TWI479269B - 感光性聚矽氧烷組成物及其應用 - Google Patents
感光性聚矽氧烷組成物及其應用 Download PDFInfo
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- TWI479269B TWI479269B TW101149666A TW101149666A TWI479269B TW I479269 B TWI479269 B TW I479269B TW 101149666 A TW101149666 A TW 101149666A TW 101149666 A TW101149666 A TW 101149666A TW I479269 B TWI479269 B TW I479269B
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- meth
- urethane
- nitrogen
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- -1 polysiloxane Polymers 0.000 title claims description 117
- 239000000203 mixture Substances 0.000 title claims description 39
- 229920001296 polysiloxane Polymers 0.000 title description 6
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims description 60
- 239000002245 particle Substances 0.000 claims description 37
- 229920000642 polymer Polymers 0.000 claims description 34
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims description 33
- 125000004432 carbon atom Chemical group C* 0.000 claims description 32
- 239000002904 solvent Substances 0.000 claims description 28
- 239000010954 inorganic particle Substances 0.000 claims description 22
- 239000000758 substrate Substances 0.000 claims description 22
- 125000000217 alkyl group Chemical group 0.000 claims description 21
- 239000000178 monomer Substances 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 17
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 claims description 16
- 125000003118 aryl group Chemical group 0.000 claims description 13
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical group C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 claims description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 10
- 125000003342 alkenyl group Chemical group 0.000 claims description 8
- 230000001681 protective effect Effects 0.000 claims description 7
- 125000003700 epoxy group Chemical group 0.000 claims description 6
- 230000007062 hydrolysis Effects 0.000 claims description 4
- 238000006460 hydrolysis reaction Methods 0.000 claims description 4
- 239000004973 liquid crystal related substance Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 125000004018 acid anhydride group Chemical group 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 238000006482 condensation reaction Methods 0.000 claims description 3
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 claims description 3
- 125000005429 oxyalkyl group Chemical group 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 2
- 238000005253 cladding Methods 0.000 claims description 2
- 239000011162 core material Substances 0.000 claims description 2
- 229910021480 group 4 element Inorganic materials 0.000 claims description 2
- 239000011229 interlayer Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 claims 1
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 claims 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 138
- 229910052757 nitrogen Inorganic materials 0.000 description 69
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- 238000000576 coating method Methods 0.000 description 17
- 239000002270 dispersing agent Substances 0.000 description 16
- 239000011248 coating agent Substances 0.000 description 14
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 14
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical group OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 239000003054 catalyst Substances 0.000 description 12
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- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 11
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 11
- 239000000126 substance Substances 0.000 description 11
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- 150000001875 compounds Chemical class 0.000 description 10
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- 230000035945 sensitivity Effects 0.000 description 9
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- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 8
- 229910000420 cerium oxide Inorganic materials 0.000 description 8
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 8
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- 239000005056 polyisocyanate Substances 0.000 description 8
- 229920001228 polyisocyanate Polymers 0.000 description 8
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- 239000000654 additive Substances 0.000 description 7
- 230000000996 additive effect Effects 0.000 description 7
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 7
- VPVSTMAPERLKKM-UHFFFAOYSA-N glycoluril Chemical compound N1C(=O)NC2NC(=O)NC21 VPVSTMAPERLKKM-UHFFFAOYSA-N 0.000 description 7
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- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 5
- YRTGWRSQRUHPKX-UHFFFAOYSA-N 3-ethyloxolane-2,5-dione Chemical compound CCC1CC(=O)OC1=O YRTGWRSQRUHPKX-UHFFFAOYSA-N 0.000 description 5
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- 230000015572 biosynthetic process Effects 0.000 description 5
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- 239000011737 fluorine Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
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- 229940051841 polyoxyethylene ether Drugs 0.000 description 5
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical group CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 238000004528 spin coating Methods 0.000 description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 5
- 241000501754 Astronotus ocellatus Species 0.000 description 4
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
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- 150000001335 aliphatic alkanes Chemical class 0.000 description 4
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- ARXJGSRGQADJSQ-UHFFFAOYSA-N propylene glycol methyl ether Substances COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 4
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- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 125000003396 thiol group Chemical class [H]S* 0.000 description 4
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 3
- JIUWLLYCZJHZCZ-UHFFFAOYSA-N 3-propyloxolane-2,5-dione Chemical compound CCCC1CC(=O)OC1=O JIUWLLYCZJHZCZ-UHFFFAOYSA-N 0.000 description 3
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 3
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- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
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- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical compound CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 2
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- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
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- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- HPYNZHMRTTWQTB-UHFFFAOYSA-N dimethylpyridine Natural products CC1=CC=CN=C1C HPYNZHMRTTWQTB-UHFFFAOYSA-N 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000002296 dynamic light scattering Methods 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- HHBOIIOOTUCYQD-UHFFFAOYSA-N ethoxy-dimethyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(C)CCCOCC1CO1 HHBOIIOOTUCYQD-UHFFFAOYSA-N 0.000 description 1
- LRMHFDNWKCSEQU-UHFFFAOYSA-N ethoxyethane;phenol Chemical compound CCOCC.OC1=CC=CC=C1 LRMHFDNWKCSEQU-UHFFFAOYSA-N 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- MYEJNNDSIXAGNK-UHFFFAOYSA-N ethyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CC)(OC(C)C)OC(C)C MYEJNNDSIXAGNK-UHFFFAOYSA-N 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 125000005313 fatty acid group Chemical group 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- GAEKPEKOJKCEMS-UHFFFAOYSA-N gamma-valerolactone Chemical compound CC1CCC(=O)O1 GAEKPEKOJKCEMS-UHFFFAOYSA-N 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- LRCZOYBOLHMGSL-UHFFFAOYSA-N hydrazine 2-methylprop-2-enoic acid Chemical compound C(C(=C)C)(=O)O.NN LRCZOYBOLHMGSL-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- XLSMFKSTNGKWQX-UHFFFAOYSA-N hydroxyacetone Chemical compound CC(=O)CO XLSMFKSTNGKWQX-UHFFFAOYSA-N 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 229940079865 intestinal antiinfectives imidazole derivative Drugs 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- HLXDKGBELJJMHR-UHFFFAOYSA-N methyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](C)(OC(C)C)OC(C)C HLXDKGBELJJMHR-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- CLZGJKHEVKJLLS-UHFFFAOYSA-N n,n-diheptylheptan-1-amine Chemical compound CCCCCCCN(CCCCCCC)CCCCCCC CLZGJKHEVKJLLS-UHFFFAOYSA-N 0.000 description 1
- DIAIBWNEUYXDNL-UHFFFAOYSA-N n,n-dihexylhexan-1-amine Chemical compound CCCCCCN(CCCCCC)CCCCCC DIAIBWNEUYXDNL-UHFFFAOYSA-N 0.000 description 1
- JAOPKYRWYXCGOQ-UHFFFAOYSA-N n,n-dimethyl-1-(4-methylphenyl)methanamine Chemical compound CN(C)CC1=CC=C(C)C=C1 JAOPKYRWYXCGOQ-UHFFFAOYSA-N 0.000 description 1
- DAZXVJBJRMWXJP-UHFFFAOYSA-N n,n-dimethylethylamine Chemical compound CCN(C)C DAZXVJBJRMWXJP-UHFFFAOYSA-N 0.000 description 1
- XTAZYLNFDRKIHJ-UHFFFAOYSA-N n,n-dioctyloctan-1-amine Chemical compound CCCCCCCCN(CCCCCCCC)CCCCCCCC XTAZYLNFDRKIHJ-UHFFFAOYSA-N 0.000 description 1
- OOHAUGDGCWURIT-UHFFFAOYSA-N n,n-dipentylpentan-1-amine Chemical compound CCCCCN(CCCCC)CCCCC OOHAUGDGCWURIT-UHFFFAOYSA-N 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000002828 nitro derivatives Chemical class 0.000 description 1
- 150000002832 nitroso derivatives Chemical class 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 125000003566 oxetanyl group Chemical group 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 125000000466 oxiranyl group Chemical group 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- RBCYCMNKVQPXDR-UHFFFAOYSA-N phenoxysilane Chemical compound [SiH3]OC1=CC=CC=C1 RBCYCMNKVQPXDR-UHFFFAOYSA-N 0.000 description 1
- 230000001699 photocatalysis Effects 0.000 description 1
- 229920001495 poly(sodium acrylate) polymer Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920006389 polyphenyl polymer Polymers 0.000 description 1
- 229920000909 polytetrahydrofuran Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 1
- 229910001950 potassium oxide Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000007764 slot die coating Methods 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical compound [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 125000003003 spiro group Chemical group 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003510 tertiary aliphatic amines Chemical class 0.000 description 1
- 150000003513 tertiary aromatic amines Chemical class 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ADLSSRLDGACTEX-UHFFFAOYSA-N tetraphenyl silicate Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC1=CC=CC=C1 ADLSSRLDGACTEX-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- YZVRVDPMGYFCGL-UHFFFAOYSA-N triacetyloxysilyl acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)OC(C)=O YZVRVDPMGYFCGL-UHFFFAOYSA-N 0.000 description 1
- ZQJYXISBATZORI-UHFFFAOYSA-N tributyl(ethoxy)silane Chemical compound CCCC[Si](CCCC)(CCCC)OCC ZQJYXISBATZORI-UHFFFAOYSA-N 0.000 description 1
- NZINNJYWGLAHPB-UHFFFAOYSA-N tributyl(methoxy)silane Chemical compound CCCC[Si](CCCC)(CCCC)OC NZINNJYWGLAHPB-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- WUMSTCDLAYQDNO-UHFFFAOYSA-N triethoxy(hexyl)silane Chemical compound CCCCCC[Si](OCC)(OCC)OCC WUMSTCDLAYQDNO-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- BOVWGKNFLVZRDU-UHFFFAOYSA-N triethoxy(trifluoromethyl)silane Chemical compound CCO[Si](OCC)(OCC)C(F)(F)F BOVWGKNFLVZRDU-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- UFTFJSFQGQCHQW-UHFFFAOYSA-N triformin Chemical compound O=COCC(OC=O)COC=O UFTFJSFQGQCHQW-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- ORVBHOQTQDOUIW-UHFFFAOYSA-N trimethoxy(trifluoromethyl)silane Chemical compound CO[Si](OC)(OC)C(F)(F)F ORVBHOQTQDOUIW-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- GRSPKXMQYAOQBM-UHFFFAOYSA-N trimethyl(pentan-2-yloxy)silane Chemical compound CCCC(C)O[Si](C)(C)C GRSPKXMQYAOQBM-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 230000002087 whitening effect Effects 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
本發明係有關一種感光性聚矽氧烷組成物及使用該組成物所形成之薄膜及裝置。特別是提供一種所得產品具感度佳及折射率佳之感光性聚矽氧烷組成物。
近年來,在半導體工業、液晶顯示器或有機電激發光顯示器等各領域中,隨著尺寸之日益縮小化,對於微影製程中圖案所需之微細化要求日益增高。業界為了達到微細化之圖案,一般是透過具有高解析及高感度之正型感度材料經曝光及顯影後而形成,其中,包含聚矽氧烷聚合物成分之正型感度材料漸成為業界使用之主流。
日本公開特許第2008-107529號揭示一種可形成高透明度硬化膜之感光性聚矽氧烷組成物。該組成物包含聚矽氧烷聚合物、醌二疊氮磺酸酯及溶劑。其中,該聚矽氧烷聚合物具有環氧丙烷基(oxetanyl)或丁二酸酐基,是由一含環氧丙烷基或丁二酸酐基之矽氧烷單體經加水分解且部分縮合所獲得。該聚矽氧烷於共聚合時會經開環反應形成親水性之結構,並在稀薄鹼性顯影液中具有高溶解性,然而,該感光性聚矽氧烷組成物無法滿足現今業界對之感度與折射率日益升高之需求。
因此,如何同時克服感度與折射率不佳之問題以達到目前業界之要求,為本發明所屬技術領域中努力研究之目標。
首先要說明的是,在本文中,該(甲基)丙烯酸表示丙烯酸及/或甲基丙烯酸;(甲基)丙烯醯[(meth)acryloyl]表示丙烯醯(acryloyl)及/或甲基丙烯醯(methacryloyl);(甲基)丙烯酸酯[(meth)acrylate]表示丙烯酸酯(acrylate)及/或甲基丙烯酸酯(methacrylate)。
本發明利用提供特殊氨基甲酸乙酯(甲基)丙烯酸酯化合物(urethane(metha)acrylate compound)及無機粒子之成分,而得到感度與折射率佳之感光性聚矽氧烷組成物。
因此,本發明係有關一種感光性聚矽氧烷組成物,其包含:聚矽氧烷聚合物(A);鄰萘醌二疊氮磺酸酯(B);氨基甲酸乙酯(甲基)丙烯酸酯化合物(C),其中該氨基甲酸乙酯(甲基)丙烯酸酯化合物(C)每分子包含至少六個(甲基)丙烯醯基;無機粒子(D),其中該無機粒子(D)係以第四族元素之氧化物為主成分;以及溶劑(E)。
本發明亦提供一種於一基板上形成薄膜之方法,其包含使用前述之感光性聚矽氧烷組成物施予該基板上。
本發明又提供一種基板上之薄膜,其係由前述之方法所製得。
本發明再提供一種裝置,其包含前述之薄膜。
本發明提供一種感光性聚矽氧烷組成物,其包含:聚矽氧烷聚合物(A);鄰萘醌二疊氮磺酸酯(B);氨基甲酸乙酯(甲基)丙烯酸酯化合物(C),其中該氨基甲酸乙酯(甲基)丙烯酸酯化合物(C)每分子包含至少六個(甲基)丙烯醯基;無機粒子(D),其中該無機粒子(D)係以第四族元素之氧化物為主成分;以及溶劑(E)。
根據本發明之該聚矽氧烷聚合物之構造並無特別限制,於本發明之一較佳具體例中,該聚矽氧烷聚合物(A)可係使用矽烷單體及/或聚矽氧烷加水分解及縮合而製得,較佳地,該縮合係為部份縮合。
於本發明之一較佳具體例中,該矽烷單體包含但不限於下列結構式(1)所示之結構:Si(Ra
)t
(ORb
)4-t
結構式(1)
其中:t為0至3之整數,且當t表示2或3時,複數個Ra
各自為相同或不同;Ra
係獨立選自由氫原子、碳數1至10之烷基、碳數2至10之烯基、碳數6至15之芳基、經酸酐基取代的碳數1至10之
烷基、經環氧基取代的的碳數1至10之烷基及經環氧基取代的氧烷基所組成之群;Rb
係獨立選自由氫原子、碳數1至6之烷基、碳數1至6之醯基及碳數6至15之芳基所組成之群,且當4-t表示2或3時,複數個Rb
各自為相同或不同。
在該Ra
的定義中,碳數1至10之烷基例如但不限於甲基、乙基、正丙基、異丙基、正丁基、第三丁基、正己基、正葵基、三氟甲基、3,3,3-三氟丙基、3-胺丙基、3-巰丙基、3-異氰酸丙基。碳數2至10之烯基例如但不限於乙烯基、3-丙烯醯氧基丙基、3-甲基丙烯醯氧基丙基等。C6
至C15
的芳香基例如但不限於苯基、甲苯基(tolyl])、對-羥基苯基、1-(對-羥基苯基)乙基、2-(對-羥基苯基)乙基、4-羥基-5-(對-羥基苯基羰氧基)戊基[4-hydroxy-5-(p-hydroxyphenylcarbonyloxy)pentyl]、萘基[naphthyl]等。
該經酸酐基取代的碳數1至10之烷基例如但不限於乙基丁二酸酐、丙基丁二酸酐、丙基戊二酸酐等。
該經環氧基取代的碳數1至10之烷基例如但不限於環氧丙烷基戊基(oxetanylpentyl)、2-(3,4-環氧環己基)乙基(2-(3,4-epoxycyclohexyl)ethyl)等。
該經環氧基取代的氧烷基例如但不限於環氧丙氧基丙基(glycidyloxypropyl)、2-環氧丙烷基丁氧基(2-oxetanylbutoxy)等。
在該Rb
的定義中,碳數1至6之烷基包含但不限於甲基、乙基、正丙基、異丙基、正丁基等。碳數1至6之醯基包含
但不限於乙醯基。碳數6至15之芳香基包含但不限於苯基。
於結構式(1)中,當t表示0至3的整數時,t=0時表示矽烷單體為四官能性矽烷,t=1時表示矽烷單體為三官能性矽烷,t=2時表示矽烷單體為二官能性矽烷,t=3時則表示矽烷單體為單官能性矽烷。
該矽烷單體包含但不限於(1)四官能性矽烷:四甲氧基矽烷(tetramethoxysilane)、四乙氧基矽烷(tetraethoxysilane)、四乙醯氧基矽烷(tetraacetoxysilane)、四苯氧基矽烷等(tetraphenoxy silane);(2)三官能性矽烷:甲基三甲氧基矽烷(methyltrimethoxysilane簡稱MTMS)、甲基三乙氧基矽烷(methyltriethoxysilane)、甲基三異丙氧基矽烷(methyltriisopropoxysilane)、甲基三正丁氧基矽烷(methyltri-n-butoxysilane)、乙基三甲氧基矽烷(ethyltrimethoxysilane)、乙基三乙氧基矽烷(ethyltriethoxysilane)、乙基三異丙氧基矽烷(ethyltriisopropoxysilane)、乙基三正丁氧基矽烷(ethyltri-n-butoxysilane)、正丙基三甲氧基矽烷(n-propyltrimethoxysilane)、正丙基三乙氧基矽烷(n-propyltriethoxysilane)、正丁基三甲氧基矽烷(n-butyltrimethoxysilane)、正丁基三乙氧基矽烷(n-butyltriethoxysilane)、正己基三甲氧基矽烷(n-hexyltrimethoxysilane)、正己基三乙氧基矽烷(n-hexyltriethoxysilane)、癸基三甲氧基矽烷
(decyltrimethoxysilane)、乙烯基三甲氧基矽烷(vinyltrimethoxysilane)、乙烯基三乙氧基矽烷(vinyltriethoxysilane)、3-丙烯醯氧基丙基三甲氧基矽烷(3-acryoyloxypropyltrimethoxysilane)、3-甲基丙烯醯氧基丙基三甲氧基矽烷(3-methylacryloyloxypropyltrimethoxysilane)、3-甲基丙烯醯氧基丙基三乙氧基矽烷(3-methylacryloyloxypropyltriethoxysilane)、苯基三甲氧基矽烷(phenyltrimethoxysilane,簡稱PTMS)、苯基三乙氧基矽烷(phenyltriethoxysilane簡稱PTES)、對-羥基苯基三甲氧基矽烷(p-hydroxyphenyltrimethoxysilane)、1-(對-羥基苯基)乙基三甲氧基矽烷[1-(p-hydroxyphenyl)ethyltrimethoxysilane]、2-(對-羥基苯基)乙基三甲氧基矽烷[2-(p-hydroxyphenyl)ethyltrimethoxysilane]、4-羥基-5-(對-羥基苯基羰氧基)戊基三甲氧基矽烷[4-hydroxy-5-(p-hydroxyphenylcarbonyloxy)pentyltrimethoxysilane]、三氟甲基三甲氧基矽烷(trifluoromethyltrimethoxysilane)、三氟甲基三乙氧基矽烷(trifluoromethyltriethoxysilane)、3,3,3-三氟丙基三甲氧基矽烷(3,3,3-trifluoropropyltrimethoxysilane)、3-胺丙基三甲氧基矽烷(3-aminopropyltrimethoxysilane)、3-胺丙基三乙氧基矽烷(3-aminopropyltriethoxysilane)、3-環氧丙氧基丙基三甲氧基矽烷(3-glycidoxypropyltrimethoxysilane)、3-環氧丙氧基丙基三乙氧基矽烷(3-glycidoxypropyltriethoxysilane)、2-(3,4-環氧環己基)乙基三甲氧基矽烷[2-(3,4-epoxycyclohexyl)
ethyltrimethoxysilane]、3-巰丙基三甲氧基矽烷(3-mercaptopropyltrimethoxysilane)、3-乙基-3-[[3-(三苯氧基矽基)丙氧基]甲基]環氧丙烷{3-ethyl-3-[[3-(triphenoxysilyl)propoxy)methyl]oxetane}、由東亞合成所製造之市售品:3-乙基-3-[[3-(三甲氧基矽基)丙氧基]甲基]環氧丙烷{3-ethyl-3-[[3-(trimethoxysilyl)propoxy)methyl]oxetane}(商品名TMSOX-D)、3-乙基-3-[[3-(三乙氧基矽基)丙氧基]甲基]環氧丙烷{3-ethyl-3-[[3-(triethoxysilyl)propoxy)methyl]oxetane}(商品名TESOX-D)、2-(三甲氧基矽基)乙基丁二酸酐[2-(trimethoxysilyl)ethyl succinic anhydride]、3-(三苯氧基矽基)丙基丁二酸酐[3-triphenoxysilyl propyl succinic anhydride]、由信越化學所製造之市售品:3-(三甲氧基矽基)丙基丁二酸酐[3-trimethoxysilyl propyl succinic anhydride](商品名X-12-967)、由WACKER公司所製造之市售品:3-(三乙氧基矽基]丙基丁二酸酐[3-(triethoxysilyl)propyl succinic anhydride](商品名GF-20)、3-(三甲氧基矽基)丙基戊二酸酐[3-(trimethoxysilyl)propyl glutaric anhydride,簡稱TMSG]、3-(三乙氧基矽基)丙基戊二酸酐[3-(triethoxysilyl)propyl glutaric anhydride]、3-(三苯氧基矽基)丙基戊二酸酐[3-(triphenoxysilyl)propyl glutaric anhydride]等;(3)二官能性矽烷:二甲基二甲氧基矽烷(dimethyldimethoxysilane簡稱DMDMS)、二甲基二乙氧基矽烷(dimethyldiethoxysilane)、二甲基二乙醯氧基矽烷
(dimethyldiacetyloxysilane)、二正丁基二甲氧基矽烷[di-n-butyldimethoxysilane]、二苯基二甲氧基矽烷(diphenyldimethoxysilane)、二異丙氧基-二(2-環氧丙烷基丁氧基丙基)矽烷[diisopropoxy-di(2-oxetanylpropylbutoxypropyl)silane,簡稱DIDOS]、二(3-環氧丙烷基戊基)二甲氧基矽烷[di(3-oxetanylpentyl)dimethoxy silane]、(二正丁氧基矽基)二(丙基丁二酸酐)[(di-n-butoxysilyl)di(propyl succinic anhydride)]、(二甲氧基矽基)二(乙基丁二酸酐)[(dimethoxysilyl)di(ethyl succinic anhydride)];(4)單官能性矽烷:三甲基甲氧基矽烷(trimethylmethoxysilane)、三正丁基乙氧基矽烷(tri-n-butylethoxysilane)、3-環氧丙氧基丙基二甲基甲氧基矽烷(3-glycidoxypropyldimethylmethoxysilane)、3-環氧丙氧基丙基二甲基乙氧基矽烷(3-glycidoxypropyldimethylethoxysilane)、二(2-環氧丙烷基丁氧基戊基)-2-環氧丙烷基戊基乙氧基矽烷[di(2-oxetanylbutoxypentyl)-2-oxetanylpentylethoxy silane]、三(2-環氧丙烷基戊基)甲氧基矽烷[tri(2-oxetanylpentyl)methoxy silane]、(苯氧基矽基)三(丙基丁二酸酐)[(phenoxysilyl)tri(propyl succinic anhydride)]、(甲基甲氧基矽基)二(乙基丁二酸酐)[(methoxysilyl)di(ethyl succinic anhydride)]等。上述之各種矽烷單體可單獨一種使用或混合多種使用。
較佳地,前述聚矽氧烷包含但不限於由下結構式(2)所示之聚矽氧烷:
於結構式(2)中,Rg
、Rh
、Ri
及Rj
為相同或不同,且各別表示氫原子、碳數1至10之烷基、碳數2至6之烯基,或碳數6至15之芳香基,該烷基、烯基及芳香基中任一者可選擇地含有取代基,當s為2至1000的整數時,每個Rg
為相同或不同,且每個Rh
為相同或不同。烷基例如但不限於甲基、乙基、正丙基等。烯基例如但不限於乙烯基、丙烯醯氧基丙基、甲基丙烯醯氧基丙基等。芳香基例如但不限於苯基、甲苯基、萘基等。
Rl
及Rk
分別表示氫原子、碳數1至6之烷基、碳數1至6之醯基或碳數6至15之芳香基,該烷基、醯基及芳香基中任一者可選擇地含有取代基。烷基可例如但不限於甲基、乙基、正丙基、異丙基、正丁基等。醯基可例如但不限於乙醯基。芳香基可例如但不限於苯基。
進一步地於結構式(2)中,s為1至1000的整數。較佳地,s為3至300的整數。更佳地,s為5至200的整數。
該結構式(2)所示的聚矽氧烷可單獨或混合使用,且該結構式(2)所示的聚矽氧烷包含但不限於1,1,3,3-四甲基-1,3-二甲氧基二矽氧烷、1,1,3,3-四甲基-1,3-二乙氧基二矽氧烷、
1,1,3,3-四乙基-1,3-二乙氧基二矽氧烷、Gelest公司製矽烷醇末端聚矽氧烷之市售品[商品名如DM-S12(分子量400至700)、DMS-S15(分子量1500至2000)、DMS-S21(分子量4200)、DMS-S27(分子量18000)、DMS-S31(分子量26000)、DMS-S32(分子量36000)、DMS-S33(分子量43500)、DMS-S35(分子量49000)、DMS-S38(分子量58000)、DMS-S42(分子量77000)、PDS-9931(分子量1000至1400)等]等。
該矽烷單體與聚矽氧烷混合使用時,其混合比率並無特別限制。較佳地,該矽烷單體與聚矽氧烷之矽原子莫耳數比是介於100:0.01至50:50之間。
該聚矽氧烷聚合物(A)除了可由上述之矽烷單體及/或聚矽氧烷進行加水分解及部分縮合而製得外,亦可混合二氧化矽[silicon dioxide]粒子進行共聚合反應。該二氧化矽之平均粒徑並無特別的限制,其範圍為2nm至250nm。較佳地,其平均粒徑範圍為5nm至200nm。更佳地,其平均粒徑範圍為10nm至100nm。
該二氧化矽粒子可單獨或混合使用,且該二氧化矽粒子包含但不限於由觸媒化成公司所製造的市售品[商品名如OSCAR 1132(粒徑12nm;分散劑為甲醇)、OSCAR 1332(粒徑12nm;分散劑為正丙醇)、OSCAR 105(粒徑60nm;分散劑為γ-丁內酯)、OSCAR 106(粒徑120nm;分散劑為二丙酮醇)等]、由扶桑化學公司所製造的市售品[商品名如Quartron PL-1-IPA(粒徑13nm;分散劑為異丙酮)、
Quartron PL-1-TOL(粒徑13nm;分散劑為甲苯)、Quartron PL-2L-PGME(粒徑18nm;分散劑為丙二醇單甲醚)、Quartron PL-2L-MEK(粒徑18nm;分散劑為甲乙酮)等]、由日產化學公司所製造的市售品[商品名如IPA-ST(粒徑12nm;分散劑為異丙醇)、EG-ST(粒徑12nm;分散劑為乙二醇)、IPA-ST-L(粒徑45nm;分散劑為異丙醇)、IPA-ST-ZL(粒徑100nm;分散劑為異丙醇)等]。
該二氧化矽粒子與該矽烷單體及/或聚矽氧烷混合時,並無使用量的限制。較佳地,該二氧化矽粒子矽原子莫耳數與該聚矽氧烷高分子(A)之矽原子莫耳數比為1:100至50:100之間。
該加水分解及部份縮合可使用一般的方法。例如,在矽烷單體及/或聚矽氧烷、二氧化矽粒子等的混合物中添加溶劑、水,或選擇性地可進一步添加觸媒,接著於50℃至150℃下加熱攪拌0.5小時至120小時。攪拌時,進一步地可藉由蒸餾除去副產物(醇類、水等)。
上述溶劑並沒有特別限制,可與本發明光硬化性聚矽氧烷組成物中所包含的溶劑(E)為相同或不同。較佳地,基於該矽烷單體及/或聚矽氧烷的總量為100克,該溶劑的使用量範圍為15克至1200克。更佳地,該溶劑的使用量範圍為20克至1100克。又更佳地,該溶劑的使用量範圍為30克至1000克。
基於該混合物中所含的可水解基團為1莫耳,該用於水解的水的使用量範圍為0.5莫耳至2莫耳。
該觸媒沒有特別的限制,較佳地,該觸媒是選自於酸觸媒或鹼觸媒。該酸觸媒包含但不限於鹽酸、硝酸、硫酸、氟酸、草酸、磷酸、醋酸、三氟醋酸、蟻酸、多元羧酸或其酐、離子交換樹脂等。該鹼觸媒包含但不限於二乙胺、三乙胺、三丙胺、三丁胺、三戊胺、三己胺、三庚胺、三辛胺、二乙醇胺、三乙醇胺、氫氧化鈉、氫氧化鉀、含有胺基的烷氧基矽烷、離子交換樹脂等。
較佳地,基於該矽烷單體及/或聚矽氧烷的總量為100克,該觸媒的使用量範圍為0.005克至15克。更佳地,該觸媒的使用量範圍為0.01克至12克。又更佳地,該觸媒的使用量範圍為0.05克至10克。
基於安定性的觀點,經縮合反應後所製得的聚矽氧烷聚合物(A)以不含副產物(如醇類或水)、觸媒為佳,因此所製得的聚矽氧烷聚合物(A)可選擇性地進行純化。純化方法並無特別限制,較佳地,可使用疏水性溶劑稀釋該聚矽氧烷聚合物(A),接著以蒸發器濃縮經水洗滌數回的有機層,以除去醇類或水。另外,可使用離子交換樹脂除去觸媒。
根據本發明之感光性聚矽氧烷組成物中之鄰萘醌二疊氮磺酸酯(B)結構並無特殊限制,可選用一般所使用者。該鄰萘醌二疊氮磺酸酯(B)係指完全酯化或部份酯化之酯化物。較佳地,該鄰萘醌二疊氮磺酸酯(B)係由鄰萘醌二疊氮磺酸或其鹽類與羥基化合物反應所製得。更佳地,該鄰萘醌二疊氮磺酸酯(B)係由鄰萘醌二疊氮磺酸或其鹽類與
多元羥基化合物反應所製得。
該鄰萘醌二疊氮磺酸包含但不限於鄰萘醌二疊氮-4-磺酸、鄰萘醌二疊氮-5-磺酸、鄰萘醌二疊氮-6-磺酸等。該鄰萘醌二疊氮磺酸之鹽類可例如但不限於鄰萘醌二疊氮磺酸鹵鹽。
該多元羥基化合物可單獨或混合使用,且該多元羥基化合物包含但不限於:
(1)羥基二苯甲酮類化合物,例如但不限於2,3,4-三羥基二苯甲酮、2,4,4'-三羥基二苯甲酮、2,4,6-三羥基二苯甲酮、2,3,4,4'-四羥基二苯甲酮、2,4,2',4'-四羥基二苯甲酮、2,4,6,3',4'-五羥基二苯甲酮、2,3,4,2',4'-五羥基二苯甲酮、2,3,4,2',5'-五羥基二苯甲酮、2,4,5,3',5'-五羥基二苯甲酮、2,3,4,3',4',5'-六羥基二苯甲酮等。
(2)羥基芳基類化合物,例如但不限於由式(3)所示之羥基芳基類化合物:
其中:Rm
至Ro
係獨立表示氫原子或碳數1至6之烷基;Rp
至Ru
係獨立表示氫原子、鹵素原子、碳數1至6之烷
基、碳數1至6之烷氧基、碳數1至6之脂烯基(alkenyl),或環烷基(cycloalkyl);Rv
及Rw
係獨立表示氫原子、鹵素原子及碳數1至6之烷基;x、y及z表示1至3之整數;k表示0或1。
結構式(3)所示之羥基芳基類化合物例如但不限於三(4-羥基苯基)甲烷、雙(4-羥基-3,5-二甲基苯基)-4-羥基苯基甲烷、雙(4-羥基-3,5-二甲基苯基)-3-羥基苯基甲烷、雙(4-羥基-3,5-二甲基苯基)-2-羥基苯基甲烷、雙(4-羥基-2,5-二甲基苯基)-4-羥基苯基甲烷、雙(4-羥基-2,5-二甲基苯基)-3-羥基苯基甲烷、雙(4-羥基-2,5-二甲基苯基)-2-羥基苯基甲烷、雙(4-羥基-3,5-二甲基苯基)-3,4-二羥基苯基甲烷、雙(4-羥基-2,5-二甲基苯基)-3,4-二羥基苯基甲烷、雙(4-羥基-3,5-二甲基苯基)-2,4-二羥基苯基甲烷、雙(4-羥基-2,5-二甲基苯基)-2,4-二羥基苯基甲烷、雙(4-羥基苯基)-3-甲氧基-4-羥基苯基甲烷、雙(3-環己基-4-羥基苯基)-3-羥基苯基甲烷、雙(3-環己基-4-羥基苯基)-2-羥基苯基甲烷、雙(3-環己基-4-羥基苯基)-4-羥基苯基甲烷、雙(3-環己基-4-羥基-6-甲基苯基)-2-羥基苯基甲烷、雙(3-環己基-4-羥基-6-甲基苯基)-3-羥基苯基甲烷、雙(3-環己基-4-羥基-6-甲基苯基)-4-羥基苯基甲烷、雙(3-環己基-4-羥基-6-甲基苯基)-3,4-二羥基苯基甲烷、雙(3-環己基-6-羥基苯基)-3-羥基苯基甲烷、雙(3-環己基-6-羥基苯基)-4-羥基苯基甲烷、
雙(3-環己基-6-羥基苯基)-2-羥基苯基甲烷、雙(3-環己基-6-羥基-4-甲基苯基)-2-羥基苯基甲烷、雙(3-環己基-6-羥基-4-甲基苯基)-4-羥基苯基甲烷、雙(3-環己基-6-羥基-4-甲基苯基)-3,4-二羥基苯基甲烷、1-[1-(4-羥基苯基)異丙基]-4-[1,1-雙(4-羥基苯基)乙基]苯、1-[1-(3-甲基-4-羥基苯基)異丙基]-4-[1,1-雙(3-甲基-4-羥基苯基)乙基]苯等。
(3)(羥基苯基)烴類化合物,例如但不限於由式(4)所示之(羥基苯基)烴類化合物:(4)
其中:Rx
及Ry
表示氫原子或碳數1至6之烷基;及x'及y'表示1至3之整數。
結構式(4)所示之(羥基苯基)烴類化合物例如但不限於2-(2,3,4-三羥基苯基)-2-(2',3',4'-三羥基苯基)丙烷、2-(2,4-二羥基苯基)-2-(2',4'-二羥基苯基)丙烷、2-(4-羥基苯基)-2-(4'-羥基苯基)丙烷、雙(2,3,4-三羥基苯基)甲烷、雙(2,4-二羥基苯基)甲烷等。
(4)其他芳香族羥基類化合物,例如但不限於苯酚、對-甲氧基苯酚、二甲基苯酚、對苯二酚、雙酚A、萘酚、鄰苯二酚、1,2,3-苯三酚甲醚、1,2,3-苯三酚-1,3-二甲基醚、3,4,5-三羥基苯甲酸、部份酯化或部份醚化之3,4,5-三
羥基苯甲酸等。
較佳地,該羥基化合物是擇自於[1-(4-羥基苯基)異丙基]-4-[1,1-雙(4-羥基苯基)乙基]苯、2,3,4-三羥基二苯甲酮、2,3,4,4'-四羥基二苯甲酮,或此等一組合。
該鄰萘醌二疊氮磺酸或其鹽類,與羥基化合物之反應通常在二氧雜環己烷(dioxane)、氮-吡咯烷酮(N-pyrrolidone)、乙醯胺(acetamide)等有機溶媒中進行,同時在三乙醇胺、鹼金屬碳酸鹽或鹼金屬碳酸氫鹽等鹼性縮合劑存在下進行較佳。
較佳地,該鄰萘醌二疊氮磺酸酯(B)之酯化度在50%以上,亦即以該羥基化合物中之羥基總量為100 mol%計,該羥基化合物中有50 mol%以上之羥基與鄰萘醌二疊氮磺酸或其鹽類進行酯化反應。更佳地,該鄰萘醌二疊氮磺酸酯(B)之酯化度在60%以上。
基於該聚矽氧烷聚合物(A)之使用量為100重量份,該鄰萘醌二疊氮磺酸酯(B)之使用量範圍為1重量份至50重量份。較佳地,該鄰萘醌二疊氮磺酸酯(B)之使用量為2重量份至40重量份。更佳地,該鄰萘醌二疊氮磺酸酯(B)之使用量為3重量份至30重量份。
根據本發明之該氨基甲酸乙酯(甲基)丙烯酸酯化合物(C),其中該氨基甲酸乙酯(甲基)丙烯酸酯化合物(C)每分子包含至少六個(甲基)丙烯醯基。該氨基甲酸乙酯(甲基)丙烯酸酯化合物(C)可由習知之方法獲得。具體之製備方法可例如但不限於:先由聚異氰酸酯與多元醇反應,接著
再與含羥基之(甲基)丙烯酸酯反應而製得該氨基甲酸乙酯(甲基)丙烯酸酯化合物;或是先由聚異氰酸酯與含羥基之(甲基)丙烯酸酯反應,接著再與多元醇反應而製得該氨基甲酸乙酯(甲基)丙烯酸酯化合物。較佳地,該氨基甲酸乙酯(甲基)丙烯酸酯化合物是先由雙官能之聚異氰酸酯與雙官能之多元醇反應,接著再與異戊四醇三(甲基)丙烯酸酯反應而得。更佳地,該製備方法還包括使用一反應觸媒,該反應觸媒可例如但不限於二丁基錫二月桂酸酯等公知之氨基甲酸酯化觸媒。
該含羥基之(甲基)丙烯酸酯可例如但不限於:(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸羥基甲酯、(甲基)丙烯酸2-羥基丙酯、二(甲基)丙烯酸縮水甘油酯、三酸甘油二(甲基)丙烯酸酯、異戊四醇三(甲基)丙烯酸酯、二異戊四醇五(甲基)丙烯酸酯、二異戊四醇四(甲基)丙烯酸酯、二異戊四醇三(甲基)丙烯酸酯、二異戊四醇二(甲基)丙烯酸酯、三羥甲基丙烷二(甲基)丙烯酸酯、環氧丙烯酸酯等,可單獨或混合2種以上使用。較佳地,該含羥基之(甲基)丙烯酸酯為異戊四醇三(甲基)丙烯酸酯。
較佳地,該聚異氰酸酯是分子內具有2個以上異氰酸酯基之聚異氰酸酯,可例如但不限於:伸甲苯基二異氰酸酯、二苯基甲烷二異氰酸酯、聚亞甲基聚苯基聚異氰酸酯、甲苯胺二異氰酸酯、萘二異氰酸酯等芳香族系、或六亞甲基二異氰酸酯(hexamethylene diisocyanate)、異佛爾酮二異氰酸酯(isophorone diisocyanate)、伸茬基二異氰酸
酯(xylylene diisocyanate)、氫化伸茬基二異氰酸酯(hHydrogenated xylylene diisocyanate)、二環己基甲烷二異氰酸酯等;該聚異氰酸酯可單獨或混合2種以上使用。
較佳地,該多元醇可例如但不限於:聚(環氧丙烷)二醇、聚(環氧丙烷)三醇、共聚(環氧乙烷-環氧丙烷)二醇、聚(四氫呋喃)二醇、乙氧基化雙酚A、乙氧基化雙酚S、螺環二醇(spiro glycol)、己內酯改質二醇、碳酸酯二醇、三羥甲基丙烷、季戊四醇等;該多元醇可單獨或混合2種以上使用。
較佳地,該氨基甲酸乙酯(甲基)丙烯酸酯化合物(C)之分子量範圍為1,000至200,000,較佳地為1,200至100,000,更佳地為1,500至50,000。
較佳地,該氨基甲酸乙酯(甲基)丙烯酸酯化合物(C)係每分子具有至少含有七個(甲基)丙烯醯基之氨基甲酸乙酯(甲基)丙烯酸酯化合物,有助於使該光硬化性聚矽氧烷組成物所形成的保護膜感度更佳。
更佳地,該氨基甲酸乙酯(甲基)丙烯酸酯化合物(C)係每分子具有至少含有八個(甲基)丙烯醯基之氨基甲酸乙酯(甲基)丙烯酸酯化合物。
該氨基甲酸乙酯(甲基)丙烯酸酯化合物(C)之市售品可例如但不限於:(1)每分子具有六個(甲基)丙烯醯基之氨基甲酸乙酯(甲基)丙烯酸酯化合物:日本合成化學(股)製造的紫光UV-7600B、紫光UV-7605B;根上工業(股)製造的Art
Resin UN-3320HA、Art Resin UN-3320HC;新中村化學工業(股)製造的NK Oligo U-6HA、NK Oligo U-6LPA;DAICEL-CYTEC公司製造的EBECRYL 5129、EBECRYL 220、EBECRYL 8301、KRM 8200、KRM 8200AE;荒川化學工業(股)製造的Beam Set 575、Beam Set 577等;(2)每分子具有七個(甲基)丙烯醯基之氨基甲酸乙酯(甲基)丙烯酸酯化合物:如日本合成化學(股)製造的紫光UV-6300B等;(3)每分子具有至少含有八個(甲基)丙烯醯基之氨基甲酸乙酯(甲基)丙烯酸酯化合物:日本合成化學(股)製造的紫光UV-7610B、紫光UV-7620EA、紫光UV-1700B;根上工業(股)製造的Art Resin UN-901T、Art Resin UN-3320HS;新中村化學工業(股)製造的NK Oligo UA-33H、NK Oligo UA-53H;DAICEL-CYTEC公司製造的KRM 8452等。
前述市售品可單獨或混合2種以上使用。其中,較佳者為:日本合成化學(股)製的紫光UV-1700B、紫光UV-6300B、紫光UV-7605B,新中村化學工業(股)製造的NK Oligo U-6HA,及根上工業(股)製造的Art Resin UN-3320HC、Art Resin UN-3320HS。
於本發明之具體例中,基於該聚矽氧烷聚合物(A)之使用量為100重量份,該氨基甲酸乙酯(甲基)丙烯酸酯化合物(C)之使用量為0.1重量份至35重量份。較佳地,該氨基甲
酸乙酯(甲基)丙烯酸酯化合物(C)之使用量為0.5重量份至30重量份。更佳地,該氨基甲酸乙酯(甲基)丙烯酸酯化合物(C)之使用量為1重量份至25重量份。
當根據本發明之該感光性聚矽氧烷組成物不含有該氨基甲酸乙酯(甲基)丙烯酸酯化合物(C)時,所形成之膜,會有感光度不佳之問題。雖不願為理論所限制,但咸信其係因添加低分子量之化合物於光阻中,可增加顯影之效果。
根據本發明之無機粒子(D)係以第四族元素之氧化物為主成分,藉由添加該具有高折射率之無機粒子(D),可以進一步提高由根據本發明之感光性聚矽氧烷組成物所得薄膜之折射率。
於本發明之一具體例中,其中該無機粒子(D)之粒徑大小係為1 nm至100 nm。該粒徑之測量方法可為習知之測量方法,例如通過動態光散射粒子所量測,其粒徑較佳為1 nm至50 nm;更佳為5 nm至15 nm。當粒徑小於1 nm時,所製得之薄膜容易發生二次凝集,並可能產生白化;當粒徑大於100 nm時,則可能影響所形成薄膜表面之均勻性。
於本發明之具體例中,可供作為無機粒子(D)之氧化物粒子較佳為氧化鈦、氧化鋯、氧化鉿以及這些金屬氧化物和氧化矽以及氧化錫之複合粒子,所得之薄膜產物之折射率增加,其中更佳為氧化鈦或氧化鋯,亦即該無機粒子(D)中第四族元素係為鈦或鋯物是優選之。
另一方面,氧化鈦之結晶形式同時存在銳鈦礦型(Anatase)和金紅石型(Rutile),較佳為金紅石型,其具有
高折射率及優異之耐光性。
再者,由於氧化鈦具有光催化活性,故難以作為光學應用,故較佳係以氧化矽覆蓋粒子表面。
根據本發明之無機粒子(D)可為粉末形式或是將氧化物顆粒分散於分散介質中之分散溶膠形式。該分散介質例如甲醇、甲基乙基酮、甲基異丁基酮、環己酮、N-甲基-2-吡咯烷酮、丙二醇單甲基醚、乙氧基乙醇。
於本發明之一具體例中,市售氧化鈦粒子為日本C.I.Kasei製,NanoTek TiO2
(分散劑為甲基異丁基酮,銳鈦礦型);韓國NanoCMS製,Lot No.:S111109(分散劑為乙氧基乙醇,金紅石型);日本日揮觸媒化成製,Red Lake series(分散劑為甲醇,銳鈦礦型);Tayca製造,TS series(分散劑為甲基乙基酮,金紅石型)。市售氧化鋯粒子為日本Osaka Cement Co.製造,HXU-120JC(分散劑為甲基乙基酮)。
於本發明之具體例中,基於該聚矽氧烷聚合物(A)之使用量為100重量份,該無機粒子(D)之使用量為5重量份至120重量份。較佳地,該無機粒子(D)之使用量為10重量份至100重量份。更佳地,該無機粒子(D)之使用量為20重量份至70重量份。若無機粒子(D)之使用量小於5重量份,則所製得之薄膜折射率不足;若無機粒子(D)之使用量大於120重量份,則顯影性不佳。
根據本發明之該感光性聚矽氧烷組成物中之溶劑(E)種類並沒有特別限制,只要能使各組份完全溶解,且具有高
揮發性,在常壓下只需提供少許熱量便可以使該溶劑揮發。該溶劑(E)可單獨或混合使用,且該溶劑(E)包含但不限於含醇式羥基(alcoholic hydroxyl)的化合物或含羰基的環狀化合物等。
該含醇式羥基的化合物可單獨或混合使用,且該含醇式羥基的化合物包含但不限於丙酮醇、3-羥基-3-甲基-2-丁酮、4-羥基-3-甲基-2-丁酮、5-羥基-2-戊酮、4-羥基-4-甲基-2-戊酮(二丙酮醇,簡稱DAA)、乳酸乙酯、乳酸丁酯、丙二醇單甲醚、丙二醇單乙醚(簡稱PGEE)、丙二醇甲醚醋酸酯(簡稱PGMEA)、丙二醇單正丙醚、丙二醇單正丁醚、丙二醇單第三丁醚、3-甲氧基-1-丁醇、3-甲基-3-甲氧基-1-丁醇或此等一組合。較佳地,該含醇式羥基的化合物是擇自於二丙酮醇、乳酸乙酯、丙二醇單乙醚、丙二醇甲醚醋酸酯,或此等一組合。
該含羰基的環狀化合物可單獨或混合使用,且該含羰基的環狀化合物包含但不限於γ-丁內酯、γ-戊內酯、δ-戊內酯、碳酸丙烯酯、氮-甲基吡咯烷酮、環己酮或環庚酮等。較佳地,該含羰基的環狀化合物是擇自於γ-丁內酯、氮-甲基吡咯烷酮、環己酮,或此等一組合。
當該含醇式羥基的化合物與含羰基的環狀化合物混合使用時,其重量比率沒有特別限制。較佳地,該含醇式羥基的化合物與該含羰基的環狀化合物的重量比值為99/1至50/50。更佳地,該含醇式羥基的化合物與該含羰基的環狀化合物的重量比值為95/5至60/40。值得一提的是,當該
溶劑(E)中該含醇式羥基的化合物與含羰基的環狀化合物的重量比值為99/1至50/50時,該聚矽氧烷聚合物(A)中未反應的矽烷醇基不易產生縮合反應而降低貯藏安定性,且其與該鄰萘醌二疊氮磺酸酯(B)的相容性佳,於塗佈成膜時不易有白化的現象,可維持該保護膜的透明性。
在不損及本發明之效果的範圍內,亦可以含有其他溶劑。該其他溶劑包含但不限於(1)酯類:醋酸乙酯、醋酸正丙酯、醋酸異丙酯、醋酸正丁酯、醋酸異丁酯、丙二醇甲醚醋酸酯、3-甲氧基-1-醋酸丁酯、3-甲基-3-甲氧基-1-醋酸丁酯等;(2)酮類:甲基異丁酮、二異丙酮、二異丁酮等;(3)醚類:二乙醚、二異丙醚、二正丁醚、二苯醚等。
較佳地,基於該聚矽氧烷聚合物(A)的總量為100重量份,該溶劑(E)的使用量範圍為50重量份至1,200重量份。又較佳地,該溶劑(E)之含量範圍為80重量份至1000重量份。更佳地,該溶劑(E)之含量範圍為100重量份至800重量份。。
較佳地,基於該聚矽氧烷聚合物(A)之使用量量為100重量份,該溶劑(E)之使用量為50重量份至2000重量份。較佳地,該溶劑(E)之使用量為100重量份至1900重量份。更佳地,該溶劑(E)之使用量為200重量份至1800重量份。
根據本發明之該感光性聚矽氧烷組成物選擇性地可進一步添加添加劑(F),添加劑之選擇是本發明所屬技術領域中具通常知識者依需求進行選擇,包含但不限於聚矽氧烷聚合物(A)以外之高分子、紫外線吸收劑、防凝集劑、界
面活性劑、密著促進劑、保存安定劑、耐熱性促進劑,或此等一組合。
該填充劑之種類並無特別之限制,較佳地,該填充劑為玻璃或鋁。
該聚矽氧烷聚合物(A)以外之高分子為聚乙烯醇、聚乙二醇單烷基醚,或聚氟丙烯酸烷酯。
該紫外線吸收劑之種類並無特別之限制,較佳地,該紫外線吸收劑為2-(3-第三丁基-5-甲基-2-羥基苯基)-5-氯苯基疊氮或烷氧基苯酮。
該防凝集劑包含但不限於聚丙烯酸鈉。
該界面活性劑包含但不限於含氟界面活性劑或有機矽界面活性劑,可單獨或混合使用,其作用在於促進該感光性聚矽氧烷組成物之塗佈性。
該含氟界面活性劑是指末端、主鏈及側鏈至少包含一氟烷基或一氟烯基之含氟界面活性劑,可例如但不限於1,1,2,2-四氟辛基(1,1,2,2-四氟丙基)醚、1,1,2,2-四氟辛基己基醚、八乙二醇二(1,1,2,2-四氟丁基)醚、六乙二醇(1,1,2,2,3,3-六氟戊基)醚、八丙二醇二(1,1,2,2-四氟丁基)醚、六丙二醇(1,1,2,2,3,3-六氟戊基)醚、全氟十二烷基硫酸鈉、1,1,2,2,8,8,9,9,10,10-十氟十二烷、1,1,2,2,3,3-六氟癸烷、氟烷苯磺酸鈉、氟烷磷酸鈉、氟烷羧酸鈉、氟烷聚氧乙烯醚、二丙三醇四(氟烷聚氧乙烯醚)、氟烷銨碘、氟烷甜菜鹼、氟烷聚氧乙烯醚、全氟烷聚氧乙烯醚、全氟烷基烷醇等,該含氟界面活性劑之市售品例如但不限於BM-
1000、BM-1100(以上由BM Chemical製)、Megafac F142D、Megafac F172、Megafac F173、Megafac F183、Megafac F178、Megafac F191、Megafac F471、Megafac F476(以上由大日本墨水及化學工業製)、Fluorad FC 170C、Fluorad FC-171、Fluorad FC-430、Fluorad FC-431(以上由住友化學製)、Surflon S-112、Surflon S-113、Surflon S-131、Surflon S-141、Surflon S-145、Surflon S-382、Surflon SC-101、Surflon SC-102、Surflon SC-103、Surflon SC-104、Surflon SC-105、Surflon SC-106(以上由旭硝子公司製)、F-Top EF301、F-Top 303、F-Top 352(以上由新秋田化成製)、Ftergent FT-100、FT-110、FT-140A、FT-150、FT-250、FT-251、FTX-251、FTX-218、FT-300、FT-310、FT-400S(以上由NEOSU製)等。
該有機矽界面活性劑之市售品可例如但不限於TORE有機矽DC3PA、DC7PA、SH11PA、SH21PA、SH28PA、SH29PA、SH30PA、SH-190、SH-193、SZ-6032、SF-8427、SF-8428、DC-57、DC-190(Dow Corning Toray Silicone製)、TSF-4440、TSF-4300、TSF-4445、TSF-4446、TSF-4460、TSF-4452(GE東芝有機矽製)等。
除前述含氟界面活性劑或有機矽界面活性劑外,該界面活性劑之具體例如:(1)聚氧乙烯烷基醚類,如月桂醇聚氧乙烯醚、聚氧乙烯硬脂酸醚、聚氧乙烯油基醚等;(2)聚氧乙烯芳基醚類,如聚氧乙烯正辛基苯醚、聚氧乙烯正壬基苯酚醚等;(3)聚氧乙烯二烷基酯,如聚氧乙烯二月桂酸、
聚氧乙烯二硬脂酸等;(4)非離子界面活性劑,如KP-341(信越化學製)、poly flow No.57、poly flow No.95(共榮社油脂化學工業製)等。
該密著促進劑包含但不限於官能性矽烷化合物,其作用在於增加感光性聚矽氧烷組成物與基材間之密著性。較佳地,該官能性矽烷化合物是指包含羧基、烯基、異氰酸酯基、環氧基、胺基、巰基或鹵素之矽烷化合物。該官能性矽烷化合物可以單獨或混合使用,例如但不限於對-羥基苯基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、乙烯三乙醯氧基矽烷、乙烯三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三(2-甲氧乙氧基)矽烷、γ-異氰酸酯丙基三乙氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷(市售品例如信越化學製KBM403)、2-(3,4-環氧環己烷基)乙基三甲氧基矽烷、3-環氧丙氧基二甲基甲氧基矽烷、3-胺丙基三甲氧基矽烷、氮-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷、氮-(2-胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、3-巰丙基三甲氧基矽烷、3-氯丙基三甲氧基矽烷、3-氯丙基甲基二甲氧基矽烷等。
該保存安定劑包含但不限於可為硫、醌、氫醌、聚氧化物、胺、亞硝基化合物或硝基化合物,可例如但不限於4-甲氧基苯酚、(氮-亞硝基-氮-苯基)羥胺鋁、2,2-硫代雙(4-甲基-6-第三丁基苯酚)、2,6-二-第三丁基苯酚等。
該耐熱性促進劑包含但不限於氮-(烷氧基甲基)甘脲化合物或氮-(烷氧基甲基)三聚氰胺。該氮-(烷氧基甲基)甘脲化
合物可例如但不限於氮,氮,氮',氮'-四(甲氧基甲基)甘脲、氮,氮,氮',氮'-四(乙氧基甲基)甘脲、氮,氮,氮',氮'-四(正丙氧基甲基)甘脲、氮,氮,氮',氮'-四(異丙氧基甲基)甘脲、氮,氮,氮',氮'-四(正丁氧基甲基)甘脲、氮,氮,氮',氮'-四(第三丁氧基甲基)甘脲等;較佳地為氮,氮,氮',氮'-四(甲氧基甲基)甘脲。該氮-(烷氧基甲基)三聚氰胺可例如但不限於氮,氮,氮',氮',氮",氮"-六(甲氧基甲基)三聚氰胺、氮,氮,氮',氮',氮",氮"-六(乙氧基甲基)三聚氰胺、氮,氮,氮',氮',氮",氮"-六(正丙氧基甲基)三聚氰胺、氮,氮,氮',氮',氮",氮"-六(異丙氧基甲基)三聚氰胺、氮,氮,氮',氮',氮",氮"-六(正丁氧基甲基)三聚氰胺、氮,氮,氮',氮',氮",氮"-六(第三丁氧基甲基)三聚氰胺;較佳地為氮,氮,氮',氮',氮",氮"-六(甲氧基甲基)三聚氰胺。其中,氮-(烷氧基甲基)三聚氰胺之市售品可例如NIKARAKKU N-2702、MW-30M(三和化學製)。
該硬化促進劑包含但不限於:(1)含環氧基之化合物,可例如但不限於雙酚A二縮水甘油醚、雙酚F二縮水甘油醚、雙酚S二縮水甘油醚、氫化雙酚A二縮水甘油醚、氫化雙酚F二縮水甘油醚、氫化雙酚AD二縮水甘油醚、溴化雙酚A二縮水甘油醚、溴化雙酚F二縮水甘油醚、溴化雙酚S二縮水甘油醚等雙酚化合物之二縮水甘油醚;(2)胍胺(guanamine)化合物,可例如但不限於三聚氰胺(melamine)、胍胺、乙醯胍胺(acetoguanamine),及苯胍胺(benzoguanamine);(3)胺類化合物,可例如但不限於雙氰胺、苄基二甲基胺、4-(二甲基胺基)-N,N-二甲基苄基胺、
4-甲氧基-N,N-二甲基苄基胺,及4-甲基-N,N-二甲基苄基胺;及(4)咪唑衍生物(imidazole derivatives)及其鹽,可例如但不限於咪唑、2-甲基咪唑、2-乙基咪唑、2-乙基-4-甲基咪唑、2-苯基咪唑、4-苯基咪唑、1-氰基乙基-2-苯基咪唑,及1-(2-氰基乙基)-2-乙基-4-甲基咪唑。
該添加劑之使用量可由本發明所屬技術領域中具通常知識者依需求自行調整;較佳地,基於該聚矽氧烷聚合物(A)之使用量為100重量份,該添加劑(F)之使用量為0重量份至30重量份。又較佳地,該添加劑(F)之使用量為0重量份至25重量份。更佳地,該添加劑(E)之使用量為0重量份至20重量份。
該感光性聚矽氧烷組成物之製法是將聚矽氧烷聚合物(A)、醌二疊氮磺酸酯(B)、氨基甲酸乙酯(甲基)丙烯酸酯化合物(C)、無機粒子(D)及溶劑(E)放置於攪拌器中攪拌,使其均勻混合成溶液狀態,必要時可添加添加劑(F)。
本發明亦提供一種於一基板上形成薄膜之方法,其包含使用前述之感光性聚矽氧烷組成物施予該基板上。
本發明又提供一種基板上之薄膜,其係由前述之方法所製得。
較佳地,該薄膜係為液晶顯示元件或有機電激發光顯示器中TFT基板用之平坦化膜、層間絕緣膜或光波導路之芯材或包覆材之保護膜。
於本發明之具體例中,該薄膜係將如上所述之感光性聚矽氧烷組成物塗佈於一基材上,再經預烤、曝光、顯影及
後烤處理後所形成。
根據本發明薄膜之塗佈方法沒有特別限制,可以藉由噴塗法、輥塗法、旋轉塗布法(旋塗法)、縫模塗敷法、棒塗法、噴墨法等塗佈方法,較佳地為使用旋塗法或縫模塗敷法,將該感光性聚矽氧烷組成物塗佈在一基材上,再經預烤(prebake)方式將溶劑去除而形成一預烤塗膜。其中,預烤之條件,依各組份之種類、配合比率而異,通常為溫度在60℃至110℃間,進行30秒鐘至15分鐘。較佳地,該塗膜之厚度為3至6 μm。
預烤後,將該塗膜於光罩下進行曝光,曝光所使用之光線可例如但不限於紫外線、遠紫外線、X射線、帶電粒子束;紫外線可例如g線(波長436 nm)、h線、i線(波長365nm)等,遠紫外線可例如KrF準分子鐳射等,X射線可例如同步加速放射線等,帶電粒子束可例如電子束等。較佳地為紫外線,更佳地為g線或i線。當選用紫外線時,紫外線照射裝置粒如但不限於高水銀燈、超高水銀燈及金屬鹵素燈;較佳地,曝光量為50至1500 J/m2
。
顯影是浸漬於一顯影液中,根據組成物之組成而不同,歷時30秒至2分鐘,以去除不要之部分而形成特定之圖案。該顯影液之具體例為:(1)無機鹼,如氫氧化鈉、氫氧化鉀、碳酸鈉、矽酸鈉、偏矽酸酸鈉,及氨;(2)第一級脂肪胺,如乙胺、正丙胺;(3)第二級脂肪胺,如二乙胺、正丙胺;(4)第三級脂肪胺,如三甲胺、二乙胺甲基、二甲基乙基胺,及三乙胺;(5)第三級脂肪環酸,如吡咯、哌啶、
N-甲基哌啶、N-甲基1,8-二氮雜雙環[5.4.0]-7-十一碳烯,及1,5-二氮雜雙環[4.3.0]-5-壬烯;(6)第三級芳香胺,如吡啶、甲基嘧啶、二甲基吡啶,及喹啉;及(7)第四級銨鹽鹼性化合物,如四甲基氫氧化銨、四乙基氫氧化銨之水溶液。
此外,水溶性有機溶劑及/或表面活性劑,如甲醇、乙醇,亦可視需要添加於上述顯影液中。另外,顯影方法可例如但不限於盛液法、浸漬法、震盪浸漬法、沖洗法等適當之方法。
使用上述鹼性化合物所構成之顯影液時,通常於顯影後以水洗淨,再以壓縮空氣或壓縮氮氣風乾。並且,較佳地還採用高壓汞燈等進行一後曝光處理,對該塗膜全面照射放射線,使殘留之鄰萘醌二疊氮磺酸酯(B)化合物分解。更佳地,後曝光步驟中之曝光量為2000至5000 J/m2
。
接著,使用加熱板或烘箱等裝置進行後烤(postbake)處理,使該塗膜固化。後烤溫度通常為120至250℃。其中,後烤時間是根據加熱機器之種類而不同而調整,例如,使用加熱板之加熱時間為5至30分鐘,使用烘箱之加熱時間為30至90分鐘。經過以上之處理步驟後,即可形成一薄膜。
該基材可選自於應用在液晶顯示器中之無鹼玻璃、鈉鈣玻璃、強化玻璃(Pyrex玻璃)、石英玻璃或表面上已附著透明導電膜之玻璃等之基材及用於固體攝影元件等之光電變換元件基板(如:矽基板)等。
本發明再提供一種裝置,其包含前述之薄膜。
根據本發明之該裝置包含但不限於顯示元件、半導體元件或光波導路等。
茲以下列實例予以詳細說明本發明,唯並不意謂本發明僅侷限於此等實例所揭示之內容。
在一容積500毫升之三頸燒瓶中,加入丙二醇單乙醚(簡稱PGEE)200克,並於室溫下,以一邊攪拌,一邊以連續添加之方式,同時加入矽烷單體及聚矽氧烷之組合溶液及草酸水溶液;其中,矽烷單體及聚矽氧烷之使用量如表1所示。接著,將燒瓶浸漬於30℃之油浴中並攪拌30分鐘,然後於30分鐘內將油浴升溫至120℃,待溶液之內溫達到105℃時,持續加熱攪拌進行聚縮合6小時後,可得聚矽氧烷聚合物(A-1-1)。
聚矽氧烷聚合物(A-1-2)至(A-1-4)之合成例與前述聚矽氧烷聚合物(A-1-1)類似,其中,矽烷單體及聚矽氧烷之種類及使用量如表1所示。惟其中溶劑、草酸之使用量、反應溫度及聚縮合之反應時間與前述聚矽氧烷聚合物(A-1-1)不同,亦示於表1,可得聚矽氧烷聚合物(A-1-2)至(A-1-5)。
表2所示之各成分及使用量,以搖動式攪拌器,加以溶
解混合,即可調製而得感光性聚矽氧烷組成物。
表2所示之各成分及使用量,以搖動式攪拌器,加以溶解混合,即可調製而得感光性聚矽氧烷組成物。
於素玻璃基板(100×100×0.7 mm)上以旋轉塗佈方式得到約2 μm之塗膜,接續以110℃預烤2分鐘後,在曝光機與塗膜間置入正光阻用光罩,並以曝光機之紫外光照射塗膜,其能量為100 mJ/cm2
。將曝光後的塗膜浸漬於23℃之2.38%之TMAH水溶液60秒,除去曝光之部分。以清水清洗後,再以曝光機直接照射顯影後之塗膜,其能量為200 mJ/cm2
。最後以230℃後烤60分鐘,可獲得素玻璃基板上之保護膜。
1.感度:
於素玻璃基板(100×100×0.7 mm)上以旋轉塗佈方式得到約2 μm之塗膜,接續以110℃預烤2分鐘後,在曝光機與塗膜間置入正光阻用光罩,且該光罩含有不同線幅的圖樣,接著以曝光機之紫外光照射塗膜,將曝光後的塗膜浸漬於23℃之2.38%之TMAH水溶液60秒,觀察塗膜可形成圖樣之1μm線幅,其曝光能量為多少mJ/cm2
。
◎:曝光能量<150mJ/cm2
○:150 mJ/cm2
≦曝光能量<300 mJ/cm2
X:300 mJ/cm2
≦曝光能量
2.折射率:
將上述或得之素玻璃基板上之保護膜,以光學膜厚機(MFS-630-F,宏明科技製)測量保護膜之折射率。該測量結果如下:
○:折射率≧1.6
△:1.6>折射率≧1.5
X:1.5>折射率
評價結果示於表2,可知使用氨基甲酸乙酯(甲基)丙烯酸酯化合物(C)及無機粒子(D)之成分,其所得之薄膜感度與折射率佳。
上述實施例僅為說明本發明之原理及其功效,而非限制
本發明。習於此技術之人士對上述實施例所做之修改及變化仍不違背本發明之精神。本發明之權利範圍應如後述之申請專利範圍所列。
Claims (11)
- 一種感光性聚矽氧烷組成物,其包含:聚矽氧烷聚合物(A);鄰萘醌二疊氮磺酸酯(B);氨基甲酸乙酯(甲基)丙烯酸酯化合物(C),其中該氨基甲酸乙酯(甲基)丙烯酸酯化合物(C)每分子包含至少六個(甲基)丙烯醯基;無機粒子(D),其中該無機粒子(D)係以第四族元素之氧化物為主成分;以及溶劑(E)。
- 根據請求項1之感光性聚矽氧烷組成物,其中,該氨基甲酸乙酯(甲基)丙烯酸酯化合物(C)係每分子至少含有七個(甲基)丙烯醯基之氨基甲酸乙酯(甲基)丙烯酸酯化合物。
- 根據請求項1之感光性聚矽氧烷組成物,其中,該氨基甲酸乙酯(甲基)丙烯酸酯化合物(C)係每分子至少含有八個(甲基)丙烯醯基之氨基甲酸乙酯(甲基)丙烯酸酯化合物。
- 根據請求項1之感光性聚矽氧烷組成物,其中基於該聚矽氧烷聚合物(A)之使用量為100重量份,該鄰萘醌二疊氮磺酸酯(B)之使用量為1至50重量份;該氨基甲酸乙酯(甲基)丙烯酸酯化合物(C)之使用量為0.1至35重量份;該無機粒子(D)之使用量為5至120重量份;及該溶劑(E)之使用量為50至2000重量份。
- 根據請求項1之感光性聚矽氧烷組成物,其中該聚矽氧烷聚合物(A)係由下列結構式(1)所表示之矽烷單體經加水分解及縮合反應而得;Si(Ra )t (ORb )4-t 結構式(1)其中:Ra 係獨立選自由氫原子、碳數1至10之烷基、碳數2至10之烯基、碳數6至15之芳基、經酸酐基取代的碳數1至10之烷基、經環氧基取代的的碳數1至10之烷基及經環氧基取代的氧烷基所組成之群;Rb 係獨立選自由氫原子、碳數1至6之烷基、碳數1至6之醯基及碳數6至15之芳基所組成之群;及t表示0至3之整數,且當t表示2或3時,複數個Ra 各自為相同或不同;且當4-t表示2或3時,複數個Rb 各自為相同或不同。
- 根據請求項1之感光性聚矽氧烷組成物,其中該無機粒子(D)中第四族元素係為鈦或鋯。
- 根據請求項1之感光性聚矽氧烷組成物,其中該無機粒子(D)之粒徑大小係為1 nm至100 nm。
- 一種於一基板上形成薄膜之方法,其包含使用根據請求項1至7中任一項之感光性聚矽氧烷組成物施予該基板上。
- 一種基板上之薄膜,其係由請求項8之方法所製得。
- 根據請求項9之薄膜,其係為液晶顯示元件或有機電激 發光顯示器中TFT基板用之平坦化膜、層間絕緣膜或光波導路之芯材或包覆材之保護膜。
- 一種裝置,其包含根據請求項9或10之薄膜。
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