on the workbench, the measurement grating be by
Polylith grid arrange along grating vector direction and are fixed on high-precision grating and fix on guide rail.
3. precise grating displacement measurement system as claimed in claim 2, it is characterised in that expose system in the scanning interferometer field
Exposure light of the outgoing measuring beam for the grating displacement measuring system that system front introduces compared to the scanning interferometer exposure system
Beam position is more forward, so that the measuring beam of reading head outgoing can be incided on the measurement grating；Equally, in institute
The outgoing measuring beam for stating the grating displacement measuring system of scanning interferometer field exposure system back side introducing is dry compared to the scanning
Relate to the exposing light beam position of exposure system more rearward, so that the measuring beam of reading head outgoing can incide the survey
Measure on grating.
A kind of 4. side that precise grating displacement measurement is carried out by precise grating displacement measurement system as claimed in claim 3
Method, it is characterised in that comprise the following steps：
Step 1：In the exposure incipient stage, the high order end for the exposing light beam that workbench comes out close to the front end optical system, this
When due to the laser fixed plate front and back the reading head below not measurement grating, so system relies on institute
Stating the positive two-frequency laser interferometer of laser fixed plate coordinates the measurement mirror to carry out step direction to the workbench
Displacement measurement and to scanning direction beat measure；
Step 2：The workbench continues to do scanning motion and does step motion, and scanning motion is completed simultaneously in workbench edge
When starting to do step motion, just against the measurement light below the reading head of the laser fixed plate front and back
Grid, at this moment control system, which can be opened, corresponds to the diaphragm for measuring grating reading head, the laser fixed plate front or the back side
The emergent light of the two-frequency laser can enter the corresponding reading head, by the optical element inside the reading head,
Two groups of measuring beams are formed, each group of measuring beam can be measured accurately to the step-wise displacement of the workbench；
Step 3：When the workbench, which completes step motion, starts to do scanning motion, the institute for the front opening that control system is just closed
Diaphragm is stated, the reading head in the laser fixed plate front or the back side is stopped, is opened again at the end of motion to be scanned
One of them described diaphragm is opened, is so moved in circles, makes the two-frequency laser interferometer and the precise grating displacement measurement system
System, which cooperates, completes measurement.
5. method as claimed in claim 4, it is characterised in that because the measurement grating is formed by polylith grating alignment,
So the seam crossing of wherein two blocks gratings cannot get displacement signal, alternately measured by two groups of measuring beams so that entirely measuring
At least one group of measuring beam is work in journey, realizes the displacement measurement of long stroke.
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Cited By (1)
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| CN114812428A (en) * | 2021-01-21 | 2022-07-29 | 中国科学院上海光学精密机械研究所 | Plane surface shape sub-aperture splicing interference measurement device and measurement method |
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