TWI441847B - Epoxy-Polyimide Oxygen Mixed Resin Composition for Photonic Semiconductor Component Sealing and Tablets for Transparent Forming - Google Patents

Epoxy-Polyimide Oxygen Mixed Resin Composition for Photonic Semiconductor Component Sealing and Tablets for Transparent Forming Download PDF

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Publication number
TWI441847B
TWI441847B TW098110129A TW98110129A TWI441847B TW I441847 B TWI441847 B TW I441847B TW 098110129 A TW098110129 A TW 098110129A TW 98110129 A TW98110129 A TW 98110129A TW I441847 B TWI441847 B TW I441847B
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TW
Taiwan
Prior art keywords
group
epoxy
composition
resin
optical semiconductor
Prior art date
Application number
TW098110129A
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English (en)
Chinese (zh)
Other versions
TW200948846A (en
Inventor
Tsutomu Kashiwagi
Original Assignee
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co
Publication of TW200948846A publication Critical patent/TW200948846A/zh
Application granted granted Critical
Publication of TWI441847B publication Critical patent/TWI441847B/zh

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0025—Crosslinking or vulcanising agents; including accelerators
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
TW098110129A 2008-03-28 2009-03-27 Epoxy-Polyimide Oxygen Mixed Resin Composition for Photonic Semiconductor Component Sealing and Tablets for Transparent Forming TWI441847B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008085835 2008-03-28
JP2009033148A JP5077894B2 (ja) 2008-03-28 2009-02-16 光半導体素子封止用エポキシ・シリコーン混成樹脂組成物及びそれからなるトランスファー成型用タブレット

Publications (2)

Publication Number Publication Date
TW200948846A TW200948846A (en) 2009-12-01
TWI441847B true TWI441847B (zh) 2014-06-21

Family

ID=41281922

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098110129A TWI441847B (zh) 2008-03-28 2009-03-27 Epoxy-Polyimide Oxygen Mixed Resin Composition for Photonic Semiconductor Component Sealing and Tablets for Transparent Forming

Country Status (4)

Country Link
JP (1) JP5077894B2 (ko)
KR (1) KR101500757B1 (ko)
CN (1) CN101565549B (ko)
TW (1) TWI441847B (ko)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5251919B2 (ja) * 2009-05-08 2013-07-31 信越化学工業株式会社 光半導体素子封止用樹脂組成物
JP5606752B2 (ja) * 2010-02-25 2014-10-15 株式会社ダイセル 光半導体封止用樹脂組成物とこれを使用した光半導体装置
CN103649218B (zh) * 2011-07-13 2016-05-11 株式会社大赛璐 固化性环氧树脂组合物
WO2013011832A1 (ja) * 2011-07-20 2013-01-24 株式会社ダイセル 硬化性エポキシ樹脂組成物
JP6047294B2 (ja) * 2012-03-30 2016-12-21 株式会社ダイセル 硬化性エポキシ樹脂組成物
JP5899025B2 (ja) * 2012-03-30 2016-04-06 株式会社ダイセル 硬化性エポキシ樹脂組成物
WO2013150900A1 (ja) * 2012-04-03 2013-10-10 株式会社ダイセル 硬化性エポキシ樹脂組成物
TWI570160B (zh) * 2012-09-04 2017-02-11 新日鐵住金化學股份有限公司 Epoxy silicone resin and a hardened resin composition using the same
EP3088465B1 (en) 2013-12-26 2019-02-13 Daicel Corporation Curable composition for lens, and lens and optical device
JP6691475B2 (ja) * 2016-12-28 2020-04-28 信越化学工業株式会社 シリコーン樹脂組成物及び光半導体装置
CN111757911B (zh) * 2018-12-29 2023-02-28 广东生益科技股份有限公司 树脂组合物、预浸料、层压板、覆金属箔层压板和印刷线路板
DE102019209346A1 (de) * 2019-06-27 2020-12-31 Siemens Aktiengesellschaft Imprägnierformulierung, Isolationsmaterial, Verfahren zum Herstellen eines Isolationsmaterials und elektrische Maschine mit einem Isolationsmaterial
CN111100463A (zh) * 2019-12-26 2020-05-05 广东盈骅新材料科技有限公司 环氧改性硅树脂组合物及其应用
CN113980514B (zh) * 2021-10-25 2023-05-12 杭州福斯特电子材料有限公司 一种光固化封装组合物、有机封装薄膜及其应用

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4528613B2 (ja) * 2004-12-27 2010-08-18 東レ・ダウコーニング株式会社 シリコーン樹脂とエポキシ樹脂の接着複合体およびその製造方法
JP2006282988A (ja) * 2005-03-08 2006-10-19 Sanyo Chem Ind Ltd 光半導体素子封止用エポキシ樹脂組成物

Also Published As

Publication number Publication date
TW200948846A (en) 2009-12-01
KR101500757B1 (ko) 2015-03-09
JP2009256604A (ja) 2009-11-05
JP5077894B2 (ja) 2012-11-21
CN101565549A (zh) 2009-10-28
KR20090103812A (ko) 2009-10-01
CN101565549B (zh) 2013-01-02

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