TWI548950B - 微影系統及在該微影系統內處理基板之方法 - Google Patents

微影系統及在該微影系統內處理基板之方法 Download PDF

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Publication number
TWI548950B
TWI548950B TW100146173A TW100146173A TWI548950B TW I548950 B TWI548950 B TW I548950B TW 100146173 A TW100146173 A TW 100146173A TW 100146173 A TW100146173 A TW 100146173A TW I548950 B TWI548950 B TW I548950B
Authority
TW
Taiwan
Prior art keywords
substrate
lithography
lithography system
unit
vacuum chamber
Prior art date
Application number
TW100146173A
Other languages
English (en)
Chinese (zh)
Other versions
TW201241575A (en
Inventor
包爾 古伊杜 迪
將 亨卓克 傑 迪
芬森特 席爾菲斯特 庫柏
歐文 史羅特
Original Assignee
瑪波微影Ｉｐ公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 瑪波微影Ｉｐ公司 filed Critical 瑪波微影Ｉｐ公司
Publication of TW201241575A publication Critical patent/TW201241575A/zh
Application granted granted Critical
Publication of TWI548950B publication Critical patent/TWI548950B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H01J37/185—Means for transferring objects between different enclosures of different pressure or atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31774—Multi-beam

Landscapes

  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW100146173A 2010-12-14 2011-12-14 微影系統及在該微影系統內處理基板之方法 TWI548950B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US42274510P 2010-12-14 2010-12-14
US201161480163P 2011-04-28 2011-04-28

Publications (2)

Publication Number Publication Date
TW201241575A TW201241575A (en) 2012-10-16
TWI548950B true TWI548950B (zh) 2016-09-11

Family

ID=45418651

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100146173A TWI548950B (zh) 2010-12-14 2011-12-14 微影系統及在該微影系統內處理基板之方法

Country Status (8)

Country Link
US (1) US8895943B2 (cg-RX-API-DMAC7.html)
EP (1) EP2681624B1 (cg-RX-API-DMAC7.html)
JP (1) JP6158091B2 (cg-RX-API-DMAC7.html)
KR (1) KR101907433B1 (cg-RX-API-DMAC7.html)
CN (1) CN103370655B (cg-RX-API-DMAC7.html)
RU (1) RU2579533C2 (cg-RX-API-DMAC7.html)
TW (1) TWI548950B (cg-RX-API-DMAC7.html)
WO (1) WO2012080278A1 (cg-RX-API-DMAC7.html)

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Also Published As

Publication number Publication date
JP6158091B2 (ja) 2017-07-05
EP2681624A1 (en) 2014-01-08
RU2579533C2 (ru) 2016-04-10
CN103370655A (zh) 2013-10-23
KR101907433B1 (ko) 2018-10-12
US8895943B2 (en) 2014-11-25
RU2013132215A (ru) 2015-01-20
EP2681624B1 (en) 2016-07-20
US20120175527A1 (en) 2012-07-12
TW201241575A (en) 2012-10-16
JP2014501442A (ja) 2014-01-20
KR20130131398A (ko) 2013-12-03
WO2012080278A1 (en) 2012-06-21
CN103370655B (zh) 2016-03-16

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