JP2016035520A - Photo-orientation device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a light irradiation device capable of reducing an operation time for a process of treating a workpiece.SOLUTION: A photo-orientation device 1 has the following configuration: a pair of workpiece collection stages PU1, PU2 provided at both end parts; a light irradiator 5 provided at a center part; and a pair of workpiece mounting stages PL1, PL2 provided between each of the workpiece collection stages PU1, PU2 and the light irradiator 5 and in the vicinity of both ends E1, E2 of the light irradiator 5.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a photo-alignment apparatus that performs photo-alignment by irradiating a workpiece with polarized light.

  2. Description of the Related Art Conventionally, a photo-alignment device that includes a light source and a polarizer, polarizes light from the light source with this polarizer and irradiates the photo-alignment film (work), and photo-aligns the photo-alignment film (for example, , See Patent Document 1). In this photo-alignment apparatus, a relatively large photo-alignment film is photo-aligned by placing and transporting the photo-alignment film on a stage (see, for example, Patent Document 1).

JP 2002-350858 A

However, in the photo-alignment apparatus, it is desired to reduce the work time of the workpiece processing.
This invention is made | formed in view of the situation mentioned above, and aims at providing the light irradiation apparatus which can shorten the process work time of the process of a workpiece | work.

  In order to achieve the above-described object, the optical alignment apparatus of the present invention has a pair of workpiece collection stages provided at both ends, a light irradiator at the center, and between the workpiece collection stage and the light irradiator. In addition, a pair of work mounting stages are provided in the vicinity of both ends of the light irradiator.

  In the above-described configuration, the workpiece is reciprocated in the order of the workpiece mounting stage on the one end side, the irradiation region of the light irradiator in the central portion, and the workpiece collection stage on the one end side, and the workpiece mounting stage on the other end side, the central portion A transport mechanism that reciprocates the workpiece in the order of the irradiation region of the light irradiator and the workpiece recovery stage on the other end side, and the transport mechanism moves the other workpiece into the workpiece when the one workpiece passes through the irradiation region. You may evacuate from the mounting stage.

  In the above-described configuration, a robot apparatus for mounting a workpiece on a workpiece mounting stage may be provided, and the robot apparatus may be configured to be able to hold two workpieces.

  In the above-described configuration, the transport mechanism may be configured to be able to change the moving speed of the workpiece before and after the workpiece passes through the irradiation region.

  Further, the photo-alignment apparatus of the present invention is provided with a light irradiator at the center, a pair of work mounting stages are provided at positions near both ends of the light irradiator, a work mounting stage on one end side, and light irradiation at the center. The workpiece is reciprocated in the order of the irradiation area of the detector and the workpiece mounting stage on the one end side, the workpiece mounting stage on the other end side, the irradiation area of the central light irradiation unit, and the workpiece mounting stage on the other end side. And a transfer mechanism that reciprocates the workpiece, and the transfer mechanism is configured to retract the other workpiece from the workpiece mounting stage when the one workpiece passes through the irradiation region.

  According to the present invention, a pair of workpiece recovery stages are provided at both ends, a light irradiator is provided at the center, and a pair is provided between the workpiece recovery stage and the light irradiator and at positions near both ends of the light irradiator. Since the workpiece mounting stage is provided, the work time of the workpiece processing can be shortened.

It is a top view which shows typically the optical orientation system provided with the optical orientation apparatus which concerns on the 1st Embodiment of this invention. It is a front view which shows a photo-alignment apparatus typically. It is a figure which shows the structure of a polarizer unit, (A) is a top view, (B) is a sectional side view. It is a top view which shows the structure of a photo-alignment irradiation system typically, (A) is explanatory drawing of the movement state of a 1st and 2nd work stage, (B) is a photo-alignment target object to a 1st and 2nd work stage. The block diagram of the state which mounts is shown. It is a top view which shows the structure of a photo-alignment irradiation system typically, (A) is explanatory drawing of the movement state of a 1st and 2nd work stage, (B) is the state of moving the 1st and 2nd work stage. A block diagram is shown. It is a top view which shows the structure of a photo-alignment irradiation system typically, (A) is explanatory drawing of the movement state of a 1st and 2nd work stage, (B) is a 1st workpiece | work during the movement of a 2nd work stage. The block diagram of the state which collect | recovers a photo-alignment target object from a stage is shown. It is a top view which shows the structure of a photo-alignment irradiation system typically, (A) is explanatory drawing of the movement state of a 1st and 2nd work stage, (B) is a 1st workpiece | work during the movement of a 2nd work stage. The block diagram of the state which mounts a photo-alignment target object on a stage is shown. It is a top view which shows the structure of a photo-alignment irradiation system typically, (A) is explanatory drawing of the movement state of a 1st and 2nd work stage, (B) is the state of moving the 1st and 2nd work stage. A block diagram is shown. It is a top view which shows the structure of a photo-alignment irradiation system typically, (A) is explanatory drawing of the movement state of a 1st and 2nd work stage, (B) is a 2nd work during the movement of a 1st work stage. The block diagram of the state which collect | recovers a photo-alignment target object from a stage is shown. It is a top view which shows the structure of a photo-alignment irradiation system typically, (A) is explanatory drawing of the movement state of a 1st and 2nd work stage, (B) is a 2nd work during the movement of a 1st work stage. The block diagram of the state which mounts a photo-alignment target object on a stage is shown. It is a top view which shows the structure of a photo-alignment irradiation system typically, (A) is explanatory drawing of the movement state of a 1st and 2nd work stage, (B) is the state of moving the 1st and 2nd work stage. A block diagram is shown. It is a top view which shows the structure of a photo-alignment irradiation system typically, (A) is explanatory drawing of the movement state of a 1st and 2nd work stage, (B) is a 1st workpiece | work during the movement of a 2nd work stage. The block diagram of the state which collect | recovers a photo-alignment target object from a stage is shown. It is a top view which shows typically the optical orientation system provided with the optical orientation apparatus which concerns on the 2nd Embodiment of this invention. It is a top view which shows the structure of a photo-alignment irradiation system typically, (A) is explanatory drawing of the movement state of a 1st and 2nd work stage, (B) is a photo-alignment target object to a 1st and 2nd work stage. The block diagram of the state which mounts is shown. It is a top view which shows the structure of a photo-alignment irradiation system typically, (A) is explanatory drawing of the movement state of a 1st and 2nd work stage, (B) is the state of moving the 1st and 2nd work stage. A block diagram is shown. It is a top view which shows the structure of a photo-alignment irradiation system typically, (A) is explanatory drawing of the movement state of a 1st and 2nd work stage, (B) is the state of moving the 1st and 2nd work stage. A block diagram is shown. It is a top view which shows the structure of a photo-alignment irradiation system typically, (A) is explanatory drawing of the movement state of a 1st and 2nd work stage, (B) is a 1st workpiece | work during the movement of a 2nd work stage. The block diagram of the state which collect | recovers and mounts a photo-alignment target object from a stage is shown. It is a top view which shows the structure of a photo-alignment irradiation system typically, (A) is explanatory drawing of the movement state of a 1st and 2nd work stage, (B) is the state of moving the 1st and 2nd work stage. A block diagram is shown. It is a top view which shows the structure of a photo-alignment irradiation system typically, (A) is explanatory drawing of the movement state of a 1st and 2nd work stage, (B) is a 2nd work during the movement of a 1st work stage. The block diagram of the state which collect | recovers and mounts a photo-alignment target object from a stage is shown. It is a top view which shows the structure of a photo-alignment irradiation system typically, (A) is explanatory drawing of the movement state of a 1st and 2nd work stage, (B) is the state of moving the 1st and 2nd work stage. A block diagram is shown.

<First Embodiment>
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
FIG. 1 is a plan view schematically showing a photo-alignment system including the photo-alignment device according to the first embodiment, and FIG. 2 is a front view schematically showing the photo-alignment device.
As shown in FIGS. 1 and 2, the optical alignment system 100 includes an optical alignment device 1, a carry-in / out device 20, an upstream robot device 30, a cleaner 40, a turn unit (angle adjustment device) 50, and a downstream. A side robot device 60 and a control device (control unit) 70 are provided. This photo-alignment system 100 is disposed in an environment with relatively few foreign matters, such as a clean room.
The photo-alignment apparatus 1 is a light irradiation apparatus that performs photo-alignment by irradiating polarized light onto a photo-alignment film of a plate-shaped or band-shaped photo-alignment target (work) W formed in a rectangular shape in plan view. The optical alignment apparatus 1 includes a work stage (transfer stage, support member) 2, a stage transfer frame 3, an irradiator installation frame 4, and a light irradiator 5.

The work stage 2 is, for example, a substantially square plate-like stage, and is provided in a pair on the stage transport frame 3. The work stage 2 holds the photo-alignment target object W by placing the photo-alignment target object W on the upper surface by the downstream robot device 60. The pair of work stages 2 are formed in the same shape, and each work stage 2 is formed in a size capable of arranging the photo-alignment object W.
The irradiator installation base 4 is a portal body that is horizontally mounted in the width direction of the stage transfer base 3 (a direction perpendicular to the linear movement direction X of a linear movement mechanism described later) at an upper position that is a predetermined distance away from the stage transfer base 3. Yes, both the pillars are fixed to the stage carrier 3. The irradiator installation base 4 is formed on the light shielding wall except for the part where the work stage 2 enters and exits. The irradiator installation base 4 includes a light irradiator 5, and the light irradiator 5 irradiates polarized light directly below. In order to separate the vibration caused by the movement of the work stage 2 from the vibration caused by the cooling of the light irradiator 5, the irradiator installation base 4 is not fixed to the stage transport base 3, but the stage transport base 3 A separate configuration may also be used. The stage conveyance base 3 and the irradiator installation base 4 may have a vibration isolation structure.

  A linear motion mechanism that moves the work stage 2 along the linear motion direction X so as to pass directly under the light irradiator 5 along the linear motion direction X under control of the control device 70. (Conveyance mechanism) 6 is provided inside. In the photo-alignment of the photo-alignment target object W, the photo-alignment target object W placed on the work stage 2 is transferred along the linear motion direction X by the linear motion mechanism 6 and directly below the light irradiator 5. The light alignment film is aligned by being exposed to polarized light during the passage. The linear motion mechanism 6 is configured to be able to change the speed at which the work stage 2 is moved. The linear motion mechanism 6 of the present embodiment is configured as, for example, a linear motor type or a belt drive type, but is not limited thereto, and various mechanisms can be used.

As shown in FIG. 2, the light irradiator 5 includes a housing 7 having a light emission opening 7A on the lower surface, a lamp (light source) 8 and a reflecting mirror 9 arranged in the housing, and a light emission opening 7A. The polarizer unit 10 is provided.
The casing 7 is supported by the irradiator installation base 4 at an upper position away from the photo-alignment target W by a predetermined distance. The lamp 8 is a straight tube type (bar-shaped) ultraviolet lamp that extends at least as long as the length of the photo-alignment object W in the longitudinal direction. That is, the long axis L of the lamp 8 coincides with the direction orthogonal to the linear motion direction X. The lamp 8 is a discharge lamp and lights up based on the control of the control device 70. The reflecting mirror 9 is a cylindrical concave reflecting mirror having an elliptical cross section and extending along the longitudinal direction of the lamp 8. The reflecting mirror 9 collects the light from the lamp 8 and irradiates it toward the polarizer unit 10 from the light exit opening 7 </ b> A. .

The light emission opening 7 </ b> A is a rectangular opening formed directly below the lamp 8 in a plan view, and is provided such that the longitudinal direction thereof coincides with the longitudinal direction of the lamp 8. Although not shown, a wavelength selection filter for selecting the wavelength of light to be transmitted is provided inside the light emission opening 7A, and the light irradiator 5 emits light of a desired wavelength by the wavelength selection filter. It is supposed to be. In this embodiment, the wavelength selection filter is provided. However, when the lamp 8 itself can emit light having a desired wavelength, the wavelength selection filter may be omitted.
In the present embodiment, the housing 7 is provided close to the photo-alignment object W, and the size of the light exit opening 7A corresponds to the size of the irradiation region R. The central axis of the irradiation region R coincides with the long axis L of the lamp 8.

  The stage transport base 3 is provided with a rotation drive mechanism (not shown) that is provided corresponding to each work stage 2 and that rotates the work stage 2. Under the control of the control device 70, this rotational drive mechanism is such that the photo-alignment object W has a pair of sides of the photo-alignment object W aligned (parallel) to the long axis L of the lamp 8, and the photo-alignment object The work stage 2 is rotated to finely adjust the angle of the photo-alignment object W so that the other pair of sides of W is in a normal posture orthogonal to the long axis L of the lamp 8. Further, when the polarization axis angle of the polarized light necessary for irradiation of the photo-alignment target W is a predetermined angle with respect to the long axis L of the lamp 8, the rotation drive mechanism rotates the work stage 2 by a predetermined angle.

3A and 3B are diagrams illustrating the configuration of the polarizer unit 10, in which FIG. 3A is a plan view and FIG. 3B is a side sectional view.
As shown in FIG. 4, the polarizer unit 10 includes a plurality of unit polarizer units 12 and a frame 14 that aligns the unit polarizer units 12 side by side and in a line. The frame 14 is a plate-like frame body in which the unit polarizer units 12 are connected and arranged. The unit polarizer unit 12 includes a wire grid polarizer (polarizer) 16 formed in a substantially rectangular plate shape.
In this embodiment, each unit polarizer unit 12 supports the wire grid polarizer 16 so that the wire direction A is parallel to the linear motion direction X, and the direction orthogonal to the wire direction A and the wire grid polarizer. The 16 arrangement directions B coincide with each other.

The wire grid polarizer 16 is a kind of linear polarizer and has a grid formed on the surface of a substrate. As described above, since the lamp 8 is rod-shaped, light of various angles is incident on the wire grid polarizer 16. However, the wire grid polarizer 16 linearly polarizes light that is incident obliquely. Through.
The wire grid polarizer 16 is supported by the unit polarizer unit 12 so that the direction of the polarization axis C1 can be finely adjusted by rotating in the plane with the normal direction as the rotation axis. That is, the plurality of wire grid polarizers 16 are arranged with a gap therebetween so that the direction of the polarization axis C1 can be finely adjusted.

The stage carrier 3 is provided with a measurement unit 18 that detects polarized light and measures the polarization direction of the polarized light and the extinction ratio under the control of the control device 70. Based on the polarization direction of the polarized light measured by the measurement unit 18, the direction of the polarization axis C1 of the wire grid polarizer 16 is adjusted.
With respect to all the unit polarizer units 12, the polarization axis C <b> 1 of the wire grid polarizer 16 is finely adjusted so as to align with a predetermined irradiation reference direction, so that the polarization axis C <b> 1 extends over the entire length of the polarizer unit 10 in the long axis direction. Is obtained with high accuracy, and high-quality optical alignment is possible. The wire grid polarizer 16 with the polarization axis C1 adjusted is fixedly arranged on the frame 14 by fixing the upper and lower ends of the unit polarizer unit 12 to the frame 14 with screws (fixing means) 19.

  As shown in FIG. 1, the carry-in / out device 20 includes a main body 21 provided in parallel to the stage transport frame 3, and includes a mounting table 22 on which a plurality of optical alignment objects W are mounted. . The optical alignment target W is carried into the mounting table 22 from the outside, and the photo-aligned optical alignment target W is mounted on the mounting table 22 and is transported from the mounting table 22 to the next processing apparatus. . In the present embodiment, four mounting tables 22 are provided, but the number of mounting tables 22 is not limited to this, and for example, a loading table 22 and a loading table 22 are provided. It may be.

  The upstream robot apparatus 30 includes a surface plate 31 provided in parallel to the stage carrier 3, a robot 32 supported by the surface plate 31, and a reciprocating drive mechanism that reciprocates the robot 32 along the linear motion direction X. 33. The robot 32 includes an arm 32A that can rotate and extend and a holding unit 32B that is fixed to the arm 32A and holds the optical alignment target W. The arm 32A is supported by the surface plate 31 so as to be rotatable in a horizontal plane. The arm 32A of the present embodiment is a multi-joint arm that has a plurality of pivotable joints and is configured to be telescopic, but the configuration of the arm 32A is not limited to this. Under the control of the control device 70, the robot 32 moves in the linear motion direction X and moves the arm 32 </ b> A, and delivers the optical alignment target W between the carry-in / out device 20, the cleaner 40, and the turn unit 50. .

  The cleaner 40 includes a surface plate 41 provided parallel to and adjacent to the surface plate 31 of the upstream robot apparatus 30, a cleaning unit 42 that removes foreign matter on the surface of the optical alignment target W, and the optical alignment target W And a moving mechanism 43 that moves toward the cleaning unit 42. The cleaning unit 42 is provided above the surface plate 41 along a direction orthogonal to the linear movement direction X (the direction of the long axis L). The cleaning unit 42 is configured to be able to blow out gas such as air from below based on the control of the control device 70. The moving mechanism 43 is a mechanism that moves the optical alignment target object W so as to pass on the surface of the surface plate 41 along the linear movement direction X under the control of the control device 70, for example, It is configured as a belt type.

  The photo-alignment target object W is transferred along the linear movement direction X by the moving mechanism 43 and passes directly under the cleaning unit 42, and gas is blown during this passage and adheres to the photo-alignment target object W. Foreign matter is removed. Although not shown, the cleaner 40 is provided with a static eliminator that removes static electricity. The cleaner 40 also removes static electricity from the photo-alignment object W. In this embodiment, the cleaner 40 includes the moving mechanism 43. However, if the cleaning unit 42 is configured to be able to blow gas over the entire surface of the photo-alignment film of the photo-alignment target W, this movement is performed. The mechanism 43 may be omitted. Further, instead of the moving mechanism 43 that moves the optical alignment target W, a moving mechanism (not shown) that can move the cleaning unit 42 in the linear motion direction X may be provided.

  The turn unit 50 is provided adjacent to the surface plate 31 of the upstream robot apparatus 30 and in parallel with the cleaner 40. The turn unit 50 includes an adjustment stage 51 on which the optical alignment target W is placed and the angle of the optical alignment target W is adjusted based on the control of the control device 70. In the turn unit 50, the pair of sides of the photo-alignment target W is aligned (parallel) with the long axis L of the lamp 8, and the other pair of sides of the photo-alignment target W is with respect to the long axis L of the lamp 8. Then, the angle of the photo-alignment target object W is adjusted so as to have a normal posture orthogonal to each other.

  The downstream robot apparatus 60 includes a surface plate 61 provided in parallel to the stage conveyance platform 3, a robot 62 supported by the surface plate 61, and a reciprocating drive mechanism that reciprocates the robot 62 along the linear motion direction X. 63. The robot 62 includes a rotatable and extendable arm 62A and a pair of holding portions 62B that are fixed to the arm 62A and hold the optical alignment target W. The arm 62A is rotatably supported on the surface plate 61 in a horizontal plane. The arm 62A of the present embodiment is a multi-joint arm that has a plurality of pivotable joints and is configured to be stretchable, but the configuration of the arm 62A is not limited to this. The holding unit 62B is configured by arranging a plurality of holding bars 62B1 in parallel, and the photo-alignment object W is arranged and held on these holding bars 62B1. In the present embodiment, the pair of holding portions 62B are provided vertically, and the robot 62 is configured to be able to hold the two optical alignment objects W vertically in parallel. A pair of holding portions 62B may be provided horizontally in parallel. Under the control of the control device 70, the robot 62 moves in the linear motion direction X and moves the arm 62 </ b> A, and delivers the optical alignment target W between the pair of work stages and the turn unit 50.

The work stage 2 of the optical alignment apparatus 1 is provided with a plurality of drive pins (not shown) for transferring the optical alignment object W to and from the downstream robot apparatus 60. These drive pins are arranged at intervals between the plurality of holding bars 62B1 so as to hold the photo-alignment object W, and are moved up and down by a pin drive mechanism (not shown). The drive pin protrudes from the upper surface of the work stage 2 to receive the photo-alignment target object W from the downstream robot apparatus 60 and is then housed in the work stage 2, so that the photo-alignment target object W becomes the upper surface of the work stage 2. Placed on. Further, the drive pin protrudes from the upper surface of the work stage 2, whereby the optical alignment target W is separated from the work stage 2 and is held by the downstream robot device 60. With these drive pins, the optical alignment target W can be delivered between the work stage 2 and the downstream robot apparatus 60 while maintaining the angle of the optical alignment target W adjusted by the turn unit 50.
The light orientation device 1, the carry-in / out device 20, the upstream robot device 30, the cleaner 40 and the turn unit 50, and the downstream robot device 60 are arranged in parallel to each other in the major axis L direction of the lamp 8. Yes.

The control device 70 is a control unit that controls the entire optical alignment system 100, and includes a storage unit 71 that stores a control program that controls each unit such as the linear motion mechanism 6, and an execution unit 72 that executes the control program. Yes. The control program can be configured to be readable by a computer, and the control device 70 can be implemented by causing the personal computer to execute the control program, for example.
Although the optical alignment system 100 includes the carry-in / out device 20 and the upstream robot device 30, the carry-in / out device 20 and the upstream robot device 30 may be configured as a supply system different from the optical alignment system 100. Good. In this case, the control device for the light alignment system 100 and the supply system may be provided. For example, the control device for the light alignment system 100 and the supply system may be provided separately, and the control devices may cooperate with each other.

Next, the mounting position and the collection position of the optical alignment target W with respect to the pair of work stages 2 will be described.
Here, for convenience of explanation, one work stage 2 is referred to as a first work stage 2A, and the other work stage 2 is referred to as a second work stage 2B.
As shown in FIG. 1, the mounting position (work mounting stage) PL1 of the optical alignment target object W on the first work stage 2A and the recovery position (work recovery stage) of the optical alignment target object W from the first work stage 2A PU1 is set on one end E1 side of the light irradiator 5, and the positions thereof are different from each other. More specifically, the mounting position PL1 is set between the collection position PU1 and the light irradiator 5 and in the vicinity of one end E1 of the light irradiator 5.

Similarly, the mounting position (work mounting stage) PL2 of the optical alignment target object W on the second work stage 2B and the recovery position (work recovery stage) PU2 of the optical alignment target object W from the second work stage 2B are: It is set on the other end E2 side of the light irradiator 5, and the positions are different. More specifically, the mounting position PL2 is set between the collection position PU2 and the light irradiator 5 and in the vicinity of the other end E2 of the light irradiator 5.
In FIG. 1, the work stage 2 at the mounting positions PL1, PL2 is indicated by a solid line, and the work stage 2 at the collection positions PU1, PU2 is indicated by a two-dot chain line. Moreover, in FIGS. 4-12, mounting position PL1, PL2 and collection | recovery position PU1, PU2 shall attach and show a code | symbol to those centers.

Between the first work stage 2A located at the mounting position PL1 and the irradiation region R, a space S1 less than the amount by which the optical alignment target W on the second work stage 2B passes through the irradiation region R is provided. .
Similarly, between the second work stage 2B located at the mounting position PL2 and the irradiation region R, a space S1 less than the amount by which the photo-alignment target W on the first work stage 2A passes through the irradiation region R is provided. It has been.
Further, a space S2 that is equal to or larger than the amount of the light alignment target W on the second work stage 2B passing through the irradiation region R is provided between the first work stage 2A located at the collection position PU1 and the irradiation region R. ing.
Similarly, between the second work stage 2B located at the collection position PU2 and the irradiation region R, a space S2 that is equal to or larger than the amount of the light alignment target W on the first work stage 2A passing through the irradiation region R is provided. It has been.

The cleaner 40 is disposed on one end E1 side, and the turn unit 50 is disposed on the other end E2 side so that the center of the optical alignment target W on the adjustment stage 51 coincides with the center of the mounting position PL2. The positions of the cleaner 40 and the turn unit 50 may be interchanged. In this case, the turn unit 50 may be arranged so that the center of the optical alignment target W on the adjustment stage 51 coincides with the center of the mounting position PL1.
The downstream robot device 60 moves the robot 62 from a position corresponding to the recovery position PU1 of the first work stage 2A (a position substantially the same in the linear movement direction X) to a position corresponding to the recovery position PU2 of the second work stage 2B. It is formed to a movable length.

Next, the operation of the optical alignment system 100 will be described with reference to FIGS. 1 and 4 to 12. 4-12, illustration of the carrying in / out apparatus 20 and the upstream robot apparatus 30 is abbreviate | omitted.
In the initial state, as shown in FIGS. 1 and 4, the first work stage 2A and the second work stage 2B are positioned at the mounting positions PL1 and PL2, respectively, and the robot 62 is positioned at a position corresponding to the mounting position PL2. The lamp 8 is lit. In the following description, the operation of the drive pin when receiving the optical alignment target W with respect to the first work stage 2A and the second work stage 2B, and the optical alignment on the first work stage 2A and the second work stage 2B. The operation of the rotation drive mechanism when the object W is placed is omitted. Further, the photo-alignment object W is referred to as photo-alignment objects WA, WB, WC, WD, WE, and WF in the order in which the photo-alignment is performed. Further, in FIG. 4, reference numeral D1 indicates a center movement range of the first work stage 2A, and reference numeral D2 indicates a center movement range of the second work stage 2B.

First, the robot 32 receives the photo-alignment target object WA from the loading / unloading device 20, removes foreign matter and static electricity from the photo-alignment target object WA by the cleaner 40, and then moves the photo-alignment target object WA onto the adjustment stage 51 of the turn unit 50. Placed on. At this time, the robot 32 moves between the cleaner 40 and the turn unit 50.
After the turn unit 50 puts the photo-alignment target object WA in the normal posture, the robot 62 receives the photo-alignment target object WA from the turn unit 50, moves to the position corresponding to the mounting position PL1, and moves the photo-alignment target object WA. It is mounted on the first work stage 2A at the mounting position PL1.

On the other hand, after placing the photo-alignment target object WA on the adjustment stage 51 of the turn unit 50, the robot 32 receives the next photo-alignment target object WB from the carry-in / out device 20, and the cleaner 40 uses the cleaner 40 for the photo-alignment target object WB. After removing the foreign matter and static electricity, the optical alignment target WB is placed on the adjustment stage 51 of the turn unit 50.
In addition, after mounting the optical alignment target object WA on the first work stage 2A, the robot 62 moves to a position corresponding to the mounting position PL2, receives the next optical alignment target object WB from the turn unit 50, The alignment object WB is mounted on the second work stage 2B at the mounting position PL2.

As shown in FIG. 5, the linear motion mechanism 6 moves the first work stage 2 </ b> A toward the other end E <b> 2 and irradiates the light alignment target object WA with polarized light. At this time, the linear motion mechanism 6 moves the first work stage 2A at a high speed until the photo-alignment target object WA enters the irradiation region R, and when the photo-alignment target object WA enters the irradiation region R, the linear motion mechanism 6 moves the first work stage 2A. Move at low speed.
Further, during the forward movement of the first work stage 2A, the linear movement mechanism 6 retracts the second work stage 2B to the collection position PU2 at high speed. As described above, by retracting the second work stage 2B to the recovery position PU2, even if the first work stage 2A moves until the photo-alignment target object WA passes through the irradiation region R, the photo-alignment target object WA is photo-aligned. Interference with the object WB can be prevented. Therefore, photo-alignment can be performed over the entire surface of the photo-alignment target object WA on the first work stage 2A.
On the other hand, after placing the optical alignment target WB on the adjustment stage 51 of the turn unit 50, the robot 32 receives the next optical alignment target WC from the carry-in / out device 20, and the cleaner 40 uses the cleaner 40 to set the optical alignment target WC. After removing the foreign matter and static electricity, the optical alignment target WC is placed on the adjustment stage 51 of the turn unit 50.
In addition, the robot 62 receives the next optical alignment target WC from the turn unit 50 after mounting the optical alignment target WB on the second work stage 2B.

When the photo-alignment target object WA passes through the irradiation region R in the forward path, the linear motion mechanism 6 reverses the first work stage 2A and moves to one end E1 side as shown in FIG. Polarized light is also emitted on the return path. Further, the linear motion mechanism 6 follows the movement of the first work stage 2A in the return path, moves the second work stage 2B to one end E1, and irradiates the optical alignment target WB with polarized light. At this time, the linear motion mechanism 6 moves the second work stage 2B at high speed until it catches up with the first work stage 2A (becomes a predetermined distance from the first work stage 2A), and catches up with the first work stage 2A. 2 Move the work stage 2B at a low speed. Further, the linear motion mechanism 6 moves the first work stage 2A at a low speed until the photo-alignment target object WA passes through the irradiation area R, and collects the first work stage 2A when the photo-alignment target object WA passes through the irradiation area R. Move at high speed to position PU1. Accordingly, the first work stage 2A can be retracted to the collection position PU1 while the second work stage 2B is moving in the forward path. Therefore, even if the photo-alignment target WB moves through the irradiation region R through the second work stage 2B, it is possible to prevent the photo-alignment target WB from interfering with the photo-alignment target WA. Therefore, the second work stage 2B Photoalignment can be performed over the entire surface of the upper photoalignment object WB.
The robot 62 moves to a position corresponding to the collection position PU1, and collects the optical alignment target object WA from the first work stage 2A at the collection position PU1. At this time, the robot 62 holds two optical alignment objects WA and WC.
On the other hand, after placing the optical alignment target WC on the adjustment stage 51 of the turn unit 50, the robot 32 receives the next optical alignment target WD from the carry-in / out device 20, and the cleaner 40 receives the optical alignment target WD. After removing the foreign matter and static electricity, the optical alignment target WD is placed on the adjustment stage 51 of the turn unit 50.

When the optical alignment target WB passes through the irradiation region R in the forward path, the linear motion mechanism 6 reverses the second work stage 2B and moves to the other end E2 side as shown in FIG. In the return path, polarized light is irradiated. Further, the linear motion mechanism 6 moves the first work stage 2A to the mounting position PL1 following the movement of the second work stage 2B in the return path. At this time, the linear motion mechanism 6 moves the second work stage 2B at a low speed until the photo-alignment target WB passes through the irradiation region R, and moves the first work stage 2A at a high speed to the mounting position PL1.
The robot 62 moves to a position corresponding to the mounting position PL1, and mounts the optical alignment target WC on the first work stage 2A at the mounting position PL1. At this time, the robot 62 holds the optical alignment target object WA.
In addition, the optical alignment target WD is waiting in the turn unit 50.
On the other hand, after placing the optical alignment target WD on the adjustment stage 51 of the turn unit 50, the robot 32 receives the next optical alignment target WE from the carry-in / out device 20, and receives the optical alignment target WE by the cleaner 40. Remove foreign matter and static electricity.

As shown in FIG. 8, the linear motion mechanism 6 moves the first work stage 2 </ b> A so as to follow the return path of the second work stage 2 </ b> B. At this time, the linear motion mechanism 6 moves the first work stage 2A at high speed until it catches up with the second work stage 2B (becomes a predetermined distance from the second work stage 2B). Further, the linear motion mechanism 6 moves the second work stage 2B at a high speed when the photo-alignment target WB passes through the irradiation region R.
The robot 62 moves to a position corresponding to the mounting position PL2, receives the next optical alignment target WD from the turn unit 50, and places the optical alignment target WA on the adjustment stage 51 of the turn unit 50.
After the turn unit 50 places the photo-alignment target object WA in the normal posture, the robot 32 receives the photo-alignment target object WA from the turn unit 50 and returns the photo-alignment target object WA to the loading / unloading device 20.
In addition, the photo-alignment object WE is waiting on the cleaner 40.

As shown in FIG. 9, the linear motion mechanism 6 further moves on the first work stage 2 </ b> A, and the optical alignment target WC is irradiated with polarized light. At this time, the linear motion mechanism 6 moves the first work stage 2A at a low speed until the photo-alignment target WC passes through the irradiation region R, and moves the second work stage 2B when the photo-alignment target WB passes through the irradiation region R. It moves at high speed to the collection position PU2.
The robot 62 moves to a position corresponding to the collection position PU2, and collects the optical alignment target WB from the second work stage 2B at the collection position PU2. At this time, the robot 62 holds two optical alignment objects WB and WD.
On the other hand, after the photo-alignment target object WA is taken out from the turn unit 50, the robot 32 receives the photo-alignment target object WE from the cleaner 40 and places the photo-alignment target object WE on the adjustment stage 51 of the turn unit 50. .

As shown in FIG. 10, the linear motion mechanism 6 moves the second work stage 2B at a high speed to the mounting position PL2 by following the movement of the first work stage 2A in the return path. At this time, the linear motion mechanism 6 moves the first work stage 2A at a low speed until the photo-alignment target WC passes through the irradiation region R.
The robot 62 moves to a position corresponding to the mounting position PL2 and mounts the optical alignment target WD on the second work stage 2B at the mounting position PL2. At this time, the robot 62 holds the optical alignment target WB.
In addition, the photo-alignment target object WE is waiting in the turn unit 50.
On the other hand, after placing the optical alignment target WE on the adjustment stage 51 of the turn unit 50, the robot 32 receives the next optical alignment target WF from the carry-in / out device 20, and receives the optical alignment target WF by the cleaner 40. Remove foreign matter and static electricity.

As shown in FIG. 11, the linear motion mechanism 6 moves the second work stage 2B following the movement of the first work stage 2A in the return path, and applies polarized light to the optical alignment target WD on the second work stage 2B. Is irradiated. At this time, the linear motion mechanism 6 moves the first work stage 2A at a high speed when the photo-alignment target WC passes through the irradiation region R. The linear motion mechanism 6 moves the second work stage 2B at high speed until it catches up with the first work stage 2A.
The robot 62 receives the next optical alignment target WE from the turn unit 50 and places the optical alignment target WB on the adjustment stage 51 of the turn unit 50.
After the turn unit 50 sets the photo-alignment target object WB to the normal posture, the robot 32 receives the photo-alignment target object WB from the turn unit 50 and returns the photo-alignment target object WB to the carry-in / out device 20.
Further, the optical alignment target WF is waiting on the cleaner 40.

As shown in FIG. 12, the linear motion mechanism 6 moves the first work stage 2A at a high speed to the collection position PU1 when the first work stage 2A moves in the return path. The linear motion mechanism 6 moves the second work stage 2B at a low speed until the photo-alignment target WD passes through the irradiation region R.
The robot 62 moves to a position corresponding to the collection position PU1, and collects the optical alignment target WC from the first work stage 2A at the collection position PU1. At this time, the robot 62 holds two optical alignment objects WC and WE.
On the other hand, after the photo-alignment object WB is taken out from the turn unit 50, the robot 32 receives the photo-alignment object WF from the cleaner 40 and places the photo-alignment object WF on the adjustment stage 51 of the turn unit 50. .
Subsequent operations are repeated from FIG.

As described above, according to the present embodiment, the photo-alignment apparatus 1 includes a pair of recovery positions PU1 and PU2 provided at both ends, a light irradiator 5 provided in the center, and the recovery positions PU1 and PU2 A pair of mounting positions PL1 and PL2 are provided between the light irradiators 5 and in the vicinity of both ends E1 and E2 of the light irradiator 5. As described above, since the two work stages 2 are provided, the other work stage 2 is moved so as to follow the movement of the one work stage 2, whereby the photo-alignment object W is processed (photo-alignment irradiation). Process work time can be shortened.
Further, since a pair of mounting positions PL1, PL2 are provided between the collection positions PU1, PU2 and the light irradiator 5 and in the vicinity of both ends E1, E2 of the light irradiator 5, the mounting positions PL1, PL2 The distance to the light irradiator 5 can be shortened. Thereby, the movement time of the photo-alignment target object W can be shortened. As a result, the process work time of the process (photo-alignment irradiation) of the photo-alignment target object W can be shortened. Moreover, since the distance from mounting position PL1, PL2 to the light irradiation device 5 can be shortened, it can suppress that a foreign material adheres to the photo-alignment target object W before irradiation.

  Further, according to the present embodiment, the optical alignment target W is reciprocated in the order of the mounting position PL1 on one end side, the irradiation region R of the light irradiator 5 in the center, and the collection position PU1 on the one end side. A linear motion mechanism 6 that reciprocates the workpiece in the order of the mounting position PL2 on the end side, the irradiation region R of the light irradiator 5 in the central portion, and the collection position PU2 on the other end side is provided. When the photo-alignment target object W passes through the irradiation region R, the other photo-alignment target object W is retracted from the mounting positions PL1 and PL2. With this configuration, even if one photo-alignment target W moves until it passes through the irradiation region R, it is possible to prevent one photo-alignment target W from interfering with the other photo-alignment target W. Photo-alignment can be performed over the entire surface of the object W.

  Moreover, according to this embodiment, the downstream robot apparatus 60 which mounts the optical alignment target object W in the work stage 2 of mounting position PL1, PL is provided, and the downstream robot apparatus 60 attaches two optical alignment target objects W to it. It was configured to be holdable. With this configuration, the next photo-alignment object W can be held in advance, so that the photo-alignment object W is recovered from the work stage 2 and mounted immediately on the work stage 2. be able to. As a result, it is possible to shorten the process work time of processing (photo-alignment irradiation) of the photo-alignment object W.

  Further, according to the present embodiment, the linear motion mechanism 6 is configured to be able to change the moving speed of the photo-alignment target object W before and after the photo-alignment target object W passes through the irradiation region R. With this configuration, even if one photo-alignment object W is mounted on the mounting positions PL1 and PL2 in the vicinity of both ends E1 and E2 of the light irradiator 5, the one photo-alignment object W is used as the other photo-alignment object. Can catch up with W. As a result, there is no need to wait for the mounting of the photo-alignment target object W, and the process work time for processing the photo-alignment target object W (photo-alignment irradiation) can be shortened.

<Second Embodiment>
Next, a second embodiment will be described.
FIG. 13 is a plan view schematically showing a photo-alignment system provided with a photo-alignment device according to the second embodiment.
In the optical alignment system 100 according to the first embodiment described above, the mounting positions PL1 and PL2 are set between the collection positions PU1 and PU2 and the light irradiator 5, but in the optical alignment system 200 according to the second embodiment. As shown in FIG. 13, the collection positions PU1, PU2 and the mounting positions PL1, PL2 are set at the same location.
More specifically, the optical alignment target W on the second work stage 2B passes through the irradiation region R between the first work stage 2A located at the mounting position PL1 (recovery position PU1) and the irradiation region R. A space S1 of less than a minute is provided.
Similarly, between the second work stage 2B located at the mounting position PL2 (recovery position PU2) and the irradiation region R, the light alignment target W on the first work stage 2A is less than the amount passing through the irradiation region R. The space S1 is provided.

The robot device 260 moves the robot 62 from the position corresponding to the mounting position PL1 (collection position PU1) of the first work stage 2A (position substantially the same in the linear motion direction X) to the mounting position PL2 (collection) of the second work stage 2B. The length is formed so as to be movable to a position corresponding to the position PU2).
In the second embodiment, the configuration is substantially the same except for the positions of the collection positions PU1 and PU2 and the length of the robot device 260 in the linear motion direction X. Therefore, the same reference numerals are used for the same parts as in the first embodiment. A description thereof will be omitted.

Next, the operation of the optical alignment system 200 will be described with reference to FIGS. 14 to 20, illustration of the carry-in / out device 20 and the upstream robot device 30 is omitted.
In the initial state, as shown in FIGS. 13 and 14, the first work stage 2A and the second work stage 2B are positioned at the mounting positions PL1 and PL2, respectively, and the robot 62 is positioned at a position corresponding to the mounting position PL2. The lamp 8 is lit. In the following description, the operation of the drive pin when receiving the optical alignment target W with respect to the first work stage 2A and the second work stage 2B, and the optical alignment on the first work stage 2A and the second work stage 2B. The operation of the rotation drive mechanism when the object W is placed is omitted. Further, the photo-alignment object W is referred to as photo-alignment objects WA, WB, WC, WD, WE, and WF in the order in which the photo-alignment is performed. Further, in FIG. 14, reference numeral D1 indicates a center movement range of the first work stage 2A, and reference numeral D2 indicates a center movement range of the second work stage 2B.

First, the robot 32 receives the photo-alignment target object WA from the loading / unloading device 20, removes foreign matter and static electricity from the photo-alignment target object WA by the cleaner 40, and then moves the photo-alignment target object WA onto the adjustment stage 51 of the turn unit 50. Placed on. At this time, the robot 32 moves between the cleaner 40 and the turn unit 50.
After the turn unit 50 puts the photo-alignment target object WA in the normal posture, the robot 62 receives the photo-alignment target object WA from the turn unit 50, moves to the position corresponding to the mounting position PL1, and moves the photo-alignment target object WA. It is mounted on the first work stage 2A at the mounting position PL1.

On the other hand, after placing the photo-alignment target object WA on the adjustment stage 51 of the turn unit 50, the robot 32 receives the next photo-alignment target object WB from the carry-in / out device 20, and the cleaner 40 uses the cleaner 40 for the photo-alignment target object WB. After removing the foreign matter and static electricity, the optical alignment target WB is placed on the adjustment stage 51 of the turn unit 50.
In addition, after mounting the optical alignment target object WA on the first work stage 2A, the robot 62 moves to a position corresponding to the mounting position PL2, receives the next optical alignment target object WB from the turn unit 50, The alignment object WB is mounted on the second work stage 2B at the mounting position PL2.

As shown in FIG. 15, the linear motion mechanism 6 moves the first work stage 2 </ b> A to the other end E <b> 2 side, and the light alignment target object WA is irradiated with polarized light. At this time, the linear motion mechanism 6 moves the first work stage 2A at a high speed until the photo-alignment target object WA enters the irradiation region R, and when the photo-alignment target object WA enters the irradiation region R, the linear motion mechanism 6 moves the first work stage 2A. Move at low speed.
Further, during the forward movement of the first work stage 2A, the linear movement mechanism 6 retracts the second work stage 2B from the mounting position PL2 to the retreat position PT2 at a high speed. Between the second work stage 2B positioned at the retreat position PT2 and the irradiation region R, a space S2 that is equal to or larger than the amount of the light alignment target object WA on the first work stage 2A passing through the irradiation region R is provided. . As described above, by retracting the second work stage 2B to the retreat position PT2, even if the first work stage 2A moves until the photo-alignment object WA passes through the irradiation region R, the photo-alignment object WA is photo-aligned. Interference with the object WB can be prevented. Therefore, photo-alignment can be performed over the entire surface of the photo-alignment target object WA on the first work stage 2A.
On the other hand, after placing the optical alignment target WB on the adjustment stage 51 of the turn unit 50, the robot 32 receives the next optical alignment target WC from the carry-in / out device 20, and the cleaner 40 uses the cleaner 40 to set the optical alignment target WC. After removing the foreign matter and static electricity, the optical alignment target WC is placed on the adjustment stage 51 of the turn unit 50.

When the photo-alignment target object WA passes through the irradiation region R in the forward path, the linear motion mechanism 6 reverses the first work stage 2A and moves to the one end E1 side as shown in FIG. Polarized light is also emitted on the return path. Further, the linear motion mechanism 6 follows the movement of the first work stage 2A in the return path, moves the second work stage 2B to one end E1, and irradiates the optical alignment target WB with polarized light. At this time, the linear motion mechanism 6 moves the second work stage 2B at high speed until it catches up with the first work stage 2A (becomes a predetermined distance from the first work stage 2A), and catches up with the first work stage 2A. 2 Move the work stage 2B at a low speed. Further, the linear motion mechanism 6 moves the first work stage 2A at a low speed until the photo-alignment target object WA passes through the irradiation region R, and when the photo-alignment target object WA passes through the irradiation region R, the first work stage 2A is retracted. It moves to the position PT1 at high speed. Between the first work stage 2A located at the retreat position PT1 and the irradiation region R, a space S2 that is equal to or larger than the amount of the optical alignment target WB on the second work stage 2B passing through the irradiation region R is provided. . Accordingly, the first work stage 2A can be retracted to the retreat position PT1 during the movement of the second work stage 2B in the forward path. Therefore, even if the photo-alignment target WB moves through the irradiation region R through the second work stage 2B, it is possible to prevent the photo-alignment target WB from interfering with the photo-alignment target WA. Therefore, the second work stage 2B Photoalignment can be performed over the entire surface of the upper photoalignment object WB.
On the other hand, the robot 62 receives the next optical alignment target WC from the turn unit 50 after mounting the optical alignment target WB on the second work stage 2B. Then, the robot 62 moves to a position corresponding to the mounting position PL1.
In addition, after placing the optical alignment target WC on the adjustment stage 51 of the turn unit 50, the robot 32 receives the next optical alignment target WD from the carry-in / out device 20, and receives the optical alignment target WD by the cleaner 40. After removing the foreign matter and static electricity, the optical alignment target WD is placed on the adjustment stage 51 of the turn unit 50.

When the optical alignment target WB passes through the irradiation region R in the forward path, the linear motion mechanism 6 reverses the second work stage 2B and moves to the other end E2 side as shown in FIG. In the return path, polarized light is irradiated. Further, the linear motion mechanism 6 moves the first work stage 2A to the mounting position PL1 following the movement of the second work stage 2B in the return path. At this time, the linear motion mechanism 6 moves the second work stage 2B at a low speed until the photo-alignment target WB passes through the irradiation region R, and moves the first work stage 2A at a high speed to the mounting position PL1.
The robot 62 collects the optical alignment target object WA from the first work stage 2A at the mounting position PL1, and mounts the optical alignment target object WC on the first work stage 2A at the mounting position PL1. At this time, the robot 62 holds the optical alignment target object WA.
In addition, the optical alignment target WD is waiting in the turn unit 50.
On the other hand, after placing the optical alignment target WD on the adjustment stage 51 of the turn unit 50, the robot 32 receives the next optical alignment target WE from the carry-in / out device 20, and receives the optical alignment target WE by the cleaner 40. Remove foreign matter and static electricity.

As shown in FIG. 18, the linear movement mechanism 6 moves the first work stage 2A following the movement of the return path of the second work stage 2B, and the light alignment target WC is irradiated with polarized light. At this time, the linear motion mechanism 6 moves the first work stage 2A at high speed until it catches up with the second work stage 2B (becomes a predetermined distance from the second work stage 2B), and the photo-alignment target WC is irradiated with the irradiation region R. The first work stage 2 </ b> A is moved at a low speed until it passes through. Further, the linear motion mechanism 6 moves the second work stage 2B at a high speed to the retracted position PT2 when the photo-alignment target WB passes through the irradiation region R.
The robot 62 moves to a position corresponding to the mounting position PL2, receives the next optical alignment target WD from the turn unit 50, and places the optical alignment target WA on the adjustment stage 51 of the turn unit 50.
After the turn unit 50 places the photo-alignment target object WA in the normal posture, the robot 32 receives the photo-alignment target object WA from the turn unit 50 and returns the photo-alignment target object WA to the loading / unloading device 20.
In addition, the photo-alignment object WE is waiting on the cleaner 40.

As shown in FIG. 19, the linear motion mechanism 6 moves the second work stage 2B to the mounting position PL2 following the movement of the first work stage 2A in the return path. At this time, the linear motion mechanism 6 moves the first work stage 2A at a low speed until the photo-alignment target WC passes through the irradiation region R, and moves the second work stage 2B at a high speed to the mounting position PL2.
The robot 62 collects the optical alignment target WB from the second work stage 2B at the mounting position PL2 and mounts the optical alignment target WD on the second work stage 2B at the mounting position PL2. At this time, the robot 62 holds the optical alignment target WB.
In addition, the photo-alignment target object WE is waiting in the turn unit 50.
On the other hand, after the photo-alignment target object WA is taken out from the turn unit 50, the robot 32 receives the photo-alignment target object WE from the cleaner 40 and places the photo-alignment target object WE on the adjustment stage 51 of the turn unit 50. .
In addition, after placing the optical alignment target WE on the adjustment stage 51 of the turn unit 50, the robot 32 receives the next optical alignment target WF from the carry-in / out device 20, and the cleaner 40 receives the optical alignment target WF. Remove foreign matter and static electricity.

As shown in FIG. 20, the linear motion mechanism 6 moves the second work stage 2B following the movement of the return path of the first work stage 2A, and applies polarized light to the optical alignment target WD on the second work stage 2B. Is irradiated. At this time, the linear motion mechanism 6 moves the second work stage 2B at a high speed until it catches up with the first work stage 2A, and moves the second work stage 2B at a low speed until the optical alignment target WD passes through the irradiation region R. . Further, the linear motion mechanism 6 moves the first work stage 2A at a high speed to the retreat position PT1 when the photo-alignment target WC passes through the irradiation region R.
The robot 62 receives the next optical alignment target WE from the turn unit 50 and places the optical alignment target WB on the adjustment stage 51 of the turn unit 50.
After the turn unit 50 sets the photo-alignment target object WB to the normal posture, the robot 32 receives the photo-alignment target object WB from the turn unit 50 and returns the photo-alignment target object WB to the carry-in / out device 20.
Further, the optical alignment target WF is waiting on the cleaner 40.
Subsequent operations are repeated from FIG.

  As described above, according to the present embodiment, the photo-alignment apparatus 1 is provided with the light irradiator 5 at the center, and the pair of mounting positions PL1 and PL2 are located near the both ends E1 and E2 of the light irradiator 5. The optical alignment target W is reciprocated in the order of the mounting position PL1 on one end side, the irradiation region R of the light irradiator 5 in the center, and the mounting position PL1 on one end side, and the mounting position on the other end side. The linear motion mechanism 6 that reciprocates the photo-alignment object W in the order of PL2, the irradiation region R of the light irradiator 5 at the center, and the mounting position PL2 on the other end side is provided. When the object W passes through the irradiation region R, the other optical alignment object W is retracted from the mounting positions PL1 and PL2. As described above, since the two work stages 2 are provided, the other work stage 2 is moved so as to follow the movement of the one work stage 2, whereby the photo-alignment object W is processed (photo-alignment irradiation). Process work time can be shortened.

Further, since the pair of mounting positions PL1 and PL2 are provided in the vicinity of both ends E1 and E2 of the light irradiator 5, the distance from the mounting positions PL1 and PL2 to the light irradiator 5 can be shortened. The moving time of the object W can be shortened. As a result, it is possible to shorten the process work time of processing (photo-alignment irradiation) of the photo-alignment object W. Moreover, since the distance from mounting position PL1, PL2 to the light irradiation device 5 can be shortened, it can suppress that a foreign material adheres to the photo-alignment target object W before irradiation.
Furthermore, since a pair of collection positions PU1 and PU2 is provided in the vicinity of both ends E1 and E2 of the light irradiator 5, the distance between the light irradiator 5 and the collection positions PU1 and PU2 can be shortened. The moving time of the object W can be shortened. As a result, it is possible to shorten the process work time of processing (photo-alignment irradiation) of the photo-alignment object W. Moreover, since the distance from the light irradiator 5 to the collection positions PU1 and PU2 can be shortened, it is possible to prevent foreign matter from adhering to the photo-alignment object W after irradiation.
In addition, since the pair of mounting positions PL1, PL2 and the pair of collection positions PU1, PU2 are provided in the vicinity of both ends E1, E2 of the light irradiator 5, the moving distance of the robot 62 of the robot apparatus 260 can be shortened. Therefore, the space occupied by the robot apparatus 260 can be reduced.

  Further, the linear motion mechanism 6 is configured such that when one optical alignment target W passes through the irradiation region R, the other optical alignment target W is retracted from the mounting positions PL1 and PL2. With this configuration, even if one photo-alignment target W moves until it passes through the irradiation region R, it is possible to prevent one photo-alignment target W from interfering with the other photo-alignment target W. Photo-alignment can be performed over the entire surface of the object W.

  In the present embodiment, the retracted positions PT1 and PT2 are provided outside the mounting positions PL1 and PL2 in the linear movement direction X. However, the retracted positions PT1 and PT2 are provided as long as they do not interfere with the mounting positions PL1 and PL2. It is not limited. The retreat positions PT1 and PT2 may be provided, for example, above, below, or on the side of the mounting positions PL1 and PL2 (for example, on the upper side in FIG. 13).

However, the above-described embodiment is an aspect of the present invention, and it is needless to say that the embodiment can be appropriately changed without departing from the gist of the present invention.
For example, in the above-described embodiment, the work stage 2 that supports the photo-alignment target object W is provided, but the support member that supports the photo-alignment target object W is not limited to the work stage 2, for example, The pin etc. which support the lower surface, side surface, etc. of the photo-alignment target object W may be sufficient.

  Further, in the above-described embodiment, the photo-alignment irradiation is performed on both the forward path and the return path, but the photo-alignment irradiation may be performed only on one of the forward path and the return path.

  Moreover, although the light source was demonstrated as the lamp 8 in the above-mentioned embodiment, it is not limited to this, A light emitting element, such as LED and organic EL, may be sufficient as a light source. In this case, the long axis (axis line) L may be configured by arranging a plurality of light emitting elements on a straight line. Further, the light emitted from the light source is not limited to ultraviolet rays.

Moreover, in the above-mentioned embodiment, although the polarizer unit 10 was comprised with the several wire grid polarizer 16, the wire grid polarizer 16 may be one.
In the above-described embodiment, the wire grid polarizer 16 is used as the polarizer. However, the polarizer may be a polarizer using a vapor deposition film, for example.

  In the above-described embodiment, one downstream robot device 60, 260 is provided for the mounting positions PL1, PL2, but the downstream robot devices 60, 260 may be provided at the mounting positions PL1, PL2, respectively.

1 optical alignment device 5 light irradiator 6 linear motion mechanism (reciprocating mechanism)
60,260 Robotic device 100,200 Optical alignment system E1 One end E2 Other end PU1, PU2 Collection position (work collection stage)
PL1, PL2 mounting position (work loading stage)
W Optical alignment object (work)

Claims (5)

  A pair of workpiece collection stages are provided at both ends, a light irradiator is provided at the center, and a pair of workpiece mounting stages is provided between the workpiece collection stage and the light irradiator, near both ends of the light irradiator. A photo-alignment device characterized in that: While reciprocating the workpiece in the order of the workpiece mounting stage on the one end side, the irradiation area of the central light irradiation device, the workpiece recovery stage on the one end side, the workpiece mounting stage on the other end side, the light irradiation device on the central portion Equipped with a transport mechanism that reciprocates the workpiece in the order of the irradiation area, the workpiece collection stage on the other end side,
The optical alignment apparatus according to claim 1, wherein the transport mechanism retracts the other work from the work mounting stage when the one work passes through the irradiation region. Equipped with a robot device that loads workpieces on the workpiece loading stage,
The optical alignment apparatus according to claim 1, wherein the robot apparatus is configured to be able to hold two workpieces.   The photo-alignment apparatus according to claim 2, wherein the transport mechanism is configured to be able to change a moving speed of the work before and after the work passes through the irradiation region. A light irradiator is provided at the center, and a pair of work mounting stages are provided at positions near both ends of the light irradiator,
While reciprocating the workpiece in the order of the workpiece mounting stage on the one end side, the irradiation area of the light irradiation device on the central portion, and the workpiece mounting stage on the one end portion side, the workpiece mounting stage on the other end side and the light irradiation device on the central portion Equipped with a transport mechanism that reciprocates the workpiece in the order of the irradiation area, the workpiece mounting stage on the other end side,
The photo-alignment apparatus, wherein the transport mechanism retracts the other work from the work mounting stage when the one work passes through the irradiation region.

Images