TWI479589B - Apparatus and method for treating substrate - Google Patents

Description

Apparatus and method for processing a substrate

The present invention relates to apparatus and methods for processing substrates, and in particular, to apparatus and methods for supplying a processing solution to a substrate being transported.

Recently, information processing devices have rapidly developed to have various functions and higher computing speeds. The information processing device can have a display panel to display certain information. For example, a flat panel display panel of a liquid crystal display (LCD) has been widely used, and in addition, the size and weight of the display panel tend to increase.

Flat panel display panels can be fabricated by a variety of processes, such as photolithography, etching, and deposition processes. Typically, photolithography can include coating, exposing, developing, and cleaning the photoresist layer. In the step of developing the photoresist layer, the developing solution can be supplied and recovered on the substrate, and then the cleaning solution can be supplied onto the substrate. 1 is a cross-sectional view schematically illustrating a conventional apparatus for performing development and cleaning processes. Referring to FIG. 1, the step of developing the substrate S can be performed in the developing chamber 10, and then, the step of cleaning the substrate S can be performed in the cleaning chamber 20. During the development and cleaning steps, the substrate S can be transported in the chambers 10 and 20, respectively, in a particular direction. For example, if the substrate S is located at the horizontal section A of the developing chamber 10, the developing solution can be supplied onto the substrate S being conveyed horizontally. Thereafter, in the angle changing region of the developing chamber 10, the substrate S can be transported in an inclined state to recover the developing solution remaining on the substrate S.

However, according to the conventional process, when the developing solution flows along the inclined surface of the substrate, stains may be generated on the substrate. This staining problem can be overcome by increasing the transfer speed of the substrate, but this approach can lead to process failures such as substrate slippage.

Embodiments of the inventive concept provide apparatus and methods for supplying a processing solution to a substrate being transported.

Other embodiments of the inventive concept provide apparatus and methods for preventing stain generation when recovering a processing solution from a substrate being transported.

Other embodiments of the inventive concept provide apparatus and methods that improve the efficiency of recovering a processing solution from a substrate being transported.

Other embodiments of the inventive concept provide an apparatus and method for preventing slippage of a substrate when the substrate is transferred at a high speed.

According to an exemplary embodiment of the inventive concept, a substrate processing apparatus may include: a first chamber; a second chamber having an internal space connected to an internal space of the first chamber; a substrate transfer member, Transmitting the substrate in a first direction; processing a solution supply member provided in the first chamber to supply the processing solution onto the substrate; and a cleaning solution supply unit provided in the second chamber to include supplying the cleaning solution A cleaning solution supply component on the substrate. The substrate transfer member may include a plurality of transfer shafts provided in each of the first chamber and the second chamber and disposed in a first direction, and a frame supporting the transfer shafts. The frame may include: a horizontal frame provided in the first chamber; a transfer shaft supported by the horizontal frame having the horizontal top; a tilt frame provided in the second chamber; and a transfer shaft having the inclined top The inclined frame support; and the angle changing frame are provided in the second chamber between the horizontal frame and the inclined frame, the angle changing frame changing the top of the conveying shaft supported by the frame from the horizontal state to the inclined state.

In an exemplary embodiment, the apparatus may further include: a processing solution recovery unit provided in the first chamber to recover the processing solution remaining on the substrate. The treatment solution recovery unit may include: a first support roller; a pressurized fluid supply member that sprays pressurized fluid on a region of the substrate supported by the first support roller. The first support roller can be provided between the transfer shafts. in In an exemplary embodiment, the first support roller can have a top having the same vertical height as the transfer roller. In other embodiments, the first support roller can have a top that is at a vertical height that is higher than the vertical height of the transfer roller. The first support roller may have a cylindrical shape and a longitudinal direction that is parallel to the longitudinal direction of the transfer shaft. The diameter of the first support roller may be greater than the diameter of the transfer shaft. The treatment solution recovery unit can be positioned at an end of the first chamber. The angle changing frame may include: a first angle changing frame that supports one side end of the conveying shaft; and a second angle changing frame that supports the other side end of the conveying shaft and is movable in a vertical direction. The cleaning solution supply member can be positioned on the angle changing frame. The cleaning solution supply unit may further include: a second support roller provided between the transfer shafts to have an end supported by the angle change frame, and the cleaning solution supply member may be disposed on the substrate by the second support roller Spray the cleaning solution over the area of the support.

According to an exemplary embodiment of the inventive concept, a substrate processing apparatus may include: a chamber, a substrate transfer member provided in the chamber to include a plurality of transfer shafts, the substrate transfer member being configurable along the first direction to a first direction conveying substrate; and a plurality of transfer rollers each of which may be provided on an outer circumferential surface of each of the transfer shafts to be in contact with the substrate; a processing solution supply member provided in the chamber The treatment solution is supplied onto the substrate; and a treatment solution recovery unit that recovers the treatment solution remaining on the substrate. The treatment solution recovery unit may include: a first support roller provided between the transfer shafts; and a pressurized fluid supply member that sprays the pressurized fluid to a region of the substrate supported by the first support roller.

In an exemplary embodiment, the first support roller can have a top that is located at substantially the same vertical height as the transfer roller. The first support roller can have a top that is at a vertical height that is higher than the vertical height of the transfer roller. The first support roller can have a cylindrical shape and a longitudinal direction The longitudinal direction is parallel to the longitudinal direction of the transport axis. The length of the first support roller may be equal to or greater than the width of the substrate.

According to an exemplary embodiment of the inventive concept, a method of processing a substrate being transferred includes: supplying a processing solution to a substrate, the substrate being horizontally transportable in the first chamber; and spraying the pressurized fluid to recover a residue remaining on the substrate a solution; and then, the position of the substrate is changed from a horizontal state to a tilted state in the second chamber.

In an exemplary embodiment, the method may further include supplying the cleaning solution onto the substrate during the changing of the substrate from the horizontal state to the tilting state.

Exemplary embodiments of the inventive concept will now be described in more detail with reference to the accompanying drawings. However, the exemplary embodiments of the present invention may be embodied in many different forms and should not be construed as being limited to the embodiments shown herein. The embodiments are provided so that the disclosure is comprehensive and complete, and The concept of an exemplary embodiment is fully conveyed by one of ordinary skill in the art. The thickness of the layers and regions of the drawings are exaggerated for clarity. The same reference numerals in the drawings denote the same elements, and thus the description thereof will be omitted.

It will be understood that when an element is referred to as "connected" or "coupled" to another element, it can be directly connected or coupled to the other element or the intermediate element. In contrast, when an element is referred to as being "directly connected" or "directly coupled" to another element, the <RTIgt; The same numbers in the text indicate the same elements. The term "and/or" used herein includes any and all combinations of one or more of the associated listed items. Other wording used to describe the relationship between elements or layers should be interpreted in a similar manner (eg, "between" and "directly in", "adjacent" to "directly" Adjacent, "upper" to "positive").

It should be understood that although the terms "first", "second", etc. may be used herein The various elements, components, regions, layers and/or regions are described, but such elements, components, regions, layers and/or regions are not limited by these terms. The terms are used to distinguish one element, component, region, layer or layer with another element, component, region, layer or region. Thus, a first element, component, region, layer or layer of the shoWs may be referred to as a second element, component, region, layer or region without departing from the teachings of the exemplary embodiments.

For ease of description, this document may use spatially relative terms such as "below", "below", "below", "above", "upper" and the like to describe one element or feature as shown in the figure. The relationship of one or more components or features. It will be understood that the spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the drawings. For example, elements that are described as "under" or "beneath" or "an" or "an" Thus, the exemplary term "lower" can encompass both an orientation and an orientation. The device can be oriented differently (rotated 90 degrees or other orientations) and the spatially relative descriptors used herein will be interpreted accordingly.

The terminology used herein is for the purpose of describing particular embodiments and is not intended to As used herein, the singular forms """ It will be further understood that the terms "comprising", "comprising" and "comprising" are used to mean the presence of the features, integers, steps, operations, components and/or components, but do not exclude the presence or addition of one or more other features, integers, Steps, operations, components, components, and/or groups thereof.

Exemplary embodiments of the inventive concept are described herein with reference to cross-section illustrations of the schematic illustrations of the idealized embodiments (and intermediate structures) of the exemplary embodiments. Thus, variations from the illustrated shapes may be contemplated as a result, for example, by the method of manufacture and/or tolerances. Therefore, exemplary embodiments of the inventive concept should not be construed as limited Contains deviations in shape due to, for example, manufacturing. For example, an implanted region illustrated as a rectangle may have rounded or curved features and/or a gradient of implant concentration at its edges rather than a binary change from the implanted region to the non-implanted region. Likewise, a buried region formed by implantation can result in some implantation in the region between the buried region and the surface where the implant occurs. The exemplification of the present invention is intended to be illustrative, and is not intended to limit the scope of the exemplary embodiments.

All terms (including technical and scientific terms) used herein have the same meaning as commonly understood by those skilled in the <RTIgt; It will be further understood that the terms as defined in the commonly used dictionary should be interpreted as meanings that are consistent with the meaning in the context of the related art and are not interpreted in an idealized or overly formal sense, unless explicitly defined herein.

For the sake of simplicity, the following description will be directed to an example in which a substrate for manufacturing a flat panel display panel is used in the present embodiment. However, exemplary embodiments of the inventive concept may not be limited thereto. For example, the substrate S can be a wafer for manufacturing a semiconductor wafer. Further, the developing process on the substrate S will be described as an example of an embodiment of the inventive concept, and exemplary embodiments of the inventive concept are not limited thereto. For example, the inventive concept, which will be described below, will be applicable to various processes, including supplying a processing solution onto a substrate S/recovering a processing solution or cleaning a substrate S from a substrate S, and an apparatus for performing the processes.

2 is a cross-sectional view illustrating a substrate processing apparatus in accordance with an exemplary embodiment of the inventive concept. Referring to FIG. 2, the substrate processing apparatus 1000 may be disposed on a substrate to perform a development process. The substrate processing apparatus 1000 may include a developing chamber 100, a cleaning chamber 200, a substrate conveying member 300, a processing solution supply part 400, a processing solution recovery unit 500, and a cleaning solution supply unit 600.

Each of the developing chamber 100 and the cleaning chamber 200 may provide a space in which the process of processing the substrate S will be performed. For example, in the developing chamber 100 A process of developing the substrate S is performed, and a process of cleaning the substrate S can be performed in the cleaning chamber 200. In an exemplary embodiment, the development chamber 100 and the cleaning chamber 200 may be arranged in a row in a first direction 12 . The developing chamber 100 and the cleaning chamber 200 may be configured to have substantially the same shape or structure. Each of the developing chamber 100 and the cleaning chamber 200 may have a shape resembling a rectangular parallelepiped. Each of the developing chamber 100 and the cleaning chamber 200 may include an inlet 102 or 202 for loading the substrate S therein, and an outlet 104 or 204 for unloading the substrate S therefrom. The outlet 104 of the development chamber 100 can be provided to face the inlet 202 of the cleaning chamber 200. Further, the developing chamber 100 and the cleaning chamber 200 may be provided in such a manner that their internal spaces are connected to each other.

The substrate transfer component 300 can be configured to transport the substrate S in the first direction 12 . At least one of the substrate transfer members 300 may be provided in the developing chamber 100 and the cleaning chamber 200. Each of the substrate transfer members 300 may include a transfer shaft 330, a transfer roller 320, a frame 340, and a guide roller 350. In an exemplary embodiment, a plurality of transfer shafts 330 may be provided in the substrate transfer unit 300. Each of the transfer shafts 330 can be configured to have a longitudinal direction that is perpendicular to the first direction 12 (eg, along the second direction 14). The transfer shafts 330 can be configured to be parallel to each other in the first direction 12. The transfer shafts 330 can be spaced apart from one another. The transfer shaft 330 can be provided with a vertical position that can correspond to the position of the eight ports 102 and 202 and the outlets 104 and 204.

The transfer shaft 330 may be provided with transfer rollers 320 to support the bottom surface of the substrate S. In an exemplary embodiment, each of the transfer shafts 330 may be provided with a plurality of transfer rollers 320. Each of the transfer rollers 320 may have a hole provided at a central axis thereof, and the transfer shaft 330 may be forcibly inserted into a hole of the transfer roller 320. The transfer roller 320 is rotatable with the transfer shaft 330.

The frame 340 can support the transfer shaft 330 and be configured in a rotatable transfer shaft 330. For example, a pair of frames 340 may be provided on both sides of the transfer shaft 330 to support both ends of the transfer shaft 330. Frame 340 can include a horizontal frame 342. The tilt frame 346 and the angle changing frame 344. A horizontal frame 342 may be provided in the developing chamber 100. The horizontal frame 342 can be provided in such a manner that both ends of the transfer shaft 330 have the same vertical height.

The inclined frame 346 may be provided in such a manner that both ends of the transfer shaft 330 have different vertical heights from each other. A tilt frame 346 can be provided in the cleaning chamber 200. The inclined frame 346 may be provided in such a manner that one end of the transfer shaft 330 has the same vertical height as the end of the transfer shaft 330 supported by the horizontal frame 342. Further, the inclined frame 346 may be provided in such a manner that the other end portion of the conveying shaft 330 is positioned at a higher vertical height than the conveying shaft 330 supported by the horizontal frame 342. For example, the transfer shaft 330 can be configured to have an angle of about 5[deg.] with respect to the ground.

The angle change frame 344 can be configured to change the angle of the transfer axis. 3 is a perspective view illustrating a substrate transfer member provided in the cleaning chamber of FIG. 2. Referring to FIG. 3, the angle changing frame 344 can support both ends of the transfer shaft 330 and is configured to enable tilting of the transfer shaft 330. An angle change frame 344 can be provided in the cleaning chamber 200. The angle change frame 344 can be configured to change the angle of the transfer shaft 330 such that the substrate S can be transferred to the transfer shaft 330 supported by the tilt frame 346 via the transfer shaft 330 supported by the horizontal frame 342. The angle change frame 344 can include a first angle change frame 344a and a second angle change frame 344b. The first angle change frame 344a can be configured to support the end of the transfer shaft 330. The first angle change frame 344a can be provided to have the same vertical height as the horizontal frame 342. The second angle changing frame 344b can support the other end of the transfer shaft 330. The second angular change frame 344b can be vertically moved by a drive member (not shown) such that it can be positioned in a horizontal or inclined position. Here, the horizontal position may be a position where the second angle changing frame 344b has the same vertical height as the horizontal frame 342. The tilted position may be a position at which the second angle changes the vertical height of the frame 344b to be higher than the vertical height of the horizontal frame 342.

The substrate S can be guided by the guide rollers 350 such that the substrate S can be transported in the first direction 12. The guide roller 350 can be configured to support one side of the substrate S. Guide rollers 350 may be provided in each of the developing chamber 100 and the cleaning chamber 200. Guide rollers 350 may be provided between the transfer shafts 330. The guide rollers 350 provided in the developing chamber 100 may be configured to support both sides of the substrate S. The guide roller 350 provided in the cleaning chamber 200 may be configured to support one side of the substrate S. A guide roller 350 provided in the cleaning chamber 200 may be disposed adjacent to the other end of the transfer shaft 330.

Referring again to FIG. 2, the processing solution supply component 400 can be configured to supply a processing solution to the substrate S. The treatment solution supply part 400 may be provided in the development chamber 100. The processing solution supply part 400 may be disposed on the transfer shaft 330 to supply the processing solution onto the substrate S to be conveyed toward the first direction 12. In an exemplary embodiment, the treatment solution may be a development solution. The treatment solution supply part 400 may include a body and a nozzle. The body may be in the shape of a rod with its longitudinal direction facing the second direction 14. In an exemplary embodiment, the longitudinal direction of the body may be provided parallel to the transfer axis 330. The length of the body may be equal to or greater than the width of the substrate S. The body can include a plurality of apertures formed in a second direction 14 on a bottom surface thereof. A nozzle can be provided to each of the holes.

The treatment solution recovery unit 500 can be configured to recover the treatment solution remaining on the substrate S. The treatment solution recovery unit 500 may be provided in the development chamber 100. The treatment solution recovery unit 500 may be disposed at an area close to the outlet 104 of the development chamber 100. The treatment solution recovery unit 500 may include a pressurized fluid supply part 510 and a first support roller 530. The pressurized fluid supply component 510 can be configured to spray a pressurized fluid and recover a processing solution onto the substrate S. The pressurized fluid can be, for example, an atmospheric gas or an inert gas. The pressurized fluid supply member 510 can be provided on the transfer shaft 330. The pressurized fluid supply component 510 can include a body and a nozzle. The body may be in the shape of a rod with its longitudinal direction facing the second direction 14. The length of the body may be equal to or greater than the width of the substrate S degree. The body can include a plurality of apertures formed in a second direction 14 on a bottom surface thereof. A nozzle can be provided to each of the holes. The injection holes of each nozzle may be inclined downwardly so that the solution from the nozzles can be sprayed away from the outlet 104 of the development chamber 100. The pressurized fluid supply member 510 can cause the treatment solution to spray the pressurized fluid in a manner to flow in a direction opposite to the direction in which the substrate is conveyed.

A plurality of transfer shafts 330 can be provided spaced apart from one another in the first direction 12. Due to an increase in the weight or volume of the substrate S, the substrate S may hang down between the substrate transfer members 300. As a result, the substrate S may have an uneven top surface along the first direction 12. As shown in FIGS. 4 and 5, it may be difficult to recover the treatment solution from the recessed top surface of the substrate S.

Even in the portion of the substrate S supported by the transfer roller 320, the substrate S may hang down between the transfer rollers 320. For example, the substrate S may have an uneven top surface in the second direction.

The first support roller 530 may support the substrate S such that the portion of the substrate S to be supplied with the pressurized fluid may have a flat profile. The first support roller 530 may support the bottom surface of the substrate S in such a manner that the top surface of the substrate S to be supplied with the pressurized fluid may be flat. Figure 6 is a front elevational view showing the first support roller of Figure 2; Referring to FIG. 6, the first support roller may be formed to have a cylindrical shape. The first support roller 530 can be provided to have a longitudinal direction that is parallel to the second direction 14. The first support roller 530 can be provided between the transfer shafts 330. The first support roller 530 can be positioned to support the area of the substrate S where the pressurized fluid will be sprayed. The top of the first support roller 530 can be located at a vertical height equal to or slightly above the vertical height of the transfer roller 320. For example, the first support roller 530 and the transfer roller 320 may have an outer circumferential surface formed of the same material.

Referring again to FIG. 2, the cleaning solution supply unit 600 can be configured to clean the substrate S. The cleaning solution supply unit 600 may be provided in the cleaning chamber 200. The cleaning solution supply unit 600 may be provided to be close to the inlet 202 of the cleaning chamber 200. The cleaning solution supply unit 600 may include a cleaning solution supply part 610. The cleaning solution supply component 610 can be configured to spray a cleaning solution onto the substrate S loaded into the cleaning chamber 200. For example, the cleaning solution can be deionized water. The cleaning solution supply member 610 can be positioned on the transfer shaft 330 supported by the angle changing frame 344. The cleaning solution supply part 610 can include a body and a nozzle. The body may be in the shape of a rod with its longitudinal direction facing the second direction 14. The length of the body may be equal to or greater than the width of the substrate S. The body can include a plurality of apertures formed in a second direction 14 on a bottom surface thereof. A nozzle can be provided to each of the holes. In an exemplary embodiment, the body of the cleaning solution supply member 610 may be provided in such a manner that the longitudinal direction of the body of the cleaning solution supply member 610 is parallel to the longitudinal direction of the conveying shaft 330 provided thereunder. If the angle of the transfer shaft 330 is changed, the angle of the body of the cleaning solution supply member 610 can also be adjusted to compensate for the change.

In other embodiments, the body of the cleaning solution supply component 610 can be configured to have a fixed longitudinal direction (eg, parallel to the horizontal direction).

In other embodiments, the cleaning solution supply unit 600 of FIG. 7 may further include a second support roller 630. A second support roller 630 may be provided to support the bottom surface of the substrate S such that the top surface of the substrate S may be flat at the area where the cleaning solution is to be supplied. The second support roller 630 may have a cylindrical shape. The second support roller 630 may be provided in such a manner that the longitudinal direction of the second support roller 630 faces the second direction. A second support roller 630 can be provided between the transfer shafts 330. The second support roller 630 can be provided with a top that is positioned at the same height as the first support roller 530. Both ends of the second support roller 630 may be provided on the angle change frame 344 such that the second support roller 630 may be inclined similar to the transfer shaft 330.

A method of transferring the substrate S using the substrate processing apparatus 1000 will be described below. If the substrate S is loaded into the developing chamber 100, the substrate S may be based on The board transport member 300 is transported toward the first direction 12. The top surface of the substrate S can be maintained horizontal during the transfer of the substrate S. Further, during the transfer of the substrate S, the processing solution may be supplied onto the substrate S, and the residual processing solution may be recovered from the top surface of the substrate S. The substrate S can be unloaded from the outlet 104 of the developing chamber 100 and simultaneously loaded into the cleaning chamber 200. During the transfer of the substrate S, the substrate S may be gradually tilted from the horizontal state to the inclined state. The cleaning solution may be supplied onto the substrate S during the oblique transfer of the substrate S. After the supply of the cleaning solution is completed, the substrate S can be transferred in an inclined state. The cleaning solution remaining on the substrate S can flow downward along the inclination angle of the substrate S and be recovered.

Next, a developing and cleaning method using the substrate processing apparatus 1000 will be described. If the substrate S is loaded into the developing chamber 100 after the exposure process, the processing solution can be supplied onto the substrate S. The pressurized fluid supply member 510 may spray pressurized fluid on a portion of the substrate S supported by the first support roller 530 during the transfer of the substrate S. The treatment solution remaining on the substrate S can be blown away by the pressurized fluid and recovered on the side opposite to the first direction 12. The substrate S can be loaded into the cleaning chamber 200 via the first support roller 530. The cleaning solution supply unit 600 can spray the cleaning solution on the substrate S being conveyed in the cleaning chamber 200. At this stage, the substrate S can be changed from the horizontal state to the tilted state, and then transferred in the first direction. The cleaning fluid remaining on the substrate S can flow downward along the inclination angle of the substrate S.

In other embodiments, the first support roller 530a of FIG. 8 can be positioned to support a portion of the substrate S that will be supplied with processing solution from the processing solution supply component 400. The first support roller 530a may support the substrate S in such a manner that the processing solution can be uniformly supplied onto the substrate S.

In accordance with an exemplary embodiment of the inventive concept, an apparatus and method for supplying a processing solution to a substrate being transferred is provided.

According to other embodiments of the inventive concept, it is possible to prevent stain generation when recovering the treatment solution from the substrate being transported.

According to other embodiments of the inventive concept, it is possible to improve the efficiency of recovering the treatment solution from the substrate being transported.

According to other embodiments of the inventive concept, it is possible to prevent the substrate from slipping even when the substrate is transported at a high speed.

While the exemplary embodiments of the present invention have been shown and described, the embodiments of the invention

A‧‧‧ horizontal section

S‧‧‧Substrate

10‧‧‧Development chamber

12‧‧‧First direction

14‧‧‧second direction

20‧‧‧Clean chamber

100‧‧‧Development chamber

102‧‧‧ entrance

104‧‧‧Export

200‧‧‧Clean chamber

202‧‧‧ entrance

204‧‧‧Export

300‧‧‧Substrate transfer parts

320‧‧‧Transfer roller

330‧‧‧Transport axis

340‧‧‧Frame

342‧‧‧ horizontal frame

344‧‧‧ Angle Change Framework

344a‧‧‧First angle change frame

344b‧‧‧ second angle change framework

346‧‧‧ tilt frame

350‧‧‧ Guide roller

400‧‧‧Processing solution supply parts

500‧‧‧Processing solution recovery unit

510‧‧‧Pressure fluid supply parts

530‧‧‧First support roller

530a‧‧‧First support roller

600‧‧‧Clean solution supply unit

610‧‧‧Clean solution supply parts

630‧‧‧second support roller

The exemplary embodiments will be more clearly understood from the following description of the accompanying drawings. 1 through 8 illustrate non-limiting, exemplary embodiments described herein.

1 is a cross-sectional view schematically illustrating a conventional apparatus for performing development and cleaning processes.

2 is a cross-sectional view illustrating a substrate processing apparatus in accordance with an exemplary embodiment of the inventive concept.

3 is a perspective view illustrating a substrate transfer member provided in the cleaning chamber of FIG. 2.

4 is a perspective view illustrating a technical problem that may occur when the substrate processing apparatus of FIG. 2 does not have the first support roller.

Figure 5 is a cross-sectional view illustrating a technical problem that may occur when the substrate processing apparatus of Figure 2 does not have a first support roller.

Figure 6 is a front elevational view showing the first support roller of Figure 2;

FIG. 7 is a cross-sectional view illustrating a substrate processing apparatus in accordance with other exemplary embodiments of the inventive concept.

FIG. 8 is a cross-sectional view illustrating a substrate processing apparatus in accordance with other exemplary embodiments of the inventive concept.

It should be noted that these figures are intended to illustrate the general features of the methods, structures, and/or materials used in certain exemplary embodiments and supplement the text provided below. Word description. However, the drawings are not to scale, and may not reflect the precise structural or performance features of any given embodiments, and should not be construed as limiting or limiting the scope of the values or properties included in the exemplary embodiments. For example, the relative thickness and location of the molecules, layers, regions and/or structural elements may be reduced or exaggerated for clarity. The use of similar or identical reference numerals in the various figures is intended to indicate that there are similar or identical elements or features.

100‧‧‧Development chamber

102‧‧‧ entrance

104‧‧‧Export

200‧‧‧Clean chamber

202‧‧‧ entrance

204‧‧‧Export

300‧‧‧Substrate transfer parts

320‧‧‧Transfer roller

330‧‧‧Transport axis

340‧‧‧Frame

342‧‧‧ horizontal frame

344‧‧‧ Angle Change Framework

346‧‧‧ tilt frame

400‧‧‧Processing solution supply parts

500‧‧‧Processing solution recovery unit

510‧‧‧Pressure fluid supply parts

530‧‧‧First support roller

600‧‧‧Clean solution supply unit

610‧‧‧Clean solution supply parts

630‧‧‧second support roller

Claims (16)

A substrate processing apparatus comprising: a first chamber; a second chamber having an internal space connected to an internal space of the first chamber; a substrate transfer member along a first Transmitting a substrate; a processing solution supply unit provided in the first chamber to supply a processing solution to the substrate, and a processing solution recovery unit provided in the first chamber to recover a substrate Residing a treatment solution, wherein the treatment solution recovery unit comprises: a first support roller; and a pressurized fluid supply component sprayed on the substrate on a region supported by the first support roller a pressurized fluid supply unit; and a cleaning solution supply unit provided in the second chamber to include a cleaning solution supply unit that supplies a cleaning solution to the substrate; wherein the substrate transfer unit comprises: a plurality of transfer shafts provided in each of the first chamber and the second chamber and disposed along the first direction; and a frame supporting the transfer shaft, and wherein the The rack includes: a horizontal frame provided in the first chamber, the transfer shaft being supported by the horizontal frame having a horizontal top; a tilting frame provided in the second chamber, the transfer shaft being An inclined frame support having a sloping top; and an angle changing frame provided between the horizontal frame and the inclined frame in the second chamber, the angle changing frame supporting the top of the transfer shaft a level change to A tilted state. The apparatus of claim 1, wherein the first support roller is provided between the transfer shafts. The apparatus of claim 2, wherein the first support roller is provided to have a top portion that is at the same vertical height as the transfer roller. The apparatus of claim 2, wherein the first support roller is provided to have a top portion located at a vertical height above a vertical height of the transfer roller. The apparatus of claim 3, wherein the first support roller has a cylindrical shape and a longitudinal direction that is parallel to a longitudinal direction of the transfer shaft. The apparatus of claim 5, wherein one of the first support rollers has a diameter greater than a diameter of the transfer shaft. The apparatus of claim 6, wherein the processing solution recovery unit is positioned at one end of the first chamber. The apparatus of claim 1, wherein the angle changing frame comprises: a first angle changing frame supporting one side end of the transmitting shaft; and a second angle changing frame supporting the transmitting shaft The other end is movable in a vertical direction. The apparatus of claim 8, wherein the cleaning solution supply member is positioned on the angle changing frame. The apparatus of claim 9, wherein the cleaning solution supply unit further comprises a second support roller, the second support roller being provided between the transfer shafts to have an end supported by the angle changing frame And the cleaning solution supply part is configured to be the second branch of the substrate The cleaning solution is sprayed on one of the support rollers. A substrate processing apparatus comprising: a chamber; a substrate transfer member provided in the chamber to include a plurality of transfer shafts disposed along a first direction to transport a substrate in the first direction, and a plurality of a transfer roller, each of the transfer rollers being provided on an outer circumferential surface of each of the transfer shafts to be in contact with the substrate; a processing solution supply member provided in the first cavity a processing solution for supplying a processing solution to the substrate; and a processing solution recovery unit for recovering the processing solution remaining on the substrate; wherein the processing solution recovery unit comprises: a first supporting roller provided for Between the transfer shafts; and a pressurized fluid supply member, comprising: a body having a plurality of holes and one of the lengths of the body being equal to or greater than a width of the substrate; and a nozzle being disposed on the body The holes, the spray holes of each nozzle are inclined downward, and a pressurized fluid is sprayed onto a region of the substrate supported by the first support roller such that the processing solution faces the base Modes of transport direction opposite to the direction of the flow of the sprayed pressurized fluid, wherein the first support roller of the substrate such that the pressurized fluid to be supplied manner of a flat profile having a portion of the substrate support. The apparatus of claim 11, wherein the first support roller has a top portion that is at the same vertical height as the transfer roller. The apparatus of claim 11, wherein the first support roller has a top portion, and the top portion is located at a height higher than a vertical height of the transport roller Vertical height. The apparatus of any one of claims 11 to 13, wherein the first support roller has a cylindrical shape and a longitudinal direction that is parallel to a longitudinal direction of the transfer shaft. The apparatus of claim 14, wherein one of the first support rollers has a length equal to or greater than a width of the substrate. A method for processing a substrate during transport, comprising: supplying a processing solution to a substrate that is being horizontally transported in a first chamber; spraying a pressurized fluid to recover the processing solution remaining on the substrate; A second chamber changes a position of the substrate from a horizontal state to a tilted state; and a cleaning solution is supplied to the substrate during the changing of the substrate from a horizontal state to an inclined state.