TWI528017B - 厚度測量裝置及其測量方法 - Google Patents

厚度測量裝置及其測量方法 Download PDF

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Publication number
TWI528017B
TWI528017B TW103132765A TW103132765A TWI528017B TW I528017 B TWI528017 B TW I528017B TW 103132765 A TW103132765 A TW 103132765A TW 103132765 A TW103132765 A TW 103132765A TW I528017 B TWI528017 B TW I528017B
Authority
TW
Taiwan
Prior art keywords
light
reflectance information
thickness
information
theoretical
Prior art date
Application number
TW103132765A
Other languages
English (en)
Chinese (zh)
Other versions
TW201520510A (zh
Inventor
朴喜載
黃映珉
趙泰英
Original Assignee
史那精密股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 史那精密股份有限公司 filed Critical 史那精密股份有限公司
Publication of TW201520510A publication Critical patent/TW201520510A/zh
Application granted granted Critical
Publication of TWI528017B publication Critical patent/TWI528017B/zh

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02012—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal intensity variation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
TW103132765A 2013-09-23 2014-09-23 厚度測量裝置及其測量方法 TWI528017B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020130112738A KR101537854B1 (ko) 2013-09-23 2013-09-23 두께 측정 장치 및 이를 이용한 두께 측정 방법

Publications (2)

Publication Number Publication Date
TW201520510A TW201520510A (zh) 2015-06-01
TWI528017B true TWI528017B (zh) 2016-04-01

Family

ID=52689106

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103132765A TWI528017B (zh) 2013-09-23 2014-09-23 厚度測量裝置及其測量方法

Country Status (5)

Country Link
JP (1) JP6181878B2 (ko)
KR (1) KR101537854B1 (ko)
CN (1) CN105492861B (ko)
TW (1) TWI528017B (ko)
WO (1) WO2015041506A1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111279147A (zh) * 2017-11-01 2020-06-12 柯尼卡美能达株式会社 膜厚测定方法、膜厚测定系统、光反射膜的制造方法及光反射膜的制造系统

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6218261B2 (ja) * 2015-10-23 2017-10-25 株式会社カツラ・オプト・システムズ 光学素子特性測定装置
US10163669B2 (en) 2016-01-29 2018-12-25 Taiwan Semiconductor Manufacturing Company, Ltd. Metrology system and measurement method using the same
JP6550101B2 (ja) * 2017-07-13 2019-07-24 Ｊｆｅテクノリサーチ株式会社 膜厚測定方法及び膜厚測定装置
US10816464B2 (en) 2019-01-23 2020-10-27 Applied Materials, Inc. Imaging reflectometer
US11150078B1 (en) 2020-03-26 2021-10-19 Applied Materials, Inc. High sensitivity image-based reflectometry
US11156566B2 (en) 2020-03-26 2021-10-26 Applied Materials, Inc. High sensitivity image-based reflectometry
US11417010B2 (en) 2020-05-19 2022-08-16 Applied Materials, Inc. Image based metrology of surface deformations
CN111750786B (zh) * 2020-07-06 2022-03-01 上海新昇半导体科技有限公司 厚度量测设备、抛光系统及抛光物料管理方法
CN112460742B (zh) * 2020-11-19 2021-11-23 珠海格力电器股份有限公司 传感器的控制方法、装置、传感器、存储介质及处理器
WO2022180775A1 (ja) * 2021-02-26 2022-09-01 国立大学法人名古屋工業大学 レーザ加工装置、厚さ検出方法および厚さ検出装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6534774B2 (en) * 2000-09-08 2003-03-18 Mitsubishi Materials Silicon Corporation Method and apparatus for evaluating the quality of a semiconductor substrate
FR2880945B1 (fr) * 2005-01-14 2007-04-06 Essilor Int Palpeur optique ainsi que dispositif et procede le mettant en oeuvre.
KR100947031B1 (ko) * 2008-04-03 2010-03-11 한국과학기술원 3파장 광원을 이용한 위상물체의 굴절률과 두께 측정장치및 그 방법
KR101107507B1 (ko) * 2009-03-23 2012-01-31 에스엔유 프리시젼 주식회사 반사도분포곡선의 모델링방법 및 이를 이용하는 두께 측정방법, 두께 측정 반사계
JP5692988B2 (ja) * 2009-10-19 2015-04-01 キヤノン株式会社 音響波測定装置
US9654745B2 (en) * 2010-03-17 2017-05-16 Haishan Zeng Rapid multi-spectral imaging methods and apparatus and applications for cancer detection and localization
CN102589452B (zh) * 2012-01-17 2014-09-24 华南师范大学 测量薄膜厚度和折射率的方法及装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111279147A (zh) * 2017-11-01 2020-06-12 柯尼卡美能达株式会社 膜厚测定方法、膜厚测定系统、光反射膜的制造方法及光反射膜的制造系统

Also Published As

Publication number Publication date
CN105492861A (zh) 2016-04-13
WO2015041506A1 (ko) 2015-03-26
CN105492861B (zh) 2018-09-04
TW201520510A (zh) 2015-06-01
JP2016531303A (ja) 2016-10-06
KR20150033132A (ko) 2015-04-01
KR101537854B1 (ko) 2015-07-21
JP6181878B2 (ja) 2017-08-16

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