TWI456792B - 發光元件及其製造方法 - Google Patents
發光元件及其製造方法 Download PDFInfo
- Publication number
- TWI456792B TWI456792B TW100128349A TW100128349A TWI456792B TW I456792 B TWI456792 B TW I456792B TW 100128349 A TW100128349 A TW 100128349A TW 100128349 A TW100128349 A TW 100128349A TW I456792 B TWI456792 B TW I456792B
- Authority
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- Taiwan
- Prior art keywords
- light
- layer
- emitting element
- semiconductor laminate
- emitting
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims 2
- 239000004065 semiconductor Substances 0.000 claims 23
- 239000000758 substrate Substances 0.000 claims 9
- 230000000903 blocking effect Effects 0.000 claims 6
- 230000004888 barrier function Effects 0.000 claims 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 3
- 239000010931 gold Substances 0.000 claims 2
- 229910052759 nickel Inorganic materials 0.000 claims 2
- 239000010936 titanium Substances 0.000 claims 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 claims 1
- 229910052697 platinum Inorganic materials 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/42—Transparent materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/405—Reflective materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/14—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
Claims (20)
- 一種發光元件,其特徵為具備:半導體積層體,其包含發光層;第1上部電極,係於上述半導體積層體之上,直接連接於上述半導體積層體;至少1個第2上部電極,係於上述半導體積層體之上,藉由第1接觸層連接於上述半導體積層體,由上述第1上部電極延伸而出;下部電極,設於上述半導體積層體之下;透明導電層,設於上述半導體積層體與上述下部電極之間,用於透過上述發光層所發出之光;光反射層,設於上述透明導電層與上述下部電極之間;及電流阻止層,設於上述半導體積層體與上述透明導電層之間、以及上述半導體積層體與上述第1上部電極及第2上部電極之間之其中至少一方,由上述發光層之主面之垂直方向看時被選擇性設有至少1個縫隙。
- 如申請專利範圍第1項之發光元件,其中在上述半導體積層體與上述透明導電層之間,另外具備含有氧與碳之其中至少一方的中間膜。
- 如申請專利範圍第1項之發光元件,其中由上述發光層之主面之垂直方向看時,上述第2上部電極具有:第1電極部,其由上述第1上部電極朝上述半導體積層體之平面外周部被延伸;及第2電極部,其和連接於上述第1電極部的上述平面外周呈大略平行而延伸。
- 如申請專利範圍第1項之發光元件,其中在上述第2電極部之周邊選擇性設有上述縫隙。
- 如申請專利範圍第1項之發光元件,其中在上述下部電極與上述光反射層之間,另外設有支撐基板。
- 如申請專利範圍第1項之發光元件,其中於上述發光層所發出光之波長之中,上述電流阻止層之折射率係低於上述半導體積層體之折射率。
- 如申請專利範圍第1項之發光元件,其中在上述第1上部電極與上述第2上部電極之其中至少一方正下方,未設置上述縫隙。
- 如申請專利範圍第1項之發光元件,其中由上述發光層之主面之垂直方向看時,上述第2電極部和上述縫隙之間之距離為10μm以上。
- 如申請專利範圍第1項之發光元件,其中由上述發光層之主面之垂直方向看時,以上述縫隙幅之長度為一邊之四角之面積為1000(μm)2 以下。
- 如申請專利範圍第1項之發光元件,其中上述電流阻止層之厚度為100nm以下。
- 如申請專利範圍第1項之發光元件,其中於上述發光層所發出光之波長之中,上述透明導電層之折射率係低於上述半導體積層體之折射率。
- 如申請專利範圍第1項之發光元件,其中上述透明導電層介由上述縫隙相接於上述半導體積層體之總面積A(cm2 )為,由上述發光層之主面之垂直方向看時的,上述半導體積層體之面積之5%以上、15%以下。
- 如申請專利範圍第1項之發光元件,其中上述透明導電層之厚度為30nm以上、100nm以下。
- 如申請專利範圍第5項之發光元件,其中上述光反射層為,將設於上述半導體積層體側之第1光反射層部,與設於上述支撐基板側之第2光反射層部予以接合之層。
- 如申請專利範圍第14項之發光元件,其中於上述第1光反射層部與上述第2光反射層部之間另外設有阻障層;上述阻障層,係包含選自Ni(鎳)、Pt(白金)、Ti(鈦)之群之至少1個元素。
- 如申請專利範圍第15項之發光元件,其中於上述阻障層與上述第2光反射層部之間,另外設置包含Au(金)之接合層。
- 如申請專利範圍第5項之發光元件,其中上述支撐基板為導電性基板。
- 如申請專利範圍第1項之發光元件,其中於上述縫隙之下的上述光反射層,另外形成空間。
- 如申請專利範圍第5項之發光元件,其中由上述發光層之主面之垂直方向看時,上述半導體積層體之面積小於上述支撐基板之面積。
- 一種發光元件之製造方法,其特徵為:具備:在半導體基板上形成包含發光層之半導體積層體的工程;於上述半導體積層體之上,形成選擇性設有至少1個縫隙之電流阻止層的工程;於上述電流阻止層之上,形成透明導電層的工程;於上述透明導電層之上,形成第1光反射層部的工程;將設於支撐基板之上的第2光反射層部,接合於上述第1光反射層部的工程;由上述半導體積層體除去上述半導體基板的工程;及於上述半導體積層體之上直接形成第1上部電極,另外,介由第1接觸層形成至少1個被連接於上述第1上部電極的第2上部電極的工程;由上述發光層之主面之垂直方向看時,將上述縫隙選擇性形成於上述第2上部電極之周邊之上述電流阻止層。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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JP2010290135A JP5404596B2 (ja) | 2010-12-27 | 2010-12-27 | 発光素子およびその製造方法 |
Publications (2)
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TW201228020A TW201228020A (en) | 2012-07-01 |
TWI456792B true TWI456792B (zh) | 2014-10-11 |
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TW100128349A TWI456792B (zh) | 2010-12-27 | 2011-08-09 | 發光元件及其製造方法 |
Country Status (5)
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US (1) | US8816378B2 (zh) |
JP (1) | JP5404596B2 (zh) |
CN (1) | CN103283042B (zh) |
TW (1) | TWI456792B (zh) |
WO (1) | WO2012090534A1 (zh) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
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JP5404596B2 (ja) | 2010-12-27 | 2014-02-05 | 株式会社東芝 | 発光素子およびその製造方法 |
TWI478384B (zh) | 2011-12-28 | 2015-03-21 | Toshiba Kk | Semiconductor light emitting element and manufacturing method thereof |
JP6068091B2 (ja) * | 2012-10-24 | 2017-01-25 | スタンレー電気株式会社 | 発光素子 |
JP2014116397A (ja) * | 2012-12-07 | 2014-06-26 | Stanley Electric Co Ltd | 発光素子 |
CN110265517B (zh) * | 2013-07-17 | 2024-03-29 | 晶元光电股份有限公司 | 发光元件 |
CN104576870B (zh) * | 2013-10-22 | 2018-11-16 | 晶元光电股份有限公司 | 发光元件 |
KR102200005B1 (ko) * | 2014-06-17 | 2021-01-11 | 엘지이노텍 주식회사 | 발광소자 |
KR102223036B1 (ko) * | 2014-08-18 | 2021-03-05 | 삼성전자주식회사 | 나노구조 반도체 발광소자 |
JP5893699B1 (ja) * | 2014-09-25 | 2016-03-23 | 泰谷光電科技股▲ふん▼有限公司 | 発光ダイオードの透明導電層構成 |
CN104241471A (zh) * | 2014-10-11 | 2014-12-24 | 聚灿光电科技(苏州)有限公司 | 一种垂直结构的led芯片及其制造方法 |
JP6685240B2 (ja) | 2015-01-27 | 2020-04-22 | 株式会社半導体エネルギー研究所 | 乗員保護装置 |
JP6668863B2 (ja) * | 2016-03-22 | 2020-03-18 | 日亜化学工業株式会社 | 発光素子 |
JP6826395B2 (ja) * | 2016-08-26 | 2021-02-03 | ローム株式会社 | 半導体発光素子 |
JP2018037690A (ja) * | 2017-12-05 | 2018-03-08 | 晶元光電股▲ふん▼有限公司Epistar Corporation | 発光素子 |
JP2020010056A (ja) * | 2019-09-11 | 2020-01-16 | 晶元光電股▲ふん▼有限公司Epistar Corporation | 半導体発光部品 |
Citations (2)
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JP2006032665A (ja) * | 2004-07-16 | 2006-02-02 | Hitachi Cable Ltd | 発光ダイオード |
JP2009076490A (ja) * | 2007-09-18 | 2009-04-09 | Hitachi Cable Ltd | 発光装置 |
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CN100495588C (zh) * | 2003-11-18 | 2009-06-03 | 日本板硝子株式会社 | 带有透明导电膜的透明基体的制造方法 |
JP2005197296A (ja) * | 2003-12-26 | 2005-07-21 | Shin Etsu Handotai Co Ltd | 発光素子及びその製造方法 |
CN100561758C (zh) * | 2004-10-22 | 2009-11-18 | 首尔Opto仪器股份有限公司 | 氮化镓化合物半导体发光元件及其制造方法 |
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JP5245970B2 (ja) * | 2009-03-26 | 2013-07-24 | 豊田合成株式会社 | 発光ダイオード及びその製造方法、並びにランプ |
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JP5404596B2 (ja) | 2010-12-27 | 2014-02-05 | 株式会社東芝 | 発光素子およびその製造方法 |
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2010
- 2010-12-27 JP JP2010290135A patent/JP5404596B2/ja active Active
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2011
- 2011-07-04 WO PCT/JP2011/065299 patent/WO2012090534A1/ja active Application Filing
- 2011-07-04 CN CN201180062905.6A patent/CN103283042B/zh active Active
- 2011-08-09 TW TW100128349A patent/TWI456792B/zh active
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2013
- 2013-06-27 US US13/929,465 patent/US8816378B2/en active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2006032665A (ja) * | 2004-07-16 | 2006-02-02 | Hitachi Cable Ltd | 発光ダイオード |
JP2009076490A (ja) * | 2007-09-18 | 2009-04-09 | Hitachi Cable Ltd | 発光装置 |
Also Published As
Publication number | Publication date |
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CN103283042B (zh) | 2016-08-24 |
WO2012090534A1 (ja) | 2012-07-05 |
JP5404596B2 (ja) | 2014-02-05 |
CN103283042A (zh) | 2013-09-04 |
US20130292729A1 (en) | 2013-11-07 |
US8816378B2 (en) | 2014-08-26 |
JP2012138479A (ja) | 2012-07-19 |
TW201228020A (en) | 2012-07-01 |
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