TWI481836B - 用於監測基材之方法以及位置敏感性高溫計 - Google Patents

用於監測基材之方法以及位置敏感性高溫計 Download PDF

Info

Publication number
TWI481836B
TWI481836B TW099127986A TW99127986A TWI481836B TW I481836 B TWI481836 B TW I481836B TW 099127986 A TW099127986 A TW 099127986A TW 99127986 A TW99127986 A TW 99127986A TW I481836 B TWI481836 B TW I481836B
Authority
TW
Taiwan
Prior art keywords
substrate
pixel array
array sensor
position sensitive
thermal radiation
Prior art date
Application number
TW099127986A
Other languages
English (en)
Chinese (zh)
Other versions
TW201129786A (en
Inventor
Ming Lun Yu
Markus E Beck
Original Assignee
First Solar Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by First Solar Inc filed Critical First Solar Inc
Publication of TW201129786A publication Critical patent/TW201129786A/zh
Application granted granted Critical
Publication of TWI481836B publication Critical patent/TWI481836B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
    • G01J5/0007—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter of wafers or semiconductor substrates, e.g. using Rapid Thermal Processing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/0022—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiation of moving bodies
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/027—Constructional details making use of sensor-related data, e.g. for identification of sensor parts or optical elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/0275—Control or determination of height or distance or angle information for sensors or receivers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/04—Casings
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/04—Casings
    • G01J5/047—Mobile mounting; Scanning arrangements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G01J5/0801—Means for wavelength selection or discrimination
    • G01J5/0802—Optical filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G01J5/0818—Waveguides
    • G01J5/0821—Optical fibres
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G01J5/0831—Masks; Aperture plates; Spatial light modulators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G01J5/0846—Optical arrangements having multiple detectors for performing different types of detection, e.g. using radiometry and reflectometry channels

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Radiation Pyrometers (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Measuring Temperature Or Quantity Of Heat (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
TW099127986A 2009-08-21 2010-08-20 用於監測基材之方法以及位置敏感性高溫計 TWI481836B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US23585509P 2009-08-21 2009-08-21

Publications (2)

Publication Number Publication Date
TW201129786A TW201129786A (en) 2011-09-01
TWI481836B true TWI481836B (zh) 2015-04-21

Family

ID=43606030

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099127986A TWI481836B (zh) 2009-08-21 2010-08-20 用於監測基材之方法以及位置敏感性高溫計

Country Status (5)

Country Link
US (1) US20110046916A1 (https=)
CN (1) CN102484041B (https=)
IN (1) IN2012DN01719A (https=)
TW (1) TWI481836B (https=)
WO (1) WO2011022648A1 (https=)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102364700B (zh) * 2011-10-26 2013-03-27 常州天合光能有限公司 太阳能电池rie工艺温度补偿方法
US9151597B2 (en) * 2012-02-13 2015-10-06 First Solar, Inc. In situ substrate detection for a processing system using infrared detection
CN104075809B (zh) * 2013-03-28 2019-05-07 中晟光电设备（上海）股份有限公司 红外光学温度测量装置、方法及mocvd系统
US9346127B2 (en) 2014-06-20 2016-05-24 Velo3D, Inc. Apparatuses, systems and methods for three-dimensional printing
US9662840B1 (en) 2015-11-06 2017-05-30 Velo3D, Inc. Adept three-dimensional printing
US10183330B2 (en) 2015-12-10 2019-01-22 Vel03D, Inc. Skillful three-dimensional printing
CN108883575A (zh) 2016-02-18 2018-11-23 维洛3D公司 准确的三维打印
EP3263316B1 (en) 2016-06-29 2019-02-13 VELO3D, Inc. Three-dimensional printing and three-dimensional printers
US11691343B2 (en) 2016-06-29 2023-07-04 Velo3D, Inc. Three-dimensional printing and three-dimensional printers
US20180095450A1 (en) 2016-09-30 2018-04-05 Velo3D, Inc. Three-dimensional objects and their formation
US20180126461A1 (en) 2016-11-07 2018-05-10 Velo3D, Inc. Gas flow in three-dimensional printing
US20180154443A1 (en) * 2016-12-06 2018-06-07 Velo3D, Inc. Optics, detectors, and three-dimensional printing
US20180186082A1 (en) 2017-01-05 2018-07-05 Velo3D, Inc. Optics in three-dimensional printing
US10357829B2 (en) 2017-03-02 2019-07-23 Velo3D, Inc. Three-dimensional printing of three-dimensional objects
US20180281237A1 (en) 2017-03-28 2018-10-04 Velo3D, Inc. Material manipulation in three-dimensional printing
US10272525B1 (en) 2017-12-27 2019-04-30 Velo3D, Inc. Three-dimensional printing systems and methods of their use
US10144176B1 (en) 2018-01-15 2018-12-04 Velo3D, Inc. Three-dimensional printing systems and methods of their use
JP2021511344A (ja) * 2018-01-22 2021-05-06 ブリストル−マイヤーズ スクイブ カンパニーＢｒｉｓｔｏｌ−Ｍｙｅｒｓ Ｓｑｕｉｂｂ Ｃｏｍｐａｎｙ 癌を治療する組成物および方法
CA3148849A1 (en) 2019-07-26 2021-02-04 Velo3D, Inc. Quality assurance in formation of three-dimensional objects
US11686683B2 (en) * 2020-04-30 2023-06-27 Taiwan Semiconductor Manufacturing Co., Ltd. System and method for detecting contamination of thin-films
DE102021103455A1 (de) 2020-04-30 2021-11-04 Taiwan Semiconductor Manufacturing Co., Ltd. System und verfahren zur erkennung der verunreinigung vondünnschichten
US11342484B2 (en) 2020-05-11 2022-05-24 Silanna UV Technologies Pte Ltd Metal oxide semiconductor-based light emitting device
US11760169B2 (en) 2020-08-20 2023-09-19 Denso International America, Inc. Particulate control systems and methods for olfaction sensors
US11636870B2 (en) 2020-08-20 2023-04-25 Denso International America, Inc. Smoking cessation systems and methods
US11932080B2 (en) 2020-08-20 2024-03-19 Denso International America, Inc. Diagnostic and recirculation control systems and methods
US12017506B2 (en) 2020-08-20 2024-06-25 Denso International America, Inc. Passenger cabin air control systems and methods
US11760170B2 (en) 2020-08-20 2023-09-19 Denso International America, Inc. Olfaction sensor preservation systems and methods
US12377711B2 (en) 2020-08-20 2025-08-05 Denso International America, Inc. Vehicle feature control systems and methods based on smoking
US12251991B2 (en) 2020-08-20 2025-03-18 Denso International America, Inc. Humidity control for olfaction sensors
US12269315B2 (en) 2020-08-20 2025-04-08 Denso International America, Inc. Systems and methods for measuring and managing odor brought into rental vehicles
US11881093B2 (en) 2020-08-20 2024-01-23 Denso International America, Inc. Systems and methods for identifying smoking in vehicles
US11813926B2 (en) 2020-08-20 2023-11-14 Denso International America, Inc. Binding agent and olfaction sensor
US11828210B2 (en) 2020-08-20 2023-11-28 Denso International America, Inc. Diagnostic systems and methods of vehicles using olfaction
ES2926693B2 (es) 2021-04-20 2023-02-28 Univ Madrid Carlos Iii Pirómetro con alta resolución espacial
EP4423325A4 (en) * 2021-10-27 2025-08-27 Silanna UV Technologies Pte Ltd METHODS AND SYSTEMS FOR HEATING A WIDE BANDGAP SUBSTRATE
JP7814510B2 (ja) 2021-11-10 2026-02-16 シランナ・ユー・ブイ・テクノロジーズ・プライベート・リミテッド エピタキシャル酸化物材料、構造、及びデバイス
JP7793776B2 (ja) 2021-11-10 2026-01-05 シランナ・ユー・ブイ・テクノロジーズ・プライベート・リミテッド エピタキシャル酸化物材料、構造、及びデバイス
KR20240109261A (ko) 2021-11-10 2024-07-10 실라나 유브이 테크놀로지스 피티이 리미티드 마그네슘 게르마늄 산화물을 포함하는 초광대역갭 반도체 디바이스
DE102022200914B3 (de) * 2022-01-27 2023-05-17 Singulus Technologies Aktiengesellschaft Beschichtungskammer mit Erfassung des Substratabstands und Verfahren zur Beschichtung von Substraten

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5086220A (en) * 1991-02-05 1992-02-04 The Babcock & Wilcox Company Radiation imaging fiber optic temperature distribution monitor
US5769540A (en) * 1990-04-10 1998-06-23 Luxtron Corporation Non-contact optical techniques for measuring surface conditions
TW200839911A (en) * 2007-03-21 2008-10-01 Promos Technologies Inc Method for measuring thickness of film on sidewall of trench in semiconductor device
TW200921804A (en) * 2007-07-23 2009-05-16 Rohm Co Ltd Substrate temperature measuring apparatus and substrate temperature measuring method

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5073698A (en) * 1990-03-23 1991-12-17 Peak Systems, Inc. Method for selectively heating a film on a substrate
DE60012474T2 (de) * 2000-03-13 2004-11-25 Csem Centre Suisse D'electronique Et De Microtechnique S.A. Bildgebendes pyrometer
US6640199B1 (en) * 2001-10-24 2003-10-28 Spectral Sciences, Inc. System and method for optically determining properties of hot fluids from the spectral structure of emitted radiation
US7005601B2 (en) * 2002-04-18 2006-02-28 Applied Materials, Inc. Thermal flux processing by scanning
US7238941B2 (en) * 2003-10-27 2007-07-03 California Institute Of Technology Pyrolyzed-parylene based sensors and method of manufacture
US7663750B2 (en) * 2005-06-30 2010-02-16 Applied Biosystems, Llc Two-dimensional spectral imaging system
US8014062B2 (en) * 2007-03-09 2011-09-06 Lockheed Martin Corporation Method of making a close proximity filter and multi color MWIR sensor and resultant device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5769540A (en) * 1990-04-10 1998-06-23 Luxtron Corporation Non-contact optical techniques for measuring surface conditions
US5086220A (en) * 1991-02-05 1992-02-04 The Babcock & Wilcox Company Radiation imaging fiber optic temperature distribution monitor
TW200839911A (en) * 2007-03-21 2008-10-01 Promos Technologies Inc Method for measuring thickness of film on sidewall of trench in semiconductor device
TW200921804A (en) * 2007-07-23 2009-05-16 Rohm Co Ltd Substrate temperature measuring apparatus and substrate temperature measuring method

Also Published As

Publication number Publication date
CN102484041A (zh) 2012-05-30
IN2012DN01719A (https=) 2015-06-05
CN102484041B (zh) 2015-09-23
WO2011022648A1 (en) 2011-02-24
TW201129786A (en) 2011-09-01
US20110046916A1 (en) 2011-02-24

Similar Documents

Publication Publication Date Title
TWI481836B (zh) 用於監測基材之方法以及位置敏感性高溫計
KR102875849B1 (ko) 분광계 장치
EP2530442A1 (en) Methods and apparatus for thermographic measurements.
US10168142B2 (en) Optical characteristic measuring apparatus and optical characteristic measuring method
CN107991284A (zh) 拉曼光谱检测设备及其检测安全性的监控方法
WO2014014534A2 (en) Monitoring radiated infrared
CN107267964B (zh) 化学气相沉积反应器中辐射测量偏离误差的缩减
JP6725988B2 (ja) 厚み測定装置および厚み測定方法
US11280686B2 (en) Temperature measurement using etalons
EP2823748A1 (en) Optical measurement device and method for associating fiber bundle
US7495762B2 (en) High-density channels detecting device
CN103674276B (zh) 温度测量仪、尤其手持式红外测量仪
KR102039200B1 (ko) 레이저 회절을 통해 3ｄ 반도체 구조물의 온도를 측정하는 장치 및 방법
JP2026026307A (ja) 放射温度計、温度測定方法及び温度測定プログラム
CN104969044B (zh) 用于非接触地确定具有未知热辐射系数的运动物体的温度的方法和装置
US20140152841A1 (en) Method and system for emissivity determination
JP2005134362A (ja) 表面凹凸の検査方法及び検査装置
US20190017871A1 (en) Method of calibrating spectrum sensors in a manufacturing environment and an apparatus for effecting the same
JP2004279140A (ja) プラズマ分光測定装置
Datskos et al. Standoff imaging of trace RDX using quantum cascade lasers
KR101486272B1 (ko) 투명 기판 모니터링 장치 및 투명 기판 측정 방법
CN114636474A (zh) 一种基于光纤式的多光谱系统结构及其检测方法
KR20220126944A (ko) 진공용 박막 두께 측정 장치
JP6309557B2 (ja) 空間移動群の温度および速度の測定装置および測定方法
RU2622239C1 (ru) Устройство для бесконтактного измерения температуры объекта