TWI484288B - Method for manufacturing dustproof film assembly - Google Patents

Method for manufacturing dustproof film assembly Download PDF

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Publication number
TWI484288B
TWI484288B TW102104945A TW102104945A TWI484288B TW I484288 B TWI484288 B TW I484288B TW 102104945 A TW102104945 A TW 102104945A TW 102104945 A TW102104945 A TW 102104945A TW I484288 B TWI484288 B TW I484288B
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TW
Taiwan
Prior art keywords
pellicle
laser
individual information
frame
pellicle frame
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TW102104945A
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Chinese (zh)
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TW201346433A (en
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Kazutoshi Sekihara
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Shinetsu Chemical Co
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983Optical system protection, e.g. pellicles or removable covers for protection of mask

Description

防塵薄膜組件的製造方法Method for manufacturing dustproof film assembly

本發明是有關於作為在半導體裝置、印刷基板或者液晶顯示器等製造時的灰塵防止器使用的微影用防塵薄膜組件的製造方法。The present invention relates to a method of manufacturing a pellicle for a lithography which is used as a dust preventer at the time of manufacture of a semiconductor device, a printed circuit board, or a liquid crystal display.

大規模積體電路(Large Scale Integration,LSI)的半導體裝置或液晶顯示器等的製造中,半導體晶圓或者液晶用玻璃原板上用光照射來進行圖案製作。此時所用的光罩(photomask)或初縮遮罩(reticle)上如附著灰塵,就會發生邊緣不齊或基底變黑的問題,這會造成尺寸、品質、外觀等受損。In the manufacture of a semiconductor device or a liquid crystal display of a large-scale integrated circuit (LSI), a semiconductor wafer or a liquid crystal glass plate is patterned by light irradiation. If dust is attached to the photomask or the reticle used at this time, the problem of edge irregularities or blackening of the substrate may occur, which may cause damage in size, quality, appearance, and the like.

這些作業通常無塵室內進行。但是即使如此,也難以經常保持經常清潔。由此,採用在光罩表面安裝作為灰塵防止器的防塵薄膜組件的方法。通過該防塵薄膜組件,使異物不在光罩的表面上直接附著,使其在防塵薄膜組件上附著,由此在微影時使焦點對在光罩的圖案上,不會受異物的影響而可進行轉印。These operations are usually carried out in a clean room. But even so, it is difficult to keep it clean often. Thus, a method of mounting a pellicle as a dust preventer on the surface of the reticle is employed. Through the pellicle assembly, the foreign matter is not directly attached to the surface of the reticle, and is attached to the pellicle assembly, thereby causing the focus to be on the pattern of the reticle during lithography without being affected by foreign matter. Transfer.

這樣的防塵薄膜組件為在鋁、不銹鋼、聚乙烯等組成的防塵薄膜組件框架的上端面,將通常良好透光的硝化纖維素、乙 酸纖維素、氟系樹脂等構成的透明的防塵薄膜,通過其良溶劑塗布風乾接著,也可以用丙烯酸樹脂或環氧樹脂等的接著劑進行接著。在該防塵薄膜組件框架的下端面,設置將光罩進行裝著的由聚丁烯樹脂、聚乙酸乙烯酯樹脂、丙烯酸樹脂等構成的黏著層,以及以對黏著層進行保護為目的的離型層(separator)。另外,在將防塵薄膜組件在光罩上貼附的狀態中,為了使防塵薄膜組件內部被圍起來的空間和外部氣壓差消除,在防塵薄膜組件框架的一部分上開有氣壓調整用的小孔,裝設過濾器,從而防止從通過小孔而移動的空氣來的異物的侵入。Such a pellicle film assembly is an upper end surface of a pellicle frame composed of aluminum, stainless steel, polyethylene, etc., and generally has a good light transmission of nitrocellulose, B A transparent pellicle film made of acid cellulose or a fluorine-based resin may be air-dried by a good solvent coating, or may be followed by an adhesive such as an acrylic resin or an epoxy resin. On the lower end surface of the pellicle frame, an adhesive layer made of a polybutene resin, a polyvinyl acetate resin, an acrylic resin, or the like, and a release layer for protecting the adhesive layer are provided. Separator. Further, in a state in which the pellicle is attached to the reticle, in order to eliminate the space enclosed by the inside of the pellicle assembly and the external air pressure difference, a small hole for air pressure adjustment is formed in a part of the pellicle frame. A filter is installed to prevent intrusion of foreign matter from the air moving through the small hole.

防塵薄膜組件為,根據適用的光源或曝光機有各種各樣的規格,乍看下不能識別品種或型式。為此,在防塵薄膜組件框架的外側面用彫刻機等進行機械刻印或雷射刻印,以打上產品號碼等個體資訊(專利文獻1)。但是,一般防塵薄膜組件框架的高度僅為3mm~6mm左右,用於表示的空間小,僅能將數字以及字母的組合等的大略記號以1mm~2mm平方左右的小文字來進行表示。此表示為必要最低限的內容,但是一看,必要的個體資訊還是不能確認,這是不充分的。為此,在防塵薄膜組件貼附作業中,作業者會將不適用的型號誤用。進一步,貼附作業時,如不將防塵薄膜組件的製造號或者個體號以某種形式記錄下來,以後麻煩發生時,就會難以對對象防塵薄膜組件進行特定,過程的確認也會難以進行。The pellicle module has various specifications depending on the applicable light source or exposure machine, and the variety or type cannot be recognized at first glance. For this purpose, mechanical marking or laser marking is performed on the outer surface of the pellicle frame by an engraving machine or the like to put individual information such as a product number (Patent Document 1). However, the height of the general pellicle frame is only about 3 mm to 6 mm, and the space for display is small. Only a large mark such as a combination of numbers and letters can be represented by a small character of about 1 mm to 2 mm square. This is expressed as the minimum necessary content, but at first glance, the necessary individual information is still not confirmed, which is not sufficient. For this reason, the operator will misuse the unsuitable model in the attaching of the pellicle. Further, when the attachment work is performed, if the manufacturing number or the individual number of the pellicle is not recorded in some form, it is difficult to specify the target pellicle assembly in the future, and the process can be difficult to confirm.

為了防止這些問題,提案有在防塵薄膜組件上設置將該 防塵薄膜組件相關的個體資訊進行記錄的資訊發生部,用具有將個體資訊進行讀取的手段的防塵薄膜組件的管理裝置對防塵薄膜組件進行管理的手法(專利文獻2)。In order to prevent these problems, the proposal has to set this on the pellicle. In the information generating unit that records the individual information related to the pellicle, the pellicle module is managed by the management device of the pellicle having the means for reading the individual information (Patent Document 2).

但是,如將這些表示或資訊發生部進行表示的方法為機械刻印或雷射刻印時,由於要將防塵薄膜組件框架的表面向下挖掘進行加工,從而在加工時會發生大量的灰塵,這樣一來就會不能在防塵薄膜組件的製造階段進行這些加工,而必須在防塵薄膜組件框架的製造階段進行這些加工。為此,防塵薄膜組件的製造步驟中被賦與的製造號等的對各個防塵薄膜組件個體進行識別的資訊的表示就會變得困難,其表示內容就會僅能為製造者名或型號等事前可知的內容,結果,難以表示有關防塵薄膜組件的詳細的資訊。However, if the method of expressing these indications or information generating portions is mechanical marking or laser marking, since the surface of the pellicle frame is to be dug down for processing, a large amount of dust is generated during processing, such that These processes cannot be performed at the manufacturing stage of the pellicle assembly, and must be performed at the manufacturing stage of the pellicle frame. For this reason, it is difficult to express the information for identifying each individual pellicle module by the manufacturing number or the like given in the manufacturing process of the pellicle, and the content can be only the name or model of the manufacturer. As a result of prior knowledge, it is difficult to express detailed information about the pellicle assembly.

現有技術文獻Prior art literature

專利文獻Patent literature

專利文獻1:日本專利3346205號Patent Document 1: Japanese Patent No. 3346205

專利文獻2:日本專利特開平11-84632號公報Patent Document 2: Japanese Patent Laid-Open No. Hei 11-84632

本發明的目的就是為了解決上述的課題,提供一種不僅表示製造者名或型式,還可以將製造號等的對各防塵薄膜組件進行識別的個體資訊也加以表示,在其個體資訊可以簡便地確認的同時,具有高的清潔度,也沒有發生灰塵或異物的附著的問題的防塵薄膜組件的製造方法以及由該製造方法得來的防塵薄膜組件。An object of the present invention is to provide an individual information that not only displays a manufacturer's name or a model but also identifies each of the pellicle components, such as a manufacturing number, and can easily confirm individual information. At the same time, a method for producing a pellicle having high cleanliness and no problem of adhesion of dust or foreign matter, and a pellicle assembly obtained by the method are provided.

上述目的可以藉由以下技術方案來達成。The above object can be achieved by the following technical solutions.

1.一種防塵薄膜組件的製造方法,其特徵在於:在防塵薄膜貼附的防塵薄膜組件框架的表面上,用波長500nm~11000nm的雷射進行照射而進行個體資訊的加工時,將所述雷射的照射部位進行抽吸排氣。A method for producing a pellicle according to the present invention, characterized in that, when the individual information is processed by irradiation with a laser having a wavelength of 500 nm to 11,000 nm on the surface of the pellicle frame to which the pellicle is attached, the thunder is applied The irradiated portion of the shot is sucked and exhausted.

2.如上述1所述的防塵薄膜組件的製造方法,其中所述個體資訊表示從製造號、型式、製造者名、以及產品號碼中選出的至少一個。2. The method of manufacturing a pellicle according to the above 1, wherein the individual information indicates at least one selected from a manufacturing number, a model, a manufacturer name, and a product number.

3.如上述1或2所述的防塵薄膜組件的製造方法,其中所述個體資訊為條形碼。3. The method of manufacturing a pellicle according to the above 1 or 2, wherein the individual information is a barcode.

4.如上述1~3中任一項所述的防塵薄膜組件的製造方法,其中所述加工為刻印加工。4. The method of manufacturing a pellicle according to any one of the above 1 to 3, wherein the processing is imprinting.

5.如上述4所述的防塵薄膜組件的製造方法,其中所述刻印加工的深度以所述防塵薄膜組件框架的表面為基準,最大為0.05mm。5. The method of manufacturing a pellicle according to the above 4, wherein the depth of the imprinting process is at most 0.05 mm based on the surface of the pellicle frame.

6.如上述1~5中任一項所述的防塵薄膜組件的製造方法,其使所述防塵薄膜組件框架或者其表面的皮膜中含有的染料進行脫色或者退色,從而變色從而進行所述加工。The method for producing a pellicle according to any one of the above-mentioned items 1 to 5, wherein the dye film contained in the pellicle frame or the film on the surface thereof is decolored or discolored to be discolored to perform the processing. .

7.一種防塵薄膜組件,其特徵在於:藉由如1~6中任一項所述的製造方法來進行製造。A pellicle film assembly produced by the production method according to any one of 1 to 6.

根據本發明的防塵薄膜組件的製造方法,在防塵薄膜貼附的防塵薄膜組件框架的表面上,不僅僅限於防塵薄膜組件框架的製造的階段預先得知的資訊,防塵薄膜組件個體的詳細的製造資訊等的對各防塵薄膜組件進行識別的個體資訊也可以加工。個體資訊被加工的表面的損傷極少的同時,由於進行抽吸排氣,所以可以在高的清潔度被要求的防塵薄膜組件製造步驟中進行。因此,可以在防塵薄膜組件框架上貼附有防塵薄膜的狀態下,也可以在防塵薄膜貼附前,沒有異物的附著或發生灰塵而進行個體資訊的加工,在任何的場合,都可以提供清潔度高的防塵薄膜組件。用如此加工的個體資訊,就可以易於對防塵薄膜組件個體的詳細的資訊進行確認,來對各個防塵薄膜組件個體進行識別。According to the method of manufacturing a pellicle according to the present invention, on the surface of the pellicle frame to which the pellicle is attached, not only the information known in advance at the stage of manufacture of the pellicle frame, but also the detailed manufacture of the individual pellicle assembly Individual information such as information that identifies each of the pellicle components can also be processed. The damage to the surface on which the individual information is processed is extremely small, and since the suction and exhaust are performed, it can be performed in the step of manufacturing the pellicle having high cleanliness. Therefore, in the state in which the pellicle film is attached to the pellicle frame, the individual information can be processed without the adhesion of foreign matter or dust before the pellicle is attached, and the cleaning can be performed in any case. High degree of pellicle assembly. With the individual information thus processed, it is possible to easily confirm the detailed information of the individual pellicle components to identify the individual pellicle components.

另外,根據該製造方法,個體資訊可以通過脫色或退色來變色形成,所以可視性優良,讀取性也良好。進一步,個體資訊可以用條形碼的表示,由此可以表示大量的資訊,同時可以用自動機器將資訊進行讀取。Further, according to the production method, the individual information can be formed by discoloration or discoloration, so that the visibility is excellent and the readability is also good. Further, the individual information can be represented by a bar code, thereby indicating a large amount of information, and the information can be read by an automatic machine.

本發明的防塵薄膜組件在為清潔度高的防塵薄膜組件的同時,可以對各防塵薄膜組件的個體資訊進行容易地確認或識別,在防塵薄膜組件貼附作業等中,可以使作業錯誤降低或作業效率提高。The pellicle film assembly of the present invention can easily confirm or recognize individual information of each pellicle film assembly while being a highly clean pellicle film assembly, and can reduce work errors in the puff film assembly attachment work or the like. Work efficiency is improved.

1‧‧‧防塵薄膜組件1‧‧‧Plastic membrane assembly

2‧‧‧防塵薄膜組件框架2‧‧‧Plastic membrane assembly frame

3‧‧‧防塵薄膜3‧‧‧Plastic film

4‧‧‧溝4‧‧‧ditch

5‧‧‧個體資訊5‧‧‧Individual information

6‧‧‧條形碼6‧‧‧ barcode

7‧‧‧印字7‧‧‧Printing

8‧‧‧遮罩黏著層8‧‧‧ Mask adhesive layer

9‧‧‧離形層9‧‧‧Fractal layer

10‧‧‧凹孔10‧‧‧ recessed hole

11‧‧‧通氣過濾器11‧‧‧Ventilation filter

12‧‧‧無塵室12‧‧‧Clean room

20‧‧‧排氣罩20‧‧‧Exhaust hood

21‧‧‧開口部21‧‧‧ openings

22‧‧‧排氣通道22‧‧‧Exhaust passage

23‧‧‧雷射加工機23‧‧‧Laser processing machine

24‧‧‧射出部24‧‧‧Sports Department

25‧‧‧雷射25‧‧‧Laser

A‧‧‧無塵室的氣流方向A‧‧‧Airflow direction of the clean room

B‧‧‧抽吸B‧‧‧ suction

C‧‧‧排氣C‧‧‧Exhaust

圖1為應用本發明的防塵薄膜組件的斜視圖。BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a perspective view of a pellicle assembly to which the present invention is applied.

圖2為應用本發明的製造方法的加工步驟的截面圖。Figure 2 is a cross-sectional view showing the processing steps of the manufacturing method to which the present invention is applied.

以下,對本發明的具體實施方式進行詳細說明,但是,本發明的範圍不限於這些方式。Hereinafter, specific embodiments of the present invention will be described in detail, but the scope of the present invention is not limited to these.

適用本發明的製造方法得到的防塵薄膜組件,如圖1所示的那樣,在由長邊和短邊形成的四角形狀的框體的防塵薄膜組件框架2的上端面上,將防塵薄膜3用接著劑進行繃緊貼附。防塵薄膜組件框架2的外側表面上刻印加工有條形碼6以及印字7,可以識別各防塵薄膜組件的個體資訊5。另外,根據需要,防塵薄膜組件框架2的下端面形成遮罩黏著層8,其表面安裝有對遮罩黏著層8進行保護的離形層9。進一步,在個體資訊5刻印加工的長邊的防塵薄膜組件框架2的外側表面,形成有作為非貫通的圓孔的凹孔10或通氣過濾器11等,短邊的防塵薄膜組件框架的外側表面形成有作為操作用途的半圓狀的溝4。As shown in Fig. 1, the pellicle film assembly according to the manufacturing method of the present invention is used for the pellicle film 3 on the upper end surface of the pellicle frame 2 of the rectangular frame body formed of the long side and the short side. The agent is then taut attached. The outer surface of the pellicle frame 2 is imprinted with a bar code 6 and a print 7 to identify the individual information 5 of each pellicle. Further, the lower end surface of the pellicle frame 2 is formed with a mask adhesive layer 8 having a release layer 9 for protecting the mask adhesive layer 8 on its surface as needed. Further, on the outer surface of the long-side pellicle frame 2 of the individual information 5, a concave hole 10 as a non-penetrating circular hole, a vent filter 11, and the like, and an outer side surface of the short-side pellicle frame are formed. A semicircular groove 4 is formed for the purpose of operation.

個體資訊5作為其表示內容,有從製造號、型式、製造者名以及產品號碼選出的至少一個。除了這些,還可以加上其他的製造上的資訊或用戶方面必要的資訊等。The individual information 5 has at least one selected from the manufacturing number, the model, the manufacturer name, and the product number as its presentation content. In addition to these, you can add other manufacturing information or user-required information.

個體資訊5,根據其表示,可以為對各防塵薄膜組件個體進行識別的資訊,作為其表示手段,可以用條形碼6、數字或字母組成的印字7。該個體資訊5可以僅為條形碼6,也可以為條形碼6與數字或字母的印字7的組合,也可以為與其他的表記的組合。The individual information 5, based on the representation, may be information for identifying each of the individual pellicle components, and as a means for expressing the same, a printing 7 composed of a bar code 6, a number or a letter may be used. The individual information 5 may be only the barcode 6, or a combination of the barcode 6 and the number 7 or the letter 7 of the letter, or a combination with other tokens.

作為條形碼6,在上述個體資訊表示內容之中,可以包括全部的表示內容,也可以為一部分的表示內容。另外,此條形碼6可以為一般的一維,也可以為二維。其表示的最小線寬度從讀取的安定性的觀點,以0.1mm以上為優選。As the barcode 6, the content of the individual information may include all of the content or a part of the content. In addition, the barcode 6 can be a general one-dimensional or two-dimensional. The minimum line width indicated is preferably 0.1 mm or more from the viewpoint of stability of reading.

個體資訊5的刻印加工,以防塵薄膜組件框架2的表面為基準,其刻印加工深度優選在0.05mm以下。The engraving processing of the individual information 5 is based on the surface of the pellicle frame 2, and the imprinting depth is preferably 0.05 mm or less.

對該防塵薄膜組件的製造方法中的一實施例進行詳細說明。An embodiment of the method for manufacturing the pellicle assembly will be described in detail.

本發明的防塵薄膜組件的製造方法為:在防塵薄膜組件框架2的表面上,用波長500nm~11000nm的雷射25進行照射的同時,對照射部位進行抽吸排氣,用雷射25的照射,使防塵薄膜組件框架2變色,從而將個體資訊5進行加工的方法。In the method for manufacturing a pellicle according to the present invention, the laser beam having a wavelength of 500 nm to 11,000 nm is irradiated on the surface of the pellicle frame 2, and the irradiated portion is suctioned and exhausted, and the laser 25 is irradiated. A method of disposing the pellicle frame 2 to thereby process the individual information 5.

關於對該個體資訊5進行加工的步驟,參照圖2進行說明。圖2為在防塵薄膜組件框架2上進行個體資訊5加工的步驟的截面圖。The procedure for processing the individual information 5 will be described with reference to FIG. 2 . 2 is a cross-sectional view showing the steps of processing the individual information 5 on the pellicle frame 2.

在二點虛線表示的無塵室12中,將在防塵薄膜組件框架2的上端面透過防塵薄膜接著劑使防塵薄膜3接著的防塵薄膜組件1,以與防塵薄膜3為二點虛線A表示的無塵室的氣流方向大略平行而配置。一般說來,無塵室的氣流由於從上方向下方垂直流動,在防塵薄膜組件框架2的表面由垂直或與其相近的角度的支持手段(未圖示)來支持,以使個體資訊5的加工面為下側。In the clean room 12 indicated by the two-dotted line, the pellicle film 1 is placed on the upper end surface of the pellicle frame 2 through the pellicle film adhesive agent, and the pellicle film 3 is indicated by a dotted line A. The airflow direction of the clean room is arranged in a slightly parallel direction. In general, the airflow in the clean room is supported by a support means (not shown) at a vertical or a close angle to the surface of the pellicle frame 2 due to vertical flow from the top to the bottom, so that the processing of the individual information 5 is performed. The face is the lower side.

在防塵薄膜組件1的下側,在具有必要最低限開口的開 口部21且具有與排氣通道22接續的排氣手段(未圖示)的排氣罩20內收納有雷射加工機23。從該雷射加工機23的射出部24射出的雷射25以大略垂直向上射出,使該雷射進行掃描,從而向防塵薄膜組件框架2進行雷射25的照射,使防塵薄膜組件1的個體資訊5得以加工。此時,排氣罩20的開口部21在防塵薄膜組件框架2的加工面的近處配置,同時,雷射加工機23和防塵薄膜組件框架2的加工面以使它們與雷射25的焦點距離一致的方式進行配置。射出的雷射25通過在加工面近處配置的開口部21,到達防塵薄膜組件框架2的加工面。On the underside of the pellicle assembly 1, opening with the necessary minimum opening A laser processing machine 23 is housed in the exhaust hood 20 of the mouth portion 21 and an exhaust means (not shown) that is connected to the exhaust passage 22. The laser beam 25 emitted from the emitting portion 24 of the laser processing machine 23 is emitted in a substantially vertical upward direction, and the laser beam is scanned to irradiate the pellicle frame 2 with the laser 25 to cause the individual of the pellicle module 1 to be irradiated. Information 5 was processed. At this time, the opening portion 21 of the hood 20 is disposed in the vicinity of the processing surface of the pellicle frame 2, while the processing faces of the laser processing machine 23 and the pellicle frame 2 are made to be in focus with the laser 25 The distance is configured in a consistent manner. The emitted laser beam 25 reaches the processing surface of the pellicle frame 2 by the opening portion 21 disposed near the processing surface.

雷射25照射時,與照射的同時,在照射部位具有排氣手段(未圖示)來進行抽吸排氣。圖2中,作為抽吸排氣產生的空氣流,抽吸方向用二點虛線的箭頭B,排氣方向用二點虛線的箭頭C分別進行表示。抽吸排氣優選由與排氣通道22接續的排氣手段(未圖示)進行排氣(參照箭頭C),從防塵薄膜組件框架2的加工面的照射部位附近設置的排氣罩20的開口部21進行抽吸(參照箭頭B)。At the time of the irradiation of the laser 25, an exhaust means (not shown) is provided at the irradiation site to perform suction and exhaustion simultaneously with the irradiation. In Fig. 2, as the air flow generated by the suction of the exhaust gas, the suction direction is indicated by an arrow B of a two-dotted line, and the direction of the exhaust is indicated by an arrow C of a two-dotted line. Preferably, the suction exhaust gas is exhausted by an exhaust means (not shown) connected to the exhaust passage 22 (see an arrow C), and the exhaust cover 20 is provided from the vicinity of the irradiation portion of the processed surface of the pellicle frame 2 The opening 21 is suctioned (see arrow B).

在此抽吸排氣中,排氣速度優選排氣罩20的開口部21中,具有50mm/s以上的線速。此排氣速度沒有特別的上限,若考慮實用的的排氣手段的能力,優選1000mm/s以下。In the suction exhaust gas, the exhaust speed is preferably in the opening portion 21 of the exhaust hood 20, and has a linear velocity of 50 mm/s or more. There is no particular upper limit for this exhaust speed, and it is preferably 1000 mm/s or less in consideration of the ability of a practical exhaust means.

作為用雷射25的個體資訊5的加工,照射的雷射25被防塵薄膜組件框架2的加工面吸收,短波長的光能量具有使表面的老化(變質)和發熱等兩個影響。此照射中,照射的時間短, 所以以熱影響為主。一般的鋁合金製防塵薄膜組件框架的場合,根據其材料,防塵薄膜組件框架的表面為用有機染料得到的黑色陽極氧化鋁,如加熱,有機染料脫色,白化產生。在不是鋁合金製的防塵薄膜組件框架,例如,樹脂製防塵薄膜組件框架的場合,為了使防塵薄膜組件框架黑色化,在其表面設置塗裝皮膜等,該塗裝皮膜同樣使其變色來進行個體資訊5的加工。As the processing of the individual information 5 by the laser 25, the irradiated laser 25 is absorbed by the processed surface of the pellicle frame 2, and the short-wavelength light energy has two effects such as deterioration (deterioration) of the surface and heat generation. In this irradiation, the irradiation time is short, Therefore, it is mainly based on heat. In the case of a general aluminum alloy pellicle frame, depending on the material, the surface of the pellicle frame is made of an organic anodized aluminum, such as heating, decolorization of an organic dye, and whitening. In the case of a pellicle frame which is not made of an aluminum alloy, for example, a resin pellicle frame, in order to blacken the pellicle frame, a coating film or the like is provided on the surface thereof, and the coating film is also discolored to perform the discoloration. Processing of individual information 5.

個體資訊5的加工,根據使用的雷射的波長或輸出,加工時也受到粉塵的量或刻印加工深度影響。The processing of the individual information 5 is influenced by the amount of dust or the depth of the imprinting process depending on the wavelength or output of the laser used.

照射的雷射25的波長優選500nm~11000nm。一般用的鋁合金製防塵薄膜組件框架優選選擇波長為500nm~11000nm的雷射,不是鋁合金製防塵薄膜組件框架,例如,樹脂製防塵薄膜組件框架的場合,優選選擇波長為500nm~1100nm的雷射。The wavelength of the irradiated laser 25 is preferably 500 nm to 11,000 nm. Generally, the aluminum alloy pellicle frame is preferably a laser having a wavelength of 500 nm to 11,000 nm, and is not a frame of a pellicle for an aluminum alloy. For example, in the case of a resin pellicle frame, it is preferable to select a mine having a wavelength of 500 nm to 1100 nm. Shoot.

在對該波長的雷射25進行利用的場合,由於能夠以短時間使防塵薄膜組件框架2的材質自身或者覆蓋表面的表面皮膜內的染料脫色或者退色從而變色,可以清楚地對個體資訊5進行加工的同時,並使異物的飛散大幅度地減少。進一步,由於排氣罩20以及排氣手段(未圖示)的作用,極少發生的異物也被抽吸除去,不僅僅防塵薄膜組件框架2的加工面,其他的部位也沒有異物的附著。When the laser beam 25 of the wavelength is used, the material of the pellicle frame 2 itself or the dye in the surface film covering the surface can be discolored or discolored to cause discoloration, and the individual information 5 can be clearly performed. At the same time of processing, the scattering of foreign matter is greatly reduced. Further, due to the action of the exhaust hood 20 and the exhaust means (not shown), foreign matter which is rarely generated is also sucked and removed, and not only the processed surface of the pellicle frame 2 but also other portions are not adhered to by foreign matter.

作為這些波長的雷射,二氧化碳雷射,YVO4固體雷射,YVO4固體雷射(第二高諧波)可以適宜地使用。As the laser of these wavelengths, a carbon dioxide laser, a YVO4 solid laser, and a YVO4 solid laser (second harmonic) can be suitably used.

在此,在給予的雷射輸出大的場合,防塵薄膜組件框架 2的加工面會激劇且局部的熱膨張,從而破壞、飛散,變為表面粗糙。另外,根據材質可以被燒黑。如此表面的破壞、燒焦的狀況中,會有大量的粉塵發生,周圍會大量汙染,由此,在防塵薄膜組件製造步驟中的個體資訊5的加工顯著不適合。為此,優選對雷射的輸出進行調整,使個體資訊5的加工的加工面為完全沒有切削的狀態,或者無階差的狀態,刻印加工中,刻印加工深度,以周圍的表面為基準,優選最大也就是0.05mm。這些條件,可以通過對雷射加工機23中使用的雷射的波長或輸出進行適當地選擇來達成。Here, in the case where the given laser output is large, the pellicle frame is provided. The processing surface of 2 will be excitable and localized by thermal expansion, which will destroy and scatter and become rough. In addition, it can be burnt black depending on the material. In such a state of destruction or scorching of the surface, a large amount of dust is generated and a large amount of contamination is caused in the surroundings, whereby the processing of the individual information 5 in the manufacturing process of the pellicle is remarkably unsuitable. For this reason, it is preferable to adjust the output of the laser so that the processed surface of the individual information 5 is in a state of no cutting at all, or a state without step, in the marking process, the depth of the engraving is based on the surrounding surface. Preferably, it is at most 0.05 mm. These conditions can be achieved by appropriately selecting the wavelength or output of the laser used in the laser processing machine 23.

加工的個體資訊5,圖1中條形碼6以及印字7的組合可以分別用黑色表示,但是一般防塵薄膜組件框架2為黑色,實際上,雷射25照射的時候,該表示為白色。The individual information of the processing 5, the combination of the barcode 6 and the printing 7 in Fig. 1 can be respectively indicated by black, but the general pellicle frame 2 is black, and in fact, when the laser 25 is irradiated, the representation is white.

個體資訊5的加工位置為防塵薄膜組件框架2中的長邊或者短邊的外側表面,從加工性以及可視性的觀點來說適當,其中優選在附近沒有通氣過濾器11或凹孔10的那樣的治具孔等形成的領域為優選。另外,在防塵薄膜組件框架2的邊的中央的位置進行加工的場合,在加工或讀取時易於對位置進行確定,所以為優選。The processing position of the individual information 5 is the long side or the outer side surface of the short side in the pellicle frame 2, which is appropriate from the viewpoint of workability and visibility, and preferably, there is no vent filter 11 or recess 10 in the vicinity. The field in which the jig hole or the like is formed is preferable. Further, in the case where the processing is performed at the position of the center of the side of the pellicle frame 2, it is preferable to easily determine the position during processing or reading.

另外,個體資訊5不限於在防塵薄膜組件框架2的外側表面,可以在防塵薄膜組件框架2的上端面和防塵薄膜3的接著面進行加工。利用防塵薄膜接著面,特別是確認性以及讀取性良好,但是在防塵薄膜接著面進行加工時,會有由於雷射25使防塵 薄膜接著劑損傷的場合,因此根據加工方法,有進行改善的必要。例如,為了防止由於雷射25的防塵薄膜接著劑的損傷,有必要在塗布防塵薄膜接著劑前對個體資訊5進行加工,通過使用對防塵薄膜3和防塵薄膜接著劑進行加工的雷射25的波長不吸收的材質,其損傷可以被防止。Further, the individual information 5 is not limited to the outer surface of the pellicle frame 2, and can be processed on the upper end surface of the pellicle frame 2 and the back surface of the pellicle 3. The use of the dust-proof film on the back surface is particularly good for confirmability and readability, but when the dust-proof film is processed on the back surface, it is dust-proof due to the laser 25 In the case where the film adhesive is damaged, it is necessary to carry out improvement according to the processing method. For example, in order to prevent damage of the dust-proof film adhesive due to the laser 25, it is necessary to process the individual information 5 before applying the dust-proof film adhesive, by using the laser 25 which processes the dust-proof film 3 and the dust-proof film adhesive. The damage of the material whose wavelength is not absorbed can be prevented.

另外,防塵薄膜組件框架2的下端面具有未設有所形成遮罩黏著層8的領域的場合,也可以在該部分進行加工。由於沒有雜散光等光學的壞影響,並且在防塵薄膜組件向光罩進行貼附後,加工的個體資訊5被隱蔽,在表面不出現,從光罩側難於確認,合適於表示對用戶來說不是必要的資訊。Further, the lower end surface of the pellicle frame 2 has a field in which the masking layer 8 is not formed, and it is also possible to perform processing in this portion. Since there is no optical adverse effect such as stray light, and after the pellicle is attached to the reticle, the processed individual information 5 is concealed, does not appear on the surface, is difficult to confirm from the reticle side, and is suitable for indicating to the user Not the necessary information.

藉由這樣的構成,在要求高的清潔度的防塵薄膜組件製造步驟中,不會對防塵薄膜3和防塵薄膜組件框架2的接著部分產生損傷,也不會在防塵薄膜組件1上附著異物,可以將製造時、作業時、使用時等的各階段中的必要的資訊內容進行適宜選擇,進行個體資訊5的加工。其結果,可以將製造中賦予的防塵薄膜組件1的製造號等加以表示,這對防塵薄膜組件1的使用以及管理是極為有用的。With such a configuration, in the manufacturing process of the pellicle assembly requiring high cleanliness, damage to the pellicle film 3 and the subsequent portion of the pellicle frame 2 is not caused, and foreign matter is not attached to the pellicle. The necessary information content in each stage of manufacturing, work, and use can be appropriately selected, and the individual information 5 can be processed. As a result, the manufacturing number or the like of the pellicle film 1 to be applied in the production can be expressed, which is extremely useful for the use and management of the pellicle film assembly 1.

作為排氣手段,沒有特別的限定,具體的說,可以利用多翼式風扇(sirocco fan)、螺旋槳式風扇(propeller fan)、旋渦風機、隔膜泵(diaphragm pump)等。The exhaust means is not particularly limited, and specifically, a sirocco fan, a propeller fan, a vortex blower, a diaphragm pump, or the like can be used.

另外,可以如在圖2的實施方式中那樣,防塵薄膜3為垂直地設置,在防塵薄膜組件1的下側將雷射加工機23加以配 置。作為其他的實施方式,是將這些全部的系統90度放平,防塵薄膜3為水平設置,可以從橫方向對防塵薄膜組件框架2用雷射25進行加工。從防止向防塵薄膜組件1的異物附著的觀點,圖2的實施方式為更優選。但是,可以根據搬送或機器的配置等步驟進行更適宜的選擇。Further, as in the embodiment of Fig. 2, the pellicle film 3 may be vertically disposed, and the laser processing machine 23 may be provided on the lower side of the pellicle film assembly 1. Set. As another embodiment, all of these systems are laid flat at 90 degrees, and the pellicle film 3 is horizontally disposed, and the pellicle frame 2 can be processed by the laser 25 from the lateral direction. The embodiment of Fig. 2 is more preferable from the viewpoint of preventing adhesion of foreign matter to the pellicle. However, it is possible to make a more appropriate selection according to steps such as transportation or machine configuration.

另外,圖1以及圖2的實施方式為防塵薄膜組件框架2中,對長邊的外側表面進行雷射25的加工,但是反對側或別的邊或面的表面,也可以對防塵薄膜組件1的位置進行更換設置,從而進行同樣的加工。In addition, in the embodiment of FIGS. 1 and 2, in the pellicle frame 2, the outer surface of the long side is processed by the laser 25, but the surface of the opposite side or the other side or surface may be applied to the pellicle assembly 1. The position is changed and the same processing is performed.

[實施例][Examples]

以下,對本發明的實施例進行詳細說明,但是本發明的範圍不被這些實施例所限定。Hereinafter, the embodiments of the present invention will be described in detail, but the scope of the present invention is not limited by the embodiments.

(實施例)(Example)

在10級(Class 10)的無塵室12中,製作如圖1所表示的那樣的形狀的防塵薄膜組件1。製作的防塵薄膜組件1使用進行了黑色陽極氧化鋁處理的鋁合金製的防塵薄膜組件框架2,外尺寸904.5mm×750mm,內尺寸894.5mm×736mm,高度包含厚度為1.3mm的遮罩黏著層8為7mm,角部為外尺寸R6、內尺寸R2。In the clean room 12 of class 10, a pellicle assembly 1 having a shape as shown in Fig. 1 was produced. The prepared pellicle film assembly 1 uses a black anodized aluminum alloy pellicle frame 2 having an outer dimension of 904.5 mm × 750 mm, an inner dimension of 894.5 mm × 736 mm, and a height of a mask adhesive layer having a thickness of 1.3 mm. 8 is 7 mm, and the corner is the outer dimension R6 and the inner dimension R2.

在此,防塵薄膜3為氟系聚合物(商品名CYTOP,旭硝子股份有限公司製),遮罩黏著材8以及防塵薄膜接著劑為矽酮黏著劑(商品名KR3700,信越化學工業股份有限公司製),防塵薄膜組件框架2的外側表面安裝有PTFE製的通氣過濾器11。進 一步,遮罩黏著層8的表面,安裝有保護遮罩黏著層8的離形層9。另外作為操作用途,在防塵薄膜組件框架2的短邊側面有高度1.5mm、深度1.5mm的半圓狀的溝4,長邊側面設有直徑2.5mm,深度2mm的非貫通的圓孔的凹孔10。Here, the dust-proof film 3 is a fluorine-based polymer (trade name: CYTOP, manufactured by Asahi Glass Co., Ltd.), and the mask adhesive 8 and the dust-proof film adhesive are an anthrone adhesive (trade name KR3700, manufactured by Shin-Etsu Chemical Co., Ltd.) A vent filter 11 made of PTFE is attached to the outer surface of the pellicle frame 2 . Enter In one step, the surface of the adhesive layer 8 is covered, and the release layer 9 which protects the adhesive layer 8 of the mask is mounted. Further, for the purpose of operation, a semicircular groove 4 having a height of 1.5 mm and a depth of 1.5 mm is provided on the short side surface of the pellicle frame 2, and a recessed hole having a diameter of 2.5 mm and a depth of 2 mm and a non-penetrating circular hole is provided on the long side surface. 10.

此防塵薄膜組件1如圖2表示得那樣配置,用支架(未圖示)大略垂直地將防塵薄膜組件框架2進行支持,使長邊外側面的一方為下側,用從雷射加工機23(松下電工SUNX股份有限公司製,波長10600nm)射出的雷射25,將條形碼6以及印字7進行加工。條形碼6表示的內容為製造者名、產品號碼、以及製造號。進行調整,使條形碼6的最小線寬度為0.15mm。此時,排氣罩20的開口部21為寬度7mm、長度80mm的長方形,一邊用與排氣通道22接續的多翼式風扇(未圖示)進行排氣,使風速為100mm/s,一邊進行加工。The pellicle film assembly 1 is disposed as shown in Fig. 2, and the pellicle frame 2 is supported substantially vertically by a bracket (not shown) so that one of the long side outer sides is the lower side, and the laser processing machine 23 is used. The laser 25 emitted from Matsushita Electric Industrial Co., Ltd. (wavelength: 10600 nm) processes the barcode 6 and the printing 7. The contents indicated by the barcode 6 are the manufacturer name, the product number, and the manufacturing number. Adjustment is made so that the minimum line width of the barcode 6 is 0.15 mm. At this time, the opening portion 21 of the hood 20 is a rectangle having a width of 7 mm and a length of 80 mm, and is exhausted by a multi-blade fan (not shown) connected to the exhaust passage 22 to set the wind speed to 100 mm/s. Processing.

其後,在暗室內對防塵薄膜組件1的異物進行檢査,不僅僅加工的個體資訊5(條形碼6以及印字7)附近,而且防塵薄膜組件1全體,異物或汙物一點也沒有。另外,條形碼6可以用讀碼器適宜地進行讀取。進一步,條形碼6用實體顯微鏡擴大進行了觀察,周圍的表面和階差完全沒有,僅確認到了陽極氧化鋁層內的黑色染料的變色。Thereafter, the foreign matter of the pellicle film assembly 1 is inspected in the dark room, not only in the vicinity of the processed individual information 5 (barcode 6 and printing 7), but also in the entire pellicle assembly 1, foreign matter or dirt. In addition, the barcode 6 can be suitably read by a code reader. Further, the bar code 6 was observed by enlarging with a stereoscopic microscope, and the surrounding surface and step were completely absent, and only the discoloration of the black dye in the anodized aluminum layer was confirmed.

[產業上之可利用性][Industrial availability]

本發明的防塵薄膜組件的製造方法,不是在防塵薄膜組件框架的製造階段,而是可以在防塵薄膜組件製造的階段,將各 防塵薄膜組件的製造上的資訊等的個體資訊進行表示,沒有異物或汙物的附著,個體資訊可以識別。另外,用該製造方法得到的防塵薄膜組件,在防塵薄膜組件的型式或品種等的種類的識別或各防塵薄膜組件個體的資訊的管理等是有效果的,可以被廣泛使用。The method for manufacturing the pellicle according to the present invention is not in the manufacturing stage of the pellicle frame, but may be in the stage of manufacturing the pellicle. Individual information such as information on the manufacture of the pellicle is indicated, and no individual or dirt is attached, and individual information can be recognized. In addition, the pellicle film assembly obtained by the above-described production method is effective in the recognition of the type of the pellicle film, the type of the pellicle, or the like, and the management of the information of each pellicle module, and can be widely used.

1‧‧‧防塵薄膜組件1‧‧‧Plastic membrane assembly

2‧‧‧防塵薄膜組件框架2‧‧‧Plastic membrane assembly frame

3‧‧‧防塵薄膜3‧‧‧Plastic film

4‧‧‧溝4‧‧‧ditch

5‧‧‧個體資訊5‧‧‧Individual information

6‧‧‧條形碼6‧‧‧ barcode

7‧‧‧印字7‧‧‧Printing

8‧‧‧遮罩黏著層8‧‧‧ Mask adhesive layer

9‧‧‧離形層9‧‧‧Fractal layer

10‧‧‧凹孔10‧‧‧ recessed hole

11‧‧‧通氣過濾器11‧‧‧Ventilation filter

Claims (2)

一種防塵薄膜組件的製造方法,其特徵在於:由不吸收波長500nm~11000nm的雷射的材質形成的防塵薄膜被通過由不吸收波長500nm~11000nm的雷射的材質形成的接著劑貼附的防塵薄膜組件框架的表面上,用波長500nm~11000nm的雷射進行照射而進行所述防塵薄膜組件的個體資訊的加工時,將防塵薄膜貼附而覆蓋的防塵薄膜組件框架的部位作為所述雷射的照射部位,從與所述照射部位相同的一側進行抽吸排氣。 A method for producing a pellicle film, characterized in that a pellicle film formed of a material that does not absorb a laser having a wavelength of 500 nm to 11,000 nm is dust-proofed by an adhesive formed of a material that does not absorb a laser having a wavelength of 500 nm to 11,000 nm. On the surface of the film module frame, when the individual information of the pellicle is processed by irradiation with a laser having a wavelength of 500 nm to 11,000 nm, a portion of the pellicle frame to which the pellicle is attached is covered as the laser. The irradiated portion is suctioned and exhausted from the same side as the irradiated portion. 一種防塵薄膜組件,由防塵薄膜組件框架、防塵薄膜、使所述防塵薄膜與所述防塵薄膜組件框架貼附的接著層、用以貼附遮罩的黏著層以及保護該黏著層的離型層所構成,其特徵在於:在所述防塵薄膜貼附而覆蓋的所述防塵薄膜組件框架的表面上,用雷射進行所述防塵薄膜組件的個體資訊的加工。 A pellicle assembly comprising a pellicle frame, a pellicle, an adhesive layer for attaching the pellicle to the pellicle frame, an adhesive layer for attaching the mask, and a release layer for protecting the adhesive layer According to the configuration, the individual information of the pellicle is processed by laser on the surface of the pellicle frame that is covered by the pellicle.
TW102104945A 2012-02-16 2013-02-07 Method for manufacturing dustproof film assembly TWI484288B (en)

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KR102366806B1 (en) * 2015-05-13 2022-02-23 삼성전자주식회사 Pellicle preventing a thermal accumulation and Extremely Ultra-Violet lithography apparatus having the same
TWI741848B (en) * 2018-10-29 2021-10-01 家登精密工業股份有限公司 Reticle retaining system

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JP2877841B2 (en) * 1989-06-12 1999-04-05 大日本印刷株式会社 Device for repairing defects such as emulsion masks
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TW200848191A (en) * 2007-05-16 2008-12-16 Nitto Denko Corp Laser processing method and laser-processed product

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