TWI560015B - - Google Patents

Info

Publication number
TWI560015B
TWI560015B TW099122327A TW99122327A TWI560015B TW I560015 B TWI560015 B TW I560015B TW 099122327 A TW099122327 A TW 099122327A TW 99122327 A TW99122327 A TW 99122327A TW I560015 B TWI560015 B TW I560015B
Authority
TW
Taiwan
Application number
TW099122327A
Other versions
TW201105444A (en
Inventor
Kazuhiro Atsumi
Masaharu Hoshikawa
Hiroyuki Iwaki
Makoto Nakano
Original Assignee
Hamamatsu Photonics Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hamamatsu Photonics Kk filed Critical Hamamatsu Photonics Kk
Publication of TW201105444A publication Critical patent/TW201105444A/zh
Application granted granted Critical
Publication of TWI560015B publication Critical patent/TWI560015B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/40—Removing material taking account of the properties of the material involved
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)
TW099122327A 2009-08-03 2010-07-07 Laser machining method TW201105444A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009181003A JP5451238B2 (ja) 2009-08-03 2009-08-03 レーザ加工方法

Publications (2)

Publication Number Publication Date
TW201105444A TW201105444A (en) 2011-02-16
TWI560015B true TWI560015B (zh) 2016-12-01

Family

ID=43544198

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099122327A TW201105444A (en) 2009-08-03 2010-07-07 Laser machining method

Country Status (3)

Country Link
JP (1) JP5451238B2 (zh)
TW (1) TW201105444A (zh)
WO (1) WO2011016296A1 (zh)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5947172B2 (ja) 2012-09-19 2016-07-06 浜松ホトニクス株式会社 波長変換型空間光変調装置
JP6620976B2 (ja) * 2015-09-29 2019-12-18 株式会社東京精密 レーザー加工装置及びレーザー加工方法
JP6644563B2 (ja) * 2016-01-28 2020-02-12 浜松ホトニクス株式会社 レーザ光照射装置
JP6896702B2 (ja) * 2016-03-10 2021-06-30 浜松ホトニクス株式会社 レーザ光照射装置及びレーザ光照射方法
JP6732627B2 (ja) * 2016-10-19 2020-07-29 浜松ホトニクス株式会社 レーザ光照射装置
JP7105639B2 (ja) 2018-07-05 2022-07-25 浜松ホトニクス株式会社 レーザ加工装置
JP7088761B2 (ja) * 2018-07-05 2022-06-21 浜松ホトニクス株式会社 レーザ加工装置
US11024501B2 (en) 2018-12-29 2021-06-01 Cree, Inc. Carrier-assisted method for parting crystalline material along laser damage region
US10562130B1 (en) 2018-12-29 2020-02-18 Cree, Inc. Laser-assisted method for parting crystalline material
US10576585B1 (en) 2018-12-29 2020-03-03 Cree, Inc. Laser-assisted method for parting crystalline material
US10611052B1 (en) 2019-05-17 2020-04-07 Cree, Inc. Silicon carbide wafers with relaxed positive bow and related methods
JP7450413B2 (ja) 2020-03-09 2024-03-15 株式会社ディスコ レーザー加工装置およびレーザー加工装置の調整方法
JP7487039B2 (ja) 2020-08-04 2024-05-20 株式会社ディスコ レーザー加工装置
JP7212299B1 (ja) * 2022-03-28 2023-01-25 株式会社東京精密 レーザ光の光軸調整方法及び装置
JP2023145943A (ja) * 2022-03-29 2023-10-12 浜松ホトニクス株式会社 空間光変調装置、加工装置、及び、位置推定方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200533451A (en) * 2004-03-05 2005-10-16 Olympus Corp Apparatus for laser machining
TW200846855A (en) * 2006-12-19 2008-12-01 Seereal Technologies Sa Method and device for reducing speckle patterns in a three-dimensional holographic reconstruction
TW200905246A (en) * 2007-05-31 2009-02-01 Nikon Corp Tunable filter, light source device and spectrum distribution measuring device
TW200911433A (en) * 2007-08-03 2009-03-16 Hamamatsu Photonics Kk Laser working method, laser working apparatus, and its manufacturing method
TW200912386A (en) * 2007-07-03 2009-03-16 Jds Uniphase Corp Non-etched flat polarization-selective diffractive optical elements
TW200916248A (en) * 2007-10-01 2009-04-16 Olympus Corp Adjusting apparatus, laser processing apparatus, adjusting method and adjusting program
TW200921083A (en) * 2004-10-18 2009-05-16 Asml Netherlands Bv Lithographic apparatus and device manufacturing method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002049002A (ja) * 2000-08-03 2002-02-15 Hamamatsu Photonics Kk レーザ加工装置
JP2002273583A (ja) * 2001-03-19 2002-09-25 Inst Of Physical & Chemical Res 透明媒質加工装置
JP3775250B2 (ja) * 2001-07-12 2006-05-17 セイコーエプソン株式会社 レーザー加工方法及びレーザー加工装置
JP4959590B2 (ja) * 2008-01-15 2012-06-27 浜松ホトニクス株式会社 観察装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200533451A (en) * 2004-03-05 2005-10-16 Olympus Corp Apparatus for laser machining
TW200921083A (en) * 2004-10-18 2009-05-16 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
TW200846855A (en) * 2006-12-19 2008-12-01 Seereal Technologies Sa Method and device for reducing speckle patterns in a three-dimensional holographic reconstruction
TW200905246A (en) * 2007-05-31 2009-02-01 Nikon Corp Tunable filter, light source device and spectrum distribution measuring device
TW200912386A (en) * 2007-07-03 2009-03-16 Jds Uniphase Corp Non-etched flat polarization-selective diffractive optical elements
TW200911433A (en) * 2007-08-03 2009-03-16 Hamamatsu Photonics Kk Laser working method, laser working apparatus, and its manufacturing method
TW200916248A (en) * 2007-10-01 2009-04-16 Olympus Corp Adjusting apparatus, laser processing apparatus, adjusting method and adjusting program

Also Published As

Publication number Publication date
JP5451238B2 (ja) 2014-03-26
JP2011031284A (ja) 2011-02-17
TW201105444A (en) 2011-02-16
WO2011016296A1 (ja) 2011-02-10

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