TWI463141B - Contact probe and probe unit - Google Patents

Contact probe and probe unit Download PDF

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Publication number
TWI463141B
TWI463141B TW100141985A TW100141985A TWI463141B TW I463141 B TWI463141 B TW I463141B TW 100141985 A TW100141985 A TW 100141985A TW 100141985 A TW100141985 A TW 100141985A TW I463141 B TWI463141 B TW I463141B
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Taiwan
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end portion
plunger
coil spring
contact probe
longitudinal direction
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TW100141985A
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Chinese (zh)
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TW201229519A (en
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Toshio Kazama
Kazuya Souma
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Nhk Spring Co Ltd
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Publication of TWI463141B publication Critical patent/TWI463141B/en

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/06711Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
    • G01R1/06733Geometry aspects
    • G01R1/06738Geometry aspects related to tip portion
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/073Multiple probes
    • G01R1/07307Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
    • G01R1/07314Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card the body of the probe being perpendicular to test object, e.g. bed of nails or probe with bump contacts on a rigid support
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/04Housings; Supporting members; Arrangements of terminals
    • G01R1/0408Test fixtures or contact fields; Connectors or connecting adaptors; Test clips; Test sockets
    • G01R1/0433Sockets for IC's or transistors
    • G01R1/0483Sockets for un-leaded IC's having matrix type contact fields, e.g. BGA or PGA devices; Sockets for unpackaged, naked chips

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Measuring Leads Or Probes (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)

Description

接觸探針及探針單元Contact probe and probe unit

本發明係關於一種用在半導體封裝件(package)或液晶面板(panel)等檢查對象之導通狀態檢查或動作特性檢查之導電性接觸探針及具備該接觸探針之探針單元。The present invention relates to a conductive contact probe for use in an on-state inspection or an operation characteristic inspection of an inspection object such as a semiconductor package or a liquid crystal panel, and a probe unit including the same.

以往,在進行半導體封裝件或液晶面板等檢查對象之導通狀態檢查或動作特性檢查時,係使用與該檢查對象所具有之外部連接用電極的設置樣式對應,而將導電性之複數個接觸探針配置於預定位置的探針單元。在探針單元中,係藉由使接觸探針之兩端部分別與用以輸出檢查對象之電極與檢查用信號之配線基板之電極接觸,而將檢查對象與配線基板之間予以電性連接(參照例如專利文獻1)。在此種探針單元中,就可與近年來之半導體封裝件或液晶面板之高積體化、微細化之進展對應的技術而言,有一種將相鄰之接觸探針間之間距予以狹小化的技術已日益進步。In the past, when performing an on-state inspection or an operation characteristic inspection of an inspection object such as a semiconductor package or a liquid crystal panel, a plurality of contact probes of conductivity are used in accordance with the installation pattern of the external connection electrodes included in the inspection target. The needle is disposed in a probe unit at a predetermined position. In the probe unit, the contact object and the wiring substrate are electrically connected by contacting the both ends of the contact probe with the electrodes of the wiring substrate for outputting the electrode to be inspected and the inspection signal. (See, for example, Patent Document 1). In such a probe unit, it is possible to narrow the distance between adjacent contact probes in accordance with a technique corresponding to the progress of high integration and miniaturization of semiconductor packages or liquid crystal panels in recent years. The technology has been increasingly improved.

然而,檢查對象之電極會有呈球狀的情形。就適於與此種球狀電極接觸的接觸探針而言,如專利文獻1所示,係使用一種接觸探針,其具備:第1柱塞(plunger),具有形成有複數個突出部之皇冠(crown)形狀的前端部,用以與球狀電極接觸,該等突出部係呈彼此相同之錘狀而朝長度方向突出,且配置於相對於該長度方向之中心軸旋轉對稱的位置;第2柱塞,用以與配線基板接觸;及線圈彈簧,用以連結該2個柱塞。此接觸探針之線圈彈簧係具有:密捲繞部,線材係被密實地捲繞,且端部係安裝於第1柱塞;及疏捲繞部,由從密捲繞部延伸之線材隔開預定間距地捲繞而成,而端部則安裝於第2柱塞。However, the electrode of the inspection object may be spherical. As a contact probe suitable for contact with such a spherical electrode, as disclosed in Patent Document 1, a contact probe including a first plunger having a plurality of protrusions is provided. a front end portion of a crown shape for contacting a spherical electrode, wherein the protruding portions are formed in a hammer shape that is identical to each other and protrude in a longitudinal direction, and are disposed at a position rotationally symmetrical with respect to a central axis of the longitudinal direction; The second plunger is for contacting the wiring substrate; and the coil spring is for connecting the two plungers. The coil spring of the contact probe has a densely wound portion, the wire is densely wound, and the end portion is attached to the first plunger; and the sparsely wound portion is separated by a wire extending from the densely wound portion. The opening is wound at a predetermined interval, and the end portion is attached to the second plunger.

依據上述之接觸探針,複數個突出部可將存在於球狀電極之表面的污垢或氧化被膜削落,而可在與球狀電極之間實現確實的電性連接。此外,依據上述之接觸探針,當檢查時之荷重從外部施加時,由於第1及第2柱塞會透過線圈彈簧的密捲繞部而導通,因此可將導通路徑縮短而實現電感(inductance)或電阻的降低、穩定化。因此,藉由使用具備上述接觸探針之探針單元,即可確保半導體封裝件等在檢查時穩定的導通。According to the contact probe described above, the plurality of protrusions can cut off the dirt or the oxide film existing on the surface of the spherical electrode, and can achieve a reliable electrical connection with the spherical electrode. Further, according to the contact probe described above, when the load at the time of inspection is applied from the outside, since the first and second plungers are electrically connected to the densely wound portion of the coil spring, the conduction path can be shortened to realize inductance (inductance). ) or the reduction and stabilization of the resistance. Therefore, by using the probe unit including the above-described contact probe, it is possible to ensure stable conduction of the semiconductor package or the like during inspection.

[先前技術文獻][Previous Technical Literature] [專利文獻][Patent Literature]

[專利文獻1]日本特開2002-107377號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2002-107377

以上述之習知之接觸探針之情形而言,在第1柱塞之前端部,係將複數個突出部相對於長度方向之中心軸旋轉對稱地配設,而與球狀電極接觸時之接觸探針的動作,係沿著長度方向呈大致直線狀。因此,荷重施加時之線圈彈簧的彎曲較少時,會有在第2柱塞與線圈彈簧之密捲繞部之間無法獲得充分接觸的可能性。此情形下,由於線圈彈簧的疏捲繞部包含在導通路徑,因此電感或電阻會增大,而有無法確保穩定之導通之虞。In the case of the above-described conventional contact probe, at the end portion of the first plunger, a plurality of protruding portions are disposed in rotational symmetry with respect to a central axis in the longitudinal direction, and contact with the spherical electrode is made. The action of the probe is substantially linear along the length direction. Therefore, when the bending of the coil spring at the time of load application is small, there is a possibility that sufficient contact cannot be obtained between the second plunger and the tightly wound portion of the coil spring. In this case, since the unwinding portion of the coil spring is included in the conduction path, the inductance or the resistance is increased, and there is a possibility that the stable conduction cannot be ensured.

本發明係有鑑於上述情形而研創者,其目的在提供一種可將存在於接觸對象之球狀電極之表面的氧化被膜確實地削落,並且可確保穩定之導通的接觸探針及具備該接觸探針之探針單元。The present invention has been made in view of the above circumstances, and an object thereof is to provide a contact probe capable of reliably cutting an oxide film existing on a surface of a spherical electrode contacting a target, and ensuring stable conduction, and having the contact Probe unit for the probe.

為了解決上述問題而達成目的,本發明之接觸探針係一種呈可沿著長度方向伸縮之針狀之導電性接觸探針,其特徵為:具備複數個突出部,該等突出部係設於前述長度方向之至少一方之端部,且沿著前述長度方向分別呈錘狀或山狀地突出,且包含前述長度方向之前端的高度與其他突出部不同的突出部。In order to achieve the object of solving the above problems, the contact probe of the present invention is a needle-shaped conductive contact probe which is expandable and contractable in the longitudinal direction, and is characterized in that it has a plurality of protruding portions which are provided in An end portion of at least one of the longitudinal directions protrudes in a hammer shape or a mountain shape along the longitudinal direction, and includes a protruding portion having a height at a front end in the longitudinal direction different from that of the other protruding portions.

此外,本發明之接觸探針在上述發明中,係具備:第1柱塞(plunger),具有前述複數個突出部;第2柱塞,位於前述長度方向之端部,該端部係為前述第1柱塞所在之端部不同之端部;及線圈彈簧,用以連結前述第1柱塞與前述第2柱塞,且沿著前述長度方向伸縮自如。Further, in the above-described invention, the contact probe according to the present invention includes: a first plunger having a plurality of protruding portions; and a second plunger located at an end portion in the longitudinal direction, wherein the end portion is the aforementioned The end portion of the first plunger is different from the end portion, and the coil spring is configured to connect the first plunger and the second plunger, and expand and contract along the longitudinal direction.

此外,本發明之接觸探針在上述發明中,前述線圈彈簧係具有:密捲繞部,線材係被密實地捲繞,且一端部係安裝於前述第1及第2柱塞之一方;及疏捲繞部,由從前述密捲繞部之另一端部連續延伸之線材從另一端部起隔開預定間距地捲繞而成,而未與前述密捲繞部連接之側的端部則安裝於前述第1及第2柱塞的另一方;安裝有前述疏捲繞部之前述第1及第2柱塞之另一方,係至少在檢查時之荷重施加在該接觸探針而使前述線圈彈簧收縮之狀態下,進入至前述密捲繞部的內周側。Further, in the contact probe of the present invention, the coil spring has a densely wound portion, the wire is densely wound, and one end portion is attached to one of the first and second plungers; The unwinding portion is formed by winding a wire extending continuously from the other end portion of the densely wound portion at a predetermined pitch from the other end portion, and the end portion on the side not connected to the densely wound portion is formed Mounted on the other of the first and second plungers; and the other of the first and second plungers to which the unwinding portion is attached, at least the load at the time of inspection is applied to the contact probe to cause the aforementioned When the coil spring is contracted, it enters the inner peripheral side of the dense winding portion.

此外,本發明之接觸探針在上述發明中,前述第1柱塞係具有插通於前述線圈彈簧之第1基端部;前述第2柱塞係具有插通於前述線圈彈簧之第2基端部,該第2基端部之前述長度方向之長度比前述第1基端部短;前述密捲繞部係安裝於前述第1柱塞。Further, in the contact probe of the present invention, the first plunger has a first base end that is inserted into the coil spring, and the second plunger has a second base that is inserted into the coil spring. The end portion has a length in the longitudinal direction of the second proximal end portion that is shorter than the first proximal end portion, and the densely wound portion is attached to the first plunger.

此外,本發明之探針單元係具備:上述發明所述之複數個接觸探針;及探針固持器,形成有複數個在一面使前述接觸探針之兩端部顯露於外部一面防止其脫落的狀態下保持該接觸探針之保持孔,且至少表面具有絕緣性。Further, the probe unit of the present invention includes: the plurality of contact probes according to the above aspect of the invention; and the probe holder, wherein a plurality of the contact probes are formed on one surface to prevent the both ends of the contact probe from being exposed to the outside The holding hole of the contact probe is held in a state where at least the surface is insulative.

依據本發明,由於具備複數個突出部,該等突出部係設於長度方向之至少一方之端部,且沿著長度方向分別呈錘狀或山狀地突出,且包括沿著長度方向之前端的高度與其他突出部不同之突出部,因此複數個突出部與接觸對象之球狀電極接觸的時間點(timing)會不一致,先接觸到之一方的突出端會一邊擦刮球狀電極一邊移動。因此,可將存在於接觸對象之球狀電極之表面的氧化被膜確實地削落,並且可確保穩定的導通。According to the invention, the plurality of protruding portions are provided at the end portions of at least one of the longitudinal directions, and protrude in a hammer shape or a mountain shape along the longitudinal direction, and include the front end along the longitudinal direction. Since the protrusions are different in height from the other protrusions, the timing at which the plurality of protrusions are in contact with the spherical electrodes of the contact object may be different, and the one end of the contact first will move while wiping the spherical electrode. Therefore, the oxide film existing on the surface of the spherical electrode contacting the object can be surely chipped, and stable conduction can be ensured.

以下參照所附圖式來說明用以實施本發明之形態(以下稱「實施形態」)。另外,圖式係為示意者,各部分之厚度與寬度的關係、各個部分之厚度的比率等,應注意有與實際者不同之情形,當然在圖式彼此間亦包含有彼此尺寸之關係或比率不同之部分的情形。The form for carrying out the invention (hereinafter referred to as "embodiment") will be described below with reference to the drawings. In addition, the drawings are schematic, the relationship between the thickness and the width of each part, the ratio of the thickness of each part, etc., should be noted that there are cases different from the actual ones. Of course, the drawings also include the relationship of each other's dimensions or The case of a different ratio.

第1圖係為顯示本發明之一實施形態之探針單元之構成之斜視圖。第2圖係為顯示本實施形態之探針單元之主要部分之構成的局部剖面圖。此等圖所示之探針單元1,係用以將半導體封裝件100與對於半導體封裝件100輸出檢查用信號之配線基板200之間予以電性連接者,且在進行屬於檢查對象物之半導體封裝件100之電性特性檢查時所使用的裝置(測試插座(test socket))。Fig. 1 is a perspective view showing the configuration of a probe unit according to an embodiment of the present invention. Fig. 2 is a partial cross-sectional view showing the configuration of a main part of the probe unit of the embodiment. The probe unit 1 shown in these figures is used to electrically connect the semiconductor package 100 to the wiring substrate 200 for outputting an inspection signal to the semiconductor package 100, and to perform semiconductors belonging to the inspection object. The device (test socket) used in the inspection of the electrical characteristics of the package 100.

探針單元1係具備:導電性接觸探針2,分別與在長度方向之兩端彼此不同之二個屬於被接觸體之半導體封裝件100及配線基板200接觸;探針固持器3,將複數個接觸探針2依照預定的樣式(pattern)予以收容並保持,且至少表面具有絕緣性;及絕緣性基座(base)構件4,以包圍探針固持器3之外周的方式配置,將探針固持器3予以固定並保持,並且抑制檢查時之半導體封裝件100的位置偏移。The probe unit 1 includes a conductive contact probe 2 that is in contact with the semiconductor package 100 and the wiring substrate 200 that are different from each other in the longitudinal direction at both ends in the longitudinal direction, and the probe holder 3 has a plurality of probe holders 3 The contact probes 2 are housed and held in accordance with a predetermined pattern, and at least the surface is insulative; and an insulating base member 4 is disposed so as to surround the outer periphery of the probe holder 3, The needle holder 3 is fixed and held, and the positional deviation of the semiconductor package 100 at the time of inspection is suppressed.

接觸探針2係具有:第1柱塞21,用以與半導體封裝件100之球狀電極101接觸;第2柱塞22,位於接觸探針2之長度方向之端部,且用以與配線基板200之電極201接觸,該端部係為第1柱塞21所在之端部不同之端部;及線圈彈簧23,用以連結第1柱塞21與第2柱塞22,且沿著接觸探針2之長度方向伸縮自如。第1柱塞21、第2柱塞22及線圈彈簧23係具有相同的軸線。The contact probe 2 has a first plunger 21 for contacting the spherical electrode 101 of the semiconductor package 100, and a second plunger 22 located at an end portion of the contact probe 2 in the longitudinal direction and used for wiring. The electrode 201 of the substrate 200 is in contact with the end portion of the end portion where the first plunger 21 is located, and the coil spring 23 is connected to the first plunger 21 and the second plunger 22, and is in contact with each other. The length direction of the probe 2 is stretchable and freely. The first plunger 21, the second plunger 22, and the coil spring 23 have the same axis.

第1柱塞21係具有:前端部21a,用以與半導體封裝件100之球狀電極101接觸;凸緣(flange)部21b,設於前端部21a之基端側,具有較前端部21a之直徑更大的直徑;圓柱狀凸軸(boss)部21c,相對於凸緣部21b設於與前端部21a之相反側,具有直徑較凸緣部21b之直徑小且與線圈彈簧23之內徑大致相等的直徑,且供線圈彈簧23之一端部壓入;及基端部(第1基端部)21d,相對於凸軸部21c設於與凸緣部21b之相反側,形成直徑較線圈彈簧23之內徑小之圓柱狀而從凸軸部21c延伸。The first plunger 21 has a distal end portion 21a for contacting the spherical electrode 101 of the semiconductor package 100, and a flange portion 21b provided on the proximal end side of the distal end portion 21a and having a front end portion 21a. The diameter of the larger diameter; the cylindrical boss portion 21c is provided on the opposite side of the front end portion 21a with respect to the flange portion 21b, and has a diameter smaller than the diameter of the flange portion 21b and the inner diameter of the coil spring 23. The coil springs 23 are pressurized at substantially the same diameter, and the base end portion (first base end portion) 21d is provided on the opposite side of the flange portion 21b with respect to the convex shaft portion 21c to form a coil having a smaller diameter. The spring 23 has a cylindrical shape with a small inner diameter and extends from the convex shaft portion 21c.

第3圖係為從第2圖之箭頭A方向觀看前端部21a時之俯視圖。另外,第2圖所示之前端部21a,係顯現從第3圖之箭頭B方向觀看時之側面。如第3圖所示,前端部21a係具有沿著接觸探針2之長度方向分別呈錘狀地突出之4個突出部211a。4個突出部211a中之位於第3圖中中央部靠左側之2個突出部211a之前端在長度方向的高度(突出量),係較位於第3圖中中央部靠右側之2個突出部211a之前端在長度方向的高度更大。此高度的差異,係以彼此高度不同之2個突出部211a之前端彼此之距離之3至25%左右為佳。Fig. 3 is a plan view showing the front end portion 21a as seen from the direction of the arrow A in Fig. 2 . Further, the front end portion 21a shown in Fig. 2 shows the side surface when viewed from the direction of the arrow B in Fig. 3 . As shown in FIG. 3, the distal end portion 21a has four protruding portions 211a that protrude in a hammer shape along the longitudinal direction of the contact probe 2. Among the four protruding portions 211a, the height of the front end of the two protruding portions 211a located on the left side of the central portion in the third figure in the longitudinal direction (the amount of protrusion) is two protrusions on the right side of the central portion in the third figure. The front end of 211a has a greater height in the length direction. The difference in height is preferably about 3 to 25% of the distance between the front ends of the two protruding portions 211a which are different in height from each other.

第2柱塞22係具有:呈大致圓錘狀之前端部22a;凸緣部22b,設於前端部22a之基端側,且具有較前端部22a之直徑更大的直徑;圓柱狀凸軸部22c,相對於凸緣部22b設於與前端部22a之相反側,具有較凸緣部22b之直徑小且與線圈彈簧23之內徑大致相等的直徑,且供線圈彈簧23之另一端部壓入;及基端部(第2基端部)22d,相對於凸軸部22c設於與凸緣部22b之相反側,呈直徑較凸軸部22c小且直徑較線圈彈簧23之內徑小的圓柱狀而從凸軸部22c延伸。接觸探針2之長度方向中之基端部22d之長度,係較第1柱塞21之基端部21d之長度長。The second plunger 22 has a substantially round hammer-shaped front end portion 22a. The flange portion 22b is provided on the proximal end side of the distal end portion 22a and has a diameter larger than the diameter of the distal end portion 22a. The cylindrical convex shaft The portion 22c is provided on the opposite side of the front end portion 22a with respect to the flange portion 22b, and has a diameter smaller than the diameter of the flange portion 22b and substantially equal to the inner diameter of the coil spring 23, and the other end portion of the coil spring 23 is provided. The press-fit and the base end portion (second base end portion) 22d are provided on the opposite side of the flange portion 22b from the convex shaft portion 22c, and have a smaller diameter than the convex shaft portion 22c and a diameter smaller than the inner diameter of the coil spring 23. The small cylindrical shape extends from the convex shaft portion 22c. The length of the base end portion 22d in the longitudinal direction of the contact probe 2 is longer than the length of the base end portion 21d of the first plunger 21.

線圈彈簧23係具備:密捲繞部23a,線材係被密實地捲繞;及疏捲繞部23b,由從密捲繞部23a之一端部連續延伸之線材從該一端部起隔開預定間距地捲繞而成。密捲繞部23a之端部係壓入於第1柱塞21之凸軸部21c,另一方面,疏捲繞部23b之端部係壓入於第2柱塞22之凸軸部22c。另外,亦可藉由彈簧的捲繞力及/或焊接將第1柱塞21及第2柱塞22與線圈彈簧23予以接合。The coil spring 23 includes a densely wound portion 23a in which the wire is densely wound, and a sparsely wound portion 23b that is spaced apart from the one end portion by a predetermined distance from the one end portion of the densely wound portion 23a. The ground is wound up. The end portion of the densely wound portion 23a is press-fitted into the convex shaft portion 21c of the first plunger 21, and the end portion of the sparsely wound portion 23b is press-fitted into the convex shaft portion 22c of the second plunger 22. Further, the first plunger 21 and the second plunger 22 may be joined to the coil spring 23 by the winding force and/or welding of the spring.

在具有以上構成之接觸探針2中,第2柱塞22之基端部22d之長度與線圈彈簧23之密捲繞部23a之長度,係設為至少在檢查時之荷重施加於接觸探針2而使線圈彈簧23收縮之狀態下,使基端部22d之一部分進入至密捲繞部23a之內周側。In the contact probe 2 having the above configuration, the length of the base end portion 22d of the second plunger 22 and the length of the tightly wound portion 23a of the coil spring 23 are set to be applied to the contact probe at least at the time of inspection. 2, in a state where the coil spring 23 is contracted, one portion of the proximal end portion 22d is brought into the inner peripheral side of the densely wound portion 23a.

接觸探針2係使用貴金屬或貴金屬合金而形成。在此所稱之貴金屬係指例如金(Au)、銀(Ag)、鉑(Pt)、鈀(Pd)、銠(Rh)等。本實施形態中適用之貴金屬或貴金屬合金,係以維克氏(vickers)硬度(HV)為400以上、且電阻率為5.00×10-8 Ω‧m以下為佳。另外,亦可使用銅、銅合金、鐵、鎢、鈹合金等作為接觸探針2的材料。The contact probe 2 is formed using a noble metal or a noble metal alloy. The noble metal referred to herein means, for example, gold (Au), silver (Ag), platinum (Pt), palladium (Pd), rhodium (Rh), or the like. The noble metal or noble metal alloy to which the present embodiment is applied has a Vickers hardness (HV) of 400 or more and a specific resistance of 5.00 × 10 -8 Ω ‧ m or less. Further, copper, a copper alloy, iron, tungsten, a tantalum alloy or the like may be used as the material of the contact probe 2.

接觸探針2之直徑係為數十μm至數百μm左右。此外,接觸探針2之長度方向之長度係為數mm至數十mm左右。The diameter of the contact probe 2 is about several tens of μm to several hundreds of μm. Further, the length of the contact probe 2 in the longitudinal direction is about several mm to several tens of mm.

接著說明探針固持器3的構成。探針固持器3係將第1基板31及第2基板32在厚度方向(第2圖之上下方向)疊層而構成。Next, the configuration of the probe holder 3 will be described. The probe holder 3 is configured by laminating the first substrate 31 and the second substrate 32 in the thickness direction (the lower direction in the second drawing).

在第1基板31中,係設有朝板厚方向貫通之複數個保持孔33。保持孔33之形成位置,係依據半導體封裝件100之配線樣式來決定。保持孔33係為附有階梯的孔,該附有階梯的孔係具有:圓筒狀小徑部33a,可插通於第1柱塞21之前端部21a;及圓筒狀大徑部33b,直徑較小徑部33a大,而且形成與小徑部33a同軸。大徑部33b之直徑係較線圈彈簧23之外徑大,且具有荷重施加於線圈彈簧23而收縮時可彎曲的間隙。小徑部33a之直徑係較第1柱塞21之凸緣部21b之直徑小。因此,在第2圖所示之狀態下,凸緣部21b係藉由抵接於小徑部33a與大徑部33b之邊界壁面,而防止從探針固持器3脫落。In the first substrate 31, a plurality of holding holes 33 penetrating in the thickness direction are provided. The position at which the hole 33 is formed is determined in accordance with the wiring pattern of the semiconductor package 100. The holding hole 33 is a stepped hole having a cylindrical small diameter portion 33a that can be inserted into the front end portion 21a of the first plunger 21, and a cylindrical large diameter portion 33b. The smaller diameter portion 33a is larger and is formed coaxially with the small diameter portion 33a. The diameter of the large diameter portion 33b is larger than the outer diameter of the coil spring 23, and has a gap that can be bent when the load is applied to the coil spring 23 and contracted. The diameter of the small diameter portion 33a is smaller than the diameter of the flange portion 21b of the first plunger 21. Therefore, in the state shown in Fig. 2, the flange portion 21b is prevented from coming off the probe holder 3 by abutting against the boundary wall surface between the small diameter portion 33a and the large diameter portion 33b.

在第2基板32中,係設有與第1基板31所具有之複數個保持孔33對應之複數個保持孔34。保持孔34係與設於第1基板31之複數個保持孔33之任一者以同軸方式連通,且與保持孔33一同形成固持器孔。保持孔34係為附有階梯的孔,該附有階段的孔係具有:圓筒狀小徑部34a,可插通於第2柱塞22之前端部22a;及圓筒狀大徑部34b,直徑較小徑部34a大,而且形成與小徑部34a同軸。小徑部34a之直徑係較第2柱塞22之凸緣部22b之直徑小。因此,在第2圖所示之狀態下,凸緣部22b係藉由抵接於小徑部34a與大徑部34b之邊界壁面,而防止從探針固持器3脫落。大徑部34b之直徑係與保持孔33之大徑部33b之直徑相等,且較線圈彈簧23之外徑大。In the second substrate 32, a plurality of holding holes 34 corresponding to the plurality of holding holes 33 of the first substrate 31 are provided. The holding hole 34 is coaxially connected to any of the plurality of holding holes 33 provided in the first substrate 31, and forms a holder hole together with the holding hole 33. The holding hole 34 is a stepped hole having a cylindrical small diameter portion 34a that can be inserted into the front end portion 22a of the second plunger 22, and a cylindrical large diameter portion 34b. The smaller diameter portion 34a is larger and is formed coaxially with the small diameter portion 34a. The diameter of the small diameter portion 34a is smaller than the diameter of the flange portion 22b of the second plunger 22. Therefore, in the state shown in Fig. 2, the flange portion 22b is prevented from coming off the probe holder 3 by abutting against the boundary wall surface between the small diameter portion 34a and the large diameter portion 34b. The diameter of the large diameter portion 34b is equal to the diameter of the large diameter portion 33b of the holding hole 33, and is larger than the outer diameter of the coil spring 23.

保持孔33、34係藉由進行鑽孔(drill)加工、蝕刻(etching)、衝切成形、或進行使用雷射、電子束、離子束、線放電等加工來形成。The holding holes 33, 34 are formed by drilling, etching, punching, or processing using a laser, an electron beam, an ion beam, a wire discharge, or the like.

具有以上構成之探針固持器3,係可使用樹脂、可加工陶瓷(machinable ceramic)、矽等中任一者的絕緣性材料來形成,亦可藉由以金屬或合金作為母材,在該母材表面設置樹脂等之絕緣被膜來形成。The probe holder 3 having the above configuration may be formed of an insulating material such as a resin, a machinable ceramic, or a crucible, or may be formed of a metal or an alloy as a base material. An insulating film such as a resin is formed on the surface of the base material.

在探針固持器3中,相鄰之固持器孔的間距係為數十μm至數百μm左右。In the probe holder 3, the pitch of the adjacent holder holes is about several tens of μm to several hundreds of μm.

接著說明半導體封裝件100在檢查時之接觸探針2的動作。當半導體封裝件100之球狀電極101在接近探針單元1而與接觸探針2之第1柱塞21開始接觸時,在接觸探針2中,僅具有沿著長度方向突出量較大之前端的突出部211a(第3圖之中央部靠左側之2個突出部211a)會與球狀電極101接觸。因此,在此狀態下,前端部21a與球狀電極101的接觸係處於不穩定的狀況。Next, the operation of the semiconductor package 100 to contact the probe 2 at the time of inspection will be described. When the spherical electrode 101 of the semiconductor package 100 comes into contact with the first plunger 21 of the contact probe 2 in proximity to the probe unit 1, the contact probe 2 has only a large amount of protrusion in the longitudinal direction. The protruding portion 211a of the end (the two protruding portions 211a on the left side in the central portion of Fig. 3) is in contact with the spherical electrode 101. Therefore, in this state, the contact between the distal end portion 21a and the spherical electrode 101 is unstable.

之後,當半導體封裝件100進一步接近接觸探針2時,線圈彈簧23即開始收縮。此時,第1柱塞21係由與球狀電極101接觸之突出部211a保持與球狀電極101的接觸,另一方面,未與球狀電極101接觸之突出部211a則逐漸接近球狀電極101。之後,當所有突出部211a皆與球狀電極101接觸時,球狀電極101即成為藉由4個突出部211a而穩定地保持的狀態。在此狀態下,第1柱塞21之長度方向係相對於保持孔33之長度方向稍微傾斜。Thereafter, when the semiconductor package 100 is further brought close to the contact probe 2, the coil spring 23 starts to contract. At this time, the first plunger 21 is held in contact with the spherical electrode 101 by the protruding portion 211a that is in contact with the spherical electrode 101, and the protruding portion 211a that is not in contact with the spherical electrode 101 is gradually approaching the spherical electrode. 101. After that, when all of the protruding portions 211a are in contact with the spherical electrode 101, the spherical electrode 101 is stably held by the four protruding portions 211a. In this state, the longitudinal direction of the first plunger 21 is slightly inclined with respect to the longitudinal direction of the holding hole 33.

先與球狀電極101接觸的突出部211a,係在剩餘之突出部211a與球狀電極101接觸的期間,由於一面擦刮球狀電極101之表面一面移動,因此可將球狀電極101之表面的氧化被膜予以去除。The protruding portion 211a that first contacts the spherical electrode 101 is such that the surface of the spherical electrode 101 is moved while the remaining protruding portion 211a is in contact with the spherical electrode 101, so that the surface of the spherical electrode 101 can be moved. The oxide film is removed.

在所有突出部211a與球狀電極101接觸的狀態下,線圈彈簧23係以隨著第1柱塞21之旋轉而彎曲的態樣收縮。因此,第2柱塞22之基端部22d不僅會進入至密捲繞部23a的內周側,且基端部22d之側面的一部分亦被推壓於密捲繞部23a的內側面。結果,在基端部22d與密捲繞部23a之間,會產生比線圈彈簧23未彎曲時更大的接觸壓,而可確保穩定的導通。在此種接觸探針2中,可防止在檢查時信號流通至疏捲繞部23b,且可實現電感或電阻的降低及穩定化。In a state where all the protruding portions 211a are in contact with the spherical electrode 101, the coil spring 23 contracts in a state of being bent in accordance with the rotation of the first plunger 21. Therefore, the base end portion 22d of the second plunger 22 not only enters the inner peripheral side of the densely wound portion 23a, but also a part of the side surface of the proximal end portion 22d is pressed against the inner side surface of the densely wound portion 23a. As a result, a larger contact pressure is generated between the base end portion 22d and the densely wound portion 23a than when the coil spring 23 is not bent, and stable conduction can be ensured. In such a contact probe 2, it is possible to prevent the signal from flowing to the unwinding portion 23b at the time of inspection, and it is possible to reduce and stabilize the inductance or the resistance.

依據以上所說明之本發明之一實施形態,由於具備包括設於長度方向之至少一方之端部,且分別沿著長度方向呈錘狀地突出,而沿著長度方向之前端的高度與其他不同者的複數個突出部,因此複數個突出部與接觸對象之球狀電極接觸的時間點會不一致,先接觸到之一方的突出端會一邊擦刮球狀電極一邊移動。因此,可將存在於接觸對象之球狀電極之表面的氧化被膜確實地削落,並且可確保穩定的導通。According to one embodiment of the present invention, the end portion provided in at least one of the longitudinal directions is protruded in a hammer shape along the longitudinal direction, and the height at the front end along the longitudinal direction is different from the others. Since the plurality of protrusions are in contact with the spherical electrodes of the contact object, the time at which the protrusions are in contact with one another will move while wiping the spherical electrodes. Therefore, the oxide film existing on the surface of the spherical electrode contacting the object can be surely chipped, and stable conduction can be ensured.

另外,在本發明中,亦可設為與上述之實施形態同樣地在形成第1柱塞之前端部時,彼此正交之2個V字形溝的底部,於加工後通過分別從成為前端部之部分之端面之圓的中心偏移之位置。在此情形下,長度方向中之突出部之前端的高度會成為3種。此外,2個V字形溝亦可形成為彼此不正交。Further, in the present invention, in the same manner as in the above-described embodiment, when the end portion of the first plunger is formed, the bottoms of the two V-shaped grooves which are orthogonal to each other may be passed from the front end portion to the front end portion after the processing. The position of the center offset of the circle of the end face. In this case, the height of the front end of the protruding portion in the longitudinal direction becomes three. Further, the two V-shaped grooves may be formed not to be orthogonal to each other.

此外,在本發明中,亦可設為第1柱塞之前端部具有3個以上V字形溝。在此情形下,亦設為至少1個溝的底部係通過從前端部之長度方向之中心軸偏移的位置。Further, in the present invention, it is also possible to have three or more V-shaped grooves at the end portions of the first plunger. In this case, it is also assumed that the bottom of at least one groove is displaced from the central axis of the longitudinal direction of the distal end portion.

此外,在本發明中,亦可設為第1柱塞的前端部具有呈長度方向中之高度彼此不同之山狀的2個突起部。Further, in the present invention, the front end portion of the first plunger may have two mountain portions having different heights in the longitudinal direction.

此外,在本發明中,亦可設成為將接觸探針之長度方向中之第1基端部之長度設為較第2基端部之長度長,且將疏捲繞部之端部壓入於第1柱塞的凸軸部,另一方面將密捲繞部之端部壓入於第2柱塞之凸軸部的構成。在此情形下,係至少在檢查時之荷重施加在接觸探針而使線圈彈簧收縮之狀態下,使第1基端部進入至密捲繞部的內周側。在具有此種構成之接觸探針中,第1柱塞於檢查時會旋轉而成為傾斜的狀態,而第1柱塞之基端部即進入至線圈彈簧之密捲繞部的內周部,因此第1柱塞之基端部之側面之一部分在被推壓於密捲繞部之內側面的狀態下接觸。因此,與上述實施形態相同,可確保穩定的導通。Further, in the present invention, the length of the first base end portion in the longitudinal direction of the contact probe may be longer than the length of the second base end portion, and the end portion of the sparse winding portion may be pressed. On the other hand, the convex shaft portion of the first plunger is configured to press the end portion of the densely wound portion into the convex shaft portion of the second plunger. In this case, the first base end portion is brought into the inner peripheral side of the densely wound portion in a state where the load is applied to the contact probe and the coil spring is contracted at least during the inspection. In the contact probe having such a configuration, the first plunger rotates and is tilted during the inspection, and the base end portion of the first plunger enters the inner peripheral portion of the tightly wound portion of the coil spring. Therefore, one of the side faces of the base end portion of the first plunger comes into contact with the inner side surface of the densely wound portion. Therefore, as in the above embodiment, stable conduction can be ensured.

此外,在本發明中,亦可適用前端部具有與第1柱塞21之前端部21a相同之前端形狀的第2柱塞。此時,較佳為亦考慮線圈彈簧23之彎曲,來決定第1柱塞21之前端部21a與第2柱塞之前端部之位置關係。Further, in the present invention, the second plunger having the same end shape as the front end portion 21a of the first plunger 21 may be applied to the distal end portion. At this time, it is preferable to determine the positional relationship between the front end portion 21a of the first plunger 21 and the front end portion of the second plunger in consideration of the bending of the coil spring 23.

此外,在本發明中,亦可將至少第1及第2突出部之表面,以電場鍍覆或鍍金等之鍍覆被膜來覆蓋。藉此,即可提升第1及第2突出部之耐久性。Further, in the present invention, at least the surfaces of the first and second protruding portions may be covered with a plating film such as electric field plating or gold plating. Thereby, the durability of the first and second protruding portions can be improved.

另外,本發明之探針單元並非僅限適用於半導體封裝件檢查用之測試插座。亦即,本發明之探針單元亦可適於作為液晶面板或晶圓等檢查用來使用。In addition, the probe unit of the present invention is not limited to test sockets suitable for inspection of semiconductor packages. That is, the probe unit of the present invention can also be suitably used for inspection as a liquid crystal panel or wafer.

此外,本發明之接觸探針在作為半導體封裝件等之檢查用以外,尚可適於作為將例如複合式(hybrid)汽車之構成零件間予以電性連接之連接器(connector)來使用。適用作為此種連接器時之接觸探針的直徑,係較上述實施形態中所說明之接觸探針的直徑大。Further, the contact probe of the present invention can be suitably used as a connector for electrically connecting constituent components of, for example, a hybrid automobile, in addition to inspection for a semiconductor package or the like. The diameter of the contact probe used as such a connector is larger than the diameter of the contact probe described in the above embodiment.

如此,本發明可包括在此未記載之各種實施形態,只要在不脫離由申請專利範圍所特定之技術思想之範圍內,均可作各種設計變更等。As described above, the present invention can be embodied in various embodiments that are not described herein, and various design changes and the like can be made without departing from the scope of the technical scope of the invention.

[產業上之可利用性][Industrial availability]

綜上所述,本發明之接觸探針係可將存在於接觸對象之球狀電極之表面的氧化被膜確實地削落,並且有助於確保穩定的導通。As described above, the contact probe of the present invention can surely cut off the oxide film existing on the surface of the spherical electrode contacting the object and contribute to ensuring stable conduction.

1‧‧‧探針單元1‧‧‧ probe unit

2‧‧‧接觸探針2‧‧‧Contact probe

3‧‧‧探針固持器3‧‧‧Probe Holder

4‧‧‧基座構件4‧‧‧Base member

21‧‧‧第1柱塞21‧‧‧1st plunger

21a、22a‧‧‧前端部21a, 22a‧‧‧ front end

21b、22b‧‧‧凸緣部21b, 22b‧‧‧Flange

21c、22c‧‧‧凸軸部21c, 22c‧‧‧ convex axis

21d、22d‧‧‧基端部21d, 22d‧‧‧ base end

22‧‧‧第2柱塞22‧‧‧2nd plunger

23‧‧‧線圈彈簧23‧‧‧ coil spring

23a‧‧‧密捲繞部23a‧‧‧Dense winding department

23b‧‧‧疏捲繞部23b‧‧‧Sparging Department

31‧‧‧第1基板31‧‧‧1st substrate

32‧‧‧第2基板32‧‧‧2nd substrate

33、34‧‧‧保持孔33, 34‧‧‧ Keep the hole

33a、34a‧‧‧小徑部33a, 34a‧‧‧ Small Trails Department

33b、34b‧‧‧大徑部33b, 34b‧‧‧The Great Trails Department

100‧‧‧半導體封裝件100‧‧‧Semiconductor package

101‧‧‧球狀電極101‧‧‧Spherical electrode

200‧‧‧配線基板200‧‧‧Wiring substrate

201‧‧‧電極201‧‧‧ electrodes

211a‧‧‧突出部211a‧‧‧Protruding

第1圖係為顯示本發明之一實施形態之探針單元之整體構成的斜視圖。Fig. 1 is a perspective view showing the overall configuration of a probe unit according to an embodiment of the present invention.

第2圖係為顯示本發明之一實施形態之探針單元之主要部分之構成圖。Fig. 2 is a view showing the configuration of a main part of a probe unit according to an embodiment of the present invention.

第3圖係為顯示本發明之一實施形態之接觸探針之第1柱塞之前端部之形狀的俯視圖。Fig. 3 is a plan view showing the shape of the end portion of the first plunger of the contact probe according to the embodiment of the present invention.

1...探針單元1. . . Probe unit

2...接觸探針2. . . Contact probe

3...探針固持器3. . . Probe holder

4...基座構件4. . . Base member

100...半導體封裝件100. . . Semiconductor package

200...配線基板200. . . Wiring substrate

Claims (7)

一種接觸探針,其係呈可沿著長度方向伸縮之針狀之導電性接觸探針,其特徵為,具備四個突出部,該等突出部係藉由形成為彼此不正交的二個V字形的溝而設於前述長度方向之至少一方之端部,且沿著前述長度方向分別呈錘狀或山狀地突出,且包含前述長度方向之前端高度與其他突出部不同的突出部。 A contact probe which is a needle-shaped conductive contact probe which is expandable and contractible in the longitudinal direction, and is characterized in that it has four protruding portions which are formed by two non-orthogonal The V-shaped groove is provided at an end portion of at least one of the longitudinal directions, and protrudes in a hammer shape or a mountain shape along the longitudinal direction, and includes a protruding portion having a height at a front end in the longitudinal direction different from that of the other protruding portions. 如申請專利範圍第1項所述之接觸探針,其中,具備:第1柱塞(plunger),具有前述複數個突出部;第2柱塞,位於前述長度方向之端部,該端部係為前述第1柱塞所在之端部不同之端部;及線圈彈簧,用以連結前述第1柱塞與前述第2柱塞,且沿著前述長度方向伸縮自如。 The contact probe according to claim 1, further comprising: a first plunger having a plurality of protrusions; and a second plunger located at an end portion in the longitudinal direction, the end portion being An end portion of the end portion where the first plunger is located; and a coil spring for connecting the first plunger and the second plunger, and being expandable and contractible along the longitudinal direction. 如申請專利範圍第2項所述之接觸探針,其中,前述線圈彈簧係具有:密捲繞部,線材係被密實地捲繞,且一端部係安裝於前述第1及第2柱塞之一方;及疏捲繞部,由從前述密捲繞部之另一端部連續延伸之線材從該另一端部起隔開預定間距地捲繞而成,而未與前述密捲繞部連接之側的端部則安裝於前述第1及第2柱塞的另一方;安裝有前述疏捲繞部之前述第1及第2柱塞之另一方,係至少在檢查時之荷重施加在該接觸探針而使前述線圈彈簧收縮之狀態下,進入至前述密捲繞部的內周 側。 The contact probe according to claim 2, wherein the coil spring has a densely wound portion, the wire is densely wound, and one end portion is attached to the first and second plungers. The one side and the sparsely wound portion are formed by winding a wire extending continuously from the other end portion of the densely wound portion from the other end portion at a predetermined pitch, and not being connected to the densely wound portion The other end is attached to the other of the first and second plungers; and the other of the first and second plungers to which the unwinding portion is attached is applied to the contact probe at least during inspection. a state in which the coil spring is contracted by the needle, and enters the inner circumference of the dense winding portion side. 如申請專利範圍第1項所述之接觸探針,其中,前述線圈彈簧係具有:密捲繞部,線材係被密實地捲繞,且一端部係安裝於前述第1及第2柱塞之一方;及疏捲繞部,由從前述密捲繞部之另一端部連續延伸之線材從該另一端部起隔開預定間距地捲繞而成,而未與前述密捲繞部連接之側的端部則安裝於前述第1及第2柱塞的另一方;安裝有前述疏捲繞部之前述第1及第2柱塞之另一方,係至少在檢查時之荷重施加在該接觸探針而使前述線圈彈簧收縮之狀態下,進入至前述密捲繞部的內周側。 The contact probe according to claim 1, wherein the coil spring has a densely wound portion, the wire is densely wound, and one end portion is attached to the first and second plungers. The one side and the sparsely wound portion are formed by winding a wire extending continuously from the other end portion of the densely wound portion from the other end portion at a predetermined pitch, and not being connected to the densely wound portion The other end is attached to the other of the first and second plungers; and the other of the first and second plungers to which the unwinding portion is attached is applied to the contact probe at least during inspection. The needle is brought into the inner peripheral side of the densely wound portion in a state where the coil spring is contracted. 如申請專利範圍第4項所述之接觸探針,其中,前述第1柱塞係具有插通於前述線圈彈簧之第1基端部;前述第2柱塞係具有插通於前述線圈彈簧之第2基端部,且該第2基端部之前述長度方向之長度比前述第1基端部短;前述密捲繞部係安裝於前述第1柱塞。 The contact probe according to claim 4, wherein the first plunger has a first base end that is inserted into the coil spring, and the second plunger has a coil spring inserted therein The second proximal end portion has a length in the longitudinal direction of the second proximal end portion that is shorter than the first proximal end portion, and the densely wound portion is attached to the first plunger. 如申請專利範圍第3項所述之接觸探針,其中,前述第1柱塞係具有插通於前述線圈彈簧之第1基端部;前述第2柱塞係具有插通於前述線圈彈簧之第2 基端部,且該第2基端部之前述長度方向之長度比前述第1基端部短;前述密捲繞部係安裝於前述第1柱塞。 The contact probe according to claim 3, wherein the first plunger has a first base end that is inserted into the coil spring, and the second plunger has a coil spring inserted therein 2nd The proximal end portion has a length in the longitudinal direction of the second proximal end portion that is shorter than the first proximal end portion, and the densely wound portion is attached to the first plunger. 一種探針單元,其特徵為具備:申請專利範圍第1至6項中任一項所述之複數個接觸探針;及探針固持器,形成有複數個在一面使前述接觸探針之兩端部顯露於外部一面防止其脫落的狀態下保持該接觸探針之兩端部的保持孔,且至少表面具有絕緣性。A probe unit, comprising: a plurality of contact probes according to any one of claims 1 to 6; and a probe holder formed with a plurality of contact probes on one side The end portion is exposed to the outside while being prevented from falling off, and the holding holes of both end portions of the contact probe are held, and at least the surface is insulative.
TW100141985A 2010-11-17 2011-11-17 Contact probe and probe unit TWI463141B (en)

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