TWI520794B - A soaking device with a cleaning device - Google Patents

Description

Immersion equipment with cleaning device

The invention relates to an immersion device applied in a wet process of a wafer, in particular to a immersion device with a cleaning device for cleaning a substrate after immersing the liquid.

After the existing semiconductor wafer is in the lithography process, a film is formed on the front side of the wafer. Usually, the transfer mechanism transfers the wafer into the immersion tank to soak the wafer in the immersion tank. After the wafer is immersed in the liquid for a period of time, the transfer mechanism will take the wafer out of the immersion tank, and then the transfer mechanism will transfer the wafer to the carrier of the etching process, and the carrier will be adsorbed through the adsorption groove. The back side of the wafer enables the carrier to drive the wafer for rotary etching.

Since the wafer is immersed in the liquid, the back side of the wafer is contaminated with the liquid. Therefore, the suction generated by the adsorption groove of the carrier plate is likely to cause the adsorption groove to adsorb to the liquid in the process of adsorbing the back surface of the wafer, thereby contaminating. The suction channel inside the carrier.

Therefore, it is an object of the present invention to provide an infusion device having a cleaning device capable of cleaning the substrate after soaking the liquid medicine The back side of the substrate keeps the back side of the substrate clean.

Another object of the present invention is to provide an immersion apparatus having a cleaning device which can simultaneously clean the back surface of the substrate during the process of transporting the substrate by the transfer device, thereby shortening the cleaning time to improve the cleaning efficiency.

Therefore, the infusion apparatus of the present invention having a cleaning device is adapted to soak a substrate having a front surface and a back surface, and a front surface of the substrate is formed with a film.

The immersion device comprises a base, a liquid storage tank, a cleaning device, and a transfer device. The machine base includes a front end and a rear end, and the liquid storage cylinder is disposed on the machine base and defines a immersion tank, wherein the immersion tank is provided with a liquid medicine for immersing the substrate, and the cleaning device is disposed at the machine base and located at the base Between the front end and the liquid storage cylinder, the cleaning device includes a first nozzle for spraying water, and a second nozzle for blowing air. The transfer device is disposed on the base and includes a clamping mechanism, and a driving mechanism connected to the clamping mechanism, the clamping mechanism is configured to clamp and place the substrate, the driving mechanism can drive the clamping mechanism to move the substrate in the immersion tank, and the substrate Taking out from the immersion tank, the driving mechanism can drive the clamping mechanism to move forward from a discharge preparation position above the liquid storage cylinder to a discharge position above the cleaning device, so that the clamping mechanism is The sandwiched substrate passes over the first and second nozzles, and the first and second nozzles respectively spray and blow the back surface of the substrate.

The second nozzle is arranged in front of the first nozzle, the first nozzle can spray water on the back surface of the substrate upward, and the second nozzle can face upward The back surface of the substrate is blown.

The cleaning device further includes a third nozzle spaced behind the first nozzle, the third nozzle blowing the back surface of the substrate upward.

The cleaning device further includes a water storage tube disposed in the machine base. The first nozzle and the second nozzle are disposed in the water storage tube for receiving water sprayed by the first nozzle.

The clamping mechanism includes a carrier plate for carrying the substrate, and two side clamping arms for clamping the substrate. The carrier plate defines an opening that exposes a portion of the back surface of the substrate.

The two side clamping arms are movable between an open position separated from the substrate and a clamping position for holding the substrate, and the clamping mechanism further includes a driving mechanism for driving the two side clamping arms An actuation assembly that moves between the open position and the clamped position.

The driving mechanism comprises a sliding assembly disposed on the base, a lifting assembly slidably coupled to the sliding assembly, and a rotating assembly disposed on the lifting assembly and coupled to the clamping mechanism, the sliding assembly Driving the lifting assembly to move along a first axis in a front-rear direction, the lifting assembly can drive the rotating component to move along a second axis in an up and down direction, the rotating component can drive the clamping mechanism to a horizontal position around a third axis And rotating between the upright positions, the third axis being perpendicular to the first axis and the second axis, respectively.

The liquid storage cartridge includes a cylinder and a carrier, the cylinder forming the immersion tank, the carrier is disposed in the immersion tank and fixedly connected to the a cylinder for carrying the substrate.

The carrier includes two left and right spaced bearing rods, and each of the supporting rods is formed with a plurality of card slots, and the card slots are arranged along a first axis extending forward and backward, and the substrate is coupled to the two carriers. The positions of the rods are aligned in the same slot.

The utility model has the advantages that: by the design of the liquid storage cylinder, the cleaning device and the transfer device, the transfer device can first transport the substrate to the soaking tank of the liquid storage cylinder, so that the substrate is immersed in the liquid medicine. When the transfer device transports the substrate from the discharge preparation position to the discharge position, the third nozzle, the first nozzle and the second nozzle of the cleaning unit sequentially clean the back surface of the substrate to keep the back surface of the substrate clean. The adsorption groove of the carrier disk of the etching process is prevented from adsorbing the liquid in the process of adsorbing the back surface. Furthermore, the cleaning time can be shortened to improve the cleaning efficiency.

1, 1'‧‧‧ substrate

11‧‧‧ board

111‧‧‧ positive

112‧‧‧Back

113‧‧‧ outer periphery

12‧‧‧ Film

200‧‧‧soaking equipment

2‧‧‧ machine base

21‧‧‧ front end

22‧‧‧ Backend

3‧‧‧Liquid cylinder

31‧‧‧Cylinder

311‧‧‧soaking tank

312‧‧‧ liquid

32‧‧‧Carriage

321‧‧‧Loading rod

322‧‧‧ card slot

4‧‧‧cleaning device

41‧‧‧Water storage tank

42‧‧‧cleaning unit

421‧‧‧First cleaning element

422‧‧‧Second cleaning element

423‧‧‧ Third cleaning element

424‧‧‧First nozzle

425‧‧‧second nozzle

426‧‧‧ third nozzle

5‧‧‧Transfer device

51‧‧‧Clamping mechanism

511‧‧‧ bracket

512‧‧‧ carrying board

513‧‧‧ side clamping arm

514‧‧‧Actuating components

515‧‧‧ openings

516‧‧‧Fixed clamping

517‧‧‧Cylinder unit

518‧‧‧ lever

519‧‧‧ Slider

520‧‧‧Connected end

521‧‧‧ screws

522‧‧‧ screws

52‧‧‧ drive mechanism

53‧‧‧Sliding components

531‧‧‧First slide rail

532‧‧‧First slide

533‧‧‧First drive unit

54‧‧‧ lifting assembly

541‧‧‧Second rail

542‧‧‧Second slide

543‧‧‧Second drive unit

55‧‧‧Rotating components

551‧‧‧suspension

552‧‧‧Drive motor

A1‧‧‧ first axis

A2‧‧‧ second axis

A3‧‧‧ third axis

Other features and effects of the present invention will be apparent from the following description of the drawings, wherein: FIG. 1 is a side view of a substrate to be processed by an embodiment of the infusion apparatus of the present invention; FIG. Is a perspective view of one embodiment of the soaking apparatus having the cleaning device of the present invention; and FIG. 3 is a plan view of an embodiment of the infusion apparatus having the cleaning device of the present invention, illustrating the space between the machine base, the liquid storage cylinder, the cleaning device, and the transfer device Linkage relationship; 4 is a top plan view showing an embodiment of an infusion apparatus having a cleaning device of the present invention, illustrating a detailed structure of the liquid storage cartridge and the cleaning device; and FIG. 5 is a transfer device of an embodiment of the infusion device having the cleaning device of the present invention. 3 is a perspective view illustrating a connection relationship between a clamping mechanism, a sliding assembly, a lifting assembly, and a rotating assembly; FIG. 6 is a plan view of a clamping mechanism of an embodiment of the infusion device having a cleaning device of the present invention, illustrating a carrier plate and a side clamping Figure 7 is a top plan view of an embodiment of the infusion device with a cleaning device of the present invention, illustrating the clamping mechanism in the feeding position; Figure 8 is a soaking device with a cleaning device of the present invention; A side view of one embodiment of the apparatus, illustrating that the clamping mechanism is in the feeding position; FIG. 9 is a side elevational view of one embodiment of the infusion apparatus having the cleaning apparatus of the present invention, illustrating the clamping mechanism being positioned on the first substrate a discharge preparation position, and the clamping mechanism is in a horizontal position; FIG. 10 is a side view showing an embodiment of the immersion apparatus having the cleaning device of the present invention, The clamping mechanism is rotated to the upright position; FIG. 11 is a side view showing an embodiment of the infusion device with the cleaning device of the present invention, illustrating the clamping mechanism moving downward to the pick-and-place position of the first substrate; FIG. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a cross-sectional view showing an embodiment of an infusion apparatus having a cleaning device, illustrating that the clamping mechanism is moved downward to a pick-and-place position of the first substrate, and the first substrate is placed in the card slot of the two carrier rods; 13 is an embodiment of the infusion apparatus of the present invention having a cleaning device FIG. 14 is a side elevational view showing an embodiment of the infusion apparatus having the cleaning device of the present invention, illustrating a second substrate of the clamping mechanism. Placed in the immersion tank and moved up to the discharge preparation position of the second substrate; FIG. 15 is a side view showing an embodiment of the immersion apparatus having the cleaning device of the present invention, illustrating that the clamping mechanism is moved backward to the first substrate Figure 16 is a side elevational view of an embodiment of the infusion apparatus with a cleaning device of the present invention, illustrating the clamping mechanism moving downward to the pick-and-place position of the first substrate to capture the first substrate Figure 17 is a side elevational view of one embodiment of the soaking apparatus having the cleaning apparatus of the present invention, illustrating the clamping mechanism moving up to the discharge preparation position of the first substrate, and the clamping mechanism is rotated to the horizontal position; A side view of an embodiment of an infusion apparatus having a cleaning device, illustrating that the clamping mechanism is moved downward to a discharge preparation position; and FIG. 19 is a cleaning device of the present invention. A side view of one embodiment of the soaking apparatus, illustrating that dry compressed air blown by the third nozzle is blown toward the back surface of the first substrate via the opening; FIG. 20 is a side of an embodiment of the infusion apparatus having the cleaning apparatus of the present invention Referring to the schematic diagram, the deionized water sprayed from the first nozzle is sprayed through the opening to the back surface of the first substrate, and the dry compressed air blown by the third nozzle is blown toward the back surface of the first substrate through the opening; and FIG. 21 is An embodiment of the invention has an embodiment of a soaking device for a cleaning device A side view showing the clamping mechanism moving forward to the discharge position.

Referring to FIG. 1 and FIG. 2, an embodiment of the immersion apparatus having a cleaning device of the present invention is applied to a wet process of a wafer, and is suitable for immersing the substrate 1. In this embodiment, the substrate 1 is exemplified by a lithography process. The substrate 1 includes a board 11 and a film 12. The board 11 has a front surface 111 and a back surface 112. It is a photoresist film formed on the front surface 111.

Referring to Figures 2, 3 and 4, the infusion device 200 comprises a base 2, a reservoir 3, a cleaning device 4, and two transfer devices 5. The base 2 includes a front end 21 and a rear end 22. The liquid storage cartridge 3 is disposed on the base 2 and includes a cylinder 31 and two carriers 32. The cylinder 31 is formed with a soaking groove 311 whose top end is open. The soaking groove 311 is provided with a medicine for immersing the substrate 1. Liquid 312 (shown in Figure 8). Each of the carriers 32 is disposed in the immersion tank 311 and fixedly connected to the cylinder 31. Each of the carriers 32 includes two left and right spaced bearing rods 321 , and each of the supporting rods 321 extends along a first axis A1 in the front-rear direction. Each of the carrying rods 321 is formed with a plurality of slots 322 arranged at intervals along the first axis A1. The latching holes 322 of the two carrying rods 321 are aligned for the substrate 1 to be locked, thereby enabling the substrate 1 to be stably It is located in the soaking tank 311.

The cleaning device 4 includes a water storage cartridge 41 and two cleaning units 42. The water storage cylinder 41 is disposed between the front end 21 and the liquid storage tank 3, and the water storage cylinder 41 is formed with a water storage tank 411 whose top end is open. Two cleaning The unit 42 is disposed in the water storage tank 411 at a distance from each other and is fixedly connected to the water storage cylinder 41. Each cleaning unit 42 includes a first cleaning element 421 and a second cleaning element 422 spaced apart from the front side of the first cleaning element 421. And a third cleaning element 423 spaced behind the first cleaning element 421. The first cleaning element 421 includes an upwardly facing first nozzle 424 that can be sprayed upwardly. The second cleaning element 422 includes an upwardly facing second nozzle 425. The third cleaning element 423 includes an upwardly facing third nozzle 426, and the second nozzle 425 and the third nozzle 426 are respectively sprayable upward. In the present embodiment, the water ejected by the first nozzle 424 is exemplified by deionized water (DIW), and the gas ejected by the second and third nozzles 425 and 426 is dry compressed air (Clean Dry). Air, CDA) as an example.

The two transfer devices 5 are disposed on the frame 2 and located on the left and right sides of the liquid storage cartridge 3. Each of the transfer devices 5 includes a clamping mechanism 51 and a driving mechanism 52 connected to the clamping mechanism 51. The clamping mechanism 51 is used for clamping and placing the substrate 1. The driving mechanism 52 can move the clamping mechanism 51 to place the substrate 1 in the immersion tank 311, and take out the substrate 1 from the immersion tank 311. The driving mechanism 52 can also drive the clamping mechanism 51 to move forward by a discharge preparation position (shown in FIG. 18) above the liquid storage cylinder 3 to a discharge position above the cleaning device 4 (as shown in FIG. 21). The substrate 1 held by the clamping mechanism 51 is passed over the first, second, and third nozzles 424, 425, and 426. Thereby, the first nozzle 424 can spray water to the back surface 112 of the substrate 1, and the second and third nozzles 425, 426 can blow the back surface 112 of the substrate 1 to perform the back surface 112 of the substrate 1 after the soaking liquid 312. Cleaning.

It should be noted that in this embodiment, two transfer devices 5 The clamping mechanism 51 is used to clamp the substrates 1 of different sizes, respectively. However, the clamping mechanism 51 of the two transfer devices 5 can also clamp the substrates 1 of the same size.

Referring to Figures 4, 5 and 6, the clamping mechanism 51 comprises a bracket 511, a carrier plate 512, two side clamping arms 513, and an actuating assembly 514. The carrier plate 512 is fixedly coupled to the bracket 511 and is configured to carry the substrate 1. The carrier plate 512 is formed with an opening 515 and two fixed clamping portions 516 located on the left and right sides of the opening 515. The opening 515 may expose a portion of the back surface 112 of the substrate 1 whereby the first nozzle 424 can spray water to the back surface 112 of the substrate 1 via the opening 515, and the second and third nozzles 425, 426 can pass the opening 515 to the substrate 1 The back 112 blows. The two fixed clamping portions 516 are for clamping on an outer periphery 113 of the plate body 11 of the substrate 1 .

The side grip arms 513 are movable between an open position (shown in Figure 6) and a gripping position (shown in Figure 5). The substrate 1 can be placed on the carrier plate 512 when the side clamping arms 513 are in the open position. During the movement of the clamping arms 513 on both sides from the open position to the clamping position, the clamping arms 513 on both sides push and guide the position of the substrate 1 so that the clamping arms 513 on both sides can move to the clamping position. The outer peripheral edge 113 of the substrate 1 is clamped together with the two fixed clamping portions 516 of the carrier plate 512.

The actuation assembly 514 includes a cylinder unit 517 and two tie rods 518. The cylinder unit 517 is fixed to the top end of the bracket 511 and has two sliders 519 spaced apart from each other. The length of one of the pull rods 518 is greater than the length of the other of the pull rods 518. One end of each pull rod 518 is connected and fixed to the corresponding slider 519, and the other end is connected and fixed to a connecting end of the corresponding side clamp arm 513. 520. One end of each of the pull rods 518 of the present embodiment is locked to the corresponding slider 519 through a plurality of screws 521, and the other end of each of the pull rods 518 is locked to the connecting end portion 520 of the corresponding side clamping arm 513 through, for example, a plurality of screws 522. . The two sliders 519 can respectively drive the two connecting ends 520 to be close to each other or away from each other through the two pull rods 518, so that the two side clamping arms 513 can move in parallel between the clamping position and the open position.

Referring to Figures 2, 5 and 6, the drive mechanism 52 includes a slide assembly 53 disposed on the base 2, a lift assembly 54 slidably coupled to the slide assembly 53, and a lift assembly 54 disposed therebetween. A rotating assembly 55 to which the mechanism 51 is coupled. The sliding assembly 53 includes a first sliding rail 531 fixed to the base 2, a first sliding member 532 slidably coupled to the first sliding rail 531, and a first driving coupled to the first sliding member 532. Unit 533. The first sliding rail 531 is elongated and extends in a length direction along the first axis A1. The first driving unit 533 is configured to drive the first sliding member 532 to slide relative to the first sliding rail 531 along the first axis A1. The lifting assembly 54 includes a second sliding rail 541 fixedly coupled to the top end of the first sliding member 532, a second sliding member 542 slidably coupled to the second sliding rail 541, and a fixed connection to the first sliding member A second drive unit 543 is attached to the top end of the member 532 and coupled to the second slider 542. The second sliding rail 541 is elongated and extends in a longitudinal direction along a second axis A2. The second driving unit 543 is configured to drive the second sliding member 542 to slide along the second axis A2. The rail 541 slides.

The rotating assembly 55 includes a suspension 551 fixedly coupled to the second slider 542, and a drive motor 552 disposed on the suspension 551. The bracket 511 of the clamping mechanism 51 is rotatably pivotally connected to the suspension 551. The driving motor 552 is coupled to one end of the bracket 511 and can rotate the bracket 511 relative to the suspension 551. The driving motor 552 can drive the clamping mechanism 51 around a third axis. A3 rotates between a horizontal position (as shown in FIG. 5) and an upright position (shown in FIG. 10), wherein the third axis A3 extends in the left-right direction and is perpendicular to the first axis A1 and the second axis A2, respectively. .

It should be noted that the number of the carriers 32 of the liquid storage cartridge 3, the number of the cleaning units 42 of the cleaning device 4, and the number of the transfer devices 5 may also be one, which is not limited to the number disclosed in the embodiment.

Referring to Fig. 5, Fig. 7, and Fig. 8, since the two transfer devices 5 of the immersion apparatus 200 operate in the same manner, only the operation mode of one of the transfer devices 5 will be described in the following description. When the immersion apparatus 200 is in operation, first, the first sliding member 532 of the sliding assembly 53 drives the lifting assembly 54 and the rotating assembly 55 disposed on the lifting assembly 54 and the clamping mechanism 51 to move to the front end of the first sliding rail 531, and the lifting The second sliding member 542 of the assembly 54 drives the rotating assembly 55 and the clamping mechanism 51 disposed on the rotating assembly 55 to a predetermined height, thereby causing the clamping mechanism 51 to be positioned at an interval above the cleaning device 4. Material location. At this time, the clamping mechanism 51 is in the horizontal position, and the clamping arms 513 on both sides are in the open position. When the clamping mechanism 51 is in the feeding position, the transfer arm (not shown) moves the substrate 1 after the lithography process to the clamping mechanism 51 and places the substrate 1 on the carrier plate 512. Then, The clamping arms 513 on both sides are moved in parallel from the open position to the clamping position, so that the clamping arms 513 on both sides are clamped together with the two fixed clamping portions 516 on the outer periphery 113 of the substrate 1.

Referring to FIG. 5, FIG. 9 and FIG. 10, the first sliding member 532 of the sliding assembly 53 drives the lifting assembly 54 and the clamping mechanism 51 to move rearward along the first axis A1 to the upper portion of the liquid storage cartridge 3, so that the clamping mechanism 51 is provided. Positioned at a discharge preparation position of the first substrate 1. At this time, the driving motor 552 of the rotating assembly 55 drives the clamping mechanism 51 to rotate about the third axis A3 in a first rotational direction R1 to the upright position shown in FIG. 10, so that the first piece clamped by the clamping mechanism 51 The substrate 1 is aligned above a card slot 322 of a corresponding rear end 22 of the carrier bar 321 .

Referring to FIG. 5, FIG. 11 and FIG. 12 and FIG. 13, the second sliding member 542 of the lifting assembly 54 drives the clamping mechanism 51 to move down along the second axis A2 to the pick-and-place position of the first substrate 1. At this time, the carrier plate 512 of the clamping mechanism 51 and the two side clamping arms 513 will drive the first substrate 1 to be immersed in the liquid medicine 312, and the first substrate 1 is placed on the card slot 322 of the two carrier rods 321 Inside. Thereafter, the side grip arms 513 are moved in parallel from the gripping position to the open position, so that the side grip arms 513 are separated from the first sheet substrate 1. After the first substrate 1 is placed, the second slider 542 of the lifting assembly 54 drives the clamping mechanism 51 to move upward along the second axis A2 and is reset to the discharge preparation position of the first substrate 1. At this time, the rotation The drive motor 552 of the assembly 55 drives the clamping mechanism 51 to rotate about the third axis A3 to a horizontal position in a second rotational direction R2. Then, the first sliding member 532 of the sliding assembly 53 drives the clamping mechanism 51 to move forward along the first axis A1 to the feeding position shown in FIG. 9, so that the clamping mechanism 51 receives the second substrate 1' (as shown in the figure). 14)).

Referring to Figures 5, 14, 15, and 16, when the clamping mechanism After the second substrate 1 ′ is received by the driving mechanism 52 , the driving mechanism 52 drives the clamping mechanism 51 to place the second substrate 1 ′ in the immersion tank 311 according to the manner of placing the first substrate 1 , so that the second substrate 1 ′ The card is engaged in the next card slot 322 of the two carrier bars 321 . Subsequently, the second sliding member 542 of the lifting assembly 54 drives the clamping mechanism 51 to move up along the second axis A2 to the discharge preparation position of the second substrate 1'. Then, the first sliding member 532 of the sliding assembly 53 is driven. The chucking mechanism 51 is moved rearward along the first axis A1 to the discharge preparation position of the first sheet substrate 1 shown in Fig. 15 . Then, the second sliding member 542 of the lifting assembly 54 drives the clamping mechanism 51 to move down along the second axis A2 to the pick-and-place position of the first substrate 1 to capture the first substrate 1. Since the clamping mechanism 51 is in the process of receiving the first substrate 1 ′ to the first substrate 1 , the first substrate 1 has been immersed in the liquid 312 of the immersion tank 311 for a period of time. Therefore, the liquid 312 will be It penetrates between the front surface 111 of the plate body 11 and the film 12, and the outer periphery of the film 12 is lifted upward to reduce the joint strength between the film 12 and the plate body 11.

Referring to FIG. 5, FIG. 16, FIG. 17, and FIG. 18, after the clamping mechanism 51 grips the first substrate 1, the second sliding member 542 of the lifting assembly 54 drives the clamping mechanism 51 to move up along the second axis A2 to The discharge preparation position of the first substrate 1 at this time, the drive motor 552 of the rotary unit 55 drives the clamping mechanism 51 to rotate to the horizontal position about the third axis A3 in the second rotational direction R2. Subsequently, the second sliding member 542 of the lifting assembly 54 drives the clamping mechanism 51 to move downward along the second axis A2 to the discharge preparation position above the liquid storage cylinder 3 shown in FIG. 18, and the discharge preparation position is located at intervals. The discharge position of the first substrate 1 is below the discharge preparation position.

Referring to FIG. 5, FIG. 19, FIG. 20 and FIG. 21, the first sliding member 532 of the sliding assembly 53 drives the clamping mechanism 51 to move forward along the first axis A1, and the clamping mechanism 51 moves forward during the clamping process. The first substrate 1 held by the mechanism 51 first passes over the third nozzle 426, and the dry compressed air blown upward by the third nozzle 426 and diffused is blown to the first substrate 1 via the opening 515 of the carrier 512. The back surface 112 is thereby used to blow off the chemical liquid 312 on the back surface 112 of the first substrate 1. Immediately after the first substrate 1 passes over the first nozzle 424, the deionized water sprayed upward by the first nozzle 424 and diffused is sprayed to the back surface 112 of the first substrate 1 via the opening 515 of the carrier 512. The back surface 112 of the first substrate 1 is cleaned. Finally, the first substrate 1 will pass over the second nozzle 425, and the dry compressed air blown upward by the second nozzle 425 and diffused will be blown toward the back surface 112 of the first substrate 1 via the opening 515 of the carrier 512. Thereby, the back surface 112 of the first substrate 1 is blown.

When the first slider 532 of the sliding assembly 53 drives the clamping mechanism 51 to move forward along the first axis A1 to a discharging position located above the cleaning device 4 shown in FIG. 21, the back surface of the first substrate 1 is completed. 112 cleaning operations. At this time, the clamping arms 513 on both sides of the clamping mechanism 51 will move parallel to the open position, and the transfer arm (not shown) will grip the first substrate 1 and transfer it to the carrier of the etching process. (not shown), the carrier disk adsorbs the back surface 112 of the first substrate 1 through the adsorption groove, so that the carrier can drive the substrate 1 to perform a rotary etching operation. Since the back surface 112 of the first substrate 1 is cleaned by the cleaning device 4, the back surface 112 is kept clean. Therefore, it is possible to prevent the adsorption groove of the carrier disk from adsorbing the drug during the adsorption of the back surface 112. Liquid 312. In addition, since the substrate 1 has been immersed in the liquid 312 of the liquid storage tank 3 for a certain period of time, the chemical liquid 312 penetrates between the front surface 111 of the plate body 11 and the film 12, so that the outer periphery of the film 12 is lifted up, Thus, the film 12 on the board body 11 can be quickly removed during the rotary etching operation.

The transfer device 5 of the immersion device 200 performs the feeding operation of the next substrate according to the above-mentioned feeding mode, and the discharging operation of the substrate completed by the previous immersion liquid 312 in the above-mentioned discharging mode to continuously perform the immersion of the substrate. And cleaning.

In particular, in the present embodiment, although each cleaning unit 42 is provided with the first cleaning element 421, the second cleaning element 422, and the third cleaning element 423 as an example, each cleaning unit 42 is designed. The third cleaning element 423 can also be omitted, and the arrangement of the first and second cleaning elements 421, 422 can also achieve the effect of cleaning the back surface 112 of the substrate 1.

In summary, the immersion apparatus 200 of the present embodiment, by the design of the liquid storage cylinder 3, the cleaning device 4, and the transfer device 5, the transfer device 5 can first transport the substrate 1 to the immersion tank 311 of the liquid storage cylinder 3. The substrate 1 is immersed in the drug solution 312. When the transfer device 5 transports the substrate 1 from the discharge preparation position to the discharge position, the third nozzle 426, the first nozzle 424 and the second nozzle 425 of the cleaning unit 42 sequentially clean the back surface 112 of the substrate 1, The back surface 112 of the substrate 1 is kept clean to prevent the adsorption solution of the carrier disk of the etching process from adsorbing the liquid 312 during the process of adsorbing the back surface 112. Furthermore, the cleaning man-hour can be shortened to improve the cleaning efficiency, so that the object of the present invention can be achieved.

However, the above is only an embodiment of the present invention, and the scope of the present invention cannot be limited thereto, that is, the application according to the present invention is The simple equivalent changes and modifications made by the scope of the patent and the contents of the patent specification are still within the scope of the invention.

1‧‧‧Substrate

113‧‧‧ outer periphery

200‧‧‧soaking equipment

2‧‧‧ machine base

21‧‧‧ front end

22‧‧‧ Backend

3‧‧‧Liquid cylinder

31‧‧‧Cylinder

311‧‧‧soaking tank

4‧‧‧cleaning device

41‧‧‧Water storage tank

42‧‧‧cleaning unit

424‧‧‧First nozzle

425‧‧‧second nozzle

426‧‧‧ third nozzle

5‧‧‧Transfer device

51‧‧‧Clamping mechanism

513‧‧‧ side clamping arm

53‧‧‧Sliding components

55‧‧‧Rotating components

551‧‧‧suspension

Claims (9)

An immersing device having a cleaning device, is adapted to soak a substrate, the substrate has a front surface and a back surface, the front surface of the substrate is formed with a film, the immersion device comprises: a base, comprising a front end, and a rear end, a liquid storage tank is disposed on the machine base and formed with a soaking tank, wherein the soaking tank is provided with a liquid medicine for immersing the substrate, and a cleaning device is disposed at the machine base and located at the front end and the liquid storage tank The cleaning device includes a first nozzle for spraying water, a second nozzle for blowing air, and a transfer device disposed on the base and including a clamping mechanism, and a clip a driving mechanism connected to the mechanism, the clamping mechanism is configured to clamp and place the substrate, the driving mechanism can move the clamping mechanism to place the substrate in the immersion tank, and the substrate is used by the immersion tank Taking out, the driving mechanism can drive the clamping mechanism to move forward from a discharge preparation position above the liquid storage cylinder to a discharge position above the cleaning device, so that the clamping mechanism is clamped The more the substrate The first and second nozzles respectively spray and blow the back surface of the substrate, and the second nozzles are arranged in front of the first nozzle, and the first nozzle can face the first nozzle The back surface of the substrate is sprayed with water, and the second nozzle can blow the back surface of the substrate upward. The immersion device with a cleaning device according to claim 1, wherein the cleaning device further comprises a third nozzle spaced behind the first nozzle, the third nozzle blowing upward toward the back surface of the substrate . The immersion device with a cleaning device according to claim 1, wherein the cleaning device further comprises a water storage tube disposed in the machine base, wherein the first nozzle and the second nozzle are disposed in the water storage tube, The water storage cylinder is for receiving water sprayed by the first nozzle. The immersion device with a cleaning device according to any one of claims 1 to 3, wherein the clamping mechanism comprises a carrier plate for carrying the substrate, and two side clamps for clamping the substrate The arm, the carrier plate is formed with an opening that exposes a portion of the back surface of the substrate. The immersion device with a cleaning device according to claim 4, wherein the two side clamping arms are movable between an open position separated from the substrate and a clamping position for holding the substrate, the clip The holding mechanism further includes an actuating assembly for urging movement of the side grip arms between the open position and the gripping position. The immersing device with a cleaning device according to claim 4, wherein the driving mechanism comprises a sliding assembly disposed on the base, a lifting assembly slidably coupled to the sliding assembly, and a lifting assembly disposed on the lifting assembly And a rotating component connected to the clamping mechanism, the sliding component can drive the lifting component to move along a first axis in a front-rear direction, and the lifting component can drive the rotating component to move along a second axis in an up and down direction, the rotation The assembly can drive the clamping mechanism to rotate about a third axis between a horizontal position and an upright position, the third axis being perpendicular to the first axis and the second axis, respectively. The immersion device with a cleaning device according to claim 1, wherein the liquid storage cartridge comprises a cylinder and a carrier, the cylinder forming the immersion tank The carrier is disposed in the immersion tank and is fixedly connected to the cylinder, and the carrier is used to carry the substrate. The immersion device with a cleaning device according to claim 7, wherein the carrier comprises two left and right spaced load bearing bars, each of the carrier bars is formed with a plurality of card slots, and the card slots are extended along a front and rear The first shafts are spaced apart from each other, and the substrate is snapped into the slots of the two bearing rods that are aligned with each other. The immersion device with a cleaning device according to claim 1, wherein the driving mechanism comprises a sliding assembly disposed on the base, a lifting assembly slidably coupled to the sliding assembly, and a lifting assembly disposed on the lifting assembly And a rotating component connected to the clamping mechanism, the sliding component can drive the lifting component to move along a first axis in a front-rear direction, and the lifting component can drive the rotating component to move along a second axis in an up and down direction, the rotation The assembly can drive the clamping mechanism to rotate about a third axis between a horizontal position and an upright position, the third axis being perpendicular to the first axis and the second axis, respectively.