TWI457193B - Stage device - Google Patents

Description

Stage device

The present invention relates to a stage device capable of more stably and precisely performing a configuration of a turning operation of a θ stage.

For example, the stage device has a Y stage that moves in the Y direction and an X stage that moves in the X direction, and the Y stage is guided in the moving direction along a pair of Y-direction rails fixed to the stage, and the X stage The X-direction guide rails mounted on the Y stage are guided in the moving direction (for example, refer to Patent Document 1).

Further, when the stage device used for the movement of the semiconductor wafer is used, the sliders disposed at both ends of the Y stage are driven in parallel in the Y direction by the linear motor, and the X stage is in the θ z direction. The rotation mode supports the θ platform on which the wafer is placed.

The stage device is configured to transport and hold the wafer of the object on the θ platform. In order to position the wafer with high precision, the θ platform is θ around the Z axis. The z-direction rotates to adjust the position control of the wafer position.

[Patent Document 1] Japanese Patent Laid-Open Publication No. 2004-317485

In the above conventional stage device, the support portion of the θ platform is rotatably supported, and the load of the θ platform is all supported by the X platform. For example, when the guide rail is deformed and the Y stage is rotated, the θ platform is also due to friction. While rotating, there is a problem that it is difficult to stably and precisely control the rotational position of the θ platform.

Accordingly, it is an object of the present invention to provide a stage device that can solve the above problems.

A stage apparatus according to an embodiment of the present invention includes: a stage that moves on a platform; and a stage platform that is movable with the stage and rotatable on the stage; the stage apparatus is characterized by a pivot that can be vertically erected between the stage and the θ platform; such that the θ platform is rotatable relative to the stage, and is axially supported between the pivot and the θ platform, or the shaft a bearing supported between the stage and the pivot; and a θ linear motor that rotationally drives the θ stage from the lower side.

A stage apparatus according to another embodiment of the present invention includes: a stage that moves on a platform; and a stage platform that is movable with the stage and rotatable on the stage; the stage apparatus is characterized by a pivot that vertically rises above the stage; a bearing that is axially supported between the pivot and the θ platform; and a linear motor that rotates the θ platform from the lower side to rotate with respect to the stage .

In addition, a support means for supporting the θ platform may be further provided between the platform or the aforementioned stage.

In addition, the support means includes: a plurality of pillars extending perpendicularly below the θ platform; and a plurality of air cushions respectively disposed at the lower ends of the plurality of pillars, and the static pressure stack is placed on the platform or on the stage.

In addition, the supporting means may further include: a plurality of pillars extending vertically upward from the platform or the loading platform; and an air cushion disposed on the upper end of the pillar and the static pressure stack being disposed on the plurality of the θ stages.

Furthermore, the aforementioned bearings may also be formed by crossed bearings.

Further, the stator of the θ linear motor may be disposed on the stage, and the movable portion of the θ linear motor may be disposed below the θ stage.

Further, the stage may be an XY stage that is movable in parallel in a two-axis direction perpendicular to the upper surface of the stage on the stage, and the XY stage includes a Y stage that moves in the Y direction; An X stage that moves on the Y stage and moves in the X direction; and a stator of the θ direction linear motor is placed on the X stage.

According to the present invention, the θ platform can be rotated with a low load by the bearing, and the θ linear motor drives the θ stage from the lower side in a non-contact manner, and has an effect of suppressing the influence of the error of the stage on the θ stage to a minimum.

Hereinafter, an embodiment of a stage device to which the present invention is applied will be described.

[Embodiment 1]

Fig. 1 is a perspective view showing a stage device of the first embodiment. Fig. 2 is a front elevational view showing the stage device of the first embodiment. Fig. 3 is a plan view showing the stage device of the first embodiment.

As shown in FIGS. 1 to 3, the stage device 10A is, for example, an exposure device used in a manufacturing process of a semiconductor wafer, and includes: a stage 20; a stage 30 that moves on the plane of the stage 20; On the stage 30, a θ stage 40 for placing a workpiece (not shown) and a pair of Y linear motors 50 for moving the stage 30 in the Y direction.

The stage 30 has a pair of sliders 32 protruding from the plane of the platform 20 and extending in parallel with the Y-direction guide rails 28 extending in the moving direction (Y direction); and statically resting on the plane of the platform 20 by using air pressure. The air cushion (also referred to as "air bearing") 34 that floats and moves. Further, the slider 32 is formed in an inverted U shape with respect to the left and right side faces and the upper surface of the Y-direction guide rail 28, and each of the opposing faces is provided with a non-contact air cushion (not shown) by air pressure. Therefore, the slider 32 can be moved in the Y direction by the air pressure by floating pressure instead of contact with respect to the Y direction guide rail 28.

The stage 30 has a Y stage 36 that moves in the Y direction, and an X stage 38 that moves in the X direction that intersects the Y direction perpendicularly. The Y stage 36 spans between the pair of Y-direction guide rails 28, and its both ends are coupled to the H-shape of the slider 32. Further, the X stage 38 is disposed between the sliders 32, and a plurality of air cushions 34 are disposed on the lower surface. Next, the X stage 38 is movable in the Y direction together with the Y stage 36, and is movable along the Y stage 36 in the X direction.

When viewed from above, the θ stage 40 has a quadrangular shape, and the upper surface of the θ stage 40 is a workpiece mounting surface (a wafer mounting surface when the semiconductor exposure apparatus is used). Further, on the upper surface 42, a mirror 44 for detecting the position of the θ stage 40 in the Y direction for reflecting the laser light from the laser interferometer (not shown) is disposed.

A pair of Y linear motors 50 are disposed on the left and right outer sides of the platform 20, and are: a yoke (fixator) 52 extending in the Y direction; and a coil unit extending in the X direction on the outer side of the slider 32 (active element) ) 54; constitutes. When viewed from the front, the yoke 52 is The glyph is above and below the inner wall and is provided with a plurality of permanent magnets. Further, the yoke 52 supports the slider 32 at the moving height position by the support member 56.

Next, the coil unit 54 is connected to a plurality of coils in the Y direction, and is inserted from the side between the magnets of the yoke 52. Therefore, when the coil unit 54 energizes the coil, a magnetic flux with respect to the permanent magnet is formed, and a thrust force in the Y direction of the permanent magnet is obtained. Further, the coil unit 54 is coupled to the side of the slider 32. Therefore, the Y-direction thrust obtained by the coil unit 54 is applied to the slider 32 to drive the Y stage 36.

In addition, the stage device 10A is provided with four pillars 60 extending perpendicularly to the lower surface of the θ platform 40 (that is, vertically downward from the θ platform 40); and disposed at the lower end of each of the pillars 60 on the platform 20 The air cushion (also referred to as "air bearing") 70 of the plurality of static pressure floating movements by means of air pressure on the plane. Therefore, the support 60 and the air cushion 70 directly support the θ stage 40 and move on the stage 20. Accordingly, the θ stage 40 has a larger area than the X stage 38, and can be statically placed on the upper surface of the platform 20 by using four pillars 60 and four air cushions 70 disposed outside the contour of the X stage 38. The pressure floats and moves, and can be moved together with the stage 30 while maintaining the plane accuracy (horizontal accuracy) of the upper surface 42.

Further, since the four corners of the θ stage 40 are supported by the four pillars 60 and the four air cushions 70, the pivoting with the pivot 80 as a fulcrum during rotation can be prevented, and the horizontal precision of the upper surface 42 can be maintained.

Further, the stage 30 is supported by four air cushions 34 disposed under the X stage 38 to perform static pressure floating movement on the upper surface of the stage 20 by air pressure. Therefore, the X stage 38 and the θ stage 40 can be moved without interfering with each other, and the θ stage 40 can move integrally with the X stage 38 while maintaining the plane accuracy of the upper surface 42. In addition, since the air cushions 34 and 70 are suspended by static pressure with respect to the plane of the platform 20, they can be moved in a non-contact manner, and the friction between the X stage 38 and the θ stage 40 is extremely small, so that relative to the air cushions 34 and 70 In part, the thrust during movement is also small.

Figure 4 is a side cross-sectional view of the stage 30 and the θ stage 40. As shown in FIG. 4, the pivot 80 stands upright above the X stage 38. The pivot 80 is screwed to the X stage 38 by means of screws not shown.

At the upper end of the pivot 80, a bearing 82 is mounted, and the θ platform 40 and the pivot 80 are axially supported by the bearing 82, so that the θ stage 40 can be rotated in the θ z direction. Further, the angle at which the θ stage 40 can be rotated is, for example, 1/3600 degrees.

The outer ring of the bearing 82 is fitted to the recess 40a disposed at the center of the lower surface of the θ table 40, and the inner wheel is fitted to the outer side of the upper end of the pivot 80.

Further, since the bearing 82 is constituted by, for example, a cross bearing in which a spacer which is vertically aligned and arranged on a rotating surface of a 90° V groove is used to perform cylindrical rolling, even if a radial load (radial load) is received, The load in all directions, such as the axial load (axial load) and the momentum (load generated by tilting, rolling, and rocking), can also be smoothly rotated.

Therefore, the θ stage 40 can be supported by a pivot bearing structure composed of the pivot 80 and the bearing 82 to obtain a stable state. Further, the bearing 82 is disposed at the center of the lower surface of the θ stage 40, and the axis of the pivot 80 coincides with the center of rotation of the θ stage 40. Next, the thrust of the Y linear motor 50 for driving the stage 30 and the X linear motor to be described later may be transmitted to the θ stage 40 via the pivot 80 and the bearing 82.

Further, the above description has been made on the state in which the upper end of the pivot 80 is supported by the θ platform 40 by the bearing 82. However, the mounting position of the bearing 82 is not limited to this portion. Alternatively, the pivot 80 may be fixed to the lower center of the θ stage 40 by screws, for example, and the bearing 82 may be disposed on the upper side of the X stage 38 so that the lower end of the pivot 80 and The X stages 38 are axially supported by bearings 82, and the θ stage 40 is also rotatable relative to the X stage 38.

Further, between the X stage 38 and the θ stage 40, a pair of θ linear motors 84 that can rotate the θ stage 40 in the θ z direction are disposed. The θ linear motor 84 is disposed in the vicinity of the pivot 80, and is composed of a yoke (fixator) 86 fixed to the upper surface of the X stage 38, and a coil unit (active member) 88 fixed to the lower surface of the θ stage 40. . The yoke 86 has an inverted U shape in cross section, and a permanent magnet is attached to the opposite inner surface. Next, the coil unit 88 is inserted between the permanent magnets of the yoke 86 in a non-contact manner.

Further, the pair of θ linear motors 84 are arranged in parallel, and are disposed at a symmetrical position centering on the pivot 80 when viewed from above. Therefore, the pair of θ linear motors 84 generate a force centered on the pivot 80 by energizing the coil unit 88, and rotate the θ stage 40 in the θ z direction from the lower side.

At this time, the θ stage 40 is rotated around the axis of the pivot 80 (θ z direction) by the thrust from a pair of θ linear motors 84 disposed in the vicinity of the pivot 80, and is low friction and low vibration by the bearing 82. Rotation. Further, since the θ linear motor 84 is a driving means for the non-contact structure, when the θ stage 40 is rotated, the θ stage 40 can be rotated without being affected by the loss or variation of the driving force caused by the transmission path, so that it can be stabilized and precise. The rotation of the θ platform 40 is controlled.

Therefore, the stage device 10A can rotate the θ stage 40 with a low load by the bearing 82, and the θ linear motor 84 is non-contact and drives the θ stage 40 from the lower side, so that the error of the stage 30 can be compared with the θ stage 40. The effect is suppressed to a minimum.

Further, the θ stage 40 is supported by the air cushion 70 disposed at the lower end of the strut 60 to perform static pressure floating movement on the platform 20 by air pressure, and when subjected to the rotational force from the pair of θ linear motors 84, The rotation can be performed in the θ z direction only in a low friction state in which the rotation of the bearing 82 is a load. Further, the θ linear motor 84 can change the relative position with respect to the θ z direction of the yoke 86 and the coil unit 88 in accordance with the rotation angle of the θ stage 40, so that a gap corresponding to the maximum rotation angle is formed between the yoke 86 and the coil unit 88. On the other hand, the yoke 86 and the coil unit 88 do not interfere with each other.

Inside the Y stage 38, a space 120 through which the Y stage 36 is inserted is formed, and in this space 120, an X linear motor 124 that drives the X stage 38 in the X direction is disposed. At both ends of the Y stage 36, a slider 32 guided by the guide 28 is disposed to move non-contact with the inner wall of the X stage 38.

Further, the Y stage 36 has a vertical portion 36a for supporting the air cushion 122 opposed to the inner wall of the X stage 38, and a flat portion 36b to which the X linear motor 124 is mounted. Since the air cushion 122 is opposed to the inner wall of the space 120 in the Y direction, when the X stage 38 is moved in the X direction, the inner wall of the space 120 moves in non-contact with the air cushion 122. Further, when the Y stage 36 is moved in the Y direction, the Y-direction inner wall of the space 120 is pressed in the moving direction by the air pressure from the air cushion 122, and the X stage 38 is moved in the Y direction.

The X linear motor 124 is composed of a yoke (fixator) 126 and a coil unit (active member) 128 which are formed to extend in the X direction. When viewed from the side, the yoke 126 is The glyph is provided with a plurality of permanent magnets above and below the inner wall. Further, the yoke 126 is fixed to the flat portion 36b of the Y stage 36, and the coil unit 128 is supported by the bracket 130 fixed to the inner wall of the X stage 38.

Next, the plurality of coils of the coil unit 128 are disposed in the X direction and inserted from the space between the magnets of the yoke 126. Therefore, when the coil unit 128 energizes the coil, a magnetic flux is formed to obtain a thrust in the X direction of the permanent magnet. Further, since the coil unit 128 is coupled to the X stage 38 via the bracket 130, the X-direction thrust obtained by the coil unit 128 is applied to the X stage 38.

Therefore, the X stage 38 is driven in the X direction due to the thrust from the X linear motor 124. Next, the X-direction thrust of the X linear motor 124 is transmitted to the θ stage 40 mounted on the X stage 38 via the pivot 80 and the bearing 82, and moves together with the X stage 38 in the X direction.

Further, a leveling mechanism 62 for adjusting the height is disposed on the pillar 60 for supporting the θ stage 40. The leveling mechanism 62 is provided with four pillars 60 for performing individual height adjustments to maintain the horizontal accuracy of the θ platform 40.

Further, when the X stage 38 is moved in the X direction and the Y direction, the θ stage 40 supported by the pivot 80 and the bearing 82 on the X stage 38 is also moved in the X direction and the Y direction, and is disposed in the pillar 60. The lower end air cushion 70 also uses the air pressure to perform a static pressure floating movement on the platform 20 while maintaining the horizontal accuracy of the θ stage 40.

Therefore, since the stage device 10A rotates the θ stage 40 around the axis of the pivot 80 in the θ z direction, even if an error occurs in the X-direction and the Y-direction movement position of the X stage 38, it is possible to prevent The rotational position of the θ stage 40 increases the error. Therefore, even if the θ stage 40 is rotated in the θ z direction after the stage 30 is moved in the Y direction, the mirror 44 disposed on the upper surface 42 of the θ stage 40 and the laser light from the laser interferometer are not irradiated. The deviation can prevent the detection accuracy of the position of the laser interferometer from being lowered. Further, the stage device 10A can prevent, for example, the position of the workpiece (wafer or the like) with respect to the optical system when the exposure device is applied, due to the rotational position of the θ stage 40.

[Embodiment 2]

Fig. 5 is a front elevational view showing the stage device of the second embodiment. Figure 6 is a side cross-sectional view showing the stage device of the second embodiment. In the fifth and sixth embodiments, the same components as those in the first embodiment are denoted by the same reference numerals, and their description is omitted.

As shown in FIGS. 5 and 6, the stage device 10B of the second embodiment includes four pillars 60 extending vertically downward from the lower surface of the θ stage 40, and is disposed at the lower end of each of the pillars 60, and is pressurized by air. A plurality of air cushions 70 for static pressure floating movement are performed on the X stage 38. Therefore, the strut 60 and the air cushion 70 directly support the θ stage 40 and move on the X stage 38. Therefore, the θ stage 40 uses the four pillars 60 and the four air cushions 70 to perform static pressure floating movement on the X stage 38 by air pressure, and can maintain the plane accuracy (horizontal accuracy) of the upper surface 42 together with the stage 30. mobile.

Further, since the four corners of the θ stage 40 are supported by the four pillars 60 and the four air cushions 70, the pivoting with the pivot 80 as a fulcrum during rotation can be prevented, and the horizontal precision of the upper surface 42 can be maintained.

According to the stage apparatus of the present embodiment, since the entire length (length in the height direction) of the support post 60 is shortened, the stability of the θ stage 40 when the X stage 38 is moved can be improved.

[Modification]

Fig. 7 is a front elevational view showing a stage device according to a modification of the embodiment. In the stage device of this modification and the stage device shown in Fig. 5, the positions of the support post 60 and the air cushion 70 are reversed. Specifically, the four pillars 60 are fixed to the X stage 38 and vertically erected from the upper surface of the X stage 38. In addition, the air cushions 70 are respectively disposed at the upper ends of the respective pillars 60, and the static pressure stack is placed on the θ platform 40. In this manner, the post 60 is mounted on the X stage 38 side, and is statically stacked on the θ stage 40 by the air cushion 70 disposed at the upper end thereof, and also the stage device shown in FIGS. 5 and 6 In the same manner, it is possible to prevent the pivot of the θ platform 40 with the pivot 80 as a fulcrum while maintaining the horizontal accuracy of the upper surface 42 thereof.

[Embodiment 3]

Fig. 8 is a front elevational view showing the stage device of the third embodiment. Figure 9 is a side cross-sectional view showing the stage device of the third embodiment. In the eighth and ninth embodiments, the same components as those in the first and second embodiments are denoted by the same reference numerals, and their description is omitted.

As shown in Fig. 8, the stage device 10C of the present embodiment is the same as the first embodiment described above, and a pair of Y linear motors 50 are disposed at positions spaced apart from each other on the left and right sides of the stage 20. The coil unit 54 of the Y linear motor 50 that is disposed to extend in the horizontal direction from the side surface of the slider 32 is inserted between the magnets of the yoke 52 from the side. Further, the yoke 52 is supported by the support member 56 at a height position opposite to the side of the slider 32.

Therefore, in the stage device 10C, the reaction force of the Y linear motor 50 propagates to the ground through the support member 56. Therefore, the reaction force of the linear motor 50 is not transmitted to the Y stage 36 and the X stage 38. In contrast, the position control error of the stage 30 can be prevented, and the rotation of the stage 30 can be stably and precisely controlled. position.

Further, in the stage device 10C, as in the first embodiment, the plurality of air cushions 70 disposed at the lower end of each of the pillars 60 are attached to the X stage 38 to perform a static pressure floating movement. Therefore, the support 60 and the air cushion 70 support the θ stage 40 and move on the X stage 38, and the plane accuracy (horizontal accuracy) of the θ stage 40 can be maintained and moved together with the stage 30.

Further, the pair of θ linear motors 84 are disposed below the θ stage 40 in the same manner as in the first embodiment described above. Next, the yoke 86 for constituting the θ linear motor 84 is supported by the support portion 90 standing on the X stage 38. Further, the coil unit 88 protrudes downward from the lower surface of the X stage 38. Further, the θ linear motor 84 is erected on the ground at a distance from the side of the slider 32 to be described later, and the θ linear motor 84 is not affected by the vibration when the slider 32 is moved.

Further, when viewed from above, the pair of θ linear motors 84 are arranged in parallel with the symmetrical position centered on the pivot 80, and energization of the coil unit 88 generates a force centered on the pivot 80, and θ is made from the side. The platform 40 is rotated in the θ z direction.

As shown in Fig. 8, in the stage device 10C, as in the first embodiment, the plurality of air cushions 70 disposed at the lower ends of the respective pillars 60 are attached to the X stage 38 to perform a static pressure floating movement. Therefore, the support 60 and the air cushion 70 directly support the θ stage 40, and move on the X stage 38, thereby maintaining the plane accuracy (horizontal accuracy) of the θ stage 40 and moving together with the stage 30.

As shown in Fig. 8, a height adjustment mechanism 200 is disposed between the θ stage 40 and the X stage 38. The height adjustment mechanism 200 has a support plate 210 having a pivot 80 and a pair of leveling units 220 for adjusting the height position of the support plate 210.

An integral pivot 80 is erected in the upper center of the support plate 210. Further, the upper four corners are provided with an air cushion 212 opposite to the lower surface of the θ platform 40. Therefore, when the θ stage 40 receives the rotational force (the even force) from the pair of θ linear motors 84, the θ stage 40 is stably rotated in the θz direction with the axis of the pivot 80 as the center of rotation.

As described above, the θ linear motor 84 is disposed vertically, and the coil unit 88 is disposed so as to be relatively movable in the Y direction and the upper direction (Z direction) with respect to the yoke 86. Therefore, when the θ stage 40 is raised and lowered by the height adjustment mechanism 200, the yoke 86 and the coil unit 88 of the θ linear motor 84 do not interfere with each other, and the θ linearity is arranged so as not to interfere with the lifting operation of the θ stage 40. Motor 84.

As shown in FIG. 9, the leveling unit 220 is supported by the lower block 230 of the air cushion 70; and is suspended from the lower portion 240 of the support plate 210; and is disposed between the lower block 230 and the upper block 240. The actuator 250 is constructed. The lower block 230 is disposed to extend in the Y direction, and the lower portion is disposed on the X stage 38 to perform a plurality of air cushions 70 for static pressure floating movement.

Also. A pair of inclined portions 232 and a concave portion 234 are disposed on the upper portion of the lower block 230. The pair of inclined portions 232 respectively have inclined surfaces of the same direction and the same angle with respect to the horizontal plane, and in the figure 9, the left side is lower. The upper side is formed by a higher oblique direction.

Further, on the upper portion of the upper block 240, a sliding member 260 that slides with a low friction with respect to the lower surface of the support plate 210 is disposed. The sliding member 260 may be a member having high rigidity, high abrasion resistance, and low friction, and is made of, for example, stainless steel or a high-hardness metal whose surface is processed by Teflon (registered trademark). Further, a pair of inclined portions 242 and a concave portion 244 are disposed at a lower portion of the upper block 240. The pair of inclined portions 242 respectively have inclined surfaces of the same direction and at the same angle with respect to the horizontal plane, and are inclined toward the inclined portion. 232 is inclined in parallel with the tilt direction.

Further, inside the inclined portions 242 of the upper block 240, through holes 246 penetrating in the vertical direction (Z direction) are formed, and the insertion holes are respectively formed above the inclined portions 232. Pillar 270. Next, the cross-sectional shape of the pillar 270 is a rectangle (a cross-sectional shape in the Z-axis direction in the drawing is a rectangle having a short X-axis direction and a long Y-axis direction), and an upper end thereof is opposite to the lower surface of the support plate 210. A distance away. Further, the opening shape of each of the through holes 246 is a rectangular shape having a short X-axis direction and a long Y-axis direction, and is inserted into the support 270 of the through hole 246, and is only movable in the Y-axis direction with respect to the through hole 246. The composition of relative movement. Here, the support 270 is coupled to the lower block 230, and the through hole 246 is formed in the upper block 240. In order to move the upper block 240 in the Y-axis direction with respect to the lower block 230, in practice, the support 270 is movable in the Y-axis direction with respect to the through hole 246. This principle of movement will be described later.

The actuator 250 disposed between the concave portion 234 and the concave portion 244 is constituted by, for example, a driving means that generates a driving force in the Y direction by driving a ball screw mechanism by a motor, and the left end strut 252 is coupled to the upper block. 240, the right end strut 254 is coupled to the lower block 230.

Further, between the inclined portion 232 and the inclined portion 242, a low friction member 280 for reducing sliding resistance is interposed. The low-friction member 280 may be made of the same material as the swinging member 260, as long as it is a member having high rigidity, high abrasion resistance, and low friction, for example, processed by stainless steel or surface by Teflon (registered trademark). Made of high hardness metal.

For example, when the driving force of the actuator 250 causes the left end strut 252 and the right end strut 254 to approach each other, the inclined portion 242 of the upper block 240 moves to the right with respect to the inclined portion 232 of the lower block 230. Therefore, the upper block 240 rises in accordance with the inclination angle of the inclined portions 232 and 242 with respect to the lower block 230, and the support plate 210 and the θ stage 40 are raised.

Further, when the driving force of the actuator 250 acts to cause the left end strut 252 and the right end strut 254 to move away from each other, the inclined portion 242 of the upper block 240 moves to the left with respect to the inclined portion 232 of the lower block 230. Therefore, the upper block 240 is lowered relative to the lower block 230 by the inclination angles of the corresponding inclined portions 232, 242, and the support plate 210 and the θ stage 40 are lowered.

Therefore, in the stage device 10C, the θ stage 40 can be rotated in the θ z direction by the rotational force (the even force) from the pair of θ linear motors 84, and the driving direction of the actuator 250 of the height adjusting mechanism 200 can be utilized. The θ platform 40 can be raised or lowered to adjust the height position.

The above embodiment is described by taking the configuration in which the bearing 82 supports the θ platform 40 in a rotatable manner, but is not limited thereto. For example, the pivot 80 The shape of the upper end is formed into a conical shape or a hemispherical shape, and a bearing corresponding to the shape of the front end thereof may be provided.

The above is a description of the stage device according to the exemplary embodiment of the present invention. However, the present invention is not limited to the above-described embodiments, and various modifications and changes can be made without departing from the scope of the invention.

The stage device of the present invention can be applied to a manufacturing process of a liquid crystal panel or a semiconductor element or the like.

10A, 10B, 10C. . . Stage device

20. . . platform

28. . . Y direction guide

30. . . Loading platform

32. . . Slider

34, 70. . . air cushion

36. . . Y stage

38. . . X stage

40. . . θ platform

50. . . Y linear motor

60. . . pillar

80. . . Pivot

82. . . Bearing

84. . . θ linear motor

86. . . Yoke

88. . . Coil unit

122. . . X rail

I24. . . X linear motor

Fig. 1 is a perspective view showing a stage device of the first embodiment.

Fig. 2 is a front elevational view showing the stage device of the first embodiment.

Fig. 3 is a plan view showing the stage device of the first embodiment.

Fig. 4 is a side cross-sectional view showing the stage of the stage device and the θ stage of the first embodiment viewed from the side.

Fig. 5 is a front elevational view showing the stage device of the second embodiment.

Figure 6 is a side cross-sectional view showing the stage device of the second embodiment.

Fig. 7 is a front elevational view showing a stage device according to a modification of the second embodiment.

Fig. 8 is a front elevational view showing the stage device of the third embodiment.

Fig. 9 is a side cross-sectional view showing the stage device of the third embodiment as seen from the side.

10A. . . Stage device

20. . . platform

30. . . Loading platform

32. . . Slider

34. . . air cushion

36. . . Y stage

38. . . X stage

40. . . θ platform

42. . . Above

44. . . mirror

50. . . Y linear motor

52. . . Yoke

54. . . Coil unit

56. . . Support component

60. . . pillar

70. . . air cushion

80. . . Pivot

82. . . Bearing

84. . . θ linear motor

86. . . Yoke

88. . . Coil unit

Claims (6)

A stage device comprising: a platform; and a stage movable on a platform in a direction perpendicular to the two-axis direction; and a first linear motor and a second linear motor that drive the stage in the two-axis direction; and a θ platform movable in the two-axis direction together with the stage and rotatable on the stage; and a pivot that can be vertically erected between the stage and the θ stage; and a bearing to make the θ The platform is rotatable relative to the stage, the shaft is supported between the pivot and the θ platform, or the shaft is supported between the stage and the pivot; and the θ linear motor is opposite to the θ from the lower side. The platform implements a rotary drive; and a support means between the platform and the carrier to support the θ platform; and the fixed stator of the θ linear motor is disposed on the stage, and the θ linear motor is active It is disposed below the aforementioned θ platform. A stage device comprising: a platform; and a stage movable on a platform in a direction perpendicular to the two-axis direction; and a first linear motor and a second linear motor that drive the stage in the two-axis direction; and a θ platform movable in the two-axis direction together with the aforementioned stage and rotatable on the stage; a pivot standing vertically above the stage; and a bearing supported by the pivot and the θ platform And the θ linear motor, the θ platform is rotationally driven from the lower side; and a supporting means is provided between the platform and the carrier to support the θ platform; and the fixed linear system of the θ linear motor is disposed On the aforementioned stage, the active sub-system of the θ linear motor is disposed below the θ platform. The stage device as claimed in claim 1 or 2, wherein the support means comprises: a plurality of pillars extending vertically below the θ platform; and a plurality of air cushions respectively disposed at the lower ends of the plurality of pillars The static pressure reactor is placed on the aforementioned platform or on the aforementioned stage. The stage device according to claim 1 or 2, wherein the support means includes: a plurality of pillars extending vertically upward from the platform or the stage; and a plurality of air cushions disposed at an upper end of the pillar The static pressure reactor is placed on the aforementioned θ stage. The stage device as recited in claim 1 or 2, wherein The aforementioned bearing is composed of a cross bearing. The stage device according to claim 1 or 2, wherein the stage is an XY stage in which the stage can be moved in parallel in a direction perpendicular to the perpendicular direction of the upper surface of the stage on the stage, the XY stage The Y stage includes: a Y stage that moves in the Y direction; and an X stage that is loaded on the Y stage and moves in the X direction; and the stator of the θ direction linear motor is placed on the X stage.