TWI527285B - 有機發光顯示元件 - Google Patents
有機發光顯示元件 Download PDFInfo
- Publication number
- TWI527285B TWI527285B TW103125269A TW103125269A TWI527285B TW I527285 B TWI527285 B TW I527285B TW 103125269 A TW103125269 A TW 103125269A TW 103125269 A TW103125269 A TW 103125269A TW I527285 B TWI527285 B TW I527285B
- Authority
- TW
- Taiwan
- Prior art keywords
- deposition
- layer
- thin film
- substrate
- film deposition
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20100039496 | 2010-04-28 | ||
KR1020110031288A KR101801351B1 (ko) | 2010-04-28 | 2011-04-05 | 박막 증착 장치, 이를 이용한 유기 발광 표시 장치의 제조 방법 및 이를 이용하여 제조된 유기 발광 표시 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201442318A TW201442318A (zh) | 2014-11-01 |
TWI527285B true TWI527285B (zh) | 2016-03-21 |
Family
ID=45391457
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW100114360A TWI540777B (zh) | 2010-04-28 | 2011-04-26 | 薄膜沉積裝置以及使用該裝置製造有機發光顯示元件的方法 |
TW103125269A TWI527285B (zh) | 2010-04-28 | 2011-04-26 | 有機發光顯示元件 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW100114360A TWI540777B (zh) | 2010-04-28 | 2011-04-26 | 薄膜沉積裝置以及使用該裝置製造有機發光顯示元件的方法 |
Country Status (5)
Country | Link |
---|---|
JP (2) | JP5628972B2 (de) |
KR (1) | KR101801351B1 (de) |
CN (1) | CN103474447B (de) |
DE (1) | DE102011017648B4 (de) |
TW (2) | TWI540777B (de) |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5328726B2 (ja) | 2009-08-25 | 2013-10-30 | 三星ディスプレイ株式會社 | 薄膜蒸着装置及びこれを利用した有機発光ディスプレイ装置の製造方法 |
JP5677785B2 (ja) | 2009-08-27 | 2015-02-25 | 三星ディスプレイ株式會社Samsung Display Co.,Ltd. | 薄膜蒸着装置及びこれを利用した有機発光表示装置の製造方法 |
US8876975B2 (en) | 2009-10-19 | 2014-11-04 | Samsung Display Co., Ltd. | Thin film deposition apparatus |
KR101084184B1 (ko) | 2010-01-11 | 2011-11-17 | 삼성모바일디스플레이주식회사 | 박막 증착 장치 |
KR101174875B1 (ko) | 2010-01-14 | 2012-08-17 | 삼성디스플레이 주식회사 | 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치 |
KR101193186B1 (ko) | 2010-02-01 | 2012-10-19 | 삼성디스플레이 주식회사 | 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치 |
KR101156441B1 (ko) | 2010-03-11 | 2012-06-18 | 삼성모바일디스플레이주식회사 | 박막 증착 장치 |
KR101202348B1 (ko) | 2010-04-06 | 2012-11-16 | 삼성디스플레이 주식회사 | 박막 증착 장치 및 이를 이용한 유기 발광 표시 장치의 제조 방법 |
US8894458B2 (en) | 2010-04-28 | 2014-11-25 | Samsung Display Co., Ltd. | Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method |
KR101223723B1 (ko) | 2010-07-07 | 2013-01-18 | 삼성디스플레이 주식회사 | 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치 |
KR101723506B1 (ko) | 2010-10-22 | 2017-04-19 | 삼성디스플레이 주식회사 | 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 |
KR101738531B1 (ko) | 2010-10-22 | 2017-05-23 | 삼성디스플레이 주식회사 | 유기 발광 디스플레이 장치의 제조 방법 및 이에 따라 제조된 유기 발광 디스플레이 장치 |
KR20120045865A (ko) | 2010-11-01 | 2012-05-09 | 삼성모바일디스플레이주식회사 | 유기층 증착 장치 |
KR20120065789A (ko) | 2010-12-13 | 2012-06-21 | 삼성모바일디스플레이주식회사 | 유기층 증착 장치 |
KR101760897B1 (ko) | 2011-01-12 | 2017-07-25 | 삼성디스플레이 주식회사 | 증착원 및 이를 구비하는 유기막 증착 장치 |
KR101852517B1 (ko) | 2011-05-25 | 2018-04-27 | 삼성디스플레이 주식회사 | 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 |
KR101840654B1 (ko) | 2011-05-25 | 2018-03-22 | 삼성디스플레이 주식회사 | 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 |
KR101857249B1 (ko) | 2011-05-27 | 2018-05-14 | 삼성디스플레이 주식회사 | 패터닝 슬릿 시트 어셈블리, 유기막 증착 장치, 유기 발광 표시장치제조 방법 및 유기 발광 표시 장치 |
KR101826068B1 (ko) | 2011-07-04 | 2018-02-07 | 삼성디스플레이 주식회사 | 유기층 증착 장치 |
KR101919021B1 (ko) * | 2011-12-15 | 2019-02-11 | 엘지디스플레이 주식회사 | 발광다이오드 제조용 증착 장비 |
KR101996435B1 (ko) * | 2012-07-10 | 2019-07-05 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 이의 제조 방법 |
KR102013315B1 (ko) | 2012-07-10 | 2019-08-23 | 삼성디스플레이 주식회사 | 유기 발광 디스플레이 장치의 제조 방법 및 이에 따라 제조된 유기 발광 디스플레이 장치 |
US9461277B2 (en) | 2012-07-10 | 2016-10-04 | Samsung Display Co., Ltd. | Organic light emitting display apparatus |
KR101632298B1 (ko) | 2012-07-16 | 2016-06-22 | 삼성디스플레이 주식회사 | 평판 표시장치 및 그 제조방법 |
KR102363252B1 (ko) | 2014-11-12 | 2022-02-16 | 삼성디스플레이 주식회사 | 박막 증착 장치, 이를 이용한 유기 발광 표시 장치의 제조 방법 및 유기 발광 표시 장치 |
CN104775091A (zh) * | 2015-04-10 | 2015-07-15 | 安徽铜峰电子股份有限公司 | 用于形成金属化薄膜屏带的喷涂装置挡板 |
KR101803511B1 (ko) * | 2016-02-18 | 2017-11-30 | 주식회사 아마다스 | 디지털 도어락의 인터페이스 모듈장치 |
JP6570561B2 (ja) * | 2017-02-07 | 2019-09-04 | キヤノン株式会社 | 蒸着装置及び蒸着源 |
CN111148860B (zh) * | 2017-09-28 | 2022-02-11 | 夏普株式会社 | 蒸镀粒子射出装置及蒸镀装置、以及蒸镀膜制造方法 |
CN109957755A (zh) * | 2017-12-14 | 2019-07-02 | 湘潭宏大真空技术股份有限公司 | 光学蒸发真空镀膜机 |
CN109957760A (zh) * | 2017-12-14 | 2019-07-02 | 湘潭宏大真空技术股份有限公司 | 线性真空镀膜单体蒸发器 |
CN109957761A (zh) * | 2017-12-14 | 2019-07-02 | 湘潭宏大真空技术股份有限公司 | 基于线性蒸发器真空镀膜单体机 |
KR102604312B1 (ko) * | 2018-09-11 | 2023-11-20 | 엘지디스플레이 주식회사 | 유기 발광 표시 장치 |
CN112575308B (zh) * | 2019-09-29 | 2023-03-24 | 宝山钢铁股份有限公司 | 一种能在真空下带钢高效镀膜的真空镀膜装置 |
CN111128809A (zh) * | 2019-12-31 | 2020-05-08 | 沈阳拓荆科技有限公司 | 多层堆栈薄膜的沉积装置及方法 |
CN113193022B (zh) * | 2021-04-26 | 2022-09-09 | 睿馨(珠海)投资发展有限公司 | 一种高分辨率amoled显示器件及其制备方法 |
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CN2425263Y (zh) * | 2000-05-29 | 2001-03-28 | 葛世潮 | 有机发光二极管照明装置 |
JP4704605B2 (ja) * | 2001-05-23 | 2011-06-15 | 淳二 城戸 | 連続蒸着装置、蒸着装置及び蒸着方法 |
JP2003077662A (ja) * | 2001-06-22 | 2003-03-14 | Junji Kido | 有機エレクトロルミネッセンス素子の製造方法および製造装置 |
US6815723B2 (en) * | 2001-12-28 | 2004-11-09 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device, method of manufacturing the same, and manufacturing apparatus therefor |
JP3877613B2 (ja) * | 2002-03-05 | 2007-02-07 | 三洋電機株式会社 | 有機エレクトロルミネッセンス表示装置の製造方法 |
CN100459220C (zh) * | 2002-09-20 | 2009-02-04 | 株式会社半导体能源研究所 | 制造系统以及发光元件的制作方法 |
JP2004238688A (ja) * | 2003-02-06 | 2004-08-26 | Sony Corp | 有機発光素子の製造装置、および表示装置の製造システム |
JP2004349101A (ja) * | 2003-05-22 | 2004-12-09 | Seiko Epson Corp | 膜形成方法、膜形成装置、有機エレクトロルミネッセンス装置の製造方法、有機エレクトロルミネッセンス装置 |
JP2004355975A (ja) * | 2003-05-29 | 2004-12-16 | Sony Corp | 表示装置の製造方法 |
US7339139B2 (en) * | 2003-10-03 | 2008-03-04 | Darly Custom Technology, Inc. | Multi-layered radiant thermal evaporator and method of use |
EP2254390B1 (de) * | 2004-03-26 | 2012-07-04 | Panasonic Corporation | Organisches lichtemittierendes Element |
US7273663B2 (en) * | 2004-08-20 | 2007-09-25 | Eastman Kodak Company | White OLED having multiple white electroluminescence units |
EP1717339A2 (de) * | 2005-04-20 | 2006-11-02 | Applied Films GmbH & Co. KG | Kontinuierliche Beschichtungsanlage |
JP2006324649A (ja) * | 2005-04-22 | 2006-11-30 | Semiconductor Energy Lab Co Ltd | 有機半導体装置の作製方法 |
KR100729089B1 (ko) * | 2005-08-26 | 2007-06-14 | 삼성에스디아이 주식회사 | 유기 발광표시장치 및 그 제조방법 |
JP4767000B2 (ja) * | 2005-11-28 | 2011-09-07 | 日立造船株式会社 | 真空蒸着装置 |
KR100829761B1 (ko) * | 2007-05-16 | 2008-05-15 | 삼성에스디아이 주식회사 | 유기 발광 소자 |
JP2009049223A (ja) * | 2007-08-21 | 2009-03-05 | Seiko Epson Corp | 発光装置 |
JP2009170200A (ja) * | 2008-01-15 | 2009-07-30 | Sony Corp | 表示装置の製造方法 |
JP4915356B2 (ja) * | 2008-01-29 | 2012-04-11 | セイコーエプソン株式会社 | 発光素子、表示装置および電子機器 |
KR20100039496A (ko) | 2008-10-08 | 2010-04-16 | 엘지전자 주식회사 | Iptv 수신기 및 상기 iptv 수신기의 채널 변경 방법 |
-
2011
- 2011-04-05 KR KR1020110031288A patent/KR101801351B1/ko active IP Right Grant
- 2011-04-26 TW TW100114360A patent/TWI540777B/zh active
- 2011-04-26 TW TW103125269A patent/TWI527285B/zh active
- 2011-04-27 CN CN201310381944.3A patent/CN103474447B/zh active Active
- 2011-04-28 DE DE102011017648.9A patent/DE102011017648B4/de active Active
-
2013
- 2013-06-19 JP JP2013128405A patent/JP5628972B2/ja active Active
-
2015
- 2015-02-02 JP JP2015018336A patent/JP6049774B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
KR101801351B1 (ko) | 2017-11-27 |
JP2013214524A (ja) | 2013-10-17 |
CN103474447A (zh) | 2013-12-25 |
KR20110120213A (ko) | 2011-11-03 |
JP5628972B2 (ja) | 2014-11-19 |
DE102011017648A1 (de) | 2012-03-01 |
JP2015120982A (ja) | 2015-07-02 |
CN103474447B (zh) | 2016-09-21 |
TW201214826A (en) | 2012-04-01 |
TWI540777B (zh) | 2016-07-01 |
DE102011017648B4 (de) | 2017-05-04 |
JP6049774B2 (ja) | 2016-12-21 |
TW201442318A (zh) | 2014-11-01 |
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