TWI579089B - Laser processing device for glass substrates - Google Patents

Laser processing device for glass substrates Download PDF

Info

Publication number
TWI579089B
TWI579089B TW101136548A TW101136548A TWI579089B TW I579089 B TWI579089 B TW I579089B TW 101136548 A TW101136548 A TW 101136548A TW 101136548 A TW101136548 A TW 101136548A TW I579089 B TWI579089 B TW I579089B
Authority
TW
Taiwan
Prior art keywords
glass substrate
laser light
laser
cylindrical lens
irradiation
Prior art date
Application number
TW101136548A
Other languages
Chinese (zh)
Other versions
TW201315555A (en
Inventor
水村通伸
Original Assignee
V科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by V科技股份有限公司 filed Critical V科技股份有限公司
Publication of TW201315555A publication Critical patent/TW201315555A/en
Application granted granted Critical
Publication of TWI579089B publication Critical patent/TWI579089B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/073Shaping the laser spot
    • B23K26/0734Shaping the laser spot into an annular shape
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0648Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/0222Scoring using a focussed radiation beam, e.g. laser
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/033Apparatus for opening score lines in glass sheets
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/09Severing cooled glass by thermal shock
    • C03B33/091Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Laser Beam Processing (AREA)

Description

玻璃基板之雷射加工裝置 Laser processing device for glass substrate

本發明係關於一種切割表面強化玻璃基板的玻璃基板的雷射加工裝置,特別是關於一種適合用來在玻璃基板上形成環狀加工痕的玻璃基板的雷射加工裝置。 The present invention relates to a laser processing apparatus for cutting a glass substrate of a surface-strengthened glass substrate, and more particularly to a laser processing apparatus suitable for a glass substrate for forming an annular processing mark on a glass substrate.

在製造液晶顯示面板時,會在玻璃基板上反覆進行曝光以及顯影,形成由既定畫素以及電路所構成的圖案。此時,會在1片玻璃基板上,同時形成複數片面板的圖案,之後,將玻璃基板分割,藉此製造出各片面板。以往,該玻璃基板的分割,係利用以旋轉刃線狀研削切斷預定線的機械式切割加工來進行的(專利文獻1)。 When a liquid crystal display panel is manufactured, exposure and development are repeated on the glass substrate to form a pattern composed of a predetermined pixel and a circuit. At this time, a pattern of a plurality of panels is simultaneously formed on one glass substrate, and then the glass substrate is divided to manufacture each panel. Conventionally, the division of the glass substrate is performed by a mechanical cutting process in which a predetermined line is cut by a rotary blade line (Patent Document 1).

然而,在該機械式切割加工中,必須使切割刀以低速度沿著切斷預定線移動,每1片玻璃基板的處理時間都很長,故會有製造效率較差這樣的問題點存在。另外,也會有在切割步驟的途中玻璃基板容易破裂而良品率較低,且在利用旋轉刃進行切削時會產生切削屑等的問題點存在。尤其,當為表面強化玻璃時,上述問題點更為顯著。 However, in this mechanical cutting process, it is necessary to move the dicing blade along the line to cut at a low speed, and the processing time per one glass substrate is long, so that there is a problem that manufacturing efficiency is inferior. In addition, there is a problem in that the glass substrate is easily broken during the cutting step, and the yield is low, and chips are generated when cutting by the rotary blade. In particular, when the surface is tempered glass, the above problems are more remarkable.

因此,吾人提出一種例如以雷射加工在玻璃上形成加工痕的技術。亦即,在玻璃的表面或深度方向的內部以點狀或線狀集中雷射光,藉此對玻璃照射能量密度較高的雷射光,以沿玻璃的切斷預定線形成加工痕,然後沿著加工痕施加機械力,如是便可沿著切斷預定線輕易切斷玻璃。利用雷射光對玻璃基板的加工,比起機械式切割加工而言,除了能夠縮短製造時間之外,玻璃基板在加工途中也不易破裂,而且也不易產生切削屑,故特別適合用 於表面強化玻璃的加工。 Therefore, we have proposed a technique for forming a processing mark on a glass, for example, by laser processing. That is, the laser light is concentrated in a dot shape or a line shape on the surface of the glass or in the depth direction, thereby irradiating the glass with laser light having a high energy density to form a processing mark along a predetermined line of cutting of the glass, and then along the line. The machining marks exert a mechanical force, and if so, the glass can be easily cut along the line to be cut. The processing of the glass substrate by the laser light is particularly suitable for the mechanical cutting process, in addition to shortening the manufacturing time, the glass substrate is not easily broken during processing, and is also less prone to chipping. Processing of surface tempered glass.

例如,專利文獻2揭示一種在以YAG雷射振盪裝置對玻璃基板照射雷射光之後,用輪式切割器劃過玻璃基板表面之雷射光所照射的位置,藉此在例如夾層玻璃等產品的表面上形成裂縫的技術。 For example, Patent Document 2 discloses a position where a laser beam is irradiated onto a surface of a glass substrate by a wheel cutter after irradiating the glass substrate with a laser light by a YAG laser oscillating device, whereby a surface of a product such as laminated glass is used. A technique for forming cracks.

在專利文獻3中,則係使對玻璃照射之光束點的形狀具有30mm以上之最大尺寸的細長形狀,並使其在玻璃上以線狀掃描,藉此在玻璃的部分位置上產生裂縫。 In Patent Document 3, the shape of the beam spot irradiated to the glass has an elongated shape having the largest dimension of 30 mm or more, and is scanned in a line shape on the glass, whereby cracks are generated at partial positions of the glass.

專利文獻4揭示一種在雷射加工裝置中,為了使對玻璃等的切斷對象物的加工速度提高,以朝切斷對象物的厚度方向以及與厚度方向正交之方向延伸的方式形成1對線狀焦點,進而使玻璃等的切斷對象物的內部改質的技術。 In the laser processing apparatus, in order to improve the processing speed of the object to be cut, such as glass, a laser beam is formed so that it may extend in the thickness direction of the object to be cut and the direction orthogonal to the thickness direction. The technique of modifying the interior of the object to be cut, such as glass, by a linear focus.

習知技術文獻 Conventional technical literature 專利文獻 Patent literature

專利文獻1:日本特開2007-229831號公報 Patent Document 1: Japanese Laid-Open Patent Publication No. 2007-229831

專利文獻2:日本特開2005-104819號公報 Patent Document 2: Japanese Laid-Open Patent Publication No. 2005-104819

專利文獻3:日本特開2008-273837號公報 Patent Document 3: Japanese Laid-Open Patent Publication No. 2008-273837

專利文獻4:日本特開2008-36641號公報 Patent Document 4: Japanese Laid-Open Patent Publication No. 2008-36641

然而,專利文獻2至4的技術,均係在玻璃上沿著連續的線狀加工痕或線狀切斷預定線形成複數個點狀加工痕的技術。因此,當欲在玻璃基板形成無端點之封閉形狀的加工痕時,必須使雷射光沿著玻璃基板的切斷預定線連續掃描,或者使雷射光的照 射位置沿著切斷預定線移動並以雷射光照射複數次,故會有製造時間變長這樣的問題存在。 However, the techniques of Patent Documents 2 to 4 are techniques for forming a plurality of dot-shaped processing marks on a glass along a continuous linear processing mark or a linear cutting line. Therefore, when it is desired to form a processing mark of a closed shape having no end points on the glass substrate, it is necessary to continuously scan the laser light along the line to cut of the glass substrate, or to make a laser light. Since the shot position moves along the line to cut and is irradiated with laser light a plurality of times, there is a problem that the manufacturing time becomes long.

有鑑於上述問題點,本發明之目的在於提供一種玻璃基板的雷射加工裝置,其可輕易在玻璃基板上形成無端點之封閉形狀的加工痕,且可縮短玻璃基板的分割處理時間。 In view of the above problems, an object of the present invention is to provide a laser processing apparatus for a glass substrate which can easily form a processing mark having a closed shape without an end point on a glass substrate, and can shorten the division processing time of the glass substrate.

本發明之玻璃基板的雷射加工裝置,係在玻璃基板的無端點的封閉形狀的切斷預定線上集中雷射光,以在該玻璃基板上形成加工痕,其特徵為包含:雷射光源,其射出雷射光;環狀的圓柱透鏡,其使該雷射光源的雷射光對應並集中於該玻璃基板的該切斷預定線上;驅動裝置,其使該雷射光源的雷射光的照射區域,相對於該圓柱透鏡朝第1方向移動;以及控制裝置,其控制該雷射光源以及驅動裝置;從該雷射光源所射出之雷射光的照射區域,在與其光軸正交的面上,與該第1方向正交的第2方向上的寬度比該圓柱透鏡的該第2方向的寬度更大;該控制裝置,在利用該驅動裝置使該雷射光的照射區域相對於該圓柱透鏡朝該第1方向移動的過程中,使該雷射光源射出複數次雷射光。 A laser processing apparatus for a glass substrate according to the present invention is characterized in that laser light is concentrated on a predetermined line of cut of a closed shape of a glass substrate to form a processing mark on the glass substrate, and is characterized in that it includes a laser light source. Shooting laser light; an annular cylindrical lens that corresponds to and concentrates the laser light of the laser light source on the cutting target line of the glass substrate; and a driving device that makes the irradiation area of the laser light of the laser light source relatively The cylindrical lens moves in a first direction; and a control device controls the laser light source and the driving device; and an irradiation region of the laser light emitted from the laser light source on a surface orthogonal to the optical axis thereof The width in the second direction orthogonal to the first direction is larger than the width in the second direction of the cylindrical lens; and the control device causes the irradiation region of the laser light to face the cylindrical lens by the driving device In the process of moving in one direction, the laser light source is caused to emit a plurality of laser lights.

在上述的玻璃基板的雷射加工裝置中,例如該控制裝置,以該複數次雷射光所照射之該玻璃基板上的照射區域在該切斷預定線上一部分重疊的方式,控制該照射區域。此時,該控制裝置,以例如該複數次雷射光之照射在該切斷預定線上所投入之能量為固定的方式,控制該照射區域的重疊。 In the above-described laser processing apparatus for a glass substrate, for example, the control device controls the irradiation region such that the irradiation region on the glass substrate irradiated with the plurality of laser beams partially overlaps the planned cutting line. At this time, the control device controls the overlap of the irradiation regions such that the energy applied to the predetermined cutting line by the irradiation of the plurality of laser beams is fixed.

該圓柱透鏡,使該雷射光的焦點位置在該玻璃基板的厚度方向的內部,同時使焦點深度比該玻璃基板的厚度更短,其宜設定在該玻璃基板的厚度的1/100以下。藉此,便可在玻璃基板的內部形成雷射光照射的加工痕。因此,便可確實防止因為雷射光束 的照射而在表面上產生裂痕的情況。 In the cylindrical lens, the focal position of the laser light is placed inside the thickness direction of the glass substrate, and the depth of focus is made shorter than the thickness of the glass substrate, and it is preferably set to be 1/100 or less of the thickness of the glass substrate. Thereby, a processing mark of laser light irradiation can be formed inside the glass substrate. Therefore, it can be surely prevented because of the laser beam Irradiation and cracking on the surface.

另外,本發明之玻璃基板的雷射加工裝置,若應用於表面強化玻璃基板,將有所助益。表面強化玻璃基板,由於表面特性較硬,在使用切割刃的機械式切割中就不用說了,即使用雷射切割,當其焦點位置在玻璃基板的表面時,也會發生在加工中破裂的情況。在本發明中,由於雷射光的波長為250至400nm,且將圓柱透鏡所致之雷射光的焦點位置,設定在該表面強化玻璃基板的厚度方向的內部,亦即比該表面強化玻璃基板的表面強化層更深的位置,故即使是表面強化玻璃基板,亦可防止其在加工中破裂。 Further, the laser processing apparatus for a glass substrate of the present invention is useful when applied to a surface-strengthened glass substrate. Surface-strengthened glass substrates, due to the hard surface characteristics, needless to say in the mechanical cutting using the cutting edge, that is, using laser cutting, when the focus position is on the surface of the glass substrate, it will also break during processing. Happening. In the present invention, since the wavelength of the laser light is 250 to 400 nm, and the focal position of the laser light by the cylindrical lens is set inside the thickness direction of the surface strengthened glass substrate, that is, the surface of the surface strengthened glass substrate The surface strengthening layer is deeper, so even if it is a surface-strengthened glass substrate, it can be prevented from being broken during processing.

本發明之玻璃基板的雷射加工裝置,具備可使雷射光源的雷射光對應並集中於玻璃基板的切斷預定線的環狀圓柱透鏡,並利用移動裝置,使對圓柱透鏡的雷射光的照射區域在第1方向上移動。雷射光源所射出之雷射光的照射區域,在與其光軸正交的面上,與第1方向正交的第2方向上的寬度比圓柱透鏡的第2方向的寬度更大,控制裝置,在利用驅動裝置使雷射光的照射區域相對於圓柱透鏡在第1方向上移動的過程中,使雷射光源的雷射光射出複數次。藉此,隨著對圓柱透鏡的雷射光的照射區域的移動,便可對應玻璃基板的無端點的封閉形狀的切斷預定線在玻璃基板上逐漸形成線狀的加工痕,並藉由複數次的雷射光的照射,將該線狀的加工痕連接,形成無端點的封閉形狀。因此,根據本發明,比起以雷射光沿著玻璃基板的環狀的切斷預定線照射的情況,更可縮短加工痕的形成時間,進而縮短玻璃基板的分割處理時間。 The laser processing apparatus of the glass substrate of the present invention includes a ring-shaped cylindrical lens that can correspond to the laser light of the laser light source and concentrates on the line to cut of the glass substrate, and uses the moving device to make the laser light to the cylindrical lens. The irradiation area moves in the first direction. The irradiation region of the laser light emitted from the laser light source has a width in the second direction orthogonal to the first direction on the surface orthogonal to the optical axis, and a width in the second direction of the cylindrical lens is larger than the width of the cylindrical lens. In the process of moving the irradiation region of the laser light in the first direction with respect to the cylindrical lens by the driving device, the laser light of the laser light source is emitted a plurality of times. Thereby, with the movement of the irradiation region of the laser light of the cylindrical lens, a linear processing mark can be gradually formed on the glass substrate in accordance with the planned cutting line of the closed shape of the endless end of the glass substrate, and by a plurality of times The irradiation of the laser light connects the linear processing marks to form a closed shape without end points. Therefore, according to the present invention, it is possible to shorten the formation time of the processing marks and to shorten the division processing time of the glass substrate, compared to the case where the laser light is irradiated along the annular cutting line of the glass substrate.

另外,在本發明中,由於控制裝置在利用驅動裝置使雷射光的照射區域相對於圓柱透鏡在第1方向上移動的過程中,使雷射光源射出雷射光複數次,故不需要可對圓柱透鏡的整體照射雷射光的大型雷射光源,而且,在為了使圓柱透鏡對應玻璃基板的切 斷預定線的形狀而更換其他圓柱透鏡的情況下,也不需要更換雷射光源。 Further, in the present invention, since the control device causes the laser light source to emit the laser light in the process of moving the irradiation region of the laser light in the first direction with respect to the cylindrical lens by the driving device, the cylindrical column is not required. a large laser light source that illuminates the laser light as a whole, and in order to make the cylindrical lens correspond to the glass substrate In the case where the shape of the predetermined line is broken and another cylindrical lens is replaced, it is not necessary to replace the laser light source.

以下,參照所附圖式具體說明本發明的實施態樣。圖1(a)係表示在本發明實施態樣之雷射加工裝置中的雷射光照射區域與玻璃基板上所形成之加工痕的俯視圖,圖1(b)係表示同上之立體圖,亦即圓柱透鏡的剖面形狀圖,圖2係表示在本發明實施態樣之雷射加工裝置中的圓柱透鏡的立體圖,圖3係表示本發明實施態樣之玻璃基板的雷射加工裝置的立體圖。如圖3所示的,在平台1上,載置著作為被加工物的曝光顯影處理後的表面強化玻璃基板等的玻璃基板2。相對於該平台1,橫跨該平台1的寬度方向的全部區域的門型的移動構件3,以可在箭號a方向上往復移動的方式受到支持。然後,在該移動構件3上,以可在平台1的寬度方向(箭號b方向)上往復移動的方式,設置了支持部4,該支持部4支持著脈衝雷射振盪器6。在玻璃基板2的上方,配置了以環狀方式設置的圓柱透鏡7,將脈衝雷射振盪器6的脈衝雷射光5,以對準玻璃基板2的切斷預定線的方式集中。 Hereinafter, embodiments of the present invention will be specifically described with reference to the accompanying drawings. 1(a) is a plan view showing a laser light irradiation region and a processing mark formed on a glass substrate in a laser processing apparatus according to an embodiment of the present invention, and FIG. 1(b) is a perspective view showing the same as above, that is, a cylinder. Fig. 2 is a perspective view showing a cylindrical lens in a laser processing apparatus according to an embodiment of the present invention, and Fig. 3 is a perspective view showing a laser processing apparatus for a glass substrate according to an embodiment of the present invention. As shown in FIG. 3, on the stage 1, a glass substrate 2 such as a surface-strengthened glass substrate after exposure and development processing of a workpiece is placed. With respect to the stage 1, the gate-shaped moving member 3 spanning the entire area in the width direction of the stage 1 is supported so as to be reciprocable in the direction of the arrow a. Then, on the moving member 3, a support portion 4 is supported so as to be reciprocable in the width direction of the stage 1 (arrow direction b), and the support portion 4 supports the pulse laser oscillator 6. A cylindrical lens 7 provided in a ring shape is disposed above the glass substrate 2, and the pulsed laser light 5 of the pulsed laser oscillator 6 is concentrated so as to be aligned with the planned cutting line of the glass substrate 2.

在該雷射加工裝置中,於平台1上載置表面強化玻璃基板等的玻璃基板2,移動構件3在箭號a方向上移動,同時從脈衝雷射振盪器6間歇性射出脈衝雷射光5,被圓柱透鏡7集中的脈衝雷射光5照射到玻璃基板2上。如圖1(a)所示的,該脈衝雷射光5的照射區域,在與該光軸正交的平面上的形狀為例如矩形,且在方向b上的寬度W5被調整成比在同一方向b上的圓柱透鏡7的寬度W7更大。然後,雷射光5的照射區域,以在方向b上涵蓋圓柱透鏡7的方式進行調整。藉此,便可對玻璃基板2在切斷預定線上以線狀照射雷射光5。此時,可在移動構件3移動的期間,從脈衝雷射振盪器6射出雷射光5,亦可在移動構件3移動之後而暫時 停止的狀態下,從脈衝雷射振盪器6射出雷射光5。玻璃基板2的上方所配置的圓柱透鏡7,可更換成不同之焦點距離者。藉此,便可因應加工對象的玻璃基板2的表面特性等選擇焦點深度最適當的圓柱透鏡7來進行雷射加工。 In the laser processing apparatus, the glass substrate 2 such as a surface-strengthened glass substrate is placed on the stage 1, and the moving member 3 is moved in the direction of the arrow a, and the pulsed laser light 5 is intermittently emitted from the pulsed laser oscillator 6, The pulsed laser light 5 concentrated by the cylindrical lens 7 is irradiated onto the glass substrate 2. As shown in Fig. 1(a), the irradiation region of the pulsed laser light 5 has a shape such as a rectangle on a plane orthogonal to the optical axis, and the width W 5 in the direction b is adjusted to be the same. The width W 7 of the cylindrical lens 7 in the direction b is larger. Then, the irradiation area of the laser light 5 is adjusted so as to cover the cylindrical lens 7 in the direction b. Thereby, the laser light 5 can be irradiated to the glass substrate 2 in a line shape on the line to cut. At this time, the laser light 5 may be emitted from the pulse laser oscillator 6 while the moving member 3 is moving, or may be emitted from the pulse laser oscillator 6 in a state where the moving member 3 is temporarily stopped after the movement of the moving member 3. . The cylindrical lens 7 disposed above the glass substrate 2 can be replaced with a different focal length. Thereby, the cylindrical lens 7 having the most appropriate depth of focus can be selected in accordance with the surface characteristics of the glass substrate 2 to be processed, and the laser processing can be performed.

又,圓柱透鏡7亦可更換成對應切斷預定線之形狀者。如圖1以及圖2所示的,在玻璃基板2的上方所配置的圓柱透鏡7,係具有朝上方平均凸出之剖面形狀的環狀透鏡,無論在哪一個剖面當中,其下方的焦點距離均為固定。因此,就圓柱透鏡7而言,連接其焦點的線,會形成與環狀圓柱透鏡7相似的環狀。在本發明中,係選用切斷預定線的形狀與圓柱透鏡7的環狀焦點形狀相同的圓柱透鏡7。在本實施態樣中,對應圓形的切斷預定線,圓柱透鏡7使用其焦點形狀為圓形者,並以其中心軸與脈衝雷射光5的光軸平行的方式配置。該圓柱透鏡7將脈衝雷射振盪器6所射出之脈衝雷射光5集中於玻璃基板2上。該脈衝雷射光5,例如波長為250~400nm,藉由圓柱透鏡7,其焦點位置在玻璃基板2的厚度方向的內部,焦點深度設定成比該玻璃基板的厚度更短,宜設定在玻璃基板2的厚度的1/100以下的範圍內。 Further, the cylindrical lens 7 may be replaced with a shape corresponding to the planned cutting line. As shown in FIG. 1 and FIG. 2, the cylindrical lens 7 disposed above the glass substrate 2 has an annular lens having a cross-sectional shape that is uniformly convex upward, and the focal distance below it is in any cross section. Both are fixed. Therefore, in the case of the cylindrical lens 7, the line connecting the focal points thereof forms a ring shape similar to that of the annular cylindrical lens 7. In the present invention, the cylindrical lens 7 having the same shape as the annular focus of the cylindrical lens 7 is selected. In the present embodiment, the cylindrical lens 7 is arranged such that its focal point shape is a circle corresponding to a circular cutting line, and its central axis is arranged in parallel with the optical axis of the pulsed laser light 5. The cylindrical lens 7 concentrates the pulsed laser light 5 emitted from the pulsed laser oscillator 6 on the glass substrate 2. The pulsed laser light 5 has a wavelength of, for example, 250 to 400 nm, and the focal position of the cylindrical lens 7 is in the thickness direction of the glass substrate 2, and the depth of focus is set to be shorter than the thickness of the glass substrate, and is preferably set on the glass substrate. 2 is less than 1/100 of the thickness.

雷射光5,如圖1(a)中的矩形細線所示的,以在方向b上涵蓋圓柱透鏡7的方式照射。脈衝雷射振盪器(雷射光源)6的雷射光5的照射時序以及移動構件3的移動距離以及移動的時序,由控制裝置(圖中未顯示)所控制。 The laser light 5, as shown by the thin rectangular line in Fig. 1(a), is irradiated in such a manner as to cover the cylindrical lens 7 in the direction b. The irradiation timing of the laser light 5 of the pulsed laser oscillator (laser light source) 6, the moving distance of the moving member 3, and the timing of the movement are controlled by a control device (not shown).

脈衝雷射光5的波長,例如為250~400nm。圖5,横軸為波長,縱軸為雷射光的透光率,顯示出表面強化玻璃的透光特性。當使用波長為532nm的雷射光時,對玻璃基板的透光率較高,亦即,玻璃基板的能量吸收率較差,不易在玻璃基板上形成加工痕。相對於此,在水銀燈的i線(波長365nm)附近,能量的吸收開始,進入可形成加工痕的狀態。另外,藉由使用波長為266nm的雷射 光,便可獲得極高的能量吸收率。因此,在本發明中,係於250~400nm的波長範圍內,在玻璃基板上形成加工痕。 The wavelength of the pulsed laser light 5 is, for example, 250 to 400 nm. In Fig. 5, the horizontal axis represents the wavelength, and the vertical axis represents the light transmittance of the laser light, which shows the light transmission characteristics of the surface strengthened glass. When laser light having a wavelength of 532 nm is used, the light transmittance to the glass substrate is high, that is, the energy absorption rate of the glass substrate is poor, and it is difficult to form a processing mark on the glass substrate. On the other hand, in the vicinity of the i-line (wavelength 365 nm) of the mercury lamp, absorption of energy starts, and a state in which a process mark can be formed is entered. In addition, by using a laser with a wavelength of 266 nm Light, you can get a very high energy absorption rate. Therefore, in the present invention, processing marks are formed on the glass substrate in the wavelength range of 250 to 400 nm.

在本實施態樣中,控制裝置,以複數次的雷射光5的照射在玻璃基板2上的照射區域於切斷預定線上一部分重疊的方式,控制雷射光5的照射區域。例如,控制裝置,以對圓柱透鏡7的雷射光5的照射區域與之前的雷射光5的照射區域的一部分重疊的方式,從雷射光源6射出雷射光。因此,雷射光5,對應在圓柱透鏡7上的照射區域於玻璃基板2的圓形的切斷預定線上集中,而逐漸在玻璃基板2上形成加工痕20(20a、20b),藉由複數次的雷射光5的照射,將該線狀的加工痕20連接並形成圓形。 In the present embodiment, the control device controls the irradiation region of the laser light 5 so that the irradiation region on the glass substrate 2 is partially overlapped on the cutting planned line by the irradiation of the plurality of laser beams 5. For example, the control device emits the laser light from the laser light source 6 so that the irradiation region of the laser light 5 of the cylindrical lens 7 overlaps with a portion of the irradiation region of the previous laser light 5. Therefore, the laser light 5 is concentrated on the circular cutting line of the glass substrate 2 corresponding to the irradiation area on the cylindrical lens 7, and the processing marks 20 (20a, 20b) are gradually formed on the glass substrate 2 by a plurality of times. The irradiation of the laser light 5 connects the linear processing marks 20 to form a circular shape.

在本實施態樣中,由於射出在與光軸正交之面上的形狀為矩形的雷射光5,如圖1(a)所示的,對圓柱透鏡7的雷射光5的照射區域,在與圓柱透鏡7的中心軸正交的面上,於從中心軸往半徑方向觀察時,產生在圓柱透鏡7中的全部受到照射的區域5a與在圓柱透鏡7中的一部分受到照射的區域5b。因此,對玻璃基板2所投入之雷射光的能量,在區域5a比在區域5b更大,因此,對應區域5a而在玻璃基板2上所形成之加工痕20a與對應區域5b而在玻璃基板2上所形成之加工痕20b,在玻璃基板2的變質程度上產生差異。控制裝置,以例如複數次的雷射光5的照射在切斷預定線上所投入之能量為固定的方式,控制在玻璃基板2上的照射區域的重疊。藉此,便可消除該玻璃基板2的變質程度的差異。另外,所謂該雷射光5的照射所投入之能量,意指在玻璃基板2上所投入之熱量。 In the present embodiment, since the laser light 5 having a rectangular shape on the surface orthogonal to the optical axis is emitted, as shown in FIG. 1(a), the irradiation region of the laser light 5 to the cylindrical lens 7 is On the surface orthogonal to the central axis of the cylindrical lens 7, when viewed from the central axis in the radial direction, all of the irradiated region 5a in the cylindrical lens 7 and a portion 5b in which a part of the cylindrical lens 7 is irradiated are generated. Therefore, the energy of the laser light input to the glass substrate 2 is larger in the region 5a than in the region 5b, and therefore, the processing mark 20a and the corresponding region 5b formed on the glass substrate 2 corresponding to the region 5a are on the glass substrate 2 The processing marks 20b formed thereon have a difference in the degree of deterioration of the glass substrate 2. The control device controls the overlap of the irradiation regions on the glass substrate 2 such that the energy applied to the cutting line by irradiation of the plurality of laser beams 5 is fixed. Thereby, the difference in the degree of deterioration of the glass substrate 2 can be eliminated. In addition, the energy input by the irradiation of the laser light 5 means the amount of heat input on the glass substrate 2.

接著,就本實施態樣的動作,與控制裝置的控制態樣一併進行說明。控制裝置,首先,如圖3所示的,對在玻璃基板2的切斷預定線上所配置之圓柱透鏡7,藉由移動構件3,使脈衝雷射振盪器6移動並配置於圓柱透鏡7的在方向a上的一端側的上方, 並使脈衝雷射振盪器6以矩形光束形狀射出之雷射光5照射到玻璃基板2上。藉此,如圖4(a)所示的,利用該雷射光5的照射,在玻璃基板2上,形成線狀的加工痕20(20a、20b)。此時,對應雷射光照射區域5b而在玻璃基板2上所投入之能量,比對應區域5a而在玻璃基板2上所投入之能量更小。因此,對應區域5b而在玻璃基板2上所形成之加工痕20b,比起對應區域5a所形成之加工痕20a而言,其玻璃基板2的變質程度較小。 Next, the operation of this embodiment will be described together with the control aspect of the control device. In the control device, first, as shown in FIG. 3, the cylindrical laser lens 7 disposed on the line to cut of the glass substrate 2 is moved by the moving member 3, and the pulse laser oscillator 6 is moved and disposed on the cylindrical lens 7. Above the one end side in the direction a, The laser light 5 emitted from the pulse laser oscillator 6 in a rectangular beam shape is irradiated onto the glass substrate 2. Thereby, as shown in FIG. 4(a), linear processing marks 20 (20a, 20b) are formed on the glass substrate 2 by the irradiation of the laser light 5. At this time, the energy input to the glass substrate 2 corresponding to the laser light irradiation region 5b is smaller than the energy input to the glass substrate 2 in the corresponding region 5a. Therefore, the processing mark 20b formed on the glass substrate 2 in the corresponding region 5b has a smaller degree of deterioration of the glass substrate 2 than the processing mark 20a formed in the corresponding region 5a.

之後,控制裝置,使脈衝雷射振盪器6在箭號a方向上相對於玻璃基板2以及圓柱透鏡7移動,如圖4(b)所示的,以對圓柱透鏡7的雷射光5的照射區域與第1次的雷射光5的照射區域的一部分重疊的方式,進行第2次的雷射光5的照射。此時,控制裝置,以對在例如第1次的雷射光5的照射並未投入最大能量的圖4(a)中的區域5b投入最大能量的方式,控制對圓柱透鏡7的雷射光5的照射區域的重疊。藉此,在玻璃基板2上的已形成加工痕20b的部分也形成與圖4(a)相同的加工痕20a。然後,藉由第2次的雷射光5的照射,對第1次照射的加工痕20a連續地形成線狀的加工痕20(20a、20b)。如是,藉由控制對圓柱透鏡7的雷射光5的照射區域的重疊,便可使切斷預定線上的投入能量固定,並形成變質程度均等的加工痕20a。 Thereafter, the control device moves the pulsed laser oscillator 6 relative to the glass substrate 2 and the cylindrical lens 7 in the direction of the arrow a, as shown in FIG. 4(b), and irradiates the laser light 5 to the cylindrical lens 7. The second laser light 5 is irradiated so that the region overlaps with a part of the irradiation region of the first laser light 5 . At this time, the control device controls the laser light 5 to the cylindrical lens 7 so that the maximum energy is input to the region 5b in FIG. 4(a) in which the maximum energy is not applied to the irradiation of the first laser light 5, for example. The overlap of the illuminated areas. Thereby, the same processing mark 20a as that of FIG. 4(a) is also formed on the portion of the glass substrate 2 on which the processing mark 20b has been formed. Then, by the irradiation of the second laser light 5, the linear processing marks 20 (20a, 20b) are continuously formed on the processing marks 20a of the first irradiation. By controlling the overlapping of the irradiation areas of the laser light 5 to the cylindrical lens 7, the input energy on the line to cut can be fixed, and the processing marks 20a having the same degree of deterioration can be formed.

之後,控制裝置,同樣地,使脈衝雷射振盪器6在箭號a方向上相對玻璃基板2以及圓柱透鏡7移動,以對圓柱透鏡7的雷射光5的照射區域與第2次的雷射光5的照射區域的一部分重疊的方式,進行第3次的雷射光5的照射[圖4(c)]。藉此,對第1次照射以及第2次照射的加工痕20a連續地形成線狀的加工痕20(20a、20b),藉由第4次的雷射光5的照射,如圖4(d)所示的,將線狀的加工痕20(20a、20b)連接,形成無端點的封閉形狀的圓形加工痕20a。 Thereafter, the control device similarly moves the pulsed laser oscillator 6 with respect to the glass substrate 2 and the cylindrical lens 7 in the direction of the arrow a to irradiate the area of the laser light 5 of the cylindrical lens 7 with the second laser light. The third irradiation light 5 is irradiated so that a part of the irradiation area of 5 overlaps (Fig. 4(c)). Thereby, the linear processing marks 20 (20a, 20b) are continuously formed on the processing marks 20a of the first irradiation and the second irradiation, and the irradiation of the fourth laser light 5 is performed as shown in Fig. 4(d). As shown, the linear processing marks 20 (20a, 20b) are joined to form a circular shaped mark 20a of a closed shape having no end points.

在雷射光5的1次照射中,對圓柱透鏡7的雷射光5的照射區域,在與圓柱透鏡7的中心軸正交的面上,當從中心軸往半徑方向觀察時,產生在圓柱透鏡7中的全部受到照射的區域5a與在圓柱透鏡7中的一部分受到照射的區域5b,由於在玻璃基板2上集中的雷射光5的能量密度的差異,加工痕20a與加工痕20b也會在玻璃基板2的變質程度上產生差異。然而,藉由控制裝置,以對圓柱透鏡7的雷射光5的照射區域與之前的雷射光5的照射區域的一部分重疊的方式,從脈衝雷射振盪器(雷射光源)6射出雷射光,藉此便可將該玻璃基板2的變質程度的差異消除。此時,控制裝置宜以複數次的雷射光5的照射在切斷預定線上所投入的能量為固定的方式,控制在玻璃基板2上的照射區域的重疊,使玻璃基板2上所形成之加工痕20的整體的變質程度均等。加工痕20形成之後,例如,可用手施加彎曲應力,將玻璃基板2沿著圓形的切斷預定線折斷。 In the primary irradiation of the laser light 5, the irradiation region of the laser light 5 to the cylindrical lens 7 is generated on the surface orthogonal to the central axis of the cylindrical lens 7 when viewed from the central axis in the radial direction. In the region 5a where all of the irradiated regions 7 and the portion 5b irradiated in the cylindrical lens 7 are irradiated, the processing marks 20a and the processing marks 20b are also present due to the difference in energy density of the laser light 5 concentrated on the glass substrate 2. The degree of deterioration of the glass substrate 2 is different. However, by the control device, the laser beam is emitted from the pulsed laser oscillator (laser light source) 6 so that the irradiation region of the laser light 5 of the cylindrical lens 7 overlaps with a portion of the irradiation region of the previous laser light 5, Thereby, the difference in the degree of deterioration of the glass substrate 2 can be eliminated. In this case, it is preferable that the control device controls the processing of the glass substrate 2 by superimposing the overlapping of the irradiation regions on the glass substrate 2 so that the energy applied to the cutting line by the irradiation of the plurality of laser beams 5 is fixed. The overall deterioration of the mark 20 is equal. After the formation of the processing mark 20, for example, the bending stress can be applied by hand to break the glass substrate 2 along a circular cutting line.

在本實施態樣中,像這樣,藉由複數次的雷射光5的照射,便可形成與切斷預定線的無端點的封閉形狀相同的加工痕20,比起使雷射光5沿著玻璃基板2的環狀的切斷預定線照射的習知雷射加工方法,環狀的加工痕20的形成時間較短,故可縮短玻璃基板2的分割處理時間。 In the present embodiment, as described above, by the irradiation of the plurality of laser beams 5, the same processing mark 20 as that of the endless cut line of the cut line can be formed, and the laser light 5 can be made along the glass. In the conventional laser processing method in which the annular cutting line of the substrate 2 is irradiated, the formation time of the annular processing mark 20 is short, so that the division processing time of the glass substrate 2 can be shortened.

另外,由於將雷射光5分成複數次照射玻璃基板,故不需要可對圓柱透鏡7的整體照射雷射光5的大型脈衝雷射振盪器(雷射光源)6。 Further, since the laser light 5 is divided into a plurality of irradiation glass substrates, a large-sized pulsed laser oscillator (laser light source) 6 that can irradiate the entire cylindrical lens 7 with the laser light 5 is not required.

例如,當使用波長為532nm的雷射光5,將脈衝寬度設為約7nsec,並將照射能量密度設為25J/cm2,而對表面強化玻璃基板2的內部照射雷射光5時,玻璃基板2上會產生裂縫,玻璃基板整體會被分割得亂七八糟。相對於此,當使用波長為355nm的雷射光5,將脈衝寬度設為約7nsec,並將照射能量密度設為10J/cm2, 而對表面強化玻璃基板5的內部照射雷射光5時,便可在玻璃基板2的內部形成加工痕20,此時若對玻璃基板2用手施加彎曲應力,便可根據該加工痕20漂亮地沿著圓形的切斷線折斷。 For example, when laser light 5 having a wavelength of 532 nm is used, the pulse width is set to about 7 nsec, and the irradiation energy density is set to 25 J/cm 2 , and the inside of the surface strengthened glass substrate 2 is irradiated with the laser light 5, the glass substrate 2 is used. Cracks will occur on the top, and the glass substrate as a whole will be divided into a mess. On the other hand, when the laser light 5 having a wavelength of 355 nm is used, the pulse width is set to about 7 nsec, and the irradiation energy density is set to 10 J/cm 2 , and when the inside of the surface strengthened glass substrate 5 is irradiated with the laser light 5, The processing mark 20 can be formed inside the glass substrate 2. In this case, when the bending stress is applied to the glass substrate 2 by hand, the processing mark 20 can be beautifully broken along the circular cutting line.

另外,雷射光5的焦點位置雖亦可在玻璃基板的表面,然而若使該雷射光5的焦點位置在玻璃基板2的內部,便可確實防止玻璃基板2產生裂痕。亦即,將雷射光5的焦點位置,設定在玻璃基板2的厚度方向的內部,並將焦點深度設定成比玻璃基板2的厚度更短,宜設定在玻璃基板2的厚度的1/100以下,藉此,即使是表面強化玻璃基板,也能避開其表面的改質部,而將雷射光5的能量集中於其內部。當玻璃基板2為表面強化玻璃基板時,若雷射光5的焦點位置不在玻璃基板2的內部,而係於表面強化玻璃基板的表面的改質部集中雷射能量,則容易在玻璃基板2上產生雜亂的裂縫,使分割情況變得亂七八糟。另外,當該雷射光5的焦點深度在玻璃基板2的厚度以上時,雷射光5會到達玻璃基板2的背面,玻璃基板2會破裂。因此,雷射光5的焦點深度應比玻璃基板2的厚度更短,宜在玻璃基板2的厚度的1/100以下的範圍內。 Further, the focal position of the laser light 5 may be on the surface of the glass substrate. However, if the focus position of the laser light 5 is inside the glass substrate 2, it is possible to surely prevent the glass substrate 2 from being cracked. In other words, the focus position of the laser light 5 is set inside the thickness direction of the glass substrate 2, and the depth of focus is set to be shorter than the thickness of the glass substrate 2, and is preferably set to be less than 1/100 of the thickness of the glass substrate 2. Thereby, even if it is a surface-strengthened glass substrate, the reforming part of the surface can be avoided, and the energy of the laser beam 5 can be concentrated in the inside. When the glass substrate 2 is a surface-strengthened glass substrate, if the focus position of the laser light 5 is not inside the glass substrate 2, and the laser beam is concentrated in the modified portion of the surface of the surface-strengthened glass substrate, it is easy to be on the glass substrate 2. There are cluttered cracks that make the splitting situation messy. Further, when the depth of focus of the laser light 5 is equal to or greater than the thickness of the glass substrate 2, the laser light 5 reaches the back surface of the glass substrate 2, and the glass substrate 2 is broken. Therefore, the depth of focus of the laser light 5 should be shorter than the thickness of the glass substrate 2, and it is preferably within a range of 1/100 or less of the thickness of the glass substrate 2.

另外,雷射光5的光束形狀,不限於上述實施態樣的矩形,亦可使用例如圓形以及橢圓形等各種形狀。 Further, the shape of the light beam of the laser light 5 is not limited to the rectangular shape of the above-described embodiment, and various shapes such as a circular shape and an elliptical shape may be used.

另外,在本實施態樣中,係就對應圓形的切斷預定線而圓柱透鏡7使用焦點形狀為圓形者之態樣進行說明,惟圓柱透鏡7只要是環狀亦可使用其他形狀者。例如亦可使用平面形狀為橢圓形或矩形的圓柱透鏡。 Further, in the present embodiment, the cylindrical lens 7 is described as being in a circular shape, and the cylindrical lens 7 is in a circular shape. . For example, a cylindrical lens whose plane shape is elliptical or rectangular may also be used.

再者,在本實施態樣中,係針對藉由雷射光5的4次照射形成無端點的封閉形狀的加工痕20a的態樣進行說明,惟雷射光5的照射數,亦可為例如2次或3次,亦可為5次以上。 Further, in the present embodiment, a description will be given of an aspect in which the processing mark 20a having a closed shape having no end point is formed by four irradiations of the laser light 5, but the number of irradiation of the laser light 5 may be, for example, 2 After three or three times, it may be five or more times.

[產業上的可利用性] [Industrial availability]

本發明,較易在玻璃基板上形成無端點的封閉形狀的加工痕,可縮短玻璃基板的分割處理時間,故在液晶顯示面板的製造步驟等中,對玻璃基板的分割技術具有偌大之貢獻。 According to the present invention, it is easy to form a processing mark having a closed shape without an end point on the glass substrate, and the division processing time of the glass substrate can be shortened. Therefore, in the manufacturing steps of the liquid crystal display panel and the like, the glass substrate division technique is greatly contributed.

1‧‧‧平台 1‧‧‧ platform

2‧‧‧玻璃基板 2‧‧‧ glass substrate

20、20a、20b‧‧‧加工痕 20, 20a, 20b‧‧‧ processing marks

3‧‧‧移動構件 3‧‧‧Mobile components

4‧‧‧支持部 4‧‧‧Support Department

5‧‧‧(脈衝)雷射光 5‧‧‧(pulse) laser light

5a、5b‧‧‧區域 5a, 5b‧‧‧ area

6‧‧‧脈衝雷射振盪器(雷射光源) 6‧‧‧Pulse laser oscillator (laser source)

7‧‧‧圓柱透鏡 7‧‧‧Cylindrical lens

W5、W7‧‧‧寬度 W 5 , W 7 ‧ ‧ width

a、b‧‧‧方向 a, b‧‧‧ directions

[圖1](a)係表示在本發明實施態樣之玻璃基板的雷射加工裝置中,雷射光的照射區域與在玻璃基板上所形成之加工痕的俯視圖,(b)係同上之立體圖,其顯示出圓柱透鏡的剖面形狀。 Fig. 1 (a) is a plan view showing a laser beam irradiation apparatus in a laser processing apparatus according to an embodiment of the present invention, and a processing pattern formed on a glass substrate, and (b) is a perspective view of the same. It shows the cross-sectional shape of the cylindrical lens.

[圖2]係表示在本發明實施態樣之玻璃基板的雷射加工裝置中的圓柱透鏡的立體圖。 Fig. 2 is a perspective view showing a cylindrical lens in a laser processing apparatus for a glass substrate according to an embodiment of the present invention.

[圖3]係表示本發明實施態樣之玻璃基板的雷射加工裝置的立體圖。 Fig. 3 is a perspective view showing a laser processing apparatus for a glass substrate according to an embodiment of the present invention.

[圖4](a)至(d)係表示在本發明實施態樣之玻璃基板的雷射加工裝置中,隨著雷射光的照射區域的移動而在玻璃基板上逐漸形成加工痕的時序圖。 [Fig. 4] (a) to (d) show a timing chart in which a processing mark is gradually formed on a glass substrate in accordance with the movement of the irradiation region of the laser light in the laser processing apparatus of the glass substrate according to the embodiment of the present invention. .

[圖5]係表示表面強化玻璃基板的透光特性圖。 Fig. 5 is a view showing a light transmission characteristic of a surface-strengthened glass substrate.

2‧‧‧玻璃基板 2‧‧‧ glass substrate

20a、20b‧‧‧加工痕 20a, 20b‧‧‧ processing marks

5‧‧‧(脈衝)雷射光 5‧‧‧(pulse) laser light

5a、5b‧‧‧區域 5a, 5b‧‧‧ area

6‧‧‧脈衝雷射振盪器(雷射光源) 6‧‧‧Pulse laser oscillator (laser source)

7‧‧‧圓柱透鏡 7‧‧‧Cylindrical lens

W5、W7‧‧‧寬度 W 5 , W 7 ‧ ‧ width

a、b‧‧‧方向 a, b‧‧‧ directions

Claims (5)

一種玻璃基板的雷射加工裝置,其在玻璃基板的無端點的封閉形狀的切斷預定線上集中雷射光,以在該玻璃基板上形成加工痕,其特徵為包含:雷射光源,其射出雷射光;環狀的圓柱透鏡,其使該雷射光源的雷射光對應並集中於該玻璃基板的該切斷預定線上;驅動裝置,其使該雷射光源的雷射光的照射區域相對於該圓柱透鏡在第1方向上移動;以及控制裝置,其控制該雷射光源以及驅動裝置;該雷射光源所射出之雷射光的照射區域,在與其光軸正交的面上,與該第1方向正交的第2方向的寬度比該圓柱透鏡的該第2方向的寬度更大;該控制裝置,在利用該驅動裝置使該雷射光的照射區域相對於該圓柱透鏡在該第1方向上移動的過程中,使該雷射光源射出複數次雷射光。 A laser processing apparatus for a glass substrate, which concentrates laser light on a cut-off line of a closed shape of a glass substrate having no end points to form a processing mark on the glass substrate, and is characterized by comprising: a laser light source that emits a lightning An annular cylindrical lens that corresponds to and concentrates laser light of the laser light source on the cutting line of the glass substrate; and a driving device that causes an irradiation area of the laser light of the laser light source to be opposite to the cylinder The lens moves in the first direction; and a control device controls the laser light source and the driving device; the irradiation region of the laser light emitted by the laser light source is on a surface orthogonal to the optical axis thereof, and the first direction The width of the orthogonal second direction is larger than the width of the cylindrical lens in the second direction; the control device moves the irradiation region of the laser light in the first direction with respect to the cylindrical lens by the driving device In the process, the laser source is caused to emit a plurality of laser lights. 如申請專利範圍第1項之玻璃基板的雷射加工裝置,其中,該控制裝置,以該複數次雷射光照射在該玻璃基板上的照射區域於該切斷預定線上一部分重疊的方式,控制該照射區域。 The laser processing apparatus for a glass substrate according to the first aspect of the invention, wherein the control device controls the irradiation region on the glass substrate by the plurality of laser light to partially overlap the planned cutting line Irradiation area. 如申請專利範圍第2項之玻璃基板的雷射加工裝置,其中,該控制裝置,以該複數次雷射光照射在該切斷預定線上的投入能量為一定的方式,控制該照射區域的重疊。 A laser processing apparatus for a glass substrate according to claim 2, wherein the control device controls the overlap of the irradiation regions such that the input energy of the plurality of laser beams irradiated on the cutting planned line is constant. 如申請專利範圍第1至3項中任一項之玻璃基板的雷射加工裝置,其中,該圓柱透鏡,使該雷射光的焦點位置在該玻璃基板的厚度方向的內部,同時將焦點深度設定成比該玻璃基板的厚度更短。 A laser processing apparatus for a glass substrate according to any one of claims 1 to 3, wherein the cylindrical lens has a focus position of the laser light in a thickness direction of the glass substrate while setting a depth of focus It is shorter than the thickness of the glass substrate. 如申請專利範圍第4項之玻璃基板的雷射加工裝置,其中,該玻璃基板,係表面強化玻璃基板,該圓柱透鏡,使該雷射光的焦點位置設定在該表面強化玻璃基板的厚度方向的內部,且比該表面強化玻璃基板的表面強化層更深的位置。 A laser processing apparatus for a glass substrate according to claim 4, wherein the glass substrate is a surface-strengthened glass substrate, and the cylindrical lens has a focus position of the laser light set in a thickness direction of the surface-strengthened glass substrate The inside is deeper than the surface strengthening layer of the surface-strengthened glass substrate.
TW101136548A 2011-10-07 2012-10-03 Laser processing device for glass substrates TWI579089B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011223442A JP5923765B2 (en) 2011-10-07 2011-10-07 Laser processing equipment for glass substrates

Publications (2)

Publication Number Publication Date
TW201315555A TW201315555A (en) 2013-04-16
TWI579089B true TWI579089B (en) 2017-04-21

Family

ID=48043586

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101136548A TWI579089B (en) 2011-10-07 2012-10-03 Laser processing device for glass substrates

Country Status (5)

Country Link
JP (1) JP5923765B2 (en)
KR (1) KR101884966B1 (en)
CN (1) CN103842305B (en)
TW (1) TWI579089B (en)
WO (1) WO2013051424A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11022747B2 (en) 2016-12-08 2021-06-01 Corelase Oy Laser processing apparatus and method
JP7119094B2 (en) 2017-12-29 2022-08-16 コアレイズ オーワイ Laser processing apparatus and method

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05305472A (en) * 1992-04-30 1993-11-19 Sumitomo Electric Ind Ltd Laser beam machine
CN1550283A (en) * 2003-04-24 2004-12-01 肖特・格拉斯 Method for removing edge coated on substrate and coating said substrate, and the substrate thereof
CN1665637A (en) * 2002-08-28 2005-09-07 詹诺普蒂克自动化技术有限公司 Beam formation unit comprising two axicon lenses, and device comprising one such beam formation unit for introducing radiation energy into a workpiece consisting of a weakly-absorbent material
CN1781645A (en) * 2004-12-01 2006-06-07 发那科株式会社 Laser processing device
CN101047111A (en) * 2006-03-27 2007-10-03 激光先进技术股份公司 Laser annealing apparatus
US7825350B2 (en) * 2000-09-13 2010-11-02 Hamamatsu Photonics K.K. Laser processing method and laser processing apparatus
JP2011121107A (en) * 2009-12-14 2011-06-23 Koike Sanso Kogyo Co Ltd Laser cutting device

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3632955A (en) * 1967-08-31 1972-01-04 Western Electric Co Simultaneous multiple lead bonding
DE2821883C2 (en) * 1978-05-19 1980-07-17 Ibm Deutschland Gmbh, 7000 Stuttgart Device for material processing
JPS58154484A (en) * 1981-11-16 1983-09-13 Hitachi Ltd Method for converting laser beam
JP5081086B2 (en) 1995-06-26 2012-11-21 コーニング インコーポレイテッド Plane glass sheet manufacturing method and glass substrate dividing method
JP2005104819A (en) 2003-09-10 2005-04-21 Nippon Sheet Glass Co Ltd Method and apparatus for cutting laminated glass
JP4247495B2 (en) * 2005-02-18 2009-04-02 坂口電熱株式会社 Laser heating device
JP2007229831A (en) 2006-02-28 2007-09-13 Epson Toyocom Corp Cutting method by dicing blade
JP2008036641A (en) 2006-08-01 2008-02-21 Laser System:Kk Laser beam machining apparatus and method
JP2009259860A (en) * 2008-04-11 2009-11-05 Sumitomo Heavy Ind Ltd Laser processing device, and laser processing method
US8035901B2 (en) * 2008-04-30 2011-10-11 Corning Incorporated Laser scoring with curved trajectory
JP5358216B2 (en) * 2009-02-23 2013-12-04 小池酸素工業株式会社 Laser cutting device
JP6002942B2 (en) * 2011-05-11 2016-10-05 株式会社ブイ・テクノロジー Lens and laser processing apparatus equipped with the lens

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05305472A (en) * 1992-04-30 1993-11-19 Sumitomo Electric Ind Ltd Laser beam machine
US7825350B2 (en) * 2000-09-13 2010-11-02 Hamamatsu Photonics K.K. Laser processing method and laser processing apparatus
CN1665637A (en) * 2002-08-28 2005-09-07 詹诺普蒂克自动化技术有限公司 Beam formation unit comprising two axicon lenses, and device comprising one such beam formation unit for introducing radiation energy into a workpiece consisting of a weakly-absorbent material
CN1550283A (en) * 2003-04-24 2004-12-01 肖特・格拉斯 Method for removing edge coated on substrate and coating said substrate, and the substrate thereof
CN1781645A (en) * 2004-12-01 2006-06-07 发那科株式会社 Laser processing device
CN101047111A (en) * 2006-03-27 2007-10-03 激光先进技术股份公司 Laser annealing apparatus
JP2011121107A (en) * 2009-12-14 2011-06-23 Koike Sanso Kogyo Co Ltd Laser cutting device

Also Published As

Publication number Publication date
WO2013051424A1 (en) 2013-04-11
CN103842305A (en) 2014-06-04
KR20140075765A (en) 2014-06-19
KR101884966B1 (en) 2018-08-02
JP5923765B2 (en) 2016-05-25
CN103842305B (en) 2016-08-17
TW201315555A (en) 2013-04-16
JP2013082580A (en) 2013-05-09

Similar Documents

Publication Publication Date Title
JP6059059B2 (en) Laser processing method
JP5597051B2 (en) Laser processing method
JP5917677B1 (en) Processing method of SiC material
US20150179523A1 (en) Laser lift off systems and methods
US9669613B2 (en) Laser lift off systems and methods that overlap irradiation zones to provide multiple pulses of laser irradiation per location at an interface between layers to be separated
KR20120098869A (en) Laser machining and scribing systems and methods
TWI469841B (en) Method and apparatus for machining workpieces using tilted laser scanning
JP6902186B2 (en) How to cut the material to be processed
JP2012028452A (en) Laser processing method
TW201706221A (en) Method of processing laminated substrate and apparatus for processing laminated substrate with laser light
JP6050002B2 (en) Laser processing method
TWI579089B (en) Laser processing device for glass substrates
JP5760251B2 (en) Laser processing equipment for glass substrates
JP2013082589A (en) Laser processing apparatus for glass substrate
JP2012240107A (en) Laser processing method
JP2006248075A (en) Method and apparatus for working substrate using laser beam
JP6810951B2 (en) Laser processing method and laser processing equipment for brittle material substrates
JP5618373B2 (en) Laser processing equipment for glass substrates
JP5285741B2 (en) Semiconductor wafer and processing method thereof
JP2013147380A (en) Method for laser beam machining
JP6944703B2 (en) Method for forming a modified layer of a brittle material substrate
KR102353478B1 (en) Method and apparatus for laser processing substrate of brittle material
JP2008000782A (en) Process stage, and laser beam machining apparatus having the same
KR20150127844A (en) Substrate cutting apparatus and method
TW202128581A (en) Processing method and processing device of substrate

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees