TWI673549B - Polarized light irradiating device for light alignment - Google Patents

Abstract

The invention is a polarized light irradiation device for light alignment, which suppresses the increase of the production cycle and the increase of the installation space of the entire device. The polarized light irradiation device for optical alignment includes: a set of stages, each of which is provided with a mounting position on each side of the irradiation area; a transport mechanism having a transport path connecting the mounting positions through the irradiation area; and a retreat mechanism, When at least one of the set of carriers located at the carrying position is moved to the passing position while the other carrier is moved to the retreat position away from the passing position. The mounting position is arranged with respect to the passing position such that at least one stage at the mounting position and at least a part of the other stage at the passing position overlap on the same plane.

Description

Polarized light irradiation device for light alignment

The present invention relates to a polarized light irradiation device for light alignment.

In a manufacturing process of a liquid crystal panel and the like, an alignment process is performed on an object such as an alignment film of the liquid crystal panel or an alignment of a viewing angle compensation film. In the alignment process, there is known a polarized light irradiation device for photo alignment used for performing so-called photo alignment. The photo alignment refers to aligning a polarizing light having a predetermined wavelength on an alignment film.

As such a polarized light irradiation device for light alignment, for example, there is a structure including: an irradiation unit that irradiates polarized light; a stage that carries a substrate on which an alignment film is formed; and a transport mechanism that passes the irradiation through the stage The stage is irradiated with the unit to transport the stage.

Furthermore, as a device similar to the polarized light irradiation device for light alignment, an exposure device is known, which uses a first stage and a second stage on which a substrate is mounted to expose the substrate by an exposure section. Let's move the first carrier and the second carrier.

Prior Art Literature Patent Literature Patent Literature 1: Japanese Patent Laid-Open No. 2008-191302

However, an object such as a liquid crystal panel is becoming larger, and with this, the irradiation time for the object in a polarized light irradiation device for light alignment has increased. Therefore, there is a problem in that the processing time (hereinafter referred to as the production takt time) of each object becomes long, resulting in a decrease in productivity. In addition, as the object becomes larger, there is a problem that the polarized light irradiation device for light alignment becomes larger.

Therefore, an object of the present invention is to provide a polarized light irradiating device for light alignment capable of suppressing an increase in the production cycle and suppressing an increase in the entire installation space of the device.

A polarized light irradiation device for optical alignment according to an embodiment includes an irradiation unit having an irradiation area for irradiating a polarized light toward an object, and a first stage and a second stage having a first mounting position and a first mounting position on which the object is mounted. 2 loading positions; and a transfer mechanism having at least one transfer path connecting the first loading position and the second loading position through the irradiation area, and in the loading position and the first stage and The second stage passes through the irradiation area and is adjacent to the passing position of the irradiation area, so that the first stage and the second stage alternately reciprocate along the at least one transport path. .

The polarized light irradiation device for optical alignment further includes a retreat mechanism for placing at least one of the first stage and the second stage at the first mounting position and the second mounting position on the other. When the stage is carried to the passing position, it moves to a retreat position away from the passing position. The mounting position is arranged with respect to the passing position such that at least a part of the at least one stage positioned at the first mounting position and the second mounting position and at least a part of another stage positioned at the passing position. Coincide on the same plane.

According to another embodiment, the at least one carrier is such that the retreat position is on the same plane as the carrying position. According to another embodiment, the at least one carrier is that the retreated position and the carrying position are located on different planes.

According to another embodiment, the at least one carrier is configured such that the carrying position is relative to the passing position: on the same plane, when the at least one carrier is located at the carrying position, The other said carrier at the passing position is entirely overlapped.

According to another embodiment, the retreat mechanism moves the at least one stage to the retreat position in the same direction as a conveyance direction in which one of the stages is reciprocated.

Furthermore, in the polarized light irradiation device for optical alignment according to another embodiment, the transport path includes a first transport path from a first mounting position where the object is mounted on the first stage, and The first stage is transferred to an irradiation start position adjacent to the irradiation area, and the second transfer path is to transfer the second stage from a second mounting position where the object is mounted on the second stage. And a third transport path, one end of which is connected to the irradiation start position, and the other end of which passes through the irradiation area to the passage position adjacent to the irradiation area, and transports the The first carrier and the second carrier. Further, the conveyance mechanism reciprocates the first stage along the first conveyance path and the third conveyance path between the first loading position and the passing position, and moves the Between the second mounting position and the passing position, the second stage is reciprocated along the second transport path and the third transport path.

According to another embodiment, the conveyance direction of at least one of the first conveyance path and the second conveyance path intersects with the conveyance direction of the third conveyance path on the same plane.

According to another embodiment, the first conveyance path and the second conveyance path are arranged side by side in the vertical direction.

According to the present invention, it is possible to suppress an increase in the production cycle and improve productivity, and to suppress an increase in the installation space of the entire device.

A polarized light irradiation device for optical alignment (hereinafter referred to as a polarized light irradiation device) 1A according to an embodiment to be described below includes an irradiation unit 10, a set of first and second stages 11, 12, a transport mechanism 15, and a retreat mechanism 17 . The irradiation unit 10 includes an irradiation area A that irradiates polarized light toward an object. A set of the first stage 11 and the second stage 12 includes first and second mounting positions P1a and P1b of the object to be mounted on both sides of the irradiation area A. The transport mechanism 15 includes a transport path 16 that connects the first mounting position P1a and the second mounting position P1b through the irradiation area A. Further, the conveyance mechanism 15 sets the first mounting position P1a, the second mounting position P1b, and the first stage 11 and the second stage 12 adjacent to the passage positions P2a and P2b of the irradiation area A through the irradiation area A, and The group first stage 11 and the second stage 12 alternately reciprocate along the transport path 16. The retreat mechanism 17 causes at least one of the first stage 11 and the second stage 12 (the second stage 12) of a group of the first stage 11 and the second stage 12 located at the first mounting position P1a (the second mounting position P1b) to When one second carrier 12 (first carrier 11) is transported to the passing position P2b (P2a), it moves to the retreat position P3a (P3b) away from the passing position P2b (P2a). The first mounting position P1a (the second mounting position P1b) is disposed with respect to the passing position P2b (P2a) so that at least one of the first mounting positions 11 (the second mounting position) is located at the first mounting position P1a (the second mounting position P1b). 12) At least a part of another second stage 12 (first stage 11) located at the passing position P2b (P2a) coincides on the same plane.

In addition, at least one first stage 11 (second stage 12) of the embodiment to be described below is located on the same plane as the retreat position P3a (P3b) and the first mounting position P1a (second mounting position P1b).

Further, at least one of the first stage 11 (second stage 12) in the embodiment to be described below is located on a different plane from the retraction position P3a (P3b) and the first mounting position P1a (second mounting position P1b).

In addition, at least one of the first stage 11 (second stage 12) of the embodiment to be described below is arranged at the first mounting position P1a (second mounting position P1b) with respect to the passing position P2b (P2a): On the plane, when at least one first stage 11 (second stage 12) is located at the first mounting position P1a (second mounting position P1b), and another second stage 12 (at the passing position P2b (P2a)) The first carrier 11) is entirely overlapped.

Further, the evacuation mechanism 17 of the embodiment to be described below causes at least one first stage 11 (second stage 12) to be transported in a reciprocating direction with one of the first stage 11 (second stage 12). Move to the retreat position P3a (P3b) in the same direction.

Hereinafter, a polarized light irradiation device according to an embodiment will be described with reference to the drawings. (First Embodiment)

FIG. 1 is a side view schematically showing a polarized light irradiation device according to a first embodiment. FIG. 2 is a plan view schematically showing a polarized light irradiation device according to the first embodiment. The polarized light irradiation device according to this embodiment is used to perform light alignment, for example, by irradiating polarized light such as linearly polarized light onto an alignment film as an object. The polarized light irradiation device according to this embodiment is used for, for example, an alignment film of a liquid crystal panel or an alignment film of a viewing angle compensation film.

(Structure of Polarized Light Irradiation Device)

As shown in FIG. 1, the polarized light irradiation device 1 according to the first embodiment includes an irradiation unit 10, a set of first and second stages 11 and 12, a transport mechanism 15, and a retreat mechanism 17.

The irradiation unit 10 includes an irradiation area A that irradiates polarized light onto a substrate 9 (hereinafter, simply referred to as a substrate 9) on which an alignment film as an object is formed. Furthermore, the irradiation unit 10 includes a tubular light source 10 a that emits light including ultraviolet rays, and a reflection plate 10 b that controls the alignment of the light emitted from the light source 10 a. In addition, the irradiation unit 10 includes a polarizing element (not shown) that allows the light emitted from the light source 10 a and the light whose alignment is controlled by the reflection plate 10 b to enter and emit the polarized light.

In addition, the "irradiated area A" referred to here means the opening at the bottom of the irradiation unit 10, that is, the opening at the position closest to the object in the irradiation unit 10. For example, if the bottom of the irradiation unit 10 is a polarizing element, the opening of the polarizing element is equivalent to the irradiation area A. If a light shielding plate (not shown) is located closer to the object side than the polarizing element, the opening of the light shielding plate is equivalent to Irradiated area A. If a cover glass (not shown) is present on the light-shielding plate, the opening of the cover glass corresponds to the irradiation area A.

For the light source 10a, for example, a high-pressure mercury lamp in which a rare gas such as mercury, argon, or xenon is enclosed in an ultraviolet-transmissive glass tube, or a metal halide in which a metal halide such as iron or iodine is enclosed in the high-pressure mercury lamp is used. Tube type lamps, such as a lamp, have a linear light emitting part. In the light source 10 a, the length direction of the light emitting portion is orthogonal to the conveyance direction of each of the first stage 11 and the second stage 12 with respect to the irradiation unit 10, and the length of the light emitting portion is set to be longer than the length of one side of the substrate 9. The light source 10 a is configured to be capable of emitting light including, for example, ultraviolet rays having a wavelength of 200 to 400 nm from a linear light-emitting portion. The light emitted from the light source 10a is a so-called unpolarized light having various polarization axis components.

The reflecting plate 10b has a reflecting surface that reflects light emitted from the light source 10a on a surface facing the light source 10a, and the reflecting surface is formed in a shape of a part of a circle. Accordingly, the reflecting plate 10b is configured to condense the light emitted from the light source 10a, that is, it serves as a so-called condensing type reflecting plate. The polarizing element can extract light of a polarization axis that oscillates only in a reference direction from light including various polarization axis components that are emitted from the light source 10 a and vibrates uniformly in all directions. In addition, light with a polarization axis that vibrates only in the reference direction is generally referred to as linearly polarized light. The polarization axis refers to the vibration direction of the electric and magnetic fields of light.

A set of the first stage 11 and the second stage 12 is formed in a rectangular plate shape, and a substrate 9 on which an alignment film is formed is mounted. The first carrier 11 and the second carrier 12 are movably supported by the transport mechanism 15.

As shown in FIGS. 1 and 2, each of the first mounting position P1 a and the second mounting position P1 b on which the substrate 9 is mounted on the first stage 11 and the second stage 12 are arranged on both sides of the irradiation area A. The transport mechanism 15 includes a transport path 16 that connects the first mounting position P1a and the second mounting position P1b through the irradiation area A. The transport mechanism 15 includes a guide shaft 15a that movably supports the first stage 11 and the second stage 12, and a drive mechanism (not shown) that moves the first stage 11 and the second stage 12 along the guide shaft 15a.示). The guide shaft 15 a constitutes a linear conveying path 16. In addition, the transport mechanism 15 is located at each of the first mounting position P1a and the second mounting position P1b, and the first stage 11 and the second stage 12 pass through the irradiation area A and are adjacent to the passage positions P2a, P2b of the irradiation area A. At this time, the first stage 11 and the second stage 12 are alternately reciprocated along the transport path 16.

Further, as shown in FIG. 1, the evacuation mechanism 17 is disposed adjacent to the first mounting position P1 a and the second mounting position P1 b, and uses a so-called industrial robot. The evacuation mechanism 17 includes an arm 17 a for conveying each of the first stage 11 and the second stage 12 in a horizontal direction. When the evacuation mechanism 17 is transported to the passing positions P2a, P2b by a set of the first stage 11 and the second stage 12, the set of the first stage 11 and the first stage 11 are located at the first mounting position P1a and the second mounting position P1b. The second stage 12 moves to the retreat positions P3a and P3b that are separated from the passing positions P2a and P2b.

As shown in FIG. 2, the first stage 11 located at the first mounting position P1a and a part of the second stage 12 located at the passing position P2b are superposed on the same plane. Similarly, the second stage 12 located at the second mounting position P1b and a part of the first stage 11 located at the passing position P2a are superposed on the same plane. With such a positional relationship, the first mounting position P1a (the second mounting position P1b) of the first stage 11 and the second stage 12 are arranged with respect to the passing position P2b (P2a).

In the present embodiment, the first stage 11 located at the first mounting position P1a overlaps one end portion of the second stage 12 located at the passing position P2b in the conveying direction on a horizontal plane. In addition, the second stage 12 located at the second mounting position P1b overlaps with one end portion of the first stage 11 located at the passing position P2a in the conveying direction on a horizontal plane. That is, the first mounting position P1a of the first stage 11 is arranged near the passing position P2b of the second stage 12, and the second mounting position P1b of the second stage 12 is close to the passing position P2a of the first stage 11. Configuration.

In other words, this means that there is less than one first stage 11 between each of the first stage 11, the second stage 12, and the irradiation unit 10 on the plane in the first mounting position P1a and the second mounting position P1b. (Second carrier 12). With this structure, the conveyance distance of each of the first stage 11 and the second stage 12 reciprocating with respect to the irradiation unit 10 is shortened, thereby suppressing an increase in the production cycle and an increase in the installation space.

One of the first stage 11 (the second stage 12) at the first mounting position P1a (the second mounting position P1b) and the other second stage 12 (the first stage 11) at the passing position P2b (P2a) ) A large overlapping area means that the transport distance between the first mounting position P1a (the second mounting position P1b) and the irradiation area A becomes shorter. Therefore, it is preferable from a viewpoint of suppressing a long production cycle and suppressing an increase in installation space. On the other hand, one of the first stage 11 (the second stage 12) located at the first mounting position P1a (the second loading position P1b) and the other second stage 12 (the second mounting position 12 of the passing position P2b (P2a)) The small area where the first stage 11) overlaps means that the time required for the first stage 11 (the second stage 12) to retreat from the first mounting position P1a (the second mounting position P1b) becomes shorter. Therefore, the first stage 11 (the second stage 12) can be easily retreated. However, in this case, since the transport distance between the first mounting position P1a (the second mounting position P1b) and the irradiation area A becomes long, it is possible to suppress the increase in the production takt time and the increase in the installation space. As a result, the effect obtained is reduced. Therefore, one of the first stage 11 (the second stage 12) located in the first mounting position P1a (the second loading position P1b) and the other second stage 12 (the first stage) located in the passing position P2b (P2a). The area where the stage 11) overlaps is appropriately set according to the speed at which the first stage 11 (the second stage 12) retreats from the first mounting position P1a (the second mounting position P1b), and the like.

In the present embodiment, the transport mechanism 15 and the retreat mechanism 17 are configured as separate mechanisms, but they can also be configured such that the transport mechanism 15 also functions as the retreat mechanism. In this case, the transfer mechanism reciprocates each of the first stage 11 and the second stage 12 and reciprocates the first stage between the first mounting position P1a, the second mounting position P1b, and the retreat positions P3a, P3b. 11 (second carrier 12). (Operation of each stage during irradiation with polarized light)

With respect to the polarized light irradiation device 1 configured as described above, an operation of transporting the first stage 11 and the second stage 12 to the irradiation unit 10 and irradiating the substrate 9 with polarized light will be described.

First, the substrate 9 is mounted on the first stage 11 located at the first mounting position P1a. Then, the first stage 11 is transported to the irradiation unit 10 by the transport mechanism 15 and is transported to the passing position P2a through the irradiation area A. Next, the first stage 11 is transported from the passing position P2a to the first mounting position P1a, and returns to the first mounting position P1a through the passing position P2a passing through the irradiation area A. In this way, the alignment film of the substrate 9 on the first stage 11 is irradiated with a predetermined amount of polarized light by reciprocating the area A to perform a desired light alignment.

On the other hand, when the first stage 11 is transported by the transport mechanism 15, the substrate 9 is mounted on the second stage 12 located at the second mounting position P1b. When the first stage 11 is transported to the first mounting position P1a, the second stage 12 is transported by the transport mechanism 15 toward the irradiation unit 10 at a predetermined timing, and is transported to the passing position through the irradiation area A Up to P2b.

In this way, the transport mechanism 15 alternately transports the first stage 11 and the second stage 12 back and forth, thereby continuously performing the operation of irradiating the alignment film of the substrate 9 on the first stage 11 with polarized light and the second carrier The alignment film of the substrate 9 on the stage 12 is irradiated with polarized light. This allows the substrate 9 to be mounted on or detached from the other second stage 12 (first stage 11) while the first stage 11 (second stage 12) is being transported. Suppresses the production cycle from becoming longer.

The passing position P2b of the second stage 12 corresponds to the irradiation start position and the irradiation end position of the first stage 11. Similarly, the passing position P2a of the first stage 11 corresponds to the irradiation start position and the irradiation end position of the second stage 12.

In addition, when the first stage 11 located at the first mounting position P1a is transported to the passing position P2b by the second stage 12, it is retracted from the first mounting position P1a to the retraction position P3a by the retreat mechanism 17. Then, after the second stage 12 is transported toward the second mounting position P1b, the first stage 11 is returned from the retraction position P3a to the first mounting position P1a by the evacuation mechanism 17. Accordingly, it is possible to prevent the first stage 11 from interfering with the second stage 12 that is transported back and forth between the second mounting position P1b and the passing position P2b.

Similarly, the second stage 12 located at the second mounting position P1b is retreated from the second mounting position P1b to the retraction position P3b by the retraction mechanism 17 when the first stage 11 is transported to the passing position P2a. Then, after the first stage 11 is transported to the first mounting position P1a, the second stage 12 is returned from the retraction position P3b to the second mounting position P1b by the retraction mechanism 17.

The movement from the retreat positions P3a and P3b to the first mounting position P1a and the second mounting position P1b and the reciprocating movement from the first mounting position P1a and the second mounting position P1b to the irradiation area A may be controlled to be continuous. Ground transition without temporarily stopping the first stage 11 and the second stage 12 at the first mounting position P1a and the second mounting position P1b.

As described above, in the present embodiment, the first mounting position P1a approaches the passing position P2b in such a manner that the first stage 11 located at the first mounting position P1a is on the same plane as the first mounting position 11 at the passing position P2b. 2 carrier 12 overlap. Similarly, the first mounting position P1b approaches the passing position P2a so that the second stage 12 located at the second mounting position P1b overlaps the first stage 11 located at the passing position P2a on the same plane. As a result, since the conveyance distance of the 1st stage 11 and the 2nd stage 12 reciprocating with respect to the irradiation area A is shortened, it becomes possible to suppress that a production cycle becomes long. (Effect of the first embodiment)

The first embodiment includes a transport mechanism 15 that alternates the first stage 11 and the second stage 12 along the transport path 16 between the first mounting position P1a, the second mounting position P1b, and the passing positions P2a, P2b. While reciprocating; and the retreat mechanism 17, each stage is moved to the retreat positions P3a, P3b away from the passing positions P2a, P2b. The first mounting position P1a (the second mounting position P1b) is disposed with respect to the passing position P2b (P2a) so that one of the first mounting positions 11 (the second mounting position) is located in the first mounting position P1a (the second mounting position P1b). 12) A part of another second stage 12 (first stage 11) located at the passing position P2b (P2a) is superposed on the same plane. Thereby, the conveyance distance of each of the 1st stage 11 and the 2nd stage 12 which reciprocates with respect to the irradiation unit 10 can be shortened. As a result, an increase in the production cycle can be suppressed, and an increase in the installation space of the entire device can be suppressed.

Further, the retreat positions P3a and P3b of the first stage 11 and the second stage 12 in the first embodiment are located on the same plane as the first mounting position P1a and the second mounting position P1b. Thereby, the conveyance mechanism 15 can be simplified, and the positional deviation of the substrate 9 can be suppressed on the first stage 11 and the second stage 12.

In addition, in the present embodiment, both the first stage 11 and the second stage 12 are arranged so that the first mounting position P1a and the second mounting position P1b overlap the passing positions P2a and P2b, but the present invention is not limited to this. The structure. According to needs such as installation space and control of the conveyance operation, at least one of the first carrier 11 and the second carrier 12 is arranged such that the carrier at the loading position and the carrier at the passing position overlap. As a result, it is possible to obtain the effect of suppressing an increase in the production cycle and an increase in the installation space of the entire device.

The retreat mechanism 17 in the first embodiment moves the first stage 11 and the second stage 12 to the retreat positions P3a and P3b in the same direction as the conveyance direction of the reciprocating conveyance. Accordingly, the first stage 11 and the second stage 12 can smoothly transition from the retreat positions P3a and P3b to the transport operation, the operation reliability is improved, and an increase in the production cycle can be suppressed.

Further, in this embodiment, the area between the irradiation area A and each of the first stage 11 and the second stage 12 located at the first mounting position P1a and the second mounting position P1b is smaller than one first stage 11 (the 2 stage 12) The size of the mounting surface. Therefore, the conveyance distance of each of the first stage 11 and the second stage 12 can be shortened, and an increase in the production cycle can be suppressed.

Furthermore, in the first embodiment, the first stage 11 and the second stage 12 located at the first mounting position P1a and the second mounting position P1b are arranged along the transport direction of the first stage 11 and the second stage 12 (Conveyance path 16), it moves to the retreat positions P3a, P3b, but it is not limited to this structure. For example, the first stage 11 and the second stage 12 located at the first mounting position P1a and the second mounting position P1b may be configured to face the first stage 11 and the first stage 11 according to needs such as restrictions on the installation space. The direction in which the carrying direction of the 2 stage 12 intersects, that is, the leftward, rightward, and obliquely upward direction in FIG. 2 is withdrawn.

Hereinafter, a polarized light irradiation device according to another embodiment will be described with reference to the drawings. In other embodiments, the same components as those in the first embodiment are denoted by the same reference numerals as those in the first embodiment, and descriptions thereof are omitted. (Modification 1 of the first embodiment)

FIG. 3 is a plan view schematically showing a polarized light irradiation device according to a modification 1 of the first embodiment. Modification 1 of the first embodiment is different from the first embodiment in the arrangement of the first mounting position P1a and the second mounting position P1b with respect to the passing positions P2a and P2b; and the first stage 11 and the second stage 12 The direction to retreat from the first mounting position P1a and the second mounting position P1b.

As shown in FIG. 3, the polarized light irradiation apparatus 1B according to the modification of the first embodiment includes a transport mechanism 25 between the first mounting position P1a, the second mounting position P1b, and the passing positions P2a, P2b. The first stage 11 and the second stage 12 alternately reciprocate along the transport path 26. As shown in FIG. 3, the transport path 26 has two ends in the longitudinal direction that are curved at an angle of about 45 degrees, for example, in a direction that intersects on the same plane with respect to the direction between the connecting passage positions P2a and P2b. Further, both end portions of the conveyance path 26 are bent in the same direction with respect to a straight line connecting the passing positions P2a and P2b. The transport path 26 is configured along the guide shaft 25 a of the transport mechanism 25.

In addition, the first mounting position P1a is disposed with respect to the passing position P2b such that the first stage 11 located at the first mounting position P1a overlaps a corner of the second stage 12 located at the passing position P2b on the same plane. In the same manner, the second mounting position P1b is arranged with respect to the passing position P2a so that the second stage 12 located at the second mounting position P1b coincides with the corner of the first stage 11 located at the passing position P2a on the same plane. . Thereby, the conveyance distance of each of the 1st stage 11 and the 2nd stage 12 which reciprocates with respect to the irradiation unit 10 is shortened. (Effect of Modification Example 1 of the first embodiment)

In the first modification of the first embodiment, as in the first embodiment, the conveyance distance of each of the first stage 11 and the second stage 12 can be shortened. Therefore, it is possible to obtain a reduction in increase in production cycle and a suppression setting. The effect of increasing space. (Modification 2 of the first embodiment)

FIG. 4 is a plan view schematically showing a polarized light irradiation device according to a second modification of the first embodiment. The second modification of the first embodiment is different from the first embodiment in the arrangement of the first mounting position P1a and the second mounting position P1b with respect to the passing positions P2a and P2b; and the first stage 11 and the second stage 12 The direction to retreat from the first mounting position P1a and the second mounting position P1b.

As shown in FIG. 4, the polarized light irradiation device 1C according to the second modification of the first embodiment includes a transport mechanism 35 between the first mounting position P1a, the second mounting position P1b, and the passing positions P2a, P2b. The first stage 11 and the second stage 12 are alternately reciprocated along the conveyance path 36. As shown in FIG. 4, the transport path 36 has both ends in the longitudinal direction that are curved in a direction orthogonal to the same plane with respect to the direction between the connecting passage positions P2a and P2b. Further, both end portions of the conveyance path 36 are bent in the same direction with respect to a straight line connecting the passing positions P2a and P2b. The transport path 36 is configured along the guide shaft 35 a of the transport mechanism 35.

Further, the first mounting position P1a is disposed with respect to the passing position P2b such that the first stage 11 located at the first mounting position P1a coincides with the end of the second stage 12 located at the passing position P2b on the same plane. In the same manner, the second mounting position P1b is disposed with respect to the passing position P2a such that the second stage 12 located at the second mounting position P1b is coincident with the end of the first stage 11 located at the passing position P2a on the same plane. . Thereby, the conveyance distance of each of the 1st stage 11 and the 2nd stage 12 which reciprocates with respect to the irradiation unit 10 is shortened. (Effect of Modification 2 of the first embodiment)

In the second modification of the first embodiment, as in the first embodiment, the conveyance distance of each of the first stage 11 and the second stage 12 can be shortened. Therefore, it is possible to obtain an increase in the production cycle and an inhibition setting. The effect of increasing space. (Second Embodiment)

FIG. 5 is a side view schematically showing a polarized light irradiation device according to a second embodiment. FIG. 6 is a plan view schematically showing a polarized light irradiation device according to a second embodiment. The second embodiment is different from the first embodiment in that the entirety of the first stage 11 and the second stage 12 located at the first mounting position P1a and the second mounting position P1b with respect to the passage positions P2a and P2b as a whole. Each of the first stage 11 and the second stage 12 overlaps. The second embodiment is different from the first embodiment in that the first stage 11 and the second stage 12 are retracted from the first mounting position P1a and the second mounting position P1b with respect to the vertical direction.

As shown in FIG. 5 and FIG. 6, the polarized light irradiation device 1D according to the second embodiment includes a transport mechanism 45 between the first mounting position P1a, the second mounting position P1b, and the passing positions P2a, P2b. The first stage 11 and the second stage 12 alternately reciprocate along the transport path 46. As shown in FIG. 5, the conveyance path 46 includes a guide rail 45 a for conveying the first stage 11 and the second stage 12. Both ends of the guide rail 45a are bent upward, and extend from the first mounting position P1a and the second mounting position P1b to the retreat positions P3a and P3b. Further, as shown in FIG. 6, the conveyance path 46 is linearly formed along the guide rail 45 a when viewed from a direction facing the mounting surface of each of the first stage 11 and the second stage 12.

In the polarized light irradiation device 1D according to the second embodiment, the first stage 11 located at the first mounting position P1a is moved to the retreat position P3a by the transfer mechanism 45, and the second stage located at the second mounting position P1b is moved. The stage 12 moves to the retreat position P3b. The transport mechanism 45 returns the first stage 11 located at the retreated position P3a to the first mounting position P1a, and returns the second stage 12 located at the retreated position P3b to the second mounting position P1b. Therefore, in the present embodiment, the transfer mechanism 45 that reciprocates each of the first stage 11 and the second stage 12 doubles the first stage 11 and the second stage 12 from the first mounting position P1a and the second mounting The retreat mechanism at position P1b retreats to retreat positions P3a, P3b.

Further, the first mounting position P1a is disposed with respect to the passing position P2b such that the first stage 11 located at the first mounting position P1a overlaps the entirety of the second stage 12 located at the passing position P2b on the same plane. In the same manner, the second mounting position P1b is disposed with respect to the passing position P2a such that the second stage 12 located at the second mounting position P1b is superimposed on the same plane as the entire first stage 11 located at the passing position P2a. Thereby, the conveyance distance of each of the 1st stage 11 and the 2nd stage 12 which reciprocates with respect to the irradiation unit 10 is shortened further. (Effect of the second embodiment)

In the second embodiment, each of the first stage 11 and the second stage 12 located at the first mounting position P1a and the second mounting position P1b and the first stage 11 and the second stage located at the passing positions P2a and P2b. Since the whole 12 overlaps, the conveyance distance of each of the first stage 11 and the second stage 12 is further shortened compared with the first embodiment or the third embodiment. As a result, it is possible to further suppress the increase in the production cycle and the increase in the installation space.

Further, the retreat positions P3a and P3b of the first stage 11 and the second stage 12 in the second embodiment are located on different planes from the first mounting position P1a and the second mounting position P1b. Therefore, it is preferable when it is difficult to secure the installation space with respect to the horizontal direction, and it is possible to suppress an increase in the installation space with respect to the installation in-plane direction serving as the horizontal direction.

In addition, in the second embodiment, each of the first stage 11 and the second stage 12 is retracted upward from the first mounting position P1a and the second mounting position P1b. However, each of the stages 11 and 12 may be configured. Retreat downward from the first mounting position P1a and the second mounting position P1b.

Further, in the second embodiment, the first mounting position P1a and the second mounting position P1b of the first stage 11 and the second stage 12 may be set upward from the passing positions P2b and P2a as necessary. The exited retreat positions P3a and P3b are the same. Accordingly, it is possible to omit the movement until the first stage 11 and the second stage 12 are retracted from the first mounting position P1a and the second mounting position P1b to the retraction positions P3a and P3b.

In addition, the transport mechanism 45 in the second embodiment is configured such that each of the first stage 11 and the second stage 12 located at each of the first mounting position P1a and the second mounting position P1b is retracted with respect to the vertical direction, but it may be As in the first embodiment, each of the first stage 11 and the second stage 12 is configured to retreat in a predetermined direction in the horizontal direction. Furthermore, in the first embodiment, each of the first stage 11 and the second stage 12 located at each of the first mounting position P1a and the second mounting position P1b may be configured to retreat with respect to the vertical direction. In addition, the structure of the retreating mechanism for retreating in the horizontal direction is simplified compared to the retreating mechanism for retreating in the vertical direction, and the positioning accuracy of the substrate 9 mounted on each of the first stage 11 and the second stage 12 can be easily maintained. Therefore, it is preferable. (Third Embodiment)

FIG. 7 is a side view schematically showing a polarized light irradiation device according to a third embodiment. The third embodiment is different from the second embodiment in an evacuation mechanism that retracts the first stage 11 and the second stage 12 located at the first mounting position P1a and the second mounting position P1b in the vertical direction.

As shown in FIG. 7, the polarized light irradiation device 1E according to the third embodiment includes a transport mechanism 55 that sets the first carrier between the first mounting position P1a, the second mounting position P1b, and the passing positions P2a, P2b. The stage 11 and the second stage 12 alternately reciprocate along the conveyance path 56. As shown in FIG. 7, the conveyance path 56 includes a guide shaft 55 a for conveying the first stage 11 and the second stage 12. The conveyance path 56 is linearly formed along the guide shaft 55a.

The polarized light irradiation device 1E according to the third embodiment includes a retreat mechanism 57 that moves the first stage 11 and the second stage 12 to retreat positions P3a and P3b that are separated from the pass positions P2a and P2b. As shown in FIG. 7, the evacuation mechanism 57 is arranged adjacent to the first mounting position P1a and the second mounting position P1b, and uses a so-called industrial robot. The retreat mechanism 57 includes an arm 57 a for transporting each of the first stage 11 and the second stage 12 in the vertical direction.

Further, when the first carrier 11 and the second carrier 12 are transported to the passing positions P2a and P2b, the evacuation mechanism 57 sets the first carrier 11 and the second carrier located at the first mounting position P1a and the second mounting position P1b. The stage 12 moves to the retreat positions P3a, P3b. The retreat mechanism 57 returns the first stage 11 located at the retreat position P3a to the first placement position P1a, and returns the second stage 12 located at the retreat position P3b to the second placement position P1b.

In addition, the first mounting position P1a is disposed with respect to the passing position P2b such that the first stage 11 located at the first mounting position P1a overlaps the entirety of the second stage 12 located at the passing position P2b on the same plane. In the same manner, the second mounting position P1b is disposed with respect to the passing position P2a such that the second stage 12 located at the second mounting position P1b is superimposed on the same plane as the entirety of the first stage 11 located at the passing position P2a. Thereby, the conveyance distance of each of the 1st stage 11 and the 2nd stage 12 which reciprocates with respect to the irradiation unit 10 is shortened further. (Effect of the third embodiment)

In the third embodiment, as in the second embodiment, it is possible to further suppress the increase in the production cycle time and the increase in the installation space compared to the first and second embodiments.

Further, in the third embodiment, although the conveyance path 56 is configured on the same plane, that is, although the conveyance path 56 is constituted only by the conveyance mechanism 55, each of the first stage 11 and the second stage 12 can be conveyed in the vertical direction. Therefore, it is not necessary to include a mechanism for transporting each of the first stage 11 and the second stage 12 in the up-down direction in the transport mechanism 55, and it is possible to suppress the complication of the transport mechanism 55. (Fourth Embodiment)

FIG. 8 is a plan view schematically showing a polarized light irradiation device according to a fourth embodiment. The fourth embodiment differs from the first embodiment in that the second stage 12 located at the second mounting position P1b and the first stage 11 located at the passing position P2a do not overlap. That is, in the fourth embodiment, among the first stage 11 and the second stage 12, only the side of the first stage 11 located at the second mounting position P1a and the second stage 12 located at the passing position P2b overlap.

As shown in FIG. 8, the polarized light irradiation device 1F according to the fourth embodiment includes a transport mechanism 65 that sets the first carrier between the first mounting position P1a, the second mounting position P1b, and the passing positions P2a, P2b. The stage 11 and the second stage 12 alternately reciprocate along the conveyance path 66. As shown in FIG. 8, the conveyance path 66 includes a guide shaft 65 a for conveying the first stage 11 and the second stage 12. The conveyance path 66 is linearly formed along the guide shaft 65a.

The first mounting position P1a is disposed with respect to the passing position P2b such that the first stage 11 located at the first mounting position P1a overlaps a part of the second stage 12 located at the passing position P2b on the same plane. Therefore, the configuration on the first stage 11 side in the fourth embodiment is the same as that in the first embodiment. Although not shown, a retraction mechanism is provided at a position adjacent to the first mounting position P1a to retreat the first stage 11 located at the first mounting position P1a to the retreat position P3a.

On the other hand, the second mounting position P1b is disposed with respect to the passing position P2a such that the second stage 12 located at the second mounting position P1b is adjacent to and does not overlap with the first stage 11 located at the passing position P2a on the same plane. Accordingly, in the polarized light irradiation device 6 according to the fourth embodiment, a retreat mechanism for retreating the second stage 12 is omitted. Further, in the polarized light irradiation device 1F according to the fourth embodiment, the transport distance of the first stage 11 to and fro with respect to the irradiation unit 10 is shorter than the transport distance of the second stage 12. (Effect of the fourth embodiment)

In the fourth embodiment, between the second mounting position P1b of the second stage 12 and the irradiation unit 10, there is a space for disposing the first stage 11 located at the passing position P2a. Therefore, in the fourth embodiment, the transport distance of the second stage 12 is longer than the transport distance of the first stage 11, and the production cycle is slower than that of the first embodiment. However, in the fourth embodiment, since it is not necessary to move the second stage 12 to the retreat position, the retreat mechanism of the second stage 12 can be reduced compared to the first embodiment.

Further, in the fourth embodiment, similarly to the first to third embodiments, the effects of suppressing the increase in the production cycle and the increase in the installation space can be obtained.

In addition, the retreat mechanism in the present embodiment uses an industrial robot or a guide rail to transport the stage in the up-down direction, but other lifting mechanisms or a mechanism that suspends the stage may be used.

Further, as the retreat mechanism, a configuration may be adopted in which the second stage located at the loading position is moved to the retreat position in cooperation with the first stage moved to the passing position. As the retreat mechanism, for example, a structure in which the second stage is pushed by the first stage moved to the passing position to move the second stage to the retracted position, or the thickness direction of the second stage may be adopted. A mechanism that rotates around a rotation axis. According to such a retreat mechanism, the mechanism or control can be simplified.

In addition, the first stage and the second stage may have a so-called alignment mechanism that performs alignment after mounting the object at the first mounting position P1 and the second mounting position P2.

Further, the first stage and the second stage may have a mounting mechanism provided with a plurality of pins or movable portions, and the object may be mounted by raising and lowering the plurality of pins or movable portions. On the first carrier and the second carrier.

Each of the embodiments described above is configured by having only one irradiation unit 10, but it is not limited to this configuration. For example, the plurality of irradiation units 10 may be arranged at predetermined intervals along the conveyance direction of the first stage and the second stage. At this time, the irradiation area A may be set not only directly below the plurality of irradiation units 10, but also an area described below, that is, from one end of the lowermost opening of the irradiation unit 10 arranged on one end side to the arrangement A region between the other ends of the lowermost opening of the irradiation unit 10 on the other end side. (Fifth Embodiment)

A polarized light irradiation device for optical alignment (hereinafter referred to as a polarized light irradiation device) 1G according to an embodiment to be described below includes an irradiation unit 10, a first stage 11 and a second stage 12, and a transport mechanism 15. The irradiation unit 10 includes an irradiation area A that irradiates polarized light toward an object. The object is mounted on the first stage 11 and the second stage 12. The conveyance mechanism 15 has a first conveyance path 19a for starting the irradiation of the first stage 11 from the first mounting position P1 on which the object is mounted on the first stage 11 to the irradiation area A adjacent to the irradiation area A. To position P3. The transport mechanism 15 has a second transport path 19b that transports the second stage 12 from the second mounting position P2 on which the object is mounted on the second stage 12 to the irradiation start position P3. The transport mechanism 15 has a third transport path 19c. One end of the third transport path 19c is connected to the irradiation start position P3, and the other end is extended by the irradiation area A to the passage position P4 adjacent to the irradiation area A. 1 carrier 11 and second carrier 12. The transport mechanism 15 reciprocates the first stage 11 along the first transport path 19a and the third transport path 19c between the first loading position P1 and the passing position P4, and moves between the second loading position P2 and the passing position P4 At this time, the second stage 12 is reciprocated along the second transport path 19b and the third transport path 19c.

The transport direction of at least one of the first transport path 19a and the second transport path 19b in the embodiment described below intersects the transport direction of the third transport path 19c on the same plane.

The first conveyance path and the second conveyance path of the embodiment to be described below are arranged side by side in the vertical direction.

FIG. 9 (a) is a side view schematically showing a polarized light irradiation device according to a fifth embodiment. FIG. 9 (b) is a side view schematically showing a polarized light irradiation device according to a fifth embodiment. 10 (a) and 10 (b) are plan views schematically showing a polarized light irradiation device according to a fifth embodiment. The polarized light irradiation device according to this embodiment is used to perform light alignment, for example, by irradiating polarized light such as linearly polarized light onto an alignment film as an object. The polarized light irradiation device according to the present embodiment is used for, for example, an alignment film of a liquid crystal panel or an alignment film of a viewing angle compensation film. (Structure of Polarized Light Irradiation Device)

As shown in FIGS. 9 (a) and 9 (b), the polarized light irradiation device 1G according to the fifth embodiment includes an irradiation unit 10, a first stage 11 and a second stage 12, and a transport mechanism 15.

In the polarized light irradiation device 1G according to the fifth embodiment, the irradiation unit 10, the "irradiated area A", the light source 10a, and the reflection plate 10b are the same constituent members as those in the first embodiment, and the same symbols as those in the first embodiment are denoted and omitted Instructions. The first stage 11 and the second stage 12 are formed in a rectangular plate shape, and a substrate 9 on which an alignment film is formed is mounted. As shown in FIG. 10 (a), a set of the first stage 11 and the second stage 12 are movably supported by the transport mechanism 15.

As shown in FIG. 10 (a), the transport mechanism 15 includes a first transport path 19 a for transporting the first stage 11, a second transport path 19 b for transporting the second stage 12, and transports the first carrier 11 and the second carrier. The third transfer path 19c of the stage 12.

As shown in FIG. 10 (b), the transport mechanism 15 includes a set of first guide shafts 15a arranged parallel to each other, and a set of second guide shafts arranged orthogonal to the first guide shaft 15a and arranged parallel to each other. 15b. Further, although not shown, the transport mechanism 15 includes a drive mechanism that transports the first stage 11 and the second stage 12 along the first guide shaft 15a and the second guide shaft 15b. The first conveyance path 19a and the second conveyance path 19b are configured by a first guide shaft 15a and are formed in a straight line shape along the X-axis direction in FIGS. 9 (b) and 10 (a). The third conveyance path 19c is linearly formed along the Y-axis direction in FIGS. 9 (a) and 10 (a) by the second guide shaft 15b, and is orthogonal to the first conveyance path 19a and the second conveyance path. Transport direction of 19b. Therefore, the first to third conveying paths 19a, 19b, and 19c are connected in a T-shape as a whole on the same plane.

As shown in FIGS. 9 (b) and 10 (b), the first transfer path 19a transfers the first stage 11 from the first mounting position P1 on which the substrate 9 is mounted on the first stage 11 to the irradiation area A adjacent to the irradiation position A. To the irradiation start position P3. The second transfer path 19b transfers the second stage 12 from the second mounting position P2 on which the substrate 9 is mounted on the second stage 12 to the irradiation start position P3. As shown in FIGS. 9 (a) and 10 (b), the third transport path 19c is connected at one end to each end portion of the first transport path 19a and the second transport path 19b, and thus one end is connected to the irradiation start position P3. The other end of the third conveyance path 19c extends through the irradiation area A to a passing position P4 adjacent to the irradiation area A. Thereby, the 3rd conveyance path 19c conveys the 1st stage 11 and the 2nd stage 12.

The transport mechanism 15 reciprocates the first stage 11 along the first transport path 19a and the third transport path 19c between the first loading position P1 and the passing position P4, and moves between the second loading position P2 and the passing position P4. At this time, the second stage 12 is reciprocated along the second transport path 19b and the third transport path 19c. (Operation of each stage during irradiation with polarized light)

The polarized light irradiating device 1G configured as described above will be described with reference to the drawings, in which the first stage 11 and the second stage 12 are transported to the irradiation unit 10 and the substrate 9 is irradiated with polarized light. 11 to 15 are schematic plan views for explaining operations of the first stage and the second stage in the polarized light irradiation apparatus according to the fifth embodiment.

First, as shown in FIGS. 10 (a) and 10 (b), the substrate 9 is mounted on the first stage 11 located at the first mounting position P1. Then, as shown in FIG. 11, the first stage 11 is transported by the transport mechanism 15 from the first mounting position P1 to the irradiation start position P3 along the first transport path 19 a. Then, the first stage 11 is transported by the transport mechanism 15 from the irradiation start position P3 along the third transport path 19 c to the passing position P4 through the irradiation area A of the irradiation unit 10. At this time, the first stage 11 passes through the irradiation area A, and thereby irradiates the alignment film of the substrate 9 with a predetermined amount of polarized light.

Next, as shown in FIG. 11, the first stage 11 is transported by the transport mechanism 15 from the passing position P4 to the irradiation start position P3 along the third transport path 19 c through the irradiation area A. At this time, the first stage 11 passes through the irradiation area A again to irradiate the alignment film of the substrate 9 with a predetermined amount of polarized light, and then the irradiation of the polarized light is completed. Therefore, the irradiation start position P3 also corresponds to the irradiation end position. Hereinafter, for convenience of explanation, the irradiation start position P3 is also referred to as an irradiation end position P3.

Then, as shown in FIG. 12, the first stage 11 is transported from the irradiation end position P3 to the first mounting position P1 along the first transport path 19 a. At this time, in association with the movement of the first stage 11 from the irradiation end position P3 (the irradiation start position P3) toward the first mounting position P1, the second stage 12 moves from the second mounting position P2 toward the irradiation start position P3, and moves along The second transport path 19b is transported.

The timing of starting the transfer of the second stage 12 is linked to the movement of the first stage 11 from the irradiation end position P3 to the first mounting position P1, and the second stage 12 moves from the second mounting position P2 to the irradiation start position. The operation of starting the movement of P3 is preferable from the viewpoint of shortening the production cycle. In addition, if necessary, after the first stage 11 returns from the irradiation end position P3 to the first mounting position P1, the second stage 12 may start moving from the second mounting position P2 toward the irradiation start position P3.

Therefore, during the operation in which the first stage 11 reciprocates between the first mounting position P1 and the irradiation end position P3 through the irradiation area A, the substrate 9 is mounted on the second stage 12 located at the second mounting position P2.

Then, as shown in FIG. 13, the second stage 12 is transported by the transport mechanism 15 from the second mounting position P2 to the irradiation start position P3 along the second transport path 19 b, and then is transported from the irradiation start position P3 along the third The path 19c is transported to the passing position P4 through the irradiation area A. Then, the second stage 12 is transported to the irradiation start position P3 (the irradiation end position P3) by the transport mechanism 15 along the third transport path 19c from the passing position P4 and passing through the irradiation area A. At this time, the second stage 12 reciprocates in the irradiation area A, and thereby irradiates the alignment film of the substrate 9 with a predetermined amount of polarized light.

Further, as shown in FIG. 13, during the operation in which the second stage 12 reciprocates between the second mounting position P2 and the irradiation end position P3 through the irradiation area A, the first stage has returned to the first mounting position P1 from the first stage. The stage 11 collects the substrate 9 whose irradiation has been completed, and mounts the next substrate 9 on the first stage 11.

Next, as shown in FIG. 14, the second stage 12 is moved from the irradiation end position P3 to the second mounting position P2, and the first stage 11 on which the next substrate 9 is mounted is mounted from the first. The position P1 is conveyed toward the irradiation start position P3.

As described above, as shown in FIG. 15, after the first stage 11 is transported from the first mounting position P1 to the irradiation start position P3 along the first transport path 19 a, the first stage 11 is moved from the irradiation start position P3 to the third stage. The transport path 19c is transported to the passing position P4 through the irradiation area A. The first stage 11 is transported to the irradiation start position P3 (the irradiation end position P3) by the transport mechanism 15 along the third transport path 19c from the passing position P4 and passing through the irradiation area A. In the same manner as described above, during the operation in which the first stage 11 reciprocates between the first mounting position P1 and the irradiation end position P3 through the irradiation area A, the second stage has returned from the second mounting position P2 to the second mounting position P2. The stage 12 collects the substrate 9 whose irradiation has been completed, and mounts the next substrate 9 on the second stage 12.

Thereafter, the polarizing light is irradiated to the alignment film of the substrate 9 on the first stage 11 and the polarizing light is irradiated to the alignment film of the substrate 9 on the second stage 12 alternately and repeatedly. (Effect of the fifth embodiment)

The transport mechanism 15 in the fifth embodiment includes a first transport path 19a to transport the first stage 11 from the first mounting position P1 to the irradiation start position P3, and a second stage 12 from the second mounting position P2. The second conveyance path 19b up to the irradiation start position P3. The transport mechanism 15 has a third transport path 19c. One end of the third transport path 19c is connected to the irradiation start position P3 and the other end extends to the passage position P4 to transport the first stage 11 and the second stage 12. In addition, the transport mechanism 15 reciprocates the first stage 11 along the first transport path 19a and the third transport path 19c between the first mounting position P1 and the passing position P4, and moves between the second mounting position P2 and the passing position. Between P4, the second stage 12 is reciprocated along the second transport path 19b and the third transport path 19c.

Thereby, it is possible to carry out the second second carrier in cooperation with the operation until one of the first stages 11 (the second stage 12) returns from the irradiation end position P3 to the first mounting position P1 (the second mounting position P2). The stage 12 (first stage 11) is transferred from the second mounting position P2 (first mounting position P1) to the irradiation start position P3. Therefore, a part of the conveyance operation of the first stage 11 and a part of the conveyance operation of the second stage 12 are performed simultaneously, so that the production cycle can be shortened. In other words, since the irradiation start position P3 (the irradiation end position P3) of the first stage 11 and the irradiation start position P3 (the irradiation end position P3) of the second stage 12 are the same position, it is possible to suppress the production cycle from becoming longer.

When the first mounting position and the second mounting position are arranged on both sides of the irradiation area of the irradiation unit, the transport path for transporting the first stage and the second stage has a long shape extending linearly. However, according to the fifth embodiment, by arranging the first mounting position P1 and the second mounting position P2 on one end side of the irradiation area A, it is possible to avoid the need for a long installation space (slim installation space). Therefore, an increase in the installation space can be suppressed.

Therefore, according to the fifth embodiment, it is possible to suppress an increase in the production cycle and to suppress an increase in the installation space of the entire device.

Furthermore, in the fifth embodiment, since the transport directions of the first transport path 19a and the second transport path 19b intersect with the transport direction of the third transport path 19c on the same plane, it is not necessary to transport the first stage in the vertical direction. The mechanisms of 11 and the second stage 12 can suppress the complication of the transport mechanism 15. (Sixth embodiment)

16 is a plan view schematically showing a polarized light irradiation device according to a sixth embodiment. The sixth embodiment is different from the fifth embodiment in the arrangement of the first conveyance path for conveying the first stage 11 and the arrangement of the second conveyance path for conveying the second stage 12.

As shown in FIG. 16, the polarized light irradiation device 1H according to the sixth embodiment includes a first transfer path 29 a for transferring the first stage 11, a second transfer path 29 b for transferring the second stage 12, and a first stage. The third transfer path 29c of 11 and the second stage 12. The first conveyance path 29a, the second conveyance path 29b, and the third conveyance path 29c are configured in a linear shape.

One end of the third transport path 29c is connected to the first transport path 29a and the second transport path 29b, and the other end extends to the passing position P4. The second conveyance path 29b and the third conveyance path 29c are connected so as to be continuous in a straight line. The first transfer path 29a is connected to the third transfer path 29c so as to be orthogonal to the transfer directions of the second transfer path 29b and the third transfer path 29c on the same plane. (Effect of the sixth embodiment)

In the sixth embodiment, as in the fifth embodiment, it is possible to suppress an increase in the production cycle and an increase in the installation space of the entire device.

Furthermore, in the sixth embodiment, the transport directions of the first transport path 29a and the second transport path 29b also intersect with the transport direction of the third transport path 29c on the same plane. Therefore, it is not necessary to transport the first transport path in the vertical direction. The mechanisms of the stage 11 and the second stage 12 can easily constitute the transport mechanism 15.

In the sixth embodiment, the first mounting position P1 and the second mounting position P2 are arranged close to each other. By adopting such a structure, an object mounting mechanism (not shown) for mounting the object on the first stage 11 at the first mounting position P1 and the second stage 12 at the second mounting position P2 can be achieved. Since the object mounting mechanism (not shown) in which the object is mounted is shared, it is possible to suppress an increase in the object mounting mechanism.

In the sixth embodiment, the first stage 11 and the second stage 12 are configured to carry two stages, but may be configured to transport three or more stages as necessary. In this case, for example, in the sixth embodiment, the third mounting position of the third stage and the transport of the third stage may be arranged at a position opposite to the first mounting position P1 of the first stage 11. path. (Modification of the sixth embodiment)

FIG. 17 is a plan view schematically showing a polarized light irradiation device according to a modification of the sixth embodiment. The modification of the sixth embodiment is different from the sixth embodiment in the arrangement of the second transport path for transporting the second stage 12.

As shown in FIG. 17, a polarized light irradiation device 1J according to a modification of the sixth embodiment includes a first transfer path 39 a for transferring the first stage 11, a second transfer path 39 b for transferring the second stage 12, and a transfer first The third carrier path 39 c of the first stage 11 and the second stage 12. The first conveyance path 39a, the second conveyance path 39b, and the third conveyance path 39c are configured in a linear shape.

One end of the third conveyance path 39c is connected to the first conveyance path 39a and the second conveyance path 39b, and the other end extends to the passing position P4. The first conveying path 39a, the second conveying path 39b, and the third conveying path 39c are centered on the irradiation start position P3 (the irradiation end position P3) and extend radially in a direction crossing each other, and one ends are connected to each other. Therefore, the first conveyance path 39a, the second conveyance path 39b, and the third conveyance path 39c are connected in a Y-shape as a whole on the same plane. (Effect of Modification of the Sixth Embodiment)

Also in the modification of the sixth embodiment, similar to the sixth embodiment, it is possible to suppress the production cycle from becoming longer.

Furthermore, in the modification of the sixth embodiment, the transport directions of the first transport path 39a and the second transport path 39b also intersect with the transport direction of the third transport path 39c on the same plane, so that it is not necessary to transport in the vertical direction. The mechanisms of the first stage 11 and the second stage 12 can suppress the complication of the transport mechanism 15.

In a modification of the sixth embodiment, the first mounting position P1 and the second mounting position P2 are also arranged close to each other. By adopting such a structure, an object mounting mechanism (not shown) for mounting the object on the first stage 11 at the first mounting position P1 and the second stage 12 at the second mounting position P2 can be achieved. Since the object mounting mechanism (not shown) in which the object is mounted is shared, it is possible to suppress an increase in the object mounting mechanism. (Seventh embodiment)

Fig. 18 (a) is a side view schematically showing a polarized light irradiation device according to a seventh embodiment. FIG. 18 (b) is a plan view schematically showing a polarized light irradiation device according to a seventh embodiment. The seventh embodiment is different from the fifth embodiment and the sixth embodiment in the arrangement of the first conveyance path for conveying the first stage 11 and the arrangement of the second conveyance path for conveying the second stage 12.

As shown in FIGS. 18 (a) and 18 (b), the polarized light irradiation device 1K according to the seventh embodiment includes a first transfer path 49 a for transferring the first stage 11 and a second transfer for transferring the second stage 12. A path 49b and a third transport path 49c for transporting the first stage 11 and the second stage 12. The first conveyance path 49a, the second conveyance path 49b, and the third conveyance path 49c are formed in a linear shape.

One end of the third conveyance path 49c is connected to the first conveyance path 49a and the second conveyance path 49b, and the other end extends to the passing position P4. As shown in FIG. 18 (a), the first conveyance path 49a and the second conveyance path 49b are arranged side by side in the vertical direction. In other words, the first stage 11 located at the first mounting position P1 and the second stage 12 located at the second mounting position P2 are arranged side by side in the vertical direction. The first conveyance path 49a and the second conveyance path 49b are connected to the third conveyance path 49c in a linear continuous manner as shown in FIG. 18 (b).

In addition, the first conveying path 49a and the second conveying path 49b are arranged so as to overlap when viewed from a direction facing the mounting surfaces of the first stage 11 and the second stage 12, so that the entire installation space of the device can be provided. reduce. In addition, the first conveying path 49a and the second conveying path 49b may be arranged in a direction facing the mounting surfaces of the first stage 11 and the second stage 12 as required by the restriction of the arrangement or the simplification of the transport mechanism. Locations that do not coincide when viewed. (Effect of the seventh embodiment)

In the seventh embodiment, since the first conveying path 49a and the second conveying path 49a are arranged side by side in the up-down direction, compared with the fifth and sixth embodiments, the installation space of the entire device can be further reduced. It is possible to further suppress an increase in the installation space. That is, the seventh embodiment is preferable when it is difficult to secure the installation space with respect to the horizontal direction, and it is possible to further suppress the increase in the installation space with respect to the installation in-plane direction serving as the horizontal direction.

Furthermore, in the seventh embodiment, as in the fifth or sixth embodiment, it is possible to suppress an increase in the production cycle.

In each of the embodiments described above, the first transport path to the third transport path, which are configured in a linear shape, are connected, but are not limited to this configuration. For example, at least one of the first conveyance path and the second conveyance path may be connected to one end of the third conveyance path in an arc shape. The smoothness of the conveyance operation can also be improved by smoothly connecting the first conveyance path and the third conveyance path, and the second conveyance path and the third conveyance path.

In addition, the first stage and the second stage may have a so-called alignment mechanism that performs alignment after mounting an object at the first mounting position P1 and the second mounting position P2.

The first stage and the second stage may have a mounting mechanism provided with a plurality of pins or movable parts, and the objects are mounted on the first stage and the second stage by raising and lowering the plurality of pins or movable parts. Carrier.

Each of the embodiments described above is configured by having only one irradiation unit 10, but it is not limited to this configuration. For example, a plurality of irradiation units 10 may be provided at a predetermined interval along the transport direction of the third transport path. At this time, the irradiation area A may be set not only directly below the plurality of irradiation units 10, but also as an area from the end of the opening of the lowermost surface of the irradiation unit 10 arranged on one end side to An area between the other ends of the openings on the lowermost surface of the irradiation unit 10 on the other end side.

Although the embodiments of the present invention have been described, the embodiments are merely examples and are not intended to limit the scope of the present invention. The embodiment can be implemented in various other forms, and various omissions, substitutions, and changes can be made without departing from the gist of the invention. The embodiment and its modifications are included in the scope or spirit of the present invention, and are also included in the invention described in the scope of patent application and its equivalent scope.

1A ～ 1H, 1J ～ 1K‧‧‧polarized light irradiation device

9‧‧‧ substrate

10‧‧‧ irradiation unit

10a‧‧‧light source

10b‧‧‧Reflector

11‧‧‧ the first carrier

12‧‧‧Second carrier

15, 25, 35, 45, 55, 65‧‧‧ transport institutions

25a, 35a, 45a, 55a, 65a‧‧‧Guide shaft

15a‧‧‧1st guide shaft

15b‧‧‧ 2nd guide shaft

16, 26, 36, 46, 56, 66‧‧‧ transport route

17, 57‧‧‧Retreat agencies

17a, 57a‧‧‧arm

19a, 29a, 39a, 49a ‧‧‧ 1st transfer route

19b, 29b, 39b, 49b ‧‧‧ 2nd transport route

19c, 29c, 39c, 49c

A‧‧‧ Irradiated area

P1a, P1‧‧‧ the first mounting position

P1b, P2‧‧‧ 2nd mounting position

P2a, P2b, P4

P3a, P3b‧‧‧Retreat position

P3‧‧‧ irradiation start position (end of irradiation position)

FIG. 1 is a side view schematically showing a polarized light irradiation device for light alignment according to a first embodiment. FIG. 2 is a plan view schematically showing a polarized light irradiation device for light alignment according to the first embodiment. FIG. 3 is a plan view schematically showing a polarized light irradiation device for light alignment according to a modification of the first embodiment. FIG. 4 is a plan view schematically showing a polarized light irradiation device for light alignment according to a modification of the first embodiment. 5 is a side view schematically showing a polarized light irradiation device for light alignment according to a second embodiment. FIG. 6 is a plan view schematically showing a polarized light irradiation device for light alignment according to a second embodiment. 7 is a side view schematically showing a polarized light irradiation device for light alignment according to a third embodiment. FIG. 8 is a plan view schematically showing a polarized light irradiation device for optical alignment according to a fourth embodiment. 9 (a) and 9 (b) are side views schematically showing a polarized light irradiation device for light alignment according to a fifth embodiment. 10 (a) and 10 (b) are plan views schematically showing a polarized light irradiation device for optical alignment according to a fifth embodiment. FIG. 11 is a schematic plan view for explaining the operation of the first stage and the second stage in the polarized light irradiation device for optical alignment according to the fifth embodiment. FIG. 12 is a schematic plan view for explaining the operation of the first stage and the second stage in the polarized light irradiation device for optical alignment according to the fifth embodiment. FIG. 13 is a schematic plan view for explaining the operation of the first stage and the second stage in the polarized light irradiation device for optical alignment according to the fifth embodiment. FIG. 14 is a schematic plan view for explaining the operation of the first stage and the second stage in the polarized light irradiation device for optical alignment according to the fifth embodiment. FIG. 15 is a schematic plan view for explaining the operation of the first stage and the second stage in the polarized light irradiation device for optical alignment according to the fifth embodiment. FIG. 16 is a plan view schematically showing a polarized light irradiation device for optical alignment according to a sixth embodiment. 17 is a plan view schematically showing a modification of the polarized light irradiation device for light alignment according to the sixth embodiment. FIGS. 18 (a) and 18 (b) are a side view and a plan view schematically showing a polarized light irradiation device for light alignment according to a seventh embodiment.

Claims (7)

A polarized light irradiation device for optical alignment, comprising: an irradiating unit having an irradiation area for irradiating polarized light toward an object; a first stage and a second stage having a first mounting position on which the object is mounted; And a second loading position; a transfer mechanism having at least one transfer path connecting the first loading position and the second loading position through the irradiation area, and in the loading position and the first stage And the second stage passes through the irradiation area and is adjacent to the passing position of the irradiation area, so that the first stage and the second stage are alternately along the at least one transport path, Reciprocating; and a retreat mechanism that causes at least one of the first carrier and the second carrier located in the first mounting position and the second mounting position to be transported to another station on the other carrier. When the passing position is moved, the vehicle is moved to a retreat position away from the passing position, and the mounting position is disposed with respect to the passing position so that the at least one carrier located at the first mounting position and the second mounting position is located.台 、 和 在 所At least a part of the other stage of the passing position is overlapped on the same plane, and both ends of the transport path where the first mounting position and the second mounting position are arranged are connected to the irradiation area and the The direction of the passing position is curved on the same plane. A polarized light irradiation device for light alignment, comprising: an irradiating unit having an irradiation area for irradiating polarized light toward an object; The first stage and the second stage are provided with a first mounting position and a second mounting position on which the object is mounted; and a transfer mechanism includes a connection between the first mounting position and the second mounting position through the irradiation area. At least one conveying path of a loading position, between the loading position and a passing position where the first stage and the second stage pass through the irradiation area and are adjacent to the irradiation area, The first stage and the second stage alternately reciprocate along the at least one conveyance path; and a retreat mechanism for the first stage positioned at the first mounting position and the second mounting position. And when at least one of the second carriers is transferred to the passing position, the other carrier is moved to a retreat position away from the passing position, and the mounting position is arranged relative to the passing position So that the at least one stage at the first mounting position and the second mounting position and at least a part of another stage at the passing position overlap the first stage and The second stage is from the first mounting position The second mounting position is retracted relative to the vertical direction. The polarized light irradiation device for light alignment according to item 1 or item 2 of the scope of the patent application, wherein at least one of the first carrier and the second carrier is the first mounting position and the first carrier. The second mounting position is disposed with respect to the passing position such that, on the same plane, when at least one of the first stage and the second stage is located in the first mounting position and the first stage, In the 2 mounting position, it overlaps the entirety of the other stage of the first stage and the second stage that are located at the passing position. The polarized light irradiation device for light alignment according to item 1 or item 2 of the scope of the patent application, wherein the retreat mechanism causes at least one of the first carrier and the second carrier to follow One of the first carrier and the second carrier is moved to the retreat position in the same direction as the transport direction of the reciprocating transport. A polarized light irradiation device for optical alignment, comprising: an irradiating unit having an irradiation area for irradiating polarized light toward an object; a first stage and a second stage having a first mounting position where the object is mounted; And a second loading position; and a transfer mechanism having at least one transfer path connecting the first loading position and the second loading position through the irradiation area, and in the loading position and the first loading position The stage and the second stage are adjacent to the passing position of the irradiation area through the irradiation area, so that the first stage and the second stage are alternately along the at least one transport path While reciprocating, the conveyance path includes a first conveyance path for conveying the first stage from a first placement position where the object is placed on the first stage to a position adjacent to the irradiation area. Irradiation start position; a second transfer path from the second mounting position where the object is mounted on the second stage to the second stage to the irradiation start position; and a third transfer path , One end is connected to the irradiation opening The first position and the other end extend through the irradiation area to a passing position adjacent to the irradiation area, and the first carrier and the second carrier are transported, and the transport mechanism is at the first Between one of the mounting position and the second mounting position and the passing position, the first stage and the second stage One of the stages is reciprocated along the first conveying path and the third conveying path, and is between the other carrying position of the first carrying position and the second carrying position and the passing position. In the meantime, the other stage of the first stage and the second stage is reciprocated along the second transport path and the third transport path. The polarized light irradiation device for optical alignment according to item 5 of the scope of patent application, wherein at least one of the first and second transport paths has a transport direction and a transport direction of the third transport path The directions intersect on the same plane. According to the polarized light irradiation device for light alignment according to item 5 of the scope of the patent application, the first transport path and the second transport path are arranged side by side in the vertical direction.