TWI567796B - Apparatus for and method of irradiating light - Google Patents

Apparatus for and method of irradiating light Download PDF

Info

Publication number
TWI567796B
TWI567796B TW103120224A TW103120224A TWI567796B TW I567796 B TWI567796 B TW I567796B TW 103120224 A TW103120224 A TW 103120224A TW 103120224 A TW103120224 A TW 103120224A TW I567796 B TWI567796 B TW I567796B
Authority
TW
Taiwan
Prior art keywords
substrate
light irradiation
main surface
flash
irradiation device
Prior art date
Application number
TW103120224A
Other languages
Chinese (zh)
Other versions
TW201521093A (en
Inventor
渉田浩二
上野隆
Original Assignee
斯克林集團公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 斯克林集團公司 filed Critical 斯克林集團公司
Publication of TW201521093A publication Critical patent/TW201521093A/en
Application granted granted Critical
Publication of TWI567796B publication Critical patent/TWI567796B/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • H01L21/67115Apparatus for thermal treatment mainly by radiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26Bombardment with radiation
    • H01L21/263Bombardment with radiation with high-energy radiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electroluminescent Light Sources (AREA)
  • Liquid Crystal (AREA)
  • Coating Apparatus (AREA)

Description

光照射裝置及光照射方法 Light irradiation device and light irradiation method

本發明係關於一種對基材之主面照射閃光之光照射裝置及光照射方法。 The present invention relates to a light irradiation device and a light irradiation method for irradiating a main surface of a substrate with a flash.

先前,於撓性器件、撓性顯示器、平板顯示器、電子機器、太陽電池、燃料電池、及半導體等之製造步驟中使用有如下之光照射裝置,該光照射裝置藉由對片狀或薄板狀之基材之主面照射閃光而加熱基材。 Conventionally, in the manufacturing steps of a flexible device, a flexible display, a flat panel display, an electronic device, a solar cell, a fuel cell, and a semiconductor, there is used a light irradiation device which is in the form of a sheet or a thin plate. The main surface of the substrate is irradiated with a flash to heat the substrate.

先前之光照射裝置中,閃光之光源及收容基材之處理室係藉由石英玻璃等透光板而隔開。而且,自光源隔著透光板而對基材之主面照射閃光。作為設置透光板之目的,可例舉:萬一光源破損時,不使其碎片向基材側飛散;或將用以冷卻光源之氣體僅供給至較透光板靠光源側之空間,從而提高冷卻效率。 In the conventional light irradiation device, the light source of the flash and the processing chamber for accommodating the substrate are separated by a light-transmitting plate such as quartz glass. Further, the main surface of the substrate is irradiated with a flash light from the light source via the light-transmitting plate. For the purpose of providing the light-transmitting plate, in the event that the light source is broken, the debris is not scattered toward the substrate side; or the gas for cooling the light source is supplied only to the space on the light source side of the light-transmitting plate, thereby Improve cooling efficiency.

關於具有此種透光板之先前之光照射裝置,例如記載於專利文獻1、2中。 A conventional light irradiation device having such a light-transmitting plate is described, for example, in Patent Documents 1 and 2.

先前技術文獻 Prior technical literature 專利文獻 Patent literature

專利文獻1:日本專利特開2013-55141號公報 Patent Document 1: Japanese Patent Laid-Open Publication No. 2013-55141

專利文獻2:日本專利特開2001-217198號公報 Patent Document 2: Japanese Patent Laid-Open Publication No. 2001-217198

然而,若透光板介置於光源與基材之間,則無法使光源充分接近於基材之主面。又,因光於透光板表面上之反射及向透光板內吸收光而使閃光之光量減少。藉此,賦予至基材主面之能量減少。 However, if the light-transmitting plate is interposed between the light source and the substrate, the light source cannot be sufficiently brought close to the main surface of the substrate. Moreover, the amount of light of the flash is reduced by the reflection on the surface of the light-transmitting plate and the absorption of light into the light-transmitting plate. Thereby, the energy imparted to the main surface of the substrate is reduced.

又,若使用石英玻璃等透光板,則光照射裝置之製造成本上升。尤其是近年來,隨著成為處理對象之基材之大型化,透光板之面積、厚度亦均變大,藉此,透光板所耗費之材料成本有進一步上升之傾向。又,於先前之構造中,若基材大型化,則收容基材之處理室亦不得不變大。如此一來,向處理室填充之處理氣體之使用量增加。其結果,光照射裝置之運轉成本亦上升。 Further, when a light-transmitting plate such as quartz glass is used, the manufacturing cost of the light irradiation device increases. In particular, in recent years, as the size of the substrate to be processed is increased, the area and thickness of the light-transmitting sheet are also increased, whereby the material cost of the light-transmitting sheet tends to increase. Moreover, in the prior structure, when the base material is enlarged, the processing chamber for accommodating the substrate also has to be enlarged. As a result, the amount of process gas used to fill the processing chamber increases. As a result, the operating cost of the light irradiation device also increases.

本發明係鑒於上述情況而完成者,其目的在於提供一種光照射裝置及光照射方法,可於不隔著石英玻璃等透光板之情況下對基材之主面照射閃光,且可抑制閃光所照射之空間之容積。 The present invention has been made in view of the above circumstances, and an object thereof is to provide a light irradiation device and a light irradiation method capable of illuminating a main surface of a substrate without a light-transmitting plate such as quartz glass, and suppressing the flash. The volume of the space illuminated.

為解決上述問題,本案之第1發明係對基材之主面照射閃光之光照射裝置,其具備:保持部,其保持上述基材;光照射部,其對保持於上述保持部之上述基材之主面照射閃光;框體,其將上述光照射部收容於單一之內部空間,並且於上述基材側具有開口部;密封構件,其設置於上述框體之上述開口部之周緣;及接觸/分離機構,其以使上述基材之主面與上述密封構件接觸及分離之方式,使上述基材及上述密封構件相對性地移動。 In order to solve the above problem, the first aspect of the present invention is a light irradiation device for irradiating a main surface of a substrate with a flash, comprising: a holding portion that holds the substrate; and a light irradiation portion that faces the base held by the holding portion The main surface of the material is irradiated with a flash; the frame receives the light irradiation portion in a single internal space, and has an opening on the substrate side; and the sealing member is disposed on a periphery of the opening of the frame; and The contact/separation mechanism relatively moves the base material and the sealing member so that the main surface of the base material comes into contact with and separates from the sealing member.

本案之第2發明係如第1發明之光照射裝置,其中上述框體之上述開口部小於上述基材之主面,且該光照射裝置進而具備搬送機構,該搬送機構使上述基材及上述框體於與上述基材之主面平行之方向上相對移動。 According to a second aspect of the invention, in the light-emitting device of the first aspect, the opening of the frame body is smaller than a main surface of the substrate, and the light irradiation device further includes a transfer mechanism that causes the substrate and the substrate The frame is relatively moved in a direction parallel to the main surface of the substrate.

本案之第3發明係如第2發明之光照射裝置,其中上述框體之位 置被固定,且上述搬送機構使上述基材移動。 According to a third aspect of the invention, the light irradiation device of the second aspect of the invention The fixing is fixed, and the conveying mechanism moves the substrate.

本案之第4發明係如第3發明之光照射裝置,其中上述基材為片狀或薄板狀。 According to a fourth aspect of the invention, in the light-emitting device of the third aspect, the substrate is in the form of a sheet or a thin plate.

本案之第5發明係如第4發明之光照射裝置,其中上述基材為可靈活地彎曲之片狀之基材,且上述搬送機構具有:送出輥,其於較上述保持部更靠搬送方向之上游側送出上述基材;及捲取輥,其於較上述保持部更靠搬送方向之下游側捲取上述基材。 According to a fifth aspect of the invention, in the light irradiation device of the fourth aspect of the invention, the substrate is a flexible sheet-shaped substrate, and the transfer mechanism includes a delivery roller that is transported in a direction closer to the holding portion. The substrate is fed to the upstream side, and a winding roller that winds the substrate on the downstream side in the transport direction from the holding portion.

本案之第6發明係如第5發明之光照射裝置,其中上述保持部一面對上述基材賦予張力一面支持上述基材。 According to a sixth aspect of the invention, in the light irradiation device of the fifth aspect, the holding portion supports the substrate while applying tension to the substrate.

本案之第7發明係如第6發明之光照射裝置,其中上述保持部具有支持基材之複數個輥。 According to a seventh aspect of the invention, the light irradiation device of the sixth aspect, wherein the holding portion has a plurality of rollers supporting the substrate.

本案之第8發明係如第4發明之光照射裝置,其中上述保持部具有支持基材之平台。 According to a eighth aspect of the invention, the light irradiation device of the fourth aspect, wherein the holding portion has a platform for supporting a substrate.

本案之第9發明係如第1發明之光照射裝置,其中上述保持部於上述基材之主面朝向下側之狀態下將上述基材保持為大致水平,且上述光照射部及上述框體配置於保持在上述保持部之上述基材之下側。 According to a ninth aspect of the invention, the light-irradiating device of the first aspect of the invention, wherein the holding portion is held substantially horizontally in a state in which a main surface of the base material faces downward, and the light-irradiating portion and the frame are It is disposed on the lower side of the substrate held by the holding portion.

本案之第10發明係如第1發明之光照射裝置,其中該光照射裝置進而具備將氣體供給至上述框體之內部之氣體供給部。 According to a tenth aspect of the invention, the light irradiation device of the first aspect of the invention, further comprising: a gas supply unit that supplies a gas to the inside of the casing.

本案之第11發明係如第10發明之光照射裝置,其中上述氣體為惰性氣體。 According to a tenth aspect of the invention, the light irradiation device of the tenth aspect, wherein the gas is an inert gas.

本案之第12發明係如第11發明之光照射裝置,其中上述惰性氣體為氮氣。 According to a twelfth aspect of the invention, the light irradiation device of the eleventh aspect, wherein the inert gas is nitrogen.

本案之第13發明係如第1發明之光照射裝置,其中該光照射裝置進而具備將上述框體內之氣體排出之排氣部。 According to a thirteenth aspect of the invention, the light-irradiation device of the first aspect of the invention, further comprising the exhaust portion that discharges the gas in the casing.

本案之第14發明係如第1發明至第13發明中任一項之光照射裝置,其中上述基材包含樹脂。 The light irradiation device according to any one of the first to the thirteenth invention, wherein the substrate comprises a resin.

本案之第15發明係對基材之主面照射閃光之光照射方法,其包括:a)使用基材之主面及於基材之主面側具有開口部之框體而形成單一之封閉空間的步驟;b)於上述步驟a)之後,自配置於上述封閉空間之光照射部對上述基材之主面照射閃光的步驟;及c)於上述步驟b)之後,打開上述封閉空間之步驟。 According to a fifteenth aspect of the invention, there is provided a method of irradiating a main surface of a substrate with a flash light, comprising: a) forming a single closed space by using a main surface of the substrate and a frame having an opening on a main surface side of the substrate; Step b) after the step a), the step of irradiating the main surface of the substrate with a light from the light irradiation portion disposed in the closed space; and c) the step of opening the closed space after the step b) .

本案之第16發明係如第15發明之光照射方法,其中上述框體之上述開口部小於上述基材之主面,且一面使上述基材及上述框體於與上述基材之主面平行之方向上相對移動,一面重複上述步驟a)、上述步驟b)、及上述步驟c)。 According to a sixteenth aspect of the invention, in the light irradiation method of the first aspect, the opening of the frame body is smaller than a main surface of the base material, and the base material and the frame body are parallel to a main surface of the base material The above steps a), the above step b), and the above step c) are repeated while moving in the opposite direction.

本案之第17發明係如第15發明或第16發明之光照射方法,其中於上述步驟b)中,一面向上述框體之內部供給氣體,一面自上述光照射部照射閃光。 The light irradiation method according to the fifteenth aspect of the invention, wherein in the step b), the gas is supplied from the light irradiation portion to the inside of the casing.

根據本案之第1發明~第14發明,於藉由基材之主面、框體、及密封構件而構成之封閉空間內,可於不隔著石英玻璃等透光板之情況下對基材之主面照射閃光。因此,可抑制閃光之能量損失,並且可抑制光照射裝置之製造成本。又,可抑制閃光所照射之空間之容積。 According to the first invention to the fourteenth aspect of the present invention, the substrate can be placed in a closed space formed by the main surface of the substrate, the frame, and the sealing member without interposing a light-transmitting plate such as quartz glass. The main surface illuminates the flash. Therefore, the energy loss of the flash can be suppressed, and the manufacturing cost of the light irradiation device can be suppressed. Moreover, the volume of the space illuminated by the flash can be suppressed.

尤其是根據本案之第2發明,可抑制框體之尺寸而進一步提高閃光之照射效率,並且可對基材之主面整體照射閃光。 In particular, according to the second invention of the present invention, it is possible to suppress the size of the frame and further improve the irradiation efficiency of the flash, and to irradiate the entire main surface of the substrate with a flash.

尤其是根據本案之第3發明,無需用以使框體移動之機構。又,容易對框體連接電纜或配管。 In particular, according to the third invention of the present invention, a mechanism for moving the casing is not required. Moreover, it is easy to connect a cable or a pipe to a frame.

尤其是根據本案之第5發明,可一面斷續地搬送片狀之基材,一面對基材之主面照射閃光。 In particular, according to the fifth invention of the present invention, the sheet-like substrate can be intermittently conveyed, and the main surface of the substrate is irradiated with a flash.

尤其是根據本案之第6發明,可藉由防止基材之撓曲而對基材之主面更均勻地照射閃光。 In particular, according to the sixth invention of the present invention, it is possible to more uniformly illuminate the main surface of the substrate by preventing the deflection of the substrate.

尤其是根據本案之第9發明,能夠自框體之上部經由開口而容易 地進行光照射部之維護作業。又,即便光照射部破損,亦可抑制其碎片向基材側飛散。又,亦可抑制自光照射部產生之微粒附著於基材。 In particular, according to the ninth invention of the present invention, it is easy to pass through the opening from the upper portion of the casing. The maintenance work of the light irradiation unit is performed. Further, even if the light-irradiating portion is broken, it is possible to suppress scattering of the chips on the substrate side. Further, it is also possible to suppress adhesion of particles generated from the light-irradiating portion to the substrate.

尤其是根據本案之第10發明,可向框體之內部空間供給閃光之照射處理所必需之氣體。尤其是由於只要將用以冷卻光照射部之氣體及應供給至基材之主面附近之氣體供給至單一之框體內即可,故而可減少氣體之使用量。 In particular, according to the tenth invention of the present invention, the gas necessary for the irradiation treatment of the flash can be supplied to the internal space of the casing. In particular, since the gas for cooling the light-irradiating portion and the gas to be supplied to the vicinity of the main surface of the substrate can be supplied to a single casing, the amount of gas used can be reduced.

尤其是根據本案之第11發明,可抑制基材伴隨著閃光之照射而氧化。 In particular, according to the eleventh invention of the present invention, it is possible to suppress oxidation of the substrate by irradiation with a flash.

又,根據本案之第15發明~第17發明,於使用基材之主面與框體而構成之封閉空間內,可於不隔著石英玻璃等透光板之情況下對基材之主面照射閃光。因此,可抑制閃光之能量損失。又,可抑制閃光所照射之空間之容積。 Further, according to the fifteenth invention to the seventeenth aspect of the present invention, in the closed space formed by using the main surface of the base material and the frame body, the main surface of the base material can be applied without interposing the light-transmitting plate such as quartz glass Illuminate the flash. Therefore, the energy loss of the flash can be suppressed. Moreover, the volume of the space illuminated by the flash can be suppressed.

尤其是根據本案之第16發明,可抑制框體之尺寸而進一步提高閃光之照射效率,並且可對基材之主面整體照射閃光。 In particular, according to the sixteenth aspect of the present invention, the size of the frame can be suppressed, the irradiation efficiency of the flash can be further improved, and the entire main surface of the substrate can be irradiated with a flash.

尤其是根據本案之第17發明,向框體之內部空間供給閃光之照射處理所必需之氣體。由於只要將用以冷卻光照射部之氣體及應供給至基材之主面附近之氣體供給至單一之封閉空間即可,故而可減少氣體之使用量。 In particular, according to the seventeenth invention of the present invention, the gas necessary for the irradiation treatment of the flash is supplied to the internal space of the casing. Since the gas for cooling the light-irradiating portion and the gas to be supplied to the vicinity of the main surface of the substrate can be supplied to a single closed space, the amount of gas used can be reduced.

1、101‧‧‧光照射裝置 1, 101‧‧‧Lighting device

9、109‧‧‧基材 9, 109‧‧‧ substrate

10、110‧‧‧基材搬送機構 10, 110‧‧‧ substrate transport mechanism

11‧‧‧送出輥 11‧‧‧Send rolls

12‧‧‧中間輥 12‧‧‧Intermediate roller

13‧‧‧捲取輥 13‧‧‧Winding roller

14、114‧‧‧搬送路徑 14, 114‧‧‧Transfer path

20、120‧‧‧光照射部 20, 120‧‧‧Lighting Department

21、121‧‧‧閃光燈 21, 121‧‧‧ flash

22、122‧‧‧反射器 22, 122‧‧‧ reflector

23、123‧‧‧電纜 23, 123‧‧‧ cable

24、124‧‧‧電源裝置 24, 124‧‧‧ power supply unit

30、130‧‧‧燈室 30, 130‧‧ ‧ lamp room

31、131‧‧‧內部空間 31, 131‧‧‧ internal space

32、132‧‧‧開口部 32, 132‧‧‧ openings

33、133‧‧‧排氣口 33, 133‧‧ vents

40、140‧‧‧密封構件 40, 140‧‧‧ Sealing members

50、150‧‧‧接觸/分離機構 50, 150 ‧ ‧ contact / separation mechanism

51‧‧‧按壓構件 51‧‧‧ Pressing members

52、152‧‧‧升降機構 52, 152‧‧‧ Lifting mechanism

60、160‧‧‧氣體供給部 60, 160‧‧‧ Gas Supply Department

61、161‧‧‧供氣配管 61,161‧‧‧ gas supply piping

62、162‧‧‧供給源 62, 162‧‧ ‧ supply source

63、163‧‧‧開閉閥 63, 163‧‧‧Opening and closing valve

64、164‧‧‧吹出口 64, 164‧‧‧ blown out

70、170‧‧‧排氣部 70, 170‧‧‧Exhaust Department

71、171‧‧‧排氣配管 71, 171‧‧‧ exhaust piping

80、180‧‧‧控制部 80, 180‧‧‧Control Department

81、181‧‧‧運算處理部 81,181‧‧‧Operation Processing Department

82、182‧‧‧記憶體 82, 182‧‧‧ memory

83、183‧‧‧記憶部 83, 183‧‧‧ Memory Department

84、184‧‧‧電腦程式 84, 184‧‧‧ computer program

91、191‧‧‧主面 91, 191‧‧ ‧ main face

111‧‧‧平台 111‧‧‧ platform

112‧‧‧平台移動機構 112‧‧‧ Platform moving mechanism

圖1係表示第1實施形態之光照射裝置之構成的圖。 Fig. 1 is a view showing the configuration of a light irradiation device according to a first embodiment.

圖2係表示第1實施形態之光照射裝置之構成的圖。 Fig. 2 is a view showing the configuration of a light irradiation device according to the first embodiment.

圖3係表示第1實施形態之光照射處理之流程的流程圖。 Fig. 3 is a flow chart showing the flow of light irradiation processing in the first embodiment.

圖4係表示第2實施形態之光照射裝置之構成的圖。 Fig. 4 is a view showing the configuration of a light irradiation device according to a second embodiment.

圖5係表示第2實施形態之光照射裝置之構成的圖。 Fig. 5 is a view showing the configuration of a light irradiation device according to a second embodiment.

圖6係表示第2實施形態之光照射處理之流程的流程圖。 Fig. 6 is a flow chart showing the flow of light irradiation processing in the second embodiment.

以下,一面參照圖式一面對本發明之實施形態進行詳細說明。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

<1.第1實施形態> <1. First embodiment>

<1-1.關於光照射裝置之構成> <1-1. About the configuration of the light irradiation device>

圖1及圖2係表示本發明之第1實施形態之光照射裝置1之構成的圖。該光照射裝置1係如下之裝置,即一面於一對輥11、13之間搬送長條之片狀之基材9,一面對基材9之主面91照射閃光。成為閃光之照射對象之基材9包含例如PET(polyethylene terephthalate,聚對苯二甲酸乙二醇酯)、PEN(polyethylene naphthalate,聚萘二甲酸乙二醇酯)、聚醯亞胺(polyimide)等樹脂,且可靈活地彎曲。如圖1及圖2所示,本實施形態之光照射裝置1具備基材搬送機構10、光照射部20、燈室30、密封構件40、接觸/分離機構50、氣體供給部60、排氣部70、及控制部80。 FIG. 1 and FIG. 2 are views showing a configuration of a light irradiation device 1 according to a first embodiment of the present invention. The light irradiation device 1 is a device that conveys a long sheet-like substrate 9 between a pair of rolls 11 and 13, and a main surface 91 facing the substrate 9 is irradiated with a flash. The substrate 9 to be irradiated with a flash includes, for example, PET (polyethylene terephthalate), PEN (polyethylene naphthalate), polyimide, and the like. Resin and flexible bending. As shown in FIG. 1 and FIG. 2, the light irradiation device 1 of the present embodiment includes a substrate transfer mechanism 10, a light irradiation unit 20, a lamp chamber 30, a sealing member 40, a contact/separation mechanism 50, a gas supply unit 60, and an exhaust gas. The unit 70 and the control unit 80.

基材搬送機構10係用以將基材9沿著其長度方向搬送之機構。基材搬送機構10具有送出輥11、一對中間輥12、及捲取輥13。送出輥11位於較一對中間輥12更靠搬送方向之上游側。捲取輥13位於較一對中間輥12更靠搬送方向之下游側。若使送出輥11及捲取輥13旋轉,則基材9被自送出輥11送出,並沿著藉由一對中間輥12所規定之搬送路徑14而被水平地搬送,其後向捲取輥13捲取。 The substrate transfer mechanism 10 is a mechanism for transporting the substrate 9 along its longitudinal direction. The substrate transfer mechanism 10 has a feed roller 11 , a pair of intermediate rollers 12 , and a take-up roller 13 . The delivery roller 11 is located on the upstream side of the pair of intermediate rollers 12 in the transport direction. The take-up roller 13 is located on the downstream side of the pair of intermediate rolls 12 in the transport direction. When the feed roller 11 and the take-up roller 13 are rotated, the base material 9 is fed from the feed roller 11 and conveyed horizontally along the transport path 14 defined by the pair of intermediate rollers 12, and then wound up. Roller 13 is taken up.

一對中間輥12一面接觸於基材9一面旋轉,藉此一面支持基材9一面引導基材9。即,於本實施形態中,一對中間輥12係基材搬送機構10之一部分,並且成為保持基材9之保持部。基材9係於一對中間輥12之間,於成為處理對象之主面91朝向下側之狀態下被大致水平地搬送。即,基材9於與主面91平行之方向上搬送。又,藉由使基材9接觸於一對中間輥12而對基材9賦予張力。藉此,可防止基材9之撓曲,於下述之閃光之照射處理時,可對基材9之主面91均勻地照射閃光。 The pair of intermediate rolls 12 are rotated while being in contact with the substrate 9, whereby the substrate 9 is supported while supporting the substrate 9. In other words, in the present embodiment, the pair of intermediate rolls 12 are part of the substrate transfer mechanism 10 and serve as a holding portion for holding the substrate 9. The base material 9 is placed between the pair of intermediate rolls 12 and is conveyed substantially horizontally in a state in which the main surface 91 to be processed faces downward. That is, the substrate 9 is conveyed in a direction parallel to the main surface 91. Further, tension is applied to the substrate 9 by bringing the substrate 9 into contact with the pair of intermediate rolls 12. Thereby, the deflection of the substrate 9 can be prevented, and the main surface 91 of the substrate 9 can be uniformly irradiated with the flash during the irradiation treatment of the flash described below.

光照射部20係用以對保持於一對中間輥12之基材9之主面91照射 閃光之機構。光照射部20配置於基材9之搬送路徑14之下方。光照射部20具有複數個棒狀之閃光燈21與反射器22。複數個閃光燈21係於同一水平面上,以成為相互平行之方式配置。又,如圖1及圖2中概念性所示般,複數個閃光燈21經由電纜23而連接於電源裝置24。複數個閃光燈21係根據自電源裝置24供給之電壓而出射閃光。 The light irradiation unit 20 is for irradiating the main surface 91 of the substrate 9 held by the pair of intermediate rolls 12 Flashing mechanism. The light irradiation unit 20 is disposed below the transport path 14 of the substrate 9 . The light irradiation unit 20 has a plurality of rod-shaped flash lamps 21 and reflectors 22. A plurality of flash lamps 21 are arranged on the same horizontal surface so as to be arranged in parallel with each other. Further, as shown conceptually in FIGS. 1 and 2, a plurality of flash lamps 21 are connected to the power supply device 24 via a cable 23. The plurality of flash lamps 21 emit a flash based on the voltage supplied from the power supply unit 24.

反射器22係以自下側覆蓋複數個閃光燈21全體之方式配置。自閃光燈21出射之閃光之一部分直接射向基材9側。又,自閃光燈21出射之閃光之其他部分藉由反射器22反射而射向基材9側。藉此,射向基材9側之閃光之量增加,從而更高效率地對基材9之主面91照射閃光。 The reflector 22 is disposed so as to cover the entirety of the plurality of flash lamps 21 from the lower side. A portion of the flash emitted from the flash lamp 21 is directed toward the substrate 9 side. Further, the other portion of the flash emitted from the flash lamp 21 is reflected by the reflector 22 and is directed toward the substrate 9 side. Thereby, the amount of flashing light toward the side of the substrate 9 is increased, so that the main surface 91 of the substrate 9 is more efficiently illuminated by the flash.

閃光燈21可使用例如氙氣(xenon)閃光燈。氙氣閃光燈具有:棒狀之玻璃管(放電管),於其內部封入有氙氣氣體,且於其兩端部配設有連接於電容器之陽極及陰極;及觸發電極,其附設於該玻璃管之外周面上。氙氣氣體由於於電性方面為絕緣體,故而即便於電容器內儲存有電荷,於正常狀態下電亦不流動至玻璃管內。然而,於對觸發電極施加高電壓而破壞絕緣之情形時,電容器所儲存之電藉由兩端電極間之放電而瞬間流動至玻璃管內,藉由此時之氙氣之原子或分子之激發而放出光。於該氙氣閃光燈中,由於將預先儲存於電容器內之靜電能量轉換為0.1毫秒~100毫秒之極短之光脈衝,故而與連續點亮之燈相比可照射極強之光。 The flash 21 can use, for example, a xenon flash. The xenon flash lamp has a rod-shaped glass tube (discharge tube) in which a helium gas is sealed, and an anode and a cathode connected to the capacitor are disposed at both ends thereof; and a trigger electrode is attached to the glass tube On the outer peripheral surface. Since the helium gas is an insulator in terms of electrical properties, even if a charge is stored in the capacitor, electricity does not flow into the glass tube under normal conditions. However, when a high voltage is applied to the trigger electrode to destroy the insulation, the electricity stored in the capacitor instantaneously flows into the glass tube by the discharge between the electrodes at both ends, thereby exciting the atoms or molecules of the helium gas at that time. Let out the light. In the xenon flash lamp, since the electrostatic energy stored in the capacitor in advance is converted into an extremely short light pulse of 0.1 millisecond to 100 milliseconds, extremely strong light can be irradiated compared to the continuously lit lamp.

再者,亦可使用氮氣(krypton)等其他稀有氣體之閃光燈代替氙氣閃光燈。 Further, a flash lamp of other rare gas such as krypton may be used instead of the xenon flash lamp.

燈室30固定性地配置於基材9之搬送路徑14之下方。燈室30具有未藉由石英玻璃等劃分之單一之內部空間31。而且,於燈室30之該內部空間31內收容有光照射部20。又,於燈室30之基材9側之端部即上部,設置有朝向上方打開之開口部32。如圖1及圖2所示,開口部32小 於基材9整體之主面91。 The lamp chamber 30 is fixedly disposed below the transport path 14 of the substrate 9. The lamp chamber 30 has a single internal space 31 which is not divided by quartz glass or the like. Further, the light irradiation unit 20 is housed in the internal space 31 of the lamp chamber 30. Further, an opening portion 32 that opens upward is provided on an upper portion of the end portion of the lamp chamber 30 on the side of the base material 9 side. As shown in FIGS. 1 and 2, the opening portion 32 is small. The main surface 91 of the entire substrate 9 is used.

本實施形態中,將燈室30及光照射部20之位置固定,而使基材9相對於其等移動。因此,無需用以使燈室30移動之驅動機構。又,於將連結閃光燈21與電源裝置24之電纜23、或下述之供氣配管61、或下述之排氣配管71安裝於燈室30時,無須考慮燈室30之移動而預先保有餘度。 In the present embodiment, the positions of the lamp chamber 30 and the light irradiation unit 20 are fixed, and the substrate 9 is moved relative to the substrate 9. Therefore, there is no need for a drive mechanism for moving the lamp chamber 30. Further, when the cable 23 connecting the flash unit 21 and the power supply unit 24, or the following air supply pipe 61 or the following exhaust pipe 71 is attached to the lamp chamber 30, it is not necessary to consider the movement of the lamp chamber 30 in advance. degree.

又,本實施形態中,於較基材9之搬送路徑14更下側配置燈室30,於燈室30之上部設置有開口部32。因此,可自燈室30之上部經由開口部32而容易地進行閃光燈21之更換等維護作業。又,即便閃光燈21破損,其碎片亦不會向基材9側飛散。又,亦可抑制自燈室30或光照射部20產生之微粒附著於基材9之表面。 Further, in the present embodiment, the lamp chamber 30 is disposed below the transport path 14 of the substrate 9, and the opening portion 32 is provided above the lamp chamber 30. Therefore, maintenance work such as replacement of the flasher 21 can be easily performed from the upper portion of the lamp chamber 30 via the opening portion 32. Further, even if the flash lamp 21 is broken, the chips do not scatter toward the substrate 9 side. Further, it is also possible to suppress adhesion of particles generated from the lamp chamber 30 or the light irradiation portion 20 to the surface of the substrate 9.

密封構件40係設置於燈室30之開口部32之周緣之環狀構件。密封構件40發揮如下作用,即於使接觸/分離機構50動作時,接觸於基材9之主面91而密封燈室30與基材9之間隙。又,密封構件40由電氣絕緣性較高之材料所形成,且作為絕緣構件發揮功能。對於密封構件40之材料,可使用例如PEEK(Polyetheretherketone,聚醚醚酮)等樹脂或陶瓷。 The sealing member 40 is an annular member that is provided at the periphery of the opening 32 of the lamp chamber 30. The sealing member 40 functions to contact the main surface 91 of the base material 9 to seal the gap between the lamp chamber 30 and the base material 9 when the contact/separation mechanism 50 is operated. Further, the sealing member 40 is formed of a material having high electrical insulation properties and functions as an insulating member. For the material of the sealing member 40, a resin such as PEEK (Polyetheretherketone) or ceramics can be used.

接觸/分離機構50係用以使基材9之主面91與密封構件40接觸及分離之機構。接觸/分離機構50具有環狀之按壓構件51、及使按壓構件51上下移動之升降機構52。按壓構件51配置於基材9之上側且隔著基材9而為密封構件40之相反側之位置。若使升降機構52動作,則按壓構件51於自基材9向上方離開之第1位置(圖1之位置)與接觸於基材9而將基材9向下側按壓之第2位置(圖2之位置)之間上下移動。升降機構52藉由例如將馬達與滾珠螺桿組合而成之機構或空氣缸而實現。 The contact/separation mechanism 50 is a mechanism for bringing the main surface 91 of the substrate 9 into contact with and separating from the sealing member 40. The contact/separation mechanism 50 has an annular pressing member 51 and an elevating mechanism 52 that moves the pressing member 51 up and down. The pressing member 51 is disposed on the upper side of the base material 9 and is located on the opposite side of the sealing member 40 with the base material 9 interposed therebetween. When the elevating mechanism 52 is operated, the pressing member 51 is moved to the first position (the position in FIG. 1 ) that is upward from the base material 9 and the second position in which the base material 9 is pressed to the lower side in contact with the base material 9 (Fig. Move between 2 and 2). The elevating mechanism 52 is realized by, for example, a mechanism or an air cylinder in which a motor and a ball screw are combined.

於按壓構件51配置於第1位置時,如圖1般,密封構件40及按壓構件51之兩者自基材9分離。因此,可利用基材搬送機構10搬送基材 9。另一方面,於按壓構件51配置於第2位置時,如圖2,基材9被夾持於按壓構件51與密封構件40之間,且密封構件40密接於基材9之主面91。其結果,燈室30之內部空間31成為與外部隔斷之封閉空間。 When the pressing member 51 is disposed at the first position, as shown in FIG. 1 , both the sealing member 40 and the pressing member 51 are separated from the base material 9 . Therefore, the substrate transfer mechanism 10 can be used to transport the substrate 9. On the other hand, when the pressing member 51 is disposed at the second position, as shown in FIG. 2 , the base material 9 is sandwiched between the pressing member 51 and the sealing member 40 , and the sealing member 40 is in close contact with the main surface 91 of the base material 9 . As a result, the internal space 31 of the lamp chamber 30 becomes a closed space that is blocked from the outside.

氣體供給部60係用以向燈室30之內部空間31供給作為處理氣體之氮氣(N2)之機構。氣體供給部60具有供氣配管61及氮氣供給源62。供氣配管61之上游側之端部連接於氮氣供給源62。供氣配管61之下游側之端部連接於設置於反射器22之吹出口64。又,於供氣配管61之路徑中途介插有開閉閥63。因此,若打開開閉閥63,則自氮氣供給源62通過供氣配管61向吹出口64供給氮氣。然後,如圖2中虛線所示,自吹出口64向燈室30之內部空間31吹出氮氣。 The gas supply unit 60 is a mechanism for supplying nitrogen gas (N 2 ) as a processing gas to the internal space 31 of the lamp chamber 30. The gas supply unit 60 has an air supply pipe 61 and a nitrogen gas supply source 62. The upstream side of the gas supply pipe 61 is connected to the nitrogen gas supply source 62. The end of the downstream side of the air supply pipe 61 is connected to the air outlet 64 provided in the reflector 22. Further, an opening and closing valve 63 is inserted in the middle of the path of the air supply pipe 61. Therefore, when the opening and closing valve 63 is opened, nitrogen gas is supplied from the nitrogen gas supply source 62 to the air outlet 64 through the air supply pipe 61. Then, as indicated by a broken line in Fig. 2, nitrogen gas is blown from the air outlet 64 to the internal space 31 of the lamp chamber 30.

此處,自氣體供給部60供給之氮氣之溫度低於藉由照射閃光而被加熱之閃光燈21之溫度。因此,可藉由自吹出口64吹出之氮氣冷卻複數個閃光燈21。又,藉由自吹出口64吹出之氮氣而於複數個閃光燈21與基材9之主面91之間,形成有惰性氣體即氮氣之氣層。藉此,抑制基材9隨著照射閃光而氧化。即,於該光照射裝置1中,供給至燈室30內之氮氣發揮冷卻閃光燈21及防止基材9之氧化之兩個作用。又,如此,藉由僅對燈室30之內部空間31供給氮氣而降低氮氣之使用量。 Here, the temperature of the nitrogen gas supplied from the gas supply unit 60 is lower than the temperature of the flash lamp 21 heated by the irradiation of the flash. Therefore, the plurality of flash lamps 21 can be cooled by the nitrogen blown from the air outlet 64. Further, a gas layer of an inert gas, that is, nitrogen gas, is formed between the plurality of flash lamps 21 and the main surface 91 of the substrate 9 by nitrogen gas blown from the air outlet 64. Thereby, the substrate 9 is suppressed from being oxidized with the irradiation of the flash. That is, in the light irradiation device 1, the nitrogen gas supplied into the lamp chamber 30 functions to cool the flash lamp 21 and prevent oxidation of the substrate 9. Further, in this manner, the amount of nitrogen gas used is reduced by supplying only nitrogen gas to the internal space 31 of the lamp chamber 30.

再者,氮氣供給源62可為光照射裝置1之一部分,亦可為設置有光照射裝置1之工廠內之公用設備。又,氣體供給部60亦可供給氬氣(Ar)或氦氣(He)等其他惰性氣體來代替氮氣。又,氣體供給部60亦可根據閃光之照射處理之目的而供給其他的各種氣體作為處理氣體。例如,亦可將氧氣(O2)、氫氣(H2)、氯氣(Cl2)等反應性氣體或清潔乾燥空氣用作處理氣體。 Further, the nitrogen gas supply source 62 may be a part of the light irradiation device 1, or may be a public device in a factory in which the light irradiation device 1 is provided. Further, the gas supply unit 60 may supply other inert gas such as argon (Ar) or helium (He) instead of nitrogen. Further, the gas supply unit 60 may supply other various gases as the processing gas for the purpose of the irradiation treatment of the flash. For example, a reactive gas such as oxygen (O 2 ), hydrogen (H 2 ), or chlorine (Cl 2 ) or clean dry air may be used as the processing gas.

排氣部70係用以將氣體自燈室30之內部空間31向燈室30之外部排出之機構。排氣部70具有連接於設置於燈室30之側壁之排氣口33之排氣配管71。若於使密封構件40密接於基材9之主面91之狀態下,一 面自氣體供給部60供給氮氣,一面向排氣部70排出氣體,則燈室30內之氣體被置換為氮氣。 The exhaust unit 70 is a mechanism for discharging gas from the internal space 31 of the lamp chamber 30 to the outside of the lamp chamber 30. The exhaust unit 70 has an exhaust pipe 71 connected to an exhaust port 33 provided in a side wall of the lamp chamber 30. If the sealing member 40 is in close contact with the main surface 91 of the substrate 9, one When the surface is supplied with nitrogen gas from the gas supply unit 60 and the gas is discharged toward the exhaust unit 70, the gas in the lamp chamber 30 is replaced with nitrogen.

控制部80係用以對光照射裝置1內之各部分進行動作控制之部位。如圖1及圖2中概念性所示,本實施形態之控制部80藉由具有CPU(Central Processing Unit,中央處理單元)等運算處理部81、RAM(Random Access Memory,隨機存取記憶體)等記憶體82、及硬碟驅動器等記憶部83之電腦而構成。控制部80分別與上述基材搬送機構10、電源裝置24、升降機構52、及開閉閥63電性連接。控制部80將記憶於記憶部83中之電腦程式84暫時讀出至記憶體82,且運算處理部81基於該電腦程式84而進行運算處理,藉此控制基材搬送機構10、電源裝置24、升降機構52、及開閉閥63之動作。藉此,進行對基材9照射閃光之處理。 The control unit 80 is a portion for controlling the operation of each part in the light irradiation device 1. As shown in FIG. 1 and FIG. 2, the control unit 80 of the present embodiment includes an arithmetic processing unit 81 such as a CPU (Central Processing Unit) and a RAM (Random Access Memory). It is constituted by a computer such as a memory 82 and a memory unit 83 such as a hard disk drive. The control unit 80 is electrically connected to the substrate transport mechanism 10, the power supply device 24, the elevating mechanism 52, and the opening and closing valve 63, respectively. The control unit 80 temporarily reads the computer program 84 stored in the storage unit 83 to the memory 82, and the arithmetic processing unit 81 performs arithmetic processing based on the computer program 84, thereby controlling the substrate transport mechanism 10 and the power supply device 24, The operation of the lifting mechanism 52 and the opening and closing valve 63. Thereby, the process of irradiating the substrate 9 with a flash is performed.

<1-2.關於閃光之照射處理> <1-2. About the irradiation treatment of the flash>

繼而,對使用第1實施形態之光照射裝置1對基材9之主面91照射閃光時之處理之流程進行說明。圖3係表示該處理之流程之流程圖。該光照射裝置1於進行閃光之照射處理時,首先,對控制部80輸入進行該處理之旨意之指令。控制部80若接收到該指令,則根據電腦程式84而對光照射裝置1內之各部分進行動作控制。藉此,進行以下動作。 Next, a flow of a process in which the main surface 91 of the substrate 9 is irradiated with a flash by the light irradiation device 1 of the first embodiment will be described. Fig. 3 is a flow chart showing the flow of the processing. When the light irradiation device 1 performs the irradiation processing of the flash, first, the control unit 80 inputs an instruction to perform the processing. Upon receiving the command, the control unit 80 controls the operation of each part in the light irradiation device 1 based on the computer program 84. Thereby, the following actions are performed.

首先,光照射裝置1藉由使基材搬送機構10動作而搬送基材9(步驟S1)。於基材9之主面91,例如沿著搬送方向而等間隔地排列有複數個圖案。基材搬送機構10藉由搬送基材9而將成為閃光之照射對象之圖案配置於光照射部20之上方。再者,於該步驟S1中,按壓構件51配置於第1位置(圖1之位置)。因此,基材9係不接觸於密封構件40及按壓構件51之任一者而沿著搬送路徑14搬送。 First, the light irradiation device 1 transports the substrate 9 by operating the substrate transfer mechanism 10 (step S1). A plurality of patterns are arranged on the main surface 91 of the substrate 9 at equal intervals, for example, along the conveyance direction. The substrate transfer mechanism 10 arranges a pattern to be irradiated with a flash by the substrate 9 to be placed above the light irradiation unit 20 . Further, in this step S1, the pressing member 51 is disposed at the first position (the position of FIG. 1). Therefore, the base material 9 is conveyed along the conveyance path 14 without contacting any of the sealing member 40 and the pressing member 51.

若所需之圖案配置於光照射部20之上方,則光照射裝置1停止基 材搬送機構10之動作。然後,使升降機構52動作,而使按壓構件51下降至第2位置(圖2之位置)(步驟S2)。如此一來,基材9被夾持於按壓構件51與密封構件40之間,且密封構件40密接於基材9之主面91。其結果,燈室30之內部空間31成為與外部隔斷之封閉空間。即,藉由基材9之主面91、燈室30、及密封構件40而形成單一之封閉空間。 If the desired pattern is disposed above the light irradiation portion 20, the light irradiation device 1 stops the base. The operation of the material conveying mechanism 10. Then, the elevating mechanism 52 is operated to lower the pressing member 51 to the second position (the position of FIG. 2) (step S2). As a result, the substrate 9 is sandwiched between the pressing member 51 and the sealing member 40, and the sealing member 40 is in close contact with the main surface 91 of the substrate 9. As a result, the internal space 31 of the lamp chamber 30 becomes a closed space that is blocked from the outside. That is, a single closed space is formed by the main surface 91 of the substrate 9, the lamp chamber 30, and the sealing member 40.

其次,光照射裝置1打開開閉閥63。藉此,將氮氣自氮氣供給源62通過供氣配管61而供給至吹出口64。然後,將氮氣自吹出口64吹出至燈室30之內部空間31。又,燈室30內之氣體通過排氣配管71而向外部排出。其結果,燈室30內之至少基材9之主面91附近之氣體被置換為氮氣(步驟S3)。 Next, the light irradiation device 1 opens the opening and closing valve 63. Thereby, nitrogen gas is supplied from the nitrogen gas supply source 62 to the air outlet 64 through the air supply pipe 61. Then, nitrogen gas is blown from the air outlet 64 to the internal space 31 of the lamp chamber 30. Further, the gas in the lamp chamber 30 is discharged to the outside through the exhaust pipe 71. As a result, at least the gas in the vicinity of the main surface 91 of the substrate 9 in the lamp chamber 30 is replaced with nitrogen gas (step S3).

繼而,一面連續向燈室30內供給氮氣,一面自電源裝置24對複數個閃光燈21施加電壓。藉此,自燈室30內之閃光燈21出射極短時間之閃光。自閃光燈21出射之閃光直接或藉由反射器22反射而照射至基材9之主面91(步驟S4)。其結果,基材9之主面91被加熱。 Then, while supplying nitrogen gas into the lamp chamber 30 continuously, a voltage is applied from the power source device 24 to the plurality of flash lamps 21. Thereby, the flash 21 from the lamp chamber 30 emits a flash for a very short time. The flash light emitted from the flash lamp 21 is irradiated to the main surface 91 of the substrate 9 directly or by reflection by the reflector 22 (step S4). As a result, the main surface 91 of the substrate 9 is heated.

此時,於基材9之主面91附近形成有惰性氣體即氮氣之氣層。因此,抑制主面91隨著基材9之升溫而被氧化。又,對各閃光燈21吹送來自吹出口64之氮氣。藉此,抑制閃光燈21之溫度隨著閃光之出射而上升。又,於照射極短時間之閃光之後,亦藉由對各閃光燈21吹送氮氣而使各閃光燈21冷卻。 At this time, a gas layer of an inert gas, that is, nitrogen gas, is formed in the vicinity of the main surface 91 of the substrate 9. Therefore, the main surface 91 is suppressed from being oxidized as the temperature of the substrate 9 is raised. Further, nitrogen gas from the air outlet 64 is blown to each of the flash lamps 21. Thereby, the temperature of the flash lamp 21 is suppressed from rising as the flash is emitted. Further, after the flash for a very short time, the flash lamps 21 are also cooled by blowing nitrogen gas to the respective flash lamps 21.

照射閃光之後,若經過特定之時間,則光照射裝置1將開閉閥63關閉。藉此,停止向燈室30內供給氮氣(步驟S5)。然後,使升降機構52動作而使按壓構件51上升至第1位置(圖1之位置)(步驟S6)。如此一來,密封構件40自基材9之主面91分離,且燈室30之內部空間31被打開。 After the irradiation of the flash, if the specific time elapses, the light irradiation device 1 closes the opening and closing valve 63. Thereby, the supply of nitrogen gas into the lamp chamber 30 is stopped (step S5). Then, the elevating mechanism 52 is operated to raise the pressing member 51 to the first position (the position in FIG. 1) (step S6). As a result, the sealing member 40 is separated from the main surface 91 of the substrate 9, and the internal space 31 of the lamp chamber 30 is opened.

其後,控制部80判斷於基材9之主面91是否存在應照射閃光之下一圖案(步驟S7)。而且,於存在成為照射對象之下一圖案之情形(於步 驟S7為Yes(是)之情形)時,返回至步驟S1,搬送基材9而將該圖案配置於光照射部20之上方。如此,該光照射裝置1藉由重複步驟S1~S7,而一面使基材9與燈室30相對移動,一面對基材9之主面91全體依序進行閃光照射。 Thereafter, the control unit 80 determines whether or not the main surface 91 of the substrate 9 has a pattern to be irradiated under the flash (step S7). Moreover, in the case where there is a pattern under the irradiation target (in step) When the step S7 is Yes (YES), the process returns to the step S1, and the substrate 9 is conveyed to arrange the pattern above the light irradiation unit 20. As described above, the light irradiation device 1 moves the substrate 9 and the lamp chamber 30 relatively while repeating the steps S1 to S7, and sequentially irradiates the entire main surface 91 of the substrate 9 with the flash.

最終,若無成為照射對象之下一圖案(於步驟S7為No(否)),則結束對該基材9之光照射處理。 Finally, if there is no pattern to be irradiated (NO in step S7), the light irradiation treatment on the substrate 9 is ended.

如此,於該光照射裝置1中,自燈室30內之光照射部20可於不隔著石英玻璃等透光板之情況下對基材9之主面91照射閃光。因此,與使用透光板之情形相比,可使複數個閃光燈21接近於基材9之主面91。又,由於不存在由透光板所致之閃光之反射或吸收,故而可高效率地對基材9之主面91照射閃光。又,藉由省略透光板而可抑制光照射裝置1之製造成本。 As described above, in the light irradiation device 1, the light irradiation portion 20 in the lamp chamber 30 can illuminate the main surface 91 of the substrate 9 without interposing a light-transmitting plate such as quartz glass. Therefore, a plurality of flash lamps 21 can be brought close to the main surface 91 of the substrate 9 as compared with the case of using a light-transmitting plate. Further, since there is no reflection or absorption of the flash light by the light-transmitting plate, the main surface 91 of the substrate 9 can be efficiently irradiated with a flash. Moreover, the manufacturing cost of the light irradiation device 1 can be suppressed by omitting the light-transmitting plate.

又,於該光照射裝置1中,於藉由基材9之主面91、燈室30、及密封構件40而構成之封閉空間內進行閃光照射。即,利用基材9之主面91而形成用以照射閃光之處理空間。因此,無須準備收容基材9全體之較大之腔室。因此,即便於基材9較大之情形時,亦可抑制處理空間之容積。又,只要能夠抑制處理空間之容積,則亦可抑制供給至該處理空間內之處理氣體(例如氮氣)之量。其結果,可減少光照射裝置1之運轉成本。 Further, in the light irradiation device 1, flash irradiation is performed in a closed space formed by the main surface 91 of the substrate 9, the lamp chamber 30, and the sealing member 40. That is, the processing space for illuminating the flash is formed by the main surface 91 of the substrate 9. Therefore, it is not necessary to prepare a large chamber for accommodating the entire substrate 9. Therefore, even when the substrate 9 is large, the volume of the processing space can be suppressed. Further, as long as the volume of the processing space can be suppressed, the amount of the processing gas (for example, nitrogen gas) supplied into the processing space can be suppressed. As a result, the running cost of the light irradiation device 1 can be reduced.

<2.第2實施形態> <2. Second embodiment>

<2-1.關於光照射裝置之構成> <2-1. About the configuration of the light irradiation device>

繼而,對本發明之第2實施形態進行說明。圖4及圖5係表示第2實施形態之光照射裝置101之構成的圖。該光照射裝置101係如下之裝置,即,將薄板狀之基材109一面保持於平台111上一面搬送,且對基材109之主面191照射閃光。成為閃光之照射對象之基材109係例如用於平板顯示器之矩形之玻璃基材。如圖4及圖5所示,本實施形態之光 照射裝置101具備基材搬送機構110、光照射部120、燈室130、密封構件140、接觸/分離機構150、氣體供給部160、排氣部170、及控制部180。 Next, a second embodiment of the present invention will be described. 4 and 5 are views showing the configuration of the light irradiation device 101 of the second embodiment. The light irradiation device 101 is a device that conveys a thin plate-shaped substrate 109 while being held on the stage 111, and irradiates the main surface 191 of the substrate 109 with a flash. The substrate 109 to be an object to be illuminated by the flash is, for example, a rectangular glass substrate for a flat panel display. As shown in FIG. 4 and FIG. 5, the light of this embodiment The irradiation device 101 includes a substrate transfer mechanism 110, a light irradiation unit 120, a lamp chamber 130, a sealing member 140, a contact/separation mechanism 150, a gas supply unit 160, an exhaust unit 170, and a control unit 180.

基材搬送機構110係用以將基材109一面保持為大致水平一面搬送之機構。基材搬送機構110具有支持基材109之平台111、及使平台111移動之平台移動機構112。基材109係於成為處理對象之主面191朝向上側之狀態下,大致水平地載置於平台111上。即,於本實施形態中,平台111為基材搬送機構110之一部分,並且成為保持基材9之保持部。平台移動機構112係將平台111及平台111上之基材109沿著搬送路徑114而大致水平地搬送。即,基材109係於與主面191平行之方向上搬送。平台移動機構112係藉由例如將馬達與滾珠螺桿組合而成之機構或使用線性馬達之機構而實現。 The substrate transfer mechanism 110 is a mechanism for transporting the substrate 109 while being substantially horizontal. The substrate transfer mechanism 110 has a stage 111 that supports the substrate 109 and a stage moving mechanism 112 that moves the stage 111. The base material 109 is placed on the stage 111 substantially horizontally in a state in which the main surface 191 to be processed faces upward. That is, in the present embodiment, the stage 111 is a part of the substrate conveying mechanism 110 and serves as a holding portion for holding the substrate 9. The platform moving mechanism 112 transports the substrate 111 on the platform 111 and the platform 111 substantially horizontally along the transport path 114. That is, the base material 109 is conveyed in a direction parallel to the main surface 191. The platform moving mechanism 112 is realized by, for example, a mechanism in which a motor and a ball screw are combined or a mechanism using a linear motor.

光照射部120係用以對保持於平台111上之基材109之主面191照射閃光之機構。光照射部120配置於基材109之搬送路徑114之上方。光照射部120具有複數個棒狀之閃光燈121與反射器122。複數個閃光燈121係於同一水平面上,以成為相互平行之方式配置。又,如圖4及圖5概念性所示,複數個閃光燈121經由電纜123而連接於電源裝置124。複數個閃光燈121根據自電源裝置124供給之電壓而出射閃光。 The light irradiation unit 120 is a mechanism for irradiating the main surface 191 of the substrate 109 held on the stage 111 with a flash. The light irradiation unit 120 is disposed above the transport path 114 of the substrate 109. The light irradiation unit 120 has a plurality of rod-shaped flash lamps 121 and reflectors 122. A plurality of flash lamps 121 are arranged on the same horizontal surface so as to be arranged in parallel with each other. Further, as conceptually shown in FIGS. 4 and 5, a plurality of flash lamps 121 are connected to the power supply device 124 via a cable 123. A plurality of flash lamps 121 emit a flash based on the voltage supplied from the power supply unit 124.

反射器122係以自上側覆蓋複數個閃光燈121全體之方式配置。自閃光燈121出射之閃光之一部分直接射向基材109側。又,自閃光燈121出射之閃光之其他部分藉由反射器122反射而射向基材109側。藉此,朝向基材109側之閃光之量增加,從而更高效率地對基材109之主面191照射閃光。 The reflector 122 is disposed so as to cover the entirety of the plurality of flash lamps 121 from the upper side. A portion of the flash emitted from the flash lamp 121 is directed toward the side of the substrate 109. Further, the other portion of the flash emitted from the flash lamp 121 is reflected by the reflector 122 and is directed toward the substrate 109 side. Thereby, the amount of flash toward the side of the substrate 109 is increased, so that the main surface 191 of the substrate 109 is more efficiently illuminated by the flash.

與第1實施形態相同,閃光燈121可使用例如氙氣閃光燈。但是,亦可使用氪氣等其他稀有氣體之閃光燈來代替氙氣閃光燈。 As in the first embodiment, for example, a xenon flash lamp can be used for the flash 121. However, it is also possible to use a flash lamp of other rare gases such as helium instead of a xenon flash lamp.

燈室130配置於基材109之搬送路徑114之上方。燈室130具有未藉 由石英玻璃等劃分之單一之內部空間131。繼而,於燈室130之該內部空間131內收容有光照射部120。又,於下部即燈室130之基材109側之端部,設置有朝向下方打開之開口部132。如圖4及圖5所示,開口部132小於基材109整體之主面191。 The lamp chamber 130 is disposed above the transport path 114 of the substrate 109. Lamp compartment 130 has not borrowed A single internal space 131 divided by quartz glass or the like. Then, the light irradiation unit 120 is housed in the internal space 131 of the lamp chamber 130. Further, an opening portion 132 that opens downward is provided at an end portion of the lower portion, that is, the base portion 109 side of the lamp chamber 130. As shown in FIGS. 4 and 5, the opening 132 is smaller than the main surface 191 of the entire substrate 109.

密封構件140係設置於燈室130之開口部132之周緣之環狀構件。密封構件140係發揮如下作用,即於使接觸/分離機構150動作時,接觸於基材109之主面191而密封燈室130與基材109之間隙。又,密封構件40由電氣絕緣性較高之材料所形成,且作為絕緣構件發揮功能。對於密封構件140之材料,可使用例如PEEK等樹脂或陶瓷。 The sealing member 140 is an annular member that is provided at the periphery of the opening 132 of the lamp chamber 130. The sealing member 140 functions to contact the main surface 191 of the base material 109 to seal the gap between the lamp chamber 130 and the base material 109 when the contact/separation mechanism 150 is operated. Further, the sealing member 40 is formed of a material having high electrical insulation properties and functions as an insulating member. For the material of the sealing member 140, a resin such as PEEK or a ceramic can be used.

接觸/分離機構150係用以使基材109之主面191與密封構件140接觸及分離之機構。接觸/分離機構150具有使燈室130上下移動之升降機構152。若使升降機構152動作,則燈室130於第1位置(圖4之位置)與較第1位置低之第2位置(圖5之位置)之間上下移動。升降機構152藉由例如將馬達與滾珠螺桿組合而成之機構或空氣缸而實現。 The contact/separation mechanism 150 is a mechanism for bringing the main surface 191 of the substrate 109 into contact with and separating from the sealing member 140. The contact/separation mechanism 150 has an elevating mechanism 152 that moves the lamp chamber 130 up and down. When the elevating mechanism 152 is operated, the lamp chamber 130 moves up and down between the first position (the position in FIG. 4) and the second position (the position in FIG. 5) lower than the first position. The elevating mechanism 152 is realized by, for example, a mechanism or an air cylinder in which a motor and a ball screw are combined.

於燈室130配置於第1位置時,如圖4般密封構件140自基材109之主面191向上方分離。因此,可利用基材搬送機構110搬送基材109。另一方面,於燈室130配置於第2位置時,如圖5所示,密封構件140密接於基材109之主面191。其結果,燈室130之內部空間131成為與外部隔斷之封閉空間。 When the lamp chamber 130 is placed at the first position, the sealing member 140 is separated upward from the main surface 191 of the substrate 109 as shown in FIG. Therefore, the substrate 109 can be conveyed by the substrate transfer mechanism 110. On the other hand, when the lamp chamber 130 is placed at the second position, as shown in FIG. 5, the sealing member 140 is in close contact with the main surface 191 of the substrate 109. As a result, the internal space 131 of the lamp chamber 130 becomes a closed space that is blocked from the outside.

氣體供給部160係用以向燈室130之內部空間131供給作為處理氣體之氮氣(N2)之機構。氣體供給部160具有供氣配管161及氮氣供給源162。供氣配管161之上游側之端部連接於氮氣供給源162。供氣配管161之下游側之端部連接於設置於反射器122之吹出口164。又,於供氣配管161之路徑中途介插有開閉閥163。因此,若打開開閉閥163,則將氮氣自氮氣供給源162通過供氣配管161而供給至吹出口164。然後,如圖5中虛線所示,自吹出口164向燈室130之內部空間131吹出氮 氣。 The gas supply unit 160 is a mechanism for supplying nitrogen gas (N 2 ) as a processing gas to the internal space 131 of the lamp chamber 130. The gas supply unit 160 has an air supply pipe 161 and a nitrogen gas supply source 162. The upstream side of the gas supply pipe 161 is connected to the nitrogen supply source 162. The end of the downstream side of the air supply pipe 161 is connected to the air outlet 164 provided in the reflector 122. Further, an opening and closing valve 163 is inserted in the middle of the path of the air supply pipe 161. Therefore, when the opening and closing valve 163 is opened, nitrogen gas is supplied from the nitrogen gas supply source 162 to the air outlet 164 through the air supply pipe 161. Then, as indicated by a broken line in FIG. 5, nitrogen gas is blown from the air outlet 164 to the internal space 131 of the lamp chamber 130.

此處,自氣體供給部160供給之氮氣之溫度低於藉由閃光之照射而被加熱之閃光燈121之溫度。因此,可藉由自吹出口164吹出之氮氣冷卻複數個閃光燈21。又,藉由自吹出口164吹出之氮氣而於複數個閃光燈121與基材109之主面191之間,形成惰性氣體即氮氣之氣層。藉此,抑制基材109隨著照射閃光而被氧化。即,於該光照射裝置101中,供給至燈室130內之氮氣發揮冷卻閃光燈121及防止基材109之氧化之兩個效果。又,如此,藉由僅對燈室130之內部空間131供給氮氣而降低氮氣之使用量。 Here, the temperature of the nitrogen gas supplied from the gas supply unit 160 is lower than the temperature of the flash lamp 121 heated by the irradiation of the flash. Therefore, the plurality of flash lamps 21 can be cooled by the nitrogen blown from the air outlet 164. Further, a gas layer of an inert gas, that is, nitrogen gas, is formed between the plurality of flash lamps 121 and the main surface 191 of the substrate 109 by nitrogen gas blown from the air outlet 164. Thereby, the substrate 109 is suppressed from being oxidized by the irradiation of the flash. That is, in the light irradiation device 101, the nitrogen gas supplied into the lamp chamber 130 exhibits two effects of cooling the flash lamp 121 and preventing oxidation of the substrate 109. Further, in this manner, the amount of nitrogen gas used is reduced by supplying only nitrogen gas to the internal space 131 of the lamp chamber 130.

再者,氮氣供給源162可為光照射裝置101之一部分,亦可為設置有光照射裝置101之工廠內之公用設備。又,氣體供給部160亦可供給氬氣(Ar)或氦氣(He)等其他惰性氣體來代替氮氣。又,氣體供給部160根據閃光照射處理之目的,亦可供給其他各種氣體作為處理氣體。例如,亦可將氧氣(O2)、氫氣(H2)、氯氣(Cl2)等反應性氣體或清潔乾燥空氣用作處理氣體。 Further, the nitrogen supply source 162 may be a part of the light irradiation device 101 or a public device in the factory in which the light irradiation device 101 is disposed. Further, the gas supply unit 160 may supply other inert gas such as argon (Ar) or helium (He) instead of nitrogen. Further, the gas supply unit 160 may supply other various gases as the processing gas for the purpose of the flash irradiation treatment. For example, a reactive gas such as oxygen (O 2 ), hydrogen (H 2 ), or chlorine (Cl 2 ) or clean dry air may be used as the processing gas.

排氣部170係用以將氣體自燈室130之內部空間131排出至燈室130之外部之機構。排氣部170具有連接於設置於燈室130之側壁之排氣口133之排氣配管171。若於使密封構件140密接於基材109之主面191之狀態下,一面自氣體供給部160供給氮氣,一面向排氣部170排出氣體,則燈室130內之氣體被置換為氮氣。 The exhaust portion 170 is a mechanism for discharging gas from the internal space 131 of the lamp chamber 130 to the outside of the lamp chamber 130. The exhaust unit 170 has an exhaust pipe 171 connected to an exhaust port 133 provided in a side wall of the lamp chamber 130. When the sealing member 140 is in close contact with the main surface 191 of the base material 109, nitrogen gas is supplied from the gas supply unit 160, and when the gas is exhausted toward the exhaust unit 170, the gas in the lamp chamber 130 is replaced with nitrogen gas.

控制部180係用以對光照射裝置101內之各部分進行動作控制之部位。如圖4及圖5中概念性所示,本實施形態之控制部180藉由具有CPU等運算處理部181、RAM等記憶體182、及硬碟驅動器等記憶部183之電腦而構成。控制部180分別與上述平台移動機構112、電源裝置124、升降機構152、及開閉閥163電性連接。控制部180將記憶於記憶部183中之電腦程式184暫時讀出至記憶體182,且運算處理部181基 於該電腦程式184進行運算處理,藉此控制平台移動機構112、電源裝置124、升降機構152、及開閉閥163之動作。藉此,對基材109進行閃光照射處理。 The control unit 180 is a portion for controlling the operation of each part in the light irradiation device 101. As shown in FIG. 4 and FIG. 5, the control unit 180 of the present embodiment is configured by a computer including an arithmetic processing unit 181 such as a CPU, a memory 182 such as a RAM, and a computer such as a memory unit 183 such as a hard disk drive. The control unit 180 is electrically connected to the platform moving mechanism 112, the power supply device 124, the elevating mechanism 152, and the opening and closing valve 163, respectively. The control unit 180 temporarily reads the computer program 184 stored in the storage unit 183 to the memory 182, and the arithmetic processing unit 181 The computer program 184 performs arithmetic processing to control the operations of the platform moving mechanism 112, the power source device 124, the elevating mechanism 152, and the opening and closing valve 163. Thereby, the substrate 109 is subjected to a flash irradiation treatment.

<2-2.關於閃光之照射處理> <2-2. About the irradiation treatment of the flash>

繼而,對使用第2實施形態之光照射裝置101對基材109之主面191照射閃光時之處理之流程進行說明。圖6係表示該處理之流程之流程圖。該光照射裝置101於進行閃光照射處理時,首先,對控制部180輸入進行該處理之旨意之指令。控制部180若接收到該指令,則根據電腦程式184而對光照射裝置101內之各部分進行動作控制。藉此進行以下動作。 Next, a flow of a process when the main surface 191 of the substrate 109 is irradiated with a flash by the light irradiation device 101 of the second embodiment will be described. Fig. 6 is a flow chart showing the flow of the processing. When the light irradiation device 101 performs the flash irradiation process, first, the control unit 180 inputs an instruction to perform the processing. Upon receiving the command, the control unit 180 controls the operation of each part in the light irradiation device 101 based on the computer program 184. By doing this, the following actions are performed.

於將基材109載置於平台111之表面之後,首先,光照射裝置101藉由使平台移動機構112動作而搬送基材109(步驟S101)。於基材109之主面191,例如沿著搬送方向而等間隔地排列有複數個圖案。基材搬送機構110藉由搬送基材109而將成為閃光之照射對象之圖案配置於光照射部120之下方。再者,於該步驟S101中,燈室130配置於第1位置(圖4之位置)。因此,基材109不與密封構件140接觸而沿著搬送路徑114搬送。 After the substrate 109 is placed on the surface of the stage 111, first, the light irradiation device 101 conveys the substrate 109 by operating the stage moving mechanism 112 (step S101). A plurality of patterns are arranged on the main surface 191 of the substrate 109 at equal intervals, for example, along the transport direction. The substrate transport mechanism 110 arranges a pattern to be irradiated with a flash to be disposed below the light irradiation unit 120 by transporting the substrate 109. Furthermore, in this step S101, the lamp chamber 130 is disposed at the first position (the position of FIG. 4). Therefore, the base material 109 is conveyed along the conveyance path 114 without coming into contact with the sealing member 140.

若所需之圖案配置於光照射部120之下方,則光照射裝置101停止平台移動機構112之動作。然後,使升降機構152動作而使燈室130下降至第2位置(圖5之位置)(步驟S102)。如此一來,密封構件140密接於基材109之主面191。其結果,燈室130之內部空間131成為與外部隔斷之封閉空間。即,藉由基材109之主面191、燈室130、及密封構件140而形成單一之封閉空間。 When the desired pattern is disposed below the light irradiation unit 120, the light irradiation device 101 stops the operation of the stage moving mechanism 112. Then, the elevating mechanism 152 is operated to lower the lamp chamber 130 to the second position (the position of FIG. 5) (step S102). In this way, the sealing member 140 is in close contact with the main surface 191 of the substrate 109. As a result, the internal space 131 of the lamp chamber 130 becomes a closed space that is blocked from the outside. That is, a single closed space is formed by the main surface 191 of the substrate 109, the lamp chamber 130, and the sealing member 140.

其次,光照射裝置101將開閉閥163打開。藉此,將氮氣自氮氣供給源162通過供氣配管161而供給至吹出口164。然後,將氮氣自吹出口164吹出至燈室130之內部空間131。又,燈室130內之氣體通過排 氣配管171而向外部排出。其結果,燈室130內之至少基材109之主面191附近之氣體被置換為氮氣(步驟S103)。 Next, the light irradiation device 101 opens the opening and closing valve 163. Thereby, nitrogen gas is supplied from the nitrogen gas supply source 162 to the air outlet 164 through the air supply pipe 161. Then, nitrogen gas is blown from the air outlet 164 to the internal space 131 of the lamp chamber 130. Moreover, the gas in the lamp chamber 130 passes through the row The gas pipe 171 is discharged to the outside. As a result, at least the gas in the vicinity of the main surface 191 of the substrate 109 in the lamp chamber 130 is replaced with nitrogen gas (step S103).

繼而,一面連續向燈室130內供給氮氣,一面自電源裝置124對複數個閃光燈121施加電壓。藉此,自燈室130內之閃光燈121出射極短時間之閃光。自閃光燈121出射之閃光直接或藉由反射器122反射而照射至基材109之主面191(步驟S104)。其結果,基材109之主面191被加熱。 Then, while continuously supplying nitrogen gas into the lamp chamber 130, a voltage is applied from the power source device 124 to the plurality of flash lamps 121. Thereby, the flash 121 in the lamp chamber 130 is emitted for a very short time. The flash emitted from the flash lamp 121 is irradiated to the main surface 191 of the substrate 109 directly or by reflection from the reflector 122 (step S104). As a result, the main surface 191 of the substrate 109 is heated.

此時,於基材109之主面191附近形成有惰性氣體即氮氣之氣層。因此,抑制主面191隨著基材109之升溫而被氧化。又,對各閃光燈121吹送來自吹出口164之氮氣。藉此,抑制閃光燈121之溫度隨著出射閃光而上升。又,於照射極短時間之閃光之後,亦藉由對各閃光燈121吹送氮氣而使各閃光燈121冷卻。 At this time, a gas layer of an inert gas, that is, nitrogen gas, is formed in the vicinity of the main surface 191 of the substrate 109. Therefore, the main surface 191 is suppressed from being oxidized as the temperature of the substrate 109 is raised. Further, nitrogen gas from the air outlet 164 is blown to each of the flash lamps 121. Thereby, the temperature of the flasher 121 is suppressed from rising as the exiting flash is emitted. Further, after the flash for a very short time, the flash lamps 121 are also cooled by blowing nitrogen gas to the respective flash lamps 121.

照射閃光之後,若經過特定之時間,則光照射裝置101將開閉閥163關閉。藉此,停止向燈室130內供給氮氣(步驟S105)。然後,使升降機構152動作而使燈室130上升至第1位置(圖4之位置)(步驟S106)。如此一來,密封構件140自基材109之主面191分離,且燈室130之內部空間131被打開。 After the irradiation of the flash, the light irradiation device 101 closes the opening and closing valve 163 when a specific time elapses. Thereby, the supply of nitrogen gas into the lamp chamber 130 is stopped (step S105). Then, the elevating mechanism 152 is operated to raise the lamp chamber 130 to the first position (the position in FIG. 4) (step S106). As a result, the sealing member 140 is separated from the main surface 191 of the substrate 109, and the internal space 131 of the lamp chamber 130 is opened.

其後,控制部180判斷於基材109之主面191是否存在應照射閃光之下一圖案(步驟S107)。而且,於存在成為照射對象之下一圖案之情形(於步驟S107為Yes之情形)時,返回至步驟S101,搬送基材109而將該圖案配置於光照射部120之下方。如此,該光照射裝置101藉由重複步驟S101~S107,而一面使基材109與燈室130相對移動,一面對基材109之主面191全體依序進行閃光照射。 Thereafter, the control unit 180 determines whether or not the main surface 191 of the substrate 109 has a pattern to be irradiated under the flash (step S107). In the case where there is a pattern to be irradiated (in the case of Yes in step S107), the process returns to step S101, and the substrate 109 is conveyed to arrange the pattern below the light irradiation unit 120. As described above, the light irradiation device 101 moves the substrate 109 and the lamp chamber 130 relatively while repeating steps S101 to S107, and sequentially irradiates the entire main surface 191 of the substrate 109 with the flash.

最終,若無成為照射對象之下一圖案(於步驟S7為No),則結束對該基材109之光照射處理。 Finally, if there is no pattern under the irradiation target (No in step S7), the light irradiation treatment on the substrate 109 is ended.

如此,於該光照射裝置101中,自燈室130內之光照射部120於不 隔著石英玻璃等透光板之情況下對基材109之主面191照射閃光。因此,與使用透光板之情形相比,可使複數個閃光燈121接近於基材109之主面191。又,由於不存在由透光板所致之閃光之反射或吸收,故而可高效率地對基材109之主面191照射閃光。又,藉由省略透光板而可抑制光照射裝置101之製造成本。 Thus, in the light irradiation device 101, the light irradiation portion 120 from the lamp chamber 130 is not The main surface 191 of the substrate 109 is irradiated with a flash light through a light transmissive plate such as quartz glass. Therefore, a plurality of flash lamps 121 can be brought close to the main surface 191 of the substrate 109 as compared with the case of using a light-transmitting plate. Further, since there is no reflection or absorption of the flash light caused by the light-transmitting plate, the main surface 191 of the substrate 109 can be efficiently irradiated with a flash. Moreover, the manufacturing cost of the light irradiation device 101 can be suppressed by omitting the light-transmitting plate.

又,於該光照射裝置101中,於藉由基材109之主面191、燈室130、及密封構件140而構成之封閉空間內進行閃光照射。即,利用基材109之主面191而形成用以照射閃光之處理空間。因此,無須準備收容基材109全體之較大之室。因此,即便於基材109較大之情形時,亦可抑制處理空間之容積。又,只要能夠抑制處理空間之容積,則亦可抑制供給至該處理空間內之處理氣體(例如氮氣)之量。其結果,可減少光照射裝置101之運轉成本。 Further, in the light irradiation device 101, flash irradiation is performed in a closed space formed by the main surface 191 of the substrate 109, the lamp chamber 130, and the sealing member 140. That is, the processing space for illuminating the flash is formed by the main surface 191 of the substrate 109. Therefore, it is not necessary to prepare a large chamber in which the entire substrate 109 is accommodated. Therefore, even when the substrate 109 is large, the volume of the processing space can be suppressed. Further, as long as the volume of the processing space can be suppressed, the amount of the processing gas (for example, nitrogen gas) supplied into the processing space can be suppressed. As a result, the running cost of the light irradiation device 101 can be reduced.

<3.變化例> <3. Change example>

以上雖舉例對本發明之實施形態進行了說明,但本發明並不限定於上述實施形態。 Although the embodiments of the present invention have been described above by way of examples, the present invention is not limited to the above embodiments.

於上述實施形態中,雖使基材僅向一方向移動,但亦可一面使基材向2個以上之方向移動,一面照射閃光。例如,亦可於第2實施形態之平台移動機構設置X驅動軸與Y驅動軸,且於水平面內使平台二維地移動。 In the above embodiment, the substrate is moved in only one direction, but the substrate may be moved in two or more directions to emit a flash. For example, the X drive shaft and the Y drive shaft may be provided in the platform moving mechanism of the second embodiment, and the stage may be moved two-dimensionally in the horizontal plane.

又,於上述實施形態中,雖將光照射部及燈室固定於水平方向上,且相對於該燈室使基材於水平方向上移動,但亦可將基材固定於水平方向上,而使光照射部及燈室相對於該基材而於水平方向上移動。即,本發明之搬送機構只要為使光照射部及燈室與基材於與基材之主面平行之方向上相對移動即可。 Further, in the above embodiment, the light irradiation portion and the lamp chamber are fixed in the horizontal direction, and the substrate is moved in the horizontal direction with respect to the lamp chamber, but the base material may be fixed in the horizontal direction. The light irradiation unit and the lamp chamber are moved in the horizontal direction with respect to the substrate. In other words, the transport mechanism of the present invention may be such that the light-irradiating portion and the lamp chamber and the substrate are relatively moved in a direction parallel to the main surface of the substrate.

又,亦可將上述第1實施形態、第2實施形態、及變化例中所出現之各要素於不產生矛盾之範圍內適當組合。例如,亦可一面如第1 實施形態般使用複數個輥搬送基材,一面以於一對中間輥之間使基材之主面朝向上側之方式如第2實施形態般於基材之上方配置光照射部及框體,並自該光照射部對基材之主面照射閃光。又,亦可一面如第1實施形態般固定框體之上下方向之位置,一面如第2實施形態般使用平台搬送基材,且使平台本身上下升降移動,藉此使基材之主面與密封構件接觸及分離。 Further, the respective elements appearing in the first embodiment, the second embodiment, and the modifications described above may be combined as appropriate within a range in which no contradiction occurs. For example, you can also be the first In the embodiment, the light-irradiating portion and the frame are disposed above the substrate as in the second embodiment, so that the main surface of the base material faces the upper side between the pair of intermediate rolls. The main surface of the substrate is irradiated with a flash from the light irradiation portion. Further, as in the first embodiment, the substrate can be transported by using a platform as in the second embodiment, and the platform itself can be moved up and down as shown in the second embodiment, whereby the main surface of the substrate can be moved up and down. The sealing member contacts and separates.

又,關於光照射裝置之各部分之詳細構成,亦可與本案之各圖不同。例如,光照射部所具有之閃光燈之數量亦可與本案之各圖所示之根數不同。 Further, the detailed configuration of each portion of the light irradiation device may be different from the respective drawings of the present invention. For example, the number of flashes provided in the light-irradiating portion may be different from the number of flashes shown in the respective figures of the present invention.

又,於上述第1實施形態中,將可靈活彎曲之樹脂製之基材作為處理對象,於上述第2實施形態中,將硬質之玻璃製之基材作為處理對象。然而,本發明之光照射裝置亦可將包含金屬等其他材料之基材作為處理對象。又,作為基材之用途,可例舉例如撓性器件、撓性顯示器、平板顯示器、電子機器、太陽電池、燃料電池、半導體等。 Further, in the first embodiment, the base material made of resin which can be flexibly bent is used as a processing target, and in the second embodiment, the base material made of hard glass is used as a processing target. However, the light irradiation device of the present invention may also treat a substrate including other materials such as metal as a treatment target. Further, examples of the use of the substrate include a flexible device, a flexible display, a flat panel display, an electronic device, a solar cell, a fuel cell, and a semiconductor.

1‧‧‧光照射裝置 1‧‧‧Lighting device

9‧‧‧基材 9‧‧‧Substrate

10‧‧‧基材搬送機構 10‧‧‧Substrate transport mechanism

11‧‧‧送出輥 11‧‧‧Send rolls

12‧‧‧中間輥 12‧‧‧Intermediate roller

13‧‧‧捲取輥 13‧‧‧Winding roller

14‧‧‧搬送路徑 14‧‧‧Transfer path

20‧‧‧光照射部 20‧‧‧Lighting Department

21‧‧‧閃光燈 21‧‧‧Flash

22‧‧‧反射器 22‧‧‧ reflector

23‧‧‧電纜 23‧‧‧ cable

24‧‧‧電源裝置 24‧‧‧Power supply unit

30‧‧‧燈室 30‧‧‧Light room

31‧‧‧內部空間 31‧‧‧Internal space

32‧‧‧開口部 32‧‧‧ openings

33‧‧‧排氣口 33‧‧‧Exhaust port

40‧‧‧密封構件 40‧‧‧ Sealing members

50‧‧‧接觸/分離機構 50‧‧‧Contact/Separation Mechanism

51‧‧‧按壓構件 51‧‧‧ Pressing members

52‧‧‧升降機構 52‧‧‧ Lifting mechanism

60‧‧‧氣體供給部 60‧‧‧Gas Supply Department

61‧‧‧供氣配管 61‧‧‧ gas supply piping

62‧‧‧供給源 62‧‧‧Supply source

63‧‧‧開閉閥 63‧‧‧Opening and closing valve

64‧‧‧吹出口 64‧‧‧Blowing out

70‧‧‧排氣部 70‧‧‧Exhaust department

71‧‧‧排氣配管 71‧‧‧Exhaust piping

80‧‧‧控制部 80‧‧‧Control Department

81‧‧‧運算處理部 81‧‧‧Operation Processing Department

82‧‧‧記憶體 82‧‧‧ memory

83‧‧‧記憶部 83‧‧‧Memory Department

84‧‧‧電腦程式 84‧‧‧ computer program

91‧‧‧主面 91‧‧‧Main face

Claims (17)

一種光照射裝置,其係對基材之主面照射閃光者,且具備:保持部,其保持上述基材;光照射部,其對保持於上述保持部之上述基材之主面照射閃光;框體,其將上述光照射部收容於單一之內部空間,並且於上述基材側具有開口部;密封構件,其設置於上述框體之上述開口部之周緣;及接觸/分離機構,其以使上述基材之主面與上述密封構件接觸及分離之方式,使上述基材及上述密封構件相對性地移動;當上述基材之主面與上述密封構件接觸時,由上述基材之主面與上述框體形成單一之封閉空間;自配置於上述封閉空間之上述光照射部對上述基材之主面照射閃光。 A light irradiation device that irradiates a main surface of a substrate with a flash, and includes: a holding portion that holds the substrate; and a light irradiation portion that illuminates a main surface of the substrate held by the holding portion; a housing that accommodates the light irradiation unit in a single internal space and has an opening on the substrate side; a sealing member that is provided on a periphery of the opening of the housing; and a contact/separation mechanism that The substrate and the sealing member are relatively moved such that the main surface of the substrate contacts and separates the sealing member; and when the main surface of the substrate contacts the sealing member, the substrate is The surface forms a single closed space with the frame; and the light irradiation unit disposed in the closed space irradiates the main surface of the substrate with a flash. 如請求項1之光照射裝置,其中上述框體之上述開口部小於上述基材之主面,且該光照射裝置進而具備搬送機構,該搬送機構使上述基材與上述框體於與上述基材之主面平行之方向上相對移動。 The light irradiation device of claim 1, wherein the opening of the frame is smaller than a main surface of the substrate, and the light irradiation device further includes a transfer mechanism that causes the substrate and the frame to be The main faces of the material move relatively in parallel. 如請求項2之光照射裝置,其中上述框體之位置被固定,且上述搬送機構使上述基材移動。 The light irradiation device of claim 2, wherein the position of the frame is fixed, and the conveying mechanism moves the substrate. 如請求項3之光照射裝置,其中上述基材為片狀或薄板狀。 The light irradiation device of claim 3, wherein the substrate is in the form of a sheet or a thin plate. 如請求項4之光照射裝置,其中上述基材為可靈活地彎曲之片狀之基材,且上述搬送機構具有:送出輥,其於較上述保持部更靠搬送方向之上游側送出上 述基材;及捲取輥,其於較上述保持部更靠搬送方向之下游側捲取上述基材。 The light irradiation device of claim 4, wherein the substrate is a flexible sheet-shaped substrate, and the transfer mechanism has a delivery roller that is fed upstream of the holding portion in the transport direction. And a winding roller that winds the substrate on a downstream side of the holding portion in a conveying direction. 如請求項5之光照射裝置,其中上述保持部一面對上述基材賦予張力,一面支持上述基材。 The light irradiation device of claim 5, wherein the holding portion supports the substrate while applying tension to the substrate. 如請求項6之光照射裝置,其中上述保持部具有支持基材之複數個輥。 The light irradiation device of claim 6, wherein the holding portion has a plurality of rollers supporting the substrate. 如請求項4之光照射裝置,其中上述保持部具有支持基材之平台。 The light irradiation device of claim 4, wherein the holding portion has a platform supporting the substrate. 如請求項1之光照射裝置,其中上述保持部於上述基材之主面朝向下側之狀態下,將上述基材保持為水平,且上述光照射部及上述框體配置於保持在上述保持部之上述基材之下側。 The light irradiation device according to claim 1, wherein the holding portion holds the substrate horizontally in a state in which a main surface of the substrate faces downward, and the light irradiation portion and the frame are disposed to be held by the holding The lower side of the above substrate. 如請求項1之光照射裝置,其進而具備氣體供給部,該氣體供給部向上述框體之內部供給氣體。 The light irradiation device of claim 1, further comprising a gas supply unit that supplies the gas to the inside of the casing. 如請求項10之光照射裝置,其中上述氣體為惰性氣體。 The light irradiation device of claim 10, wherein the gas is an inert gas. 如請求項11之光照射裝置,其中上述惰性氣體為氮氣。 The light irradiation device of claim 11, wherein the inert gas is nitrogen. 如請求項1之光照射裝置,其進而具備排氣部,該排氣部將上述框體內之氣體排出。 The light irradiation device of claim 1, further comprising an exhaust unit that discharges the gas in the casing. 如請求項1至13中任一項之光照射裝置,其中上述基材包含樹脂。 The light irradiation device according to any one of claims 1 to 13, wherein the substrate comprises a resin. 一種光照射方法,其係對基材之主面照射閃光之光照射方法,且包括以下步驟:a)使用基材之主面及於基材之主面側具有開口部之框體而形成單一之封閉空間;b)於上述步驟a)之後,自配置於上述封閉空間之光照射部對上 述基材之主面照射閃光;及c)於上述步驟b)之後,打開上述封閉空間。 A light irradiation method is a method of irradiating a main surface of a substrate with a flash light, and comprising the steps of: a) forming a single body using a main surface of the substrate and a frame having an opening on a main surface side of the substrate; a closed space; b) after the above step a), self-disposed on the light-irradiating portion of the enclosed space The main surface of the substrate is irradiated with a flash; and c) after the above step b), the closed space is opened. 如請求項15之光照射方法,其中上述框體之上述開口部小於上述基材之主面,且一面使上述基材及上述框體於與上述基材之主面平行之方向上相對移動,一面重複上述步驟a)、上述步驟b)、及上述步驟c)。 The light irradiation method of claim 15, wherein the opening of the frame body is smaller than a main surface of the base material, and the base material and the frame body are relatively moved in a direction parallel to a main surface of the base material, The above step a), the above step b), and the above step c) are repeated. 如請求項15或16之光照射方法,其中於上述步驟b)中,一面向上述框體之內部供給氣體,一面自上述光照射部照射閃光。 The light irradiation method according to claim 15 or 16, wherein in the step b), a gas is supplied to the inside of the casing, and a flash is irradiated from the light irradiation portion.
TW103120224A 2013-08-08 2014-06-11 Apparatus for and method of irradiating light TWI567796B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013165029A JP6152010B2 (en) 2013-08-08 2013-08-08 Light irradiation apparatus and light irradiation method

Publications (2)

Publication Number Publication Date
TW201521093A TW201521093A (en) 2015-06-01
TWI567796B true TWI567796B (en) 2017-01-21

Family

ID=52502794

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103120224A TWI567796B (en) 2013-08-08 2014-06-11 Apparatus for and method of irradiating light

Country Status (4)

Country Link
JP (1) JP6152010B2 (en)
KR (1) KR101574896B1 (en)
CN (1) CN104347455A (en)
TW (1) TWI567796B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7336256B2 (en) * 2019-05-10 2023-08-31 東京エレクトロン株式会社 Mounting table and manufacturing method of mounting table

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0677198A (en) * 1992-08-28 1994-03-18 Hitachi Ltd Removal apparatus of organic substrate
JP2006134983A (en) * 2004-11-04 2006-05-25 Ushio Inc Excimer light irradiation equipment
JP2006219689A (en) * 2005-02-08 2006-08-24 Seiko Instruments Inc Thin-film production apparatus and method for forming semiconductor thin film
JP2007324170A (en) * 2006-05-30 2007-12-13 Yoshimi Shiotani Irradiation device and semiconductor production system employing the same
JP2009251269A (en) * 2008-04-07 2009-10-29 Hitachi High-Technologies Corp Exposure apparatus, exposure method and method of manufacturing panel substrate for display

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6229093U (en) * 1985-08-06 1987-02-21
JPH03222429A (en) * 1990-01-29 1991-10-01 Mitsubishi Electric Corp Semiconductor manufacturing device
JP4218192B2 (en) * 1999-08-05 2009-02-04 株式会社日立ハイテクノロジーズ Substrate processing apparatus and processing method
KR101150996B1 (en) * 2004-09-24 2012-06-08 가부시키가이샤 한도오따이 에네루기 켄큐쇼 Method for manufacturing a semiconductor device
JP5019156B2 (en) * 2006-08-21 2012-09-05 ウシオ電機株式会社 Excimer lamp device
JP5456257B2 (en) * 2008-01-08 2014-03-26 大日本スクリーン製造株式会社 Heat treatment equipment
US8410712B2 (en) * 2008-07-09 2013-04-02 Ncc Nano, Llc Method and apparatus for curing thin films on low-temperature substrates at high speeds
JP5554034B2 (en) * 2009-08-26 2014-07-23 リンテック株式会社 Light irradiation apparatus and light irradiation method
JP2011091386A (en) * 2009-09-24 2011-05-06 Semiconductor Energy Lab Co Ltd Heat treatment apparatus, heat treatment method and method for manufacturing semiconductor device
JP5728265B2 (en) 2011-03-29 2015-06-03 リンテック株式会社 Light irradiation apparatus and light irradiation method
JP5601312B2 (en) * 2011-11-25 2014-10-08 ウシオ電機株式会社 Light irradiation device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0677198A (en) * 1992-08-28 1994-03-18 Hitachi Ltd Removal apparatus of organic substrate
JP2006134983A (en) * 2004-11-04 2006-05-25 Ushio Inc Excimer light irradiation equipment
JP2006219689A (en) * 2005-02-08 2006-08-24 Seiko Instruments Inc Thin-film production apparatus and method for forming semiconductor thin film
JP2007324170A (en) * 2006-05-30 2007-12-13 Yoshimi Shiotani Irradiation device and semiconductor production system employing the same
JP2009251269A (en) * 2008-04-07 2009-10-29 Hitachi High-Technologies Corp Exposure apparatus, exposure method and method of manufacturing panel substrate for display

Also Published As

Publication number Publication date
JP2015035472A (en) 2015-02-19
TW201521093A (en) 2015-06-01
KR101574896B1 (en) 2015-12-04
CN104347455A (en) 2015-02-11
KR20150018373A (en) 2015-02-23
JP6152010B2 (en) 2017-06-21

Similar Documents

Publication Publication Date Title
JP5092808B2 (en) Ultraviolet irradiation unit and ultraviolet irradiation treatment device
TWI505332B (en) Heat treatment method and heat treatment apparatus
KR101657038B1 (en) Light projection device
JP7140448B2 (en) NOTCHING DEVICE AND NOTCHING METHOD FOR SECONDARY BATTERY
TW201434098A (en) UV curing system and method of processing a wafer
TW202109672A (en) Heat treatment apparatus and method for cleaning heat treatment apparatus
TW201742121A (en) Heat treatment apparatus
US10446415B2 (en) Exhaust method of heat treatment apparatus
JP5317852B2 (en) UV irradiation equipment
TWI567796B (en) Apparatus for and method of irradiating light
KR20130058602A (en) Light irradiation apparatus
TWI642125B (en) Heat treatment apparatus
TW201913745A (en) Heat treatment apparatus and heat treatment method
US20160284573A1 (en) Light irradiation type heat treatment apparatus and method for manufacturing heat treatment apparatus
JP2015065358A (en) Heat treatment device
KR20190033003A (en) Particle removal method and heat treatment apparatus
KR102165402B1 (en) Heat treatment apparatus and heat treatment method
TW201812978A (en) Heat treatment apparatus
TWI650802B (en) Crystal structure control method and heat treatment method
JP2009081239A (en) Light illumination type heat treatment device
JP2011206731A (en) Ultraviolet irradiation apparatus
JP6486775B2 (en) Heat treatment apparatus and heat treatment method
TWI600087B (en) Heat treatment apparatus and method for manufacturing heat treatment apparatus
TWI761908B (en) Heat treatment method and heat treatment apparatus
JP5093176B2 (en) Excimer lamp device