TWI450411B - Method and apparatus for forming selective emitter of solar cell - Google Patents

Method and apparatus for forming selective emitter of solar cell Download PDF

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TWI450411B
TWI450411B TW100123751A TW100123751A TWI450411B TW I450411 B TWI450411 B TW I450411B TW 100123751 A TW100123751 A TW 100123751A TW 100123751 A TW100123751 A TW 100123751A TW I450411 B TWI450411 B TW I450411B
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substrate
stage
layer
laser radiation
finger
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TW201212271A (en
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Yun-Sung Huh
Seung-Il Park
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Dms Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1876Particular processes or apparatus for batch treatment of the devices
    • H01L31/188Apparatus specially adapted for automatic interconnection of solar cells in a module
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Photovoltaic Devices (AREA)

Description

用於形成太陽能電池的選擇性發射器的方法和設備Method and apparatus for forming a selective emitter for a solar cell

本發明關於一種用於形成太陽能電池的選擇性發射器的方法和設備。
The present invention relates to a method and apparatus for forming a selective emitter for a solar cell.

隨著環境污染問題變得日益嚴重,近來已經有一些對能夠減輕環境污染的可再生能源的研究。尤其是,對能夠通過使用太陽能而產生電能的太陽能電池給予了大量關注。然而,為了在實際產業中利用太陽能電池,太陽能電池的光電轉換效率必需足夠高,並且太陽能電池的製造成本必須很低。
從光電轉換效率的角度,因為太陽能電池的理論效率極限不是很高,所以增加實際太陽能電池的光電轉換效率存在局限性,但是世界知名的研究組已經報導了矽太陽能電池目前具有24%或更高的光電轉換效率。
但是,在大批量生產太陽能電池的情況下,太陽能電池的實際平均光電轉換效率很難高於17%。因此,需要可以應用於具有30MW或更大的年生產能力的自動化大批量生產線的高效製造方法。
As environmental pollution problems have become more serious, there have been some recent studies on renewable energy sources that can reduce environmental pollution. In particular, a great deal of attention has been paid to solar cells capable of generating electric energy by using solar energy. However, in order to utilize solar cells in the actual industry, the photoelectric conversion efficiency of the solar cells must be sufficiently high, and the manufacturing cost of the solar cells must be low.
From the perspective of photoelectric conversion efficiency, since the theoretical efficiency limit of solar cells is not very high, there is a limitation in increasing the photoelectric conversion efficiency of actual solar cells, but world-renowned research groups have reported that germanium solar cells currently have 24% or higher. Photoelectric conversion efficiency.
However, in the case of mass production of solar cells, the actual average photoelectric conversion efficiency of solar cells is difficult to be higher than 17%. Therefore, there is a need for an efficient manufacturing method that can be applied to an automated high-volume production line having an annual production capacity of 30 MW or more.

本案提供用於形成太陽能電池的選擇性發射器的方法和設備,所述方法和設備可以通過形成選擇性發射器來提高太陽能電池的光電轉換效率並且可以藉由穩定的方式形成該選擇性發射器。The present invention provides a method and apparatus for forming a selective emitter for a solar cell, which method and apparatus can increase the photoelectric conversion efficiency of a solar cell by forming a selective emitter and can form the selective emitter by a stable manner .

本發明提供用於形成太陽能電池的選擇性發射器的方法和設備,所述方法和設備可以通過形成選擇性發射器來提高太陽能電池的光電轉換效率並且可以藉由穩定的方式形成該選擇性發射器。The present invention provides a method and apparatus for forming a selective emitter for a solar cell, which method and apparatus can increase the photoelectric conversion efficiency of a solar cell by forming a selective emitter and can form the selective emission by a stable manner Device.

本發明的一個方面表徵為一種用於形成太陽能電池的選擇性發射器的設備,該設備包括:傳送裝置,用來傳送基板,該基板上表面上形成有第一發射器層,該第一發射器層中擴散並形成有n型雜質;載物台,從傳送裝置向該載物台提供基板並且該載物台支撐被提供的基板;預加熱裝置,用來對載物台所支撐的基板進行預加熱;雷射輻射裝置,位於載物台的上方與載物台分隔開並且用來在第一發射器層的一部分上輻射雷射以形成其中進一步擴散並形成有n型雜質的第二發射器層。An aspect of the invention is characterized by an apparatus for forming a selective emitter of a solar cell, the apparatus comprising: a transfer device for transporting a substrate, a first emitter layer formed on an upper surface of the substrate, the first emission An n-type impurity is diffused in the layer; a stage is provided from the transfer device to the stage and the stage supports the supplied substrate; and a preheating device is used to perform the substrate supported by the stage Preheating; a laser radiation device positioned above the stage and spaced apart from the stage and configured to radiate a laser over a portion of the first emitter layer to form a second of which is further diffused and formed with n-type impurities Transmitter layer.

預加熱裝置可以透過載物台對基板進行預加熱。The preheating device can preheat the substrate through the stage.

第二發射器層可以包括:在要形成母線電極的位置處形成的母線層;以及在要形成指狀電極的位置處形成的指狀層。雷射輻射裝置可以包括:可在第一方向上移動以形成母線層的第一雷射輻射裝置;和可在與第一方向交叉的第二方向上移動以形成指狀層的第二雷射輻射裝置。The second emitter layer may include: a busbar layer formed at a position where the busbar electrode is to be formed; and a finger layer formed at a position where the finger electrode is to be formed. The laser radiation device may include: a first laser radiation device movable in a first direction to form a busbar layer; and a second laser movable in a second direction crossing the first direction to form a finger layer Radiation device.

載物台可以包括:順序排列的第一載物台和第二載物台,第一雷射輻射裝置可以放置在第一載物台的上面並且形成母線層,第二雷射輻射裝置可以放置在第二載物台的上面並且形成指狀層。The stage may include: a first stage and a second stage arranged in sequence, the first laser radiation device may be placed on the first stage and form a bus layer, and the second laser radiation device may be placed On top of the second stage and forming a finger layer.

雷射輻射裝置可在第一方向上移動以形成母線層,以及在與第一方向交叉的第二方向上移動以形成指狀層。The laser radiation device is movable in a first direction to form a busbar layer and in a second direction that intersects the first direction to form a finger layer.


傳送裝置可以包括一傳送帶,載物台可以被放置在該傳送帶的底面。

The transfer device can include a conveyor belt on which the stage can be placed.


用於形成太陽能電池的選擇性發射器的設備還可以包括基板感測器,該基板感測器放置在載物台前面並感應基板的傳送,以及控制傳送帶的操作使得基板放置在載物台之上並停止。

The apparatus for forming a selective emitter of a solar cell may further include a substrate sensor placed in front of the stage and sensing the transfer of the substrate, and controlling the operation of the conveyor such that the substrate is placed on the stage Go up and stop.

用於形成太陽能電池的選擇性發射器的設備還可以包括對準感測器,該對準感測器感應被放置在載物台之上的基板的對準狀態,並且可以根據基板的對準狀態校正雷射輻射裝置的位置。The apparatus for forming a selective emitter of a solar cell may further include an alignment sensor that senses an alignment state of the substrate placed on the stage and may be aligned according to the substrate The state corrects the position of the laser radiation device.


對準感測器可以放置在載物台的底面上,並且可以在載物臺上設置一透明區域使得對準感測器可以感應基板的對準狀態。

The alignment sensor can be placed on the bottom surface of the stage, and a transparent area can be placed on the stage so that the alignment sensor can sense the alignment of the substrate.


對準感測器可以包括:用來感應基板後面的第一感測器;用來感應基板側面的第二感測器;和用來感應基板的旋轉狀態的第三感測器。

The alignment sensor may include: a first sensor for sensing a rear surface of the substrate; a second sensor for sensing a side of the substrate; and a third sensor for sensing a rotation state of the substrate.

第一感測器、第二感測器、和第三感測器中的每一個都可以包括照明裝置和照相機。Each of the first sensor, the second sensor, and the third sensor may include a lighting device and a camera.

為了防止被放置在載物台之上的基板移動,可以在載物台中形成用來提供負壓力的負壓孔。In order to prevent the substrate placed on the stage from moving, a negative pressure hole for providing a negative pressure may be formed in the stage.


本發明的另一方面表徵為一種用於形成太陽能電池選擇性發射器的方法,其包括:將基板放置到載物台的之上,基板的上表面形成有第一發射器層,該第一發射器層中擴散並形成有n型雜質;對放置在載物台之上的基板進行預加熱;向第一發射器層的一部分輻射雷射,形成其中進一步擴散並形成有n型雜質的第二發射器層。

Another aspect of the invention is characterized by a method for forming a solar cell selective emitter, comprising: placing a substrate onto a stage, the upper surface of the substrate being formed with a first emitter layer, the first An n-type impurity is diffused in the emitter layer; the substrate placed on the stage is preheated; a portion of the first emitter layer is irradiated with a laser to form a portion in which the n-type impurity is further diffused and formed. Two emitter layers.


預加熱可以透過載物台進行。

Preheating can be carried out through the stage.

第二發射器層可以包括:在要形成母線電極的位置處形成的母線層;以及在要形成指狀電極的位置處形成的指狀層。雷射的輻射可以通過下面的裝置來進行:用來在第一方向上移動以形成母線層的第一雷射輻射裝置;以及用來在與第一方向交叉的第二方向上移動以形成指狀層的第二雷射輻射裝置。
The second emitter layer may include: a busbar layer formed at a position where the busbar electrode is to be formed; and a finger layer formed at a position where the finger electrode is to be formed. The radiation of the laser may be performed by means of: a first laser radiation device for moving in a first direction to form a busbar layer; and for moving in a second direction intersecting the first direction to form a finger a second layer of laser radiation.

第二發射器層可以包括:在要形成母線電極的位置處形成的母線層;和在要形成指狀電極的位置處形成的指狀層。雷射的輻射可以通過雷射輻射裝置來進行,該雷射輻射裝置可在第一方向上移動以形成母線層並且可在與第一方向交叉的第二方向上移動以形成指狀層。The second emitter layer may include: a busbar layer formed at a position where the busbar electrode is to be formed; and a finger layer formed at a position where the finger electrode is to be formed. The radiation of the laser may be performed by a laser radiation device that is movable in a first direction to form a busbar layer and that is movable in a second direction that intersects the first direction to form a finger layer.


雷射的輻射可以通過放置在基板的之上與基板分隔開的雷射輻射裝置來進行,並且所述方法還可以包括:感應放置在載物台之上的基板的對準狀態;以及根據基板的對準狀態校正雷射輻射裝置的位置。
感應基板的對準狀態可以包括:照明基板;和對基板的端部進行照相。

The radiation of the laser may be performed by a laser radiation device disposed above the substrate and separated from the substrate, and the method may further include: sensing an alignment state of the substrate placed on the stage; The alignment state of the substrate corrects the position of the laser radiation device.
The alignment state of the sensing substrate may include: illuminating the substrate; and taking a picture of the end of the substrate.

感應基板的對準狀態可以包括:感應基板前面;感應基板的側面;和感應基板的旋轉狀態。The alignment state of the sensing substrate may include: sensing the front surface of the substrate; sensing the side surface of the substrate; and sensing the rotation state of the substrate.


可以在載物台中形成負壓孔,並且所述方法還包括向基板提供負壓以固定放置在載物台之上的基板。

A negative pressure hole may be formed in the stage, and the method further includes providing a negative pressure to the substrate to fix the substrate placed on the stage.


本發明的優選實施例可以通過形成選擇性發射器提高太陽能電池的光電轉換效率,並且可以以穩定的方式形成選擇性發射器。

A preferred embodiment of the present invention can improve the photoelectric conversion efficiency of a solar cell by forming a selective emitter, and can form a selective emitter in a stable manner.

由於本發明可以有多種改變和實施例,所以將參照附圖闡述和描述某些實施例。然而,這並不意味著將本發明限制於某些實施例,而應理解為本發明包括本發明的理念和範圍所覆蓋的所有的改變、等效物和替代。在本發明的整個描述中,當決定描述某一技術而並未注意本發明的觀點時,將省略相關的詳細描述。Certain embodiments may be illustrated and described with reference to the drawings in the drawings. However, it is not intended that the invention be limited to the embodiments, and all modifications, equivalents and substitutions are included in the scope of the invention. In the entire description of the present invention, when it is decided to describe a certain technology without paying attention to the viewpoint of the present invention, the related detailed description will be omitted.



諸如“第一”和“第二”的術語可以用來描述各種元件,但是所述元件不應局限於上述術語。上述術語僅用來將一個元件與其他元件區分開。


Terms such as "first" and "second" may be used to describe various elements, but the elements are not limited to the above terms. The above terms are only used to distinguish one element from another.



說明書中所使用的術語僅用來描述某些實施例,而不意味著限制本發明。除非另有明確的使用,否則單數形式的表達包括多數形式的含義。在本說明書中,諸如“包含”或“包括”的表達旨在表明特徵、數量、步驟、操作、元件、部件、或其組合,並且不應被理解為排除任何一個或多個其它特徵、數量、步驟、操作、元件、部件、或其組合的存在或可能性。


The terms used in the specification are only used to describe certain embodiments, and are not intended to limit the invention. Unless expressly stated otherwise, the singular expression includes the meaning of the plural. In the present specification, the expression "includes" or "includes" is intended to indicate a feature, quantity, step, operation, element, component, or combination thereof, and should not be construed as excluding any one or more other features or quantities. The existence or possibility of steps, operations, components, components, or combinations thereof.



下面將參照附圖詳細描述根據本發明用於形成太陽能電池的選擇性發射器的方法和設備的優選實施例。不管是哪一附圖,相同或相應的元件都將賦予相同的參考標記,並且不再重複對相同或相應元件的任何冗餘描述。


Preferred embodiments of a method and apparatus for forming a selective emitter for a solar cell according to the present invention will be described in detail below with reference to the accompanying drawings. The same or corresponding elements will be given the same reference signs, and any redundant description of the same or corresponding elements will not be repeated.



請參閱第1圖至第11圖來描述根據本發明一方面的用於形成太陽能電池的選擇性發射器的方法。


Referring to Figures 1 through 11, a method for forming a selective emitter for a solar cell in accordance with an aspect of the present invention is described.


首先,將基板10放置到載物台200上(如第12圖所示之步驟S100),基板10的上表面形成有第一發射器層14,該第一發射器層14中擴散並形成有n型雜質12。載物台200支撐基板10,而且在基板10上形成選擇性發射器是當載物台200支撐基板10時進行的。通過在基板10固定在載物台200上時進行選擇性發射器的形成,可以以穩定的方式形成選擇性發射器而不會對基板10產生振動。

First, the substrate 10 is placed on the stage 200 (step S100 shown in FIG. 12), and the upper surface of the substrate 10 is formed with a first emitter layer 14 in which the first emitter layer 14 is diffused and formed. N-type impurity 12. The stage 200 supports the substrate 10, and the formation of the selective emitter on the substrate 10 is performed when the stage 200 supports the substrate 10. By performing the formation of the selective emitter while the substrate 10 is fixed on the stage 200, the selective emitter can be formed in a stable manner without vibrating the substrate 10.



基板10可以是摻雜有硼離子的p型矽基板,並且基板10的表面已經形成有第一發射器層14。也即,根據本實施例,選擇性發射器(即第二發射器層16)是通過與形成第一發射器層14的工序不同的工序形成的。


The substrate 10 may be a p-type germanium substrate doped with boron ions, and the surface of the substrate 10 has been formed with the first emitter layer 14. That is, according to the present embodiment, the selective emitter (i.e., the second emitter layer 16) is formed by a different process from the process of forming the first emitter layer 14.



在此,第一發射器層14相當於擴散並形成有諸如磷的雜質12的n層。為了製備這種基板10,可以將含有諸如磷的雜質12的溶液塗覆到矽基板10的表面上(如第2圖及第3圖所示),然後可以向矽基板10的表面施加能量E1(如第4圖所示)。當向矽基板10的表面施加能量E1時,雜質12的離子可以擴散到矽基板10中,形成第一發射器層14(如第5圖所示)。


Here, the first emitter layer 14 corresponds to an n layer which is diffused and formed with impurities 12 such as phosphorus. In order to prepare such a substrate 10, a solution containing an impurity 12 such as phosphorus may be applied onto the surface of the ruthenium substrate 10 (as shown in FIGS. 2 and 3), and then energy E1 may be applied to the surface of the ruthenium substrate 10. (as shown in Figure 4). When energy E1 is applied to the surface of the germanium substrate 10, ions of the impurity 12 may diffuse into the germanium substrate 10 to form a first emitter layer 14 (as shown in Fig. 5).



然後,如第6圖所示,對放置在載物台200上的基板10(如第12圖所示)進行預加熱(如步驟S200所示),然後向一部分的第一發射器層14輻射雷射L,形成其中進一步擴散並形成有n型雜質12的第二發射器層16(如步驟S300所示)。換言之,在將能量施加到整個基板10之後,向第一發射器層14中已經擴散有n型雜質12的部分輻射雷射L。


Then, as shown in Fig. 6, the substrate 10 placed on the stage 200 (as shown in Fig. 12) is preheated (as shown in step S200), and then radiated to a portion of the first emitter layer 14. The laser light L forms a second emitter layer 16 in which the n-type impurity 12 is further diffused and formed (as shown in step S300). In other words, after energy is applied to the entire substrate 10, the portion L of the first emitter layer 14 to which the n-type impurity 12 has been diffused is irradiated with the laser light L.



在此,為了在第一發射器層14的特定部分中形成第二發射器層16,通過預加熱而施加到基板10上的能量E3與通過雷射L而施加的能量E2的總和必需大於用於形成第一發射器層14的能量E1(E2+E3>E1)。如果僅用雷射L來施加比用於形成第一發射器層14的能量E1大的能量,就必需將過大強度的雷射L集中到基板10的特定部分上,這可能會在基板10的特定部分處造成損壞,如表面燒蝕。


Here, in order to form the second emitter layer 16 in a specific portion of the first emitter layer 14, the sum of the energy E3 applied to the substrate 10 by preheating and the energy E2 applied by the laser L must be greater than The energy E1 (E2+E3>E1) forming the first emitter layer 14 is formed. If only the laser L is used to apply energy greater than the energy E1 used to form the first emitter layer 14, it is necessary to concentrate the excessively intense laser light L onto a specific portion of the substrate 10, which may be on the substrate 10. Damage is caused at specific parts, such as surface ablation.



為了解決這個問題,在本實施例中通過與雷射L的輻射分開地進行預加熱工序,將一定量的能量E3通過預加熱施加到整個基板10,而將除了通過預加熱提供的能量E3外所需的能量E2通過雷射輻射來提供。如此一來,可以防止被雷射L輻射的區域與其餘區域之間的能量差別過大,由此防止基板10損壞。在此,預加熱工序和激光輻射工序可以連續或同時進行。


In order to solve this problem, in the present embodiment, by performing a preheating process separately from the radiation of the laser light L, a certain amount of energy E3 is applied to the entire substrate 10 by preheating, and the energy E3 supplied by the preheating will be used. The required energy E2 is provided by laser radiation. As a result, it is possible to prevent the energy difference between the region irradiated by the laser light L and the remaining region from being excessively large, thereby preventing the substrate 10 from being damaged. Here, the preheating process and the laser irradiation process can be carried out continuously or simultaneously.



當將比用於形成第一發射器層14的能量E1大的能量E2+E3如上所述通過預加熱和雷射輻射施加到一部分的第一發射器層14上時,n型雜質12進一步擴散到被雷射L輻射的那部分中,結果是在那部分第一發射器層14中形成了第二發射器層16(如第7圖所示)。下面將更詳細地描述這一原理。


When energy E2+E3 larger than the energy E1 for forming the first emitter layer 14 is applied to a portion of the first emitter layer 14 by preheating and laser irradiation as described above, the n-type impurity 12 is further diffused to the In that portion of the laser L radiation, the result is that a second emitter layer 16 is formed in that portion of the first emitter layer 14 (as shown in Figure 7). This principle will be described in more detail below.



當固體內的原子濃度不均勻時,固體內的原子通過熱運動從高濃度區域向低濃度區域擴散,直到整個固體內的原子濃度變均勻。這種擴散量與濃度梯度成比例的基於菲克第一定律的擴散現象可以用下面的公式來表示。


When the atomic concentration in the solid is not uniform, the atoms in the solid diffuse from the high concentration region to the low concentration region by thermal motion until the atomic concentration in the entire solid becomes uniform. This diffusion phenomenon based on Fick's first law, which is proportional to the concentration gradient, can be expressed by the following formula.

【公式1】


在[公式1]中,J是擴散量(即經過單位面積的擴散材料的量),D是擴散係數,C是擴散材料的濃度,x是擴散材料在Y軸上的移動距離。
【Formula 1】


In [Formula 1], J is the amount of diffusion (i.e., the amount of diffusion material per unit area), D is the diffusion coefficient, C is the concentration of the diffusion material, and x is the moving distance of the diffusion material on the Y-axis.


在此,擴散係數隨溫度升高而顯著增加,這可以用下面的公式表示。

Here, the diffusion coefficient increases remarkably with an increase in temperature, which can be expressed by the following formula.

【公式2】


[Formula 2]


在[公式2]中,D0是對溫度不敏感的常數,k是波茲曼常數,T是溫度。Q被稱為啟動能,它根據材料而具有2和5eV之間的數值。在第8圖及第9圖所示的圖表中圖示了根據[公式2],擴散係數隨溫度的變化。例如,當Q=2eV並且D0=8×10-5 m2/sec時,在300°K下D約為10-38 m2/sec,但是當T=1500°K時D顯著增加到10-11 m2/sec。In [Formula 2], D0 is a constant that is insensitive to temperature, k is a Boltzmann constant, and T is a temperature. Q is called the starting energy, which has a value between 2 and 5 eV depending on the material. The variation of the diffusion coefficient with temperature according to [Formula 2] is illustrated in the graphs shown in Figs. 8 and 9. For example, when Q=2eV and D0=8×10-5 m2/sec, D is about 10-38 m2/sec at 300°K, but D increases significantly to 10-11 m2 when T=1500°K. /sec.


因此,如第8圖所示,如果假設分別將能量E1和能量E2+E3提供到矽基板10的彼此具有不同溫度的兩個不同點上,因為這兩個點的擴散係數分別為彼此不同的D1和D2,所以雜質12達到的水準也變得不同(即擴散係數隨溫度升高而增加),從而使得在第一發射器層14的特定部分中形成第二發射器層16,而將兩個發射器層彼此區分開,如第7圖所示。

Therefore, as shown in Fig. 8, if it is assumed that the energy E1 and the energy E2+E3 are respectively supplied to the two different points of the tantalum substrate 10 having different temperatures from each other, since the diffusion coefficients of the two points are respectively different from each other, D1 and D2, so the level reached by the impurity 12 also becomes different (i.e., the diffusion coefficient increases with increasing temperature), so that the second emitter layer 16 is formed in a specific portion of the first emitter layer 14, and the two emitters are formed The layers are distinguished from each other, as shown in Figure 7.


如第9圖所示,可以在表示對數函數與溫度之間的倒數關係的圖表中重新繪製第8圖所示的圖表。下面的公式是與[公式2]表示的、在第9圖中示出的圖表相對應的對數函數。

As shown in Fig. 9, the graph shown in Fig. 8 can be redrawn in a graph showing the reciprocal relationship between the logarithmic function and the temperature. The following formula is a logarithmic function corresponding to the graph shown in Fig. 9 expressed by [Formula 2].


【公式3】


[Formula 3]


如第10圖所示,選擇性地形成在第一發射器層14上的第二發射器層16可以包括母線層16a和指狀層16b,母線層16a形成在要形成太陽能電池的母線電極13a的位置處(如第11圖所示);而指狀層16b形成在要形成指狀電極13b的位置處(如第11圖所示)。為了形成所有的母線層16a和指狀層16b,上述的雷射輻射工序可以分成用來形成母線層16a的第一工序和用來形成指狀層16b的第二工序。

As shown in FIG. 10, the second emitter layer 16 selectively formed on the first emitter layer 14 may include a bus bar layer 16a and a finger layer 16b formed on the bus bar electrode 13a where the solar cell is to be formed. The position of the finger (as shown in Fig. 11); and the finger layer 16b is formed at a position where the finger electrode 13b is to be formed (as shown in Fig. 11). In order to form all of the bus bar layer 16a and the finger layer 16b, the above-described laser irradiation process may be divided into a first process for forming the bus bar layer 16a and a second process for forming the finger layer 16b.


在此,應理解的是,第一工序和第二工序可以通過一個雷射輻射裝置或兩個雷射輻射裝置來進行。後面將描述用來進行該些工序的特定設備的結構。第11圖示出在指狀層16b上形成有指狀電極13b而在母線電極16a上形成有母線電極13a。排除了形成指狀電極13b和母線電極13a的區域形成有防反射膜11。

Here, it should be understood that the first process and the second process may be performed by one laser radiation device or two laser radiation devices. The structure of a specific device for performing these processes will be described later. Fig. 11 shows that the finger electrodes 13b are formed on the finger layer 16b and the bus bar electrodes 13a are formed on the bus bar electrodes 16a. An anti-reflection film 11 is formed in a region where the finger electrode 13b and the bus bar electrode 13a are formed.


至此,已經描述了根據本發明一個方面用來形成太陽能電池的選擇性發射器的方法,此後將描述根據本發明另一個方面用來形成太陽能電池的選擇性發射器的設備。上述用來形成太陽能電池的選擇性發射器的方法能夠通過與下述用來形成太陽能電池選擇性發射器的設備相同或類似的設備來進行。因此,應理解的是,對下面要描述的每一個設備的操作的描述也可以應用于上述用來形成太陽能電池的選擇性發射器的方法中。

Heretofore, a method for forming a selective emitter of a solar cell according to an aspect of the present invention has been described, and an apparatus for forming a selective emitter of a solar cell according to another aspect of the present invention will be described hereinafter. The above described method for forming a selective emitter of a solar cell can be carried out by the same or similar device as that used to form the solar cell selective emitter described below. Accordingly, it should be understood that the description of the operation of each of the devices to be described below can also be applied to the above-described method for forming a selective emitter of a solar cell.


如第12圖所示,根據本發明另一個方面用來形成太陽能電池的選擇性發射器的設備主要由下述部件構成:用於傳送基板10的傳送裝置100a、100b、100c(一起為“100”)(如第16圖所示),基板10上形成有第一發射器層14(如第7圖所示);用來支撐所提供的基板10的載物台200;用來對基板10進行預加熱的預加熱裝置300;以及雷射輻射裝置400,用來通過在第一發射器層14的某部分上輻射雷射而形成其中進一步擴散並形成有n型雜質的第二發射器層17(如第7圖所示)。

As shown in Fig. 12, an apparatus for forming a selective emitter of a solar cell according to another aspect of the present invention is mainly constituted by the following members: transfer means 100a, 100b, 100c for transporting the substrate 10 (together "100 together" ”) (as shown in FIG. 16), a first emitter layer 14 (shown in FIG. 7) is formed on the substrate 10; a stage 200 for supporting the provided substrate 10; Preheating device 300 for preheating; and laser radiation device 400 for forming a second emitter layer in which an n-type impurity is further diffused and formed by irradiating a laser over a portion of the first emitter layer 14. 17 (as shown in Figure 7).


傳送裝置100執行向載物台200提供其上已經形成有第一發射器層14的基板10的功能。雖然可以將機械手(未圖示)用於這樣的傳送裝置100,但是本實施例提出傳送帶,該傳送帶利於連續製造。通過如在本實施例中那樣使用傳送帶來實施傳送基板10的流水方法,能連續的處理,並且可以提高生產率。

The transfer device 100 performs a function of supplying the stage 200 with the substrate 10 on which the first emitter layer 14 has been formed. Although a robot (not shown) can be used for such a transport device 100, the present embodiment proposes a conveyor belt that facilitates continuous manufacture. By performing the flow method of transporting the substrate 10 using the transport belt as in the present embodiment, continuous processing can be performed, and productivity can be improved.


載物台200支撐通過傳送裝置100而提供的基板10,當基板10被載物台200支撐時,在基板10上選擇性地形成第二發射器層17。通過在基板10固定於載物台200上時選擇性地形成第二發射器層16,可以以穩定的方式形成選擇性發射器,而基板10不會發生振動。

The stage 200 supports the substrate 10 provided by the transfer device 100, and when the substrate 10 is supported by the stage 200, the second emitter layer 17 is selectively formed on the substrate 10. By selectively forming the second emitter layer 16 when the substrate 10 is fixed on the stage 200, the selective emitter can be formed in a stable manner without the substrate 10 vibrating.


如第16圖所示,上述傳送裝置100和載物台200可以以單一元件的形式來構成,在此將這種單一元件形式稱作傳送元件1000。後面將描述傳送元件1000的具體結構。

As shown in Fig. 16, the above-described conveying device 100 and stage 200 may be constructed in the form of a single element, and this single element form is referred to herein as a conveying element 1000. The specific structure of the transporting element 1000 will be described later.

由傳送裝置100提供到載物台200上的基板10可以是摻雜有硼離子、並且已經在其表面上形成有第一發射器層14的p型矽基板。製備其上預先形成有第一發射器層14的基板10的工序與前面的描述相同,因此在此將不提供具體描述。The substrate 10 provided by the transfer device 100 onto the stage 200 may be a p-type germanium substrate doped with boron ions and having the first emitter layer 14 formed on its surface. The process of preparing the substrate 10 on which the first emitter layer 14 is previously formed is the same as the foregoing description, and thus a detailed description will not be provided herein.



預加熱裝置300執行對載物台200所支撐的基板100進行預加熱的功能。通過預加熱裝置300向整個基板10施加一定量的能量E3(如第6圖所示)並且通過雷射輻射裝置400提供除了通過預加熱提供的能量E3外所需的能量E2(如第6圖所示),可以防止經雷射L輻射的區域與未經雷射L輻射的區域之間的能量差別過大。從而如前所述,可以防止由於向基板10相關區域集中了過大強度的輻射雷射而損壞基板10的相關區域。


The preheating device 300 performs a function of preheating the substrate 100 supported by the stage 200. A certain amount of energy E3 is applied to the entire substrate 10 by the preheating device 300 (as shown in FIG. 6) and the energy E2 required by the energy E3 provided by the preheating is provided by the laser radiation device 400 (as shown in FIG. 6). As shown, it is possible to prevent the energy difference between the area irradiated by the laser L and the area not irradiated by the laser L from being excessive. Thus, as described above, it is possible to prevent the relevant region of the substrate 10 from being damaged due to the excessively intense radiation laser concentrated on the relevant region of the substrate 10.



預加熱裝置300可以通超載物台200對基板10進行預加熱。也即,預加熱裝置300可以加熱載物台200以使被加熱的載物台200對基板10進行預加熱。在這種情況下,如第12圖所示,可以採用嵌入在載物台200中的加熱線圈作為預加熱裝置300。


The preheating device 300 can preheat the substrate 10 through the overload stage 200. That is, the preheating device 300 can heat the stage 200 to preheat the substrate 10 by the heated stage 200. In this case, as shown in Fig. 12, a heating coil embedded in the stage 200 can be employed as the preheating means 300.



雖然在本實施例中描述了經由載物台200預加熱基板10,但是本發明不限於本實施例中所描述的方式,應該可以獨立於載物台200而採用能直接加熱基板10的非接觸型預加熱裝置。


Although the substrate 10 is preheated via the stage 200 in the present embodiment, the present invention is not limited to the manner described in the embodiment, and it is possible to employ a non-contact capable of directly heating the substrate 10 independently of the stage 200. Type preheating device.



雷射輻射裝置400與載物台分隔開而位於載物台200的上方,並且向載物台200所支撐的基板10的預定部位輻射雷射L。在被雷射輻射的部分處,雜質進一步擴散以允許形成第二發射器層16。


The laser radiation device 400 is spaced apart from the stage and located above the stage 200, and radiates the laser light L to a predetermined portion of the substrate 10 supported by the stage 200. At the portion that is irradiated by the laser, the impurities are further diffused to allow formation of the second emitter layer 16.



如前面參照第10圖所示,選擇性地形成在第一發射器層14上的第二發射器層16可以包括母線層16a和指狀層16b,該母線層16a形成在要形成太陽能電池的母線電極13a的位置處(如第11圖所示);而指狀層16b形成在要形成指狀電極13b的位置處(如第11圖所示)。為了形成所有的母線層16a和指狀層16b,雷射輻射工序可以分成用來形成母線層16a的第一工序和用來形成指狀層16b的第二工序。


As previously described with reference to FIG. 10, the second emitter layer 16 selectively formed on the first emitter layer 14 may include a bus bar layer 16a and a finger layer 16b formed on a solar cell to be formed. The position of the bus bar electrode 13a (as shown in Fig. 11); and the finger layer 16b is formed at a position where the finger electrode 13b is to be formed (as shown in Fig. 11). In order to form all of the bus bar layer 16a and the finger layer 16b, the laser irradiation process may be divided into a first process for forming the bus bar layer 16a and a second process for forming the finger layer 16b.



在此,應理解的是,第一工序和第二工序可以由一個雷射輻射裝置400或兩個激光輻射裝置400a、400b來進行(如第13圖及第15圖所示)。第13圖係表示用來執行第一工序的可沿一個方向(例如x軸方向)移動的第一雷射輻射裝置400a和用來執行第二工序的可沿另一個方向(例如y軸方向)移動的第二雷射輻射裝置400b。


Here, it should be understood that the first process and the second process may be performed by one laser radiation device 400 or two laser radiation devices 400a, 400b (as shown in Figs. 13 and 15). Figure 13 is a view showing the first laser radiation device 400a movable in one direction (e.g., the x-axis direction) for performing the first process and the other direction (e.g., the y-axis direction) for performing the second process. Moving second laser radiation device 400b.



第14圖係表示一個沿x軸方向和y軸方向都可移動使得能夠執行第一工序和第二工序的激光輻射裝置400。


Fig. 14 shows a laser irradiation device 400 which is movable in both the x-axis direction and the y-axis direction so that the first process and the second process can be performed.



如第15圖所示,可以存在兩個順序排列的傳送元件1000a、1000b和兩個激光輻射裝置400a、400b來執行第一工序和第二工序。亦即,第一工序可在前傳送組件1000a的載物台200a上用可沿x軸方向移動的第一雷射輻射裝置400a來進行,第二工序可在後傳送元件1000b的載物台200b上用可沿y軸方向移動的第二雷射輻射裝置400b來進行。


As shown in Fig. 15, there may be two sequentially arranged transport elements 1000a, 1000b and two laser irradiation devices 400a, 400b to perform the first process and the second process. That is, the first process can be performed on the stage 200a of the front transport unit 1000a with the first laser radiation device 400a movable in the x-axis direction, and the second process can be performed on the stage 200b of the rear transport element 1000b. The upper laser radiation device 400b is movable in the y-axis direction.



雖然第15圖示出了兩個傳送組件1000a、1000b分開預定的距離,但是所述兩個傳送元件1000a、1000b應該也可以連續設置使得可以通過設置在兩個載物台之間的傳送帶連續地傳送基板。


Although FIG. 15 shows that the two transport assemblies 1000a, 1000b are separated by a predetermined distance, the two transport elements 1000a, 1000b should also be continuously arranged so that they can be continuously connected by a conveyor belt disposed between the two stages. Transfer the substrate.


下面請參閱第16圖至第19圖將更詳細地描述傳送元件100的結構。由於第15圖示出的兩個傳送元件1000a、1000b相同,所以在此將不單獨描述這兩個元件。

The structure of the conveying member 100 will be described in more detail below with reference to Figs. 16 to 19. Since the two transport elements 1000a, 1000b shown in Fig. 15 are identical, these two elements will not be separately described herein.



傳送元件1000配置為容納基板10,在雷射輻射的時候支撐基板並且將已經完成雷射輻射的基板10傳送到下面的工序。第16圖示出了傳送組件100,包括:通常成板形的載物台架500;放置在載物台架500上的前傳送裝置100a;載物台元件TA;以及後傳送裝置100b。


The transport element 1000 is configured to receive the substrate 10, support the substrate at the time of laser radiation, and transfer the substrate 10 that has completed the laser radiation to the following process. Fig. 16 shows a transport assembly 100 comprising: a generally pallet-shaped carrier gantry 500; a front conveyor 100a placed on the carrier gantry 500; a stage element TA; and a rear conveyor 100b.

前傳送裝置100a執行向載物台元件TA提供基板10的功能,後傳送裝置100b執行將已經完成雷射輻射的基板10傳送到下面的工序的功能。載物台元件TA提供有來自前傳送裝置100a的基板10,並執行在向基板10輻射雷射時支撐基板10的功能。在此,在載物台元件TA上設置中心傳送裝置100c。The front transfer device 100a performs a function of supplying the substrate 10 to the stage element TA, and the post transfer device 100b performs a function of transferring the substrate 10 that has completed the laser irradiation to the lower process. The stage element TA is supplied with the substrate 10 from the front transfer device 100a, and performs a function of supporting the substrate 10 when irradiating a laser to the substrate 10. Here, the center conveyor 100c is provided on the stage element TA.



在本實施例中,將傳送帶用於前傳送裝置100a、後傳送裝置100b、和中心傳送裝置100c。通過實施使用傳送帶的流水類型,以達到連續處理之目的,並且可以提高產量。中心傳送裝置100c將基板100放置在載物台200上,可以通過將該中心傳送裝置100c與具有輥子240(如第17圖所示)等的傳送帶框架260(如第17圖所示)耦接來操作該中心傳送裝置100c。


In the present embodiment, a conveyor belt is used for the front conveyor 100a, the rear conveyor 100b, and the center conveyor 100c. By implementing the type of flow using the conveyor belt, for continuous processing purposes, and increasing throughput. The center transfer device 100c places the substrate 100 on the stage 200, and can couple the center transfer device 100c to a belt frame 260 (shown in Fig. 17) having a roller 240 (shown in Fig. 17) or the like. The center conveyor 100c is operated.



如上所述,如果採用傳送帶作為將基板10放置到載物台200上的傳送裝置100,則可以將載物台200設置在中心傳送裝置100c(即傳送帶)下面的預定位置處。然而,本發明不限於此,而可以根據傳送裝置100的結構來改變載物台200的位置。


As described above, if a conveyor belt is employed as the conveying device 100 for placing the substrate 10 on the stage 200, the stage 200 can be disposed at a predetermined position below the center conveying device 100c (i.e., the conveyor belt). However, the present invention is not limited thereto, and the position of the stage 200 may be changed according to the configuration of the conveying device 100.



如第16圖所示,感應基板10的傳送的基板感測器110可以放置在載物台200前面。基板感測器110可以通過感應正在向載物台200傳送的基板10而執行將基板10停止在精確位置處的功能。為了執行這一功能,基板感測器110可以探測基板10的傳送,然後在經過預定的時間(例如1.5秒)之後停止傳送帶100的運行。


As shown in FIG. 16, the substrate sensor 110 that transmits the sensing substrate 10 can be placed in front of the stage 200. The substrate sensor 110 can perform a function of stopping the substrate 10 at a precise position by sensing the substrate 10 being transferred to the stage 200. In order to perform this function, the substrate sensor 110 can detect the transfer of the substrate 10 and then stop the operation of the transfer belt 100 after a predetermined time (for example, 1.5 seconds) elapses.



載物台200的上表面可以形成插入槽230(如第17圖所示),使得傳送帶100c可以插入槽230中。通過在載物台200中形成之插入槽230,可以防止基板10與載物台200被傳送帶100c不必要地分隔開,使得載物台200可以以更穩定的方式支撐基板10。


The upper surface of the stage 200 may be formed with an insertion groove 230 (as shown in Fig. 17) so that the conveyor belt 100c can be inserted into the groove 230. By the insertion groove 230 formed in the stage 200, it is possible to prevent the substrate 10 and the stage 200 from being unnecessarily separated by the conveyor belt 100c, so that the stage 200 can support the substrate 10 in a more stable manner.



根據本實施例用於形成太陽能電池選擇性發射器的設備可以包括對準感測器222a、222b、222c(如第18圖所示),所述對準感測器感應放置於載物台200之上的基板10的對準狀態。為了確保激光輻射裝置400與基板10之間的匹配,對準感測器222探測於載物台200之上放置的基板10的對準狀態。探測到的基板10的對準狀態被發送到上述激光輻射裝置400、400a、400b,基於基板10的對準狀態可以校正雷射輻射裝置400、400a、400b的位置。


The apparatus for forming a solar cell selective emitter according to the present embodiment may include alignment sensors 222a, 222b, 222c (as shown in FIG. 18) that are placed on the stage 200 inductively. The alignment state of the substrate 10 above. In order to ensure matching between the laser irradiation device 400 and the substrate 10, the alignment sensor 222 detects an alignment state of the substrate 10 placed over the stage 200. The detected alignment state of the substrate 10 is transmitted to the above-described laser irradiation devices 400, 400a, 400b, and the position of the laser irradiation devices 400, 400a, 400b can be corrected based on the alignment state of the substrate 10.



對於對準感測器222,本實施例提出在載物台200下方放置的照相機和照明裝置。為此,載物台200可以具有透明的區域220a、220b、220c(一起為“220”,如第17圖所示),使得照相機可以感應基板10的對準狀態。在此,應理解的是,透明區域200並不必然意味著完全透明,而可以是足夠透明以光學地感應基板10的對準狀態。本實施例的透明區域220以石英來提供。


For the alignment sensor 222, the present embodiment proposes a camera and illumination device placed under the stage 200. To this end, the stage 200 can have transparent regions 220a, 220b, 220c (collectively "220", as shown in FIG. 17) such that the camera can sense the alignment of the substrate 10. Here, it should be understood that the transparent region 200 does not necessarily mean completely transparent, but may be sufficiently transparent to optically sense the alignment state of the substrate 10. The transparent region 220 of this embodiment is provided in quartz.



對準感測器222可以包括:用來感應基板10後面的第一感測器222a;,用來感應基板10側面的第二感測器222b;以及用來感應基板10的旋轉狀態的第三感測器222c。因此,X軸和Y軸方向上的對準誤差可以通過用第一感測器222a和第二感測器222b感應後面和側面邊緣來確定,而旋轉對準誤差可以用第三感測器222c來確定。


The alignment sensor 222 may include: a first sensor 222a for sensing the rear of the substrate 10; a second sensor 222b for sensing the side of the substrate 10; and a third for sensing the rotation state of the substrate 10. Sensor 222c. Therefore, the alignment errors in the X-axis and Y-axis directions can be determined by sensing the back and side edges with the first sensor 222a and the second sensor 222b, and the rotation alignment error can be made with the third sensor 222c. to make sure.



一旦感應到基板10的對準狀態,就可以通超載物台升降機250(如第17圖所示)提升載物台200和放置在載物台200之上的基板10。載物台升降機250執行使載物台200提升和降低預定高度的功能。在基板10被載物台升降機250提升的同時,可以在基板10上進行雷射輻射。


Once the alignment of the substrate 10 is sensed, the stage 200 and the substrate 10 placed over the stage 200 can be lifted by the overload stage elevator 250 (as shown in FIG. 17). The stage elevator 250 performs a function of raising and lowering the stage 200 by a predetermined height. While the substrate 10 is lifted by the stage elevator 250, laser radiation can be performed on the substrate 10.



載物台升降機250可以包括:沿載物台200的外邊緣彼此分開地設置並且可垂直延伸的多條支撐腿251;用來垂直地移動傳送帶架260的汽缸252。每條支撐腿251可以固定到支撐架253上以進行更好的組裝。其他可以用於載物台升降機250的功率傳送結構可以包括線性致動器(未圖示)和齒輪傳動鏈(未圖示)。

載物台200中還可以形成有負壓孔210以防止放置在載物台200上的基板10移動。通過在載物台200中形成負壓孔210和例如用泵(未圖示)向基板10的底面提供負壓,基板10變得緊密地依附到載物台200上,防止基板10的對準狀態陷入混亂。


The stage elevator 250 may include a plurality of support legs 251 disposed apart from each other along the outer edge of the stage 200 and vertically extendable; a cylinder 252 for vertically moving the belt carrier 260. Each support leg 251 can be secured to the support frame 253 for better assembly. Other power transfer structures that may be used for the stage lift 250 may include linear actuators (not shown) and gear trains (not shown).

A negative pressure hole 210 may also be formed in the stage 200 to prevent the substrate 10 placed on the stage 200 from moving. By forming the negative pressure hole 210 in the stage 200 and providing a negative pressure to the bottom surface of the substrate 10, for example, by a pump (not shown), the substrate 10 becomes closely attached to the stage 200, preventing alignment of the substrate 10. The state is in chaos.



至此,已經描述了根據本發明另一個方面用於形成太陽能電池的選擇性發射器的設備結構,下面將描述根據本發明一實施例的設備的操作。


Heretofore, the device structure for forming a selective emitter of a solar cell according to another aspect of the present invention has been described, and the operation of the device according to an embodiment of the present invention will be described below.



一旦將基板10提供到載物台200上,預加熱裝置300就向基板10提供熱能。熱能的提供可以一直持續到完成雷射輻射。


Once the substrate 10 is provided onto the stage 200, the preheating device 300 provides thermal energy to the substrate 10. The supply of thermal energy can continue until the completion of the laser radiation.



對準感測器222感應放置於載物台200之上的基板10的對準狀態,然後提升其上放置了基板10的載物台200。


The alignment sensor 222 senses the alignment state of the substrate 10 placed on the stage 200, and then lifts the stage 200 on which the substrate 10 is placed.



探測到的基板10的對準狀態被傳送給與載物台200分開並放置在載物台200之上的雷射輻射裝置400,根據基板10的對準狀態校正雷射輻射裝置400的位置。


The detected alignment state of the substrate 10 is transmitted to the laser radiation device 400 separated from the stage 200 and placed on the stage 200, and the position of the laser irradiation device 400 is corrected in accordance with the alignment state of the substrate 10.



經位置校正的雷射輻射裝置400向基板10上的預定位置輻射雷射,選擇性地形成第二發射器層16(如第17圖所示)。


The position-corrected laser radiation device 400 radiates a laser to a predetermined location on the substrate 10 to selectively form a second emitter layer 16 (as shown in Figure 17).



一旦完成雷射輻射,就將載物台降低到其原始位置,然後傳送基板10進行下面的工序。


Once the laser radiation is completed, the stage is lowered to its original position, and then the substrate 10 is transferred for the following process.



雖然已經描述了本發明的特定優選實施例,但是應理解的是,在不背離本發明的技術理念和範圍下,本領域技術人員可以對本發明進行各種修改和變化。


While the invention has been described with respect to the preferred embodiments of the present invention, it is understood that various modifications and changes may be made by those skilled in the art without departing from the scope of the invention.



還應理解,除了上述的實施例之外,在本發明的權利要求中還有許多其他實施例。





It should also be understood that there are many other embodiments in the claims of the invention in addition to the embodiments described above.



S100、S200、S300...步驟S100, S200, S300. . . step

10...基板10. . . Substrate

11...防反射膜11. . . Anti-reflection film

110...基板感測器110. . . Substrate sensor

12...雜質12. . . Impurity

13a...母線電極13a. . . Bus bar electrode

13b...指狀電極13b. . . Finger electrode

14...第一發射器層14. . . First emitter layer

16...第二發射器層16. . . Second emitter layer

16a...母線層16a. . . Bus layer

16b...指狀層16b. . . Finger layer

1000、1000a、1000b...傳送組件1000, 1000a, 1000b. . . Transfer component

100a,100b,100c...傳送裝置100a, 100b, 100c. . . Conveyor

200、200a、200b...載物台200, 200a, 200b. . . Stage

210...負壓孔210. . . Negative pressure hole

220、220a、220b、220c...透明的區域220, 220a, 220b, 220c. . . Transparent area

222、222a、222b、222c...對準感測器222, 222a, 222b, 222c. . . Alignment sensor

230...插入槽230. . . Insert slot

240...輥子240. . . Roller

250...載物台升降機250. . . Stage lift

251...支撐腿251. . . Support leg

252...汽缸252. . . cylinder

253...支撐架253. . . Support frame

260...傳送帶框架260. . . Conveyor frame

300...預加熱裝置300. . . Preheating device

400、400a、400b...雷射輻射裝置400, 400a, 400b. . . Laser radiation device

500...載物台架500. . . Carrier stand

E1、E2、E3...能量E1, E2, E3. . . energy

L...雷射L. . . Laser

TA...載物台元件TA. . . Stage component

第1圖係為本發明一方面用於形成太陽能電池的選擇性發射器的方法流程圖。1 is a flow chart of a method for forming a selective emitter of a solar cell on the one hand of the present invention.


第2圖和第3圖係為在基板的表面上塗覆雜質。

Figures 2 and 3 show the application of impurities on the surface of the substrate.

第4圖係為向基板施加能量以形成第一發射器層。Figure 4 is the application of energy to the substrate to form a first emitter layer.


第5圖係為其上形成有第一發射器層的基板的剖面圖。

Figure 5 is a cross-sectional view of a substrate on which a first emitter layer is formed.

第6圖係為輻射雷射以形成第二發射器層。Figure 6 is a radiation laser to form a second emitter layer.


第7圖係為形成有第二發射器層的基板的剖面圖。

Figure 7 is a cross-sectional view of a substrate on which a second emitter layer is formed.

第8圖及第9圖係為擴散係數隨溫度變化的圖表。Fig. 8 and Fig. 9 are graphs showing the diffusion coefficient as a function of temperature.


第10圖係為如何形成母線層和指狀層的平面圖。

Figure 10 is a plan view of how the busbar layer and the finger layer are formed.

第11圖係為如何形成母線電極和指狀電極的平面圖。Figure 11 is a plan view of how the bus bar electrodes and the finger electrodes are formed.


第12圖係為本發明另一個方面用於形成太陽能電池的選擇性發射器的設備的側視圖。

Figure 12 is a side elevational view of an apparatus for forming a selective emitter for a solar cell in accordance with another aspect of the invention.


第13圖至第15圖係為本發明另一個方面用於形成太陽能電池的選擇性發射器的設備的多種實施例的透視圖。

Figures 13 through 15 are perspective views of various embodiments of an apparatus for forming a selective emitter for a solar cell in accordance with another aspect of the present invention.


第16圖係為傳送組件的平面圖。

Figure 16 is a plan view of the transfer assembly.

第17圖係為載物台組件的透視圖。
Figure 17 is a perspective view of the stage assembly.

第18圖係為第17圖所示除去了載物台的平面圖。Figure 18 is a plan view showing the stage removed as shown in Figure 17.

第19圖係為載物台組件的側視圖。
Figure 19 is a side view of the stage assembly.

400a、400b...雷射輻射裝置400a, 400b. . . Laser radiation device

1000...傳送組件1000. . . Transfer component

Claims (17)

一種用於形成太陽能電池的選擇性發射器之設備,包括:一傳送裝置,用以傳送一基板,該基板之上表面上形成一第一發射器層,該第一發射器層中擴散並形成n型雜質;一載物台,由該傳送裝置向該載物台提供該基板並且該載物台支撐所提供之該基板;一預加熱裝置,用以對該載物台所支撐之該基板進行預加熱;一雷射輻射裝置,位於該載物台之上方與該載物台分隔開,並且用以於一部分之該第一發射器層上輻射雷射以形成一第二發射器層,該第二發射器層中進一步擴散並形成n型雜質;以及一對準感測器,感應設置在該載物台之上之該基板之對準狀態,其中該雷射輻射裝置的位置是根據該基板之對準狀態進行校正,其中該對準感測器設置於該載物台之一下面,以及其中於該載物台中設有一透明區域,使得該對準感測器感應該基板之對準狀態。 An apparatus for forming a selective emitter of a solar cell, comprising: a transfer device for transporting a substrate, a first emitter layer is formed on an upper surface of the substrate, and the first emitter layer is diffused and formed An n-type impurity; a stage provided by the transfer device to the stage and supporting the substrate provided by the stage; a preheating device for performing the substrate supported by the stage Preheating; a laser radiation device located above the stage and spaced apart from the stage, and configured to radiate a portion of the first emitter layer to form a second emitter layer, Further diffusing and forming an n-type impurity in the second emitter layer; and an alignment sensor sensing an alignment state of the substrate disposed on the stage, wherein the position of the laser radiation device is based Correcting an alignment state of the substrate, wherein the alignment sensor is disposed under one of the stages, and wherein a transparent area is disposed in the stage such that the alignment sensor senses the pair of the substrate Quasi-state. 如申請專利範圍第1項所述之設備,其中該預加熱裝置透過該載物台對基板進行預加熱。 The apparatus of claim 1, wherein the preheating device preheats the substrate through the stage. 如申請專利範圍第1項所述之設備,其中該第二發射器層包括:在要形成母線電極的位置處形成的母線層;在要形成指狀電極的位置處形成的指狀層,其中,雷射輻射裝置包括:第一雷射輻射裝置,於第一方向上係可移動之以形成該母線層;以及 第二雷射輻射裝置,於與第一方向交叉的第二方向上係可移動之以形成該指狀層。 The apparatus of claim 1, wherein the second emitter layer comprises: a busbar layer formed at a position where the busbar electrode is to be formed; and a finger layer formed at a position where the finger electrode is to be formed, wherein The laser radiation device includes: a first laser radiation device movable in a first direction to form the bus layer; The second laser radiation device is movable in a second direction crossing the first direction to form the finger layer. 如申請專利範圍第3項所述之設備,其中該載物台包括順序地排列之一第一載物台和一第二載物台,其中該第一雷射輻射裝置放置於該第一載物台的一上面並且用來形成該母線層,以及其中該第二雷射輻射裝置放置於該第二載物台的一上面並且用來形成該指狀層。 The apparatus of claim 3, wherein the stage comprises a first stage and a second stage sequentially arranged, wherein the first laser radiation device is placed in the first load An upper surface of the stage and used to form the bus layer, and wherein the second laser radiation device is placed on top of the second stage and used to form the finger layer. 如申請專利範圍第1項所述之設備,其中該第二發射器層包括:在要形成母線電極的位置處形成的母線層;在要形成指狀電極的位置處形成的指狀層,其中該雷射輻射裝置在第一方向上是可移動的以形成該母線層,並且在與第一方向交叉的第二方向上是可移動的以形成該指狀層。 The apparatus of claim 1, wherein the second emitter layer comprises: a busbar layer formed at a position where the busbar electrode is to be formed; and a finger layer formed at a position where the finger electrode is to be formed, wherein The laser radiation device is movable in a first direction to form the busbar layer and is movable in a second direction that intersects the first direction to form the finger layer. 如申請專利範圍第1項所述之設備,其中該傳送裝置包括一傳送帶,並且其中該載物台放置於該傳送帶的一下面。 The apparatus of claim 1, wherein the conveying device comprises a conveyor belt, and wherein the stage is placed under one of the conveyor belts. 如申請專利範圍第6項所述之設備,還包括一基板感測器,該基板感測器設置於該載物台前面並且感應該基板之傳送以及控制該傳送帶之操作使得基板放置並且停止在載物台之上。 The device of claim 6, further comprising a substrate sensor disposed in front of the stage and sensing the transfer of the substrate and controlling the operation of the conveyor such that the substrate is placed and stopped at Above the stage. 如申請專利範圍第1項所述之設備,其中該對準感測器包括:一第一感測器,用以感應該基板之後面;一第二感測器,用以感應該基板之側面;以及一第三感測器,用以感應該基板之旋轉狀態。 The device of claim 1, wherein the alignment sensor comprises: a first sensor for sensing a rear surface of the substrate; and a second sensor for sensing a side of the substrate And a third sensor for sensing the rotation state of the substrate. 如申請專利範圍第8項所述之設備,其中該第一感測器、該第二感測器、以及該第三感測器中都包括一照明裝置及一照相機。 The device of claim 8, wherein the first sensor, the second sensor, and the third sensor comprise a lighting device and a camera. 如申請專利範圍第1項所述之設備,其中該載物台中形成有用以 提供負壓力之一負壓孔以防止設置於該載物台之上之該基板移動。 The apparatus of claim 1, wherein the stage is formed to be useful A negative pressure port of negative pressure is provided to prevent movement of the substrate disposed above the stage. 一種用來形成太陽能電池的選擇性發射器之方法,包括步驟:將一基板放置到一載物台之上,該基板上表面上形成一第一發射器層,該第一發射器層中擴散並形成n型雜質;對放置在該載物台之上之該基板進行預加熱;以及向該第一發射器層之一部分輻射雷射,進一步形成擴散並形成n型雜質之一第二發射器層;其中通過放置於該基板之上方與該基板分隔開之一雷射輻射裝置來進行雷射的輻射,並且該方法還包括以下步驟:使用一對準感測器來感應設置於該載物台之上之該基板之對準狀態;以及根據該基板之對準狀態校正該雷射輻射裝置之位置,其中該對準感測器設置於該載物台之一下面,並且其中於該載物台中設有一透明區域,使得該對準感測器感應該基板之對準狀態。 A method for forming a selective emitter for a solar cell, comprising the steps of: placing a substrate on a stage on which a first emitter layer is formed, the first emitter layer diffusing Forming an n-type impurity; preheating the substrate placed on the stage; and radiating a portion of the first emitter layer to further form a second emitter that diffuses and forms one of the n-type impurities a layer; wherein the laser radiation is performed by a laser radiation device disposed above the substrate and separated from the substrate, and the method further comprises the step of: sensing an arrangement of the carrier using an alignment sensor An alignment state of the substrate above the stage; and correcting a position of the laser radiation device according to an alignment state of the substrate, wherein the alignment sensor is disposed under one of the stages, and wherein A transparent area is provided in the stage such that the alignment sensor senses the alignment state of the substrate. 如申請專利範圍第11項所述之方法,其中透過該載物台進行預加熱。 The method of claim 11, wherein the preheating is performed through the stage. 如申請專利範圍第11項所述之方法,其中該第二發射器層包括:在要形成母線電極的位置處形成的母線層;在要形成指狀電極的位置處形成的指狀層,並且其中雷射之輻射可以通過下面的裝置來進行:一第一雷射輻射裝置,用以於第一方向上移動以形成母線層;以及第二雷射輻射裝置,用來在與第一方向交叉的第二方向上移 動以形成指狀層。 The method of claim 11, wherein the second emitter layer comprises: a busbar layer formed at a position where the busbar electrode is to be formed; a finger layer formed at a position where the finger electrode is to be formed, and The radiation of the laser may be performed by: a first laser radiation device for moving in a first direction to form a busbar layer; and a second laser radiation device for crossing the first direction Move in the second direction Move to form a finger layer. 如申請專利範圍第11項所述之方法,其中該第二發射器層包括:在要形成母線電極的位置處形成的母線層;在要形成指狀電極的位置處形成的指狀層,並且其中通過雷射輻射裝置來進行雷射的輻射,該雷射輻射裝置在第一方向上是可移動的以形成母線層並且該雷射輻射裝置在與第一方向交叉的第二方向上是可移動的以形成指狀層。 The method of claim 11, wherein the second emitter layer comprises: a busbar layer formed at a position where the busbar electrode is to be formed; a finger layer formed at a position where the finger electrode is to be formed, and Wherein the radiation of the laser is performed by a laser radiation device that is movable in a first direction to form a busbar layer and the laser radiation device is in a second direction crossing the first direction Moved to form a finger layer. 如申請專利範圍第11項所述之方法,其中感應該基板之對準狀態包括步驟:照明該基板;以及對該基板之端部進行照相。 The method of claim 11, wherein sensing the alignment state of the substrate comprises the steps of: illuminating the substrate; and photographing the end of the substrate. 如申請專利範圍第11項所述之方法,其中感應該基板之對準狀態包括:感應該基板之後面;感應該基板之側面;以及感應該基板之旋轉狀態。 The method of claim 11, wherein sensing the alignment state of the substrate comprises: sensing a rear surface of the substrate; sensing a side surface of the substrate; and sensing a rotation state of the substrate. 如申請專利範圍第11項所述之方法,其中於該載物台中形成一負壓孔,並且所述方法還包括向該基板提供一負壓以固定設置於該載物台之上之該基板。 The method of claim 11, wherein a negative pressure hole is formed in the stage, and the method further comprises: providing a negative pressure to the substrate to fix the substrate disposed on the stage .
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