CN107588728B - Precise grating displacement measurement system and method for scanning interferometer field exposure system - Google Patents
Precise grating displacement measurement system and method for scanning interferometer field exposure system Download PDFInfo
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- CN107588728B CN107588728B CN201710734787.8A CN201710734787A CN107588728B CN 107588728 B CN107588728 B CN 107588728B CN 201710734787 A CN201710734787 A CN 201710734787A CN 107588728 B CN107588728 B CN 107588728B
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Abstract
The invention discloses a kind of precise grating displacement measurement systems for scanning interferometer field exposure system, in scanning interferometer field, the front and the back side of exposure system introduce long stroke respectively, high precision diffraction gratings displacement measurement system, the grating displacement measuring system includes: two-frequency laser, diaphragm, reading head, the two-frequency laser, diaphragm, reading head is separately fixed at the front and back sides same position of laser fixed plate, the laser fixed plate is fixed on the bottom end of marble platform, whether the diaphragm enters reading head by the emergent light that control system automatically controls two-frequency laser, the reading head is integrated with optical element and receiver.The present invention is a kind of measuring system and method for solving measurement stroke increase and causing laser interferometer affected by environment more sensitive and measurement accuracy being caused to decline, and reduces environmental Kuznets Curves cost, improves optical grating diffraction beam quality.
Description
Technical field
The present invention relates to large scale grating manufacturing fields, the more particularly, to precise grating of scanning interferometer field exposure system
Displacement measurement system and method.
Background technique
Scanning interferometer field exposure technique is one of production large scale, the main path of high diffraction beam quality grating.It was both
Has the advantages that mechanical scribing techniques optical grating diffraction wavefront control easy to accomplish, but also with the low veiling glare of holographic exposure techniques, without ghost
Line and the high advantage of producing efficiency, using interference fringe as " cutter ", using with the consistent scanning-stepping of mechanical scribing techniques
Exposure mode carries out large-area grating production.Since the interference field size for participating in exposure is small, it is easier to control optical grating diffraction wave
Before, in combination with holographic exposure techniques, each scan exposure has thousands of interference fringes, compared with mechanical scribing techniques, light
The efficiency of grid production is significantly improved.Due to scanning interferometer field exposure technique be it is static with exposure spot, workbench carries
Grating substrate realizes that grating mask fabrication, the interference fringe between the adjacent scan period exist by scanning-stepping Exposure mode
It is realized in phase and accurately splices most important, this just needs accurate workbench position measuring system.Operating position measurement system
System is for positioning the operating position of carrying grating substrate, actually for the phase for obtaining exposure area, workbench position
Set the production precision that measurement accuracy directly determines optical grating diffraction wavefront, be determine preparing grating success or failure the most key factor it
One, it is necessary to realize in nanoscale repeatability.
In the prior art, when making large scale grating, early period is double since workbench is smaller along the displacement of step direction
Distance is shorter between frequency laser interferometer and measurement mirror, and influence of the external environment to optical maser wavelength is smaller, two-frequency laser interferometer
Measurement accuracy and repeatability be all easier to guarantee.But with the increase that sports platform is displaced in step direction, double-frequency laser is dry
The distance between interferometer and measurement mirror just will increase, and external environment just will increase the disturbance of two-frequency laser interferometer, cause double
Frequency laser interferometer measurement precision and measurement reproducibility decline, cumulative errors will increase, if environmental Kuznets Curves are not up at this time
To requirement, manufactured optical grating diffraction beam quality is deteriorated with the increase of step distance, leads to environmental Kuznets Curves cost and skill
Art, optical grating diffraction beam quality etc. face problem.
Diffraction grating displacement measurement system uses high incisure density diffraction grating, and cooperation high magnification numbe is electronic fine-grained, is differentiating
Also it can reach scanning interferometer field exposure system sports platform step direction displacement measurement the required accuracy in rate and precision.It is surveyed in displacement
During amount, the distance between reading head and measurement grating remain constant, and optical path is symmetrical and light path is short, ring extraneous in this way
Influence of the border to wavelength will very little, and diffraction grating displacement measurement system is using grating pitch as measuring basis, this is just more
Add the requirement relaxed to environment.But restriction of the diffraction grating displacement measurement system range by measurement grating length, for
The scanning interferometer field exposure system of meter-sized grating is made, existing diffraction grating displacement measurement system can not be applied directly
Into scanning interferometer field exposure system step direction displacement measurement.
Therefore, how to provide a kind of solution measurement stroke increase causes laser interferometer affected by environment more sensitive and makes
At the measurement method that measurement accuracy declines, environmental Kuznets Curves cost is reduced, improving optical grating diffraction beam quality is those skilled in the art
Member's technical problem urgently to be resolved.
Summary of the invention
An object of the present invention is to provide a kind of precise grating displacement measurement system for scanning interferometer field exposure system
System.
The second object of the present invention is to provide a kind of precise grating displacement measurement side for scanning interferometer field exposure system
Method.
One of to achieve the goals above, technical solution provided by the invention is to provide one kind to expose for scanning interferometer field
The precise grating displacement measurement system of system, comprising:, in scanning interferometer field, the front and the back side of exposure system introduce long row respectively
Journey, high precision diffraction gratings displacement measurement system, the grating displacement measuring system include: two-frequency laser, diaphragm, reading
Head, the two-frequency laser, diaphragm, reading head are separately fixed at the front and back sides same position of laser fixed plate, the laser
Device fixed plate is fixed on the bottom end of fixed platform, and the diaphragm is by the emergent light that control system automatically controls two-frequency laser
No to enter reading head, the reading head is integrated with optical element and receiver.
It further include workbench, the workbench is set to below the grating displacement measuring system, fixed on the workbench
Two measurement gratings, the measurement grating are that the fixation of high-precision grating is arranged by muti-piece grid and be fixed on along grating vector direction to lead
On rail.
The scanning interferometer field exposure system front introduce grating displacement measuring system outgoing measuring beam compared with
It is more forward in the exposing light beam position of the scanning interferometer exposure system, so that the measuring beam of reading head outgoing can be with
It is incident on the measurement grating；Equally, the grating displacement measuring system introduced at the scanning interferometer field exposure system back side
Outgoing measuring beam compared to the scanning interferometer exposure system exposing light beam position more rearward so that the reading head
The measuring beam of outgoing can be incident on the measurement grating.
To achieve the goals above two, the technical solution of the present invention is as follows: mentioning a kind of for scanning interferometer field exposure system
Precise grating displacement measurement method, include the following steps:
Step 1: exposure the incipient stage, workbench close to the front end optical system come out exposing light beam it is most left
End, at this time since there is no measurement gratings below the reading head of the laser fixed plate front and back, so system
The measurement mirror is cooperated to walk the workbench by the positive two-frequency laser interferometer of the laser fixed plate
It is measured into the displacement measurement in direction and to scanning direction beat；
Step 2: the workbench continues to do scanning motion and does step motion, and the workbench is transported along scanning is completed
When moving and starting to do step motion, just against the survey below the reading head of the laser fixed plate front and back
Measure grating, at this moment control system can open the diaphragm of the corresponding measurement grating reading head, the laser fixed plate front or
The emergent light of the two-frequency laser at the back side can enter the corresponding reading head, by the optics member inside the reading head
Part, forms two groups of measuring beams, each group of measuring beam can the step-wise displacement accurately to the workbench measure；
Step 3: when the workbench, which completes step motion, to be started to do scanning motion, front opening that control system is just closed
The diaphragm, so that the reading head at laser fixed plate front or the back side is stopped working, at the end of movement to be scanned
It is then turned on one of them described diaphragm, is looped back and forth like this, the two-frequency laser interferometer and the precise grating is displaced and surveys
Amount system, which cooperates, completes measurement.
Since the measurement grating is formed by muti-piece grating alignment, so wherein the seam crossing of two blocks of gratings cannot get position
Shifting signal is alternately measured by two groups of measuring beams, so that at least one group measuring beam is work in entire range, it is real
The displacement measurement of long stroke is showed.
Compared with prior art, due to the precise grating displacement measurement system in the present invention for scanning interferometer field exposure system
In system and method, diffraction grating displacement measurement system uses high incisure density diffraction grating, and cooperation high magnification numbe is electronic fine-grained, is dividing
Also it can reach scanning interferometer field exposure system sports platform step direction displacement measurement the required accuracy in resolution and precision.It is being displaced
In measurement process, the distance between reading head and measurement grating remain constant, and optical path is symmetrical and light path is short, extraneous in this way
Influence of the environment to wavelength will very little, and diffraction grating displacement measurement system is using grating pitch as measuring basis, this is just
More relax the requirement to environment.But restriction of the diffraction grating displacement measurement system range by measurement grating length, it is right
In the scanning interferometer field exposure system for making meter-sized grating, existing diffraction grating displacement measurement system can not be answered directly
It uses in the exposure system step direction displacement measurement of scanning interferometer field, and the present invention is capable of providing a kind of solution measurement stroke increase
Lead to the measuring system and method that laser interferometer is affected by environment more sensitive and measurement accuracy is caused to decline, reduces environment control
This is made, improves optical grating diffraction beam quality.
Through the following description and in conjunction with the attached drawings, the present invention will become more fully apparent, these attached drawings are used to explain the present invention
Embodiment.
Detailed description of the invention
Fig. 1 is the schematic diagram of one angle of scanning interferometer field exposure system structure.
Fig. 2 is the schematic diagram of another angle of scanning interferometer field exposure system structure.
Fig. 3 is scanning interferometer field exposure system Working table structure schematic diagram.
Fig. 4 is view of the present invention for an angle of the precise grating displacement measurement system of scanning interferometer field exposure system
Figure.
Fig. 5 is second of the precise grating displacement measurement system for scanning interferometer field exposure system as shown in Figure 4
The view of angle.
Fig. 6 is the third of the precise grating displacement measurement system for scanning interferometer field exposure system as shown in Figure 4
The view of angle.
Fig. 7 is the workbench of the precise grating displacement measurement system for scanning interferometer field exposure system as shown in Figure 4
Schematic diagram.
Fig. 8 is signal of the present invention for the step 1 of the precise grating displacement measurement method of scanning interferometer field exposure system
Figure.
Fig. 9 is signal of the present invention for the step 2 of the precise grating displacement measurement method of scanning interferometer field exposure system
Figure.
Specific embodiment
The embodiment of the present invention described referring now to the drawings, similar element numbers represent similar element in attached drawing.In
In description of the invention attached drawing, direction is distinguished for convenience, and Figure of description 1~9 has marked three-dimensional coordinate.As described above,
As shown in Figure 1, Figure 2 and Figure 3, scanning interferometer field exposure system specifically includes that fixed platform 1, optical system 2, front-end optical system
System 3, front end optical system fixed plate 4, grating substrate to be exposed 5, workbench 6, two-frequency laser interferometer 7, measurement mirror 8.Double frequency
7 conjunction measuring mirror of laser interferometer, 8 one side is measured and is positioned along step direction (X-direction) to workbench 6, on the other hand
Also to measure deflection angle of the workbench 6 along scanning direction (Y-direction) movement when.When making large scale grating, early period is due to work
It is smaller along the displacement of step direction (X-direction) to make platform 6, distance is shorter between two-frequency laser interferometer 7 and measurement mirror 8, extraneous ring
Influence of the border to optical maser wavelength is smaller, and the measurement accuracy and repeatability of two-frequency laser interferometer 7 are all easier to guarantee.
In one embodiment of the invention, fixed platform 1 is marble platform.
As shown in figure 4, the front in scanning interferometer field exposure system introduces long stroke, high precision diffraction gratings displacement measurement
System, comprising: two-frequency laser 10, diaphragm 11, reading head 12；As shown in figure 5, same at the back side of scanning interferometer field exposure system
Sample introduces long stroke, high precision diffraction gratings displacement measurement system, comprising: two-frequency laser 13, diaphragm 14, reading head 15.Institute
It states two-frequency laser 10 and two-frequency laser 13 is fixed on the front and back sides same position of laser fixed plate 9, the laser is solid
Fixed board 9 is fixed on the bottom end of marble platform 1.The diaphragm 11, reading head 12, diaphragm 14, reading head 15 are fixed on front end light
On the tow sides of system fixed plate 4.The diaphragm 11 and diaphragm 14 can be automatically controlled by control system (not shown)
Whether the emergent light of two-frequency laser 10 and two-frequency laser 13 enters reading head 12 and reading head 15.The reading head 12 and reading
Optical element (not shown) and receiver (not shown) are integrated in several 15.
Two measurement gratings 16 are fixed on workbench 6 as shown in Figure 7.The measurement grating 16 is by muti-piece grid along grating
Direction vector is arranged and is fixed in the fixed guide rail (not shown) of high-precision grating.As shown in fig. 6, exposing system in scanning interferometer field
Exposing light beam position of the outgoing measuring beam for the grating displacement measuring system that system front introduces compared to scanning interferometer exposure system
Set it is more forward, guarantee reading head 12 be emitted measuring beam can be incident on measurement grating 16 on.Equally, in scanning interferometer field
Exposure of the outgoing measuring beam for the grating displacement measuring system that the exposure system back side introduces compared to scanning interferometer exposure system
Light-beam position more rearward, guarantees that the measuring beam that reading head 15 is emitted can be incident on measurement grating 16.
The present invention also mentions a kind of precise grating displacement measurement method for scanning interferometer field exposure system, including walks as follows
It is rapid:
Step 1: in the exposure incipient stage, relative position between workbench 6 and exposing light beam as shown in figure 8, at this time by
In reading head 12 and 15 lower section of reading head, there is no measurement gratings, so system relies on 7 conjunction measuring mirror 8 of two-frequency laser interferometer
The displacement measurement of step direction (X-direction) is carried out to workbench 6 and scanning direction (Y-direction) beat is measured.
Step 2: the continuation of workbench 6 is doing scanning motion along Y-axis, does step motion along X-axis.It is as shown in Figure 9 when stepping to
Position, and workbench 6 along Y-axis completes scanning motion and when starting to do step motion, under reading head 12 or reading head 15
Founder is good against measurement grating 16, and at this moment control system (not shown) can open the diaphragm of corresponding measurement grating reading head, double frequency
The emergent light of laser 10 or two-frequency laser 13 can enter reading head 12 or reading head 15, by the light inside reading head
Learn element, form two groups of measuring beams, each group of measuring beam can the step-wise displacement accurately to workbench 6 survey
Amount.Since measurement grating is formed by muti-piece grating alignment, so wherein the seam crossing of two blocks of gratings cannot get displacement signal, lead to
It crosses two groups of measuring beams alternately to measure, ensure that at least one group measuring beam is work in entire range, this is just realized
The displacement measurement of long stroke.The displacement that the step-wise displacement and two-frequency laser interferometer 7 that grating displacement measuring system measures measure
It is handled, cooperation other systems complete closed-loop control.
Step 3: when workbench 6, which completes step motion along the x axis, to be started to do scanning motion along the y axis, control system
The diaphragm for the front opening that system (not shown) is just closed, makes reading head 12 or reading head 15 stop working.At the end of movement to be scanned
It is then turned on one of diaphragm.
It loops back and forth like this, keeps two-frequency laser interferometer 7 and long stroke, high precision diffraction gratings displacement measurement system mutual
Cooperation, in conjunction with the advantages of two systems, mutually compensates measurement data, ensure that the stepping when workbench step distance is too long
Precision improves system performance.
The above disclosure is only a preferred embodiment of the invention, cannot limit the right of the present invention with this certainly
Range, therefore according to equivalent variations made by scope of the present invention patent, it is still within the scope of the present invention.
Claims (5)
1. a kind of precise grating displacement measurement system for scanning interferometer field exposure system, which is characterized in that in scanning interferometer
The front and the back side of field exposure system introduce the grating displacement measuring system of long stroke, high-precision diffraction respectively；
The precise grating displacement measurement system includes: two two-frequency lasers, two diaphragms, two reading heads, the double frequency
Laser is separately fixed at the same position of the front and back sides of laser fixed plate, and the laser fixed plate is fixed on described sweep
Retouch the bottom end of the marble platform of interference field exposure system；
One of them described diaphragm and a reading head are fixed on the front-end optical system of scanning interferometer field exposure system
The front for fixed plate of uniting, another described diaphragm is corresponding with reading head described in another to be fixed on the front end optical system and fixes
The reverse side of plate；
Two measurement gratings are provided on the workbench of scanning interferometer field exposure system；
When carrying out pattern displacement measurement, the workbench does scanning motion along Y-axis, step motion is done along X-axis, when the work
When platform completes scanning motion and start to do step motion along Y-axis, at least one reading head aligned beneath measures grating；
The diaphragm that corresponding reading head is opened by control system, can be into the emergent light of the obverse two-frequency laser of the reading head
Enter the reading head, two beam measuring beams is formed, to measure by step-wise displacement of the measuring beam to workbench.
2. precise grating displacement measurement system as described in claim 1, which is characterized in that the workbench is set to the grating
Below displacement measurement system, the measurement grating is that high-precision grating is arranged by muti-piece grid and be fixed on along grating vector direction to consolidate
Determine on guide rail.
3. precise grating displacement measurement system as claimed in claim 2, which is characterized in that expose system in the scanning interferometer field
Exposure light of the outgoing measuring beam for the grating displacement measuring system that system front introduces compared to the scanning interferometer exposure system
Beam position is more forward, so that the measuring beam of reading head outgoing can be incident on the measurement grating；Equally, in institute
The outgoing measuring beam for stating the grating displacement measuring system of scanning interferometer field exposure system back side introducing is dry compared to the scanning
Relate to the exposing light beam position of exposure system more rearward, so that the measuring beam of reading head outgoing can be incident on the survey
It measures on grating.
4. a kind of side for carrying out precise grating displacement measurement by precise grating displacement measurement system as claimed in claim 3
Method, which comprises the steps of:
Step 1: in the exposure incipient stage, the left end for the exposing light beam that workbench comes out close to the front end optical system, this
When due to the laser fixed plate front and back the reading head below there is no measurement grating, so system rely on institute
The displacement that the positive two-frequency laser interferometer conjunction measuring mirror of laser fixed plate carries out step direction to the workbench is stated to survey
It measures and scanning direction beat is measured；
Step 2: the workbench continues to do scanning motion and does step motion, and scanning motion is completed simultaneously in workbench edge
When starting to do step motion, just against the measurement light below the reading head of the laser fixed plate front and back
Grid, at this moment control system can open the diaphragm of the corresponding measurement grating reading head, the laser fixed plate front or the back side
The emergent light of the two-frequency laser can enter the corresponding reading head, by the optical element inside the reading head,
Form two groups of measuring beams, each group of measuring beam can the step-wise displacement accurately to the workbench measure；
Step 3: when the workbench, which completes step motion, to be started to do scanning motion, the institute for the front opening that control system is just closed
Diaphragm is stated, so that the reading head at the laser fixed plate front or the back side is stopped working, is opened again at the end of movement to be scanned
One of them described diaphragm is opened, is looped back and forth like this, the two-frequency laser interferometer and precise grating displacement measurement system are made
System, which cooperates, completes measurement.
5. method as claimed in claim 4, which is characterized in that since the measurement grating is formed by muti-piece grating alignment,
So wherein the seam crossing of two blocks of gratings cannot get displacement signal, alternately measured by two groups of measuring beams, so that entirely measuring
At least one group measuring beam is work in journey, realizes the displacement measurement of long stroke.
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| CN114812428B (en) * | 2021-01-21 | 2023-09-01 | 中国科学院上海光学精密机械研究所 | Planar surface shape sub-aperture splicing interferometry device and measurement method |
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