TWI528017B - 厚度測量裝置及其測量方法 - Google Patents
厚度測量裝置及其測量方法 Download PDFInfo
- Publication number
- TWI528017B TWI528017B TW103132765A TW103132765A TWI528017B TW I528017 B TWI528017 B TW I528017B TW 103132765 A TW103132765 A TW 103132765A TW 103132765 A TW103132765 A TW 103132765A TW I528017 B TWI528017 B TW I528017B
- Authority
- TW
- Taiwan
- Prior art keywords
- light
- reflectance information
- thickness
- information
- theoretical
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02012—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal intensity variation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020130112738A KR101537854B1 (ko) | 2013-09-23 | 2013-09-23 | 두께 측정 장치 및 이를 이용한 두께 측정 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201520510A TW201520510A (zh) | 2015-06-01 |
TWI528017B true TWI528017B (zh) | 2016-04-01 |
Family
ID=52689106
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW103132765A TWI528017B (zh) | 2013-09-23 | 2014-09-23 | 厚度測量裝置及其測量方法 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6181878B2 (ja) |
KR (1) | KR101537854B1 (ja) |
CN (1) | CN105492861B (ja) |
TW (1) | TWI528017B (ja) |
WO (1) | WO2015041506A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111279147A (zh) * | 2017-11-01 | 2020-06-12 | 柯尼卡美能达株式会社 | 膜厚测定方法、膜厚测定系统、光反射膜的制造方法及光反射膜的制造系统 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6218261B2 (ja) * | 2015-10-23 | 2017-10-25 | 株式会社カツラ・オプト・システムズ | 光学素子特性測定装置 |
US10163669B2 (en) | 2016-01-29 | 2018-12-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Metrology system and measurement method using the same |
JP6550101B2 (ja) * | 2017-07-13 | 2019-07-24 | Jfeテクノリサーチ株式会社 | 膜厚測定方法及び膜厚測定装置 |
US10816464B2 (en) * | 2019-01-23 | 2020-10-27 | Applied Materials, Inc. | Imaging reflectometer |
US11150078B1 (en) | 2020-03-26 | 2021-10-19 | Applied Materials, Inc. | High sensitivity image-based reflectometry |
US11156566B2 (en) | 2020-03-26 | 2021-10-26 | Applied Materials, Inc. | High sensitivity image-based reflectometry |
US11417010B2 (en) | 2020-05-19 | 2022-08-16 | Applied Materials, Inc. | Image based metrology of surface deformations |
CN111750786B (zh) * | 2020-07-06 | 2022-03-01 | 上海新昇半导体科技有限公司 | 厚度量测设备、抛光系统及抛光物料管理方法 |
CN112460742B (zh) * | 2020-11-19 | 2021-11-23 | 珠海格力电器股份有限公司 | 传感器的控制方法、装置、传感器、存储介质及处理器 |
CN114502316B (zh) * | 2021-02-26 | 2022-12-27 | 国立大学法人名古屋工业大学 | 激光加工装置、厚度检测方法及厚度检测装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6534774B2 (en) * | 2000-09-08 | 2003-03-18 | Mitsubishi Materials Silicon Corporation | Method and apparatus for evaluating the quality of a semiconductor substrate |
FR2880945B1 (fr) * | 2005-01-14 | 2007-04-06 | Essilor Int | Palpeur optique ainsi que dispositif et procede le mettant en oeuvre. |
KR100947031B1 (ko) * | 2008-04-03 | 2010-03-11 | 한국과학기술원 | 3파장 광원을 이용한 위상물체의 굴절률과 두께 측정장치및 그 방법 |
KR101107507B1 (ko) * | 2009-03-23 | 2012-01-31 | 에스엔유 프리시젼 주식회사 | 반사도분포곡선의 모델링방법 및 이를 이용하는 두께 측정방법, 두께 측정 반사계 |
JP5692988B2 (ja) * | 2009-10-19 | 2015-04-01 | キヤノン株式会社 | 音響波測定装置 |
CN102893137B (zh) * | 2010-03-17 | 2017-01-11 | 曾海山 | 用于癌症检测和定位的快速多光谱成像方法和设备及应用 |
CN102589452B (zh) * | 2012-01-17 | 2014-09-24 | 华南师范大学 | 测量薄膜厚度和折射率的方法及装置 |
-
2013
- 2013-09-23 KR KR1020130112738A patent/KR101537854B1/ko not_active IP Right Cessation
-
2014
- 2014-09-23 CN CN201480046738.XA patent/CN105492861B/zh not_active Expired - Fee Related
- 2014-09-23 JP JP2016542655A patent/JP6181878B2/ja not_active Expired - Fee Related
- 2014-09-23 TW TW103132765A patent/TWI528017B/zh active
- 2014-09-23 WO PCT/KR2014/008852 patent/WO2015041506A1/ko active Application Filing
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111279147A (zh) * | 2017-11-01 | 2020-06-12 | 柯尼卡美能达株式会社 | 膜厚测定方法、膜厚测定系统、光反射膜的制造方法及光反射膜的制造系统 |
Also Published As
Publication number | Publication date |
---|---|
WO2015041506A1 (ko) | 2015-03-26 |
KR101537854B1 (ko) | 2015-07-21 |
TW201520510A (zh) | 2015-06-01 |
JP6181878B2 (ja) | 2017-08-16 |
KR20150033132A (ko) | 2015-04-01 |
CN105492861B (zh) | 2018-09-04 |
JP2016531303A (ja) | 2016-10-06 |
CN105492861A (zh) | 2016-04-13 |
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