TWI453970B - Barrier film composite and display apparatus including the barrier film composite - Google Patents

Description

Barrier film composite and display device including the same

The present invention relates to a barrier film composition and a display device comprising a barrier film composition.

Multilayer film barrier compositions having alternating layers of barrier material and decoupling material are well known. These barrier compositions are typically formed by depositing alternating layers of barrier material and decoupling material, for example, by vapor deposition. Each barrier layer is typically a few hundred angstroms thick, and each decoupling layer is typically no more than 10 microns thick.

There is a need for a shrinkable multilayer barrier film composition and a display device comprising such a barrier film composition.

Aspects of the invention provide an improved stretchable barrier film composition.

Another aspect of the invention provides a display device comprising an improved stretchable barrier film composition.

According to aspects of the present invention, there is provided a barrier film composition comprising a decoupling layer and a barrier layer. The barrier layer can include a first region and a second region having a thickness less than the first region.

The barrier layer can comprise an inorganic material.

The barrier layer may comprise at least one selected from the group consisting of: individual metals, two or more metal mixtures, intermetallics or alloys, metals and mixed metal oxides, metals and mixed metal fluorides, metals And mixed metal nitrides, metals and mixed metal carbides, metals and mixed metal carbonitrides, metals and mixed metal oxynitrides, metals and mixed metal borides, metals and mixed metal oxyborides, metals and mixed metal tellurides And their combinations.

The first region and the second region may comprise the same material.

The second region may comprise a material that is mechanically less than the material of the first region.

The second regions can have different thicknesses.

The thickness of the second region may decrease from both sides of the second region toward the center of the second region.

The barrier layer can include a plurality of second regions.

The spacing between each pair of adjacent second regions can be the same.

The barrier film composition can include alternating layers of at least one decoupling layer and at least one barrier layer.

The second region in each of the barrier layers may not overlap with the second region in the adjacent barrier layer.

According to another aspect of the present invention, there is provided a display device including a first substrate, a second substrate facing the first substrate, and a light-emitting element between the first substrate and the second substrate. At least one of the first substrate and the second substrate may include the barrier film composition of any of the above embodiments.

The light emitting element may include an organic light emitting element.

1‧‧‧Resistance diaphragm composite

2‧‧‧Resistance diaphragm composite

3‧‧‧Resist diaphragm composite

4-1‧‧‧Resistance diaphragm composite

4-2‧‧‧Resist diaphragm composite

5‧‧‧Resistance diaphragm composite

6‧‧‧Resistance diaphragm composite

7‧‧‧Resistance diaphragm composite

8‧‧‧Resistance diaphragm composite

10‧‧‧Substrate

20‧‧‧Organic light-emitting elements

21‧‧‧First electrode layer

23‧‧‧Organic light-emitting layer

25‧‧‧Second electrode layer

100‧‧‧Organic light-emitting display device

105‧‧‧Mold

110‧‧‧ surface ups and downs

115‧‧‧Decoupling layer

120‧‧‧Barrier

125‧‧‧film

140‧‧‧ first floor

145‧‧‧ second floor

150‧‧‧ surface ups and downs

200‧‧‧Organic light-emitting display device

305‧‧‧Substrate

310‧‧‧Polymer materials

315‧‧‧ Barrier material

405‧‧‧Barrier

410‧‧‧Barrier

415‧‧‧Rubber stretch polymer

420‧‧‧Absorbent material

505‧‧‧Inorganic barrier

510‧‧‧Decoupling layer

515‧‧‧Absorbent material

605‧‧‧Barrier

610‧‧‧Decoupling layer

615‧‧‧First area

620‧‧‧Second area

705‧‧‧Substrate

710‧‧‧Inorganic barrier

715‧‧‧Decoupling layer

720‧‧‧Metal ribs

A more complete appreciation of the present invention, and the advantages of the present invention will become apparent from the <RTIgt; Similar components, wherein: FIGS. 1A through 1C are diagrams illustrating a barrier film composition in accordance with an embodiment of the principles of the present invention; and FIG. 2 is an illustration of an organic light emitting display device including the barrier film composition of FIG. 1C in accordance with an embodiment of the principles of the present invention. 3A to 3C are diagrams illustrating a barrier film composition in accordance with another embodiment of the present principles; FIG. 4 is a block diagram of a barrier film composition in accordance with another embodiment of the present principles; and FIG. 5A is another embodiment in accordance with the principles of the present invention. One embodiment illustrates a barrier film composition; FIG. 5B illustrates a barrier film composition in accordance with another embodiment of the principles of the present invention; and FIG. 6 illustrates a barrier film composition in accordance with another embodiment of the principles of the present invention; A barrier film composition is illustrated in accordance with another embodiment of the principles of the present invention; and FIG. 8 is a block diagram of the barrier film including FIG. 7 in accordance with another embodiment of the present principles. The organic light emitting display device thereof; and Figure 9 is a further embodiment according to the principles of the present invention will be described barrier film composition.

All of the advantages of this application are incorporated herein by reference. Suspension to the US Patent and Trademark Office on December 31, 2009, in accordance with 35 USC §119 The application form, and the formal application form is No. 61/291, 404, and the application filed earlier on December 6, 2010 at the Korean Intellectual Property Office, and the formal grant sequence is 10-2010- 0123489.

Films with multi-layer barrier coatings create barrier films with superior barrier properties, as described in the following patents and patent applications, and each incorporated by reference: U.S. Patent issued on July 31, 2001 No. 6,268,896, entitled "Environmental Barrier Material For Organic Light Emitting Device And Method Of Making"; U.S. Patent No. 6,522,067, issued on February 18, 2003, entitled "Environmental Barrier Material For Organic Light Emitting Device And Method Of Making" U.S. Patent No. 6,570,325, issued May 27, 2003, entitled "Environmental Barrier Material For Organic Light Emitting Device And Method Of Making"; U.S. Patent No. 6,866,901, issued March 15, 2005, entitled " "Method for Edge Sealing Barrier Films"; U.S. Patent No. 7,1988, filed on Apr. 3, 2007, entitled "Method for Edge Sealing Barrier Films"; U.S. Patent Application Serial No. 11/068,356, filed on Feb. 28, 2005 , entitled "Method for Edge Sealing Barrier Films"; US patent application filed on March 29, 2007 Clause 11/693,020, entitled "Method for Edge Sealing Barrier Films"; U.S. Patent Application Serial No. 11/693,022, filed on March 29, 2007, entitled "Method for Edge Sealing Barrier Films"; 2007 7 U.S. Patent Application Serial No. 11/776,616 filed on Jan. 12, entitled &quot;Multilayer Barrier Stacks and Methods of Making Multilayer Barrier Stacks.&quot;

The number of barrier stacks comprising a multilayer barrier film is not limited. The number of barrier stacks depends on the desired substrate material and the degree of penetration resistance required for a particular application. For some applications, one or two barrier stacks provide adequate barrier performance. The most rigorous applications may require five or more barrier stacks.

The barrier stack can include at least one decoupling layer and at least one barrier layer. There can be a decoupling layer and a barrier layer. There may be at least one decoupling layer disposed on one side of the at least one barrier layer. There may be at least one decoupling layer disposed on both sides of the at least one barrier layer. There may be at least one barrier layer disposed on both sides of the at least one decoupling layer. The most important feature is that the barrier stack can include at least one decoupling layer and at least one barrier layer. The barrier layers in the barrier stack may be made of the same material or materials different from each other, and the decoupling layers may also be made of the same material or materials different from each other.

Each barrier layer is typically about 100 Å to 2000 Å thick. In some embodiments, the first barrier layer can be thicker than the later barrier layer that is later deposited on the first barrier layer, if desired. For example, the first barrier layer can have a thickness of from about 1000 Å to about 1500 Å, and the later barrier layer can have a thickness of from about 400 Å to about 500 Å. In other embodiments, the thickness of the first barrier layer is thinner than the subsequent barrier layer. For example, the first barrier layer can have a thickness of from about 100 Å to about 400 Å, and the later barrier layer can have a thickness of from about 400 Å to about 500 Å. Each decoupling layer is typically about 0.1 to 10 microns thick. In some implementations, the first decoupling layer formed first between all decoupling layers can be thicker than the later decoupling layer. For example, the first decoupling layer can have a thickness of between about 3 microns and 5 microns, and the later decoupling layer can have a thickness of from about 0.1 microns to about 2 microns.

The barrier stack can comprise the same or different layers, which can be arranged on the same or different sequences.

The decoupling layer can be made of the same decoupling material or a different decoupling material. The decoupling layer may be fabricated by selecting at least one of the groups listed below, but is not limited to: an organic polymer, a polymer including an inorganic element, an organometallic polymer, a mixed organic/inorganic polymer system, and combinations thereof. The organic polymer may be selected from at least one of the groups listed below, but is not limited to: urethane, polyamide, polyimine, polybutene, isobutylene, polyolefin, epoxy resin. , polyparaphenylene, benzocyclobutene, polydecene, polyarylene ether, polycarbonate, alkyd resin, polyaniline, ethylene vinyl acetate, ethylene acrylic acid, and combinations thereof. These polymers including inorganic elements may be selected from at least one of the groups listed below, but are not limited to: oxime resin, polyphosphorus, polyazane, polycarbohydrin, polycarbobane, carborane Oxylkane, polydecane, diphosphorus nitrous acid, sulfur nitride polymer, helium oxide, and combinations thereof. The organometallic polymer may be selected from at least one of the group listed below, but is not limited to: an organic polymer of a main group metal, a transition metal, and a lanthanide/lanthanide metal, and combinations thereof. The mixed organic/inorganic polymer system may be selected from at least one of the groups listed below, but is not limited to: an organic modified tantalate, a ceramic precursor polymer, a polyamidide ceria mixture, (methyl) An acrylate ceria mixture, a polydimethyl oxyhydroxide ceria mixture, and combinations thereof.

The barrier layer can be made of the same barrier material or a different barrier material. The barrier layer can be made of any suitable barrier material. Based on the metal, suitable inorganic materials may be selected from at least the group listed below, but are not limited to: individual metals, two or more metal mixtures, intermetallics or alloys, metals and mixed metal oxides, metals, and Mixed metal fluorides, metals and mixed metal nitrides, metals and mixed metal carbides, metals and mixed metal carbonitrides, metals and mixed metal oxynitrides, metals and mixed metal borides, metals and mixed metal boroides, Metal and mixed metal tellurides and combinations thereof. The metal may be selected from at least one of the following, but is not limited to: transition ("d" column) metal, lanthanide ("f" column) metal, aluminum, indium, antimony, tin, antimony, bismuth, and combinations thereof. Many of the metals produced by this material are conductors or semiconductors. Fluorides and oxides may be selected from at least one of the following, but are not limited to: dielectrics (insulators), semiconductors, and metal conductors. The conductive oxide may be selected from at least one of the following, but is not limited to: aluminum-doped zinc oxide, indium tin oxide (ITO), antimony tin oxide, titanium oxide (TiO _x , 0.8 ≦ x ≦ 1), tungsten, and the like. Metal oxide (WO _x , where 2.7 ≦ x < 3.0). Based on the P column semiconductor and non-metal, suitable inorganic materials may be selected from at least one of the following, but are not limited to: ruthenium, osmium compounds, boron, boron compounds, carbon compounds including amorphous carbon and diamond-like carbon, and combinations thereof. The cerium compound may be selected from at least one of the following, but is not limited to: cerium oxide (SiO _x , wherein 1 ≦ x ≦ 2), polyphthalic acid, alkali and alkaline earth silicate, aluminate (Al _x SiO _y ), Niobium nitride (SiN _x H _y , where 0≦y<1), niobium oxynitride (SiN _x O _y H _z where 0≦z<1), niobium carbide (SiC _x H _y , where 0≦y< 1) Nitrogen oxides and niobium aluminum alloys (SiAlONs). The boron compound may be selected from at least one of the following, but is not limited to: boron carbide, nitride boron, boron oxynitride, boron carbonitride, and combinations thereof.

The barrier layer can be deposited using any suitable process, including but not limited to: contemporary vacuum processes such as magnetron sputtering, evaporation, sublimation, chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD). ), electron cyclotron resonance plasma enhanced vapor deposition (ECR-PECVD) and combinations thereof.

Decoupling layers can be created using known process numbers, which provide better surface flatness, including atmospheric processes and vacuum processes. The decoupling layer can be formed by depositing a layer of liquid and then processing the layer of liquid into a solid film. Decomposing the layer with liquid to allow the liquid Flowing through and compensating for defects on the substrate or previous layers, filling the lower areas and covering the high points provides a significant improvement in surface flattening. When the decoupling layer is processed into a solid film, the increased surface flatness will be preserved. Processes suitable for depositing a layer of liquid material and processing into a solid film include, but are not limited to, vacuum processes and atmospheric processes. Suitable vacuum processes include, but are not limited to, those described in U.S. Patent Nos. 5,260,095, 5,395, 644, 5, 547, 508, 5, 916, s, 5, s s The liquid extension device described in U.S. Patent Nos. 5,260,095, 5,395, 644, and 5, 547, 508, incorporated herein by reference, may further be configured to separately sm.

Suitable atmospheric processes include, but are not limited to, spin coating, printing, ink jet printing, and/or spraying. Atmospheric process means that the process operates at a pressure of about 1 atmosphere and can use the ambient atmosphere. The use of atmospheric processes presents several difficulties, including the need to cycle between the vacuum environment in which the barrier layer is deposited and the environmental conditions of the decoupling layer, and exposure to environmentally sensitive devices produces environmental contaminants such as oxygen and moisture. One way to alleviate these problems is to use a specific gas (purge gas) in the atmospheric process to control the exposure of environmental contaminants to the receiving substrate. For example, the process may include a cycle between a vacuum environment in which the barrier layer is deposited and a nitrogen environment at ambient pressure in the atmospheric process. A printing process that includes inkjet printing allows deposition of a decoupling layer over a precise area without the use of a reticle.

One method of making a decoupling layer involves depositing a polymer precursor, such as a (meth) acrylate containing a polymer precursor, which is then polymerized in situ to form a decoupling layer. The term "polymer precursor" as used herein refers to a material that can be polymerized to form a polymer including, but not limited to, monomers, oligomers, and resins. As another example of a method of fabricating a decoupling layer, the precursor can be deposited in a liquid form by spin coating. The product is then converted to a solid layer. For this type of film, full thermal conversion directly on a glass or oxide coated substrate is possible. While ceramic precursors are sometimes not fully converted to ceramic at temperatures suitable for some flexible substrates, partial conversion of the crosslinked network structure would be satisfactory. Electron beam technology can be used for some types of polymers that are crosslinked and/or dense, and can be combined with thermal techniques to overcome some substrate thermal limitations, and the provided substrate can handle electron beam exposure. Another example of making a decoupling layer involves depositing a material, such as a polymer precursor, as a liquid at a temperature above its melting point, and then freezing it at the appropriate location.

One method of making a barrier film composition includes providing a substrate and a barrier layer deposited adjacent the substrate at the deposition deposition station. The substrate with the barrier layer can be transferred to a decoupling material deposition station. A reticle having an opening is provided that limits the deposition (and inclusion) of the decoupling layer to a region that is smaller than the area covered by the barrier layer. Depending on the design of the composition, the first layer deposited may be a barrier layer or a decoupling layer.

These multilayer barrier coatings and barrier films are relatively flexible. When they roll over a 7 mm radius axis, they are determined to usually only begin to crack. Now, a thin (about 60 nm) alumina barrier layer in the barrier coating begins to crack with about 0.75% tensile stress. However, optimization of the adhesive and material can shift the criticality of the first crack to a higher value, but such a multilayer barrier film cannot be extended to a few percent elongation.

The original multilayer barrier film has proven to be almost stress-free (the tensile stress of the alumina layer is only 470 MPa and the tensile stress of the polymer layer is even lower), resulting in these treated films being flat and not under heat treatment. curly.

The barrier properties of the original multilayer barrier film have been demonstrated to have a water vapor transmission rate (WVTR) of 1 x 10 ^-6 g/m ² per day.

The use of stretchable barrier films protects a wide range of environmentally sensitive materials and objects, from flexible displays and solar cells to automotive bumpers and medical applications for corrosion protection.

Rather than applying wet or spray coatings to three-dimensional objects (such as paint), more and more industries prefer molded coatings that can be packaged in objects (for example, car bumpers) rather than manufacturing companies, where the manufacturing company Wet processing of chemicals that are not environmentally friendly must be used, and the resulting contaminants and waste streams must be addressed.

Another application of the stretchable barrier film composition is to provide a barrier coating on the appearance of a three-dimensional object that can be created by placing a barrier film into a mold and injecting the plastic into the mold.

The use of multilayer barrier films for pharmaceutical packaging of individual pill bags is another potential application for stretchable barrier film compositions.

There are several ways to implement this structure. These methods utilize the flexibility of the barrier layer or account for cracking of the barrier layer during stretching.

The object of the invention is either to prevent cracks or to minimize cracks and compensated barrier layers. The resulting barrier may not be able to meet the WVTR of 1x10 ^-6 g/m ² per day, but it still has a good WVTR, which is about 100 times better than a homogenous barrier film, such as a polychlorotrifluoroethylene film (ie from ACLAR ^® film obtained by Honeywell International, Inc.).

1A to 1C are diagrams illustrating a barrier film composition 1 and a method of manufacturing the barrier film composition 1 according to an embodiment of the present invention.

Referring to FIG. 1A, mold 105 provides undulating surface 110. The mold 105 having the undulating surface 110 can be formed by embossing or photolithography.

The decoupling layer 115 and the barrier layer 120 may be alternately formed to conform to the surface of the mold 105. Decoupling layer 115 and barrier layer 120 form a very soft, resilient relief structure that is stretchable. In particular, the decoupling layer 115 is applied to the surface 110 of the mold 105, and then the barrier layer 120 is sputtered onto the decoupling layer 115 and conforms to the decoupling layer 115. Although FIGS. 1A through 1C illustrate that the decoupling layer 115 is formed directly on the surface 110 of the mold 105, the deposition order of the decoupling layer 115 and the barrier layer 120 is reversible. In other words, the barrier layer 120 may be formed directly on the surface of the mold 105, and then the decoupling layer 115 may be formed on the surface of the barrier layer 120. The decoupling layer 115 may include, but is not limited to, a crosslinked acrylate having a low glass transition temperature (Tg), for example, from about -80 ° C to about 40 ° C. This process may be repeated as many times as needed to form each other. An alternating layer of decoupling layer 115 and barrier layer 120.

Referring to FIG. 1B, a film 125 may be laminated on the surfaces of the alternating decoupling layer 115 and the barrier layer 120. The film 125 also has an undulating surface due to the undulating structure of the decoupling layer 115 and the barrier layer 120. The film 125 can be formed from a stretchable material. Therefore, the film 125 has a stretchable structure. Film 125 can include, but is not limited to, at least one material selected from the group consisting of polyethylene, polypropylene, polycarbonate, and combinations thereof.

Referring to FIG. 1C, the mold 105 releases the barrier film composition 1 including alternating layers of the decoupling layer 115 and the barrier layer and the film 125. In order to facilitate the release of the mold 105 of the self-resisting diaphragm composite 1, the adhesion between the surface 110 of the mold 105 and the layer directly contacting the surface 110 The agent may be weaker than the adhesive between the film 125 and the alternating layers of the decoupling layer 115 and the barrier layer 120.

Thus, the barrier film composition 1 comprising alternating layers from the decoupling layer 115 and the barrier layer 120 and released from the mold 105 can provide a very soft, elastic polymer-based structure with an undulating surface. Rather than using wet or spray coating, the mold 105 is used to mold to create the undulating structure, thereby alleviating environmental problems.

2 is an illustration of an organic light emitting display device 100 including the barrier film composition 1 of FIG. 1C in accordance with an embodiment of the principles of the present invention.

As described above, the barrier film composition 1 can be used for environmentally sensitive materials or objects, and can be used in flexible display devices. The organic light-emitting display device includes an organic light-emitting layer which is easily affected by oxygen and moisture, and there is an increasing demand for a flexible display device as a next-generation display device.

Referring to FIG. 2, the organic light-emitting display device 100 includes an organic light-emitting element 20 on the surface of the substrate 10 and a barrier film composition 1 of the encapsulated organic light-emitting element 20. Although FIG. 2 illustrates an exemplary application of the barrier film composition 1 as a sealing material of the organic light-emitting element 20, the aspect of the invention is not limited thereto. The barrier film composition 1 can be used as the substrate 10. When the barrier film composition 1 is only used to seal the organic light-emitting element 20, the substrate 10 may comprise a flexible material such as plastic or polyimide.

The organic light emitting element 20 includes a first electrode layer 21, an organic light emitting layer 23, and a second electrode layer 25.

The first electrode layer 21 and the second electrode layer 25 can function as an anode or a cathode. Each of the first electrode layer 21 and the second electrode layer 25 may serve as one of a reflective electrode, a transparent electrode, and a translucent electrode.

The organic light-emitting layer 23 may include a low molecular weight organic material or a large molecular weight organic material. When the organic light-emitting layer 23 includes a low molecular weight organic material, a hole transport layer (HTL) and a hole injection layer (HIL) may be sequentially disposed on the surface of the organic light-emitting layer 23, an electron transport layer (ETL) and an electron injection layer. (EIL), which can be placed on the opposite surface. Other types of layers can be further sandwiched if needed. Examples of suitable low molecular weight organic materials include copper phthalocyanine (CuPc), N'-bis(naphthalen-1-yl)-N,N'-diphenylbenzidine (NPB), tris-8-hydroxyquinoline aluminum. (Alq3) or the like. When the organic light-emitting layer 23 includes a material having a large molecular weight, an HTL may be further included in addition to the organic light-emitting layer 23. The HTL may be poly(2,4)-ethylene-dihydroxythiophene (PEDOT), polyaniline (PANI) or the like. Examples of suitable large molecular weight organic materials include polystyrene (PPV), polyfluorene or the like.

The organic light-emitting display element 100 including the barrier film composition 1 as described above may have a soft and elastic structure to manufacture a flexible display. The barrier film composition 1 does not crack or crack, so that the organic light-emitting layer 23 can be protected from external moisture and oxygen contamination.

Although the present embodiment has been described and focused on an organic light emitting display device, the aspect of the present invention is not limited thereto. That is, the barrier film composition 1 can be applied to various types of display devices.

3A through 3C are diagrams illustrating a barrier film composition 2 and a method of manufacturing the barrier film composition 2, in accordance with another embodiment of the present invention.

Referring to FIG. 3A, a second layer 145 is formed on the first layer 140 and its parts are subjected to a first illumination (L1). The first layer 140 can comprise a flexible material such as plastic. The second layer 145 can include a flexible monomer. The first illumination L1 can be laser written or illuminated by a reticle .

Referring to FIG. 3B, the second layer 145 has an undulating surface 150 as a result of the first illumination (L1). In particular, one surface of the second layer 145 exposed by the first illumination (L1) partially contracts or expands to cause an undulating surface, which is then fixed by a second illumination (not shown), resulting in an undulating surface 150.

Referring to FIG. 3C, alternating layers of decoupling layer 115 and barrier layer 120 are laminated on undulating surface 150 of second layer 145, as in the previously described embodiments. The undulating surface 150 of the second layer 145 is transferred to alternating layers of the decoupling layer 115 and the barrier layer 120, causing fluctuations in the surface thereof.

The first layer 140, the second layer 145 disposed on the first layer 140 having the undulating surface 150, and the alternating layers of the decoupling layer 115 and the barrier layer 120, as described above, form a barrier film composition 2, which can provide very A soft, elastic polymer-based undulating structure. Instead of using wet or spray coating, the relief structure as described above is created with illumination to alleviate environmental problems.

4 is a block diagram of a barrier film composition 3 in accordance with another embodiment of the principles of the present invention.

A method of making a three-dimensional barrier is described in U.S. Patent Application Serial No. 11/627, 583, filed on Jan. 26, 2007, and entitled &quot;Three Dimensional Multilayer Barrier And Method Of Making,&quot; incorporated herein by reference.

Referring to FIG. 4, the bubbles of the polymer material 310 are disposed on the substrate 305 and surrounded by the barrier material 315. Polymer material 310 is soft and stretchable. When stretched, most of the bubbles will stretch but will not break. Although some foams may break, this will not provide a direct external path because the break will be covered by other foam.

Figure 5A is a diagram showing a barrier film composition 4-1 in accordance with another embodiment of the principles of the present invention.

Referring to FIG. 5A, the barrier film composition 4-1 includes double barrier layers 405 and 410. Rather than a single barrier layer in a multilayer structure, the dual barrier layers 405 and 410 are separated from one another by a thin layer (about 10 nm to about 100 nm thick) of rubber stretch polymer layer 415. Suitable rubber stretch polymers include, but are not limited to, crosslinked acrylates having a low Tg.

Figure 5B illustrates a barrier film composition 4-2 in accordance with another embodiment of the principles of the present invention.

Referring to FIG. 5B, the barrier film composition 4-2 includes an absorber material 420 in the polymer layer 415. The particle size of the absorbent material 420 can be on the nanometer scale, for example, from 1 to 100 nanometers. Additionally, the rubber stretched polymer layer 415 can contain inorganic oxide or nitride particles to create a tortuous path for moisture.

Figure 6 is a block diagram of a barrier film composition 5 in accordance with another embodiment of the principles of the present invention.

Referring to FIG. 6, the barrier film composition 5 includes alternating layers of an inorganic barrier layer 505 and a decoupling layer 510. Each inorganic barrier layer 505 is covered by a film of a layer of absorbent material 515. When stretched, the inorganic barrier layer 505 may crack, but the absorber layer 515 may reduce the effects of cracks.

Figure 7 is a block diagram of a barrier film composition 6 in accordance with another embodiment of the principles of the present invention.

Referring to FIG. 7, the barrier film composition 6 includes alternating layers of a barrier layer 605 and a decoupling layer 610.

Barrier material 605 can be fabricated from a barrier material. The barrier material can comprise an inorganic material. In some embodiments, the barrier material can comprise at least one selected from the group consisting of: individual metals, two or more metal mixtures, intermetallics Or alloys, metals and mixed metal oxides, metals and mixed metal fluorides, metals and mixed metal nitrides, metals and mixed metal carbides, metals and mixed metal carbonitrides, metals and mixed metal oxynitrides, metals and blends Metal borides, metal and mixed metal oxyborides, metals and mixed metal tellurides, and combinations thereof, are listed above.

Each barrier layer 605 includes a first region 615 and a second region 620 that is less thick than the first region 615. The second region 620 has a smaller mechanical strength than the first region 615. When the barrier film composition 6 is stretched, the second region 620 relieves pressure and helps the barrier film composition 6 to extend.

The first region 615 and the second region 620 can be formed from the same material. In one embodiment, the first region 615 and the second region 620 can be formed from different materials. For example, the second region 620 can include a material that has a lower mechanical strength than forming the first region 615.

The second regions 620 can have different thicknesses. As shown in FIG. 7, the thickness of the second region 620 can be a wedge-shaped cross-section that decreases from both sides of the second region 620 toward the center of the second region 620. However, aspects of the invention are not limited thereto.

Each barrier layer 605 can include a plurality of second regions 620. The spacing between each two adjacent second regions 620 may be the same. However, aspects of the invention are not limited thereto. A plurality of second regions 620 can be formed by shielding the reticle. However, aspects of the invention are not limited thereto.

In the barrier film composition 6 having a plurality of barrier layers 605, the second regions 620 in each barrier layer 605 can be positioned to avoid overlapping with those in the adjacent barrier layer 605. Therefore, even when the barrier film composition 6 is stretched to cause cracks, including the first The barrier layer 605 of the second region 620 can reduce the effect on the crack because the spacing P between each two adjacent second regions 620 in the barrier layer 605 is also extended, thereby elongating the path of potential external contamination, It may be formed by the second region 620.

FIG. 8 is an illustration of an organic light emitting display device 200 including the barrier film composition 6 of FIG. 7 in accordance with another embodiment of the present principles.

Referring to FIG. 8, the organic light-emitting display device 200 includes an organic light-emitting element 20 on the surface of the substrate 10 and a barrier film composition 6 of the encapsulated organic light-emitting element 20. Although FIG. 8 illustrates an exemplary application of the barrier film composition 6 as a sealing material of the organic light emitting element 20, the aspect of the invention is not limited thereto. The barrier film composition 6 can be used as the substrate 10. When the barrier film composition 6 is only used to seal the organic light emitting element 20, the substrate 10 may comprise a flexible material such as plastic or polyimide.

The organic light emitting element 20 includes a first electrode layer 21, an organic light emitting layer 23, and a second electrode layer 25. A detailed description of the organic light emitting element 20 will not be provided herein because it has been described above with respect to the organic light emitting display device 100 of FIG.

The organic light-emitting display element 200 including the barrier film composition 6 as described above may have a soft, elastic structure to manufacture a flexible display. The barrier film composition 6 is less cracked, so that the organic light-emitting layer 23 can be protected from external moisture and oxygen contamination, and even when cracking occurs, the pitch P and potential external contamination extending between the second regions 620 are caused. The path is elongated, so the barrier film composition 6 is stretched.

Figure 9 is a block diagram of a barrier film composition 7 in accordance with another embodiment of the principles of the present invention.

Referring to FIG. 9, the barrier film composition 7 includes alternating layers of an inorganic barrier layer 710 and a decoupling layer 715 on a substrate 705. The metal ribs 720 can be disposed in the inorganic barrier layer 710, if partial loss of transparency occurs is acceptable. Suitable as a metal rib 720 Materials include, but are not limited to, soft metals, alloys, tin (Sn), indium (In), and combinations thereof. The metal ribs 720 can be stretched without breaking. Metal ribs 720 can be two dimensional.

As another embodiment in accordance with the principles of the present invention, a method of making a barrier film composition can involve the fabrication of an inorganic barrier layer, such as tin, of a very ductile soft metal or metal alloy. The multilayer structure will be translucent, even opaque, depending on the number of layers and thickness used. However, there are many applications for stretchable multilayer barriers that do not require a transparent barrier.

As another embodiment in accordance with the principles of the present invention, a method of making a barrier film composition is covered with an inorganic barrier layer of nanoparticle having a thin layer of inorganic oxide or nitride. When the inorganic barrier layer is stretched, it can be cracked, but the nanoparticle should reduce the influence of the crack by increasing the length of the undulating path.

As another embodiment in accordance with the principles of the present invention, a method of making a barrier film composition is to stretch a soft substrate and deposit an inorganic barrier layer on the substrate when the soft substrate is stretched. When the tension is released, the inorganic barrier layer will be compressed. When the structure is used, it will allow stretching of some inorganic layers.

As noted above, in accordance with one or more embodiments of the present invention, the barrier film composition provides a soft, stretchable barrier structure that reduces pressure. The display device can be fabricated using a barrier film composition.

While the invention has been particularly shown and described with reference to the exemplary embodiments of the embodiments of the invention, those skilled in the art can understand that various changes in the form and details can be carried out without departing from the invention as defined in the following claims. The spirit and scope of the scope.

6‧‧‧Resistance diaphragm composite

605‧‧‧Barrier

610‧‧‧Decoupling layer

615‧‧‧First area

620‧‧‧Second area

Claims (17)

A barrier film composition comprising: a first layer, one of a decoupling layer and a barrier layer; and a second layer stacked on the first layer, the second layer being the decoupling The other of the layer and the barrier layer, the barrier layer comprising a first region and a second region having a thickness less than the first region; wherein the barrier film composition comprises alternating layers of at least one decoupling layer and at least one barrier layer Wherein the second region in each of the barrier layers does not overlap with the second region in the adjacent barrier layer. A barrier film composition according to claim 1, wherein the barrier layer comprises an inorganic material. The barrier film composition according to claim 2, wherein the barrier layer comprises at least one selected from the group consisting of: an individual metal, two or more metal mixtures, a metal or an alloy, Metals and mixed metal oxides, metals and mixed metal fluorides, metals and mixed metal nitrides, metals and mixed metal carbides, metals and mixed metal carbonitrides, metals and mixed metal oxynitrides, metals and mixed metal borides Metal and mixed metal oxyborides, metals and mixed metal tellurides and combinations thereof. The barrier film composition of claim 1, wherein the first region and the second region comprise the same material. A barrier film composition according to claim 1 of the patent application, wherein the second region comprises A material that is mechanically less than the material of the first region. The barrier film composition of claim 1, wherein the second region has a different thickness. The barrier film composition of claim 6, wherein the thickness of the second region becomes smaller from both sides of the second region toward a center of the second region. The barrier film composition of claim 1, wherein the barrier layer comprises a plurality of second regions. A barrier film composition according to claim 8 wherein the spacing between each pair of adjacent second regions is the same. The barrier film composition of claim 1, wherein the barrier layer comprises tin. The barrier film composition according to claim 1, further comprising a thin layer of nanoparticles of inorganic oxide or nitride covering the barrier layer. A display device comprising: a first substrate; a second substrate disposed opposite to the first substrate; and a light emitting element between the first substrate and the second substrate, in the first substrate and the second substrate At least one of the barrier film compositions of claim 1 includes. A display device according to claim 12, wherein the light-emitting element comprises an organic light-emitting element. A display device according to claim 12, wherein the barrier layer comprises an inorganic material. A display device according to claim 12, wherein the second region comprises a material having a mechanical strength smaller than that of the first region. The display device according to claim 12, wherein the thickness of the second region becomes smaller from both sides of the second region toward the center of the second region. The display device of claim 12, wherein at least one of the first substrate and the second substrate is flexible without including a barrier film composition.