TWI458027B - 半導體裝置及其製造方法 - Google Patents
半導體裝置及其製造方法 Download PDFInfo
- Publication number
- TWI458027B TWI458027B TW97134199A TW97134199A TWI458027B TW I458027 B TWI458027 B TW I458027B TW 97134199 A TW97134199 A TW 97134199A TW 97134199 A TW97134199 A TW 97134199A TW I458027 B TWI458027 B TW I458027B
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- semiconductor device
- resin
- manufacturing
- sealing layer
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/01—Manufacture or treatment
- H10D86/021—Manufacture or treatment of multiple TFTs
- H10D86/0214—Manufacture or treatment of multiple TFTs using temporary substrates
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
- G06K19/00—Record carriers for use with machines and with at least a part designed to carry digital markings
- G06K19/06—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code
- G06K19/067—Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components
- G06K19/07—Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components with integrated circuit chips
- G06K19/077—Constructional details, e.g. mounting of circuits in the carrier
- G06K19/07749—Constructional details, e.g. mounting of circuits in the carrier the record carrier being capable of non-contact communication, e.g. constructional details of the antenna of a non-contact smart card
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/80—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple passive components, e.g. resistors, capacitors or inductors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W42/00—Arrangements for protection of devices
- H10W42/60—Arrangements for protection of devices protecting against electrostatic charges or discharges, e.g. Faraday shields
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W44/00—Electrical arrangements for controlling or matching impedance
- H10W44/20—Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
- H10W74/111—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed
- H10W74/114—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed by a substrate and the encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
- H10W74/47—Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins
- H10W74/473—Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins containing a filler
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W44/00—Electrical arrangements for controlling or matching impedance
- H10W44/20—Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF]
- H10W44/241—Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF] for passive devices or passive elements
- H10W44/248—Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF] for passive devices or passive elements for antennas
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
- H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
- H10W70/69—Insulating materials thereof
- H10W70/695—Organic materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/01—Manufacture or treatment
- H10W74/012—Manufacture or treatment of encapsulations on active surfaces of flip-chip devices, e.g. forming underfills
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
- H10W74/15—Encapsulations, e.g. protective coatings characterised by their shape or disposition on active surfaces of flip-chip devices, e.g. underfills
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/721—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
- H10W90/724—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/731—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
- H10W90/734—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked insulating package substrate, interposer or RDL
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
- Y10T428/31515—As intermediate layer
- Y10T428/31522—Next to metal
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Thin Film Transistor (AREA)
- Power Engineering (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007232713 | 2007-09-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200935528A TW200935528A (en) | 2009-08-16 |
| TWI458027B true TWI458027B (zh) | 2014-10-21 |
Family
ID=40428799
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW97134199A TWI458027B (zh) | 2007-09-07 | 2008-09-05 | 半導體裝置及其製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US8459561B2 (https=) |
| JP (1) | JP5438934B2 (https=) |
| CN (1) | CN101803008B (https=) |
| TW (1) | TWI458027B (https=) |
| WO (1) | WO2009031482A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10703394B2 (en) | 2015-09-10 | 2020-07-07 | Kawasaki Jukogyo Kabushiki Kaisha | Method of producing electrode-equipped plate spring of railcar bogie |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1970951A3 (en) * | 2007-03-13 | 2009-05-06 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
| EP1970952A3 (en) * | 2007-03-13 | 2009-05-06 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
| US7804450B2 (en) * | 2007-07-20 | 2010-09-28 | Laird Technologies, Inc. | Hybrid antenna structure |
| JP2009205669A (ja) * | 2008-01-31 | 2009-09-10 | Semiconductor Energy Lab Co Ltd | 半導体装置 |
| US8563397B2 (en) * | 2008-07-09 | 2013-10-22 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
| JP2010041040A (ja) * | 2008-07-10 | 2010-02-18 | Semiconductor Energy Lab Co Ltd | 光電変換装置および光電変換装置の製造方法 |
| WO2010032611A1 (en) | 2008-09-19 | 2010-03-25 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
| WO2010035627A1 (en) * | 2008-09-25 | 2010-04-01 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| WO2010038596A1 (en) * | 2008-10-03 | 2010-04-08 | Semiconductor Energy Laboratory Co., Ltd. | Modulation circuit and semiconductor device including the same |
| CN102460721B (zh) * | 2009-06-05 | 2015-07-01 | 株式会社半导体能源研究所 | 光电转换装置及其制造方法 |
| WO2010140539A1 (en) * | 2009-06-05 | 2010-12-09 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and method for manufacturing the same |
| KR101732397B1 (ko) * | 2009-06-05 | 2017-05-04 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 광전 변환 장치 및 그의 제작 방법 |
| US9030359B2 (en) * | 2009-10-05 | 2015-05-12 | Teijin Fibers Limited | Communication sheet structure and information management system |
| KR101201720B1 (ko) * | 2010-07-29 | 2012-11-15 | 삼성디스플레이 주식회사 | 표시 장치 및 유기 발광 표시 장치 |
| US8633600B2 (en) * | 2010-09-21 | 2014-01-21 | Infineon Technologies Ag | Device and method for manufacturing a device |
| US8906749B2 (en) * | 2012-03-28 | 2014-12-09 | Infineon Technologies Ag | Method for fabricating a semiconductor device |
| DE102013210668A1 (de) * | 2013-06-07 | 2014-12-11 | Würth Elektronik GmbH & Co. KG | Verfahren zur Herstellung eines optischen Moduls |
| CN105409329B (zh) * | 2013-08-20 | 2017-10-24 | 大日本印刷株式会社 | 元件制造方法以及元件制造装置 |
| JP6398399B2 (ja) * | 2013-09-06 | 2018-10-03 | 富士電機株式会社 | 半導体装置およびその製造方法 |
| CN106663391B (zh) | 2013-12-02 | 2019-09-03 | 株式会社半导体能源研究所 | 显示装置及其制造方法 |
| US10290532B2 (en) * | 2017-05-19 | 2019-05-14 | Analog Devices Global | Forming an isolation barrier in an isolator |
| JP7070373B2 (ja) | 2018-11-28 | 2022-05-18 | 三菱電機株式会社 | 半導体装置の製造方法、半導体装置、電力変換装置 |
| CN110293687B (zh) * | 2019-06-05 | 2021-06-08 | 大连理工大学 | 一种聚醚酰亚胺多岐管板键合方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6403221B1 (en) * | 1999-10-13 | 2002-06-11 | Ajinomoto Co., Inc. | Epoxy resin composition, and adhesive film and prepreg using the composition, and multilayer printed-wiring board using them, and process for manufacturing the same |
| US20070117288A1 (en) * | 2005-11-23 | 2007-05-24 | Hidekazu Miyairi | Laser irradiation apparatus |
Family Cites Families (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05190582A (ja) | 1992-01-08 | 1993-07-30 | Oki Electric Ind Co Ltd | 樹脂封止半導体装置及びその製造方法 |
| JP2625654B2 (ja) * | 1995-04-28 | 1997-07-02 | 日本電気株式会社 | 半導体装置およびその製造方法 |
| JPH1092980A (ja) | 1996-09-13 | 1998-04-10 | Toshiba Corp | 無線カードおよびその製造方法 |
| TW484101B (en) * | 1998-12-17 | 2002-04-21 | Hitachi Ltd | Semiconductor device and its manufacturing method |
| JP2004078991A (ja) | 1998-12-17 | 2004-03-11 | Hitachi Ltd | 半導体装置およびその製造方法 |
| US6224965B1 (en) * | 1999-06-25 | 2001-05-01 | Honeywell International Inc. | Microfiber dielectrics which facilitate laser via drilling |
| JP2001044332A (ja) * | 1999-08-03 | 2001-02-16 | Shinko Electric Ind Co Ltd | 半導体装置 |
| TW558743B (en) | 2001-08-22 | 2003-10-21 | Semiconductor Energy Lab | Peeling method and method of manufacturing semiconductor device |
| KR100430001B1 (ko) | 2001-12-18 | 2004-05-03 | 엘지전자 주식회사 | 다층기판의 제조방법, 그 다층기판의 패드 형성방법 및 그다층기판을 이용한 반도체 패키지의 제조방법 |
| WO2004001848A1 (en) | 2002-06-19 | 2003-12-31 | Sten Bjorsell | Electronics circuit manufacture |
| US7485489B2 (en) * | 2002-06-19 | 2009-02-03 | Bjoersell Sten | Electronics circuit manufacture |
| JP4111116B2 (ja) * | 2002-12-05 | 2008-07-02 | 株式会社村田製作所 | 厚膜配線の形成方法及び積層型電子部品の製造方法 |
| JP4151421B2 (ja) * | 2003-01-23 | 2008-09-17 | セイコーエプソン株式会社 | デバイスの製造方法 |
| JP4828088B2 (ja) | 2003-06-05 | 2011-11-30 | 凸版印刷株式会社 | Icタグ |
| CN100524734C (zh) * | 2003-09-09 | 2009-08-05 | 三洋电机株式会社 | 含有电路元件和绝缘膜的半导体模块及其制造方法以及其应用 |
| CN1894796B (zh) * | 2003-12-15 | 2010-09-01 | 株式会社半导体能源研究所 | 薄膜集成电路器件的制造方法和非接触薄膜集成电路器件及其制造方法 |
| US7405665B2 (en) * | 2003-12-19 | 2008-07-29 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, RFID tag and label-like object |
| JP4989854B2 (ja) * | 2004-02-06 | 2012-08-01 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| WO2005076359A1 (en) | 2004-02-06 | 2005-08-18 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| US7381579B2 (en) | 2004-02-26 | 2008-06-03 | Samsung Sdi Co., Ltd. | Donor sheet, method of manufacturing the same, method of manufacturing TFT using the donor sheet, and method of manufacturing flat panel display device using the donor sheet |
| US20050233122A1 (en) * | 2004-04-19 | 2005-10-20 | Mikio Nishimura | Manufacturing method of laminated substrate, and manufacturing apparatus of semiconductor device for module and laminated substrate for use therein |
| US7259106B2 (en) * | 2004-09-10 | 2007-08-21 | Versatilis Llc | Method of making a microelectronic and/or optoelectronic circuitry sheet |
| JP5057703B2 (ja) * | 2005-05-31 | 2012-10-24 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| US7465674B2 (en) | 2005-05-31 | 2008-12-16 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method of semiconductor device |
| JP4845623B2 (ja) * | 2005-07-29 | 2011-12-28 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| WO2007013571A1 (en) | 2005-07-29 | 2007-02-01 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method of semiconductor device |
| WO2007020805A1 (en) | 2005-08-12 | 2007-02-22 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method of semiconductor device |
| JP5352048B2 (ja) * | 2005-08-12 | 2013-11-27 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| JP2007059821A (ja) * | 2005-08-26 | 2007-03-08 | Shinko Electric Ind Co Ltd | 配線基板の製造方法 |
| JP4628912B2 (ja) * | 2005-09-09 | 2011-02-09 | 信越化学工業株式会社 | 封止用エポキシ樹脂組成物 |
| JP2007173782A (ja) * | 2005-11-23 | 2007-07-05 | Semiconductor Energy Lab Co Ltd | レーザ照射装置 |
| CN101479747B (zh) * | 2006-06-26 | 2011-05-18 | 株式会社半导体能源研究所 | 包括半导体器件的纸及其制造方法 |
| JP2010500764A (ja) * | 2006-08-07 | 2010-01-07 | セミ−フォトニクス カンパニー リミテッド | 複数の半導体ダイを分離する方法 |
| EP1887497B1 (en) * | 2006-08-10 | 2015-05-27 | Fujitsu Limited | RFID tag |
| EP1970951A3 (en) | 2007-03-13 | 2009-05-06 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
| EP1970952A3 (en) | 2007-03-13 | 2009-05-06 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
| EP2001047A1 (en) | 2007-06-07 | 2008-12-10 | Semiconductor Energy Laboratory Co, Ltd. | Semiconductor device |
| JP5248240B2 (ja) | 2007-08-30 | 2013-07-31 | 株式会社半導体エネルギー研究所 | 半導体装置 |
-
2008
- 2008-08-25 WO PCT/JP2008/065620 patent/WO2009031482A1/en not_active Ceased
- 2008-08-25 CN CN2008800256580A patent/CN101803008B/zh not_active Expired - Fee Related
- 2008-08-28 JP JP2008219903A patent/JP5438934B2/ja not_active Expired - Fee Related
- 2008-09-04 US US12/204,320 patent/US8459561B2/en not_active Expired - Fee Related
- 2008-09-05 TW TW97134199A patent/TWI458027B/zh not_active IP Right Cessation
-
2013
- 2013-06-07 US US13/912,309 patent/US9508619B2/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6403221B1 (en) * | 1999-10-13 | 2002-06-11 | Ajinomoto Co., Inc. | Epoxy resin composition, and adhesive film and prepreg using the composition, and multilayer printed-wiring board using them, and process for manufacturing the same |
| US20070117288A1 (en) * | 2005-11-23 | 2007-05-24 | Hidekazu Miyairi | Laser irradiation apparatus |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10703394B2 (en) | 2015-09-10 | 2020-07-07 | Kawasaki Jukogyo Kabushiki Kaisha | Method of producing electrode-equipped plate spring of railcar bogie |
Also Published As
| Publication number | Publication date |
|---|---|
| US9508619B2 (en) | 2016-11-29 |
| US20090065590A1 (en) | 2009-03-12 |
| TW200935528A (en) | 2009-08-16 |
| JP5438934B2 (ja) | 2014-03-12 |
| US8459561B2 (en) | 2013-06-11 |
| WO2009031482A1 (en) | 2009-03-12 |
| CN101803008A (zh) | 2010-08-11 |
| JP2009081426A (ja) | 2009-04-16 |
| US20130270720A1 (en) | 2013-10-17 |
| CN101803008B (zh) | 2012-11-28 |
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| Date | Code | Title | Description |
|---|---|---|---|
| GD4A | Issue of patent certificate for granted invention patent | ||
| MM4A | Annulment or lapse of patent due to non-payment of fees |