TWI465532B - Coating material for forming transparent coating film and a substrate with a transparent coating film - Google Patents

Coating material for forming transparent coating film and a substrate with a transparent coating film Download PDF

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TWI465532B
TWI465532B TW096119440A TW96119440A TWI465532B TW I465532 B TWI465532 B TW I465532B TW 096119440 A TW096119440 A TW 096119440A TW 96119440 A TW96119440 A TW 96119440A TW I465532 B TWI465532 B TW I465532B
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metal oxide
fine particles
transparent film
oxide fine
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TW200804547A (en
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Mitsuaki Kumazawa
Ryo Muraguchi
Toshiharu Hirai
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Jgc Catalysts & Chemicals Ltd
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04Homopolymers or copolymers of esters
    • C09D133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09D133/08Homopolymers or copolymers of acrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/66Additives characterised by particle size
    • C09D7/67Particle size smaller than 100 nm
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/66Additives characterised by particle size
    • C09D7/68Particle size between 100-1000 nm

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  • Application Of Or Painting With Fluid Materials (AREA)

Description

透明被膜形成用塗料及附有透明被膜之基材Transparent film forming coating and substrate with transparent film

本發明係關於一種可使用於藉由一次塗佈1種塗料而具有至少2種以上功能之例如抗反射性能、硬塗功能等之透明被膜的形成之透明被膜形成用塗料及使用該透明被膜形成用塗料所形成之附有透明被膜之基材。The present invention relates to a coating material for forming a transparent film which can be used for forming a transparent film such as an antireflection property or a hard coating function which has at least two or more functions by applying one coating at a time, and is formed using the transparent film. A substrate formed with a coating and having a transparent film.

自以往,為提昇玻璃、塑膠片、塑膠透鏡等之基材表面的耐刮傷性,已知在基材表面形成硬塗膜而如此之硬塗膜係進行,使有機樹脂膜或無機膜形成於玻璃或塑膠等的表面。進而,於有機樹脂膜或無機膜中調配樹脂粒子或二氧化矽等之無機粒子而進一步提昇耐刮傷性。In order to improve the scratch resistance of the surface of a substrate such as a glass, a plastic sheet, or a plastic lens, it is known that a hard coat film is formed on the surface of the substrate, and such a hard coat film is formed to form an organic resin film or an inorganic film. On the surface of glass or plastic. Further, inorganic particles such as resin particles or cerium oxide are blended in the organic resin film or the inorganic film to further improve scratch resistance.

又,已知為防止玻璃、塑膠片、塑膠透鏡等之基材表面之反射,而於其表面形成抗反射膜,例如,已知藉由塗佈法、蒸鍍法、CVD法等而使如含氟樹脂、氟化鎂之低折射率的物質之被膜形成於玻璃或塑膠的基材表面,或使含有氧化矽微粒等之低折射率微粒的塗佈液塗佈於基材表面,以形成抗反射被膜之方法(例如,專利文獻1(日本特開平7-133105號公報))。Further, it is known to prevent reflection of the surface of a substrate such as glass, a plastic sheet or a plastic lens, and to form an antireflection film on the surface thereof. For example, it is known to use a coating method, a vapor deposition method, a CVD method, or the like. A film of a material having a low refractive index of a fluorine-containing resin or magnesium fluoride is formed on a surface of a substrate of glass or plastic, or a coating liquid containing low refractive index fine particles such as cerium oxide fine particles is applied onto a surface of a substrate to form a film. A method of anti-reflection film (for example, Patent Document 1 (JP-A-7-133105)).

此時,已知為提高抗反射性能而於抗反射被膜之下層形成含有高折射率之微粒等的高折射率被膜。進一步為於基材上賦予抗靜電(anti-static)性能、電磁波遮蔽性能,亦進行含有導電性之氧化物微粒、金屬微粒等的導電性被膜之形成。例如,以陰極射線管、螢光顯示管、液晶顯示板 等之顯示面板的透明基材表面之抗靜電及抗反射作為目的,而於此等之表面形成具有抗靜電性能及抗反射性能之透明被膜。At this time, it is known that a high refractive index film containing fine particles having a high refractive index or the like is formed on the lower layer of the antireflection film in order to improve the antireflection performance. Further, in order to impart antistatic properties and electromagnetic wave shielding properties to the substrate, a conductive coating film containing conductive oxide fine particles or metal fine particles is also formed. For example, a cathode ray tube, a fluorescent display tube, a liquid crystal display panel For the purpose of antistatic and antireflection of the surface of the transparent substrate of the display panel, etc., the surface of the display forms a transparent film having antistatic properties and antireflection properties.

尤其近年來,進行積層如此之各種功能性的被膜而使用。例如,於基材上形成硬塗膜,形成導電性被膜或高折射率被膜,以形成抗反射膜。In particular, in recent years, it has been used to laminate such various functional films. For example, a hard coat film is formed on a substrate to form a conductive film or a high refractive index film to form an antireflection film.

但,各膜係由塗佈塗料,乾燥,依需要而硬化之步驟所構成,故形成上述多層膜時必須有許多步驟,而各膜間之密着性不足,或有生產性、經濟性等之問題。However, each film is composed of a coating coating, drying, and hardening as needed. Therefore, there are many steps in forming the multilayer film, and the adhesion between the films is insufficient, or productivity, economy, etc. problem.

又,本案發明人等係於專利文獻2(特開2003-12965號公報)中,提出:藉由使用一種含有平均粒徑相異,且粒徑小之導電性微粒與粒徑大之低折射率微粒相異的2種微粒之塗佈液,而以一次之塗佈形成抗反射性能的導電性被膜。In addition, the inventors of the present invention have proposed to use a conductive particle having a small average particle diameter and a small particle diameter and a low refractive index which is large in particle diameter, as disclosed in Japanese Laid-Open Patent Publication No. 2003-12965. The coating liquid of two kinds of fine particles having different particle ratios is obtained, and the conductive film having antireflection properties is formed by coating once.

(專利文獻1)特開平7-133105號公報(Patent Document 1) Japanese Patent Publication No. 7-133105

(專利文獻2)特開2003-12965號公報(Patent Document 2) JP-A-2003-12965

至今,為了步驟之簡化,或減少被膜本身之厚度,而尋求只塗佈塗料1次,卻具有2種以上功能之透明被膜。Heretofore, in order to simplify the steps or to reduce the thickness of the film itself, a transparent film having two or more functions has been sought only by applying the coating once.

在前述之專利文獻2的塗佈液中,由於為2種微粒的混合物,故只形成1層,有時抗反射性能、抗靜電性能未必充分,進一步,會有塑膠等對基材之密着性低,且膜的強度不足的情形。In the coating liquid of the above-mentioned Patent Document 2, since it is a mixture of two types of fine particles, only one layer is formed, and antireflection performance and antistatic performance may not be sufficient. Further, adhesion of a plastic or the like to a substrate may occur. Low, and the strength of the film is insufficient.

本發明人等有鑑於如此之問題點,經專心研究之結果,認為於進行塗佈而形成之被膜內,若以上下完全分離之形式形成微粒層,而只塗佈塗料1次,即可形成具有2種以上功能之透明被膜等。In view of such a problem, the inventors of the present invention have found that, in the film formed by coating, if a fine particle layer is formed in the form of the above completely separated, and only the coating material is applied once, it can be formed. A transparent film having two or more functions.

繼而,進一步研究之結果,發現:將表面以特定之有機矽化合物進行疏水化處理,並將具有特定之表面電荷量之金屬氧化物微粒與疏水性基質形成成分組合,使金屬氧化物微粒不會均一地分散於透明被膜中,而於透明被膜之上部形成層,亦即,發現可以一次之被膜形成而形成具有2種以上之功能的被膜,終於完成本發明。Then, as a result of further research, it was found that the surface was hydrophobized with a specific organic cerium compound, and the metal oxide fine particles having a specific surface charge amount were combined with the hydrophobic matrix forming component so that the metal oxide fine particles did not The film was uniformly dispersed in the transparent film, and a layer was formed on the upper portion of the transparent film. That is, it was found that the film can be formed at one time to form a film having two or more functions, and finally the present invention has been completed.

[1]一種透明被膜形成用塗料,係包括如下:[1] A coating material for forming a transparent film, which comprises the following:

(A)金屬氧化物微粒(a),其表面經下述式(1)所示之有機矽化合物及/或具有疏水性官能基的多官能丙烯酸酯樹脂之表面處理,且表面電荷量(QA )在5至80μ eq/g的範圍;Rn -SiX4-n (1)(式中,R為碳數1至10的非取代或取代烴基,可互為相同或相異。X:碳數1至4的烷氧基、矽烷醇基、鹵素、氫,n:0至3之整數)(A) Metal oxide fine particles (a) whose surface is surface-treated with an organic cerium compound represented by the following formula (1) and/or a multifunctional acrylate resin having a hydrophobic functional group, and a surface charge amount (Q) A ) in the range of 5 to 80 μ eq/g; R n -SiX 4-n (1) (wherein, R is an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, which may be the same or different from each other. X : alkoxy group having 1 to 4 carbon atoms, stanol group, halogen, hydrogen, n: an integer of 0 to 3)

(B)基質形成成分,其包含下述式(2)所示之有機矽化合物或此等之水解物、水解聚縮合物及/或具有疏水性官能基之多官能(甲基)丙烯酸酯樹脂所構成之疏水性基質形成成分;Rn’ -SiX4-n’ (2) (式中,R為碳數1至10的非取代或取代烴基,可互為相同或相異。X:碳數1至4的烷氧基、矽烷醇基、鹵素、氫,n’:1至3之整數)(B) a matrix-forming component comprising an organic hydrazine compound represented by the following formula (2) or a hydrolyzate thereof, a hydrolyzed polycondensate, and/or a polyfunctional (meth) acrylate resin having a hydrophobic functional group the hydrophobic matrix forming component composed; R n '-SiX 4-n ' (2) ( wherein, R is a 1 to 10 carbon atoms, non-substituted or substituted hydrocarbon group, may be the same or different from each other .X: carbon Alkoxy groups of 1 to 4, stanol groups, halogens, hydrogen, n': an integer from 1 to 3)

(C)極性溶劑;其特徵在於:作為金屬氧化物微粒(a)之固形分的濃度(CPA )在0.1至20重量%的範圍,作為基質形成成分(C)之固形分的濃度(CM )在1至50重量%的範圍。(C) a polar solvent; characterized in that the concentration (C PA ) of the solid content of the metal oxide fine particles (a) is in the range of 0.1 to 20% by weight, and the concentration of the solid component as the matrix forming component (C) (C) M ) is in the range of 1 to 50% by weight.

[2]如[1]之透明被膜形成用塗料,其中,前述基質形成成分為含有疏水性基質,以及,由下述式(3)所示之有機矽化合物或此等之水解物、水解聚縮合物或具有親水性官能基之多官能(甲基)丙烯酸酯樹脂所構成之親水性基質形成成分;SiX4 (3)(式中,X:碳數1至4的烷氧基、矽烷醇基、鹵素、氫)[2] The coating material for forming a transparent film according to [1], wherein the matrix-forming component contains a hydrophobic matrix, and an organic hydrazine compound represented by the following formula (3) or a hydrolyzate thereof, hydrolyzed poly a hydrophilic matrix-forming component composed of a condensate or a polyfunctional (meth) acrylate resin having a hydrophilic functional group; SiX 4 (3) (wherein X: alkoxy group having 1 to 4 carbon atoms, stanol Base, halogen, hydrogen)

作為親水性基質形成成分之固形分的濃度(CMA )與作為疏水性基質形成成分之固形分的濃度(CMB )之濃度比(CMA )/(CMB )為0.01至1的範圍。Concentration (C MA) formed in the solid component of the points as the hydrophilic matrix and the concentration (C MB) of forming the solid component of the points as the hydrophobic matrix concentration ratio (C MA) / (C MB ) is a range of 0.01 to 1.

[3]如[1]或[2]之透明被膜形成用塗料,其中,前述金屬氧化物微粒(a)的平均粒徑在5至500nm的範圍。[3] The coating material for forming a transparent film according to [1] or [2], wherein the metal oxide fine particles (a) have an average particle diameter in the range of 5 to 500 nm.

[4]如[1]至[3]中任一項的透明被膜形成用塗料,其中,進一步含有表面電荷量(QB )在25至100μ eq/g的範圍之金屬氧化物微粒(B);金屬氧化物微粒(b)之表面電荷量(QB )與金屬氧化物微粒(a)之表面電荷量(QA )之差(QB )-(QA )在20至95μ eq/g 的範圍。[4] The coating material for forming a transparent film according to any one of [1] to [3], further comprising metal oxide fine particles (BB) having a surface charge amount (Q B ) in the range of 25 to 100 μ eq/g The difference between the surface charge amount (Q B ) of the metal oxide fine particles (b) and the surface charge amount (Q A ) of the metal oxide fine particles (a) (Q B )-(Q A ) is 20 to 95 μ eq The range of /g.

[5]如[1]至[4]中任一項的透明被膜形成用塗料,其中,作為前述金屬氧化物微粒(b)之固形分的濃度(CPB )在0.1至20重量%的範圍。[5] The coating material for forming a transparent film according to any one of [1] to [4] wherein the concentration (C PB ) of the solid content of the metal oxide fine particles (b) is in the range of 0.1 to 20% by weight. .

[6]如[4]或[5]之透明被膜形成用塗料,其中,前述金屬氧化物微粒(b)之平均粒徑在5至500nm的範圍。[6] The coating material for forming a transparent film according to [4], wherein the metal oxide fine particles (b) have an average particle diameter in the range of 5 to 500 nm.

[7]如[1]或[2]之透明被膜形成用塗料,其中,前述親水性官能基為選自羥基、胺基、羧基、磺基、縮水甘油基中之1種以上,且前述疏水性官能基為選自(甲基)丙烯醯基、烷基、苯基、胺基甲酸酯基、CF2 基中之1種以上。[7] The coating material for forming a transparent film according to the above [1], wherein the hydrophilic functional group is at least one selected from the group consisting of a hydroxyl group, an amine group, a carboxyl group, a sulfo group, and a glycidyl group, and the hydrophobic The functional group is one or more selected from the group consisting of a (meth)acryl fluorenyl group, an alkyl group, a phenyl group, a urethane group, and a CF 2 group.

[8]一種附有透明被膜之基材,係於基材上形成透明被膜之附有透明被膜的基材,其特徵在於:透明被膜為由表面電荷量(QA )在5至80μ eq/g範圍中的疏水性金屬氧化物微粒(a)與基質成分所構成;金屬氧化物微粒(a)偏存於透明被膜上部形成之層,透明被膜中之金屬氧化物微粒(a)的含量(WPA )在0.2至90重量%的範圍;基質成分之含量(WM )在10至99.8重量%的範圍;該基質成分係選自下述式(4)所示之有機矽化合物之水解聚縮合物及/或具有疏水性官能基之多官能(甲基)丙烯酸酯樹脂之疏水性基質成分。[8] A substrate with a transparent film attached to a substrate to form a transparent film with a transparent film, characterized in that the transparent film has a surface charge amount (Q A ) of 5 to 80 μ eq. The hydrophobic metal oxide fine particles (a) in the /g range are composed of a matrix component; the metal oxide fine particles (a) are deposited in a layer formed on the upper portion of the transparent film, and the content of the metal oxide fine particles (a) in the transparent film is (W PA ) is in the range of 0.2 to 90% by weight; the content of the matrix component (W M ) is in the range of 10 to 99.8% by weight; the matrix component is selected from the hydrolysis of the organic cerium compound represented by the following formula (4) A hydrophobic matrix component of a polycondensate and/or a polyfunctional (meth) acrylate resin having a hydrophobic functional group.

Rn -SiX4-n (4)(式中,R為碳數1至10的非取代或取代烴基,可互為相同或相異。X:碳數1至4的烷氧基、矽烷醇基、鹵素、 氫,n:0至3之整數)R n -SiX 4-n (4) (wherein R is an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms which may be the same or different from each other. X: alkoxy group having 1 to 4 carbon atoms, stanol Base, halogen, hydrogen, n: an integer from 0 to 3)

[9]如[8]之附有透明被膜之基材,其中,前述基質成分為由疏水性基質成分,以及親水性基質成分所構成,親水性基質成分為下述式(3)所示之有機矽化合物之水解聚縮合物及/或具有親水性官能基之多官能(甲基)丙烯酸酯樹脂;SiX4 (3)(式中,X:碳數1至4的烷氧基、矽烷醇基、鹵素、氫)[9] The substrate having a transparent film according to [8], wherein the matrix component is composed of a hydrophobic matrix component and a hydrophilic matrix component, and the hydrophilic matrix component is represented by the following formula (3) Hydrolyzed polycondensate of an organic hydrazine compound and/or polyfunctional (meth) acrylate resin having a hydrophilic functional group; SiX 4 (3) (wherein X: alkoxy group having 1 to 4 carbon atoms, stanol Base, halogen, hydrogen)

作為親水性基質成分之固形分的含量(WMA )與作為疏水性基質成分之固形分的含量(WMB )之含量比(WMA )/(WMB )在0.01至1的範圍。The content ratio (W MA ) of the solid content of the hydrophilic matrix component (W MA ) to the content of the solid component (W MB ) as the hydrophobic matrix component (W MA )/(W MB ) is in the range of 0.01 to 1.

[10]如[8]或[9]之附有透明被膜之基材,其中,透明被膜進一步含有金屬氧化物微粒(b),且該金屬氧化物微粒(b)之表面電荷量(QB )在25至100μ eq/g的範圍;且金屬氧化物微粒(b)之表面電荷量(QB )與金屬氧化物微粒(a)之表面電荷量(QA )之差(QB )-(QA )在20至95μ eq/g的範圍;金屬氧化物微粒(b)偏存於基材表面上形成之層,或分散於由前述金屬氧化物微粒(a)所構成之層與基材表面之間而成。[10] The substrate having a transparent film as in [8] or [9], wherein the transparent film further contains metal oxide fine particles (b), and the surface charge amount of the metal oxide fine particles (b) (Q B ) in the range of 25 to 100 μ eq/g; and the difference between the surface charge amount (Q B ) of the metal oxide fine particles (b) and the surface charge amount (Q A ) of the metal oxide fine particles (a) (Q B ) - (Q A ) is in the range of 20 to 95 μ eq/g; the metal oxide fine particles (b) are deposited on a layer formed on the surface of the substrate, or dispersed in a layer composed of the aforementioned metal oxide fine particles (a) Made between the surface of the substrate.

[11]如[8]至[10]中任一項的附有透明被膜之基材,其中,前述金屬氧化物微粒(a)的平均粒徑在5至500nm的範圍,前述金屬氧化物微粒(b)的平均粒徑在5至500nm的範圍。[11] The substrate with a transparent film according to any one of [8] to [10] wherein the metal oxide fine particles (a) have an average particle diameter in the range of 5 to 500 nm, and the metal oxide particles are as described above. The average particle diameter of (b) is in the range of 5 to 500 nm.

[12]如[8]至[11]中任一項之附有透明被膜之基材,其中,前述親水性官能基為選自羥基、胺基、羧基、磺基中之1 種以上,且前述疏水性官能基為選自(甲基)丙烯醯基、烷基、苯基、胺基甲酸酯基、CF2 基中之1種或2種以上。[12] The substrate having a transparent film according to any one of [8], wherein the hydrophilic functional group is at least one selected from the group consisting of a hydroxyl group, an amine group, a carboxyl group, and a sulfo group, and The hydrophobic functional group is one or more selected from the group consisting of a (meth) acrylonitrile group, an alkyl group, a phenyl group, a urethane group, and a CF 2 group.

若依本發明,可提供一種藉由一次之塗佈,可至少形成2層分離成上下之功能相異的層之透明被膜形成用塗料及附有透明被膜之基材。According to the present invention, it is possible to provide a coating material for forming a transparent film and a substrate having a transparent film by forming at least two layers which are separated into upper and lower functional layers by one application.

又,因以一次之塗佈可得到透明被膜,故可大幅地縮短步驟,同時並提昇良率,所得到之透明被膜係密着性亦優。Further, since the transparent film can be obtained by one application, the step can be greatly shortened and the yield can be improved, and the obtained transparent film can be excellent in adhesion.

(用以實施發明之最佳形態)(The best form for implementing the invention)

以下,首先,具體地說明有關本發明之透明被膜形成用塗料。Hereinafter, the coating material for forming a transparent film of the present invention will be specifically described.

透明被膜形成用塗料Transparent film forming coating

本發明之透明被膜形成用塗料係由具有特定之表面電荷量的金屬氧化物微粒(a)與基質形成成分與極性溶劑所構成。The coating material for forming a transparent film of the present invention comprises a metal oxide fine particle (a) having a specific surface charge amount, a matrix forming component and a polar solvent.

疏水性金屬氧化物微粒(a)Hydrophobic metal oxide particles (a)

使用於本發明之金屬氧化物微粒(a)係只要具有疏水性即可,而無特別限制,可使用以往公知之疏水性金屬氧化物微粒,但,表面電荷量(QA )為5至80μ eq/g,進一步宜為7至50μ eq/g的範圍。若在此範圍,與後述之基質成分組合,即可在形成被膜時偏存於上層。The metal oxide fine particles (a) to be used in the present invention are not particularly limited as long as they have hydrophobicity, and conventionally known hydrophobic metal oxide fine particles can be used, but the surface charge amount (Q A ) is 5 to 80. μ eq/g, further preferably in the range of 7 to 50 μ eq/g. In this range, in combination with a matrix component to be described later, it is possible to deviate from the upper layer when the film is formed.

金屬氧化物微粒(a)之表面電荷量(QA )小者係或許因 疏水性過高而於塗料中金屬氧化物微粒(a)會有凝集現象,並於膜之上部會有不形成均勻之層的情形。The surface charge amount (Q A ) of the metal oxide fine particles (a) may be small due to excessive hydrophobicity, and the metal oxide fine particles (a) may agglomerate in the coating, and may not form uniform on the upper portion of the film. The situation of the layer.

若金屬氧化物微粒(a)之表面電荷量(QA )太高,在形成膜時,金屬氧化物微粒(a)並不偏存於上層,而有分散於膜中之傾向。When the surface charge amount (Q A ) of the metal oxide fine particles (a) is too high, the metal oxide fine particles (a) do not tend to be present in the upper layer but are dispersed in the film when the film is formed.

金屬氧化物微粒(a)係如後述般,金屬氧化物微粒經有機矽化合物及/或樹脂表面處理。The metal oxide fine particles (a) are treated as described below, and the metal oxide fine particles are surface-treated with an organic cerium compound and/or a resin.

金屬氧化物微粒可依用途而適當選擇使用,例如,使用於抗反射膜之金屬氧化物微粒之折射率一般為1.45以下,進一步可使用1.40以下之微料子,具體上,可舉例如SiO2 、於內部具有孔洞之SiO2 、或於此等被覆具有導電性之金屬氧化物的微粒等。The metal oxide fine particles can be appropriately selected and used depending on the application. For example, the metal oxide fine particles used for the antireflection film generally have a refractive index of 1.45 or less, and further, 1.40 or less of fine particles can be used. Specifically, for example, SiO 2 , SiO 2 having pores therein, or particles coated with a conductive metal oxide or the like.

使用於硬化膜之金屬氧化物微粒係可舉例如ZrO2 、TiO2 、Sb2 O5 、ZnO2 、Al2 O3 、SnO2 或此等粒子呈鏈狀連結之鏈狀粒子,或前述之折射率為1.45以下之二氧化矽系微粒等。Examples of the metal oxide fine particles used in the cured film include ZrO 2 , TiO 2 , Sb 2 O 5 , ZnO 2 , Al 2 O 3 , SnO 2 or chain-like particles in which the particles are chain-linked, or the foregoing The cerium oxide-based fine particles having a refractive index of 1.45 or less.

使用於高折射率膜之金屬氧化物微粒之折射率一般為1.60以上,進一步可使用1.80以上之微粒,具體上可舉例如ZrO2 、TiO2 、Sb2 O5 、ZnO2 、Al2 O3 、SnO2 、摻雜銻之氧化錫、摻雜錫之氧化銦、摻雜氧化錫之磷(PTO)等。The metal oxide fine particles used in the high refractive index film generally have a refractive index of 1.60 or more, and further preferably 1.80 or more fine particles, and specific examples thereof include ZrO 2 , TiO 2 , Sb 2 O 5 , ZnO 2 , and Al 2 O 3 . , SnO 2 , antimony-doped tin oxide, tin-doped indium oxide, doped tin oxide-phosphorus (PTO), and the like.

使用於導電性膜之金屬氧化物微粒,一般可舉例如Sb2 O5 、SnO2 、摻雜銻之氧化錫、摻雜錫之氧化銦、摻雜氧化錫之磷(PTO),或以此等之導電性材料被覆表面之氧化矽系微粒或於內部具有孔洞之二氧化矽系微粒等。The metal oxide fine particles used for the conductive film are generally, for example, Sb 2 O 5 , SnO 2 , tin oxide doped with antimony, indium oxide doped with tin, phosphorus doped with tin oxide (PTO), or The conductive material covers the cerium oxide-based fine particles on the surface or the cerium oxide-based fine particles having pores therein.

金屬氧化物微粒(a)係前述金屬氧化物微粒經下述式(1)所示之有機矽化合物及/或具有疏水性官能基的多官能丙烯酸酯樹脂之表面處理。The metal oxide fine particles (a) are surface-treated by the above-mentioned metal oxide fine particles by an organic cerium compound represented by the following formula (1) and/or a multifunctional acrylate resin having a hydrophobic functional group.

Rn -SiX4-n (1)(式中,R為碳數1至10的非取代或取代烴基,可互為相同或相異。X:碳數1至4的烷氧基、矽烷醇基、鹵素、氫,n:0至3之整數)R n -SiX 4-n (1) (wherein R is an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms which may be the same or different from each other. X: alkoxy group having 1 to 4 carbon atoms, stanol Base, halogen, hydrogen, n: an integer from 0 to 3)

以如此之式(1)所示之有機矽化合物係可舉例如四甲氧基矽烷、四乙氧基矽烷、四丙氧基矽烷、四丁氧基矽烷、甲基三甲氧基矽烷、二甲基二甲氧基矽烷、苯基三甲氧基矽烷、二苯基二甲氧基矽烷、甲基三乙氧基矽烷、二甲基二乙氧基矽烷、苯基三乙氧基矽烷、二苯基二乙氧基矽烷、異丁基三甲氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三(β-甲氧基乙氧基)矽烷、3,3,3-三氟丙基三甲氧基矽烷、甲基-3,3,3-三氟丙基二甲氧基矽烷、β-(3,4-環氧基環己基)乙基三甲氧基矽烷、γ-環氧丙氧基甲基三甲氧基矽烷、γ-環氧丙氧基甲基三乙氧基矽烷、γ-環氧丙氧基乙基三甲氧基矽烷、γ-環氧丙氧基乙基三乙氧基矽烷、γ-環氧丙氧基丙基三甲氧基矽烷、γ-環氧丙氧基丙基三甲氧基矽烷、γ-環氧丙氧基丙基三乙氧基矽烷、γ-環氧丙氧基丙基三乙氧基矽烷、γ-(β-環氧丙氧基乙氧基)丙基三甲氧基矽烷、γ-(甲基)丙烯醯氧基甲基三甲氧基矽烷、γ-(甲基)丙烯醯氧基甲基三乙氧基矽烷、γ-(甲基)丙烯醯氧基乙基三甲氧基矽烷、γ-(甲基)丙烯醯氧基乙基 三乙氧基矽烷、γ-(甲基)丙烯醯氧基丙基三甲氧基矽烷、γ-(甲基)丙烯醯氧基丙基三甲氧基矽烷、γ-(甲基)丙烯醯氧基丙基三乙氧基矽烷、γ-(甲基)丙烯醯氧基丙基三乙氧基矽烷、丁基三甲氧基矽烷、異丁基三乙氧基矽烷、己基三乙氧基矽烷、辛基三乙氧基矽烷、癸基三乙氧基矽烷、丁基三乙氧基矽烷、異丁基三乙氧基矽烷、己基三乙氧基矽烷、辛基三乙氧基矽烷、癸基三乙氧基矽烷、3-脲基異丙基丙基三乙氧基矽烷、全氟辛基乙基三甲氧基矽烷、全氟辛基乙基三乙氧基矽烷、全氟辛基乙基三異丙氧基矽烷、三氟丙基三甲氧基矽烷、N-β(胺基乙基)γ-胺基丙基甲基二甲氧基矽烷、N-β(胺基乙基)γ-胺基丙基三甲氧基矽烷、N-苯基-γ-胺基丙基三甲氧基矽烷、γ-氫硫基丙基三甲氧基矽烷、三甲基矽烷醇、甲基三氯矽烷等。The organic hydrazine compound represented by the formula (1) may, for example, be tetramethoxy decane, tetraethoxy decane, tetrapropoxy decane, tetrabutoxy decane, methyl trimethoxy decane or dimethyl. Dimethoxy decane, phenyl trimethoxy decane, diphenyl dimethoxy decane, methyl triethoxy decane, dimethyl diethoxy decane, phenyl triethoxy decane, diphenyl Diethoxy decane, isobutyl trimethoxy decane, vinyl trimethoxy decane, vinyl triethoxy decane, vinyl tris (β-methoxyethoxy) decane, 3, 3, 3 -trifluoropropyltrimethoxydecane, methyl-3,3,3-trifluoropropyldimethoxydecane, β-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, γ -glycidoxymethyltrimethoxydecane, γ-glycidoxymethyltriethoxydecane, γ-glycidoxyethyltrimethoxydecane, γ-glycidoxypropyl B Triethoxy decane, γ-glycidoxypropyltrimethoxydecane, γ-glycidoxypropyltrimethoxydecane, γ-glycidoxypropyltriethoxydecane, Γ-glycidoxypropyltriethoxyhydrazine , γ-(β-glycidoxyethoxy)propyltrimethoxydecane, γ-(meth)acryloxymethyltrimethoxydecane, γ-(methyl)propene fluorenyl Triethoxy decane, γ-(meth) propylene methoxyethyl trimethoxy decane, γ-(meth) propylene oxiranyl ethyl Triethoxy decane, γ-(meth) propylene methoxy propyl trimethoxy decane, γ-(meth) propylene methoxy propyl trimethoxy decane, γ-(methyl) propylene decyloxy Propyltriethoxydecane, γ-(meth)acryloxypropyltriethoxydecane, butyltrimethoxydecane, isobutyltriethoxydecane, hexyltriethoxydecane, octyl Triethoxy decane, decyl triethoxy decane, butyl triethoxy decane, isobutyl triethoxy decane, hexyl triethoxy decane, octyl triethoxy decane, decyl III Ethoxy decane, 3-ureido isopropyl propyl triethoxy decane, perfluorooctylethyl trimethoxy decane, perfluorooctyl ethyl triethoxy decane, perfluorooctyl ethyl three Isopropoxydecane, trifluoropropyltrimethoxydecane, N-β(aminoethyl)γ-aminopropylmethyldimethoxydecane, N-β(aminoethyl)γ-amine Propyltrimethoxydecane, N-phenyl-γ-aminopropyltrimethoxydecane, γ-hydrothiopropyltrimethoxydecane, trimethylstanol, methyltrichlorodecane, and the like.

具有疏水性之多官能丙烯酸酯樹脂係可舉例如季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、季戊四醇四丙烯酸酯、二-三羥甲基丙烷四(甲基)丙烯酸酯、二季戊四醇六丙烯酸酯、甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸丁酯、甲基丙烯酸異丁酯、甲基丙烯酸2-乙基己酯、甲基丙烯酸異癸基酯、丙烯酸正月桂基酯、丙烯酸正硬脂基酯、1,6-己二醇二甲基丙烯酸酯、全氟辛基乙基甲基丙烯酸酯、甲基丙烯酸三氟乙基酯、胺基甲酸酯丙烯酸酯等。Examples of the hydrophobic polyfunctional acrylate resin include pentaerythritol triacrylate, pentaerythritol tetraacrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol tetraacrylate, and di-trimethylolpropane tetra ( Methyl) acrylate, dipentaerythritol hexaacrylate, methyl methacrylate, ethyl methacrylate, butyl methacrylate, isobutyl methacrylate, 2-ethylhexyl methacrylate, methacrylic acid Isodecyl ester, n-lauryl acrylate, n-stearyl acrylate, 1,6-hexanediol dimethacrylate, perfluorooctylethyl methacrylate, trifluoroethyl methacrylate , urethane acrylate, and the like.

使用有機矽化合物時,與金屬氧化物微粒之量比(有機矽化合物/金屬氧化物微粒之重量)係依金屬氧化物微粒之 平均粒徑而異,但宜為0.001至2,更宜在0.005至1.5之範圍。When an organic cerium compound is used, the ratio of the amount of the metal oxide particles (the weight of the organic cerium compound/metal oxide fine particles) depends on the metal oxide particles. The average particle size varies, but is preferably from 0.001 to 2, more preferably from 0.005 to 1.5.

使用具有上述疏水性之多官能丙烯酸酯樹脂時,與金屬氧化物微粒之量比(作為具有上述疏水性之多官能丙烯酸酯樹脂之固形分的重量/金屬氧化物微粒之重量)係依金屬氧化物微粒之平均粒徑而異,但宜為0.01至2,更宜在0.05至1.5之範圍。When a polyfunctional acrylate resin having the above hydrophobicity is used, the ratio of the amount to the metal oxide fine particles (the weight of the solid component of the polyfunctional acrylate resin having the above hydrophobicity / the weight of the metal oxide fine particles) is oxidized by metal The average particle diameter of the particles varies, but is preferably from 0.01 to 2, more preferably from 0.05 to 1.5.

若以如此之重量比經有機矽化合物或多官能丙烯酸酯樹脂之表面處理,可得到具有前述之特定表面電荷量的金屬氧化物粒子,在極性溶劑中之分散性、安定性高,可於膜之上部形成均一的層。When the surface of the organic ruthenium compound or the polyfunctional acrylate resin is treated in such a weight ratio, metal oxide particles having the specific surface charge amount described above can be obtained, and the dispersibility and stability in a polar solvent are high, and the film can be obtained. The upper portion forms a uniform layer.

又,重量比為小時,在極性溶劑中之分散性、安定性低,塗料之安定性變得不充分,有時在形成膜時,會有膜白化的情形。若前述重量比過高,金屬氧化物微粒(a)之表面電荷量變成5μ q/g以下,或許因疏水性過高而於塗料中金屬氧化物微粒(a)會有凝集現象,並於膜之上部會有不形成均勻的層之情形。Further, when the weight ratio is small, the dispersibility and stability in a polar solvent are low, and the stability of the coating material is insufficient, and the film may be whitened when the film is formed. If the aforementioned weight ratio is too high, the surface charge amount of the metal oxide fine particles (a) becomes 5 μq /g or less, and the metal oxide fine particles (a) may agglomerate in the coating due to excessively high hydrophobicity. There is a case where a uniform layer is not formed on the upper portion of the film.

在本案說明書中,所謂金屬氧化物微粒(a)排列於膜之上部,係指僅於膜表面與其附近存在金屬微粒,而所謂金屬氧化物微粒排列於膜之下部,係指僅於基材表面與其附近存在金屬微粒。In the present specification, the arrangement of the metal oxide fine particles (a) on the upper portion of the film means that only metal particles are present on the surface of the film and the vicinity thereof, and the so-called metal oxide particles are arranged on the lower portion of the film, which means only on the surface of the substrate. There are metal particles in the vicinity.

在本發明之透明被膜中,金屬氧化物微粒(a)係偏佈透明被膜的上部,但此時,金屬氧化物微粒(a)可形成多層,亦可形成單層,或亦可以點存在於上部。In the transparent film of the present invention, the metal oxide fine particles (a) are biased on the upper portion of the transparent film, but in this case, the metal oxide fine particles (a) may be formed into a plurality of layers, or may be formed as a single layer, or may be present in a plurality of layers. Upper part.

前述之金屬氧化物微粒(a)的表面電荷量之測定方法,係使用表面電位滴定裝置(Mutek(股)pcd-03),使用0.001N的poly-氯化二烯丙基二甲基銨而滴定微粒的分散液,求取每一粒子單位重量(克)的表面電荷量(μ eq/g)。The method for measuring the surface charge amount of the metal oxide fine particles (a) described above is a surface potential titrator (Mutek pcd-03) using 0.001 N poly-diallyldimethylammonium chloride. The dispersion of the microparticles was titrated to determine the surface charge amount ( μ eq/g) per unit weight (gram) of each particle.

金屬氧化物微粒(a)之平均粒徑在5至500nm,更宜在10至100nm的範圍內。The metal oxide fine particles (a) have an average particle diameter of from 5 to 500 nm, more preferably from 10 to 100 nm.

金屬氧化物微粒(a)之平均粒徑小者即難以得到其本體,金屬氧化物微粒(a)之平均粒徑大者在塗布膜時之霧度值(haze value)高,有時無法使用來作為光學膜。When the average particle diameter of the metal oxide fine particles (a) is small, it is difficult to obtain the bulk thereof, and the average particle diameter of the metal oxide fine particles (a) is high, and the haze value at the time of coating the film is high, and may not be used. Comes as an optical film.

於本發明所使用之金屬氧化物微粒(a)係只要為經實施上述表面處理者即可,並無特別限定,例如,適宜為以下之方法所調製者。The metal oxide fine particles (a) used in the present invention are not particularly limited as long as they are subjected to the above surface treatment, and are preferably prepared by the following methods, for example.

有機矽化合物之情形係於前述之金屬氧化物微粒的醇分散液中加入特定量之前述有機矽化合物,再加入水,依需要而加入酸或鹼作為有機矽化合物之水解用觸媒以水解有機矽化合物。或,具有疏水性之多官能丙烯酸酯樹脂之情形,使具有前述之疏水性之多官能丙烯酸酯樹脂藉熱或聚合起始劑聚合而被覆金屬氧化物微粒(a)的粒子表面。聚合起始劑可使用一般之自由基聚合起始劑、陽離子聚合起始劑、陰離子聚合起始劑,其中宜為自由基聚合起始劑,例如適宜為乙醯苯系、苯並醚系、硫雜蔥酮系等之聚合起始劑。In the case of the organic ruthenium compound, a specific amount of the above organic ruthenium compound is added to the alcohol dispersion of the metal oxide fine particles described above, and water is added thereto, and an acid or a base is added as a catalyst for hydrolysis of the organic ruthenium compound to hydrolyze the organic矽 compound. Alternatively, in the case of a hydrophobic polyfunctional acrylate resin, the polyfunctional acrylate resin having the aforementioned hydrophobicity is polymerized to coat the surface of the particles of the metal oxide fine particles (a) by heat or a polymerization initiator. As the polymerization initiator, a general radical polymerization initiator, a cationic polymerization initiator, an anionic polymerization initiator may be used, and a radical polymerization initiator is preferred, and for example, it is preferably an acetophenone or a benzoate. A polymerization initiator such as a thioselenone system.

然後,藉由取代成有機溶劑而可得到金屬氧化物微粒(a)之有機溶劑分散液。有機溶劑係宜使用後述之極性溶劑。Then, an organic solvent dispersion of the metal oxide fine particles (a) can be obtained by substituting an organic solvent. The organic solvent is preferably a polar solvent described later.

作為如此之金屬氧化物微粒(a)的透明被膜形成用塗料中的固形分之濃度(CPA )為0.1至20重量%,進一步宜在0.2至15重量%的範圍中。The solid content (C PA ) in the coating material for forming a transparent film of such a metal oxide fine particle (a) is from 0.1 to 20% by weight, more preferably from 0.2 to 15% by weight.

如金屬氧化物微粒(a)之濃度(CPA )較少時,即使偏存於膜之上部,由於粒子之量較少,故有時會因粒子所具有之特性(低折射率或導電性等)而產生抗反射性能、抗靜電性能等不足的情形。又,即使金屬氧化物微粒(a)之濃度(CPA )過多,所得膜中的粒子之比率過多而成為實質上於膜中金屬氧化物微粒涵蓋全區域均一地分散之膜,而有時並無法得到具有本發明之2種以上功能的膜。When the concentration (C PA ) of the metal oxide fine particles (a) is small, even if it is excessively deposited on the upper portion of the film, the amount of particles is small, so the characteristics of the particles (low refractive index or conductivity) may be sometimes caused. Etc.), which causes insufficient anti-reflection performance, antistatic performance, and the like. Further, even if the concentration (C PA ) of the metal oxide fine particles (a) is too large, the ratio of the particles in the obtained film is too large, and the film mainly disperses the metal oxide fine particles in the entire region in the film, and sometimes A film having two or more functions of the present invention could not be obtained.

金屬氧化物微粒(b)Metal oxide particles (b)

本發明之透明被膜形成用塗料中可含有金屬氧化物微粒(a)以及亦可進一步含有金屬氧化物微粒(b)。The coating material for forming a transparent film of the present invention may contain metal oxide fine particles (a) and may further contain metal oxide fine particles (b).

金屬氧化物微粒(b)宜使用疏水性較同時所含有之金屬氧化物微粒(a)為低,表面電荷量高於金屬氧化物微粒(a)者之粒子。如此之金屬氧化物微粒係於膜之下部形成均一的層。藉此,亦可對透明被膜進一步賦予另外之特性。The metal oxide fine particles (b) are preferably those having a lower hydrophobicity than the metal oxide fine particles (a) contained therein and having a higher surface charge than the metal oxide fine particles (a). Such metal oxide particles form a uniform layer under the film. Thereby, it is also possible to further impart another characteristic to the transparent film.

金屬氧化物微粒(b)之表面電荷量(QB )為25至100μ eq/g,更宜在30至100μ eq/g的範圍。The surface charge amount (Q B ) of the metal oxide fine particles (b) is 25 to 100 μ eq/g, more preferably in the range of 30 to 100 μ eq/g.

若金屬氧化物微粒(b)之表面電荷量(QB )低,則因表面電荷量與金屬氧化物微粒(a)接近,因而不偏存於膜之下部,而與金屬氧化物微粒(a)混合而有位於膜之上部的傾向,金屬氧化物微粒(a)之特性所產生之效果,例如低折射率的特性所產生之抗反射性能會有不足的情形。若金屬氧 化物微粒(b)之表面電荷量(QB )過大,或許因疏水性低而接近親水性,而於塗料中會有金屬氧化物微粒(b)凝集的現象,而有於膜之下部不形成均一的層之情形。If the surface charge amount (Q B ) of the metal oxide fine particles (b) is low, since the surface charge amount is close to the metal oxide fine particles (a), it does not deviate from the lower portion of the film, and the metal oxide fine particles (a) The tendency to be located above the film is mixed, and the effect of the characteristics of the metal oxide fine particles (a), for example, the low refractive index property may be insufficient. If the surface charge amount (Q B ) of the metal oxide fine particles (b) is too large, it may be close to hydrophilic due to low hydrophobicity, and there may be agglomeration of metal oxide fine particles (b) in the coating, and there is a phenomenon in the film. The lower part does not form a uniform layer.

金屬氧化物微粒(a)之表面電荷量(QA )與金屬氧化物微粒(b)之表面電荷量(QB )之差(QB )-(QA )為20至95μ eq/g,更宜在25至85μ eq/g的範圍。The difference (Q B )-(Q A ) between the surface charge amount (Q A ) of the metal oxide fine particles (a) and the surface charge amount (Q B ) of the metal oxide fine particles (b) is 20 to 95 μ eq/g. More preferably in the range of 25 to 85 μ eq/g.

若(QB )-(QA )較小,則金屬氧化物微粒(a)與金屬氧化物微粒(b)之表面電荷量的差為小,此等微粒之分離變得不足,有時無法得到本發明之2種以上的功能之膜。若(QB )-(QA )較大,則金屬氧化物微粒(a)會凝集,同時金屬氧化物微粒(b)亦會凝集,而所得到之膜會白化或與基材之密着性或強度會有不足的情形。When (Q B )-(Q A ) is small, the difference in surface charge amount between the metal oxide fine particles (a) and the metal oxide fine particles (b) is small, and the separation of these fine particles becomes insufficient, and sometimes it is impossible. A film having two or more functions of the present invention is obtained. If (Q B )-(Q A ) is large, the metal oxide fine particles (a) will aggregate, and the metal oxide fine particles (b) will also aggregate, and the obtained film will be whitened or adhered to the substrate. Or there may be insufficient strength.

金屬氧化物微粒(b)與前述金屬氧化物微粒(a)相同,係金屬氧化物微粒經表面處理。一般,作為金屬氧化物微粒係使與用於前述之金屬氧化物微粒(a)之金屬氧化物微粒相異的金屬氧化物微粒,依照目的而選擇使用。具體上,可舉例如,以前述金屬氧化物微粒(a)所例示者。又,表面處理係以表面電荷量成為特定之差之方式(亦即,金屬氧化物微粒的表面電荷量變高)進行選擇。例如,可選擇親水性較使用於金屬氧化物微粒(a)者還高者,或減少處理量等之處理法。The metal oxide fine particles (b) are the same as the metal oxide fine particles (a) described above, and the metal oxide fine particles are surface-treated. In general, as the metal oxide fine particles, metal oxide fine particles different from the metal oxide fine particles used for the metal oxide fine particles (a) described above are used depending on the purpose. Specifically, for example, the metal oxide fine particles (a) are exemplified. Further, the surface treatment is selected such that the amount of surface charge becomes a specific difference (that is, the surface charge amount of the metal oxide fine particles becomes high). For example, a treatment method in which the hydrophilicity is higher than that of the metal oxide fine particles (a) or the amount of treatment is reduced can be selected.

如此之金屬氧化物微粒(b)的平均粒徑為5至500nm,更宜在10至100nm的範圍。平均粒徑小者係本身很難得到,而過大,會有塗料之安定性不足的情形。又,所得到 之膜的透明性會降低,進一步膜會有白化的情形。The metal oxide fine particles (b) have an average particle diameter of from 5 to 500 nm, more preferably from 10 to 100 nm. A person having a small average particle size is difficult to obtain by itself, and if it is too large, there is a case where the stability of the paint is insufficient. Again, got The transparency of the film is lowered, and the film is further whitened.

作為金屬氧化物微粒(b)之透明被膜形成用塗料中的固形分之濃度(CPB )為0.1至20重量%,更宜在0.2至15重量%之範圍。若金屬氧化物微粒(b)之濃度(CPB )較低,即使金屬氧化物微粒(b)偏存於膜的下部,由於粒子之量較少,故添加金屬氧化物微粒(b)之效果(高折射率或導電性等,進而抗反射性能提昇效果、抗靜電性能等)會有變得不足的情形。若金屬氧化物微粒(b)之濃度(CPA )太多,所得到膜中的粒子之比率太多,而與金屬氧化物微粒(a)混合,或變成膜中金屬氧化物微粒(b)涵蓋全域而分散之膜,而有無法得到具有本發明之2種以上之功能的膜。The solid content (C PB ) in the coating material for forming a transparent film of the metal oxide fine particles (b) is from 0.1 to 20% by weight, more preferably from 0.2 to 15% by weight. If the concentration (C PB ) of the metal oxide fine particles (b) is low, even if the metal oxide fine particles (b) are deposited in the lower portion of the film, the effect of adding the metal oxide fine particles (b) is small because the amount of the particles is small. (High refractive index, electrical conductivity, etc., and antireflection performance improvement effect, antistatic performance, etc.) may become insufficient. If the concentration (C PA ) of the metal oxide fine particles (b) is too large, the ratio of the particles in the obtained film is too large, and is mixed with the metal oxide fine particles (a), or becomes a metal oxide fine particle in the film (b) A film which is dispersed throughout the whole is covered, and a film having two or more functions of the present invention cannot be obtained.

基質形成成分Matrix forming component

在本發明中,特別是基質形成成分係可使用如下之基質形成成分,其係含有下述式(2)所示之有機矽化合物或此等之水解物、水解聚縮合物、或具有疏水性官能基之多官能(甲基)丙烯酸酯樹脂所構成之疏水性基質形成成分。In the present invention, in particular, the matrix-forming component may be a matrix-forming component containing an organic hydrazine compound represented by the following formula (2) or a hydrolyzate thereof, a hydrolyzed polycondensate, or a hydrophobic property. A hydrophobic matrix forming component composed of a functional group polyfunctional (meth) acrylate resin.

疏水性之聚矽氧系(溶膠凝膠系)基質形成成分係可使用下述式(2)所示之有機矽化合物或此等之水解物、水解聚縮合物。As the hydrophobic polyoxo-based (sol-gel-based) matrix-forming component, an organic hydrazine compound represented by the following formula (2), a hydrolyzate thereof, or a hydrolyzed polycondensate can be used.

Rn’ -SiX4-n’ (2)(式中,R為碳數1至10的非取代或取代烴基,可互為相同或相異。X:碳數1至4的烷氧基、矽烷醇基、鹵素、氫,n’:1至3之整數)R n' -SiX 4-n' (2) (wherein R is an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms which may be the same or different from each other. X: an alkoxy group having 1 to 4 carbon atoms, Sulfhydryl, halogen, hydrogen, n': an integer from 1 to 3)

具體上,前述式(1)所示之化合物中,可舉例如除了n 為0者。此等之中亦可適宜使用3,3,3-三氟丙基三甲氧基矽烷、甲基-3,3,3-三氟丙基二甲氧基矽烷及此等之水解物、水解聚縮合物。Specifically, among the compounds represented by the above formula (1), for example, n It is 0. Among these, 3,3,3-trifluoropropyltrimethoxydecane, methyl-3,3,3-trifluoropropyldimethoxydecane, and the like, hydrolyzed, and hydrolyzed Condensate.

疏水性之有機樹脂系基質形成成分,可舉例如具有乙烯基、胺基甲酸酯基、環氧基、(甲基)丙烯醯基、CF2 基等之疏水性官能基的多官能(甲基)丙烯酸酯樹脂,具體上可列舉如:季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、季戊四醇四丙烯酸酯、二-三羥甲基丙烷四(甲基)丙烯酸酯、二季戊四醇六丙烯酸酯、甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸丁酯、甲基丙烯酸異丁酯、甲基丙烯酸2-乙基己酯、甲基丙烯酸異癸酯、丙烯酸正月桂基酯、丙烯酸正硬脂基酯、1,6-己二醇二甲基丙烯酸酯、全氟辛基乙基甲基丙烯酸酯、甲基丙烯酸三氟乙基酯、胺基甲酸酯丙烯酸酯等及該等之混合物。The hydrophobic organic resin-based matrix-forming component may, for example, be a polyfunctional group having a hydrophobic functional group such as a vinyl group, a urethane group, an epoxy group, a (meth) acryl fluorenyl group or a CF 2 group. The acrylate resin may specifically be, for example, pentaerythritol triacrylate, pentaerythritol tetraacrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol tetraacrylate, di-trimethylolpropane tetra(a) Acrylate, dipentaerythritol hexaacrylate, methyl methacrylate, ethyl methacrylate, butyl methacrylate, isobutyl methacrylate, 2-ethylhexyl methacrylate, methacrylic acid Oxime ester, n-lauryl acrylate, n-stearyl acrylate, 1,6-hexanediol dimethacrylate, perfluorooctylethyl methacrylate, trifluoroethyl methacrylate, amine A urethane acrylate or the like and a mixture thereof.

此等之樹脂可為乳液樹脂、水溶性樹脂、親水性樹脂。進一步,熱硬化性樹脂之情形,可為紫外線硬化型者,亦可為電子束硬化型者,熱硬化性樹脂之情形,亦可含有硬化觸媒。These resins may be emulsion resins, water-soluble resins, and hydrophilic resins. Further, in the case of a thermosetting resin, it may be an ultraviolet curing type, an electron beam curing type, or a thermosetting resin, and may also contain a curing catalyst.

本發明所使用之基質形成成分宜含有疏水性基質形成成分以及親水性基質形成成分。The matrix-forming component used in the present invention preferably contains a hydrophobic matrix-forming component and a hydrophilic matrix-forming component.

親水性基質形成成分可舉例如由有機矽化合物或此等之水解物、水解聚縮合物、或具有親水性官能基之多官能(甲基)丙烯酸酯樹脂所構成之親水性基質形成成分。The hydrophilic matrix-forming component may, for example, be a hydrophilic matrix-forming component composed of an organic hydrazine compound, a hydrolyzate thereof, a hydrolyzed polycondensate, or a polyfunctional (meth) acrylate resin having a hydrophilic functional group.

SiX4 (3)(式中,X:碳數1至4的烷氧基、矽烷醇基、鹵素、氫)SiX 4 (3) (wherein X: alkoxy group having 1 to 4 carbon atoms, stanol group, halogen, hydrogen)

式(3)所示之有機矽化合物在具體上可適宜使用四甲氧基矽烷、四乙氧基矽烷、四丙氧基矽烷、四丁氧基矽烷、甲基三甲氧基矽烷及此等之水解物、水解聚縮合物等。Specific examples of the organic phosphonium compound represented by the formula (3) include tetramethoxydecane, tetraethoxydecane, tetrapropoxydecane, tetrabutoxydecane, methyltrimethoxydecane, and the like. Hydrolyzate, hydrolyzed polycondensate, and the like.

又,親水性之有機樹脂系基質形成成分係可舉例如具有羥基(OH基)、胺基、羧基、磺基等之親水性官能基的多官能(甲基)丙烯酸酯樹脂,具體上可舉例如具有羥基(OH基)、胺基、羧基、磺基等之親水性官能基的季戊四醇三丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、季戊四醇四丙烯酸酯、二-三羥甲基丙烷四(甲基)丙烯酸酯、二季戊四醇六丙烯酸酯等之外,尚有二乙基胺基甲基甲基丙烯酸酯、二甲基胺基甲基甲基丙烯酸酯、2-羥基-3-丙烯醯氧丙基丙烯酸酯、甲氧基三乙二醇二甲基丙烯酸酯、丁氧基二乙二醇甲基丙烯酸酯及此等之混合物。Further, the hydrophilic organic resin-based matrix-forming component may, for example, be a polyfunctional (meth)acrylate resin having a hydrophilic functional group such as a hydroxyl group (OH group), an amine group, a carboxyl group or a sulfo group, and specifically, for example, For example, pentaerythritol triacrylate having a hydrophilic functional group such as a hydroxyl group (OH group), an amine group, a carboxyl group or a sulfo group, trimethylolpropane tri(meth)acrylate, pentaerythritol tetraacrylate, or di-trihydroxyl In addition to propane tetra(meth)acrylate, dipentaerythritol hexaacrylate, etc., there are still diethylaminomethyl methacrylate, dimethylaminomethyl methacrylate, 2-hydroxy-3 - propylene oxypropyl acrylate, methoxy triethylene glycol dimethacrylate, butoxy diethylene glycol methacrylate and mixtures thereof.

若使親水性基質形成成分與疏水性基質形成成分混合而使用,金屬氧化物微粒(a)與金屬氧化物微粒(b)易分離,而容易獲得分為2層之膜。When the hydrophilic matrix-forming component is mixed with the hydrophobic matrix-forming component, the metal oxide fine particles (a) and the metal oxide fine particles (b) are easily separated, and a film having two layers can be easily obtained.

作為親水性基質形成成分之固形分的濃度(CMA )與作為疏水性基質形成成分之固形分的濃度(CMB )之濃度比(CMA )/(CMB )宜為0.01至1的範圍,更宜在0.05至0.5的範圍。Concentration (C MA) formed in the solid component of the points as the hydrophilic matrix and the concentration (C MB) of forming the solid component of the points as the hydrophobic matrix concentration ratio (C MA) / (C MB ) appropriate for the range of 0.01 to 1 More preferably in the range of 0.05 to 0.5.

若濃度比(CMA )/(CMB )為小,親水性基質形成成分少,實質上變成僅接近於疏水性基質形成成分,使金屬氧 化物微粒(a)(上部)與金屬氧化物微粒(b)(下部)之分離效果變得不足。若前述濃度比(CMA )/(CMB )超過1時,親水性基質形成成分多,有時表面電荷量高之金屬氧化物微粒(b)不會偏存於下層。If the concentration ratio (C MA ) / (C MB ) is small, the hydrophilic matrix forming component is small, and substantially becomes close to the hydrophobic matrix forming component, so that the metal oxide fine particles (a) (upper portion) and the metal oxide fine particles The separation effect of (b) (lower part) becomes insufficient. When the concentration ratio (C MA )/(C MB ) exceeds 1, the hydrophilic matrix forming component is large, and the metal oxide fine particles (b) having a high surface charge amount may not be excessively deposited in the lower layer.

極性溶劑Polar solvent

使用於本發明之極性溶劑,係極性溶劑可適宜使用使前述多官能(甲基)丙烯酸酯樹脂溶解同時容易揮發之溶劑。As the polar solvent to be used in the present invention, a solvent which dissolves the above-mentioned polyfunctional (meth) acrylate resin while being easily volatilized can be suitably used.

具體上可舉例如水;甲醇、乙醇、丙醇、2-丙醇、丁醇、二丙酮醇、糠基醇、四氫糠基醇、乙二醇、己二醇、異丙醇等之醇類;醋酸甲酯、醋酸乙酯、醋酸丁酯等之酯類;二乙基醚、乙二醇單甲基醚、乙二醇單乙基醚、乙二醇單丁基醚、二乙二醇單甲基醚、二乙二醇單乙基醚、丙二醇單甲基醚等之醚類;丙酮、甲乙酮、甲基異丁基酮、乙醯基丙酮、乙醯基醋酸酯等之酮類等。此等係可單獨使用,亦可併用2種以上。又亦可使用甲基溶纖劑、乙基溶纖劑、丁基溶纖劑、甲苯、環己酮、異佛爾酮等。Specific examples thereof include water; alcohols such as methanol, ethanol, propanol, 2-propanol, butanol, diacetone alcohol, mercapto alcohol, tetrahydrofurfuryl alcohol, ethylene glycol, hexanediol, and isopropanol. ; esters of methyl acetate, ethyl acetate, butyl acetate, etc.; diethyl ether, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol An ether such as monomethyl ether, diethylene glycol monoethyl ether or propylene glycol monomethyl ether; a ketone such as acetone, methyl ethyl ketone, methyl isobutyl ketone, ethyl acetonyl acetone or ethyl decyl acetate; . These may be used singly or in combination of two or more. Methyl cellosolve, ethyl cellosolve, butyl cellosolve, toluene, cyclohexanone, isophorone or the like can also be used.

若使上述之金屬氧化物微粒(a)、依需要而使用之金屬氧化物微粒(b),基質形成成分及極性溶劑適宜混合成所希望的量比,即可調製本發明之透明被膜形成用塗料。When the metal oxide fine particles (a) and the metal oxide fine particles (b) used as needed, the matrix forming component and the polar solvent are appropriately mixed in a desired amount ratio, the transparent film of the present invention can be prepared. coating.

使如此之透明被膜形成用塗料以浸漬法、噴塗法、旋塗法,輥塗法,桿塗法,凹版印刷法,微凹版印刷法等公知之方法塗佈於基材上,乾燥,藉紫外線照射、加熱處理等常用方法使之硬化,可形成透明被膜。The coating material for forming a transparent film is applied to a substrate by a known method such as a dipping method, a spray coating method, a spin coating method, a roll coating method, a bar coating method, a gravure printing method, or a micro gravure printing method, and is dried. It is hardened by a usual method such as irradiation or heat treatment to form a transparent film.

基質形成成分為有機矽化合物時,亦可含有酸或鹼作為水解觸媒。又,基質形成成分含有多官能(甲基)丙烯酸酯樹脂時,亦可含有聚合起始劑。聚合起始劑係可採用公知者,無特別限制,具體上可舉例如與在前述表面處理所使用者相同者。When the matrix-forming component is an organic ruthenium compound, an acid or a base may be contained as a hydrolysis catalyst. Further, when the matrix-forming component contains a polyfunctional (meth) acrylate resin, a polymerization initiator may be contained. The polymerization initiator may be a known one, and is not particularly limited, and specifically, for example, the same as the user of the surface treatment described above.

附有透明被膜之基材Substrate with transparent film

本發明之附有透明被膜之基材係於基材上可形成透明被膜之附有透明被膜之基材,透明被膜為由表面電荷量(QA )在5至80μ eq/g範圍中的疏水性金屬氧化物微粒(a)與基質成分所構成;金屬氧化物微粒(a)偏存於透明被膜上部形成之層,透明被膜中之金屬氧化物微粒(a)的含量(WPA )在0.2至90重量%的範圍;基質成分之含量(WM )在10至99.8重量%的範圍。又,相當於透明被膜中之各成分的量比、塗佈液中之其量比。With the present invention based on the transparent film substrate may be formed of a transparent film of the substrate with a transparent film on a substrate, a transparent film by the surface charge amount (Q A) μ eq 5 to 80 / g in the range The hydrophobic metal oxide fine particles (a) and the matrix component are formed; the metal oxide fine particles (a) are deposited on the upper layer of the transparent film, and the content (W PA ) of the metal oxide fine particles (a) in the transparent film is The range of 0.2 to 90% by weight; the content of the matrix component (W M ) is in the range of 10 to 99.8% by weight. Further, it corresponds to the amount ratio of each component in the transparent film and the amount ratio in the coating liquid.

基材Substrate

使用於本發明之基材係可使用以往公知者,而無特別限定,可舉例如玻璃、聚碳酸酯、丙烯酸系樹脂、聚對酞酸乙二酯(PET)、三乙醯基纖維素(TAC)、環聚烯烴、降冰片烯等之塑膠片、塑膠膜等、塑膠面板等。其中可適宜使用樹脂系基材。又。於如此之基材上亦可使用形成有其他被膜之附被膜基材。The substrate to be used in the present invention may be any conventionally known one, and is not particularly limited, and examples thereof include glass, polycarbonate, acrylic resin, polyethylene terephthalate (PET), and triethylenesulfonyl cellulose ( TAC), plastic sheets such as cycloolefin and norbornene, plastic films, etc., plastic panels, etc. Among them, a resin-based substrate can be suitably used. also. An adhesive film substrate on which another film is formed may also be used on such a substrate.

金屬氧化物微粒(a)Metal oxide particles (a)

金屬氧化物微粒(A)係可使用與前述之金屬氧化物微粒(A)同樣者。透明被膜中之金屬氧化物微粒(a)的含量 (WPA )宜在0.2至90重量%的範圍,更宜在0.5至80重量%的範圍。The metal oxide fine particles (A) can be used in the same manner as the metal oxide fine particles (A) described above. The content (W PA ) of the metal oxide fine particles (a) in the transparent film is preferably in the range of 0.2 to 90% by weight, more preferably in the range of 0.5 to 80% by weight.

金屬氧化物微粒(a)之含量(WPA )少時,即使偏存於膜之上部,因粒子之量少,故有時依據低折射率、高折射率、導電性等粒子所具有的特性而無法充分顯現抗反射性能、抗靜電性能等功能。又,即使金屬氧化物微粒(a)之含量(WPA )太多,實質上金屬氧化物微粒(a)遍存於全區域,而無法成為具有本發明之2種以上功能的透明被膜,又,有時與基材之密著性變得不足。When the content (W PA ) of the metal oxide fine particles (a) is small, even if it is excessively deposited on the upper portion of the film, the amount of particles is small, and the particles may have characteristics such as low refractive index, high refractive index, and conductivity. However, functions such as anti-reflection performance and antistatic performance cannot be fully exhibited. In addition, even if the content (W PA ) of the metal oxide fine particles (a) is too large, the metal oxide fine particles (a) are substantially present in the entire region, and cannot be a transparent film having two or more functions of the present invention. Sometimes, the adhesion to the substrate becomes insufficient.

在透明被膜中,疏水性金屬氧化物微粒(a)係偏存於透明被膜中形成於上部之層。使如此之狀態模式性表示於第1圖中。In the transparent film, the hydrophobic metal oxide fine particles (a) are deposited on the upper layer of the transparent film. Such a state is schematically shown in Fig. 1.

金屬氧化物 微粒(b) Metal oxide particles (b)

於本發明之附有透明被膜之基材的透明被膜可更含有金屬氧化物微粒(b)。金屬氧化物微粒(b)係偏存於被膜中形成之層,或分散於由前述金屬氧化物微粒(a)所構成之層與基材表面之問。使如此之狀態模式性表示於第2、3、4圖中。第2圖係偏存於透明被膜之下層的例。第3圖係偏存於存在金屬氧化物微粒(a)層之正下方的層之例,第4圖係不偏存於金屬氧化物微粒(a)層的下方而為分散者。The transparent film of the substrate to which the transparent film of the present invention is attached may further contain metal oxide fine particles (b). The metal oxide fine particles (b) are dispersed in a layer formed in the film or dispersed in the layer composed of the metal oxide fine particles (a) and the surface of the substrate. Such a state is schematically represented in the second, third, and fourth figures. Fig. 2 is an example in which the lower layer of the transparent film is deposited. Fig. 3 is an example in which a layer directly under the layer of the metal oxide fine particles (a) is present, and Fig. 4 is a dispersion without being biased under the layer of the metal oxide fine particles (a).

金屬氧化物微粒(b)可使用與前述之金屬氧化物微粒(b)同樣者。The metal oxide fine particles (b) can be used in the same manner as the metal oxide fine particles (b) described above.

透明被膜中之金屬氧化物微粒(b)的含量(WPB )宜在0.1至40重量%的範圍,更宜在0.2至30重量%的範圍。 金屬氧化物微粒(b)之含量(WPB )少時,即使偏存於膜之下層,因粒子之量少,故有時無法充分顯現粒子具有的特性(導電性、高折射率、低折射率、與基材之密著性提昇等)。又,若金屬氧化物微粒(b)之含量(WPB )太多,成為與排列於上部之金屬氧化物微粒(a)混合之狀態,有時無法得到具有本發明之2種以上的功能的透明被膜。The content (W PB ) of the metal oxide fine particles (b) in the transparent film is preferably in the range of 0.1 to 40% by weight, more preferably in the range of 0.2 to 30% by weight. When the content (W PB ) of the metal oxide fine particles (b) is small, even if it is present in the lower layer of the film, the amount of particles is small, and thus the characteristics of the particles (electric conductivity, high refractive index, low refractive index) may not be sufficiently exhibited. Rate, adhesion to the substrate, etc.). In addition, when the content (W PB ) of the metal oxide fine particles (b) is too large, it is mixed with the metal oxide fine particles (a) arranged in the upper portion, and the two or more functions of the present invention may not be obtained. Transparent film.

基質成分Matrix component

基質成分係可使用聚矽氧系(溶膠凝膠系)基質成分、有機樹脂系基質成分等。As the matrix component, a polyoxynitride-based (sol-gel) matrix component, an organic resin-based matrix component, or the like can be used.

聚矽氧系基質成分可適宜使用與前述式(2)同樣的有機矽化合物的水解聚縮合物。此等之中亦可適宜為如3,3,3-三氟丙基三甲氧基矽烷、甲基-3,3,3-三氟丙基二甲氧基矽烷之水解聚縮合物。As the polyoxymethylene base component, a hydrolyzed polycondensate of the same organic hydrazine compound as the above formula (2) can be suitably used. Among these, a hydrolyzed polycondensate such as 3,3,3-trifluoropropyltrimethoxydecane or methyl-3,3,3-trifluoropropyldimethoxydecane may also be suitably used.

又,有機樹脂系基質成分,可舉例如公知之熱硬化樹脂、熱塑性樹脂、電子束硬化樹脂等作為塗料用樹脂。In addition, examples of the organic resin-based matrix component include a known thermosetting resin, a thermoplastic resin, an electron beam-curing resin, and the like as a coating resin.

具體上,宜為具有疏水性官能基之多官能(甲基)丙烯酸酯樹脂。疏水性之有機樹脂系基質成分,可舉例如具有乙烯基、胺基甲酸酯、環氧基、(甲基)丙烯醯基、CF2 基等之疏水性官能基的多官能(甲基)丙烯酸酯樹脂,具體上,可舉例如與前述者相同者。Specifically, it is preferably a polyfunctional (meth) acrylate resin having a hydrophobic functional group. The hydrophobic organic resin-based matrix component may, for example, be a polyfunctional (meth) group having a hydrophobic functional group such as a vinyl group, a urethane group, an epoxy group, a (meth) acryl fluorenyl group or a CF 2 group. Specific examples of the acrylate resin include the same as those described above.

又作為如此之樹脂,可舉例如自以往所使用之聚酯樹脂、聚碳酸酯樹脂、聚醯胺樹脂、聚苯氧樹脂、熱塑性丙烯酸樹脂、氯化乙烯樹脂、氟樹脂、醋酸乙烯酯樹脂、聚矽氧橡膠等之熱塑性樹脂、胺基甲酸酯樹脂、三聚氰胺樹 脂、矽樹脂、丁縮醛樹脂、反應性聚矽氧樹脂、酚樹脂、環氧樹脂、不飽和聚酯樹脂、熱硬化性丙烯酸樹脂、紫外線硬化型丙烯酸樹脂等之熱硬化性樹脂、紫外線硬化型丙烯酸樹脂等。進一步,亦可為此等樹脂之2種以上之共聚物或改性體。Further, as such a resin, for example, a polyester resin, a polycarbonate resin, a polyamide resin, a polyphenylene oxide resin, a thermoplastic acrylic resin, a vinyl chloride resin, a fluororesin, a vinyl acetate resin, or the like, which have been conventionally used, may be mentioned. Thermoplastic resin such as polyoxymethylene rubber, urethane resin, melamine tree Thermosetting resin such as grease, enamel resin, butyral resin, reactive polyoxyl resin, phenol resin, epoxy resin, unsaturated polyester resin, thermosetting acrylic resin, ultraviolet curable acrylic resin, ultraviolet curing Acrylic resin, etc. Further, a copolymer or a modified body of two or more kinds of resins may be used.

此等之樹脂可為乳液樹脂、水溶性樹脂、親水性樹脂。進一步,熱硬化性樹脂之情形,可為紫外線硬化型者,亦可為電子束硬化型者,熱硬化性樹脂之情形,亦可含有硬化觸媒。These resins may be emulsion resins, water-soluble resins, and hydrophilic resins. Further, in the case of a thermosetting resin, it may be an ultraviolet curing type, an electron beam curing type, or a thermosetting resin, and may also contain a curing catalyst.

本發明所使用之基質成分宜含有親水性基質成分以及疏水性基質成分。尤其,就金屬氧化物微粒(b)之分散性,偏存性而言,宜為含有金屬氧化物微粒(b)。The matrix component used in the present invention preferably contains a hydrophilic matrix component and a hydrophobic matrix component. In particular, in terms of dispersibility and offset property of the metal oxide fine particles (b), it is preferable to contain the metal oxide fine particles (b).

使用聚矽氧系之基質成分時,就親和性而言,宜為與親水性之聚矽氧系(溶膠凝膠系)基質成分併用者,可使用以下述式(3)所示之有機矽化合物之水解聚縮合物。When the matrix component of the polyoxymethylene system is used, it is preferable to use it together with a hydrophilic polyoxo-based (sol-gel-based) matrix component in terms of affinity, and an organic hydrazine represented by the following formula (3) can be used. Hydrolyzed polycondensate of the compound.

Rn -SiX4 (3)(式中,R為碳數1至10的非取代或取代烴基,可互為相同或相異。X:碳數1至4的烷氧基、矽烷醇基、鹵素、氫,n:0之整數)R n -SiX 4 (3) (wherein R is an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms which may be the same or different from each other. X: an alkoxy group having 1 to 4 carbon atoms, a stanol group, Halogen, hydrogen, n: an integer of 0)

具體上可適宜使用四甲氧基矽烷、四乙氧基矽烷、四丙氧基矽烷、四丁氧基矽烷、甲基三甲氧基矽烷之水解聚縮合物等。Specifically, a hydrolyzed polycondensate of tetramethoxy decane, tetraethoxy decane, tetrapropoxy decane, tetrabutoxy decane or methyltrimethoxy decane can be suitably used.

又,親水性之有機樹脂系基質成分可舉例如具有羥基(OH基)、胺基、羧基、磺基等之親水性官能基的多官能(甲 基)丙烯酸酯樹脂,具體上可舉例如前述者。Further, the hydrophilic organic resin-based matrix component may, for example, be a polyfunctional group having a hydrophilic functional group such as a hydroxyl group (OH group), an amine group, a carboxyl group or a sulfo group (A) Specific examples of the acrylate resin include the above.

作為親水性基質成分之固形分的含量(WMA )與作為疏水性基質成分之固形分的含量(WMB )之含量的比(WMA )/(WMB )宜為0.01至1的範圍,更宜在0.05至0.5的範圍。The ratio (W MA ) / (W MB ) of the content of the solid component (W MA ) as the hydrophilic matrix component to the content of the solid component (W MB ) as the hydrophobic matrix component is preferably in the range of 0.01 to 1. More preferably in the range of 0.05 to 0.5.

若(WMA )/(WMB )為小,則親水性基質形成成分少,實質上變成僅接近於疏水性基質形成成分,使金屬氧化物微粒(a)(上部)與金屬氧化物微粒(b)(下部)之分離效果變得不足。即使(WMA )/(WMB )過大,親水性基質形成成分多,有時表面電荷量高之金屬氧化物微粒(b)不會偏存於下層。When (W MA )/(W MB ) is small, the hydrophilic matrix forming component is small, and substantially becomes close to only the hydrophobic matrix forming component, and the metal oxide fine particles (a) (upper portion) and the metal oxide fine particles ( b) The separation effect of the (lower part) becomes insufficient. Even if (W MA )/(W MB ) is too large, the hydrophilic matrix is formed in a large amount, and the metal oxide fine particles (b) having a high surface charge amount may not be deposited in the lower layer.

透明被膜中之親水性基質成分之含量(WMA )宜為10至99.8重量%,更宜為20至99.5重量%的範圍。若透明被膜中之基質成分的含量(WMA )少,膜中之粒子的比例過多,而實質上成為膜中金屬氧化物微粒平均分散於全區域之膜,有時無法得到具有本發明之2種以上功能的膜。The content (W MA ) of the hydrophilic matrix component in the transparent film is preferably from 10 to 99.8% by weight, more preferably from 20 to 99.5% by weight. When the content (W MA ) of the matrix component in the transparent film is small, the proportion of the particles in the film is too large, and substantially the film in which the metal oxide fine particles in the film are dispersed throughout the entire region is not obtained. A membrane of the above function.

即使透明被膜中之親水性基質成分含量(WMA )過多,因粒子之量少,有時粒子會因具有之特性(低折射率或導電性等)而產生抗反射性能、抗靜電性能等不足的情形。Even if the content of the hydrophilic matrix component (W MA ) in the transparent film is too large, the amount of particles may be small, and the particles may have anti-reflection properties and antistatic properties due to their properties (low refractive index, conductivity, etc.). The situation.

本發明之透明被膜的膜厚係依用途而異,但宜在30nm至12μ m左右,更宜在70nm至10μ m的範圍。以1層賦予2種以上的功能時,必須有此程度的厚度。The film thickness of the transparent film of the present invention varies depending on the application, but is preferably in the range of about 30 nm to 12 μm , more preferably in the range of 70 nm to 10 μm . When two or more functions are provided in one layer, it is necessary to have such a thickness.

又,透明被膜之膜厚不足30nm時,實質上很難形成分離成2層之透明被膜,膜厚超過12μ m,於透明被膜產生龜裂,或在塑膠等之基材有時會產生捲曲(彎曲或翹曲)。When the film thickness of the transparent film is less than 30 nm, it is substantially difficult to form a transparent film which is separated into two layers, and the film thickness exceeds 12 μm , and cracks occur in the transparent film, or may be curled on a substrate such as plastic. (bending or warping).

透明被膜之較佳態樣係如下述。The preferred aspect of the transparent film is as follows.

(1)上部為低折射率的抗反射膜或防眩性膜,而下部為硬塗膜、高折射率膜、導電性膜等之時,抗反射膜部之膜厚宜在40nm至10μ m,更宜在60nm至8μ m之範圍。(1) When the upper portion is a low refractive index antireflection film or an antiglare film, and the lower portion is a hard coating film, a high refractive index film, a conductive film, or the like, the film thickness of the antireflection film portion is preferably 40 nm to 10 μ. m is more preferably in the range of 60 nm to 8 μm .

抗反射膜之膜較薄時,成為脫離菲涅爾(Fresnel’s)原理之光學膜厚,而有時無法得到充分的抗反射性能,即使抗反射性能之膜過厚,因膜之收縮,依基材之種類係例如薄PET膜等之情形有時會產生捲曲。When the film of the anti-reflection film is thin, it becomes an optical film thickness that deviates from the Fresnel's principle, and sometimes sufficient anti-reflection performance cannot be obtained, and even if the anti-reflection film is too thick, the film shrinks, and the base is weak. The type of material is, for example, a thin PET film or the like, which sometimes causes curling.

此時,下部之膜的折射率大概宜在1.48至2.20的範圍,上部之抗反射膜部的折射率大概宜在1.45以下之範圍。At this time, the refractive index of the lower film is preferably in the range of 1.48 to 2.20, and the refractive index of the upper anti-reflecting film portion is preferably in the range of 1.45 or less.

此時,透明被膜係具有低反射性、防眩性,若下層為高折射率膜,則具有高的抗反射性能,又,下層含有五氧化銻微粒作為疏水性金屬氧化物微粒(b)時,則具有高的硬塗性能以及抗靜電性能,含有ATO或ITO粒子時,係具有抗靜電性能以及熱線遮蔽性能,含有氧化鈦時,則具有紫外線吸收性能。In this case, the transparent film has low reflectivity and anti-glare property, and if the lower layer is a high refractive index film, it has high anti-reflection performance, and when the lower layer contains ruthenium pentoxide particles as the hydrophobic metal oxide fine particles (b) It has high hard coating properties and antistatic properties. It contains antistatic properties and heat ray shielding properties when it contains ATO or ITO particles. It contains UV absorbing properties when it contains titanium oxide.

(2)使用來作為導電性膜時,導電膜部之膜厚在30nm至10μ m,更宜在60nm至8μ m之範圍。導電性膜部之膜厚不足30nm時,很難形成功能相異之已分離的其他膜,又,因不形成充分的導電通路,有時會有導電性不足的情形。(2) When used as a conductive film, the film thickness of the conductive film portion is in the range of 30 nm to 10 μm , more preferably in the range of 60 nm to 8 μm . When the film thickness of the conductive film portion is less than 30 nm, it is difficult to form another film which has been separated from each other in function, and there is a case where the conductivity is insufficient because a sufficient conductive path is not formed.

若導電性膜之膜厚超過10μ m時,因膜之收縮變大,故如為基材較薄之塑膠膜等時,會有產生捲曲的情形。When the film thickness of the conductive film exceeds 10 μm , the shrinkage of the film becomes large, and if it is a plastic film having a thin substrate, curling may occur.

具有如此之導電膜部的透明被膜之表面電阻值宜在 103 至1013 Ω/□的範圍。The surface resistivity of the transparent film having such a conductive film portion is preferably in the range of 10 3 to 10 13 Ω/□.

上部為導電性膜時,除了前述(1)之案例,下部即使不存在粒子時,亦具有硬塗性。When the upper portion is a conductive film, in addition to the case of the above (1), the lower portion has a hard coat property even when no particles are present.

又,下部為含有氧化鈦粒子作為疏水性金屬氧化物微粒(B)時,則具有紫外線吸收性能,而含有低折射率微粒時,則具有低介電率特性。Further, when the lower portion contains titanium oxide particles as the hydrophobic metal oxide fine particles (B), it has ultraviolet absorbing properties, and when low refractive index fine particles are contained, it has low dielectric constant properties.

(3)使用來作為高折射率膜時,高折射率膜部之膜厚在40nm至10μ m,更宜在60nm至8μ m之範圍。(3) When used as a high refractive index film, the film thickness of the high refractive index film portion is from 40 nm to 10 μm , more preferably from 60 nm to 8 μm .

高折射率膜部之膜厚較薄時,很難形成功能相異之已分離的其他膜,又,依具有其它功能之粒子或基質之折射率有時無法形成具有所希望之折射率的層。若高折射率膜部之膜較厚,則因膜之收縮變大,基材為薄塑膠膜等時則會有產生捲曲的情形。When the film thickness of the high refractive index film portion is thin, it is difficult to form another film which has been separated from each other in function, and a layer having a desired refractive index may not be formed depending on the refractive index of particles or substrates having other functions. . When the film of the high refractive index film portion is thick, the shrinkage of the film becomes large, and when the substrate is a thin plastic film or the like, curling may occur.

此時,高折射率膜部之折射率大概宜在1.52至2.00的範圍,上部為高折射率膜時,即使下部並無粒子的存在,亦具有硬塗性。At this time, the refractive index of the high refractive index film portion is preferably in the range of 1.52 to 2.00, and when the upper portion is the high refractive index film, even if there is no particle in the lower portion, it has hard coatability.

又,下部為含有ATO、ITO作為疏水性金屬氧化物微粒(B)時,則具有導電性、抗靜電性能、紅外線遮蔽性性能;如含有五氧化銻、摻雜磷之氧化錫時,係具有抗靜電性能、硬塗性能;如含有低折射率之氧化矽粒子或中空氧化矽微粒等時,則具有高的硬塗性能、低介電率性能。Further, when the lower portion contains ATO or ITO as the hydrophobic metal oxide fine particles (B), it has conductivity, antistatic property, and infrared shielding property; and if it contains ruthenium pentoxide or phosphorus-doped tin oxide, it has Antistatic properties, hard coating properties; such as low refractive index cerium oxide particles or hollow cerium oxide particles, etc., have high hard coating properties, low dielectric properties.

本發明之附有透明被膜之基材係可於基材上藉由塗佈前述之透明被膜形成用塗料,乾燥,硬化而製造。塗佈方法係將上述塗料以浸漬法、噴塗法、旋塗法,輥塗法,桿 塗法,凹版印刷法,微凹版印刷法等公知之方法塗佈於基材上,乾燥,熱硬化性樹脂之時,係硬化後,進行加熱處理,紫外線硬化樹脂之時,可藉紫外線400mJ/cm2 左右進行照射使之硬化而形成。The substrate with a transparent film of the present invention can be produced by applying the above-mentioned coating material for forming a transparent film onto a substrate, drying and curing. The coating method is applied to a substrate by a known method such as a dipping method, a spray coating method, a spin coating method, a roll coating method, a bar coating method, a gravure printing method, or a micro gravure printing method, followed by drying, and thermosetting. In the case of the resin, it is heat-treated and then heat-treated. When the resin is cured by ultraviolet rays, it can be formed by irradiation with ultraviolet rays of about 400 mJ/cm 2 to cure it.

再者,於本發明之附有透明被膜之基材上可於基材與前述之透明被膜之間及/或於透明被膜上設有與前述透明被膜相異之其他被膜。其他之被膜可為以往公知之硬塗膜、高折射率膜、導電性膜、低折射率膜、防眩膜、紅外線遮蔽膜、紫外線遮蔽膜,亦可為具有本發明之硬塗功能的透明被膜、高折射率的透明被膜、具有導電性之透明被膜等。Further, in the substrate having the transparent film of the present invention, another film different from the transparent film may be provided between the substrate and the transparent film and/or on the transparent film. The other film may be a conventionally known hard coat film, high refractive index film, conductive film, low refractive index film, antiglare film, infrared shielding film, ultraviolet shielding film, or transparent having the hard coating function of the present invention. A film, a transparent film having a high refractive index, a transparent film having conductivity, and the like.

[實施例][Examples]

以下,依實施例說明本發明,但本發明係不限定於此等實施例者。Hereinafter, the present invention will be described by way of examples, but the present invention is not limited to the examples.

[實施例1][Example 1] 透明被膜形成用塗料(A-1)之調製Modification of coating film for transparent film formation (A-1)

使用二氧化矽系中空微粒分散溶膠(觸媒化成工業(股)製:斯里亞(音譯)1420、平均粒徑60nm、濃度20.5重量%、分散劑:異丙醇、粒子折射率1.30)作為低折射率成分。於此溶膠100g中混合全氟辛基乙基三乙氧基矽烷10g(Toray Dow Corning製AY43-158E 100%),添加超純水10g,在40℃下攪拌5小時,得到經表面處理之二氧化矽系中空微粒分散溶膠(固形分19.3重量%)。As the cerium oxide-based hollow fine particle dispersion sol (manufactured by Catalyst Chemical Co., Ltd.: Sria (transliteration) 1420, average particle diameter: 60 nm, concentration: 20.5 wt%, dispersant: isopropyl alcohol, particle refractive index: 1.30) Low refractive index component. 10 g of perfluorooctylethyltriethoxydecane (100% by Aray 43-158E manufactured by Toray Dow Corning) was mixed with 100 g of the sol, and 10 g of ultrapure water was added thereto, and the mixture was stirred at 40 ° C for 5 hours to obtain a surface-treated second. The cerium oxide-based hollow fine particle-dispersed sol (solid content: 19.3% by weight).

測定此經表面處理之二氧化矽系中空微粒分散溶膠的 表面電荷量後,為8.3μ eq/g。使此已表面處理之二氧化矽系中空微粒分散溶膠15.5g與六季戊四醇三(五丙烯酸酯)(日本化藥(股):KAYARD DPHA)30g與光起始劑(Ciba Specialty(股)製Irgacure184,以IPA溶解、固形分濃度10%)0.42g及異丙醇與甲基異丁基酮之1/1(重量比)混合溶劑54.08g充分混合而調製透明被膜形成用塗料(A-1)。After measuring the surface charge amount of this silicon dioxide-based hollow microparticle dispersion sol of the surface treated, and is 8.3 μ eq / g. 15.5 g of the surface-treated cerium oxide-based hollow fine particle-dispersing sol and 30 g of hexapentaerythritol tris(pentaacrylate) (Japan Chemical Co., Ltd.: KAYARD DPHA) and a photoinitiator (Irgacure 184 manufactured by Ciba Specialty Co., Ltd.) A coating film for forming a transparent film (A-1) was prepared by thoroughly mixing the mixture with an IPA solution and a solid content of 10% by weight of 0.42 g and a 1/1 (by weight) mixed solvent of isopropyl alcohol and methyl isobutyl ketone. .

附有透明被膜之基材(1)之調製Modulation of substrate (1) with transparent film

使透明被膜形成用塗佈液(A-1)以桿塗器塗佈於PET膜(厚100μ m、折射率1.65,基材穿透率88.0%、霧度1.0%、反射率5.1%),在70℃下乾燥1分鐘後,照射高壓水銀燈(80W/cm)1分鐘而硬化以調製附有透明被膜之基材(1)。此時之透明被膜的膜厚為5μ m。將透明被膜之一部分朝縱方向垂直地切斷,藉穿透型電子顯微鏡觀察截面後,於上部形成二氧化矽系中空微粒厚度為100nm之層,下部僅有基質而看不出粒子的存在。The coating liquid for forming a transparent film (A-1) was applied to a PET film by a bar coater (thickness: 100 μm , refractive index: 1.65, substrate transmittance: 88.0%, haze: 1.0%, reflectance: 5.1%) After drying at 70 ° C for 1 minute, it was irradiated with a high-pressure mercury lamp (80 W/cm) for 1 minute to be hardened to prepare a substrate (1) having a transparent film. At this time, the film thickness of the transparent film 5 μ m. One portion of the transparent film was cut perpendicularly in the longitudinal direction, and the cross section was observed by a transmission electron microscope. Then, a layer having a thickness of the ceria-based hollow fine particles of 100 nm was formed on the upper portion, and only the matrix was present in the lower portion, and the presence of particles was not observed.

測定所得到之附有透明被膜之基材(1)的表面電阻值、全光線穿透率、霧度、波長550nm之光線的反射率。將結果示於表1中。The surface resistivity, total light transmittance, haze, and reflectance of light having a wavelength of 550 nm of the obtained substrate (1) with a transparent film were measured. The results are shown in Table 1.

以表面電阻計(三菱油化(股)製:LORESTA)測定表面電阻,全光線穿透率及霧度係藉霧度計(日本電色(股)製:NDH2000)進行測定,反射率係藉分光光度計(日本分光公司製:Ubest-55)進行測定。The surface resistance was measured by a surface resistance meter (Mitsubishi Olefin Co., Ltd.: LORESTA), and the total light transmittance and haze were measured by a haze meter (Nippon Denshoku Co., Ltd.: NDH2000), and the reflectance was measured. A spectrophotometer (manufactured by JASCO Corporation: Ubest-55) was used for the measurement.

又,依以下之方法及評估基準評估防眩性、密著性、鉛筆硬度,將結果示於表1中。Further, the anti-glare property, the adhesion, and the pencil hardness were evaluated according to the following methods and evaluation criteria, and the results are shown in Table 1.

[防眩性][anti-glare]

以黑色均一地噴塗於基材之背面使附有硬塗功能之附抗反射膜基材(1)的防眩性,離30W之螢光燈2m,以目視確認螢光燈的映入,以如下之尺度評估防眩性。將結果示於表1。The anti-glare property of the anti-reflective film substrate (1) with a hard-coating function was uniformly applied to the back surface of the substrate by black, and the fluorescent lamp was exposed to a light of 2 m from a 30 W fluorescent lamp to visually confirm the reflection of the fluorescent lamp. Anti-glare properties were evaluated on the following scales. The results are shown in Table 1.

完全看不到螢光燈:◎Fluorescent light is not visible at all: ◎

稍看到螢光燈:○Slightly see the fluorescent light: ○

雖可看到螢光燈,但輪廓模糊:△Although you can see the fluorescent light, the outline is blurred: △

明顯看得到螢光燈:×Obviously see the fluorescent lamp: ×

[密著性][adhesiveness]

於附有硬塗功能之附抗反射膜基材(1)之表面藉刀刃以縱橫1mm的間隔割劃11條平行的割痕、作成100個格子,再貼粘賽璐玢膠帶。On the surface of the anti-reflection film substrate (1) with a hard coating function, 11 parallel cuts were cut by a blade at intervals of 1 mm in length and width, and 100 grids were formed, and then the celluloid tape was attached.

繼而,剝離賽璐玢膠帶時,被膜不剝離而殘存之格子的數目,分類成以下之4階段,俾評估密著性。將結果示於表1中。Then, when the cellophane tape was peeled off, the number of the cells remaining without being peeled off by the film was classified into the following four stages, and the adhesion was evaluated. The results are shown in Table 1.

殘存格子之數目100個:◎The number of remaining grids is 100: ◎

殘存眼目之數目90至99個:○The number of remaining eyes is 90 to 99: ○

殘存眼目之數目85至89個:△The number of remaining eyes is 85 to 89: △

殘存眼目之數目84個以下:×The number of remaining eyes is 84 or less: ×

[鉛筆硬度][pencil hardness]

依JIS-K-5400之標準而藉鉛筆硬度試驗器進行測定。The measurement was carried out by a pencil hardness tester in accordance with the standard of JIS-K-5400.

[實施例2][Embodiment 2] 透明被膜形成用塗料(A-2)之調製Modification of coating film for transparent film formation (A-2)

使用二氧化矽系中空微粒分散溶膠(觸媒化成工業(股)製:斯里亞(音譯)1420、平均粒徑60nm、濃度20.5重量%、分散劑:異丙醇、粒子折射率1.30)作為低折射率成分。於該溶膠100g中混合正矽酸乙酯7.11g(多摩化學製 乙基矽酸鹽28 SiO2 成分28.8%),添加超純水10g,在40℃下攪拌5小時,得到經表面處理之二氧化矽系中空微粒分散溶膠(固形分19.3重量%)。As the cerium oxide-based hollow fine particle dispersion sol (manufactured by Catalyst Chemical Co., Ltd.: Sria (transliteration) 1420, average particle diameter: 60 nm, concentration: 20.5 wt%, dispersant: isopropyl alcohol, particle refractive index: 1.30) Low refractive index component. To 100 g of the sol, 7.11 g of ethyl ortho-nonanoate (28.8% of ethyl phthalate 28 SiO 2 component) was added, and 10 g of ultrapure water was added thereto, and the mixture was stirred at 40 ° C for 5 hours to obtain a surface-treated second. The cerium oxide-based hollow fine particle-dispersed sol (solid content: 19.3% by weight).

測定經此表面處理之二氧化矽系中空微粒分散溶膠的表面電荷量後,為18.3μ eq/g。使此表面處理之二氧化矽系中空微粒分散溶膠15.5g、五季戊四醇三乙酸酯(共榮社化學(股):PE-3A)24g、二乙基胺基乙基甲基丙烯酸酯(共榮社化學(股):Light Ester DE)3g、光起始劑(Ciba Specialty(股)製Irgacure184,以IPA溶解、固形分濃度10%)0.42g及異丙醇與甲基異丁基酮之1/1(重量比)混合溶劑54.08g進行充分混合而調製透明被膜形成用塗料(A-2)。The surface charge amount of the surface-treated ceria-based hollow fine particle-dispersed sol was measured and found to be 18.3 μ eq/g. This surface-treated cerium oxide-based hollow fine particle-dispersed sol was 15.5 g, pentaerythritol triacetate (Kyoeisha Chemical Co., Ltd.: PE-3A), 24 g, and diethylaminoethyl methacrylate (total Rongshe Chemical Co., Ltd.: Light Ester DE) 3 g, photoinitiator (Irgacure 184 manufactured by Ciba Specialty Co., Ltd., dissolved in IPA, solid concentration 10%) 0.42 g and isopropanol and methyl isobutyl ketone The composite film for forming a transparent film (A-2) was prepared by thoroughly mixing the 1/1 (weight ratio) mixed solvent 54.08 g.

附有透明被膜之基材(2)之調製Modulation of substrate (2) with transparent film

使透明被膜形成用塗料(A-2)以桿塗器塗佈於PET膜(厚100μ m、折射率1.65,基材穿透率88.0%、霧度1.0%、反射率5.1%),在70℃下乾燥1分鐘後,照射高壓水銀燈(80W/cm)1分鐘而硬化以調製附有透明被膜之基材(2)。此時之膜厚為5μ m。將透明被膜之一部分朝縱方向垂直地切斷,藉穿透型電子顯微鏡觀察截面後,發現於上部形成二氧化矽系中空微粒厚度為100nm之層,而下部僅有基質而看不出粒子的存在。The coating film for forming a transparent film (A-2) was applied to a PET film by a bar coater (thickness: 100 μm , refractive index: 1.65, substrate transmittance: 88.0%, haze: 1.0%, reflectance: 5.1%). After drying at 70 ° C for 1 minute, it was irradiated with a high pressure mercury lamp (80 W/cm) for 1 minute to be hardened to prepare a substrate (2) with a transparent film. The film thickness at this time was 5 μm . One part of the transparent film was cut perpendicularly in the longitudinal direction, and the cross section was observed by a transmission electron microscope, and it was found that a layer of ceria-based hollow fine particles having a thickness of 100 nm was formed on the upper portion, and only a matrix was formed in the lower portion, and no particles were observed. presence.

測定所得到之附有透明被膜之基材(2)的表面電阻值、全光線穿透率、霧度、波長550nm之光線的反射率、防眩性、密著性、鉛筆硬度,將結果示於表1中。The surface resistance value, the total light transmittance, the haze, the reflectance of the light having a wavelength of 550 nm, the anti-glare property, the adhesion, and the pencil hardness of the obtained substrate (2) with the transparent film were measured, and the results were shown. In Table 1.

[實施例3][Example 3] 透明被膜形成用塗料(A-3)之調製Modification of coating film for transparent film formation (A-3)

使用二氧化矽系中空微粒分散溶膠(觸媒化成工業(股)製:斯里亞(音譯)1420-120、平均粒徑120nm、濃度20.5重量%、分散劑:異丙醇、粒子折射率1.20)作為低折射率成分。於該溶膠100g中混合正矽酸乙酯7.11g(多摩化學製乙基矽酸鹽28 SiO2 成分28.8%),添加超純水10g,在40℃下攪拌5小時,得到經表面處理之二氧化矽系中空微粒分散溶膠(固形分19.3%)。A cerium oxide-based hollow fine particle dispersion sol (manufactured by Catalyst Chemical Co., Ltd.): Sriah 1420-120, an average particle diameter of 120 nm, a concentration of 20.5 wt%, a dispersing agent: isopropyl alcohol, and a particle refractive index of 1.20 ) as a low refractive index component. To 100 g of the sol, 7.11 g of ethyl ortho-nonanoate (28.8% of ethyl phthalate 28 SiO 2 component) was added, and 10 g of ultrapure water was added thereto, and the mixture was stirred at 40 ° C for 5 hours to obtain a surface-treated second. The cerium oxide-based hollow fine particle-dispersed sol (solid content: 19.3%).

測定此經表面處理之二氧化矽系中空微粒分散溶膠的表面電荷量後,為15.3μ eq/g。使此經表面處理之二氧化矽系中空微粒分散溶膠15.5g、全氟乙基丙烯酸酯(共榮社化學(股):FA-108)24g、二乙基胺基乙基甲基丙烯酸酯(共榮社化學(股):Light Ester DE)3g、光起始劑(Ciba Specialty(股)製Irgacure184、以IPA溶解、固型分濃度10%)0.42g及異丙醇與甲基異丁基酮之1/1(重量比)混合溶劑57.08g進行充分混合而調製透明被膜形成用塗料(A-3)。The surface charge amount of this surface-treated ceria-based hollow fine particle-dispersed sol was measured and found to be 15.3 μ eq/g. 15.5 g of this surface-treated cerium oxide-based hollow fine particle-dispersed sol, perfluoroethyl acrylate (Kyoeisha Chemical Co., Ltd.: FA-108), 24 g, diethylaminoethyl methacrylate ( Gongrongshe Chemical Co., Ltd.: Light Ester DE) 3 g, photoinitiator (Irgacure 184 manufactured by Ciba Specialty Co., Ltd., dissolved in IPA, solid concentration: 10%) 0.42 g and isopropanol and methyl isobutyl 57.08 g of a 1/1 (by weight) mixed solvent of the ketone was sufficiently mixed to prepare a coating film (A-3) for forming a transparent film.

附有透明被膜之基材(3)之調製Modulation of substrate (3) with transparent film

使透明被膜形成用塗佈液(A-3)以桿塗器塗佈於PET膜(厚100μm、折射率1.65,基材穿透率88.0%、霧度1.0%、反射率5.1%),在70℃下乾燥1分鐘後,照射高壓水銀燈 (80W/cm)1分鐘而硬化以調製附有透明被膜之基材(3)。此時之膜厚為5μ m。將透明被膜之一部分朝縱方向垂直地切斷,藉穿透型電子顯微鏡觀察截面後,發現於上部形成二氧化矽系中空微粒厚度為120nm之層,而下部僅有基質而看不出粒子的存在。The coating liquid for forming a transparent film (A-3) was applied to a PET film by a bar coater (thickness: 100 μm, refractive index: 1.65, substrate transmittance: 88.0%, haze: 1.0%, reflectance: 5.1%). After drying at 70 ° C for 1 minute, it was irradiated with a high pressure mercury lamp (80 W/cm) for 1 minute to be hardened to prepare a substrate (3) with a transparent film. The film thickness at this time was 5 μm . One portion of the transparent film was cut perpendicularly in the longitudinal direction, and the cross section was observed by a transmission electron microscope. It was found that a layer of ceria-based hollow fine particles having a thickness of 120 nm was formed on the upper portion, and only a matrix was formed in the lower portion, and no particles were observed. presence.

測定所得到之附有透明被膜之基材(3)的表面電阻值、全光線穿透率、霧度、波長550nm之光線的反射率、防眩性、密著性、鉛筆硬度,將結果示於表1中。The surface resistance value, total light transmittance, haze, reflectance of light having a wavelength of 550 nm, anti-glare property, adhesion, and pencil hardness of the obtained substrate (3) with a transparent film were measured, and the results were shown. In Table 1.

[實施例4][Example 4] 透明被膜形成用塗料(A-4)之調製Modification of coating film for transparent film formation (A-4)

使用五氧化銻微粒分散溶膠(觸媒化成工業(股)製:ELCOM V-4560、平均粒徑20nm、濃度30.5重量%、分散劑:異丙醇、粒子折射率1.60)作為導電成分。於該溶膠100g中混合γ-甲基丙烯醯氧基丙基三甲氧基矽烷1.88g(信越Silicone股製KBM-503 SiO2 成分81.2%),添加超純水10g,在40℃下攪拌5小時,得到經表面處理之五氧化銻微粒分散溶膠(固形分28.6%)。As the conductive component, a ruthenium pentoxide fine particle dispersion sol (manufactured by Catalyst Chemical Co., Ltd.: ELCOM V-4560, an average particle diameter of 20 nm, a concentration of 30.5 wt%, a dispersing agent: isopropyl alcohol, and a particle refractive index of 1.60) was used. Into 100 g of the sol, 1.88 g of γ-methylpropenyloxypropyltrimethoxydecane (81.2% of KBM-503 SiO 2 component manufactured by Shin-Etsu Silicone Co., Ltd.) was added, and 10 g of ultrapure water was added thereto, and the mixture was stirred at 40 ° C for 5 hours. A surface treated pentoxide pentoxide fine particle sol (solid fraction 28.6%) was obtained.

測定此經表面處理之五氧化銻微粒分散溶膠的表面電荷量後,為45.3μ eq/g。使此經表面處理之五氧化銻微粒分散溶膠17.48g、二赤蘚糖醇三乙酸酯(共榮社化學(股):DPE-6A)22.5g、具有羥基之丙烯酸酯(共榮社化學(股):MMH-40丙二醇單甲基醚分散 固形分40%)6.25g、光起始劑(Ciba Specialty(股)製Irgacure184、以IPA溶解、固形分濃度10%)0.42g及異丙醇與甲基異丁基酮之1/1(重量 比)混合溶劑53.35g進行充分混合而調製透明被膜形成用塗料(A-4)。The surface charge amount of this surface-treated pentoxide pentoxide fine particle sol was measured and found to be 45.3 μ eq/g. The surface-treated cerium oxide microparticles dispersed sol 17.48 g, dierythritol triacetate (Kyoeisha Chemical Co., Ltd.: DPE-6A) 22.5 g, hydroxy-containing acrylate (Kyoeisha Chemical Co., Ltd.) (Unit): MMH-40 propylene glycol monomethyl ether dispersion solid fraction 40%) 6.25 g, photoinitiator (Irgacure 184 manufactured by Ciba Specialty Co., Ltd., dissolved in IPA, solid concentration 10%) 0.42 g and isopropanol 53.35 g of a mixed solvent of 1/1 (weight ratio) of methyl isobutyl ketone was sufficiently mixed to prepare a coating material (A-4) for forming a transparent film.

抗反射形成用塗佈液(A-4R)之調製Modulation of anti-reflection forming coating liquid (A-4R)

使用二氧化矽系中空微粒分散溶膠(觸媒化成工業(股)製:斯里亞(音譯)1420、平均粒徑60nm、濃度20.5重量%、分散劑:異丙醇、粒子折射率1.30)作為低折射率成分。使該溶膠以異丙醇稀釋成固形分濃度5重量%之分散液33g與紫外線硬化樹脂(大日本油墨(股)製:Unidic 17-824-9、固形分濃度78.9%)1.54g、光起始劑(Chiba Specialty(股)製cure 184、以IPA溶解、固形分濃度10%)0.42g及異丙醇與丁基溶纖劑之1/1(重量比)混合溶劑65.46g進行充分混合而調製抗反射膜形成用塗料(A-4R)。As the cerium oxide-based hollow fine particle dispersion sol (manufactured by Catalyst Chemical Co., Ltd.: Sria (transliteration) 1420, average particle diameter: 60 nm, concentration: 20.5 wt%, dispersant: isopropyl alcohol, particle refractive index: 1.30) Low refractive index component. The sol was diluted with isopropanol to a solid content of 5% by weight of a dispersion of 33 g and an ultraviolet curable resin (manufactured by Dainippon Ink (Unisex): Unidic 17-824-9, solid concentration: 78.9%), light-emitting Starting agent (Cure 184, manufactured by Chiba Specialty Co., Ltd., dissolved in IPA, solid concentration: 10%), 0.42 g, and 65.46 g of a mixed solvent of isopropyl alcohol and butyl cellosolve in a ratio of 1/1 (by weight) were prepared to sufficiently react. A coating material for forming a reflective film (A-4R).

附有透明被膜之基材(4-1)之調製Modulation of substrate (4-1) with transparent film

使透明被膜形成用塗料(A-4)以桿塗器塗佈於PET膜(厚100μ m、折射率1.65,基材穿透率88.0%、霧度1.0%、反射率5.1%),在70℃下乾燥1分鐘後,照射高壓水銀燈(80W/cm)1分鐘而硬化以調製附有透明被膜之基材(4-1)。此時之膜厚為5μ m。將透明被膜之一部分朝縱方向垂直地切斷,藉穿透型電子顯微鏡觀察截面後,發現於上部形成五氧化銻微粒厚度為150nm之層,而下部僅有基質而看不出粒子的存在。The coating film for forming a transparent film (A-4) was applied to a PET film by a bar coater (thickness: 100 μm , refractive index: 1.65, substrate transmittance: 88.0%, haze: 1.0%, reflectance: 5.1%). After drying at 70 ° C for 1 minute, it was irradiated with a high pressure mercury lamp (80 W/cm) for 1 minute to be hardened to prepare a substrate (4-1) having a transparent film. The film thickness at this time was 5 μm . One of the transparent films was cut perpendicularly in the longitudinal direction, and the cross section was observed by a transmission electron microscope. It was found that a layer having a thickness of 150 nm of pentoxide particles was formed on the upper portion, and only the matrix was present in the lower portion, and the presence of particles was not observed.

測定所得到之附有透明被膜之基材(4-1)的表面電阻值、全光線穿透率、霧度、波長550nm之光線的反射率、防眩性、密著性、鉛筆硬度,將結果示於表1中。The surface resistance value, the total light transmittance, the haze, the reflectance of the light having a wavelength of 550 nm, the anti-glare property, the adhesion, and the pencil hardness of the obtained substrate (4-1) with a transparent film were measured. The results are shown in Table 1.

附有透明被膜之基材(4-2)之調製Modulation of substrate (4-2) with transparent film

繼而使抗反射膜形成用塗料(A-4R)以桿塗器塗佈於附有透明被膜之基材(4-1)上,在70℃下乾燥1分鐘後,照射高壓水銀燈(80W/cm)1分鐘而硬化以調製附有透明被膜之基材(4-2)。此時之抗反射膜之膜厚為100nm。Then, the anti-reflective film-forming coating material (A-4R) was applied to a substrate (4-1) having a transparent film by a bar coater, and dried at 70 ° C for 1 minute, and then irradiated with a high-pressure mercury lamp (80 W/cm). ) hardened in 1 minute to prepare a substrate (4-2) to which a transparent film was attached. The film thickness of the antireflection film at this time was 100 nm.

測定所得到之附有透明被膜之基材(4-2)的表面電阻值、全光線穿透率、霧度、波長550nm之光線的反射率、防眩性、密著性、鉛筆硬度,將結果示於表1中。The surface resistance value, the total light transmittance, the haze, the reflectance of the light having a wavelength of 550 nm, the anti-glare property, the adhesion, and the pencil hardness of the obtained substrate (4-2) with a transparent film were measured. The results are shown in Table 1.

[實施例5][Example 5] 透明被膜形成用塗料(A-5)之調製Modification of coating film for transparent film formation (A-5)

使用氧化鈦微粒分散溶膠(觸媒化成工業(股)製:OPTLAK 1137Z、平均粒徑20nm、濃度30.5重量%、分散劑:甲醇、粒子折射率2.10)作為高折射率粒子。於溶膠100g中混合γ-丙烯醯氧基丙基三甲氧基矽烷1.86g(信越Silicone股製KBM-503 SiO2 成分81.9%),添加超純水10g,在40℃下攪拌5小時,得到經表面處理之氧化鈦微粒分散溶膠(固形分28.6%)。測定此經表面處理之氧化鈦微粒分散溶膠的表面電荷量後,為19.5μ eq/g。As the high refractive index particles, a titanium oxide fine particle dispersion sol (manufactured by Catalyst Chemical Co., Ltd.: OPTLAK 1137Z, an average particle diameter of 20 nm, a concentration of 30.5 wt%, a dispersing agent: methanol, and a particle refractive index of 2.10) was used. Into 100 g of sol, 1.86 g of γ-acryloxypropyltrimethoxydecane (81.9% of KBM-503 SiO 2 component manufactured by Shin-Etsu Silicone Co., Ltd.) was added, and 10 g of ultrapure water was added thereto, and the mixture was stirred at 40 ° C for 5 hours to obtain a The surface treated titanium oxide fine particle dispersed sol (solid content 28.6%). After the measurement of this surface charge amount of surface treated particulate titanium oxide-dispersed sol, it is 19.5 μ eq / g.

使此經表面處理之氧化鈦微粒分散溶膠17.48g、二赤蘚糖醇三乙酸酯(共榮社化學(股):DPE-6A)22.5g、具有羥基之丙烯酸酯(共榮社化學(股):MMH-40丙二醇單甲基醚分散 固形分40%)6.25g、光起始劑(Ciba Specialty(股)製Irgacure184、以IPA溶解、固形分濃度10%)0.42g及異丙醇與甲基異丁基酮之1/1(重量比)混合溶劑53.35g進行充 分混合而調製透明被膜形成用塗料(A-5)。The surface-treated titanium oxide fine particles dispersed sol 17.48 g, dierythritol triacetate (Kyoeisha Chemical Co., Ltd.: DPE-6A) 22.5 g, hydroxy-containing acrylate (Kyoeisha Chemical ( Share): MMH-40 propylene glycol monomethyl ether dispersion solid fraction 40%) 6.25g, photoinitiator (Irgacure 184 made by Ciba Specialty, dissolved in IPA, solid concentration 10%) 0.42g and isopropanol Methyl isobutyl ketone 1/1 (by weight) mixed solvent 53.35g for charging The coating material for transparent film formation (A-5) was prepared by mixing.

附有透明被膜之基材(5-1)之調製Modulation of substrate (5-1) with transparent film

使透明被膜形成用塗料(A-5)以桿塗器塗佈於PET膜(厚100μ m、折射率1.65,基材穿透率88.0%、霧度1.0%、反射率5.1%),在70℃下乾燥1分鐘後,照射高壓水銀燈(80W/cm)1分鐘而硬化以調製附有透明被膜之基材(5)。此時之膜厚為5μ m。將透明被膜之一部分朝縱方向垂直地切斷,藉穿透型電子顯微鏡觀察截面後,發現於上部形成氧化鈦微粒之厚度為80nm之層,而下部僅有基質而看不出粒子的存在。The coating film for forming a transparent film (A-5) was applied to a PET film (100 μm thick, refractive index 1.65, substrate transmittance: 88.0%, haze 1.0%, and reflectance: 5.1%) by a bar coater. After drying at 70 ° C for 1 minute, it was irradiated with a high pressure mercury lamp (80 W/cm) for 1 minute to be hardened to prepare a substrate (5) with a transparent film. The film thickness at this time was 5 μm . One of the transparent films was cut perpendicularly in the longitudinal direction, and the cross section was observed by a transmission electron microscope. It was found that a layer having a thickness of 80 nm of titanium oxide fine particles was formed on the upper portion, and only the matrix was present in the lower portion, and the presence of particles was not observed.

測定所得到之附有透明被膜之基材(5-1)的表面電阻值、全光線穿透率、霧度、波長550nm之光線的反射率、防眩性、密著性、鉛筆硬度,將結果示於表1中。The surface resistance value, the total light transmittance, the haze, the reflectance of the light having a wavelength of 550 nm, the anti-glare property, the adhesion, and the pencil hardness of the obtained substrate (5-1) with a transparent film were measured. The results are shown in Table 1.

附有透明被膜之基材(5-2)之調製Modulation of substrate (5-2) with transparent film

繼而使與實施例4同樣做法所調製的抗反射形成用塗料(A-4R)以桿塗器塗佈於附有透明被膜之基材(5-1)上,在70℃下乾燥1分鐘後,照射高壓水銀燈(80W/cm)1分鐘而硬化以調製附有透明被膜之基材(5-2)。此時之抗反射膜之膜厚為100nm。Then, the antireflection-forming coating material (A-4R) prepared in the same manner as in Example 4 was applied to a substrate (5-1) having a transparent film by a bar coater, and dried at 70 ° C for 1 minute. The high-pressure mercury lamp (80 W/cm) was irradiated for 1 minute to be hardened to prepare a substrate (5-2) to which a transparent film was attached. The film thickness of the antireflection film at this time was 100 nm.

測定所得到之附有透明被膜之基材(5-2)的表面電阻值、全光線穿透率、霧度、波長550nm之光線的反射率、防眩性、密著性、鉛筆硬度,將結果示於表1中。The surface resistance value, the total light transmittance, the haze, the reflectance of the light having a wavelength of 550 nm, the anti-glare property, the adhesion, and the pencil hardness of the obtained substrate (5-2) having the transparent film were measured. The results are shown in Table 1.

[實施例6][Embodiment 6] 透明被膜形成用塗料(A-6)之調製Modification of coating film for transparent film formation (A-6)

使用二氧化矽系中空微粒分散溶膠(觸媒化成工業(股)製:斯里亞(音譯)1420、平均粒徑60nm、濃度20.5重量%、分散劑:異丙醇、粒子折射率1.30)作為低折射率成分。於溶膠100g中混合全氟辛基乙基三乙氧基矽烷10g(Toray Dow Corning製AY43-158E 100%),添加超純水10g,在40℃下攪拌5小時,得到經表面處理之二氧化矽系中空微粒分散溶膠(固形分19.3重量%)。測定此經表面處理之二氧化矽系中空微粒分散溶膠的表面電荷量後,為8.3μ eq/g。使ATO微粒分散溶膠(觸媒化成工業(股)製:ELCOM V-3501、平均粒徑8nm、濃度19.3重量%、分散劑:乙醇、粒子折射率1.75)作為抗靜電高折射率成分。於此溶膠100g中混合γ-丙烯醯氧基丙基三甲氧基矽烷1.26g(信越Silicone股製KBM-5103 SiO2 成分81.2%),添加超純水10g,在40℃下攪拌5小時,得到經表面處理之ATO微粒分散溶膠(固形分19.3%)。測定此經表面處理之ATO微粒分散溶膠的表面電荷量後,為35.8μeq/g。使此經表面處理之二氧化矽系中空微粒分散溶膠15.5g、經表面處理之ATO微粒分散溶膠31.3g、赤蘚糖醇三(五丙烯酸酯)(日本化藥(股):KAYARD DPHA)27g與光起始劑(Ciba Specialty(股)製Irgacure184,以IPA溶解、固型分濃度10%)0.35g及異丙醇與甲基異丁基酮之1/1(重量比)混合溶劑26.05g充分混合而調製透明被膜形成用塗料(A-6)。As the cerium oxide-based hollow fine particle dispersion sol (manufactured by Catalyst Chemical Co., Ltd.: Sria (transliteration) 1420, average particle diameter: 60 nm, concentration: 20.5 wt%, dispersant: isopropyl alcohol, particle refractive index: 1.30) Low refractive index component. 10 g of perfluorooctylethyltriethoxydecane (100% by Aray 43-158E manufactured by Toray Dow Corning) was mixed with 100 g of sol, and 10 g of ultrapure water was added thereto, and the mixture was stirred at 40 ° C for 5 hours to obtain a surface-treated oxidizing agent. The lanthanide hollow fine particle dispersion sol (solid content 19.3 wt%). After measuring the surface charge amount of this silicon dioxide-based hollow microparticle dispersion sol of the surface treated, and is 8.3 μ eq / g. The ATO fine particle dispersion sol (manufactured by Catalyst Chemical Co., Ltd.: ELCOM V-3501, average particle diameter: 8 nm, concentration: 19.3% by weight, dispersant: ethanol, particle refractive index: 1.75) was used as an antistatic high refractive index component. To 100 g of the sol, 1.26 g of γ-acryloxypropyltrimethoxydecane (81.2% of KBM-5103 SiO 2 component manufactured by Shin-Etsu Silicone Co., Ltd.) was added, and 10 g of ultrapure water was added thereto, and the mixture was stirred at 40 ° C for 5 hours to obtain Surface treated ATO microparticle dispersion sol (solids 19.3%). The surface charge amount of this surface-treated ATO fine particle-dispersed sol was measured and found to be 35.8 μeq/g. 15.5 g of the surface-treated cerium oxide-based hollow fine particle-dispersing sol, 31.3 g of the surface-treated ATO fine particle-dispersing sol, and erythritol tris(pentaacrylate) (Nippon Chemical Co., Ltd.: KAYARD DPHA) 27 g With a photoinitiator (Irgacure 184, manufactured by Ciba Specialty Co., Ltd., dissolved in IPA, solid concentration: 10%), 0.35 g, and 1/1 (by weight) mixed solvent of isopropanol and methyl isobutyl ketone 26.05 g The coating film for forming a transparent film (A-6) was prepared by thoroughly mixing.

附有透明被膜之基材(6)之調製Modulation of substrate (6) with transparent film

使透明被膜形成用塗料(A-6)以桿塗器塗佈於TAC膜 (厚80μ m、折射率1.48,基材穿透率88.0%、霧度0.0%、反射率4.8%),在70℃下乾燥1分鐘後,照射高壓水銀燈(80W/cm)1分鐘而硬化以調製附有透明被膜之基材(6)。此時之膜厚為5μ m。將透明被膜之一部分朝縱方向垂直地切斷,藉穿透型電子顯微鏡觀察截面後,發現於上部形成氧化鈦微粒之厚度為100nm之層,而下部係ATO微粒以第4圖所示之形態存在於基質中。The coating film for forming a transparent film (A-6) was applied to a TAC film by a bar coater (thickness: 80 μm , refractive index: 1.48, substrate transmittance: 88.0%, haze: 0.0%, reflectance: 4.8%). After drying at 70 ° C for 1 minute, it was irradiated with a high pressure mercury lamp (80 W/cm) for 1 minute to be hardened to prepare a substrate (6) with a transparent film. The film thickness at this time was 5 μm . One part of the transparent film was cut perpendicularly in the longitudinal direction, and the cross section was observed by a transmission electron microscope, and it was found that a layer having a thickness of 100 nm of titanium oxide fine particles was formed on the upper portion, and the lower ATO fine particles were in the form shown in FIG. Present in the matrix.

測定所得到之附有透明被膜之基材(6)的表面電阻值、全光線穿透率、霧度、波長550nm之光線的反射率、防眩性、密著性、鉛筆硬度,將結果示於表1中。The surface resistance value, the total light transmittance, the haze, the reflectance of the light having a wavelength of 550 nm, the anti-glare property, the adhesion, and the pencil hardness of the obtained substrate (6) with a transparent film were measured, and the results were shown. In Table 1.

[實施例7][Embodiment 7] 透明被膜形成用塗料(A-7)之調製Modification of coating film for transparent film formation (A-7)

使用二氧化矽系中空微粒分散溶膠(觸媒化成工業(股)製:斯里亞(音譯)1420、平均粒徑60nm、濃度20.5重量%、分散劑:異丙醇、粒子折射率1.30)作為低折射率成分。於此溶膠100g中混合十三烷基甲基丙烯酸酯10g(共榮社化學製:Light Ester TD),在50℃下攪拌24小時,得到經表面處理之二氧化矽系中空微粒分散溶膠(固形分27.7%)。測定此經表面處理之二氧化矽系中空微粒分散溶膠的表面電荷量後,為5.3μ eq/g。使五氧化銻微粒分散溶膠(觸媒化成工業(股)製:ELCOM V-4560、平均粒徑20nm、濃度30.5重量%、分散劑:異丙醇、粒子折射率1.60)作為抗靜電高折射率成分。以異丙醇稀釋成20.5%之此溶膠100g中混合γ-環氧丙氧基丙基三甲氧基矽烷1.44g(Toray Dow Corning製AY43-026 SiO2 成分86.8%),添加超純水10g,在40℃下攪拌5小時,得到經表面處理之五氧化銻微粒分散溶膠(固形分19.5%)。測定此經表面處理之五氧化銻微粒分散溶膠的表面電荷量後,為35.3μ eq/g。As the cerium oxide-based hollow fine particle dispersion sol (manufactured by Catalyst Chemical Co., Ltd.: Sria (transliteration) 1420, average particle diameter: 60 nm, concentration: 20.5 wt%, dispersant: isopropyl alcohol, particle refractive index: 1.30) Low refractive index component. 10 g of tridecyl methacrylate (Light Ester TD, manufactured by Kyoeisha Chemical Co., Ltd.) was mixed with 100 g of the sol, and stirred at 50 ° C for 24 hours to obtain a surface-treated cerium oxide hollow fine particle dispersion sol (solid form) 27.7%). After measuring the surface charge amount of this silicon dioxide-based hollow microparticle dispersion sol of the surface treated, and is 5.3 μ eq / g. The ruthenium pentoxide fine particle dispersion sol (manufactured by Catalyst Chemical Co., Ltd.: ELCOM V-4560, average particle diameter: 20 nm, concentration: 30.5 wt%, dispersant: isopropanol, particle refractive index: 1.60) was used as an antistatic high refractive index. ingredient. Γ-glycidoxypropyltrimethoxydecane 1.44 g (86.8% of AY43-026 SiO 2 component manufactured by Toray Dow Corning) was mixed with 100 g of the sol diluted with isopropanol to 100%, and 10 g of ultrapure water was added. The mixture was stirred at 40 ° C for 5 hours to obtain a surface-treated cerium oxide microparticle-dispersed sol (solid content: 19.5%). The surface charge amount of this surface-treated pentoxide pentoxide fine particle sol was measured and found to be 35.3 μ eq/g.

使此經表面處理之二氧化矽系中空微粒分散溶膠10.8g、經表面處理之ATO微粒分散溶膠30g、六赤蘚糖醇三(五丙烯酸酯)(日本化藥(股):KAYARAD DPHA)27g與光起始劑(Ciba Specialty(股)製Irgacure184,以IPA溶解、固型分濃度10%)0.35g及異丙醇與甲基異丁基酮之1/1(重量比)混合溶劑31.9g充分混合而調製透明被膜形成用塗料(A-7)。10.8 g of the surface-treated cerium oxide-based hollow fine particle-dispersing sol, 30 g of the surface-treated ATO fine particle-dispersing sol, and hexaerythritol tris(pentaacrylate) (Nippon Chemical Co., Ltd.: KAYARAD DPHA) 27 g 0.39 g with a photoinitiator (Irgacure 184, manufactured by Ciba Specialty Co., Ltd., dissolved in IPA, solid concentration: 10%) and 1/1 (by weight) mixed solvent of isopropyl alcohol and methyl isobutyl ketone 31.9 g The coating film for forming a transparent film (A-7) was prepared by thoroughly mixing.

附有透明被膜之基材(7)之調製Modulation of substrate (7) with transparent film

使透明被膜形成用塗料(A-7)以桿塗器塗佈於PET膜(厚100μ m、折射率1.65,基材穿透率88.0%、霧度1.0%、反射率5.1%),在70℃下乾燥1分鐘後,照射高壓水銀燈(80W/cm)1分鐘而硬化以調製附有透明被膜之基材(7)。此時之膜厚為5μ m。將透明被膜之一部分朝縱方向垂直地切斷,藉穿透型電子顯微鏡觀察截面後,發現於上部形成二氧化矽中空微粒之厚度為100nm之層,而下部係五氧化銻微粒以第3圖所示之形態存在於基質中。The coating film for forming a transparent film (A-7) was applied to a PET film (100 μm thick, refractive index: 1.65, substrate transmittance: 88.0%, haze 1.0%, reflectance: 5.1%) by a bar coater. After drying at 70 ° C for 1 minute, it was irradiated with a high pressure mercury lamp (80 W/cm) for 1 minute to be hardened to prepare a substrate (7) with a transparent film. The film thickness at this time was 5 μm . One part of the transparent film was cut perpendicularly in the longitudinal direction, and the cross section was observed by a transmission electron microscope, and it was found that a layer having a thickness of 100 nm in the upper portion of the ceria hollow fine particles was formed, and the lower part was a layer of ruthenium pentoxide particles. The morphology shown is present in the matrix.

測定所得到之附有透明被膜之基材(7)的表面電阻值、全光線穿透率、霧度、波長550nm之光線的反射率、防眩性、密著性、鉛筆硬度,將結果示於表1中。The surface resistance value, the total light transmittance, the haze, the reflectance of the light having a wavelength of 550 nm, the anti-glare property, the adhesion, and the pencil hardness of the obtained substrate (7) with a transparent film were measured, and the results were shown. In Table 1.

[比較例1][Comparative Example 1] 透明被膜形成用塗料(R-1)之調製Modification of coating film for transparent film formation (R-1)

使用二氧化矽系中空微粒分散溶膠(觸媒化成工業(股)製:斯里亞(音譯)1420、平均粒徑60nm、濃度20.5重量%、分散劑:異丙醇、粒子折射率1.30)作為低折射率成分。於此溶膠100g中混合乙烯基矽烷32.69g(信越化學製KBE-1003 SiO2 成分62.7%),添加超純水10g,在40℃下攪拌5小時,得到經表面處理之二氧化矽系中空微粒分散溶膠(固形分28.4%)。測定此經表面處理之二氧化矽系中空微粒分散溶膠的表面電荷量後,為3.3μ eq/g。使此經表面處理之二氧化矽系中空微粒分散溶膠10.54g、季戊四醇三乙酸酯(共榮社化學(股):PE-3A)24g、二乙基胺基乙基甲基丙烯酸酯(共榮社化學(股):Light Ester DE)3g、光起始劑(Ciba Specialty(股)製Irgacure184、以IPA溶解、固形分濃度10%)0.42g及異丙醇與甲基異丁基酮之1/1(重量比)混合溶劑62.04g進行充分混合而調製透明被膜形成用塗料(R-1)。As the cerium oxide-based hollow fine particle dispersion sol (manufactured by Catalyst Chemical Co., Ltd.: Sria (transliteration) 1420, average particle diameter: 60 nm, concentration: 20.5 wt%, dispersant: isopropyl alcohol, particle refractive index: 1.30) Low refractive index component. Into 100 g of the sol, 32.69 g of vinyl decane (62.7% of KBE-1003 SiO 2 component manufactured by Shin-Etsu Chemical Co., Ltd.) was added, and 10 g of ultrapure water was added thereto, and the mixture was stirred at 40 ° C for 5 hours to obtain surface-treated cerium oxide hollow particles. Dispersed sol (solids 28.4%). The surface charge amount of this surface-treated ceria-based hollow fine particle-dispersed sol was measured and found to be 3.3 μ eq/g. 10.54 g of this surface-treated cerium oxide-based hollow fine particle-dispersed sol, pentaerythritol triacetate (Kyoeisha Chemical Co., Ltd.: PE-3A), 24 g, diethylaminoethyl methacrylate (total Rongshe Chemical Co., Ltd.: Light Ester DE) 3g, photoinitiator (Irgacure 184 made by Ciba Specialty, dissolved in IPA, solid concentration 10%) 0.42g and isopropanol and methyl isobutyl ketone The composite film for forming a transparent film (R-1) was prepared by sufficiently mixing 62.04 g of a 1/1 (weight ratio) mixed solvent.

附有透明被膜之基材(R-1)之調製Modulation of substrate (R-1) with transparent film

使透明被膜形成用塗料(R-1)以桿塗器塗佈於PET膜(厚100μ m、折射率1.65,基材穿透率88.0%、霧度1.0%、反射率5.1%),在70℃下乾燥1分鐘後,照射高壓水銀燈(80W/cm)1分鐘而硬化以調製附有透明被膜之基材(R-1)。此時之膜厚為5μ m。將透明被膜之一部分朝縱方向垂直地切斷,藉穿透型電子顯微鏡觀察截面後,發現二氧化矽系中空微粒於膜中以均一地單分散之形式存在。測定所得到 之附有透明被膜之基材(R-1)的表面電阻值、全光線穿透率、霧度、波長550nm之光線的反射率、防眩性、密著性、鉛筆硬度,結果表示於表1中。The coating film for forming a transparent film (R-1) was applied to a PET film by a bar coater (thickness: 100 μm , refractive index: 1.65, substrate transmittance: 88.0%, haze: 1.0%, reflectance: 5.1%). After drying at 70 ° C for 1 minute, it was irradiated with a high pressure mercury lamp (80 W/cm) for 1 minute to be hardened to prepare a substrate (R-1) having a transparent film. The film thickness at this time was 5 μm . One of the transparent films was cut perpendicularly in the longitudinal direction, and the cross section was observed by a transmission electron microscope, and it was found that the ceria-based hollow fine particles were uniformly dispersed in the film. The surface resistance value, the total light transmittance, the haze, the reflectance of the light having a wavelength of 550 nm, the anti-glare property, the adhesion, and the pencil hardness of the obtained substrate (R-1) having the transparent film were measured. Shown in Table 1.

[比較例2][Comparative Example 2] 透明被膜形成用塗料(R-2)之調製Modification of coating film for transparent film formation (R-2)

使用五氧化銻微粒分散溶膠(觸媒化成工業(股)製:ELCOM V-4560、平均粒徑20nm、濃度30.5重量%、分散劑:異丙醇、粒子折射率1.60)作為導電成分。於此溶膠100g中混合γ-甲基丙烯醯氧基丙基三甲氧基矽烷37.57g(信越Silicone股製KBM-503 SiO2 成分81.2%),添加超純水10g,在40℃下攪拌5小時,得到經表面處理之五氧化銻微粒分散溶膠(固形分42.1%)。測定此經表面處理之五氧化銻微粒分散溶膠的表面電荷量後,為5.5μ eq/g。使此經表面處理之五氧化銻微粒分散溶膠11.88g、二赤蘚糖醇三乙酸酯(共榮社化學(股):DPE-6A)22.5g、具有羥基之丙烯酸酯(共榮社化學(股):MMH-40丙二醇單甲基醚分散固形分40%)6.25g、光起始劑(Ciba Specialty(股)製Irgacure184、以IPA溶解、固形分濃度10%)0.42g及異丙醇與甲基異丁基酮之1/1(重量比)混合溶劑58.95g進行充分混合而調製透明被膜形成用塗料(R-2)。As the conductive component, a ruthenium pentoxide fine particle dispersion sol (manufactured by Catalyst Chemical Co., Ltd.: ELCOM V-4560, an average particle diameter of 20 nm, a concentration of 30.5 wt%, a dispersing agent: isopropyl alcohol, and a particle refractive index of 1.60) was used. Into 100 g of this sol, 37.57 g of γ-methylpropenyloxypropyltrimethoxydecane (81.2% of KBM-503 SiO 2 component manufactured by Shin-Etsu Silicone Co., Ltd.) was mixed, and 10 g of ultrapure water was added thereto, and the mixture was stirred at 40 ° C for 5 hours. A surface treated pentoxide pentoxide fine particle sol (solid fraction 42.1%) was obtained. This surface treatment was measured after the surface charge amount of an antimony pentoxide sol particle dispersion, is 5.5 μ eq / g. The surface-treated cerium oxide microparticles dispersed sol 11.88 g, dierythritol triacetate (Kyoeisha Chemical Co., Ltd.: DPE-6A) 22.5 g, hydroxy-containing acrylate (Kyoeisha Chemical Co., Ltd.) (Unit): MMH-40 propylene glycol monomethyl ether dispersion solid fraction 40%) 6.25 g, photoinitiator (Irgacure 184 manufactured by Ciba Specialty Co., Ltd., dissolved in IPA, solid concentration 10%) 0.42 g and isopropanol 58.95 g of a mixed solvent of 1/1 (weight ratio) of methyl isobutyl ketone was thoroughly mixed to prepare a coating material for transparent film formation (R-2).

附有透明被膜之基材(R-2-1)之調製Modulation of substrate (R-2-1) with transparent film

使透明被膜形成用塗料(R-2)以桿塗器塗佈於PET膜(厚100μm、折射率1.65,基材穿透率88.0%、霧度1.0%、反射率5.1%),在70℃下乾燥1分鐘後,照射高壓水銀燈 (80W/cm)1分鐘而硬化以調製附有透明被膜之基材(R-2-1)。此時之膜厚為5μ m。將透明被膜之一部分朝縱方向垂直地切斷,藉穿透型電子顯微鏡觀察截面後,發現五氧化銻微粒於膜中以均一地單分散之形式存在。The coating film for forming a transparent film (R-2) was applied to a PET film by a bar coater (thickness: 100 μm, refractive index: 1.65, substrate transmittance: 88.0%, haze: 1.0%, reflectance: 5.1%) at 70 ° C. After drying for 1 minute, the high pressure mercury lamp (80 W/cm) was irradiated for 1 minute to be hardened to prepare a substrate (R-2-1) having a transparent film. The film thickness at this time was 5 μm . One of the transparent films was cut perpendicularly in the longitudinal direction, and after observing the cross section by a transmission electron microscope, it was found that the ruthenium pentoxide particles were uniformly dispersed in the film.

測定所得到之附有透明被膜之基材(R-2-1)的表面電阻值、全光線穿透率、霧度、波長550nm之光線的反射率、防眩性、密著性、鉛筆硬度,將結果示於表1中。The surface resistance value, total light transmittance, haze, reflectance of light having a wavelength of 550 nm, anti-glare property, adhesion, pencil hardness of the obtained substrate (R-2-1) with a transparent film were measured. The results are shown in Table 1.

附有透明被膜之基材(R-2-2)之調製Modulation of substrate (R-2-2) with transparent film

繼而與實施例相同作法,使抗反射形成用塗料(A-4R)以桿塗器塗佈於附有透明被膜之基材(R-2-1)上,在70℃下乾燥1分鐘後,照射高壓水銀燈(80W/cm)1分鐘而硬化以調製附有透明被膜之基材(R-2-2)。此時之膜厚為100nm。Then, in the same manner as in the examples, the antireflection-forming coating material (A-4R) was applied to a substrate (R-2-1) having a transparent film by a bar coater, and dried at 70 ° C for 1 minute. The high pressure mercury lamp (80 W/cm) was irradiated for 1 minute to be hardened to prepare a substrate (R-2-2) having a transparent film. The film thickness at this time was 100 nm.

測定所得到之附有透明被膜之基材(R-2-2)的表面電阻值、全光線穿透率、霧度、波長550nm之光線的反射率、防眩性、密著性、鉛筆硬度,將結果示於表1中。The surface resistance value, total light transmittance, haze, reflectance of light having a wavelength of 550 nm, anti-glare property, adhesion, pencil hardness of the obtained substrate (R-2-2) with a transparent film were measured. The results are shown in Table 1.

[比較例3][Comparative Example 3] 附有透明被膜之基材(R-3)之調製Modulation of substrate (R-3) with transparent film

使與實施例4同樣做法所調製之抗反射膜形成用塗料(A-4R)以桿塗器塗佈於PET膜(厚100μ m、折射率1.65,基材穿透率88.0%、霧度1.0%、反射率5.1%),在70℃下乾燥1分鐘後,照射高壓水銀燈(80W/cm)1分鐘而硬化以調製附有抗反射被膜之基材(R-3)。此時之膜厚為100μ m。將透明被膜之一部分朝縱方向垂直地切斷,藉穿透型電子顯微鏡觀察截面後,發現二氧化矽系中空微粒於 膜中以均一地單分散之形式存在。The antireflection film-forming coating material (A-4R) prepared in the same manner as in Example 4 was applied to a PET film by a bar coater (thickness: 100 μm , refractive index: 1.65, substrate transmittance: 88.0%, haze) 1.0%, reflectance 5.1%), after drying at 70 ° C for 1 minute, the high pressure mercury lamp (80 W/cm) was irradiated for 1 minute to be hardened to prepare a substrate (R-3) having an antireflection film. The film thickness at this time was 100 μm . One of the transparent films was cut perpendicularly in the longitudinal direction, and the cross section was observed by a transmission electron microscope, and it was found that the ceria-based hollow fine particles were uniformly dispersed in the film.

測定所得到之附有抗反射被膜之基材(R-3)的表面電阻值、全光線穿透率、霧度、波長550nm之光線的反射率、防眩性、密著性、鉛筆硬度,將結果示於表1中。The surface resistance value, the total light transmittance, the haze, the reflectance of the light having a wavelength of 550 nm, the anti-glare property, the adhesion, and the pencil hardness of the obtained substrate (R-3) with an anti-reflection film were measured. The results are shown in Table 1.

第1圖係表示在透明被膜中之疏水性金屬氧化物微粒(a)的偏存之模式圖。Fig. 1 is a schematic view showing the unevenness of the hydrophobic metal oxide fine particles (a) in the transparent film.

第2圖係表示在透明被膜中之疏水性金屬氧化物微粒(a)及親水性金屬氧化物微粒(b)的偏存之模式圖。Fig. 2 is a schematic view showing the unevenness of the hydrophobic metal oxide fine particles (a) and the hydrophilic metal oxide fine particles (b) in the transparent film.

第3圖係表示在透明被膜中之疏水性金屬氧化物微粒(a)及親水性金屬氧化物微粒(b)的偏存之模式圖。Fig. 3 is a schematic view showing the unevenness of the hydrophobic metal oxide fine particles (a) and the hydrophilic metal oxide fine particles (b) in the transparent film.

第4圖係表示在透明被膜中之疏水性金屬氧化物微粒(a)及親水性金屬氧化物微粒(b)的偏存之模式圖。Fig. 4 is a schematic view showing the unevenness of the hydrophobic metal oxide fine particles (a) and the hydrophilic metal oxide fine particles (b) in the transparent film.

Claims (10)

一種透明被膜形成用塗料,係包含如下:(A)金屬氧化物微粒(a),其表面經下述式(1)所示之有機矽化合物及/或具有疏水性官能基的多官能丙烯酸酯樹脂之表面處理,且表面電荷量(QA )在5至80μ eq/g的範圍;Rn -SiX4-n (1)(式中,R為碳數1至10的非取代或取代烴基,可互為相同或相異;X:碳數1至4的烷氧基、矽烷醇基、鹵素、氫,n:0至3之整數)(B)基質形成成分,其包含下述式(2)所示之有機矽化合物或此等之水解物、水解聚縮合物及/或具有疏水性官能基之多官能(甲基)丙烯酸酯樹脂所構成之疏水性基質形成成分;Rn’ -SiX4-n’ (2)(式中,R為碳數1至10的非取代或取代烴基,可互為相同或相異;X:碳數1至4的烷氧基、矽烷醇基、鹵素、氫,n’:1至3之整數)(C)極性溶劑;(D)金屬氧化物微粒(b),其金屬氧化物微粒(b)之表面電荷量(QB )與金屬氧化物微粒(a)之表面電荷量(QA )之差(QB )-(QA )在20至95μ eq/g的範圍,其表面電荷量(QB )在25至100μ eq/g的範圍;其特徵在於:作為金屬氧化物微粒(a)之固形分的 濃度(CPA )在0.1至20重量%的範圍,作為基質形成成分(B)之固形分的濃度(CM )在1至50重量%的範圍。A coating material for forming a transparent film, comprising: (A) a metal oxide fine particle (a) having an organic ruthenium compound represented by the following formula (1) and/or a polyfunctional acrylate having a hydrophobic functional group; Surface treatment of the resin, and the surface charge amount (Q A ) is in the range of 5 to 80 μ eq/g; R n -SiX 4-n (1) (wherein R is an unsubstituted or substituted carbon number of 1 to 10) a hydrocarbon group which may be the same or different from each other; X: an alkoxy group having 1 to 4 carbon atoms, a stanol group, a halogen, a hydrogen, n: an integer of 0 to 3) (B) a matrix-forming component comprising the following formula (2) the organic silicon compound or hydrolyzate of such hydrolysis polycondensation product and / or hydrophobic matrix forming component having the configuration of many hydrophobic functional group-functional (meth) acrylate resin; R n ' -SiX 4-n' (2) (wherein R is an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms which may be the same or different from each other; X: an alkoxy group having 1 to 4 carbon atoms, a decyl alcohol group , halogen, hydrogen, n': an integer from 1 to 3) (C) polar solvent; (D) metal oxide fine particles (b), surface charge amount (Q B ) of metal oxide fine particles (b) and metal oxidation Surface charge amount of particle (a) (Q A The difference (Q B )-(Q A ) is in the range of 20 to 95 μ eq/g, and the surface charge amount (Q B ) thereof is in the range of 25 to 100 μ eq/g; characterized by: as a metal oxide The concentration (C PA ) of the solid content of the fine particles (a) is in the range of 0.1 to 20% by weight, and the concentration (C M ) of the solid content as the matrix-forming component (B) is in the range of 1 to 50% by weight. 如申請專利範圍第1項之透明被膜形成用塗料,其中,前述基質形成成分為含有疏水性基質,以及由以下述式(3)所示之有機矽化合物或此等之水解物、水解聚縮合物或具有親水性官能基之多官能(甲基)丙烯酸酯樹脂所構成之親水性基質形成成分;SiX4 (3)(式中,X:碳數1至4的烷氧基、矽烷醇基、鹵素、氫)作為親水性基質形成成分之固形分的濃度(CMA )與作為疏水性基質形成成分之固形分的濃度(CMB )之濃度比(CMA )/(CMB )為0.01至1的範圍。The coating material for forming a transparent film according to the first aspect of the invention, wherein the matrix-forming component contains a hydrophobic matrix, and is hydrolyzed and condensed by an organic hydrazine compound represented by the following formula (3) or a hydrolyzate thereof. or having a hydrophilic functional group as many functional (meth) matrix composed of a hydrophilic acrylate resin component; SiX 4 (3) (in the formula, X: an alkoxy group having 1 to 4 carbon atoms, an alkanol group silicon concentration (C MA), halogen, hydrogen) form a solid component of the points as the hydrophilic matrix and the concentration (C MB) of forming the solid component of the points as the hydrophobic matrix concentration ratio (C MA) / (C MB ) 0.01 To the range of 1. 如申請專利範圍第1或2項之透明被膜形成用塗料,其中,前述金屬氧化物微粒(a)的平均粒徑在5至500nm的範圍。 The coating material for forming a transparent film according to the first or second aspect of the invention, wherein the metal oxide fine particles (a) have an average particle diameter of 5 to 500 nm. 如申請專利範圍第1或2項的透明被膜形成用塗料,其中,作為前述金屬氧化物微粒(b)之固形分的濃度(CPB )在0.1至20重量%的範圍。The coating material for forming a transparent film according to the first or second aspect of the invention, wherein the concentration (C PB ) of the solid content of the metal oxide fine particles (b) is in the range of 0.1 to 20% by weight. 如申請專利範圍第1或2項之透明被膜形成用塗料,其中,前述金屬氧化物微粒(b)之平均粒徑在5至500nm的範圍。 The coating material for forming a transparent film according to claim 1 or 2, wherein the metal oxide fine particles (b) have an average particle diameter of 5 to 500 nm. 如申請專利範圍第1或2項之透明被膜形成用塗料,其中,前述親水性官能基為選自羥基、胺基、羧基、磺基、縮水甘油基中之1種以上,且前述疏水性官能基為 選自(甲基)丙烯醯基、烷基、苯基、胺基甲酸酯基、CF2 基中之1種以上。The coating material for forming a transparent film according to the first or second aspect of the invention, wherein the hydrophilic functional group is at least one selected from the group consisting of a hydroxyl group, an amine group, a carboxyl group, a sulfo group, and a glycidyl group, and the hydrophobic functional group is used. The group is one or more selected from the group consisting of a (meth) acrylonitrile group, an alkyl group, a phenyl group, a urethane group, and a CF 2 group. 一種附有透明被膜之基材,係於基材上形成透明被膜之附有透明被膜的基材,其特徵在於:透明被膜為由表面電荷量(QA )在5至80μeq/g範圍的疏水性金屬氧化物微粒(a)、表面電荷量(QB )在25至100μ eq/g範圍的金屬氧化物微粒(b)與基質成分所構成;金屬氧化物微粒(a)偏存於透明被膜之上部形成層,透明被膜中之金屬氧化物微粒(a)的含量(WPA )在0.2至90重量%的範圍;金屬氧化物微粒(b)之表面電荷量(QB )與金屬氧化物微粒(a)之表面電荷量(QA )之差(QB )-(QA )在20至95μ eq/g的範圍;基質成分之含量(WM )在10至99.8重量%的範圍;該基質成分係選自下述式(4)所示之有機矽化合物之水解聚縮合物及/或具有疏水性官能基之多官能(甲基)丙烯酸酯樹脂之疏水性基質成分Rn -SiX4-n (4)(式中,R為碳數1至10的非取代或取代烴基,可互為相同或相異;X:碳數1至4的烷氧基、矽烷醇基、鹵素、氫,n:0至3之整數);金屬氧化物微粒(b)偏存於基材表面上形成之層,或分散於由前述金屬氧化物微粒(a)所構成之層與基材 表面之間而成。A substrate with a transparent film attached to a substrate to form a transparent film with a transparent film, wherein the transparent film is hydrophobic with a surface charge amount (Q A ) in the range of 5 to 80 μeq/g. Metal oxide fine particles (a), metal oxide fine particles (b) having a surface charge amount (Q B ) in the range of 25 to 100 μ eq/g, and matrix components; metal oxide fine particles (a) are partially transparent A layer is formed on the upper portion of the film, and the content (W PA ) of the metal oxide fine particles (a) in the transparent film is in the range of 0.2 to 90% by weight; the surface charge amount (Q B ) of the metal oxide fine particles (b) and the metal oxide The difference (Q B )-(Q A ) between the surface charge amounts (Q A ) of the particles (a) is in the range of 20 to 95 μ eq/g; the content of the matrix component (W M ) is from 10 to 99.8% by weight. The matrix component is selected from the group consisting of a hydrolyzed polycondensate of an organic hydrazine compound represented by the following formula (4) and/or a hydrophobic matrix component R n of a polyfunctional (meth) acrylate resin having a hydrophobic functional group. -SiX 4-n (4) (wherein R is an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms which may be the same or different from each other; X: an alkoxy group having 1 to 4 carbon atoms, a stanol group, Halogen, hydrogen, n: an integer of 0 to 3); the metal oxide fine particles (b) are deposited on a layer formed on the surface of the substrate, or dispersed in a layer and a substrate composed of the aforementioned metal oxide fine particles (a) Made between the surfaces. 如申請專利範圍第7項之附有透明被膜之基材,其中,前述基質成分為由疏水性基質成分,以及親水性基質成分所構成,親水性基質成分為下述式(3)所示之有機矽化合物之水解聚縮合物及/或具有親水性官能基之多官能(甲基)丙烯酸酯樹脂;SiX4 (3)(式中,X:碳數1至4的烷氧基、矽烷醇基、鹵素、氫)作為親水性基質成分之固形分的含量(WMA )與作為疏水性基質成分之固形分的含量(WMB )之含量比(WMA )/(WMB )在0.01至1的範圍。The substrate having a transparent film according to the seventh aspect of the invention, wherein the matrix component is composed of a hydrophobic matrix component and a hydrophilic matrix component, and the hydrophilic matrix component is represented by the following formula (3). Hydrolyzed polycondensate of an organic hydrazine compound and/or polyfunctional (meth) acrylate resin having a hydrophilic functional group; SiX 4 (3) (wherein X: alkoxy group having 1 to 4 carbon atoms, stanol The ratio of the content of the solid component (W MA ) as the hydrophilic matrix component to the content of the solid component (W MB ) as the hydrophobic matrix component (W MA ) / (W MB ) is 0.01 to The scope of 1. 如申請專利範圍第7項或第8項的附有透明被膜之基材,其中,前述金屬氧化物微粒(a)的平均粒徑在5至500nm的範圍,前述金屬氧化物微粒(b)的平均粒徑在5至500nm的範圍。 The substrate with a transparent film according to Item 7 or Item 8 of the patent application, wherein the metal oxide fine particles (a) have an average particle diameter in the range of 5 to 500 nm, and the metal oxide fine particles (b) The average particle diameter is in the range of 5 to 500 nm. 如申請專利範圍第7項或第8項之附有透明被膜之基材,其中,前述親水性官能基為選自羥基、胺基、羧基、磺基中之1種以上,且前述疏水性官能基為選自(甲基)丙烯醯基、烷基、苯基、胺基甲酸酯基、CF2 基中之1種或2種以上。The substrate having a transparent film, wherein the hydrophilic functional group is one or more selected from the group consisting of a hydroxyl group, an amine group, a carboxyl group, and a sulfo group, and the hydrophobic functional group is the same. The group is one or more selected from the group consisting of a (meth) acrylonitrile group, an alkyl group, a phenyl group, a urethane group, and a CF 2 group.
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