TWI443208B - Evaporation apparatus - Google Patents
Evaporation apparatus Download PDFInfo
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- TWI443208B TWI443208B TW97120463A TW97120463A TWI443208B TW I443208 B TWI443208 B TW I443208B TW 97120463 A TW97120463 A TW 97120463A TW 97120463 A TW97120463 A TW 97120463A TW I443208 B TWI443208 B TW I443208B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Description
本發明係關於一種蒸發裝置，尤指一種可於大尺寸基板上沉積均勻厚度蒸發材料且具簡化結構之蒸發裝置。The present invention relates to an evaporation apparatus, and more particularly to an evaporation apparatus which can deposit a uniform thickness of evaporation material on a large-sized substrate and has a simplified structure.
蒸發裝置一般係在以真空幫浦排氣及減壓之真空室中，藉由加熱及蒸發填入蒸發源之材料，將材料沉積於基板上。The evaporation device is generally deposited on a substrate by heating and evaporating a material filled in the evaporation source in a vacuum chamber for evacuating and decompressing the vacuum pump.
近來，可於基板上沉積蒸發材料之蒸發裝置的在短時間內的需求日益提升。舉例而言，已經發展出具有大尺寸蒸發源之蒸發裝置，且此蒸發源具有寬度同於基板寬度之長形開口，所以蒸發裝置可以在移動基板的同時，進行蒸發製程。但是因移動基板需要空間，所以無可避免的會使得此種裝置尺寸提升，且因大尺寸源的溫度控制困難，所以沉積膜的均勻度低。Recently, the demand for an evaporation device capable of depositing an evaporation material on a substrate has been increasing in a short period of time. For example, an evaporation device having a large-sized evaporation source has been developed, and the evaporation source has an elongated opening having a width equal to the width of the substrate, so that the evaporation device can perform an evaporation process while moving the substrate. However, since the space required for moving the substrate is inevitable, the size of such a device is inevitably increased, and the uniformity of the deposited film is low due to difficulty in temperature control of the large-sized source.
因此，發展出具有蒸發源的蒸發裝置，此蒸發源能夠在蒸發材料至懸掛基板上的同時進行移動。然而，此蒸發裝置所需的製程時間長，且其所使用之移動部包含會產生出許多顆粒之滾珠螺桿。Therefore, an evaporation device having an evaporation source capable of moving while evaporating the material onto the suspension substrate has been developed. However, the evaporation apparatus requires a long process time, and the moving portion used therein contains a ball screw which generates a large number of particles.
另外，亦有研究持續發展具有複數個蒸發源的蒸發裝置，其中每一個蒸發源包含一來源及一移動部，以在短時間內，蒸發材料至大尺寸基板上。不過，因需要複數個移動部去移動複數個蒸發源，所以此種裝置複雜且昂貴。In addition, research has continued to develop evaporation devices having a plurality of evaporation sources, each of which includes a source and a moving portion to evaporate material onto a large-sized substrate in a short time. However, such a device is complicated and expensive because a plurality of moving parts are required to move a plurality of evaporation sources.
據此，為解決先前技術中所發生如上述問題，因而構想出本發明；而本發明之目的在於提供一種蒸發裝置，其可在縮短蒸發製程的時間，同時可改善沉積於基板上之蒸發材料厚度的均勻度。Accordingly, the present invention has been conceived to solve the problems as described above in the prior art; and an object of the present invention is to provide an evaporation device which can shorten the evaporation process time while improving the evaporation material deposited on the substrate. Uniformity of thickness.
本發明之另一目的係在提供一種蒸發裝置，其結構簡化且可降低顆粒產生。Another object of the present invention is to provide an evaporation apparatus which is simplified in structure and which can reduce particle generation.
本發明之目的可藉由一種蒸發裝置完成，此蒸發裝置包括一移動板，配置於一框架上，以進行往復移動；複數個蒸發源，用於蒸發一蒸發材料至一基板上，以沉積該蒸發材料於該基板上，該複數個蒸發源係在交叉於該移動板之移動方向的方位上配置於該移動板上；以及一驅動單元，用於使該移動板進行往復移動。The object of the present invention can be achieved by an evaporation device comprising a moving plate disposed on a frame for reciprocating movement; a plurality of evaporation sources for evaporating an evaporation material onto a substrate to deposit the Evaporating the material on the substrate, the plurality of evaporation sources are disposed on the moving plate in an orientation crossing the moving direction of the moving plate; and a driving unit for reciprocating the moving plate.
依照本發明之實施例，蒸發裝置包括一導引單元，用於導引該移動板進行往復移動，該導引單元包括：一導引軌，配置於該框架中；以及一導引元件，固定於該移動板，且具有一導引溝，該導引軌係插置於該導引溝之中。According to an embodiment of the present invention, the evaporating device includes a guiding unit for guiding the moving plate to reciprocate, the guiding unit includes: a guiding rail disposed in the frame; and a guiding component fixed The moving plate has a guiding groove, and the guiding rail is inserted into the guiding groove.
該驅動單元包括：一驅動馬達；以及一動力傳輸單元，用以傳輸該驅動馬達之驅動力至該移動板，使該移動板移動。該動力傳輸單元包括：一驅動輪，可轉動地配置於該框架中，且由該驅動馬達進行驅動；一惰輪，可轉動地配置於該框架中，該惰輪係在該移動板之移動方向上與該驅動輪隔開；一鋼帶，驅動地連接該驅動輪及該惰輪，其中 該移動板固定於該鋼帶；以及一對斜齒輪，傳輸該驅動力給該驅動輪，其中該驅動輪、該惰輪及該鋼帶之總數各為複數，其係在交叉於該移動板之移動方向的方向上相互間隔。The driving unit includes: a driving motor; and a power transmission unit configured to transmit a driving force of the driving motor to the moving plate to move the moving plate. The power transmission unit includes: a driving wheel rotatably disposed in the frame and driven by the driving motor; an idler wheel rotatably disposed in the frame, the idler is moved on the moving plate Separating from the driving wheel in a direction; a steel belt drivingly connecting the driving wheel and the idler wheel, wherein The moving plate is fixed to the steel strip; and a pair of helical gears transmit the driving force to the driving wheel, wherein the total number of the driving wheel, the idler wheel and the steel belt are plural, which are intersected by the moving board The directions of movement are spaced apart from each other.
此外，該蒸發源包含：複數個主蒸發源，其係在交叉於該移動板之移動方向的方向上相互間隔排列；以及副蒸發源，其數量相當於主蒸發源的數量，且每一副蒸發源係在該移動板之移動方向上與該對應之主蒸發源隔開配置。Further, the evaporation source includes: a plurality of primary evaporation sources which are arranged at intervals in a direction crossing the moving direction of the moving plate; and a secondary evaporation source, the number of which corresponds to the number of primary evaporation sources, and each pair The evaporation source is disposed apart from the corresponding main evaporation source in the moving direction of the moving plate.
依照本發明之另一實施例，該驅動輪係與該驅動馬達之驅動軸連接，因此可省略該對斜齒輪。According to another embodiment of the invention, the drive train is coupled to the drive shaft of the drive motor so that the pair of helical gears can be omitted.
同樣，本發明之目的可藉由一種蒸發裝置完成，此蒸發裝置包括一驅動馬達；一移動板，配置於框架上，以進行往復移動；至少一蒸發源，配置於該移動板上，該至少一蒸發源蒸發一蒸發材料至一基板上，以沉積該蒸發材料於該基板上；以及一鋼帶，連接於固定在該鋼帶之該移動板，當驅動馬達驅動該鋼帶時，該鋼帶使該移動板進行往復移動。Similarly, the object of the present invention can be accomplished by an evaporation device including a drive motor, a moving plate disposed on the frame for reciprocating movement, and at least one evaporation source disposed on the moving plate, the at least An evaporation source evaporates an evaporation material onto a substrate to deposit the evaporation material on the substrate; and a steel strip coupled to the moving plate fixed to the steel strip, the steel is driven when the drive motor drives the steel strip The belt causes the moving plate to reciprocate.
於後，參考隨後圖式，本發明將詳述示例性的實施例。Hereinafter, the present invention will be described in detail with reference to the following drawings.
參考圖1至3，本發明實施例之蒸發裝置包括：框架100、移動板110(以可於框架100上直線往復移動的方式架設於框架100)、複數個蒸發源120(配置在移動板110上)、 導引單元130(用於導引移動板110直線移動)以及驅動單元140(用於使移動板110直線往復移動)。Referring to FIGS. 1 to 3, an evaporation apparatus according to an embodiment of the present invention includes a frame 100, a moving plate 110 (which is erected on the frame 100 in a linear reciprocating manner on the frame 100), and a plurality of evaporation sources 120 (disposed on the moving plate 110). on), The guiding unit 130 (for guiding the linear movement of the moving plate 110) and the driving unit 140 (for moving the moving plate 110 linearly reciprocating).
移動板110係用於支撐並使複數個蒸發源120全部一起移動，且移動板110的頂面上配置有複數個蒸發源120，而底面上則配置有一對連接元件112，以使移動板110連接至驅動單元140。此外，移動板110的底面上配置有一對支撐元件114，用於支撐導引單元130上的移動板110。雖然本實施例之移動板110為矩形板，但其可為各種不同經修飾的形狀，且可由各種不同的材料製成，只要其可支撐複數個蒸發源120且可與它們一起移動即可。The moving plate 110 is used for supporting and moving all of the plurality of evaporation sources 120 together, and a plurality of evaporation sources 120 are disposed on the top surface of the moving plate 110, and a pair of connecting members 112 are disposed on the bottom surface to move the plate 110. Connected to the drive unit 140. Further, a pair of support members 114 are disposed on the bottom surface of the moving plate 110 for supporting the moving plate 110 on the guiding unit 130. Although the moving plate 110 of the present embodiment is a rectangular plate, it may be of various modified shapes and may be made of a variety of different materials as long as it can support a plurality of evaporation sources 120 and can move with them.
複數個蒸發源120以垂直於移動板110的移動方向的方位，排列在移動板110的頂面上，較佳為，複數個蒸發源120以相同距離間隔，使得蒸發材料可以根據基板的位置沉積出均勻厚度。在蒸發有機EL材料的同時，複數個蒸發源120中，每一個可包含主蒸發源124及副蒸發源122，其兩者在移動板110的移動方向上相互隔開。主蒸發源124填充主材料，而副蒸發源122填充副材料作為摻雜劑，以使主材料和副材料可以同時沉積在基板上。A plurality of evaporation sources 120 are arranged on the top surface of the moving plate 110 in an orientation perpendicular to the moving direction of the moving plate 110. Preferably, the plurality of evaporation sources 120 are spaced at the same distance so that the evaporation material can be deposited according to the position of the substrate. A uniform thickness is obtained. While evaporating the organic EL material, each of the plurality of evaporation sources 120 may include a primary evaporation source 124 and a secondary evaporation source 122, both of which are spaced apart from each other in the moving direction of the moving plate 110. The primary evaporation source 124 fills the primary material and the secondary evaporation source 122 fills the secondary material as a dopant so that the primary and secondary materials can be deposited simultaneously on the substrate.
這些蒸發源120每一個可以具有已知結構，此已知結構為可裝備有坩堝(填充有蒸發材料)，以及配置在坩堝周圍的電熱線，以加熱並蒸發該蒸發材料。因蒸發源120的構造已廣為人知，故在此不再贅述蒸發源120之蒸發原理及結構。Each of these evaporation sources 120 may have a known structure that is equipped with a crucible (filled with an evaporation material) and a heating wire disposed around the crucible to heat and evaporate the evaporation material. Since the structure of the evaporation source 120 is well known, the evaporation principle and structure of the evaporation source 120 will not be described herein.
此外，包含石英振動器的感應器(未示)可配置接近於個別蒸發源120，以量測蒸發源的蒸發作用。根據測得個別 蒸發源120的蒸發作用，可用控制器透過調整蒸發源120的個別溫度，來控制個別蒸發源120的蒸發速率。Additionally, an inductor (not shown) including a quartz vibrator can be configured proximate to the individual evaporation source 120 to measure the evaporation of the evaporation source. Based on individual measurements The evaporation of the evaporation source 120 can be controlled by the controller to adjust the evaporation rate of the individual evaporation sources 120 by adjusting the individual temperatures of the evaporation sources 120.
引導單元130可用於引導移動板110進行直線往復移動，且每一個引導單元130包含裝備在每一個支撐元件114的引導元件134，以及裝備在支架100的導引軌132。導引元件134具有導引溝135，而導引軌132插置於導引溝135中。由於上述結構，移動板110可沿著導引軌132直線往復移動。The guiding unit 130 can be used to guide the moving plate 110 to linearly reciprocate, and each guiding unit 130 includes a guiding member 134 equipped at each of the supporting members 114, and a guiding rail 132 equipped on the bracket 100. The guiding element 134 has a guiding groove 135, and the guiding rail 132 is inserted in the guiding groove 135. Due to the above structure, the moving plate 110 can linearly reciprocate along the guide rail 132.
同時，本實施例中，導引軌132係固定於支架100，且具有個別導引軌135之導引元件134固定於移動板110，但也有可能相反於本實施例，將導引軌132固定於移動板110，而導引溝則形成於支架100中。In the embodiment, the guide rails 132 are fixed to the bracket 100, and the guiding members 134 having the individual guiding rails 135 are fixed to the moving plate 110. However, it is also possible to fix the guiding rails 132 instead of the embodiment. The moving plate 110 is moved, and the guiding groove is formed in the bracket 100.
驅動單元140係用於使移動板110進行移動，趨動單元140包含驅動馬達141及動力傳輸單元142，以傳輸驅動馬達141之驅動力給移動板110。The driving unit 140 is for moving the moving plate 110, and the driving unit 140 includes a driving motor 141 and a power transmission unit 142 to transmit the driving force of the driving motor 141 to the moving plate 110.
驅動馬達141係固定於支架100，且可對提供的電流方向呈現向前及向後轉動的反應，因此可以使移動板110進行往復移動。The drive motor 141 is fixed to the bracket 100 and can exhibit a forward and backward rotation reaction to the direction of the supplied current, so that the moving plate 110 can be reciprocated.
動力傳輸單元142包含一對斜齒輪143及144(連接於驅動馬達141的驅動軸141a且具有相互交叉軸)、驅動輪145(連接於斜齒輪143及144)、惰輪146(經由鋼帶147驅動地連接於個別驅動輪145)以及鋼帶147(傳輸驅動輪145的驅動力給惰輪146)。The power transmission unit 142 includes a pair of helical gears 143 and 144 (connected to the drive shaft 141a of the drive motor 141 and have mutually intersecting shafts), a drive wheel 145 (connected to the helical gears 143 and 144), and an idler 146 (via the steel belt 147). Driven to the individual drive wheels 145) and the steel strip 147 (the drive force that transmits the drive wheels 145 to the idler 146).
斜齒輪143及144包含第一斜齒輪143(連接於驅動馬達141之驅動軸141a)及第二斜齒輪144(其軸垂直於第一斜齒 輪143的柄軸)。因為驅動馬達141的驅動軸141a垂直於驅動輪145的柄軸，所以第一斜齒輪143及第二斜齒輪144係用於轉換驅動力的轉動方向。因此，根據驅動馬達141的位置及配置，可省略不用第一斜齒輪143及第二斜齒輪144。The helical gears 143 and 144 include a first helical gear 143 (connected to the drive shaft 141a of the drive motor 141) and a second helical gear 144 (the axis of which is perpendicular to the first helical gear) The arbor of the wheel 143). Since the drive shaft 141a of the drive motor 141 is perpendicular to the arbor of the drive wheel 145, the first helical gear 143 and the second helical gear 144 are used to switch the rotational direction of the driving force. Therefore, the first helical gear 143 and the second helical gear 144 can be omitted depending on the position and arrangement of the drive motor 141.
驅動輪145包含一對滑輪，此對滑輪配置於驅動馬達141的兩相對側。更具體而言，此對驅動輪145可轉動地分別固設於支架100的支撐肋104，且驅動輪145與第二斜齒輪144共享一柄軸144a。The drive wheel 145 includes a pair of pulleys disposed on opposite sides of the drive motor 141. More specifically, the pair of drive wheels 145 are rotatably secured to the support ribs 104 of the bracket 100, respectively, and the drive wheels 145 share a arbor 144a with the second bevel gears 144.
惰輪146係由驅動輪145進行驅動，且惰輪146係在移動板110的移動方向上與驅動輪145隔開配置，惰輪146為對應於該對驅動輪145的一對滑輪，且其可轉動地固設於支架100的支撐肋。The idler 146 is driven by the drive wheel 145, and the idler 146 is disposed apart from the drive wheel 145 in the moving direction of the moving plate 110, and the idler 146 is a pair of pulleys corresponding to the pair of drive wheels 145, and The support rib of the bracket 100 is rotatably fixed.
鋼帶147為一對鋼帶，其中每條鋼帶係連接於對應的驅動輪145及惰輪146，以使其兩者轉動。因此，移動板110係固定於每條鋼帶147的一端。更具體而言，將連接到移動板110的連接元件112固定於個別鋼帶147。當鋼帶147轉動時，由於此結構所以移動板110可以沿著導引軌132直線移動。因為鋼帶作為動力傳輸元件，使移動板110如上述方式移動，所以可將由其他傳輸元件如滾珠螺桿在高速下所產生的顆粒降至最低，而顆粒減少可使沉積有蒸發材料的基板部份缺陷減少。此外，可配置殼體，以覆蓋鋼帶147、驅動輪145及惰輪146。在此情形下，因動力傳輸單元142對於基板而言呈密封狀態，所以基板因顆粒所產生的部份缺陷亦可更加減少。The steel strip 147 is a pair of steel strips, each of which is coupled to a corresponding drive wheel 145 and idler 146 to rotate both. Therefore, the moving plate 110 is fixed to one end of each of the steel strips 147. More specifically, the connecting member 112 connected to the moving plate 110 is fixed to the individual steel strip 147. When the steel strip 147 is rotated, the moving plate 110 can move linearly along the guide rail 132 due to this structure. Since the steel strip acts as a power transmission element, the moving plate 110 is moved as described above, so that particles generated by other conveying elements such as a ball screw at a high speed can be minimized, and the particle portion can be reduced by the substrate portion on which the evaporation material is deposited. Defects are reduced. Additionally, a housing can be configured to cover the steel strip 147, the drive wheel 145, and the idler 146. In this case, since the power transmission unit 142 is in a sealed state with respect to the substrate, a part of the defects of the substrate due to the particles can be further reduced.
上述配置之蒸發裝置的操作將詳述於後。The operation of the evaporation apparatus of the above configuration will be described in detail later.
首先，固設基板面向蒸發單元120，且供應電源給蒸發源120，以使蒸發材料蒸發，此時，開啟驅動馬達141，使移動板110沿著導引軌132移動。更具體而言，當驅動馬達141啟動時，第一斜齒輪143、第二斜齒輪144及鋼帶147藉由摩擦力連接於個別的驅動輪145，使該對驅動輪145進行轉動，而固定於個別鋼帶147一端的移動板110因此移動，此時，固設於移動板110的複數個蒸發源120於基板的長軸方向上移動的同時，蒸發源120將蒸發材料蒸發在整個基板上。First, the fixed substrate faces the evaporation unit 120, and supplies power to the evaporation source 120 to evaporate the evaporation material. At this time, the drive motor 141 is turned on to move the moving plate 110 along the guide rail 132. More specifically, when the drive motor 141 is activated, the first helical gear 143, the second helical gear 144, and the steel strip 147 are coupled to the individual drive wheels 145 by friction, and the pair of drive wheels 145 are rotated to be fixed. The moving plate 110 at one end of the individual steel strip 147 is thus moved. At this time, while the plurality of evaporation sources 120 fixed on the moving plate 110 move in the long axis direction of the substrate, the evaporation source 120 evaporates the evaporation material on the entire substrate. .
圖4係本發明另一實施例中蒸發裝置的結構示意圖。參考圖4，藉由更改驅動馬達241的位置，本實施例不用上述實施例中第一斜齒輪143及第二斜齒輪144。亦即，本發明另一實施例中動力傳輸單元242包含驅動馬達241，其中驅動軸241a直接連接於驅動輪245。然後，驅動輪245透過鋼帶247與惰輪246連接。於此，較佳為鋼帶247、驅動輪245及惰輪246位於移動板210寬度的中間，此更能有效地在移動板210的移動方向上傳輸驅動力。除此之外，連接移動板210及鋼帶247的結構，以及引導移動板210移動的結構，則與上述實施例中所述的相同。Figure 4 is a schematic view showing the structure of an evaporation device in another embodiment of the present invention. Referring to FIG. 4, by changing the position of the drive motor 241, the first helical gear 143 and the second helical gear 144 of the above embodiment are not used in this embodiment. That is, in another embodiment of the present invention, the power transmission unit 242 includes a drive motor 241 in which the drive shaft 241a is directly coupled to the drive wheel 245. Then, the drive wheel 245 is coupled to the idler 246 through the steel strip 247. Here, it is preferable that the steel strip 247, the driving wheel 245, and the idler pulley 246 are located in the middle of the width of the moving plate 210, which is more effective in transmitting the driving force in the moving direction of the moving plate 210. In addition to this, the structure for connecting the moving plate 210 and the steel strip 247, and the structure for guiding the movement of the moving plate 210 are the same as those described in the above embodiment.
藉由將驅動輪245直接連接於驅動馬達241的驅動軸241a，以此方式可更為簡化蒸發裝置的結構。By directly connecting the drive wheel 245 to the drive shaft 241a of the drive motor 241, the structure of the evaporation device can be further simplified in this manner.
依照上述本發明，因為蒸發材料由複數個蒸發源(藉由往復移動的移動板所支撐)蒸發而沉積於懸掛基板上，所以 可以簡化蒸發裝置的結構，減少沉積時間，並輕易控制每個蒸發源的溫度，因此可得厚度均勻的沉積膜。According to the invention as described above, since the evaporation material is deposited on the suspension substrate by evaporation of a plurality of evaporation sources (supported by the reciprocating moving plate), The structure of the evaporation device can be simplified, the deposition time can be reduced, and the temperature of each evaporation source can be easily controlled, so that a deposited film having a uniform thickness can be obtained.
尤其透過使用驅動馬達及鋼帶，使支撐複數個蒸發源的移動板進行往復移動，更可簡化蒸發裝置移動部的結構，並將來自移動部的顆粒降至最少。In particular, by using a drive motor and a steel strip, the moving plate supporting a plurality of evaporation sources is reciprocated, which simplifies the structure of the moving portion of the evaporation device and minimizes particles from the moving portion.
此外，由於驅動馬達的驅動軸直接連接於驅動輪，更可簡化驅動單元的結構。In addition, since the drive shaft of the drive motor is directly connected to the drive wheel, the structure of the drive unit can be simplified.
本發明所描述之示例性實施例僅作為說明用，本領域中通常知識者將可瞭解，在不違背隨後伴隨的申請專利範圍所揭露之發明的範疇及精神下，可執行各種不同的修飾、添加及取代。The present invention has been described by way of example only, and it will be understood by those of ordinary skill in the art that various modifications and modifications can be made without departing from the scope and spirit of the inventions disclosed. Add and replace.
上述實施例僅係為了方便說明而舉例而已，本發明所主張之權利範圍自應以申請專利範圍所述為準，而非僅限於上述實施例。The above-mentioned embodiments are merely examples for convenience of description, and the scope of the claims is intended to be limited to the above embodiments.
框架‧‧‧100Framework ‧‧100
移動板‧‧‧110,210Mobile board ‧‧‧110,210
蒸發源‧‧‧120Evaporation source ‧‧120
導引單元‧‧‧130Guide unit ‧‧‧130
驅動單元‧‧‧140Drive unit ‧‧‧140
連接元件‧‧‧112Connecting element ‧‧‧112
支撐元件‧‧‧114Supporting element ‧‧‧114
主蒸發源‧‧‧124Main evaporation source ‧‧‧124
副蒸發源‧‧‧122Sub-evaporation source ‧‧122
引導元件‧‧‧134Guiding element ‧‧‧134
導引軌‧‧‧132Guide rail ‧‧‧132
導引溝‧‧‧135Guiding Ditch ‧‧135
驅動馬達‧‧‧141,241Drive motor ‧‧‧141,241
動力傳輸單元‧‧‧142,242Power transmission unit ‧‧‧142,242
第一斜齒輪‧‧‧143First helical gear ‧‧143
第二斜齒輪‧‧‧144Second helical gear ‧‧‧144
驅動軸‧‧‧141a,241aDrive shaft ‧‧‧141a, 241a
驅動輪‧‧‧145,245Drive wheel ‧‧‧145,245
惰輪‧‧‧146,246Idler ‧‧146,246
鋼帶‧‧‧147,247Steel strip ‧‧‧147,247
支撐肋‧‧‧104Support rib ‧‧‧104
柄軸‧‧‧144aShank ‧‧‧144a
上述本發明其他目的、特徵及優點，由以下詳細描述結合隨後之圖式可更臻明確。The other objects, features, and advantages of the invention will be apparent from the description and appended claims
圖1係本發明實施例中蒸發裝置的結構示意圖。1 is a schematic structural view of an evaporation device in an embodiment of the present invention.
圖2係圖1所示之蒸發裝置的側視圖。Figure 2 is a side view of the evaporation device shown in Figure 1.
圖3係圖1所示之蒸發裝置的剖面圖。Figure 3 is a cross-sectional view of the evaporation apparatus shown in Figure 1.
圖4係本發明另一實施例中蒸發裝置的示意圖。Figure 4 is a schematic illustration of an evaporation apparatus in another embodiment of the present invention.
框架‧‧‧100Framework ‧‧100
移動板‧‧‧110Mobile board ‧‧‧110
蒸發源‧‧‧120Evaporation source ‧‧120
導引單元‧‧‧130Guide unit ‧‧‧130
驅動單元‧‧‧140Drive unit ‧‧‧140
主蒸發源‧‧‧124Main evaporation source ‧‧‧124
副蒸發源‧‧‧122Sub-evaporation source ‧‧122
引導元件‧‧‧134Guiding element ‧‧‧134
導引軌‧‧‧132Guide rail ‧‧‧132
驅動馬達‧‧‧141Drive motor ‧‧‧141
動力傳輸單元‧‧‧142Power transmission unit ‧‧‧142
第一斜齒輪‧‧‧143First helical gear ‧‧143
第二斜齒輪‧‧‧144Second helical gear ‧‧‧144
驅動輪‧‧‧145Drive wheel ‧‧‧145
惰輪‧‧‧146Idler ‧‧146
鋼帶‧‧‧147Steel strip ‧‧‧147
支撐肋‧‧‧104Support rib ‧‧‧104
柄軸‧‧‧144aShank ‧‧‧144a
Claims (7)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR20070063711A KR100977971B1 (en) | 2007-06-27 | 2007-06-27 | Evaporation equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200916595A TW200916595A (en) | 2009-04-16 |
| TWI443208B true TWI443208B (en) | 2014-07-01 |
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| Application Number | Title | Priority Date | Filing Date |
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| TW97120463A TWI443208B (en) | 2007-06-27 | 2008-06-02 | Evaporation apparatus |
Country Status (5)
| Country | Link |
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| JP (1) | JP2010531391A (en) |
| KR (1) | KR100977971B1 (en) |
| CN (1) | CN101743617B (en) |
| TW (1) | TWI443208B (en) |
| WO (1) | WO2009002019A2 (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101876058B (en) * | 2010-03-23 | 2012-07-11 | 东莞宏威数码机械有限公司 | Vacuum evaporation device |
| CN103540898B (en) * | 2013-10-30 | 2015-07-01 | 京东方科技集团股份有限公司 | Vacuum evaporation device |
| KR101609185B1 (en) * | 2013-12-13 | 2016-04-05 | 주식회사 선익시스템 | Unit for transferring deposition source, apparatus of deposition having the same and method of deposition |
| CN105695939B (en) * | 2016-04-26 | 2018-09-14 | 京东方科技集团股份有限公司 | Linear evaporation source, evaporation coating device and method |
| CN111041441B (en) * | 2019-12-28 | 2021-04-13 | 中国科学院长春光学精密机械与物理研究所 | Uniform coating method, coating equipment and computer-readable storage medium |
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| JPH0742582B2 (en) * | 1993-01-26 | 1995-05-10 | クリーンサアフェイス技術株式会社 | Spatter device |
| JPH0659464U (en) * | 1993-01-29 | 1994-08-19 | 日新電機株式会社 | Film forming equipment |
| TW490714B (en) * | 1999-12-27 | 2002-06-11 | Semiconductor Energy Lab | Film formation apparatus and method for forming a film |
| JP3877613B2 (en) * | 2002-03-05 | 2007-02-07 | 三洋電機株式会社 | Method for manufacturing organic electroluminescence display device |
| US20030221620A1 (en) * | 2002-06-03 | 2003-12-04 | Semiconductor Energy Laboratory Co., Ltd. | Vapor deposition device |
| JP4286496B2 (en) * | 2002-07-04 | 2009-07-01 | 株式会社半導体エネルギー研究所 | Vapor deposition apparatus and thin film manufacturing method |
| US20040040504A1 (en) * | 2002-08-01 | 2004-03-04 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing apparatus |
| JP4251857B2 (en) * | 2002-11-27 | 2009-04-08 | 株式会社アルバック | Vacuum film forming apparatus and vacuum film forming method |
| JP4015064B2 (en) * | 2003-05-28 | 2007-11-28 | トッキ株式会社 | Vapor deposition equipment |
-
2007
- 2007-06-27 KR KR20070063711A patent/KR100977971B1/en not_active IP Right Cessation
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2008
- 2008-05-26 JP JP2010514600A patent/JP2010531391A/en active Pending
- 2008-05-26 CN CN2008800220536A patent/CN101743617B/en not_active Expired - Fee Related
- 2008-05-26 WO PCT/KR2008/002919 patent/WO2009002019A2/en active Application Filing
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Also Published As
| Publication number | Publication date |
|---|---|
| JP2010531391A (en) | 2010-09-24 |
| CN101743617B (en) | 2012-05-23 |
| TW200916595A (en) | 2009-04-16 |
| WO2009002019A2 (en) | 2008-12-31 |
| KR20080114299A (en) | 2008-12-31 |
| CN101743617A (en) | 2010-06-16 |
| KR100977971B1 (en) | 2010-08-24 |
| WO2009002019A3 (en) | 2009-02-19 |
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