TWI570485B - Light orientation device - Google Patents

Light orientation device Download PDF

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Publication number
TWI570485B
TWI570485B TW104125213A TW104125213A TWI570485B TW I570485 B TWI570485 B TW I570485B TW 104125213 A TW104125213 A TW 104125213A TW 104125213 A TW104125213 A TW 104125213A TW I570485 B TWI570485 B TW I570485B
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Taiwan
Prior art keywords
light
workpiece
workpiece stage
robot
mounting
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TW104125213A
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Chinese (zh)
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TW201621429A (en
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淺見英一
今井誠
川鍋保文
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岩崎電氣股份有限公司
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Liquid Crystal (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)

Description

光配向裝置 Light alignment device

本發明係關於對工件照射偏振光而進行光配向之光配向裝置。 The present invention relates to a light alignment device that performs light alignment by irradiating polarized light to a workpiece.

先前,已知有一種光配向裝置,其具備有光源及偏光板,藉由該偏光板將來自光源之光進行偏振並照射於光配向膜(工件),而對光配向膜進行光配向(例如,參照專利文獻1)。於該光配向裝置中,藉由將光配向膜載置於作業台上而進行搬送,來對較大之光配向膜進行光配向(例如,參照專利文獻1)。 Previously, there has been known a light alignment device comprising a light source and a polarizing plate, wherein the light from the light source is polarized and irradiated to the light alignment film (workpiece) to optically align the light alignment film (for example) Refer to Patent Document 1). In the optical alignment device, the light alignment film is placed on the work surface to be transported, and the large optical alignment film is optically aligned (for example, see Patent Document 1).

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

專利文獻1:日本專利特開2002-350858號公報 Patent Document 1: Japanese Patent Laid-Open Publication No. 2002-350858

然而,於光配向裝置中,期望能縮短工件之處理之製程作業時間。本發明係鑑於上述情況而完成者,其目的在於提供一種可縮短工件之處理之製程作業時間之光照射裝置。 However, in the optical alignment device, it is desirable to shorten the processing time of the processing of the workpiece. The present invention has been made in view of the above circumstances, and an object thereof is to provide a light irradiation device capable of shortening a process time for processing a workpiece.

為了達成上述目的,本發明之光配向裝置,其特徵在於:將一對工件回收台設置於兩端部,於中央部設置有光照射器, 並於工件回收台與光照射器之間且光照射器之兩端附近位置設置有一對工件搭載台。 In order to achieve the above object, a light alignment device according to the present invention is characterized in that a pair of workpiece recovery stages are provided at both end portions, and a light illuminator is provided at a central portion. A pair of workpiece mounting stages are disposed between the workpiece recovery stage and the light illuminator and at positions near both ends of the light illuminator.

於上述構成中,也可具備有搬送機構,該搬送機構係使工件以一端部側之工件搭載台、中央部之光照射器之照射區域、一端部側之工件回收台之順序進行往返,並且使工件以另一端部側之工件搭載台、中央部之光照射器之照射區域、另一端部側之工件回收台之順序進行往返,上述搬送機構係於一工件通過照射區域時,使另一工件自工件搭載台退避。相反地上述搬送機構也可同樣地,於另一工件通過照射區域時,使一工件自工件搭載台退避。 In the above configuration, the transport mechanism may be configured such that the workpiece is reciprocated in the order of the workpiece mounting table on the one end side, the irradiation region of the light irradiator in the center portion, and the workpiece collecting table on the one end side. The workpiece is reciprocated in the order of the workpiece mounting table on the other end side, the irradiation region of the light irradiator at the center portion, and the workpiece collecting table on the other end side. The transfer mechanism is used when the workpiece passes through the irradiation region to make the other The workpiece is retracted from the workpiece mounting table. Conversely, in the above-described conveying mechanism, similarly, when another workpiece passes through the irradiation region, a workpiece is retracted from the workpiece mounting table.

於上述構成中,也可具備有將工件搭載於工件搭載台之機器人裝置,上述機器人裝置也可構成為可保持2個工件。 In the above configuration, the robot apparatus may be provided in which the workpiece is mounted on the workpiece mounting table, and the robot apparatus may be configured to hold two workpieces.

於上述構成中,上述搬送機構也可構成為可於工件通過照射區域之前後變更工件之移動速度。 In the above configuration, the conveying mechanism may be configured to change the moving speed of the workpiece before the workpiece passes through the irradiation region.

於上述構成中,也可於對上述另一工件照射後,使上述另一工件自工件搭載台退避。相反地也可同樣地,於對上述一工件照射後,使上述一工件自工件搭載台退避。 In the above configuration, after the other workpiece is irradiated, the other workpiece may be retracted from the workpiece mounting table. Conversely, in the same manner, after the one workpiece is irradiated, the one workpiece is retracted from the workpiece mounting table.

於上述構成中,上述機器人裝置也可構成為可於上下保持2個工件,並將照射前之工件保持於下層,而將照射後之工件保持於上層。 In the above configuration, the robot apparatus may be configured to hold two workpieces up and down, hold the workpiece before the irradiation in the lower layer, and hold the workpiece after the irradiation in the upper layer.

於上述構成中,上述機器人裝置也可構成為可將2個工件水平地保持於工件搭載台側及工件回收台側,並將照射前之工件保持於工件搭載台側,而將照射後之工件保持於工件回收台側。 In the above configuration, the robot apparatus may be configured to hold the two workpieces horizontally on the workpiece mounting stage side and the workpiece collection stage side, and to hold the workpiece before the irradiation on the workpiece mounting stage side, and to irradiate the workpiece after irradiation. Keep it on the side of the workpiece recovery table.

此外,本發明之光配向裝置,其特徵在於:於中央部 設置有光照射器,於光照射器之兩端附近位置設置有一對工件搭載台,且具備有搬送機構,該搬送機構係僅工件以一端部側之工件搭載台、中央部之光照射器之照射區域、一端部側之工件搭載台之順序進行往返,並使工件以另一端部側之工件搭載台、中央部之光照射器之照射區域、另一端部側之工件搭載台之順序進行往返,上述搬送機構係於一工件通過照射區域時,使另一工件自工件搭載台退避。此外,上述搬送機構也可於另一工件通過照射區域時,使一工件自工件搭載台退避。 Further, the optical alignment device of the present invention is characterized in that: in the central portion A light irradiator is provided, and a pair of workpiece mounting tables are provided at positions near both ends of the light irradiator, and a transport mechanism is provided. The transport mechanism is a workpiece mounting table on the one end side and a light irradiator in the center portion of the workpiece. The workpiece mounting table in the irradiation region and the one end portion is reciprocated in the order of the workpiece mounting table on the other end side, the irradiation region of the light irradiator in the center portion, and the workpiece mounting table on the other end side. The conveying mechanism is configured to retract another workpiece from the workpiece mounting table when a workpiece passes through the irradiation region. Further, the transport mechanism may retract a workpiece from the workpiece mounting table when another workpiece passes through the irradiation region.

於上述構成中,也可具備有將工件搭載於工件搭載台之機器人裝置,上述機器人裝置係構成為可保持2個工件。 In the above configuration, the robot apparatus for mounting the workpiece on the workpiece mounting table may be provided, and the robot apparatus may be configured to hold two workpieces.

於上述構成中,上述搬送機構也可構成為可於工件通過照射區域之前後變更工件之移動速度。 In the above configuration, the conveying mechanism may be configured to change the moving speed of the workpiece before the workpiece passes through the irradiation region.

於上述構成中,也可於對上述另一工件照射後,使上述另一工件自工件搭載台退避。 In the above configuration, after the other workpiece is irradiated, the other workpiece may be retracted from the workpiece mounting table.

於上述構成中,工件搭載台也可兼作為工件回收台。 In the above configuration, the workpiece mounting table can also serve as a workpiece recovery stage.

於上述構成中,上述機器人裝置也可構成為可於上下保持2個工件,並將照射前之工件保持於下層,而將照射後之工件保持於上層。 In the above configuration, the robot apparatus may be configured to hold two workpieces up and down, hold the workpiece before the irradiation in the lower layer, and hold the workpiece after the irradiation in the upper layer.

根據本發明,由於將一對工件回收台設置於兩端部,於中央部設置有光照射器,於工件回收台與光照射器之間且光照射器之兩端附近位置設置有一對工件搭載台,因此可縮短工件之處理之製程作業時間。 According to the invention, a pair of workpiece collecting stations are provided at both end portions, and a light irradiator is provided at the center portion, and a pair of workpieces are mounted between the workpiece collecting table and the light irradiator at a position near both ends of the light irradiator. The stage can shorten the processing time of the processing of the workpiece.

1‧‧‧光配向裝置 1‧‧‧Light alignment device

2‧‧‧工件台 2‧‧‧Workpiece table

3‧‧‧台搬送架 3‧‧‧Transport rack

4‧‧‧照射器設置架 4‧‧‧ illuminator setting

5‧‧‧光照射器 5‧‧‧Light illuminator

6‧‧‧直線運動機構(往返機構) 6‧‧‧Linear motion mechanism (round-trip mechanism)

7‧‧‧筐體 7‧‧‧Shell

7A‧‧‧光出射開口部 7A‧‧‧Light exit opening

8‧‧‧燈管(光源) 8‧‧‧Light tube (light source)

9‧‧‧反射鏡 9‧‧‧Mirror

10‧‧‧偏光板單元 10‧‧‧Polar plate unit

12‧‧‧單位偏光板單元 12‧‧‧Unit polarizer unit

14‧‧‧框架 14‧‧‧Frame

16‧‧‧線柵偏光板(偏光板) 16‧‧‧Wire grid polarizer (polarizer)

18‧‧‧測量單元 18‧‧‧Measurement unit

19‧‧‧螺絲(固定手段) 19‧‧‧ screws (fixed means)

20‧‧‧搬入搬出裝置 20‧‧‧Moving and unloading devices

21‧‧‧本體 21‧‧‧ body

22‧‧‧載置台 22‧‧‧ mounting table

30‧‧‧上游側機器人裝置 30‧‧‧Upstream side robot

31‧‧‧平面板 31‧‧‧flat board

32‧‧‧機器人 32‧‧‧ Robot

33‧‧‧往返驅動機構 33‧‧‧Reciprocating drive mechanism

32A‧‧‧機械臂 32A‧‧ mechanical arm

32B‧‧‧保持部 32B‧‧‧ Keeping Department

40‧‧‧清潔器 40‧‧‧cleaner

41‧‧‧平面板 41‧‧‧flat board

42‧‧‧清潔單元 42‧‧‧ cleaning unit

43‧‧‧移動機構 43‧‧‧Mobile agencies

50‧‧‧旋轉單元(角度調整裝置) 50‧‧‧Rotating unit (angle adjustment device)

60‧‧‧下游側機器人裝置 60‧‧‧Downstream robot

61‧‧‧平面板 61‧‧‧flat board

62‧‧‧機器人 62‧‧‧ Robot

62A‧‧‧機械臂 62A‧‧‧ Robotic arm

62B‧‧‧保持部 62B‧‧‧ Keeping Department

62B1‧‧‧保持桿 62B1‧‧‧Holding rod

62C‧‧‧支撐體 62C‧‧‧Support

63‧‧‧往返驅動機構 63‧‧‧Reciprocating drive mechanism

63A‧‧‧線性軌道 63A‧‧‧linear orbit

63B‧‧‧線性軌道 63B‧‧‧linear orbit

70‧‧‧控制裝置(控制部) 70‧‧‧Control device (control department)

71‧‧‧記憶部 71‧‧‧Memory Department

72‧‧‧執行部 72‧‧‧Executive Department

100、200‧‧‧光配向系統 100, 200‧‧‧ optical alignment system

260‧‧‧機器人裝置 260‧‧‧Robots

C1‧‧‧偏光軸 C1‧‧‧ polarizing axis

D1‧‧‧第1工件台之中心移動範圍 D1‧‧‧1st workpiece table center movement range

D2‧‧‧第2工件台之中心移動範圍 D2‧‧‧2nd workpiece table center movement range

E1‧‧‧一端 E1‧‧‧ end

E2‧‧‧另一端 E2‧‧‧The other end

R‧‧‧照射區域 R‧‧‧illuminated area

PL1、PL2‧‧‧搭載位置 PL1, PL2‧‧‧ carrying position

PU1、PU2‧‧‧回收位置 PU1, PU2‧‧‧Recycling location

S1、S2‧‧‧空間 S1, S2‧‧‧ space

W、WA~WF‧‧‧光配向對象物(工件) W, WA~WF‧‧‧Light matching object (workpiece)

X‧‧‧直線運動方向 X‧‧‧Directional direction

圖1為示意性地顯示具備有本發明第1實施形態之光配向裝置之光配向系統的俯視圖。 Fig. 1 is a plan view schematically showing an optical alignment system including an optical alignment device according to a first embodiment of the present invention.

圖2為示意性地顯示光配向裝置之前視圖。 Fig. 2 is a front view schematically showing a light alignment device.

圖3為顯示偏光板單元之構成之圖,(A)為俯視圖,(B)為側剖視圖。 3 is a view showing a configuration of a polarizing plate unit, wherein (A) is a plan view and (B) is a side cross-sectional view.

圖4為顯示下游側機器人裝置60之圖,(A)為俯視圖,(B)為側視圖,(C)為前視圖。 4 is a view showing the downstream side robot device 60, wherein (A) is a plan view, (B) is a side view, and (C) is a front view.

圖5為示意性地顯示光配向照射系統之構成之俯視圖,(A)為顯示第1及第2工件台之移動狀態之說明圖,(B)為顯示將光配向對象物搭載於第1及第2工件台之狀態之構成圖。 5 is a plan view schematically showing a configuration of a light alignment irradiation system, wherein (A) is an explanatory view showing a movement state of the first and second workpiece stages, and (B) is a view showing that the light distribution target is mounted on the first and The structure of the state of the second workpiece stage.

圖6為示意性地顯示光配向照射系統之構成之俯視圖,(A)為顯示第1及第2工件台之移動狀態之說明圖,(B)為顯示移動第1及第2工件台之狀態之構成圖。 6 is a plan view schematically showing a configuration of a light alignment irradiation system, in which (A) is an explanatory view showing a movement state of the first and second workpiece stages, and (B) is a state in which the first and second workpiece stages are moved. The composition of the figure.

圖7為示意性地顯示光配向照射系統之構成之俯視圖,(A)為顯示第1及第2工件台之移動狀態之說明圖,(B)為顯示於第2工件台之移動中,自第1工台回收光配向對象物之狀態之構成圖。 Fig. 7 is a plan view schematically showing a configuration of a light alignment irradiation system, wherein (A) is an explanatory view showing a movement state of the first workpiece stage and a second workpiece stage, and (B) is a movement displayed on the second workpiece stage. A configuration diagram of the state in which the first stage recovers the light-aligning object.

圖8為示意性地顯示光配向照射系統之構成之俯視圖,(A)為顯示第1及第2工件台之移動狀態之說明圖,(B)為顯示於第2工件台之移動中,將光配向對象物搭載於第1工件台之狀態之構成圖。 8 is a plan view schematically showing a configuration of a light alignment irradiation system, wherein (A) is an explanatory view showing a movement state of the first workpiece stage and the second workpiece stage, and (B) is a movement shown in the second workpiece stage. A configuration diagram in which the light alignment object is mounted on the first workpiece stage.

圖9為示意性地顯示光配向照射系統之構成之俯視圖,(A)為顯示第1及第2工件台之移動狀態之說明圖,(B)為顯示移動第1及第2工件台之狀態之構成圖。 Fig. 9 is a plan view schematically showing a configuration of a light alignment irradiation system, wherein (A) is an explanatory view showing a movement state of the first workpiece stage and the second workpiece stage, and (B) is a state in which the first workpiece stage and the second workpiece stage are moved. The composition of the figure.

圖10為示意性地顯示光配向照射系統之構成之俯視圖,(A)為 顯示第1及第2工件台之移動狀態之說明圖,(B)為顯示於第1工件台之移動中,自第2工件台回收光配向對象物之狀態之構成圖。 Figure 10 is a plan view schematically showing the configuration of a light alignment irradiation system, (A) being (B) is a block diagram showing a state in which the first workpiece stage is moved, and (B) is a state in which the light is aligned to the object from the second workpiece stage during the movement of the first workpiece stage.

圖11為示意性地顯示光配向照射系統之構成之俯視圖,(A)為顯示第1及第2工件台之移動狀態之說明圖,(B)為顯示於第1工件台之移動中,將光配向對象物搭載於第2工件台之狀態之構成圖。 11 is a plan view schematically showing a configuration of a light alignment irradiation system, wherein (A) is an explanatory view showing a movement state of the first workpiece stage and the second workpiece stage, and (B) is a movement displayed on the first workpiece stage, and A configuration diagram in which the light alignment object is mounted on the second workpiece stage.

圖12為示意性地顯示光配向照射系統之構成之俯視圖,(A)為顯示第1及第2工件台之移動狀態之說明圖,(B)為顯示移動第1及第2工件台之狀態之構成圖。 Fig. 12 is a plan view schematically showing a configuration of a light alignment irradiation system, wherein (A) is an explanatory view showing a movement state of the first workpiece stage and the second workpiece stage, and (B) is a state in which the first workpiece stage and the second workpiece stage are moved. The composition of the figure.

圖13為示意性地顯示光配向照射系統之構成之俯視圖,(A)為顯示第1及第2工件台之移動狀態之說明圖,(B)為顯示於第2工件台之移動中,自第1工件台回收光配向對象物之狀態之構成圖。 Fig. 13 is a plan view schematically showing a configuration of a light alignment irradiation system, wherein (A) is an explanatory view showing a movement state of the first workpiece stage and a second workpiece stage, and (B) is a movement shown in the second workpiece stage. A configuration diagram of the state in which the first workpiece stage recovers the light-aligning object.

圖14為示意性地顯示具備有本發明第2實施形態之光配向裝置之光配向系統的俯視圖。 Fig. 14 is a plan view schematically showing an optical alignment system including the optical alignment device according to the second embodiment of the present invention.

圖15為示意性地顯示光配向照射系統之構成之俯視圖,(A)為顯示第1及第2工件台之移動狀態之說明圖,(B)為顯示將光配向對象物搭載於第1及第2工件台之狀態之構成圖。 15 is a plan view schematically showing a configuration of a light alignment irradiation system, wherein (A) is an explanatory view showing a movement state of the first and second workpiece stages, and (B) is a view showing that the light alignment object is mounted on the first and The structure of the state of the second workpiece stage.

圖16為示意性地顯示光配向照射系統之構成之俯視圖,(A)為顯示第1及第2工件台之移動狀態之說明圖,(B)為顯示移動第1及第2工件台之狀態之構成圖。 Fig. 16 is a plan view schematically showing a configuration of a light alignment irradiation system, wherein (A) is an explanatory view showing a movement state of the first and second workpiece stages, and (B) is a state in which the first and second workpiece stages are moved. The composition of the figure.

圖17為示意性地顯示光配向照射系統之構成之俯視圖,(A)為顯示第1及第2工件台之移動狀態之說明圖,(B)為顯示移動第1及第2工件台之狀態之構成圖。 Fig. 17 is a plan view schematically showing a configuration of a light alignment irradiation system, wherein (A) is an explanatory view showing a movement state of the first and second workpiece stages, and (B) is a state in which the first and second workpiece stages are moved. The composition of the figure.

圖18為示意性地顯示光配向照射系統之構成之俯視圖,(A)為顯示第1及第2工件台之移動狀態之說明圖,(B)為顯示於第2工 件台之移動中,自第1工件台回收及搭載光配向對象物之狀態之構成圖。 18 is a plan view schematically showing a configuration of a light alignment irradiation system, wherein (A) is an explanatory view showing a movement state of the first and second workpiece stages, and (B) is a second work shown in FIG. In the movement of the table, the configuration of the state in which the light-aligning object is collected and loaded from the first workpiece stage is shown.

圖19為示意性地顯示光配向照射系統之構成之俯視圖,(A)為顯示第1及第2工件台之移動狀態之說明圖,(B)為顯示移動第1及第2工件台之狀態之構成圖。 19 is a plan view schematically showing a configuration of a light alignment irradiation system, in which (A) is an explanatory view showing a movement state of the first and second workpiece stages, and (B) is a state in which the first and second workpiece stages are moved. The composition of the figure.

圖20為示意性地顯示光配向照射系統之構成之俯視圖,(A)為顯示第1及第2工件台之移動狀態之說明圖,(B)為顯示於第1工件台之移動中,自第2工件台回收及搭載光配向對象物之狀態之構成圖。 Fig. 20 is a plan view schematically showing a configuration of a light alignment irradiation system, wherein (A) is an explanatory view showing a movement state of the first workpiece stage and the second workpiece stage, and (B) is a movement displayed on the first workpiece stage. A configuration diagram of the state in which the second workpiece stage is collected and the optical alignment object is mounted.

圖21為示意性地顯示光配向照射系統之構成之俯視圖,(A)為顯示第1及第2工件台之移動狀態之說明圖,(B)為顯示移動第1及第2工件台之狀態之構成圖。 Fig. 21 is a plan view schematically showing a configuration of a light alignment irradiation system, wherein (A) is an explanatory view showing a movement state of the first and second workpiece stages, and (B) is a state in which the first and second workpiece stages are moved. The composition of the figure.

<第1實施形態> <First embodiment>

以下,參照圖式對本發明之實施形態進行說明。圖1為示意性地顯示具備有第1實施形態之光配向裝置之光配向系統的俯視圖,而圖2為示意性地顯示光配向裝置之前視圖。如圖1及圖2所示,光配向系統100係構成為具備有光配向裝置1、搬入搬出裝置20、上游側機器人裝置30、清潔器40、旋轉單元(角度調整裝置)50、下游側機器人裝置60、及控制裝置(控制部)70。該光配向系統100例如被配置於無塵室等異物相對較少之環境。光配向裝置1係對以俯視時形成為矩形狀之板狀或帶狀之光配向對象物(工件)W之光配向膜照射偏振光而進行光配向之光照射裝置。該光配向裝置1具備有工件台(搬送台、支撐構件)2、台搬送架3、照射器設置架 4、及光照射器5。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. Fig. 1 is a plan view schematically showing an optical alignment system including the optical alignment device of the first embodiment, and Fig. 2 is a front view schematically showing the optical alignment device. As shown in FIG. 1 and FIG. 2, the optical alignment system 100 is configured to include a light alignment device 1, a loading/unloading device 20, an upstream robot device 30, a cleaner 40, a rotating unit (angle adjusting device) 50, and a downstream robot. Device 60 and control device (control unit) 70. The optical alignment system 100 is disposed, for example, in an environment in which a foreign matter such as a clean room is relatively small. The light-aligning device 1 is a light-illuminating device that performs light-alignment on a light-aligning film in which a light-aligning film of a target (work) W is formed into a rectangular plate shape or a strip shape in a plan view. The optical alignment device 1 includes a workpiece stage (transfer table, support member) 2, a table transfer frame 3, and an illuminator setting frame. 4. And the light illuminator 5.

工件台2例如為大致四角形板狀之作業台,且於台搬送架3設置有一對。工件台2係藉由下游側機器人裝置60而於上表面載置有光配向對象物W,用以保持光配向對象物W。一對工件台2係形成為相同形狀,各工件台2係形成為可配置光配向對象物W之大小。照射器設置架4係於離開台搬送架3規定距離之上方位置朝橫向跨設於台搬送架3之寬度方向(與後述之直線運動機構之直線運動方向X垂直之方向)的門體,其兩柱被固定於台搬送架3。照射器設置架4除了供工件台2出入之部分以外係形成為遮光壁。照射器設置架4內置有光照射器5,光照射器5係朝正下方照射偏振光。再者,為了將伴隨工件台2之移動的振動與因光照射器5之冷卻所引起之振動分離,也可構成為不將照射器設置架4固定於台搬送架3,而將其與該台搬送架3分別設置。台搬送架3及照射器設置架4也可具備有防振構造。 The workpiece stage 2 is, for example, a substantially quadrangular plate-shaped work table, and is provided with a pair on the stage transfer frame 3. In the workpiece stage 2, the light-aligning object W is placed on the upper surface by the downstream robot apparatus 60 to hold the light-aligning object W. The pair of workpiece stages 2 are formed in the same shape, and each of the workpiece stages 2 is formed to be sized to arrange the light-aligning object W. The illuminator mounting frame 4 is a door body that straddles the width direction of the table transport frame 3 in a lateral direction (a direction perpendicular to the linear motion direction X of a linear motion mechanism to be described later) at a position above the predetermined distance from the table transport frame 3, The two columns are fixed to the table transfer frame 3. The illuminator mounting frame 4 is formed as a light shielding wall except for a portion where the workpiece stage 2 is taken in and out. The illuminator mounting frame 4 incorporates a light illuminator 5, and the light illuminator 5 illuminates the polarized light directly below. Further, in order to separate the vibration accompanying the movement of the workpiece stage 2 from the vibration caused by the cooling of the light irradiator 5, the illuminator mounting frame 4 may be fixed to the stage transfer frame 3 without being attached thereto. The transfer racks 3 are separately provided. The stage transfer frame 3 and the illuminator installation frame 4 may be provided with an anti-vibration structure.

於台搬送架3內,設置有直線運動機構(搬送機構)6,該進運動機構6係於控制裝置70之控制下,將工件台2以沿著直線運動方向X而通過光照射器5之正下方之方式在台搬送架3之面上進行移送。光配向對象物W之光配向,係使被載置於工件台2之光配向對象物W,藉由直線運動機構6沿著直線運動方向X被移送而通過光照射器5之正下方,並於該通過時曝露於偏振光中而對光配向膜進行配向。直線運動機構6係構成為可變更移動工件台2之速度。本實施形態之直線運動機構6,雖構成為例如線性馬達式或皮帶驅動式,但並不侷限於此,也可使用各種之機構。 A linear motion mechanism (transport mechanism) 6 is provided in the table transfer frame 3, and the feed mechanism 6 is controlled by the control device 70 to pass the workpiece stage 2 through the light illuminator 5 in a linear motion direction X. The method directly below is transferred on the surface of the table transfer frame 3. The light is aligned with the light of the object W, and the light-aligning object W placed on the workpiece stage 2 is transferred by the linear motion mechanism 6 in the linear motion direction X and directly passed through the light irradiator 5, and The photo-alignment film is aligned by exposure to polarized light during the passage. The linear motion mechanism 6 is configured to change the speed at which the workpiece stage 2 is moved. The linear motion mechanism 6 of the present embodiment is configured by, for example, a linear motor type or a belt drive type, but is not limited thereto, and various mechanisms may be used.

如圖2所示,光照射器5具備有:筐體7,其下表面 具有光出射開口部7A;燈管(光源)8與反射鏡9,其等係配置於該筐體內;及偏光板單元10,其係配置於光出射開口部7A。筐體7係於離開光配向對象物W規定距離之上方位置而由照射器設置架4所支撐。燈管8係使用至少延伸與光配向對象物W之長邊方向的長度相同長度以上之直管型(桿狀)之紫外線燈。亦即,燈管8之長軸L係與正交於直線運動方向X之方向一致。該燈管8係放電燈,且根據控制裝置70之控制而點燈。反射鏡9係截面為橢圓形且沿著燈管8之長邊方向延伸之柱狀凹面反射鏡,用以將燈管8之光進行聚光而自光出射開口部7A朝向偏光板單元10照射。 As shown in FIG. 2, the light irradiator 5 is provided with a housing 7 and a lower surface thereof. The light exit opening portion 7A, the lamp tube (light source) 8 and the mirror 9 are disposed in the casing, and the polarizing plate unit 10 is disposed in the light exit opening portion 7A. The casing 7 is supported by the illuminator mounting frame 4 at a position above a predetermined distance from the light-aligning object W. The tube 8 is a straight tube type (rod-shaped) ultraviolet lamp that extends at least the same length as the length of the light-aligning object W in the longitudinal direction. That is, the long axis L of the bulb 8 coincides with the direction orthogonal to the linear motion direction X. The lamp tube 8 is a discharge lamp and is lit according to the control of the control device 70. The mirror 9 is a columnar concave mirror having an elliptical cross section and extending along the longitudinal direction of the bulb 8 for condensing the light of the bulb 8 and irradiating the polarizing plate unit 10 from the light exit opening portion 7A. .

光出射開口部7A係於燈管8之正下方所形成以俯視時呈矩形狀之開口部,且長邊方向係設置為與燈管8之長邊方向一致。此外,雖省略圖示,但於光出射開口部7A之內側,設置有選擇穿透之光的波長之波長選擇濾光片,藉由該波長選擇濾光片,光照射器5係照射所期望之波長的光。於本實施形態中,雖設置有波長選擇濾光片,但於燈管8本身可出射所期望之波長的光之情形時,也可省略波長選擇濾光片。於本實施形態中,筐體7係與光配向對象物W接近而設置,且光出射開口部7A之大小相當於照射區域R之大小。此外,照射區域R之中心軸係與燈管8之長軸L一致。 The light exit opening portion 7A is formed in an opening portion which is rectangular in plan view, directly under the bulb 8, and the longitudinal direction is provided to coincide with the longitudinal direction of the bulb 8. Further, although not shown, a wavelength selective filter for selecting a wavelength of light to be transmitted is provided inside the light emission opening portion 7A, and the light illuminator 5 is desired to be irradiated by the wavelength selection filter. The wavelength of light. In the present embodiment, although the wavelength selective filter is provided, the wavelength selective filter may be omitted when the lamp 8 itself can emit light of a desired wavelength. In the present embodiment, the casing 7 is provided close to the light-aligning object W, and the size of the light-emitting opening 7A corresponds to the size of the irradiation region R. Further, the central axis of the irradiation region R coincides with the long axis L of the bulb 8.

於作業台搬送架3內設有與各工件台2對應而設置,用以旋轉驅動工件台2之旋轉驅動機構(未圖示)。該旋轉驅動機構係於控制裝置70之控制下,以使光配向對象物W成為光配向對象物W一對之邊相對於燈管8之長軸L而與其一致(平行)、且光配向對象物W另一對之邊相對於燈管8之長軸而與其正交之正姿勢之 方式,使工件台2旋轉而對光配向對象物W之角度進行微調。此外,於光配向對象物W之照射所必需之偏振光的偏光軸角度相對於燈管8之長軸L呈規定角度之情形時,旋轉驅動機構係使工件台2旋轉規定角度。 A rotary drive mechanism (not shown) for rotatably driving the workpiece stage 2 is provided in the work table transfer frame 3 in correspondence with each of the workpiece stages 2. The rotation drive mechanism is controlled by the control device 70 so that the light-aligning object W becomes a pair of the light-aligning object W and is aligned (parallel) with respect to the long axis L of the bulb 8, and the light-aligning object The other pair of sides of the object W are orthogonal to the long axis of the tube 8 and orthogonal thereto In this manner, the workpiece stage 2 is rotated to finely adjust the angle of the light-aligning object W. Further, when the polarization axis angle of the polarized light necessary for the irradiation of the light-aligning object W is at a predetermined angle with respect to the long axis L of the bulb 8, the rotation drive mechanism rotates the workpiece stage 2 by a predetermined angle.

圖3為顯示偏光板單元10之構成之圖,圖3(A)為俯視圖,圖3(B)為側剖視圖。如圖3所示,偏光板單元10具備有複數個單位偏光板單元12、及將該等單位偏光板單元12橫向排列地排成一列之框架14。框架14係連接配置各單位偏光板單元12之板狀之框體。單位偏光板單元12具備有形成為大致矩形板狀之線柵偏光板(偏光板)16。於本實施形態中,各單位偏光板單元12係以使線柵方向A與直線運動方向X平行之方式支撐線柵偏光板16,並使正交於該線柵方向A之方向與線柵偏光板16之排列方向B一致。 3 is a view showing the configuration of the polarizing plate unit 10. FIG. 3(A) is a plan view and FIG. 3(B) is a side cross-sectional view. As shown in FIG. 3, the polarizing plate unit 10 is provided with a plurality of unit polarizing plate units 12, and a frame 14 in which the unit polarizing plate units 12 are arranged side by side in a row. The frame 14 is connected to a frame-like frame in which the unit polarizing plate units 12 are arranged. The unit polarizing plate unit 12 is provided with a wire grid polarizing plate (polarizing plate) 16 formed in a substantially rectangular plate shape. In the present embodiment, each unit polarizing plate unit 12 supports the wire grid polarizing plate 16 such that the wire grid direction A is parallel to the linear motion direction X, and polarizes the direction orthogonal to the wire grid direction A and the wire grid. The arrangement direction B of the plates 16 is identical.

線柵偏光板16係直線偏光板之一種,且於基板之表面形成有光柵者。如上所述,由於燈管8為桿狀,因此雖然有各種角度之光入射於線柵偏光板16,但即使為傾斜入射之光,線柵偏光板16亦使其等直線偏振化而穿透。線柵偏光板16係以可使將其法線方向作為旋轉軸而於面內轉動來對偏光軸C1之方向進行微調之方式,被支撐於單位偏光板單元12。亦即,複數個線柵偏光板16係以可對偏光軸C1之方向進行微調之方式,相互隔開間隙而配置。 The wire grid polarizing plate 16 is a type of linear polarizing plate, and a grating is formed on the surface of the substrate. As described above, since the bulb 8 has a rod shape, although light of various angles is incident on the wire grid polarizing plate 16, even if it is obliquely incident light, the wire grid polarizing plate 16 is linearly polarized and penetrates. . The wire grid polarizing plate 16 is supported by the unit polarizing plate unit 12 so that the direction of the polarization axis C1 can be finely adjusted by rotating the normal direction thereof as a rotation axis. In other words, the plurality of wire grid polarizing plates 16 are arranged with a gap therebetween so as to be finely adjusted in the direction of the polarization axis C1.

於台搬送架3,設置有根據控制裝置70之控制,來檢測偏振光而測量偏振光之偏振方向及消光率之測量單元18。可根據該測量單元18所測量之偏振光之偏振方向,來調整線柵偏光板16之偏光軸C1之方向。藉由對全部之單位偏光板單元12以使線柵偏光板16之偏光軸C1與規定之照射基準方向一致之方式進行微 調,可獲得使偏光軸C1橫跨偏光板單元10長軸方向之全長高精度地對齊之偏振光,可達成高品質之光配向。經調整偏光軸C1之線柵偏光板16,係利用螺絲(固定手段)19,將單位偏光板單元12之上端及下端固定於框架14,藉此固定配置於框架14。 The stage transfer frame 3 is provided with a measuring unit 18 that measures the polarization direction and the extinction ratio of the polarized light by detecting the polarized light under the control of the control device 70. The direction of the polarization axis C1 of the wire grid polarizing plate 16 can be adjusted according to the polarization direction of the polarized light measured by the measuring unit 18. By making all of the unit polarizing plate units 12 such that the polarization axis C1 of the wire grid polarizing plate 16 coincides with a predetermined irradiation reference direction By adjusting, it is possible to obtain polarized light in which the polarization axis C1 is aligned with high precision over the entire length of the polarizing plate unit 10 in the long axis direction, and high-quality light alignment can be achieved. The wire grid polarizing plate 16 whose polarization axis C1 is adjusted is fixed to the frame 14 by fixing the upper end and the lower end of the unit polarizing plate unit 12 to the frame 14 by screws (fixing means) 19.

如圖1所示,搬入搬出裝置20具備有平行於台搬送架3而設置之本體21,並具備有將複數個光配向對象物W載置於該本體21之載置台22。該載置台22係自外部搬入光配向對象物W,並且將經光配向之光配向對象物W載置於載置台22,再自該載置台22搬出至下一個處理之裝置。於本實施形態中,雖設置有4個載置台22,但載置台22之數量並不侷限於此,例如,也可構成為設置搬入用之載置台22及搬出用之載置台22。 As shown in FIG. 1 , the loading/unloading device 20 includes a main body 21 that is provided in parallel with the table transfer frame 3 , and a mounting table 22 that mounts a plurality of light-aligning objects W on the main body 21 . The mounting table 22 carries the light-aligning object W from the outside, and places the light-aligned light-aligning object W on the mounting table 22, and then carries it out from the mounting table 22 to the next processing device. In the present embodiment, the number of the mounting tables 22 is not limited thereto. For example, the mounting table 22 for loading and the mounting table 22 for loading and unloading may be provided.

上游側機器人裝置30係構成為具備有:平面板31,其平行地設置於台搬送架3;機器人32,其支撐於該平面板31;及往返驅動機構33,其使機器人32沿直線運動方向X往返移動。機器人32具備有可旋轉及伸縮之機械臂32A、及保持被固定於機械臂32A之光配向對象物W之保持部32B。機械臂32A係可於水平面上旋轉地被支撐於平面板31。本實施形態之機械臂32A,係構成為具有可轉動自如之複數個關節且可伸縮自如之多關節機械臂,但機械臂32A之構成並不侷限於此。機器人32係於控制裝置70之控制下,沿直線運動方向X移動並且移動機械臂32A,而於其與搬入搬出裝置20、清潔器40及旋轉單元50之間交接光配向對象物W。 The upstream robot apparatus 30 is configured to include a flat plate 31 that is provided in parallel to the table transfer frame 3, a robot 32 that supports the flat plate 31, and a reciprocating drive mechanism 33 that causes the robot 32 to move in a linear direction. X moves back and forth. The robot 32 includes a robot arm 32A that is rotatable and expandable, and a holding portion 32B that holds the light alignment object W that is fixed to the robot arm 32A. The robot arm 32A is rotatably supported by the flat plate 31 on a horizontal surface. The mechanical arm 32A of the present embodiment is configured as a multi-joint robot having a plurality of rotatable joints and being expandable and contractible, but the configuration of the mechanical arm 32A is not limited thereto. Under the control of the control device 70, the robot 32 moves in the linear motion direction X and moves the robot arm 32A, and transfers the light-aligning object W between the loading/unloading device 20, the cleaner 40, and the rotating unit 50.

清潔器40係構成為具備有:平面板41,其平行於上游側機器人裝置30之平面板31且鄰接而設置;清潔單元42,其去除光配向對象物W表面之異物;及移動機構43,其使光配向對象 物W朝向清潔單元42移動。清潔單元42係沿著與直線運動方向X正交之方向(長軸L之方向)設置於平面板41之上方。清潔單元42係構成為根據控制裝置70之控制,而可自下方吹出空氣等之氣體。移動機構43係於控制裝置70之控制下,使光配向對象物W以沿著直線運動方向X而通過清潔單元42之正下方之方式在平面板41之上表面進行移動之機構,且構成為例如皮帶式。 The cleaner 40 is configured to include a flat plate 41 that is disposed adjacent to and adjacent to the flat plate 31 of the upstream robot device 30, and a cleaning unit 42 that removes foreign matter that is directed toward the surface of the object W; and a moving mechanism 43, It aligns light with objects The object W moves toward the cleaning unit 42. The cleaning unit 42 is disposed above the plane plate 41 in a direction orthogonal to the linear motion direction X (the direction of the long axis L). The cleaning unit 42 is configured to be capable of blowing a gas such as air from below under the control of the control device 70. The moving mechanism 43 is a mechanism for moving the light-aligning object W on the upper surface of the flat plate 41 so as to pass directly under the cleaning unit 42 in the linear motion direction X under the control of the control device 70, and is configured as For example, belt type.

光配向對象物W係藉由移動機構43沿著直線運動方向X被移送而通過清潔單元42之正下方,且於該通過時被噴吹氣體,而去除附著於光配向對象物W之異物。此外,雖省略圖示,但於清潔器40設置有去除靜電之靜電消除器,而亦可於清潔器40去除光配向對象物W之靜電。再者,於本實施形態中,雖然清潔器40具備有移動機構43,但只要清潔單元42構成為可橫跨光配向對象物W之光配向膜全面吹出氣體,則亦可省略該移動機構43。此外,也可取代移動光配向對象物W之移動機構43,而設置可沿著直線運動方向X移動清潔單元42之移動機構(未圖示)。 The light-aligning object W is transported in the linear motion direction X by the moving mechanism 43 and passes right below the cleaning unit 42, and the gas is blown at the time of passing, and the foreign matter adhering to the light-aligning object W is removed. Further, although not shown, the cleaner 40 is provided with a static eliminator for removing static electricity, and the cleaner 40 removes static electricity of the light aligning object W. Further, in the present embodiment, the cleaner 40 is provided with the moving mechanism 43, but the moving mechanism 43 may be omitted as long as the cleaning unit 42 is configured to completely blow the gas across the light alignment film of the light-aligning object W. . Further, instead of the moving mechanism 43 that moves the light to the object W, a moving mechanism (not shown) that can move the cleaning unit 42 in the linear motion direction X may be provided.

旋轉單元50係鄰接於上游側機器人裝置30之平面板31,且與清潔器40並排地設置。旋轉單元50具備有根據控制裝置70之控制而載置光配向對象物W並對光配向對象物W之角度進行調整之調整台51。旋轉單元50係以使光配向對象物W成為光配向對象物W一對之邊相對於燈管8之長軸L而與其一致(平行),且光配向對象物W另一對之邊相對於燈管8之長軸L而與其正交之正姿勢之方式,對光配向對象物W之角度進行調整。 The rotating unit 50 is adjacent to the flat plate 31 of the upstream side robot device 30, and is disposed side by side with the cleaner 40. The rotation unit 50 is provided with an adjustment stage 51 that mounts the light distribution target W and adjusts the angle of the light distribution to the object W under the control of the control device 70. The rotation unit 50 is configured such that a pair of the light-aligning object W becomes a pair of the light-aligning object W with respect to the long axis L of the bulb 8 and is aligned (parallel) thereto, and the other side of the light-aligning object W is opposed to The angle of the light-aligning object W is adjusted such that the long axis L of the bulb 8 is orthogonal to the posture.

圖4為顯示下游側機器人裝置60之圖,圖4(A)為俯視圖,圖4(B)為側視圖,圖4(C)為前視圖。如圖1及圖4所示,下 游側機器人裝置60係構成為具備有:平面板61,其係平行於台搬送架3而設置;機器人62,其係支撐於該平面板61;及往返驅動機構63,其使機器人62沿著直線運動方向X往返移動。機器人62具備有可旋轉及伸縮之機械臂62A、及保持被固定於機械臂62A之光配向對象物W之一對保持部62B。機械臂62A係可於水平面上旋轉地被支撐於平面板61。本實施形態之機械臂62A雖構成為具有可轉動自如之複數個關節且可伸縮自如之多關節機械臂,但機械臂62A之構成並不侷限於此。保持部62B係構成為將複數個保持桿62B1平行地排列,光配向對象物W被配置而保持於該等保持桿62B1上。於本實施形態中,一對保持部62B係於上下設置,而機器人62係構成為可以上下排列而將2個光配向對象物W予以保持。於該情形時,機器人62係藉由將照射前之光配向對象物W保持於下層之保持部62B,並將照射後之光配向對象物W保持於上層之保持部62B,而可減少照射前之光配向對象物W之移動。藉此,可精度更佳地維持已藉由旋轉單元50所調整之光配向對象物W之角度,而可提高光配向精度。具體而言,機器人62係構成為具備有上下配置之2個機械臂62A,且各機械臂62A可上下移動地被支撐於朝上下延伸之支撐體62C,並於各機械臂62A分別設置有保持桿62B1。再者,也可水平地並排設置一對保持部62B。於該情形時,對於光照射器5之一端E1側,機器人62係構成為可將2個光配向對象物W保持於搭載(後述之搭載位置PL1)側、及回收(後述之回收位置PU1)側,而將照射前之光配向對象物W保持於搭載側,將照射後之光配向對象物W保持於回收側。此外,對於光照射器5之另一端E2側,機器人62係構成為可將2個光配向對象物W保 持於搭載(後述之搭載位置PL2)側、及回收(後述之回收位置PU2)側,而將照射前之光配向對象物W保持於搭載側,將照射後之光配向對象物W保持於回收側。藉此,可減少照射前之光配向對象物W之移動,而可精度更佳地維持已藉由旋轉單元50所調整之光配向對象物W之角度,其結果,可提高光配向精度。往返驅動機構63可使用各種之機構,作為其中一例,本實施形態係以線性馬達致動器來構成。具體而言,往返驅動機構63係構成為具備有被設置於平面板61之磁鐵盤(未圖示)及線性軌道63A、與被設置於機器人62之線性馬達(未圖示)及線性軌道63B。此外,線性軌道63A並不侷限於線性軌道,可使用各種軌道。機器人62係於控制裝置70之控制下,沿著直線運動方向X移動並且移動機械臂62A,而在其與一對工件台及旋轉單元50之間交接光配向對象物W。 4 is a view showing the downstream side robot device 60. FIG. 4(A) is a plan view, FIG. 4(B) is a side view, and FIG. 4(C) is a front view. As shown in Figure 1 and Figure 4, the next The side robot device 60 is configured to include a flat plate 61 that is disposed parallel to the table transfer frame 3, a robot 62 that is supported by the flat plate 61, and a reciprocating drive mechanism 63 that causes the robot 62 to follow The direction of linear motion X moves back and forth. The robot 62 includes a robot arm 62A that is rotatable and retractable, and a pair of light-aligning objects W that are fixed to the robot arm 62A to the holding portion 62B. The robot arm 62A is rotatably supported by the flat plate 61 on a horizontal surface. The robot arm 62A of the present embodiment is configured as a multi-joint robot arm having a plurality of rotatable joints and being expandable and contractible, but the configuration of the robot arm 62A is not limited thereto. The holding portion 62B is configured such that a plurality of holding rods 62B1 are arranged in parallel, and the light-aligning object W is placed and held on the holding rods 62B1. In the present embodiment, the pair of holding portions 62B are provided on the upper and lower sides, and the robot 62 is configured to be vertically arranged to hold the two lights to the object W. In this case, the robot 62 is held in the lower holding portion 62B by the light before the irradiation, and the light after the irradiation is held in the upper holding portion 62B, thereby reducing the irradiation. The light is aligned with the movement of the object W. Thereby, the angle of the light-aligning object W that has been adjusted by the rotation unit 50 can be more accurately maintained, and the optical alignment accuracy can be improved. Specifically, the robot 62 is configured to include two robot arms 62A arranged vertically, and each of the robot arms 62A is supported by a support body 62C that extends upward and downward, and is provided to each of the robot arms 62A. Rod 62B1. Further, a pair of holding portions 62B may be provided side by side horizontally. In this case, the robot 62 is configured to hold the two light-aligning objects W on the side of the mounting (the mounting position PL1 to be described later) and to collect (the recovery position PU1 to be described later). On the side, the light-aligning object W before irradiation is held on the mounting side, and the light-aligned light is supplied to the object W on the recovery side. Further, for the other end E2 side of the light irradiator 5, the robot 62 is configured to be capable of aligning two lights to the object W On the side of the mounting (the mounting position PL2 to be described later) and the side of the collection (the storage position PU2 to be described later), the light distribution target W is held on the mounting side, and the light after the irradiation is held in the collection object W. side. Thereby, the movement of the light-aligning object W before irradiation can be reduced, and the angle of the light-aligning object W that has been adjusted by the rotation unit 50 can be more accurately maintained, and as a result, the optical alignment accuracy can be improved. As an example, a variety of mechanisms can be used for the shuttle drive mechanism 63. This embodiment is configured by a linear motor actuator. Specifically, the shuttle drive mechanism 63 is configured to include a magnet disk (not shown) provided on the flat plate 61, a linear track 63A, a linear motor (not shown) provided in the robot 62, and a linear track 63B. . Further, the linear track 63A is not limited to a linear track, and various tracks can be used. The robot 62 moves under the control of the control device 70, moves the robot arm 62A in the linear motion direction X, and transfers the light alignment object W between it and the pair of workpiece stages and the rotation unit 50.

於光配向裝置1之工件台2,設置有複數根用以在與下游側機器人裝置60之間交接光配向對象物W之驅動銷(未圖示)。該等驅動銷係以可保持光配向對象物W之間隔被配置於複數個保持桿62B1之間之位置,並藉由銷驅動機構(未圖示)上下地移動。使驅動銷自工件台2之上表面突出而自下游側機器人裝置60接取光配向對象物W,然後將其收容於工件台2內,藉此將光配向對象物W載置於工件台2之上表面。此外,使驅動銷自工件台2之上表面突出,藉此使光配向對象物W離開工件台2,而由下游側機器人裝置60所保持。藉由該等驅動銷,可於維持已藉由旋轉單元50所調整之光配向對象物W之角度的狀態下,於工件台2與下游側機器人裝置60之間交接光配向對象物W。光配向裝置1、搬入搬出裝置20、上游側機器人裝置30、清潔器40及旋轉單元50、 以及下游側機器人裝置60,係相互並排地被配置於燈管8之長軸L方向。 The workpiece stage 2 of the optical alignment device 1 is provided with a plurality of drive pins (not shown) for transferring the light-aligning object W to and from the downstream robot apparatus 60. The drive pins are disposed at positions spaced apart between the plurality of holding levers 62B1 at intervals in which the light-aligning objects W are held, and are moved up and down by a pin driving mechanism (not shown). The drive pin protrudes from the upper surface of the workpiece stage 2, and the light-aligning object W is picked up from the downstream robot apparatus 60, and then accommodated in the workpiece stage 2, whereby the light-aligning object W is placed on the workpiece stage 2. Above the surface. Further, the drive pin is protruded from the upper surface of the workpiece stage 2, whereby the light distribution object W is separated from the workpiece stage 2, and is held by the downstream side robot apparatus 60. By the driving pins, the optical alignment object W can be transferred between the workpiece stage 2 and the downstream robot apparatus 60 while maintaining the angle of the light adjusted by the rotating unit 50 to the object W. Optical alignment device 1, loading/unloading device 20, upstream robot device 30, cleaner 40, and rotating unit 50, The downstream side robot apparatus 60 is disposed side by side in the longitudinal direction L of the bulb 8.

控制裝置70係控制光配向系統100整體之控制部,具備有儲存控制直線運動機構6等各部分的控制程式之儲存部71、及執行控制程式之執行部72。再者,也可構成為可由電腦讀取控制程式,控制裝置70可藉由使例如個人電腦執行而實施該控制程式。再者,雖然光配向系統100具備有搬入搬出裝置20及上游側機器人裝置30,但也可將搬入搬出裝置20及上游側機器人裝置30與光配向系統100構成為不同之供給系統。於該情形時,既可設置光配向系統100及供給系統之控制裝置,也可例如個別地設置光配向系統100及供給系統之控制裝置,並使各控制裝置協同動作。 The control device 70 controls the entire control unit of the optical alignment system 100, and includes a storage unit 71 that stores a control program for controlling each portion of the linear motion mechanism 6 and an execution unit 72 that executes a control program. Furthermore, it is also possible to configure the control program to be readable by a computer, and the control device 70 can implement the control program by, for example, executing a personal computer. In addition, although the optical alignment system 100 includes the loading/unloading device 20 and the upstream robot device 30, the loading/unloading device 20 and the upstream robot device 30 and the optical alignment system 100 may be configured as different supply systems. In this case, the optical alignment system 100 and the control device of the supply system may be provided, or the optical alignment system 100 and the control device of the supply system may be separately provided, and the respective control devices may operate in cooperation.

其次,對光配向對象物W相對於一對工件台2之搭載位置及回收位置進行說明。此處,為了方便說明,將一工件台2稱作第1工件台2A,而將另一工件台2稱作第2工件台2B。如圖1所示,光配向對象物W朝向第1工件台2A之搭載位置(工件搭載台)PL1、與光配向對象物W來自第1工件台2A之回收位置(工件回收台)PU1,係設定於光照射器5之一端E1側,且位置各不相同。更具體而言,將搭載位置PL1設定於回收位置PU1與光照射器5之間且光照射器5之一端E1附近位置。 Next, the mounting position and the recovery position of the optical alignment object W with respect to the pair of workpiece stages 2 will be described. Here, for convenience of explanation, one workpiece stage 2 is referred to as a first workpiece stage 2A, and the other workpiece stage 2 is referred to as a second workpiece stage 2B. As shown in Fig. 1, the light-aligning object W is placed at the mounting position (work-mounting stage) PL1 of the first workpiece stage 2A and the collection position (work-receiving stage) PU1 of the optical workpiece W from the first workpiece stage 2A. It is set to one side E1 side of the light irradiator 5, and the positions are different. More specifically, the mounting position PL1 is set between the collection position PU1 and the light irradiator 5 and at a position near one end E1 of the light irradiator 5.

同樣地,光配向對象物W朝向第2工件台2B之搭載位置(工件搭載台)PL2、與光配向對象物W來自第2工件台2B之回收位置(工件回收台)PU2,係設定於光照射器5之另一端E2側,且位置各不相同。更具體而言,將搭載位置PL2設定於回收位置PU2與光照射器5之間且光照射器5之另一端E2附近位置。再 者,於圖1中,以實線表示搭載位置PL1、PL2之工件台2,並以二點鏈線表示回收位置PU1、PU2之工件台2。此外,於圖5~圖13中,搭載位置PL1、PL2及回收位置PU1、PU2,係將符號標示於該等之中心。 In the same manner, the position (the workpiece mounting table) PL2 at which the light-aligning object W is directed toward the second workpiece stage 2B, and the collection position (work-receiving table) PU2 from the second workpiece stage 2B of the light-aligning object W are set in the light. The other end of the illuminator 5 is on the E2 side, and the positions are different. More specifically, the mounting position PL2 is set between the collection position PU2 and the light irradiator 5 and at the position near the other end E2 of the light irradiator 5. again In FIG. 1, the workpiece stage 2 on which the positions PL1 and PL2 are mounted is indicated by a solid line, and the workpiece stage 2 of the collection positions PU1 and PU2 is indicated by a two-dot chain line. In addition, in FIGS. 5-13, the mounting positions PL1 and PL2 and the collection positions PU1 and PU2 are indicated by the symbols in the center of these.

在位於搭載位置PL1之第1工件台2A與照射區域R之間設置有空間S1,該空間S1之長度未達第2工件台2B上之光配向對象物W通過照射區域R之長度。同樣地,在位於搭載位置PL2之第2工件台2B與照射區域R之間設置有空間S1,該空間S1之長度未達第1工件台2A上之光配向對象物W通過照射區域R之通過面積。此外,在位於回收位置PU1之第1工件台2A與照射區域R之間設置有空間S2,該空間S2之長度為第2工件台2B上之光配向對象物W通過照射區域R之長度以上。同樣地,在位於回收位置PU2之第2工件台2B與照射區域R之間設置有空間S2,該空間S2之長度為第1工件台2A上之光配向對象物W通過照射區域R之長度以上。 A space S1 is provided between the first workpiece stage 2A located at the mounting position PL1 and the irradiation region R, and the length of the space S1 is less than the length of the light-aligning object W on the second workpiece stage 2B passing through the irradiation region R. Similarly, a space S1 is provided between the second workpiece stage 2B located at the mounting position PL2 and the irradiation region R, and the length of the space S1 is less than the passage of the light-aligning object W on the first workpiece stage 2A through the irradiation region R. area. Further, a space S2 is provided between the first workpiece stage 2A located at the collection position PU1 and the irradiation region R, and the length of the space S2 is equal to or longer than the length of the irradiation target region W on the second workpiece stage 2B. Similarly, a space S2 is provided between the second workpiece stage 2B located at the collection position PU2 and the irradiation region R, and the length of the space S2 is longer than the length of the irradiation target region W on the first workpiece stage 2A. .

清潔器40係配置於一端E1側,旋轉單元50係以使調整台51上之光配向對象物W之中心與搭載位置PL2之中心一致之方式配置於另一端E2側。清潔器40及旋轉單元50之位置也可互換,而於該情形時,旋轉單元50只要配置為使調整台51上之光配向對象物W之中心與搭載位置PL1之中心一致即可。下游側機器人裝置60係形成為可將機器人62自與第1工件台2A之回收位置PU1對應之位置(於直線運動方向X上大致相同之位置)移動至與第2工件台2B之回收位置PU2對應之位置之長度。 The cleaner 40 is disposed on the one end E1 side, and the rotation unit 50 is disposed on the other end E2 side so that the center of the light distribution object W on the adjustment table 51 coincides with the center of the mounting position PL2. The positions of the cleaner 40 and the rotating unit 50 may be interchanged. In this case, the rotating unit 50 may be arranged such that the center of the light-aligning object W on the adjusting table 51 coincides with the center of the mounting position PL1. The downstream robot apparatus 60 is configured to move the robot 62 from a position corresponding to the collection position PU1 of the first workpiece stage 2A (a position substantially the same in the linear motion direction X) to a recovery position PU2 of the second workpiece stage 2B. The length of the corresponding position.

其次,參照圖1、圖5~圖13,對光配向系統100之 動作進行說明。再者,於圖5~圖13中,省略搬入搬出裝置20及上游側機器人裝置30之圖示。於初始狀態下,如圖1及圖5所示,第1工件台2A及第2工件台2B係分別位於搭載位置PL1、PL2,並且,機器人62係位於與搭載位置PL2對應之位置,而燈管8被點燈。再者,於以下說明中,省略相對於第1工件台2A及第2工件台2B進行光配向對象物W之接取時驅動銷的動作、及將光配向對象物W載置於第1工件台2A及第2工件台2B時旋轉驅動機構之動作。此外,依進行光配向之順序依序將光配向對象物W稱作光配向對象物WA、WB、WC、WD、WE、WF。此外,於圖5中,符號D1係表示第1工件台2A之中心移動範圍,而符號D2係表示第2工件台2B之中心移動範圍。 Next, referring to FIG. 1 , FIG. 5 to FIG. 13 , the optical alignment system 100 The action is explained. In addition, in FIGS. 5-13, illustration of the loading/unloading apparatus 20 and the upstream side robot apparatus 30 is abbreviate|omitted. In the initial state, as shown in FIGS. 1 and 5, the first workpiece stage 2A and the second workpiece stage 2B are located at the mounting positions PL1 and PL2, respectively, and the robot 62 is located at a position corresponding to the mounting position PL2. Tube 8 is lit. In the following description, the operation of the drive pin at the time of picking up the optical alignment object W with respect to the first workpiece stage 2A and the second workpiece stage 2B and the placement of the light distribution target object W on the first workpiece are omitted. The operation of the rotation drive mechanism when the table 2A and the second workpiece stage 2B are used. Further, the light distribution target objects W are sequentially referred to as light alignment objects WA, WB, WC, WD, WE, and WF in the order in which the light alignment is performed. Further, in Fig. 5, the symbol D1 indicates the center movement range of the first workpiece stage 2A, and the symbol D2 indicates the center movement range of the second workpiece stage 2B.

首先,機器人32自搬入搬出裝置20接取光配向對象物WA,並藉由清潔器40清除光配向對象物WA之異物及靜電後,將光配向對象物WA載置於旋轉單元50之調整台51上。此時,機器人32在清潔器40與移動旋轉單元50之間移動。於旋轉單元50使光配向對象物WA成為正姿勢後,機器人62自旋轉單元50接取光配向對象物WA,移動至與搭載位置PL1對應之位置,並將光配向對象物WA搭載於搭載位置PL1之第1工件台2A上。 First, the robot 32 picks up the light-aligning object WA from the loading/unloading device 20, and removes foreign matter and static electricity of the light-aligning object WA by the cleaner 40, and then mounts the light-aligning object WA on the adjusting table of the rotating unit 50. 51 on. At this time, the robot 32 moves between the cleaner 40 and the moving rotary unit 50. After the rotation unit 50 causes the light distribution target object WA to be in the normal posture, the robot 62 picks up the light distribution target object WA from the rotation unit 50, moves to the position corresponding to the mounting position PL1, and mounts the light distribution target object WA on the mounting position. On the first workpiece stage 2A of PL1.

另一方面,機器人32係於將光配向對象物WA載置於旋轉單元50之調整台51上後,自搬入搬出裝置20接取下一個光配向對象物WB,並於藉由清潔器40去除光配向對象物WB之異物及靜電後,將光配向對象物WB載置於旋轉單元50之調整台51上。此外,機器人62係於將光配向對象物WA搭載於第1工件台2A上後,移動至與搭載位置PL2對應之位置,自旋轉單元50 接取下一個光配向對象物WB,並將光配向對象物WB搭載於搭載位置PL2之第2工件台2B上。 On the other hand, after the robot 32 is placed on the adjustment table 51 of the rotating unit 50, the robot 32 is attached to the next optical alignment object WB from the loading/unloading device 20, and is removed by the cleaner 40. After the light is directed to the foreign matter of the object WB and the static electricity, the light-aligning object WB is placed on the adjustment table 51 of the rotating unit 50. In addition, the robot 62 is mounted on the first workpiece stage 2A after the light distribution target object WA is moved to the position corresponding to the mounting position PL2, and the self-rotating unit 50 The next light alignment target object WB is picked up, and the light distribution target object WB is mounted on the second workpiece stage 2B at the mounting position PL2.

如圖6所示,直線運動機構6係將第1工件台2A移動至另一端E2側,而使偏振光照射於光配向對象物WA。此時,直線運動機構6係至光配向對象物WA進入照射區域R為止,以高速移動第1工件台2A,而當光配向對象物WA一進入照射區域R,便使第1工件台2A以低速移動。此外,於第1工件台2A去程之移動中,直線運動機構6係以高速使第2工件台2B退避至回收位置PU2。如此,藉由使第2工件台2B退避至回收位置PU2,則即使將第1工件台2A移動至使光配向對象物WA通過照射區域R,仍可防止光配向對象物WA干涉到光配向對象物W。因此,可橫跨第1工件台2A上之光配向對象物WA之整個面進行光配向。另一方面,機器人32係於將光配向對象物WB載置於旋轉單元50之調整台51上後,自搬入搬出裝置20接取下一個光配向對象物WC,並藉由清潔器40去除光配向對象物WC之異物及靜電後,將光分配向對象物WC載置於旋轉單元50之調整台51上。此外,機器人62係於將光配向對象物WB搭載於第2工件台2B上後,自旋轉單元50接取下一個光配向對象物WC。 As shown in FIG. 6, the linear motion mechanism 6 moves the first workpiece stage 2A to the other end E2 side, and irradiates the polarized light to the light-aligning object WA. At this time, the linear motion mechanism 6 moves the first workpiece stage 2A at a high speed until the light-aligning object WA enters the irradiation region R, and causes the first workpiece stage 2A to enter the irradiation region R as soon as the light-aligning object WA enters the irradiation region R. Move at low speed. Further, during the outward movement of the first workpiece stage 2A, the linear motion mechanism 6 retracts the second workpiece stage 2B to the recovery position PU2 at a high speed. By retracting the second workpiece stage 2B to the collection position PU2, even if the first workpiece stage 2A is moved to pass the light-aligning object WA through the irradiation region R, the light-aligning object WA can be prevented from interfering with the light-aligning object. W. Therefore, the optical alignment can be performed across the entire surface of the light-aligning object WA on the first workpiece stage 2A. On the other hand, after the robot 32 is placed on the adjustment table 51 of the rotation unit 50, the robot 32 picks up the next light alignment object WC from the loading/unloading device 20, and removes the light by the cleaner 40. After the foreign matter and the static electricity of the object WC are aligned, the light is distributed to the object WC and placed on the adjustment table 51 of the rotating unit 50. Further, after the robot 62 is mounted on the second workpiece stage 2B by the light distribution target object WB, the next optical alignment object WC is picked up from the rotation unit 50.

當光配向對象物WA於去程上一通過照射區域R,如圖7所示,直線運動機構6便將第1工件台2A反轉並移動至一端E1側,則於回程也可使偏振光照射於光配向對象物WA。此外,直線運動機構6係使第2工件台2B追隨第1工件台2A在回程上的移動而移動至一端E1側,從而使偏振光可照射於光配向對象物WB。此時,直線運動機構6係至追上第1工件台2A(與第1工件 台2A成為規定之距離)為止,使第2工件台2B以高速移動,當追上第1工件台2A時,便以低速移動第2工件台2B。此外,直線運動機構6係至光配向對象物WA完全通過照射區域R為止,使第1工件台2A以低速移動,當光配向對象物WA一完全通過照射區域R,至回收位置PU1為止便以高速使第1工件台2A移動。藉此,於第2工件台2B在去程上之移動中,可使第1工件台2A退避至回收位置PU1。因此,即使將第2工件台2B移動至使光配向對象物WB完全通過照射區域R,仍可防止光配向對象物WB干涉到光配向對象物WA,因此,可橫跨第2工件台2B上之光配向對象物WB之整個面進行光配向。機器人62係移動至與回收位置PU1對應之位置,並自回收位置PU1之第1工件台2A回收光配向對象物WA。此時,機器人62係保持2個光配向對象物WA、WC。另一方面,機器人32係於將光配向對象物WC載置於旋轉單元50之調整台51上後,自搬入搬出裝置20接取下一個光配向對象物WD,並於藉由清潔器40去除光配向對象物WD之異物及靜電後,將光配向對象物WD載置於旋轉單元50之調整台51上。 When the light-aligning object WA passes through the irradiation region R on the way out, as shown in FIG. 7, the linear motion mechanism 6 reverses and moves the first workpiece stage 2A to the one end E1 side, so that the polarized light can be made on the return path. It is irradiated to the light alignment object WA. Further, the linear motion mechanism 6 moves the second workpiece stage 2B to the one end E1 side following the movement of the first workpiece stage 2A on the return path, so that the polarized light can be irradiated onto the light alignment target object WB. At this time, the linear motion mechanism 6 is brought up to catch up with the first workpiece stage 2A (with the first workpiece) When the stage 2A is at a predetermined distance, the second workpiece stage 2B is moved at a high speed, and when the first workpiece stage 2A is caught, the second workpiece stage 2B is moved at a low speed. Further, the linear motion mechanism 6 moves the first workpiece stage 2A at a low speed until the light-aligning object WA completely passes through the irradiation region R, and the light-aligning object WA passes through the irradiation region R completely to the recovery position PU1. The first workpiece stage 2A is moved at a high speed. Thereby, the first workpiece stage 2A can be retracted to the collection position PU1 during the movement of the second workpiece stage 2B. Therefore, even if the second workpiece stage 2B is moved so that the light-aligning object WB completely passes through the irradiation region R, the light-aligning object WB can be prevented from interfering with the light-aligning object WA, and therefore, it can straddle the second workpiece stage 2B. The light is aligned to the entire surface of the object WB. The robot 62 is moved to a position corresponding to the collection position PU1, and the optical alignment object WA is recovered from the first workpiece stage 2A of the collection position PU1. At this time, the robot 62 holds the two light alignment objects WA and WC. On the other hand, after the robot 32 is placed on the adjustment table 51 of the rotation unit 50, the robot 32 picks up the next light alignment object WD from the loading/unloading device 20, and removes it by the cleaner 40. After the light is directed to the foreign object of the object WD and the static electricity, the light-aligning object WD is placed on the adjustment table 51 of the rotating unit 50.

當光配向對象物WB在去程一完全通過照射區域R,如圖8所示,直線運動機構6便將第2工件台2B反轉並移動至另一端E2側,則於回程也可使偏振光照射於光配向對象物WB。此外,直線運動機構6係使第1工件台2A追隨第2工件台2B在回程上之移動,移動至搭載位置PL1。此時,直線運動機構6係使第2工件台2B至光配向對象物WB完全通過照射區域R為止,以低速移動,並使第1工件台2A至搭載位置PL1為止,以高速移動。機器人62係移動至與搭載位置PL1對應之位置,並將光配向對象 物WC搭載於搭載位置PL1之第1工件台2A上。此時,機器人62保持有光配向對象物WA。此外,光配向對象物WD係於旋轉單元50待機。另一方面,機器人32係於將光配向對象物WD載置於旋轉單元50之調整台51上後,自搬入搬出裝置20接取下一個光配向對象物WE,並藉由清潔器40去除光配向對象物WE之異物及靜電。 When the light-aligning object WB passes through the irradiation region R in the outward direction, as shown in FIG. 8, the linear motion mechanism 6 reverses the second workpiece stage 2B and moves to the other end E2 side, and the polarization can also be made in the return path. Light is incident on the light alignment object WB. Further, the linear motion mechanism 6 moves the first workpiece stage 2A following the movement of the second workpiece stage 2B on the return stroke, and moves to the mounting position PL1. At this time, the linear motion mechanism 6 moves the second workpiece stage 2B to the light distribution region R completely at the low speed, and moves the first workpiece stage 2A to the mounting position PL1 at a high speed. The robot 62 moves to a position corresponding to the mounting position PL1 and aligns the light to the object The object WC is mounted on the first workpiece stage 2A at the mounting position PL1. At this time, the robot 62 holds the light alignment object WA. Further, the optical alignment object WD is in standby by the rotation unit 50. On the other hand, after the robot 32 is placed on the adjustment table 51 of the rotating unit 50, the robot 32 picks up the next light alignment object WE from the loading/unloading device 20, and removes the light by the cleaner 40. Foreign matter and static electricity of the object WE.

如圖9所示,直線運動機構6係使第1工件台2A追隨第2工件台2B在回程上之移動而移動。此時,直線運動機構6係至追上第2工件台2B(與第2工件台2B為規定之距離)為止,使第1工件台2A以高速移動。此外,當光配向對象物WB一完全通過照射區域R,直線運動機構6便使第2工件台2B以高速移動。機器人62係移動至與搭載位置PL2對應之位置,自旋轉單元50接取下一個光配向對象物WD,並且將光配向對象物WA載置於旋轉單元50之調整台51上。於旋轉單元50使光配向對象物WA成為正姿勢後,機器人32便自旋轉單元50接取光配向對象物WA,並使光配向對象物WA回到搬入搬出裝置20。此外,光配向對象物WE係於清潔器40待機。 As shown in FIG. 9, the linear motion mechanism 6 moves the first workpiece stage 2A following the movement of the second workpiece stage 2B on the return stroke. At this time, the linear motion mechanism 6 moves the first workpiece stage 2A at a high speed until the second workpiece stage 2B (a predetermined distance from the second workpiece stage 2B) is caught. Further, when the light-aligning object WB passes completely through the irradiation region R, the linear motion mechanism 6 moves the second workpiece stage 2B at a high speed. The robot 62 is moved to a position corresponding to the mounting position PL2, and the next optical alignment object WD is picked up from the rotation unit 50, and the optical alignment object WA is placed on the adjustment table 51 of the rotation unit 50. When the rotation unit 50 sets the light distribution target object WA to the normal posture, the robot 32 picks up the light distribution target object WA from the rotation unit 50, and returns the light distribution target object WA to the loading/unloading device 20. Further, the light-aligning object WE is placed in the cleaner 40 to stand by.

如圖10所示,直線運動機構6係進一步移動第1工件台2A,使偏振光可照射於光配向對象物WC。此時,直線運動機構6係使第1工件台2A至光配向對象物WC完全通過照射區域R為止,以低速移動,當光配向對象物WB一完全通過照射區域R,便使第2工件台2B至回收位置PU2為止,以高速移動。機器人62係移動至與回收位置PU2對應之位置,並自回收位置PU2之第2工件台2B回收光配向對象物WB。此時,機器人62保持有2個光 配向對象物WB、WD。另一方面,於自旋轉單元50取出光配向對象物WA後,機器人32便自清潔器40接取光配向對象物WE,並將光配向對象物WE載置於旋轉單元50之調整台51上。 As shown in FIG. 10, the linear motion mechanism 6 further moves the first workpiece stage 2A so that the polarized light can be irradiated onto the light-aligning object WC. At this time, the linear motion mechanism 6 moves the first workpiece stage 2A to the light-aligning object WC completely through the irradiation region R, and moves the second object stage when the light-aligning object WB completely passes through the irradiation region R. 2B moves to high speed up to the recovery position PU2. The robot 62 moves to a position corresponding to the collection position PU2, and recovers the light distribution target WB from the second workpiece stage 2B of the collection position PU2. At this time, the robot 62 keeps 2 lights. Targeting objects WB, WD. On the other hand, after the light-aligning object WA is taken out from the rotating unit 50, the robot 32 picks up the light-aligning object WE from the cleaner 40, and mounts the light-aligning object WE on the adjusting table 51 of the rotating unit 50. .

如圖11所示,直線運動機構6係使第2工件台2B追隨第1工件台2A之回程之移動,而至搭載位置PL2為止,以高速移動。此時,直線運動機構6係使第1工件台2A至光配向對象物WC完全通過照射區域R為止,以低速移動。機器人62係移動至與搭載位置PL2對應之位置,並將光配向對象物WD搭載於搭載位置PL2之第2工件台2B上。此時,機器人62保持有光配向對象物WB。此外,光配向對象物WE係於旋轉單元50待機。另一方面,機器人32係於將光配向對象物WE載置於旋轉單元50之調整台51上後,自搬入搬出裝置20接取下一個光配向對象物WF,並藉由清潔器40去除光配向對象物WF之異物及靜電。 As shown in FIG. 11, the linear motion mechanism 6 moves the second workpiece stage 2B following the movement of the return path of the first workpiece stage 2A to the mounting position PL2. At this time, the linear motion mechanism 6 moves the first workpiece stage 2A to the light-aligning object WC completely at the low speed by the irradiation region R. The robot 62 is moved to a position corresponding to the mounting position PL2, and the light distribution target WD is mounted on the second workpiece stage 2B at the mounting position PL2. At this time, the robot 62 holds the light alignment object WB. Further, the light-aligning object WE is placed on the rotating unit 50 to stand by. On the other hand, after the robot 32 is placed on the adjustment table 51 of the rotating unit 50, the robot 32 picks up the next light alignment object WF from the loading/unloading device 20, and removes the light by the cleaner 40. Foreign matter and static electricity of the object WF.

如圖12所示,直線運動機構6係使第2工件台2B追隨第1工件台2A在回程上之移動而移動,而使偏振光可照射於第2工件台2B上之光配向對象物WD。此時,當光配向對象物WC一完全通過照射區域R,直線運動機構6便使第1工件台2A以高速移動。此外,直線運動機構6係使第2工件台2B至追上第1工件台2A為止,以高速移動。機器人62係自旋轉單元50接取下一個光配向對象物WE,並將光配向對象物WB載置於旋轉單元50之調整台51上。於旋轉單元50使光配向對象物WB成為正姿勢後,機器人32係自旋轉單元50接取光配向對象物WB,並使光配向對象物WB回到搬入搬出裝置20。此外,光配向對象物WF係於清潔器40待機。 As shown in FIG. 12, the linear motion mechanism 6 moves the second workpiece stage 2B to follow the movement of the first workpiece stage 2A on the return path, and the polarized light can be irradiated onto the second workpiece stage 2B. . At this time, when the light-aligning object WC completely passes through the irradiation region R, the linear motion mechanism 6 moves the first workpiece stage 2A at a high speed. Further, the linear motion mechanism 6 moves at a high speed until the second workpiece stage 2B catches up with the first workpiece stage 2A. The robot 62 picks up the next optical alignment object WE from the rotation unit 50, and mounts the optical alignment object WB on the adjustment table 51 of the rotation unit 50. When the rotation unit 50 sets the light distribution target object WB to the normal posture, the robot 32 picks up the light distribution target object WB from the rotation unit 50, and returns the light distribution target object WB to the loading/unloading device 20. Further, the light-aligning object WF is in standby with the cleaner 40.

如圖13所示,直線運動機構6係於第1工件台2A在回程上之移動時,使第1工件台2A至回收位置PU1為止,以高速移動。直線運動機構6係使第2工件台2B至光配向對象物WD完全通過照射區域R為止,以低速移動。機器人62係移動至與回收位置PU1對應之位置,並自回收位置PU1之第1工件台2A回收光配向對象物WC。此時,機器人62保持有2個光配向對象物WC、WE。另一方面,於自旋轉單元50取出光配向對象物WB後,機器人32係自清潔器40接取光配向對象物WF,並將光配向對象物WF載置於旋轉單元50之調整台51上。之後的動作則為自圖5開始之動作的重複。 As shown in FIG. 13, the linear motion mechanism 6 moves the first workpiece stage 2A to the recovery position PU1 at a high speed when the first workpiece stage 2A moves on the return path. The linear motion mechanism 6 moves the second workpiece stage 2B to the light-aligning object WD completely through the irradiation region R at a low speed. The robot 62 is moved to a position corresponding to the collection position PU1, and the optical alignment object WC is recovered from the first workpiece stage 2A of the collection position PU1. At this time, the robot 62 holds two light alignment objects WC and WE. On the other hand, after the light-aligning object WB is taken out from the rotating unit 50, the robot 32 picks up the light-aligning object WF from the cleaner 40, and mounts the light-aligning object WF on the adjusting table 51 of the rotating unit 50. . The subsequent actions are repetitions of the actions starting from Figure 5.

如以上所說明,根據本實施形態,光配向裝置1係構成為將一對回收位置PU1、PU2設置於兩端部,於中央部設置有光照射器5,而於回收位置PU1、PU2與光照射器5之間且光照射器5之兩端E1、E2附近位置,設置有一對搭載位置PL1、PL2。如此,由於設置有2個工件台2,因此藉由使另一工件台2以追隨一工件台2之移動之方式移動,可縮短光配向對象物W之處理(光配向照射)之製程作業時間。此外,由於在回收位置PU1、PU2與光照射器5之間且光照射器5之兩端E1、E2附近位置設置一對搭載位置PL1、PL2,因此可縮短自搭載位置PL1、PL2至光照射器5之間的距離。藉此,可縮短光配向對象物W之移動時間,其結果,可縮短光配向對象物W之處理(光配向照射)之製程作業時間。此外,由於可縮短自搭載位置PL1、PL2至光照射器5之間的距離,因此可抑制異物附著於照射前之光配向對象物W。 As described above, according to the present embodiment, the optical alignment device 1 is configured such that the pair of recovery positions PU1 and PU2 are provided at both end portions, and the light irradiator 5 is provided at the central portion, and the PU1, PU2 and the light are collected at the recovery positions. A pair of mounting positions PL1 and PL2 are provided between the illuminators 5 and at positions near the ends E1 and E2 of the light illuminator 5. In this way, since the two workpiece stages 2 are provided, the movement of the other workpiece stage 2 can be shortened by following the movement of the workpiece stage 2, thereby shortening the processing time of the processing of the optical alignment object W (optical alignment irradiation). . Further, since the pair of mounting positions PL1 and PL2 are provided between the collection positions PU1 and PU2 and the light irradiator 5 and at the positions near the ends E1 and E2 of the light irradiator 5, the self-mounting positions PL1 and PL2 can be shortened to light irradiation. The distance between the devices 5. Thereby, the moving time of the light-aligning object W can be shortened, and as a result, the processing time of the processing of the light-aligning object W (optical alignment irradiation) can be shortened. Further, since the distance between the self-mounting positions PL1 and PL2 and the light irradiator 5 can be shortened, it is possible to suppress foreign matter from adhering to the light-aligning object W before the irradiation.

此外,根據本實施形態,構成為具備有使光配向對象 物W依一端部側之搭載位置PL1、中央部之光照射器5之照射區域R、一端部側之回收位置PU1之順序進行往返,並且使工件依另一端部側之搭載位置PL2、中央部之光照射器5之照射區域R、另一端部側之回收位置PU2之順序進行往返之直線運動機構6,直線運動機構6係於一光配向對象物W通過照射區域R時,使另一光配向對象物W自搭載位置PL1、PL2退避。藉由該構成,由於即使一光配向對象物W移動至完全通過照射區域R,仍可防止一光配向對象物W干涉到另一光配向對象物W,因此可橫跨光配向對象物W之整個面進行光配向。 Further, according to the present embodiment, the light distribution target is provided The object W reciprocates in the order of the mounting position PL1 on the one end side, the irradiation area R of the light irradiator 5 in the center portion, and the collection position PU1 on the one end side, and the workpiece is placed on the other end side of the mounting position PL2 and the center portion. The linear motion mechanism 6 reciprocates in the order of the irradiation region R of the light irradiator 5 and the collection position PU2 on the other end side, and the linear motion mechanism 6 is configured to make another light when the light alignment object W passes through the irradiation region R. The object to be aligned W is retracted from the mounting positions PL1 and PL2. According to this configuration, even if one light-aligning object W moves completely through the irradiation region R, it is possible to prevent one light-aligning object W from interfering with another light-aligning object W, and thus it is possible to align the light-aligning object W. The entire surface is optically aligned.

此外,根據本實施形態,構成為具備有將光配向對象物W搭載於搭載位置PL1、PL2之工件台2之下游側機器人裝置60,且下游側機器人裝置6可保持2個光配向對象物W。藉由該構成,由於可預先保持下一個光配向對象物W,因此當自工件台2一回收光配向對象物W,便可立即將光配向對象物W搭載於該工件台2。其結果,可縮短光配向對象物W之處理(光配向照射)之製程作業時間。 Further, according to the present embodiment, the downstream robot device 60 is provided in the workpiece stage 2 in which the light-aligning object W is mounted on the mounting positions PL1 and PL2, and the downstream robot device 6 can hold two light-aligning objects W. . With this configuration, since the next light-aligning object W can be held in advance, when the light-aligning object W is recovered from the workpiece stage 2, the light-aligning object W can be immediately mounted on the workpiece stage 2. As a result, the processing time of the processing of the light-aligning object W (optical alignment irradiation) can be shortened.

此外,根據本實施形態,直線運動機構6係構成為可於光配向對象物W通過照射區域R之前後,變更光配向對象物W之移動速度。藉由該構成,即使於光照射器5之兩端E1、E2附近位置之搭載位置PL1、PL2搭載一光配向對象物W,也可使該一光配向對象物W追上另一光配向對象物W。其結果,不需要等待光配向對象物W之搭載,而可縮短光配向對象物W之處理(光配向照射)之製程作業時間。 Further, according to the present embodiment, the linear motion mechanism 6 is configured to change the moving speed of the light-aligning object W before and after the light-aligning object W passes through the irradiation region R. According to this configuration, even if the light-aligning object W is mounted on the mounting positions PL1 and PL2 at the positions near the ends E1 and E2 of the light irradiator 5, the one light-aligning object W can be caught by another light-aligning object. W. As a result, it is not necessary to wait for the mounting of the light-aligning object W, and the processing time of the processing of the light-aligning object W (optical alignment irradiation) can be shortened.

此外,根據本實施形態,構成為於照射另一光配向對 象物W後,使另一光配向對象物W自搭載位置PL1、PL2退避。藉此,由於相較於照射前退避之情形,可減少照射前之光配向對象物W之移動,因此,可精度更佳地維持已藉由旋轉單元50所調整之光配向對象物W之角度,其結果,可提高光配向精度。再者,於本實施形態中,雖然只有最初載置於第2工件台2B之光配向對象物WB在照射前退避,但對於該光配向對象物WB,也可不使其在照射前退避。於該情形時,於第1工件台2A在去程上之移動時,不將光配向對象物WB載置於第2工件台2B,而於第1工件台2A在去程上之移動中,使第2工件台2B以高速退避至回收位置PU2。然後,使第2工件台2B追隨第1工件台2A在回程上之移動而移動至搭載位置PL1,並將光配向對象物WB搭載於搭載位置PL1之第2工件台2B上。藉此,也可精度更佳地維持光配向對象物WB之角度,其結果,可提高光配向精度。 Further, according to the embodiment, it is configured to illuminate another pair of light alignments After the object W, the other light-aligning object W is retracted from the mounting positions PL1 and PL2. Thereby, since the movement of the light-aligning object W before irradiation can be reduced as compared with the case of retreating before irradiation, the angle of the light-aligning object W that has been adjusted by the rotation unit 50 can be more accurately maintained. As a result, the optical alignment accuracy can be improved. In the present embodiment, only the light-aligning object WB placed on the second workpiece stage 2B is retracted before the irradiation, but the light-aligning object WB may not be retracted before the irradiation. In this case, when the first workpiece stage 2A moves in the outward movement, the light-aligning object WB is not placed on the second workpiece stage 2B, and during the movement of the first workpiece stage 2A on the way out, The second workpiece stage 2B is evacuated to the recovery position PU2 at a high speed. Then, the second workpiece stage 2B moves to the mounting position PL1 following the movement of the first workpiece stage 2A on the return stroke, and the light distribution target object WB is mounted on the second workpiece stage 2B of the mounting position PL1. Thereby, the angle of the light-aligning object WB can be maintained with higher precision, and as a result, the light alignment accuracy can be improved.

<第2實施形態> <Second embodiment>

其次,對第2實施形態進行說明。圖14為示意性地顯示具備有第2實施形態之光配向裝置之光配向系統之俯視圖。於上述第1實施形態之光配向系統100中,雖然於回收位置PU1、PU2與光照射器5之間設定有搭載位置PL1、PL2,但於第2實施形態之光配向系統200中,如圖14所示,回收位置PU1、PU2與搭載位置PL1、PL2被設定於相同之部位。亦即,工件搭載台(搭載位置PL1、PL2)係兼作為工件回收台(回收位置PU1、PU2)。更詳細而言,在位於搭載位置PL1(回收位置PU1)之第1工件台2A與照射區域R之間設置有空間S1,該空間S1之長度未達第2工件台2B上之光配向對象物W通過照射區域R之長度。同樣地,在位於搭載位置 PL2(回收位置PU2)之第2工件台2B與照射領域R之間設置有空間S1,該空間S1之長度未達第1工件台2A上之光配向對象物W通過照射區域R之長度。 Next, a second embodiment will be described. Fig. 14 is a plan view schematically showing an optical alignment system including the optical alignment device of the second embodiment. In the optical alignment system 100 according to the first embodiment, the mounting positions PL1 and PL2 are set between the collection positions PU1 and PU2 and the light irradiator 5. However, in the optical alignment system 200 according to the second embodiment, As shown in FIG. 14, the collection positions PU1 and PU2 and the mounting positions PL1 and PL2 are set to the same position. In other words, the workpiece mounting table (mounting positions PL1, PL2) also serves as a workpiece collecting table (recovering positions PU1, PU2). More specifically, a space S1 is provided between the first workpiece stage 2A located at the mounting position PL1 (recovering position PU1) and the irradiation area R, and the length of the space S1 is less than the optical alignment object on the second workpiece stage 2B. W passes through the length of the irradiation region R. Similarly, in the loading position A space S1 is provided between the second workpiece stage 2B of the PL2 (recovery position PU2) and the irradiation region R, and the length of the space S1 is less than the length of the light-aligning object W on the first workpiece stage 2A passing through the irradiation region R.

機器人裝置260係形成為可使機器人62自與第1工件台2A之搭載位置PL1(回收位置PU1)對應之位置(於直線運動方向X上大致相同之位置)移動至與第2工件台2B之搭載位置PL2(回收位置PU2)對應之位置之長度。於第2實施形態中,由於除了回收位置PU1、PU2之位置及機器人裝置260之直線運動方向X之長度以外為大致相同之構成,因此對與第1實施形態相同部分賦予相同之符號並省略說明。再者,機器人裝置260之機器人62,係構成為可上下並排地保持2個光配向對象物W。 The robot apparatus 260 is configured to move the robot 62 from a position corresponding to the mounting position PL1 (recovering position PU1) of the first workpiece stage 2A (a position substantially the same in the linear motion direction X) to the second workpiece stage 2B. The length of the position corresponding to the position PL2 (recovery position PU2) is mounted. In the second embodiment, the same components as those in the first embodiment are denoted by the same reference numerals, and the description thereof is omitted, except that the positions of the positions PU1 and PU2 and the linear motion direction X of the robot apparatus 260 are substantially the same. . Further, the robot 62 of the robot apparatus 260 is configured to hold the two light alignment objects W side by side.

其次,參照圖14~圖21,對光配向系統200之動作進行說明。再者,於圖15~圖21中,省略搬入搬出裝置20及上游側機器人裝置30之圖示。於初始狀態下,如圖14及圖15所示,第1工件台2A及第2工件台2B分別位於搭載位置PL1、PL2,並且機器人62係位於與搭載位置PL2對應之位置,而燈管8被點燈。再者,於以下之說明中,省略光配向對象物W相對於第1工件台2A及第2工件台2B在進行接取時驅動銷之動作、及將光配向對象物W載置於第1工件台2A及第2工件台2B時旋轉驅動機構之動作。此外,依進行光配向之順序而將光配向對象物W稱為光配向對象物WA、WB、WC、WD、WE、WF。此外,於圖15中,符號D1表示第1工件台2A之中心移動範圍,符號D2則表示第2工件台2B之中心移動範圍。 Next, the operation of the optical alignment system 200 will be described with reference to Figs. 14 to 21 . In addition, in FIGS. 15-21, illustration of the loading/unloading apparatus 20 and the upstream side robot apparatus 30 is abbreviate|omitted. In the initial state, as shown in FIGS. 14 and 15 , the first workpiece stage 2A and the second workpiece stage 2B are located at the mounting positions PL1 and PL2, respectively, and the robot 62 is located at a position corresponding to the mounting position PL2, and the tube 8 is provided. Was lighted. In the following description, the operation of the drive pin at the time of picking up the optical workpiece W with respect to the first workpiece stage 2A and the second workpiece stage 2B is omitted, and the light distribution target W is placed in the first position. The operation of the rotation drive mechanism is performed between the workpiece stage 2A and the second workpiece stage 2B. Further, the light distribution target object W is referred to as a light alignment target object WA, WB, WC, WD, WE, WF in the order in which the light alignment is performed. Further, in Fig. 15, the symbol D1 indicates the center movement range of the first workpiece stage 2A, and the symbol D2 indicates the center movement range of the second workpiece stage 2B.

首先,機器人32係自搬入搬出裝置20接取光配向對 象物WA,並藉由清潔器40去除光配向對象物WA之異物及靜電後,將光配向對象物WA載置於旋轉單元50之調整台51上。此時,機器人32係在清潔器40與移動旋轉單元50之間移動。於旋轉單元50使光配向對象物WA成為正姿勢後,機器人62係自旋轉單元50接取光配向對象物WA,移動至與搭載位置PL1對應之位置,並將光配向對象物WA搭載於搭載位置PL1之第1工件台2A上。 First, the robot 32 picks up the optical alignment pair from the loading/unloading device 20 After the foreign matter and the static electricity of the light-aligning object WA are removed by the cleaner 40, the light-aligning object WA is placed on the adjustment table 51 of the rotary unit 50. At this time, the robot 32 moves between the cleaner 40 and the moving rotary unit 50. After the rotation unit 50 causes the light distribution target object WA to be in the normal posture, the robot 62 picks up the light distribution target object WA from the rotation unit 50, moves to the position corresponding to the mounting position PL1, and mounts the light distribution target object WA on the surface. The first workpiece stage 2A of the position PL1 is placed.

另一方面,機器人32係於將光配向對象物WB載置於旋轉單元50之調整台51上後,自搬入搬出裝置20接取下一個光配向對象物WB,並藉由清潔器40去除光配向對象物WB之異物及靜電後,將光配向對象物WB載置於旋轉單元50之調整台51上。此外,機器人62係於將光配向對象物WA搭載於第1工件台2A上後,移動至與搭載位置PL2對應之位置,自旋轉單元50接取下一個光配向對象物WB,並將光配向對象物WB搭載於搭載位置PL2之第2工件台2B上。 On the other hand, after the robot 32 is placed on the adjustment table 51 of the rotary unit 50, the robot 32 picks up the next light alignment object WB from the loading/unloading device 20, and removes the light by the cleaner 40. After the foreign matter and the static electricity of the object WB are aligned, the optical alignment object WB is placed on the adjustment table 51 of the rotating unit 50. In addition, the robot 62 is mounted on the first workpiece stage 2A after the light distribution target object WA is moved to the position corresponding to the mounting position PL2, and the next optical alignment object WB is picked up from the rotation unit 50, and the light is aligned. The object WB is mounted on the second workpiece stage 2B at the mounting position PL2.

如圖16所示,直線運動機構6係將第1工件台2A移動至另一端E2側,而使偏振光可照射於光配向對象物WA。此時,直線運動機構6係使第1工件台2A至光配向對象物WA進入照射區域R為止,以高速移動,當光配向對象物WA一進入照射區域R,便使第1工件台2A以低速移動。此外,於第1工件台2A在去程上之移動中,直線運動機構6係使第2工件台2B以高速自搭載位置PL2退避至退避位置PT2。於位於退避位置PT2之第2工件台2B與照射區域R之間設置有空間S2,該空間S2之長度為第1工件台2A上之光配向對象物WA通過照射區域R之長度以上。如此,藉由使第2工件台2B退避至退避位置PT2,即使將第1 工件台2A移動至使光配向對象物WA完全通過照射區域R,也可防止光配向對象物WA干涉到光配向對象物WB。因此,可橫跨第1工件台2A上之光配向對象物WA之整個面進行光配向。另一方面,機器人32係於將光配向對象物WB載置於旋轉單元50之調整台51上後,自搬入搬出裝置20接取下一個光配向對象物WC,並藉由清潔器40去除光配向對象物WC之異物及靜電後,將光配向對象物WC載置於旋轉單元50之調整台51上。 As shown in FIG. 16, the linear motion mechanism 6 moves the first workpiece stage 2A to the other end E2 side, and the polarized light can be irradiated to the light alignment object WA. At this time, the linear motion mechanism 6 moves the first workpiece stage 2A to the light-aligning object WA into the irradiation region R, and moves at a high speed. When the light-aligning object WA enters the irradiation region R, the first workpiece stage 2A is caused by the first workpiece stage 2A. Move at low speed. Further, during the movement of the first workpiece stage 2A in the outward movement, the linear motion mechanism 6 retracts the second workpiece stage 2B from the mounting position PL2 to the retracted position PT2 at a high speed. A space S2 is provided between the second workpiece stage 2B located at the retracted position PT2 and the irradiation region R, and the length of the space S2 is equal to or longer than the length of the irradiation target region R of the optical alignment object WA on the first workpiece stage 2A. As described above, even if the second workpiece stage 2B is retracted to the retracted position PT2, the first When the workpiece stage 2A is moved so that the light-aligning object WA completely passes through the irradiation region R, the light-aligning object WA can be prevented from interfering with the light-aligning object WB. Therefore, the optical alignment can be performed across the entire surface of the light-aligning object WA on the first workpiece stage 2A. On the other hand, after the robot 32 is placed on the adjustment table 51 of the rotation unit 50, the robot 32 picks up the next light alignment object WC from the loading/unloading device 20, and removes the light by the cleaner 40. After the foreign matter and the static electricity of the object WC are aligned, the light distribution target WC is placed on the adjustment table 51 of the rotary unit 50.

當光配向對象物WA在去程上一完全通過照射區域R,如圖17所示,直線運動機構6便將第1工件台2A反轉並移動至一端E1側,而於回程上也可使偏振光照射於光配向對象物WA。此外,直線運動機構6係使第2工件台2B追隨第1工件台2A在回程上之移動而移動至一端E1側,從而使偏振光照射於光配向對象物WB。此時,直線運動機構6係使第2工件台2B至追上第1工件台2A(與第1工件台2A為規定之距離)為止以高速移動,當追上第1工件台2A,便使第2工件台2B以低速移動。此外,直線運動機構6係使第1工件台2A至光配向對象物WA完全通過照射區域R為止以低速移動,當光配向對象物WA一完全通過照射區域R,便使第1工件台2A以高速移動至退避位置PT1。在位於退避位置PT1之第1工件台2A與照射區域R之間設置有空間S2,該空間S2之長度為第2工件台2B上之光配向對象物WB通過照射區域R之長度以上。藉此,可於第2工件台2B在去程上之移動中,使第1工件台2A退避至退避位置PT1。因此,即使將第2工件台2B移動至使光配向對象物WB完全通過照射區域R,仍可防止光配向對象物WB干涉到光配向對象物WA,而可橫跨第2工件台2B上之 光配向對象物WB之整個面進行光配向。另一方面,機器人62係於將光配向對象物WB搭載於第2工件台2B上後,自旋轉單元50接取下一個光配向對象物WC。然後,機器人62係移動至與搭載位置PL1對應之位置。此外,機器人32係於將光配向對象物WC載置於旋轉單元50之調整台51上後,自搬入搬出裝置20接取下一個光配向對象物WD,並藉由清潔器40去除光配向對象物WD之異物及靜電後,將光配向對象物WC載置於旋轉單元50之調整台51上。 When the light-aligning object WA completely passes through the irradiation region R on the way out, as shown in FIG. 17, the linear motion mechanism 6 reverses and moves the first workpiece stage 2A to the one end E1 side, and can also be made on the return path. The polarized light is incident on the light alignment object WA. In addition, the linear motion mechanism 6 moves the second workpiece stage 2B to the one end E1 side following the movement of the first workpiece stage 2A on the return stroke, and irradiates the polarized light to the optical alignment object WB. At this time, the linear motion mechanism 6 moves the second workpiece stage 2B up to the first workpiece stage 2A (a predetermined distance from the first workpiece stage 2A), and catches up with the first workpiece stage 2A. The second workpiece stage 2B moves at a low speed. Further, the linear motion mechanism 6 moves the first workpiece stage 2A to the light-aligning object WA completely at a low speed through the irradiation region R, and when the light-aligning object WA completely passes through the irradiation region R, the first workpiece stage 2A is caused by the first workpiece stage 2A. Move to the retracted position PT1 at high speed. A space S2 is provided between the first workpiece stage 2A located at the retracted position PT1 and the irradiation region R, and the length of the space S2 is equal to or longer than the length of the irradiation target region WB on the second workpiece stage 2B. Thereby, the first workpiece stage 2A can be retracted to the retracted position PT1 during the movement of the second workpiece stage 2B. Therefore, even if the second workpiece stage 2B is moved so that the light-aligning object WB completely passes through the irradiation region R, the light-aligning object WB can be prevented from interfering with the light-aligning object WA, and can be traversed on the second workpiece stage 2B. The light distribution is optically aligned to the entire surface of the object WB. On the other hand, after the robot 62 is mounted on the second workpiece stage 2B with the light distribution target WB, the next optical alignment object WC is picked up from the rotation unit 50. Then, the robot 62 is moved to a position corresponding to the mounting position PL1. Further, after the robot 32 is placed on the adjustment table 51 of the rotation unit 50, the robot 32 picks up the next light alignment object WD from the loading/unloading device 20, and removes the light alignment object by the cleaner 40. After the foreign matter of the object WD and the static electricity, the light-aligning object WC is placed on the adjustment table 51 of the rotating unit 50.

當光配向對象物WB在去程上一完全通過照射區域R,如圖18所示,直線運動機構6便將第2工件台2B反轉而移動至另一端E2側,於回程上也可使偏振光照射於光配向對象物WB。此外,直線運動機構6係使第1工件台2A追隨第2工件台2B在回程上之移動而移動至搭載位置PL1。此時,直線運動機構6係使第2工件台2B至光配向對象物WB完全通過照射區域R為止,以低速移動,並使第1工件台2A以高速移動至搭載位置PL1。機器人62係自搭載位置PL1之第1工件台2A回收光配向對象物WA,並且將光配向對象物WC搭載於搭載位置PL1之第1工件台2A上。此時,機器人62保持有光配向對象物WA。此外,光配向對象物WD係於旋轉單元50待機。另一方面,機器人32係於將光配向對象物WD載置於旋轉單元50之調整台51上後,自搬入搬出裝置20接取下一個光配向對象物WE,並藉由清潔器40去除光配向對象物WE之異物及靜電。 When the light-aligning object WB completely passes through the irradiation region R on the way out, as shown in FIG. 18, the linear motion mechanism 6 reverses the second workpiece stage 2B and moves to the other end E2 side, and can also be made on the return path. The polarized light is incident on the light alignment object WB. Further, the linear motion mechanism 6 moves the first workpiece stage 2A to the mounting position PL1 following the movement of the second workpiece stage 2B on the return stroke. At this time, the linear motion mechanism 6 moves the second workpiece stage 2B to the light-aligning object WB completely at the low speed, and moves the first workpiece stage 2A to the mounting position PL1 at a high speed. The robot 62 collects the light distribution target WA from the first workpiece stage 2A at the mounting position PL1, and mounts the light distribution target object WC on the first workpiece stage 2A at the mounting position PL1. At this time, the robot 62 holds the light alignment object WA. Further, the optical alignment object WD is in standby by the rotation unit 50. On the other hand, after the robot 32 is placed on the adjustment table 51 of the rotating unit 50, the robot 32 picks up the next light alignment object WE from the loading/unloading device 20, and removes the light by the cleaner 40. Foreign matter and static electricity of the object WE.

如圖19所示,直線運動機構6係使第1工件台2A追隨第2工件台2B在回程上之移動而移動,而可對光配向對象物 WC照射偏振光。此時,直線運動機構6係使第1工件台2A至追上第2工件台2B(與第2工件台2B為規定之距離)為止以高速移動,並使第1工件台2A至光配向對象物WC完全通過照射區域R為止以低速移動。此外,當光配向對象物WB一完全通過照射區域R,直線運動機構6便使第2工件台2B以高速移動至退避位置PT2。機器人62係移動至與搭載位置PL2對應之位置,自旋轉單元50接取下一個光配向對象物WD,並且將光配向對象物WA載置於旋轉單元50之調整台51上。於旋轉單元50使光配向對象物WA成為正姿勢後,機器人32係自旋轉單元50接取光配向對象物WA,並使光配向對象物WA回到搬入搬出裝置20。此外,光配向對象物WE係於清潔器40待機。 As shown in FIG. 19, the linear motion mechanism 6 moves the first workpiece stage 2A following the movement of the second workpiece stage 2B on the return path, and the object can be aligned with the light. The WC illuminates the polarized light. At this time, the linear motion mechanism 6 moves the first workpiece stage 2A up to the second workpiece stage 2B (the predetermined distance from the second workpiece stage 2B), and moves the first workpiece stage 2A to the light alignment target. The object WC moves at a low speed completely through the irradiation region R. Further, when the light-aligning object WB completely passes through the irradiation region R, the linear motion mechanism 6 moves the second workpiece stage 2B to the retracted position PT2 at a high speed. The robot 62 is moved to a position corresponding to the mounting position PL2, and the next optical alignment object WD is picked up from the rotation unit 50, and the optical alignment object WA is placed on the adjustment table 51 of the rotation unit 50. After the rotation unit 50 sets the light distribution target object WA to the normal posture, the robot 32 picks up the light distribution target object WA from the rotation unit 50, and returns the light distribution target object WA to the loading/unloading device 20. Further, the light-aligning object WE is placed in the cleaner 40 to stand by.

如圖20所示,直線運動機構6係使第2工件台2B追隨第1工件台2A在回程上之移動,而移動至搭載位置PL2。此時,直線運動機構6係使第1工件台2A至光配向對象物WC完全通過照射區域R為止以低速移動,並使第2工件台2B以高速移動至搭載位置PL2。機器人62係自搭載位置PL2之第2工件台2B回收光配向對象物WB,並將光配向對象物WD搭載於搭載位置PL2之第2工件台2B上。此時,機器人62保持有光配向對象物WB。此外,光配向對象物WE係於旋轉單元50待機。另一方面,於自旋轉單元50取出光配向對象物WA後,機器人32係自清潔器40接取光配向對象物WE,並將光配向對象物WE載置於旋轉單元50之調整台51上。此外,機器人32係於將光配向對象物WE載置於旋轉單元50之調整台51上後,自搬入搬出裝置20接取下一個光配向對象物WF,並藉由清潔器40去除光配向對象物WF之異物及 靜電。 As shown in FIG. 20, the linear motion mechanism 6 moves the second workpiece stage 2B to the mounting position PL2 following the movement of the first workpiece stage 2A on the return stroke. At this time, the linear motion mechanism 6 moves the first workpiece stage 2A to the light distribution target object WC at a low speed completely through the irradiation region R, and moves the second workpiece stage 2B to the mounting position PL2 at a high speed. The robot 62 collects the light-aligning object WB from the second workpiece stage 2B at the mounting position PL2, and mounts the light-aligning object WD on the second workpiece stage 2B at the mounting position PL2. At this time, the robot 62 holds the light alignment object WB. Further, the light-aligning object WE is placed on the rotating unit 50 to stand by. On the other hand, after the light-aligning object WA is taken out from the rotating unit 50, the robot 32 picks up the light-aligning object WE from the cleaner 40, and mounts the light-aligning object WE on the adjusting table 51 of the rotating unit 50. . Further, after the robot 32 is placed on the adjustment table 51 of the rotating unit 50, the robot 32 is attached to the next optical alignment object WF from the loading/unloading device 20, and the optical alignment object is removed by the cleaner 40. Foreign matter of WF and Static electricity.

如圖21所示,直線運動機構6係使第2工件台2B追隨第1工件台2A在回程上之移動而移動,而可對第2工件台2B上之光配向對象物WD照射偏振光。此時,直線運動機構6係使第2工件台2B至追上第1工件台2A為止以高速移動,並使第2工件台2B至光配向對象物WD完全通過照射區域R為止以低速移動。此外,當光配向對象物WC一完全通過照射區域R,直線運動機構6便使第1工件台2A以高速移動至退避位置PT1。機器人62係自旋轉單元50接取下一個光配向對象物WE,並且將光配向對象物WB載置於旋轉單元50之調整台51上。於旋轉單元50使光配向對象物WB成為正姿勢後,機器人32係自旋轉單元50接取光配向對象物WB,並使光配向對象物WB回到搬入搬出裝置20。此外,光配向對象物WF係於清潔器40待機。之後的動作為自圖15開始之動作的重複。 As shown in FIG. 21, the linear motion mechanism 6 moves the second workpiece stage 2B following the movement of the first workpiece stage 2A on the return path, and can irradiate the light-aligning object WD on the second workpiece stage 2B with polarized light. At this time, the linear motion mechanism 6 moves at a high speed until the second workpiece stage 2B moves up to the first workpiece stage 2A, and moves the second workpiece stage 2B to the light-aligning object WD completely through the irradiation region R. Further, when the light-aligning object WC passes completely through the irradiation region R, the linear motion mechanism 6 moves the first workpiece stage 2A to the retracted position PT1 at a high speed. The robot 62 picks up the next light alignment object WE from the rotation unit 50, and mounts the light alignment object WB on the adjustment table 51 of the rotation unit 50. When the rotation unit 50 sets the light distribution target object WB to the normal posture, the robot 32 picks up the light distribution target object WB from the rotation unit 50, and returns the light distribution target object WB to the loading/unloading device 20. Further, the light-aligning object WF is in standby with the cleaner 40. The subsequent actions are repetitions of the actions starting from FIG.

如以上所說明,根據本實施形態,光配向裝置1係構成為於中央部設置有光照射器5,並於光照射器5之兩端E1、E2附近位置設置有一對搭載位置PL1、PL2,並具備有使光配向對象物W以一端部側之搭載位置PL1、中央部之光照射器5之照射區域R、一端部側之搭載位置PL1之順序進行往返,並且使光配向對象物W以另一端部側之搭載位置PL2、中央部之光照射器5之照射區域R、另一端部側之搭載位置PL2之順序進行往返之直線運動機構6,而直線運動機構6係於使一光配向對象物W通過照射區域R時,使另一光配向對象物W自搭載位置PL1、PL2退避。如此,由於設置有2個工件台2,因此可藉由以追隨一工件台2之移動之方式移 動另一工件台2,而縮短光配向對象物W之處理(光配向照射)之製程作業時間。 As described above, according to the present embodiment, the optical alignment device 1 is configured such that the light irradiator 5 is provided at the center portion, and the pair of mounting positions PL1 and PL2 are provided at positions near the both ends E1 and E2 of the light irradiator 5, In addition, the optical alignment object W is reciprocated in the order of the mounting position PL1 on the one end side, the irradiation region R of the light irradiator 5 in the center portion, and the mounting position PL1 on the one end side, and the light is aligned to the object W. The linearly moving mechanism 6 is reciprocated in the order of the mounting position PL2 on the other end side, the irradiation area R of the light irradiator 5 in the center portion, and the mounting position PL2 on the other end side, and the linear motion mechanism 6 is used to align one light. When the object W passes through the irradiation region R, the other light alignment object W is retracted from the mounting positions PL1 and PL2. Thus, since two workpiece stages 2 are provided, they can be moved by following the movement of a workpiece stage 2. The other workpiece stage 2 is moved, and the processing time of the processing of the light-aligning object W (light alignment irradiation) is shortened.

此外,由於在光照射器5之兩端E1、E2附近位置設置有一對搭載位置PL1、PL2,因此可縮短自搭載位置PL1、PL2至光照射器5之間的距離,從而縮短光配向對象物W之移動時間。其結果,可縮短光配向對象物W之處理(光配向照射)之製程作業時間。此外,由於可縮短自搭載位置PL1、PL2至光照射器5之間的距離,因此可抑制異物附著於照射前之光配向對象物W。此外,由於在光照射器5之兩端E1、E2附近位置設置有一對回收位置PU1、PU2,因此可縮短自光照射器5至回收位置PU1、PU2之間的距離,從而縮短光配向對象物W之移動時間。其結果,可縮短光配向對象物W之處理(光配向照射)之製程作業時間。此外,由於可縮短自光照射器5至回收位置PU1、PU2之間的距離,因此可抑制異物附著於照射後之光配向對象物W。除此之外,由於在光照射器5之兩端E1、E2附近位置設置有一對搭載位置PL1、PL2及一對回收位置PU1、PU2,因此,可縮短機器人裝置260之機器人62之移動距離,從而減小機器人裝置260之專用空間。 Further, since the pair of mounting positions PL1 and PL2 are provided at positions near the both ends E1 and E2 of the light irradiator 5, the distance between the mounting positions PL1 and PL2 and the light irradiator 5 can be shortened, and the light alignment object can be shortened. W's moving time. As a result, the processing time of the processing of the light-aligning object W (optical alignment irradiation) can be shortened. Further, since the distance between the self-mounting positions PL1 and PL2 and the light irradiator 5 can be shortened, it is possible to suppress foreign matter from adhering to the light-aligning object W before the irradiation. Further, since a pair of recovery positions PU1 and PU2 are provided at positions near the both ends E1 and E2 of the light irradiator 5, the distance from the light irradiator 5 to the recovery positions PU1 and PU2 can be shortened, thereby shortening the light alignment object. W's moving time. As a result, the processing time of the processing of the light-aligning object W (optical alignment irradiation) can be shortened. Further, since the distance from the light irradiator 5 to the collection positions PU1 and PU2 can be shortened, it is possible to suppress foreign matter from adhering to the light-aligning object W after the irradiation. In addition, since the pair of mounting positions PL1 and PL2 and the pair of recovery positions PU1 and PU2 are provided at positions near the both ends E1 and E2 of the light irradiator 5, the moving distance of the robot 62 of the robot apparatus 260 can be shortened. Thereby, the dedicated space of the robot device 260 is reduced.

此外,直線運動機構6係構成為於一光配向對象物W通過照射區域R時,使另一光配向對象物W自搭載位置PL1、PL2退避。藉由該構成,則即使使一光配向對象物W移到至完全通過照射區域R,仍可防止一光配向對象物W干涉到另一光配向對象物W,因此可橫跨光配向對象物W之整個面進行光配向。 Further, the linear motion mechanism 6 is configured to evacuate the other light distribution target object W from the mounting positions PL1 and PL2 when the one light-aligning object W passes through the irradiation region R. According to this configuration, even if one light-aligning object W is moved to completely pass through the irradiation region R, it is possible to prevent one light-aligning object W from interfering with another light-aligning object W, and thus it is possible to straddle the light-aligning object. The entire surface of W is optically aligned.

此外,根據本實施形態,構成為於照射另一光配向對象物W後,使另一光配向對象物W自搭載位置PL1、PL2退避。 藉此,相較於照射前退避之情形,可減少照射前之光配向對象物W之移動,因此,可精度更佳地維持已藉由旋轉單元50所調整之光配向對象物W之角度,其結果,可提高光配向精度。再者,於本實施形態中,雖然只有最初載置於第2工件台2B之光配向對象物WB於照射前退避,但對於該光配向對象物WB,也可不使其於照射前退避。於該情形時,於第1工件台2A在去程上之移動時,不將光配向對象物WB載置於第2工件台2B,而於第1工件台2A在去程上之移動中,使第2工件台2B以高速退避至回收位置PU2。然後,使第2工件台2B追隨第1工件台2A在回程上之移動,而移動至搭載位置PL1,並將光配向對象物WB搭載於搭載位置PL1之第2工件台2B上。藉此,也可精度更佳地維持光配向對象物WB之角度,其結果,可提高光配向精度。 Further, according to the present embodiment, after the other light-aligning object W is irradiated, the other light-aligning object W is retracted from the mounting positions PL1 and PL2. With this configuration, the movement of the light-aligning object W before the irradiation can be reduced as compared with the case of the retraction before the irradiation. Therefore, the angle of the light-aligning object W that has been adjusted by the rotation unit 50 can be more accurately maintained. As a result, the optical alignment accuracy can be improved. In the present embodiment, only the light-aligning object WB placed on the second workpiece stage 2B is retracted before the irradiation, but the light-aligning object WB may not be retracted before the irradiation. In this case, when the first workpiece stage 2A moves in the outward movement, the light-aligning object WB is not placed on the second workpiece stage 2B, and during the movement of the first workpiece stage 2A on the way out, The second workpiece stage 2B is evacuated to the recovery position PU2 at a high speed. Then, the second workpiece stage 2B moves to the mounting position PL1 following the movement of the first workpiece stage 2A on the return path, and the light distribution target object WB is mounted on the second workpiece stage 2B of the mounting position PL1. Thereby, the angle of the light-aligning object WB can be maintained with higher precision, and as a result, the light alignment accuracy can be improved.

再者,於本實施形態中,雖然將退避位置PT1、PT2設於搭載位置PL1、PL2之直線運動方向X外側,但退避位置PT1、PT2只要位於不干涉搭載位置PL1、PL2之位置,即不侷限於此。退避位置PT1、PT2例如也可設置於搭載位置PL1、PL2之上方、下方或側面(例如,圖14之紙面上側)。 In the present embodiment, the retracted positions PT1 and PT2 are disposed outside the linear motion direction X of the mounting positions PL1 and PL2, but the retracted positions PT1 and PT2 are located at positions that do not interfere with the mounting positions PL1 and PL2, that is, Limited to this. The retracted positions PT1 and PT2 may be provided, for example, above, below, or on the side of the mounting positions PL1 and PL2 (for example, on the side of the paper on FIG. 14).

惟,上述實施形態為本發明之一態樣,只要在不超出本發明主旨之範圍內,當然可適宜地進行變更。例如,於上述實施形態中,雖設置有支撐光配向對象物W之工件台2,但支撐光配向對象物W之支撐構件,並不限定於工件台2,例如,也可為支撐光配向對象物W之下表面或側面等之銷等。 However, the above-described embodiments are an aspect of the present invention, and may be appropriately changed as long as they do not depart from the gist of the present invention. For example, in the above-described embodiment, the workpiece stage 2 that supports the light-aligning object W is provided, but the supporting member that supports the light-aligning object W is not limited to the workpiece stage 2, and may be, for example, a supporting light-aligning object. A pin or the like on the surface or the side below the object W.

此外,於上述實施形態中,雖然於去程及回程雙方進行光配向照射,但也可僅於去程或回程中之一者進行光配向照射。 Further, in the above embodiment, the light alignment irradiation is performed on both the forward and the return paths, but the light alignment irradiation may be performed only in one of the forward or the return.

此外,於上述實施形態中,雖然已以燈管8作為光源進行說明,但並不侷限於此,光源也可為LED或有機EL等之發光元件。於該情形時,只要藉由將複數個發光元件排列於直線上,而構成長軸(軸線)L即可。此外,光源所放射之光,也不限定於紫外線。 Further, in the above embodiment, the lamp tube 8 has been described as a light source. However, the present invention is not limited thereto, and the light source may be a light-emitting element such as an LED or an organic EL. In this case, the long axis (axis) L may be formed by arranging a plurality of light-emitting elements on a straight line. Further, the light emitted by the light source is not limited to ultraviolet rays.

此外,於上述實施形態中,雖然以複數個線柵偏光板16構成偏光板單元10,但線柵偏光板16也可為1個。此外,於上述實施形態中,作為偏光板,雖然使用線柵偏光板16,但偏光板例如也可為使用蒸鍍膜之偏光板。 Further, in the above-described embodiment, the polarizing plate unit 10 is constituted by a plurality of wire grid polarizing plates 16, but the number of the wire grid polarizing plates 16 may be one. Further, in the above embodiment, the wire grid polarizing plate 16 is used as the polarizing plate, but the polarizing plate may be, for example, a polarizing plate using a vapor deposition film.

此外,於上述實施形態中,雖然相對於搭載位置PL1、PL2設置有1個下游側機器人裝置60、260,但也可於搭載位置PL1、PL2分別設置下游側機器人裝置60、260。 Further, in the above-described embodiment, one downstream robot apparatus 60 and 260 is provided for each of the mounting positions PL1 and PL2, but the downstream robot devices 60 and 260 may be provided at the mounting positions PL1 and PL2, respectively.

1‧‧‧光配向裝置 1‧‧‧Light alignment device

2‧‧‧工件台 2‧‧‧Workpiece table

2A‧‧‧第1工件台 2A‧‧‧1st workpiece stage

2B‧‧‧第2工件台 2B‧‧‧2nd workpiece stage

3‧‧‧台搬送架 3‧‧‧Transport rack

4‧‧‧照射器設置架 4‧‧‧ illuminator setting

5‧‧‧光照射器 5‧‧‧Light illuminator

6‧‧‧直線運動機構(往返機構) 6‧‧‧Linear motion mechanism (round-trip mechanism)

8‧‧‧燈管(光源) 8‧‧‧Light tube (light source)

18‧‧‧測量單元 18‧‧‧Measurement unit

20‧‧‧搬入搬出裝置 20‧‧‧Moving and unloading devices

21‧‧‧本體 21‧‧‧ body

22‧‧‧載置台 22‧‧‧ mounting table

30‧‧‧上游側機器人裝置 30‧‧‧Upstream side robot

31‧‧‧平面板 31‧‧‧flat board

32‧‧‧機器人 32‧‧‧ Robot

32A‧‧‧機械臂 32A‧‧ mechanical arm

32B‧‧‧保持部 32B‧‧‧ Keeping Department

32B1 32B1

33‧‧‧往返驅動機構 33‧‧‧Reciprocating drive mechanism

40‧‧‧清潔器 40‧‧‧cleaner

41‧‧‧平面板 41‧‧‧flat board

42‧‧‧清潔單元 42‧‧‧ cleaning unit

43‧‧‧移動機構 43‧‧‧Mobile agencies

50‧‧‧旋轉單元(角度調整裝置) 50‧‧‧Rotating unit (angle adjustment device)

51‧‧‧調整台 51‧‧‧ adjustment station

60‧‧‧下游側機器人裝置 60‧‧‧Downstream robot

61‧‧‧平面板 61‧‧‧flat board

62‧‧‧機器人 62‧‧‧ Robot

62A‧‧‧機械臂 62A‧‧‧ Robotic arm

62B‧‧‧保持部 62B‧‧‧ Keeping Department

62B1‧‧‧保持桿 62B1‧‧‧Holding rod

63‧‧‧往返驅動機構 63‧‧‧Reciprocating drive mechanism

70‧‧‧控制裝置(控制部) 70‧‧‧Control device (control department)

71‧‧‧記憶部 71‧‧‧Memory Department

72‧‧‧執行部 72‧‧‧Executive Department

100‧‧‧光配向系統 100‧‧‧Light Alignment System

E1‧‧‧一端 E1‧‧‧ end

E2‧‧‧另一端 E2‧‧‧The other end

L‧‧‧長軸 L‧‧‧ long axis

PL1‧‧‧搭載位置 PL1‧‧‧ carrying position

PL2‧‧‧搭載位置 PL2‧‧‧ carrying position

PU1‧‧‧回收位置 PU1‧‧‧Recycling location

PU2‧‧‧回收位置 PU2‧‧‧Recycling location

R‧‧‧照射區域 R‧‧‧illuminated area

S1‧‧‧空間 S1‧‧‧ space

S2‧‧‧空間 S2‧‧‧ space

W‧‧‧光配向對象物(工件) W‧‧‧Light alignment object (workpiece)

WA‧‧‧光配向對象物(工件) WA‧‧‧Light alignment object (workpiece)

WB‧‧‧光配向對象物(工件) WB‧‧‧Light alignment object (workpiece)

WC‧‧‧光配向對象物(工件) WC‧‧‧Light alignment object (workpiece)

WD‧‧‧光配向對象物(工件) WD‧‧‧Light alignment object (workpiece)

X‧‧‧直線運動方向 X‧‧‧Directional direction

Claims (10)

一種光配向裝置,其特徵在於:設置有兩個支持構件,各支持構件分別支持工件,將自支持構件回收工件之一對回收位置設置於兩端部,於中央部設置有光照射器,並於回收位置與光照射器之間且光照射器之兩端附近位置設置有於支持構件搭載工件之一對搭載位置,以追隨搭載於一搭載位置之一工件的移動之方式,而移動搭載於另一搭載位置之另一工件。 A light alignment device, characterized in that: two supporting members are provided, each supporting member respectively supports a workpiece, and one of the self-supporting members is collected and the recovery position is set at both ends, and a light illuminator is disposed at the central portion, and Between the collection position and the light illuminator and at a position near the both ends of the light illuminator, one of the support member-mounted workpieces is mounted on the mounting position, and is moved in accordance with the movement of the workpiece mounted on one of the mounting positions. Another workpiece with another position. 如請求項1之光配向裝置,其中,其具備有搬送機構,該搬送機構係使工件以一端部側之搭載位置、中央部之光照射器之照射區域、一端部側之回收位置之順序進行往返,並且使工件以另一端部側之搭載位置、中央部之光照射器之照射區域、另一端部側之回收位置之順序進行往返,上述搬送機構係於一工件通過照射區域時,使另一工件自搭載位置退避。 The optical alignment device of claim 1, further comprising: a transport mechanism that sequentially performs a workpiece at a mounting position on one end side, an irradiation region in a central portion of the light irradiator, and a storage position on one end side The workpiece is reciprocated in the order of the mounting position on the other end side, the irradiation area of the light irradiator in the center portion, and the collection position on the other end side. The transport mechanism is used when the workpiece passes through the irradiation area. A workpiece is retracted from the mounting position. 如請求項1或2之光配向裝置,其中,其具備有將工件搭載於搭載位置之機器人裝置,上述機器人裝置係構成為可保持2個工件。 The optical alignment device according to claim 1 or 2, further comprising: a robot apparatus for mounting the workpiece on the mounting position, wherein the robot apparatus is configured to hold two workpieces. 如請求項2之光配向裝置,其中,上述搬送機構係構成為可於工件通過照射區域之前後變更工件之移動速度。 The optical alignment device of claim 2, wherein the transport mechanism is configured to change a moving speed of the workpiece before the workpiece passes through the irradiation region. 如請求項2之光配向裝置,其中,於對上述另一工件照射後,使上述另一工件自搭載位置退避。 The optical alignment device of claim 2, wherein the another workpiece is retracted from the mounting position after the other workpiece is irradiated. 一種光配向裝置,其特徵在於:設置有兩個支持構件,各支持構件分別支持工件, 於中央部設置有光照射器,於光照射器之兩端附近位置設置有於支持構件搭載工件之一對搭載位置,且具備有搬送機構,該搬送機構係使工件以一端部側之搭載位置、中央部之光照射器之照射區域、一端部側之搭載位置之順序進行往返,並且使工件以另一端部側之搭載位置、中央部之光照射器之照射區域、另一端部側之搭載位置之順序進行往返,上述搬送機構係以追隨搭載於一搭載位置之一工件的移動之方式,而移動搭載於另一搭載位置之另一工件,於一工件通過照射區域時,使另一工件自搭載位置退避。 A light alignment device, characterized in that: two support members are provided, and each support member supports a workpiece, A light illuminator is provided at a central portion, and one of the support member-mounted workpieces is mounted at a position near the both ends of the light illuminator, and a transport mechanism is provided. The transport mechanism is a mounting position on the one end side of the workpiece. The irradiation area of the light irradiator in the center and the mounting position on the one end side are reciprocated, and the workpiece is mounted on the other end side, the irradiation area of the light irradiator in the center, and the other end side. The position of the position is reciprocated, and the transport mechanism moves another workpiece mounted on the other mounting position so as to follow the movement of the workpiece mounted on one of the mounting positions, and causes another workpiece when the workpiece passes through the irradiation region. Retreat from the mounting position. 如請求項6之光配向裝置,其中,其具備有將工件搭載於搭載位置之機器人裝置,上述機器人裝置係構成為可保持2個工件。 The optical alignment device of claim 6, further comprising: a robot apparatus for mounting the workpiece on the mounting position, wherein the robot apparatus is configured to hold two workpieces. 如請求項6之光配向裝置,其中,上述搬送機構係構成為可於工件通過照射區域之前後變更工件之移動速度。 The optical alignment device of claim 6, wherein the transport mechanism is configured to change a moving speed of the workpiece before the workpiece passes through the irradiation region. 如請求項6至8中任一項之光配向裝置,其中,於對上述另一工件照射後,使上述另一工件自搭載位置退避。 The optical alignment device according to any one of claims 6 to 8, wherein the another workpiece is retracted from the mounting position after the other workpiece is irradiated. 如請求項6至8中任一項之光配向裝置,其中,搭載位置兼作為自支持構件回收工件之回收位置。 The optical alignment device according to any one of claims 6 to 8, wherein the mounting position also serves as a recovery position for recovering the workpiece from the self-supporting member.
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