TWI560297B - Method to produce highly transparent hydrogenated carbon protective coating for transparent substrates - Google Patents

Method to produce highly transparent hydrogenated carbon protective coating for transparent substrates

Info

Publication number
TWI560297B
TWI560297B TW102124269A TW102124269A TWI560297B TW I560297 B TWI560297 B TW I560297B TW 102124269 A TW102124269 A TW 102124269A TW 102124269 A TW102124269 A TW 102124269A TW I560297 B TWI560297 B TW I560297B
Authority
TW
Taiwan
Prior art keywords
protective coating
transparent
carbon protective
produce highly
hydrogenated carbon
Prior art date
Application number
TW102124269A
Other languages
English (en)
Other versions
TW201410902A (zh
Inventor
David Fang Wei Chen
David Ward Brown
Charles Liu
Iv Samuel D Harkness
Original Assignee
Intevac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intevac Inc filed Critical Intevac Inc
Publication of TW201410902A publication Critical patent/TW201410902A/zh
Application granted granted Critical
Publication of TWI560297B publication Critical patent/TWI560297B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
TW102124269A 2012-07-05 2013-07-05 Method to produce highly transparent hydrogenated carbon protective coating for transparent substrates TWI560297B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201261668402P 2012-07-05 2012-07-05

Publications (2)

Publication Number Publication Date
TW201410902A TW201410902A (zh) 2014-03-16
TWI560297B true TWI560297B (en) 2016-12-01

Family

ID=49877682

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102124269A TWI560297B (en) 2012-07-05 2013-07-05 Method to produce highly transparent hydrogenated carbon protective coating for transparent substrates

Country Status (8)

Country Link
US (2) US9605340B2 (zh)
JP (1) JP6316287B2 (zh)
KR (2) KR20150030741A (zh)
CN (1) CN104603324B (zh)
MY (1) MY171465A (zh)
SG (1) SG11201500038PA (zh)
TW (1) TWI560297B (zh)
WO (1) WO2014008484A2 (zh)

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TWI560297B (en) 2012-07-05 2016-12-01 Intevac Inc Method to produce highly transparent hydrogenated carbon protective coating for transparent substrates
CN106104311B (zh) * 2014-03-13 2018-04-10 富士胶片株式会社 光学组件、红外线照相机及光学组件的制造方法
DE112015004470B4 (de) * 2014-09-30 2018-08-23 Fujifilm Corporation Antireflexfilm, Linse und Abbildungsvorrichtung
JP6155399B2 (ja) * 2014-09-30 2017-06-28 富士フイルム株式会社 反射防止膜及びカルコゲナイドガラスレンズ並びに撮像装置
US11472590B2 (en) 2016-05-05 2022-10-18 The Coca-Cola Company Containers and methods for improved mechanical strength
CN107785488A (zh) * 2016-08-25 2018-03-09 杭州纤纳光电科技有限公司 钙钛矿薄膜的低压化学沉积的设备及其使用方法和应用
CN107083536B (zh) * 2017-04-24 2019-11-29 信利光电股份有限公司 一种类金刚石复合薄膜及其制备方法
CN107857471B (zh) * 2017-11-28 2020-09-04 信利光电股份有限公司 一种渐变色玻璃的制作方法
CN108468029B (zh) * 2018-02-12 2020-01-21 中国科学院国家天文台南京天文光学技术研究所 用于碳化硅光学镜面改性与面形提升的磁控溅射扫描方法
CN108330459A (zh) * 2018-02-26 2018-07-27 温州职业技术学院 一种对称磁控溅射工艺及其类金刚石涂层的应用
US10494710B1 (en) 2018-08-28 2019-12-03 Yamaha Hatsudoki Kabushiki Kaisha Film-forming method, production method for product with ceramic film, and product with ceramic film
CN114302604B (zh) * 2022-01-18 2024-03-15 Oppo广东移动通信有限公司 盖板、其制备方法及电子设备

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Also Published As

Publication number Publication date
KR20150030741A (ko) 2015-03-20
US20170152592A1 (en) 2017-06-01
CN104603324B (zh) 2017-03-08
JP6316287B2 (ja) 2018-04-25
KR20210010667A (ko) 2021-01-27
JP2015528056A (ja) 2015-09-24
WO2014008484A2 (en) 2014-01-09
US20140008214A1 (en) 2014-01-09
CN104603324A (zh) 2015-05-06
MY171465A (en) 2019-10-15
US9896758B2 (en) 2018-02-20
TW201410902A (zh) 2014-03-16
SG11201500038PA (en) 2015-02-27
US9605340B2 (en) 2017-03-28
WO2014008484A3 (en) 2014-02-27
KR102292497B1 (ko) 2021-08-20

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