TWI575095B - Substrate processing apparatus and film forming apparatus - Google Patents

Substrate processing apparatus and film forming apparatus Download PDF

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TWI575095B
TWI575095B TW103132600A TW103132600A TWI575095B TW I575095 B TWI575095 B TW I575095B TW 103132600 A TW103132600 A TW 103132600A TW 103132600 A TW103132600 A TW 103132600A TW I575095 B TWI575095 B TW I575095B
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shaft portion
swing
swing arm
rigid body
film forming
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TW103132600A
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TW201516170A (en
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大野哲宏
月川慶澄
立川晋輔
新井進
武井応樹
磯部辰徳
清田淳也
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愛發科股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568Transferring the substrates through a series of coating stations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32798Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32908Utilities
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411Constructional aspects of the reactor
    • H01J37/3414Targets
    • H01J37/342Hollow targets
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411Constructional aspects of the reactor
    • H01J37/3435Target holders (includes backing plates and endblocks)
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411Constructional aspects of the reactor
    • H01J37/3444Associated circuits

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Description

基板處理裝置及成膜裝置 Substrate processing device and film forming device

本發明係關於一種對基板實施處理的基板處理裝置,以及在基板上形成薄膜的成膜裝置。 The present invention relates to a substrate processing apparatus that performs processing on a substrate, and a film forming apparatus that forms a thin film on the substrate.

作為於基板上形成薄膜的濺鍍裝置,例如專利文獻一所記載,使包含靶材的陰極,在基板上相對的一對的邊上,從一邊往另一邊移動的濺鍍裝置,已為人所知。該濺鍍裝置中,陰極一邊移動一邊對基板放出濺鍍粒子。 As a sputtering apparatus for forming a thin film on a substrate, for example, as described in Patent Document 1, a sputtering apparatus including a target and a sputtering device that moves from one side to the other on a pair of opposite sides of the substrate has been used. Known. In the sputtering apparatus, the sputtering particles are emitted to the substrate while the cathode moves.

【先前技術文獻】[Previous Technical Literature] 【專利文獻】[Patent Literature]

【專利文獻1】國際公開第2010/044257號說明書 [Patent Document 1] International Publication No. 2010/044257

此外,濺鍍裝置具有連接線,該連接線包含對靶材供給電源的電源線以及對靶材表面供給濺鍍氣體之配管等。在上述的濺鍍裝置中,每當陰極移動時,連接線僅以陰極移動的距離,從配置有陰極之腔室的外側向內被拉入,或從腔室內向外被拉出。接著,每當陰極移動時,因為連接線被拉扯,或是連接線與引導連接線的構件磨擦,故連接線反覆承受機 械性的負載。 Further, the sputtering apparatus has a connection line including a power supply line for supplying power to the target, a pipe for supplying a sputtering gas to the surface of the target, and the like. In the above sputtering apparatus, each time the cathode moves, the connecting line is pulled in from the outside of the chamber in which the cathode is disposed, or is pulled out from the inside of the chamber only by the distance at which the cathode moves. Then, whenever the cathode moves, because the connecting wire is pulled, or the connecting wire and the member of the guiding connecting wire are rubbed, the connecting wire is repeatedly covered by the machine. Mechanical load.

此外,不僅是濺鍍裝置等成膜裝置,只要係使處理基板的處理部在與基板互相面對的空間中移動的基板處理裝置,則上述的事項大致上相同。 Further, the above-described matters are substantially the same as long as the film forming apparatus such as a sputtering apparatus is a substrate processing apparatus that moves the processing unit of the processing substrate in a space facing the substrate.

本發明之技術,其目的在於提供一種基板處理裝置,其能減少因連接於處理基板之處理部的連接線,因在框體內部與框體外部之間進出所承受的機械性負載;本發明並提供一種成膜裝置。 An object of the present invention is to provide a substrate processing apparatus capable of reducing a mechanical load that is received and received between a frame body and a frame body by a connection line connected to a processing portion of a processing substrate; A film forming device is also provided.

本發明之技術中的基板處理裝置,其一態樣包含框體以及位於該框體內部的中空擺動手臂。該擺動手臂,包含連接於該框體的中空擺動中心軸部以及作為擺動端的中空的連結軸部。又,基板處理裝置具備處理部,其位於該框體的內部,並在與基板相對的處理空間中,與該擺動中心軸部之軸向垂直的方向上移動,以對該基板實施處理。該處理部,以可追隨該處理部的移動而使該連結軸部與該處理部並進的方式,連結於該連結軸部,以藉由該處理部的移動使該擺動手臂進行擺動。又,基板處理裝置包含連接線,其位於該擺動手臂的內部,通過該擺動中心軸部的內部而與位於該框體外部的共用設備(utility)連接,且通過該連結軸部的內部而與該處理部連接。 In the substrate processing apparatus of the present invention, an aspect includes a frame body and a hollow swing arm located inside the frame body. The swing arm includes a hollow swing center shaft portion connected to the frame body and a hollow joint shaft portion as a swing end. Further, the substrate processing apparatus includes a processing unit that is located inside the housing and that moves in a direction perpendicular to the axial direction of the swing center shaft portion in the processing space facing the substrate to perform processing on the substrate. The processing unit is coupled to the connecting shaft portion so as to follow the movement of the processing unit so that the connecting shaft portion and the processing portion advance together, and the swing arm is swung by the movement of the processing portion. Further, the substrate processing apparatus includes a connection line that is located inside the swing arm, and is connected to a common device located outside the frame by the inside of the swing center shaft portion, and is connected to the inside of the connection shaft portion. The processing unit is connected.

根據此構成,在處理部與連結軸部一起並進時,擺動手臂以擺動中心軸部為中心而進行擺動。此時,位於擺動手臂內的連接線,一方面追隨擺動手臂的擺動,一方面確保與處理部的連接。因此,連接線通過擺動中心軸部而幾乎不在擺動手臂的內部與外部之間進出。亦即,連接線 追隨擺動手臂的擺動,並以擺動中心軸部為中心以進行擺動。於是,可使在框體的內部與外部之間變化的連接線的長度之變化量,小於處理部的移動距離就行。結果,可減少連接線因進出框體內部與框體外部之間而承受的機械性負載。 According to this configuration, when the treatment portion is advanced together with the connection shaft portion, the swing arm swings around the swing center shaft portion. At this time, the connecting line located in the swinging arm follows the swing of the swinging arm on the one hand, and ensures the connection with the processing portion on the other hand. Therefore, the connecting wire is hardly moved in and out between the inside and the outside of the swinging arm by swinging the center shaft portion. That is, the connection line Follow the swing of the swinging arm and swing around the center axis of the swing center. Therefore, the amount of change in the length of the connecting line that changes between the inside and the outside of the casing can be made smaller than the moving distance of the processing portion. As a result, the mechanical load that the connecting wire receives due to entering and exiting between the inside of the casing and the outside of the casing can be reduced.

本發明之技術中的成膜裝置,其一態樣具備框體及位於該框體內部之中空擺動手臂。該擺動手臂包含與該框體連接的中空擺動中心軸部,及作為擺動端的中空連結軸部。又,成膜裝置具備成膜部,其位於該框體的內部,在與基板互相面對的處理空間中,與該擺動中心軸部之軸向垂直的方向上移動,以對該基板放出成膜材料,藉此在該基板上形成膜。該成膜部,以可追隨該成膜部的移動而使該連結軸部與該成膜部並進的方式,與該連結軸部連結,並藉由該成膜部的移動使該擺動手臂進行擺動。又,成膜裝置包含連接線,其位於該擺動手臂的內部,通過該擺動中心軸部的內部而與位於該框體外部之共用設備連接,且通過該連結軸部的內部而與該成膜部連接。 The film forming apparatus in the art of the present invention has a frame body and a hollow swing arm located inside the frame body. The swing arm includes a hollow swing center shaft portion connected to the frame body, and a hollow joint shaft portion as a swing end. Further, the film forming apparatus includes a film forming portion which is located inside the casing and moves in a direction perpendicular to the axial direction of the swing center shaft portion in the processing space facing the substrate to release the substrate A film material whereby a film is formed on the substrate. The film formation portion is coupled to the connection shaft portion so as to follow the movement of the film formation portion so that the connection shaft portion and the film formation portion are advanced, and the swing arm is caused by the movement of the film formation portion. swing. Further, the film forming apparatus includes a connecting line which is located inside the swing arm, is connected to a common device located outside the frame by the inside of the swing center shaft portion, and is formed by the inside of the connecting shaft portion. Department connection.

根據此構成,在成膜部與連結軸部一起並進時,擺動手臂以擺動中心軸部為中心而進行擺動。此時,位於擺動手臂內的連接線,一方面追隨擺動手臂進行擺動,一方面確保與成膜部的連接。因此,連接線穿過擺動中心軸部,而幾乎不進出擺動手臂之內部與外部之間。亦即,連接線係追隨擺動手臂的擺動,而以擺動中心軸部為中心進行擺動。於是,可使在框體的內部與外部之間變化的連接線的長度之變化量,小於成膜部的移動距離就行。結果,可減少連接線因為在框體內部與框體外部之間進出而承受的機械性負載。 According to this configuration, when the film formation portion and the connection shaft portion are advanced together, the swing arm swings around the swing center shaft portion. At this time, the connecting line located in the swinging arm, on the one hand, follows the swinging arm to swing, and on the other hand ensures the connection with the film forming portion. Therefore, the connecting wire passes through the swing center shaft portion and hardly enters between the inside and the outside of the swing arm. That is, the connecting line follows the swing of the swinging arm and swings around the center axis of the swinging center. Therefore, the amount of change in the length of the connecting line which changes between the inside and the outside of the casing can be made smaller than the moving distance of the film forming portion. As a result, it is possible to reduce the mechanical load that the connecting wire is subjected to because it enters and exits between the inside of the casing and the outside of the casing.

上述基板處理裝置中,該處理部宜包含軸支部,其支持該連結軸部成可相對該處理部旋轉。又,該擺動手臂宜包含伸縮機構,其使該連結軸部相對該擺動中心軸部位移,而使該擺動中心軸部與該連結軸部之間的距離伸縮。此構成中,伸縮機構,係以使「該擺動中心軸部與該連結軸部之間的距離」配合「該擺動中心軸部與該軸支部之間的距離」的方式進行變化。 In the above substrate processing apparatus, the processing unit preferably includes a shaft support that supports the connection shaft portion so as to be rotatable relative to the processing portion. Further, the swing arm preferably includes a telescopic mechanism that displaces the connecting shaft portion with respect to the swing center shaft portion, and expands and contracts the distance between the swing center shaft portion and the connecting shaft portion. In this configuration, the telescopic mechanism is changed such that "the distance between the swing center shaft portion and the connecting shaft portion" is "the distance between the swing center shaft portion and the shaft branch portion".

根據此構成,在處理部與連結軸部一起並進時,擺動手臂的伸縮機構,以使擺動中心軸部與連結軸部之間的距離配合擺動中心軸部與軸支部之間的距離的方式進行變化。因此,可使擺動手臂的連結軸部追隨處理部的移動。 According to this configuration, when the treatment portion is moved in together with the connection shaft portion, the telescopic mechanism of the arm is swung so that the distance between the swing center shaft portion and the connection shaft portion is matched with the distance between the swing center shaft portion and the shaft portion. Variety. Therefore, the connecting shaft portion of the swing arm can follow the movement of the processing portion.

上述基板處理裝置中,該連接線宜由複數的線路構成元件所構成。又,該複數的線路構成元件宜包含兩條中間剛體線,其配置於該擺動手臂內部,並分別固定於該擺動手臂,配合該伸縮機構所進行的該擺動手臂的伸縮,而使彼此之間的距離伸縮。又,該複數的線路構成元件宜包含中間可撓線,其配置在該擺動手臂內部,並連接於該兩條中間剛體線之間,且具有可撓曲性,以因應該兩條中間剛體線之間的距離增大而使撓曲量變小。 In the above substrate processing apparatus, the connection line is preferably composed of a plurality of line constituent elements. Moreover, the plurality of line constituent elements preferably include two intermediate rigid body lines disposed inside the swing arm and respectively fixed to the swing arm, and the expansion and contraction of the swing arm is performed by the telescopic mechanism to make each other The distance is telescopic. Moreover, the plurality of line constituent elements preferably include an intermediate flexible line disposed inside the swing arm and connected between the two intermediate rigid body lines and having flexibility to accommodate two intermediate rigid body lines The distance between them increases to make the amount of deflection smaller.

根據此構成,在擺動手臂伸縮時,可使中間可撓線的撓曲量於兩個中間剛體線之間改變。因此,可藉由中間可撓線的撓曲量變化,以吸收穿過擺動手臂內部之連接線的長度與擺動手臂的長度之差值的變化。於是,使進出擺動手臂內部與外部之間的連接線的長度變短。 According to this configuration, when the swing arm is stretched and contracted, the amount of deflection of the intermediate flexible line can be changed between the two intermediate rigid body lines. Therefore, the change in the amount of deflection of the intermediate flexible wire can be absorbed to absorb the change in the difference between the length of the connecting line passing through the inside of the swinging arm and the length of the swinging arm. Thus, the length of the connecting line between the inside and the outside of the swinging arm is made shorter.

上述基板處理裝置中,該擺動中心軸部宜設置為基端旋轉 部,其以沿著該擺動中心軸部之軸向的旋轉軸為中心,而相對該框體旋轉。又,該連接線宜包含:基端旋轉配線,其係剛體,該剛體固定於該基端旋轉部並追隨該基端旋轉部的旋轉而旋轉;基端固定配線,其係固定於該框體的剛體;及基端可撓線,其以可藉由自身重量撓曲的方式設置,並連接於該基端固定配線與該基端旋轉配線之間,以因應該基端旋轉配線與該基端固定配線之間的距離增大而減少撓曲量。 In the above substrate processing apparatus, the swing center shaft portion is preferably set to rotate at the base end The portion rotates relative to the frame centering on a rotation axis along the axial direction of the swing center shaft portion. Moreover, the connecting wire preferably includes: a base end rotating wire, which is a rigid body fixed to the base end rotating portion and rotates following the rotation of the base end rotating portion; the base end fixing wire is fixed to the frame body a rigid body; and a base end flexible wire which is disposed by being deflected by its own weight and connected between the base end fixing wire and the base end rotating wire, so as to rotate the wiring and the base at the base end The distance between the end fixing wires is increased to reduce the amount of deflection.

根據此構成,可抑制因基端旋轉部的旋轉所造成的連接線扭曲。因此,可減少連接線所承受的機械性負載。 According to this configuration, the twist of the connecting wire due to the rotation of the base end rotating portion can be suppressed. Therefore, the mechanical load on the connecting wire can be reduced.

上述基板處理裝置中,該連結軸部,宜設置為前端旋轉部,其以沿著該擺動中心軸部在軸向上的旋轉軸為中心,而相對該處理部進行旋轉。又,該連接線宜包含:前端旋轉配線,其係剛體,該剛體固定於該前端旋轉部,並追隨該前端旋轉部的旋轉而進行旋轉;前端並進配線,其係剛體,該剛體固定於該處理部,追隨該處理部的移動而與該處理部並進;及前端可撓線,其以可藉由自身重量撓曲的方式設置,並連接於該前端旋轉配線與該前端並進配線之間,以因應該前端旋轉配線與該前端並進配線之間的距離增大而減少撓曲量。 In the above-described substrate processing apparatus, the connection shaft portion is preferably provided as a distal end rotation portion that rotates with respect to the treatment portion around a rotation axis along the axial direction of the oscillation center shaft portion. Further, the connecting wire preferably includes a front end rotating wire that is a rigid body that is fixed to the front end rotating portion and that rotates in accordance with the rotation of the front end rotating portion. The front end is wired in parallel, and the rigid body is fixed to the rigid body. The processing unit is moved in parallel with the processing unit in accordance with the movement of the processing unit; and the front end flexible line is provided so as to be deflectable by its own weight, and is connected between the front end rotating wiring and the front end parallel wiring. The amount of deflection is reduced by an increase in the distance between the front end rotating wiring and the front end parallel wiring.

根據此構成,可抑制因前端旋轉部的旋轉所造成的連接線扭曲。因此,可減少連接線所承受的機械性負載。 According to this configuration, the distortion of the connecting line due to the rotation of the distal end rotating portion can be suppressed. Therefore, the mechanical load on the connecting wire can be reduced.

10‧‧‧濺鍍裝置 10‧‧‧ Sputtering device

11‧‧‧運出入腔室 11‧‧‧Transported into the chamber

12‧‧‧前處理腔室 12‧‧‧Pre-treatment chamber

13‧‧‧濺鍍腔室 13‧‧‧ Sputtering chamber

14‧‧‧閘閥 14‧‧‧ gate valve

15‧‧‧排氣部 15‧‧‧Exhaust Department

16‧‧‧成膜通道 16‧‧‧film formation channel

17‧‧‧回收通道 17‧‧‧Recovery channel

18‧‧‧正極裝置 18‧‧‧ positive device

19‧‧‧通道變更部 19‧‧‧Channel Change Department

21‧‧‧框體 21‧‧‧ frame

22‧‧‧陰極單元 22‧‧‧ cathode unit

22a‧‧‧並進台 22a‧‧‧and enter the stage

22b‧‧‧軌道 22b‧‧‧ Track

23‧‧‧擺動手臂 23‧‧‧Swing arm

23a‧‧‧擺動中心軸部 23a‧‧‧Swing center shaft

23a1‧‧‧擺動軸支部 23a1‧‧‧Swing shaft branch

23a2‧‧‧擺動凸緣 23a2‧‧‧Swing flange

23b‧‧‧連結軸部 23b‧‧‧Connected shaft

23b1‧‧‧連結軸支部 23b1‧‧‧Connected shaft branch

23b2‧‧‧連結凸緣 23b2‧‧‧Link flange

31‧‧‧上部框體 31‧‧‧ upper frame

31a‧‧‧擺動開口部 31a‧‧‧Swing opening

31b‧‧‧上部開口部 31b‧‧‧Upper opening

32‧‧‧固定板 32‧‧‧ fixed board

32a‧‧‧固定開口部 32a‧‧‧Fixed openings

33‧‧‧引導筒部 33‧‧‧Guide tube

33a‧‧‧上部筒部 33a‧‧‧Upper tube

33b‧‧‧下部筒部 33b‧‧‧ lower tube

33c‧‧‧伸縮軟管 33c‧‧‧Flexible hose

34‧‧‧下部框體 34‧‧‧Lower frame

34a‧‧‧連結開口部 34a‧‧‧Connecting opening

34b‧‧‧下部開口部 34b‧‧‧lower opening

40‧‧‧伸縮機構 40‧‧‧Flexing mechanism

41‧‧‧長桿 41‧‧‧Long pole

41a‧‧‧上端部 41a‧‧‧Upper end

42‧‧‧長桿引導部 42‧‧‧Long Rod Guide

50‧‧‧連接線 50‧‧‧Connecting line

51‧‧‧電源線 51‧‧‧Power cord

51a‧‧‧剛體部 51a‧‧‧ rigid body

51a1‧‧‧擺動剛體部 51a1‧‧‧Swinging body

51a2‧‧‧連結剛體部 51a2‧‧‧Connected body

51b‧‧‧撓曲部 51b‧‧‧Flexing Department

51b1‧‧‧彎曲部 51b1‧‧‧Bend

51A‧‧‧第一電源線 51A‧‧‧First power cord

51B‧‧‧第二電源線 51B‧‧‧second power cord

52‧‧‧氣體配管 52‧‧‧ gas piping

52a‧‧‧撓曲部 52a‧‧‧Flexing Department

53a‧‧‧撓曲部 53a‧‧‧Flexing Department

53‧‧‧冷卻水配管 53‧‧‧Cooling water piping

61‧‧‧擺動固定部 61‧‧‧Swing fixed part

62‧‧‧擺動可撓部 62‧‧‧Swinging flexible part

62a‧‧‧彎曲部 62a‧‧‧Bend

71‧‧‧連結並進部 71‧‧‧Link and Advance

72‧‧‧連結可撓部 72‧‧‧Connecting the flexible department

72a‧‧‧折返部 72a‧‧‧Departure

A‧‧‧旋轉軸 A‧‧‧Rotary axis

P‧‧‧擺動軸 P‧‧‧ swing axis

S‧‧‧基板 S‧‧‧Substrate

T‧‧‧托盤 T‧‧‧Tray

L‧‧‧長度 L‧‧‧ length

第一圖係將成膜裝置的第一實施型態之濺鍍裝置的內部構成與濺鍍裝置的處理對象、即基板一併示意顯示的構成圖。 The first drawing is a configuration diagram in which the internal configuration of the sputtering apparatus of the first embodiment of the film forming apparatus is schematically shown together with the substrate to be processed by the sputtering apparatus.

第二圖係從與位於框體內之基板相對之方向,對框體內部構造進行透 視的圖。 The second figure is transparent to the internal structure of the frame from the direction opposite to the substrate located in the frame. Vision diagram.

第三圖係從與位於框體內之基板相對之方向,對框體內部構造進行透視的圖。 The third figure is a perspective view of the internal structure of the frame from a direction opposite to the substrate located in the casing.

第四圖係從與位於框體內之基板相對之方向,對框體內部構造進行透視的圖。 The fourth figure is a perspective view of the internal structure of the frame from a direction opposite to the substrate located in the casing.

第五圖係顯示沿著成膜裝置之第二實施型態的濺鍍裝置所具有之擺動手臂的高度方向的剖面構造的剖面圖。 Fig. 5 is a cross-sectional view showing a cross-sectional structure in the height direction of the swing arm of the sputtering apparatus of the second embodiment of the film forming apparatus.

第六圖係顯示擺動手臂伸長前的正面構造的前視圖。 The sixth figure shows a front view of the frontal configuration of the swinging arm before it is extended.

第七圖係顯示擺動手臂伸長後的正面構造的前視圖。 The seventh diagram shows a front view of the frontal configuration of the swinging arm after it has been elongated.

第八圖係顯示沿著擺動手臂伸長前之高度方向的部分剖面構造的剖面圖。 The eighth figure shows a cross-sectional view of a partial cross-sectional structure along the height direction before the swing arm is extended.

第九圖係顯示沿著擺動手臂伸長後之高度方向的部分剖面構造的剖面圖。 The ninth diagram shows a cross-sectional view of a partial cross-sectional structure along the height direction in which the swing arm is elongated.

第十圖係顯示從相對於陰極裝置的與基板的相反側,觀察成膜裝置之第三實施型態的濺鍍裝置所具有的擺動手臂之背面構造的一部分的部分後視圖。 Fig. 10 is a partial rear elevational view showing a part of the back surface structure of the swing arm which is provided in the sputtering apparatus of the third embodiment of the film forming apparatus from the side opposite to the substrate with respect to the cathode device.

第十一圖係顯示從相對於陰極裝置的與基板的相反側,觀察擺動手臂之背面構造的一部分的部分後視圖。 The eleventh figure shows a partial rear view of a portion of the back side configuration of the swing arm viewed from the side opposite to the substrate with respect to the cathode device.

第十二圖係顯示從相對於陰極裝置之基板側觀察擺動手臂的部分正面構造的部分前視圖。 The twelfth line shows a partial front view of a partial front configuration of the swing arm viewed from the side of the substrate with respect to the cathode device.

第十三圖係顯示從相對於陰極裝置之基板側觀察擺動手臂的部分正面構造的部分前視圖。 The thirteenth diagram shows a partial front view of a partial front configuration of the swing arm viewed from the side of the substrate with respect to the cathode device.

〔第一實施形態〕 [First Embodiment]

參照第一圖到第四圖,說明將基板處理裝置及成膜裝置作為濺鍍裝置而具體化的第一實施形態。以下依序說明濺鍍裝置整體構成的一例、濺鍍裝置所包含之陰極裝置,以及陰極裝置的作用。 A first embodiment in which a substrate processing apparatus and a film forming apparatus are embodied as a sputtering apparatus will be described with reference to the first to fourth drawings. Hereinafter, an example of the entire configuration of the sputtering apparatus, the cathode apparatus included in the sputtering apparatus, and the role of the cathode apparatus will be described in order.

〔濺鍍裝置的整體構成〕 [The overall structure of the sputtering device]

參照第一圖說明濺鍍裝置全體構成的一例。 An example of the overall configuration of the sputtering apparatus will be described with reference to the first drawing.

如第一圖所示,濺鍍裝置10包含運出入腔室11、前處理腔室12、及濺鍍腔室13;三個腔室在一個方向上沿著運送方向並排。濺鍍裝置10包含兩個閘閥14,其分別連結於運出入腔室11與前處理腔室12之間,以及前處理腔室12與濺鍍腔室13之間。三個腔室分別搭載使各腔室減壓的排氣部15。三個腔室的底面分別安裝有成膜路徑16與回收路徑17,其係沿著運送方向延伸而相互平行的兩條路徑。 As shown in the first figure, the sputtering apparatus 10 includes an inlet and outlet chamber 11, a pretreatment chamber 12, and a sputtering chamber 13; the three chambers are arranged side by side in the conveying direction in one direction. The sputtering apparatus 10 includes two gate valves 14 that are respectively coupled between the inlet and outlet chambers 11 and the pretreatment chamber 12, and between the pretreatment chamber 12 and the sputtering chamber 13. Each of the three chambers is provided with an exhaust portion 15 that decompresses each chamber. The bottom surfaces of the three chambers are respectively mounted with a film formation path 16 and a recovery path 17, which are two paths extending in the conveying direction and parallel to each other.

成膜路徑16與回收路徑17,係由例如,沿著運送方向延伸的軌道、沿著運送方向配置之複數滾輪、及分別使複數滾輪自轉的複數馬達等元件所構成。成膜路徑16,將運入濺鍍裝置10內部的托盤T,與成膜前的基板S一起從運出入腔室11送往濺鍍腔室13。回收路徑17,將運入濺鍍腔室13內部之托盤T,與成膜後的基板S一起從濺鍍腔室13送往運出入腔室11。托盤T中,向紙面前方延伸的呈矩形的基板S,係以立起的狀態被固定。基板S的寬度,例如,沿著運送方向為2200mm,朝向紙面前方為2500mm。 The film formation path 16 and the recovery path 17 are composed of, for example, a track extending in the transport direction, a plurality of rollers arranged along the transport direction, and a plurality of motors each rotating the plurality of rollers. The film formation path 16 transports the tray T carried into the inside of the sputtering apparatus 10 from the transport-in chamber 11 to the sputtering chamber 13 together with the substrate S before film formation. The recovery path 17 transports the tray T carried into the inside of the sputtering chamber 13 from the sputtering chamber 13 to the carry-out chamber 11 together with the formed substrate S. In the tray T, the rectangular substrate S extending toward the front of the paper surface is fixed in an upright state. The width of the substrate S is, for example, 2200 mm along the transport direction and 2500 mm toward the front of the paper.

運出入腔室11,將從濺鍍裝置10外部運入的成膜前的基板S送往前處理腔室12,並將從前處理腔室12運入的成膜後的基板S送往濺鍍裝 置10的外部。在從外部將成膜前的基板S運入運出入腔室11時,或是,在將成膜後的基板S從運出入腔室11往外部運出時,在運出入腔室11中,使其腔室內部升壓至大氣壓。在將成膜前的基板S從運出入腔室11運入前處理腔室12時,或是,在將成膜後的基板S從前處理腔室12往運出入腔室11運出時,使運出入腔室11內部減壓至與前處理腔室12內部相同的程度。 The film is transported into the chamber 11, and the substrate S before being formed from the outside of the sputtering apparatus 10 is sent to the pretreatment chamber 12, and the filmed substrate S carried from the pretreatment chamber 12 is sent to the sputtering. Loading Set the outside of 10. When the substrate S before film formation is carried out into the chamber 11 from the outside, or when the substrate S after being formed is transported out of the chamber 11 to the outside, it is carried out into the chamber 11 The chamber is pressurized to atmospheric pressure. When the substrate S before the film formation is carried into the pretreatment chamber 12 from the chamber 11, or when the substrate S after the film formation is carried out from the pretreatment chamber 12 to the chamber 11, The inside of the chamber 11 is evacuated to the same extent as the inside of the pretreatment chamber 12.

前處理腔室12,對於從運出入腔室11運入前處理腔室12的成膜前的基板S,進行例如加熱處理或洗淨處理等,以作為成膜必要之處理。前處理腔室12,將從運出入腔室11運出至前處理腔室12的基板S運入濺鍍腔室13。又,前處理腔室12,將從濺鍍腔室13運出至前處理腔室12的基板S運出至運出入腔室11。 The pretreatment chamber 12 performs, for example, a heat treatment or a washing treatment on the substrate S before being formed into the pretreatment chamber 12 from the inlet and outlet chambers 11 to perform a film formation process. The pretreatment chamber 12 carries the substrate S transported out of the chamber 11 to the pretreatment chamber 12 into the sputtering chamber 13. Further, the pretreatment chamber 12 transports the substrate S transported from the sputtering chamber 13 to the pretreatment chamber 12 to the carry-out chamber 11.

濺鍍腔室13,包含將成膜材料放出至基板S的陰極裝置18。陰極裝置18中,陰極裝置18在與基板S面對面的處理空間中放出成膜材料。濺鍍腔室13包含路徑變更部19,其設於成膜路徑16與回收路徑17之間。 The sputtering chamber 13 includes a cathode device 18 that discharges the film forming material to the substrate S. In the cathode device 18, the cathode device 18 discharges a film forming material in a processing space facing the substrate S. The sputtering chamber 13 includes a path changing portion 19 provided between the film formation path 16 and the recovery path 17.

在濺鍍腔室13中,使用陰極裝置18對於從前處理腔室12運入濺鍍腔室13的成膜前的基板S形成薄膜。在濺鍍腔室13中,使用路徑變更部19,使托盤T與成膜後的基板S一起從成膜路徑16移動至回收路徑17。 In the sputtering chamber 13, a film is formed on the substrate S before film formation from the pretreatment chamber 12 into the sputtering chamber 13 by using the cathode device 18. In the sputtering chamber 13, the path changing portion 19 is used to move the tray T together with the substrate S after the film formation from the film formation path 16 to the recovery path 17.

此外,濺鍍裝置10只要是至少包含濺鍍腔室13的構成即可。 在這樣的構成之下,濺鍍腔室13亦可不包含成膜路徑16、回收路徑17以及路徑變更部19,而僅包含將基板S與陰極裝置18配置成相對狀態之配置部即可。 Further, the sputtering apparatus 10 may be configured to include at least the sputtering chamber 13. In such a configuration, the sputtering chamber 13 may not include the film formation path 16, the recovery path 17, and the path changing unit 19, and may include only the arrangement portion in which the substrate S and the cathode device 18 are disposed in a relative state.

〔陰極裝置〕 [cathode device]

參照第二圖說明陰極裝置18。此外,為了方便說明,第二圖 到第四圖中省略構成濺鍍腔室13之框體所具有之壁部、即平行於運送方向之壁部的圖示。 The cathode device 18 will be described with reference to the second figure. In addition, for convenience of explanation, the second figure In the fourth drawing, the wall portion of the frame constituting the sputtering chamber 13, that is, the wall portion parallel to the conveying direction is omitted.

如第二圖所示,陰極裝置18,位於形成箱狀而構成濺鍍腔室13之框體21的內部,而框體21具有與運送方向平行的兩個壁部。與運送方向平行的兩個壁部相互面對,兩個壁部中的一邊的壁部面向另一邊之壁部的方向,係為面對方向。陰極裝置18包含陰極單元22及擺動手臂23。 As shown in the second figure, the cathode device 18 is located inside the casing 21 which is formed in a box shape to constitute the sputtering chamber 13, and the casing 21 has two wall portions which are parallel to the conveying direction. The two wall portions parallel to the conveying direction face each other, and the wall portion of one of the two wall portions faces the wall portion of the other side in a facing direction. The cathode device 18 includes a cathode unit 22 and a swing arm 23.

陰極單元22,具有形成中空矩形柱狀的並進台22a,構成並進台22a的壁部之中,與基板S面對面的壁部,具有由形成薄膜的材料所構成的靶材。並進台22a內部搭載與靶材連接而從外部對靶材供給電源的背板,以及在與基板S面對面的靶材的一面上形成漏磁場(stray magnetic field)的磁性電路等。陰極單元22為處理部及成膜部的一例。 The cathode unit 22 has a parallel-shaped table 22a formed in a hollow rectangular column shape, and a wall portion that faces the substrate S among the wall portions that form the parallel table 22a has a target material composed of a material forming a film. The backing table 22a is provided with a back plate that is connected to the target and that supplies power to the target from the outside, and a magnetic circuit that forms a stray magnetic field on one surface of the target that faces the substrate S. The cathode unit 22 is an example of a processing unit and a film forming unit.

框體21的內部,鋪設沿著運送方向延伸的軌道22b,而並進台22a載置於軌道22b上。並進台22a與使並進台22a沿著軌道22b來回移動的驅動部連結。並進台22a被驅動部所驅動,藉此沿著運送方向來回移動。並進台22a,藉由沿著運送方向來回移動,而在與基板S面對面的處理空間中移動。 Inside the casing 21, a rail 22b extending in the conveying direction is laid, and the joining table 22a is placed on the rail 22b. The joining table 22a is coupled to a driving unit that moves the joining table 22a back and forth along the rail 22b. The parallel table 22a is driven by the driving portion, thereby moving back and forth along the conveying direction. The parallel stage 22a is moved in the processing space facing the substrate S by moving back and forth along the transport direction.

框體21中的上述的兩個壁部,其中一個壁部上安裝有位於框體21內部的擺動手臂23。擺動手臂23,形成中空且大致為矩形的柱狀,以沿著面對方向延伸的擺動軸P為中心而進行擺動。 The above-described two wall portions in the frame 21 are mounted with a swing arm 23 located inside the frame 21 on one of the wall portions. The swing arm 23 is formed in a hollow and substantially rectangular column shape, and is swung centering on the swing axis P extending in the facing direction.

擺動手臂23,具備在框體21內部的上方與框體21連接的中空擺動中心軸部23a、以及在框體21內部的下方與並進台22a連接以作為擺動端的中空連結軸部23b。例如,擺動中心軸部23a,在與運送方向上的軌道22b 之約略中央一致的位置,連接於框體21壁部的上方。擺動中心軸部23a的軸向與擺動軸P一致。 The swing arm 23 includes a hollow swing center shaft portion 23a that is connected to the frame body 21 above the frame body 21, and a hollow connection shaft portion 23b that is connected to the parallel table 22a at the lower side inside the frame body 21 as a swing end. For example, the swing center shaft portion 23a, the rail 22b in the transport direction The approximately centrally aligned position is connected to the upper portion of the wall of the frame 21. The axial direction of the swing center shaft portion 23a coincides with the swing axis P.

擺動軸支部23a1位於擺動中心軸部23a的外側,擺動軸支部23a1形成沿著面對方向延伸的筒狀,並支持擺動中心軸部23a成可相對框體21進行旋轉的狀態。擺動軸支部23a1,被固定於框體21。亦即,框體21具備擺動軸支部23a1。 The swing shaft branch portion 23a1 is located outside the swing center shaft portion 23a, and the swing shaft branch portion 23a1 is formed in a tubular shape extending in the facing direction, and supports the swing center shaft portion 23a in a state of being rotatable relative to the frame body 21. The swing shaft branch portion 23a1 is fixed to the frame body 21. That is, the casing 21 is provided with the swing shaft branch portion 23a1.

連結軸部23b,在並進台22a之中,與面對靶材的壁部的外側面連接;連結軸部23b,在並進台22a外側面上,連接於例如其中央的下方。連結軸部23b,以與沿著面對方向延伸之中心軸一致的旋轉軸A為中心,而相對於並進台22a旋轉。連結軸部23b,在可隨著陰極單元22並進的狀態下,與並進台22a連結。 The connecting shaft portion 23b is connected to the outer surface of the wall portion facing the target in the joining table 22a, and the connecting shaft portion 23b is connected to, for example, the lower side of the center of the joining table 22a. The connecting shaft portion 23b is rotated with respect to the parallel table 22a centering on the rotation axis A that coincides with the central axis extending in the facing direction. The connection shaft portion 23b is coupled to the parallel table 22a while the cathode unit 22 is being advanced.

連結軸支部23b1位於連結軸部23b的外側,連結軸支部23b1形成沿著面對方向延伸的筒狀,並支持連結軸部23b成可相對並進台22a進行旋轉的狀態。連結軸支部23b1,被固定於並進台22a。亦即,陰極單元22具備連結軸支部23b1。 The connection shaft support portion 23b1 is located outside the connection shaft portion 23b, and the connection shaft support portion 23b1 is formed in a tubular shape extending in the facing direction, and supports the connection shaft portion 23b so as to be rotatable relative to the table 22a. The connecting shaft branch portion 23b1 is fixed to the parallel table 22a. That is, the cathode unit 22 is provided with the connection shaft branch portion 23b1.

在陰極裝置18中,擺動手臂23的內部以及與擺動手臂23內部相連的並進台22a的內部係大氣壓氛圍。另一方面,因為真空密封構件位於擺動中心軸部23a外周面與擺動軸支部23a1內周面之間,且真空密封構件位於連結軸部23b外周面與連結軸支部23b1內周面之間,故在排氣部15使框體21內部進行減壓時,可將框體21內部保持於真空氛圍。 In the cathode device 18, the inside of the swing arm 23 and the inside of the parallel table 22a connected to the inside of the swing arm 23 are atmospheric atmosphere. On the other hand, since the vacuum sealing member is located between the outer peripheral surface of the swing center shaft portion 23a and the inner peripheral surface of the swing shaft branch portion 23a1, and the vacuum seal member is located between the outer peripheral surface of the joint shaft portion 23b and the inner peripheral surface of the joint shaft portion 23b1, When the inside of the casing 21 is decompressed in the exhaust portion 15, the inside of the casing 21 can be held in a vacuum atmosphere.

連接線位於擺動手臂23的內部,該連接線與用以驅動陰極單元22而配置於濺鍍腔室13外部的共用設備連接,並與用以驅動陰極單元22 而與位在濺鍍腔室13內部之陰極單元22連接。共用設備包含例如,各種電源、具有濺鍍氣體及反應氣體之製程氣體的氣體鋼瓶以及冷卻水槽。連接線,可為例如,供給靶材電源的電源線,亦可為供冷卻靶材的冷卻水流動的配管,且可為供被供給濺鍍腔室13內部的製程氣體流動的配管。 The connecting line is located inside the swing arm 23, and the connecting line is connected to a common device for driving the cathode unit 22 and disposed outside the sputtering chamber 13, and is used to drive the cathode unit 22 It is connected to the cathode unit 22 located inside the sputtering chamber 13. The shared device includes, for example, various power sources, a gas cylinder having a process gas of a sputtering gas and a reactive gas, and a cooling water tank. The connection line may be, for example, a power supply line that supplies the target power source, a pipe through which the cooling water for cooling the target material flows, and a pipe through which the process gas supplied to the inside of the sputtering chamber 13 flows.

〔陰極裝置的作用〕 [The role of the cathode device]

參照第二圖到第四圖以說明陰極裝置的作用。 Referring to the second to fourth figures, the action of the cathode device will be explained.

如第二圖所示,在陰極裝置18開始形成薄膜時,並進台22a在框體21內部,位於軌道22b運送方向的一端,例如,位於第二圖的左端部。此時,擺動手臂23的擺動中心軸部23a位於運送方向上的軌道22b的大致中央之位置,並連接於框體21之壁部的上方。另一方面,擺動手臂23的連結軸部23b,在運送方向上的軌道22b的左端側位置,位於框體21內部的下方。因此,並進台22a相對軌道22b垂直延伸的方向上與擺動手臂23的延伸方向形成既定的角度。 As shown in the second figure, when the cathode device 18 starts to form a film, the joining table 22a is inside the casing 21 at one end in the conveying direction of the rail 22b, for example, at the left end portion of the second drawing. At this time, the swing center shaft portion 23a of the swing arm 23 is located substantially at the center of the rail 22b in the transport direction, and is connected to the upper side of the wall portion of the casing 21. On the other hand, the connecting shaft portion 23b of the swing arm 23 is located below the inside of the casing 21 at the left end side position of the rail 22b in the transport direction. Therefore, the parallel insertion table 22a forms a predetermined angle with the extending direction of the swing arm 23 in the direction in which the rail 22b extends vertically.

若陰極裝置18開始形成薄膜,則並進台22a沿著軌道22b,從與擺動軸P垂直的運送方向的一端朝向另一端移動。例如,並進台22a,從第二圖左端朝向右端沿著運送方向移動。藉此,擺動手臂23的連結軸部23b亦沿著運送方向與並進台22a一起並進,故連結軸部23b在運送方向上的位置,往擺動中心軸部23a在運送方向上的位置接近。結果,並進台22a延伸的方向與擺動手臂23延伸方向之間所形成的角度逐漸變小。在並進台22a沿著運送方向與連結軸部23b一起並進時,擺動中心軸部23a與連結軸部23b一起旋轉。此時,擺動中心軸部23a相對於框體21旋轉的方向,與連結軸部23b相對於並進台22a旋轉的方向相同。 When the cathode device 18 starts to form a film, the joining table 22a moves along the rail 22b from one end in the conveying direction perpendicular to the swing axis P toward the other end. For example, the parallel table 22a moves in the transport direction from the left end toward the right end of the second figure. As a result, the connecting shaft portion 23b of the swing arm 23 also advances along with the parallel table 22a in the transport direction. Therefore, the position of the connecting shaft portion 23b in the transport direction is close to the position of the swing center shaft portion 23a in the transport direction. As a result, the angle formed between the direction in which the parallel stage 22a extends and the direction in which the swing arm 23 extends is gradually reduced. When the joining table 22a advances together with the connecting shaft portion 23b in the conveying direction, the swing center shaft portion 23a rotates together with the connecting shaft portion 23b. At this time, the direction in which the swing center shaft portion 23a rotates with respect to the casing 21 is the same as the direction in which the connecting shaft portion 23b rotates with respect to the parallel table 22a.

如第三圖所示,在並進台22a沿運送方向與連結軸部23b並進,而使擺動中心軸部23a在運送方向上的位置與連結軸部23b在運送方向上的位置重疊時,並進台22a的延伸方向與擺動手臂23的延伸方向重疊。結果使得上述角度變成為0°。 As shown in the third figure, when the parallel table 22a is moved in parallel with the connecting shaft portion 23b in the transport direction, and the position of the swing center shaft portion 23a in the transport direction overlaps with the position of the connecting shaft portion 23b in the transport direction, The extending direction of 22a overlaps with the extending direction of the swing arm 23. As a result, the above angle becomes 0°.

並進台22a,在運送方向上,超過擺動中心軸部23a的位置而接近另一端時,連結軸部23b在運送方向上的位置,遠離擺動中心軸部23a在運送方向上的位置。結果,並進台22a延伸的方向與擺動手臂23延伸方向之間所形成的角度逐漸變大。 When the insertion table 22a is closer to the other end than the position of the swing center shaft portion 23a in the transport direction, the position of the connection shaft portion 23b in the transport direction is away from the position of the swing center shaft portion 23a in the transport direction. As a result, the angle formed between the direction in which the parallel stage 22a extends and the direction in which the swing arm 23 extends is gradually increased.

如第四圖所示,並進台22a若移動至軌道22b在運送方向上的另一端,例如移動到第二圖中的右端,則擺動手臂23的擺動中心軸部23a,在與運送方向上的軌道22b的略中央一致之位置,位於框體21內部之中的上方。另一方面,擺動手臂23的連結軸部23b,在運送方向軌道22b的右側的位置,位在框體21內部的下方。因此,並進台22a的延伸方向與擺動手臂23的延伸方向所形成的角度,與並進台22a位於軌道22b左端時,形成大致相同的角度。 As shown in the fourth figure, if the parallel table 22a is moved to the other end of the rail 22b in the transport direction, for example, to the right end in the second figure, the swing center shaft portion 23a of the swing arm 23 is in the transport direction. The position where the center of the rail 22b coincides is located above the inside of the casing 21. On the other hand, the connecting shaft portion 23b of the swing arm 23 is positioned below the inside of the casing 21 at a position on the right side of the transport direction rail 22b. Therefore, the angle formed by the extending direction of the joining table 22a and the extending direction of the swing arm 23 is substantially the same angle as when the joining table 22a is located at the left end of the rail 22b.

如此,陰極單元22,在運送方向上,從軌道22b的一端朝向另一端,或是從另一端朝向一端,與連結軸部23b一起並進。藉此,具有連結軸部23b而作為擺動端的擺動手臂23,以擺動中心軸部23a為中心進行擺動。 In this manner, the cathode unit 22 advances together with the connecting shaft portion 23b from one end of the rail 22b toward the other end or from the other end toward the one end in the transport direction. Thereby, the swing arm 23 which has the connection shaft part 23b as a swing end is rocking centering on the swing center shaft part 23a.

因此,在陰極單元22沿著軌道22b與連結軸部23b並進時,通過框體21內部的連接線也隨著擺動手臂23的擺動,以擺動中心軸部23a為中心進行擺動。此時,位在擺動手臂23內部的連接線,一方面追隨擺動手臂 23的擺動,一方面確保與陰極單元22連接。因此,連接線通過擺動中心軸部23a,而幾乎不在擺動手臂23內部與外部之間進出。藉此,因為在框體21內部與外部之間變化的連接線之長度的變化量,小於陰極單元22並進之距離就行,故可減少連接線所承受的機械性負載。 Therefore, when the cathode unit 22 is advanced along the rail 22b and the connecting shaft portion 23b, the connecting line passing through the inside of the casing 21 also swings around the swing center shaft portion 23a as the swing arm 23 swings. At this time, the connecting line inside the swinging arm 23 follows the swinging arm on the one hand. The oscillation of 23 ensures on the one hand the connection to the cathode unit 22. Therefore, the connecting wire passes through the swing center shaft portion 23a, and hardly enters and exits between the inside and the outside of the swing arm 23. Thereby, since the amount of change in the length of the connecting line which changes between the inside and the outside of the casing 21 is smaller than the distance in which the cathode unit 22 is advanced, the mechanical load on the connecting line can be reduced.

如以上所說明,根據第一實施形態之濺鍍裝置,可得到以下的效果。 As described above, according to the sputtering apparatus of the first embodiment, the following effects can be obtained.

(1)在陰極單元22與連結軸部23b並進時,擺動手臂23進行擺動。此時,位在擺動手臂23內部之連接線,隨著擺動手臂23的擺動,一方面以擺動中心軸部23a為中心進行擺動,一方面確保與陰極單元22的連接。因此,連接線通過擺動中心軸部23a,而幾乎不在擺動手臂23內部與外部之間進出。因此,可使在框體21內部與外部之間變化的連接線之長度的變化量,小於陰極單元22移動之距離就行。結果,可減少因連接線在框體21內部與框體21外部之間進出所承受的機械性負載。 (1) When the cathode unit 22 and the connecting shaft portion 23b are advanced, the swing arm 23 swings. At this time, the connecting line located inside the swing arm 23 swings around the swing center shaft portion 23a as the swing arm 23 swings, and on the other hand, the connection with the cathode unit 22 is ensured. Therefore, the connecting wire passes through the swing center shaft portion 23a, and hardly enters and exits between the inside and the outside of the swing arm 23. Therefore, the amount of change in the length of the connecting line which changes between the inside and the outside of the casing 21 can be made smaller than the distance by which the cathode unit 22 moves. As a result, the mechanical load that the connecting wire is subjected to entering and exiting between the inside of the casing 21 and the outside of the casing 21 can be reduced.

此外,第一實施形態亦可如以下所述,進行適當的變化。 Further, the first embodiment can be appropriately changed as described below.

‧擺動中心軸部23a連接在框體21壁部的位置,亦可不在運送方向上與軌道22b的大致中央一致的位置。只要擺動手臂23可以進行擺動,則擺動中心軸部23a與框體21之壁部連接的位置,亦可為在與運送方向上的軌道22b之兩端部的任一方對應的位置或其他位置。 ‧ The swing center shaft portion 23a is connected to the wall portion of the casing 21, and may not be at a position that coincides with the substantially center of the rail 22b in the transport direction. As long as the swing arm 23 can swing, the position at which the swing center shaft portion 23a is connected to the wall portion of the frame body 21 may be a position corresponding to either one of the both end portions of the rail 22b in the transport direction or another position.

‧陰極單元22,如上所述,不限於與基板S面對面之具有形成平板狀之靶材的構成。陰極單元22,亦可為具備下述靶材之構成:該靶材具有沿著運送方向與並進台22a一起移動之旋轉軸,其形成以旋轉軸為中心軸的圓筒狀,並與基板S面對面。 ‧ As described above, the cathode unit 22 is not limited to a configuration in which a flat plate-shaped target is formed to face the substrate S. The cathode unit 22 may be configured to include a target having a rotation axis that moves together with the parallel table 22a along the conveyance direction, and forms a cylindrical shape having a rotation axis as a central axis, and the substrate S Face to face.

‧成膜裝置,可不為包含陰極單元22的濺鍍裝置10,亦可為例如,具有蒸鍍源以作為成膜部的蒸鍍裝置等的各種成膜裝置,而將其具體化。或是,成膜裝置亦可作為下述各種的處理裝置而被具體化:包含具備離子射線照射部以作為處理部的離子射線照射裝置,或具備紫外線等各種雷射照射部以作為處理部的雷射照射裝置等。 ‧ The film forming apparatus may not be a sputtering apparatus 10 including the cathode unit 22, and may be embodied in various film forming apparatuses such as a vapor deposition apparatus having a vapor deposition source as a film forming unit. Alternatively, the film forming apparatus may be embodied as a processing device including an ion beam irradiation unit having an ion beam irradiation unit as a processing unit, or a laser irradiation unit such as an ultraviolet light as a processing unit. Laser irradiation device, etc.

〔第二實施形態〕 [Second embodiment]

參照第五圖到第九圖,說明以基板處理裝置及成膜裝置作為濺鍍裝置而將其具體化的第二實施形態。擺動手臂23的擺動中心軸部23a與連結軸部23b之間的距離,會配合擺動中心軸部23a與連結軸支部23b1之間的距離而改變。因此,以下詳細說明與此距離變化相關的構成。又,以下依序說明擺動手臂23的整體構成、擺動手臂23的伸縮機構以及連接線之一例、即電源線的詳細構成。 A second embodiment in which a substrate processing apparatus and a film forming apparatus are used as a sputtering apparatus will be described with reference to the fifth to ninth drawings. The distance between the swing center shaft portion 23a of the swing arm 23 and the joint shaft portion 23b changes in accordance with the distance between the swing center shaft portion 23a and the joint shaft portion 23b1. Therefore, the configuration related to this change in distance will be described in detail below. In addition, the detailed configuration of the entire configuration of the swing arm 23, the expansion and contraction mechanism of the swing arm 23, and the connection line, that is, the power supply line will be described in order.

〔擺動手臂的整體構成〕 [The overall composition of the swinging arm]

參照第五圖一併說明擺動手臂23的整體構成及內部構成。 The overall configuration and internal configuration of the swing arm 23 will be described with reference to FIG.

如第五圖所示,擺動手臂23包含上部框體31、固定板32、引導筒部33以及下部框體34;上部框體31、固定板32、引導筒部33以及下部框體34,係以此順序沿著單一方向、即高度方向排列。 As shown in FIG. 5, the swing arm 23 includes an upper housing 31, a fixing plate 32, a guiding cylinder portion 33, and a lower housing 34; the upper housing 31, the fixing plate 32, the guiding cylinder portion 33, and the lower housing 34 are In this order, they are arranged in a single direction, that is, in the height direction.

上部框體31具有擺動開口部31a,其形成中空的矩形柱狀,在一個側面上與擺動中心軸部23a連結,而沿著面對方向貫通該側面。上部框體31,在與下部框體34面對面的側面上,具有上部開口部31b,其係沿高度方向延伸的貫通孔。 The upper housing 31 has a swing opening portion 31a which is formed in a hollow rectangular column shape and is coupled to the swing center shaft portion 23a on one side surface and penetrates the side surface in the facing direction. The upper housing 31 has an upper opening portion 31b on a side surface facing the lower housing 34, which is a through hole extending in the height direction.

固定板32形成矩形板狀,其具有固定開口部32a,其係沿著 高度方向延伸的貫通孔。固定板32,在固定開口部32a與上部開口部31b面對面的狀態下與上部框體31連結。固定板32中,沿著面對方向的寬度以及與紙面垂直方向的寬度,分別大於上部框體31。 The fixing plate 32 is formed in a rectangular plate shape having a fixed opening portion 32a which is followed by A through hole extending in the height direction. The fixing plate 32 is coupled to the upper casing 31 in a state where the fixed opening 32a faces the upper opening 31b. In the fixing plate 32, the width in the facing direction and the width in the direction perpendicular to the paper surface are larger than the upper frame 31, respectively.

引導筒部33,形成沿著高度方向延伸的圓筒狀,其在高度方向上的兩個端部之中,接近固定板32的端部,在與固定開口部32a面對面的狀態下固定於固定板32。 The guiding cylinder portion 33 is formed in a cylindrical shape extending in the height direction, and is adjacent to the end portion of the fixing plate 32 among the both end portions in the height direction, and is fixed and fixed in a state of being face-to-face with the fixing opening portion 32a. Board 32.

下部框體34形成中空的矩形柱狀,以其中一個側面與連結軸部23b連結,並具有沿著面對方向貫通該側面的連結開口部34a。下部框體34,在與上部框體31面對面的側面上,具有下部開口部34b,其係沿著高度方向延伸的貫通孔。引導筒部33在高度方向上的兩個端部之中,接近下部框體34的端部,在與下部開口部34b面對面的狀態下被固定於下部框體34中與上部框體31面對面的側面。下部框體34中,沿著面對方向的寬度,以及,與紙面垂直方向的寬度,分別略等於固定板32。 The lower frame body 34 is formed in a hollow rectangular column shape, and one of the side surfaces is coupled to the connection shaft portion 23b, and has a connection opening portion 34a penetrating the side surface in the facing direction. The lower casing 34 has a lower opening portion 34b on a side surface facing the upper casing 31, which is a through hole extending in the height direction. The guide tube portion 33 is adjacent to the end portion of the lower frame body 34 in the two end portions in the height direction, and is fixed to the lower frame body 34 facing the upper frame body 31 in a state of being faced to the lower opening portion 34b. side. In the lower frame 34, the width in the facing direction and the width in the direction perpendicular to the paper surface are slightly equal to the fixing plate 32, respectively.

擺動中心軸部23a,與上部框體31相接,其在包覆擺動中心軸部23a之外周面的形成圓筒狀的擺動軸支部23a1,可使擺動中心軸部23a相對框體21旋轉的狀態下進行軸支。擺動軸支部23a1,在沿著面對方向延伸的途中,具有從外周面往直徑方向延伸的擺動凸緣23a2;擺動凸緣23a2,藉由固定構件而被固定於框體21。擺動中心軸部23a,在擺動中心軸部23a的外周面隔著具有真空密封構件功能之軸承而連接於擺動軸支部23a1之內周面的狀態下,以擺動軸P為中心,相對於框體21旋轉。 The swing center shaft portion 23a is in contact with the upper frame body 31, and forms a cylindrical swing shaft branch portion 23a1 on the outer peripheral surface of the cover swing center shaft portion 23a, so that the swing center shaft portion 23a can be rotated relative to the frame body 21. The shaft is supported in the state. The swing shaft branch portion 23a1 has a swing flange 23a2 extending in the radial direction from the outer peripheral surface in the middle of extending in the facing direction, and the swing flange 23a2 is fixed to the frame body 21 by a fixing member. The swing center shaft portion 23a is connected to the inner peripheral surface of the swing shaft support portion 23a1 via a bearing having a function of a vacuum seal member, and the swing center shaft portion 23a is centered on the swing shaft P with respect to the frame body. 21 rotation.

連結軸部23b,與下部框體34連接,其形成相對引導筒部33沿著面對方向而在擺動中心軸部23a的相反側上延伸的圓筒狀。包覆連結軸 部23b外周面並形成圓筒狀的連結軸支部23b1,在可使連結軸部23b相對並進台22a旋轉的狀態下,對連結軸部23b進行軸支。連結軸支部23b1,在沿著面對方向延伸的途中,具有從外周面往直徑方向之外側延伸的連結凸緣23b2;連結凸緣23b2,藉由固定構件而固定於並進台22a。連結軸部23b,在連結軸部23b的外周面隔著具有真空密封構件功能之軸承而連接於連結軸支部23b1之內周面的狀態下,以旋轉軸A為中心相對於並進台22a旋轉。 The connecting shaft portion 23b is connected to the lower casing 34, and is formed in a cylindrical shape that extends toward the opposite side of the swing center shaft portion 23a in the facing direction with respect to the guiding cylinder portion 33. Coated connecting shaft The cylindrical connecting portion 23b1 is formed on the outer peripheral surface of the portion 23b, and the connecting shaft portion 23b is pivoted while the connecting shaft portion 23b is rotated relative to the table 22a. The connecting shaft branch portion 23b1 has a connecting flange 23b2 extending outward in the radial direction from the outer peripheral surface in the middle of extending in the facing direction, and the connecting flange 23b2 is fixed to the joining table 22a by a fixing member. The connection shaft portion 23b is rotated with respect to the parallel table 22a around the rotation axis A in a state in which the outer circumferential surface of the connection shaft portion 23b is connected to the inner circumferential surface of the connection shaft support portion 23b1 via a bearing having a vacuum sealing member function.

擺動手臂23具備伸縮機構40,其係以在高度方向上的上部框體31與下部框體34之間圍住引導筒部33的周圍,並包含引導筒部33的方式所構成。伸縮機構40,使連結軸部23b相對擺動中心軸部23a進行位移,而使得擺動中心軸部23a與連結軸部23b之間的距離伸縮。 The swing arm 23 includes a telescopic mechanism 40 that surrounds the circumference of the guide tubular portion 33 between the upper housing 31 and the lower housing 34 in the height direction, and includes a guide tubular portion 33. The telescopic mechanism 40 displaces the connecting shaft portion 23b with respect to the swing center shaft portion 23a, and expands and contracts the distance between the swing center shaft portion 23a and the connecting shaft portion 23b.

伸縮機構40包含複數的長桿(shaft)41,以及與長桿41相同數量之長桿引導部42。複數的長桿引導部42,在引導筒部33的周圍,以隔著相等間隔的方式設置,複數的長桿引導部42,分別形成沿著高度方向延伸的圓筒狀。各長桿引導部42的兩個筒端之中,接近上部框體31的筒端,在與形成於固定板32上的在高度方向上延伸的長桿貫通孔(圖中未顯示)面對面的狀態下,固定於固定板32。複數的長桿41,分別形成沿著高度方向延伸的圓柱狀。各長桿41的兩個端部之中,接近上部框體31的端部,通過一個長桿引導部42及固定板32的長桿貫通孔,而接近下部框體34的端部,被固定在下部框體34中的與上部框體31面對面的側面上。 The telescoping mechanism 40 includes a plurality of shafts 41 and the same number of long rod guides 42 as the long rods 41. The plurality of long rod guiding portions 42 are provided at equal intervals around the guiding cylinder portion 33, and the plurality of long rod guiding portions 42 are formed in a cylindrical shape extending in the height direction. Among the two cylindrical ends of the long rod guiding portions 42, the cylindrical end of the upper frame body 31 is adjacent to the long rod through hole (not shown) extending in the height direction formed on the fixing plate 32. In the state, it is fixed to the fixing plate 32. The plurality of long rods 41 respectively form a columnar shape extending in the height direction. Among the two end portions of each of the long rods 41, the end portion of the upper frame body 31 is close to the end portion of the lower frame body 34 by a long rod guide portion 42 and a long rod through hole of the fixed plate 32, and is fixed. On the side of the lower casing 34 that faces the upper casing 31.

從擺動中心軸部23a朝向連結軸部23b延伸的複數連接線50,通過擺動手臂23的內部。複數連接線50,分別可為一條線,亦可藉由終端而相互連結的複數線路構成元件所構成。複數的連接線50,包含對陰 極單元22的背板供給高頻電力的電源線51、對陰極單元22的周圍供給製程氣體的氣體配管52、以及對背板供給冷卻水的冷卻水配管53。連接線50所包含的電源線51、氣體配管52以及冷卻水配管53的數量,分別可為一條,亦可為複數條。 The plurality of connecting wires 50 extending from the swing center shaft portion 23a toward the connecting shaft portion 23b pass through the inside of the arm 23. The plurality of connecting lines 50 may each be a line, or may be constituted by a plurality of line constituent elements connected to each other by a terminal. a plurality of connecting lines 50, including a pair of yin The back plate of the pole unit 22 supplies a power line 51 for high-frequency power, a gas pipe 52 for supplying a process gas to the periphery of the cathode unit 22, and a cooling water pipe 53 for supplying cooling water to the back plate. The number of the power supply line 51, the gas piping 52, and the cooling water piping 53 included in the connection line 50 may be one or plural.

電源線51,具有以形狀不改變的狀態下固定於擺動手臂23內部之剛體部51a、及收納在下部框體34內部的形狀可變的可撓部51b。剛體部51a包含:擺動剛體部51a1,其從擺動中心軸部23a的外側朝向下部框體34延伸,並連接於可撓部51b的一端;及連結剛體部51a2,其連接於可撓部51b的另一端,並從下部框體34朝向連結軸部23b的外側延伸。擺動剛體部51a1及連結剛體部51a2為中間剛體線的一例,可撓部51b為中間可撓線的一例。 The power supply line 51 has a rigid body portion 51a fixed to the inside of the swing arm 23 in a state in which the shape is not changed, and a flexible portion 51b that is variable in shape inside the lower housing 34. The rigid body portion 51a includes a rocking rigid body portion 51a1 that extends from the outer side of the swing center shaft portion 23a toward the lower frame body 34 and is connected to one end of the flexible portion 51b, and a rigid body portion 51a2 that is coupled to the flexible portion 51b. The other end extends from the lower frame 34 toward the outside of the connecting shaft portion 23b. The swing rigid body portion 51a1 and the connection rigid body portion 51a2 are examples of the intermediate rigid body line, and the flexible portion 51b is an example of the intermediate flexible line.

氣體配管52,具有呈現彎曲形狀的撓曲部52a;撓曲部52a位於下部框體34的內部。冷卻水配管53,具有呈現彎曲形狀的撓曲部53a;撓曲部53a位於下部框體34的內部。 The gas pipe 52 has a bent portion 52a that has a curved shape, and the bent portion 52a is located inside the lower frame 34. The cooling water pipe 53 has a bent portion 53a that has a curved shape, and the bent portion 53a is located inside the lower casing 34.

〔擺動手臂的伸縮機構〕 [Flexing mechanism of swinging arm]

參照第六圖及第七圖詳細說明擺動手臂23的伸縮機構40。 The telescopic mechanism 40 of the swing arm 23 will be described in detail with reference to the sixth and seventh figures.

如第六圖所示,伸縮機構40,具備引導筒部33及四支長桿41(第六圖僅顯示兩支長桿41)及,四個長桿引導部42。四支長桿41及四個長桿引導部42,位在與固定板32對應的四個角落。 As shown in the sixth figure, the telescopic mechanism 40 is provided with a guiding cylinder portion 33 and four long rods 41 (the sixth drawing shows only two long rods 41) and four long rod guiding portions 42. The four long rods 41 and the four long rod guides 42 are located at four corners corresponding to the fixed plate 32.

引導筒部33,具有形成圓筒狀並固定於固定板32的上部筒部33a、以及形成圓筒狀並固定於下部框體34的下部筒部33b。 The guiding cylinder portion 33 has an upper tubular portion 33a that is formed in a cylindrical shape and fixed to the fixed plate 32, and a lower tubular portion 33b that is formed in a cylindrical shape and is fixed to the lower casing 34.

引導筒部33,在高度方向上於上部筒部33a及下部筒部33b之間,具備 形成圓筒狀的伸縮軟管(bellows)33c。伸縮軟管33c,具有連接於上部筒部33a的一側筒端,以及連接於下部筒部33b的另一側筒端。伸縮軟管33c,於高度方向上,在從下部筒部33b往上部筒部33a的方向被賦予勢能。 The guiding cylinder portion 33 is provided between the upper tubular portion 33a and the lower tubular portion 33b in the height direction. A cylindrical bellows 33c is formed. The bellows 33c has a one side cylindrical end connected to the upper cylindrical portion 33a and the other side cylindrical end connected to the lower cylindrical portion 33b. The telescopic hose 33c is provided with potential energy in the height direction from the lower tubular portion 33b toward the upper tubular portion 33a.

如第六圖所示,在擺動手臂23與陰極單元22在運送方向上重疊時,擺動手臂23中的擺動中心軸部23a與支持連結軸部23b的連結軸支部23b1之間的距離成為最小。此時,伸縮機構40,配合擺動中心軸部23a與連結軸支部23b1間的距離,而縮短擺動手臂23中的擺動中心軸部23a與連結軸部23b之間的距離。亦即,伸縮機構40,使得擺動中心軸部23a與連結軸部23b之間的距離、即擺動手臂的長度L成為最小。 As shown in the sixth figure, when the swing arm 23 and the cathode unit 22 overlap in the transport direction, the distance between the swing center shaft portion 23a of the swing arm 23 and the joint shaft portion 23b1 of the support connecting shaft portion 23b is minimized. At this time, the telescopic mechanism 40 shortens the distance between the swing center shaft portion 23a and the connection shaft portion 23b in the swing arm 23 by the distance between the swing center shaft portion 23a and the joint shaft portion 23b1. That is, the telescopic mechanism 40 minimizes the distance between the swing center shaft portion 23a and the connection shaft portion 23b, that is, the length L of the swing arm.

此時,伸縮機構40中,伸縮軟管33c因為保守力而縮短,位在接近上部框體31側之各長桿41的上端部41a,移動至在高度方向上從固定板32的突出量成為最大的位置。藉此,各長桿41以及固定於伸縮軟管33c的下部筒部33b,與下部框體34一起在高度方向上移動至距離固定板32最近的位置。 At this time, in the telescopic mechanism 40, the telescopic hose 33c is shortened by the conservative force, and the upper end portion 41a of each of the long rods 41 on the side closer to the upper housing 31 is moved to the amount of protrusion from the fixed plate 32 in the height direction. The biggest location. Thereby, each of the long rods 41 and the lower cylindrical portion 33b fixed to the bellows 33c are moved in the height direction together with the lower frame body 34 to the position closest to the fixed plate 32.

接著,在擺動手臂23的內部,氣體配管52在撓曲部52a之撓曲量成為最大,冷卻水配管53在撓曲部53a的撓曲量亦成為最大。並進台22a在運送方向上的位置與擺動手臂23的擺動中心軸部23a在運送方向上的位置越接近,則兩個撓曲部52a、53a的個別的撓曲量就越大。 Then, in the swing arm 23, the amount of deflection of the gas pipe 52 in the flexure portion 52a is maximized, and the amount of deflection of the coolant pipe 53 in the flexure portion 53a is also maximized. The closer the position of the joining table 22a in the conveying direction is to the position of the swinging center shaft portion 23a of the swing arm 23 in the conveying direction, the larger the amount of deflection of the two flex portions 52a, 53a is.

如第七圖所示,並進台22a沿著軌道22b與連結軸部23b並進,在配置於軌道22b中的運送方向上的一端時,在運送方向上的擺動中心軸部23a及支持連結軸部23b的連結軸支部23b1之間的距離成為最大。此時,伸縮機構40,配合擺動中心軸部23a與連結軸支部23b1的距離,使得擺 動手臂23之中的擺動中心軸部23a與連結軸部23b之間的距離伸長。亦即,伸縮機構40,使擺動中心軸部23a與連結軸部23b間之距離即擺動手臂23的長度L成為最大。 As shown in the seventh figure, the parallel table 22a advances along the rail 22b and the connecting shaft portion 23b, and is disposed at one end in the transport direction of the rail 22b, and swings the central shaft portion 23a and the supporting connecting shaft portion in the transport direction. The distance between the connecting shaft branches 23b1 of 23b is the largest. At this time, the telescopic mechanism 40 is configured to match the distance between the swing center shaft portion 23a and the joint shaft portion 23b1. The distance between the swing center shaft portion 23a and the connecting shaft portion 23b in the movable arm 23 is elongated. That is, the telescopic mechanism 40 maximizes the distance L between the swing center shaft portion 23a and the connection shaft portion 23b, that is, the length L of the swing arm 23.

此時,伸縮機構40中,伸縮軟管33c與保守力反向延伸,各長桿41之上端部41a,移動至在高度方向上從固定板32的突出量成為最小的位置。藉此,各長桿41以及固定於伸縮軟管33c的下部筒部33b,與下部框體34一起在高度方向上移動至距離固定板32最遠的位置。 At this time, in the telescopic mechanism 40, the bellows 33c extends in the opposite direction to the conservative force, and the upper end portion 41a of each of the long rods 41 moves to a position where the amount of protrusion from the fixed plate 32 in the height direction is the smallest. Thereby, each of the long rods 41 and the lower cylindrical portion 33b fixed to the bellows 33c are moved in the height direction together with the lower frame body 34 to a position farthest from the fixed plate 32.

接著,在擺動手臂23的內部,氣體配管52在撓曲部52a之撓曲量成為最小,冷卻水配管53在撓曲部53a的撓曲量成為最小。並進台22a在運送方向上的位置與擺動手臂23的擺動中心軸部23a在運送方向上的位置越遠,則兩個撓曲部52a、53a個別的撓曲量就越小。 Then, the amount of deflection of the gas pipe 52 in the flexure portion 52a is minimized in the swing arm 23, and the amount of deflection of the cooling water pipe 53 in the flexure portion 53a is minimized. The further the position of the parallel table 22a in the transport direction and the position of the swing center shaft portion 23a of the swing arm 23 in the transport direction are, the smaller the amount of deflection of the two flex portions 52a, 53a is.

如此,擺動手臂23的伸縮機構40,對應與並進台22a並進之連結軸部23b的位置,亦即對應擺動手臂23的擺動中心軸部23a與連結軸支部23b1之間的距離,而改變擺動手臂23長度L。亦即,陰極單元22與並進台22a並進時,擺動手臂23的長度在擺動中心軸部23a與連結軸部23b間伸縮。換言之,擺動手臂23的伸縮機構40,在擺動中心軸部23a與連結軸部23b之間的距離,配合擺動中心軸部23a與連結軸支部23b1之間的距離而變化。因此,設在擺動手臂23的連結軸部23b,即可追隨並進台22a的移動。 In this manner, the telescopic mechanism 40 of the swing arm 23 changes the swing arm corresponding to the position of the joint shaft portion 23b that is parallel to the parallel table 22a, that is, the distance between the swing center shaft portion 23a of the swing arm 23 and the joint shaft portion 23b1. 23 length L. That is, when the cathode unit 22 and the parallel table 22a are advanced, the length of the swing arm 23 expands and contracts between the swing center shaft portion 23a and the connecting shaft portion 23b. In other words, the distance between the swing center shaft portion 23a and the connection shaft portion 23b of the expansion/contraction mechanism 40 of the swing arm 23 changes in accordance with the distance between the swing center shaft portion 23a and the connection shaft branch portion 23b1. Therefore, the connection shaft portion 23b of the swing arm 23 can follow the movement of the parallel table 22a.

〔電源線的構成〕 [Construction of power cord]

參照第八圖及第九圖詳細說明電源線51之構成。此外,第八圖係顯示擺動手臂23的長度L最小時之電源線51的狀態,另一方面,第九圖係顯示擺動手臂23的長度L最大時之電源線51的狀態。 The configuration of the power supply line 51 will be described in detail with reference to the eighth and ninth drawings. Further, the eighth diagram shows the state of the power supply line 51 when the length L of the swing arm 23 is the smallest, and the ninth diagram shows the state of the power supply line 51 when the length L of the swing arm 23 is the largest.

如第八圖所示,電源線51係由複數的構成元件所構成,複數的構成元件包含擺動剛體部51a1、可撓部51b以及連結剛體部51a2。擺動剛體部51a1,形成從擺動中心軸部23a朝向下部框體34延伸之帶狀,形成擺動剛體部51a1之材料的主要成分為例如銅。擺動剛體部51a1的兩個端部中,一端部與配置於擺動手臂23外部的電源線連接,另一端部則與擺動手臂23內部的可撓部51b連接。 As shown in the eighth diagram, the power supply line 51 is composed of a plurality of constituent elements, and the plurality of constituent elements include a rocking rigid body portion 51a1, a flexible portion 51b, and a connecting rigid body portion 51a2. The rocking rigid body portion 51a1 is formed in a strip shape extending from the swing center shaft portion 23a toward the lower frame body 34, and the main component of the material forming the rocking rigid body portion 51a1 is, for example, copper. Of the two end portions of the swing rigid body portion 51a1, one end portion is connected to a power supply line disposed outside the swing arm 23, and the other end portion is connected to the flexible portion 51b inside the swing arm 23.

擺動剛體部51a1通過引導筒部33的內部,擺動剛體部51a1的另一端部,從下部框體34的下部開口部34b,朝向下部框體34的底部突出。圖中雖未顯示,但擺動剛體部51a1,從擺動中心軸部23a朝向下部框體34延伸的途中,被固定於擺動手臂23的上部框體31之內部或是上部筒部33a的內部。 The swinging rigid body portion 51a1 passes through the inside of the guide tubular portion 33, and oscillates the other end portion of the rigid body portion 51a1, and protrudes from the lower opening portion 34b of the lower casing 34 toward the bottom portion of the lower casing 34. Although not shown in the figure, the swinging rigid body portion 51a1 is fixed to the inside of the upper casing 31 of the swing arm 23 or the inside of the upper tubular portion 33a from the middle of the swing center shaft portion 23a toward the lower casing 34.

連結剛體部51a2,形成由下部框體34往連結軸部23b延伸之帶狀,形成連結剛體部51a2的材料主要成分為例如銅。連結剛體部51a2的兩個端部之中,一端部與擺動手臂23的內部之可撓部51b連接,另一端部則與配置於擺動手臂23外部的電源線連接。圖中雖未顯示,連結剛體部51a2,在從下部框體34往連結軸部23b延伸的途中,被固定在擺動手臂23內部。在伸縮機構40配合擺動手臂23的擺動而使擺動手臂23伸縮時,可撓部51b,使擺動剛體部51a1與連結剛體部51a2之間的距離伸縮。 The rigid body portion 51a2 is connected to form a strip shape in which the lower frame body 34 extends toward the connecting shaft portion 23b, and the main component of the material that connects the rigid body portion 51a2 is, for example, copper. Among the two end portions of the rigid body portion 51a2, one end portion is connected to the flexible portion 51b inside the swing arm 23, and the other end portion is connected to a power supply line disposed outside the swing arm 23. Although not shown in the drawing, the rigid body portion 51a2 is coupled to the inside of the swing arm 23 in the middle of extending from the lower frame body 34 to the connecting shaft portion 23b. When the expansion/contraction mechanism 40 engages the swing of the swing arm 23 to expand and contract the swing arm 23, the flexible portion 51b expands and contracts the distance between the swing rigid body portion 51a1 and the rigid body portion 51a2.

可撓部51b,配置於下部框體34內部,其形成兩個端部之中,一端部與擺動剛體部51a1連接,而另一端部與連結剛體部51a2連接的帶狀。可撓部51b,係由例如,以複數的銅線編成帶狀的平編銅線所構成,而具有可撓曲性。可撓部51b,具有因自身重量而撓曲的彎曲部51b1。 The flexible portion 51b is disposed inside the lower casing 34, and is formed to have two end portions, one end portion of which is connected to the swing rigid body portion 51a1, and the other end portion of which is connected to the rigid body portion 51a2. The flexible portion 51b is made of, for example, a flat copper wire braided in a plurality of copper wires, and has flexibility. The flexible portion 51b has a curved portion 51b1 that is deflected by its own weight.

如第八圖所示,擺動手臂23的長度L最小時,伸縮軟管33c收縮的程度最大,而下部框體34最接近上部框體31(參照第六圖)。因此,擺動剛體部51a1與可撓部51b的連接部分,最接近下部框體34的底壁。又,擺動剛體部51a1與連結剛體部51a2之間的距離成為最小。因此,可撓部51b,以從連接於擺動剛體部51a1之可撓部51b的一端到彎曲部51b1的距離與連接至連結剛體部51a2之可撓部51b的另一端到彎曲部51b1的距離大致相等的方式進行變形。亦即,可撓部51b的撓曲量成為最大。 As shown in the eighth figure, when the length L of the swing arm 23 is the smallest, the degree of contraction of the bellows 33c is the largest, and the lower frame 34 is closest to the upper frame 31 (refer to the sixth drawing). Therefore, the connecting portion of the swiveling rigid body portion 51a1 and the flexible portion 51b is closest to the bottom wall of the lower casing 34. Further, the distance between the rocking rigid body portion 51a1 and the connecting rigid body portion 51a2 is minimized. Therefore, the flexible portion 51b has a distance from the end connected to the flexible portion 51b of the swing rigid body portion 51a1 to the curved portion 51b1 and the other end connected to the flexible portion 51b of the rigid body portion 51a2 to the curved portion 51b1. Transform in an equal way. That is, the amount of deflection of the flexible portion 51b is maximized.

另一方面,如第九圖所示,在擺動手臂23的長度L最大時,伸縮軟管33c伸長,而下部框體34最遠離上部框體31(參照第七圖)。因此,擺動剛體部51a1與可撓部51b的連接部分,最接近下部框體34的上壁。又,擺動剛體部51a1與連結剛體部51a2之間的距離成為最大。藉此,可撓部51b,以連接於擺動剛體部51a1之可撓部51b的一端到彎曲部51b1的距離成為最大,而連接於連結剛體部51a2之可撓部51b的另一端到彎曲部51b1的距離成為最小的方式進行變形。亦即,可撓部51b的撓曲量成為最小。 On the other hand, as shown in the ninth figure, when the length L of the swing arm 23 is the largest, the bellows 33c is extended, and the lower frame 34 is farthest from the upper frame 31 (refer to the seventh drawing). Therefore, the connecting portion of the swiveling rigid body portion 51a1 and the flexible portion 51b is closest to the upper wall of the lower casing 34. Moreover, the distance between the rocking rigid body portion 51a1 and the connecting rigid body portion 51a2 is maximized. Thereby, the flexible portion 51b is connected to the other end of the flexible portion 51b of the rigid body portion 51a2 to the curved portion 51b1 by connecting the one end of the flexible portion 51b connected to the swinging rigid portion 51a1 to the curved portion 51b1 to the maximum. The distance becomes the smallest way to deform. That is, the amount of deflection of the flexible portion 51b is minimized.

如此,擺動手臂23在伸縮時,可撓部51b的撓曲量在擺動剛體部51a1與連結剛體部51a2之間改變。因此,通過擺動手臂23內部的電源線51之長度與擺動手臂23之長度的差值變化,會因為可撓部51b的撓曲量之變化而被吸收。於是,在擺動手臂23內部與外部之間進出之電源線51的長度變短。 As described above, when the swing arm 23 is stretched and contracted, the amount of deflection of the flexible portion 51b changes between the swiveling rigid body portion 51a1 and the connecting rigid body portion 51a2. Therefore, the difference in the length of the power supply line 51 inside the swing arm 23 and the length of the swing arm 23 is absorbed by the change in the amount of deflection of the flexible portion 51b. Thus, the length of the power supply line 51 that enters and exits between the inside and the outside of the swing arm 23 becomes short.

如以上所說明,根據第二實施形態的濺鍍裝置,可得到以下列舉之效果。 As described above, according to the sputtering apparatus of the second embodiment, the effects listed below can be obtained.

(2)在並進台22a與連結軸部23b並進時,擺動手臂23的伸縮機構40,, 配合擺動中心軸部23a與連結軸支部23b1之間的距離,使擺動中心軸部23a與連結軸部23b之間的距離變化。因此,設於擺動手臂23之連結軸部23b,可追隨並進台22a的移動。 (2) When the parallel table 22a and the connecting shaft portion 23b are advanced, the telescopic mechanism 40 of the arm 23 is swung, The distance between the swing center shaft portion 23a and the connection shaft portion 23b is changed in accordance with the distance between the swing center shaft portion 23a and the joint shaft portion 23b1. Therefore, the connection shaft portion 23b provided in the swing arm 23 can follow the movement of the parallel table 22a.

(3)在擺動手臂23伸縮時,連結於擺動剛體部51a1與連結剛體部51a2之間的可撓部51b其撓曲量會改變。因此,可藉由可撓部51b的撓曲量變化吸收通過擺動手臂23內部之電源線51之長度與擺動手臂23之長度的差值變化。於是,在擺動手臂23內部與外部之間進出之電源線51的長度變短。 (3) When the swing arm 23 expands and contracts, the amount of deflection of the flexible portion 51b connected between the swing rigid body portion 51a1 and the coupled rigid body portion 51a2 changes. Therefore, the change in the difference between the length of the power supply line 51 passing through the inside of the swing arm 23 and the length of the swing arm 23 can be absorbed by the change in the amount of deflection of the flexible portion 51b. Thus, the length of the power supply line 51 that enters and exits between the inside and the outside of the swing arm 23 becomes short.

此外,第二實施形態,亦可如以下所述,進行適當變更。 Further, the second embodiment can be appropriately changed as described below.

‧氣體配管52的撓曲部52a以及冷卻水配管53的撓曲部53a,可分別不為「在氣體配管52及冷卻水配管53分別具有彎曲形狀之部位」的態樣而被具體化,其可為例如,「在連接線具有螺旋形狀之部分」的態樣而具體化。此外,螺旋形狀可為二維的螺旋形狀,亦可為三維的螺旋形狀。 The flexure portion 52a of the gas pipe 52 and the flexure portion 53a of the cooling water pipe 53 can be embodied in a state in which the gas pipe 52 and the cooling water pipe 53 have curved portions, respectively. For example, it can be embodied in the aspect of "the portion in which the connecting wire has a spiral shape". Further, the spiral shape may be a two-dimensional spiral shape or a three-dimensional spiral shape.

‧電源線51的構成亦可應用於連接線50所包含的其他配線,例如,氣體配管52以及冷卻水配管53中的至少一種。 The configuration of the power supply line 51 can be applied to at least one of the other wirings included in the connection line 50, for example, the gas piping 52 and the cooling water piping 53.

‧濺鍍裝置,亦可為將第一實施形態所記載之構成與第二實施形態所記載之構成組合的構成而具體化。只要根據此結構,即可將濺鍍裝置具體化,以作為兼具第一實施形態之效果與第二實施形態之效果兩者的構成。 ‧ The sputtering apparatus may be embodied by a combination of the configuration described in the first embodiment and the configuration described in the second embodiment. According to this configuration, the sputtering apparatus can be embodied as a configuration that combines both the effects of the first embodiment and the effects of the second embodiment.

‧擺動手臂23,亦可不具備伸縮機構40。此情況下,引導筒部33,亦可作為一個圓筒狀的筒部而具體化。接著,例如,為了抑制連結軸部23b與連結軸部23b的連接端、即並進台22a之間的距離變大,亦可在擺動中心軸部23a與框體21之間,具備連結構件(例如彈簧等伸縮材料),其可 使擺動中心軸部23a與框體21之間的距離隨著陰極單元22並進而變大。即使係這樣的結構,只要擺動手臂23以擺動中心軸部23a為中心擺動,即可得到等同於上述(1)的效果。 ‧ Swing arm 23 may not have telescopic mechanism 40. In this case, the guiding cylinder portion 33 may be embodied as a cylindrical tubular portion. Then, for example, in order to suppress a large distance between the connection end of the connection shaft portion 23b and the connection shaft portion 23b, that is, between the insertion table 22a, a connection member may be provided between the swing center shaft portion 23a and the frame body 21 (for example). Spring and other flexible materials), which can The distance between the swing center shaft portion 23a and the frame 21 is made larger with the cathode unit 22. Even in such a configuration, as long as the swing arm 23 swings around the swing center shaft portion 23a, an effect equivalent to the above (1) can be obtained.

‧擺動手臂23,亦可不具備伸縮機構40,而係具備例如連接構件,其因連結軸部23b與連結軸部23b之連接端、即並進台22a之間的距離越大,而越在連結軸部23b與並進台22a之間延伸(例如彈簧等伸縮材料)。此外,此情況下,引導筒部33,亦可具體化以作為一個圓筒狀的筒部。即使係這樣的構成,只要擺動手臂23以擺動中心軸部23a為中心擺動,即可得到等同於上述(1)的效果。 The swinging arm 23 may be provided with, for example, a connecting member, and the distance between the connecting end of the connecting shaft portion 23b and the connecting shaft portion 23b, that is, the distance between the joining stages 22a, and the connecting shaft The portion 23b extends between the parallel table 22a (for example, a stretchable material such as a spring). Further, in this case, the guiding cylinder portion 33 may be embodied as a cylindrical tubular portion. Even in such a configuration, as long as the swing arm 23 swings around the swing center shaft portion 23a, an effect equivalent to the above (1) can be obtained.

‧擺動手臂23,亦可不具備伸縮機構40,只要連結軸部23b與並進台22a之間,以及擺動中心軸部23a與框體21之間,分別包含上述連接構件(例如彈簧等伸縮材料)即可。此外,此情況下,引導筒部33,亦可具體化以作為一個圓筒狀的筒部。即使係這樣的構成,只要擺動手臂23以擺動中心軸部23a為中心擺動,就可得到等同於上述(1)之效果。 The swing arm 23 may not include the expansion/contraction mechanism 40, and may include the connection member (for example, a stretchable material such as a spring) between the connection shaft portion 23b and the entrance table 22a, and between the swing center shaft portion 23a and the frame body 21, respectively. can. Further, in this case, the guiding cylinder portion 33 may be embodied as a cylindrical tubular portion. Even in such a configuration, as long as the swing arm 23 swings around the swing center shaft portion 23a, the effect equivalent to the above (1) can be obtained.

‧電源線51,可不僅包含導體,亦可包含位在兩個導體之間的絕緣體、即端子台,以作為電源線51的構成元件。例如,亦可在擺動剛體部51a1與可撓部51b之間設置「在擺動剛體部51a1與可撓部51b電性連接的狀態下支持該等元件」的端子台,亦可在連結剛體部51a2與可撓部51b之間設置「在連結剛體部51a2與可撓部51b電性連接的狀態下支持該等元件」的端子台。 The power supply line 51 may include not only a conductor but also an insulator located between the two conductors, that is, a terminal block, as a constituent element of the power supply line 51. For example, a terminal block that supports the elements in a state where the oscillating rigid body portion 51a1 and the flexible portion 51b are electrically connected to each other may be provided between the oscillating rigid body portion 51a1 and the flexible portion 51b, or the rigid body portion 51a2 may be coupled to the rigid body portion 51a2. A terminal block that "supports the elements in a state in which the rigid body portion 51a2 and the flexible portion 51b are electrically connected" is provided between the flexible portion 51b.

〔第三實施形態〕 [Third embodiment]

參照第十圖到第十三圖,說明以基板處理裝置及成膜裝置作 為濺鍍裝置而具體化的第三實施形態。第三實施形態之濺鍍裝置,其特徵為包含安裝於擺動手臂23之擺動中心軸部23a的電源線,以及安裝於擺動手臂23之連結軸部23b之電源線。因此,以下說明該等構成。此外,第十圖至第十三圖中,顯示具有兩條電源線51的濺鍍裝置的一例。 Referring to the tenth to thirteenth drawings, the substrate processing apparatus and the film forming apparatus are described. A third embodiment embodied in a sputtering apparatus. The sputtering apparatus according to the third embodiment is characterized in that it includes a power supply line attached to the swing center shaft portion 23a of the swing arm 23, and a power supply line attached to the connection shaft portion 23b of the swing arm 23. Therefore, the configurations will be described below. Further, in the tenth to thirteenth drawings, an example of a sputtering apparatus having two power supply lines 51 is shown.

〔擺動中心軸部之電源線〕 [Power cord for swinging the center shaft section]

參照第十圖及第十一圖,說明安裝在擺動中心軸部23a之電源線51。此外,第十圖顯示電源線51在擺動手臂23的長度L最小時的狀態,另一方面,第十一圖顯示電源線51在擺動手臂23的長度L最大時的狀態。 The power supply line 51 attached to the swing center shaft portion 23a will be described with reference to the tenth and eleventh drawings. Further, the tenth diagram shows a state in which the power cord 51 has the smallest length L of the swing arm 23, and on the other hand, the eleventh diagram shows a state in which the power cord 51 has the largest length L of the swing arm 23.

如第十圖所示,電源線51包含第一電源線51A與第二電源線51B,第一電源線51A與第二電源線51B,相對於通過擺動軸P而在高度方向上延伸的假想平面,形成相互面對稱的態樣。構成各電源線51的擺動剛體部51a1分別形成帶狀,並在從沿著面對方向延伸之擺動中心軸部23a的內周面離開的狀態下,從上部框體31的內部朝向擺動中心軸部23a的筒端延伸。亦即,各擺動剛體部51a1之中,因為通過擺動中心軸部23a的部分沿著擺動軸P延伸,故可抑制伴隨擺動手臂23的擺動所造成的變形。各擺動剛體部51a1的端部,於擺動中心軸部23a的筒端,透過絕緣物而固定在擺動中心軸部23a的端面上。擺動中心軸部23a為基端旋轉部的一例,擺動剛體部51a1為基端旋轉配線的一例。 As shown in the tenth diagram, the power supply line 51 includes a first power supply line 51A and a second power supply line 51B, and the first power supply line 51A and the second power supply line 51B are opposite to the imaginary plane extending in the height direction by the swing axis P. Forming a mutually symmetrical pattern. Each of the oscillating rigid body portions 51a1 constituting each of the power supply lines 51 is formed in a strip shape, and is separated from the inside of the upper housing 31 toward the oscillating central axis in a state of being separated from the inner peripheral surface of the oscillating central shaft portion 23a extending in the facing direction. The barrel end of the portion 23a extends. In other words, in each of the swing rigid body portions 51a1, since the portion passing through the swing center shaft portion 23a extends along the swing axis P, deformation due to the swing of the swing arm 23 can be suppressed. The end portion of each of the oscillating rigid body portions 51a1 is fixed to the end surface of the oscillating center shaft portion 23a through the insulator at the cylindrical end of the oscillating center shaft portion 23a. The swing center shaft portion 23a is an example of a base end rotation portion, and the swing rigid body portion 51a1 is an example of a base end rotation wiring.

第一電源線51A及第二電源線51B,分別具有擺動固定部61,其透過絕緣物被固定於濺鍍腔室13的壁部上(例如,固定於擺動凸緣23a2之框體21的壁部),並與其他電源線連接。擺動固定部61為基端固定配線的一例。 The first power source line 51A and the second power source line 51B each have a swing fixing portion 61 that is fixed to the wall portion of the sputtering chamber 13 through an insulator (for example, a wall of the frame body 21 fixed to the swing flange 23a2). And connected to other power cords. The swing fixing portion 61 is an example of a base end fixing wiring.

第一電源線51A及第二電源線51B,分別具有擺動可撓部62,其與擺動剛體部51a1的端部及擺動固定部61連接的。各擺動可撓部62,形成沿著運送方向延伸的略圓弧狀,其係由例如,具有可撓曲性的平編銅線所構成。擺動可撓部62,具有彎曲部62a,其在高度方向上,因自身重量而往下部框體34的方向撓曲。因應擺動剛體部51a1的端部與擺動固定部61之間的距離而變形的擺動可撓部62上所形成的彎曲部62a之長度,相當於彎曲部62a的撓曲量。擺動可撓部62為基端可撓線的一例。 The first power source line 51A and the second power source line 51B each have a swingable flexible portion 62 that is connected to an end portion of the swinging rigid body portion 51a1 and the swing fixing portion 61. Each of the swingable flexible portions 62 is formed in a slightly arc shape extending in the transport direction, and is formed of, for example, a flexible copper wire having flexibility. The swingable flexible portion 62 has a curved portion 62a that is deflected in the direction of the lower frame 34 by its own weight in the height direction. The length of the curved portion 62a formed on the swingable flexible portion 62 deformed by the distance between the end portion of the swinging rigid body portion 51a1 and the swinging fixed portion 61 corresponds to the amount of deflection of the curved portion 62a. The swing flexible portion 62 is an example of a base end flexible line.

如第十圖所示,擺動手臂23的長度L為最小時,各擺動可撓部62,以在運送方向上從擺動剛體部51a1到彎曲部62a的距離與從擺動固定部61到彎曲部62a的距離大致相等的方式進行變形。亦即,擺動剛體部51a1的端部與擺動固定部61之間的距離成為最小時,各彎曲部62a的撓曲量成為最大。 As shown in the tenth diagram, when the length L of the swing arm 23 is the smallest, each of the swing flexible portions 62 has a distance from the swing rigid body portion 51a1 to the curved portion 62a in the transport direction and from the swing fixing portion 61 to the curved portion 62a. The distance is deformed in a roughly equal way. In other words, when the distance between the end portion of the swing rigid body portion 51a1 and the swing fixing portion 61 is the smallest, the amount of deflection of each curved portion 62a is maximized.

如第十一圖所示,擺動手臂23的長度L成為最大時,擺動中心軸部23a以擺動軸P為中心而擺動。例如,擺動中心軸部23a在紙面上向左旋轉時,在第一電源線51A之擺動剛體部51a1的端部,沿著擺動中心軸部23a的圓周方向往下方移動。另一方面,在第二電源線51B上的擺動剛體部51a1的端部,沿著擺動中心軸部23a的圓周方向往上方移動。因此,擺動剛體部51a1的端部與擺動固定部61之間的距離變大,各彎曲部62a的撓曲量則變小。 As shown in the eleventh diagram, when the length L of the swing arm 23 is maximized, the swing center shaft portion 23a swings around the swing axis P. For example, when the swing center shaft portion 23a is rotated to the left on the paper surface, the end portion of the swinging rigid body portion 51a1 of the first power source line 51A moves downward along the circumferential direction of the swing center shaft portion 23a. On the other hand, the end portion of the rocking rigid body portion 51a1 on the second power source line 51B moves upward in the circumferential direction of the swing center shaft portion 23a. Therefore, the distance between the end portion of the swing rigid body portion 51a1 and the swing fixing portion 61 is increased, and the amount of deflection of each curved portion 62a is reduced.

如此,由於抑制了因擺動中心軸部23a的旋轉而造成的電源線51扭曲,故可減少電源線51所承受的機械性負載。 Thus, since the twisting of the power supply line 51 due to the rotation of the swing center shaft portion 23a is suppressed, the mechanical load on the power supply line 51 can be reduced.

〔連結軸部的電源線〕 [Connecting the power cord of the shaft]

參照第十二圖及第十三圖說明安裝於連結軸部23b之電源線51。此 外,第十二圖係顯示電源線51在擺動手臂23的長度L為最小時的狀態,另一方面,第十三圖係顯示電源線51在擺動手臂23的長度L為最大時的狀態。 The power supply line 51 attached to the connecting shaft portion 23b will be described with reference to the twelfth and thirteenth drawings. this Further, the twelfth diagram shows a state in which the power cord 51 has the minimum length L of the swing arm 23, and on the other hand, the thirteenth diagram shows a state in which the power cord 51 has the maximum length L of the swing arm 23.

如第十二圖所示,構成各電源線51之連結剛體部51a2分別形成帶狀,並在從沿著面對方向延伸的連結軸部23b之內周面離開的狀態下,從下部框體34的內部朝向連結軸部23b的筒端延伸。亦即,各連結剛體部51a2之中,因為通過連結軸部23b的部分沿著旋轉軸A延伸,故可抑制其隨著擺動手臂23的擺動所造成的變形。各連結剛體部51a2,於連結軸部23b的筒端,透過絕緣物而固定在連結軸部23b的端面上。連結軸部23b為前端旋轉部的一例,連結剛體部51a2為前端旋轉配線的一例。 As shown in Fig. 12, the connecting rigid body portions 51a2 constituting the respective power supply lines 51 are formed in a strip shape, respectively, and are separated from the inner peripheral surface of the connecting shaft portion 23b extending in the facing direction, from the lower casing. The inside of the 34 extends toward the cylindrical end of the connecting shaft portion 23b. In other words, in each of the connected rigid body portions 51a2, since the portion passing through the connecting shaft portion 23b extends along the rotation axis A, deformation due to the swinging of the swing arm 23 can be suppressed. Each of the connected rigid body portions 51a2 is fixed to the end surface of the connecting shaft portion 23b via an insulator at the cylindrical end of the connecting shaft portion 23b. The connection shaft portion 23b is an example of a distal end rotation portion, and the connection rigid body portion 51a2 is an example of a front end rotation wiring.

第一電源線51A及第二電源線51B,分別具有連結並進部71,其追隨陰極單元22及連結軸部23b的並進而並進。連結並進部71,透過絕緣部固定於並進台22a的一側面上(例如,固定於連結軸支部23b1之並進台22a之側壁的內側面),並連接於其他電源線上。連結並進部71為前端並進配線的一例。 Each of the first power source line 51A and the second power source line 51B has a connection parallel portion 71 that follows the cathode unit 22 and the connection shaft portion 23b and further advances. The connecting portion 71 is fixed to one side surface of the joining table 22a (for example, fixed to the inner side surface of the side wall of the joining shaft portion 23b1 and joined to the side wall 22a) through the insulating portion, and is connected to the other power source line. The connection advancing portion 71 is an example of a front end and a wiring.

第一電源線51A及第二電源線51B,分別具有連結可撓部72,其連接於連結剛體部51a2的端部與連結並進部71。各連結可撓部72,從連結剛體部51a2的端部沿著高度方向往下方延伸,並在途中折返,而向上沿著高度方向延伸到連結並進部71為止。各連結可撓部72,具有折返部72a,其因為自身重量而沿著高度方向撓曲至連結並進部71的更下方。因應連結剛體部51a2的端部與連結並進部71之間的距離而變形的連結可撓部72,其上所形成之折返部72a的長度(亦即,在高度方向上比連結並進部71更下方的折返部72a的長度),相當於折返部72a的撓曲量。各連結可撓部72, 係以例如,具有可撓性之平編銅線而構成。連結可撓部72為前端可撓線的一例。 Each of the first power source line 51A and the second power source line 51B has a connection flexible portion 72 that is connected to an end portion of the connection rigid body portion 51a2 and a connection parallel portion 71. Each of the connecting flexible portions 72 extends downward from the end portion connecting the rigid body portions 51a2 in the height direction, and is folded back in the middle, and extends upward in the height direction until the joining portion 71 is joined. Each of the connecting flexible portions 72 has a folded portion 72a which is bent in the height direction due to its own weight to be further below the joining portion 71. The length of the folded portion 72a formed on the connecting flexible portion 72 which is deformed by the distance between the end portion of the rigid body portion 51a2 and the connecting parallel portion 71 (that is, the height in the direction of the connecting portion 71 is greater than the connecting portion 71) The length of the lower folded portion 72a corresponds to the amount of deflection of the folded portion 72a. Each of the flexible portions 72, For example, it is constructed of a flexible copper wire having flexibility. The connection flexible portion 72 is an example of a front end flexible line.

如第十二圖所示,擺動手臂23的長度L為最小時,第一電源線51A的折返部72a之撓曲量,與第二電源線51B的折返部72a之撓曲量相等。 As shown in Fig. 12, when the length L of the swing arm 23 is the smallest, the amount of deflection of the folded portion 72a of the first power source line 51A is equal to the amount of deflection of the folded portion 72a of the second power source line 51B.

如第十三圖所示,擺動手臂23的長度L成為最大時,連結軸部23b以旋轉軸A為中心相對於並進台22a而旋轉。例如,在連結軸部23b在紙面上向右擺動時,在第一電源線51A中的連結剛體部51a2的端部,沿著連結軸部23b的圓周方向往下方移動,在第二電源線51B中的連結剛體部51a2的端部,沿著連結軸部23b的圓周方向往上方移動。因此,在第一電源線51A中,連結剛體部51a2的端部與連結並進部71之間的距離變小,另一方面,在第二電源線51B中,連結剛體部51a2的端部與連結並進部71之間的距離則變大。因此,在第一電源線51A中,連結可撓部72之撓曲量變大,另一方面,第二電源線51B中,連結可撓部72之撓曲量則變小。 As shown in the thirteenth diagram, when the length L of the swing arm 23 is the maximum, the connecting shaft portion 23b rotates with respect to the parallel table 22a around the rotation axis A. For example, when the connecting shaft portion 23b swings to the right on the paper surface, the end portion of the first power source line 51A that connects the rigid body portion 51a2 moves downward in the circumferential direction of the connecting shaft portion 23b, and is on the second power source line 51B. The end portion of the connected rigid body portion 51a2 moves upward in the circumferential direction of the connecting shaft portion 23b. Therefore, in the first power source line 51A, the distance between the end portion connecting the rigid body portion 51a2 and the connection advancing portion 71 is reduced, and on the other hand, the end portion and the connection portion of the rigid body portion 51a2 are connected to the second power source line 51B. The distance between the parallel portions 71 becomes larger. Therefore, in the first power source line 51A, the amount of deflection of the connection flexible portion 72 is increased, and on the other hand, the amount of deflection of the connection flexible portion 72 in the second power source line 51B is small.

如此,因為抑制了因連結軸部23b的旋轉而造成的電源線51扭曲,故可減少電源線51所承受的機械性負載。 In this way, since the twisting of the power supply line 51 due to the rotation of the connecting shaft portion 23b is suppressed, the mechanical load on the power supply line 51 can be reduced.

如以上所說明,根據第三實施形態之濺鍍裝置,可得到以下列舉之效果。 As described above, according to the sputtering apparatus of the third embodiment, the effects listed below can be obtained.

(4)因為分別抑制了擺動中心軸部23a的旋轉所造成的第一電源線51A及第二電源線51B的扭曲,故可減少第一電源線51A及第二電源線51B分別承受的機械性負載。 (4) Since the distortion of the first power source line 51A and the second power source line 51B caused by the rotation of the swing center shaft portion 23a is suppressed, the mechanical properties of the first power source line 51A and the second power source line 51B can be reduced, respectively. load.

(5)因為分別抑制了連結軸部23b的旋轉所造成的第一電源線51A及第二電源線51B的扭曲,故可減少第一電源線51A及第二電源線51B 其分別受到的機械性負載。 (5) Since the distortion of the first power source line 51A and the second power source line 51B caused by the rotation of the connection shaft portion 23b is suppressed, the first power source line 51A and the second power source line 51B can be reduced. They are each subjected to a mechanical load.

此外,第三實施形態,亦可如以下進行適當的變化。 Further, the third embodiment can be appropriately changed as follows.

‧第一電源線51A及第二電源線51B,亦可分別為不具備連結可撓部72的構成,亦可為連結剛體部51a2分別連接於連結並進部71的構成。即使係這樣的構成,只要係第一電源線51A及第二電源線51B分別具備擺動可撓部62的構成,即可得到等同於上述(4)之效果。 The first power supply line 51A and the second power supply line 51B may be configured not to connect the flexible portion 72, or may be configured such that the connected rigid body portion 51a2 is connected to the connection parallel portion 71. Even in such a configuration, as long as the first power supply line 51A and the second power supply line 51B are provided with the swingable flexible portion 62, an effect equivalent to the above (4) can be obtained.

‧第一電源線51A及第二電源線51B亦可分別為不具備擺動可撓部62的構成,而為擺動剛體部51a1分別連接於擺動固定部61的構成。即使係這樣的結構,只要係第一電源線51A及第二電源線51B分別具備連結可撓部72的構成,即可得到等同於上述(5)的效果。 The first power supply line 51A and the second power supply line 51B may have a configuration in which the swingable flexible portion 62 is not provided, and the swing rigid body portion 51a1 is connected to the swing fixed portion 61, respectively. Even in such a configuration, as long as the first power supply line 51A and the second power supply line 51B have the configuration in which the flexible portion 72 is connected, an effect equivalent to the above (5) can be obtained.

‧形成以擺動軸P為中心之環狀而連接於共用設備的端子(以下稱為共用設備連接端子),亦可透過絕緣物而被安裝於擺動手臂23的擺動中心軸部23a之端面上。接著,該結構亦可為下述構成:在連接線50的兩個端部之中,接近擺動中心軸部23a的一端,在能夠沿著共用設備連接端子之圓周方向移動的狀態下連結於共用設備連接端子的構成。只要根據此構成,即可抑制連接於共用設備連接端子之連接線50的端部,隨著擺動手臂23的擺動而產生變形的情況。 ‧ A terminal (hereinafter referred to as a common device connection terminal) that is connected to the common device by a ring shape around the swing axis P is formed, and may be attached to the end surface of the swing center shaft portion 23a of the swing arm 23 through the insulator. Then, the configuration may be such that one end of the two ends of the connecting wire 50 that is close to the swing center shaft portion 23a is connected to the common state while being movable in the circumferential direction of the common device connecting terminal. The structure of the device connection terminal. According to this configuration, it is possible to suppress the end portion of the connecting wire 50 connected to the connection terminal of the common device and to be deformed by the swing of the swing arm 23.

‧形成以旋轉軸A為中心之環狀並連接於配置在框體21內部的陰極單元22之端子(以下稱陰極單元連接端子),亦可透過絕緣物而被安裝於擺動手臂23之連結軸部23b的端面上。接著,該構成亦可為下述構成:在連接線50的兩個端部之中,接近連結軸部23b的端部,在能夠沿著陰極單元連接端子之圓周方向移動的狀態下,連結於陰極單元連接端子的構成。只 要根據此構成,即可抑制連接於陰極單元連接端子之連接線50的一端,隨著擺動手臂23的擺動而產生變形的情況。 ‧ A terminal (hereinafter referred to as a cathode unit connection terminal) that is connected to the cathode unit 22 disposed inside the casing 21 in a ring shape around the rotation axis A, and is connected to the connection shaft of the swing arm 23 via an insulator On the end face of the portion 23b. In the configuration, the end portion of the connecting shaft portion 23b that is close to the connecting shaft portion 23b can be connected to the cathode unit connecting terminal in the circumferential direction. The configuration of the cathode unit connection terminal. only According to this configuration, it is possible to suppress the deformation of one end of the connecting wire 50 connected to the connection terminal of the cathode unit, as the swinging arm 23 swings.

‧第一電源線51A及第二電源線51B,亦可分別不僅包含導體,而包含位於兩個導體之間的絕緣體、即端子台,以作為構成元件。或是,第一電源線51A及第二電源線51B,亦可分別包含位於構成元件所包含之一個導體與位於框體21外部的電源之間的絕緣體、即端子台。 The first power supply line 51A and the second power supply line 51B may include not only a conductor but also an insulator located between the two conductors, that is, a terminal block, as a constituent element. Alternatively, the first power source line 51A and the second power source line 51B may respectively include an insulator, that is, a terminal block, between one of the conductors included in the constituent elements and a power source located outside the casing 21.

‧第一電源線51A及第二電源線51B的構成,亦可不應用於電源線51,而是應用於連接線50所包含之其他配線、即氣體配管52或冷卻水配管53。 The configuration of the first power source line 51A and the second power source line 51B may be applied not to the power source line 51 but to other wirings included in the connection line 50, that is, the gas piping 52 or the cooling water piping 53.

‧濺鍍裝置,亦可具體化以作為將第一實施形態中所記載之構成與第三實施形態中所記載之構成組合的構成。只要根據這樣的構成,即可作為雙方面具有第一實施形態之效果及第三實施形態之效果的構成,而將濺鍍裝置具體化。 ‧ The sputtering apparatus may be embodied as a combination of the configuration described in the first embodiment and the configuration described in the third embodiment. According to such a configuration, the sputtering apparatus can be embodied as a configuration having both the effects of the first embodiment and the effects of the third embodiment.

‧濺鍍裝置,亦可具體化以作為將第一實施形態中所記載之構成、第二實施形態中所記載之構成,以及第三實施形態中所記載之構成組合的構成。只要根據這樣的構成,即可作為兼具所有第一實施形態的效果、第二實施形態的效果以及第三實施形態的效果的構成,而將濺鍍裝置具體化。 ‧ The sputtering apparatus may be embodied as a combination of the configuration described in the first embodiment, the configuration described in the second embodiment, and the configuration described in the third embodiment. According to such a configuration, the sputtering apparatus can be embodied as a configuration that combines the effects of all the first embodiments, the effects of the second embodiment, and the effects of the third embodiment.

18‧‧‧陰極裝置 18‧‧‧Cathode device

21‧‧‧框體 21‧‧‧ frame

22‧‧‧陰極單元 22‧‧‧ cathode unit

22a‧‧‧並進台 22a‧‧‧and enter the stage

22b‧‧‧軌道 22b‧‧‧ Track

23‧‧‧擺動手臂 23‧‧‧Swing arm

23a‧‧‧擺動中心軸部 23a‧‧‧Swing center shaft

23a1‧‧‧擺動軸支部 23a1‧‧‧Swing shaft branch

23b‧‧‧連結軸部 23b‧‧‧Connected shaft

23b1‧‧‧連結軸支部 23b1‧‧‧Connected shaft branch

A‧‧‧旋轉軸 A‧‧‧Rotary axis

P‧‧‧擺動軸 P‧‧‧ swing axis

Claims (5)

一種基板處理裝置,其包含:框體;擺動手臂,係位於該框體內部的中空的擺動手臂,其包含與該框體連接的中空的擺動中心軸部以及作為擺動端的中空的連結軸部;處理部,係位於該框體內部,在與基板面對面的處理空間中,在與該擺動中心軸部的軸向垂直的方向上移動,以對該基板實施處理的,該處理部以可追隨該處理部的移動,而使該連結軸部與該處理部並進的方式與該連結軸部連結,進而藉由該處理部的移動使該擺動手臂進行擺動;及連接線,位於該擺動手臂的內部,通過該擺動中心軸部內部,而與位於該框體外部的共用設備連接,且通過該連結軸部內部而與該處理部連接;其中,該處理部更包含軸支部,其支持該連結軸部成可相對該處理部旋轉;該擺動手臂更包含伸縮機構,其使該連結軸部相對該擺動中心軸部位移,而使該擺動中心軸部與該連結軸部之間的距離伸縮;該伸縮機構,以使該擺動中心軸部與該連結軸部之間的距離配合該擺動中心軸部與該軸支部之間的距離的方式進行變化。 A substrate processing apparatus comprising: a frame; a swing arm; a hollow swing arm located inside the frame, comprising a hollow swing center shaft portion connected to the frame body and a hollow connecting shaft portion as a swing end; The processing unit is located inside the casing, and moves in a direction perpendicular to an axial direction of the swing center shaft portion in a processing space facing the substrate to perform processing on the substrate, and the processing portion can follow the The movement of the treatment portion is such that the connection shaft portion and the treatment portion are connected to the connection shaft portion, and the swing arm is swung by the movement of the treatment portion; and the connection line is located inside the swing arm And passing through the inside of the swinging center shaft portion, and being connected to a common device located outside the frame body, and connected to the processing portion through the inside of the connecting shaft portion; wherein the processing portion further includes a shaft branch portion that supports the connecting shaft The oscillating arm further includes a telescopic mechanism that displaces the connecting shaft portion relative to the oscillating central shaft portion to cause the oscillating central axis The distance between the telescopic coupling shaft; the telescopic mechanism, so that the swing shaft portion by distance between the swing center axis of the shaft portion and the distance between the branch portion and the coupling portion with the shaft changes. 如申請專利範圍第1項之基板處理裝置,其中,該連接線,係由複數的線路構成要件所構成;該複數的線路構成要件,包含: 兩個中間剛體配線,其在配置於該擺動手臂內部的同時,分別固定於該擺動手臂,並配合該伸縮機構所進行的該擺動手臂的伸縮,使相互之間的距離伸縮;及中間可撓線,其在配置於該擺動手臂內部的同時,連接於該兩個中間剛體配線之間,並具有可撓性,而因應該兩個中間剛體配線之間的距離增加而使撓曲量變小。 The substrate processing apparatus of claim 1, wherein the connecting line is composed of a plurality of line constituent elements; the plurality of line constituent elements comprising: Two intermediate rigid body wires are respectively fixed to the swing arm while being disposed inside the swing arm, and cooperate with the expansion and contraction of the swing arm to expand and contract the distance between the two; and the intermediate flexible The wire is connected between the two intermediate rigid body wires while being disposed inside the swing arm, and has flexibility, and the amount of deflection is reduced because the distance between the two intermediate rigid body wires is increased. 如申請專利範圍第1或2項之基板處理裝置,其中,該擺動中心軸部係設置為基端旋轉部,其以沿著該擺動中心軸部之軸向的旋轉軸為中心,而相對該框體進行旋轉;該連接線,包含:基端旋轉配線,其係固定於該基端旋轉部,並隨著該基端旋轉部的旋轉而進行旋轉的剛體;基端固定配線,其係固定於該框體的剛體;基端可撓線,其係以可藉由本身重量撓曲的方式設置,並連接於該基端旋轉配線與該基端固定配線之間,且可因應該基端旋轉配線與該基端固定配線之間的距離增加而使撓曲量變小。 The substrate processing apparatus according to claim 1 or 2, wherein the swing center shaft portion is provided as a base end rotation portion centered on a rotation axis along an axial direction of the swing center shaft portion, and is opposed to The frame is rotated; the connecting wire includes: a base end rotating wire fixed to the base end rotating portion, and a rigid body that rotates as the base rotating portion rotates; the base end fixed wiring is fixed a rigid body of the frame; the base end is flexible, and is disposed in a manner that can be flexed by its own weight, and is connected between the base end rotating wire and the base end fixing wire, and can be connected to the base end The distance between the rotating wiring and the fixed wiring of the base end is increased to make the amount of deflection small. 如申請專利範圍第1或2項之基板處理裝置,其中,該連結軸部係設置為前端旋轉部,其以沿著該擺動中心軸部之軸向的旋轉軸作為中心,而相對該處理部進行旋轉;該連接線,包含:前端旋轉配線,其係剛體,該剛體固定於該前端旋轉部,並追隨該前端旋轉部的旋轉而進行旋轉; 前端並進配線,其係剛體,該剛體固定於該處理部,並追隨該處理部的移動而與該處理部並進;及前端可撓線,其係以可藉由本身重量撓曲的方式設置,且連接於該前端旋轉配線與該前端並進配線之間,並因應該前端旋轉配線與該前端並進配線之間的距離增加而使撓曲量變小。 The substrate processing apparatus according to claim 1 or 2, wherein the connecting shaft portion is provided as a front end rotating portion centered on a rotating shaft along an axial direction of the swing center shaft portion, and is opposed to the processing portion Rotating; the connecting line includes: a front end rotating wire, the rigid body is fixed to the front end rotating portion, and rotates following the rotation of the front end rotating portion; The front end is connected to the wiring, and the rigid body is fixed to the processing portion, and follows the processing portion in accordance with the movement of the processing portion; and the front end is flexible, which is provided so as to be deflectable by its own weight. Further, the front end rotation wiring is connected between the front end rotation wiring and the front end, and the amount of deflection is reduced because the distance between the front end rotation wiring and the front end parallel wiring is increased. 一種成膜裝置,其包含:框體;擺動手臂,其係位於該框體內部的中空的擺動手臂,其包含與該框體連接的中空的擺動中心軸部以及作為擺動端的中空的連結軸部;成膜部,其係位於該框體內部,且在與基板面對面的處理空間中,在與該擺動中心軸部之軸向垂直的方向上移動,以朝向該基板放出成膜材料,藉此在該基板上成膜,該成膜部以可使該連結軸部追隨該成膜部之移動而與該成膜部並進的方式,與該連結軸部連結,並藉由該成膜部的移動使該擺動手臂進行擺動;連接線,位於該擺動手臂的內部,通過該擺動中心軸部內部而與位於該框體外部的共用設備連接,且通過該連結軸部內部而與該成膜部連接;其中,該成膜部更包含軸支部,其支持該連結軸部成可相對該成膜部旋轉;該擺動手臂更包含伸縮機構,其使該連結軸部相對該擺動中心軸部位移,而使該擺動中心軸部與該連結軸部之間的距離伸縮;該伸縮機構,以使該擺動中心軸部與該連結軸部之間的距離配合該 擺動中心軸部與該軸支部之間的距離的方式進行變化。 A film forming apparatus comprising: a frame; a swinging arm, which is a hollow swinging arm located inside the frame, and includes a hollow swinging central shaft portion connected to the frame body and a hollow connecting shaft portion as a swinging end a film forming portion that is located inside the frame and that moves in a direction perpendicular to an axial direction of the swing center axis portion in a processing space facing the substrate to discharge a film forming material toward the substrate Forming a film on the substrate, the film forming portion is coupled to the connecting shaft portion so that the connecting shaft portion can follow the film forming portion in accordance with the movement of the film forming portion, and the film forming portion is formed by the film forming portion Moving the swing arm to swing; the connecting wire is located inside the swing arm, and is connected to a common device located outside the frame through the inside of the swing center shaft portion, and passes through the inside of the connecting shaft portion and the film forming portion The film forming portion further includes a shaft support portion that supports the connecting shaft portion to be rotatable relative to the film forming portion; the swing arm further includes a telescopic mechanism that causes the connecting shaft portion to be opposite to the swinging central axis portion , The telescoping portion of the swing center axis distance between the connecting shaft portion; the telescopic mechanism, so that the distance between the center axis of the pivot shaft portion and the connecting portion of the mating The manner in which the distance between the central shaft portion and the shaft branch is swung is changed.
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