TWI569104B - An illumination optical system, an exposure apparatus, a manufacturing method of an element, and an optical element - Google Patents
An illumination optical system, an exposure apparatus, a manufacturing method of an element, and an optical element Download PDFInfo
- Publication number
- TWI569104B TWI569104B TW103103205A TW103103205A TWI569104B TW I569104 B TWI569104 B TW I569104B TW 103103205 A TW103103205 A TW 103103205A TW 103103205 A TW103103205 A TW 103103205A TW I569104 B TWI569104 B TW I569104B
- Authority
- TW
- Taiwan
- Prior art keywords
- light
- reflecting surface
- optical system
- incident
- shape
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Optical Elements Other Than Lenses (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013040033A JP6178588B2 (ja) | 2013-02-28 | 2013-02-28 | 照明光学系、露光装置、デバイスの製造方法及び光学素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201433885A TW201433885A (zh) | 2014-09-01 |
TWI569104B true TWI569104B (zh) | 2017-02-01 |
Family
ID=51617573
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW103103205A TWI569104B (zh) | 2013-02-28 | 2014-01-28 | An illumination optical system, an exposure apparatus, a manufacturing method of an element, and an optical element |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6178588B2 (ko) |
KR (2) | KR101707277B1 (ko) |
TW (1) | TWI569104B (ko) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5843905B2 (ja) * | 2013-04-23 | 2016-01-13 | キヤノン株式会社 | 照明光学系、露光装置及びデバイス製造方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6335786B1 (en) * | 1997-11-10 | 2002-01-01 | Nikon Corporation | Exposure apparatus |
TW201237566A (en) * | 2011-02-22 | 2012-09-16 | Canon Kk | Illumination optical system, exposure apparatus, and method of manufacturing device |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1182639B (it) * | 1985-10-29 | 1987-10-05 | Cselt Centro Studi Lab Telecom | Procedimento per la fabbricazione di fibre ottiche con nucleo a sezione non circolare |
JP3517573B2 (ja) * | 1997-11-27 | 2004-04-12 | キヤノン株式会社 | 照明装置及びそれを用いた投影露光装置 |
DE19856575A1 (de) * | 1998-12-08 | 2000-09-14 | Zeiss Carl Fa | Projektions-Mikrolithographiegerät |
JP2001324762A (ja) * | 2000-05-17 | 2001-11-22 | Minolta Co Ltd | 単板式液晶プロジェクタの照明光学系 |
JP4659223B2 (ja) * | 2001-01-15 | 2011-03-30 | キヤノン株式会社 | 照明装置及びこれに用いる投影露光装置並びにデバイスの製造方法 |
US7215863B1 (en) * | 2006-04-27 | 2007-05-08 | International Business Machines Corporation | Light pipe optical coupling utilizing convex-shaped light pipe end |
DE102010026252B4 (de) * | 2010-07-01 | 2012-08-02 | Jenoptik Optical Systems Gmbh | Lichtintegrator für rechteckige Strahlquerschnitte unterschiedlicher Abmessungen |
-
2013
- 2013-02-28 JP JP2013040033A patent/JP6178588B2/ja active Active
-
2014
- 2014-01-28 TW TW103103205A patent/TWI569104B/zh active
- 2014-02-20 KR KR1020140019467A patent/KR101707277B1/ko active IP Right Grant
-
2017
- 2017-01-17 KR KR1020170008091A patent/KR101831552B1/ko active IP Right Grant
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6335786B1 (en) * | 1997-11-10 | 2002-01-01 | Nikon Corporation | Exposure apparatus |
TW201237566A (en) * | 2011-02-22 | 2012-09-16 | Canon Kk | Illumination optical system, exposure apparatus, and method of manufacturing device |
Also Published As
Publication number | Publication date |
---|---|
KR101707277B1 (ko) | 2017-02-27 |
KR101831552B1 (ko) | 2018-02-22 |
KR20140108125A (ko) | 2014-09-05 |
JP2014168022A (ja) | 2014-09-11 |
TW201433885A (zh) | 2014-09-01 |
KR20170010336A (ko) | 2017-01-26 |
JP6178588B2 (ja) | 2017-08-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI533030B (zh) | 光學積分器系統、照明光學裝置、曝光裝置以及元件製造方法 | |
JP2012174936A (ja) | 照明光学系、露光装置及びデバイス製造方法 | |
TW202026703A (zh) | 用於投影曝光設備的光學系統 | |
JPWO2019146448A1 (ja) | 露光装置及び露光方法 | |
US9946056B2 (en) | Illumination optical system, exposure apparatus, and method of manufacturing article | |
JP6651124B2 (ja) | 照明光学系、露光装置、およびデバイス製造方法 | |
TWI569104B (zh) | An illumination optical system, an exposure apparatus, a manufacturing method of an element, and an optical element | |
JP2004055856A (ja) | 照明装置、それを用いた露光装置及びデバイス製造方法 | |
KR101506748B1 (ko) | 광학 적분기, 조명 광학 장치, 노광 장치, 및 디바이스 제조 방법 | |
KR102144863B1 (ko) | 조명장치, 노광장치, 노광방법 및 디바이스 제조방법 | |
JP2002222761A (ja) | 照明光学装置および該照明光学装置を備えた露光装置 | |
TW200417825A (en) | Method for fabricating light exposing apparatus, light unit, light exposing apparatus, light exposing method, and adjusting method | |
JP2014195048A (ja) | 照明光学系、露光装置及びデバイスの製造方法 | |
US9632423B2 (en) | Illumination device, exposure apparatus, adjusting method, and method for manufacturing object | |
WO2009150913A1 (ja) | 照明装置、露光装置及びデバイス製造方法 | |
US20190086812A1 (en) | Illumination device | |
US9733571B2 (en) | Illumination optical device, exposure apparatus, and method of manufacturing article | |
KR20190046920A (ko) | 조명 장치, 노광 장치 및 물품의 제조 방법 | |
JP2009032749A (ja) | 露光装置およびデバイス製造方法 | |
JP4765314B2 (ja) | 照明光学装置 | |
JPH07135133A (ja) | 照明光学装置 | |
JP2006066429A (ja) | 照明光学装置、露光装置、および露光方法 | |
JP2013143450A (ja) | 走査露光装置及びデバイスの製造方法 | |
JP2012059848A (ja) | 偏光変換ユニット、照明光学系、露光装置、およびデバイス製造方法 | |
JP2009117672A (ja) | 照明光学系、露光装置、およびデバイス製造方法 |