TWI511822B - Processing control device, laser processing device and processing control method - Google Patents
Processing control device, laser processing device and processing control method Download PDFInfo
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- TWI511822B TWI511822B TW102148130A TW102148130A TWI511822B TW I511822 B TWI511822 B TW I511822B TW 102148130 A TW102148130 A TW 102148130A TW 102148130 A TW102148130 A TW 102148130A TW I511822 B TWI511822 B TW I511822B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
- B23K26/0853—Devices involving movement of the workpiece in at least in two axial directions, e.g. in a plane
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
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Description
本發明係關於用於被加工物的雷射加工之加工控制裝置、雷射加工裝置及加工控制方法。The present invention relates to a machining control device, a laser processing device, and a machining control method for laser processing of a workpiece.
在對於印刷(print)基板等之工件(work)(加工對象物)進行加工之裝置方面,有一種係對於工件照射雷射光而進行開孔加工之雷射加工裝置(微(micro)雷射加工機)。如此的雷射加工裝置,係使承載有工件之XY滑台(XY table)移動而於停止後才使電流計式掃描器(galvanometer scanner)掃描而進行電流計式掃描器掃描區域(galvano area)內的雷射加工(步進(step)方式)。此步進方式,係在工件面內重複進行:使XY滑台移動然後停止,等到電流計式掃描器掃描區域內的雷射加工完後,再使XY滑台移動到下一個電流計式掃描器掃描區域然後停止之處理。因此,在XY滑台移動中的期間並不能對工件進行雷射加工,會使得雷射加工有所謂的損失時間(loss time)。In a device for processing a workpiece (processing object) such as a printed substrate, there is a laser processing apparatus (micro laser processing for performing laser processing on a workpiece by irradiating laser light). machine). Such a laser processing apparatus moves an XY table (XY table) carrying a workpiece and stops the galvanometer scanner after scanning to perform a galvano area of the galvano area. Laser processing inside (step method). This stepping method is repeated in the workpiece surface: the XY stage is moved and then stopped, and after the laser processing in the scanning area of the galvanometer scanner is completed, the XY stage is moved to the next galvanometer scanning. The scan area is then processed. Therefore, the workpiece cannot be subjected to laser processing during the movement of the XY stage, which causes the so-called loss time of the laser processing.
因此,專利文獻1、2中記載的雷射加工方法,係進行使XY滑台與電流計式掃描器同步,而在仍然在使XY滑台動作的情況下使電流計式掃描器掃描而進行雷射加工之協調控制(coordinated control)。Therefore, in the laser processing methods described in Patent Documents 1 and 2, the XY stage is synchronized with the galvanometer scanner, and the galvano scanner is scanned while the XY stage is still being operated. Coordinated control of laser processing.
(專利文獻1)日本特開2000-100608號公報(Patent Document 1) Japanese Patent Laid-Open Publication No. 2000-100608
(專利文獻2)日本特開2011-140057號公報(Patent Document 2) Japanese Patent Laid-Open Publication No. 2011-140057
然而,上述的先前技術,卻有:算出電流計式掃描器側的定位資料(data)之演算法(algorithm)(電腦輔助製造:CAM(Computer Aided Manufacturing)資料)很複雜,在為了實現協調控制所做的開發上會花很多時間之問題。However, the above prior art has an algorithm for calculating the positioning data of the galvanometer scanner side (computer aided manufacturing: CAM (Computer Aided Manufacturing) data), which is complicated in order to realize coordinated control. It takes a lot of time to develop the development.
本發明係鑑於上述問題而完成者,其目的在得到可容易地進行有效率的雷射加工之加工控制裝置、雷射加工裝置及加工控制方法。The present invention has been made in view of the above problems, and an object thereof is to provide a processing control device, a laser processing device, and a processing control method that can easily perform efficient laser processing.
為了解決上述課題,達成本發明之目的,本發明之加工控制裝置係具備有控制XY滑台(XY table)及電流計式掃描器(galvanometer scanner)之控制部,該XY滑台係承載被加工物而在與前述被加工物的主面平行之面內,亦即XY平面內移動,該電流計式掃描器係使從雷射光源射出之雷射光在電流計式掃描器掃描區域(galvano area)內定位而使雷射光照射至前述被加工物上,前述控制部,係在要對於前述被加工物進行雷射加工之際,控制前述XY滑台,以使設定在前述被加工物上之加工區域依序移動至電流計式掃描器掃描區域,而且控制前述電流計式掃描器,以 使前述雷射光相對於移動來到前述電流計式掃描器掃描區域上之各加工區域而定位,且在使前述加工區域朝前述電流計式掃描器掃描區域移動之際,當前述加工區域進入離移動的目標座標有預先設定的距離之到位(in position)範圍內時,就開始以不使前述XY滑台停止之方式一邊使前述XY滑台移動一邊使前述雷射光在前述電流計式掃描器掃描區域內定位之第一協調控制,而且在前述加工區域到達前述電流計式掃描器掃描區域而前述XY滑台停止為止,藉由執行前述第一協調控制而使前述加工區域內的第一協調控制區域接受雷射加工,當前述加工區域到達前述電流計式掃描器掃描區域而前述XY滑台停止時,在使前述XY滑台停止之狀態下,使前述加工區域內之其餘的加工區域接受雷射加工。In order to solve the above problems, the object of the present invention is to provide a control unit for controlling an XY table and a galvanometer scanner, and the XY stage is processed. The object moves in a plane parallel to the main surface of the workpiece, that is, in the XY plane, and the galvanometer scanner causes the laser light emitted from the laser source to be in the galvano area of the galvano area. The inner portion is positioned to irradiate the laser beam onto the workpiece, and the control unit controls the XY stage so as to be set on the workpiece when laser processing is performed on the workpiece. The processing area is sequentially moved to the galvanometer scanner scanning area, and the aforementioned galvanometer scanner is controlled to Positioning the laser light relative to each of the processing regions that are moved to the scanning area of the galvanometer scanner, and moving the aforementioned processing region toward the galvanometer scanner scanning region when the processing region enters When the moving target coordinate has a predetermined distance within the in position range, the XY stage is moved while the XY stage is not stopped, so that the laser light is in the galvanometer scanner. a first coordinated control of positioning in the scanning area, and the first coordination in the processing area is performed by performing the first coordinated control until the processing area reaches the galvanometer scanner scanning area and the XY stage stops The control area receives the laser processing, and when the processing area reaches the galvanometer scanner scanning area and the XY stage stops, the remaining processing area in the processing area is accepted while the XY stage is stopped. Laser processing.
根據本發明,就會產生可容易地進行有效率的雷射加工之效果。According to the present invention, an effect of efficiently performing efficient laser processing is produced.
1‧‧‧電流計式掃描器控制器1‧‧‧ galvanometer scanner controller
2‧‧‧XY滑台控制器2‧‧‧XY slide controller
3‧‧‧加工程式記憶部3‧‧‧Processing Program Memory
4‧‧‧加工指示部4‧‧‧Processing Instructions Department
6‧‧‧雷射振盪器6‧‧‧Laser oscillator
9‧‧‧XY滑台9‧‧‧XY slide
10-1至10-N,82‧‧‧加工區域10-1 to 10-N, 82‧‧‧Processing area
11、21‧‧‧XY滑台位置資訊輸入部11, 21‧‧‧XY slide position information input section
12‧‧‧電流計式掃描器控制部12‧‧‧ galvanometer scanner control unit
22‧‧‧滑台控制部22‧‧‧Slide Control Department
40-2至40-6,41-2至41-6‧‧‧協調控制區域40-2 to 40-6, 41-2 to 41-6‧‧‧ coordinated control area
51A‧‧‧剩餘距離51A‧‧‧Remaining distance
52A‧‧‧到位資訊52A‧‧‧Information in place
53A‧‧‧照射時序資訊53A‧‧‧Irradiation timing information
81‧‧‧電流計式掃描器掃描區域81‧‧‧ galvanometer scanner scanning area
83A,83B‧‧‧到位範圍83A, 83B‧‧‧ in-range range
84A至84C‧‧‧協調控制區域84A to 84C‧‧‧ coordinated control area
100‧‧‧雷射加工裝置100‧‧‧ Laser processing equipment
200‧‧‧控制裝置200‧‧‧Control device
W‧‧‧工件W‧‧‧Workpiece
第1圖係顯示實施形態1中之雷射加工裝置的構成之圖。Fig. 1 is a view showing the configuration of a laser processing apparatus in the first embodiment.
第2圖係顯示控制裝置的構成之方塊圖。Fig. 2 is a block diagram showing the configuration of the control device.
第3圖係用來說明設定在工件上的加工區域的順序之圖。Fig. 3 is a view for explaining the order of the processing regions set on the workpiece.
第4圖係用來說明實施形態1中之雷射加工處理的處理步驟之圖。Fig. 4 is a view for explaining the processing procedure of the laser processing in the first embodiment.
第5-1圖係顯示XY滑台的移動速度之圖。Figure 5-1 shows a graph of the moving speed of the XY stage.
第5-2圖係用來說明加工區域之到目標座標的距離與到位範圍之關係之圖。Figure 5-2 is a diagram for explaining the relationship between the distance to the target coordinates of the processing area and the in-position range.
第6-1圖係顯示以往的雷射加工處理的處理步驟之圖。Fig. 6-1 is a view showing a processing procedure of a conventional laser processing.
第6-2圖係顯示實施形態1中之雷射加工處理的處理步驟之圖。Fig. 6-2 is a view showing a processing procedure of the laser processing in the first embodiment.
第7圖係顯示XY滑台的設定特性例之圖。Fig. 7 is a view showing an example of setting characteristics of the XY stage.
第8圖係用來說明XY滑台停止時的振動之圖。Fig. 8 is a view for explaining the vibration of the XY slide when it is stopped.
第9圖係用來說明剩餘距離資訊的停止時的振幅與到位範圍之關係之圖。Fig. 9 is a diagram for explaining the relationship between the amplitude at the time of stop of the remaining distance information and the in-position range.
第10圖係用來說明實施形態2中之雷射加工處理的處理步驟之圖。Fig. 10 is a view for explaining the processing procedure of the laser processing in the second embodiment.
第11圖係用來說明實施形態2中之雷射加工處理的處理步驟之圖。Fig. 11 is a view for explaining the processing procedure of the laser processing in the second embodiment.
第12圖係用來說明實施形態3中之雷射加工處理的處理步驟之圖。Fig. 12 is a view for explaining the processing procedure of the laser processing in the third embodiment.
第13圖係用來說明實施形態4中之雷射加工處理的處理步驟之圖。Fig. 13 is a view for explaining the processing procedure of the laser processing in the fourth embodiment.
第14圖係顯示XY滑台的移動速度之圖。Fig. 14 is a view showing the moving speed of the XY stage.
第15圖係顯示實施形態4中之雷射加工處理的處理步驟之圖。Fig. 15 is a view showing the processing procedure of the laser processing in the fourth embodiment.
以下,根據圖式來詳細說明本發明實施形態之加工控制裝置、雷射加工裝置及加工控制方法。不過,本發明並不受此等實施形態所限定。Hereinafter, the machining control device, the laser machining device, and the machining control method according to the embodiment of the present invention will be described in detail based on the drawings. However, the invention is not limited by the embodiments.
實施形態1.Embodiment 1.
第1圖係顯示實施形態1中之雷射加工裝置的構成之圖。雷 射加工裝置100係進行用來在後述的工件(被加工物)W形成印刷配線板的貫通孔(through hole)等之孔加工之裝置。本實施形態之雷射加工裝置100係使XY滑台9以步進方式移動,並且當XY滑台9移動而將使電流計式掃描器掃描區域(galvano area)到達希望的座標(目標座標),就在XY滑台9停止之前採取協調控制而進行雷射加工。當XY滑台9停止且電流計式掃描器掃描區域到達希望的座標,雷射加工裝置100就在使XY滑台9停止的狀態下進行雷射加工。Fig. 1 is a view showing the configuration of a laser processing apparatus in the first embodiment. mine The injection processing apparatus 100 is a device for performing hole processing such as a through hole for forming a printed wiring board on a workpiece (subject to be processed) W to be described later. The laser processing apparatus 100 of the present embodiment moves the XY stage 9 in a stepwise manner, and when the XY stage 9 moves, the galvano area of the galvano scanner is reached to the desired coordinates (target coordinates). The laser processing is performed by taking coordinated control before the XY slide table 9 is stopped. When the XY stage 9 is stopped and the galvano scanner scanning area reaches the desired coordinates, the laser processing apparatus 100 performs laser processing while the XY stage 9 is stopped.
雷射加工裝置100係具備有控制裝置(加工控制裝置)200、放大器(amplifier)31x,31y,32x,32y、馬達(motor)5x,5y、XY滑台9、電流計式掃描器Gx,Gy、及雷射振盪器(雷射光源)6。The laser processing apparatus 100 is provided with a control device (processing control device) 200, amplifiers 31x, 31y, 32x, 32y, motors 5x, 5y, XY slides 9, galvanometer scanners Gx, Gy. And a laser oscillator (laser source) 6.
控制裝置200具有控制電流計式掃描器Gx,Gy之電流計式掃描器控制器(雷射光掃描系統控制部)1、以及控制XY滑台9之XY滑台控制器(搬送系統控制部)2。控制裝置200係以讓雷射光照射在希望的雷射光照射位置之方式控制XY滑台9及電流計式掃描器Gx,Gy。The control device 200 includes a galvanometer scanner controller (laser scanning system control unit) that controls the galvanometer scanners Gx and Gy, and an XY stage controller (transport system control unit) that controls the XY stage 9 . The control device 200 controls the XY stage 9 and the galvano-type scanners Gx, Gy so that the laser beam is irradiated to the desired laser beam irradiation position.
電流計式掃描器控制器1,係將用來控制電流計式掃描器Gx,Gy之控制訊號(電流計式掃描器控制指令)輸出至放大器31x,31y。XY滑台控制器2,係將用來控制XY滑台9之控制訊號(XY滑台控制指令)輸出至放大器32x,32y。The galvanometer scanner controller 1 outputs control signals (galvanometer scanner control commands) for controlling the galvanometer scanners Gx, Gy to the amplifiers 31x, 31y. The XY stage controller 2 outputs a control signal (XY stage control command) for controlling the XY stage 9 to the amplifiers 32x, 32y.
放大器31x,31y分別將從電流計式掃描器控制器1送來的電流計式掃描器控制指令予以放大,然後傳送至電流計式掃描器Gx,Gy。放大器32x,32y分別將從XY滑台控制器2送來的XY滑台控制指令予以放大,而傳送至馬達5x,5y。The amplifiers 31x, 31y respectively amplify the galvanometer scanner control commands sent from the galvanometer scanner controller 1 and then transmit them to the galvanometer scanners Gx, Gy. The amplifiers 32x, 32y respectively amplify the XY stage control commands sent from the XY stage controller 2, and transmit them to the motors 5x, 5y.
雷射振盪器6,係輸出雷射光(脈衝輸出)將雷射光輸送至工件W之裝置,由電流計式掃描器控制器1加以控制。電流計式掃描器Gx,Gy,係使從雷射振盪器6射出的雷射光在電流計式掃描器掃描區域內定位而照射到工件W上。電流計式掃描器Gx,Gy,係藉由使雷射光掃描而使雷射光通過未圖示的f θ透鏡(f θ lens)而照射到工件W上的雷射加工位置。電流計式掃描器Gx,Gy具有與電流計式掃描器控制器1連接之編碼器(encoder)8x,8y。編碼器8x,8y係檢測出電流計式掃描器Gx,Gy的狀態(電流計式掃描器位置資訊),並將檢測出的電流計式掃描器位置資訊傳送至電流計式掃描器控制器1。The laser oscillator 6 is a device that outputs laser light (pulse output) to deliver laser light to the workpiece W, and is controlled by the galvanometer scanner controller 1. The galvanometer scanners Gx, Gy cause the laser light emitted from the laser oscillator 6 to be positioned in the scanning area of the ammeter scanner to be irradiated onto the workpiece W. The galvanometer scanners Gx and Gy irradiate the laser light to the laser processing position on the workpiece W by scanning the laser light through an f θ lens (f θ lens) (not shown). The galvanometer scanners Gx, Gy have encoders 8x, 8y connected to the galvanometer scanner controller 1. The encoders 8x, 8y detect the state of the galvanometer scanner Gx, Gy (galvanometer scanner position information), and transmit the detected galvanometer scanner position information to the galvanometer scanner controller 1 .
從雷射振盪器6輸出的雷射光的射出時序(timing)、及電流計式掃描器Gx,Gy所使雷射光照射的位置,係由電流計式掃描器控制器1根據來自編碼器8x,8y的電流計式掃描器位置資訊加以控制,以使雷射光能照射到希望開孔的位置。The timing of the laser light output from the laser oscillator 6 and the position at which the galvanometer scanners Gx and Gy illuminate the laser light are controlled by the galvanometer scanner 1 from the encoder 8x. The 8y galvanometer scanner position information is controlled so that the laser light can be illuminated to the desired opening.
馬達5x,5y,係使XY滑台9在XY平面內(與工件W的主面平行的面內)移動到按照XY滑台控制指令之位置(X,Y座標)。XY滑台9係承載工件W並且在XY平面內移動而搬送工件W。XY滑台9具備有:用來檢測出XY滑台9的X方向的位置之線性光學尺(linear scale)7x、以及用來檢測出XY滑台9的Y方向的位置之線性光學尺7y。線性光學尺7x,7y係為了精度良好地檢知XY滑台9的位置資訊(座標)而安裝於XY滑台9。The motors 5x, 5y move the XY slide 9 in the XY plane (in the plane parallel to the main surface of the workpiece W) to the position (X, Y coordinate) according to the XY slide control command. The XY slide table 9 carries the workpiece W and moves in the XY plane to convey the workpiece W. The XY stage 9 is provided with a linear scale 7x for detecting the position of the XY stage 9 in the X direction, and a linear scale 7y for detecting the position of the XY stage 9 in the Y direction. The linear optical scales 7x and 7y are attached to the XY slide table 9 in order to accurately detect the position information (coordinates) of the XY slide table 9.
本實施形態之線性光學尺7x,7y,係將檢測出的XY滑台9在XY平面內的位置資訊(XY滑台位置資訊)傳送至XY滑台控制器2及電流計式掃描器控制器1。線性光學尺7x,7y並不 是透過XY滑台控制器2而是直接將要傳給電流計式掃描器控制器1之XY滑台位置資訊傳送至電流計式掃描器控制器1。此係因為電流計式掃描器控制器1的處理週期係比XY滑台控制器2的處理週期還要高速,所以若是通過XY滑台控制器2而將線性光學尺7x,7y的位置資訊轉送至電流計式掃描器控制器1,就會產生延遲而無法進行協調控制之故。The linear optical scales 7x, 7y of the present embodiment transmit position information (XY slide position information) of the detected XY slide table 9 in the XY plane to the XY slide controller 2 and the galvanometer scanner controller. 1. Linear optical ruler 7x, 7y is not The XY stage position information to be transmitted to the galvanometer scanner controller 1 is directly transmitted to the galvanometer scanner controller 1 through the XY stage controller 2. Since the processing cycle of the galvano-scanner controller 1 is higher than the processing cycle of the XY stage controller 2, if the position information of the linear optical scales 7x, 7y is transferred through the XY stage controller 2 To the galvanometer scanner controller 1, there is a delay that cannot be coordinated.
XY滑台控制器2,係根據後述的加工程式(program)、及XY滑台位置資訊,而控制XY滑台9的位置。本實施形態之XY滑台控制器2,係將XY滑台9控制成以步進方式在XY平面內移動。具體而言,XY滑台控制器2係使承載有工件W之XY滑台9依序移動至電流計式掃描器掃描區域,而且在各加工區域進行雷射加工的期間係使XY滑台9停止。The XY slide controller 2 controls the position of the XY slide table 9 based on a machining program (program) and an XY slide position information which will be described later. In the XY stage controller 2 of the present embodiment, the XY stage 9 is controlled to move in the XY plane in a stepwise manner. Specifically, the XY stage controller 2 sequentially moves the XY stage 9 carrying the workpiece W to the galvano scanner scanning area, and the XY stage 9 is performed during the laser processing in each processing area. stop.
電流計式掃描器控制器1,係根據後述的加工程式、及XY滑台位置資訊,而控制電流計式掃描器Gx,Gy(雷射光的照射位置)。本實施形態之電流計式掃描器控制器1,係在XY滑台9開始移動後,到即將於下一個加工位置停止的預定時間前,使電流計式掃描器Gx,Gy的掃描開始而開始電流計式掃描器掃描區域內的雷射加工。The galvanometer scanner controller 1 controls the galvanometer scanners Gx and Gy (the irradiation position of the laser light) based on the machining program and the XY stage position information described later. The galvanometer scanner controller 1 of the present embodiment starts the scanning of the galvano-scanners Gx, Gy before the XY slide table 9 starts moving until a predetermined time immediately before the next machining position is stopped. The galvanometer scanner scans the laser area.
具體而言,在XY滑台9以步進方式使工件W的下一個加工區域移動到電流計式掃描器掃描區域上之際,當下一個加工區域的最前端部接近到與目標座標(電流計式掃描器掃描區域的最前端部)相距預定距離(進入到後述的到位範圍內),就開始進行協調控制。協調控制,係藉由使XY滑台9與電流計式掃描器Gx,Gy同步,而在仍使XY滑台9動作的情況下使電流計式掃 描器Gx,Gy掃描而進行雷射加工之控制。Specifically, when the XY stage 9 moves the next processing area of the workpiece W to the galvano scanner scanning area in a stepwise manner, when the foremost end portion of the next processing area approaches the target coordinates (galvanometer) The front end portion of the scanning area of the scanner is separated by a predetermined distance (into the in-position range described later), and coordinated control is started. Coordinated control, by synchronizing the XY stage 9 with the galvanometer scanners Gx, Gy, while the XY stage 9 is still operating, the galvanometer sweep The scanners Gx and Gy scan for laser processing control.
XY滑台9移動之際,XY滑台9係先加速到預定速度,然後減速直到停止。因此,下一個加工區域接近到與目標座標相距預定距離之時序,係為XY滑台9的速度變得比預定速度慢之時序。因此,在XY滑台9以步進方式使工件W上的下一個加工區域移動到電流計式掃描器掃描區域上之際,係在XY滑台9的速度變得比預定速度慢之時點(停止前),開始進行協調控制。When the XY slide table 9 is moved, the XY slide table 9 is first accelerated to a predetermined speed, and then decelerated until it stops. Therefore, the timing at which the next processing region approaches a predetermined distance from the target coordinates is the timing at which the speed of the XY stage 9 becomes slower than the predetermined speed. Therefore, when the XY stage 9 moves the next processing area on the workpiece W to the scanning area of the galvano scanner in a stepwise manner, the speed at which the speed of the XY stage 9 becomes slower than the predetermined speed ( Before stopping, start coordinated control.
如上所述,在本實施形態中,XY滑台控制器2係使XY滑台9以步進方式移動,同時電流計式掃描器控制器1係在XY滑台9(工件W)即將於下一個加工位置(電流計式掃描器掃描區域)停止之前,進行電流計式掃描器Gx,Gy與XY滑台9之協調控制。因此,只有在XY滑台9正在移動中的預定時序(XY滑台9即將停止之前的預定期間)進行協調控制。As described above, in the present embodiment, the XY slide controller 2 moves the XY slide table 9 in a stepwise manner, and the galvanometer scanner controller 1 is placed on the XY slide table 9 (workpiece W). The coordinated control of the galvanometer scanners Gx, Gy and the XY slide table 9 is performed before a machining position (the galvano scanner scanning area) is stopped. Therefore, the coordinated control is performed only at a predetermined timing in which the XY slide table 9 is moving (a predetermined period immediately before the XY slide table 9 is stopped).
第2圖係顯示控制裝置的構成之圖。控制裝置200係具備有電流計式掃描器控制器1、XY滑台控制器2、加工程式記憶部3、及加工指示部4。其中,電流計式掃描器控制器1及XY滑台控制器2係對應於申請專利範圍中記載的控制部。Fig. 2 is a view showing the configuration of the control device. The control device 200 includes a galvanometer scanner controller 1, an XY slide controller 2, a machining program storage unit 3, and a machining instruction unit 4. Among them, the galvanometer scanner controller 1 and the XY slide controller 2 correspond to the control unit described in the patent application.
加工程式記憶部3,係記憶工件W的雷射加工所要用到的加工程式之記憶體(memory)等。加工程式係由兩個加工程式所構成,其一為包含有指定XY滑台9的位置之工件位置指令等而構成之XY滑台用的加工程式,另一為包含有指定雷射加工位置給電流計式掃描器所用的加工位置指令等而構成之電流計式掃描器用的加工程式。加工指示部4,係按照兩個加工程式而將加工位置指令傳送至電流計式掃描器控制器1,將工件位置指令 傳送至XY滑台控制器2。The machining program storage unit 3 is a memory for processing a machining program to be used for laser processing of the workpiece W. The machining program is composed of two machining programs, one of which is a machining program for the XY slide including the workpiece position command specifying the position of the XY slide 9, and the other includes the specified laser machining position. A machining program for a galvanometer scanner formed by a machining position command or the like used in a galvanometer scanner. The machining instruction unit 4 transmits the machining position command to the galvanometer scanner controller 1 according to two machining programs, and the workpiece position command is executed. Transfer to the XY slide controller 2.
XY滑台控制器2具有XY滑台位置資訊輸入部21及滑台控制部22。XY滑台位置資訊輸入部21,係將從線性光學尺7x,7y傳送來的XY滑台位置資訊予以輸入,並將之傳送至滑台控制部22。滑台控制部22,係根據從加工指示部4傳送來的工件位置指令及XY滑台位置資訊而控制XY滑台9的位置。The XY slide controller 2 has an XY slide position information input unit 21 and a slide control unit 22. The XY stage position information input unit 21 inputs the XY stage position information transmitted from the linear optical scales 7x, 7y, and transmits the information to the slide table control unit 22. The slide control unit 22 controls the position of the XY slide table 9 based on the workpiece position command and the XY table position information transmitted from the machining instruction unit 4.
電流計式掃描器控制器1具有XY滑台位置資訊輸入部11及電流計式掃描器控制部12。XY滑台位置資訊輸入部11,係將從線性光學尺7x,7y傳送來的XY滑台位置資訊予以輸入,並將之傳送至電流計式掃描器控制部12。電流計式掃描器控制部12,係根據從加工指示部4傳送來的加工位置指令及XY滑台位置資訊而控制電流計式掃描器Gx,Gy(雷射光照射位置)。The galvanometer scanner controller 1 has an XY stage position information input unit 11 and a galvanometer type scanner control unit 12. The XY stage position information input unit 11 inputs the XY stage position information transmitted from the linear optical scales 7x, 7y, and transmits the information to the galvanometer scanner control unit 12. The galvanometer scanner control unit 12 controls the galvano-type scanners Gx, Gy (the laser light irradiation position) based on the machining position command and the XY table position information transmitted from the machining instruction unit 4.
控制裝置200,係包含CPU(Central Processing Unit)、ROM(Read Only Memory)、RAM(Random Access Memory)等而構成。而且,CPU係利用屬於電腦程式之加工程式而進行工件W的雷射加工控制。The control device 200 includes a CPU (Central Processing Unit), a ROM (Read Only Memory), a RAM (Random Access Memory), and the like. Further, the CPU performs laser processing control of the workpiece W by using a machining program belonging to a computer program.
在此,說明在協調控制中之XY滑台9的座標、與電流計式掃描器Gx,Gy的座標之關係。在通常的步進加工中,電流計式掃描器Gx,Gy的座標(Gx,Gy)=(0,0)時,係使加工區域定位在雷射光會照射在加工區域的中心之位置。將此加工區域的位置(XY滑台9的位置)表示成(Tx0,Ty0)=(0,0)。Here, the relationship between the coordinates of the XY stage 9 and the coordinates of the galvano-type scanners Gx and Gy in the coordinated control will be described. In the normal stepping process, when the coordinates (Gx, Gy) of the galvanometer scanner Gx, Gy = (0, 0), the processing region is positioned such that the laser light is irradiated at the center of the processing region. The position of the processing region (the position of the XY stage 9) is expressed as (Tx0, Ty0) = (0, 0).
另一方面,進行協調控制之情況,XY滑台9雖然應以(Tx,Ty)=(0,0)為目標而定位,但例如XY滑台正在X+方向移動之情況,係從(Tx,Ty)=(-1.0,0)開始為到位範圍。此時,假設想要 使雷射光照射在加工區域的中心,則電流計式掃描器Gx,Gy的座標必須為(Gx,Gy)=(-1.0,0)。亦即,XY滑台9之步進前移時之現在座標(Tx,Ty)與目標座標(Tx0,Ty0)的相差距離,可藉由使電流計式掃描器Gx,Gy動作相當於XY滑台9與目標座標的偏差份量而予以抵銷掉。On the other hand, in the case of coordinated control, the XY stage 9 should be positioned with (Tx, Ty) = (0, 0) as the target, but for example, when the XY stage is moving in the X+ direction, it is from (Tx, Ty)=(-1.0,0) starts as the in-position range. At this point, suppose you want When the laser light is irradiated to the center of the processing area, the coordinates of the galvanometer scanner Gx, Gy must be (Gx, Gy) = (-1.0, 0). That is, the distance between the current coordinates (Tx, Ty) and the target coordinates (Tx0, Ty0) when the stepping of the XY slide table 9 is advanced can be made equivalent to XY slip by causing the galvanometer scanner Gx, Gy to operate. The deviation of the table 9 from the target coordinates is offset.
如此地控制電流計式掃描器Gx,Gy,即使雷射光之照射需要時間(數微秒至數十微秒)也可使電流計式掃描器Gx,Gy一邊與XY滑台9連動一邊動作,結果就可防止雷射加工孔變橢圓、或位置偏移。XY滑台9與電流計式掃描器Gx,Gy之同步方法,可採用專利文獻1中記載之方法等。By controlling the galvanometer scanners Gx and Gy in this manner, even if it takes time (a few microseconds to several tens of microseconds) to irradiate the laser light, the galvanometer scanners Gx and Gy can be operated while being interlocked with the XY slider 9. As a result, it is possible to prevent the laser processing hole from becoming elliptical or positionally offset. In the method of synchronizing the XY stage 9 and the galvano-type scanners Gx and Gy, the method described in Patent Document 1 or the like can be employed.
接著,針對設定在工件W上之各加工區域的加工順序進行說明。各加工區域的加工順序,係預先設定在電流計式掃描器用的加工程式內。第3圖係用來說明設定在工件W上之各加工區域的加工順序之圖。Next, the processing sequence of each processing region set on the workpiece W will be described. The processing order of each processing area is set in advance in the processing program for the galvanometer scanner. Fig. 3 is a view for explaining the processing sequence of each processing region set on the workpiece W.
本實施形態,係藉由在工件W設定複數個加工區域,而利用複數個加工區域來分割工件W上的區域。第3圖係顯示利用在X軸方向及Y軸方向排列之格子狀的加工區域來分割工件W上的區域之情況的工件W的俯視圖。其中之加工區域10-1,10-2,...,10-N(N為自然數)的大小係對應於電流計式掃描器掃描區域的大小。In the present embodiment, a plurality of processing regions are set in the workpiece W, and a plurality of processing regions are used to divide the region on the workpiece W. Fig. 3 is a plan view showing a workpiece W in a case where a region on the workpiece W is divided by a lattice-shaped processing region arranged in the X-axis direction and the Y-axis direction. The size of the processing regions 10-1, 10-2, ..., 10-N (N is a natural number) corresponds to the size of the scanning area of the galvano scanner.
要對工件W進行雷射加工之際,係使XY滑台9在XY平面內以讓各加工區域依序成為電流計式掃描器掃描區域之方式移動。例如,在加工區域10-1進行完雷射加工之後,XY滑台9移動以使下一個加工區域10-2成為電流計式掃描器掃描區 域。然後,在加工區域10-2進行完雷射加工之後,XY滑台9移動以使加工區域10-3成為電流計式掃描器掃描區域。對於工件W進行雷射加工之際,係重複進行使電流計式掃描器掃描區域移動至加工區域之處理、以及在加工區域內之雷射加工處理。When the workpiece W is subjected to laser processing, the XY stage 9 is moved in the XY plane so that each processing area sequentially becomes a galvano scanner scanning area. For example, after the laser processing is performed in the processing area 10-1, the XY stage 9 is moved to make the next processing area 10-2 a galvanometer scanner scanning area. area. Then, after the laser processing is performed in the processing region 10-2, the XY slider 9 is moved to make the processing region 10-3 a galvanometer scanner scanning region. When the workpiece W is subjected to laser processing, the process of moving the scanning area of the galvanometer scanner to the processing area and the laser processing in the processing area are repeated.
接著,針對實施形態1中之雷射加工處理的處理步驟進行說明。第4圖係用來說明實施形態1中之雷射加工處理的處理步驟之圖。在此,係針對以加工區域10-1至加工區域10-6之順序進行雷射加工之情況進行說明。Next, the processing procedure of the laser processing in the first embodiment will be described. Fig. 4 is a view for explaining the processing procedure of the laser processing in the first embodiment. Here, the case where laser processing is performed in the order of the processing region 10-1 to the processing region 10-6 will be described.
在加工區域10-1進行完雷射加工之後,XY滑台9移動以使加工區域10-2成為電流計式掃描器掃描區域。XY滑台9開始移動,XY滑台9就開始加速。然後,當XY滑台9到達預定的速度,就結束XY滑台9之加速,而XY滑台9以預定的速度繼續移動。然後,要使XY滑台9停止之際,開始使XY滑台9減速。XY滑台9的速度減到變為0,XY滑台9就停止。After the laser processing is performed in the processing area 10-1, the XY stage 9 is moved to make the processing area 10-2 a galvano scanner scanning area. The XY slide table 9 starts moving, and the XY slide table 9 starts to accelerate. Then, when the XY stage 9 reaches the predetermined speed, the acceleration of the XY stage 9 is ended, and the XY stage 9 continues to move at a predetermined speed. Then, when the XY slide table 9 is stopped, the XY slide table 9 is started to be decelerated. When the speed of the XY slide table 9 is reduced to 0, the XY slide table 9 is stopped.
在本實施形態中,控制裝置200係在XY滑台9開始減速後,加工區域接近到與目標座標相距預定距離之時點,開始進行協調控制。換言之,控制裝置200係在加工區域與目標座標之間的距離的差(到目標座標之距離)變到預定值以下之時點開始進行協調控制。以此方式,當加工區域進入到與目標座標相距有預定的距離之到位(in position)範圍內,就使協調控制開始。In the present embodiment, the control device 200 starts the coordinated control when the XY stage 9 starts decelerating and the machining area approaches a predetermined distance from the target coordinate. In other words, the control device 200 starts the coordinated control when the difference in the distance between the processing region and the target coordinates (the distance to the target coordinate) becomes less than a predetermined value. In this way, coordinated control begins when the processing region enters the in position range by a predetermined distance from the target coordinate.
然後,一直到XY滑台9停止為止的期間,控制裝置200進行電流計式掃描器Gx,Gy與XY滑台9之協調控制。換言之,在到位範圍內,係一直到XY滑台9停止為止的期間,都進行協調控制。到位範圍,係根據例如XY滑台9的移動速度、 電流計式掃描器Gx,Gy所做的定位的速度等而設定。Then, the control device 200 performs coordinated control of the galvano-scan scanners Gx, Gy and the XY slide table 9 until the XY slide table 9 is stopped. In other words, in the in-position range, the coordinated control is performed until the XY slide table 9 is stopped. The in-position range is based on, for example, the moving speed of the XY slide table 9, The speed of the positioning of the galvanometer scanner Gx, Gy, etc. is set.
進行協調控制之區域(協調控制區域),係加工區域內的一部分的區域。例如,使加工區域之中之移動方向的前端部作為協調控制區域。第4圖中以協調控制區域40-2至40-6來表示加工區域10-2至10-6的各協調控制區域。The area where the coordinated control is performed (coordinated control area) is the area of a part of the processing area. For example, the front end portion of the moving direction in the processing region is used as the coordinated control region. In Fig. 4, the coordinated control regions of the processing regions 10-2 to 10-6 are indicated by the coordinated control regions 40-2 to 40-6.
例如,在加工區域10-1的整個區域都進行完雷射加工後,XY滑台9開始移動以使加工區域10-2成為電流計式掃描器掃描區域。然後,當加工區域10-2進入到位範圍內,一直到XY滑台9停止為止的期間,藉由進行協調控制而對於加工區域10-2內的協調控制區域40-2進行雷射加工。然後,在XY滑台9停止後,在XY滑台9停止的狀態下對於加工區域10-2之中之協調控制區域40-2以外的區域進行雷射加工。For example, after laser processing is performed over the entire area of the processing area 10-1, the XY stage 9 starts moving to make the processing area 10-2 a galvanometer scanner scanning area. Then, when the processing region 10-2 enters the in-position range, the coordinated control region 40-2 in the processing region 10-2 is subjected to laser processing by the coordinated control until the XY slider 9 is stopped. Then, after the XY slide table 9 is stopped, laser processing is performed on a region other than the coordinated control region 40-2 in the processing region 10-2 while the XY slide table 9 is stopped.
然後,在加工區域10-2的整個區域都進行完雷射加工後,XY滑台9開始移動以使加工區域10-3成為電流計式掃描器掃描區域。然後,利用與加工區域10-2一樣之處理,依序對於加工區域10-3至10-6進行雷射加工。此外,到位範圍與協調控制區域,並不一定要為同一區域,協調控制區域可為任何區域。Then, after the laser processing is completed in the entire area of the processing region 10-2, the XY slider 9 starts moving to make the processing region 10-3 a galvanometer scanner scanning region. Then, laser processing is sequentially performed on the processing regions 10-3 to 10-6 by the same processing as the processing region 10-2. In addition, the in-position range and the coordinated control area do not have to be the same area, and the coordinated control area can be any area.
第5-1圖係顯示XY滑台的移動速度之圖,第5-2圖係用來說明加工區域之到目標座標的距離與到位範圍之關係之圖。第5-1圖的橫軸為時間,縱軸為XY滑台9的移動速度。如第5-1圖所示,XY滑台9係一開始移動就進行預定時間之加速。加速後,XY滑台9到達預定的速度。然後,當加工區域接近目標座標,XY滑台9就開始減速。利用此減速,XY滑台9使加工區域在目標座標停止。Fig. 5-1 is a diagram showing the moving speed of the XY stage, and Fig. 5-2 is a diagram for explaining the relationship between the distance to the target coordinate of the processing area and the in-position range. The horizontal axis of Fig. 5-1 is time, and the vertical axis is the moving speed of the XY stage 9. As shown in Fig. 5-1, the XY slide table 9 is accelerated for a predetermined time as soon as it starts moving. After the acceleration, the XY stage 9 reaches a predetermined speed. Then, as the processing area approaches the target coordinate, the XY stage 9 begins to decelerate. With this deceleration, the XY stage 9 stops the machining area at the target coordinate.
本實施形態,係在XY滑台9變到比預定速度慢之後,一直到XY滑台9停止為止的期間(加工區域進入到位範圍內的期間)(時間範圍71)進行協調控制。In the present embodiment, after the XY slide table 9 is changed to be slower than the predetermined speed, the period until the XY slide table 9 is stopped (the period in which the machining region enters the in-position range) (time range 71) is coordinated.
第5-2圖中顯示:表示加工區域之到目標座標的距離之剩餘距離51A、表示是否在到位(in position)中之到位資訊52A、以及表示照射雷射光的時序之照射時序資訊53A。剩餘距離51A係對應於加工區域的現在位置。Fig. 5-2 shows the remaining distance 51A indicating the distance from the processing region to the target coordinates, the in-position information 52A indicating whether or not the in-position is in position, and the irradiation timing information 53A indicating the timing of irradiating the laser light. The remaining distance 51A corresponds to the current position of the processing area.
隨著XY滑台9的移動,剩餘距離51A的值變小,然後在XY滑台9停止的時點,剩餘距離51A變為0。在剩餘距離51A變小的過程中,剩餘距離51A變小到預定值,加工區域就進入到到位範圍內。到位範圍,係進行協調控制之範圍,係為例如從目標座標分別向X方向及Y方向±1mm之範圍。As the XY slide table 9 moves, the value of the remaining distance 51A becomes small, and then the remaining distance 51A becomes 0 at the time point when the XY slide table 9 is stopped. In the process in which the remaining distance 51A becomes smaller, the remaining distance 51A becomes smaller to a predetermined value, and the processed area enters the in-position range. The range in which the coordinated control is performed is, for example, a range of ±1 mm from the target coordinates to the X direction and the Y direction.
加工區域進入到位範圍,到位資訊52A就變為表示正在到位中之狀態(High)。到位資訊52A變為表示正在到位中之狀態,就為可進行雷射加工之狀態,所以開始進行採用協調控制之雷射加工。開始雷射加工,就如照射時序資訊53A所示,在預定的時序使雷射光照射至工件W。在此情況,電流計式掃描器控制器1係設想XY滑台9係停止在目標位置的而控制電流計式掃描器Gx,Gy。When the machining area enters the in-position range, the in-position information 52A becomes a state indicating that it is in place (High). Since the in-position information 52A is in a state in which it is in the position, it is in a state in which laser processing is possible, so laser processing using coordinated control is started. The laser processing is started, and as shown by the illumination timing information 53A, the laser light is irradiated to the workpiece W at a predetermined timing. In this case, the galvanometer scanner controller 1 assumes that the XY stage 9 is stopped at the target position and controls the galvanometer scanners Gx, Gy.
例如,假設XY滑台9的最高移動速度為50m/min,XY滑台9的加減速時間為100msec(梯形加減速)。以及,假設加工區域為四邊皆為50mm之正方形,到位範圍為±1mm。在此情況,為了使電流計式掃描器掃描區域從加工區域移動到下一個加工區域,XY滑台9必須移動50mm。而且,50mm的移動時間為 0.2sec。這是因為:50mm之移動的情況下,XY滑台9不會達到最高速度,而是以500mm/sec為頂點之三角波形的緣故。For example, assume that the maximum moving speed of the XY stage 9 is 50 m/min, and the acceleration/deceleration time of the XY stage 9 is 100 msec (trapezoidal acceleration/deceleration). And, assuming that the processing area is a square of 50 mm on all four sides, the in-position range is ±1 mm. In this case, in order to move the galvano scanner scanning area from the processing area to the next processing area, the XY stage 9 must be moved by 50 mm. Moreover, the moving time of 50mm is 0.2 sec. This is because, in the case of a movement of 50 mm, the XY stage 9 does not reach the maximum speed, but a triangular waveform with a vertex of 500 mm/sec.
在此情況,XY滑台9停止之際,從剩餘距離51A進入到位範圍到停止為止之時間,會為0.02sec。因此,假設到位範圍為±1mm,且一進入此範圍就立刻使電流計式掃描器Gx,Gy動作而開始進行雷射加工的話,每一個加工區域就會縮短0.02sec之加工時間。In this case, when the XY slide table 9 is stopped, the time from the remaining distance 51A to the in-position range to the stop is 0.02 sec. Therefore, assuming that the in-position range is ±1 mm, and as soon as the galvanometer scanner Gx, Gy is operated to start laser processing as soon as this range is entered, the processing time of each processing area is shortened by 0.02 sec.
第6-1圖係顯示以往的雷射加工處理的處理步驟之圖,第6-2圖係顯示實施形態1中之雷射加工處理的處理步驟之圖。第6-1圖及第6-2圖顯示的是工件W的斷面圖。Fig. 6-1 is a view showing a processing procedure of a conventional laser processing, and Fig. 6-2 is a view showing a processing procedure of the laser processing in the first embodiment. Figures 6-1 and 6-2 show cross-sectional views of the workpiece W.
如第6-1圖所示,工件W上的加工區域82在電流計式掃描器掃描區域81外之情況(S1),並不進行雷射加工。然後,在工件W上的加工區域82進入到電流計式掃描器掃描區域81內之情況(S2),在加工區域82整個進入電流計式掃描器掃描區域81內之前,都不進行雷射加工。然後,加工區域82整個進入電流計式掃描器掃描區域81內(S3),就在加工區域82停止的狀態下開始進行雷射加工。As shown in Fig. 6-1, in the case where the processing region 82 on the workpiece W is outside the galvano scanner scanning region 81 (S1), laser processing is not performed. Then, in the case where the processing region 82 on the workpiece W enters the galvanometer scanner scanning region 81 (S2), no laser processing is performed until the processing region 82 enters the galvano scanner scanning region 81 as a whole. . Then, the entire processing area 82 enters the galvanometer scanner scanning area 81 (S3), and laser processing is started in a state where the processing area 82 is stopped.
如第6-2圖所示,就本實施形態而言,工件W上的加工區域82在電流計式掃描器掃描區域81外之情況(S11),並不進行雷射加工。然後,即使是在工件W上的加工區域82進入到電流計式掃描器掃描區域81內之情況(S12),在加工區域82進入到位範圍83A內之前,都不進行雷射加工。As shown in Fig. 6-2, in the present embodiment, the processing region 82 on the workpiece W is outside the galvano-scan scanner scanning region 81 (S11), and laser processing is not performed. Then, even if the processing region 82 on the workpiece W enters the galvano-scan scanner scanning region 81 (S12), the laser processing is not performed until the processing region 82 enters the in-position range 83A.
然後,加工區域82進入到位範圍83A內(S13),就在加工區域82仍在移動的狀態下,控制裝置200開始進行雷射加工 的協調控制。例如,當XY滑台9移動到目標座標的附近(例如1mm之前),就開始採用協調控制之電流計式掃描器掃描加工。雷射加工之協調控制,係針對協調控制區域84A而進行。此處的加工區域82係對應於第4圖所示之加工區域10-1至10-6等,協調控制區域84A係對應於第4圖所示之協調控制區域40-2至40-6等。對於協調控制區域84A之電流計式掃描器掃描加工,係如例如第6-2圖所示,從XY滑台9的行進方向開始實施。Then, the processing region 82 enters the in-position range 83A (S13), and just as the processing region 82 is still moving, the control device 200 starts laser processing. Coordinated control. For example, when the XY slide 9 is moved to the vicinity of the target coordinates (for example, before 1 mm), the galvano-scan scanner processing using coordinated control is started. The coordinated control of the laser processing is performed for the coordinated control region 84A. The processing area 82 here corresponds to the processing areas 10-1 to 10-6 shown in FIG. 4, and the coordinated control area 84A corresponds to the coordinated control areas 40-2 to 40-6 shown in FIG. . The galvanometer scanner scanning processing for the coordinated control region 84A is performed from the traveling direction of the XY slider 9 as shown in, for example, FIG. 6-2.
控制裝置200,係在雷射加工的協調控制開始之後,若加工區域82整個進入電流計式掃描器掃描區域81內(S14),就使雷射加工在加工區域82為停止之狀態下繼續。此時,協調控制區域84A的雷射加工已經完成,所以控制裝置200係使協調控制區域84A以外的加工區域接受雷射加工。因此,與以往相比較可使加工時間縮短協調控制區域84A的加工時間之值。The control device 200 causes the laser processing to continue in the state where the machining region 82 is stopped, after the machining region 82 is entirely entered into the galvano scanner scanning region 81 after the start of the coordinated control of the laser machining (S14). At this time, since the laser processing of the coordinated control region 84A has been completed, the control device 200 accepts the laser processing in the processing region other than the coordinated control region 84A. Therefore, the processing time can be shortened by the processing time of the coordinated control region 84A as compared with the related art.
控制裝置200,係不管是XY滑台9正在移動的情況或是已停止的情況,都將電流計式掃描器目標座標減掉XY滑台9的現在位置與XY滑台9的定位位置之誤差而使雷射光照射。The control device 200 subtracts the error between the current position of the XY stage 9 and the positioning position of the XY stage 9 regardless of whether the XY stage 9 is moving or stopped. And the laser light is irradiated.
到位範圍,並不限於±1mm,亦可為比±1mm窄之範圍,或為比±1mm寬之範圍。電流計式掃描器掃描區域的X方向的長度為x之情況,X方向的到位範圍可設定為比x/2短之距離。同樣的,電流計式掃描器掃描區域的Y方向的長度為y之情況,Y方向的到位範圍可設定為比y/2短之距離。The in-position range is not limited to ±1 mm, and may be a range narrower than ±1 mm or a range wider than ±1 mm. When the length of the scanning area of the galvanometer scanner in the X direction is x, the in-position range of the X direction can be set to be shorter than x/2. Similarly, the length of the scanning area of the galvanometer scanner in the Y direction is y, and the range of the Y direction is set to be shorter than y/2.
不過,實際的XY滑台9的設定特性,會有如例如第7圖所示的特性之情況。第7圖係顯示XY滑台的設定特性之圖。第7圖顯示的是到位範圍為±5μm之情況之剩餘距離51B、 到位資訊52B、以及照射時序資訊53B。However, the setting characteristics of the actual XY slide table 9 may have characteristics as shown in, for example, FIG. Fig. 7 is a view showing the setting characteristics of the XY stage. Figure 7 shows the remaining distance 51B in the case where the in-position range is ±5μm, The in-place information 52B and the illumination timing information 53B.
XY滑台9係為例如質量300Kg至500Kg之平台,非常地重,所以無法急遽停止。因此,XY滑台9係如剩餘距離51B所示,速度慢慢地降低然後停止。因此,在以一定的比率將速度降低之情況下使加工區域進入到位範圍之情況、與在慢慢地將速度降低之情況下使加工區域進入到位範圍之情況,其進入到位範圍所需的時間會有差異。此時間之差異即為設定延遲時間,係為例如300μsec。The XY slide table 9 is, for example, a platform having a mass of 300 kg to 500 kg, and is very heavy, so that it cannot be stopped suddenly. Therefore, the XY stage 9 is as shown by the remaining distance 51B, and the speed is gradually lowered and then stopped. Therefore, when the machining area is brought into the in-position range with a certain speed reduction, and the machining area is brought into the in-position range with the speed being lowered slowly, the time required to enter the in-position range There will be differences. The difference in this time is the set delay time, which is, for example, 300 μsec.
加工區域進入到位範圍之後,XY滑台9也是慢慢降低速度然後停止。因此,從加工區域進入到位範圍開始到XY滑台9停止為止的時間,在以一定的比率使速度降低之情況、與在慢慢地使速度降低之情況會有時間差。例如,在慢慢地使速度降低之情況,從加工區域進入到位範圍開始到XY滑台9停止為止需要0.05sec。After the machining area enters the in-position range, the XY slide table 9 also slowly decreases the speed and then stops. Therefore, there is a time lag between when the machining region enters the in-position range and when the XY slide table 9 is stopped, when the speed is lowered at a constant rate and when the speed is gradually decreased. For example, in the case where the speed is gradually lowered, it takes 0.05 sec from the time when the processing area enters the in-position range until the XY stage 9 is stopped.
因此,從XY滑台9停止之後才開始進行雷射加工之情況、與加工區域進入到位範圍之後就開始進行雷射加工之情況,兩者有0.05sec之差。所以,採用本實施形態之雷射加工方法,可在每一個加工區域縮短0.05sec之加工時間。Therefore, the laser processing is started after the XY slide table 9 is stopped, and the laser processing is started after the machining region enters the in-position range, and the difference therebetween is 0.05 sec. Therefore, with the laser processing method of the present embodiment, the processing time of 0.05 sec can be shortened in each processing region.
加工區域進入到位範圍,到位資訊52B就成為表示正在到位中之狀態(例如High)。到位資訊52B變為表示正在到位中之狀態,就為可進行雷射加工之狀態,所以開始進行採用協調控制之雷射加工。開始雷射加工,就如照射時序資訊53B所示,在預定的時序使雷射光照射至工件W。When the processing area enters the in-position range, the in-position information 52B becomes a state indicating that it is in place (for example, High). Since the in-position information 52B is in a state in which it is in the position, it is in a state in which laser processing is possible, so laser processing using coordinated control is started. The laser processing is started, and as shown by the illumination timing information 53B, the laser light is irradiated to the workpiece W at a predetermined timing.
XY滑台9在XY滑台9的滾珠螺桿(ball screw)的背 隙(backlash)增大了之情況、地板剛性不夠高之情況等,在停止時會有振動之情形。第8圖係用來說明XY滑台之停止時的振動之圖。第8圖顯示的是XY滑台9停止時發生振之情況之剩餘距離51C、到位資訊52C、以及照射時序資訊53C。The XY slide table 9 is on the back of the ball screw of the XY slide table 9. When the backlash is increased, the rigidity of the floor is not high enough, etc., there is vibration when it stops. Fig. 8 is a view for explaining the vibration at the time of stopping the XY slide. Fig. 8 shows the remaining distance 51C, the in-position information 52C, and the irradiation timing information 53C in the case where the oscillation occurs when the XY slide table 9 is stopped.
XY滑台9停止時發生振動之情況,XY滑台9會重複加工區域短暫進入到位範圍後又跑到到位範圍外之振盪的動作。When the XY slide table 9 stops vibrating, the XY slide table 9 repeats the action of the oscillation of the machining area briefly entering the in-position range and then running outside the in-position range.
在如此的情況,若不對於XY滑台9的振動及照射雷射光的時序進行協調控制,就會因為忽視XY滑台9的振動而照射雷射光,使得雷射光的照射位置發生偏差。In such a case, if the vibration of the XY stage 9 and the timing of the irradiation of the laser light are not coordinated, the laser beam is irradiated with the vibration of the XY stage 9 and the irradiation position of the laser beam is shifted.
若將到位範圍設定為比剩餘距離51C的停止時的振幅(XY滑台9的振動幅度)小之範圍(例如±5μm),則到位資訊52C在XY滑台9之停止時會重複在High與Low之間變動。When the in-position range is set to be smaller than the amplitude at the stop of the remaining distance 51C (the vibration amplitude of the XY stage 9) (for example, ±5 μm), the in-position information 52C is repeated at High when the XY slide table 9 is stopped. Change between Low.
具體而言,加工區域進入到位範圍內,到位資訊52C就暫時為High,加工區域跑到到位範圍外,到位資訊52C就變為Low。Specifically, the processing area enters the in-position range, and the in-position information 52C is temporarily High, and the processing area runs out of the in-position range, and the in-position information 52C becomes Low.
然後,當到位資訊52C變為High,就成為可進行雷射加工之狀態,所以會開始進行採用協調控制之雷射加工,當到位資訊52C變為Low,就成為不進行雷射加工之狀態,所以使雷射加工停止。雷射加工開始,就會按照如照射時序資訊53C所示之預定的時序使雷射光照射至工件W,但是在要照射雷射光之時序若加工區域超出到位範圍,就會有雷射光的照射位置發生偏移之情形。Then, when the in-position information 52C is turned to High, the laser processing is possible. Therefore, the laser processing using the coordinated control is started, and when the in-position information 52C is Low, the laser processing is not performed. So stop the laser processing. At the beginning of the laser processing, the laser light is irradiated to the workpiece W at a predetermined timing as indicated by the illumination timing information 53C, but if the processing region is out of the in-position range at the timing of irradiating the laser light, there is a laser light irradiation position. The situation where an offset occurs.
因此,本實施形態係在XY滑台9會於停止時振動 之情況,將到位範圍設定為比剩餘距離51C的停止時的振幅大之範圍(例如±1mm)後,才在到位範圍內進行協調控制。Therefore, this embodiment vibrates when the XY slide table 9 stops. In the case where the in-position range is set to be larger than the amplitude at the stop of the remaining distance 51C (for example, ±1 mm), the coordinated control is performed in the in-position range.
第9圖係用來說明剩餘距離資訊的停止時的振幅與到位範圍之關係之圖。第9圖顯示的是將到位範圍設定為比剩餘距離51D的停止時的振幅大之範圍之情況之剩餘距離51D、到位資訊52D、以及照射時序資訊53D。此處之剩餘距離51D係與第8圖所示之剩餘距離51C相同。Fig. 9 is a diagram for explaining the relationship between the amplitude at the time of stop of the remaining distance information and the in-position range. Fig. 9 shows the remaining distance 51D, the in-position information 52D, and the irradiation timing information 53D in the case where the in-position range is set to be larger than the amplitude at the stop of the remaining distance 51D. The remaining distance 51D here is the same as the remaining distance 51C shown in FIG.
藉由將到位範圍設定為比剩餘距離51D的停止時的振幅大之範圍,則即使XY滑台9在停止時振動,也可防止加工區域短暫進入到位範圍後又跑到到位範圍外之情形。以及,即使在XY滑台9發生振動之情況,電流計式掃描器Gx,Gy也是考慮XY滑台9的位置座標而進行定位,所以可透過加工位置精度來抵銷(cancel)XY滑台9的振動。By setting the in-position range to a range larger than the amplitude at the stop of the remaining distance 51D, even if the XY stage 9 vibrates at the time of stopping, it is possible to prevent the machining area from temporarily entering the in-position range and then running out of the in-position range. Further, even when the XY slide table 9 vibrates, the galvanometer scanners Gx and Gy are positioned in consideration of the position coordinates of the XY slide table 9, so that the XY slide table 9 can be canceled by the machining position accuracy. Vibration.
加工區域進入到位範圍,到位資訊52D就會變為High。到位資訊52D變為High,就成為可進行雷射加工之狀態,所以會開始進行利用協調控制之雷射加工。雷射加工開始,就會按照如照射時序資訊53D所示以預定的時序使雷射光照射至工件W。When the processing area enters the in-position range, the in-position information 52D will become High. When the in-position information 52D is turned to High, the laser processing is possible, and laser processing using coordinated control is started. At the start of the laser processing, the laser light is irradiated to the workpiece W at a predetermined timing as indicated by the illumination timing information 53D.
到位範圍在X方向及Y方向可設定為不同的範圍。此外,亦可根據使加工區域移動之際之XY滑台9的移動距離、XY滑台9停止之際的減速度等而設定到位範圍。The in-position range can be set to a different range in the X direction and the Y direction. Further, the in-position range may be set in accordance with the moving distance of the XY slide table 9 when the machining region is moved, the deceleration when the XY slide table 9 is stopped, or the like.
進行協調控制之時序,可根據XY滑台9的移動速度而設定。例如,控制裝置200在XY滑台9的移動速度在預定值以下之情況進行協調控制。進行協調控制之時序係亦可根據要 在工件W上形成之孔的形狀(真圓度等)而設定。The timing of the coordinated control can be set according to the moving speed of the XY stage 9. For example, the control device 200 performs coordinated control in a case where the moving speed of the XY slide table 9 is equal to or lower than a predetermined value. The timing of coordinated control can also be based on It is set in the shape (roundness, etc.) of the hole formed in the workpiece W.
如上所述,根據實施形態1,雷射加工裝置100在以步進方式為基礎(base)的情況下加入協調控制的元素。因此,不會使CAM資料的演算法複雜化,可容易地實現協調控制。而且,因為採用協調控制所以可減少加工循環時間(cycle time)。因此,可容易地進行有效率的雷射加工。此外,由於將到位範圍設定為比剩餘距離51D的停止時的振幅大之範圍,所以可做到加工位置精度之提高。As described above, according to the first embodiment, the laser processing apparatus 100 adds the elements of the coordinated control in the case of the stepping method. Therefore, the algorithm of the CAM data is not complicated, and the coordinated control can be easily realized. Moreover, since the coordinated control is employed, the cycle time can be reduced. Therefore, efficient laser processing can be easily performed. Further, since the in-position range is set to be larger than the amplitude at the stop of the remaining distance 51D, the accuracy of the machining position can be improved.
另外,由於以加工區域之中之移動方向的前端部作為協調控制區域,所以可在採用協調控制之雷射加工之後,針對其餘的加工區域有效率地決定雷射光的照射位置。Further, since the front end portion in the moving direction of the processing region is used as the coordinated control region, it is possible to efficiently determine the irradiation position of the laser light for the remaining processing regions after the laser processing using the coordinated control.
實施形態2.Embodiment 2.
接著,利用第10及11圖來說明本發明之實施形態2。實施形態2係以加工區域之中之移動方向的後端部作為協調控制區域,然後以與實施形態1一樣的處理步驟進行雷射加工。Next, a second embodiment of the present invention will be described using the tenth and eleventh drawings. In the second embodiment, the rear end portion in the moving direction of the processing region is used as the coordinated control region, and then the laser processing is performed in the same processing procedure as in the first embodiment.
第10圖係用來說明實施形態2中之雷射加工處理的處理步驟之圖。在此,針對以加工區域10-1至加工區域10-6之順序進行雷射加工之情況進行說明。在本實施形態中,雷射加工裝置100與實施形態1之情況一樣進行XY滑台9的移動處理及協調控制處理。Fig. 10 is a view for explaining the processing procedure of the laser processing in the second embodiment. Here, a case where laser processing is performed in the order of the processing region 10-1 to the processing region 10-6 will be described. In the present embodiment, the laser processing apparatus 100 performs the movement processing and the coordinated control processing of the XY stage 9 as in the case of the first embodiment.
本實施形態之協調控制區域,係為加工區域之中之移動方向的後端部。第10圖中顯示以協調控制區域41-2至41-6作為加工區域10-1至10-6的各協調控制區域。The coordinated control region of this embodiment is a rear end portion of the moving direction in the processing region. The coordinated control regions in which the coordinated control regions 41-2 to 41-6 are used as the processing regions 10-1 to 10-6 are shown in Fig. 10.
例如,在加工區域10-1的整個區域都進行完雷射加 工後,XY滑台9開始移動以使加工區域10-2成為電流計式掃描器掃描區域。然後,當加工區域10-2進入到位範圍內,一直到XY滑台9停止為止的期間,進行協調控制而對於加工區域10-2內的協調控制區域41-2進行雷射加工。然後,在XY滑台9停止後,在XY滑台9停止的狀態下對於加工區域10-2之中之協調控制區域41-2以外的區域進行雷射加工。在加工區域10-2的整個區域都進行完雷射加工後,依序對於加工區域10-3至10-6進入雷射加工。For example, the laser is applied to the entire area of the processing area 10-1. After the work, the XY stage 9 starts moving to make the processing area 10-2 a galvanometer scanner scanning area. Then, when the processing region 10-2 enters the in-position range, the coordinated control is performed until the XY slider 9 is stopped, and the coordinated control region 41-2 in the processing region 10-2 is subjected to laser processing. Then, after the XY slide table 9 is stopped, laser processing is performed on a region other than the coordinated control region 41-2 in the processing region 10-2 while the XY slide table 9 is stopped. After the laser processing is performed on the entire area of the processing region 10-2, the laser processing is sequentially performed for the processing regions 10-3 to 10-6.
第11圖係顯示實施形態2中之雷射加工處理的處理步驟之圖。第11圖顯示的是工件W的斷面圖。第11圖所示之處理(S21)至(S22),係為與實施形態1之利用第6-2圖說明過之處理(S11)至(S12)一樣之處理。亦即,工件W上的加工區域82在電流計式掃描器掃描區域81外之情況(S21),並不進行雷射加工。然後,在工件W上的加工區域82進入到電流計式掃描器掃描區域81內之情況(S22),在加工區域82進入到位範圍83B內之前,都不進行雷射加工。Fig. 11 is a view showing a processing procedure of the laser processing in the second embodiment. Figure 11 shows a cross-sectional view of the workpiece W. The processes (S21) to (S22) shown in Fig. 11 are the same as the processes (S11) to (S12) described in the sixth embodiment with reference to Fig. 6-2. That is, in the case where the processing region 82 on the workpiece W is outside the galvano-scan scanner scanning region 81 (S21), laser processing is not performed. Then, in the case where the processing region 82 on the workpiece W enters the galvano scanner scanning region 81 (S22), no laser processing is performed until the processing region 82 enters the in-position range 83B.
然後,加工區域82進入到位範圍83B內(S23),就在加工區域82仍在移動的狀態下,控制裝置200開始進行雷射加工之協調控制。雷射加工之協調控制,係針對協調控制區域84B而進行(S24)。此處的協調控制區域84B係對應於第10圖所示之協調控制區域41-2至41-6等。Then, the processing region 82 enters the in-position range 83B (S23), and the control device 200 starts the coordinated control of the laser processing while the processing region 82 is still moving. The coordinated control of the laser processing is performed for the coordinated control region 84B (S24). Here, the coordinated control area 84B corresponds to the coordinated control areas 41-2 to 41-6 and the like shown in FIG.
控制裝置200,係在雷射加工的協調控制開始之後,若加工區域82整個進入電流計式掃描器掃描區域81內(S25),就在使XY滑台9停止之狀態下使雷射加工繼續。此時,協調控制 區域84B的雷射加工已經完成,所以控制裝置200係使協調控制區域84B以外的加工區域接受雷射加工。因此,與以往相比較可使加工時間縮短協調控制區域84B的加工時間之值。The control device 200 causes the laser processing to continue in the state where the XY stage 9 is stopped, if the entire processing area 82 enters the galvano scanner scanning area 81 after the start of the coordinated control of the laser processing (S25). . At this time, coordinated control Since the laser processing of the area 84B has been completed, the control device 200 accepts the laser processing in the processing area other than the coordinated control area 84B. Therefore, the processing time can be shortened by the processing time of the coordinated control region 84B as compared with the related art.
如上所述,根據實施形態2,雷射加工裝置100在以步進方式為基礎(base)的情況下加入協調控制的元素,所以與實施形態1一樣,可容易地實現協調控制。而且,因為採用協調控制所以可減少加工循環時間(cycle time)。As described above, according to the second embodiment, the laser processing apparatus 100 adds the elements of the coordinated control in the case of the stepping method. Therefore, as in the first embodiment, the coordinated control can be easily realized. Moreover, since the coordinated control is employed, the cycle time can be reduced.
另外,由於以加工區域之中之移動方向的後端部作為協調控制區域,所以可在採用協調控制之雷射加工之後,針對其餘的加工區域而有效率地決定雷射光的照射位置。Further, since the rear end portion in the moving direction of the processing region is used as the coordinated control region, it is possible to efficiently determine the irradiation position of the laser light for the remaining processing regions after the laser processing using the coordinated control.
實施形態3.Embodiment 3.
接著,利用第12圖來說明本發明之實施形態3。實施形態3係在加工區域進入到電流計式掃描器掃描區域之時點開始進行採用協調控制之雷射加工。然後,對於協調控制區域之雷射加工完成後,暫時停止雷射加工,而於XY滑台9的移動結束後,才進行協調控制區域以外之雷射加工。Next, a third embodiment of the present invention will be described using FIG. In the third embodiment, laser processing using coordinated control is started when the processing region enters the scanning area of the galvano scanner. Then, after the laser processing of the coordinated control area is completed, the laser processing is temporarily stopped, and after the movement of the XY stage 9 is completed, the laser processing outside the coordinated control area is performed.
第12圖係顯示實施形態3中之雷射加工處理的處理步驟之圖。第12圖顯示的是工件W的斷面圖。第12圖所示之處理(S31),係為與實施形態1之利用第6-2圖說明過之處理(S11)一樣之處理。亦即,工件W上的加工區域82在電流計式掃描器掃描區域81外之情況(S31),並不進行雷射加工。Fig. 12 is a view showing a processing procedure of the laser processing in the third embodiment. Figure 12 shows a cross-sectional view of the workpiece W. The process (S31) shown in Fig. 12 is the same as the process (S11) described in the first embodiment with reference to Fig. 6-2. That is, in the case where the processing region 82 on the workpiece W is outside the galvano scanner scanning region 81 (S31), laser processing is not performed.
然後,當工件W上的加工區域82進入到電流計式掃描器掃描區域81內,就在加工區域82仍在移動的狀態下,控制裝置200開始進行雷射加工之協調控制。雷射加工之協調控 制,係針對位於加工區域82之中之移動方向的前端部之協調控制區域84C而進行(S32)。此處的協調控制區域84C係對應於第4圖所示之協調控制區域40-2至40-6等。Then, when the processing region 82 on the workpiece W enters the galvanometer scanner scanning region 81, the control device 200 starts the coordinated control of the laser processing while the processing region 82 is still moving. Coordinated control of laser processing The system is performed for the coordinated control region 84C located at the front end portion of the moving direction in the processing region 82 (S32). Here, the coordinated control area 84C corresponds to the coordinated control areas 40-2 to 40-6 and the like shown in FIG.
控制裝置200,係當對於協調控制區域84C之雷射加工結束,就停止雷射加工。在此情況,即使對於協調控制區域84C之雷射加工結束,XY滑台9也繼續使加工區域82移動至電流計式掃描器掃描區域81之處理(S33)。The control device 200 stops the laser processing when the laser processing for the coordinated control region 84C is completed. In this case, even if the laser processing for the coordinated control region 84C ends, the XY stage 9 continues the process of moving the processing region 82 to the galvano scanner scanning region 81 (S33).
當XY滑台9的移動結束,且加工區域82整個進入到電流計式掃描器掃描區域81內(S34),控制裝置200就在使XY滑台9停止的狀態下使雷射加工再開始。此時,協調控制區域84C的雷射加工已經完成,所以控制裝置200係使協調控制區域84C以外的加工區域接受雷射加工。因此,與以往相比較可使加工時間縮短協調控制區域84C的加工時間之值。When the movement of the XY stage 9 is completed and the processing area 82 is entirely entered into the galvano scanner scanning area 81 (S34), the control apparatus 200 restarts the laser processing while the XY stage 9 is stopped. At this time, since the laser processing of the coordinated control region 84C has been completed, the control device 200 accepts the laser processing in the processing region other than the coordinated control region 84C. Therefore, the processing time can be shortened by the processing time of the coordinated control region 84C as compared with the related art.
如上所述,根據實施形態3,雷射加工裝置100在以步進方式為基礎(base)的情況下加入協調控制的元素,所以與實施形態1一樣,可容易地實現協調控制。而且,因為採用協調控制所以可減低加工循環時間(cycle time)。As described above, according to the third embodiment, since the laser processing apparatus 100 adds the elements of the coordinated control in the case of the stepping method, the coordinated control can be easily realized as in the first embodiment. Moreover, since the coordinated control is employed, the cycle time can be reduced.
另外,由於以加工區域之中之移動方向的前端部作為協調控制區域,所以可在採用協調控制之雷射加工之後,針對其餘的加工區域而有效率地將雷射光的照射位置予以定位。Further, since the front end portion in the moving direction of the processing region is used as the coordinated control region, it is possible to efficiently position the irradiation position of the laser light for the remaining processing regions after the laser processing using the coordinated control.
實施形態4.Embodiment 4.
接著,利用第13至15圖來說明本發明之實施形態4。實施形態4係進行在實施形態2中說明過的協調控制也進行在實施形態3中說明過的協調控制。亦即,在加工區域進入到電流計式掃 描器掃描區域的時點,使採用協調控制之雷射加工開始。然後,對於協調控制區域之雷射加工完成後,暫時停止雷射加工,然後當加工區域進入到位範圍內,就再使採用協調控制之雷射加工開始。然後,在XY滑台9的移動結束後,進行協調控制區域以外之雷射加工。Next, a fourth embodiment of the present invention will be described using Figs. 13 to 15. In the fourth embodiment, the coordinated control described in the second embodiment is performed, and the coordinated control described in the third embodiment is also performed. That is, entering the galvanometer sweep in the processing area The time at which the scanner scans the area begins with laser processing using coordinated control. Then, after the laser processing of the coordinated control area is completed, the laser processing is temporarily stopped, and then when the processing area enters the in-position range, the laser processing using the coordinated control is started. Then, after the movement of the XY slide table 9 is completed, laser processing other than the coordinated control region is performed.
接著,針對實施形態4中之雷射加工處理的處理步驟進行說明。第13圖係用來說明實施形態4中之雷射加工處理的處理步驟之圖。在此,係針對以加工區域10-1至加工區域10-6之順序進行雷射加工之情況進行說明。Next, the processing procedure of the laser processing in the fourth embodiment will be described. Fig. 13 is a view for explaining the processing procedure of the laser processing in the fourth embodiment. Here, the case where laser processing is performed in the order of the processing region 10-1 to the processing region 10-6 will be described.
本實施形態之協調控制區域,係加工區域之中之移動方向的前端部及後端部。第13圖中以協調控制區域40-2至40-6,41-2至41-6來表示加工區域10-2至10-6的各協調控制區域。The coordinated control region of this embodiment is a front end portion and a rear end portion in the moving direction among the processing regions. In Fig. 13, the coordinated control areas of the processing areas 10-2 to 10-6 are indicated by the coordinated control areas 40-2 to 40-6, 41-2 to 41-6.
例如,在加工區域10-1的整個區域都進行完雷射加工後,XY滑台9開始移動以使加工區域10-2成為電流計式掃描器掃描區域。然後,當加工區域10-2的一部分進入到位範圍,就進行協調控制而對於加工區域10-2內的協調控制區域41-2進行雷射加工。控制裝置200在對於協調控制區域41-2之雷射加工完成後,使雷射加工停止。For example, after laser processing is performed over the entire area of the processing area 10-1, the XY stage 9 starts moving to make the processing area 10-2 a galvanometer scanner scanning area. Then, when a part of the processing region 10-2 enters the in-position range, coordinated control is performed to perform laser processing on the coordinated control region 41-2 in the processing region 10-2. The control device 200 stops the laser processing after the laser processing for the coordinated control region 41-2 is completed.
然後,XY滑台9開始減速後,在加工區域10-2進入到到位範圍內之時點,控制裝置200再開始進行協調控制。藉此,在到XY滑台9停止為止的期間,進行對於協調控制區域40-2之雷射加工。Then, after the XY stage 9 starts decelerating, when the processing area 10-2 enters the in-position range, the control device 200 starts the coordinated control again. Thereby, the laser processing for the coordinated control region 40-2 is performed while the XY slide table 9 is stopped.
如上所述,在加工區域10-2,採用協調控制而對於協調控制區域41-2,40-2進行雷射加工。然後,在XY滑台9停止 之後,在使XY滑台9停止的狀態下使加工區域10-2之中之協調控制區域41-2,40-2以外的區域接受雷射加工。As described above, in the processing area 10-2, laser processing is performed on the coordinated control areas 41-2, 40-2 by coordinated control. Then, stop at the XY slide 9 Thereafter, the region other than the coordinated control regions 41-2 and 40-2 in the processing region 10-2 is subjected to laser processing while the XY slider 9 is stopped.
在加工區域10-2的整個區域都進行完雷射加工後,XY滑台9開始移動以使加工區域10-3成為電流計式掃描器掃描區域。然後,以與加工區域10-2一樣的處理,依序對加工區域10-3至10-6進行雷射加工。After the laser processing is completed in the entire area of the processing area 10-2, the XY stage 9 starts moving to make the processing area 10-3 a galvanometer scanner scanning area. Then, the processing regions 10-3 to 10-6 are subjected to laser processing in the same manner as the processing region 10-2.
第14圖係顯示XY滑台的移動速度之圖。第14圖中的橫軸為時間,縱軸為XY滑台9的移動速度。本實施形態係在從XY滑台9開始移動之後到速度變得比預定速度快為止之期間(時間範圍72)進行協調控制。以及,在XY滑台9變得比預定速度慢之後到XY滑台9停止為止之期間(時間範圍71)進行協調控制。Fig. 14 is a view showing the moving speed of the XY stage. In Fig. 14, the horizontal axis represents time and the vertical axis represents the moving speed of the XY stage 9. In the present embodiment, coordinated control is performed during the period from the start of the movement of the XY stage 9 to the time when the speed becomes faster than the predetermined speed (time range 72). And, the coordinated control is performed during the period (time range 71) until the XY slide table 9 is stopped after the XY slide table 9 is slower than the predetermined speed.
第15圖係顯示實施形態4中之雷射加工處理的處理步驟之圖。第15圖顯示的是工件W的斷面圖。第15圖所示之處理(S41)至(S43),係為與實施形態3之利用第12圖說明過之處理(S31)至(S33)一樣之處理。此外,第15圖所示之處理(S44)至(S46),係為與實施形態2之利用第11圖說明過之處理(S23)至(S25)一樣之處理。Fig. 15 is a view showing the processing procedure of the laser processing in the fourth embodiment. Figure 15 shows a cross-sectional view of the workpiece W. The processes (S41) to (S43) shown in Fig. 15 are the same as the processes (S31) to (S33) described in the fourth embodiment. Further, the processes (S44) to (S46) shown in Fig. 15 are the same as the processes (S23) to (S25) described in the first embodiment with reference to Fig. 11.
亦即,工件W上的加工區域82在電流計式掃描器掃描區域81外之情況(S41),並不進行雷射加工。然後,當工件W上的加工區域82進入到電流計式掃描器掃描區域81內,就在加工區域82仍在移動的狀態下,控制裝置200開始進行雷射加工之協調控制。雷射加工之協調控制,係針對協調控制區域84C而進行(S42)。That is, in the case where the processing region 82 on the workpiece W is outside the galvano-scan scanner scanning region 81 (S41), laser processing is not performed. Then, when the processing region 82 on the workpiece W enters the galvanometer scanner scanning region 81, the control device 200 starts the coordinated control of the laser processing while the processing region 82 is still moving. The coordinated control of the laser processing is performed for the coordinated control region 84C (S42).
控制裝置200,係當對於協調控制區域84C之雷射加工結束,就停止雷射加工。在此情況,就算對於協調控制區域84C之雷射加工結束,XY滑台9也繼續使加工區域82移動至電流計式掃描器掃描區域81之處理(S43)。The control device 200 stops the laser processing when the laser processing for the coordinated control region 84C is completed. In this case, even if the laser processing for the coordinated control region 84C is completed, the XY stage 9 continues the process of moving the processing region 82 to the galvano scanner scanning region 81 (S43).
然後,當加工區域82進入到位範圍83B內(S44),就在加工區域82仍在移動的狀態下,控制裝置200再開始進行雷射加工之協調控制。雷射加工之協調控制,係針對協調控制區域84B而進行(S45)。Then, when the processing region 82 enters the in-position range 83B (S44), the control device 200 restarts the coordinated control of the laser processing while the processing region 82 is still moving. The coordinated control of the laser processing is performed for the coordinated control region 84B (S45).
控制裝置200在開始雷射加工之協調控制之後,當加工區域82的整個區域都進入電流計式掃描器掃描區域81內(S46),就在使XY滑台9停止的狀態下使雷射加工繼續。此時,協調控制區域84B,84C的雷射加工已經完成,所以控制裝置200係使協調控制區域84B,84C以外的加工區域接受雷射加工。因此,與以往相比較可使加工時間縮短協調控制區域84B,84C的加工時間之值。After the control device 200 starts the coordinated control of the laser processing, when the entire area of the processing area 82 enters the galvano scanner scanning area 81 (S46), the laser processing is performed while the XY stage 9 is stopped. carry on. At this time, since the laser processing of the coordinated control regions 84B, 84C has been completed, the control device 200 accepts the laser processing in the processing regions other than the coordinated control regions 84B, 84C. Therefore, the processing time can be shortened by the processing time of the coordinated control regions 84B, 84C as compared with the prior art.
如上所述,根據實施形態5,雷射加工裝置100在以步進方式為基礎的情況下加入協調控制的元素,所以與實施形態1一樣,可容易地實現協調控制。而且,因為採用協調控制所以可減少加工循環時間。As described above, according to the fifth embodiment, since the laser processing apparatus 100 adds the elements of the coordinated control based on the stepping method, the coordinated control can be easily realized as in the first embodiment. Moreover, the processing cycle time can be reduced because of coordinated control.
另外,由於以加工區域之中之移動方向的前端部及後端部作為協調控制區域,所以可在採用協調控制之雷射加工之後,針對其餘的加工區域而有效率地將雷射光的照射位置予以定位。Further, since the front end portion and the rear end portion in the moving direction in the processing region serve as the coordinated control region, it is possible to efficiently irradiate the laser light to the remaining processing regions after the laser processing using the coordinated control. Position it.
可將在實施形態1至4中說明過之處理予以組合而 進行雷射加工。例如,可將實施形態1之利用第7及9圖說明過之處理應用於實施形態2至4中。The processes described in Embodiments 1 to 4 can be combined. Perform laser processing. For example, the processing described in the seventh and ninth embodiments of the first embodiment can be applied to the second to fourth embodiments.
如以上所述,本發明之加工控制裝置、雷射加工裝置及加工控制方法可利用於被加工物之雷射加工。As described above, the processing control device, the laser processing device, and the processing control method of the present invention can be utilized for laser processing of a workpiece.
51A‧‧‧剩餘距離51A‧‧‧Remaining distance
52A‧‧‧到位資訊52A‧‧‧Information in place
53A‧‧‧照射時序資訊53A‧‧‧Irradiation timing information
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