KR101763906B1 - Substrate processing device and film forming device - Google Patents

Substrate processing device and film forming device Download PDF

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Publication number
KR101763906B1
KR101763906B1 KR1020167008733A KR20167008733A KR101763906B1 KR 101763906 B1 KR101763906 B1 KR 101763906B1 KR 1020167008733 A KR1020167008733 A KR 1020167008733A KR 20167008733 A KR20167008733 A KR 20167008733A KR 101763906 B1 KR101763906 B1 KR 101763906B1
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South Korea
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shaft portion
swinging
casing
arm
connecting shaft
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KR1020167008733A
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Korean (ko)
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KR20160042168A (en
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테츠히로 오노
요시즈미 츠키가와
신스케 타테카와
스스무 아라이
마사키 타케이
다쯔노리 이소베
준야 키요타
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가부시키가이샤 알박
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32908—Utilities
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/342—Hollow targets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3444—Associated circuits

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The substrate processing apparatus has a casing (21) and a hollow swing arm (23) positioned inside the casing. The swing arm includes a hollow swinging central shaft portion 23a connected to the casing and a hollow connecting shaft portion 23b which is a swinging end. The substrate processing apparatus further includes a processing section (22) located inside the casing and moving the processing space facing the substrate in a direction orthogonal to the axial direction (P) of the swinging central axis part to perform processing on the substrate. The processing section follows the movement of the processing section and is connected to the connecting shaft section so that the connecting shaft section 23b can be translated with the processing section. Therefore, the swing arm 23 rocks by the movement of the processing section 22. [ The substrate processing apparatus is connected to a utility which is located inside the swing arm 23 and is located outside the casing through the inside of the swinging central shaft portion 23a and which is connected to the processing section through the inside of the connecting shaft portion 23b Line.

Description

[0001] DESCRIPTION [0002] Substrate processing apparatus and film forming apparatus [0003]

The present disclosure relates to a substrate processing apparatus for performing a process on a substrate and a film forming apparatus for forming a thin film on the substrate.

As a sputtering apparatus for forming a thin film on a substrate, for example, as disclosed in Patent Document 1, a sputtering apparatus is known in which a cathode containing a target moves from one side of a pair of opposite sides of the substrate toward the other side. In such a sputtering apparatus, the cathode moves while emitting the sputtering particles toward the substrate.

International Publication No. 2010/044257

Incidentally, the sputtering apparatus has a connection line including a power line for supplying electric power to the target, a pipe for supplying sputter gas to the surface of the target, and the like. In the sputtering apparatus described above, every time the cathode moves, the connection line is pulled inwardly or outwardly from the chamber outside the chamber in which the cathode is arranged as the cathode moves. And, every time the cathode moves, the connecting line is repeatedly subjected to a mechanical load because the connecting line is pulled or the connecting line and the member guiding the connecting line are skewed.

Sputtering apparatus, or the like, and in the case of a substrate processing apparatus in which a processing section for processing a substrate moves in a space opposed to the substrate, the above-mentioned matters are generally common.

It is an object of the present disclosure to provide a substrate processing apparatus and a film forming apparatus capable of reducing a mechanical load which is caused by a connection line connected to a processing section for processing a substrate due to the entry and exit between the inside of the casing and the outside of the casing .

One embodiment of the substrate processing apparatus in the present specification includes a casing and a hollow swinging arm located inside the casing. The rocking arm includes a hollow pivot center shaft portion connected to the casing and a hollow connecting shaft portion that is a swinging end. The substrate processing apparatus further includes a processing section which is located inside the casing and moves the processing space facing the substrate with respect to the substrate in a direction orthogonal to the axial direction of the swinging central axis section to perform processing on the substrate. The processing section is connected to the connection shaft section so that the connection shaft section follows the movement of the processing section so as to be able to translate with the processing section, and causes the swinging arm to swing by the movement of the processing section. The substrate processing apparatus further includes a connection line which is located inside the swing arm and is connected to a utility located outside the casing through the inside of the swing center shaft and connected to the processing unit through the connection shaft .

According to this configuration, when the processing portion translates together with the connection shaft portion, the swinging arm rocks about the swinging central axis portion. At this time, the connection line located in the swinging arm keeps connection with the processing unit while following the swinging motion of the swinging arm. Therefore, the connection line is hardly inserted or removed between the inside and the outside of the swing arm through the swing center shaft portion. That is, the connection line rocks about the swinging central axis portion following the swinging motion of the swinging arm. Therefore, the amount of change in the length of the connecting line that changes between the inside of the casing and the outside may be smaller than the moving distance of the treating section. As a result, the mechanical load received by the connection line due to the entry / exit between the inside of the casing and the outside of the casing can be reduced.

One embodiment of the film forming apparatus in this specification includes a casing and a hollow swinging arm that is located inside the casing. The swinging arm includes a hollow swinging central shaft portion connected to the casing and a hollow connecting shaft portion which is a swinging end. In addition, the film forming apparatus may further include a step of moving a processing space facing the substrate with respect to the substrate in a direction orthogonal to the axial direction of the swinging central axis portion, and forming a film on the substrate by discharging the film forming material toward the substrate As shown in Fig. The film forming portion is connected to the connecting shaft portion so that the connecting shaft portion can follow the movement of the film forming portion and can translate to the film forming portion, and causes the swinging arm to rock by the movement of the film forming portion. The film forming apparatus further includes a connection line which is located inside the swinging arm and is connected to a utility located outside the casing through the inside of the swinging central axis portion and connected to the film forming portion through the connection shaft portion .

According to this configuration, when the film forming portion translates together with the connecting shaft portion, the swinging arm rocks around the swinging central shaft portion. At this time, the connection line located in the pivoting arm keeps connection with the film forming section while following the swinging motion of the pivoting arm. Therefore, the connection line is hardly inserted or removed between the inside and the outside of the swing arm through the swing center shaft portion. That is, the connection line rocks around the swinging central shaft portion in accordance with the swinging motion of the swinging arm. Therefore, the amount of change in the length of the connecting line that changes between the inside of the casing and the outside may be smaller than the moving distance of the film forming portion. As a result, the mechanical load received by the connection line due to the entry / exit between the inside of the casing and the outside of the casing can be reduced.

Preferably, in the substrate processing apparatus, the processing section includes a shaft support portion that rotatably supports the connection shaft portion with respect to the processing portion. Preferably, the rocking arm is provided with an expanding and contracting mechanism for displacing the connecting shaft portion with respect to the swinging central shaft portion, thereby expanding and contracting the distance between the swinging central shaft portion and the connecting shaft portion. In this configuration, the extensible mechanism changes the distance between the pivot center shaft portion and the connection shaft portion to match the distance between the pivot center shaft portion and the shaft support portion.

With this configuration, when the processing portion translates together with the connecting shaft portion, the extending and retracting mechanism of the swinging arm changes the distance between the swinging central shaft portion and the connecting shaft portion according to the distance between the swinging central shaft portion and the shaft supporting portion. Thus, the connection shaft portion of the swing arm can follow the movement of the processing portion.

Preferably, in the substrate processing apparatus, the connection line is composed of a plurality of line components. Preferably, the plurality of line elements are disposed inside the swinging arm and are individually fixed to the swinging arm, and the distance between the swinging arm and the swinging arm is set to be longer And two intermediate rigid wiring lines. Preferably, the plurality of line elements are disposed inside the swing arm, and are connected between the two intermediate rigid wiring lines and have flexibility so that the distance between the two intermediate rigid wiring lines increases And an intermediate flexible line for reducing the amount of warp.

According to this configuration, when the swinging arm expands and contracts, the amount of warping of the intermediate flexible line between the two intermediate rigid wiring lines changes. Therefore, the change in the difference between the length of the connection line passing through the inside of the swing arm and the length of the swing arm is absorbed by the change in the amount of bending of the intermediate flexible line. Therefore, the length of the connection line that goes in and out between the inside and the outside of the swing arm is shortened.

Preferably, the pivot center shaft portion of the substrate processing apparatus is provided as a base end rotation portion that rotates with respect to the casing about a rotation axis along the axial direction of the pivot center shaft portion. Preferably, the connection line includes: a base end rotation wiring fixed to the base end rotation portion and being a rigid body rotating following the rotation of the base end rotation portion; a base end fixed wiring that is a rigid body fixed to the casing; And a base end flexible line connected between the base end fixed wiring and the base end rotation wiring and reducing the amount of warping as the distance between the base end rotation wiring and the base end fixed wiring increases.

According to such a configuration, the connection line is prevented from twisting due to the rotation of the base-end rotating portion. Therefore, the mechanical load on the connection line can be reduced.

Preferably, in the substrate processing apparatus, the connecting shaft portion is provided as a tip rotating portion that rotates with respect to the processing portion about a rotation axis along the axial direction of the swinging central axis portion. Preferably, the connecting line is a rigid body that is fixed to the distal rotating part and is a rigid body that rotates following the rotation of the distal rotating part. The connecting line is fixed to the processing part, And is connected between the distal rotating wiring and the distal rotating wiring so as to reduce the amount of warping as the distance between the distal rotating wiring and the distal rotating wiring increases And a leading end curved line.

According to such a configuration, it is possible to suppress the twist of the connection line by the rotation of the tip rotation portion. Therefore, the mechanical load on the connection line can be reduced.

BRIEF DESCRIPTION OF DRAWINGS FIG. 1 is a configuration diagram schematically showing an internal configuration of a sputtering apparatus, which is a first embodiment of a film forming apparatus, together with a substrate to be processed by a sputtering apparatus. FIG.
FIG. 2 is a view showing the internal structure of the casing in a direction opposite to the substrate placed in the casing. FIG.
Fig. 3 is a view showing the casing internal structure in a direction facing the substrate positioned in the casing. Fig.
Fig. 4 is a view showing the internal structure of the casing in a direction opposite to the substrate placed in the casing. Fig.
5 is a cross-sectional view showing a cross-sectional structure along the height direction of a rocking arm of a sputtering apparatus which is a second embodiment of the film forming apparatus.
6 is a front view showing the frontal structure of the swing arm before stretching.
Fig. 7 is a front view showing the frontal structure of the swing arm after stretching. Fig.
8 is a cross-sectional view showing a partial cross-sectional structure along the height direction of the rocking arm before stretching.
9 is a cross-sectional view showing a partial cross-sectional structure along the height direction of the rocking arm after stretching.
10 is a partial rear view showing a part of the back surface structure of the sputtering apparatus of the third embodiment of the film forming apparatus viewed from the side opposite to the substrate with respect to the cathode apparatus.
11 is a partial rear view showing a part of the back surface structure of the rocking arm viewed from the side opposite to the substrate with respect to the cathode device.
12 is a partial front view showing a part of the frontal structure seen from the substrate side with respect to the cathode device of the rocking arm.
Fig. 13 is a partial front view showing a part of the frontal structure of the rocking arm viewed from the substrate side with respect to the cathode device. Fig.

[First Embodiment]

A first embodiment in which a substrate processing apparatus and a film forming apparatus are embodied as a sputtering apparatus will be described with reference to Figs. Hereinafter, an example of the entire configuration of the sputtering apparatus, the cathode apparatus included in the sputtering apparatus, and the operation of the cathode apparatus will be described in order.

[Overall structure of sputtering apparatus]

An example of the entire configuration of the sputtering apparatus will be described with reference to Fig.

1, the sputtering apparatus 10 includes a loading / unloading chamber 11, a front processing chamber 12, and a sputtering chamber 13, Transport direction). The sputtering apparatus 10 has two gate valves 14 connecting between the ion implantation chamber 11 and the pretreatment chamber 12 and between the pretreatment chamber 12 and the sputtering chamber 13, respectively. Each of the three chambers is provided with an exhaust unit 15 for decompressing the chambers. On each of the bottom surfaces of the three chambers, two lane-forming film forming lanes 16 and a recovery lane 17 extending in parallel to each other in the carrying direction are mounted.

The deposition lane 16 and the recovery lane 17 are configured by, for example, rails extending along the conveying direction, a plurality of rollers arranged along the conveying direction, and a plurality of motors for rotating the plurality of rollers . The film formation lane 16 transports the tray T carried into the sputtering apparatus 10 together with the substrate S before film formation from the loading / unloading chamber 11 toward the sputtering chamber 13. The recovery lane 17 transports the tray T carried into the sputter chamber 13 together with the substrate S after the deposition from the sputter chamber 13 toward the loading / unloading chamber 11. In the tray T, a rectangular substrate S extending in front of the paper surface is fixed in a standing state. The width of the substrate S is, for example, 2200 mm along the transport direction and 2500 mm toward the front of the paper.

The loading and unloading chamber 11 transports the substrate S before the deposition from the outside of the sputtering apparatus 10 into the pretreatment chamber 12 and transfers the substrate S after the deposition from the pretreatment chamber 12 to the sputtering apparatus 12, (10). When the substrate S before film formation is carried into the loading / unloading chamber 11 from the outside and the substrate S after film forming is taken out from the loading / unloading chamber 11, the loading / unloading chamber 11 is moved to the atmospheric pressure Boost. When the substrate S before film formation is carried into the preprocessing chamber 12 from the loading / unloading chamber 11 and the substrate S after film forming is taken out of the preprocessing chamber 12 to the loading / unloading chamber 11, 11 depressurize the interior to the same extent as the interior of the pretreatment chamber 12.

The pretreatment chamber 12 performs heat treatment, cleaning treatment, and the like, for example, as a treatment required for film formation, on the substrate S before film formation, which has been transferred from the loading / unloading chamber 11 to the pretreatment chamber 12. The pretreatment chamber 12 carries the substrate S transferred from the loading and unloading chamber 11 to the pretreatment chamber 12 into the sputter chamber 13. The pretreatment chamber 12 also takes out the substrate S carried out from the sputter chamber 13 to the pretreatment chamber 12 to the loading / unloading chamber 11.

The sputter chamber 13 is provided with a cathode device 18 for emitting a film forming material to the substrate S. The cathode device 18 emits the film forming material into the processing space in which the cathode device 18 faces the substrate S. The sputter chamber 13 is provided with a lane changing section 19 provided between the deposition lane 16 and the recovery lane 17.

The sputter chamber 13 forms a thin film on the substrate S before the deposition carried into the sputter chamber 13 from the pretreatment chamber 12 by using the cathode device 18. The sputter chamber 13 moves the tray T from the deposition lane 16 to the recovery lane 17 together with the substrate S after the deposition using the lane changing portion 19. [

The sputtering apparatus 10 may be configured to include at least the sputtering chamber 13. In this configuration, the sputter chamber 13 may not include the deposition lane 16, the recovery lane 17, and the lane changing portion 19, and the substrate S may be opposed to the cathode device 18 And a disposing portion for disposing the disposable diaper in a viewing state.

[Cathode device]

The cathode device 18 will be described with reference to Fig. 2 to 4, for the convenience of explanation, the wall portion of the casing constituting the sputter chamber 13 is not shown in the view of the wall portion parallel to the carrying direction.

2, the cathode device 18 is formed in a box shape and is located inside the casing 21 constituting the sputter chamber 13. The casing 21 has two wall portions parallel to the carrying direction Have. The two wall portions parallel to the carrying direction are opposed to each other, and one wall portion of the two wall portions faces in the opposite direction to the other wall portion. The cathode device 18 includes a cathode unit 22 and a swing arm 23.

The cathode unit 22 has a hollow rectangular columnar translating stage 22a and a wall portion facing the substrate S among the wall portions constituting the translational stage 22a is constituted by a target Lt; / RTI > The translating stage 22a has a backing plate connected to the target and supplying external power to the target, and a magnetic circuit for forming a leakage magnetic field on one surface of the target facing the substrate S, and the like. The cathode unit 22 is an example of a processing unit and a film forming unit.

A rail 22b extending in the carrying direction is laid in the casing 21 and the translation stage 22a is placed on the rail 22b. The translation stage 22a is connected to a driving unit that reciprocates the translation stage 22a along the rail 22b. The translation stage 22a reciprocates along the transport direction by being driven by the drive section. The translation stage 22a moves in the processing space facing the substrate S by reciprocating along the carrying direction.

A swinging arm 23 located inside the casing 21 is mounted on one of the two wall portions of the casing 21. The swinging arm 23 is formed into a substantially rectangular columnar shape having a hollow shape and pivots about a swinging axis P extending along the opposite direction.

The swing arm 23 has a hollow pivot center shaft portion 23a connected to the casing 21 from above in the casing 21 and connected to the translation stage 22a below the casing 21 And a hollow connecting shaft portion 23b which is a swinging end. For example, the swinging central shaft portion 23a is connected to the upper portion of the wall portion of the casing 21 at a position substantially coinciding with the center of the rail 22b in the carrying direction. The axial direction of the swinging central axis portion 23a coincides with the swinging axis P.

A pivotal shaft support portion 23a1 which is formed in a cylindrical shape extending along the opposite direction and supports the pivotal axial shaft portion 23a in a state of being rotatable with respect to the casing 21 is formed outside the pivotal axial shaft portion 23a Is located. The pivotal shaft support portion 23a1 is fixed to the casing 21. [ That is, the casing 21 is provided with the pivotal shaft support portion 23a1.

The connecting shaft portion 23b is connected to the outer surface of the wall portion opposed to the target in the translational stage 22a and the connecting shaft portion 23b is connected to the outside of the outer surface of the translating stage 22a, Respectively. The connection shaft portion 23b rotates about the rotation stage 22a about the rotation axis A coinciding with the center axis extending along the opposite direction. The connection shaft portion 23b is connected to the translation stage 22a in a state in which the translation of the cathode unit 22 can be followed.

A connection shaft support portion 23b1 for supporting the connection shaft portion 23b in a state of being rotatable with respect to the translation stage 22a is located outside the connection shaft portion 23b in a cylindrical shape extending along the opposite direction have. The connection shaft support portion 23b1 is fixed to the translation stage 22a. That is, the cathode unit 22 has the connection shaft support portion 23b1.

In the cathode device 18, the inside of the swinging arm 23 and the inside of the swinging stage 22a connected to the inside of the swinging arm 23 are atmospheric pressure atmosphere. A vacuum seal member is located between the outer circumferential surface of the oscillating central shaft portion 23a and the inner circumferential surface of the oscillating shaft support portion 23a1 and a vacuum seal is formed between the outer circumferential surface of the connection shaft portion 23b and the inner circumferential surface of the connection shaft support portion 23b1. When the exhaust part 15 decompresses the inside of the casing 21 by the member being located, the inside of the casing 21 is maintained in a vacuum atmosphere.

Inside the oscillating arm 23 are disposed a utility which is disposed outside the sputter chamber 13 for driving the cathode unit 22 and a utility which is located inside the sputter chamber 13 for driving the cathode unit 22 And a connection line connected to the cathode unit 22 is located. The utility includes, for example, gas bombs of process gases, including various power sources, sputter gases and reactive gases, and cooling water tanks. The connection line may be, for example, a power line supplying electric power to the target, a pipe through which cooling water for cooling the target flows, or a pipe through which the process gas supplied into the sputter chamber 13 flows.

[Operation of the cathode device]

The operation of the cathode device will be described with reference to Figs. 2 to 4. Fig.

2, when the cathode device 18 starts to form a thin film, the translating stage 22a is disposed in the casing 21 at one end in the carrying direction of the rail 22b, for example, , And is located at the left end in Fig. At this time, the swinging central shaft portion 23a of the swing arm 23 is connected to the upper portion of the wall portion of the casing 21 at a position substantially coinciding with the center of the rail 22b in the carrying direction. On the other hand, the connecting shaft portion 23b of the swing arm 23 is positioned below the inside of the casing 21 at a position on the left end side of the rail 22b in the carrying direction. Therefore, the direction in which the translation stage 22a extends perpendicularly to the rail 22b and the direction in which the swing arm 23 extends form a predetermined angle.

When the cathode device 18 starts forming the thin film, the translation stage 22a moves along the rail 22b from one end in the transport direction perpendicular to the pivot axis P toward the other end. For example, the translation stage 22a moves along the carrying direction from the left end to the right end in Fig. The connecting shaft portion 23b of the swing arm 23 is also translated with the translating stage 22a along the carrying direction so that the position of the connecting shaft portion 23b in the carrying direction is shifted from the swinging center shaft portion 23a ). As a result, the angle formed by the direction in which the translation stage 22a extends and the direction in which the swing arm extends is gradually reduced. When the translating stage 22a is translated along with the connecting shaft portion 23b along the carrying direction, the swinging central shaft portion 23a and the connecting shaft portion 23b rotate together. At this time, the direction in which the pivot center shaft portion 23a rotates with respect to the casing 21 is the same as the direction in which the connection shaft portion 23b rotates with respect to the translation stage 22a.

3, the translation stage 22a is translated with the connection shaft portion 23b along the transport direction, and the position of the swing center shaft portion 23a in the transport direction and the position of the connection shaft portion 23b in the transport direction When the positions overlap, the direction in which the translation stage 22a extends extends in the direction in which the swing arm 23 extends. As a result, the above-mentioned angle becomes 0 DEG.

The position of the connecting shaft portion 23b in the carrying direction becomes larger than the position of the swinging central shaft portion 23a in the carrying direction when the translating stage 22a moves closer to the other end beyond the position of the swinging central shaft portion 23a in the carrying direction, . As a result, the angle formed between the direction in which the translation stage 22a extends and the direction in which the swing arm 23 extends gradually increases.

As shown in Fig. 4, when the translation stage 22a moves to the other end portion in the carrying direction of the rail 22b, for example, to the right end portion in Fig. 2, the swinging center shaft portion 23a Is located above the inside of the casing 21 at a position where it coincides with the almost center of the rail 22b in the carrying direction. On the other hand, the connecting shaft portion 23b of the swing arm 23 is positioned below the inside of the casing 21 at the position on the right end side of the rail 22b in the carrying direction. The angle formed between the direction in which the translation stage 22a extends and the direction in which the swing arm 23 extends is almost the same angle as when the translation stage 22a is located at the left end of the rail 22b .

Thus, the cathode unit 22 translates from the one end to the other end of the rail 22b in the carrying direction together with the connecting shaft portion 23b, or from one end to the other end. As a result, the swing arm 23 having the connecting shaft portion 23b as a swinging end rocks around the swinging central shaft portion 23a.

Therefore, when the cathode unit 22 is translated along the rail 22b with the connecting shaft portion 23b, the connecting line passing through the inside of the casing 21 follows the swinging motion of the swing arm 23, (23a). At this time, the connection line located inside the swing arm 23 keeps the connection with the cathode unit 22 while following the swing of the swing arm 23. Therefore, the connection line hardly goes in and out between the inside and the outside of the swing arm 23 through the swinging central shaft portion 23a. Thus, the amount of change in the length of the connecting line that changes between the inside and the outside of the casing 21 can be smaller than the distance that the cathode unit 22 translates, so that the mechanical load that the connecting line receives can be reduced.

As described above, according to the sputtering apparatus of the first embodiment, the following effects can be obtained.

(1) When the cathode unit 22 translates to the connecting shaft portion 23b, the swing arm 23 rocks. At this time, the connection line located inside the swing arm 23 follows the swing motion of the swing arm 23 and swings around the swing center shaft 23a, while maintaining the connection with the cathode unit 22 . Therefore, the connection line hardly goes in and out between the inside and the outside of the swing arm 23 through the swing center shaft portion 23a. Therefore, the amount of change in the length of the connecting line that varies between the inside and the outside of the casing 21 may be smaller than the distance that the cathode unit 22 moves. As a result, the mechanical load received by the connection line can be reduced due to the entry / exit between the inside of the casing 21 and the outside of the casing 21. [

The first embodiment may be modified as appropriate as follows.

The position at which the pivot center shaft portion 23a is connected to the wall portion of the casing 21 may not be the position substantially coincident with the center of the rail 22b in the carrying direction. The position at which the swinging central shaft portion 23a is connected to the wall portion of the casing 21 is determined by the position corresponding to one of the two ends of the rail 22b in the carrying direction , Or other location.

The cathode unit 22 is not limited to the structure having the target formed on the flat plate facing the substrate S as described above. The cathode unit 22 may be configured to have a rotary shaft that moves together with the translation stage 22a along the transport direction and has a cylindrical shape with the rotation axis as a central axis and a target facing the substrate S have.

The film forming apparatus may be embodied as various film forming apparatuses such as a deposition apparatus having an evaporation source as a film forming unit, instead of the sputter apparatus 10 having the cathode unit 22. Alternatively, the film forming apparatus may be embodied as various substrate processing apparatuses such as an ion beam irradiating apparatus having an ion beam irradiating section as a processing section and a laser irradiating device including various laser irradiating sections such as ultraviolet rays as processing sections.

[Second Embodiment]

A second embodiment in which the substrate processing apparatus and the film forming apparatus are embodied as a sputtering apparatus will be described with reference to Figs. 5 to 9. Fig. The distance between the swinging central shaft portion 23a of the swinging arm 23 and the connecting shaft portion 23b varies in accordance with the distance between the swinging central shaft portion 23a and the connecting shaft supporting portion 23b1. For this reason, the structure related to the change of the distance will be described in detail below. In the following, the overall configuration of the swing arm 23, the extending and retracting mechanism of the swing arm 23, and the detailed configuration of the power line, which is an example of the connection line, will be described in turn.

[Overall configuration of the rocking arm]

The entire configuration of the swing arm 23 will be described with reference to FIG.

5, the swing arm 23 includes an upper casing 31, a fixed plate 32, a guide cylinder 33, and a lower casing 34, and includes an upper casing 31, a fixed plate 32 The guide tube portion 33, and the lower casing 34 are arranged in this order along the height direction which is one direction.

The upper casing 31 is formed in a hollow rectangular column shape and has a swing opening portion 31a that is connected to the swing center shaft portion 23a on one side and penetrates the side surface along the opposite direction. The upper casing 31 has an upper opening 31b which is a through hole extending along the height direction on a side facing the lower casing 34. [

The fixing plate 32 is formed in a rectangular plate shape and has a fixing opening portion 32a which is a through hole extending along the height direction. The fixing plate 32 is connected to the upper casing 31 in a state in which the fixed opening 32a and the upper opening 31b are opposed to each other. In the fixing plate 32, the width along the opposed direction and the width in the direction orthogonal to the paper are respectively larger than the upper casing 31.

The guide tube 33 is formed into a cylindrical shape extending along the height direction and an end portion of the two end portions in the height direction close to the fixing plate 32 faces the fixing plate 32 in a state of facing the fixing opening 32a. As shown in FIG.

The lower casing 34 is formed in the shape of a hollow rectangular column and has a connection opening portion 34a connected to the connection shaft portion 23b on one side and penetrating the side surface along the opposite direction. The lower casing 34 has a lower opening 34b which is a through hole extending along the height direction on the side facing the upper casing 31. [ An end portion of the lower casing 34 which is close to the lower casing 34 is positioned at a side opposite to the upper casing 31 so that an end portion of the two end portions in the height direction of the guide tube 33 facing the lower casing 34 faces the lower opening 34b Respectively. In the lower casing 34, the width along the opposite direction and the width in the direction orthogonal to the paper are almost the same as those of the fixing plate 32. [

The swinging central shaft portion 23a is connected to the upper casing 31 and includes a swinging shaft support portion 23a1 formed in a cylindrical shape covering the outer peripheral surface of the swinging central shaft portion 23a and having a swinging central shaft portion 23a, As shown in Fig. The pivotal shaft support portion 23a1 has a swing flange 23a2 extending radially outward from the outer circumferential surface on the way of extending along the opposing direction and the swing flange 23a2 is fixed to the casing 21 by a fixing member have. The swinging central shaft portion 23a is formed such that the outer peripheral surface of the swinging central shaft portion 23a is in contact with the inner peripheral surface of the swinging shaft support portion 23a1 via a bearing having a function of a vacuum seal member, (21).

The connecting shaft portion 23b is connected to the lower casing 34 and formed in a cylindrical shape extending in the opposite direction to the guide tube portion 33 in the opposite direction to the swing center shaft portion 23a. The connection shaft support portion 23b1 formed in a cylindrical shape covering the outer circumferential surface of the connection shaft portion 23b supports the connection shaft portion 23b in such a state that the connection shaft portion 23b can rotate with respect to the translation stage 22a. The connection shaft support portion 23b1 has a connection flange 23b2 that extends from the outer circumferential surface in the radial direction on the way of extending along the opposing direction and the connection flange 23b2 is fixed to the rotation stage 22a by the fixing member . The connecting shaft portion 23b is formed so that the outer circumferential surface of the connecting shaft portion 23b is in contact with the inner circumferential surface of the connecting shaft supporting portion 23b1 through a bearing having a function of a vacuum chamber member, .

The swinging arm 23 is provided between the upper casing 31 and the lower casing 34 in the height direction and includes a stretching mechanism 40 that surrounds the circumference of the guide tube 33 and includes the guide tube 33, Lt; / RTI > The extensible mechanism 40 displaces the connecting shaft portion 23b with respect to the swinging central shaft portion 23a to expand and contract the distance between the swinging central shaft portion 23a and the connecting shaft portion 23b.

The extensible mechanism 40 has a plurality of shafts 41 and shaft guiding portions 42 of the same number as the shafts 41. The plurality of shaft guide portions 42 are located at equal intervals around the guide tube portion 33 and each of the plurality of shaft guide portions 42 is formed into a cylindrical shape extending in the height direction. The two end portions of the two shaft ends of each shaft guide portion 42 close to the upper casing 31 are fixed to the stationary plate 32 in a state of facing a shaft through hole (not shown) 32, respectively. Each of the plurality of shafts 41 is formed into a columnar shape extending along the height direction. The end of each of the two shafts 41 near the upper casing 31 communicates with one shaft guide portion 42 and the shaft through hole of the fixed plate 32 and the end near the lower casing 34 And is fixed to a side surface of the lower casing 34 facing the upper casing 31.

In the inside of the swing arm 23, a plurality of connection lines 50 extending from the swing center shaft portion 23a toward the connection shaft portion 23b pass. Each of the plurality of connection lines 50 may be one line and may be composed of a plurality of line components interconnected by a terminal. The plurality of connection lines 50 includes a power line 51 for supplying high frequency power to the backing plate of the cathode unit 22, a gas piping 52 for supplying a process gas around the cathode unit 22, And a cooling water pipe 53 for supplying cooling water to the plate. The number of the power lines 51, the gas piping 52, and the cooling water pipings 53 included in the connection line 50 may be one or plural.

The power line 51 has a rigid portion 51a fixed in the inside of the swing arm 23 in a state in which the shape is not changed and a flexible portion 51b accommodated in the lower casing 34 and changing its shape . The rigid body portion 51a includes a swing rigid body portion 51a1 extending from the outside of the swinging central shaft portion 23a toward the lower casing 34 and connected to one end portion of the flexible portion 51b, And a connecting rigid portion 51a2 connected to the other end of the connecting shaft portion 23b and extending from the lower casing 34 toward the outside of the connecting shaft portion 23b. The oscillating rigid portion 51a1 and the connecting rigid portion 51a2 are examples of intermediate rigid wiring and the flexible portion 51b is an example of the intermediate flexible line.

The gas pipe 52 has a bent portion 52a having a curved shape and the bent portion 52a is located inside the lower casing 34. [ The cooling water pipe 53 has a bent portion 53a having a curved shape and the bent portion 53a is located inside the lower casing 34. [

[Extension mechanism of rocking arm]

The extensible mechanism 40 of the swing arm 23 will be described in more detail with reference to Figs. 6 and 7. Fig.

6, the extensible mechanism 40 includes a guide tube 33, four shafts 41 (only two shafts 41 are shown in Fig. 6), four shaft guides 42, . The four shafts 41 and the four shaft guiding portions 42 are located corresponding to the four corners of the fixing plate 32.

The guide tube portion 33 has an upper tube portion 33a formed in a cylindrical shape and fixed to the fixed plate 32 and a lower tube portion 33b formed in a cylindrical shape and fixed to the lower casing 34. [

The guide tube portion 33 is provided with a bellows 33c formed in a cylindrical shape between the upper tube portion 33a and the lower tube portion 33b in the height direction. The bellows 33c has one barrel portion connected to the upper barrel portion 33a and the other barrel portion connected to the lower barrel portion 33b. The bellows 33c is urged in the direction from the lower cylinder portion 33b toward the upper cylinder portion 33a in the height direction.

6, when the swing arm 23 and the cathode unit 22 overlap each other in the carrying direction, the swinging central shaft portion 23a of the swing arm 23 and the connecting shaft portion 23b for supporting the connecting shaft portion 23b, The distance from the support portion 23b1 becomes the smallest. At this time, the elongating / contracting mechanism 40 moves the distance between the swinging central shaft portion 23a and the connecting shaft portion 23b in the swing arm 23 in accordance with the distance between the swinging central shaft portion 23a and the connecting shaft support portion 23b1 . That is, the extensible mechanism 40 minimizes the length L of the swinging arm, which is the distance between the swinging central shaft portion 23a and the connecting shaft portion 23b.

At this time, in the elongating and contracting mechanism 40, the bellows 33c is reduced by the urging force, and the upper end 41a of each shaft 41 located on the side closer to the upper casing 31 is moved to the fixed plate 32 are maximized. The shaft 41 and the lower cylinder portion 33b fixed to the bellows 33c move together with the lower casing 34 to a position closest to the fixed plate 32 in the height direction.

The amount of bending in the bending portion 52a of the gas pipe 52 is the largest in the inside of the swing arm 23 and the amount of bending in the bending portion 53a of the cooling water pipe 53 is the largest. The amount of bending in each of the two bent portions 52a and 53a increases as the position of the translation stage 22a in the carrying direction becomes closer to the position in the carrying direction of the swinging central shaft portion 23a of the swinging arm 23 .

7, when the translation stage 22a is disposed at one end in the carrying direction of the rail 22b while being translated with the connecting shaft portion 23b along the rail 22b, The distance between the connecting shaft portion 23a and the connecting shaft portion 23b1 supporting the connecting shaft portion 23b is maximized. At this time, the elongating / contracting mechanism 40 adjusts the distance between the swinging central shaft portion 23a and the connecting shaft portion 23b in the swinging arm 23 in accordance with the distance between the swinging central shaft portion 23a and the connecting shaft supporting portion 23b1 Increase. That is, the extensible mechanism 40 has the largest length L of the swinging arm 23, which is the distance between the swinging central shaft portion 23a and the connecting shaft portion 23b.

At this time, in the elongating and contracting mechanism 40, the bellows 33c is stretched against the urging force, and the upper end 41a of each shaft 41 is positioned at a position where the projecting amount from the fixing plate 32 in the height direction becomes minimum . The shaft 41 and the lower cylinder portion 33b fixed to the bellows 33c are moved together with the lower casing 34 to a position farthest from the fixed plate 32 in the height direction.

The amount of bending in the bending portion 52a of the gas pipe 52 is the smallest and the amount of bending in the bending portion 53a of the cooling water pipe 53 is the smallest. The amount of bending in each of the two bent portions 52a and 53a is such that the more the position of the translation stage 22a in the carrying direction is away from the position in the carrying direction of the swinging central shaft portion 23a of the swinging arm 23 Lt; / RTI >

The extending and retracting mechanism 40 of the swinging arm 23 is configured to move the swinging arm 23 such that the swinging center 23a of the swinging arm 23 and the connecting shaft portion 23b, The length L of the swinging arm 23 is changed in accordance with the distance between the two arm portions 23b1. That is, when the cathode unit 22 is translated with the translation stage 22a, the length of the swinging arm 23 is stretched or shrunk between the swinging central shaft portion 23a and the connecting shaft portion 23b. In other words, the extending and retracting mechanism 40 of the swinging arm 23 is arranged so that the distance between the swinging central shaft portion 23a and the connecting shaft portion 23b is equal to the distance between the swinging central shaft portion 23a and the connecting shaft supporting portion 23b1 Change it. Thus, the connection shaft portion 23b provided on the swinging arm 23 can follow the movement of the translation stage 22a.

[Configuration of Power Line]

The configuration of the power line 51 will be described in more detail with reference to Figs. 8 and 9. Fig. 8 shows the state of the power line 51 when the length L of the swinging arm 23 is the smallest, while FIG. 9 shows the state of the power line 51 when the length L of the swinging arm 23 is the largest 51) state is shown.

As shown in Fig. 8, the power line 51 is composed of a plurality of components, and the plurality of components include a rocking rigid portion 51a1, a flexible portion 51b, and a connecting rigid portion 51a2. The oscillating rigid portion 51a1 is formed in a band shape extending from the oscillation central axis portion 23a toward the lower casing 34 and the main component of the material for forming the oscillating rigid portion 51a1 is copper )to be. One end of the two ends of the oscillating rigid body 51a1 is connected to a power line disposed outside the oscillating arm 23 and the other end is connected to the flexible portion 51b inside the oscillating arm 23 have.

The oscillating rigid body portion 51a1 passes through the inside of the guide tube portion 33 and the other end portion of the oscillating rigid body portion 51a1 extends from the lower opening portion 34b of the lower casing 34 toward the bottom portion of the lower casing 34 Respectively. The swinging rigid body portion 51a1 is provided inside the upper casing 31 of the swinging arm 23 or inside the upper cylinder portion 33a on the way of extending from the swinging central shaft portion 23a toward the lower casing 34 As shown in FIG.

The connecting rigid portion 51a2 is formed in a strip shape extending from the lower casing 34 to the connecting shaft portion 23b and the main component of the forming material of the connecting rigid portion 51a2 is, for example, copper. One end of the two ends of the connecting rigid portion 51a2 is connected to the flexible portion 51b inside the swing arm 23 and the other end is connected to a power line disposed outside the swing arm 23. [ Although not shown, the connecting rigid portion 51a2 is fixed to the inside of the swing arm 23 on the way of extending from the lower casing 34 toward the connecting shaft portion 23b. The flexible portion 51b is configured to extend or retract the distance between the oscillating rigid portion 51a1 and the connecting rigid portion 51a2 when the elongating / contracting mechanism 40 expands / contracts the swinging arm 23 in accordance with the swinging motion of the swinging arm 23 do.

The flexible portion 51b is disposed inside the lower casing 34 and has a band shape in which one end of the two ends is connected to the oscillating rigid portion 51a1 and the other end is connected to the connecting rigid portion 51a2 Respectively. The flexible portion 51b is made of a flat copper wire formed by interweaving a plurality of copper wires in a strip shape, for example, and has flexibility. The flexible portion 51b has a curved portion 51b1 which is a portion curved by its own weight.

8, when the length L of the swing arm 23 is the smallest, the bellows 33c contracts most and the lower casing 34 closest to the upper casing 31 Reference). Therefore, the connecting portion between the oscillating rigid portion 51a1 and the flexible portion 51b comes closest to the bottom wall of the lower casing 34. [ In addition, the distance between the rocking rigid portion 51a1 and the connecting rigid portion 51a2 is minimized. The flexible portion 51b is located at a distance from one end of the flexible portion 51b connected to the oscillating rigid portion 51a1 to the curved portion 51b1 and the distance between the flexible portion 51b2 connected to the connecting rigid portion 51a2 To the curved portion 51b1 are substantially equal to each other. That is, the amount of flexure of the flexible portion 51b is the largest.

9, when the length L of the swing arm 23 is the largest, the bellows 33c is extended and the lower casing 34 is farthest from the upper casing 31 7). Therefore, the connecting portion between the oscillating rigid portion 51a1 and the flexible portion 51b comes closest to the upper wall of the lower casing 34. [ Further, the distance between the rocking rigid portion 51a1 and the connecting rigid portion 51a2 is maximized. The flexible portion 51b has the largest distance from one end of the flexible portion 51b connected to the oscillating rigid portion 51a1 to the curved portion 51b1, The distance from the other end of the curved portion 51b to the curved portion 51b1 is minimized. That is, the amount of bending of the flexible portion 51b is the smallest.

As described above, when the swinging arm 23 expands and contracts, the amount of bending of the flexible portion 51b varies between the oscillating rigid portion 51a1 and the connecting rigid portion 51a2. The change in the difference between the length of the power line 51 passing through the inside of the swinging arm 23 and the length of the swinging arm 23 is absorbed by the change in the amount of bending of the flexible portion 51b. Therefore, the length of the power line 51 entering and exiting the inside of the swing arm 23 is shortened.

As described above, according to the sputtering apparatus of the second embodiment, the following effects can be obtained.

(2) When the translating stage 22a translates to the connecting shaft portion 23b, the extending and retracting mechanism 40 of the swinging arm 23 shifts the distance between the swinging central shaft portion 23a and the connecting shaft portion 23b And is changed according to the distance between the central shaft portion 23a and the connecting shaft support portion 23b1. Thus, the connection shaft portion 23b provided on the swinging arm 23 can follow the movement of the translation stage 22a.

(3) When the swinging arm 23 expands and contracts, the amount of bending of the flexible portion 51b connected between the oscillating rigid portion 51a1 and the connecting rigid portion 51a2 varies. The change in the difference between the length of the power line 51 passing through the inside of the swinging arm 23 and the length of the swinging arm 23 is absorbed by the change in the amount of bending of the flexible portion 51b. Therefore, the length of the power line 51 entering and exiting the inside of the swing arm 23 is shortened.

The second embodiment may be modified as appropriate as follows.

The curved portion 52a of the gas pipe 52 and the bent portion 53a of the cooling water pipe 53 are not embodied as a portion having a curved shape in each of the gas pipe 52 and the cooling water pipe 53, For example, it may be embodied as a portion having a helical shape in a connection line. The spiral shape may be a two-dimensional spiral shape or a three-dimensional spiral shape.

The configuration of the power line 51 may be applied to at least one of the other lines included in the connection line 50, for example, the gas piping 52 and the cooling water piping 53. [

The sputtering apparatus may be embodied as a combination of the constitution described in the first embodiment and the constitution described in the second embodiment. According to such a structure, the sputtering apparatus can be embodied as a structure having both the effect of the first embodiment and the effect of the second embodiment.

The oscillating arm (23) may not have the elongating / contracting mechanism (40). In this case, the guide tube portion 33 can be embodied as a single cylindrical tube portion. For example, in order to prevent the distance between the connection shaft portion 23b and the translation stage 22a, which is the connection portion of the connection shaft portion 23b from increasing, between the swing center shaft portion 23a and the casing 21, (For example, a stretching member such as a spring) for increasing the distance between the swinging central shaft portion 23a and the casing 21 in accordance with the translation of the unit 22. Even in such a configuration, the effect of the above-described (1) can be obtained when the swinging arm 23 swings about the swinging central shaft portion 23a.

The swinging arm 23 may not include the elongating and contracting mechanism 40. The larger the distance between the connecting shaft portion 23b and the translating stage 22a to which the connecting shaft portion 23b is connected, (For example, a stretching member such as a spring) extending between the connecting shaft portion 23b and the translating stage 22a. In this case, the guide tube portion 33 can be embodied as a single cylindrical tube portion. Even in such a configuration, the above-described effect (1) can be obtained when the swing arm 23 swings about the swing center shaft portion 23a.

The swinging arm 23 may not include the elongating and contracting mechanism 40 and may be provided between the connecting shaft portion 23b and the translating stage 22a and between the swinging central shaft portion 23a and the casing 21, And a connecting portion (for example, a stretching member such as a spring). In this case, the guide tube portion 33 can be embodied as a single cylindrical tube portion. Even in such a configuration, the above-described effect (1) can be obtained when the swing arm 23 swings about the swing center shaft portion 23a.

The power line 51 may include not only a conductor as a component of the power line 51 but also a terminal block that is an insulator located between two conductors. For example, a terminal block for supporting them can be positioned between the oscillating rigid body portion 51a1 and the flexible portion 51b in a state where the oscillating rigid body portion 51a1 and the flexible portion 51b are electrically connected, A terminal block for supporting the connecting rigid portion 51a2 and the flexible portion 51b in a state in which they are electrically connected may be disposed between the flexible portion 51a2 and the flexible portion 51b.

[Third embodiment]

A third embodiment in which the substrate processing apparatus and the film forming apparatus are embodied as a sputtering apparatus will be described with reference to FIGS. 10 to 13. FIG. The sputtering apparatus of the third embodiment is characterized by a power line mounted on the swinging central shaft portion 23a of the swinging arm 23 and a power line mounted on the connecting shaft portion 23b of the swinging arm 23. [ Therefore, these configurations will be described below. In Fig. 10 to Fig. 13, a sputtering apparatus having two power lines 51 is shown as an example.

[Power line at the pivot center shaft portion]

Referring to Figs. 10 and 11, the power line 51 mounted on the pivot center shaft portion 23a will be described. Fig. 10 shows the state of the power line 51 when the length L of the swing arm 23 is the smallest, while Fig. 11 shows the state of the power line 51 when the length L of the swing arm 23 is the largest ) State.

10, the power line 51 includes a first power line 51A and a second power line 51B, and the first power line 51A and the second power line 51B include a pivot axis P And are formed in mutual plane symmetry with respect to virtual planes extending in the height direction. Each of the oscillating rigid bodies 51a1 constituting each power line 51 is formed in a band shape and extends from the inside of the upper casing 31 in a state of being away from the inner circumferential surface of the oscillating central shaft portion 23a extending along the opposite direction And extends toward the end of the pivot center shaft portion 23a. That is, the portion of each of the oscillating rigid portions 51a1 that passes the oscillating center shaft portion 23a extends along the oscillating axis P, and therefore, the oscillating arm 23 is prevented from being deformed due to the oscillation. The ends of the oscillating rigid bodies 51a1 are fixed to the end surface of the oscillating central shaft portion 23a through the insulating material at the end portions of the oscillating central shaft portion 23a. The swinging central shaft portion 23a is an example of a base end rotating portion, and the swing rigid portion 51a1 is an example of a base end rotating wiring.

Each of the first power line 51A and the second power line 51B is fixed to the wall portion of the sputter chamber 13, for example, the wall portion of the casing 21 fixed to the swing flange 23a2, And a pivotal fixing portion 61 connected to the power line. The swing fixing portion 61 is an example of the base end fixed wiring.

Each of the first power line 51A and the second power line 51B has an oscillating flexible portion 62 connected to the end of the oscillating rigid portion 51a1 and the oscillating fixed portion 61. [ Each pivotable flexible portion 62 is formed in a substantially circular arc shape extending along the carrying direction, and is formed of, for example, a flat copper wire having flexibility. The swing flexible portion 62 has a curved portion 62a which is bent by its own weight toward the lower casing 34 in the height direction. The length of the curved portion 62a formed in the oscillating flexible portion 62 deformed in accordance with the distance between the end of the oscillating rigid body portion 51a1 and the oscillating fixing portion 61 corresponds to the amount of bending of the curved portion 62a. The swing flexible portion 62 is an example of a base end flexible line.

10, when the length L of the swinging arm 23 is the smallest, each swinging flexible portion 62 has a distance from the swing rigid portion 51a1 to the curved portion 62a in the carrying direction, So that the distance from the pivotal fixing portion 61 to the curved portion 62a is substantially equalized. That is, when the distance between the end of the rocking rigid portion 51a1 and the pivotal fixing portion 61 is the smallest, the amount of bending of each curved portion 62a becomes the largest.

11, when the length L of the swinging arm 23 is the largest, the swinging center shaft portion 23a swings around the swinging shaft P. As shown in Fig. For example, when the swinging central shaft portion 23a rotates in the left direction on the paper surface, the end portion of the swinging rigid portion 51a1 in the first power line 51A is in contact with the periphery of the swinging central shaft portion 23a And moves downward along the direction. On the other hand, the end of the swing rigid portion 51a1 of the second power line 51B moves upward along the circumferential direction of the swinging central shaft portion 23a. As a result, the distance between the end portion of the rocking rigid portion 51a1 and the pivotal fixing portion 61 is increased, and the amount of flexion of each curved portion 62a is reduced.

As described above, since the rotation of the swinging central shaft portion 23a prevents the power line 51 from twisting, the mechanical load imposed on the power line 51 can be reduced.

[Power line of connection shaft part]

The power line 51 mounted on the connecting shaft portion 23b will be described with reference to Figs. 12 and 13. Fig. 12 shows the state of the power line 51 when the length L of the swing arm 23 is the smallest and FIG. 13 shows the state of the power line 51 when the length L of the swing arm 23 is the largest ) State.

As shown in Fig. 12, each of the connecting rigid portions 51a2 constituting the power line 51 is formed in a band-like shape. In the state of being away from the inner circumferential surface of the connecting shaft portion 23b extending along the opposite direction, 34 toward the end of the connecting shaft portion 23b. That is, the portion of each connecting rigid portion 51a2 that passes through the connecting shaft portion 23b extends along the rotational axis A, so that the deformation of the connecting rigid portion 51a2 is suppressed along with the swinging of the swinging arm 23. Each connecting rigid portion 51a2 is fixed to the end face of the connecting shaft portion 23b through the insulating member at the end portion of the connecting shaft portion 23b. The connection shaft portion 23b is an example of the tip rotation portion, and the connection rigid portion 51a2 is an example of the tip rotation wiring.

Each of the first power line 51A and the second power line 51B has a connection translating portion 71 that translates following the translational movement of the cathode unit 22 and the connecting shaft portion 23b. The connection translating portion 71 is fixed to the inner side surface of the side wall of the translation stage 22a fixed to one side of the translation stage 22a, for example, the connection shaft support portion 23b1, do. The connection translating portion 71 is an example of a front end translating wiring.

Each of the first power line 51A and the second power line 51B has a connecting flexible portion 72 connected to the end of the connecting rigid portion 51a2 and the connecting and translating portion 71. [ Each connecting flexible portion 72 extends downward along the height direction from the end portion of the connecting rigid portion 51a2 and returns to the middle of the connecting rigid portion 51a2 and extends upwardly to the connecting and translating portion 71 along the height direction. Each connecting flexible portion 72 has a return portion 72a which is bent downward by its own weight below the connecting and translating portion 71 along the height direction. The length of the return portion 72a formed in the connection flexible portion 72 which is deformed according to the distance between the end portion of the connecting rigid portion 51a2 and the connection translatory portion 71, The length of the return portion 72a located below is equivalent to the amount of bending of the return portion 72a. Each connecting flexible portion 72 is formed of, for example, a flexible copper wire. The connecting flexible portion 72 is an example of a tip flexible line.

The amount of bending of the return portion 72a of the first power line 51A and the amount of bending of the return portion 72a of the second power line 51B are different from each other when the length L of the swing arm 23 is the smallest, Are equal to each other.

13, when the length L of the swinging arm 23 is the largest, the connecting shaft portion 23b rotates about the rotating stage A with respect to the rotating stage 22a. For example, when the connecting shaft portion 23b swings to the right in the paper surface, the end portion of the connecting rigid portion 51a2 in the first power line 51A is set to be in the circumferential direction of the connecting shaft portion 23b And the end of the connecting rigid portion 51a2 of the second power line 51B moves upward along the circumferential direction of the connecting shaft portion 23b. As a result, in the first power line 51A, the distance between the end portion of the connecting rigid portion 51a2 and the connecting transducing portion 71 is reduced. On the other hand, in the second power line 51B, And the connection translating portion 71 is increased. As a result, in the first power line 51A, the amount of bending in the connecting flexible portion 72 becomes large while in the second power line 51B, the amount of bending in the connecting flexible portion 72 becomes small.

As described above, since the rotation of the connecting shaft portion 23b prevents the power line 51 from twisting, the mechanical load imposed on the power line 51 can be reduced.

As described above, according to the sputtering apparatus of the third embodiment, the following effects can be obtained.

(4) Since the first power line 51A and the second power line 51B are prevented from twisting due to the rotation of the oscillation central axis portion 23a, the first power line 51A and the second power line 51B It is possible to reduce the mechanical load to be received.

The first power line 51A and the second power line 51B are prevented from twisting due to the rotation of the connecting shaft portion 23b of the first power line 51A and the second power line 51B, The receiving mechanical load can be reduced.

The third embodiment may be modified as appropriate as follows.

Each of the first power line 51A and the second power line 51B may not include the connecting flexible portion 72 and each of the connecting rigid portions 51a2 may be configured to be connected to the connecting and translating portion 71 Lt; / RTI > Even in such a configuration, if each of the first power line 51A and the second power line 51B is provided with the swing flexible portion 62, the effect according to the above-mentioned (4) can be obtained.

Each of the first power line 51A and the second power line 51B may not include the pivotable flexible portion 62 and each of the pivot rigid portions 51a1 may be connected to the pivotal fixing portion 61 Lt; / RTI > Even in such a configuration, if the first power line 51A and the second power line 51B each have the connecting flexible portion 72, the effect according to the above-mentioned (5) can be obtained.

A terminal formed in an annular shape around the pivot axis P and connected to the utility (hereinafter referred to as a utility connection terminal) is mounted on the end face of the pivot center shaft portion 23a of the swing arm 23 through an insulator . In this configuration, in the state where the end near the pivot center shaft portion 23a of the two end portions of the connection line 50 can move along the circumferential direction of the utility connection terminal, . According to such a configuration, the end of the connection line 50 connected to the utility connection terminal is suppressed from being deformed due to the swinging motion of the swing arm 23.

A terminal connected to the cathode unit 22 disposed in the casing 21 (hereinafter referred to as a cathode unit connection terminal) is formed in an annular shape with the rotation axis A as a center and connected to the connection shaft portion 23b of the swing arm 23, (Not shown). In this configuration, an end of the two ends of the connection line 50, which is close to the connection shaft portion 23b, is connected to the cathode unit connection terminal in a state of being movable along the circumferential direction of the cathode unit connection terminal . According to such a configuration, the end portion of the connection line 50 connected to the cathode unit connection terminal is suppressed from being deformed due to the swinging motion of the swing arm 23.

Each of the first power line 51A and the second power line 51B may include not only a conductor but also a terminal block which is an insulator located between two conductors as a component. Alternatively, each of the first power line 51A and the second power line 51B may include a terminal block that is an insulator located between one conductor included in the component and a power source located outside the casing 21 .

The configuration of the first power line 51A and the second power line 51B can be applied not to the power line 51 but to the gas line 52 or the cooling water line 53 which is another line included in the connection line 50 .

The sputtering apparatus can be embodied as a combination of the structure described in the first embodiment and the structure described in the third embodiment. With this structure, the sputtering apparatus can be embodied as a structure having both the effects of the first embodiment and the effect of the third embodiment.

The sputtering apparatus can be embodied as a combination of the structure described in the first embodiment, the structure described in the second embodiment, and the structure described in the third embodiment. According to such a configuration, the sputtering apparatus can be embodied as a configuration having both the effects of the first embodiment, the effect of the second embodiment, and the effect of the third embodiment.

10 sputter apparatus, 11 transfer chamber, 12 pre-treatment chamber, 13 sputter chamber, 14 gate valve, 15 times base, 16 deposition lane, 17 recovery lane, 18 cathode device, 19 lane changing section, 21 casing, 22 cathode 23a a swinging shaft support portion, 23a2 a swinging shaft support portion, 23a2 a swing flange, 23b a connecting shaft portion, 23b1 a connecting shaft support portion, 23b2 a connecting flange, 31 an upper casing, 31a a swing opening portion, A lower opening portion and a lower opening portion are formed in the upper and lower cylindrical portions of the upper casing and the lower casing, respectively. 51a 51a 51a1 swinging rigid portion 51a2 connecting rigid portion 51b flexible portion 51b1 61a bend portion 51A first power line 51B second power line 52 gas pipe 52a 53a bent portion, 53 cooling water pipe, 61 swinging fixing portion, 62 swinging flexible portion , 71 connection connecting portion, 72 connecting flexible portion, 72a return portion, A rotating shaft, P pivoting shaft, S substrate, T tray

Claims (6)

A casing,
A hollow swinging arm disposed inside the casing, the hollow swinging arm including: a hollow swinging central shaft portion that is pivotally supported by the swinging shaft support portion fixed to the casing such that the swinging shaft can rotate with respect to the casing; The rocking arm including a connecting shaft portion,
A processing unit which is located inside the casing and moves the processing space facing the substrate in a direction orthogonal to the axial direction of the swinging central axis part to perform processing on the substrate, wherein the processing unit follows the movement of the processing unit, The processing portion being connected to the connection shaft portion so as to be able to translate the processing portion,
And a connection line which is located inside the swinging arm and is connected to a utility located outside the casing through the inside of the swinging central axis portion and connected to the processing portion through the inside of the connection shaft portion,
Wherein the processing section includes a shaft supporting section for rotatably supporting the connection shaft section with respect to the processing section,
Wherein the swing arm includes a stretching mechanism that displaces the connecting shaft portion with respect to the swinging central shaft portion and expands and contracts the distance between the swinging central shaft portion and the connecting shaft portion,
The elongating and contracting mechanism changes a distance between the swinging central axis portion and the connecting shaft portion in accordance with the distance between the swinging central shaft portion and the shaft supporting portion,
Wherein the connection line includes a bent portion having a bent shape and the bent portion is provided inside the lower casing of the swing arm connected to the connecting shaft portion.
delete The method according to claim 1,
Wherein the connection line is composed of a plurality of line components,
Wherein the plurality of line elements comprise:
Two intermediate rigid wiring lines which are disposed inside the swinging arm and which are individually fixed to the swinging arm and which extend and retract each other in accordance with the expansion and contraction of the swinging arm by the extending and contracting mechanism,
And an intermediate flexible line arranged inside the swinging arm and connected between the two intermediate rigid wiring lines and having flexibility so as to reduce the amount of bending in accordance with an increase in the distance between the two intermediate rigid wiring lines, .
The method according to claim 1 or 3,
Wherein the pivot center shaft portion is provided as a proximal rotating portion that rotates with respect to the casing about a rotation axis along the axial direction of the pivot center shaft portion,
The connection line includes:
A base end rotation wiring fixed to the base end rotation part and being a rigid body rotating following the rotation of the base end rotation part,
A base fixed wiring that is a rigid body fixed to the casing,
A base end which is provided so as to be able to be wheeled by its own weight and which is connected between the base end rotation wiring and the base end fixed wiring and reduces the amount of bending according to an increase in the distance between the base end rotation wiring and the base end fixed wiring Line.
The method according to claim 1 or 3,
Wherein the connection shaft portion is provided as a tip rotation portion that rotates with respect to the processing portion about a rotation axis along an axial direction of the swinging central axis portion,
The connection line includes:
A distal rotating wire fixed to the distal rotating part and being a rigid body rotating following the rotation of the distal rotating part,
A distal end translating wiring fixed to the processing portion and being a rigid body that follows the movement of the processing portion and translates with the processing portion,
And a distal end connected to between the distal rotation wiring and the distal rotation wiring so as to reduce the amount of deflection in accordance with an increase in the distance between the distal rotation wiring and the distal rotation wiring, Line.
A casing,
A hollow pivotal arm located inside the casing, the hollow pivotal shaft including a hollow pivotal central shaft portion that is pivotally supported by the pivotal shaft support portion fixed to the casing so as to be rotatable with respect to the casing, and a hollow connecting shaft portion that is a swinging end The rocking arm,
And a film forming unit for forming a film on the substrate by moving a processing space facing the substrate in a direction orthogonal to the axial direction of the swinging central axis part and releasing a film forming material toward the substrate, A film forming part connected to the connection shaft part so that the connection shaft part can translate with the film forming part following the movement of the part and that rocks the swinging arm by movement of the film forming part,
And a connecting line which is located inside the swinging arm and is connected to a utility located outside the casing through the inside of the swinging central axis portion and connected to the film forming portion through the inside of the connecting shaft portion,
Wherein the film forming section has a shaft supporting section for rotatably supporting the connection shaft section with respect to the film forming section,
Wherein the swing arm includes a stretching mechanism that displaces the connecting shaft portion with respect to the swinging central shaft portion and expands and contracts the distance between the swinging central shaft portion and the connecting shaft portion,
The elongating and contracting mechanism changes a distance between the swinging central axis portion and the connecting shaft portion in accordance with the distance between the swinging central shaft portion and the shaft supporting portion,
Wherein the connection line includes a bent portion having a bent shape and the bent portion is provided inside the lower casing of the swing arm connected to the connecting shaft portion.
KR1020167008733A 2013-09-26 2014-09-17 Substrate processing device and film forming device KR101763906B1 (en)

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JP2000178716A (en) * 1998-12-15 2000-06-27 Mitsubishi Electric Corp Formation of film and device therefor
JP2010040956A (en) * 2008-08-08 2010-02-18 Tokyo Electron Ltd Substrate processing apparatus
JP5231917B2 (en) * 2008-09-25 2013-07-10 株式会社日立ハイテクノロジーズ Deposition equipment
KR20110042217A (en) 2008-10-16 2011-04-25 가부시키가이샤 아루박 Sputtering apparatus, method for forming thin film, and method for manufacturing field effect transistor
WO2011135731A1 (en) * 2010-04-28 2011-11-03 株式会社ユーテック Substrate processing apparatus and method for manufacturing thin film

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Publication number Priority date Publication date Assignee Title
JP2009299176A (en) * 2008-06-16 2009-12-24 Samsung Mobile Display Co Ltd Transfer apparatus and organic deposition device with the same
JP2012012626A (en) 2010-06-29 2012-01-19 Hitachi High-Technologies Corp Assist mechanism and assist method for conveying heavy load, and device and method for film deposition

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CN105555996B (en) 2017-03-22
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JPWO2015045980A1 (en) 2017-03-09
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CN105555996A (en) 2016-05-04
KR20170017004A (en) 2017-02-14

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