TW201516170A - Substrate processing apparatus and film forming apparatus - Google Patents

Abstract

A substrate processing device is provided with a casing (21) and a hollow swing arm (23) located inside the casing. The swing arm includes a hollow swing center shaft part (23a) connected to the casing and a hollow linking shaft part (23b) representing the swinging end. The substrate processing device is further provided with a processing part (22) located inside the casing and adapted to move within a processing space, which faces the substrate, in a direction orthogonal to the axial direction (P) of the swing center shaft part and process the substrate. The processing part is linked to the linking shaft part so that the linking shaft part (23b) is able to move parallel to the processing part so as to track the movement of the processing part. Therefore, the movement of the processing part (22) causes the swing arm (23) to swing. The substrate processing device is further provided with a connection line located inside the swing arm (23), connected through the interior of the swinging center shaft part (23a) to a utility located outside the casing, and connected through the interior of the linking shaft part (23b) to the processing part.

Description

Substrate processing device and film forming device

The present invention relates to a substrate processing apparatus that performs processing on a substrate, and a film forming apparatus that forms a thin film on the substrate.

As a sputtering apparatus for forming a thin film on a substrate, for example, as described in Patent Document 1, a sputtering apparatus including a target and a sputtering device that moves from one side to the other on a pair of opposite sides of the substrate has been used. Known. In the sputtering apparatus, the sputtering particles are emitted to the substrate while the cathode moves.

[Previous Technical Literature] [Patent Literature]

[Patent Document 1] International Publication No. 2010/044257

Further, the sputtering apparatus has a connection line including a power supply line for supplying power to the target, a pipe for supplying a sputtering gas to the surface of the target, and the like. In the above sputtering apparatus, each time the cathode moves, the connecting line is pulled in from the outside of the chamber in which the cathode is disposed, or is pulled out from the inside of the chamber only by the distance at which the cathode moves. Then, whenever the cathode moves, because the connecting wire is pulled, or the connecting wire and the member of the guiding connecting wire are rubbed, the connecting wire is repeatedly covered by the machine. Mechanical load.

Further, the above-described matters are substantially the same as long as the film forming apparatus such as a sputtering apparatus is a substrate processing apparatus that moves the processing unit of the processing substrate in a space facing the substrate.

An object of the present invention is to provide a substrate processing apparatus capable of reducing a mechanical load that is received and received between a frame body and a frame body by a connection line connected to a processing portion of a processing substrate; A film forming device is also provided.

In the substrate processing apparatus of the present invention, an aspect includes a frame body and a hollow swing arm located inside the frame body. The swing arm includes a hollow swing center shaft portion connected to the frame body and a hollow joint shaft portion as a swing end. Further, the substrate processing apparatus includes a processing unit that is located inside the housing and that moves in a direction perpendicular to the axial direction of the swing center shaft portion in the processing space facing the substrate to perform processing on the substrate. The processing unit is coupled to the connecting shaft portion so as to follow the movement of the processing unit so that the connecting shaft portion and the processing portion advance together, and the swing arm is swung by the movement of the processing portion. Further, the substrate processing apparatus includes a connection line that is located inside the swing arm, and is connected to a common device located outside the frame by the inside of the swing center shaft portion, and is connected to the inside of the connection shaft portion. The processing unit is connected.

According to this configuration, when the treatment portion is advanced together with the connection shaft portion, the swing arm swings around the swing center shaft portion. At this time, the connecting line located in the swinging arm follows the swing of the swinging arm on the one hand, and ensures the connection with the processing portion on the other hand. Therefore, the connecting wire is hardly moved in and out between the inside and the outside of the swinging arm by swinging the center shaft portion. That is, the connection line Follow the swing of the swinging arm and swing around the center axis of the swing center. Therefore, the amount of change in the length of the connecting line that changes between the inside and the outside of the casing can be made smaller than the moving distance of the processing portion. As a result, the mechanical load that the connecting wire receives due to entering and exiting between the inside of the casing and the outside of the casing can be reduced.

The film forming apparatus in the art of the present invention has a frame body and a hollow swing arm located inside the frame body. The swing arm includes a hollow swing center shaft portion connected to the frame body, and a hollow joint shaft portion as a swing end. Further, the film forming apparatus includes a film forming portion which is located inside the casing and moves in a direction perpendicular to the axial direction of the swing center shaft portion in the processing space facing the substrate to release the substrate A film material whereby a film is formed on the substrate. The film formation portion is coupled to the connection shaft portion so as to follow the movement of the film formation portion so that the connection shaft portion and the film formation portion are advanced, and the swing arm is caused by the movement of the film formation portion. swing. Further, the film forming apparatus includes a connecting line which is located inside the swing arm, is connected to a common device located outside the frame by the inside of the swing center shaft portion, and is formed by the inside of the connecting shaft portion. Department connection.

According to this configuration, when the film formation portion and the connection shaft portion are advanced together, the swing arm swings around the swing center shaft portion. At this time, the connecting line located in the swinging arm, on the one hand, follows the swinging arm to swing, and on the other hand ensures the connection with the film forming portion. Therefore, the connecting wire passes through the swing center shaft portion and hardly enters between the inside and the outside of the swing arm. That is, the connecting line follows the swing of the swinging arm and swings around the center axis of the swinging center. Therefore, the amount of change in the length of the connecting line which changes between the inside and the outside of the casing can be made smaller than the moving distance of the film forming portion. As a result, it is possible to reduce the mechanical load that the connecting wire is subjected to because it enters and exits between the inside of the casing and the outside of the casing.

In the above substrate processing apparatus, the processing unit preferably includes a shaft support that supports the connection shaft portion so as to be rotatable relative to the processing portion. Further, the swing arm preferably includes a telescopic mechanism that displaces the connecting shaft portion with respect to the swing center shaft portion, and expands and contracts the distance between the swing center shaft portion and the connecting shaft portion. In this configuration, the telescopic mechanism is changed such that "the distance between the swing center shaft portion and the connecting shaft portion" is "the distance between the swing center shaft portion and the shaft branch portion".

According to this configuration, when the treatment portion is moved in together with the connection shaft portion, the telescopic mechanism of the arm is swung so that the distance between the swing center shaft portion and the connection shaft portion is matched with the distance between the swing center shaft portion and the shaft portion. Variety. Therefore, the connecting shaft portion of the swing arm can follow the movement of the processing portion.

In the above substrate processing apparatus, the connection line is preferably composed of a plurality of line constituent elements. Moreover, the plurality of line constituent elements preferably include two intermediate rigid body lines disposed inside the swing arm and respectively fixed to the swing arm, and the expansion and contraction of the swing arm is performed by the telescopic mechanism to make each other The distance is telescopic. Moreover, the plurality of line constituent elements preferably include an intermediate flexible line disposed inside the swing arm and connected between the two intermediate rigid body lines and having flexibility to accommodate two intermediate rigid body lines The distance between them increases to make the amount of deflection smaller.

According to this configuration, when the swing arm is stretched and contracted, the amount of deflection of the intermediate flexible line can be changed between the two intermediate rigid body lines. Therefore, the change in the amount of deflection of the intermediate flexible wire can be absorbed to absorb the change in the difference between the length of the connecting line passing through the inside of the swinging arm and the length of the swinging arm. Thus, the length of the connecting line between the inside and the outside of the swinging arm is made shorter.

In the above substrate processing apparatus, the swing center shaft portion is preferably set to rotate at the base end The portion rotates relative to the frame centering on a rotation axis along the axial direction of the swing center shaft portion. Moreover, the connecting wire preferably includes: a base end rotating wire, which is a rigid body fixed to the base end rotating portion and rotates following the rotation of the base end rotating portion; the base end fixing wire is fixed to the frame body a rigid body; and a base end flexible wire which is disposed by being deflected by its own weight and connected between the base end fixing wire and the base end rotating wire, so as to rotate the wiring and the base at the base end The distance between the end fixing wires is increased to reduce the amount of deflection.

According to this configuration, the twist of the connecting wire due to the rotation of the base end rotating portion can be suppressed. Therefore, the mechanical load on the connecting wire can be reduced.

In the above-described substrate processing apparatus, the connection shaft portion is preferably provided as a distal end rotation portion that rotates with respect to the treatment portion around a rotation axis along the axial direction of the oscillation center shaft portion. Further, the connecting wire preferably includes a front end rotating wire that is a rigid body that is fixed to the front end rotating portion and that rotates in accordance with the rotation of the front end rotating portion. The front end is wired in parallel, and the rigid body is fixed to the rigid body. The processing unit is moved in parallel with the processing unit in accordance with the movement of the processing unit; and the front end flexible line is provided so as to be deflectable by its own weight, and is connected between the front end rotating wiring and the front end parallel wiring. The amount of deflection is reduced by an increase in the distance between the front end rotating wiring and the front end parallel wiring.

According to this configuration, the distortion of the connecting line due to the rotation of the distal end rotating portion can be suppressed. Therefore, the mechanical load on the connecting wire can be reduced.

10‧‧‧ Sputtering device

11‧‧‧Transported into the chamber

12‧‧‧Pre-treatment chamber

13‧‧‧ Sputtering chamber

14‧‧‧ gate valve

15‧‧‧Exhaust Department

16‧‧‧film formation channel

17‧‧‧Recovery channel

18‧‧‧ positive device

19‧‧‧Channel Change Department

21‧‧‧ frame

22‧‧‧ cathode unit

22a‧‧‧and enter the stage

22b‧‧‧ Track

23‧‧‧Swing arm

23a‧‧‧Swing center shaft

23a1‧‧‧Swing shaft branch

23a2‧‧‧Swing flange

23b‧‧‧Connected shaft

23b1‧‧‧Connected shaft branch

23b2‧‧‧Link flange

31‧‧‧ upper frame

31a‧‧‧Swing opening

31b‧‧‧Upper opening

32‧‧‧ fixed board

32a‧‧‧Fixed openings

33‧‧‧Guide tube

33a‧‧‧Upper tube

33b‧‧‧ lower tube

33c‧‧‧Flexible hose

34‧‧‧Lower frame

34a‧‧‧Connecting opening

34b‧‧‧lower opening

40‧‧‧Flexing mechanism

41‧‧‧Long pole

41a‧‧‧Upper end

42‧‧‧Long Rod Guide

50‧‧‧Connecting line

51‧‧‧Power cord

51a‧‧‧ rigid body

51a1‧‧‧Swinging body

51a2‧‧‧Connected body

51b‧‧‧Flexing Department

51b1‧‧‧Bend

51A‧‧‧First power cord

51B‧‧‧second power cord

52‧‧‧ gas piping

52a‧‧‧Flexing Department

53a‧‧‧Flexing Department

53‧‧‧Cooling water piping

61‧‧‧Swing fixed part

62‧‧‧Swinging flexible part

62a‧‧‧Bend

71‧‧‧Link and Advance

72‧‧‧Connecting the flexible department

72a‧‧‧Departure

A‧‧‧Rotary axis

P‧‧‧ swing axis

S‧‧‧Substrate

T‧‧‧Tray

L‧‧‧ length

The first drawing is a configuration diagram in which the internal configuration of the sputtering apparatus of the first embodiment of the film forming apparatus is schematically shown together with the substrate to be processed by the sputtering apparatus.

The second figure is transparent to the internal structure of the frame from the direction opposite to the substrate located in the frame. Vision diagram.

The third figure is a perspective view of the internal structure of the frame from a direction opposite to the substrate located in the casing.

The fourth figure is a perspective view of the internal structure of the frame from a direction opposite to the substrate located in the casing.

Fig. 5 is a cross-sectional view showing a cross-sectional structure in the height direction of the swing arm of the sputtering apparatus of the second embodiment of the film forming apparatus.

The sixth figure shows a front view of the frontal configuration of the swinging arm before it is extended.

The seventh diagram shows a front view of the frontal configuration of the swinging arm after it has been elongated.

The eighth figure shows a cross-sectional view of a partial cross-sectional structure along the height direction before the swing arm is extended.

The ninth diagram shows a cross-sectional view of a partial cross-sectional structure along the height direction in which the swing arm is elongated.

Fig. 10 is a partial rear elevational view showing a part of the back surface structure of the swing arm which is provided in the sputtering apparatus of the third embodiment of the film forming apparatus from the side opposite to the substrate with respect to the cathode device.

The eleventh figure shows a partial rear view of a portion of the back side configuration of the swing arm viewed from the side opposite to the substrate with respect to the cathode device.

The twelfth line shows a partial front view of a partial front configuration of the swing arm viewed from the side of the substrate with respect to the cathode device.

The thirteenth diagram shows a partial front view of a partial front configuration of the swing arm viewed from the side of the substrate with respect to the cathode device.

[First Embodiment]

A first embodiment in which a substrate processing apparatus and a film forming apparatus are embodied as a sputtering apparatus will be described with reference to the first to fourth drawings. Hereinafter, an example of the entire configuration of the sputtering apparatus, the cathode apparatus included in the sputtering apparatus, and the role of the cathode apparatus will be described in order.

[The overall structure of the sputtering device]

An example of the overall configuration of the sputtering apparatus will be described with reference to the first drawing.

As shown in the first figure, the sputtering apparatus 10 includes an inlet and outlet chamber 11, a pretreatment chamber 12, and a sputtering chamber 13; the three chambers are arranged side by side in the conveying direction in one direction. The sputtering apparatus 10 includes two gate valves 14 that are respectively coupled between the inlet and outlet chambers 11 and the pretreatment chamber 12, and between the pretreatment chamber 12 and the sputtering chamber 13. Each of the three chambers is provided with an exhaust portion 15 that decompresses each chamber. The bottom surfaces of the three chambers are respectively mounted with a film formation path 16 and a recovery path 17, which are two paths extending in the conveying direction and parallel to each other.

The film formation path 16 and the recovery path 17 are composed of, for example, a track extending in the transport direction, a plurality of rollers arranged along the transport direction, and a plurality of motors each rotating the plurality of rollers. The film formation path 16 transports the tray T carried into the inside of the sputtering apparatus 10 from the transport-in chamber 11 to the sputtering chamber 13 together with the substrate S before film formation. The recovery path 17 transports the tray T carried into the inside of the sputtering chamber 13 from the sputtering chamber 13 to the carry-out chamber 11 together with the formed substrate S. In the tray T, the rectangular substrate S extending toward the front of the paper surface is fixed in an upright state. The width of the substrate S is, for example, 2200 mm along the transport direction and 2500 mm toward the front of the paper.

The film is transported into the chamber 11, and the substrate S before being formed from the outside of the sputtering apparatus 10 is sent to the pretreatment chamber 12, and the filmed substrate S carried from the pretreatment chamber 12 is sent to the sputtering. Loading Set the outside of 10. When the substrate S before film formation is carried out into the chamber 11 from the outside, or when the substrate S after being formed is transported out of the chamber 11 to the outside, it is carried out into the chamber 11 The chamber is pressurized to atmospheric pressure. When the substrate S before the film formation is carried into the pretreatment chamber 12 from the chamber 11, or when the substrate S after the film formation is carried out from the pretreatment chamber 12 to the chamber 11, The inside of the chamber 11 is evacuated to the same extent as the inside of the pretreatment chamber 12.

The pretreatment chamber 12 performs, for example, a heat treatment or a washing treatment on the substrate S before being formed into the pretreatment chamber 12 from the inlet and outlet chambers 11 to perform a film formation process. The pretreatment chamber 12 carries the substrate S transported out of the chamber 11 to the pretreatment chamber 12 into the sputtering chamber 13. Further, the pretreatment chamber 12 transports the substrate S transported from the sputtering chamber 13 to the pretreatment chamber 12 to the carry-out chamber 11.

The sputtering chamber 13 includes a cathode device 18 that discharges the film forming material to the substrate S. In the cathode device 18, the cathode device 18 discharges a film forming material in a processing space facing the substrate S. The sputtering chamber 13 includes a path changing portion 19 provided between the film formation path 16 and the recovery path 17.

In the sputtering chamber 13, a film is formed on the substrate S before film formation from the pretreatment chamber 12 into the sputtering chamber 13 by using the cathode device 18. In the sputtering chamber 13, the path changing portion 19 is used to move the tray T together with the substrate S after the film formation from the film formation path 16 to the recovery path 17.

Further, the sputtering apparatus 10 may be configured to include at least the sputtering chamber 13. In such a configuration, the sputtering chamber 13 may not include the film formation path 16, the recovery path 17, and the path changing unit 19, and may include only the arrangement portion in which the substrate S and the cathode device 18 are disposed in a relative state.

[cathode device]

The cathode device 18 will be described with reference to the second figure. In addition, for convenience of explanation, the second figure In the fourth drawing, the wall portion of the frame constituting the sputtering chamber 13, that is, the wall portion parallel to the conveying direction is omitted.

As shown in the second figure, the cathode device 18 is located inside the casing 21 which is formed in a box shape to constitute the sputtering chamber 13, and the casing 21 has two wall portions which are parallel to the conveying direction. The two wall portions parallel to the conveying direction face each other, and the wall portion of one of the two wall portions faces the wall portion of the other side in a facing direction. The cathode device 18 includes a cathode unit 22 and a swing arm 23.

The cathode unit 22 has a parallel-shaped table 22a formed in a hollow rectangular column shape, and a wall portion that faces the substrate S among the wall portions that form the parallel table 22a has a target material composed of a material forming a film. The backing table 22a is provided with a back plate that is connected to the target and that supplies power to the target from the outside, and a magnetic circuit that forms a stray magnetic field on one surface of the target that faces the substrate S. The cathode unit 22 is an example of a processing unit and a film forming unit.

Inside the casing 21, a rail 22b extending in the conveying direction is laid, and the joining table 22a is placed on the rail 22b. The joining table 22a is coupled to a driving unit that moves the joining table 22a back and forth along the rail 22b. The parallel table 22a is driven by the driving portion, thereby moving back and forth along the conveying direction. The parallel stage 22a is moved in the processing space facing the substrate S by moving back and forth along the transport direction.

The above-described two wall portions in the frame 21 are mounted with a swing arm 23 located inside the frame 21 on one of the wall portions. The swing arm 23 is formed in a hollow and substantially rectangular column shape, and is swung centering on the swing axis P extending in the facing direction.

The swing arm 23 includes a hollow swing center shaft portion 23a that is connected to the frame body 21 above the frame body 21, and a hollow connection shaft portion 23b that is connected to the parallel table 22a at the lower side inside the frame body 21 as a swing end. For example, the swing center shaft portion 23a, the rail 22b in the transport direction The approximately centrally aligned position is connected to the upper portion of the wall of the frame 21. The axial direction of the swing center shaft portion 23a coincides with the swing axis P.

The swing shaft branch portion 23a1 is located outside the swing center shaft portion 23a, and the swing shaft branch portion 23a1 is formed in a tubular shape extending in the facing direction, and supports the swing center shaft portion 23a in a state of being rotatable relative to the frame body 21. The swing shaft branch portion 23a1 is fixed to the frame body 21. That is, the casing 21 is provided with the swing shaft branch portion 23a1.

The connecting shaft portion 23b is connected to the outer surface of the wall portion facing the target in the joining table 22a, and the connecting shaft portion 23b is connected to, for example, the lower side of the center of the joining table 22a. The connecting shaft portion 23b is rotated with respect to the parallel table 22a centering on the rotation axis A that coincides with the central axis extending in the facing direction. The connection shaft portion 23b is coupled to the parallel table 22a while the cathode unit 22 is being advanced.

The connection shaft support portion 23b1 is located outside the connection shaft portion 23b, and the connection shaft support portion 23b1 is formed in a tubular shape extending in the facing direction, and supports the connection shaft portion 23b so as to be rotatable relative to the table 22a. The connecting shaft branch portion 23b1 is fixed to the parallel table 22a. That is, the cathode unit 22 is provided with the connection shaft branch portion 23b1.

In the cathode device 18, the inside of the swing arm 23 and the inside of the parallel table 22a connected to the inside of the swing arm 23 are atmospheric atmosphere. On the other hand, since the vacuum sealing member is located between the outer peripheral surface of the swing center shaft portion 23a and the inner peripheral surface of the swing shaft branch portion 23a1, and the vacuum seal member is located between the outer peripheral surface of the joint shaft portion 23b and the inner peripheral surface of the joint shaft portion 23b1, When the inside of the casing 21 is decompressed in the exhaust portion 15, the inside of the casing 21 can be held in a vacuum atmosphere.

The connecting line is located inside the swing arm 23, and the connecting line is connected to a common device for driving the cathode unit 22 and disposed outside the sputtering chamber 13, and is used to drive the cathode unit 22 It is connected to the cathode unit 22 located inside the sputtering chamber 13. The shared device includes, for example, various power sources, a gas cylinder having a process gas of a sputtering gas and a reactive gas, and a cooling water tank. The connection line may be, for example, a power supply line that supplies the target power source, a pipe through which the cooling water for cooling the target material flows, and a pipe through which the process gas supplied to the inside of the sputtering chamber 13 flows.

[The role of the cathode device]

Referring to the second to fourth figures, the action of the cathode device will be explained.

As shown in the second figure, when the cathode device 18 starts to form a film, the joining table 22a is inside the casing 21 at one end in the conveying direction of the rail 22b, for example, at the left end portion of the second drawing. At this time, the swing center shaft portion 23a of the swing arm 23 is located substantially at the center of the rail 22b in the transport direction, and is connected to the upper side of the wall portion of the casing 21. On the other hand, the connecting shaft portion 23b of the swing arm 23 is located below the inside of the casing 21 at the left end side position of the rail 22b in the transport direction. Therefore, the parallel insertion table 22a forms a predetermined angle with the extending direction of the swing arm 23 in the direction in which the rail 22b extends vertically.

When the cathode device 18 starts to form a film, the joining table 22a moves along the rail 22b from one end in the conveying direction perpendicular to the swing axis P toward the other end. For example, the parallel table 22a moves in the transport direction from the left end toward the right end of the second figure. As a result, the connecting shaft portion 23b of the swing arm 23 also advances along with the parallel table 22a in the transport direction. Therefore, the position of the connecting shaft portion 23b in the transport direction is close to the position of the swing center shaft portion 23a in the transport direction. As a result, the angle formed between the direction in which the parallel stage 22a extends and the direction in which the swing arm 23 extends is gradually reduced. When the joining table 22a advances together with the connecting shaft portion 23b in the conveying direction, the swing center shaft portion 23a rotates together with the connecting shaft portion 23b. At this time, the direction in which the swing center shaft portion 23a rotates with respect to the casing 21 is the same as the direction in which the connecting shaft portion 23b rotates with respect to the parallel table 22a.

As shown in the third figure, when the parallel table 22a is moved in parallel with the connecting shaft portion 23b in the transport direction, and the position of the swing center shaft portion 23a in the transport direction overlaps with the position of the connecting shaft portion 23b in the transport direction, The extending direction of 22a overlaps with the extending direction of the swing arm 23. As a result, the above angle becomes 0°.

When the insertion table 22a is closer to the other end than the position of the swing center shaft portion 23a in the transport direction, the position of the connection shaft portion 23b in the transport direction is away from the position of the swing center shaft portion 23a in the transport direction. As a result, the angle formed between the direction in which the parallel stage 22a extends and the direction in which the swing arm 23 extends is gradually increased.

As shown in the fourth figure, if the parallel table 22a is moved to the other end of the rail 22b in the transport direction, for example, to the right end in the second figure, the swing center shaft portion 23a of the swing arm 23 is in the transport direction. The position where the center of the rail 22b coincides is located above the inside of the casing 21. On the other hand, the connecting shaft portion 23b of the swing arm 23 is positioned below the inside of the casing 21 at a position on the right side of the transport direction rail 22b. Therefore, the angle formed by the extending direction of the joining table 22a and the extending direction of the swing arm 23 is substantially the same angle as when the joining table 22a is located at the left end of the rail 22b.

In this manner, the cathode unit 22 advances together with the connecting shaft portion 23b from one end of the rail 22b toward the other end or from the other end toward the one end in the transport direction. Thereby, the swing arm 23 which has the connection shaft part 23b as a swing end is rocking centering on the swing center shaft part 23a.

Therefore, when the cathode unit 22 is advanced along the rail 22b and the connecting shaft portion 23b, the connecting line passing through the inside of the casing 21 also swings around the swing center shaft portion 23a as the swing arm 23 swings. At this time, the connecting line inside the swinging arm 23 follows the swinging arm on the one hand. The oscillation of 23 ensures on the one hand the connection to the cathode unit 22. Therefore, the connecting wire passes through the swing center shaft portion 23a, and hardly enters and exits between the inside and the outside of the swing arm 23. Thereby, since the amount of change in the length of the connecting line which changes between the inside and the outside of the casing 21 is smaller than the distance in which the cathode unit 22 is advanced, the mechanical load on the connecting line can be reduced.

As described above, according to the sputtering apparatus of the first embodiment, the following effects can be obtained.

(1) When the cathode unit 22 and the connecting shaft portion 23b are advanced, the swing arm 23 swings. At this time, the connecting line located inside the swing arm 23 swings around the swing center shaft portion 23a as the swing arm 23 swings, and on the other hand, the connection with the cathode unit 22 is ensured. Therefore, the connecting wire passes through the swing center shaft portion 23a, and hardly enters and exits between the inside and the outside of the swing arm 23. Therefore, the amount of change in the length of the connecting line which changes between the inside and the outside of the casing 21 can be made smaller than the distance by which the cathode unit 22 moves. As a result, the mechanical load that the connecting wire is subjected to entering and exiting between the inside of the casing 21 and the outside of the casing 21 can be reduced.

Further, the first embodiment can be appropriately changed as described below.

‧ The swing center shaft portion 23a is connected to the wall portion of the casing 21, and may not be at a position that coincides with the substantially center of the rail 22b in the transport direction. As long as the swing arm 23 can swing, the position at which the swing center shaft portion 23a is connected to the wall portion of the frame body 21 may be a position corresponding to either one of the both end portions of the rail 22b in the transport direction or another position.

‧ As described above, the cathode unit 22 is not limited to a configuration in which a flat plate-shaped target is formed to face the substrate S. The cathode unit 22 may be configured to include a target having a rotation axis that moves together with the parallel table 22a along the conveyance direction, and forms a cylindrical shape having a rotation axis as a central axis, and the substrate S Face to face.

‧ The film forming apparatus may not be a sputtering apparatus 10 including the cathode unit 22, and may be embodied in various film forming apparatuses such as a vapor deposition apparatus having a vapor deposition source as a film forming unit. Alternatively, the film forming apparatus may be embodied as a processing device including an ion beam irradiation unit having an ion beam irradiation unit as a processing unit, or a laser irradiation unit such as an ultraviolet light as a processing unit. Laser irradiation device, etc.

[Second embodiment]

A second embodiment in which a substrate processing apparatus and a film forming apparatus are used as a sputtering apparatus will be described with reference to the fifth to ninth drawings. The distance between the swing center shaft portion 23a of the swing arm 23 and the joint shaft portion 23b changes in accordance with the distance between the swing center shaft portion 23a and the joint shaft portion 23b1. Therefore, the configuration related to this change in distance will be described in detail below. In addition, the detailed configuration of the entire configuration of the swing arm 23, the expansion and contraction mechanism of the swing arm 23, and the connection line, that is, the power supply line will be described in order.

[The overall composition of the swinging arm]

The overall configuration and internal configuration of the swing arm 23 will be described with reference to FIG.

As shown in FIG. 5, the swing arm 23 includes an upper housing 31, a fixing plate 32, a guiding cylinder portion 33, and a lower housing 34; the upper housing 31, the fixing plate 32, the guiding cylinder portion 33, and the lower housing 34 are In this order, they are arranged in a single direction, that is, in the height direction.

The upper housing 31 has a swing opening portion 31a which is formed in a hollow rectangular column shape and is coupled to the swing center shaft portion 23a on one side surface and penetrates the side surface in the facing direction. The upper housing 31 has an upper opening portion 31b on a side surface facing the lower housing 34, which is a through hole extending in the height direction.

The fixing plate 32 is formed in a rectangular plate shape having a fixed opening portion 32a which is followed by A through hole extending in the height direction. The fixing plate 32 is coupled to the upper casing 31 in a state where the fixed opening 32a faces the upper opening 31b. In the fixing plate 32, the width in the facing direction and the width in the direction perpendicular to the paper surface are larger than the upper frame 31, respectively.

The guiding cylinder portion 33 is formed in a cylindrical shape extending in the height direction, and is adjacent to the end portion of the fixing plate 32 among the both end portions in the height direction, and is fixed and fixed in a state of being face-to-face with the fixing opening portion 32a. Board 32.

The lower frame body 34 is formed in a hollow rectangular column shape, and one of the side surfaces is coupled to the connection shaft portion 23b, and has a connection opening portion 34a penetrating the side surface in the facing direction. The lower casing 34 has a lower opening portion 34b on a side surface facing the upper casing 31, which is a through hole extending in the height direction. The guide tube portion 33 is adjacent to the end portion of the lower frame body 34 in the two end portions in the height direction, and is fixed to the lower frame body 34 facing the upper frame body 31 in a state of being faced to the lower opening portion 34b. side. In the lower frame 34, the width in the facing direction and the width in the direction perpendicular to the paper surface are slightly equal to the fixing plate 32, respectively.

The swing center shaft portion 23a is in contact with the upper frame body 31, and forms a cylindrical swing shaft branch portion 23a1 on the outer peripheral surface of the cover swing center shaft portion 23a, so that the swing center shaft portion 23a can be rotated relative to the frame body 21. The shaft is supported in the state. The swing shaft branch portion 23a1 has a swing flange 23a2 extending in the radial direction from the outer peripheral surface in the middle of extending in the facing direction, and the swing flange 23a2 is fixed to the frame body 21 by a fixing member. The swing center shaft portion 23a is connected to the inner peripheral surface of the swing shaft support portion 23a1 via a bearing having a function of a vacuum seal member, and the swing center shaft portion 23a is centered on the swing shaft P with respect to the frame body. 21 rotation.

The connecting shaft portion 23b is connected to the lower casing 34, and is formed in a cylindrical shape that extends toward the opposite side of the swing center shaft portion 23a in the facing direction with respect to the guiding cylinder portion 33. Coated connecting shaft The cylindrical connecting portion 23b1 is formed on the outer peripheral surface of the portion 23b, and the connecting shaft portion 23b is pivoted while the connecting shaft portion 23b is rotated relative to the table 22a. The connecting shaft branch portion 23b1 has a connecting flange 23b2 extending outward in the radial direction from the outer peripheral surface in the middle of extending in the facing direction, and the connecting flange 23b2 is fixed to the joining table 22a by a fixing member. The connection shaft portion 23b is rotated with respect to the parallel table 22a around the rotation axis A in a state in which the outer circumferential surface of the connection shaft portion 23b is connected to the inner circumferential surface of the connection shaft support portion 23b1 via a bearing having a vacuum sealing member function.

The swing arm 23 includes a telescopic mechanism 40 that surrounds the circumference of the guide tubular portion 33 between the upper housing 31 and the lower housing 34 in the height direction, and includes a guide tubular portion 33. The telescopic mechanism 40 displaces the connecting shaft portion 23b with respect to the swing center shaft portion 23a, and expands and contracts the distance between the swing center shaft portion 23a and the connecting shaft portion 23b.

The telescoping mechanism 40 includes a plurality of shafts 41 and the same number of long rod guides 42 as the long rods 41. The plurality of long rod guiding portions 42 are provided at equal intervals around the guiding cylinder portion 33, and the plurality of long rod guiding portions 42 are formed in a cylindrical shape extending in the height direction. Among the two cylindrical ends of the long rod guiding portions 42, the cylindrical end of the upper frame body 31 is adjacent to the long rod through hole (not shown) extending in the height direction formed on the fixing plate 32. In the state, it is fixed to the fixing plate 32. The plurality of long rods 41 respectively form a columnar shape extending in the height direction. Among the two end portions of each of the long rods 41, the end portion of the upper frame body 31 is close to the end portion of the lower frame body 34 by a long rod guide portion 42 and a long rod through hole of the fixed plate 32, and is fixed. On the side of the lower casing 34 that faces the upper casing 31.

The plurality of connecting wires 50 extending from the swing center shaft portion 23a toward the connecting shaft portion 23b pass through the inside of the arm 23. The plurality of connecting lines 50 may each be a line, or may be constituted by a plurality of line constituent elements connected to each other by a terminal. a plurality of connecting lines 50, including a pair of yin The back plate of the pole unit 22 supplies a power line 51 for high-frequency power, a gas pipe 52 for supplying a process gas to the periphery of the cathode unit 22, and a cooling water pipe 53 for supplying cooling water to the back plate. The number of the power supply line 51, the gas piping 52, and the cooling water piping 53 included in the connection line 50 may be one or plural.

The power supply line 51 has a rigid body portion 51a fixed to the inside of the swing arm 23 in a state in which the shape is not changed, and a flexible portion 51b that is variable in shape inside the lower housing 34. The rigid body portion 51a includes a rocking rigid body portion 51a1 that extends from the outer side of the swing center shaft portion 23a toward the lower frame body 34 and is connected to one end of the flexible portion 51b, and a rigid body portion 51a2 that is coupled to the flexible portion 51b. The other end extends from the lower frame 34 toward the outside of the connecting shaft portion 23b. The swing rigid body portion 51a1 and the connection rigid body portion 51a2 are examples of the intermediate rigid body line, and the flexible portion 51b is an example of the intermediate flexible line.

The gas pipe 52 has a bent portion 52a that has a curved shape, and the bent portion 52a is located inside the lower frame 34. The cooling water pipe 53 has a bent portion 53a that has a curved shape, and the bent portion 53a is located inside the lower casing 34.

[Flexing mechanism of swinging arm]

The telescopic mechanism 40 of the swing arm 23 will be described in detail with reference to the sixth and seventh figures.

As shown in the sixth figure, the telescopic mechanism 40 is provided with a guiding cylinder portion 33 and four long rods 41 (the sixth drawing shows only two long rods 41) and four long rod guiding portions 42. The four long rods 41 and the four long rod guides 42 are located at four corners corresponding to the fixed plate 32.

The guiding cylinder portion 33 has an upper tubular portion 33a that is formed in a cylindrical shape and fixed to the fixed plate 32, and a lower tubular portion 33b that is formed in a cylindrical shape and is fixed to the lower casing 34.

The guiding cylinder portion 33 is provided between the upper tubular portion 33a and the lower tubular portion 33b in the height direction. A cylindrical bellows 33c is formed. The bellows 33c has a one side cylindrical end connected to the upper cylindrical portion 33a and the other side cylindrical end connected to the lower cylindrical portion 33b. The telescopic hose 33c is provided with potential energy in the height direction from the lower tubular portion 33b toward the upper tubular portion 33a.

As shown in the sixth figure, when the swing arm 23 and the cathode unit 22 overlap in the transport direction, the distance between the swing center shaft portion 23a of the swing arm 23 and the joint shaft portion 23b1 of the support connecting shaft portion 23b is minimized. At this time, the telescopic mechanism 40 shortens the distance between the swing center shaft portion 23a and the connection shaft portion 23b in the swing arm 23 by the distance between the swing center shaft portion 23a and the joint shaft portion 23b1. That is, the telescopic mechanism 40 minimizes the distance between the swing center shaft portion 23a and the connection shaft portion 23b, that is, the length L of the swing arm.

At this time, in the telescopic mechanism 40, the telescopic hose 33c is shortened by the conservative force, and the upper end portion 41a of each of the long rods 41 on the side closer to the upper housing 31 is moved to the amount of protrusion from the fixed plate 32 in the height direction. The biggest location. Thereby, each of the long rods 41 and the lower cylindrical portion 33b fixed to the bellows 33c are moved in the height direction together with the lower frame body 34 to the position closest to the fixed plate 32.

Then, in the swing arm 23, the amount of deflection of the gas pipe 52 in the flexure portion 52a is maximized, and the amount of deflection of the coolant pipe 53 in the flexure portion 53a is also maximized. The closer the position of the joining table 22a in the conveying direction is to the position of the swinging center shaft portion 23a of the swing arm 23 in the conveying direction, the larger the amount of deflection of the two flex portions 52a, 53a is.

As shown in the seventh figure, the parallel table 22a advances along the rail 22b and the connecting shaft portion 23b, and is disposed at one end in the transport direction of the rail 22b, and swings the central shaft portion 23a and the supporting connecting shaft portion in the transport direction. The distance between the connecting shaft branches 23b1 of 23b is the largest. At this time, the telescopic mechanism 40 is configured to match the distance between the swing center shaft portion 23a and the joint shaft portion 23b1. The distance between the swing center shaft portion 23a and the connecting shaft portion 23b in the movable arm 23 is elongated. That is, the telescopic mechanism 40 maximizes the distance L between the swing center shaft portion 23a and the connection shaft portion 23b, that is, the length L of the swing arm 23.

At this time, in the telescopic mechanism 40, the bellows 33c extends in the opposite direction to the conservative force, and the upper end portion 41a of each of the long rods 41 moves to a position where the amount of protrusion from the fixed plate 32 in the height direction is the smallest. Thereby, each of the long rods 41 and the lower cylindrical portion 33b fixed to the bellows 33c are moved in the height direction together with the lower frame body 34 to a position farthest from the fixed plate 32.

Then, the amount of deflection of the gas pipe 52 in the flexure portion 52a is minimized in the swing arm 23, and the amount of deflection of the cooling water pipe 53 in the flexure portion 53a is minimized. The further the position of the parallel table 22a in the transport direction and the position of the swing center shaft portion 23a of the swing arm 23 in the transport direction are, the smaller the amount of deflection of the two flex portions 52a, 53a is.

In this manner, the telescopic mechanism 40 of the swing arm 23 changes the swing arm corresponding to the position of the joint shaft portion 23b that is parallel to the parallel table 22a, that is, the distance between the swing center shaft portion 23a of the swing arm 23 and the joint shaft portion 23b1. 23 length L. That is, when the cathode unit 22 and the parallel table 22a are advanced, the length of the swing arm 23 expands and contracts between the swing center shaft portion 23a and the connecting shaft portion 23b. In other words, the distance between the swing center shaft portion 23a and the connection shaft portion 23b of the expansion/contraction mechanism 40 of the swing arm 23 changes in accordance with the distance between the swing center shaft portion 23a and the connection shaft branch portion 23b1. Therefore, the connection shaft portion 23b of the swing arm 23 can follow the movement of the parallel table 22a.

[Construction of power cord]

The configuration of the power supply line 51 will be described in detail with reference to the eighth and ninth drawings. Further, the eighth diagram shows the state of the power supply line 51 when the length L of the swing arm 23 is the smallest, and the ninth diagram shows the state of the power supply line 51 when the length L of the swing arm 23 is the largest.

As shown in the eighth diagram, the power supply line 51 is composed of a plurality of constituent elements, and the plurality of constituent elements include a rocking rigid body portion 51a1, a flexible portion 51b, and a connecting rigid body portion 51a2. The rocking rigid body portion 51a1 is formed in a strip shape extending from the swing center shaft portion 23a toward the lower frame body 34, and the main component of the material forming the rocking rigid body portion 51a1 is, for example, copper. Of the two end portions of the swing rigid body portion 51a1, one end portion is connected to a power supply line disposed outside the swing arm 23, and the other end portion is connected to the flexible portion 51b inside the swing arm 23.

The swinging rigid body portion 51a1 passes through the inside of the guide tubular portion 33, and oscillates the other end portion of the rigid body portion 51a1, and protrudes from the lower opening portion 34b of the lower casing 34 toward the bottom portion of the lower casing 34. Although not shown in the figure, the swinging rigid body portion 51a1 is fixed to the inside of the upper casing 31 of the swing arm 23 or the inside of the upper tubular portion 33a from the middle of the swing center shaft portion 23a toward the lower casing 34.

The rigid body portion 51a2 is connected to form a strip shape in which the lower frame body 34 extends toward the connecting shaft portion 23b, and the main component of the material that connects the rigid body portion 51a2 is, for example, copper. Among the two end portions of the rigid body portion 51a2, one end portion is connected to the flexible portion 51b inside the swing arm 23, and the other end portion is connected to a power supply line disposed outside the swing arm 23. Although not shown in the drawing, the rigid body portion 51a2 is coupled to the inside of the swing arm 23 in the middle of extending from the lower frame body 34 to the connecting shaft portion 23b. When the expansion/contraction mechanism 40 engages the swing of the swing arm 23 to expand and contract the swing arm 23, the flexible portion 51b expands and contracts the distance between the swing rigid body portion 51a1 and the rigid body portion 51a2.

The flexible portion 51b is disposed inside the lower casing 34, and is formed to have two end portions, one end portion of which is connected to the swing rigid body portion 51a1, and the other end portion of which is connected to the rigid body portion 51a2. The flexible portion 51b is made of, for example, a flat copper wire braided in a plurality of copper wires, and has flexibility. The flexible portion 51b has a curved portion 51b1 that is deflected by its own weight.

As shown in the eighth figure, when the length L of the swing arm 23 is the smallest, the degree of contraction of the bellows 33c is the largest, and the lower frame 34 is closest to the upper frame 31 (refer to the sixth drawing). Therefore, the connecting portion of the swiveling rigid body portion 51a1 and the flexible portion 51b is closest to the bottom wall of the lower casing 34. Further, the distance between the rocking rigid body portion 51a1 and the connecting rigid body portion 51a2 is minimized. Therefore, the flexible portion 51b has a distance from the end connected to the flexible portion 51b of the swing rigid body portion 51a1 to the curved portion 51b1 and the other end connected to the flexible portion 51b of the rigid body portion 51a2 to the curved portion 51b1. Transform in an equal way. That is, the amount of deflection of the flexible portion 51b is maximized.

On the other hand, as shown in the ninth figure, when the length L of the swing arm 23 is the largest, the bellows 33c is extended, and the lower frame 34 is farthest from the upper frame 31 (refer to the seventh drawing). Therefore, the connecting portion of the swiveling rigid body portion 51a1 and the flexible portion 51b is closest to the upper wall of the lower casing 34. Moreover, the distance between the rocking rigid body portion 51a1 and the connecting rigid body portion 51a2 is maximized. Thereby, the flexible portion 51b is connected to the other end of the flexible portion 51b of the rigid body portion 51a2 to the curved portion 51b1 by connecting the one end of the flexible portion 51b connected to the swinging rigid portion 51a1 to the curved portion 51b1 to the maximum. The distance becomes the smallest way to deform. That is, the amount of deflection of the flexible portion 51b is minimized.

As described above, when the swing arm 23 is stretched and contracted, the amount of deflection of the flexible portion 51b changes between the swiveling rigid body portion 51a1 and the connecting rigid body portion 51a2. Therefore, the difference in the length of the power supply line 51 inside the swing arm 23 and the length of the swing arm 23 is absorbed by the change in the amount of deflection of the flexible portion 51b. Thus, the length of the power supply line 51 that enters and exits between the inside and the outside of the swing arm 23 becomes short.

As described above, according to the sputtering apparatus of the second embodiment, the effects listed below can be obtained.

(2) When the parallel table 22a and the connecting shaft portion 23b are advanced, the telescopic mechanism 40 of the arm 23 is swung, The distance between the swing center shaft portion 23a and the connection shaft portion 23b is changed in accordance with the distance between the swing center shaft portion 23a and the joint shaft portion 23b1. Therefore, the connection shaft portion 23b provided in the swing arm 23 can follow the movement of the parallel table 22a.

(3) When the swing arm 23 expands and contracts, the amount of deflection of the flexible portion 51b connected between the swing rigid body portion 51a1 and the coupled rigid body portion 51a2 changes. Therefore, the change in the difference between the length of the power supply line 51 passing through the inside of the swing arm 23 and the length of the swing arm 23 can be absorbed by the change in the amount of deflection of the flexible portion 51b. Thus, the length of the power supply line 51 that enters and exits between the inside and the outside of the swing arm 23 becomes short.

Further, the second embodiment can be appropriately changed as described below.

The flexure portion 52a of the gas pipe 52 and the flexure portion 53a of the cooling water pipe 53 can be embodied in a state in which the gas pipe 52 and the cooling water pipe 53 have curved portions, respectively. For example, it can be embodied in the aspect of "the portion in which the connecting wire has a spiral shape". Further, the spiral shape may be a two-dimensional spiral shape or a three-dimensional spiral shape.

The configuration of the power supply line 51 can be applied to at least one of the other wirings included in the connection line 50, for example, the gas piping 52 and the cooling water piping 53.

‧ The sputtering apparatus may be embodied by a combination of the configuration described in the first embodiment and the configuration described in the second embodiment. According to this configuration, the sputtering apparatus can be embodied as a configuration that combines both the effects of the first embodiment and the effects of the second embodiment.

‧ Swing arm 23 may not have telescopic mechanism 40. In this case, the guiding cylinder portion 33 may be embodied as a cylindrical tubular portion. Then, for example, in order to suppress a large distance between the connection end of the connection shaft portion 23b and the connection shaft portion 23b, that is, between the insertion table 22a, a connection member may be provided between the swing center shaft portion 23a and the frame body 21 (for example). Spring and other flexible materials), which can The distance between the swing center shaft portion 23a and the frame 21 is made larger with the cathode unit 22. Even in such a configuration, as long as the swing arm 23 swings around the swing center shaft portion 23a, an effect equivalent to the above (1) can be obtained.

The swinging arm 23 may be provided with, for example, a connecting member, and the distance between the connecting end of the connecting shaft portion 23b and the connecting shaft portion 23b, that is, the distance between the joining stages 22a, and the connecting shaft The portion 23b extends between the parallel table 22a (for example, a stretchable material such as a spring). Further, in this case, the guiding cylinder portion 33 may be embodied as a cylindrical tubular portion. Even in such a configuration, as long as the swing arm 23 swings around the swing center shaft portion 23a, an effect equivalent to the above (1) can be obtained.

The swing arm 23 may not include the expansion/contraction mechanism 40, and may include the connection member (for example, a stretchable material such as a spring) between the connection shaft portion 23b and the entrance table 22a, and between the swing center shaft portion 23a and the frame body 21, respectively. can. Further, in this case, the guiding cylinder portion 33 may be embodied as a cylindrical tubular portion. Even in such a configuration, as long as the swing arm 23 swings around the swing center shaft portion 23a, the effect equivalent to the above (1) can be obtained.

The power supply line 51 may include not only a conductor but also an insulator located between the two conductors, that is, a terminal block, as a constituent element of the power supply line 51. For example, a terminal block that supports the elements in a state where the oscillating rigid body portion 51a1 and the flexible portion 51b are electrically connected to each other may be provided between the oscillating rigid body portion 51a1 and the flexible portion 51b, or the rigid body portion 51a2 may be coupled to the rigid body portion 51a2. A terminal block that "supports the elements in a state in which the rigid body portion 51a2 and the flexible portion 51b are electrically connected" is provided between the flexible portion 51b.

[Third embodiment]

Referring to the tenth to thirteenth drawings, the substrate processing apparatus and the film forming apparatus are described. A third embodiment embodied in a sputtering apparatus. The sputtering apparatus according to the third embodiment is characterized in that it includes a power supply line attached to the swing center shaft portion 23a of the swing arm 23, and a power supply line attached to the connection shaft portion 23b of the swing arm 23. Therefore, the configurations will be described below. Further, in the tenth to thirteenth drawings, an example of a sputtering apparatus having two power supply lines 51 is shown.

[Power cord for swinging the center shaft section]

The power supply line 51 attached to the swing center shaft portion 23a will be described with reference to the tenth and eleventh drawings. Further, the tenth diagram shows a state in which the power cord 51 has the smallest length L of the swing arm 23, and on the other hand, the eleventh diagram shows a state in which the power cord 51 has the largest length L of the swing arm 23.

As shown in the tenth diagram, the power supply line 51 includes a first power supply line 51A and a second power supply line 51B, and the first power supply line 51A and the second power supply line 51B are opposite to the imaginary plane extending in the height direction by the swing axis P. Forming a mutually symmetrical pattern. Each of the oscillating rigid body portions 51a1 constituting each of the power supply lines 51 is formed in a strip shape, and is separated from the inside of the upper housing 31 toward the oscillating central axis in a state of being separated from the inner peripheral surface of the oscillating central shaft portion 23a extending in the facing direction. The barrel end of the portion 23a extends. In other words, in each of the swing rigid body portions 51a1, since the portion passing through the swing center shaft portion 23a extends along the swing axis P, deformation due to the swing of the swing arm 23 can be suppressed. The end portion of each of the oscillating rigid body portions 51a1 is fixed to the end surface of the oscillating center shaft portion 23a through the insulator at the cylindrical end of the oscillating center shaft portion 23a. The swing center shaft portion 23a is an example of a base end rotation portion, and the swing rigid body portion 51a1 is an example of a base end rotation wiring.

The first power source line 51A and the second power source line 51B each have a swing fixing portion 61 that is fixed to the wall portion of the sputtering chamber 13 through an insulator (for example, a wall of the frame body 21 fixed to the swing flange 23a2). And connected to other power cords. The swing fixing portion 61 is an example of a base end fixing wiring.

The first power source line 51A and the second power source line 51B each have a swingable flexible portion 62 that is connected to an end portion of the swinging rigid body portion 51a1 and the swing fixing portion 61. Each of the swingable flexible portions 62 is formed in a slightly arc shape extending in the transport direction, and is formed of, for example, a flexible copper wire having flexibility. The swingable flexible portion 62 has a curved portion 62a that is deflected in the direction of the lower frame 34 by its own weight in the height direction. The length of the curved portion 62a formed on the swingable flexible portion 62 deformed by the distance between the end portion of the swinging rigid body portion 51a1 and the swinging fixed portion 61 corresponds to the amount of deflection of the curved portion 62a. The swing flexible portion 62 is an example of a base end flexible line.

As shown in the tenth diagram, when the length L of the swing arm 23 is the smallest, each of the swing flexible portions 62 has a distance from the swing rigid body portion 51a1 to the curved portion 62a in the transport direction and from the swing fixing portion 61 to the curved portion 62a. The distance is deformed in a roughly equal way. In other words, when the distance between the end portion of the swing rigid body portion 51a1 and the swing fixing portion 61 is the smallest, the amount of deflection of each curved portion 62a is maximized.

As shown in the eleventh diagram, when the length L of the swing arm 23 is maximized, the swing center shaft portion 23a swings around the swing axis P. For example, when the swing center shaft portion 23a is rotated to the left on the paper surface, the end portion of the swinging rigid body portion 51a1 of the first power source line 51A moves downward along the circumferential direction of the swing center shaft portion 23a. On the other hand, the end portion of the rocking rigid body portion 51a1 on the second power source line 51B moves upward in the circumferential direction of the swing center shaft portion 23a. Therefore, the distance between the end portion of the swing rigid body portion 51a1 and the swing fixing portion 61 is increased, and the amount of deflection of each curved portion 62a is reduced.

Thus, since the twisting of the power supply line 51 due to the rotation of the swing center shaft portion 23a is suppressed, the mechanical load on the power supply line 51 can be reduced.

[Connecting the power cord of the shaft]

The power supply line 51 attached to the connecting shaft portion 23b will be described with reference to the twelfth and thirteenth drawings. this Further, the twelfth diagram shows a state in which the power cord 51 has the minimum length L of the swing arm 23, and on the other hand, the thirteenth diagram shows a state in which the power cord 51 has the maximum length L of the swing arm 23.

As shown in Fig. 12, the connecting rigid body portions 51a2 constituting the respective power supply lines 51 are formed in a strip shape, respectively, and are separated from the inner peripheral surface of the connecting shaft portion 23b extending in the facing direction, from the lower casing. The inside of the 34 extends toward the cylindrical end of the connecting shaft portion 23b. In other words, in each of the connected rigid body portions 51a2, since the portion passing through the connecting shaft portion 23b extends along the rotation axis A, deformation due to the swinging of the swing arm 23 can be suppressed. Each of the connected rigid body portions 51a2 is fixed to the end surface of the connecting shaft portion 23b via an insulator at the cylindrical end of the connecting shaft portion 23b. The connection shaft portion 23b is an example of a distal end rotation portion, and the connection rigid body portion 51a2 is an example of a front end rotation wiring.

Each of the first power source line 51A and the second power source line 51B has a connection parallel portion 71 that follows the cathode unit 22 and the connection shaft portion 23b and further advances. The connecting portion 71 is fixed to one side surface of the joining table 22a (for example, fixed to the inner side surface of the side wall of the joining shaft portion 23b1 and joined to the side wall 22a) through the insulating portion, and is connected to the other power source line. The connection advancing portion 71 is an example of a front end and a wiring.

Each of the first power source line 51A and the second power source line 51B has a connection flexible portion 72 that is connected to an end portion of the connection rigid body portion 51a2 and a connection parallel portion 71. Each of the connecting flexible portions 72 extends downward from the end portion connecting the rigid body portions 51a2 in the height direction, and is folded back in the middle, and extends upward in the height direction until the joining portion 71 is joined. Each of the connecting flexible portions 72 has a folded portion 72a which is bent in the height direction due to its own weight to be further below the joining portion 71. The length of the folded portion 72a formed on the connecting flexible portion 72 which is deformed by the distance between the end portion of the rigid body portion 51a2 and the connecting parallel portion 71 (that is, the height in the direction of the connecting portion 71 is greater than the connecting portion 71) The length of the lower folded portion 72a corresponds to the amount of deflection of the folded portion 72a. Each of the flexible portions 72, For example, it is constructed of a flexible copper wire having flexibility. The connection flexible portion 72 is an example of a front end flexible line.

As shown in Fig. 12, when the length L of the swing arm 23 is the smallest, the amount of deflection of the folded portion 72a of the first power source line 51A is equal to the amount of deflection of the folded portion 72a of the second power source line 51B.

As shown in the thirteenth diagram, when the length L of the swing arm 23 is the maximum, the connecting shaft portion 23b rotates with respect to the parallel table 22a around the rotation axis A. For example, when the connecting shaft portion 23b swings to the right on the paper surface, the end portion of the first power source line 51A that connects the rigid body portion 51a2 moves downward in the circumferential direction of the connecting shaft portion 23b, and is on the second power source line 51B. The end portion of the connected rigid body portion 51a2 moves upward in the circumferential direction of the connecting shaft portion 23b. Therefore, in the first power source line 51A, the distance between the end portion connecting the rigid body portion 51a2 and the connection advancing portion 71 is reduced, and on the other hand, the end portion and the connection portion of the rigid body portion 51a2 are connected to the second power source line 51B. The distance between the parallel portions 71 becomes larger. Therefore, in the first power source line 51A, the amount of deflection of the connection flexible portion 72 is increased, and on the other hand, the amount of deflection of the connection flexible portion 72 in the second power source line 51B is small.

In this way, since the twisting of the power supply line 51 due to the rotation of the connecting shaft portion 23b is suppressed, the mechanical load on the power supply line 51 can be reduced.

As described above, according to the sputtering apparatus of the third embodiment, the effects listed below can be obtained.

(4) Since the distortion of the first power source line 51A and the second power source line 51B caused by the rotation of the swing center shaft portion 23a is suppressed, the mechanical properties of the first power source line 51A and the second power source line 51B can be reduced, respectively. load.

(5) Since the distortion of the first power source line 51A and the second power source line 51B caused by the rotation of the connection shaft portion 23b is suppressed, the first power source line 51A and the second power source line 51B can be reduced. They are each subjected to a mechanical load.

Further, the third embodiment can be appropriately changed as follows.

The first power supply line 51A and the second power supply line 51B may be configured not to connect the flexible portion 72, or may be configured such that the connected rigid body portion 51a2 is connected to the connection parallel portion 71. Even in such a configuration, as long as the first power supply line 51A and the second power supply line 51B are provided with the swingable flexible portion 62, an effect equivalent to the above (4) can be obtained.

The first power supply line 51A and the second power supply line 51B may have a configuration in which the swingable flexible portion 62 is not provided, and the swing rigid body portion 51a1 is connected to the swing fixed portion 61, respectively. Even in such a configuration, as long as the first power supply line 51A and the second power supply line 51B have the configuration in which the flexible portion 72 is connected, an effect equivalent to the above (5) can be obtained.

‧ A terminal (hereinafter referred to as a common device connection terminal) that is connected to the common device by a ring shape around the swing axis P is formed, and may be attached to the end surface of the swing center shaft portion 23a of the swing arm 23 through the insulator. Then, the configuration may be such that one end of the two ends of the connecting wire 50 that is close to the swing center shaft portion 23a is connected to the common state while being movable in the circumferential direction of the common device connecting terminal. The structure of the device connection terminal. According to this configuration, it is possible to suppress the end portion of the connecting wire 50 connected to the connection terminal of the common device and to be deformed by the swing of the swing arm 23.

‧ A terminal (hereinafter referred to as a cathode unit connection terminal) that is connected to the cathode unit 22 disposed inside the casing 21 in a ring shape around the rotation axis A, and is connected to the connection shaft of the swing arm 23 via an insulator On the end face of the portion 23b. In the configuration, the end portion of the connecting shaft portion 23b that is close to the connecting shaft portion 23b can be connected to the cathode unit connecting terminal in the circumferential direction. The configuration of the cathode unit connection terminal. only According to this configuration, it is possible to suppress the deformation of one end of the connecting wire 50 connected to the connection terminal of the cathode unit, as the swinging arm 23 swings.

The first power supply line 51A and the second power supply line 51B may include not only a conductor but also an insulator located between the two conductors, that is, a terminal block, as a constituent element. Alternatively, the first power source line 51A and the second power source line 51B may respectively include an insulator, that is, a terminal block, between one of the conductors included in the constituent elements and a power source located outside the casing 21.

The configuration of the first power source line 51A and the second power source line 51B may be applied not to the power source line 51 but to other wirings included in the connection line 50, that is, the gas piping 52 or the cooling water piping 53.

‧ The sputtering apparatus may be embodied as a combination of the configuration described in the first embodiment and the configuration described in the third embodiment. According to such a configuration, the sputtering apparatus can be embodied as a configuration having both the effects of the first embodiment and the effects of the third embodiment.

‧ The sputtering apparatus may be embodied as a combination of the configuration described in the first embodiment, the configuration described in the second embodiment, and the configuration described in the third embodiment. According to such a configuration, the sputtering apparatus can be embodied as a configuration that combines the effects of all the first embodiments, the effects of the second embodiment, and the effects of the third embodiment.

18‧‧‧Cathode device

21‧‧‧ frame

22‧‧‧ cathode unit

22a‧‧‧and enter the stage

22b‧‧‧ Track

23‧‧‧Swing arm

23a‧‧‧Swing center shaft

23a1‧‧‧Swing shaft branch

23b‧‧‧Connected shaft

23b1‧‧‧Connected shaft branch

A‧‧‧Rotary axis

P‧‧‧ swing axis

Claims (6)

A substrate processing apparatus comprising: a frame; a swing arm; a hollow swing arm located inside the frame, comprising a hollow swing center shaft portion connected to the frame body and a hollow connecting shaft portion as a swing end; The processing unit is located inside the casing, and moves in a direction perpendicular to an axial direction of the swing center shaft portion in a processing space facing the substrate to perform processing on the substrate, and the processing portion can follow the The movement of the treatment portion is such that the connection shaft portion and the treatment portion are connected to the connection shaft portion, and the swing arm is swung by the movement of the treatment portion; and the connection line is located inside the swing arm The inside of the swing center shaft portion is connected to a common device located outside the frame body, and is connected to the processing portion through the inside of the connecting shaft portion. The substrate processing apparatus according to claim 1, wherein the processing unit further includes a shaft support portion that supports the connection shaft portion to be rotatable relative to the processing portion; the swing arm further includes a telescopic mechanism that causes the connection shaft portion Displacement of the swing center shaft portion with respect to the swing center shaft portion, and stretching the distance between the swing center shaft portion and the joint shaft portion; the telescopic mechanism is configured such that a distance between the swing center shaft portion and the joint shaft portion matches the swing center The manner of the distance between the shaft portion and the shaft branch changes. The substrate processing apparatus of claim 2, wherein the connecting line is composed of a plurality of line constituent elements; The plurality of intermediate rigid body wirings include: two intermediate rigid body wirings, which are respectively fixed to the swinging arm while being disposed inside the swinging arm, and cooperate with the telescopic mechanism to expand and contract the swinging arm to make each other The distance between the two telescopic lines; and the intermediate flexible line, which is disposed between the two intermediate rigid body wires while being disposed inside the swinging arm, and has flexibility, and is required between the two intermediate rigid body wires The distance increases to make the amount of deflection smaller. The substrate processing apparatus according to any one of claims 1 to 3, wherein the swing center shaft portion is provided as a base end rotation portion centered on a rotation axis along an axial direction of the swing center shaft portion And rotating the frame; the connecting wire includes: a base end rotating wire fixed to the base end rotating portion, and a rigid body that rotates as the base rotating portion rotates; the base end fixed wiring a rigid body fixed to the frame; the base end is flexible, and is disposed in a manner that can be flexed by its own weight, and is connected between the base rotating wire and the base fixed wire, and The amount of deflection is reduced because the distance between the base end rotating wiring and the base fixed wiring is increased. The substrate processing apparatus according to any one of claims 1 to 3, wherein the connecting shaft portion is provided as a front end rotating portion centered on a rotation axis along an axial direction of the swing center shaft portion. Rotating the processing unit; the connecting line includes a front end rotating wire, which is a rigid body, and the rigid body is fixed to the front end rotating portion, and is chased Rotating with the rotation of the front end rotating portion; the front end is connected to the wiring, which is a rigid body, the rigid body is fixed to the processing portion, and follows the processing portion following the movement of the processing portion; and the front end is flexible, which is It can be provided by the deflection of its own weight, and is connected between the front end rotating wiring and the front end to enter the wiring, and the amount of deflection is reduced because the distance between the front end rotating wiring and the front end parallel wiring is increased. A film forming apparatus comprising: a frame; a swinging arm, which is a hollow swinging arm located inside the frame, and includes a hollow swinging central shaft portion connected to the frame body and a hollow connecting shaft portion as a swinging end a film forming portion that is located inside the frame and that moves in a direction perpendicular to an axial direction of the swing center axis portion in a processing space facing the substrate to discharge a film forming material toward the substrate Forming a film on the substrate, the film forming portion is coupled to the connecting shaft portion so that the connecting shaft portion can follow the film forming portion in accordance with the movement of the film forming portion, and the film forming portion is formed by the film forming portion Moving the swing arm to swing; the connecting wire is located inside the swing arm, and is connected to a common device located outside the frame through the inside of the swing center shaft portion, and passes through the inside of the connecting shaft portion and the film forming portion connection.