JP6459580B2 - Polarized light irradiation device for photo-alignment - Google Patents

Description

  Embodiments described herein relate generally to a polarized light irradiation apparatus for photo-alignment.

  In a manufacturing process of a liquid crystal panel or the like, an alignment process of an object such as an alignment film of a liquid crystal panel or an alignment layer of a viewing angle compensation film is performed. In the alignment treatment, there is known a polarized light irradiation apparatus for photo-alignment that is used to perform so-called photo-alignment, in which alignment is performed by irradiating polarized light with a predetermined wavelength to an alignment film.

  As this type of polarized light irradiation device for photo-alignment, for example, an irradiation unit that irradiates polarized light, a stage on which a substrate on which an alignment film is formed, and a stage that passes through an irradiation area of the irradiation unit. And a transport mechanism that transports the stage.

  Further, as an apparatus similar to the above-described polarized light irradiation apparatus for photo-alignment, the first and second stages on which the substrate is mounted pass through the exposure unit that exposes the substrate. An exposure apparatus that conveys two stages is known.

JP 2008-191302 A

  By the way, the object such as a liquid crystal panel tends to increase in size, and accordingly, the irradiation time for the object in the polarized light irradiation device for photo-alignment increases. For this reason, there is a problem that the processing time per one object (hereinafter referred to as tact time) becomes long and the productivity is lowered. Further, there is a problem that the polarized light irradiation device for photo-alignment is increased with the increase in size of the object.

  Accordingly, an object of the present invention is to provide a polarized light irradiation apparatus for photo-alignment that can suppress an increase in tact time and an increase in installation space of the entire apparatus.

  The polarized light irradiation apparatus for photo-alignment according to the embodiment includes an irradiation unit having an irradiation area for irradiating an object with polarized light, and a set in which each mounting position for mounting the object is arranged on both sides of the irradiation area. The stage and a transport path that connects the mounting positions through the irradiation region, and the one position is between the mounting position and a passing position where the stage passes through the irradiation region and is adjacent to the irradiation region. A transport mechanism that alternately reciprocates a set of stages along the transport path, and at least one stage of the set of stages positioned at the mounting position, when the other stage is transported to the passing position. A retraction mechanism that moves the retraction mechanism to a retreat position that is distant from the pass position, and includes a small number of the at least one stage located at the mounting position and the other stage located at the pass position. Ku and also to partially, so as to overlap on the same plane, the mounting position is located with respect to the passing position.

  According to the present invention, it is possible to improve the productivity by suppressing an increase in tact time and to suppress an increase in the installation space of the entire apparatus.

FIG. 1 is a side view schematically showing a polarized light irradiation apparatus for photo-alignment according to the first embodiment. FIG. 2 is a plan view schematically showing the polarized light irradiation apparatus for photo-alignment according to the first embodiment. FIG. 3 is a plan view schematically showing a polarized light irradiation apparatus for photo-alignment according to a modified example of the first embodiment. FIG. 4 is a plan view schematically showing a polarized light irradiation apparatus for photo-alignment according to a modified example of the first embodiment. FIG. 5 is a side view schematically showing a polarized light irradiation apparatus for photo-alignment according to the second embodiment. FIG. 6 is a plan view schematically showing a polarized light irradiation apparatus for photo-alignment according to the second embodiment. FIG. 7 is a side view schematically showing a polarized light irradiation apparatus for photo-alignment according to the third embodiment. FIG. 8 is a plan view schematically showing a polarized light irradiation apparatus for photo-alignment according to the fourth embodiment.

  A polarized light irradiation apparatus for photo-alignment (hereinafter referred to as a polarized light irradiation apparatus) 1 according to an embodiment described below includes an irradiation unit 10, a pair of first and second stages 11 and 12, and a conveyance. A mechanism 15 and a retracting mechanism 17 are provided. The irradiation unit 10 has an irradiation area A that irradiates the object with polarized light. In the set of first and second stages 11 and 12, the mounting positions P <b> 1 a and P <b> 1 b on which the object is mounted are arranged on both sides of the irradiation area A. The transport mechanism 15 has a transport path 16 that connects the mounting positions P1a and P1b through the irradiation region A. Further, the transport mechanism 15 includes a pair of first and second positions between the mounting positions P1a and P1b and the passing positions P2a and P2b adjacent to the irradiation area A through which the stages 11 and 12 pass the irradiation area A. The stages 11 and 12 are reciprocated along the conveyance path 16 alternately. The retraction mechanism 17 includes at least one stage 11 (12) of the pair of first and second stages 11 and 12 positioned at the mounting position P1a (P1b), and the other stage 12 (11) passes through the position P2b. When transported to (P2a), it is moved to a retracted position P3a (P3b) that is distant from the passing position P2b (P2a). At least one stage 11 (12) positioned at the mounting position P1a (P1b) and at least a part of the other stage 12 (11) positioned at the passing position P2b (P2a) are overlapped on the same plane. The mounting position P1a (P1b) is arranged with respect to the passing position P2b (P2a).

  Further, in at least one stage 11 (12) according to the embodiment described below, the retracted position P3a (P3b) is located on the same plane as the mounting position P1a (P1b).

  In addition, in at least one stage 11 (12) according to the embodiment described below, the retracted position P3a (P3b) is located on a different plane from the mounting position P1a (P1b).

  Further, when at least one stage 11 (12) according to the embodiment described below is located at the mounting position P1a (P1b) on the same plane, the other stage 12 located at the passing position P2b (P2a). (11) The mounting position P1a (P1b) is arranged with respect to the passage position P2b (P2a) so as to overlap the whole.

  Further, the retracting mechanism 17 according to the embodiment described below is configured to retract at least one of the stages 11 (12) along the same direction as the transport direction in which the one stage 11 (12) is reciprocally transported. ).

  Hereinafter, a polarized light irradiation apparatus according to an embodiment will be described with reference to the drawings.

(First embodiment)
FIG. 1 is a side view schematically showing a polarized light irradiation apparatus according to the first embodiment. FIG. 2 is a plan view schematically showing the polarized light irradiation apparatus according to the first embodiment. The polarized light irradiation apparatus according to the present embodiment is used for photoalignment, for example, by irradiating polarized light such as linearly polarized light onto an alignment film that is an object. The polarized light irradiation apparatus according to the present embodiment is used for manufacturing, for example, an alignment film of a liquid crystal panel and an alignment film of a viewing angle compensation film.

(Configuration of polarized light irradiation device)
As shown in FIG. 1, the polarized light irradiation apparatus 1 according to the first embodiment includes an irradiation unit 10, a pair of first and second stages 11 and 12, a transport mechanism 15, a retracting mechanism 17, Is provided.

  The irradiation unit 10 has an irradiation region A for irradiating polarized light onto a substrate 9 (hereinafter simply referred to as a substrate 9) on which an alignment film as an object is formed. Further, the irradiation unit 10 includes a tubular light source 10a that emits light including ultraviolet rays, and a reflector 10b that controls the orientation of the light emitted from the light source 10a. Further, the irradiation unit 10 includes a polarizing element (not shown) that emits polarized light when light emitted from the light source 10a and light whose orientation is controlled by the reflecting plate 10b are incident.

  Here, the “irradiation area A” refers to an opening on the lowermost surface of the irradiation unit 10, that is, an opening at a position closest to the object in the irradiation unit 10. For example, if the lowermost surface of the irradiation unit 10 is a polarizing element, the opening of the polarizing element corresponds to the irradiation region A, and if there is a light shielding plate (not shown) closer to the object side than the polarizing element, the opening of the light shielding plate is irradiated. Corresponds to region A. Furthermore, if the light shielding plate has a protective glass (not shown), the opening of the protective glass corresponds to the irradiation region A.

  The light source 10a is, for example, a high-pressure mercury lamp in which a rare gas such as mercury, argon, or xenon is enclosed in an ultraviolet light transmissive glass tube, or a metal halide lamp in which a metal halide such as iron or iodine is further enclosed in the high-pressure mercury lamp. Tube-type lamps are used and have a linear light-emitting portion. In the light source 10 a, the longitudinal direction of the light emitting unit is orthogonal to the transport direction of the stages 11 and 12 with respect to the irradiation unit 10, and the length of the light emitting unit is longer than the length of one side of the substrate 9. The light source 10a can emit light including ultraviolet rays having a wavelength of 200 nm to 400 nm, for example, from a linear light emitting unit. The light emitted from the light source 10a is so-called non-polarized light having various polarization axis components.

  The reflection plate 10b has a reflection surface that reflects light emitted from the light source 10a on a surface facing the light source 10a, and the reflection surface is formed in a shape that forms part of an ellipse. Thereby, the reflecting plate 10b is configured as a so-called condensing type reflecting plate that collects the light emitted from the light source 10a. The polarizing element is capable of extracting light having a polarization axis oscillated only in the reference direction from light including various polarization axis components emitted from the light source 10a and uniformly oscillating in all directions. Note that light having a polarization axis that vibrates only in the reference direction is generally referred to as linearly polarized light. The polarization axis is the vibration direction of the electric field and magnetic field of light.

  The pair of first and second stages 11 and 12 are formed in a rectangular plate shape, and a substrate 9 on which an alignment film is formed is mounted. The first and second stages 11 and 12 are movably supported by the transport mechanism 15.

  As shown in FIGS. 1 and 2, the first and second mounting positions P1a and P1b for mounting the substrate 9 on the first and second stages 11 and 12 are arranged on both sides of the irradiation region A. . The transport mechanism 15 includes a transport path 16 that connects the first and second mounting positions P1a and P1b through the irradiation region A. The transport mechanism 15 includes a guide shaft 15a that movably supports the first and second stages 11 and 12, and a drive mechanism (not shown) that moves the first and second stages 11 and 12 along the guide shaft 15a. ) And. The guide shaft 15 a constitutes a linear conveyance path 16. Further, the transport mechanism 15 includes the first and second mounting positions P1a and P1b, and the first and second stages 11 and 12 passing through the irradiation region A and passing through the irradiation region A. The first and second stages 11 and 12 are alternately reciprocated along the transport path 16 with the P2b.

  Further, as shown in FIG. 1, the retracting mechanism 17 is disposed adjacent to the first and second mounting positions P1a and P1b, and a so-called industrial robot is used. The retraction mechanism 17 has an arm 17a for transporting the stages 11 and 12 in the horizontal direction. The retreat mechanism 17 is a set of first sets located at the first and second mounting positions P1a, P1b when the set of first and second stages 11, 12 are transported to the passing positions P2a, P2b. Then, the second stages 11 and 12 are moved to the retracted positions P3a and P3b apart from the passing positions P2a and P2b.

  As shown in FIG. 2, the first stage 11 located at the first mounting position P1a and the part of the second stage 12 located at the passing position P2b overlap on the same plane. Similarly, the second stage 12 positioned at the second mounting position P1b and a part of the first stage 11 positioned at the passing position P2a overlap on the same plane. With such a positional relationship, the mounting positions P1a (P1b) of the first and second stages 11 and 12 are arranged with respect to the passing position P2b (P2a).

  In the present embodiment, the first stage 11 located at the first mounting position P1a overlaps one end portion in the transport direction of the second stage 12 located at the passing position P2b on the horizontal plane. In addition, the second stage 12 positioned at the second mounting position P1b overlaps one end portion in the transport direction of the first stage 11 positioned at the passing position P2a on the horizontal plane. That is, the first mounting position P1a on the first stage 11 is arranged close to the passing position P2b on the second stage 12, and the second mounting position P1b on the second stage 12 is The stage 11 is disposed close to the passing position P2a.

  In other words, on the plane, it means that the space between each stage 11, 12 located at the mounting positions P1a, P1b and the irradiation unit 10 is smaller than the space occupied by one stage 11 (12). With this configuration, the transport distances of the stages 11 and 12 that reciprocate with respect to the irradiation unit 10 are shortened, and an increase in tact time is suppressed and an increase in installation space is suppressed.

  The one where the stage 11 (12) positioned at the mounting position P1a (P1b) and the other stage 12 (11) positioned at the passing position P2b (P2a) overlap is larger in the mounting position P1a (P1b). The conveyance distance to the irradiation area A is shortened. For this reason, it is preferable from the viewpoint of suppressing an increase in tact time and suppressing an increase in installation space. On the other hand, the stage 11 (12 has a smaller area where one stage 11 (12) located at the mounting position P1a (P1b) and the other stage 12 (11) located at the passing position P2b (P2a) overlap. ) Takes less time to retreat from the mounting position P1a (P1b). For this reason, the stage 11 (12) can be easily retracted. However, in this case, since the transport distance between the mounting position P1a (P1b) and the irradiation area A becomes long, the effect obtained is small from the viewpoint of suppressing an increase in tact time and suppressing an increase in installation space. Become. Therefore, in the region where one stage 11 (12) located at the mounting position P1a (P1b) and the other stage 12 (11) located at the passing position P2b (P2a) overlap, the stage 11 (12) is located at the mounting position. It is set as appropriate according to the speed of retreating from P1a (P1b).

  In the present embodiment, the transport mechanism 15 and the retracting mechanism 17 are configured as independent mechanisms. However, the transport mechanism 15 may be configured to also serve as the retracting mechanism. In this case, the transport mechanism reciprocates the stages 11 and 12 and reciprocates the stages 11 (12) between the mounting positions P1a and P1b and the retreat positions P3a and P3b.

(Operation of each stage during irradiation with polarized light)
Regarding the polarized light irradiation apparatus 1 configured as described above, an operation of conveying the first and second stages 11 and 12 to the irradiation unit 10 and irradiating the substrate 9 with polarized light will be described.

  First, the substrate 9 is mounted on the first stage 11 located at the first mounting position P1a. Subsequently, the first stage 11 is transported toward the irradiation unit 10 by the transport mechanism 15 and is transported to the passing position P2a through the irradiation region A. Next, the first stage 11 is transported from the passing position P2a toward the first mounting position P1a, passes through the passing position P2a that has passed through the irradiation region A, and returns to the first mounting position P1a. As described above, the alignment film of the substrate 9 on the first stage 11 is irradiated with a predetermined amount of polarized light by reciprocating the irradiation region A, and desired optical alignment is performed.

  On the other hand, when the first stage 11 is being transported by the transport mechanism 15, the substrate 9 is mounted on the second stage 12 located at the second mounting position P1b. When the first stage 11 is transported toward the first mounting position P1a, the second stage 12 is transported toward the irradiation unit 10 by the transport mechanism 15 at a predetermined timing, and passes through the irradiation area A. Passed and transported to the passing position P2b.

  Thus, the transport mechanism 15 alternately reciprocates the first and second stages 11 and 12 to irradiate the alignment film of the substrate 9 on the first stage 11 with polarized light, The operation of irradiating the alignment film of the substrate 9 on the second stage 12 with the polarized light is continuously performed. As a result, it is possible to mount the substrate 9 on the other stage 12 (11) and remove the substrate 9 while transporting one stage 11 (12). The increase in length is suppressed.

  The passing position P2b in the second stage 12 corresponds to the irradiation start position and the irradiation end position in the first stage 11. Similarly, the passing position P2a in the first stage 11 corresponds to the irradiation start position and the irradiation end position in the second stage 12.

  The first stage 11 located at the first mounting position P1a is retracted from the first mounting position P1a to the retracted position P3a by the retracting mechanism 17 when the second stage 12 is transported to the passing position P2b. Let Subsequently, after the second stage 12 is transported toward the second mounting position P1b, the first stage 11 is returned from the retracted position P3a to the first mounting position P1a by the retracting mechanism 17. Thus, the first stage 11 can avoid interference with the second stage 12 that is reciprocally conveyed between the second mounting position P1b and the passing position P2b.

  Similarly, the second stage 12 positioned at the second mounting position P1b is moved from the second mounting position P1b to the retracted position P3b by the retracting mechanism 17 when the first stage 11 is transported to the passing position P2a. Evacuate. Subsequently, after the first stage 11 is transported toward the first mounting position P1a, the second stage 12 is returned from the retracted position P3b to the second mounting position P1b by the retracting mechanism 17.

  Note that the movement of returning from the retracted positions P3a and P3b to the mounting positions P1a and P1b and the movement of reciprocating from the mounting positions P1a and P1b to the irradiation area A temporarily stops the stages 11 and 12 at the mounting positions P1a and P1b. It may be controlled to make a continuous transition without any change.

  As described above, in the present embodiment, the first stage 11 positioned at the first mounting position P1a is positioned at the passing position P2b so as to overlap the second stage 12 positioned at the passing position P2b on the same plane. On the other hand, the first mounting position P1a is approached. Similarly, the second stage 12 positioned at the second mounting position P1b has a first mounting position relative to the passing position P2a so as to overlap the first stage 11 positioned at the passing position P2a on the same plane. P1b is approached. As a result, since the transport distance of the first and second stages 11 and 12 that reciprocate with respect to the irradiation area A is shortened, an increase in tact time is suppressed.

(Effects of the first embodiment)
In the first embodiment, a transport mechanism 15 that reciprocates the stages 11 and 12 along the transport path 16 alternately between the mounting positions P1a and P1b and the passing positions P2a and P2b, and the passing positions P2a and P2b. And a retracting mechanism 17 that moves to the retracted positions P3a and P3b. The passing position so that one stage 11 (12) located at the mounting position P1a (P1b) and a part of the other stage 12 (11) located at the passing position P2b (P2a) overlap on the same plane. The mounting position P1a (P1b) is arranged with respect to P2b (P2a). Thereby, the conveyance distance of each stage 11 and 12 which reciprocates with respect to the irradiation unit 10 can be shortened. As a result, an increase in tact time can be suppressed, and an increase in installation space of the entire apparatus can be suppressed.

  Further, in the first and second stages 11 and 12 in the first embodiment, the retracted positions P3a and P3b are located on the same plane as the mounting positions P1a and P1b. As a result, the transport mechanism 15 can be simplified, and the displacement of the substrate 9 on the first and second stages 11 and 12 can be suppressed.

  In the present embodiment, both the first and second stages 11 and 12 are arranged so that the first and second mounting positions P1a and P1b overlap with the passing positions P2a and P2b. It is not limited to. As necessary for the installation space and the control of the transfer operation, at least one of the first and second stages 11 and 12 is arranged so that the stage located at the mounting position and the stage located at the passing position overlap. Thus, it is possible to obtain an effect of suppressing the increase in the tact time described above and suppressing an increase in the installation space of the entire apparatus.

  Further, the retraction mechanism 17 in the first embodiment moves to the retraction positions P3a and P3b along the same direction as the conveyance direction in which the first and second stages 11 and 12 are reciprocally conveyed. As a result, the first and second stages 11 and 12 can smoothly shift from the retracted positions P3a and P3b to the transport operation, the operation reliability is improved, and the increase in tact time is suppressed. it can.

  Moreover, in this embodiment, the area | region between the irradiation area | region A and each stage 11 and 12 located in mounting position P1a, P1b is made smaller than the magnitude | size of the mounting surface of one stage 11 (12). . For this reason, the conveyance distance of each stage 11 and 12 is shortened, and the increase in tact time can be suppressed.

  In the first embodiment, the first and second stages 11 and 12 positioned at the first and second mounting positions P1a and P1b are transported in the transport direction (conveyance of the first and second stages 11 and 12). The present invention is not limited to this configuration, which is configured to move to the retreat positions P3a and P3b along the path 16). For example, the first and second stages 11 and 12 positioned at the first and second mounting positions P1a and P1b are replaced with the first and second stages 11, 12 may be configured to retreat in a direction intersecting with the 12 conveying directions, that is, left and right in FIG.

  Hereinafter, a polarized light irradiation apparatus according to another embodiment will be described with reference to the drawings. In other embodiments, the same components as those of the first embodiment are denoted by the same reference numerals as those of the first embodiment, and the description thereof is omitted.

(Modification 1 of the first embodiment)
FIG. 3 is a plan view schematically showing a polarized light irradiation apparatus according to the first modification of the first embodiment. In the first modification of the first embodiment, the arrangement of the mounting positions P1a and P1b with respect to the passing positions P2a and P2b and the direction in which the first and second stages 11 and 12 retract from the mounting positions P1a and P1b are the first. Different from the embodiment.

  As shown in FIG. 3, the polarized light irradiation apparatus 2 according to the modification of the first embodiment includes the first and second stages 11 and 12 between the mounting positions P1a and P1b and the passing positions P2a and P2b. A transport mechanism 25 that alternately reciprocates along the transport path 26 is provided. As shown in FIG. 3, the conveyance path 26 forms an angle of, for example, about 45 degrees in a direction in which both ends in the longitudinal direction intersect on the same plane with respect to the direction connecting the passage positions P2a and P2b. Is bent. Further, both end portions of the conveyance path 26 are bent in the same direction with respect to a straight line connecting the passage positions P2a and P2b. The conveyance path 26 is configured along the guide shaft 25 a of the conveyance mechanism 25.

  The first stage 11 positioned at the first mounting position P1a is first with respect to the passing position P2b so as to overlap the corner of the second stage 12 positioned at the passing position P2b on the same plane. Mounting position P1a is arranged. Similarly, the second stage 12 positioned at the second mounting position P1b is positioned relative to the passing position P2a so as to overlap the corner of the first stage 11 positioned at the passing position P2a on the same plane. The second mounting position P1b is arranged. Thereby, the conveyance distance of each stage 11 and 12 which reciprocates with respect to the irradiation unit 10 is shortened.

(Effects of Modification 1 of First Embodiment)
Also in the first modification of the first embodiment, as in the first embodiment, the transport distance of the stages 11 and 12 can be shortened. The effect which suppresses the increase in is acquired.

(Modification 2 of the first embodiment)
FIG. 4 is a plan view schematically showing a polarized light irradiation apparatus according to the second modification of the first embodiment. In the second modification of the first embodiment, the arrangement of the mounting positions P1a and P1b with respect to the passing positions P2a and P2b and the direction in which the first and second stages 11 and 12 retract from the mounting positions P1a and P1b are the first. Different from the embodiment.

  As shown in FIG. 4, the polarized light irradiation apparatus 3 according to the second modification of the first embodiment includes the first and second stages 11 and 12 between the mounting positions P1a and P1b and the passing positions P2a and P2b. Is provided with a transport mechanism 35 that alternately reciprocates along the transport path 36. As shown in FIG. 4, the conveyance path 36 is bent at both ends in the longitudinal direction in a direction orthogonal to the direction connecting the passage positions P2a and P2b on the same plane. Further, both end portions of the conveyance path 36 are bent in the same direction with respect to a straight line connecting the passage positions P2a and P2b. The conveyance path 36 is configured along the guide shaft 35 a of the conveyance mechanism 35.

  The first stage 11 located at the first mounting position P1a is first with respect to the passage position P2b so as to overlap the end of the second stage 12 located at the passage position P2b on the same plane. Mounting position P1a is arranged. Similarly, the second stage 12 positioned at the second mounting position P1b is positioned relative to the passing position P2a so as to overlap the end of the first stage 11 positioned at the passing position P2a on the same plane. The second mounting position P1b is arranged. Thereby, the conveyance distance of each stage 11 and 12 which reciprocates with respect to the irradiation unit 10 is shortened.

(Effects of Modification 2 of First Embodiment)
Also in the second modification of the first embodiment, as in the first embodiment, it is possible to reduce the transport distance of the stages 11 and 12, thereby suppressing increase in tact time and installation space. The effect which suppresses the increase in is acquired.

(Second Embodiment)
FIG. 5 is a side view schematically showing a polarized light irradiation apparatus according to the second embodiment. FIG. 6 is a plan view schematically showing a polarized light irradiation apparatus according to the fourth embodiment. The second embodiment is different from the first embodiment in that the stages 11 and 12 positioned at the mounting positions P1a and P1b overlap the stages 11 and 12 positioned at the passing positions P2a and P2b. . The second embodiment is different from the first embodiment in that the first and second stages 11 and 12 are retracted from the mounting positions P1a and P1b in the vertical direction.

  As shown in FIGS. 5 and 6, the polarized light irradiation device 4 of the second embodiment includes the first and second stages 11 and 12 between the mounting positions P1a and P1b and the passing positions P2a and P2b. A transport mechanism 45 that reciprocates along the transport path 46 is provided. As shown in FIG. 5, the conveyance path 46 includes a guide rail 45 a that conveys the first and second stages 11 and 12. Both ends of the guide rail 45a are curved upward and extend from the mounting positions P1a and P1b to the retracted positions P3a and P3b. Further, as shown in FIG. 6, the conveyance path 46 is configured in a straight line along the guide rail 45 a when viewed from the direction facing the mounting surface of the stages 11 and 12.

  And in the polarized light irradiation apparatus 4 of 2nd Embodiment, while the 1st stage 11 located in the 1st mounting position P1a is moved to the retracted position P3a by the conveyance mechanism 45, it is moved to the 2nd mounting position P1b. The positioned second stage 12 is moved to the retracted position P3b. Further, the transport mechanism 45 returns the first stage 11 located at the retracted position P3a to the first mounting position P1a, and returns the second stage 12 located at the retracted position P3b to the second mounting position P1b. Therefore, in the present embodiment, the transport mechanism 45 that reciprocates the stages 11 and 12 also serves as a retreat mechanism that retreats the stages 11 and 12 from the mounting positions P1a and P1b to the retreat positions P3a and P3b.

  In addition, the first stage 11 positioned at the first mounting position P1a is first mounted on the passing position P2b so as to overlap the entire second stage 12 positioned at the passing position P2b on the same plane. Position P1a is arranged. Similarly, the second stage 12 located at the second mounting position P1b is second relative to the passage position P2a so as to overlap the entire first stage 11 located at the passage position P2a on the same plane. Mounting position P1b is arranged. Thereby, the conveyance distance of each stage 11 and 12 which reciprocates with respect to the irradiation unit 10 is further shortened.

(Effect of 2nd Embodiment)
In the second embodiment, the stages 11 and 12 positioned at the mounting positions P1a and P1b are overlapped with the entire stages 11 and 12 positioned at the passing positions P2a and P2b. Therefore, the second embodiment is compared with the first to third embodiments. Thus, the transport distance of each stage 11 and 12 is further shortened. As a result, further increase in tact time can be suppressed, and further increase in installation space can be suppressed.

  Further, the retracted positions P3a and P3b of the first and second stages 11 and 12 in the second embodiment are located on a different plane from the mounting positions P1a and P1b. Thereby, it is preferable when it is difficult to ensure the installation space with respect to the horizontal direction, and it becomes possible to suppress an increase in the installation space with respect to the horizontal direction of the installation surface.

  In the second embodiment, the stages 11 and 12 are retracted upward from the mounting positions P1a and P1b. However, the stages 11 and 12 are downwardly moved from the mounting positions P1a and P1b. It may be configured to evacuate.

  Further, as necessary, in the second embodiment, the mounting positions P1a and P1b of the first and second stages 11 and 12 are the same positions as the retracted positions P3a and P3b that are separated upward from the passing positions P2b and P2a. May be set. Thereby, it is possible to omit the movement of retracting the stages 11 and 12 from the mounting positions P1a and P1b to the retracted positions P3a and P3b.

  Further, the transport mechanism 45 in the second embodiment is configured to retract the stages 11 and 12 located at the mounting positions P1a and P1b in the vertical direction, but as in the first embodiment. The stages 11 and 12 may be configured to be retracted in a predetermined direction in the horizontal direction. In the first embodiment, the stages 11 and 12 positioned at the mounting positions P1a and P1b may be configured to retract in the vertical direction. In addition, the retracting mechanism that retracts in the horizontal direction has a simpler configuration than the retracting mechanism that retracts in the vertical direction, and the positioning accuracy of the substrates 9 mounted on the stages 11 and 12 can be easily maintained. It is preferable because it is possible.

(Third embodiment)
FIG. 7 is a side view schematically showing a polarized light irradiation apparatus according to the third embodiment. The third embodiment is different from the second embodiment in a retracting mechanism for retracting the first and second stages 11 and 12 positioned at the mounting positions P1a and P1b in the vertical direction.

  As shown in FIG. 7, the polarized light irradiation device 5 of the third embodiment alternately conveys the first and second stages 11 and 12 between the mounting positions P1a and P1b and the passing positions P2a and P2b. A transport mechanism 55 that reciprocates along the path 56 is provided. As shown in FIG. 7, the conveyance path 56 includes a guide shaft 55 a that conveys the first and second stages 11 and 12. The conveyance path 56 is configured linearly along the guide shaft 55a.

  Further, the polarized light irradiation device 5 of the third embodiment includes a retraction mechanism 57 that moves the first and second stages 11 and 12 to retraction positions P3a and P3b apart from the passage positions P2a and P2b. As shown in FIG. 7, the retraction mechanism 57 is disposed adjacent to the first and second mounting positions P1a and P1b, and a so-called industrial robot is used. The retraction mechanism 57 has an arm 57a for transporting the stages 11 and 12 in the vertical direction.

  The retraction mechanism 57 is configured so that when the first and second stages 11 and 12 are transported to the passing positions P2a and P2b, the first and second mounting positions P1a and P1b are positioned at the first and second mounting positions P1a and P1b. The stages 11 and 12 are moved to the retracted positions P3a and P3b. Further, the retracting mechanism 57 returns the first stage 11 located at the retracted position P3a to the first mounting position P1a and returns the second stage 12 located at the retracted position P3b to the second mounting position P1b.

  In addition, the first stage 11 positioned at the first mounting position P1a is first mounted on the passing position P2b so as to overlap the entire second stage 12 positioned at the passing position P2b on the same plane. Position P1a is arranged. Similarly, the second stage 12 located at the second mounting position P1b is second relative to the passage position P2a so as to overlap the entire first stage 11 located at the passage position P2a on the same plane. Mounting position P1b is arranged. Thereby, the conveyance distance of each stage 11 and 12 which reciprocates with respect to the irradiation unit 10 is further shortened.

(Effect of the third embodiment)
Also in the third embodiment, as in the second embodiment, it is possible to suppress further increase in tact time compared to the first and second embodiments, and to suppress further increase in installation space. it can.

  In the third embodiment, the transport paths 56 are configured on the same plane, that is, although the transport path 56 is configured only by the transport mechanism 55, the stages 11 and 12 are moved vertically. Can be transported. For this reason, since it is not necessary to incorporate the mechanism which conveys each stage 11 and 12 to the up-down direction in the conveyance mechanism 55, it can suppress that the conveyance mechanism 55 becomes complicated.

(Fourth embodiment)
FIG. 8 is a plan view schematically showing a polarized light irradiation apparatus according to the fourth embodiment. The fourth embodiment differs from the first embodiment in that the second stage 12 positioned at the second mounting position P1b does not overlap the first stage 11 positioned at the passing position P2a. That is, in the fourth embodiment, of the first and second stages 11 and 12, only the first stage 11 side located at the second mounting position P1a is the second stage located at the passing position P2b. 11 is overlapped.

  As shown in FIG. 8, the polarized light irradiation device 6 of the fourth embodiment alternately conveys the first and second stages 11 and 12 between the mounting positions P1a and P1b and the passing positions P2a and P2b. A transport mechanism 65 that reciprocates along the path 66 is provided. As shown in FIG. 8, the conveyance path 66 has a guide shaft 65 a that conveys the first and second stages 11 and 12. The conveyance path 66 is configured linearly along the guide shaft 65a.

  The first stage 11 located at the first mounting position P1a is first with respect to the passage position P2b so as to overlap a part of the second stage 12 located at the passage position P2b on the same plane. Mounting position P1a is arranged. Therefore, the configuration on the first stage 11 side in the fourth embodiment is the same as that in the first embodiment. Although not shown, a retracting mechanism for retracting the first stage 11 located at the first mounting position P1a to the retracted position P3a is provided at a position adjacent to the first mounting position P1a.

  On the other hand, the second stage 12 located at the second mounting position P1b is adjacent to the passage position P2a so as to be adjacent to the first stage 11 located at the passage position P2a without overlapping. Two mounting positions P1b are arranged. Thereby, in the polarized light irradiation device 6 of the fourth embodiment, a retracting mechanism for retracting the second stage 12 is omitted. In the polarized light irradiation device 6 of the fourth embodiment, the transport distance of the first stage 11 that reciprocates with respect to the irradiation unit 10 is shorter than the transport distance of the second stage 12.

(Effect of the fourth embodiment)
In 4th Embodiment, it has the space where the 1st stage 11 located in the passage position P2a is arrange | positioned between the 2nd mounting position P1b of the 2nd stage 12, and the irradiation unit 10. FIG. For this reason, in the fourth embodiment, the transport distance of the second stage 12 is longer than the transport distance of the first stage 11, and the tact time is delayed as compared with the first embodiment. However, since the sixth embodiment does not need to move the second stage 12 to the retracted position, the retracting mechanism of the second stage 12 can be reduced as compared with the first embodiment.

  Also in the fourth embodiment, as in the first to third embodiments, an effect of suppressing an increase in tact time and suppressing an increase in installation space can be obtained.

  The retraction mechanism in the present embodiment uses an industrial robot or a guide rail to convey the stage in the vertical direction, but other lifting mechanisms, mechanisms that suspend the stage, and the like are used. May be.

  Further, the retracting mechanism may be configured to move the second stage located at the mounting position to the retracted position in conjunction with the first stage moved to the passing position. As a retraction mechanism, for example, the second stage is pushed by the first stage moved to the passing position, so that the second stage moves to the retraction position, or the thickness direction of the second stage is about the rotation axis. A mechanism that pivots may be adopted. According to such a retracting mechanism, the mechanism and control can be simplified.

  In addition, the first stage and the second stage may have a so-called alignment mechanism that performs positioning after mounting an object at the first mounting position P1 and the second mounting position P2.

  Further, the first stage and the second stage are provided with a plurality of pins and a movable part, and the plurality of pins and the movable part are moved up and down to move the object to the first stage and the second stage. You may have the mounting mechanism to mount.

  In each of the embodiments described above, only one irradiation unit 10 is provided, but the present invention is not limited to this configuration. For example, the plurality of irradiation units 10 may be arranged at a predetermined interval along the conveyance direction of the first and second stages. In this case, the irradiation area A is not only directly below the plurality of irradiation units 10 but also from the lower end of the irradiation unit 10 disposed on one end side to the lowermost surface of the irradiation unit 10 disposed on the other end side. It is good also as an area | region between the other ends of this opening.

  Although the embodiments of the present invention have been described, the embodiments are presented as examples and are not intended to limit the scope of the present invention. The embodiment can be implemented in various other forms, and various omissions, replacements, and changes can be made without departing from the spirit of the invention. The embodiments and modifications thereof are included in the scope of the present invention and the gist thereof, and are also included in the invention described in the claims and the equivalents thereof.

DESCRIPTION OF SYMBOLS 1 Polarized light irradiation apparatus 9 Board | substrate 10 Irradiation unit 10a Light source 11 1st stage 12 2nd stage 15 Conveyance mechanism 15a Guide shaft 16 Conveyance path 17 Retraction mechanism A Irradiation area P1a 1st mounting position P1b 2nd mounting position P2a , P2b passing position P3a, P3b retracted position

Claims (4)

An irradiation unit having an irradiation region for irradiating the object with polarized light;
A set of stages in which each mounting position for mounting the object is disposed on both sides of the irradiation region;
A pair of stages between the mounting position and a passing position where the stage passes through the irradiation region and is adjacent to the irradiation region. A transport mechanism that alternately reciprocates along the transport path;
Located at the mounting position, the hand of the stage of the set of stages, when the other stage is conveyed to the passing position, a retraction mechanism for moving the retracted position away from the passing position; comprising the And
Before Symbol hand of the stage positioned in the mounting position, at least a portion of the other stage is positioned in the passage position, to overlap on the same plane, the mounting position is arranged relative to the passage position ,
Both ends of the transport path on which the respective mounting positions are arranged are bent on the same plane with respect to the direction connecting the irradiation area and the passing position . An irradiation unit having an irradiation region for irradiating the object with polarized light;
A set of stages in which each mounting position for mounting the object is disposed on both sides of the irradiation region;
A pair of stages between the mounting position and a passing position where the stage passes through the irradiation region and is adjacent to the irradiation region. A transport mechanism that alternately reciprocates along the transport path;
A retraction mechanism that moves one stage of the set of stages located at the mounting position to a retreat position away from the pass position when the other stage is transported to the pass position. ,
The mounting position is arranged with respect to the passing position so that the one stage positioned at the mounting position and at least a part of the other stage positioned at the passing position overlap on the same plane,
The retracting mechanism is a polarized light irradiation apparatus for photo-alignment that retracts the one stage to the retracted position that is vertically separated from the mounting position . Stage before Symbol hand, in the same plane, when positioned in the mounting position, so as to overlap the entire other of the stage positioned in the passage position, the mounting position is arranged relative to the passage position The polarized light irradiation apparatus for photo-alignment according to claim 1 or 2 . The retraction mechanism, the pre-Symbol hand stage, the one stage is moved to the retracted position along the same direction as the conveying direction to be reciprocated, the polarized light for optical alignment as claimed in claim 1 or 2 Irradiation device.

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