HK1183943A1 - Method of manufacturing a dust-prevention film component - Google Patents

Method of manufacturing a dust-prevention film component

Info

Publication number
HK1183943A1
HK1183943A1 HK13111144.7A HK13111144A HK1183943A1 HK 1183943 A1 HK1183943 A1 HK 1183943A1 HK 13111144 A HK13111144 A HK 13111144A HK 1183943 A1 HK1183943 A1 HK 1183943A1
Authority
HK
Hong Kong
Prior art keywords
dust
manufacturing
prevention film
film component
component
Prior art date
Application number
HK13111144.7A
Other languages
Chinese (zh)
Inventor
关原敏
Original Assignee
信越化學工業株式會社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 信越化學工業株式會社 filed Critical 信越化學工業株式會社
Publication of HK1183943A1 publication Critical patent/HK1183943A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
HK13111144.7A 2012-02-16 2013-09-30 Method of manufacturing a dust-prevention film component HK1183943A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012031621A JP5663507B2 (en) 2012-02-16 2012-02-16 Pellicle manufacturing method

Publications (1)

Publication Number Publication Date
HK1183943A1 true HK1183943A1 (en) 2014-01-10

Family

ID=48961519

Family Applications (1)

Application Number Title Priority Date Filing Date
HK13111144.7A HK1183943A1 (en) 2012-02-16 2013-09-30 Method of manufacturing a dust-prevention film component

Country Status (5)

Country Link
JP (1) JP5663507B2 (en)
KR (1) KR102018067B1 (en)
CN (1) CN103257522B (en)
HK (1) HK1183943A1 (en)
TW (1) TWI484288B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102366806B1 (en) * 2015-05-13 2022-02-23 삼성전자주식회사 Pellicle preventing a thermal accumulation and Extremely Ultra-Violet lithography apparatus having the same
TWI712552B (en) * 2018-10-29 2020-12-11 家登精密工業股份有限公司 Reticle retaining system

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2877841B2 (en) * 1989-06-12 1999-04-05 大日本印刷株式会社 Device for repairing defects such as emulsion masks
JPH09192875A (en) * 1996-01-10 1997-07-29 Nikon Corp Laser beam machine
JPH1099978A (en) * 1996-09-27 1998-04-21 Hitachi Ltd Laser beam machine
JP3346205B2 (en) * 1996-12-13 2002-11-18 信越化学工業株式会社 Pellicle manufacturing method
JPH1184632A (en) 1997-09-12 1999-03-26 Nikon Corp Management device for pellicle, projection aligner and projection alignment method
US6894766B1 (en) * 2001-03-27 2005-05-17 Dupont Photomasks, Inc. Method for constructing a photomask assembly using an encoded mark
JP5096040B2 (en) * 2007-05-16 2012-12-12 日東電工株式会社 Laser processing method and laser processed product

Also Published As

Publication number Publication date
TW201346433A (en) 2013-11-16
CN103257522B (en) 2016-05-04
TWI484288B (en) 2015-05-11
JP5663507B2 (en) 2015-02-04
JP2013167795A (en) 2013-08-29
KR20130094682A (en) 2013-08-26
KR102018067B1 (en) 2019-09-04
CN103257522A (en) 2013-08-21

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20220205