TWI547709B - A radiation detector manufacturing method and a radiation detector - Google Patents

A radiation detector manufacturing method and a radiation detector Download PDF

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TWI547709B
TWI547709B TW103141659A TW103141659A TWI547709B TW I547709 B TWI547709 B TW I547709B TW 103141659 A TW103141659 A TW 103141659A TW 103141659 A TW103141659 A TW 103141659A TW I547709 B TWI547709 B TW I547709B
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layer
adhesive
array substrate
moisture
cap portion
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TW103141659A
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TW201527786A (en
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Katsuhisa Homma
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Toshiba Electron Tubes & Devic
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Description

放射線檢測器之製造方法及放射線檢測器 Radiation detector manufacturing method and radiation detector

本發明之實施形態係關於放射線檢測器之製造方法及放射線檢測器。 Embodiments of the present invention relate to a method of manufacturing a radiation detector and a radiation detector.

放射線檢測器之一例有X射線檢測器。於X射線檢測器中,將X射線藉由閃爍體層轉換為可視光即螢光,並使用非晶矽(a-Si)光電二極體、或CCD(Charge Coupled Device:電荷耦合器件)等光電轉換元件,將該螢光轉換為信號電荷,藉此取得圖像。 An example of a radiation detector is an X-ray detector. In an X-ray detector, X-rays are converted into visible light, that is, fluorescent light, by a scintillator layer, and an amorphous germanium (a-Si) photodiode or a CCD (Charge Coupled Device) is used. The conversion element converts the fluorescence into a signal charge, thereby acquiring an image.

又,為了提高螢光之利用效率、改善感度特性,亦有於閃爍體層上進而設置反射層之情形。 Further, in order to improve the utilization efficiency of the fluorescent light and improve the sensitivity characteristics, a reflective layer may be further provided on the scintillator layer.

此處,為了抑制因水蒸氣等引起之特性之劣化,閃爍體層與反射層必須自外部氣體環境隔離。尤其閃爍體層包含CsI(碘化銫):Tl(鉈)膜或CsI:Na(鈉)膜等之情形時,有因濕度等引起特性劣化增大之虞。 Here, in order to suppress deterioration of characteristics due to water vapor or the like, the scintillator layer and the reflective layer must be isolated from the external gaseous environment. In particular, when the scintillator layer contains a CsI (yttrium iodide): Tl (yttrium) film or a CsI:Na (sodium) film or the like, the deterioration of characteristics due to humidity or the like may increase.

因此,已有提出如下技術,即,以包含聚對二甲苯之膜覆蓋閃爍體層與反射層,或使用包圍閃爍體層的周圍之包圍構件及設在包圍構件上的覆蓋體而密封閃爍體層。 Therefore, there has been proposed a technique of covering a scintillator layer and a reflective layer with a film containing parylene or sealing the scintillator layer with a surrounding member surrounding the scintillator layer and a cover provided on the surrounding member.

又,作為可獲得更高的防濕性能之構造,已有提出一種以冠帽形狀之防濕體覆蓋閃爍體層與反射層,並將防濕體之帽緣(凸緣)部接著於基板之構造。 Further, as a structure for obtaining a higher moisture-proof property, it has been proposed to cover the scintillator layer and the reflective layer with a cap-shaped moisture-proof body, and to attach the cap edge (flange) portion of the moisture-proof body to the substrate. structure.

於使用冠帽形狀之防濕體之情形時,若將介於防濕體之帽緣部 與基板之間的接著劑之塗佈量增多,且將用以使帽緣部與基板緊貼之加壓力增大至一定程度以上時,可確保帽緣部與基板之密封性,並可獲得高可靠性。 In the case of using a cap-shaped moisture-proof body, if it is placed between the cap portion of the moisture-proof body When the amount of the adhesive applied to the substrate is increased, and the pressing force for bringing the cap portion and the substrate into close contact is increased to a certain extent or more, the sealing property between the cap portion and the substrate can be ensured, and High reliability.

然而,於增多接著劑之塗佈量,並將加壓力增大至一定以上時,自防濕體之帽緣部溢出於外側之接著劑之量變多,而有於防濕體之附近難以連接可撓性印刷基板等之虞。又,自防濕體之冠帽部溢出於外側之接著劑之量若增多,於切斷為最終的面板尺寸時,有接著劑之溢出部分干擾切斷刀片之虞。 However, when the amount of application of the adhesive agent is increased and the pressing force is increased to a certain level or more, the amount of the adhesive agent that overflows from the outer edge portion of the moisture-proof body is increased, and it is difficult to connect in the vicinity of the moisture-proof body. A flexible printed circuit board or the like. Further, when the amount of the adhesive agent overflowing from the outer side of the cap portion of the moisture-proof body is increased, when the final panel size is cut, the overflow portion of the adhesive agent interferes with the cutting blade.

又,近年來,為了X射線檢測器之小型化或輕量化等,期望縮小防濕體帽緣部之尺寸。因此,有進而難以抑制接著劑自防濕體之帽緣部溢出於外側之虞。 Moreover, in recent years, in order to reduce the size and weight of the X-ray detector, it is desirable to reduce the size of the moisture-proof body cap portion. Therefore, it is further difficult to suppress the adhesion of the adhesive agent from the outer edge portion of the moisture-proof body to the outside.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]美國專利第6262422號說明書 [Patent Document 1] US Patent No. 6262422

[專利文獻2]日本特開平05-242847號公報 [Patent Document 2] Japanese Patent Publication No. 05-242847

[專利文獻3]日本特開2009-128023號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2009-128023

本發明所欲解決之問題在於提供一種可抑制接著劑自防濕體之帽緣部溢出於外側之放射線檢測器之製造方法及放射線檢測器。 The problem to be solved by the present invention is to provide a method and a radiation detector for a radiation detector which can suppress the overflow of the adhesive from the cap portion of the moisture-proof body to the outside.

實施形態之放射線檢測器之製造方法包含以下步驟:於具有光電轉換元件之陣列基板上,形成將放射線轉換為螢光之閃爍體層;將接著劑塗佈於設置於覆蓋上述閃爍體層之防濕體且位於上述閃爍體層外側之環狀之帽緣部、或對向於上述帽緣部之上述陣列基板上;使上述帽緣部與上述陣列基板近接;及使上述接著劑硬化。且,於使上述 帽緣部與上述陣列基板近接之步驟中,藉由設置於較上述帽緣部更靠外側之厚度控制部,將上述帽緣部與上述陣列基板之間之距離保持為一定。 A method of manufacturing a radiation detector according to an embodiment comprises the steps of: forming a scintillator layer for converting radiation into fluorescence on an array substrate having a photoelectric conversion element; and applying an adhesive to a moisture-proof body provided to cover the scintillator layer And an annular cap portion on the outer side of the scintillator layer or on the array substrate facing the cap portion; the cap portion is in close proximity to the array substrate; and the adhesive is cured. And, to make the above In a step in which the cap portion is in close proximity to the array substrate, the distance between the cap portion and the array substrate is kept constant by a thickness control portion provided outside the cap portion.

1‧‧‧X射線檢測器 1‧‧‧X-ray detector

2‧‧‧陣列基板 2‧‧‧Array substrate

2a‧‧‧基板 2a‧‧‧Substrate

2b‧‧‧光電轉換部 2b‧‧‧Photoelectric Conversion Department

2b1‧‧‧光電轉換元件 2b1‧‧‧ photoelectric conversion components

2b2‧‧‧薄膜電晶體 2b2‧‧‧film transistor

2c1‧‧‧控制線 2c1‧‧‧ control line

2c2‧‧‧資料線 2c2‧‧‧ data line

2d1‧‧‧配線墊片 2d1‧‧‧Wiring gasket

2d2‧‧‧配線墊片 2d2‧‧‧Wiring gasket

2e1‧‧‧可撓性印刷基板 2e1‧‧‧Flexible printed circuit board

2e2‧‧‧可撓性印刷基板 2e2‧‧‧Flexible printed circuit board

2f‧‧‧保護層 2f‧‧‧protective layer

3‧‧‧信號處理部 3‧‧‧Signal Processing Department

4‧‧‧凸顯傳送部 4‧‧‧ Highlighting the transmission department

4a‧‧‧配線 4a‧‧‧Wiring

5‧‧‧閃爍體層 5‧‧‧ scintillation layer

6‧‧‧反射層 6‧‧‧reflective layer

7‧‧‧防濕體 7‧‧‧Damps

7a‧‧‧表面部 7a‧‧‧Surface

7b‧‧‧周面部 7b‧‧‧ week face

7c‧‧‧帽緣部 7c‧‧‧Cap

8‧‧‧接著層 8‧‧‧Next layer

8a‧‧‧接著劑 8a‧‧‧Binder

18‧‧‧接著層 18‧‧‧Next layer

100‧‧‧托盤 100‧‧‧Tray

100a~100c‧‧‧托盤 100a~100c‧‧‧Tray

101‧‧‧基部 101‧‧‧ base

101a‧‧‧凹部 101a‧‧‧ recess

101b‧‧‧載置面 101b‧‧‧Loading surface

102‧‧‧防附著層 102‧‧‧Anti-adhesion layer

103‧‧‧厚度控制部 103‧‧‧ thickness control department

103a‧‧‧厚度控制部 103a‧‧‧Thickness Control Department

104‧‧‧板狀體 104‧‧‧ plate body

110‧‧‧托盤 110‧‧‧Tray

111‧‧‧基部 111‧‧‧ base

111a‧‧‧凹部 111a‧‧‧ recess

111b‧‧‧載置面 111b‧‧‧Loading surface

111c‧‧‧凹部 111c‧‧‧ recess

112‧‧‧基部 112‧‧‧ base

112a‧‧‧凹部 112a‧‧‧ recess

112b‧‧‧載置面 112b‧‧‧Loading surface

112c‧‧‧厚度控制部 112c‧‧‧ thickness control department

113‧‧‧基部 113‧‧‧ base

113a‧‧‧凹部 113a‧‧‧ recess

113b‧‧‧載置面 113b‧‧‧Loading surface

113c‧‧‧凹部 113c‧‧‧ recess

113d‧‧‧厚度控制部 113d‧‧‧Thickness Control Department

S1‧‧‧控制信號 S1‧‧‧ control signal

S2‧‧‧圖像資料信號 S2‧‧‧ image data signal

T‧‧‧接著層厚度尺寸 T‧‧‧layer thickness dimension

W1‧‧‧帽緣部寬度尺寸 W1‧‧‧Band edge width dimension

W2‧‧‧接著層寬度尺寸 W2‧‧‧layer width dimension

圖1係用以示例第1實施形態之X射線檢測器1之示意立體圖。 Fig. 1 is a schematic perspective view showing an example of the X-ray detector 1 of the first embodiment.

圖2係X射線檢測器1之示意剖面圖。 2 is a schematic cross-sectional view of the X-ray detector 1.

圖3(a)係防濕體之示意前視圖;(b)係防濕體之示意側視圖。 Figure 3 (a) is a schematic front view of the moisture-proof body; (b) is a schematic side view of the moisture-proof body.

圖4係用以示例本實施形態之接著層8之形成所使用之託盤(治具)100之示意剖面圖。 Fig. 4 is a schematic cross-sectional view showing a tray (tool) 100 used for exemplifying the formation of the adhesive layer 8 of the present embodiment.

圖5係用以示例本實施形態之接著層8形成之狀態之示意剖面圖。 Fig. 5 is a schematic cross-sectional view showing a state in which the adhesive layer 8 of the present embodiment is formed.

圖6係用以示例比較例之接著層18之形成所使用之托盤(治具)110之示意剖面圖。 Figure 6 is a schematic cross-sectional view of a tray (tool) 110 used to form the formation of the back layer 18 of the comparative example.

圖7係用以示例比較例之接著層18形成之狀態之示意剖面圖。 Fig. 7 is a schematic cross-sectional view showing a state in which the adhesive layer 18 of the comparative example is formed.

圖8係用以示例使接著劑8a自防濕體7之帽緣部7c溢出於內側之方法之示意圖。 Fig. 8 is a schematic view showing a method of allowing the adhesive 8a to overflow from the cap portion 7c of the moisture-proof body 7 to the inside.

圖9係用以示例使接著劑8a自防濕體7之帽緣部7c溢出於內側之方法之示意圖。 Fig. 9 is a schematic view showing a method of allowing the adhesive 8a to overflow from the cap portion 7c of the moisture-proof body 7 to the inside.

圖10係用以示例另一實施形態之厚度控制部之示意剖面圖。 Fig. 10 is a schematic cross-sectional view showing a thickness control portion of another embodiment.

圖11係用以示例另一實施形態之厚度控制部之示意剖面圖。 Fig. 11 is a schematic cross-sectional view showing a thickness control portion of another embodiment.

圖12係用以示例另一實施形態之厚度控制部之示意剖面圖。 Fig. 12 is a schematic cross-sectional view showing a thickness control portion of another embodiment.

以下,參照圖式,對實施形態進行示例。另,各圖式中,對相同之構成要素標註相同之符號而適當省略詳細之說明。 Hereinafter, an embodiment will be described with reference to the drawings. In the drawings, the same components are denoted by the same reference numerals, and the detailed description is omitted as appropriate.

又,本發明實施形態之放射線檢測器除了X射線以外亦可應用y射線等各種放射線。此處,作為一例,採用以X射線作為放射線中具 代表性者之情形之例進行說明。因此,藉由將以下實施形態之「X射線」置換為「其他放射線」,亦可應用於其他放射線。 Further, the radiation detector according to the embodiment of the present invention may apply various kinds of radiation such as y rays in addition to X-rays. Here, as an example, X-rays are used as radiation An example of a representative case will be described. Therefore, the "X-rays" of the following embodiments can be applied to other radiations by replacing them with "other radiations".

首先,對本發明第1實施形態之X射線檢測器1進行示例。 First, the X-ray detector 1 according to the first embodiment of the present invention will be exemplified.

[第1實施形態] [First Embodiment]

圖1係用以示例第1實施形態之X射線檢測器1之示意立體圖。 Fig. 1 is a schematic perspective view showing an example of the X-ray detector 1 of the first embodiment.

另,為了避免繁雜,於圖1中,省略反射層6或防濕體7等而描繪。 In addition, in order to avoid complication, in FIG. 1, the reflection layer 6, the moisture-proof body 7, etc. are abbreviate|omitted and it draws.

圖2係X射線檢測器1之示意剖面圖。 2 is a schematic cross-sectional view of the X-ray detector 1.

另,為了避免繁雜,於圖2中,省略控制線2c1、資料線2c2、信號處理部3、圖像傳送部4等而描繪。 In order to avoid complication, in FIG. 2, the control line 2c1, the data line 2c2, the signal processing unit 3, the image transfer unit 4, and the like are omitted and drawn.

圖3(a)係防濕體之示意前視圖。 Fig. 3(a) is a schematic front view of the moistureproof body.

圖3(b)係防濕體之示意側視圖。 Figure 3 (b) is a schematic side view of the moisture barrier.

放射線檢測器即X射線檢測器1係檢測放射線圖像即X射線圖像之X射線平面感測器。X射線檢測器1可使用於例如一般醫療用途等。 The X-ray detector 1 which is a radiation detector is an X-ray plane sensor that detects a radiographic image, that is, an X-ray image. The X-ray detector 1 can be used, for example, in general medical use or the like.

如圖1及圖2所示,於X射線檢測器1中,設置有陣列基板2、信號處理部3、圖像傳送部4、閃爍體層5、反射層6、防濕體7、及接著層8。 As shown in FIGS. 1 and 2, the X-ray detector 1 is provided with an array substrate 2, a signal processing unit 3, an image transfer unit 4, a scintillator layer 5, a reflective layer 6, a moisture-proof body 7, and an adhesive layer. 8.

陣列基板2係藉由閃爍體層5將自X射線轉換之可視光(螢光)轉換為電性信號。 The array substrate 2 converts visible light (fluorescence) converted from X-rays into an electrical signal by the scintillator layer 5.

陣列基板2具有基板2a、光電轉換部2b、控制線(或閘極線)2c1、資料線(或信號線)2c2、及保護層2f。 The array substrate 2 has a substrate 2a, a photoelectric conversion portion 2b, a control line (or gate line) 2c1, a data line (or signal line) 2c2, and a protective layer 2f.

基板2a係呈板狀,並由玻璃等透光性材料形成。 The substrate 2a has a plate shape and is formed of a light transmissive material such as glass.

光電轉換部2b係於基板2a之一表面設置有複數個。 The photoelectric conversion unit 2b is provided in plural numbers on one surface of the substrate 2a.

光電轉換部2b係呈矩形狀,並設置於以控制線2c1與資料線2c2劃分之區域。複數個光電轉換部2b係排列成矩陣狀。 The photoelectric conversion unit 2b has a rectangular shape and is provided in a region partitioned by the control line 2c1 and the data line 2c2. The plurality of photoelectric conversion units 2b are arranged in a matrix.

另,1個光電轉換部2b對應於1個像素(pixel)。 Further, one photoelectric conversion unit 2b corresponds to one pixel (pixel).

於複數個光電轉換部2b各者,設置光電轉換元件2b1、開關元件即薄膜電晶體(TFT;Thin Film Transistor)2b2。 Each of the plurality of photoelectric conversion units 2b is provided with a photoelectric conversion element 2b1 and a thin film transistor (TFT) (Thin Film Transistor) 2b2.

又,於光電轉換元件2b1中設置累積轉換後之信號電荷之未圖示之累積電容器。然而,根據光電轉換元件2b1之電容,光電轉換元件2b1亦可兼作未圖示之累積電容器。 Further, an accumulation capacitor (not shown) that accumulates the converted signal charge is provided in the photoelectric conversion element 2b1. However, the photoelectric conversion element 2b1 may also serve as a cumulative capacitor (not shown) depending on the capacitance of the photoelectric conversion element 2b1.

光電轉換元件2b1可採用例如光電二極體等。 The photoelectric conversion element 2b1 can be, for example, a photodiode or the like.

薄膜電晶體2b2進行藉由螢光入射於光電轉換元件2b1而產生之電荷之累積及釋放之切換,薄膜電晶體2b2可採用包含非晶矽(a-Si)或多晶矽(P-Si)等半導體材料者。薄膜電晶體2b2具有閘極電極、源極電極及汲極電極。薄膜電晶體2b2之閘極電極係電性連接於對應之控制線2c1。薄膜電晶體2b2之源極電極係電性連接於對應之資料線2c2。薄膜電晶體2b2之汲極電極係電性連接於對應之光電轉換元件2b1與未圖示之累積電容器。 The thin film transistor 2b2 performs switching of accumulation and release of charges generated by fluorescence incident on the photoelectric conversion element 2b1, and the thin film transistor 2b2 may be a semiconductor including amorphous germanium (a-Si) or polycrystalline germanium (P-Si). Material. The thin film transistor 2b2 has a gate electrode, a source electrode, and a drain electrode. The gate electrode of the thin film transistor 2b2 is electrically connected to the corresponding control line 2c1. The source electrode of the thin film transistor 2b2 is electrically connected to the corresponding data line 2c2. The drain electrode of the thin film transistor 2b2 is electrically connected to the corresponding photoelectric conversion element 2b1 and an accumulation capacitor (not shown).

控制線2c1係隔開特定之間隔相互平行地設置有複數條。控制線2c1係延伸於第1方向(例如,列方向)。 The control line 2c1 is provided with a plurality of strips in parallel with each other at a predetermined interval. The control line 2c1 extends in the first direction (for example, the column direction).

複數條控制線2c1係分別電性連接於設置於基板2a周邊附近之複數個配線墊片2d1。對複數個配線墊片2d1,分別電性連接設置於可撓性印刷基板2e1之複數個配線之一端。設置於可撓性印刷基板2e1之複數個配線之另一端係分別電性連接於設置於信號處理部3之未圖示之控制電路。 The plurality of control lines 2c1 are electrically connected to a plurality of wiring pads 2d1 provided in the vicinity of the periphery of the substrate 2a, respectively. Each of the plurality of wiring pads 2d1 is electrically connected to one end of a plurality of wirings provided on the flexible printed circuit board 2e1. The other ends of the plurality of wirings provided on the flexible printed circuit board 2e1 are electrically connected to a control circuit (not shown) provided in the signal processing unit 3.

資料線2c2係隔開特定之間隔互相平行地設置有複數條。資料線2c2係延伸於與第1方向正交之第2方向(例如,行方向)。 The data line 2c2 is provided with a plurality of strips in parallel with each other at a predetermined interval. The data line 2c2 extends in a second direction (for example, a row direction) orthogonal to the first direction.

複數條資料線2c2係分別電性連接於設置於基板2a周邊附近之複數個配線墊片2d2。對複數個配線墊片2d2分別電性連接設置於可撓性印刷基板2e2之複數條配線之一端。設置於可撓性印刷基板2e2之複數條配線之另一端分別電性連接於設置於信號處理部3之未圖示之放大 電路。 The plurality of data lines 2c2 are electrically connected to a plurality of wiring pads 2d2 provided in the vicinity of the periphery of the substrate 2a. Each of the plurality of wiring pads 2d2 is electrically connected to one end of a plurality of wirings provided on the flexible printed circuit board 2e2. The other ends of the plurality of wirings provided on the flexible printed circuit board 2e2 are electrically connected to an unillustrated amplifier provided in the signal processing unit 3, respectively. Circuit.

保護層2f係以覆蓋光電轉換部2b、控制線2c1、及資料線2c2之方式設置。 The protective layer 2f is provided to cover the photoelectric conversion portion 2b, the control line 2c1, and the data line 2c2.

信號處理部3設置於與設置基板2a之光電轉換部2b之側相反側。 The signal processing unit 3 is provided on the side opposite to the side of the photoelectric conversion unit 2b of the installation substrate 2a.

於信號處理部3設置未圖示之控制電路、及未圖示之放大電路。 A control circuit (not shown) and an amplifier circuit (not shown) are provided in the signal processing unit 3.

未圖示之控制電路控制各薄膜電晶體2b2之動作,即接通狀態及斷開狀態。例如,未圖示之控制電路係經由可撓性印刷基板2e1、配線墊片2d1及控制線2c1,將控制信號S1依序施加於各控制線2c1之每一者。薄膜電晶體2b2藉由施加於控制線2c1之控制信號S1而成為接通狀態,並可接收來自光電轉換部2b之圖像資料信號S2。 A control circuit (not shown) controls the operation of each of the thin film transistors 2b2, that is, the on state and the off state. For example, a control circuit (not shown) sequentially applies a control signal S1 to each of the control lines 2c1 via the flexible printed circuit board 2e1, the wiring pad 2d1, and the control line 2c1. The thin film transistor 2b2 is turned on by the control signal S1 applied to the control line 2c1, and can receive the image data signal S2 from the photoelectric conversion portion 2b.

未圖示之放大電路係經由資料線2c2、配線墊片2d2及可撓性印刷基板2e2,依序接收來自各光電轉換部2b之圖像資料信號S2。接著,未圖示之放大電路放大接收到之圖像資料信號S2。 The amplifier circuit (not shown) sequentially receives the image data signal S2 from each of the photoelectric conversion units 2b via the data line 2c2, the wiring pad 2d2, and the flexible printed circuit board 2e2. Next, an amplifier circuit (not shown) amplifies the received image data signal S2.

圖像傳送部4係經由配線4a,電性連接於信號處理部3之未圖示之放大電路。另,圖像傳送部4亦可設為與信號處理部3一體化。 The image transfer unit 4 is electrically connected to an amplifier circuit (not shown) of the signal processing unit 3 via the wiring 4a. Further, the image transfer unit 4 may be integrated with the signal processing unit 3.

圖像傳送部4係將藉由信號處理部3依序放大之圖像資料信號S2依序轉換為串聯信號,並進而依序轉換為數位信號。接著,圖像傳送部4係基於依序轉換之數位信號,構成X射線圖像。構成之X射線圖像之資料係自圖像傳送部4向外部之機器輸出。另,串聯信號之轉換或數位信號之轉換,亦可於信號處理部3中進行。 The image transfer unit 4 sequentially converts the image data signal S2 sequentially amplified by the signal processing unit 3 into a series signal, and sequentially converts it into a digital signal. Next, the image transfer unit 4 forms an X-ray image based on the sequentially converted digital signals. The data of the configured X-ray image is output from the image transfer unit 4 to an external device. Further, the conversion of the series signal or the conversion of the digital signal can also be performed in the signal processing unit 3.

閃爍體層5係設置於光電轉換元件2b1之上,並將入射之X射線轉換為可視光即螢光。閃爍體層5係以覆蓋基板2a上之設置有複數個光電轉換部2b之區域之方式設置。 The scintillator layer 5 is provided on the photoelectric conversion element 2b1, and converts incident X-rays into visible light, that is, fluorescent light. The scintillator layer 5 is provided so as to cover a region of the substrate 2a on which the plurality of photoelectric conversion portions 2b are provided.

閃爍體層5可使用例如碘化銫(CsI):鉈(Tl)、或碘化鈉(NaI):鉈(Tl)等形成。於該情形時,使用真空蒸鍍法等,可形成柱狀結晶之集合體。 The scintillator layer 5 can be formed using, for example, cesium iodide (CsI): strontium (Tl), or sodium iodide (NaI): strontium (Tl) or the like. In this case, an aggregate of columnar crystals can be formed by vacuum deposition or the like.

又,閃爍體層5亦可使用例如硫氧化釓(Gd2O2S)等形成。於該情形時,例如,可如以下方式形成閃爍體層5。首先,將包含硫氧化釓之粒子與黏合劑材混合。接著,以覆蓋基板2a上之設置有複數個光電轉換部2b之區域之方式塗佈經混合之材料。接著,將塗佈之材料燒成。接著,使用刀片切割法等,於燒成後之材料形成槽部。此時,以於複數個光電轉換部2b之每一個設置四角柱狀之閃爍體層5之方式,可形成矩陣狀之槽部。槽部中可充滿大氣(空氣)、或防氧化用之氮氣等惰性氣體。又,槽部亦可為真空狀態。 Further, the scintillator layer 5 may be formed using, for example, bismuth oxysulfide (Gd 2 O 2 S) or the like. In this case, for example, the scintillator layer 5 can be formed as follows. First, the particles containing cerium oxysulfide are mixed with a binder. Next, the mixed material is applied so as to cover the region on the substrate 2a where the plurality of photoelectric conversion portions 2b are provided. Next, the coated material is fired. Next, a groove portion is formed on the material after firing using a blade cutting method or the like. In this case, a matrix-shaped groove portion can be formed in such a manner that a quadrangular columnar scintillator layer 5 is provided for each of the plurality of photoelectric conversion portions 2b. The groove portion may be filled with an inert gas such as air (air) or nitrogen gas for oxidation prevention. Further, the groove portion may be in a vacuum state.

另,圖2示例之閃爍體層5係包含碘化銫:鉈之蒸鍍膜之情形。因此,閃爍體層5為柱狀結晶之集合體。於該情形時,閃爍體層5之厚度尺寸可設為600μm左右。柱狀結晶之柱(柱體)之粗細尺寸於最表面可設為8~12μm左右。 In addition, the scintillator layer 5 exemplified in FIG. 2 includes a case of a vapor deposition film of cesium iodide: ruthenium. Therefore, the scintillator layer 5 is an aggregate of columnar crystals. In this case, the thickness of the scintillator layer 5 can be set to about 600 μm. The thickness of the column (column) of the columnar crystal can be set to about 8 to 12 μm on the outermost surface.

反射層6係用於提高螢光之利用效率、改善感度特性而設置。即,反射層6係使閃爍體層5中產生之螢光中、朝向於與設置有光電轉換部2b之側相反側之光反射,並射向光電轉換部2b。 The reflective layer 6 is provided for improving the utilization efficiency of the fluorescent light and improving the sensitivity characteristics. In other words, the reflective layer 6 reflects the light generated in the scintillator layer 5 toward the side opposite to the side on which the photoelectric conversion portion 2b is provided, and is incident on the photoelectric conversion portion 2b.

反射層6係以覆蓋閃爍體層5之方式設置。另,反射層6亦可以覆蓋閃爍體層5表面側(X射線之入射面側)之面之方式設置(例如,參照圖5)。 The reflective layer 6 is provided to cover the scintillator layer 5. Further, the reflective layer 6 may be provided so as to cover the surface of the surface side (the incident surface side of the X-ray) of the scintillator layer 5 (for example, refer to FIG. 5).

反射層6可藉由將包含銀合金或鋁等光反射率較高之金屬而成之層成膜於閃爍體層5上而形成。又,反射層6亦可藉由將包含例如二氧化鈦(TiO2)等光散射性粒子之樹脂塗佈於閃爍體層5上而形成。 The reflective layer 6 can be formed by forming a layer of a metal having a high light reflectance such as a silver alloy or aluminum on the scintillator layer 5. Further, the reflective layer 6 may be formed by applying a resin containing light-scattering particles such as titanium oxide (TiO 2 ) to the scintillator layer 5 .

又,反射層6亦可使用例如表面包含銀合金或鋁等光反射率較高之金屬之板而形成。 Further, the reflective layer 6 may be formed, for example, by using a plate having a metal having a high light reflectance such as a silver alloy or aluminum.

另,於圖2示例之反射層6係藉由將包含二氧化鈦之超微物粉體、及將黏合劑與溶劑混合而製成之材料塗佈於閃爍體層5上,並使其乾燥而形成者。 Further, the reflective layer 6 exemplified in FIG. 2 is formed by applying a material containing an ultrafine powder containing titanium oxide and a material obtained by mixing a binder and a solvent onto the scintillator layer 5 and drying it. .

防濕體7係為了抑制因空氣中含有之水蒸氣引起閃爍體層5或反射層6之特性劣化而設置。 The moisture-proof body 7 is provided to suppress deterioration of characteristics of the scintillator layer 5 or the reflective layer 6 due to water vapor contained in the air.

如圖2、圖3(a)、及圖3(b)所示,防濕體7係呈冠帽形狀,具有表面部7a、周面部7b、及帽緣(帽緣)部7c。 As shown in FIGS. 2, 3(a), and 3(b), the moisture-proof body 7 has a crown cap shape, and has a surface portion 7a, a circumferential surface portion 7b, and a brim (cap) portion 7c.

防濕體7可設為將表面部7a、周面部7b、及帽緣部7c一體化成形者。 The moisture-proof body 7 can be formed by integrally molding the surface portion 7a, the circumferential surface portion 7b, and the brim portion 7c.

防濕體7可包含透濕係數較小之材料。 The moisture-proof body 7 may contain a material having a small moisture permeability coefficient.

防濕體7可包含層疊例如鋁、鋁合金、樹脂層與無機材料(鋁等輕金屬、SiO2、SiON、Al2O3等陶瓷系材質)層之低透濕防濕材料等。 The moisture-proof body 7 may include a low moisture-permeable moisture-proof material or the like in which a layer of, for example, aluminum, an aluminum alloy, a resin layer, and an inorganic material (a light metal such as aluminum, a ceramic material such as SiO 2 , SiON, or Al 2 O 3 ) is laminated.

又,防濕體7之厚度尺寸可考慮X射線之吸收或剛性等決定。於該情形時,若過度增大防濕體7之厚度尺寸則X射線之吸收過多。若過度縮小防濕體7之厚度尺寸則剛性降低容易破損。 Further, the thickness of the moisture-proof body 7 can be determined in consideration of absorption or rigidity of X-rays. In this case, if the thickness dimension of the moistureproof body 7 is excessively increased, the X-ray absorption is excessive. If the thickness of the moisture-proof body 7 is excessively reduced, the rigidity is lowered and it is easily broken.

防濕體7例如可將厚度尺寸為0.1mm之鋁箔加壓成形而形成。 The moisture-proof body 7 can be formed, for example, by press molding an aluminum foil having a thickness of 0.1 mm.

表面部7a係與閃爍體層5之表面側(X射線之入射面側)相對。 The surface portion 7a faces the surface side (the incident surface side of the X-ray) of the scintillator layer 5.

周面部7b係包圍表面部7a之周緣而設置。周面部7b係自表面部7a之周緣朝基板2a延伸。 The peripheral surface portion 7b is provided to surround the periphery of the surface portion 7a. The peripheral surface portion 7b extends from the peripheral edge of the surface portion 7a toward the substrate 2a.

於藉由表面部7a及周面部7b形成之空間之內部,設置閃爍體層5與反射層6。另,於未設置反射層6之情形時,於藉由表面部7a及周面部7b形成之空間之內部,設置閃爍體層5。於表面部7a及周面部7b、與反射層6或閃爍體層5之間可有間隙,或表面部7a及周面部7b亦可與反射層6或閃爍體層5接觸。 The scintillator layer 5 and the reflective layer 6 are provided inside the space formed by the surface portion 7a and the peripheral surface portion 7b. Further, when the reflective layer 6 is not provided, the scintillator layer 5 is provided inside the space formed by the surface portion 7a and the peripheral surface portion 7b. There may be a gap between the surface portion 7a and the peripheral surface portion 7b, and the reflective layer 6 or the scintillator layer 5, or the surface portion 7a and the peripheral surface portion 7b may be in contact with the reflective layer 6 or the scintillator layer 5.

帽緣部7c包圍周面部7b之與表面部7a側相反側之端部而設置。帽緣部7c係自周面部7b之端部朝外側延伸。帽緣部7c係呈環狀,並以與基板2a之設置光電轉換部2b之側之面平行之方式設置。 The cap portion 7c is provided to surround the end portion of the circumferential surface portion 7b on the side opposite to the surface portion 7a side. The cap portion 7c extends outward from the end portion of the peripheral surface portion 7b. The cap portion 7c is annular and is provided in parallel with the surface of the substrate 2a on the side where the photoelectric conversion portion 2b is provided.

帽緣部7c係經由接著層8而連接於基板2a之設置光電轉換部2b之側之面。 The cap portion 7c is connected to the surface of the substrate 2a on the side where the photoelectric conversion portion 2b is provided via the bonding layer 8.

即,防濕體7具有位於閃爍體層5外側之環狀之帽緣部7c,並至少覆蓋閃爍體層。 That is, the moistureproof body 7 has an annular brim portion 7c located outside the scintillator layer 5 and covers at least the scintillator layer.

若使用冠帽形狀之防濕體7,可獲得較高的防濕性能。於該情形時,由於防濕體7係由鋁等形成,故可認為水蒸氣之透過極少。然而,接著層8係包含接著劑8a(樹脂),故必須抑制水蒸氣之透過。 If the cap-shaped moisture-proof body 7 is used, high moisture resistance can be obtained. In this case, since the moisture-proof body 7 is formed of aluminum or the like, it is considered that the water vapor is transmitted very little. However, since the adhesive layer 8 contains the adhesive 8a (resin), it is necessary to suppress the permeation of water vapor.

接著層8設置於帽緣部7c、與陣列基板2之設置有光電轉換部2b之側之面之間。接著層8係藉由接著劑8a硬化而形成者。 Next, the layer 8 is provided between the cap portion 7c and the surface of the array substrate 2 on the side where the photoelectric conversion portion 2b is provided. Next, the layer 8 is formed by curing the adhesive 8a.

形成接著層8時所使用之接著劑8a係考慮透濕係數、與防濕體7及基板2a之接著性而選擇。形成接著層8時所使用之接著劑8a可為例如紫外線硬化型環氧樹脂系接著劑、或熱硬化型環氧樹脂系接著劑等。 The adhesive 8a used in forming the adhesive layer 8 is selected in consideration of the moisture permeability coefficient and the adhesion between the moisture-proof body 7 and the substrate 2a. The adhesive 8a used when forming the adhesive layer 8 may be, for example, an ultraviolet curable epoxy resin adhesive or a thermosetting epoxy resin adhesive.

此處,有於基板2a之接著劑8a所接觸之區域設置有配線等遮光性構件之情形。因此,於使用紫外線硬化型接著劑之情形時,較好為選擇即使有照射不均之情形亦可進行適當硬化者。作為即使有照射不均之情形亦可進行適當硬化之紫外線硬化型接著劑,可示例例如藉由陽離子聚合促進硬化反應之環氧樹脂系紫外線硬化型接著劑(例如,Nagase ChemteX(股)XNR-5516ZHV-B1:比重ρ比重ρ5516Z3)等。 Here, a case where a light-blocking member such as a wiring is provided in a region where the adhesive 8a of the substrate 2a contacts is provided. Therefore, in the case of using an ultraviolet curable adhesive, it is preferred to select a person who can be appropriately cured even if there is uneven irradiation. An ultraviolet curable adhesive which can be suitably cured even in the case of uneven irradiation, for example, an epoxy resin-based ultraviolet curable adhesive which promotes a curing reaction by cationic polymerization (for example, Nagase ChemteX (X) XNR- 5516ZHV-B1: specific gravity ρ specific gravity ρ5516Z 3 ) and so on.

又,為了使接著層8之透濕率(水蒸氣之透過率)降低,較好為挑選透濕係數盡可能小之材料。 Further, in order to lower the moisture permeability (transmission rate of water vapor) of the adhesive layer 8, it is preferred to select a material having a moisture permeability coefficient as small as possible.

例如,如對環氧樹脂系之接著劑添加70重量%以上無機材料之滑石粉(滑石:Mg3Si4O10(OH)2),可使接著層8之透濕係數大幅降低。 For example, when 70% by weight or more of an inorganic material talc (talcite: Mg 3 Si 4 O 10 (OH) 2 ) is added to an epoxy resin-based adhesive, the moisture permeability coefficient of the adhesive layer 8 can be greatly reduced.

此處,進而對接著層8之透濕率進行說明。 Here, the moisture permeability of the adhesive layer 8 will be described.

包含防濕體7及接著層8之防濕構造整體之透濕率可利用以下之近似式(1)表示。 The moisture permeability of the moisture-proof structure including the moisture-proof body 7 and the adhesive layer 8 can be expressed by the following approximate formula (1).

QT=Q7+Q8......(1) QT=Q7+Q8......(1)

Q8=P.S/W =P.L.T/W......(2) Q8=P. S/W =P. L. T/W......(2)

QT:防濕構造整體之透濕率 QT: moisture permeability of the moisture-proof structure as a whole

Q7:防濕體7之透濕率 Q7: moisture permeability of moisture-proof body 7

Q8:接著層8之透濕率 Q8: moisture permeability of layer 8

P:接著層8之透濕係數 P: moisture permeability coefficient of layer 8

S:接著層8之透濕剖面面積 S: moisture permeability cross-sectional area of layer 8

W:接著層8之寬度尺寸 W: the width dimension of the layer 8

L:接著層8之周長 L: the perimeter of layer 8

T:接著層8之厚度尺寸 T: thickness dimension of layer 8

於該情形時,式(1)之第1項Q7係表示占防濕構造大部分之防濕體7之透濕率。作為防濕體7之材料,若使用厚度尺寸為0.1mm之鋁箔材等,則可實質上將Q7抑制為零位準。因此,作為防濕構造整體之透視率係以式(1)之第2項Q8為主。 In this case, the first term Q7 of the formula (1) indicates the moisture permeability of the moisture-proof body 7 which accounts for most of the moisture-proof structure. As the material of the moisture-proof body 7, if an aluminum foil having a thickness of 0.1 mm or the like is used, Q7 can be substantially suppressed to a zero level. Therefore, the perspective ratio of the entire moisture-proof structure is mainly the second item Q8 of the formula (1).

如式(2)所示,Q8係由接著層8之維數(L、T、W)、與接著層8之材料之透濕係數(P)決定。即,藉由接著層8之維數、與接著層8之材料之透濕係數,決定一定的溫濕度環境中之透濕率。 As shown in the formula (2), Q8 is determined by the dimensionality (L, T, W) of the adhesive layer 8 and the moisture permeability coefficient (P) of the material of the adhesive layer 8. That is, the moisture permeability in a constant temperature and humidity environment is determined by the dimension of the layer 8 and the moisture permeability coefficient of the material of the layer 8.

此處,於要求小型化或輕量化之X射線檢測器1之情形時,較好為接著層8之寬度尺寸W2盡可能小。然而,為兼顧透濕率之降低或可靠性之提高,考慮較好將接著層8之寬度尺寸W2設為2mm以上。 Here, in the case of the X-ray detector 1 requiring miniaturization or weight reduction, it is preferable that the width dimension W2 of the bonding layer 8 is as small as possible. However, in order to achieve both a decrease in the moisture permeability and an improvement in reliability, it is preferable to set the width dimension W2 of the adhesive layer 8 to 2 mm or more.

然而,若過度縮小接著層8之厚度尺寸T,有於接著層8之形成時寬度尺寸W2之偏差擴大之虞。此係由於過度縮小接著層8之厚度尺寸T時,會使得帽緣部7c相對於接著層8之厚度尺寸T隆起、或後述之厚度控制部103之厚度尺寸偏差之影響增大之故。 However, if the thickness dimension T of the adhesive layer 8 is excessively reduced, there is a possibility that the deviation of the width dimension W2 is increased when the adhesive layer 8 is formed. When the thickness T of the adhesive layer 8 is excessively reduced, the influence of the thickness dimension T of the cap portion 7c with respect to the adhesive layer 8 or the thickness dimension deviation of the thickness control portion 103 to be described later is increased.

另一方面,若過度增大接著層8之厚度尺寸T,如式(2)所示,接著層8之透濕率變大,有作為防濕構造之功能降低之虞。 On the other hand, if the thickness dimension T of the adhesive layer 8 is excessively increased, as shown in the formula (2), the moisture permeability of the subsequent layer 8 becomes large, and the function as a moisture-proof structure is lowered.

因此,接著層8之厚度尺寸T較好設為0.1mm以上0.4mm以下。 Therefore, the thickness dimension T of the subsequent layer 8 is preferably set to 0.1 mm or more and 0.4 mm or less.

此處,於形成接著層8時,若一邊將接著劑8a之塗佈量增多至適 量以上,一邊將用以使帽緣部7c與基板2a緊貼之加壓力增大至一定以上,則可形成寬度尺寸W2較大之接著層8。因此,容易確保防濕性能。 Here, when the adhesive layer 8 is formed, the amount of the adhesive 8a applied is increased to the appropriate level. When the pressing force for bringing the cap portion 7c into close contact with the substrate 2a is increased to a certain value or more, the adhesive layer 8 having a large width W2 can be formed. Therefore, it is easy to ensure moisture resistance.

然而,若增多接著劑8a之塗佈量,並將加壓力增大至一定以上,則自帽緣部7c溢出於外側之接著劑8a之量增多,而有於防濕體7附近難以連接可撓性印刷基板2e1、2e2等之虞。又,自帽緣部7c溢出於外側之接著劑8a之量增多時,於切斷為最終的面板尺寸時,有接著劑8a之溢出部分干擾切斷之刀片之虞。 However, when the coating amount of the adhesive 8a is increased and the pressing force is increased to a certain level or more, the amount of the adhesive 8a overflowing from the outside of the cap portion 7c is increased, and it is difficult to connect in the vicinity of the moistureproof body 7. The flexible printed circuit boards 2e1, 2e2, etc. are the same. Further, when the amount of the adhesive 8a overflowing from the outside of the cap portion 7c is increased, when the final panel size is cut, the overflow portion of the adhesive 8a interferes with the cutting blade.

又,近年來,為了X射線檢測器1之小型化或輕量化等,期望縮小帽緣部7c之尺寸。因此,有進而難以抑制接著劑8a自帽緣部7c溢出於外側之虞。 Moreover, in recent years, in order to reduce the size and weight of the X-ray detector 1, it is desirable to reduce the size of the brim portion 7c. Therefore, it is further difficult to suppress the overflow of the adhesive 8a from the cap portion 7c to the outside.

因此,必須將接著層8之厚度尺寸T與寬度尺寸W2收在適當之範圍內,並抑制接著劑8a自帽緣部7c溢出於外側。 Therefore, it is necessary to set the thickness dimension T and the width dimension W2 of the adhesive layer 8 within an appropriate range, and to suppress the adhesive 8a from overflowing from the outside of the cap portion 7c.

於本實施形態之X射線檢測器1中,接著層8之與閃爍體層5側相反側之端部係設在較設置於陣列基板2周邊之配線墊片2d1、2d2更靠閃爍體層5側。 In the X-ray detector 1 of the present embodiment, the end portion of the layer 8 opposite to the side of the scintillator layer 5 is disposed closer to the scintillator layer 5 than the wiring pads 2d1 and 2d2 provided on the periphery of the array substrate 2.

又,如後述般,亦可設為自防濕體7之帽緣部7c溢出於內側之接著層8(參照圖9)。 Further, as will be described later, the back layer 8 (see FIG. 9) may be used to overflow the inner edge portion 7c of the moisture-proof body 7.

即,接著層8之閃爍體層5側之端部亦可設在較帽緣部7c之閃爍體層5側之端部更靠閃爍體層5側。 In other words, the end portion of the layer 8 on the side of the scintillator layer 5 may be provided on the side of the scintillator layer 5 on the side of the scintillator layer 5 side of the cap portion 7c.

接著,對本發明第2實施形態之X射線檢測器1之製造方法、接著層8之形成方法進行示例。 Next, a method of manufacturing the X-ray detector 1 and a method of forming the adhesive layer 8 according to the second embodiment of the present invention will be exemplified.

[第2實施形態] [Second Embodiment]

X射線檢測器1例如可以如下方式製造。 The X-ray detector 1 can be manufactured, for example, in the following manner.

首先,於基板2a上依序形成光電轉換部2b、控制線2c1、資料線2c2、配線墊片2d1、配線墊片2d2、及保護層2f等作成陣列基板2。陣 列基板2例如可使用半導體製程製作。 First, the photoelectric conversion unit 2b, the control line 2c1, the data line 2c2, the wiring pad 2d1, the wiring pad 2d2, and the protective layer 2f are sequentially formed on the substrate 2a to form the array substrate 2. Array The column substrate 2 can be fabricated, for example, using a semiconductor process.

接著,以覆蓋陣列基板2上之形成有複數個光電轉換部2b之區域之方式形成閃爍體層5。閃爍體層5使用例如真空蒸鍍法等,藉由成膜包含碘化銫:鉈之膜而形成。於該情形時,閃爍體層5之厚度尺寸可設為600μm左右。柱狀結晶之柱之粗細尺寸於最表面可設為8~12μm左右。 Next, the scintillator layer 5 is formed so as to cover the region on the array substrate 2 on which the plurality of photoelectric conversion portions 2b are formed. The scintillator layer 5 is formed by forming a film containing cerium iodide: cerium by, for example, vacuum deposition. In this case, the thickness of the scintillator layer 5 can be set to about 600 μm. The thickness of the column of the columnar crystal can be set to about 8 to 12 μm on the outermost surface.

接著,以覆蓋閃爍體層5之方式形成反射層6。反射層6係藉由將包含例如二氧化鈦之超微物粉體、黏合劑樹脂與溶劑混合而製成之材料塗佈於閃爍體層5上,並使其乾燥而形成。 Next, the reflective layer 6 is formed to cover the scintillator layer 5. The reflective layer 6 is formed by applying a material prepared by mixing an ultrafine powder containing, for example, titanium dioxide, a binder resin, and a solvent onto the scintillator layer 5 and drying it.

接著,於基板2a上接著冠帽形狀之防濕體7,並藉由防濕體7與接著層8而密封閃爍體層5與反射層6。 Next, a cap-shaped moisture-proof body 7 is attached to the substrate 2a, and the scintillator layer 5 and the reflective layer 6 are sealed by the moisture-proof body 7 and the adhesive layer 8.

防濕體7可將例如厚度尺寸為0.1mm之鋁箔加壓成形而形成。又,帽緣部7c之寬度尺寸W1可設為例如2mm。 The moisture-proof body 7 can be formed by, for example, press-forming an aluminum foil having a thickness of 0.1 mm. Moreover, the width dimension W1 of the brim portion 7c can be set to, for example, 2 mm.

另,關於接著層8之形成方法之詳細內容如後述。 The details of the method of forming the adhesive layer 8 will be described later.

接著,經由可撓性印刷基板2e1、2e2,電性連接陣列基板2與信號處理部3。 Next, the array substrate 2 and the signal processing unit 3 are electrically connected via the flexible printed boards 2e1 and 2e2.

又,經由配線4a,電性連接信號處理部3與圖像傳送部4。 Moreover, the signal processing unit 3 and the image transfer unit 4 are electrically connected via the wiring 4a.

此外,適當安裝電路零件等。 In addition, properly install circuit parts and the like.

接著,於未圖示之框體之內部,收納陣列基板2、信號處理部3、圖像傳送部4等。 Next, the array substrate 2, the signal processing unit 3, the image transfer unit 4, and the like are housed inside a casing (not shown).

接著,根據需要,進行確認有無光電轉換元件2b1異常或電性連接異常之電性測試、X射線圖像測試、高溫高濕測試、冷熱循環測試等。 Next, if necessary, an electrical test, an X-ray image test, a high-temperature high-humidity test, a hot and cold cycle test, and the like for confirming the presence or absence of abnormality or electrical connection abnormality of the photoelectric conversion element 2b1 are performed.

如以上般,可製造X射線檢測器1。 As described above, the X-ray detector 1 can be manufactured.

接著,進而對接著層8之形成方法進行示例。 Next, a method of forming the subsequent layer 8 will be exemplified.

圖4係用以示例本實施形態之接著層8之形成所使用之托盤(治 具)100之示意剖面圖。 4 is a tray for exemplifying the formation of the adhesive layer 8 of the present embodiment. A schematic cross-sectional view of 100).

圖5係用以顯示本實施形態之接著層8之形成狀態之示意剖面圖。 Fig. 5 is a schematic cross-sectional view showing a state in which the adhesive layer 8 of the present embodiment is formed.

首先,對本實施形態之接著層8形成所使用之托盤100進行說明。 First, the tray 100 to be used for forming the adhesive layer 8 of the present embodiment will be described.

如圖4所示,於托盤100,設置有基部101、防附著層102、及厚度控制部103。 As shown in FIG. 4, the tray 100 is provided with a base portion 101, an adhesion preventing layer 102, and a thickness control portion 103.

基部101係呈板狀,並於中央部分設置有凹部101a。凹部101a之深度尺寸可設為如下程度:將防濕體7載置於托盤100時,凹部101a之底面與防濕體7之表面部7a之間可形成間隙。又,凹部101a之平面尺寸可設為如下程度:將防濕體7載置於托盤100時,於凹部101a之側壁面與防濕體7之周面部7b之間可形成間隙。 The base portion 101 has a plate shape, and a concave portion 101a is provided at a central portion. The depth dimension of the concave portion 101a can be set such that a gap can be formed between the bottom surface of the concave portion 101a and the surface portion 7a of the moistureproof body 7 when the moistureproof body 7 is placed on the tray 100. Moreover, the planar size of the concave portion 101a can be set such that a gap can be formed between the side wall surface of the concave portion 101a and the circumferential surface portion 7b of the moisture-proof body 7 when the moisture-proof body 7 is placed on the tray 100.

凹部101a之周圍為載置防濕體7之帽緣部7c之載置面101b。 The periphery of the recessed portion 101a is a mounting surface 101b on which the cap portion 7c of the moistureproof body 7 is placed.

防附著層102係設置於載置面101b。防附著層102可藉由例如對載置面101b施加氟樹脂塗佈,或將包含氟樹脂之膠帶黏貼於載置面101b而形成。若設置防附著層102,則即使附著用於形成接著層8之接著劑8a,亦可容易地加以去除。 The adhesion preventing layer 102 is provided on the mounting surface 101b. The adhesion preventing layer 102 can be formed by, for example, applying a fluororesin coating to the mounting surface 101b or adhering a tape containing a fluororesin to the mounting surface 101b. When the adhesion preventing layer 102 is provided, even if the adhesive 8a for forming the adhesive layer 8 is adhered, it can be easily removed.

控制部103係為了將接著層8之厚度尺寸收在特定範圍內而設置。 The control unit 103 is provided to receive the thickness dimension of the adhesive layer 8 within a specific range.

厚度控制部103設置於防附著層102之上。另,厚度控制部103亦可設置於載置面101b。厚度控制部103設置於將防濕體載置於托盤100時,成為帽緣部7c外側之位置。即,厚度控制部103設置於載置防濕體7之區域之外側。厚度控制部103可以包圍載置防濕體7之區域之方式連續地設置(例如,可呈環狀),亦可間斷地設置於載置防濕體7之區域之外側。 The thickness control unit 103 is disposed on the adhesion prevention layer 102. Further, the thickness control unit 103 may be provided on the mounting surface 101b. The thickness control unit 103 is provided at a position outside the brim portion 7c when the moisture-proof body is placed on the tray 100. In other words, the thickness control unit 103 is provided on the outer side of the region on which the moistureproof body 7 is placed. The thickness control unit 103 may be provided continuously (for example, in a ring shape) so as to surround the region on which the moisture-proof body 7 is placed, or may be intermittently provided on the outer side of the region on which the moisture-proof body 7 is placed.

對厚度控制部103之材料無特別限定,但較好為考慮設置厚度控 制部103之步驟之耐久性、表面之平滑性、厚度之穩定性等而選定。 The material of the thickness control unit 103 is not particularly limited, but it is preferable to consider setting the thickness control. The durability of the step of the portion 103, the smoothness of the surface, the stability of the thickness, and the like are selected.

此處,厚度控制部103係於加壓接著劑8a時,使接著劑8a之按壓尺寸為一定之值者。因此,厚度控制部103只要厚度尺寸實質上穩定、且為平坦之構件即可。然而,如後述般,由於厚度控制部103與陣列基板2(基板2a)接觸,故較好為至少表面側(接觸面側)非為金屬或陶瓷等無機材料,而由具有可撓性(柔軟性)之材料形成。例如,於厚度控制部103包含無機材料之情形時,有對基板2a造成損傷之虞。又,有因厚度控制部103被壓入於托盤100側,而引起厚度控制部103之實效性厚度尺寸經時變化之虞。 Here, the thickness control unit 103 is a one in which the pressing size of the adhesive 8a is set to a constant value when the adhesive 8a is pressurized. Therefore, the thickness control unit 103 may be a member that is substantially stable in thickness and flat. However, as described later, since the thickness control unit 103 is in contact with the array substrate 2 (substrate 2a), it is preferable that at least the surface side (contact surface side) is not made of an inorganic material such as metal or ceramic, but has flexibility (softness). Material formation. For example, when the thickness control unit 103 includes an inorganic material, there is a risk of damage to the substrate 2a. Further, the thickness control unit 103 is pressed against the tray 100 side, and the effective thickness dimension of the thickness control unit 103 changes over time.

因此,厚度控制部103可設為其至少接觸於陣列基板2之側具有可撓性者。 Therefore, the thickness control unit 103 can be made flexible at least on the side contacting the array substrate 2.

例如,厚度控制部103可由氟樹脂形成。 For example, the thickness control portion 103 may be formed of a fluororesin.

厚度控制部103之厚度尺寸可根據所形成之接著層8之厚度尺寸而適當決定。例如,於圖5所示之情形中,將帽緣部7c之厚度尺寸設為0.1mm,接著劑8a之按壓尺寸(所形成之接著層8之厚度尺寸)設為0.15mm時,厚度控制部103之厚度尺寸可設為0.25mm。 The thickness dimension of the thickness control portion 103 can be appropriately determined depending on the thickness dimension of the formed back layer 8. For example, in the case shown in FIG. 5, when the thickness of the cap portion 7c is 0.1 mm, and the pressing size of the adhesive 8a (the thickness of the formed back layer 8) is 0.15 mm, the thickness control portion The thickness of 103 can be set to 0.25 mm.

又,厚度控制部103只要於加壓接著劑8a時,保持於特定之位置即可。然而,若厚度控制部103之位置偏移,則有無法實現將接著劑8a之按壓尺寸設為一定之值之功能之虞。又,亦有厚度控制部103接觸於接著劑8a或帽緣部7c等,使所形成之接著層8或防濕體7之品質惡化之虞。 Further, the thickness control unit 103 may be held at a specific position when the adhesive 8a is pressurized. However, if the position of the thickness control unit 103 is shifted, there is a possibility that the pressing size of the adhesive 8a cannot be set to a constant value. Further, the thickness control unit 103 is in contact with the adhesive 8a, the brim portion 7c, and the like to deteriorate the quality of the formed backing layer 8 or the moisture-proof body 7.

因此,厚度控制部103較好設為固定者。 Therefore, the thickness control unit 103 is preferably a fixed person.

例如,厚度控制部103可設為具有樹脂層、及設置於樹脂層之粘著層,並經由粘著層而設置於托盤100者。厚度控制部103例如可設為藉由黏貼氟樹脂粘著膠帶等形成者。 For example, the thickness control unit 103 may be provided with a resin layer and an adhesive layer provided on the resin layer, and provided on the tray 100 via the adhesive layer. The thickness control unit 103 can be formed, for example, by adhering a fluororesin adhesive tape or the like.

於該情形時,若將厚度控制部103固定於托盤100側,則只要厚 度控制部103未磨耗破損,即可重複使用。 In this case, if the thickness control unit 103 is fixed to the tray 100 side, it is only thick. The degree control unit 103 can be reused without being worn and damaged.

亦可將厚度控制部103固定於基板2a側,但由於基板2a自身為產品,該情況下必須固定厚度控制部103。又,於形成接著層8後必須去除厚度控制部103。 The thickness control unit 103 may be fixed to the substrate 2a side. However, since the substrate 2a itself is a product, the thickness control unit 103 must be fixed in this case. Further, the thickness control unit 103 must be removed after the formation of the adhesive layer 8.

因此,厚度控制部103較好為固定於托盤100側。 Therefore, the thickness control unit 103 is preferably fixed to the tray 100 side.

接著,對使用托盤100之接著層8之形成(防濕體7之接著)進行說明。 Next, the formation of the adhesive layer 8 using the tray 100 (the subsequent step of the moisture-proof body 7) will be described.

首先,淨化防濕體7之帽緣部7c之表面(接著面)。 First, the surface (adjoining surface) of the brim portion 7c of the moisture-proof body 7 is cleaned.

淨化可藉由例如有機溶劑洗淨、紫外線臭氧處理(Ultraviolet-Ozone Surface Treatment)、電漿處理等進行。 Purification can be carried out, for example, by organic solvent washing, ultraviolet ozone treatment (Ultraviolet-Ozone Surface Treatment), plasma treatment, or the like.

接著,將防濕體7載置於托盤100,將接著劑8a塗佈於帽緣部7c之表面。接著劑8a係遍及帽緣部7c之整周塗佈。 Next, the moistureproof body 7 is placed on the tray 100, and the adhesive 8a is applied to the surface of the cap portion 7c. The subsequent agent 8a is applied over the entire circumference of the cap portion 7c.

此處,若接著劑8a之塗佈量不適當,則有溢出之量增多,或接著層8之寬度尺寸W2縮小之虞。 Here, if the coating amount of the adhesive 8a is not appropriate, the amount of overflow increases, or the width dimension W2 of the layer 8 is reduced.

因此,接著劑8a之塗佈量係考慮所形成之接著層8之體積而決定。 Therefore, the coating amount of the adhesive 8a is determined in consideration of the volume of the formed adhesive layer 8.

接著劑8a使用例如液體定量噴出裝置(配料器)等,可實現特定之量塗佈。 The subsequent agent 8a can be applied in a specific amount using, for example, a liquid dosing device (dispenser).

接著劑8a係考慮透濕係數、與防濕體7及基板2a之接著性而加以選擇。接著劑8a可設為例如紫外線硬化型環氧樹脂系接著劑、或熱硬化型環氧樹脂系接著劑等。接著劑8a亦可塗佈於與帽緣部7c對向之陣列基板2(基板2a)側。 The subsequent agent 8a is selected in consideration of the moisture permeability coefficient and the adhesion between the moisture-proof body 7 and the substrate 2a. The adhesive 8a can be, for example, an ultraviolet curable epoxy resin adhesive or a thermosetting epoxy resin adhesive. The subsequent agent 8a may be applied to the array substrate 2 (substrate 2a) side opposite to the cap portion 7c.

接著,使塗佈於防濕體7之帽緣部7c、或與帽緣部7c對向之陣列基板2(基板2a)上之接著劑8a接觸於陣列基板2(基板2a)。 Next, the cap portion 7c applied to the moisture-proof body 7 or the adhesive 8a on the array substrate 2 (substrate 2a) facing the cap portion 7c is brought into contact with the array substrate 2 (substrate 2a).

首先,如圖5所示,使形成有閃爍體層5與反射層6之陣列基板2保持於板狀體104。 First, as shown in FIG. 5, the array substrate 2 on which the scintillator layer 5 and the reflective layer 6 are formed is held by the plate-like body 104.

接著,使載置有防濕體7之托盤100對向於板狀體104。 Next, the tray 100 on which the moistureproof body 7 is placed is opposed to the plate-like body 104.

接著,使板狀體104與托盤100於近接方向相對移動,使厚度控制部103與陣列基板2(基板2a)接觸。於圖5所示者之情形為,上推托盤100,使厚度控制部103與陣列基板2(基板2a)接觸。另,亦可下壓板狀體104,或亦可上推托盤100並進而下壓板狀體104。又,示例為將托盤100配置於板狀體104之下方之情形,但亦可將板狀體配置於托盤100之下方。 Next, the plate-like body 104 and the tray 100 are relatively moved in the proximity direction, and the thickness control unit 103 is brought into contact with the array substrate 2 (substrate 2a). In the case shown in FIG. 5, the tray 100 is pushed up to bring the thickness control unit 103 into contact with the array substrate 2 (substrate 2a). Alternatively, the plate-like body 104 may be pressed down, or the tray 100 may be pushed up and the plate-shaped body 104 may be pressed down. Further, although the tray 100 is disposed below the plate-shaped body 104, the plate-like body may be disposed below the tray 100.

藉由厚度控制部103與陣列基板2接觸,規定接著劑8a之按壓尺寸(所形成之接著層8之厚度尺寸)。 The thickness control unit 103 is in contact with the array substrate 2 to define the pressing size of the adhesive 8a (the thickness dimension of the formed back layer 8).

接著,於使厚度控制部103與陣列基板2(基板2a)接觸之狀態,使接著劑8a硬化而形成接著層8。 Next, in a state where the thickness control unit 103 is brought into contact with the array substrate 2 (substrate 2a), the adhesive 8a is cured to form the adhesive layer 8.

例如,於接著劑8a為紫外線硬化型接著劑之情形時,可藉由對接著劑8a照射紫外線而使接著劑8a硬化。 For example, when the adhesive 8a is an ultraviolet curable adhesive, the adhesive 8a can be cured by irradiating ultraviolet rays to the adhesive 8a.

於該情形,於接著劑8a為藉由陽離子聚合促進硬化反應之環氧樹脂系紫外線硬化型接著劑之情形時,即使有因設置於基板2a之配線等引起紫外線之照射不均,亦可進行適當之硬化。 In this case, when the adhesive 8a is an epoxy resin-based ultraviolet curable adhesive which promotes the curing reaction by cationic polymerization, even if the ultraviolet light is unevenly irradiated by the wiring provided on the substrate 2a, the irradiation can be performed. Proper hardening.

又,於接著劑8a為熱硬化型接著劑之情形時,可藉由加熱接著劑8a使接著劑8a硬化。 Further, when the adhesive 8a is a thermosetting adhesive, the adhesive 8a can be cured by heating the adhesive 8a.

又,使塗佈於防濕體7之帽緣部7c之接著劑8a接觸於陣列基板2(基板2a)之步驟、與使接著劑8a硬化而形成接著層8之步驟,可於減壓氣體環境之腔室內進行。若於減壓氣體環境下進行該等之步驟,則可將閃爍體層5與反射層6減壓密封於防濕體7之內部。 Moreover, the step of bringing the adhesive 8a applied to the cap portion 7c of the moisture-proof body 7 into contact with the array substrate 2 (substrate 2a) and the step of curing the adhesive 8a to form the adhesive layer 8 can be used for the decompressed gas. The environment is carried out indoors. When the steps are performed in a reduced-pressure gas atmosphere, the scintillator layer 5 and the reflective layer 6 can be pressure-tightly sealed inside the moisture-proof body 7.

如以上般,可形成接著層8。 As above, the adhesive layer 8 can be formed.

如以上說明般,本實施形態之X射線檢測器之製造方法具備以下步驟:於具有光電轉換元件2b1之陣列基板2上,形成將X射線轉換為螢光之閃爍體層5;將接著劑8a塗佈於設置在覆蓋閃爍體層5之防濕體 7且位於閃爍體層5之外側之環狀帽緣部7c;使帽緣部7c與陣列基板2近接;及使接著劑8a硬化。 As described above, the method of manufacturing the X-ray detector of the present embodiment includes the steps of: forming a scintillator layer 5 for converting X-rays into fluorescence on the array substrate 2 having the photoelectric conversion element 2b1; and coating the adhesive 8a Between the moisture-proof body disposed on the layer covering the scintillator layer 5 7 and an annular brim portion 7c located on the outer side of the scintillator layer 5; the cap portion 7c is in close proximity to the array substrate 2; and the adhesive 8a is cured.

接著,於使帽緣部7c與陣列基板2近接之步驟中,藉由設置於較帽緣部7c更外側之厚度控制部103,將帽緣部7c與陣列基板2之間之距離保持一定。 Next, in the step of bringing the cap portion 7c into close contact with the array substrate 2, the distance between the cap portion 7c and the array substrate 2 is kept constant by the thickness control portion 103 provided on the outer side of the cap portion 7c.

又,於使帽緣部7c與陣列基板2近接之步驟中,將防濕體7載置於托盤100。接著,設置在托盤100之載置防濕體7之區域外側之厚度控制部103與陣列基板2接觸。 Further, in the step of bringing the cap portion 7c into close proximity to the array substrate 2, the moistureproof body 7 is placed on the tray 100. Next, the thickness control unit 103 provided outside the region on which the moisture-proof body 7 is placed on the tray 100 is in contact with the array substrate 2.

接著,對比較例之接著層18之形成進行說明。 Next, the formation of the adhesive layer 18 of the comparative example will be described.

圖6係用以示例形成比較例之接著層18所使用之托盤(治具)110之示意剖面圖。 Fig. 6 is a schematic cross-sectional view showing a tray (tool) 110 used to form the adhesive layer 18 of the comparative example.

圖7係用以示例比較例之接著層18之形成狀態之示意剖面圖。 Fig. 7 is a schematic cross-sectional view showing a state in which the adhesive layer 18 of the comparative example is formed.

如圖6所示,於托盤110,設置有基部101、及防附著層102。 As shown in FIG. 6, the tray 110 is provided with a base 101 and an adhesion preventing layer 102.

即,於托盤110未設置厚度控制部103。另,托盤110除了未設置厚度控制部103以外,其餘皆與托盤100相同。 That is, the thickness control unit 103 is not provided in the tray 110. Further, the tray 110 is the same as the tray 100 except that the thickness control unit 103 is not provided.

比較例之接著層18之形成係使用托盤110進行。 The formation of the adhesive layer 18 of the comparative example is carried out using the tray 110.

首先,與接著層8形成之情形相同,淨化防濕體7之帽緣部7c之表面(接著面),並將接著劑8a塗佈於帽緣部7c之表面。 First, as in the case where the adhesive layer 8 is formed, the surface (adjacent surface) of the cap portion 7c of the moisture-proof body 7 is cleaned, and the adhesive 8a is applied to the surface of the cap portion 7c.

接著,使塗佈於防濕體7之帽緣部7c之接著劑8a接觸於陣列基板2(基板2a)。 Next, the adhesive 8a applied to the cap portion 7c of the moisture-proof body 7 is brought into contact with the array substrate 2 (substrate 2a).

於比較例之接著層18之形成中,如圖7所示,使板狀體104與托盤110於近接之方向相對移動,使塗佈於防濕體7之帽緣部7c之接著劑8a接觸於陣列基板2(基板2a)。 In the formation of the adhesive layer 18 of the comparative example, as shown in Fig. 7, the plate-like body 104 and the tray 110 are relatively moved in the immediate direction, and the adhesive 8a applied to the cap portion 7c of the moisture-proof body 7 is brought into contact. On the array substrate 2 (substrate 2a).

於該情形時,由於托盤110上未設置厚度控制部103,故例如藉由控制加壓力,而規定接著劑8a之按壓尺寸(所形成之接著層18之厚度尺寸)。 In this case, since the thickness control unit 103 is not provided on the tray 110, the pressing size of the adhesive 8a (the thickness dimension of the formed adhesive layer 18) is specified, for example, by controlling the pressing force.

然而,因接著劑8a之硬度或黏度、接著劑8a之相對於基板2a或帽緣部7c之濡濕性、加壓力之面內分佈等,接著劑8a之壓扁方式與擴展方式會有所變動。要控制該等影響因子而遍及全周擠壓接著劑8a,並控制接著劑8a之按壓尺寸、乃至接著層8之寬度尺寸或溢出量,極其困難。因此,有接著劑8a之按壓尺寸偏差增大,而如圖7所示接著劑8a之溢出量增大或接著層18之寬度尺寸變小之虞。 However, due to the hardness or viscosity of the adhesive 8a, the wettability of the adhesive 8a with respect to the substrate 2a or the brim portion 7c, the in-plane distribution of the pressing force, etc., the flattening manner and expansion mode of the adhesive 8a may vary. . It is extremely difficult to control the influence factors and press the adhesive 8a throughout the entire circumference and control the pressing size of the adhesive 8a, or even the width dimension or the overflow amount of the layer 8. Therefore, the pressing size deviation of the adhesive 8a is increased, and as shown in Fig. 7, the overflow amount of the adhesive 8a is increased or the width dimension of the layer 18 is decreased.

例如,於接著劑8a之塗佈量增加、加壓力增大之情形時,接著層8之溢出量顯著增大。 For example, when the coating amount of the adhesive 8a is increased and the pressing force is increased, the amount of overflow of the subsequent layer 8 is remarkably increased.

又,於接著劑8a之塗佈量減少之情形時,接著層8之寬度尺寸縮小,且寬度尺寸偏差亦增大。因此,有產生接著層8之寬度尺寸極其小之部位、防濕性能變差之虞。 Moreover, when the coating amount of the adhesive 8a is reduced, the width dimension of the subsequent layer 8 is reduced, and the width dimension deviation is also increased. Therefore, there is a case where the width of the adhesive layer 8 is extremely small, and the moisture resistance is deteriorated.

對此,根據使用托盤100之接著層8之形成方法,可抑制接著劑8a之溢出量,且容易形成具有適當尺寸之接著層8。 On the other hand, according to the method of forming the adhesive layer 8 using the tray 100, the amount of overflow of the adhesive 8a can be suppressed, and the adhesive layer 8 having an appropriate size can be easily formed.

接著,對本實施形態之接著層8之特性進行說明。 Next, the characteristics of the adhesive layer 8 of the present embodiment will be described.

首先,對本實施形態之接著層8之尺寸精度進行說明。 First, the dimensional accuracy of the adhesive layer 8 of the present embodiment will be described.

此處,本實施形態之接著層8係使用托盤100形成。 Here, the adhesive layer 8 of this embodiment is formed using the tray 100.

比較例之接著層18係使用托盤110形成。 The adhesive layer 18 of the comparative example is formed using the tray 110.

又,接著劑8a之比重設為約1.4g/cc,塗佈於帽緣部7c之接著劑8a之量設為0.4mg/mm、0.6mg/mm之2個水準。 Further, the specific gravity of the adhesive 8a was set to be about 1.4 g/cc, and the amount of the adhesive 8a applied to the brim portion 7c was set to two levels of 0.4 mg/mm and 0.6 mg/mm.

又,接著時之加壓條件設為帽緣部7c之每單位面積為0.5kgf/cm2、1.0kgf/cm2、1.5kgf/cm2之3個水準。 Further, when the press conditions set then the brim portion 7c of per unit area of 0.5kgf / cm 2, 1.0kgf / cm 2, 1.5kgf / cm 2 of 3 standard.

又,帽緣部7c之寬度尺寸W1設為2mm。 Moreover, the width dimension W1 of the brim portion 7c is set to 2 mm.

於以下之表1、表2顯示接著層8及接著層18之厚度尺寸T之量測結果。 The measurement results of the thickness dimension T of the subsequent layer 8 and the subsequent layer 18 are shown in Tables 1 and 2 below.

另,表1係接著劑8a之量為0.4mg/mm之情形。 In addition, Table 1 shows the case where the amount of the adhesive 8a is 0.4 mg/mm.

表2係接著劑8a之量為0.6mg/mm之情形。 Table 2 shows the case where the amount of the adhesive 8a is 0.6 mg/mm.

於以下表3、表4顯示接著層8及接著層18之寬度尺寸W2之量測結 果。 The measurement of the width dimension W2 of the bonding layer 8 and the bonding layer 18 is shown in Tables 3 and 4 below. fruit.

另,表3係接著劑8a之量為0.4mg/mm之情形。 Further, Table 3 is a case where the amount of the adhesive 8a is 0.4 mg/mm.

表4係接著劑8a之量為0.6mg/mm之情形。 Table 4 shows the case where the amount of the adhesive 8a is 0.6 mg/mm.

另,接著層之寬度尺寸W2係亦包含自帽緣部7c溢出之部分時之尺寸。 Further, the width dimension W2 of the subsequent layer also includes the size when the portion of the cap portion 7c overflows.

自表1~表4可知,於本實施形態之接著層8中,與比較例之接著層18比較,厚度尺寸T及寬度尺寸W2之偏差縮小。意指可獲得防濕性能之高穩定性與高可靠性。 As is apparent from Tables 1 to 4, in the adhesive layer 8 of the present embodiment, the deviation between the thickness dimension T and the width dimension W2 was reduced as compared with the adhesive layer 18 of the comparative example. It means high stability and high reliability for moisture resistance.

又,帽緣部7c之寬度尺寸W1係2mm。因此,自表3、表4可知,於本實施形態之接著層8中,與比較例之接著層18比較,來自帽緣部7c之溢出量減小。 Moreover, the width dimension W1 of the brim portion 7c is 2 mm. Therefore, as is clear from Tables 3 and 4, in the adhesive layer 8 of the present embodiment, the amount of overflow from the cap portion 7c is reduced as compared with the adhesive layer 18 of the comparative example.

接著,對本實施形態之關於接著層8之防濕之可靠性進行說明。 Next, the reliability of the moisture barrier of the adhesive layer 8 of the present embodiment will be described.

於關於防濕之可靠性試驗中,使用將防濕體7接著於虛設面板之上者。虛設面板係於基板2a上僅形成保護層2f者,未形成光電轉換部2b、控制線2c1、資料線2c2。閃爍體層5與反射層6係為了確認特性變化而形成。 In the reliability test regarding moisture prevention, the use of the moisture-proof body 7 on the dummy panel is used. The dummy panel is formed by forming only the protective layer 2f on the substrate 2a, and the photoelectric conversion portion 2b, the control line 2c1, and the data line 2c2 are not formed. The scintillator layer 5 and the reflective layer 6 are formed in order to confirm the change in characteristics.

使用虛設面板之理由是,由於未形成存在於陣列基板中之像素圖案等遮蔽閃爍光之透過者,故適合自基板之背面側量測亮度或解析度之特性之故。又,關於防濕可靠性或冷熱可靠性,即使使用虛設基板亦可實現與使用陣列基板2時同等的評估之故。 The reason why the dummy panel is used is that the transmission of the scintillation light such as the pixel pattern existing in the array substrate is not formed, so that the characteristics of the luminance or the resolution are measured from the back side of the substrate. Further, regarding the moisture-proof reliability or the cold-heat reliability, even when a dummy substrate is used, the same evaluation as in the case of using the array substrate 2 can be achieved.

樣本1~樣本6係使用托盤100形成之本實施形態之接著層8之情形。 Samples 1 to 6 are the case where the adhesive layer 100 of the present embodiment formed by the tray 100 is used.

樣本7~樣本12係使用托盤110形成之比較例之接著層18之情形。 Samples 7 to 12 are the case of using the adhesive layer 18 of the comparative example formed by the tray 110.

樣本1~12之形成條件等如表5所示。 The formation conditions of the samples 1 to 12 are as shown in Table 5.

又,將帽緣部7c之寬度尺寸W1設為2mm。 Moreover, the width dimension W1 of the brim portion 7c was set to 2 mm.

於高溫高濕試驗中,評估藉由閃爍體層5與反射層6而獲得之解析度特性在高溫高濕環境下(60°-90%RH)隨著保存時間之經過而劣化之情形。 In the high-temperature and high-humidity test, the resolution characteristics obtained by the scintillator layer 5 and the reflective layer 6 were evaluated in a high-temperature and high-humidity environment (60°-90% RH) as the storage time elapsed.

另,根據對於濕度較亮度更敏感之解析度特性進行評估。 In addition, it is evaluated based on the resolution characteristics that are more sensitive to humidity than brightness.

解析度特性係以將解析度圖表配於各樣本之表面側,照射與RQA-5相當之X射線,並自背面量測2Lp/mm之CTF(Contrast transfer function:反差轉換函數)之方法求出。 The resolution characteristic is obtained by arranging a resolution chart on the surface side of each sample, irradiating an X-ray equivalent to RQA-5, and measuring a CTF (Contrast transfer function) of 2 Lp/mm from the back side. .

表6係高溫高濕試驗之結果。 Table 6 shows the results of the high temperature and high humidity test.

另,表6中之數值係將初期裝置之CTF設為100(%)之情形之維持率(%)。 In addition, the numerical value in Table 6 is the maintenance rate (%) in the case where the CTF of the initial apparatus was set to 100 (%).

自表6可知,關於對高溫高濕之可靠性,本實施形態之接著層8、與比較例之接著層18幾乎相等,但整體上可認為本實施形態之接著層8較穩定。 As is clear from Table 6, the adhesion layer 8 of the present embodiment and the adhesion layer 18 of the comparative example are almost equal to the reliability of high temperature and high humidity. However, the adhesion layer 8 of the present embodiment is considered to be relatively stable as a whole.

此處,若設置自帽緣部7c溢出之部分並加長接著層18之寬度尺寸W2,則容易抑制水蒸氣之透過。 Here, if the portion overflowing from the cap portion 7c is provided and the width dimension W2 of the subsequent layer 18 is lengthened, it is easy to suppress the permeation of water vapor.

本實施形態之接著層8其寬度尺寸W2與帽緣部7c之寬度尺寸W1幾乎相同,且偏差縮小。又,接著層8之厚度尺寸T之偏差亦縮小。因此,無容易透過水蒸氣之厚度尺寸T變大之部位、或寬度尺寸W2縮小之部位。其結果,可認為即使無自帽緣部7c溢出之部分,亦可確保與接著層18之情形同等之對高溫高濕之可靠性。即,認為是由於遍及接 著層之整個區域充分確保抑制水蒸氣透過之接著層所必須之維數(寬度尺寸與厚度尺寸)之故。 In the adhesive layer 8 of the present embodiment, the width dimension W2 and the width dimension W1 of the cap portion 7c are almost the same, and the deviation is reduced. Further, the deviation of the thickness dimension T of the layer 8 is also reduced. Therefore, there is no portion that is likely to pass through the thickness T of the water vapor or a portion where the width W2 is reduced. As a result, it is considered that the reliability of high temperature and high humidity equivalent to the case of the subsequent layer 18 can be ensured even without the portion overflowing from the cap portion 7c. That is, it is considered to be due to The entire area of the layer is sufficient to ensure the dimensionality (width size and thickness dimension) necessary to suppress the adhesion of water vapor.

冷熱循環試驗係將溫度條件設為(-20℃×1h)→(室溫×30分鐘)→(60℃×1h)→(室溫×30分鐘),循環數設為最大100次循環。 In the thermal cycle test, the temperature conditions were set to (-20 ° C × 1 h) → (room temperature × 30 minutes) → (60 ° C × 1 h) → (room temperature × 30 minutes), and the number of cycles was set to a maximum of 100 cycles.

接著,於中途之每10次循環,確認於各樣本之接著層有無產生剝落或破損等異常。 Next, every 10 cycles in the middle of the process, it was confirmed whether or not an abnormality such as peeling or breakage occurred in the adhesive layer of each sample.

表7係冷熱循環試驗之結果。 Table 7 shows the results of the thermal cycle test.

另,表7中之數值中,「2」表示無異常,「1」表示有異常。 In addition, in the numerical values in Table 7, "2" indicates that there is no abnormality, and "1" indicates that there is an abnormality.

自表7可知,關於對冷熱循環試驗之可靠性,本實施形態之接著層8、與比較例之接著層18幾乎相同,但整體可以說本實施形態之接 著層8較穩定。 As can be seen from Table 7, the reliability of the thermal cycle test is almost the same as that of the adhesive layer 8 of the present embodiment, and the laminate layer 18 of the comparative example. Layer 8 is relatively stable.

本實施形態之接著層8係充分地形成至帽緣部7c之端部附近之區域。因此,帽緣部7c與接著層8之界面之實效面積、基板2a與接著層8之界面之實效面積與接著層18之情形相比毫不遜色。又,如上述般,接著層8之接著品質遍及整個區域均較穩定。結果,認為可確保對冷熱循環之可靠性者。 The adhesive layer 8 of the present embodiment is sufficiently formed in a region in the vicinity of the end portion of the cap portion 7c. Therefore, the effective area of the interface between the cap portion 7c and the adhesive layer 8 and the effective area of the interface between the substrate 2a and the adhesive layer 8 are inferior to those of the adhesive layer 18. Further, as described above, the subsequent quality of the layer 8 is relatively stable throughout the entire area. As a result, it is considered that the reliability of the hot and cold cycle can be ensured.

如以上說明般,根據本實施形態之接著層8,可確保對高溫高濕之可靠性、及對冷熱循環之可靠性。 As described above, according to the adhesive layer 8 of the present embodiment, the reliability against high temperature and high humidity and the reliability against the hot and cold cycle can be ensured.

如上述般,接著劑8a自防濕體7之帽緣部7c溢出於外側時,有難以與可撓性印刷基板2e1、2e2等連接,或難以進行X射線檢測器1之小型化或輕量化等之虞。 As described above, when the adhesive 8a overflows from the cap portion 7c of the moisture-proof body 7, it is difficult to connect with the flexible printed boards 2e1, 2e2, etc., or it is difficult to reduce the size or weight of the X-ray detector 1. Wait a minute.

然而,於接著劑8a自防濕體7之帽緣部7c溢出於內側之情形時,只要對閃爍體層5之有效像素區域部分不造成影響即可容許。 However, when the adhesive 8a overflows from the cap portion 7c of the moisture-proof body 7 to the inside, it is acceptable as long as it does not affect the effective pixel region portion of the scintillator layer 5.

又,有以下之優點。 Also, there are the following advantages.

例如,若接著劑8a自防濕體7之帽緣部7c溢出於內側,接著層8之實效透過路徑變長。因此,該部分可抑制水蒸氣之透過。 For example, when the adhesive 8a overflows from the cap portion 7c of the moisture-proof body 7, the effective transmission path of the layer 8 becomes long. Therefore, this portion can suppress the permeation of water vapor.

又,若接著劑8a自防濕體7之帽緣部7c溢出於內側,可使防濕體7與接著層8之接著面積、及接著層8與基板2a之接著面積增加。因此,可提高對冷熱循環試驗等之可靠性。 Further, when the adhesive 8a overflows from the cap portion 7c of the moisture-proof body 7, the contact area between the moisture-proof body 7 and the adhesive layer 8 and the contact area between the adhesive layer 8 and the substrate 2a can be increased. Therefore, the reliability of the cold and heat cycle test and the like can be improved.

圖8及圖9係用以示例使接著劑8a自防濕體7之帽緣部7c溢出於內側之方法之示意圖。 8 and 9 are schematic views for explaining a method of allowing the adhesive 8a to overflow from the cap portion 7c of the moisture-proof body 7 to the inside.

首先,如圖8所示,將防濕體7載置於托盤100,並於帽緣部7c之表面塗佈接著劑8a。 First, as shown in Fig. 8, the moisture-proof body 7 is placed on the tray 100, and the adhesive 8a is applied to the surface of the cap portion 7c.

此時,遍及帽緣部7c之中心位置附近之整周塗佈接著劑8a。 At this time, the adhesive 8a is applied over the entire circumference of the vicinity of the center position of the cap portion 7c.

又,於塗佈於帽緣部7c之中心位置附近之接著劑8a之內側,遍及整周塗佈接著劑8a。 Further, the adhesive 8a is applied over the entire circumference of the adhesive 8a applied in the vicinity of the center position of the brim portion 7c.

即,於帽緣部7c之中心位置附近環狀地塗佈接著劑8a,並於其內側亦分開適當之間隔(例如,自0.5mm至1.0mm左右),環狀地塗佈接著劑8a。 In other words, the adhesive 8a is applied annularly in the vicinity of the center position of the cap portion 7c, and the adhesive agent 8a is applied in a ring shape at an appropriate interval (for example, from about 0.5 mm to 1.0 mm).

接著,如圖9所示,使板狀體104與托盤100於近接之方向相對移動,使厚度控制部103與陣列基板2(基板2a)接觸。 Next, as shown in FIG. 9, the plate-like body 104 and the tray 100 are relatively moved in the proximity direction, and the thickness control part 103 is contacted with the array substrate 2 (substrate 2a).

藉由厚度控制部103與陣列基板2接觸,規定接著劑8a之按壓尺寸(所形成之接著層8之厚度尺寸)。 The thickness control unit 103 is in contact with the array substrate 2 to define the pressing size of the adhesive 8a (the thickness dimension of the formed back layer 8).

此時,環狀地塗佈於較帽緣部7c之中心位置更內側之接著劑8a自防濕體7之帽緣部7c溢出於內側。 At this time, the adhesive 8a which is applied to the inner side of the center edge of the cap portion 7c in an annular shape overflows from the cap portion 7c of the moisture-proof body 7 to the inside.

於該情形時,若適當選擇環狀地塗佈於較帽緣部7c之中心位置更內側之接著劑8a之量、或環狀地塗佈之接著劑8a彼此之間之間隔,則可抑制接著劑8a自帽緣部7c溢出於外側,並可使接著劑8a自帽緣部7c溢出於內側。 In this case, if the amount of the adhesive 8a applied to the inner side of the brim portion 7c in the annular shape or the interval between the cyclically applied adhesives 8a is appropriately selected, it is possible to suppress The subsequent agent 8a overflows from the cap portion 7c to the outside, and allows the adhesive 8a to overflow from the cap portion 7c to the inside.

例如,若將帽緣部7c之寬度尺寸W1設為2mm,將帽緣部7c之厚度尺寸設為0.1mm,將厚度控制部103之厚度尺寸設為0.25mm,則接著劑8a之按壓尺寸為0.15mm。 For example, when the width W1 of the brim portion 7c is 2 mm, the thickness of the brim portion 7c is 0.1 mm, and the thickness of the thickness control portion 103 is 0.25 mm, the pressing size of the adhesive 8a is 0.15mm.

於此種情形時,於帽緣部7c之中心位置附近以0.4mg/mm之塗佈量塗佈接著劑8a,並於其內側空開0.8mm之間隔以0.4mg/mm之塗佈量塗佈接著劑8a。(接著劑之比重係例如ρ著劑之比重係例如ρ3) In this case, the adhesive 8a was applied at a coating amount of 0.4 mg/mm in the vicinity of the center position of the cap portion 7c, and was applied at a gap of 0.8 mm on the inner side thereof at a coating amount of 0.4 mg/mm. Cloth adhesive 8a. (The specific gravity of the adhesive is, for example, the specific gravity of the ρ agent is, for example, ρ 3 )

如此,則可抑制接著劑8a自帽緣部7c溢出於外側,並可使接著劑8a自帽緣部7c溢出於內側。 In this manner, the adhesive 8a can be prevented from overflowing from the outside of the cap portion 7c, and the adhesive 8a can be allowed to overflow from the cap portion 7c to the inside.

接著,對其他實施形態之厚度控制部進行示例。 Next, the thickness control unit of another embodiment will be exemplified.

圖10~圖12係用以示例其他實施形態之厚度控制部之示意剖面圖。 10 to 12 are schematic cross-sectional views for illustrating a thickness control unit according to another embodiment.

如圖10所示,於托盤100a設置有基部111、防附著層102、及厚度控制部103a。 As shown in FIG. 10, the tray 100a is provided with a base portion 111, an adhesion preventing layer 102, and a thickness control portion 103a.

基部111係呈板狀,並於中央部分設置凹部111a。凹部111a可設為與上述之凹部101a相同。凹部111a之周圍成為載置防濕體7之帽緣部7c之載置面111b。於載置面111b之外側,設置有凹部111c。即,托盤100a係於上述之托盤100進而設置有凹部111c者。 The base portion 111 has a plate shape, and a concave portion 111a is provided at the center portion. The concave portion 111a can be the same as the above-described concave portion 101a. The periphery of the recessed portion 111a is a mounting surface 111b on which the cap portion 7c of the moistureproof body 7 is placed. A concave portion 111c is provided on the outer side of the mounting surface 111b. That is, the tray 100a is attached to the above-described tray 100 and further provided with the concave portion 111c.

厚度控制部103a係設置於凹部111c。因此,與上述之厚度控制部103相比可延長厚度尺寸。因此,容易以機械加工或成形加工製作厚度控制部103a。 The thickness control unit 103a is provided in the recess 111c. Therefore, the thickness dimension can be extended as compared with the thickness control unit 103 described above. Therefore, it is easy to manufacture the thickness control part 103a by mechanical processing or shaping|molding.

如圖11所示,於托盤100b設置有基部112、防附著層102、及厚度控制部112c。 As shown in FIG. 11, the base 100, the adhesion prevention layer 102, and the thickness control part 112c are provided in the tray 100b.

基部112係呈板狀,並於中央部分設置有凹部112a。凹部112a可設為與上述之凹部101a相同。凹部112a之周圍係載置防濕體7之帽緣部7c之載置面112b。 The base portion 112 has a plate shape, and a concave portion 112a is provided at a central portion. The concave portion 112a can be made the same as the above-described concave portion 101a. A mounting surface 112b of the brim portion 7c of the moistureproof body 7 is placed around the recess 112a.

於基部112之周邊附近,設置自載置面112b突出之厚度控制部112c。即,基部112之一部分成為厚度控制部112c。 A thickness control portion 112c that protrudes from the mounting surface 112b is provided in the vicinity of the periphery of the base portion 112. That is, one of the base portions 112 serves as the thickness control portion 112c.

因此,可提高厚度控制部112c之厚度尺寸之尺寸精度。 Therefore, the dimensional accuracy of the thickness dimension of the thickness control portion 112c can be improved.

如圖12所示,於托盤100c設置有基部113、防附著層102、及厚度控制部113d。 As shown in FIG. 12, the tray 100c is provided with a base portion 113, an adhesion preventing layer 102, and a thickness control portion 113d.

基部113係呈板狀,並於中央部分設置有凹部113a。凹部113a可設為與上述之凹部101a相同。凹部113a之周圍成為載置防濕體7之帽緣部7c之載置面113b。於載置面113b之外側,設置有凹部113c。 The base portion 113 has a plate shape, and a concave portion 113a is provided at the center portion. The concave portion 113a can be the same as the above-described concave portion 101a. The periphery of the recessed portion 113a serves as a mounting surface 113b on which the cap portion 7c of the moistureproof body 7 is placed. A concave portion 113c is provided on the outer side of the mounting surface 113b.

厚度控制部113d係自凹部113c突出。即,基部113之一部分成為厚度控制部113d。即,基部113係與上述之基部111及厚度控制部103a一體形成者。 The thickness control unit 113d protrudes from the concave portion 113c. That is, one of the base portions 113 serves as the thickness control portion 113d. That is, the base portion 113 is integrally formed with the base portion 111 and the thickness control portion 103a described above.

因此,可容易以機械加工或成形加工製作厚度控制部113d。又,可提高厚度控制部113d之厚度尺寸之尺寸精度。 Therefore, the thickness control portion 113d can be easily formed by machining or forming. Moreover, the dimensional accuracy of the thickness dimension of the thickness control portion 113d can be improved.

以上示例本發明之若干實施形態,但該等實施形態係作為例提 示者,並非意圖限定發明之範圍。該等新型實施形態可以其他各種形態實施,於不脫離發明主旨之範圍,可進行各種省略、置換、變更等。該等實施形態或其變化例包含於發明之範圍或主旨,且包含於申請專利範圍所記載之發明及與其均等之範圍。又,上述各實施形態可相互組合實施。 The embodiments of the present invention have been exemplified above, but the embodiments are described as examples. The present invention is not intended to limit the scope of the invention. The present invention can be implemented in various other forms, and various omissions, substitutions, changes and the like can be made without departing from the scope of the invention. The inventions and their modifications are intended to be included within the scope of the inventions and the scope of the invention. Further, each of the above embodiments can be implemented in combination with each other.

2‧‧‧陣列基板 2‧‧‧Array substrate

2a‧‧‧基板 2a‧‧‧Substrate

5‧‧‧閃爍體層 5‧‧‧ scintillation layer

6‧‧‧反射層 6‧‧‧reflective layer

7‧‧‧防濕體 7‧‧‧Damps

7a‧‧‧表面部 7a‧‧‧Surface

7b‧‧‧周面部 7b‧‧‧ week face

7c‧‧‧帽緣部 7c‧‧‧Cap

8‧‧‧接著層 8‧‧‧Next layer

8a‧‧‧接著劑 8a‧‧‧Binder

100‧‧‧托盤 100‧‧‧Tray

101‧‧‧基部 101‧‧‧ base

102‧‧‧防附著層 102‧‧‧Anti-adhesion layer

103‧‧‧厚度控制部 103‧‧‧ thickness control department

104‧‧‧板狀體 104‧‧‧ plate body

Claims (7)

一種放射線檢測器之製造方法,其包含以下步驟:於包含光電轉換元件之陣列基板上,形成將放射線轉換為螢光之閃爍體層;將接著劑塗佈於設置於覆蓋上述閃爍體層之防濕體且位於上述閃爍體層外側之環狀帽緣部、或對向於上述帽緣部之上述陣列基板上;使上述帽緣部與上述陣列基板近接;使上述接著劑硬化;且於使上述帽緣部與上述陣列基板近接之步驟中,藉由設置於較上述帽緣部更靠外側之厚度控制部,將上述帽緣部與上述陣列基板之間之距離保持為一定。 A method of manufacturing a radiation detector comprising the steps of: forming a scintillator layer for converting radiation into fluorescence on an array substrate including a photoelectric conversion element; and applying an adhesive to a moisture-proof body disposed on the scintillator layer And an annular cap portion on the outer side of the scintillator layer or on the array substrate facing the cap portion; the cap portion is in close proximity to the array substrate; the adhesive is cured; and the cap is made In the step of the portion adjacent to the array substrate, the distance between the cap portion and the array substrate is kept constant by a thickness control portion provided outside the cap portion. 如請求項1之放射線檢測器之製造方法,其中於使上述帽緣部與上述陣列基板接近之步驟中,上述防濕體係載置於托盤,且設置於上述托盤之載置上述防濕體之區域外側之上述厚度控制部與上述陣列基板接觸。 The method of manufacturing a radiation detector according to claim 1, wherein in the step of bringing the cap portion into proximity with the array substrate, the moisture-proof system is placed on a tray, and the moisture-proof body is placed on the tray. The thickness control unit outside the region is in contact with the array substrate. 如請求項1或2之放射線檢測器之製造方法,其中上述厚度控制部至少接觸於上述陣列基板之側具有可撓性。 The method of manufacturing a radiation detector according to claim 1 or 2, wherein the thickness control portion has flexibility at least on a side contacting the array substrate. 如請求項2之放射線檢測器之製造方法,其中上述厚度控制部包含:樹脂層、及設置於上述樹脂層之黏著層,且上述厚度控制部係經由上述黏著層而設置於上述托盤。 The method of manufacturing a radiation detector according to claim 2, wherein the thickness control unit includes a resin layer and an adhesive layer provided on the resin layer, and the thickness control unit is provided on the tray via the adhesive layer. 如請求項3之放射線檢測器之製造方法,其中上述厚度控制部包含:樹脂層、及設置於上述樹脂層之黏著層,且上述厚度控制部係經由上述黏著層而設置於上述托盤。 The method of manufacturing a radiation detector according to claim 3, wherein the thickness control unit includes a resin layer and an adhesive layer provided on the resin layer, and the thickness control unit is provided on the tray via the adhesive layer. 一種放射線檢測器,其包含:陣列基板,其包含光電轉換元件;閃爍體層,其設置於上述光電轉換元件之上,並將放射線轉換為螢光;防濕體,其包含位於上述閃爍體層外側之環狀帽緣部,並覆蓋上述閃爍體層;接著層,其設置於上述帽緣部與上述陣列基板之間;且上述接著層之與上述閃爍體層側相反側之端部係設置在較設置於上述陣列基板周邊之配線墊片更靠上述閃爍體層側;上述接著層之厚度尺寸係0.1mm以上0.4mm以下;上述接著層之寬度尺寸係2mm以上。 A radiation detector comprising: an array substrate comprising a photoelectric conversion element; a scintillator layer disposed on the photoelectric conversion element and converting the radiation into a fluorescent light; and a moistureproof body comprising the outer side of the scintillator layer An annular cap portion covering the scintillator layer; a second layer disposed between the cap portion and the array substrate; and an end portion of the adhesive layer opposite to the scintillator layer side disposed on the end portion The wiring spacer around the array substrate is further on the side of the scintillator layer; the thickness of the adhesive layer is 0.1 mm or more and 0.4 mm or less; and the width of the subsequent layer is 2 mm or more. 如請求項6之放射線檢測器,其中上述接著層之上述閃爍體層側之端部係設置在較上述帽緣部之上述閃爍體層側之端部更靠上述閃爍體層側。 The radiation detector according to claim 6, wherein the end portion of the adhesive layer on the scintillator layer side is provided on the side of the scintillator layer on the side of the scintillator layer side of the cap portion.
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