TWI528017B - Apparatus for measuring thickness and method for measuring thickness for the same - Google Patents
Apparatus for measuring thickness and method for measuring thickness for the same Download PDFInfo
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- TWI528017B TWI528017B TW103132765A TW103132765A TWI528017B TW I528017 B TWI528017 B TW I528017B TW 103132765 A TW103132765 A TW 103132765A TW 103132765 A TW103132765 A TW 103132765A TW I528017 B TWI528017 B TW I528017B
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02012—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal intensity variation
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- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Description
本發明涉及一種厚度測量裝置及利用該裝置的厚度測量方法,更為詳細地涉及一種能夠與測量對象的材料或測量位置無關地提高厚度測量精度的測量裝置及利用該裝置的厚度測量方法。 The present invention relates to a thickness measuring device and a thickness measuring method using the same, and more particularly to a measuring device capable of improving thickness measuring accuracy regardless of a material or a measuring position of a measuring object, and a thickness measuring method using the same.
在LCD、半導體領域中廣泛使用的透明薄膜在其特性上,由於其厚度之分佈度對於後續之製成工序的影響甚大,因此,係出現一種能夠監控透明薄膜厚度的監控系統。 The transparent film widely used in the field of LCD and semiconductor has a great influence on the subsequent manufacturing process because its thickness distribution has a great influence on the subsequent manufacturing process. Therefore, a monitoring system capable of monitoring the thickness of the transparent film has appeared.
一般而言,薄膜的厚度可透過利用探針(stylus)的機械方法及光學方法而測量,而光學方法之中,係廣泛地使用干涉儀(Interferometer)和反射計(Reflectometer)等儀器以進行量測。 In general, the thickness of a film can be measured by a mechanical method and an optical method using a stylus, and among optical methods, an instrument such as an interferometer and a reflectometer is widely used for the amount. Measurement.
請參閱第一圖,係習用之利用反射光度計(Reflectometry)的厚度測量裝置示意圖;如第一圖所示,在習用之利用反射光度計的厚度測量裝置1之中,從光源10照射的光通過各個透鏡(21、22)之後,係透過分光器30 而射入測量對象之中,並且再透過物鏡31而匯聚。接著,透過透明薄膜S’反射的光通過分光器30與而物鏡32射入光譜儀(Spetrometer)40或照相機50之中;並且,再利用光譜儀40獲取從檢測對象反射的光相對於波長的反射度變化的反射度分佈曲線並將其予以顯示出來。 Referring to the first drawing, a schematic diagram of a thickness measuring device using a Reflectometry is shown; as shown in the first figure, among the conventional thickness measuring device 1 using a reflectance photometer, light irradiated from the light source 10 After passing through the respective lenses (21, 22), passing through the beam splitter 30 The object is incident on the measurement object, and is again collected by the objective lens 31. Then, the light reflected through the transparent film S' passes through the beam splitter 30 and the objective lens 32 is incident into the spectrometer 40 or the camera 50; and, the spectrometer 40 is used to acquire the reflectance of the light reflected from the detection object with respect to the wavelength. The varying reflectance profile is displayed and displayed.
在此,為了確定透明薄膜S’的厚度,係應用對透過光譜儀40測量的反射度分佈曲線與透過數學式模化的反射度分佈曲線進行比較的方法(請參照文獻:韓國公開專利第10-2013-0021425號)。 Here, in order to determine the thickness of the transparent film S', a method of comparing the reflectance distribution curve measured by the transmission spectrometer 40 with the reflectance distribution curve by the mathematical simulation is applied (refer to the document: Korean Patent Laid-Open No. 10- 2013-0021425).
首先,係假設有具有彼此不同厚度的多種透明薄膜S’,且對每個透明薄膜S’利用數學式生成個別之反射度分佈曲線。之後,在經由模化的多個反射度分佈曲線中採用與測量的反射度分佈曲線最為一致的經模化的反射度分佈曲線,並且,與該經模化的反射度分佈曲線相對應的厚度即可確定為所述薄膜層的厚度。 First, it is assumed that there are a plurality of transparent films S' having different thicknesses from each other, and an individual reflectance profile is generated for each of the transparent films S' by a mathematical formula. Thereafter, a modeled reflectance profile that most closely matches the measured reflectance profile is employed in the plurality of reflectance profiles that are modeled, and a thickness corresponding to the modeled reflectance profile It can be determined as the thickness of the film layer.
然而,在習知厚度測量裝置中,雖然對測量對象的中心部較容易生成所測量的反射度曲線,但是越往測量對象的邊緣側時,其反射度之分佈曲線的反射度數值將越小,如此,將產生難以與經模化的反射度分佈曲線進行比較或者不能進行比較的問題。 However, in the conventional thickness measuring device, although it is easier to generate the measured reflectance curve for the center portion of the measuring object, the reflectance value of the reflectance distribution curve will be smaller as the edge side of the measuring object is measured. As such, there will be problems in that it is difficult to compare with the modeled reflectance profile or cannot be compared.
此外,根據測量對象的材料的特性,從測量對象中測量的反射度分佈曲線的反射度數值過高,將產生難以與 經模化的反射度分佈曲線進行比較或者不能進行比較的問題。 In addition, depending on the characteristics of the material of the measurement object, the reflectance value of the reflectance distribution curve measured from the measurement object is too high, which will cause difficulty The modeled reflectance profile is compared or cannot be compared.
根據上述吾人可以得知,根據測量對象的材料或測量位置等因素之不同,將會產生厚度測量精度下降的問題。 According to the above, it can be known that there is a problem that the thickness measurement accuracy is lowered depending on factors such as the material of the measurement object or the measurement position.
因此,本發明是為了解決所述的習知問題而提出的,其目的是提供一種厚度測量裝置及利用該裝置的厚度測量方法,該厚度測量裝置及利用該裝置的厚度測量方法能夠與測量對象的材料或測量位置無關地提高厚度測量精度。 Accordingly, the present invention has been made to solve the above-described conventional problems, and an object thereof is to provide a thickness measuring device and a thickness measuring method using the same, the thickness measuring device and a thickness measuring method using the same can be measured with a measuring object The material or measurement position increases the thickness measurement accuracy independently.
所述目的透過本發明的厚度測量裝置而達到,該厚度測量裝置使用反射光度計(Reflectometer),其特徵在於,包括:光源,用於發出光線;濾光器部,接收所述光源所發出的光線,並對彼此不同的多個頻率選擇性地使所述光進行透射而被調制為具有強度分佈的光,而且能夠調節所述具有強度分佈的光的波長寬度;光學系統,向測量對象側照射由所述濾光器部調制的光,並且從所述測量對象側反射的光被射入所述光學系統中;光檢測部,接收通過所述光學系統的光而獲得反射度資訊;和控制部,設定可透射所述濾光器部的多個頻率,以調節透過所述濾光器而被調制的光的波長寬度,並且對透過數學式被模化並被 保存的理論反射度資訊和透過所述光檢測部獲得的反射度資訊進行比較,以測量測量對象的厚度。 The object is achieved by a thickness measuring device according to the invention, the thickness measuring device using a Reflectometer, comprising: a light source for emitting light; and a filter portion for receiving the light source Light rays are selectively modulated by the plurality of frequencies different from each other to be modulated into light having an intensity distribution, and the wavelength width of the light having the intensity distribution can be adjusted; the optical system is directed to the measuring object side Irradiating light modulated by the filter portion, and light reflected from the measuring object side is incident into the optical system; and a light detecting portion that receives light passing through the optical system to obtain reflectance information; a control unit that sets a plurality of frequencies transmittable to the filter portion to adjust a wavelength width of light modulated by the filter, and is modeled and transmitted by a mathematical expression The saved theoretical reflectance information is compared with the reflectance information obtained by the light detecting portion to measure the thickness of the measuring object.
在此,所述濾光器部優選為沿從光源發出的光的進行方向彼此隔開配置的多個聲光調制濾波器(Acousto-OpticalTunableFilter)。 Here, it is preferable that the filter portion is a plurality of Acousto-Optical Tunable Filters arranged to be spaced apart from each other in the direction in which light emitted from the light source is performed.
在此,所述濾光器部優選在保持分別透射已設定的所述多個頻率的光的波長的狀態下結合所述光,從而將從所述濾光器部透射的光調制為具有強度分佈的光。 Here, the filter portion preferably combines the light while maintaining a wavelength of light that transmits the plurality of frequencies that have been set, respectively, thereby modulating light transmitted from the filter portion to have intensity Distributed light.
在此,所述光學系統優選包括:第一分光器,用於反射透過所述濾光器部而被調制的光,或者使從測量對象反射的光透射;和透鏡部,設置在所述第一分光器與測量對象之間,用於使從所述第一分光器反射的光向測量對象側匯聚,所述厚度測量裝置進一步包括:照相機部,用於從所述光學系統接收從所述測量對象反射的光,以獲得測量對象的圖像資訊。 Here, the optical system preferably includes: a first beam splitter for reflecting light modulated by the filter portion or transmitting light reflected from the measuring object; and a lens portion disposed at the Between a spectroscope and a measuring object, for condensing light reflected from the first beam splitter toward a measuring object side, the thickness measuring device further comprising: a camera portion for receiving from the optical system The light reflected by the object is measured to obtain image information of the measurement object.
在此,所述控制部優選包括:頻率設定模組,用於設定可透射所述濾光器部的多個頻率;保存模組,用於保存透過數學式而被模化並與每個厚度對應的多個理論反射度資訊;和比較判斷模組,對由所述光檢測部測量的反射度資訊和在所述保存模組中保存的理論反射度資訊進行比較,以判斷測量對象的厚度。 Here, the control unit preferably includes: a frequency setting module configured to set a plurality of frequencies transmittable to the filter portion; and a saving module configured to save and be modeled by each of the thicknesses Corresponding plurality of theoretical reflectance information; and a comparison judging module comparing the reflectance information measured by the photodetecting portion with the theoretical reflectance information held in the save module to determine the thickness of the measuring object .
在此,所述控制部優選進一步包括:轉換模組,用 於對應透過所述頻率設定模組而被調節的頻率,轉換由所述光檢測部測量的反射度資訊及在所述保存模組中保存的理論反射度資訊中的至少一種,所述比較判斷模組利用所述反射度資訊及所述理論反射度資訊中的至少一種已被轉換的資訊,來測量測量對象的厚度。 Here, the control unit preferably further includes: a conversion module, Converting at least one of reflectance information measured by the light detecting unit and theoretical reflectance information stored in the save module to a frequency adjusted by the frequency setting module, the comparison judgment The module measures the thickness of the measurement object by using at least one of the reflectivity information and the theoretical reflectance information that has been converted.
另外,所述目的透過本發明的厚度測量方法而達到,該厚度測量方法的特徵在於,包括:調制步驟,設定可透射用於調制從光源發出的光的濾光器部的多個頻率,以調節透過所述濾光器部而被調制的光的強度分佈的波長寬度;理論反射度資訊的設置步驟,透過數學式設置對應每個厚度的理論反射度資訊;反射度資訊的獲取步驟,向測量對象側照射透過所述濾光器部而被調制的光,以獲得測量對象的反射度資訊;匹配步驟,對所述理論反射度資訊與所述反射度資訊進行比較,以在所述理論反射度資訊中選擇與所述反射度資訊最相似的理論反射度資訊;和厚度確定步驟,將與在所述匹配步驟中選擇的理論反射度資訊對應的厚度確定為測量對象的厚度。 Further, the object is achieved by the thickness measuring method of the present invention, characterized in that it comprises a modulating step of setting a plurality of frequencies transmissive for a filter portion for modulating light emitted from a light source, Adjusting the wavelength width of the intensity distribution of the light modulated by the filter portion; the step of setting the theoretical reflectance information, setting the theoretical reflectance information corresponding to each thickness through a mathematical formula; the step of acquiring the reflectance information, The measuring object side illuminates the light modulated by the filter portion to obtain the reflectance information of the measuring object; the matching step compares the theoretical reflectance information with the reflectance information to The theoretical reflectance information most similar to the reflectance information is selected in the reflectance information; and the thickness determining step determines the thickness corresponding to the theoretical reflectance information selected in the matching step as the thickness of the measurement object.
在此,所述理論反射度資訊的設置步驟優選包括:轉換步驟,考慮透過所述調制步驟而被設定的多個頻率,對透過所述理論反射度設置步驟而被設置的理論反射度資訊進行轉換。 Here, the step of setting the theoretical reflectance information preferably includes a converting step of considering the theoretical reflectance information set by the theoretical reflectance setting step in consideration of a plurality of frequencies set by the modulating step. Conversion.
在此,優選當在所述匹配步驟中無法選擇與所述反 射度資訊最為相似的理論反射度資訊時,重新進行所述調制步驟。 Here, it is preferred that when the matching step is not possible to select and the opposite The modulation step is re-executed when the radiance information is most similar to the theoretical reflectance information.
根據本發明,提供一種厚度測量裝置及利用該裝置的厚度測量方法,該厚度測量裝置及利用該裝置的厚度測量方法能夠易於調節向測量對象側射入的具有強度分佈的光的波長寬度。 According to the present invention, there is provided a thickness measuring device and a thickness measuring method using the same, which thickness measuring device and thickness measuring method using the same can easily adjust the wavelength width of light having an intensity distribution incident on the measuring object side.
此外,對反射度分佈曲線的反射度數值較小的測量對象的邊緣區域也能進行精確的厚度測量。 In addition, an accurate thickness measurement can be performed on the edge region of the measurement object having a small reflectance value of the reflectance distribution curve.
此外,即使測量對象由形成過高的反射度分佈曲線的反射度數值的材料形成,也能進行精確的厚度測量。 Further, even if the measurement object is formed of a material that forms a reflectance value of an excessively high reflectance profile, accurate thickness measurement can be performed.
S‧‧‧測量對象 S‧‧‧Measurement object
100‧‧‧厚度測量裝置 100‧‧‧ thickness measuring device
110‧‧‧光源 110‧‧‧Light source
120‧‧‧濾光器部 120‧‧‧Filter Department
121‧‧‧光波發生部 121‧‧‧Lightwave Generation Department
121a‧‧‧第一光波發生部 121a‧‧‧First Lightwave Generation Department
121b‧‧‧第二光波發生部 121b‧‧‧Second light wave generation department
121c‧‧‧第三光波發生部 121c‧‧‧ Third Lightwave Generation Department
130‧‧‧光學系統 130‧‧‧Optical system
131‧‧‧分光器 131‧‧‧ spectroscopy
132‧‧‧透鏡部 132‧‧‧Lens Department
133‧‧‧半透射鏡 133‧‧‧Semi-transmission mirror
132b‧‧‧第二透鏡部 132b‧‧‧second lens section
140‧‧‧光檢測部 140‧‧‧Light Inspection Department
150‧‧‧照相機部 150‧‧‧ camera department
160‧‧‧控制部 160‧‧‧Control Department
161‧‧‧頻率設定模組 161‧‧‧frequency setting module
162‧‧‧保存模組 162‧‧‧Save module
163‧‧‧轉換模組 163‧‧‧Transition module
164‧‧‧比較判斷模組 164‧‧‧Comparative judgment module
S100‧‧‧厚度測量方法 S100‧‧‧ thickness measurement method
S110‧‧‧調制步驟 S110‧‧‧Modulation step
S120‧‧‧理論反射度資訊的設置步驟 S120‧‧‧Setting steps for theoretical reflectance information
S124‧‧‧模化步驟 S124‧‧‧Molding steps
S125‧‧‧轉換步驟 S125‧‧‧ conversion steps
S130‧‧‧反射度資訊的獲取步驟 S130‧‧‧Steps for obtaining reflectance information
S140‧‧‧匹配步驟 S140‧‧‧ Matching steps
S150‧‧‧厚度確定步驟 S150‧‧‧ thickness determination step
S’‧‧‧透明薄膜 S’‧‧·transparent film
1‧‧‧厚度測量裝置 1‧‧‧ thickness measuring device
10‧‧‧光源 10‧‧‧Light source
21‧‧‧透鏡 21‧‧‧ lens
22‧‧‧透鏡 22‧‧‧ lens
30‧‧‧分光器 30‧‧‧Distributor
31‧‧‧物鏡 31‧‧‧ Objective lens
32‧‧‧物鏡 32‧‧‧ Objective lens
40‧‧‧光譜儀 40‧‧‧ Spectrometer
50‧‧‧照相機 50‧‧‧ camera
第一圖係習用之利用反射光度計的厚度測量裝置示意圖;第二圖係本發明的厚度測量裝置的概念示意圖;第三A圖至第三B圖係本發明之濾光器部操作示意圖;第四圖係本發明之控制部結構的示意圖;第五圖係本發明之厚度測量方法流程圖;第六A圖與第六B圖係第五圖的厚度測量方法中相對於波長調制步驟前後的光強度圖表;第七圖係第五圖的厚度測量方法中基於調制步驟前後的光所獲得的反射度資訊圖表;以及 第八A圖至第八C圖係第五圖所示之厚度測量方法中的轉換步驟圖表。 The first figure is a schematic diagram of a thickness measuring device using a reflection photometer; the second drawing is a conceptual diagram of the thickness measuring device of the present invention; and the third A to the third B are schematic views of the operation of the optical filter portion of the present invention; The fourth drawing is a schematic diagram of the structure of the control portion of the present invention; the fifth drawing is a flow chart of the thickness measuring method of the present invention; the sixth and second B drawings are the thickness measuring methods of the fifth figure before and after the wavelength modulation step a light intensity chart; the seventh figure is a reflectance information chart obtained based on light before and after the modulation step in the thickness measurement method of the fifth figure; The eighth to eighth C diagrams are diagrams of the conversion steps in the thickness measurement method shown in the fifth diagram.
為了能夠更清楚地描述本發明所提出之一種厚度測量裝置及其測量方法,以下將配合圖式,詳盡說明本發明之較佳實施例。 In order to more clearly describe a thickness measuring device and a measuring method thereof according to the present invention, a preferred embodiment of the present invention will be described in detail below with reference to the drawings.
請參閱第二圖,係本發明的厚度測量裝置的概念示意圖;如第二圖所示,於本發明實施例之中的厚度測量裝置100,在光線射入測量對象S之前係將光線調制為具有強度分佈的光,並且調節具有強度分佈的光的波長寬度,從而能夠提高從測量對象S反射之後測量的反射度資訊,並且,本發明之厚度測量裝置100係包括有:光源110、濾光器部120、光學系統130、光檢測部140、照相機部150及控制部160。 Referring to the second figure, a conceptual diagram of the thickness measuring device of the present invention; as shown in the second figure, the thickness measuring device 100 in the embodiment of the present invention modulates light into light before it is incident on the measuring object S. The light having the intensity distribution and adjusting the wavelength width of the light having the intensity distribution, so that the reflectance information measured after the reflection from the measuring object S can be improved, and the thickness measuring device 100 of the present invention includes the light source 110 and the filter The unit 120, the optical system 130, the light detecting unit 140, the camera unit 150, and the control unit 160.
其中,所述光源110用於發出光線,於本實施例之中係設置為發出白光,但並不局限於此。此外,於本實施例之中,該光源110係為一鹵素燈,但並不局限於此,可使用多種源頭的光源。 The light source 110 is used to emit light, and is set to emit white light in the embodiment, but is not limited thereto. In addition, in the embodiment, the light source 110 is a halogen lamp, but is not limited thereto, and a plurality of source light sources can be used.
請同時參閱第三A圖與第三B圖,係本發明之濾光器部操作示意圖,於第三A圖中係示意地表示設置有具有不同頻率的三個光波發生部的濾光器部,而於第三B圖中 係示意地表示設置有具有不同頻率的五個光波發生部的濾光器部。 Please refer to the third A diagram and the third B diagram at the same time, which is a schematic diagram of the operation of the optical filter portion of the present invention. In the third A diagram, the filter portion provided with three light wave generating portions having different frequencies is schematically shown. And in the third B picture The filter portion provided with five light wave generating portions having different frequencies is schematically shown.
如第三A圖與第三B圖所示,所述濾光器部120接收從光源110發出的光線,並且相對於已設定的多個頻率選擇性地進行透射,從而將光線調制為具有強度分佈的光,並且調節具有強度分佈的光的波長寬度。此外,在此為了便於近一步地說明,係以第三A圖所示之濾光器部120為基準以進行說明。 As shown in the third A diagram and the third B diagram, the filter portion 120 receives the light emitted from the light source 110 and selectively transmits the plurality of frequencies with respect to the set frequency, thereby modulating the light to have intensity. The light is distributed and the wavelength width of the light having the intensity distribution is adjusted. In addition, here, in order to facilitate the further description, the filter unit 120 shown in FIG.
於本實施例之中,濾光器部120透過沿與光線的進行方向交叉的方向發出特定頻率的光波的光波發生部121,將光線調制為具有微細的波長寬度的光。在此,沿著光線的進行方向配置有多個光波發生部121,且各光波發生部121被設置為產生不同頻率的光波。 In the present embodiment, the filter unit 120 transmits the light wave generating unit 121 that emits light of a specific frequency in a direction intersecting the direction in which the light beams, and modulates the light into light having a fine wavelength width. Here, a plurality of light wave generating portions 121 are arranged along the direction in which light is emitted, and each of the light wave generating portions 121 is provided to generate light waves of different frequencies.
此外,於本實施例之中,光波發生部121沿著光線的進行方向而分別設置有產生具有120MHz、130MHz、140MHz的頻率的光波的第一光波發生部121a、第二光波發生部121b及第三光波發生部121c,但並不局限於此,為了拉大或縮小被調制的光的波長寬度,可增加或減小各光波發生部121的頻率差距。 Further, in the present embodiment, the light wave generating unit 121 is provided with a first light wave generating unit 121a, a second light wave generating unit 121b, and a first light wave generating unit having light waves having frequencies of 120 MHz, 130 MHz, and 140 MHz, respectively. The three-light generating unit 121c is not limited thereto, and the frequency difference between the respective light wave generating units 121 may be increased or decreased in order to increase or decrease the wavelength width of the modulated light.
另外,從光源110發出的光線透過各光波發生部121a、121b、121c而被調制為具有特定頻率且具有微細的波長寬度的光;在此,光線透過光波發生部121a、121b、 121c在保存各個特定頻率的狀態下結合,並被調制為具有強度分佈的光。 Further, the light emitted from the light source 110 is modulated by the respective light wave generating portions 121a, 121b, and 121c to have light having a specific frequency and having a fine wavelength width; here, the light is transmitted through the light wave generating portions 121a and 121b, 121c is combined in a state in which each specific frequency is saved, and is modulated into light having an intensity distribution.
再次說明如下:若將通過各光波發生部121a、121b、121c的光進行結合,則具有強度分佈,但光線並不是在強度分佈的範圍內連續地連接,而是只有具有各特定頻率的光線斷續地連接;是以,在調制光時,具有強度分佈的同時能夠防止產生雜訊。 Again, the light intensity distribution is obtained by combining the light passing through the respective light wave generating portions 121a, 121b, and 121c. However, the light is not continuously connected within the range of the intensity distribution, but only the light having the specific frequency is broken. Continuous connection; that is, when modulating light, it has an intensity distribution and can prevent noise.
此外,優選地透過各光波發生部121a、121b、121c調節光的強度,以使透過濾光器部120被調制的光線具有使用者所希望的強度分佈。 Further, it is preferable that the intensity of the light is adjusted by the respective light wave generating portions 121a, 121b, and 121c so that the light transmitted through the filter portion 120 has a desired intensity distribution by the user.
即在本實施例之中,透過第二光波發生部121b而被調制的光被控制為具有最強的強度,透過第一光波發生部121a及第三光波發生部121c而被調制的光被控制為具有幾乎相同的強度。 In other words, in the present embodiment, the light modulated by the second light wave generating unit 121b is controlled to have the strongest intensity, and the light modulated by the first light wave generating unit 121a and the third light wave generating unit 121c is controlled to be Has almost the same strength.
並且,在實施例之中,係由沿著光線的進行方向彼此隔開的多個聲光調制濾波器(Acousto-OpticalTunableFilter)來設置濾光器部120,但並不局限於此。 Further, in the embodiment, the filter portion 120 is provided by a plurality of Acousto-Optical Tunable Filters which are spaced apart from each other in the direction in which the light rays are conducted, but the present invention is not limited thereto.
所述光學系統130係用於接收透過所述濾光器部120而被調制的光,並使其向測量對象S側射入,而且從測量對象S反射的光射入所述光學系統130中,所述光學系統130包括分光器(Beamsplitter)131、透鏡部132及半透射 鏡133。 The optical system 130 is configured to receive light modulated by the filter portion 120 and to inject it toward the measurement object S side, and the light reflected from the measurement object S is incident on the optical system 130. The optical system 130 includes a beam splitter 131, a lens portion 132, and a semi-transmission Mirror 133.
所述分光器131用於接收透過濾光器部120而被調制的光,並使所述光向測量對象S側進行反射,或者使從測量對象S反射的光透射。此外,所述透鏡部132用於使從分光器131反射的光向測量對象S側進行匯聚,可由物鏡設置,但並不局限於此。 The spectroscope 131 is configured to receive the light modulated by the filter unit 120, and to reflect the light toward the measurement object S side or to transmit the light reflected from the measurement object S. Further, the lens portion 132 is for collecting the light reflected from the spectroscope 131 toward the measurement target S side, and may be provided by the objective lens, but is not limited thereto.
所述半透射鏡133用於使從測量對象S反射的部分光進行反射或透射,從而向將在後面描述的光檢測部140側或照相機部150側引導進行方向。另外,在分光器131和半透射鏡133之間可設置有用於使從測量對象反射的光進行匯聚的第二透鏡部132b,但並不局限於此。進一步地,光學系統130的結構為公知結構,因此並不局限於所述的結構,當然可採用包括或省略其他結構的光學系統130。 The semi-transmissive mirror 133 is for reflecting or transmitting a part of the light reflected from the measuring object S, thereby guiding the direction to the light detecting portion 140 side or the camera portion 150 side which will be described later. Further, the second lens portion 132b for condensing the light reflected from the measurement object may be provided between the spectroscope 131 and the semi-transmissive mirror 133, but is not limited thereto. Further, the structure of the optical system 130 is a well-known structure, and thus is not limited to the structure described, and of course, the optical system 130 including or omitting other structures may be employed.
所述光檢測部140用於接收從測量對象S反射並通過光學系統130的光,並進行光譜分析而獲得反射度資訊。此外,於本實施例之中,所謂的反射度資訊意味著表示相對於光線的強度和波長的反射度變化的反射度分佈曲線,但並不局限於此。 The light detecting unit 140 is configured to receive light reflected from the measuring object S and passing through the optical system 130, and perform spectral analysis to obtain reflectance information. Further, in the present embodiment, the so-called reflectance information means a reflectance profile indicating a change in reflectance with respect to the intensity of light and the wavelength, but is not limited thereto.
除此之外,所述照相機部150用於接收從測量對象S反射並通過光學系統130的光,並將反射度資訊成像為圖像。在本實施例之中,照相機部150可利用具有對所要測量的區域適合數量的像素的CCD照相機 (Chargecoulpeddevice),但並不局限於此。 In addition to this, the camera section 150 is for receiving light reflected from the measuring object S and passing through the optical system 130, and imaging the reflectance information as an image. In the present embodiment, the camera unit 150 can utilize a CCD camera having a suitable number of pixels for the area to be measured. (Chargecoulpeddevice), but not limited to this.
請參閱第四圖,係本發明之控制部結構的示意圖;如第四圖所示,所述控制部160用於設定可透射濾光器部120的多個頻率並調節透過濾光器部120而被調制的光的波長寬度,並且對透過數學式被模化並被保存的理論反射度資訊和透過光檢測部140獲得的反射度資訊進行比較,以測量測量對象S的厚度,包括頻率設定模組161、保存模組162、轉換模組163及比較判斷模組164。 Please refer to the fourth figure, which is a schematic diagram of the structure of the control unit of the present invention; as shown in the fourth figure, the control unit 160 is configured to set a plurality of frequencies of the transmissive filter unit 120 and adjust the transmissive filter unit 120. And the wavelength width of the modulated light, and the theoretical reflectance information that is modeled and saved by the mathematical expression is compared with the reflectance information obtained by the transmitted light detecting portion 140 to measure the thickness of the measuring object S, including the frequency setting. The module 161, the save module 162, the conversion module 163, and the comparison determination module 164.
所述頻率設定模組161係用於設定可透射濾光器部120的多個頻率,根據本實施例,所述頻率設定模組161用於設定從各光波發生部121發出的光波的特定頻率。 The frequency setting module 161 is configured to set a plurality of frequencies of the transmissive filter unit 120. According to the embodiment, the frequency setting module 161 is configured to set a specific frequency of the light wave emitted from each of the light wave generating units 121. .
於此,可透過控制從各光波發生部121發出的光波的特定頻率之間的差或者所產生的光波的數量等方式,來改變透過濾光器部120而被調制的光的強度分佈的波長寬度。 Here, the wavelength of the intensity distribution of the light modulated by the filter unit 120 can be changed by controlling the difference between the specific frequencies of the light waves emitted from the respective light wave generating units 121 or the number of generated light waves. width.
此外,當改變透過濾光器部120而被調制的光的強度分佈的波長寬度時,之後從光檢測部140獲得的反射度資訊的反射度數值將被改變,並且可透過控制頻率設定模組161使反射度資訊的反射度值具有最適於與理論反射度資訊進行比較的值。 Further, when the wavelength width of the intensity distribution of the light modulated by the filter unit 120 is changed, the reflectance value of the reflectance information obtained from the light detecting portion 140 thereafter is changed, and the control frequency setting module is transmitted through 161 causes the reflectance value of the reflectance information to have a value that is most suitable for comparison with theoretical reflectance information.
所述保存模組162用於透過數學式保存與各厚度對應的多個理論反射度資訊,於此,對理論反射度資訊進行
模化的數學式如下:
在此,R ρ (d,λ)為與入射面平行的P波的總反射系數,r ρ 12為空氣層與測量對象的邊介面上的P波的菲涅耳(Fresnel)反射系數,r ρ 23為測量對象與支撐測量對象的支撐層的邊介面上的P波的菲涅耳反射系數,β為在光線經過測量對象時產生的相移量。 Here, R ρ (d, λ ) is the total reflection coefficient of the P wave parallel to the incident surface, and r ρ 12 is the Fresnel reflection coefficient of the P wave of the air layer and the side interface of the measurement object, r ρ 23 is the Fresnel reflection coefficient of the P wave on the side interface of the support object and the support layer supporting the measurement object, and β is the phase shift amount generated when the light passes through the measurement object.
在此,R δ (d,λ)為與入射面垂直的S波的總反射系數,r δ 12為空氣層12與測量對象的邊介面上的S波的菲涅耳(Fresnel)反射系數,r δ 23為測量對象與支撐層的邊介面上的S波的菲涅耳反射系數。 Here, R δ (d, λ ) is the total reflection coefficient of the S wave perpendicular to the incident surface, and r δ 12 is the Fresnel reflection coefficient of the S wave of the air layer 12 and the side interface of the measurement object, r δ 23 is the Fresnel reflection coefficient of the S wave on the side interface of the measurement object and the support layer.
在此,d為測量對象的厚度,為測量對象的複折射率,φ2為在測量對象上的折射角。 Here, d is the thickness of the measurement object, To measure the complex refractive index of the object, φ 2 is the angle of refraction on the object to be measured.
在此,R1為透過數學模化生成的理論反射度,Ii為 所射入的光線的強度(intensity),Ir為所反射的光線的強度。 Here, R 1 is the theoretical reflectance generated by mathematical modeling, I i is the intensity of the incident light, and Ir is the intensity of the reflected light.
其中,係可透過將數學式1至數學式3代入數學式4而獲得對規定厚度的理論反射度,並且可透過改變波長並將反射度分佈表示為圖表而生成理論反射度分佈曲線。 Among them, the theoretical reflectance for a predetermined thickness can be obtained by substituting Mathematical Formula 1 to Mathematical Formula 3 into Mathematical Formula 4, and the theoretical reflectance distribution curve can be generated by changing the wavelength and expressing the reflectance distribution as a graph.
此外,可透過將由所述數學式4生成的理論反射度分佈曲線乘以從測量對象反射的光的強度分佈,來求得理論積分反射度分佈曲線,其透過下面的數學式計算:
在此,R2為透過數學模化而生成的理論積分反射度,λ *為特定波長,Ii為輸入強度,Ir為輸出強度,I0為在特定波長下的強度的最大值,I0F λ 為特定波長的強度分佈曲線,R1為理論反射度分佈曲線。 Here, R 2 is a theoretical integrated reflectance generated by mathematical modeling, λ * is a specific wavelength, I i is an input intensity, Ir is an output intensity, and I 0 is a maximum value of intensity at a specific wavelength, I 0 F λ is the intensity distribution curve of a specific wavelength, and R 1 is a theoretical reflectance distribution curve.
即,保存模組162獲得對應每個厚度的反射度分佈曲線後,透過該反射度分佈曲線獲得對應每個厚度的積分反射度曲線並進行保存。 That is, after the save module 162 obtains the reflectance distribution curve corresponding to each thickness, the integrated reflectance curve corresponding to each thickness is obtained through the reflectance distribution curve and saved.
另外,保存模組162在透過頻率設定模組161而光的強度分佈被改變時,可利用改變的強度分佈值重新獲得理論反射度資訊並將其予以保存,但並不局限於此,可透過將在後面描述的轉換模組163來轉換已保存的理論反射 度資訊。 In addition, when the intensity distribution of the light is changed by the transmission frequency setting module 161, the storage module 162 can regain the theoretical reflectance information and save it by using the changed intensity distribution value, but it is not limited thereto. The conversion module 163, which will be described later, converts the saved theoretical reflection Information.
所述轉換模組163用於在透過頻率設定模組161進行頻率調節時,改變從光檢測部140測量的反射度資訊或在保存模組162中保存的理論反射度資訊中的任一種資訊。 The conversion module 163 is configured to change any one of the reflectance information measured by the light detecting unit 140 or the theoretical reflectance information stored in the save module 162 when the frequency adjustment module 161 performs frequency adjustment.
如上所述,在透過數學模化而獲得理論反射度資訊時,將所射入光的強度假設為最初設定值而進行計算。 As described above, when the theoretical reflectance information is obtained by mathematical modeling, the intensity of the incident light is assumed to be the initial set value and calculated.
在此,在透過頻率設定模組161而光的強度分佈被改變時,所射入的光的強度也會改變,因此可能會產生反射度資訊與理論反射度資訊不能在相同的條件下進行比較的問題,因此有必要改變所述的兩個條件中的任一個條件,從而使這些條件相一致。 Here, when the intensity distribution of the light is changed by the transmission frequency setting module 161, the intensity of the incident light also changes, so that the reflectance information and the theoretical reflectance information may not be compared under the same conditions. The problem is therefore necessary to change any of the two conditions described so that these conditions are consistent.
在本實施例之中,採用了轉換已被保存在保存模組162中的理論反射度資訊的方法,轉換的積分反射度分佈曲線由以下數學式確定:
在此,F λ **(λ)表示相對於最初設定值的光的強度的變化量,其他數學式與以上說明的內容相同。 Here, F λ **( λ ) represents the amount of change in the intensity of light with respect to the initial set value, and other mathematical expressions are the same as those described above.
另外,如本發明實施例所示,可使用轉換理論反射度資訊並在與反射度資訊相同的條件下進行比較的方法, 但也可將反射度資訊轉換為其條件與理論反射度資訊的條件相同。 In addition, as shown in the embodiment of the present invention, a method of converting theoretical reflectance information and performing comparison under the same conditions as the reflectance information may be used. However, the reflectance information can also be converted to the same conditions as the theoretical reflectance information.
所述比較判斷模組164用於對透過光檢測部140而獲得的反射度資訊和透過保存模組162及轉換模組163而被轉換的理論反射度資訊進行比較而確定測量對象的厚度。 The comparison determination module 164 is configured to compare the reflectance information obtained by the transmitted light detecting unit 140 with the theoretical reflectance information converted by the storage module 162 and the conversion module 163 to determine the thickness of the measurement target.
即,對透過光檢測部140而獲得的反射度資訊與理論反射度資訊進行比較,以檢索最相似的理論反射度資訊,並且在檢索最相似的理論反射度資訊時將與最相似的理論反射度對應的厚度值確定為測量對象的厚度。 That is, the reflectance information obtained by the transmitted light detecting portion 140 is compared with the theoretical reflectance information to retrieve the most similar theoretical reflectance information, and the most similar theoretical reflection is obtained when the most similar theoretical reflectance information is retrieved. The thickness value corresponding to the degree is determined as the thickness of the measurement object.
接著,將針對上述厚度測量裝置及利用該裝置的厚度測量方法的實施例之運作方式進行說明。 Next, an operation mode of the embodiment of the above-described thickness measuring device and the thickness measuring method using the same will be described.
請參閱第五圖,係本發明之厚度測量方法流程圖;如第五圖所示,本實施例的厚度測量方法係針對反射度資訊的反射度進行調節,以使其具有適合與理論反射度資訊進行比較的反射度,從而能夠提高厚度測量的精確性,其中係包括:調制步驟S110、理論反射度資訊的設置步驟S120、轉換步驟S125、反射度資訊的獲取步驟S130、匹配步驟S140及厚度確定步驟S150。 Please refer to the fifth figure, which is a flow chart of the thickness measurement method of the present invention; as shown in the fifth figure, the thickness measurement method of the embodiment adjusts the reflectance of the reflectance information so as to have a suitable and theoretical reflectance. The information is compared to the reflectance, so that the accuracy of the thickness measurement can be improved, including: a modulation step S110, a theoretical reflectance information setting step S120, a conversion step S125, a reflectance information acquisition step S130, a matching step S140, and a thickness. The step S150 is determined.
所述調制步驟S110為設定可透射濾光器部120的多個頻率,以使從光源110發出的光在透過濾光器部120而被調製時具有強度分佈並且調節其波長寬度的步驟。 The modulating step S110 is a step of setting a plurality of frequencies of the transmissive filter portion 120 such that the light emitted from the light source 110 has an intensity distribution and adjusts a wavelength width thereof when modulated by the filter unit 120.
在此,波長寬度由從光波發生部121發出的光波數量及頻率值確定,並且,與在後述的反射度資訊的獲取步驟S140中獲得的反射度資訊的反射度數值有關。 Here, the wavelength width is determined by the number of light waves and the frequency value emitted from the light wave generating portion 121, and is related to the reflectance value of the reflectance information obtained in the obtaining step S140 of the reflectance information to be described later.
第六A-B圖為第五圖的厚度測量方法中相對於波長調制步驟前後的光強度圖表,第七圖為第五圖的厚度測量方法中基於調制步驟前後的光所獲得的反射度資訊圖表。由第六A-B圖與第七圖可知,隨著執行調制步驟S110,光的強度及在反射度資訊中的反射度數值將隨之改變。 The sixth A-B graph is a graph of the light intensity before and after the wavelength modulation step in the thickness measurement method of the fifth graph, and the seventh graph is the reflectance information graph obtained based on the light before and after the modulation step in the thickness measurement method of the fifth graph. As can be seen from the sixth A-B diagram and the seventh diagram, as the modulation step S110 is performed, the intensity of the light and the reflectance value in the reflectance information will change accordingly.
另外,在本發明的實施例之中,可透過確定在多個光波發生部121中發出光波的光波發生部121數量,即運行的光波發生部121數量,並且,分別確定從運行的光波發生部121發出的光波頻率來進行調制步驟S110,但並不局限於此。 Further, in the embodiment of the present invention, the number of the light wave generating portions 121 that emit light waves in the plurality of light wave generating portions 121, that is, the number of the light wave generating portions 121 that operate, can be determined, and the light wave generating portion from the operation can be separately determined. The light wave frequency emitted by 121 is used to perform the modulation step S110, but is not limited thereto.
在本實施例之中,透過調制步驟S110而使得三個光波發生部121運行,從各光波發生部121a、121b、121c發出的光波分別具有120MHz、130MHz及140MHz的頻率。此外,在本實施例之中,從各光波發生部121發出的光波被設置為越遠離光源110其大小將依次地變大,但並不局限於此,可被配置為其大小依次地變小或者不規則。 In the present embodiment, the three light wave generating units 121 are operated by the modulation step S110, and the light waves emitted from the respective light wave generating units 121a, 121b, and 121c have frequencies of 120 MHz, 130 MHz, and 140 MHz, respectively. Further, in the present embodiment, the light waves emitted from the respective light wave generating portions 121 are set to be larger in size as they are farther away from the light source 110. However, the present invention is not limited thereto, and may be configured such that the size thereof becomes smaller in order. Or irregular.
此外,在從各個光波發生部121發出的光波中,最小值和最大值之間的差值越大,則被調製的光的強度分佈越寬,最小值和最大值之間的差值越小,則被調製的光的 強度分佈越窄。另外,根據本實施例所示,從各光波發生部121發出的光波被設置為越遠離光源110,則按10MHz的大小穩定地增加,但並不局限於此。 Further, in the light waves emitted from the respective light wave generating portions 121, the larger the difference between the minimum value and the maximum value, the wider the intensity distribution of the modulated light, and the smaller the difference between the minimum value and the maximum value. Modulated light The narrower the intensity distribution. Further, according to the present embodiment, the light wave emitted from each of the light wave generating portions 121 is set to be stably increased by 10 MHz as it is away from the light source 110, but the present invention is not limited thereto.
所述理論反射度資訊的設置步驟S120為透過數學模化在所述保存模組162中保存理論反射度資訊的步驟,包括模化步驟S124及轉換步驟S125。 The step S120 of the theoretical reflectance information is a step of storing theoretical reflectance information in the save module 162 through mathematical modeling, and includes a modeling step S124 and a converting step S125.
且根據本實施例所示,理論反射度資訊將特定頻率的具有微細的波長寬度的光確定為最初光的強度值,但並不局限於此。並且,在上述說明中所述模化步驟S124被描述為確定理論反射度分佈曲線及理論積分反射度分佈曲線的步驟,因此在此省略詳細的說明。 Further, according to the present embodiment, the theoretical reflectance information determines the light having a fine wavelength width of a specific frequency as the intensity value of the initial light, but is not limited thereto. Further, in the above description, the modulating step S124 is described as a step of determining the theoretical reflectance distribution curve and the theoretical integrated reflectance distribution curve, and thus detailed description is omitted here.
第八A圖至第八C圖係第五圖所示之厚度測量方法中的轉換步驟圖表;其中,第八A圖係表示透過調制步驟,光的強度被改變的示意圖,第八B圖係表示隨著光強度的變化,在相同的厚度下反射度資訊和理論反射度資訊變得彼此不同的示意圖,第八C圖係表示透過轉換步驟,在相同的厚度下反射度資訊和理論反射度資訊變得一致的示意圖。 8A to 8C are diagrams of conversion steps in the thickness measurement method shown in FIG. 5; wherein, the eighth diagram A shows a schematic diagram in which the intensity of light is changed through the modulation step, and the eighth B diagram A graph showing that the reflectance information and the theoretical reflectance information become different from each other at the same thickness as the light intensity changes, and the eighth C map shows the reflectance information and the theoretical reflectance at the same thickness through the conversion step. A schematic diagram where the information becomes consistent.
如第八圖所示,所述轉換步驟S125為當透過調制步驟S110光線被調製為具有與在理論反射度資訊的設置步驟S120中設定的最初光的強度值不同的強度值的光線時,轉換理論反射度資訊的步驟。如上所述,理論反射度 資訊以在理論反射度資訊的設置步驟S120中設定的光強度值為基準獲得理論積分反射度分佈曲線。 As shown in the eighth figure, the converting step S125 is a conversion when the light is modulated by the modulating step S110 to have a light value different from the intensity value of the initial light set in the setting step S120 of the theoretical reflectance information. The step of theoretical reflectivity information. As stated above, theoretical reflectivity The information obtains a theoretical integrated reflectance distribution curve based on the light intensity value set in the setting step S120 of the theoretical reflectance information.
在此,若已設定的強度值被改變,則能夠比較理論反射度資訊與反射度資訊的前提條件變得不一致,因此不能期待厚度確定的精確性。因此,係有必要以改變的強度值為基準對理論反射度資訊進行轉換,或者將反射度資訊轉換為最初強度值的過程,在本實施例之中,係以改變的強度值為基準對理論反射度資訊進行轉換。 Here, if the set intensity value is changed, the preconditions for comparing the theoretical reflectance information and the reflectance information become inconsistent, and therefore the accuracy of the thickness determination cannot be expected. Therefore, it is necessary to convert the theoretical reflectance information on the basis of the changed intensity value, or to convert the reflectance information into the initial intensity value. In the present embodiment, the theory is based on the changed intensity value. Reflectance information is converted.
所述反射度資訊的獲取步驟S130為從光檢測部140接收由測量對象S反射的光,以獲取反射度分佈曲線的步驟。而在反射度資訊的獲取步驟S130中透過光檢測部140獲取反射度分佈曲線為公知技術,因此在此省略詳細的說明。 The step S130 of acquiring the reflectance information is a step of receiving the light reflected by the measuring object S from the light detecting unit 140 to acquire a reflectance distribution curve. In the reflectance information acquisition step S130, the transmitted light detecting unit 140 acquires the reflectance distribution curve as a well-known technique, and thus detailed description thereof will be omitted.
所述匹配步驟S140為將透過理論反射度資訊的設置步驟S120獲得的理論反射度資訊和透過反射度資訊的獲取步驟S130獲得的反射度資訊進行比較,以檢索與反射度資訊最相似的理論反射度資訊的步驟。 The matching step S140 compares the theoretical reflectance information obtained through the setting step S120 of the theoretical reflectance information with the reflectance information obtained by the obtaining step S130 of the reflectance information to retrieve the theoretical reflection most similar to the reflectance information. Steps to information.
對於是否最相似,則透過以下方法進行判斷:求出利用最小自乘法的誤差函數後,將具有最小誤差的理論反射度資訊和反射度資訊判為"最相似";惟,此方法為公知技術,因此在此省略詳細的說明。當然,不僅如上所述那樣透過自乘法,還可透過其他方法來判斷是否為“最相 似”的。 For the most similarity, the judgment is made by the following method: after the error function using the least-square method is obtained, the theoretical reflectance information and the reflectance information with the smallest error are judged as "most similar"; however, this method is a well-known technique. Therefore, a detailed description is omitted here. Of course, not only through the multiplication method as described above, but also through other methods to determine whether it is "the most Like "."
另外,透過光檢測部140測量的反射度資訊的反射度值可能過低或過高,以至在匹配步驟S140中無法進行比較或者難以比較。在此情況下,將重新進行所述的調制步驟S110,此時若測量的反射度資訊的反射度值過低,則在調制步驟S110中重新設定頻率的數值及數量等,以使光的強度分佈的波長寬度變寬;若測量的反射度資訊的反射度值過高,則在調制步驟S110中重新設定頻率的數值及數量等,以使光的強度分佈的波長寬度變窄。 Further, the reflectance value of the reflectance information measured by the light detecting portion 140 may be too low or too high, so that comparison or difficulty in comparison is impossible in the matching step S140. In this case, the modulation step S110 will be performed again. If the reflectance value of the measured reflectance information is too low, the value and the number of the frequency are reset in the modulation step S110 to make the intensity of the light. The wavelength width of the distribution is widened; if the reflectance value of the measured reflectance information is too high, the value and the number of the frequency are reset in the modulation step S110 to narrow the wavelength width of the intensity distribution of the light.
即,透過重新進行調制步驟S110而加工反射度數值,使得在後續的匹配步驟S140中能夠易於比較反射度資訊與理論反射度資訊。 That is, the reflectance value is processed by re-performing the modulation step S110 so that the reflectance information and the theoretical reflectance information can be easily compared in the subsequent matching step S140.
在此,以透過調制步驟S110的重新進行而改變的數值為基礎重新獲得理論反射度資訊後進行保存,之後重新進行匹配步驟S140而檢索與反射度資訊最相似的理論反射度資訊。 Here, the theoretical reflectance information is re-acquired based on the value changed by the re-execution of the modulation step S110, and then saved, and then the matching step S140 is performed again to retrieve the theoretical reflectance information most similar to the reflectance information.
在所述厚度確定步驟S150中,選擇與反射度資訊最相似的理論反射度資訊,並將與所選的理論反射度資訊對應的厚度確定為測量對象的厚度。 In the thickness determining step S150, the theoretical reflectance information most similar to the reflectance information is selected, and the thickness corresponding to the selected theoretical reflectance information is determined as the thickness of the measuring object.
此外,將測量對象S的檢查表面劃分為微米或奈米大小的多個區域,並且對每個區域進行檢查並組合所測量的結果,則能計算包括測量對象S的表面的厚度及三維形 狀等的測量對象S的檢查表面的綜合資訊並且將其可視化。 Further, by dividing the inspection surface of the measuring object S into a plurality of regions of a micrometer or a nanometer size, and examining each region and combining the measured results, the thickness and the three-dimensional shape of the surface including the measuring object S can be calculated. The comprehensive information of the inspection surface of the measuring object S is visualized and visualized.
必須加以強調的是,本發明的權利範圍並不限於上述實施例,在所附的申請專利範圍中記載的範圍內可實現為多種形式的實施例。在不脫離申請專利範圍所要求保護的本發明精神的範圍內,本發明所屬技術領域中具有一般知識的人均能變形的各種範圍也應屬於本發明的保護範圍。 It is to be understood that the scope of the invention is not limited to the embodiments described above, but may be embodied in various forms within the scope of the appended claims. The various ranges in which the person having ordinary knowledge in the art to which the present invention pertains can be modified are also within the scope of the present invention without departing from the spirit and scope of the invention as claimed.
S‧‧‧測量對象 S‧‧‧Measurement object
100‧‧‧厚度測量裝置 100‧‧‧ thickness measuring device
110‧‧‧光源 110‧‧‧Light source
120‧‧‧濾光器部 120‧‧‧Filter Department
130‧‧‧光學系統 130‧‧‧Optical system
140‧‧‧光檢測部 140‧‧‧Light Inspection Department
150‧‧‧照相機部 150‧‧‧ camera department
160‧‧‧控制部 160‧‧‧Control Department
S100‧‧‧厚度測量方法 S100‧‧‧ thickness measurement method
S110‧‧‧調制步驟 S110‧‧‧Modulation step
S120‧‧‧理論反射度資訊的設置步驟 S120‧‧‧Setting steps for theoretical reflectance information
S130‧‧‧反射度資訊的獲取步驟 S130‧‧‧Steps for obtaining reflectance information
S140‧‧‧匹配步驟 S140‧‧‧ Matching steps
S150‧‧‧厚度確定步驟 S150‧‧‧ thickness determination step
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US10163669B2 (en) * | 2016-01-29 | 2018-12-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Metrology system and measurement method using the same |
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US10816464B2 (en) | 2019-01-23 | 2020-10-27 | Applied Materials, Inc. | Imaging reflectometer |
US11150078B1 (en) | 2020-03-26 | 2021-10-19 | Applied Materials, Inc. | High sensitivity image-based reflectometry |
US11156566B2 (en) | 2020-03-26 | 2021-10-26 | Applied Materials, Inc. | High sensitivity image-based reflectometry |
US11417010B2 (en) | 2020-05-19 | 2022-08-16 | Applied Materials, Inc. | Image based metrology of surface deformations |
CN111750786B (en) * | 2020-07-06 | 2022-03-01 | 上海新昇半导体科技有限公司 | Thickness measuring equipment, polishing system and polishing material management method |
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CN102589452B (en) * | 2012-01-17 | 2014-09-24 | 华南师范大学 | Method and device for measuring thickness and refractive index of thin film |
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