JPH09192875A - Laser beam machine - Google Patents
Laser beam machineInfo
- Publication number
- JPH09192875A JPH09192875A JP8002168A JP216896A JPH09192875A JP H09192875 A JPH09192875 A JP H09192875A JP 8002168 A JP8002168 A JP 8002168A JP 216896 A JP216896 A JP 216896A JP H09192875 A JPH09192875 A JP H09192875A
- Authority
- JP
- Japan
- Prior art keywords
- laser beam
- laser
- processing
- workpiece
- work
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、エキシマレーザ等
の紫外域のレーザ光によるアブレーションを利用したレ
ーザ加工装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a laser processing apparatus utilizing ablation by laser light in the ultraviolet region such as excimer laser.
【0002】[0002]
【従来の技術】高分子材料やセラミックス材料に微細加
工を施すための装置として、エキシマレーザ等によって
得られる紫外域のレーザ光を用いたレーザ加工装置があ
る。2. Description of the Related Art As an apparatus for finely processing a polymer material or a ceramic material, there is a laser processing apparatus using a laser beam in the ultraviolet region obtained by an excimer laser or the like.
【0003】例えば、KrFエキシマレーザは波長24
8nmの紫外線を発生し、ArFエキシマレーザは波長
193nmの真空紫外線を発生するが、これらの紫外線
の光子エネルギーは原子の結合エネルギーに相当する。
また、エキシマレーザは数十ナノ秒のパルス幅で数百ミ
リジュール以上の大エネルギーを瞬間的に発生すること
ができる。このようなレーザ光を高分子材料等でできた
被加工物に照射すると、アブレーション(光化学反応)
によって被加工物を構成する材料の分子間結合が破壊さ
れ、材料が蒸発、飛散することで加工が行われる。この
アブレーションを利用するレーザ加工は、炭酸ガスレー
ザなど赤外域のレーザ光を用いるレーザ加工と違って、
被加工物に熱的影響を及ぼすことなく加工をすることが
できるという利点を有する。ところで、従来のレーザ加
工装置は、被加工物をステージ上に保持し、被加工物の
加工面に上方からレーザ光を照射して加工を行ってい
た。For example, a KrF excimer laser has a wavelength of 24
The ultraviolet light of 8 nm is generated, and the ArF excimer laser generates vacuum ultraviolet light of wavelength 193 nm, and the photon energy of these ultraviolet rays corresponds to the binding energy of atoms.
Further, the excimer laser can instantaneously generate a large energy of several hundreds of millijoules or more with a pulse width of several tens of nanoseconds. When such a laser beam is applied to a work piece made of a polymer material or the like, ablation (photochemical reaction)
As a result, the intermolecular bond of the material forming the workpiece is broken, and the material is evaporated and scattered to perform the processing. Laser processing using this ablation is different from laser processing using laser light in the infrared region such as carbon dioxide gas laser.
This has an advantage that processing can be performed without thermally affecting the workpiece. By the way, in the conventional laser processing apparatus, the workpiece is held on the stage, and the processing surface of the workpiece is irradiated with laser light from above to perform the processing.
【0004】[0004]
【発明が解決しようとする課題】アブレーションを利用
するレーザ加工は、高分子材料のような炭素含有材料等
にレーザ光を照射し、レーザ光が照射された部分の材料
の分子間結合を破壊して加工を行うものであるため、レ
ーザ光を照射した部分からすすや微細な除去物が発生す
る。In the laser processing utilizing ablation, a carbon-containing material such as a polymer material is irradiated with laser light to destroy the intermolecular bond of the material irradiated with the laser light. Since the processing is performed by so-called processing, soot and fine removed matter are generated from the portion irradiated with the laser beam.
【0005】図5(a)に示すように、レーザ加工中に
発生したすす42〜45が被加工物40の加工面41に
付着すると、すす42〜45にレーザ光LBが吸収され
てしまう。そのため、すす42〜45が付着した部分は
加工速度が遅くなり、加工が進むにつれて、図5(b)
に示すように加工面41に凹凸が生じたり、加工の輪郭
が乱れたりして均一な加工ができないという問題があっ
た。本発明は、このような従来技術の問題点に鑑みてな
されたもので、加工中に被加工物からすすが発生しても
良好なレーザ加工を行うことのできるレーザ加工装置を
提供することを目的とする。As shown in FIG. 5A, when the soot 42 to 45 generated during laser processing adheres to the processing surface 41 of the workpiece 40, the soot 42 to 45 absorbs the laser beam LB. Therefore, the processing speed becomes slow in the portion where the soot 42 to 45 adhere, and as the processing progresses, as shown in FIG.
As shown in FIG. 3, there is a problem that unevenness is generated on the processed surface 41 or the contour of the processing is disturbed, and uniform processing cannot be performed. The present invention has been made in view of the above problems of the prior art, and it is an object of the present invention to provide a laser processing apparatus capable of performing excellent laser processing even if soot is generated from a workpiece during processing. To aim.
【0006】[0006]
【課題を解決するための手段】本発明では、加工面が下
方を向くようにして被加工物を保持し、被加工物の下方
から加工面にレーザ光を照射してレーザ加工を行うこと
で前記目的を達成する。According to the present invention, a work piece is held with the work surface facing downward, and laser light is applied to the work surface from below the work piece to perform laser processing. To achieve the above objectives.
【0007】加工面は下方が開放されており、レーザ加
工は被加工物の下方に面する表面から内部に向かって行
われるため、レーザ加工中に発生したすすは自重で下に
落ちることができる。したがって、レーザ加工面にすす
が付着することがないので、加工レーザ光はすすによる
吸収を受けることがなく、設計通りの輪郭を有する均一
なレーザ加工を実現することができる。Since the machined surface is open on the lower side and the laser machining is performed from the lower surface of the workpiece toward the inside, the soot generated during the laser machining can fall down by its own weight. . Therefore, since soot does not adhere to the laser processing surface, the processing laser light is not absorbed by soot, and uniform laser processing having a contour as designed can be realized.
【0008】すなわち、本発明は、紫外域のレーザ光を
出射する光源と、被加工物を保持する保持手段と、レー
ザ光を保持手段に保持された被加工物に照射する照射光
学系とを有するレーザ加工装置において、保持手段は被
加工物の加工面を下方に向けて保持し、照射光学系は被
加工物に下方側からレーザ光を照射することを特徴とす
る。That is, the present invention comprises a light source for emitting a laser beam in the ultraviolet region, a holding means for holding a work piece, and an irradiation optical system for irradiating the work piece held by the holding means with the laser light. In the laser processing apparatus having the above, the holding means holds the processed surface of the workpiece downward, and the irradiation optical system irradiates the workpiece with laser light from the lower side.
【0009】レーザ光の照射によって被加工物から落下
したすす等の発生物が雰囲気中に浮遊して装置の光学系
等を汚染するのを防止するために、被加工物の加工面の
近くにすす等の発生物を真空吸引する吸引手段を備える
のが好ましい。また、被加工物の加工面、特にレーザ光
照射領域にガスを吹き付ける手段を更に備えることで、
レーザ加工中に発生したすすを加工面から効果的に除去
して、均一な加工を行うことができる。In order to prevent the generation of soot or the like dropped from the work piece due to the irradiation of the laser beam from floating in the atmosphere and contaminating the optical system of the apparatus, etc. It is preferable to provide a suction means for vacuum-sucking a product such as soot. Further, by further providing a means for blowing a gas onto the processed surface of the workpiece, particularly the laser light irradiation region,
Soot generated during laser processing can be effectively removed from the processed surface, and uniform processing can be performed.
【0010】[0010]
【発明の実施の形態】以下、図面を参照して発明の実施
の形態を説明する。図1は、本発明の実施の形態を説明
する概略図である。エキシマレーザ等のレーザ光源1か
ら発振された紫外域のレーザ光LBは、ビーム整形部2
により適切なビーム形状に整形されたのち、被加工物7
に加工すべきパターンと相似形の光透過パターンを有す
るマスク3に照射される。マスク3を透過したレーザ光
LBは、ダイクロイックミラー4で反射され、対物レン
ズ6を通ったのち反射ミラー11a,11bで反射され
て被加工物7に照射され、被加工物7上にマスク3のパ
ターンの等倍像あるいは縮小像が形成される。マスク3
は、対物レンズ6に関して被加工物7の加工面を共役な
位置に配置されている。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic diagram illustrating an embodiment of the present invention. The laser beam LB in the ultraviolet region oscillated from the laser light source 1 such as an excimer laser is emitted by the beam shaping unit 2
Is shaped into an appropriate beam shape by the
The mask 3 having a light transmission pattern similar to the pattern to be processed is irradiated. The laser beam LB that has passed through the mask 3 is reflected by the dichroic mirror 4, passes through the objective lens 6, and then is reflected by the reflection mirrors 11 a and 11 b to irradiate the workpiece 7, and the laser beam LB on the workpiece 7 is reflected. A 1: 1 image or a reduced image of the pattern is formed. Mask 3
Is arranged at a position conjugate with the processing surface of the workpiece 7 with respect to the objective lens 6.
【0011】被加工物7は、ステージ8の下面側に固定
されている。ステージ8への被加工物7の固定は、例え
ば図2(a)に示すように、ステージ8の下面の一端側
に固定部材25を、他端側に可動部材26を設け、その
間に被加工物7を配置することによって行うことができ
る。可動部材26はバネ27,28の力で被加工物7の
端面に押圧され、被加工物7は固定部材25と可動部材
26の間に挟み込まれて固定される。あるいは、被加工
物7のステージ8上への固定は、図2(b)に示すよう
に、ステージ8上に置かれた被加工物7の両端を断面L
字型の固定用部材31,32で押さえ、固定用部材3
1,32をビス33等によってステージ8に固定する方
法によってもよい。The workpiece 7 is fixed to the lower surface side of the stage 8. The workpiece 7 is fixed to the stage 8 by, for example, as shown in FIG. 2A, a fixing member 25 is provided on one end side of the lower surface of the stage 8 and a movable member 26 is provided on the other end side of the lower surface of the stage 8. This can be done by placing the object 7. The movable member 26 is pressed against the end surface of the workpiece 7 by the force of the springs 27 and 28, and the workpiece 7 is sandwiched and fixed between the fixed member 25 and the movable member 26. Alternatively, as shown in FIG. 2B, the workpiece 7 is fixed on the stage 8 by cutting the workpiece 7 placed on the stage 8 into a cross section L at both ends.
The fixing member 3 is held down by the character-shaped fixing members 31 and 32.
Alternatively, the method of fixing 1, 32 to the stage 8 with screws 33 or the like may be used.
【0012】ステージ8は、モータ21等の駆動装置に
よって2次元方向に移動可能である。ステージ8には移
動鏡22が固定されており、レーザ干渉計23で移動鏡
22との間の距離を計測することによりステージ8の座
標位置が検知される。制御部9は、レーザ干渉計23の
出力をモニターしながらステージ8の座標位置が予め入
力された値となるようにモータ21を駆動することで、
加工レーザ光LBに対して被加工物7を位置決めする。
図示されていないが、ステージ8はステージ上で被加工
物を回転させる回転機構も有し、被加工物7は制御部9
の制御下に並進あるいは回転される。The stage 8 can be moved in a two-dimensional direction by a driving device such as a motor 21. The movable mirror 22 is fixed to the stage 8, and the coordinate position of the stage 8 is detected by measuring the distance between the movable mirror 22 and the laser interferometer 23. The control unit 9 drives the motor 21 so that the coordinate position of the stage 8 becomes a value input in advance while monitoring the output of the laser interferometer 23.
The workpiece 7 is positioned with respect to the processing laser beam LB.
Although not shown, the stage 8 also has a rotating mechanism for rotating the workpiece on the stage, and the workpiece 7 is controlled by the controller 9
Is translated or rotated under the control of.
【0013】レーザ光源1による照射エネルギー密度の
設定は以下のようにして行われる。まず、モータ21を
駆動してステージ8を移動させ、ステージ8上に設けら
れたエネルギーメータ5aが加工レーザ光LBの照射位
置にくるようにする。この状態でレーザ光源1を駆動
し、加工レーザ光LBの1パルスのエネルギー(単位:
ジュール)をモニターする。制御部9は、予め分かって
いる照射パターンの面積から照射エネルギー密度を計算
する。そして、制御部9は被加工物の加工面に照射され
る照射エネルギー密度が計算された所定の値になるよう
にレーザ光源1の出力を調整することで、照射エネルギ
ー密度の設定が行われる。加工中は、エネルギーメータ
5aを使用することができないので、ダイクロイックミ
ラー4を透過したレーザ光が入射する別のエネルギーメ
ータ5bによって照射エネルギーをモニターする。制御
部9は、エネルギーメータ5bからの信号を用いてレー
ザ光源1の出力をフィードバック制御し、あるいはレー
ザ光源1のエネルギー安定性が悪い場合には警報を発し
たり加工を中止する指令を出したりする。The irradiation energy density is set by the laser light source 1 as follows. First, the motor 21 is driven to move the stage 8 so that the energy meter 5a provided on the stage 8 is at the irradiation position of the processing laser beam LB. The laser light source 1 is driven in this state, and the energy of one pulse of the processing laser light LB (unit:
Joule). The control unit 9 calculates the irradiation energy density from the area of the irradiation pattern which is known in advance. Then, the control unit 9 sets the irradiation energy density by adjusting the output of the laser light source 1 so that the irradiation energy density applied to the processed surface of the workpiece becomes the calculated predetermined value. Since the energy meter 5a cannot be used during processing, the irradiation energy is monitored by another energy meter 5b on which the laser light transmitted through the dichroic mirror 4 is incident. The control unit 9 feedback-controls the output of the laser light source 1 using the signal from the energy meter 5b, or issues an alarm or issues a command to stop processing when the energy stability of the laser light source 1 is poor. .
【0014】図3に、レーザ加工中の被加工物の拡大図
を示す。本発明によると、被加工物7の加工面は下方側
を向いており、加工レーザ光LBは下方側から被加工物
に照射される。したがって、被加工物7のレーザ光照射
部で発生したすす等の微細な粒子35は、従来のように
加工部に堆積することなく加工部から離脱して自重で下
に落ち、自動的に加工表面から取り除かれる。そのた
め、図5で説明した従来例のように加工面にすすが付着
してレーザ加工を妨げるようなことがなく、設計通りの
輪郭を有する加工を均一に行うことができる。FIG. 3 shows an enlarged view of the workpiece during laser processing. According to the present invention, the processing surface of the workpiece 7 faces downward, and the processing laser beam LB is applied to the workpiece from the lower side. Therefore, the fine particles 35 such as soot generated at the laser light irradiation portion of the workpiece 7 are separated from the processing portion without being deposited on the processing portion as in the conventional case, and fall down by its own weight, and are automatically processed. Removed from the surface. Therefore, unlike the conventional example described with reference to FIG. 5, soot does not adhere to the processing surface and interferes with the laser processing, and processing having a contour as designed can be uniformly performed.
【0015】このとき、図3に示すように、ガス吸引装
置37をレーザ光照射部の近くに配置し、加工部から落
下してくるすす等の発生物35を吸引するようにする
と、これらの発生物35が雰囲気中を浮遊して光学系に
付着したり、装置の他の部分を汚染するのを防止するこ
とができる。At this time, as shown in FIG. 3, if a gas suction device 37 is arranged near the laser light irradiation part to suck the generated substances 35 such as soot falling from the processing part, the gas suction device 37 and the gas irradiation device 37 are sucked. It is possible to prevent the generated product 35 from floating in the atmosphere and adhering to the optical system or contaminating other parts of the device.
【0016】また、図4に示すように、ガス吸引装置3
7とともにガス吹き付けノズル38をレーザ光照射部に
対してガス吸引装置37の反対側に配置し、被加工物7
の加工部にヘリウムガスや窒素ガスのような不活性ガス
を適当な流量で吹き付けるようにすると、レーザ光LB
の照射部からすす等の発生物35を確実に除去して良好
なレーザ加工を行うことができる。ガス吹き付けノズル
38からレーザ光照射部に吹き付けるガスは、流量をあ
まり大きくすると発生物35をかえって飛散させること
になってしまう。したがって、実際の形態では、ガス吹
き付けノズル38は、吹き付けたガスがガス吸引装置3
7によって全量吸引されるように、ガス吸引手段37の
位置及び吸引量を考慮して吹き付け流量あるいは吹き付
け方向等を設定している。Further, as shown in FIG. 4, the gas suction device 3
7, the gas blowing nozzle 38 is arranged on the side opposite to the gas suction device 37 with respect to the laser beam irradiation part, and the workpiece 7
If an inert gas such as helium gas or nitrogen gas is blown to the processed portion of the laser at an appropriate flow rate, the laser beam LB
It is possible to surely remove the soot and other generated substances 35 from the irradiation portion of (1) and perform favorable laser processing. When the flow rate of the gas blown from the gas blowing nozzle 38 to the laser beam irradiation portion is too large, the generated substances 35 are scattered instead. Therefore, in an actual form, the gas spray nozzle 38 is configured so that the sprayed gas is the gas suction device 3
The blowing flow rate, the blowing direction, etc. are set in consideration of the position and the suction amount of the gas suction means 37 so that the entire amount is sucked by 7.
【0017】図1にもどって、被加工物7の加工面の観
察は、観察光源10から発した観察光IBを反射ミラー
11cで反射させ、ダイクロイックミラー4、対物レン
ズ6を通して加工レーザ光LBと同軸で被加工物7の加
工領域に照射し、その反射光をCCDカメラ12に取り
込み、TVモニター14で観察することで行われる。Returning to FIG. 1, when observing the processing surface of the workpiece 7, the observation light IB emitted from the observation light source 10 is reflected by the reflection mirror 11c, and the processing laser light LB is passed through the dichroic mirror 4 and the objective lens 6. This is performed by irradiating the processing area of the workpiece 7 coaxially, capturing the reflected light in the CCD camera 12, and observing it on the TV monitor 14.
【0018】画像処理装置13は、CCDカメラ12で
取り込んだ画像の記憶及びサーチ等の処理を行うことが
でき、被加工物7上に予め形成されているアライメント
マークのサーチ及び位置測定を行うことができる。制御
部9は、画像処理装置13の信号を用いて、モータ21
によりステージ8を駆動して、被加工物7のローテーシ
ョン補正や位置合わせを行うことができる。The image processing apparatus 13 can perform processing such as storage and search of an image captured by the CCD camera 12, and search and position measurement of an alignment mark previously formed on the workpiece 7. You can The control unit 9 uses the signal from the image processing device 13 to drive the motor 21.
Thus, the stage 8 can be driven to perform rotation correction and alignment of the workpiece 7.
【0019】[0019]
【発明の効果】本発明によると、加工中にすすが発生し
てもその影響を受けずに均一で良好なレーザ加工を行う
ことができる。According to the present invention, even if soot is generated during processing, it is not affected by soot and uniform and excellent laser processing can be performed.
【図1】本発明によるレーザ加工装置の概略図。FIG. 1 is a schematic view of a laser processing apparatus according to the present invention.
【図2】ステージへの被加工物の固定方法を説明する
図。FIG. 2 is a diagram illustrating a method of fixing a work piece to a stage.
【図3】レーザ加工中の被加工物の拡大図。FIG. 3 is an enlarged view of a workpiece during laser processing.
【図4】レーザ加工中の被加工物の拡大図。FIG. 4 is an enlarged view of a workpiece during laser processing.
【図5】従来例の問題点を説明する図。FIG. 5 is a diagram illustrating a problem of a conventional example.
1…レーザ光源、2…ビーム整形部、3…マスク、4…
ダイクロイックミラー、5a,5b…エネルギーメー
タ、6…対物レンズ、7…被加工物、8…ステージ、9
…制御部、10…観察光源、11a,11b,11c…
反射ミラー、12…CCDカメラ、13…画像処理装
置、14…TVモニター、25…固定部材、26…可動
部材、27,28…バネ、31,32…固定用部材、3
3…ビス、35…発生物、37…ガス吸引手段、38…
ガス吹き付けノズル、40…被加工物、41…加工面、
42,43,44,45…すす、LB…加工レーザ光、
IB…観察光1 ... Laser light source, 2 ... Beam shaping unit, 3 ... Mask, 4 ...
Dichroic mirror, 5a, 5b ... Energy meter, 6 ... Objective lens, 7 ... Workpiece, 8 ... Stage, 9
... Control unit, 10 ... Observation light source, 11a, 11b, 11c ...
Reflection mirror, 12 ... CCD camera, 13 ... Image processing device, 14 ... TV monitor, 25 ... Fixed member, 26 ... Movable member, 27, 28 ... Spring, 31, 32 ... Fixing member, 3
3 ... screw, 35 ... generation object, 37 ... gas suction means, 38 ...
Gas blowing nozzle, 40 ... Workpiece, 41 ... Processing surface,
42, 43, 44, 45 ... Soot, LB ... Processing laser light,
IB ... Observation light
Claims (3)
加工物を保持する保持手段と、前記レーザ光を前記保持
手段に保持された被加工物に照射する照射光学系とを有
するレーザ加工装置において、 前記保持手段は前記被加工物の加工面を下方に向けて保
持し、前記照射光学系は前記被加工物に前記下方側から
前記レーザ光を照射することを特徴とするレーザ加工装
置。1. A laser having a light source for emitting a laser beam in the ultraviolet range, a holding means for holding a work piece, and an irradiation optical system for irradiating the work piece held by the holding means with the laser light. In the processing apparatus, the holding means holds the processing surface of the workpiece downward, and the irradiation optical system irradiates the workpiece with the laser beam from the lower side. apparatus.
物から発生する発生物を吸引する吸引手段を備えること
を特徴とする請求項1記載のレーザ加工装置。2. The laser processing apparatus according to claim 1, further comprising suction means for sucking a product generated from the workpiece by the irradiation of the laser light.
る手段を更に備えることを特徴とする請求項2記載のレ
ーザ加工装置。3. The laser processing apparatus according to claim 2, further comprising means for blowing gas onto the processing surface of the workpiece.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8002168A JPH09192875A (en) | 1996-01-10 | 1996-01-10 | Laser beam machine |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8002168A JPH09192875A (en) | 1996-01-10 | 1996-01-10 | Laser beam machine |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH09192875A true JPH09192875A (en) | 1997-07-29 |
Family
ID=11521844
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8002168A Pending JPH09192875A (en) | 1996-01-10 | 1996-01-10 | Laser beam machine |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH09192875A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002164264A (en) * | 2000-11-27 | 2002-06-07 | Shin Etsu Handotai Co Ltd | Soft laser marking method and apparatus |
JP2002540950A (en) * | 1999-04-07 | 2002-12-03 | シーメンス ソーラー ゲゼルシャフト ミット ベシュレンクテル ハフツング | Apparatus and method for peeling a thin layer on a carrier material |
WO2005116751A1 (en) * | 2004-05-26 | 2005-12-08 | Nikon Corporation | Wavelength converting optical system, laser light source, exposure apparatus, mask examining apparatus, and macromolecular crystal lens machining device |
US7339961B2 (en) | 2005-08-08 | 2008-03-04 | Nikon Corporation | Wavelength converting optical system, laser light source, exposure apparatus, device for inspecting object of inspection, and polymer crystal working apparatus |
JP2009271289A (en) * | 2008-05-07 | 2009-11-19 | Fujifilm Corp | Recessed part forming method, manufacturing method of irregular product, manufacturing method of light emitting element, and manufacturing method of optical element |
JP2012011440A (en) * | 2010-07-02 | 2012-01-19 | Disco Corp | Laser beam machining device |
KR20130094682A (en) * | 2012-02-16 | 2013-08-26 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Method of manufacturing pellicle |
-
1996
- 1996-01-10 JP JP8002168A patent/JPH09192875A/en active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002540950A (en) * | 1999-04-07 | 2002-12-03 | シーメンス ソーラー ゲゼルシャフト ミット ベシュレンクテル ハフツング | Apparatus and method for peeling a thin layer on a carrier material |
JP2002164264A (en) * | 2000-11-27 | 2002-06-07 | Shin Etsu Handotai Co Ltd | Soft laser marking method and apparatus |
WO2005116751A1 (en) * | 2004-05-26 | 2005-12-08 | Nikon Corporation | Wavelength converting optical system, laser light source, exposure apparatus, mask examining apparatus, and macromolecular crystal lens machining device |
EP1750172A1 (en) * | 2004-05-26 | 2007-02-07 | Nikon Corporation | Wavelength converting optical system, laser light source, exposure apparatus, mask examining apparatus, and macromolecular crystal lens machining device |
US7623557B2 (en) | 2004-05-26 | 2009-11-24 | Nikon Corporation | Wavelength converting optical system, laser light source, exposure apparatus, mask examining apparatus, and macromolecular crystal lens machining device |
EP1750172A4 (en) * | 2004-05-26 | 2011-11-30 | Nikon Corp | Wavelength converting optical system, laser light source, exposure apparatus, mask examining apparatus, and macromolecular crystal lens machining device |
US7339961B2 (en) | 2005-08-08 | 2008-03-04 | Nikon Corporation | Wavelength converting optical system, laser light source, exposure apparatus, device for inspecting object of inspection, and polymer crystal working apparatus |
JP2009271289A (en) * | 2008-05-07 | 2009-11-19 | Fujifilm Corp | Recessed part forming method, manufacturing method of irregular product, manufacturing method of light emitting element, and manufacturing method of optical element |
JP2012011440A (en) * | 2010-07-02 | 2012-01-19 | Disco Corp | Laser beam machining device |
KR20130094682A (en) * | 2012-02-16 | 2013-08-26 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Method of manufacturing pellicle |
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